TW202303718A - Processing device and method for producing processed product - Google Patents

Processing device and method for producing processed product Download PDF

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TW202303718A
TW202303718A TW111118974A TW111118974A TW202303718A TW 202303718 A TW202303718 A TW 202303718A TW 111118974 A TW111118974 A TW 111118974A TW 111118974 A TW111118974 A TW 111118974A TW 202303718 A TW202303718 A TW 202303718A
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processing
drying
moving
holding
cutting
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TW111118974A
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TWI830233B (en
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深井元樹
片岡昌一
堀聡子
坂上雄哉
山本裕子
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日商Towa股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67236Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • B24B41/061Work supports, e.g. adjustable steadies axially supporting turning workpieces, e.g. magnetically, pneumatically
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/06Dust extraction equipment on grinding or polishing machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/18Means for removing cut-out material or waste
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

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  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Details Of Cutting Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The present invention simplifies the device configuration, reduces the footprint, and miniaturizes the storage space of the singulated object to be processed, and includes: processing tables for holding the sealed substrate; a first holding mechanism holding the sealed substrate in order to transport the sealed substrate to the processing table; a processing mechanism cutting and singulating the sealed substrate that is held on the processing table; a storage box in which the sealed substrate singulated by the processing mechanism is dropped and housed; a second holding mechanism holding the product in order to transport the product from the processing tables to the storage box; a moving mechanism for transporting having a common transfer shaft that extends along an arrangement direction of the processing table and the storage box for moving the first holding mechanism and the second holding mechanism; and a moving mechanism for processing moving the processing mechanism respectively on a horizontal plane in a X direction along the transfer shaft and in a Y direction orthogonal to the X direction.

Description

加工裝置、及加工品的製造方法Processing device, and method for manufacturing processed product

本發明是有關於一種加工裝置、及加工品的製造方法。The present invention relates to a processing device and a method for manufacturing a processed product.

先前,於將經樹脂密封的密封完畢基板等電子零件切斷而單片化時使用切斷裝置,但已知有例如如專利文獻1所示般的分割裝置。Conventionally, a cutting device has been used when cutting and singulating electronic components such as resin-sealed sealed substrates, but a dividing device such as that shown in Patent Document 1 is known, for example.

該分割裝置中,被加工物搬入部件於Y軸方向上移動而將封裝基板搬送至保持台,一邊使該保持台於加工進給方向(X軸方向)上移動,一邊利用切削刀片切削封裝基板而分割成晶片尺寸封裝(Chip Scale Package,CSP)。於進行該切削時,自切斷水供給噴嘴向利用切削刀片的切斷部供給切削水。另外,於該分割裝置中,為了與將多個晶片尺寸封裝(CSP)排列並收容於托盤上的結構相比小型化,包括將多個晶片尺寸封裝(CSP)落入至晶片收容容器中進行散裝收容的散裝收容部件。 [現有技術文獻] [專利文獻] In this dividing device, the workpiece carrying member moves in the Y-axis direction to transport the package substrate to the holding table, and cuts the package substrate with the cutting blade while moving the holding table in the processing feed direction (X-axis direction). And divided into chip size package (Chip Scale Package, CSP). During this cutting, cutting water is supplied from the cutting water supply nozzle to the cutting portion by the cutting blade. In addition, in this dividing device, in order to reduce the size compared with the structure in which a plurality of chip size packages (CSPs) are arranged and accommodated on a tray, a plurality of chip size packages (CSPs) are dropped into a chip storage container. Bulk containment parts for bulk containment. [Prior art literature] [Patent Document]

[專利文獻1]日本專利第5947010號公報[Patent Document 1] Japanese Patent No. 5947010

然而,於所述分割裝置中,不僅於Y軸方向上搬送封裝基板,而且為了將封裝基板切削而使保持台於加工進給(X軸方向)上移動,因此裝置的佔據面積(footprint)變大。However, in the above dividing device, not only the package substrate is conveyed in the Y-axis direction, but also the holding table is moved in the processing feed (X-axis direction) in order to cut the package substrate, so the footprint of the device becomes smaller. big.

另外,為了保護X軸方向移動部件免受因切削而產生的加工屑或切削水的影響,而X軸方向移動部件中需要保護構件。作為該保護構件,使用用以保護X軸方向移動部件的蛇腹構件及用以保護該蛇腹構件的蓋構件等。其結果,裝置結構變得複雜。In addition, in order to protect the moving parts in the X-axis direction from machining chips and cutting water generated by cutting, a protection member is required for the moving parts in the X-axis direction. As the protection member, a bellows member for protecting the X-axis direction moving member, a cover member for protecting the bellows member, and the like are used. As a result, the device structure becomes complicated.

[發明所欲解決之課題][Problem to be Solved by the Invention]

因此,本發明是為了解決所述問題點而成,其主要課題在於,簡化裝置結構,減少佔據面積,並且使經單片化的加工對象物的收容空間小型化。 [解決課題之手段] Therefore, the present invention is made to solve the above-mentioned problems, and its main subject is to simplify the structure of the device, reduce the occupied area, and reduce the size of the storage space for the singulated objects to be processed. [Means to solve the problem]

即,本發明的加工裝置的特徵在於包括:加工台,保持加工對象物;第一保持機構,為了將所述加工對象物搬送至所述加工台而保持所述加工對象物;加工機構,將保持於所述加工台的所述加工對象物切斷而單片化;收容箱,將藉由所述加工機構而單片化的所述加工對象物落下並收容;第二保持機構,為了將所述經單片化的所述加工對象物自所述加工台搬送至所述收容箱而保持所述經單片化的所述加工對象物;搬送用移動機構,具有沿著所述加工台及所述收容箱的排列方向延伸且用以使所述第一保持機構及所述第二保持機構移動的共用的傳遞軸;以及加工用移動機構,使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動。 [發明的效果] That is, the processing device of the present invention is characterized in that it includes: a processing table that holds the object to be processed; a first holding mechanism that holds the object to be processed in order to transfer the object to the processing table; and a processing mechanism that holds the object to be processed. The object to be processed held on the processing table is cut and separated into pieces; the storage box drops and accommodates the object to be processed which has been separated into pieces by the processing mechanism; The object to be processed that has been separated into pieces is transferred from the processing table to the storage box to hold the object to be processed that has been separated into pieces; and a common transmission shaft extending in the arrangement direction of the storage boxes and used to move the first holding mechanism and the second holding mechanism; and a moving mechanism for processing, so that the processing mechanism can move along the The transmission shaft moves in a first direction and a second direction orthogonal to the first direction, respectively. [Effect of the invention]

根據如此構成的本發明,可簡化裝置結構,減少佔據面積,並且使經單片化的加工對象物的收容空間小型化。According to the present invention constituted in this way, the structure of the device can be simplified, the occupied area can be reduced, and the storage space for the singulated objects can be reduced in size.

接著,舉例對本發明進行更詳細說明。但是,本發明不由以下的說明限定。Next, the present invention will be described in more detail with examples. However, the present invention is not limited by the following description.

如所述般,本發明的加工裝置的特徵在於包括:加工台,保持加工對象物;第一保持機構,為了將所述加工對象物搬送至所述加工台而保持所述加工對象物;加工機構,將保持於所述加工台的所述加工對象物切斷而單片化;收容箱,將藉由所述加工機構而單片化的所述加工對象物落下並收容;第二保持機構,為了將所述經單片化的所述加工對象物自所述加工台搬送至所述收容箱而保持所述經單片化的所述加工對象物;搬送用移動機構,具有沿著所述加工台及所述收容箱的排列方向延伸且用以使所述第一保持機構及所述第二保持機構移動的共用的傳遞軸;以及加工用移動機構,使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動。As described above, the processing apparatus of the present invention is characterized in that it includes: a processing table that holds the object to be processed; a first holding mechanism that holds the object to be processed in order to transfer the object to the processing table; a mechanism for cutting and separating the object to be processed held by the processing table; a storage box for dropping and storing the object to be processed which is separated by the processing mechanism; and a second holding mechanism , in order to transfer the singulated object to be processed from the processing table to the storage box to hold the singulated object to be processed; the moving mechanism for conveyance has a A common transmission shaft extending in the direction of arrangement of the processing table and the storage box and used to move the first holding mechanism and the second holding mechanism; and a moving mechanism for processing, so that the processing mechanism is placed on a horizontal plane respectively move in a first direction along the transmission shaft and in a second direction orthogonal to the first direction.

若為所述加工裝置,則採用藉由沿著加工台及收容箱的排列方向延伸的共用的傳遞軸使第一保持機構及第二保持機構移動的結構,藉由加工用移動機構使加工機構於水平面上於沿著傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動,因此無需使加工台於第一方向及第二方向上移動便可將加工對象物單片化。因此,可不藉由滾珠螺桿機構等使加工台移動,而無需用以保護滾珠螺桿機構等的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果,可使加工裝置的裝置結構簡化。 另外,由於成為加工台不於水平面上於第一方向及第二方向上移動的結構,因此可削減加工台的移動空間及其周邊的無用空間,可減少加工裝置的佔據面積。 進而,將保持有經單片化的加工對象物的第二保持機構搬送至收容箱,使經單片化的加工對象物自該第二保持機構落下並收容於收容箱中,因此與先前的托盤收容的結構相比,可使收容空間小型化。藉此,亦可減少加工裝置的佔據面積。 In the processing device, the first holding mechanism and the second holding mechanism are moved by a common transmission shaft extending along the direction in which the processing table and the storage box are arranged, and the processing mechanism is moved by the moving mechanism for processing. It moves on the horizontal plane in the first direction along the transmission axis and in the second direction perpendicular to the first direction, so that the processing object can be processed without moving the processing table in the first direction and the second direction. Monolithic. Therefore, the processing table can be moved without using the ball screw mechanism or the like, and the bellows member for protecting the ball screw mechanism or the like and the cover member for protecting the bellows member are unnecessary. As a result, the device structure of the processing device can be simplified. In addition, since the processing table does not move in the first direction and the second direction on the horizontal plane, the movement space of the processing table and the useless space around it can be reduced, and the occupied area of the processing device can be reduced. Furthermore, the second holding mechanism holding the singulated object to be processed is transferred to the storage box, and the singulated object to be processed is dropped from the second holding mechanism and stored in the storage box. Compared with the tray storage structure, the storage space can be miniaturized. Thereby, the occupied area of the processing device can also be reduced.

作為傳遞軸及加工用移動機構的具體配置的態樣,理想的是所述傳遞軸以於所述加工用移動機構的上方橫穿所述加工用移動機構的方式配置。 若為所述結構,則可使沿著傳遞軸移動的第一保持機構於加工用移動機構的上方移動,從而可防止第一保持機構與加工用移動機構發生物理干擾。另外,可使沿著傳遞軸移動的第二保持機構於加工用移動機構的上方移動,從而可防止第二保持機構與加工用移動機構發生物理干擾。 As an aspect of the specific arrangement of the transmission shaft and the moving mechanism for processing, it is desirable that the transmission shaft is arranged so as to traverse the moving mechanism for processing above the moving mechanism for processing. According to this configuration, the first holding mechanism that moves along the transmission shaft can be moved above the processing moving mechanism, and physical interference between the first holding mechanism and the processing moving mechanism can be prevented. In addition, the second holding mechanism that moves along the transmission shaft can be moved above the processing moving mechanism, thereby preventing physical interference between the second holding mechanism and the processing moving mechanism.

作為所述第二保持機構的具體的實施態樣,理想的是所述第二保持機構吸附保持所述經單片化的所述加工對象物。As a specific implementation aspect of the second holding mechanism, it is desirable that the second holding mechanism suction-holds the singulated object to be processed.

為了使經單片化的加工對象物自第二保持機構可靠地落下至收容箱,理想的是更包括自所述第二保持機構刮落所述經單片化的所述加工對象物的刮落構件。In order to reliably drop the separated object to be processed from the second holding mechanism to the storage box, it is desirable to further include a scraper for scraping off the separated object to be processed from the second holding mechanism. Fall components.

