TW202238795A - Processing apparatus, and manufacturing method of processed product - Google Patents

Processing apparatus, and manufacturing method of processed product Download PDF

Info

Publication number
TW202238795A
TW202238795A TW111110436A TW111110436A TW202238795A TW 202238795 A TW202238795 A TW 202238795A TW 111110436 A TW111110436 A TW 111110436A TW 111110436 A TW111110436 A TW 111110436A TW 202238795 A TW202238795 A TW 202238795A
Authority
TW
Taiwan
Prior art keywords
cutting
processing
holding
mark
processed
Prior art date
Application number
TW111110436A
Other languages
Chinese (zh)
Other versions
TWI810856B (en
Inventor
片岡昌一
深井元樹
堀聡子
坂上雄哉
坂本真二
吉岡翔
Original Assignee
日商Towa股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Towa股份有限公司 filed Critical 日商Towa股份有限公司
Publication of TW202238795A publication Critical patent/TW202238795A/en
Application granted granted Critical
Publication of TWI810856B publication Critical patent/TWI810856B/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q17/00Arrangements for observing, indicating or measuring on machine tools
    • B23Q17/24Arrangements for observing, indicating or measuring on machine tools using optics or electromagnetic waves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/02Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
    • B24B47/04Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by mechanical gearing only
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/22Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Abstract

The invention shortens the time spent in the alignment operation and includes: a cutting table 2A and a cutting table 2B, holding a sealed substrate W provided with an alignment mark AM, and rotatable; a cutting mechanism 4, cutting the sealed substrate W held on the cutting table 2A and the cutting table 2B; a reference mark M1, provided on the cutting table 2A and the cutting table 2B, wherein the relative position thereof relative to a rotating center RC of the cutting table 2A and the cutting table 2B is known; and a camera 24, capturing the reference mark M1 and the alignment mark AM. The alignment mark AM is captured while the camera 24 is moved in one direction with respect to the sealed substrate W, and, based on the captured alignment mark AM and the reference mark M1, the sealed substrate W and the cutting mechanism 4 are aligned in one direction and in a direction orthogonal to the one direction.

Description

加工裝置及加工品的製造方法Processing device and method for manufacturing processed product

本發明是有關於一種加工裝置及加工品的製造方法。The invention relates to a processing device and a method for manufacturing a processed product.

作為先前的切斷裝置,如專利文獻1所示,於切斷矩形形狀的密封完畢基板的情況下,針對每個密封完畢基板,使相機沿著長邊方向移動而進行對準動作(對位動作)之後進行切斷,其後,使密封完畢基板旋轉90度,使相機沿著短邊方向移動而進行對準動作之後進行切斷。As a conventional cutting device, as shown in Patent Document 1, when cutting a rectangular sealed substrate, for each sealed substrate, the camera is moved along the longitudinal direction to perform an alignment operation (positioning operation). operation) and then cutting is performed, and then the sealed substrate is rotated 90 degrees, and the camera is moved in the short side direction to perform an alignment operation and then cutting is performed.

然而,於所述切斷裝置中,於長邊方向及短邊方向此兩個方向分別進行對準動作,因此對準動作花費時間。其結果,切斷裝置的生產性降低。 [現有技術文獻] [專利文獻] However, in the above-mentioned cutting device, the alignment operation is performed in two directions, the longitudinal direction and the short-side direction, and therefore the alignment operation takes time. As a result, the productivity of the cutting device decreases. [Prior art literature] [Patent Document]

[專利文獻1]日本專利特開2015-128122號公報[Patent Document 1] Japanese Patent Laid-Open No. 2015-128122

[發明所欲解決之課題][Problem to be Solved by the Invention]

因此,本發明是為解決所述問題點而成,其主要課題在於縮短對準動作所花費的時間。 [解決課題之手段] Therefore, the present invention is made to solve the above-mentioned problems, and its main subject is to shorten the time required for the alignment operation. [Means to solve the problem]

即,本發明的加工裝置的特徵在於包括:加工工作台,保持設置有對準標記的加工對象物並且能夠旋轉;加工機構,對保持於所述加工工作台的所述加工對象物進行加工;基準標記,設置於所述加工工作台,且與所述加工工作台的旋轉中心的相對位置已知;以及攝像相機,拍攝所述基準標記及所述對準標記,使所述攝像相機相對於所述加工對象物於一方向移動的同時拍攝所述對準標記,基於所拍攝的所述對準標記及所述基準標記,進行於所述一方向及與所述一方向正交的方向的所述加工對象物與所述加工機構的對準。 [發明的效果] That is, the processing device of the present invention is characterized by comprising: a processing table capable of holding and rotating an object to be processed on which an alignment mark is provided; a processing mechanism that processes the object to be processed held on the processing table; A reference mark is arranged on the processing worktable, and its relative position to the rotation center of the processing workbench is known; and a camera is used to photograph the reference mark and the alignment mark, so that the camera is The object to be processed is photographed while the object is moving in one direction, and based on the photographed alignment mark and the reference mark, the alignment in the one direction and a direction perpendicular to the one direction is performed. Alignment of the object to be processed and the processing mechanism. [Effect of the invention]

根據如此構成的本發明,可縮短對準動作所花費的時間。According to the present invention thus constituted, the time required for the alignment operation can be shortened.

