TW202311046A - 轉印薄膜及積層體之製造方法 - Google Patents

轉印薄膜及積層體之製造方法 Download PDF

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Publication number
TW202311046A
TW202311046A TW111129438A TW111129438A TW202311046A TW 202311046 A TW202311046 A TW 202311046A TW 111129438 A TW111129438 A TW 111129438A TW 111129438 A TW111129438 A TW 111129438A TW 202311046 A TW202311046 A TW 202311046A
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TW
Taiwan
Prior art keywords
compound
photosensitive layer
transfer film
aforementioned
mass
Prior art date
Application number
TW111129438A
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English (en)
Chinese (zh)
Inventor
中村秀之
山口圭吾
Original Assignee
日商富士軟片股份有限公司
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Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW202311046A publication Critical patent/TW202311046A/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Decoration By Transfer Pictures (AREA)
TW111129438A 2021-08-24 2022-08-05 轉印薄膜及積層體之製造方法 TW202311046A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021136123 2021-08-24
JP2021-136123 2021-08-24

Publications (1)

Publication Number Publication Date
TW202311046A true TW202311046A (zh) 2023-03-16

Family

ID=85323094

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111129438A TW202311046A (zh) 2021-08-24 2022-08-05 轉印薄膜及積層體之製造方法

Country Status (3)

Country Link
JP (1) JPWO2023026786A1 (fr)
TW (1) TW202311046A (fr)
WO (1) WO2023026786A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3849070B2 (ja) * 1999-06-30 2006-11-22 株式会社日立プラズマパテントライセンシング 平面型表示装置
JP2001350255A (ja) * 2000-06-08 2001-12-21 Hitachi Chem Co Ltd ブラックマトリックス形成用感光性フィルム
JP5470993B2 (ja) * 2009-04-13 2014-04-16 日立化成株式会社 パターン形成用材料、これを用いたフィルム状エレメント及びパターン形成方法
JP6424150B2 (ja) * 2014-09-30 2018-11-14 富士フイルム株式会社 凹凸構造を有する物品の製造方法および凹凸構造を有する物品
WO2020040054A1 (fr) * 2018-08-23 2020-02-27 富士フイルム株式会社 Film de transfert, stratifié, et procédé de formation de motif

Also Published As

Publication number Publication date
JPWO2023026786A1 (fr) 2023-03-02
WO2023026786A1 (fr) 2023-03-02

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