為了於利用由移動用搬送機構進行的第二保持機構的移動的同時可靠地將經單片化的加工對象物刮落並收容於收容箱中,理想的是所述刮落構件固定於所述收容箱,藉由所述搬送用移動機構使所述第二保持機構相對於所述刮落構件移動,而將所述經單片化的所述加工對象物自所述第二保持機構刮落。In order to reliably scrape off and store the singulated object in the storage box while using the movement of the second holding mechanism by the moving conveyance mechanism, it is desirable that the scraping member is fixed to the A storage box for scraping off the singulated objects from the second holding mechanism by moving the second holding mechanism relative to the scraping member by the transport moving mechanism. .

為了將經單片化的加工對象物乾燥,理想的是本發明的加工裝置更包括用以將所述經單片化的所述加工對象物乾燥的乾燥台。 於所述結構中,所述搬送用移動機構使所述第二保持機構自所述加工台移動至所述乾燥台,並自所述乾燥台移動至所述收容台。 In order to dry the individualized object to be processed, it is desirable that the processing apparatus of the present invention further includes a drying table for drying the individualized object to be processed. In the above configuration, the transfer moving mechanism moves the second holding mechanism from the processing table to the drying table, and from the drying table to the storage table.

作為用以將經單片化的加工對象物乾燥的具體的實施態樣,理想的是本發明的加工裝置更包括:乾燥機構,自所述乾燥台的上方噴射氣體,而將所述經單片化的所述加工對象物乾燥;以及乾燥用移動機構,使所述乾燥機構沿著所述乾燥台移動。As a specific implementation aspect for drying the object to be processed which has been separated into pieces, it is desirable that the processing device of the present invention further includes: a drying mechanism, which injects gas from above the drying table, and separates the single pieces into pieces. drying the sheeted object; and moving the drying mechanism along the drying table for drying.

作為乾燥機構的具體的實施態樣,理想的是所述乾燥機構朝向利用所述乾燥用移動機構的移動方向噴射氣體。As a specific implementation aspect of the drying mechanism, it is preferable that the drying mechanism injects gas toward a moving direction of the drying moving mechanism.

作為使加工機構至少於作為第一方向的X方向及作為第二方向的Y方向上移動的移動機構的具體的實施態樣,理想的是所述加工用移動機構包括:X方向移動部,使所述加工機構於X方向上直線移動;以及Y方向移動部,使所述加工機構於Y方向上直線移動,所述X方向移動部具有:一對X方向導軌,隔著所述加工台沿著X方向設置;以及支撐體,沿著所述一對X方向導軌移動並且經由所述Y方向移動部支撐所述加工機構。 若為所述結構,則由於在X方向上設置的一對X方向導軌隔著加工台而設置,因此可增大一對X方向導軌的間距。其結果,可減小X方向導軌彼此的Z方向的位置偏移對加工造成的影響。即,可減小旋轉工具(例如刀片)與加工台的正交度的偏移,可提高加工精度。另外,對於X方向導軌,可使用規格較先前低的導軌。 As a specific implementation aspect of the moving mechanism that makes the processing mechanism move at least in the X direction as the first direction and the Y direction as the second direction, it is desirable that the moving mechanism for processing includes: a moving part in the X direction, so that The processing mechanism moves linearly in the X direction; and the Y direction moving part makes the processing mechanism move linearly in the Y direction, and the X direction moving part has: a pair of X direction guide rails, separated by the processing table along the and a support body that moves along the pair of X-direction guide rails and supports the processing mechanism via the Y-direction moving portion. According to the said structure, since a pair of X direction guide rail provided in the X direction is provided across a processing table, the pitch of a pair of X direction guide rail can be enlarged. As a result, the influence of the Z-direction positional displacement between the X-direction guide rails on the machining can be reduced. That is, it is possible to reduce the deviation of the orthogonality between the rotating tool (such as a blade) and the processing table, and improve the processing accuracy. In addition, for the X-direction guide rail, a guide rail with a lower specification than before can be used.

另外,使用所述加工裝置來製造加工品的、加工品的製造方法亦為本發明的一態樣。Moreover, the manufacturing method of the processed product which manufactures a processed product using the said processing apparatus is also one aspect of this invention.

<本發明的一實施形態> 以下,參照圖式對本發明的加工裝置的一實施形態進行說明。再者,關於以下所示的任一圖,均為了容易理解而適當省略或誇張地示意性地描繪。對相同的構成部件標註相同符號,適當省略說明。 <An embodiment of the present invention> Hereinafter, an embodiment of the processing apparatus of the present invention will be described with reference to the drawings. It should be noted that any of the drawings shown below are appropriately omitted or exaggerated and schematically drawn for easy understanding. The same symbols are assigned to the same components, and explanations are appropriately omitted.

<加工裝置的整體結構> 本實施形態的加工裝置100為切斷裝置,所述切斷裝置藉由將作為加工對象物的密封完畢基板W切斷,而單片化為多個作為加工品的製品P。 <Overall structure of processing equipment> The processing apparatus 100 of this embodiment is a cutting apparatus which cuts the sealed substrate W which is an object to be processed, and singulates it into a plurality of products P which are processed products.

此處,所謂密封完畢基板W,是對連接有半導體晶片、電阻元件、電容器元件等電子元件的基板,以至少對電子元件進行樹脂密封的方式進行了樹脂成形而成。作為構成密封完畢基板W的基板,可使用引線框架、印刷配線板,除了該些以外,亦可使用半導體製基板(包含矽晶圓等半導體晶圓)、金屬製基板、陶瓷製基板、玻璃製基板、樹脂製基板等。另外,對於構成密封完畢基板W的基板,可實施配線亦可不實施配線。Here, the sealed substrate W is a substrate to which electronic components such as a semiconductor chip, a resistor element, and a capacitor element are connected, and resin-molded such that at least the electronic components are resin-sealed. As the substrate constituting the sealed substrate W, lead frames and printed wiring boards can be used, and other than these, semiconductor substrates (including semiconductor wafers such as silicon wafers), metal substrates, ceramic substrates, and glass substrates can also be used. Substrates, resin substrates, etc. In addition, for the substrate constituting the sealed substrate W, wiring may or may not be performed.

另外,本實施形態的密封完畢基板W及製品P成為基板的一面經樹脂成形的結構。於此種結構中,經樹脂成形的面是與基板連接的電子元件經樹脂密封的面,被稱為「密封面」或「封裝面」。另一方面,與經樹脂成形的面為相反側的未經樹脂成形的面露出通常作為製品的外部連接電極發揮功能的引線,因此被稱為引線面。在該引線為球柵陣列(Ball Grid Array,BGA)等電子零件中使用的突起狀電極的情況下,有時亦被稱為「球面」。進而,與經樹脂成形的面為相反側的未經樹脂成形的面亦存在未形成引線的形態,因此有時亦被稱為「基板面」。於本實施形態的說明中,將經樹脂成形的面記載為「密封面」或「封裝面」,將與經樹脂成形的面為相反側的未經樹脂成形的面記載為「引線面」。In addition, the sealed substrate W and the product P of this embodiment have a structure in which one side of the substrate is molded with resin. In this structure, the resin-molded surface is the resin-sealed surface of the electronic components connected to the substrate, which is called "sealing surface" or "package surface". On the other hand, the non-resin-molded surface on the opposite side to the resin-molded surface exposes the leads that usually function as external connection electrodes of the product, so it is called a lead surface. When the lead wire is a protruding electrode used in electronic components such as a ball grid array (BGA), it may also be called a "spherical surface". Furthermore, the non-resin-molded surface opposite to the resin-molded surface also has a form in which no leads are formed, so it may also be called a "substrate surface". In the description of this embodiment, the resin-molded surface is described as a "sealing surface" or "package surface", and the resin-molded surface opposite to the resin-molded surface is described as a "lead surface".

具體而言,如圖1所示,切斷裝置100包括:兩個切斷用台(加工台)2A、2B,保持密封完畢基板W;第一保持機構3,為了將密封完畢基板W搬送至切斷用台2A、切斷用台2B而保持密封完畢基板W;切斷機構(加工機構)4,將保持於切斷用台2A、切斷用台2B的密封完畢基板W切斷;第二保持機構6,為了將多個製品P自切斷用台2A、切斷用台2B搬送至收容箱5而保持多個製品P;搬送用移動機構7,具有用以使第一保持機構3及第二保持機構6移動的共用的傳遞軸71;以及切斷用移動機構(加工用移動機構)8,使切斷機構4相對於保持於切斷用台2A、切斷用台2B的密封完畢基板W移動。再者,由第一保持機構3及搬送用移動機構7構成搬送密封完畢基板W的搬送機構(裝載機),由第二保持機構6及搬送用移動機構7構成搬送多個製品P的搬送機構(卸載機)。Specifically, as shown in FIG. 1 , the cutting device 100 includes: two cutting tables (processing tables) 2A and 2B holding the sealed substrate W; and a first holding mechanism 3 for transporting the sealed substrate W to The cutting table 2A and the cutting table 2B hold the sealed substrate W; the cutting mechanism (processing mechanism) 4 cuts the sealed substrate W held on the cutting table 2A and the cutting table 2B; Two holding mechanisms 6 keep a plurality of products P in order to transport a plurality of products P from the cutting table 2A and the cutting table 2B to the storage box 5; and the common transmission shaft 71 that the second holding mechanism 6 moves; The movement of the substrate W is completed. Furthermore, the transport mechanism (loader) for transporting the sealed substrate W is constituted by the first holding mechanism 3 and the transport moving mechanism 7, and the transport mechanism for transporting a plurality of products P is constituted by the second holding mechanism 6 and the transport moving mechanism 7. (uninstaller).

於以下的說明中,將沿著切斷用台2A、切斷用台2B的上表面的平面(水平面)內相互正交的方向分別設為作為第一方向的X方向及作為第二方向的Y方向,將與X方向及Y方向正交的鉛垂方向設為Z方向。具體而言,將圖1的左右方向設為X方向,將上下方向設為Y方向。雖將後述,但X方向為支撐體812的移動方向,而且為與門型支撐體812的架設有一對腳部的樑部(橫樑部)的長度方向(樑部延伸的方向)正交的方向(參照圖2及圖3)。In the following description, the directions perpendicular to each other in the plane (horizontal plane) along the upper surfaces of the table 2A for cutting and the table 2B for cutting are respectively referred to as the X direction as the first direction and as the X direction as the second direction. As for the Y direction, let the vertical direction perpendicular to the X direction and the Y direction be the Z direction. Specifically, let the left-right direction of FIG. 1 be an X direction, and let an up-down direction be a Y direction. Although it will be described later, the X direction is the moving direction of the support body 812, and is also a direction perpendicular to the longitudinal direction (the direction in which the beam portion extends) of the beam portion (beam portion) on which the pair of legs of the door-shaped support body 812 is erected. (Refer to Figure 2 and Figure 3).

<切斷用台2A、切斷用台2B> 兩個切斷用台2A、2B於X方向、Y方向及Z方向上固定地設置。再者,切斷用台2A能夠藉由設置於切斷用台2A之下的旋轉機構9A於θ方向上旋轉。另外,切斷用台2B能夠藉由設置於切斷用台2B之下的旋轉機構9B於θ方向上旋轉。 <Cutting table 2A, cutting table 2B> The two tables 2A and 2B for cutting are fixedly installed in the X direction, the Y direction, and the Z direction. In addition, the table 2A for cutting is rotatable in the (theta) direction by the rotation mechanism 9A provided under the table 2A for cutting. In addition, the cutting table 2B can be rotated in the θ direction by the rotation mechanism 9B provided under the cutting table 2B.