繼而,對本發明舉例加以更詳細說明。但是,本發明不受以下說明的限定。Next, examples of the present invention will be described in more detail. However, the present invention is not limited by the following description.

如上所述,本發明的加工裝置的特徵在於包括:加工工作台,保持設置有對準標記的加工對象物並且能夠旋轉;加工機構,對保持於所述加工工作台的所述加工對象物進行加工;基準標記,設置於所述加工工作台,與所述加工工作台的旋轉中心的相對位置已知;以及攝像相機,拍攝所述基準標記及所述對準標記,使所述攝像相機相對於所述加工對象物於一方向移動的同時拍攝所述對準標記,基於所拍攝的所述對準標記及所述基準標記,進行於所述一方向及與所述一方向正交的方向的所述加工對象物與所述加工機構的對準。 所述加工裝置於不使加工對象物旋轉的情況下使攝像相機相對於加工對象物於一方向移動的同時拍攝對準標記,並基於所拍攝的對準標記及基準標記,進行於一方向及與該一方向正交的方向(即,兩個方向)的加工對象物與加工機構的對準。因此,無需於使加工對象物旋轉的前後分別拍攝加工對象物的對準標記的動作。其結果,可減少拍攝對準標記的次數,縮短對準動作所花費的時間。 As described above, the processing apparatus of the present invention is characterized by comprising: a processing table that holds and can rotate the object to be processed on which the alignment mark is provided; Processing; fiducial marks, set on the processing workbench, and the relative position of the rotation center of the processing workbench is known; The alignment mark is photographed while the object to be processed is moving in one direction, and based on the photographed alignment mark and the reference mark, the process is carried out in the one direction and in a direction perpendicular to the one direction. The alignment of the object to be processed and the processing mechanism. The processing apparatus moves a camera in one direction relative to the object to be processed without rotating the object to be processed, and images alignment marks in one direction and based on the imaged alignment marks and fiducial marks. Alignment of the object to be processed and the processing mechanism in directions (ie, two directions) perpendicular to the one direction. Therefore, there is no need to photograph the alignment marks of the object before and after rotating the object. As a result, the number of times of imaging the alignment mark can be reduced, and the time required for the alignment operation can be shortened.

作為加工裝置的具體實施形態,理想的是,所述加工對象物呈矩形形狀,使所述攝像相機於所述加工對象物的長邊方向或短邊方向中的其中一個方向移動的同時拍攝所述對準標記,並基於所拍攝的所述對準標記及所述基準標記,進行於所述長邊方向及所述短邊方向的所述加工對象物與所述加工機構的對準。As a specific embodiment of the processing device, it is desirable that the object to be processed is in a rectangular shape, and the imaging camera is moved in one of the long-side direction and the short-side direction of the object to be processed to take pictures. The object to be processed and the processing mechanism are aligned in the longitudinal direction and the short direction based on the alignment mark and the imaged reference mark.

所述加工工作台理想的是,具有:保持用板,用以保持所述加工對象物;以及保持基部,能夠裝卸地安裝有所述保持用板,使用所述保持用板來保持所述加工對象物,所述基準標記設置於所述保持用板或所述保持基部。Preferably, the processing table includes: a holding plate for holding the object to be processed; and a holding base on which the holding plate is detachably attached, and the processing object is held using the holding plate. For an object, the reference mark is provided on the holding plate or the holding base.

為了良好地控制對準,理想的是,加工裝置藉由所述攝像相機拍攝所述基準標記,來修正所述攝像相機的偏移量。In order to control the alignment well, ideally, the processing device corrects the offset of the imaging camera by photographing the reference mark with the imaging camera.

而且,藉由所述偏移量得到修正的所述攝像相機拍攝所述對準標記,而可準確地進行加工對象物與加工機構的對準。Furthermore, the alignment mark can be imaged by the imaging camera with the offset corrected, so that the object to be processed and the processing mechanism can be accurately aligned.

作為用以求出所述加工工作台的旋轉中心與所述基準標記的相對位置的具體實施形態,理想的是,於所述加工工作台設置有用以算出所述加工工作台的旋轉中心的中心算出用標記,於使所述加工工作台旋轉規定角度的前後,利用所述攝像相機拍攝所述中心用標記藉此算出所述旋轉中心,基於所述所算出的旋轉中心來算出所述基準標記與所述旋轉中心的相對位置。As a specific embodiment for obtaining the relative position between the rotation center of the processing table and the reference mark, it is preferable that a center for calculating the rotation center of the processing table is provided on the processing table. The mark for calculation calculates the center of rotation by photographing the mark for center with the imaging camera before and after rotating the processing table by a predetermined angle, and calculates the reference mark based on the calculated center of rotation relative position to the center of rotation.