該些兩個切斷用台2A、2B於水平面上沿著X方向設置。具體而言,兩個切斷用台2A、2B以該些的上表面位於同一水平面上(於Z方向位於相同高度位置)的方式配置(參照圖4),並且以該些上表面的中心(具體而言為利用旋轉機構9A、旋轉機構9B的旋轉中心)位於沿X方向延伸的同一直線上的方式配置(參照圖2及圖3)。These two stages 2A and 2B for cutting are installed along the X direction on a horizontal plane. Specifically, the two cutting tables 2A, 2B are arranged so that their upper surfaces are on the same horizontal plane (at the same height position in the Z direction) (see FIG. 4 ), and the centers of these upper surfaces ( Specifically, they are arranged so that the rotation centers of the rotation mechanism 9A and the rotation mechanism 9B are located on the same straight line extending in the X direction (see FIGS. 2 and 3 ).

另外,兩個切斷用台2A、2B吸附保持密封完畢基板W,如圖1所示,與兩個切斷用台2A、2B對應地配置有用以吸附保持的兩個真空泵10A、10B。各真空泵10A、10B例如為水封式真空泵。In addition, the two cutting stages 2A, 2B absorb and hold the sealed substrate W. As shown in FIG. Each vacuum pump 10A, 10B is a water-sealed vacuum pump, for example.

此處,切斷用台2A、切斷用台2B於XYZ方向上經固定,因此可縮短自真空泵10A、真空泵10B連接於切斷用台2A、切斷用台2B的配管(未圖示),可減少配管的壓力損失,而防止吸附力的降低。其結果,即便為例如1 mm見方以下的極小封裝,亦能可靠地吸附於切斷用台2A、切斷用台2B。另外,可防止配管的壓力損失所致的吸附力的降低,因此可減小真空泵10A、真空泵10B的容量,有助於小型化或成本降低。Here, since the table 2A for cutting and the table 2B for cutting are fixed in the XYZ direction, the piping (not shown) connecting the table 2A for cutting and the table 2B for cutting from the vacuum pump 10A, 10B can be shortened. , can reduce the pressure loss of the piping, and prevent the reduction of the adsorption force. As a result, even an extremely small package of, for example, 1 mm square or less can be reliably adsorbed to the table 2A for cutting and the table 2B for cutting. In addition, since the reduction of the adsorption force due to the pressure loss of the piping can be prevented, the capacities of the vacuum pump 10A and the vacuum pump 10B can be reduced, contributing to downsizing and cost reduction.

<第一保持機構3> 如圖1所示,第一保持機構3為了將密封完畢基板W自基板供給機構11搬送至切斷用台2A、切斷用台2B而保持密封完畢基板W。如圖5及圖6所示,所述第一保持機構3具有:吸附頭31,設置有用以吸附保持密封完畢基板W的多個吸附部311;以及真空泵(未圖示),連接於該吸附頭31的吸附部311。而且,吸附頭31藉由後述的搬送用移動機構7等移動至所期望的位置,藉此將密封完畢基板W自基板供給機構11搬送至切斷用台2A、切斷用台2B。 First holding mechanism 3> As shown in FIG. 1 , the first holding mechanism 3 holds the sealed substrate W to transfer the sealed substrate W from the substrate supply mechanism 11 to the cutting table 2A and the cutting table 2B. As shown in Figures 5 and 6, the first holding mechanism 3 has: a suction head 31, provided with a plurality of suction parts 311 for suction and holding the sealed substrate W; and a vacuum pump (not shown), connected to the suction The suction part 311 of the head 31 . Then, the suction head 31 is moved to a desired position by the transport moving mechanism 7 described later, thereby transporting the sealed substrate W from the substrate supply mechanism 11 to the cutting table 2A and the cutting table 2B.

如圖1所示,基板供給機構11具有:基板收容部111,自外部收容多個密封完畢基板W;以及基板供給部112,使收容於該基板收容部111的密封完畢基板W移動至由第一保持機構3吸附保持的保持位置RP。所述保持位置RP是以於X方向上與兩個切斷用台2A、2B成為同行的方式設定。再者,基板供給機構11亦可具有為了使由第一保持機構3吸附的密封完畢基板W為柔軟的狀態以容易吸附而對所述密封完畢基板W進行加熱的加熱部113。As shown in FIG. 1 , the substrate supply mechanism 11 has: a substrate accommodating portion 111 for accommodating a plurality of sealed substrates W from the outside; A holding mechanism 3 absorbs and holds the holding position RP. The holding position RP is set so as to be in line with the two stages 2A and 2B for cutting in the X direction. Furthermore, the substrate supply mechanism 11 may include a heating unit 113 for heating the sealed substrate W sucked by the first holding mechanism 3 so as to make the sealed substrate W sucked by the first holding mechanism 3 into a soft state for easy sucking.

<切斷機構4> 如圖1、圖2及圖3所示,作為加工機構的切斷機構4具有包含刀片41A、刀片41B及兩個心軸部42A、42B的兩個旋轉工具40。兩個心軸部42A、42B以該些的旋轉軸沿著Y方向的方式設置,安裝於該些心軸部的刀片41A、刀片41B以相互相向的方式配置(參照圖3)。心軸部42A的刀片41A及心軸部42B的刀片41B藉由在包含X方向及Z方向的面內旋轉,而將保持於各切斷用台2A、2B的密封完畢基板W切斷。再者,如圖4所示,於本實施形態的切斷裝置100設置有液體供給機構12,所述液體供給機構12具有為了抑制由刀片41A、刀片41B產生的摩擦熱而噴射切削水(加工液)的噴射噴嘴121。所述噴射噴嘴121例如支撐於後述的Z方向移動部83。 <Cutting mechanism 4> As shown in FIGS. 1 , 2 and 3 , the cutting mechanism 4 as a processing mechanism has two rotary tools 40 including a blade 41A, a blade 41B, and two spindle portions 42A, 42B. The two spindle parts 42A and 42B are provided so that the rotation axes thereof are along the Y direction, and the blades 41A and 41B attached to the spindle parts are arranged to face each other (see FIG. 3 ). The blade 41A of the mandrel part 42A and the blade 41B of the mandrel part 42B cut the sealed substrate W held on each cutting table 2A, 2B by rotating in a plane including the X direction and the Z direction. Furthermore, as shown in FIG. 4, the cutting device 100 of the present embodiment is provided with a liquid supply mechanism 12 having a function of jetting cutting water (processing) in order to suppress the frictional heat generated by the blades 41A and 41B. liquid) spray nozzle 121. The spray nozzle 121 is supported, for example, by a Z-direction moving part 83 described later.

<第二保持機構6> 如圖1所示,第二保持機構6為了將多個製品P自切斷用台2A、切斷用台2B搬送至乾燥台13或收容箱5而保持多個製品P。如圖8所示,所述第二保持機構6具有:吸附頭61,設置有用以吸附保持多個製品P的多個吸附部611;以及真空泵(未圖示),連接於該吸附頭61的吸附部611。然後,吸附頭61藉由後述的搬送用移動機構7等移動至所期望的位置,藉此將多個製品P自切斷用台2A、切斷用台2B搬送至乾燥台13,並自乾燥台13搬送至收容箱5。 <Second holding mechanism 6> As shown in FIG. 1 , the second holding mechanism 6 holds a plurality of products P in order to transfer the plurality of products P from the cutting table 2A and the cutting table 2B to the drying table 13 or the storage box 5 . As shown in FIG. 8 , the second holding mechanism 6 has: an adsorption head 61 provided with a plurality of adsorption parts 611 for adsorbing and holding a plurality of products P; and a vacuum pump (not shown) connected to the suction head 61 Adsorption part 611. Then, the adsorption head 61 is moved to a desired position by the conveying moving mechanism 7 described later, whereby a plurality of products P are conveyed from the cutting table 2A and the cutting table 2B to the drying table 13, and are automatically dried. The table 13 is transferred to the storage box 5 .

<搬送用移動機構7> 如圖1所示,搬送用移動機構7使第一保持機構3至少於基板供給機構11與切斷用台2A、切斷用台2B之間移動,並且使第二保持機構6至少於切斷用台2A、切斷用台2B與收容箱5之間移動。 Movement Mechanism 7 for Transport> As shown in FIG. 1 , the transporting moving mechanism 7 moves the first holding mechanism 3 at least between the substrate supply mechanism 11 and the cutting table 2A and the cutting table 2B, and moves the second holding mechanism 6 at least below the cutting table. It moves between the table 2A, the table 2B for cutting, and the storage box 5 .

而且,如圖1所示,搬送用移動機構7具有共用的傳遞軸71,所述共用的傳遞軸71沿著兩個切斷用台2A、2B及收容箱5的排列方向(X方向)呈一直線延伸,用以使第一保持機構3及第二保持機構6移動。Moreover, as shown in FIG. 1 , the moving mechanism 7 for conveyance has a common transmission shaft 71 , and the common transmission shaft 71 is arranged along the arrangement direction (X direction) of the two cutting tables 2A, 2B and the storage box 5 . Extending in a straight line, it is used to move the first holding mechanism 3 and the second holding mechanism 6 .

所述傳遞軸71設於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至收容箱5的上方(參照圖1)。另外,相對於所述傳遞軸71,第一保持機構3、第二保持機構6、切斷用台2A、切斷用台2B及收容箱5於俯視時設置於相同側(近前側)。此外,後述的第一清潔機構18及第二清潔機構19、乾燥台13亦相對於傳遞軸71而設置於相同側(近前側)。The transmission shaft 71 is set in the following range, that is: the first holding mechanism 3 can move to the top of the substrate supply part 112 of the substrate supply mechanism 11, and the second holding mechanism 6 can move to the top of the storage box 5 (refer to FIG. 1). In addition, the first holding mechanism 3 , the second holding mechanism 6 , the cutting table 2A, the cutting table 2B, and the storage box 5 are arranged on the same side (near side) in plan view with respect to the transmission shaft 71 . Moreover, the 1st cleaning mechanism 18 and the 2nd cleaning mechanism 19 mentioned later, and the drying table 13 are also installed in the same side (near side) with respect to the transmission shaft 71. As shown in FIG.

進而,如圖5、圖6及圖8所示,搬送用移動機構7具有:主移動機構72,使第一保持機構3及第二保持機構6沿著傳遞軸71於X方向上移動;升降移動機構73,使第一保持機構3及第二保持機構6相對於傳遞軸71於Z方向上升降移動;以及水平移動機構74,使第一保持機構3及第二保持機構6相對於傳遞軸71於Y方向上水平移動。Furthermore, as shown in Fig. 5, Fig. 6 and Fig. 8, the moving mechanism 7 for conveyance has: a main moving mechanism 72, which moves the first holding mechanism 3 and the second holding mechanism 6 along the transmission shaft 71 in the X direction; The moving mechanism 73 makes the first holding mechanism 3 and the second holding mechanism 6 move up and down in the Z direction relative to the transmission shaft 71; and the horizontal moving mechanism 74 makes the first holding mechanism 3 and the second holding mechanism 6 move relative to the transmission shaft 71 moves horizontally in the Y direction.

如圖5~圖8所示,主移動機構72具有:共用的導軌721,設置於傳遞軸71、且導引第一保持機構3及第二保持機構6;以及齒條與小齒輪機構722,使第一保持機構3及第二保持機構6沿著該導軌721移動。As shown in FIGS. 5-8 , the main moving mechanism 72 has: a common guide rail 721, which is arranged on the transmission shaft 71 and guides the first holding mechanism 3 and the second holding mechanism 6; and a rack and pinion mechanism 722, The first holding mechanism 3 and the second holding mechanism 6 are moved along the guide rail 721 .

導軌721沿著傳遞軸71於X方向上呈一直線延伸,與傳遞軸71同樣地設於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至收容箱5的上方。於所述導軌721,能夠滑動地設置有滑動構件723,所述滑動構件723經由升降移動機構73及水平移動機構74而設置有第一保持機構3及第二保持機構6。此處,導軌721為第一保持機構3及第二保持機構6所共用,但升降移動機構73、水平移動機構74及滑動構件723是針對第一保持機構3及第二保持機構6的各者各別地設置。The guide rail 721 extends linearly in the X direction along the transfer shaft 71, and is provided in the same range as the transfer shaft 71 so that the first holding mechanism 3 can move above the substrate supply part 112 of the substrate supply mechanism 11, and The second holding mechanism 6 can move to the top of the storage box 5 . The guide rail 721 is slidably provided with a slide member 723 provided with the first holding mechanism 3 and the second holding mechanism 6 via the elevating movement mechanism 73 and the horizontal movement mechanism 74 . Here, the guide rail 721 is shared by the first holding mechanism 3 and the second holding mechanism 6, but the elevating movement mechanism 73, the horizontal moving mechanism 74 and the sliding member 723 are for each of the first holding mechanism 3 and the second holding mechanism 6. Set individually.

齒條與小齒輪機構722具有:凸輪齒條722a,為第一保持機構3及第二保持機構6所共用;以及小齒輪722b,分別設置於第一保持機構3及第二保持機構6,藉由致動器(未圖示)旋轉。凸輪齒條722a設置於共用的傳遞軸71,可藉由將多個凸輪齒條要素連結而變更為各種長度。另外,小齒輪722b設置於滑動構件723,被稱為所謂滾子小齒輪(roller pinion),如圖7所示,具有:與馬達的旋轉軸一起旋轉的一對滾子本體722b1;以及於該一對滾子本體722b1之間於圓周方向上等間隔地設置、且設置成能夠相對於滾子本體722b1滾動的多個滾子銷722b2。本實施形態的齒條與小齒輪機構722使用所述滾子小齒輪,因此兩個以上的滾子銷722b2與凸輪齒條722a接觸,於正反方向上不產生背隙(backlash),於使第一保持機構3及第二保持機構6於X方向上移動時定位精度變良好。The rack and pinion mechanism 722 has: a cam rack 722a shared by the first holding mechanism 3 and the second holding mechanism 6; Rotated by an actuator (not shown). The cam rack 722a is provided on the common transmission shaft 71, and can be changed to various lengths by connecting a plurality of cam rack elements. In addition, the pinion 722b is provided on the sliding member 723, and is called a so-called roller pinion (roller pinion), as shown in FIG. A plurality of roller pins 722b2 are provided at equal intervals in the circumferential direction between the pair of roller bodies 722b1 and are provided so as to be able to roll relative to the roller bodies 722b1. The rack and pinion mechanism 722 of this embodiment uses the above-mentioned roller pinion, so two or more roller pins 722b2 are in contact with the cam rack 722a, and there is no backlash in the forward and reverse directions. When the first holding mechanism 3 and the second holding mechanism 6 move in the X direction, the positioning accuracy becomes better.

如圖5及圖8所示,升降移動機構73與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的升降移動機構73介隔存在於傳遞軸71(具體而言為主移動機構72)與第一保持機構3之間而設置,具有:Z方向導軌73a,沿著Z方向設置;以及致動器部73b,使第一保持機構3沿著該Z方向導軌73a移動。再者,致動器部73b例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。再者,如圖8所示,第二保持機構6的升降移動機構73的結構與第一保持機構3的升降移動機構73同樣。As shown in FIGS. 5 and 8 , the elevating movement mechanism 73 is provided corresponding to the first holding mechanism 3 and the second holding mechanism 6 , respectively. As shown in Figures 5 and 6, the elevating movement mechanism 73 of the first holding mechanism 3 is provided between the transmission shaft 71 (specifically, the main moving mechanism 72) and the first holding mechanism 3, and has: Z The direction guide rail 73a is provided along the Z direction; and the actuator part 73b moves the first holding mechanism 3 along the Z direction guide rail 73a. In addition, as the actuator part 73b, for example, a ball screw mechanism may be used, an air cylinder may be used, and a linear motor may be used. In addition, as shown in FIG. 8 , the structure of the vertical movement mechanism 73 of the second holding mechanism 6 is the same as that of the vertical movement mechanism 73 of the first holding mechanism 3 .

如圖5、圖6及圖8所示,水平移動機構74與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的水平移動機構74是介隔存在於傳遞軸71(具體而言為升降移動機構73)與第一保持機構3之間而設置,具有:Y方向導軌74a,沿著Y方向設置;彈性體74b,對第一保持機構3向Y方向導軌74a的其中一側賦予力;以及凸輪機構74c,使第一保持機構3向Y方向導軌74a的另一側移動。此處,凸輪機構74c使用偏心凸輪,藉由利用馬達等致動器使該偏心凸輪旋轉,可調整第一保持機構3向Y方向的移動量。As shown in FIG. 5 , FIG. 6 and FIG. 8 , the horizontal movement mechanism 74 is provided corresponding to the first holding mechanism 3 and the second holding mechanism 6 , respectively. As shown in Figures 5 and 6, the horizontal movement mechanism 74 of the first holding mechanism 3 is arranged between the transmission shaft 71 (specifically, the lifting movement mechanism 73) and the first holding mechanism 3, and has: The Y direction guide rail 74a is arranged along the Y direction; the elastic body 74b imparts force to one side of the first holding mechanism 3 toward the Y direction guide rail 74a; and the cam mechanism 74c makes the first holding mechanism 3 move toward the Y direction guide rail 74a. Move to the other side. Here, the cam mechanism 74c uses an eccentric cam, and by rotating the eccentric cam with an actuator such as a motor, the amount of movement of the first holding mechanism 3 in the Y direction can be adjusted.

再者,如圖8所示,第二保持機構6的水平移動機構74的結構與第一保持機構3的升降移動機構73同樣。另外,可設為於第二保持機構6不設置水平移動機構74的結構,亦可設為於第一保持機構3及第二保持機構6兩者不設置水平移動機構74的結構。進而,水平移動機構74與升降移動機構73同樣地,亦可不使用凸輪機構74c而使用例如滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。Furthermore, as shown in FIG. 8 , the structure of the horizontal movement mechanism 74 of the second holding mechanism 6 is the same as that of the vertical movement mechanism 73 of the first holding mechanism 3 . Moreover, the structure which does not provide the horizontal movement mechanism 74 to the 2nd holding mechanism 6 may be sufficient, and the structure which does not provide the horizontal movement mechanism 74 to both the 1st holding mechanism 3 and the 2nd holding mechanism 6 may be sufficient. Furthermore, similarly to the vertical movement mechanism 73, the horizontal movement mechanism 74 may use, for example, a ball screw mechanism instead of the cam mechanism 74c, may use an air cylinder, or may use a linear motor.

<切斷用移動機構8(加工用移動機構)> 切斷用移動機構8使兩個心軸部42A、42B的各者於X方向、Y方向及Z方向上分別獨立地直線移動。 <Moving mechanism 8 for cutting (moving mechanism for processing)> The moving mechanism 8 for cutting linearly moves each of the two spindle parts 42A, 42B independently in the X direction, the Y direction, and the Z direction.

具體而言,如圖2、圖3及圖9所示,切斷用移動機構8包括:X方向移動部81,使心軸部42A、心軸部42B於X方向上直線移動;Y方向移動部82,使心軸部42A、心軸部42B於Y方向上直線移動;以及Z方向移動部83,使心軸部42A、心軸部42B於Z方向上直線移動。Specifically, as shown in Fig. 2, Fig. 3 and Fig. 9, the moving mechanism 8 for cutting includes: an X direction moving part 81, which moves the mandrel part 42A and the mandrel part 42B linearly in the X direction; The part 82 linearly moves the spindle part 42A and the spindle part 42B in the Y direction; and the Z direction moving part 83 linearly moves the spindle part 42A and the spindle part 42B in the Z direction.

X方向移動部81為兩個切斷用台2A、2B所共用,尤其如圖2及圖3所示,具有:一對X方向導軌811,沿著X方向隔著兩個切斷用台2A、2B而設置;以及支撐體812,沿著該一對X方向導軌811移動並且經由Y方向移動部82及Z方向移動部83支撐心軸部42A、心軸部42B。一對X方向導軌811設置於沿著X方向設置的兩個切斷用台2A、2B的側方。另外,支撐體812例如為門型,具有沿Y方向延伸的形狀。具體而言,支撐體812具有自一對X方向導軌811向上方延伸的一對腳部、以及架設於該一對腳部的樑部(橫樑部),該樑部沿Y方向延伸。The X-direction moving part 81 is shared by the two cutting platforms 2A and 2B, especially as shown in FIGS. , 2B are provided; and the support body 812 moves along the pair of X-direction guide rails 811 and supports the mandrel part 42A and the mandrel part 42B via the Y-direction moving part 82 and the Z-direction moving part 83 . A pair of X direction guide rail 811 is provided in the side of two cutting tables 2A, 2B provided along the X direction. In addition, the support body 812 is, for example, a gate shape and has a shape extending in the Y direction. Specifically, the support body 812 has a pair of leg portions extending upward from the pair of X-direction rails 811 , and a beam portion (beam portion) spanning the pair of leg portions, and the beam portion extends in the Y direction.

而且,支撐體812例如藉由沿X方向延伸的滾珠螺桿機構813而於一對X方向導軌811上沿著X方向直線性地往返移動。所述滾珠螺桿機構813由伺服馬達等驅動源(未圖示)驅動。除此以外,支撐體812亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。Moreover, the support body 812 linearly reciprocates along the X direction on a pair of X direction guide rails 811 by the ball screw mechanism 813 extended along the X direction, for example. The ball screw mechanism 813 is driven by a drive source (not shown) such as a servo motor. In addition, the supporting body 812 can also be configured to move back and forth by other linear motion mechanisms such as linear motors.

尤其如圖3所示,Y方向移動部82具有:Y方向導軌821,於支撐體812中沿著Y方向設置;以及Y方向滑塊822,沿著該Y方向導軌821移動。Y方向滑塊822例如由線性馬達823驅動,於Y方向導軌821上直線性地往返移動。於本實施形態中,與兩個心軸部42A、42B對應地設置有兩個Y方向滑塊822。藉此,兩個心軸部42A、42B能夠相互獨立地於Y方向上移動。除此以外,Y方向滑塊822亦可以藉由使用滾珠螺桿機構的其他直動機構而往返移動的方式構成。Especially as shown in FIG. 3 , the Y-direction moving part 82 has: a Y-direction rail 821 disposed in the support body 812 along the Y-direction; and a Y-direction slider 822 that moves along the Y-direction rail 821 . The Y-direction slider 822 is driven by, for example, a linear motor 823 and linearly moves back and forth on the Y-direction guide rail 821 . In this embodiment, two Y direction sliders 822 are provided corresponding to the two spindle parts 42A and 42B. Thereby, the two spindle parts 42A, 42B can move in the Y direction independently of each other. In addition, the Y-direction slider 822 may also be configured to move back and forth by using other linear motion mechanisms such as ball screw mechanisms.

如圖2~圖4所示,Z方向移動部83具有:Z方向導軌831,於各Y方向滑塊822中沿著Z方向設置;以及Z方向滑塊832,沿著所述Z方向導軌831移動並且支撐心軸部42A、心軸部42B。即,Z方向移動部83與各心軸部42A、42B對應地設置。Z方向滑塊832例如由偏心凸輪機構(未圖示)驅動,於Z方向導軌831上直線性地往返移動。除此以外,Z方向滑塊832亦可以藉由滾珠螺桿機構等其他直動機構而往返移動的方式構成。As shown in FIGS. 2 to 4 , the Z direction moving part 83 has: a Z direction guide rail 831 arranged along the Z direction in each Y direction slider 822 ; and a Z direction slider 832 arranged along the Z direction guide rail 831 The mandrel part 42A, the mandrel part 42B are moved and supported. That is, the Z direction moving part 83 is provided corresponding to each spindle part 42A, 42B. The Z-direction slider 832 is driven by, for example, an eccentric cam mechanism (not shown), and linearly moves back and forth on the Z-direction guide rail 831 . In addition, the Z-direction slider 832 may also be configured to move back and forth by other linear motion mechanisms such as a ball screw mechanism.