本發明的加工裝置理想的是,更包括使所述加工機構於水平面上於相互正交的X方向及Y方向移動的加工用移動機構,所述加工用移動機構具有:一對X方向導軌,沿著所述X方向夾持所述加工工作台而設置;以及支持體,沿著所述一對X方向導軌移動,並且對所述加工機構以能夠沿著所述Y方向移動的方式予以支持。 若為所述結構,則藉由加工用移動機構使加工機構於水平面上於相互正交的X方向及Y方向分別移動,因此可於不使加工工作台於X方向及Y方向移動的情況下對加工對象物進行加工。因此,可無需使加工工作台移動的移動機構,可簡化裝置結構並且減少佔據面積(footprint)。 Preferably, the processing device of the present invention further includes a processing moving mechanism that moves the processing mechanism in mutually orthogonal X and Y directions on a horizontal plane, and the processing moving mechanism has: a pair of X-direction guide rails, and a supporting body that moves along the pair of X-direction guide rails and supports the processing mechanism so as to be movable along the Y-direction. . According to the above structure, the processing mechanism can be moved in the X direction and Y direction which are perpendicular to each other on the horizontal plane by the processing moving mechanism, so the processing table can be moved without moving the processing table in the X direction and the Y direction. Process the object to be processed. Therefore, a moving mechanism for moving the processing table can be eliminated, and the structure of the device can be simplified and the footprint can be reduced.

於所述結構中,理想的是,所述攝像相機與所述加工機構一起沿著所述支持體於Y方向移動。 若為所述結構,則可使用加工用移動機構來使攝像相機移動。 In the above structure, it is desirable that the imaging camera moves along the support body in the Y direction together with the processing mechanism. According to this configuration, the imaging camera can be moved using the moving mechanism for processing.

另外,使用所述加工裝置來製造加工品的、加工品的製造方法亦為本發明的一態樣。Moreover, the manufacturing method of the processed product which manufactures a processed product using the said processing apparatus is also one aspect of this invention.

<本發明的一實施形態> 以下,參照圖式對本發明的加工裝置的一實施形態加以說明。再者,關於以下所示的任一圖,均為了容易理解而適當省略或誇張地示意性地描畫。對相同的構成要素標註相同符號,適當省略說明。 <An embodiment of the present invention> Hereinafter, an embodiment of the processing apparatus of the present invention will be described with reference to the drawings. In addition, any of the figures shown below are appropriately omitted or exaggerated and schematically drawn for easy understanding. The same symbols are assigned to the same constituent elements, and explanations are appropriately omitted.

<加工裝置的總體結構> 本實施形態的加工裝置100為切斷裝置,藉由將作為加工對象物的密封完畢基板W切斷,從而單片化為多個作為加工品的製品P。 <Overall structure of processing equipment> The processing apparatus 100 of this embodiment is a cutting apparatus which cuts the sealed substrate W which is an object to be processed, and separates it into a plurality of products P which are processed products.

具體而言,如圖1所示,切斷裝置100包括:兩個切斷用工作台(加工工作台)2A、2B,保持密封完畢基板W;第一保持機構3,為了將密封完畢基板W搬送至切斷用工作台2A、切斷用工作台2B而保持密封完畢基板W;切斷機構(加工機構)4,將保持於切斷用工作台2A、切斷用工作台2B的密封完畢基板W切斷;移載工作台5,移動多個製品P;第二保持機構6,為了將多個製品P自切斷用工作台2A、切斷用工作台2B搬送至移載工作台5而保持多個製品P;搬送用移動機構7,具有用以使第一保持機構3及第二保持機構6移動的共用的傳遞軸71;以及切斷用移動機構(加工用移動機構)8,使切斷機構4相對於保持於切斷用工作台2A、切斷用工作台2B的密封完畢基板W移動。Specifically, as shown in FIG. 1 , the cutting device 100 includes: two cutting tables (processing tables) 2A, 2B holding the sealed substrate W; The sealed substrate W is transported to the cutting table 2A and the cutting table 2B, and the sealed substrate W is held; the cutting mechanism (processing mechanism) 4 holds the sealed substrate W on the cutting table 2A and the cutting table 2B The substrate W is cut; the transfer table 5 moves a plurality of products P; the second holding mechanism 6 transfers a plurality of products P from the cutting table 2A and the cutting table 2B to the transfer table 5 and hold a plurality of products P; the moving mechanism 7 for conveyance has a common transmission shaft 71 for moving the first holding mechanism 3 and the second holding mechanism 6; and the moving mechanism (moving mechanism for processing) 8 for cutting, The cutting mechanism 4 is moved relative to the sealed substrate W held on the cutting table 2A and the cutting table 2B.

此處,所謂密封完畢基板W,是針對連接有半導體晶片、電阻元件、電容元件等電子元件的基板,以至少將電子元件加以樹脂密封的方式進行樹脂成形而成。作為構成密封完畢基板W的基板,可使用引線框架(lead frame)、印刷配線板,除了該些以外,亦可使用半導體製基板(包含矽晶圓等半導體晶圓)、金屬製基板、陶瓷製基板、玻璃製基板、樹脂製基板等。另外,對於構成密封完畢基板W的基板,可實施有配線亦可未實施配線。Here, the sealed substrate W is resin-molded so that at least the electronic components are resin-sealed with respect to the substrate to which electronic components such as semiconductor chips, resistive elements, and capacitive elements are connected. As the substrate constituting the sealed substrate W, lead frames and printed wiring boards can be used, and other than these, semiconductor substrates (including semiconductor wafers such as silicon wafers), metal substrates, and ceramic substrates can also be used. Substrates, glass substrates, resin substrates, etc. In addition, the substrate constituting the sealed substrate W may or may not be provided with wiring.