關於所述切斷用移動機構8與傳遞軸71的位置關係,如圖1及圖4所示,以傳遞軸71於切斷用移動機構8的上方橫穿切斷用移動機構8的方式配置。具體而言,傳遞軸71以於支撐體812的上方橫穿該支撐體812的方式配置,傳遞軸71及支撐體812成為相互交叉的位置關係。Regarding the positional relationship between the moving mechanism 8 for cutting and the transmission shaft 71, as shown in FIG. 1 and FIG. . Specifically, the transmission shaft 71 is disposed above the support body 812 so as to cross the support body 812 , and the transmission shaft 71 and the support body 812 are in a positional relationship that intersects each other.

<加工屑收容部17> 另外,如圖1所示,本實施形態的切斷裝置100更包括加工屑收容部17,所述加工屑收容部17收容因密封完畢基板W的切斷而產生的端材等加工屑S。 <Swarf container 17> In addition, as shown in FIG. 1 , the cutting device 100 of the present embodiment further includes a chip storage unit 17 for storing chips S such as end materials generated by cutting the sealed substrate W.

如圖2~圖4所示,所述加工屑收容部17設置於切斷用台2A、切斷用台2B的下方,具有:導引滑槽171,具有於俯視時包圍切斷用台2A、切斷用台2B的上部開口171X;以及回收容器172,將由該導引滑槽171所導引的加工屑S回收。藉由將加工屑收容部17設置於切斷用台2A、切斷用台2B的下方,可提高加工屑S的回收率。As shown in FIGS. 2 to 4 , the chip storage unit 17 is provided below the cutting table 2A and the cutting table 2B, and has a guide chute 171 that surrounds the cutting table 2A when viewed from above. , the upper opening 171X of the table 2B for cutting; and the recovery container 172 for recovering the machining chips S guided by the guide chute 171 . The recovery rate of the machining waste S can be improved by providing the machining waste storage unit 17 below the cutting table 2A and the cutting table 2B.

導引滑槽171將自切斷用台2A、切斷用台2B飛散或掉落的加工屑S引導至回收容器172。本實施形態中,以導引滑槽171的上部開口171X包圍切斷用台2A、切斷用台2B的方式構成(參照圖3),因此不易漏掉加工屑S,可進一步提高加工屑S的回收率。另外,導引滑槽171以包圍設置於切斷用台2A、切斷用台2B之下的旋轉機構9A、旋轉機構9B的方式設置(參照圖4),以保護旋轉機構9A、旋轉機構9B免受加工屑S及切削水的影響的方式構成。The guide chute 171 guides the machining chips S scattered or dropped from the cutting table 2A and the cutting table 2B to the recovery container 172 . In this embodiment, the upper opening 171X of the guide chute 171 surrounds the table 2A for cutting and the table 2B for cutting (see FIG. 3 ), so it is difficult to miss the machining chips S, and the machining waste S can be further increased. recovery rate. In addition, the guide chute 171 is provided so as to surround the rotation mechanism 9A and the rotation mechanism 9B provided under the table 2A for cutting and the table 2B for cutting (see FIG. 4 ), so as to protect the rotation mechanism 9A and the rotation mechanism 9B. Constructed to avoid the influence of machining chips S and cutting water.

於本實施形態中,加工屑收容部17為兩個切斷用台2A、2B所共用,但亦可與切斷用台2A、切斷用台2B分別對應地設置。In the present embodiment, the chip storage unit 17 is shared by the two cutting tables 2A and 2B, but may be provided correspondingly to the cutting table 2A and the cutting table 2B, respectively.

回收容器172將因自重而通過導引滑槽171的加工屑S回收,於本實施形態中,如圖4等所示,與兩個切斷用台2A、2B分別對應地設置。而且,兩個回收容器172配置於傳遞軸的近前側,且以可分別獨立地自切斷裝置100的近前側卸除的方式構成。藉由所述結構,可提高加工屑S的廢棄等的維護性。再者,回收容器172可想到密封完畢基板W的尺寸或加工屑S的尺寸及量、作業性等而於所有切斷用台的下方整體設置一個,亦可分割成三個以上來設置。The recovery container 172 recovers the machining chips S passing through the guide chute 171 by its own weight, and in this embodiment, as shown in FIG. Furthermore, the two recovery containers 172 are disposed on the near side of the transmission shaft, and are configured to be independently detachable from the near side of the cutting device 100 . With such a configuration, maintainability such as disposal of machining waste S can be improved. In addition, one collection container 172 may be provided as a whole under all the cutting tables in consideration of the size of the sealed substrate W, the size and amount of the processing waste S, and workability, or may be divided into three or more and provided.

另外,如圖4等所示,加工屑收容部17具有將切削水與加工屑S分離的分離部173。作為所述分離部173的結構,例如可想到於回收容器172的底面設置使切削水通過的多孔板等過濾器。藉由所述分離部173,可不於在回收容器172蓄積切削水的情況下將加工屑S回收。In addition, as shown in FIG. 4 and the like, the chip storage unit 17 has a separating portion 173 for separating cutting water and chips S. As shown in FIG. As a structure of the separation unit 173 , for example, a filter such as a perforated plate through which the cutting water passes is provided on the bottom surface of the recovery container 172 . By the separation unit 173, the machining chips S can be recovered without accumulating cutting water in the recovery container 172.

<第一清潔機構18> 另外,如圖1及圖5所示,本發明的切斷裝置100更包括第一清潔機構18,所述第一清潔機構18對保持於切斷用台2A、切斷用台2B的多個製品P的上表面側(引線面)進行清潔。所述第一清潔機構18藉由對保持於切斷用台2A、切斷用台2B的多個製品P的上表面噴射洗淨液及/或壓縮空氣的噴射噴嘴18a(參照圖5),來對製品P的上表面側進行清潔。 First Cleaning Mechanism 18> In addition, as shown in FIG. 1 and FIG. 5, the cutting device 100 of the present invention further includes a first cleaning mechanism 18. The upper surface side (lead surface) of the product P is cleaned. The first cleaning mechanism 18 uses spray nozzles 18a (see FIG. 5 ) that spray cleaning liquid and/or compressed air to the upper surfaces of the plurality of products P held on the cutting table 2A and the cutting table 2B, to clean the upper surface side of the product P.

如圖5所示,所述第一清潔機構18構成為能夠與第一保持機構3一起沿著傳遞軸71移動。此處,第一清潔機構18設置於滑動構件723,所述滑動構件723在設置於傳遞軸71的導軌721上滑動。此處,於第一清潔機構18及滑動構件723之間,設置有用以使第一清潔機構18於Z方向上升降移動的升降移動機構181。關於所述升降移動機構181,例如可考慮使用齒條與小齒輪機構,使用滾珠螺桿機構,或使用氣缸等。As shown in FIG. 5 , the first cleaning mechanism 18 is configured to be movable along the transmission shaft 71 together with the first holding mechanism 3 . Here, the first cleaning mechanism 18 is provided on a sliding member 723 that slides on a guide rail 721 provided on the transmission shaft 71 . Here, between the first cleaning mechanism 18 and the slide member 723 , there is provided a lifting movement mechanism 181 for moving the first cleaning mechanism 18 up and down in the Z direction. As for the lifting mechanism 181, for example, a rack and pinion mechanism, a ball screw mechanism, or an air cylinder may be used.

<第二清潔機構19> 進而,如圖1所示,本發明的切斷裝置100更包括第二清潔機構19,所述第二清潔機構19對保持於第二保持機構6的多個製品P的下表面側(封裝面)進行清潔。所述第二清潔機構19設置於切斷用台2B與收容箱5(更具體而言為後述的乾燥台13)之間,藉由向保持於第二保持機構6的多個製品P的下表面噴射洗淨液及/或壓縮空氣,而對製品P的下表面側進行清潔。即,於第二保持機構6沿著傳遞軸71移動的中途,第二清潔機構19對製品P的下表面側進行清潔。 Second Cleaning Mechanism 19> Furthermore, as shown in FIG. 1 , the cutting device 100 of the present invention further includes a second cleaning mechanism 19 for cleaning the lower surface side (packaging surface) of the plurality of products P held by the second holding mechanism 6. ) to clean. The second cleaning mechanism 19 is provided between the table 2B for cutting and the storage box 5 (more specifically, the drying table 13 described later), and cleans the products P held by the second holding mechanism 6 below the plurality of products P. The cleaning solution and/or compressed air are sprayed on the surface to clean the lower surface side of the product P. That is, the second cleaning mechanism 19 cleans the lower surface side of the product P while the second holding mechanism 6 is moving along the transmission shaft 71 .

<切斷裝置100的乾燥功能> 本實施形態的切斷裝置100具有進一步將由第二清潔機構19清潔的多個製品P乾燥的功能。具體而言,如圖1、圖9及圖10所示,切斷裝置100包括:乾燥台13,用以將多個製品P乾燥;乾燥機構14,將載置於乾燥台13的多個製品P乾燥;以及乾燥用移動機構15,使該乾燥機構14沿著乾燥台13移動。 <Drying function of cutting device 100> The cutting device 100 of the present embodiment has a function of further drying the plurality of products P cleaned by the second cleaning mechanism 19 . Specifically, as shown in FIG. 1, FIG. 9 and FIG. 10, the cutting device 100 includes: a drying table 13 for drying a plurality of products P; a drying mechanism 14 for drying a plurality of products P placed on the drying table 13; P drying; and a moving mechanism 15 for drying, which moves the drying mechanism 14 along the drying table 13 .

乾燥台13藉由第二保持機構6及搬送用移動機構7搬送並載置多個製品P。該乾燥台13吸附並保持多個製品P。另外,乾燥台13與兩個切斷用台2A、2B於水平面上沿著X方向配置成一行。本實施形態的乾燥台13於俯視時呈矩形形狀,但亦可為其他形狀。The drying table 13 conveys and mounts several products P by the 2nd holding mechanism 6 and the moving mechanism 7 for conveyance. The drying table 13 absorbs and holds a plurality of products P. In addition, the drying table 13 and the two tables 2A and 2B for cutting are arranged in a row along the X direction on the horizontal plane. The drying table 13 of the present embodiment has a rectangular shape in plan view, but may have other shapes.

乾燥機構14自乾燥台13的上方噴射作為氣體的壓縮空氣,而將吸附保持於乾燥台13的多個製品P乾燥。該乾燥機構14具有向保持於乾燥台13的多個製品P噴射壓縮空氣的噴射噴嘴14a。本實施形態的噴射噴嘴14a具有朝向乾燥台13設置的、呈直線狀延伸的狹縫狀的開口(參照圖9),但亦可具有沿著X方向間歇地設置的多個開口。The drying mechanism 14 sprays compressed air as a gas from above the drying table 13 to dry the plurality of products P adsorbed and held on the drying table 13 . This drying mechanism 14 has spray nozzles 14 a that spray compressed air to a plurality of products P held by the drying table 13 . The spray nozzle 14 a of the present embodiment has a slit-like opening (see FIG. 9 ) extending linearly provided toward the drying table 13 , but may have a plurality of openings intermittently provided along the X direction.

本實施形態的乾燥機構14以朝向利用乾燥用移動機構15的移動方向噴射壓縮空氣的方式構成(參照圖9)。即,以利用噴射噴嘴14a噴射壓縮空氣的噴射方向朝向利用乾燥用移動機構15的移動方向(此處,為於Y方向上自近前側向裏側)的方式構成。The drying mechanism 14 of the present embodiment is configured to spray compressed air toward the moving direction of the drying moving mechanism 15 (see FIG. 9 ). That is, it is configured such that the spraying direction of the compressed air sprayed from the spraying nozzle 14a is directed toward the moving direction (here, from the front side to the rear side in the Y direction) by the drying moving mechanism 15 .