以下的說明中,將沿著切斷用工作台2A、切斷用工作台2B的上表面的平面(水平面)內相互正交的方向分別設為X方向及Y方向,將與X方向及Y方向正交的鉛垂方向設為Z方向。具體而言,將圖1的左右方向設為X方向,將上下方向設為Y方向。雖將後述,但X方向為支持體812的移動方向,另外,為與門型支持體812的架設一對腳部的樑部(橫樑部)的長邊方向(樑部延伸的方向)正交的方向(參照圖2)。In the following description, the directions perpendicular to each other in the plane (horizontal plane) along the upper surfaces of the cutting table 2A and the cutting table 2B are respectively referred to as the X direction and the Y direction, and the X direction and the Y direction are respectively referred to as the X direction and the Y direction. The vertical direction perpendicular to the direction is defined as the Z direction. Specifically, let the left-right direction of FIG. 1 be an X direction, and let an up-down direction be a Y direction. Although it will be described later, the X direction is the moving direction of the support body 812, and is perpendicular to the longitudinal direction (direction in which the beam portion extends) of the beam portion (beam portion) on which the pair of legs of the door-shaped support body 812 is erected. direction (see Figure 2).

<切斷用工作台> 兩個切斷用工作台2A、2B於X方向、Y方向及Z方向經固定而設置。再者,切斷用工作台2A能夠藉由設置於切斷用工作台2A之下的旋轉機構9A於θ方向旋轉。另外,切斷用工作台2B能夠藉由設置於切斷用工作台2B之下的旋轉機構9B於θ方向旋轉。 <Table for cutting> The two cutting tables 2A and 2B are fixed and installed in the X direction, the Y direction, and the Z direction. In addition, the cutting table 2A can be rotated in the θ direction by the rotation mechanism 9A provided under the cutting table 2A. In addition, the cutting table 2B can be rotated in the θ direction by the rotation mechanism 9B provided under the cutting table 2B.

該些兩個切斷用工作台2A、2B於水平面上沿著X方向設置。具體而言,兩個切斷用工作台2A、2B以該些的上表面位於同一水平面上(於Z方向位於相同高度位置)的方式配置(參照圖4),並且以該些的上表面的中心(具體而言為基於旋轉機構9A、旋轉機構9B的旋轉中心)位於沿X方向延伸的同一直線上的方式配置(參照圖2及圖3)。These two cutting tables 2A and 2B are installed along the X direction on a horizontal plane. Specifically, the two cutting tables 2A, 2B are arranged so that their upper surfaces are on the same horizontal plane (at the same height position in the Z direction) (see FIG. 4 ), and the upper surfaces of these Centers (specifically, rotation centers based on the rotation mechanism 9A and the rotation mechanism 9B) are arranged so as to be located on the same straight line extending in the X direction (see FIGS. 2 and 3 ).

另外,兩個切斷用工作台2A、2B吸附保持密封完畢基板W,如圖1所示,與兩個切斷用工作台2A、2B對應地配置有用以吸附保持的兩個真空泵10A、10B。各真空泵10A、10B例如為水封式真空泵。In addition, the two cutting tables 2A, 2B absorb and hold the sealed substrate W. As shown in FIG. . Each vacuum pump 10A, 10B is a water-sealed vacuum pump, for example.

此處,切斷用工作台2A、切斷用工作台2B於XYZ方向經固定,故而可縮短自真空泵10A、真空泵10B連接於切斷用工作台2A、切斷用工作台2B的配管(未圖示),可減小配管的壓力損失,防止吸附力的降低。其結果為,即便為例如1 mm見方以下的極小封裝體,亦能可靠地吸附於切斷用工作台2A、切斷用工作台2B。另外,可防止配管的壓力損失所致的、吸附力的降低,故而可減小真空泵10A、真空泵10B的容量,亦會帶來小型化或成本降低。Here, the cutting table 2A and the cutting table 2B are fixed in the XYZ direction, so the piping (not shown) connected to the cutting table 2A and the cutting table 2B from the vacuum pump 10A and the vacuum pump 10B can be shortened. As shown in the figure), the pressure loss of the piping can be reduced to prevent the reduction of the adsorption force. As a result, even an extremely small package of, for example, 1 mm square or less can be reliably adsorbed to the cutting table 2A and the cutting table 2B. In addition, since the reduction of the adsorption force due to the pressure loss of the piping can be prevented, the capacities of the vacuum pump 10A and the vacuum pump 10B can be reduced, resulting in miniaturization and cost reduction.

<第一保持機構> 如圖1所示,第一保持機構3為了將密封完畢基板W自基板供給機構11搬送至切斷用工作台2A、切斷用工作台2B而保持密封完畢基板W。如圖5及圖6所示,所述第一保持機構3具有:吸附頭31,設置有用以吸附保持密封完畢基板W的多個吸附部311;以及真空泵(未圖示),連接於該吸附頭31的吸附部311。而且,藉由吸附頭31由後述的搬送用移動機構7等移動至所需位置,從而將密封完畢基板W自基板供給機構11搬送至切斷用工作台2A、切斷用工作台2B。 <First Holding Mechanism> As shown in FIG. 1 , the first holding mechanism 3 holds the sealed substrate W to transfer the sealed substrate W from the substrate supply mechanism 11 to the cutting table 2A and the cutting table 2B. As shown in Figures 5 and 6, the first holding mechanism 3 has: a suction head 31, provided with a plurality of suction parts 311 for suction and holding the sealed substrate W; and a vacuum pump (not shown), connected to the suction The suction part 311 of the head 31 . Then, the sealed substrate W is transported from the substrate supply mechanism 11 to the cutting table 2A and the cutting table 2B by the suction head 31 being moved to a desired position by the transportation moving mechanism 7 described later.

如圖1所示,基板供給機構11具有:基板收容部111,自外部收容多個密封完畢基板W;以及基板供給部112,使收容於該基板收容部111的密封完畢基板W移動至由第一保持機構3吸附保持的保持位置RP。所述保持位置RP是以於X方向與兩個切斷用工作台2A、2B成為同行的方式設定。再者,基板供給機構11亦可為了使由第一保持機構3吸附的密封完畢基板W為柔軟的狀態以容易吸附,而具有進行加熱的加熱部113。As shown in FIG. 1 , the substrate supply mechanism 11 has: a substrate accommodating portion 111 for accommodating a plurality of sealed substrates W from the outside; A holding mechanism 3 absorbs and holds the holding position RP. The holding position RP is set so as to be parallel to the two cutting tables 2A and 2B in the X direction. In addition, the substrate supply mechanism 11 may include a heating unit 113 for heating the sealed substrate W sucked by the first holding mechanism 3 in a soft state for easy suction.

<切斷機構(加工機構)> 如圖1、圖2及圖3所示,切斷機構4具有包含刀片41A、刀片41B及兩個心軸部42A、42B的兩個旋轉工具40。兩個心軸部42A、42B以該些的旋轉軸沿著Y方向的方式設置,安裝於該些心軸的刀片41A、刀片41B以相互相向的方式配置(參照圖3)。心軸部42A的刀片41A及心軸部42B的刀片41B藉由在包含X方向及Z方向的面內旋轉,從而將保持於各切斷用工作台2A、2B的密封完畢基板W切斷。再者,於本實施形態的切斷裝置100,如圖4所示,為了抑制由刀片41A、刀片41B產生的摩擦熱而設置有液體供給機構12,所述液體供給機構12具有噴射切削水(加工液)的噴射噴嘴121。所述噴射噴嘴121例如支持於後述的Z方向移動部83。 <Cutting mechanism (processing mechanism)> As shown in FIGS. 1 , 2 and 3 , the cutting mechanism 4 has two rotary tools 40 including a blade 41A, a blade 41B, and two spindle portions 42A, 42B. The two spindle parts 42A and 42B are provided so that the rotation axes of these spindles are along the Y direction, and the blades 41A and 41B attached to the spindles are arranged to face each other (see FIG. 3 ). The blade 41A of the mandrel part 42A and the blade 41B of the mandrel part 42B cut the sealed substrate W held on each cutting table 2A, 2B by rotating in a plane including the X direction and the Z direction. Furthermore, in the cutting device 100 of the present embodiment, as shown in FIG. 4 , in order to suppress the frictional heat generated by the blades 41A and 41B, a liquid supply mechanism 12 is provided, and the liquid supply mechanism 12 has a jet cutting water ( machining fluid) spray nozzle 121. The spray nozzle 121 is supported by, for example, a Z-direction moving part 83 described later.

<移載工作台> 如圖1所示,本實施形態的移載工作台5為移動經後述的檢查部13進行了檢查的多個製品P的工作台。所述移載工作台5被稱為所謂的分度工作台(index table),於將多個製品P分類至各種托盤21之前,暫時載置多個製品P。另外,移載工作台5於水平面上沿著X方向與兩個切斷用工作台2A、2B配置成一行。進而,移載工作台5能夠沿著Y方向前後移動,可移動至分類機構20。載置於移載工作台5的多個製品P根據由檢查部13所得的檢查結果(良品、不良品等)而由分類機構20分類至各種托盤21。 <Transfer table> As shown in FIG. 1 , the transfer stage 5 of the present embodiment is a stage for moving a plurality of products P inspected by an inspection unit 13 described later. The transfer table 5 is called a so-called index table, and temporarily places a plurality of products P before sorting the plurality of products P into various trays 21 . In addition, the transfer table 5 is arranged in a row along the X direction with the two cutting tables 2A and 2B on the horizontal plane. Furthermore, the transfer table 5 can move back and forth along the Y direction, and can move to the sorting mechanism 20 . A plurality of products P placed on the transfer table 5 are sorted into various trays 21 by the sorting mechanism 20 according to the inspection results (defective products, defective products, etc.) obtained by the inspection unit 13 .