另外,如圖9所示,乾燥機構14的噴射噴嘴14a相對於保持於乾燥台13上的多個製品P的沿著X方向的排列方向例如以小於30度傾斜地配置。此處,於乾燥台13,多個製品P於X方向及Y方向上呈矩陣狀配置,乾燥機構14的噴射噴嘴14a相對於各製品P的沿著X方向的一邊傾斜地噴射壓縮空氣。藉此,容易將蓄積於鄰接的製品P之間的水分自製品P吹走。藉此,促進多個製品P的乾燥。另外,亦可將乾燥機構14的噴射噴嘴14a的狹縫狀的開口以朝向乾燥台13稍微傾斜的方式設置,使得壓縮空氣朝向乾燥機構14的移動方向被吹走。In addition, as shown in FIG. 9 , the spray nozzles 14 a of the drying mechanism 14 are arranged inclined at, for example, less than 30 degrees with respect to the arrangement direction along the X direction of the plurality of products P held on the drying table 13 . Here, in the drying table 13, a plurality of products P are arranged in a matrix in the X direction and the Y direction, and the spray nozzle 14a of the drying mechanism 14 sprays compressed air obliquely with respect to one side of each product P along the X direction. Thereby, the moisture accumulated between the adjacent products P can be easily blown away from the products P. As shown in FIG. Thereby, drying of a plurality of products P is accelerated. In addition, the slit-shaped opening of the spray nozzle 14 a of the drying mechanism 14 may be installed so as to be slightly inclined toward the drying table 13 so that the compressed air is blown away toward the moving direction of the drying mechanism 14 .

乾燥用移動機構15使乾燥機構14於乾燥台13的上方於Y方向上移動。本實施形態的乾燥用移動機構15使乾燥機構14相對於乾燥台13於Y方向上往返移動。具體而言,如圖9及圖10所示,乾燥用移動機構15包括:Y方向導軌151,沿Y方向延伸;滑動構件152,沿著該Y方向導軌151移動並且保持乾燥機構14;以及驅動部(未圖示),使該滑動構件152沿著Y方向導軌151移動。再者,作為驅動部,例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。The drying moving mechanism 15 moves the drying mechanism 14 in the Y direction above the drying table 13 . The moving mechanism 15 for drying of this embodiment moves the drying mechanism 14 back and forth in the Y direction with respect to the drying table 13 . Specifically, as shown in Figures 9 and 10, the drying moving mechanism 15 includes: a Y direction guide rail 151 extending along the Y direction; a sliding member 152 moving along the Y direction guide rail 151 and maintaining the drying mechanism 14; part (not shown) to move the slide member 152 along the Y-direction guide rail 151 . In addition, as a drive part, for example, a ball screw mechanism may be used, an air cylinder may be used, and a linear motor may be used.

<乾燥動作的一例> 接著,對利用乾燥機構14及乾燥用移動機構15的乾燥動作進行說明。 <Example of drying operation> Next, the drying operation by the drying mechanism 14 and the drying moving mechanism 15 will be described.

於將多個製品P載置於乾燥台13之前,乾燥用移動機構15使乾燥機構14退避至乾燥台13的Y方向其中一側(例如近前側),以不妨礙多個製品P的載置。然後,當將多個製品P載置並保持於乾燥台13時,乾燥機構14開始噴射壓縮空氣,並且乾燥用移動機構15使乾燥機構14向Y方向另一側(例如裏側)移動。藉此,進行保持於乾燥台13的多個製品P的乾燥。再者,於乾燥用移動機構15使乾燥機構14自Y方向另一側(裏側)向Y方向其中一側(近前側)移動時,乾燥機構14停止氣體的噴射。再者,乾燥機構14亦可設為不僅於往路中而且亦於返路中噴射壓縮空氣的結構。Before placing a plurality of products P on the drying table 13, the moving mechanism 15 for drying retracts the drying mechanism 14 to one side (for example, the front side) of the drying table 13 in the Y direction so as not to hinder the loading of the plurality of products P. . Then, when a plurality of products P are placed and held on the drying table 13 , the drying mechanism 14 starts spraying compressed air, and the drying moving mechanism 15 moves the drying mechanism 14 to the other side (for example, the rear side) in the Y direction. Thereby, a plurality of products P held by the drying table 13 are dried. Furthermore, when the drying moving mechanism 15 moves the drying mechanism 14 from the other side (back side) in the Y direction to one side (the front side) in the Y direction, the drying mechanism 14 stops spraying the gas. Furthermore, the drying mechanism 14 may also be configured to inject compressed air not only in the forward path but also in the return path.

<收容箱5及刮落構件16> 如圖1、圖9及圖10所示,收容箱5以零散的狀態收容(所謂散裝收容)多個製品P。另外,收容箱5與兩個切斷用台2A、2B於水平面上沿著X方向配置成一行。該收容箱5更包括自第二保持機構6刮落多個製品P的刮落構件16。 <Storage box 5 and scraping member 16> As shown in FIGS. 1 , 9 , and 10 , the storage box 5 stores a plurality of products P in a scattered state (so-called bulk storage). In addition, the storage box 5 and the two cutting tables 2A and 2B are arranged in a row along the X direction on the horizontal plane. The storage box 5 further includes a scraping member 16 for scraping off a plurality of products P from the second holding mechanism 6 .

收容箱5具有於俯視時為矩形形狀的上部開口5X(參照圖9)。而且,刮落構件16固定於收容箱5的上部開口5X的一邊。藉由使第二保持機構6相對於該刮落構件16於X方向上移動,製品P被刮落而落下並被收容於收容箱5中。The storage box 5 has an upper opening 5X having a rectangular shape in plan view (see FIG. 9 ). Furthermore, the scraping member 16 is fixed to one side of the upper opening 5X of the storage box 5 . By moving the second holding mechanism 6 in the X direction relative to the scraping member 16 , the product P is scraped off and dropped, and stored in the storage box 5 .

另外,本實施形態的收容箱5於X方向上設置於乾燥台13與收容保持用板(未圖示)的板收容部20之間,刮落構件16於收容箱5的上部開口5X中設置於乾燥台13側的一邊。藉此,設為於刮落製品P時,第二保持機構6不與板收容部20干擾的結構。In addition, the storage box 5 of the present embodiment is installed between the drying table 13 and the plate storage portion 20 for storing the holding plate (not shown) in the X direction, and the scraping member 16 is installed in the upper opening 5X of the storage box 5 On one side of the drying table 13 sides. Thereby, when the product P is scraped off, the second holding mechanism 6 is configured so as not to interfere with the plate housing portion 20 .

再者,收容於板收容部20的保持用板用以保持密封完畢基板W或製品P,例如存在用以將密封完畢基板W切斷的切斷用台2A、切斷用台2B的保持用板、用以將製品P乾燥的乾燥台13的保持用板、及為了搬送製品P而保持所述製品P的第二保持機構6的保持用板。Furthermore, the holding plate accommodated in the plate accommodating portion 20 is used to hold the sealed substrate W or the product P, for example, there are a cutting table 2A for cutting the sealed substrate W, and a holding table 2B for cutting the sealed substrate W. plate, a holding plate of the drying table 13 for drying the product P, and a holding plate of the second holding mechanism 6 for holding the product P in order to transfer the product P.

刮落構件16自上部開口5X中的乾燥台13側的一邊向上方延伸設置(參照圖9)。另外,作為刮落構件16,只要刮落不離開經吸附解除的第二保持機構6的製品P即可,例如為聚醚醚酮(poly ether ether ketone,PEEK)材料等樹脂製,其形態可為刷形狀,亦可為平板形狀。The scraping member 16 extends upward from one side of the upper opening 5X on the drying table 13 side (see FIG. 9 ). In addition, as the scraping member 16, as long as it scrapes off the product P that does not leave the second holding mechanism 6 that has been released by adsorption, for example, it is made of resin such as poly ether ether ketone (poly ether ether ketone, PEEK) material, and its form can be It may be in the shape of a brush, or may be in the shape of a flat plate.

於本實施形態中,收容箱5配置於傳遞軸71的近前側,於收容箱5的近前側的外表面設置有把手51(參照圖9),且以可自切斷裝置100的近前側卸除的方式構成。藉由該結構,可提高製品P的取出、回收等的維護性。再者,收容箱5的取出方向不限於近前側,例如,可設為自切斷裝置100的橫側取出的結構,亦可設為自裏側取出的結構。In this embodiment, the storage box 5 is disposed on the near side of the transmission shaft 71, and a handle 51 (referring to FIG. The method of division constitutes. With this configuration, maintainability such as taking out and collecting the product P can be improved. Furthermore, the take-out direction of the storage box 5 is not limited to the front side, for example, it may be taken out from the lateral side of the cutting device 100, or may be taken out from the back side.

<切斷裝置100的動作的一例> 接著,對切斷裝置100的動作的一例進行說明。於圖11中示出切斷裝置100的動作中的第一保持機構3的移動路徑、及第二保持機構6的移動路徑。再者,於本實施形態中,切斷裝置100的動作、例如密封完畢基板W的搬送、密封完畢基板W的切斷、製品P的乾燥、製品P的刮落動作等所有動作或控制由控制部CTL(參照圖1)進行。 <An example of the operation of the cutting device 100> Next, an example of the operation of the cutting device 100 will be described. FIG. 11 shows the movement path of the first holding mechanism 3 and the movement path of the second holding mechanism 6 during the operation of the cutting device 100 . Furthermore, in the present embodiment, the operation of the cutting device 100, for example, the conveyance of the sealed substrate W, the cutting of the sealed substrate W, the drying of the product P, and the scraping operation of the product P are performed or controlled by the controller. Partial CTL (refer to Figure 1) was performed.

基板供給機構11的基板供給部112使收容於基板收容部111的密封完畢基板W朝向由第一保持機構3保持的保持位置RP移動。The substrate supply unit 112 of the substrate supply mechanism 11 moves the sealed substrate W stored in the substrate storage unit 111 toward the holding position RP held by the first holding mechanism 3 .

接著,搬送用移動機構7使第一保持機構3移動至保持位置RP,第一保持機構3吸附保持密封完畢基板W。其後,搬送用移動機構7使保持有密封完畢基板W的第一保持機構3移動至切斷用台2A、切斷用台2B,第一保持機構3解除吸附保持,將密封完畢基板W載置於切斷用台2A、切斷用台2B。此時,藉由主移動機構72來調整密封完畢基板W的X方向的位置,藉由水平移動機構74來調整密封完畢基板W的Y方向的位置。而且,切斷用台2A、切斷用台2B吸附保持密封完畢基板W。Next, the transport moving mechanism 7 moves the first holding mechanism 3 to the holding position RP, and the first holding mechanism 3 absorbs and holds the sealed substrate W. Thereafter, the conveyance moving mechanism 7 moves the first holding mechanism 3 holding the sealed substrate W to the cutting table 2A and the cutting table 2B, and the first holding mechanism 3 releases the adsorption and holding, and the sealed substrate W is placed on the substrate W. Placed on table 2A for cutting and table 2B for cutting. At this time, the position of the sealed substrate W in the X direction is adjusted by the main moving mechanism 72 , and the position of the sealed substrate W in the Y direction is adjusted by the horizontal movement mechanism 74 . Then, the cutting table 2A and the cutting table 2B suck and hold the sealed substrate W.

此處,在使保持有密封完畢基板W的第一保持機構3移動至切斷用台2B的情況下,升降移動機構73使第一保持機構3上升至不與切斷用移動機構8(支撐體812)發生物理干擾的位置為止。再者,於使保持有密封完畢基板W的第一保持機構3移動至切斷用台2B時,在使支撐體812自切斷用台2B向乾燥台13側退避的情況下,無需如所述般使第一保持機構3升降。Here, when the first holding mechanism 3 holding the sealed substrate W is moved to the table 2B for cutting, the elevating movement mechanism 73 raises the first holding mechanism 3 so that it does not contact the moving mechanism 8 for cutting (supported). body 812) until the location where physical interference occurs. Furthermore, when the first holding mechanism 3 holding the sealed substrate W is moved to the table 2B for cutting, when the support body 812 is retracted from the table 2B for cutting to the side of the drying table 13, it is not necessary to do so. As described above, the first holding mechanism 3 is raised and lowered.