再者,各種托盤21藉由沿著傳遞軸71移動的托盤搬送機構22搬送至所需位置,載置由分類機構20分類的製品P。經分類後,各種托盤21藉由托盤搬送機構22收容於托盤收容部23。於本實施形態中,構成為於托盤收容部23收容例如收容製品P之前的托盤21、收容有良好製品P的托盤21、收容有需要返工(rework)的不良製品P的托盤21等三種托盤。Furthermore, the various trays 21 are transported to desired positions by the tray transport mechanism 22 that moves along the transfer shaft 71, and the products P sorted by the sorting mechanism 20 are placed thereon. After being sorted, various trays 21 are stored in the tray storage unit 23 by the tray transport mechanism 22 . In the present embodiment, three types of trays are stored in the tray storage unit 23, such as the tray 21 before storing the product P, the tray 21 containing the good product P, and the tray 21 containing the defective product P requiring rework.

<檢查部> 此處,檢查部13如圖1所示,設置於切斷用工作台2A、切斷用工作台2B與移載工作台5之間,檢查保持於第二保持機構6的多個製品P。本實施形態的檢查部13具有檢查製品P的密封面(封裝面)的第一檢查部131、及檢查製品P的引線面的第二檢查部132。第一檢查部131為具有用以檢查封裝面的光學系統的攝像相機,第二檢查部132為具有用以檢查引線面的光學系統的攝像相機。再者,亦可使第一檢查部131及第二檢查部132共用。 <Inspection Department> Here, the inspection unit 13 is provided between the cutting table 2A, the cutting table 2B, and the transfer table 5 as shown in FIG. 1 , and inspects a plurality of products P held by the second holding mechanism 6 . The inspection part 13 of this embodiment has the 1st inspection part 131 which inspects the sealing surface (package surface) of the product P, and the 2nd inspection part 132 which inspects the lead surface of the product P. The first inspection part 131 is a camera with an optical system for inspecting the package surface, and the second inspection part 132 is a camera with an optical system for inspection of the lead surface. Furthermore, the first inspection unit 131 and the second inspection unit 132 may be shared.

本實施形態的密封完畢基板W及製品P為基板的一面經樹脂成形的結構。於此種結構中,經樹脂成形的面是與基板連接的電子元件經樹脂密封而成的面,被稱為「密封面」或「封裝面」。另一方面,與經樹脂成形的面為相反側的未經樹脂成形的面露出了通常作為製品的外部連接電極發揮功能的引線,因此被稱為引線面。於所述引線為球柵陣列(Ball Grid Array,BGA)等的電子零件中使用的突起狀電極的情況下,有時亦被稱為「球面」。進而,與經樹脂成形的面為相反側的未經樹脂成形的面亦有未形成引線的形態,因此有時亦被稱為「基板面」。於本實施形態的說明中,將經樹脂成形的面記載為「密封面」或「封裝面」,將與經樹脂成形的面為相反側的未經樹脂成形的面記載為「引線面」。The sealed substrate W and product P of this embodiment have a structure in which one side of the substrate is molded with resin. In this structure, the resin-molded surface is the surface where the electronic components connected to the substrate are sealed with resin, and is called "sealing surface" or "package surface". On the other hand, the non-resin-molded surface on the opposite side to the resin-molded surface exposes the leads that usually function as external connection electrodes of the product, so it is called a lead surface. When the said lead is a protruding electrode used in electronic components, such as a ball grid array (BGA), it may also be called a "spherical surface." Furthermore, the non-resin-molded surface on the opposite side to the resin-molded surface may also have no leads formed thereon, so it may also be referred to as a "substrate surface". In the description of this embodiment, the resin-molded surface is described as a "sealing surface" or "package surface", and the resin-molded surface opposite to the resin-molded surface is described as a "lead surface".

另外,為了能夠藉由檢查部13來檢查多個製品P的兩面,設置有使多個製品P反轉的反轉機構14(參照圖1)。所述反轉機構14具有保持多個製品P的保持工作台141、以及使該保持工作台141以成為表背相反的方式反轉的馬達等反轉部142。In addition, in order to be able to inspect both sides of the plurality of products P by the inspection unit 13 , an inversion mechanism 14 (see FIG. 1 ) for inverting the plurality of products P is provided. The reversing mechanism 14 has a holding table 141 for holding a plurality of products P, and a reversing unit 142 such as a motor for reversing the holding table 141 so that its front and back are reversed.