於此狀態下,切斷用移動機構8使兩個心軸部42A、42B於X方向及Y方向上依次移動,並且藉由切斷用台2A、2B旋轉,將密封完畢基板W切斷為格子狀而單片化。In this state, the cutting moving mechanism 8 sequentially moves the two mandrel parts 42A, 42B in the X direction and the Y direction, and the sealed substrate W is cut by the rotation of the cutting tables 2A, 2B. Grid-like and monolithic.

於切斷後,搬送用移動機構7使第一清潔機構18移動,對保持於切斷用台2A、切斷用台2B的多個製品P的上表面側(引線面)進行清潔。所述清潔之後,搬送用移動機構7使第一保持機構3及第一清潔機構18退避至規定位置。After cutting, the conveyance moving mechanism 7 moves the first cleaning mechanism 18 to clean the upper surface side (lead surface) of the plurality of products P held on the cutting table 2A and the cutting table 2B. After the cleaning, the transport moving mechanism 7 retracts the first holding mechanism 3 and the first cleaning mechanism 18 to predetermined positions.

接著,搬送用移動機構7使第二保持機構6移動至切斷後的切斷用台2A、切斷用台2B,第二保持機構6吸附保持多個製品P。其後,搬送用移動機構7使保持有多個製品P的第二保持機構6移動至第二清潔機構19。藉此,第二清潔機構19對保持於第二保持機構6的多個製品P的下表面側(封裝面)進行清潔。Next, the conveyance moving mechanism 7 moves the second holding mechanism 6 to the cutting table 2A and the cutting table 2B after cutting, and the second holding mechanism 6 adsorbs and holds a plurality of products P. Thereafter, the conveyance moving mechanism 7 moves the second holding mechanism 6 holding a plurality of products P to the second cleaning mechanism 19 . Thereby, the second cleaning mechanism 19 cleans the lower surface side (sealing surface) of the plurality of products P held by the second holding mechanism 6 .

於清潔後,搬送用移動機構7使第二保持機構6移動至乾燥台13,第二保持機構6解除吸附保持,將多個製品P載置於乾燥台13。然後,乾燥台13吸附保持密封完畢基板W。此時,搬送用移動機構7使第二保持機構6退避至不妨礙乾燥機構14的移動的位置。After cleaning, the conveyance moving mechanism 7 moves the second holding mechanism 6 to the drying table 13 , and the second holding mechanism 6 releases the adsorption and holding, and places a plurality of products P on the drying table 13 . Then, the drying table 13 adsorbs and holds the sealed substrate W. At this time, the transport moving mechanism 7 retreats the second holding mechanism 6 to a position where the movement of the drying mechanism 14 is not hindered.

在該狀態下,乾燥用移動機構15使乾燥機構14於Y方向上往返移動,並且乾燥機構14噴射壓縮空氣,藉此進行多個製品P的乾燥。再者,利用乾燥用移動機構15進行的乾燥機構14的往返次數能夠適當設定,可為一次,亦可為多次。In this state, the drying mechanism 15 reciprocates the drying mechanism 14 in the Y direction, and the drying mechanism 14 sprays compressed air to dry a plurality of products P. FIG. In addition, the number of times of reciprocation of the drying mechanism 14 by the moving mechanism 15 for drying can be set suitably, and may be one time or multiple times.

於乾燥後,搬送用移動機構7使第二保持機構6移動至乾燥台13,第二保持機構6自乾燥台13吸附保持多個製品P。其後,搬送用移動機構7使保持有多個製品P的第二保持機構6移動至收容箱5。After drying, the transport moving mechanism 7 moves the second holding mechanism 6 to the drying table 13 , and the second holding mechanism 6 absorbs and holds a plurality of products P from the drying table 13 . Thereafter, the moving mechanism 7 for conveyance moves the second holding mechanism 6 holding a plurality of products P to the storage box 5 .

然後,第二保持機構6於收容箱5的上部開口5X的上方解除多個製品P的吸附保持。其後,搬送用移動機構7使第二保持機構6相對於刮落構件16向乾燥台13側移動,以使未自第二保持機構6落下而殘存於第二保持機構6的製品P碰觸刮落構件16。於本實施形態中,為了可靠地刮落製品P,以使刮落構件16與第二保持機構6的吸附面即下表面接觸的方式使第二保持機構6相對於刮落構件16移動。藉此,多個製品P落下並被收容於收容箱5中。Then, the second holding mechanism 6 releases the adsorption and holding of the plurality of products P above the upper opening 5X of the storage box 5 . Thereafter, the conveying moving mechanism 7 moves the second holding mechanism 6 toward the drying table 13 side with respect to the scraping member 16, so that the product P remaining in the second holding mechanism 6 without falling from the second holding mechanism 6 touches it. Scraping member 16 . In this embodiment, in order to scrape off the product P reliably, the second holding mechanism 6 is moved relative to the scraping member 16 so that the scraping member 16 contacts the lower surface which is the adsorption surface of the second holding mechanism 6 . Thereby, several products P fall and are accommodated in the storage box 5. As shown in FIG.

<本實施形態的效果> 根據本實施形態的切斷裝置100,設為藉由沿著切斷用台2A、切斷用台2B及收容箱5的排列方向延伸的共用的傳遞軸71來使第一保持機構3及第二保持機構6的結構,藉由切斷用移動機構8使切斷機構4於水平面上於沿著傳遞軸71的X方向及Y方向上分別移動,因此無需使切斷用台2A、切斷用台2B於X方向及Y方向上移動便可將密封完畢基板W單片化。因此,可不藉由滾珠螺桿機構等使切斷用台2A、切斷用台2B移動,而無需用以保護滾珠螺桿機構等的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果,可使切斷裝置100的裝置結構簡化。 <Effects of this embodiment> According to the cutting device 100 of the present embodiment, the first holding mechanism 3 and the second holding mechanism 3 are connected by the common transmission shaft 71 extending along the direction in which the cutting table 2A, the cutting table 2B, and the storage box 5 are arranged. The structure of the holding mechanism 6 is to move the cutting mechanism 4 on the horizontal plane in the X direction and the Y direction along the transmission shaft 71 by the cutting moving mechanism 8, so there is no need to use the cutting table 2A, cutting The sealed substrate W can be separated into pieces by moving the table 2B in the X direction and the Y direction. Therefore, the cutting table 2A and the cutting table 2B can be moved without a ball screw mechanism or the like, and the bellows member for protecting the ball screw mechanism or the like and the cover member for protecting the bellows member are unnecessary. As a result, the device structure of the cutting device 100 can be simplified.

另外,由於成為切斷用台2A、切斷用台2B不於X方向及Y方向上移動的結構,因此可削減切斷用台2A、切斷用台2B的移動空間及其周邊的無用空間,可減少切斷裝置100的佔據面積。In addition, since the cutting table 2A and the cutting table 2B do not move in the X direction and the Y direction, the movement space of the cutting table 2A and the cutting table 2B and the useless space around them can be reduced. , the occupied area of the cutting device 100 can be reduced.

進而,將保持有多個製品P的第二保持機構6搬送至收容箱5,使多個製品P自該第二保持機構6落下並收容於收容箱5中,因此與先前的托盤收容的結構相比,可使收容空間小型化。藉此,亦可減少切斷裝置100的佔據面積。Furthermore, the second holding mechanism 6 holding a plurality of products P is transferred to the storage box 5, and the plurality of products P are dropped from the second holding mechanism 6 to be stored in the storage box 5. Therefore, it is different from the previous tray storage structure. In comparison, the storage space can be miniaturized. Thereby, the occupied area of the cutting device 100 can also be reduced.

<其他變形實施形態> 再者,本發明並不限於所述實施形態。 <Other modified implementation forms> In addition, this invention is not limited to the said embodiment.

例如,於所述實施形態中為具有乾燥台13的結構,但亦可設為不具有乾燥台13的結構。For example, in the above-mentioned embodiment, although it has the structure which has the drying table 13, it may be set as the structure which does not have the drying table 13.

另外,亦可設為以下結構:不具有刮落構件16,於藉由第二保持機構6解除吸附保持之後,自第二保持機構6噴射氣體,藉此使多個製品P落下。In addition, a structure may be adopted in which the scraping member 16 is not provided, and the plurality of products P are dropped by ejecting gas from the second holding mechanism 6 after the second holding mechanism 6 releases the adsorption and holding.

進而,除了為將刮落構件16固定於收容箱5的結構以外,亦可將刮落構件16固定於其他構件,或者亦可設為以下結構:構成為能夠移動刮落構件16,刮落構件16相對於第二保持機構6移動,藉此刮落多個製品P。Furthermore, in addition to the structure in which the scraping member 16 is fixed to the storage box 5, the scraping member 16 may also be fixed to another member, or the following structure may be adopted: the scraping member 16 may be moved, and the scraping member 16 may be moved. 16 moves relative to the second holding mechanism 6, whereby a plurality of articles P is scraped off.

於所述實施形態中,對雙切割台方式且雙心軸結構的切斷裝置進行了說明,但並不限於此,亦可為單切割台方式且單心軸結構的切斷裝置、或單切割台方式且雙心軸結構的切斷裝置等。In the above-described embodiment, a cutting device with a double-table system and a double-spindle structure has been described, but it is not limited to this, and a cutting device with a single-table system and a single-mandrel structure, or a single-stage cutting device may also be used. Cutting table type and double-spindle structure cutting device, etc.

另外,構成傳遞軸71的凸輪齒條要素可將多個連結而構成,因此例如可將切斷裝置(加工裝置)100設為於第二清潔機構19與乾燥台13之間能夠分離及連結(能夠裝卸)的模組結構。在此情況下,例如可於第二清潔機構19側的模組與乾燥台13側的模組之間,追加進行製品P的檢查的模組。再者,除了此處例示的結構以外,亦可將切斷裝置(加工裝置)100設為於某處能夠分離及連結(能夠裝卸)的模組結構,亦可將追加的模組設為檢查以外的各種功能的模組。In addition, since a plurality of cam rack elements constituting the transmission shaft 71 can be connected, for example, the cutting device (processing device) 100 can be separated and connected between the second cleaning mechanism 19 and the drying table 13 ( Can be loaded and unloaded) module structure. In this case, for example, a module for inspecting the product P may be added between the module on the side of the second cleaning mechanism 19 and the module on the side of the drying table 13 . Furthermore, in addition to the structure exemplified here, the cutting device (processing device) 100 may also have a module structure that can be separated and connected (detachable) somewhere, and an additional module may be used as an inspection Modules for various functions other than

除此以外,本發明不限於所述實施形態,當然能夠於不偏離其主旨的範圍進行各種變形。 [產業上的可利用性] In addition, this invention is not limited to the said embodiment, Of course, various deformation|transformation is possible in the range which does not deviate from the summary. [industrial availability]

根據本發明,可簡化裝置結構,減少佔據面積,並且使經單片化的加工對象物的收容空間小型化。According to the present invention, the structure of the device can be simplified, the occupied area can be reduced, and the storage space for singulated objects can be reduced in size.

2A、2B:切斷用台(加工台) 3:第一保持機構 4:切斷機構(加工機構) 5:收容箱 5X、171X:上部開口 6:第二保持機構 7:搬送用移動機構 8:加工用移動機構(切斷用移動機構) 9A、9B:旋轉機構 10A、10B:真空泵 11:基板供給機構 12:液體供給機構 13:乾燥台 14:乾燥機構 14a、18a、121:噴射噴嘴 15:乾燥用移動機構 16:刮落構件 17:加工屑收容部 18:第一清潔機構 19:第二清潔機構 20:板收容部 31、61:吸附頭 40:旋轉工具 41A、41B:刀片 42A、42B:心軸部 51:把手 71:傳遞軸 72:主移動機構 73、181:升降移動機構 73a、831:Z方向導軌 73b:致動器部 74:水平移動機構 74a、151、821:Y方向導軌 74b:彈性體 74c:凸輪機構 81:X方向移動部 82:Y方向移動部 83:Z方向移動部 100:切斷裝置(加工裝置) 111:基板收容部 112:基板供給部 113:加熱部 152:滑動構件 171:導引滑槽 172:回收容器 173:分離部 311、611:吸附部 721:導軌 722:小齒輪機構 722a:凸輪齒條 722b:小齒輪 722b1:滾子本體 722b2:滾子銷 723:滑動構件 811:一對X方向導軌 812:支撐體 813:滾珠螺桿機構 822:Y方向滑塊 823:線性馬達 832:Z方向滑塊 CTL:控制部 P:製品(加工品) RP:保持位置 S:加工屑 W:密封完畢基板(加工對象物) X、Y、Z、θ:方向 2A, 2B: cutting table (processing table) 3: The first holding mechanism 4: Cutting mechanism (processing mechanism) 5: Containment box 5X, 171X: upper opening 6: The second holding mechanism 7: Moving mechanism for conveying 8: Moving mechanism for processing (moving mechanism for cutting) 9A, 9B: rotating mechanism 10A, 10B: vacuum pump 11: Substrate supply mechanism 12: Liquid supply mechanism 13:Drying table 14: Drying mechanism 14a, 18a, 121: spray nozzles 15:Moving mechanism for drying 16: Scraping components 17: Processing swarf storage unit 18: The first cleaning agency 19: The second cleaning mechanism 20: Plate Containment Department 31, 61: adsorption head 40:Rotary Tool 41A, 41B: Blades 42A, 42B: mandrel part 51: handle 71: Transmission shaft 72: Main moving mechanism 73, 181: Lifting and moving mechanism 73a, 831: Z direction guide rail 73b: Actuator part 74: Horizontal movement mechanism 74a, 151, 821: guide rail in Y direction 74b: Elastomer 74c: Cam Mechanism 81: X direction moving part 82:Y direction moving part 83: Z direction moving part 100: Cutting device (processing device) 111: Substrate storage unit 112: Substrate supply department 113: heating part 152: sliding member 171: guide chute 172: Recycling container 173: Separation Department 311, 611: adsorption part 721: guide rail 722: Pinion mechanism 722a: Cam rack 722b: Pinion 722b1: Roller body 722b2: Roller pin 723: sliding components 811: A pair of X direction guide rails 812: support body 813: Ball screw mechanism 822: Y direction slider 823:Linear motor 832:Z direction slider CTL: control department P: Products (processed products) RP: hold position S: processing chips W: Sealed substrate (object to be processed) X, Y, Z, θ: directions

圖1是示意性地表示本發明一實施形態的切斷裝置的結構的圖。 圖2是示意性地表示所述實施形態的切斷用台及其周邊結構的立體圖。 圖3是示意性地表示所述實施形態的切斷用台及其周邊結構的結構的、自Z方向觀察的圖(平面圖)。 圖4是示意性地表示所述實施形態的切斷用台及其周邊結構的結構的、自Y方向觀察的圖(正面圖)。 圖5是示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自Y方向觀察的圖(正面圖)。 圖6是示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自X方向觀察的圖(側面圖)。 圖7是示意性地表示所述實施形態的第二保持機構及搬送用移動機構的結構的、自Y方向觀察的圖(正面圖)。 圖8是示意性地表示所述實施形態的齒條與小齒輪機構的結構的剖面圖。 圖9是示意性地表示所述實施形態的乾燥台及收容箱的周邊結構的、自Z方向觀察的圖(平面圖)。 圖10是示意性地表示所述實施形態的乾燥台及收容箱的周邊結構的、自Y方向觀察的圖(正面圖)。 圖11是表示所述實施形態的切斷裝置的動作的示意圖。 Fig. 1 is a diagram schematically showing the structure of a cutting device according to an embodiment of the present invention. Fig. 2 is a perspective view schematically showing the table for cutting and its peripheral structure according to the embodiment. FIG. 3 is a view (plan view) seen from the Z direction schematically showing the structure of the table for cutting and its peripheral structures according to the embodiment. FIG. 4 is a view (front view) seen from the Y direction, schematically showing the structure of the table for cutting and its peripheral structures according to the embodiment. 5 is a view (front view) seen from the Y direction, schematically showing the configuration of the first holding mechanism and the moving mechanism for conveyance according to the embodiment. 6 is a view (side view) seen from the X direction schematically showing the configuration of the first holding mechanism and the moving mechanism for conveyance according to the embodiment. 7 is a view (front view) seen from the Y direction, schematically showing the configuration of the second holding mechanism and the moving mechanism for conveyance according to the embodiment. Fig. 8 is a cross-sectional view schematically showing the structure of the rack and pinion mechanism according to the embodiment. 9 is a view (plan view) seen from the Z direction, schematically showing the peripheral structures of the drying table and the storage box according to the embodiment. 10 is a view (front view) seen from the Y direction, schematically showing the peripheral structures of the drying table and the storage box according to the embodiment. Fig. 11 is a schematic diagram showing the operation of the cutting device according to the embodiment.

2A、2B:切斷用台(加工台) 2A, 2B: Table for cutting (processing table)

3:第一保持機構 3: The first holding mechanism

4:切斷機構(加工機構) 4: Cutting mechanism (processing mechanism)

5:收容箱 5: Containment box

6:第二保持機構 6: The second holding mechanism

7:搬送用移動機構 7: Moving mechanism for conveying

8:加工用移動機構(切斷用移動機構) 8: Moving mechanism for processing (moving mechanism for cutting)

9A、9B:旋轉機構 9A, 9B: rotating mechanism

10A、10B:真空泵 10A, 10B: vacuum pump

11:基板供給機構 11: Substrate supply mechanism

13:乾燥台 13:Drying table

14:乾燥機構 14: Drying mechanism

15:乾燥用移動機構 15:Moving mechanism for drying

16:刮落構件 16: Scraping components

17:加工屑收容部 17: Processing swarf storage unit

18:第一清潔機構 18: The first cleaning agency

19:第二清潔機構 19: The second cleaning mechanism

20:板收容部 20: Plate Containment Department

40:旋轉工具 40:Rotary tool

41A、41B:刀片 41A, 41B: Blades

42A、42B:心軸部 42A, 42B: mandrel part

71:傳遞軸 71: Transmission shaft

100:切斷裝置(加工裝置) 100: Cutting device (processing device)

111:基板收容部 111: Substrate storage unit

112:基板供給部 112: Substrate supply department

113:加熱部 113: heating part

172:回收容器 172: Recycling container

812:支撐體 812: support body

CTL:控制部 CTL: control department

RP:保持位置 RP: hold position

W:密封完畢基板(加工對象物) W: Sealed substrate (object to be processed)

X、Y、Z、θ:方向 X, Y, Z, θ: direction

Claims (10)

一種加工裝置,包括: 加工台,保持加工對象物; 第一保持機構,為了將所述加工對象物搬送至所述加工台而保持所述加工對象物; 加工機構,將保持於所述加工台的所述加工對象物切斷而單片化; 收容箱,將藉由所述加工機構而單片化的所述加工對象物落下並收容; 第二保持機構,為了將所述經單片化的所述加工對象物自所述加工台搬送至所述收容箱而保持所述經單片化的所述加工對象物; 搬送用移動機構,具有沿著所述加工台及所述收容箱的排列方向延伸且用以使所述第一保持機構及所述第二保持機構移動的共用的傳遞軸;以及 加工用移動機構,使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動。 A processing device comprising: The processing table holds the object to be processed; a first holding mechanism for holding the object to be processed in order to transfer the object to be processed to the processing table; a processing mechanism that cuts and separates the object to be processed held on the processing table; a storage box for dropping and storing the object to be processed which has been separated into pieces by the processing mechanism; a second holding mechanism for holding the singulated object to be processed in order to transfer the singulated object to be processed from the processing table to the storage box; a moving mechanism for conveyance having a common transmission shaft extending along the direction in which the processing table and the storage box are arranged and for moving the first holding mechanism and the second holding mechanism; and The moving mechanism for processing moves the processing mechanism in a first direction along the transmission shaft and in a second direction perpendicular to the first direction on a horizontal plane. 如請求項1所述的加工裝置,其中,所述傳遞軸以於所述加工用移動機構的上方橫穿所述加工用移動機構的方式配置。The processing device according to claim 1, wherein the transmission shaft is disposed above the processing moving mechanism so as to traverse the processing moving mechanism. 如請求項1或請求項2所述的加工裝置,其中,所述第二保持機構吸附保持所述經單片化的所述加工對象物。The processing device according to claim 1 or claim 2, wherein the second holding mechanism absorbs and holds the singulated object to be processed. 如請求項1至請求項3中任一項所述的加工裝置,更包括自所述第二保持機構刮落所述經單片化的所述加工對象物的刮落構件。The processing device according to any one of claims 1 to 3, further comprising a scraper member for scraping off the singulated objects to be processed from the second holding mechanism. 如請求項4所述的加工裝置,其中,所述刮落構件固定於所述收容箱, 藉由所述搬送用移動機構使所述第二保持機構相對於所述刮落構件移動,而將所述經單片化的所述加工對象物自所述第二保持機構刮落。 The processing device according to claim 4, wherein the scraping member is fixed to the storage box, The object to be processed that has been separated into pieces is scraped off from the second holding mechanism by the moving mechanism for conveyance moving the second holding mechanism relative to the scraping member. 如請求項1至請求項5中任一項所述的加工裝置,更包括用以將所述經單片化的所述加工對象物乾燥的乾燥台, 所述搬送用移動機構使所述第二保持機構自所述加工台移動至所述乾燥台,並自所述乾燥台移動至所述收容台。 The processing device according to any one of claim 1 to claim 5, further comprising a drying table for drying the singulated objects to be processed, The transfer moving mechanism moves the second holding mechanism from the processing table to the drying table, and from the drying table to the storage table. 如請求項6所述的加工裝置,更包括: 乾燥機構,自所述乾燥台的上方噴射氣體,而將所述經單片化的所述加工對象物乾燥;以及 乾燥用移動機構,使所述乾燥機構沿著所述乾燥台移動。 The processing device as described in Claim 6, further comprising: a drying mechanism that sprays gas from above the drying table to dry the singulated objects to be processed; and The moving mechanism for drying moves the drying mechanism along the drying table. 如請求項7所述的加工裝置,其中,所述乾燥機構朝向利用所述乾燥用移動機構的移動方向噴射氣體。The processing apparatus according to claim 7, wherein the drying mechanism injects gas in a moving direction of the drying moving mechanism. 如請求項1至請求項8中任一項所述的加工裝置,其中,所述加工用移動機構包括:X方向移動部,使所述加工機構於作為所述第一方向的X方向上直線移動;以及Y方向移動部,使所述加工機構於作為所述第二方向的Y方向上直線移動, 所述X方向移動部具有:一對X方向導軌,隔著所述加工台沿著X方向設置;以及支撐體,沿著所述一對X方向導軌移動並且經由所述Y方向移動部支撐所述加工機構。 The processing device according to any one of claim 1 to claim 8, wherein the moving mechanism for processing includes: an X-direction moving part, which makes the processing mechanism move in a straight line in the X direction as the first direction. moving; and a Y-direction moving part that linearly moves the processing mechanism in the Y direction as the second direction, The X-direction moving part has: a pair of X-direction rails disposed along the X direction across the processing table; and a support body that moves along the pair of X-direction rails and supports the processing mechanism. 一種加工品的製造方法,使用如請求項1至請求項9中任一項所述的加工裝置來製造加工品。A method of manufacturing a processed product, using the processing device according to any one of claim 1 to claim 9 to manufacture a processed product.
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