於第二保持機構6自切斷用工作台2A、切斷用工作台2B保持多個製品P時,製品P的封裝面朝向下側。於此狀態下,於自切斷用工作台2A、切斷用工作台2B向反轉機構14搬送多個製品P的中途,藉由第一檢查部131來檢查製品P的封裝面。其後,保持於第二保持機構6的多個製品P由反轉機構14反轉。於此狀態下,製品P的引線面朝向下側,使反轉機構14移動至第二檢查部132,藉此檢查製品P的引線面。When the second holding mechanism 6 holds a plurality of products P from the cutting table 2A and the cutting table 2B, the packaging surface of the products P faces downward. In this state, while the plurality of products P are being conveyed from the cutting table 2A and the cutting table 2B to the reversing mechanism 14 , the sealing surfaces of the products P are inspected by the first inspection unit 131 . Thereafter, the plurality of products P held by the second holding mechanism 6 are reversed by the reversing mechanism 14 . In this state, the lead surface of the product P faces downward, and the reversing mechanism 14 is moved to the second inspection part 132 , thereby inspecting the lead surface of the product P.

<第二保持機構> 如圖1所示,第二保持機構6為了將多個製品P自切斷用工作台2A、切斷用工作台2B搬送至移載工作台5而保持多個製品P。如圖8所示,所述第二保持機構6具有:吸附頭61,設置有用以吸附保持多個製品P的多個吸附部611;以及真空泵(未圖示),連接於該吸附頭61的吸附部611。繼而,藉由吸附頭61由後述的搬送用移動機構7等移動至所需的位置,從而將多個製品P自切斷用工作台2A、切斷用工作台2B搬送至保持工作台141或移載工作台5。 <Second Holding Mechanism> As shown in FIG. 1 , the second holding mechanism 6 holds a plurality of products P for transferring the plurality of products P from the cutting table 2A and the cutting table 2B to the transfer table 5 . As shown in FIG. 8 , the second holding mechanism 6 has: an adsorption head 61 provided with a plurality of adsorption parts 611 for adsorbing and holding a plurality of products P; and a vacuum pump (not shown) connected to the suction head 61 Adsorption part 611. Then, by moving the suction head 61 to a desired position by the transport moving mechanism 7 described later, a plurality of products P are transported from the cutting table 2A and the cutting table 2B to the holding table 141 or Transfer workbench 5.

<搬送用移動機構> 如圖1所示,搬送用移動機構7使第一保持機構3至少於基板供給機構11與切斷用工作台2A、切斷用工作台2B之間移動,並且使第二保持機構6至少於切斷用工作台2A、切斷用工作台2B與保持工作台141之間移動。 <Movement Mechanism for Transport> As shown in FIG. 1 , the moving mechanism 7 for conveyance moves the first holding mechanism 3 at least between the substrate supply mechanism 11 and the cutting table 2A and the cutting table 2B, and moves the second holding mechanism 6 at least below the substrate supply mechanism 11 . It moves between the table 2A for cutting, the table 2B for cutting, and the holding table 141 .

而且,如圖1所示,搬送用移動機構7具有:共用的傳遞軸71,沿著兩個切斷用工作台2A、2B及移載工作台5的排列方向(X方向)一直線地延伸,用以使第一保持機構3及第二保持機構6移動。Moreover, as shown in FIG. 1 , the transfer mechanism 7 has a common transmission shaft 71 extending linearly along the direction (X direction) in which the two cutting tables 2A, 2B and the transfer table 5 are arranged, It is used to move the first holding mechanism 3 and the second holding mechanism 6 .

所述傳遞軸71設置於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至移載工作台5的上方(參照圖1)。另外,相對於所述傳遞軸71,第一保持機構3、第二保持機構6、切斷用工作台2A、切斷用工作台2B及移載工作台5於平面視時設置於同側(近前側)。此外,檢查部13、反轉機構14、各種托盤21、托盤搬送機構22、托盤收容部23、後述的第一清潔機構18及第二清潔機構19、回收容器172亦相對於傳遞軸71而設置於同側(近前側)。The transmission shaft 71 is set in the following range, that is: the first holding mechanism 3 can move to the top of the substrate supply part 112 of the substrate supply mechanism 11, and the second holding mechanism 6 can move to the top of the transfer table 5 ( Refer to Figure 1). In addition, with respect to the transmission shaft 71, the first holding mechanism 3, the second holding mechanism 6, the cutting table 2A, the cutting table 2B, and the transfer table 5 are arranged on the same side in plan view ( near the front). In addition, the inspection unit 13, the reversing mechanism 14, various trays 21, the tray transport mechanism 22, the tray storage unit 23, the first cleaning mechanism 18 and the second cleaning mechanism 19 described later, and the recovery container 172 are also installed on the transmission shaft 71. On the same side (near the front side).

進而,如圖5、圖6及圖8所示,搬送用移動機構7具有:主移動機構72,使第一保持機構3及第二保持機構6沿著傳遞軸71於X方向移動;升降移動機構73,使第一保持機構3及第二保持機構6相對於傳遞軸71於Z方向升降移動;以及水平移動機構74,使第一保持機構3及第二保持機構6相對於傳遞軸71於Y方向水平移動。Furthermore, as shown in Fig. 5, Fig. 6 and Fig. 8, the moving mechanism 7 for conveyance has: a main moving mechanism 72, which moves the first holding mechanism 3 and the second holding mechanism 6 in the X direction along the transmission shaft 71; The mechanism 73 makes the first holding mechanism 3 and the second holding mechanism 6 move up and down in the Z direction relative to the transmission shaft 71; and the horizontal movement mechanism 74 makes the first holding mechanism 3 and the second holding mechanism 6 move relative to the transmission shaft 71 Move horizontally in the Y direction.

如圖5~圖8所示,主移動機構72具有:共用的導軌721,設置於傳遞軸71、且導引第一保持機構3及第二保持機構6;以及齒條與小齒輪機構722,使第一保持機構3及第二保持機構6沿著該導軌721移動。As shown in FIGS. 5-8 , the main moving mechanism 72 has: a common guide rail 721, which is arranged on the transmission shaft 71 and guides the first holding mechanism 3 and the second holding mechanism 6; and a rack and pinion mechanism 722, The first holding mechanism 3 and the second holding mechanism 6 are moved along the guide rail 721 .

導軌721沿著傳遞軸71於X方向一直線地延伸,與傳遞軸71同樣地設置於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至移載工作台5的上方。於所述導軌721,能夠滑動地設置有滑動構件723,所述滑動構件723經由升降移動機構73及水平移動機構74而設置有第一保持機構3及第二保持機構6。此處,導軌721為第一保持機構3及第二保持機構6所共用,但升降移動機構73、水平移動機構74及滑動構件723是針對第一保持機構3及第二保持機構6各自而分別設置。The guide rail 721 extends linearly in the X direction along the transmission shaft 71, and is provided in the same range as the transmission shaft 71 so that the first holding mechanism 3 can move above the substrate supply part 112 of the substrate supply mechanism 11 and the second holding mechanism 3 can move above the substrate supply part 112 of the substrate supply mechanism 11. The second holding mechanism 6 can move to the top of the transfer table 5 . The guide rail 721 is slidably provided with a slide member 723 provided with the first holding mechanism 3 and the second holding mechanism 6 via the elevating movement mechanism 73 and the horizontal movement mechanism 74 . Here, the guide rail 721 is shared by the first holding mechanism 3 and the second holding mechanism 6, but the elevating movement mechanism 73, the horizontal moving mechanism 74 and the sliding member 723 are for the first holding mechanism 3 and the second holding mechanism 6 respectively. set up.

齒條與小齒輪機構722具有:凸輪齒條722a,為第一保持機構3及第二保持機構6所共用;以及小齒輪722b,分別設置於第一保持機構3及第二保持機構6,由致動器(未圖示)旋轉。凸輪齒條722a設置於共用的傳遞軸71,可藉由將多個凸輪齒條要素連結從而變更為各種長度。另外,小齒輪722b設置於滑動構件723,被稱為所謂的滾子小齒輪(roller pinion),如圖7所示,具有:與馬達的旋轉軸一起旋轉的一對滾子本體722b1,以及於該一對滾子本體722b1之間於圓周方向等間隔地設置、且以相對於滾子本體722b1能夠滾動的方式設置的多個滾子銷722b2。本實施形態的齒條與小齒輪機構722使用所述滾子小齒輪,故而兩個以上的滾子銷722b2與凸輪齒條722a接觸,於正反方向不產生背隙(backlash),於使第一保持機構3及第二保持機構6於X方向移動時定位精度變良好。The rack and pinion mechanism 722 has: a cam rack 722a, shared by the first holding mechanism 3 and the second holding mechanism 6; and a pinion 722b, respectively arranged on the first holding mechanism 3 and the second holding mechanism 6, by An actuator (not shown) rotates. The cam rack 722a is provided on the common transmission shaft 71, and can be changed to various lengths by connecting a plurality of cam rack elements. In addition, the pinion 722b is provided on the sliding member 723, and is called a so-called roller pinion (roller pinion), as shown in FIG. A plurality of roller pins 722b2 are provided at equal intervals in the circumferential direction between the pair of roller bodies 722b1 and are provided so as to be able to roll with respect to the roller bodies 722b1. The rack and pinion mechanism 722 of this embodiment uses the above-mentioned roller pinion, so two or more roller pins 722b2 contact the cam rack 722a, and there is no backlash in the forward and reverse directions. When the first holding mechanism 3 and the second holding mechanism 6 move in the X direction, the positioning accuracy becomes better.

如圖5及圖8所示,升降移動機構73是與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的升降移動機構73介於傳遞軸71(具體而言為主移動機構72)與第一保持機構3之間而設置,具有:Z方向導軌73a,沿著Z方向設置;以及致動器部73b,使第一保持機構3沿著該Z方向導軌73a移動。再者,致動器部73b例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。再者,如圖8所示,第二保持機構6的升降移動機構73的結構與第一保持機構3的升降移動機構73同樣。As shown in FIGS. 5 and 8 , the elevating movement mechanism 73 is provided corresponding to the first holding mechanism 3 and the second holding mechanism 6 , respectively. As shown in Fig. 5 and Fig. 6, the elevating and moving mechanism 73 of the first holding mechanism 3 is provided between the transmission shaft 71 (specifically, the main moving mechanism 72) and the first holding mechanism 3, and has: a Z-direction guide rail 73a, which is provided along the Z direction; and the actuator part 73b, which moves the first holding mechanism 3 along the Z direction guide rail 73a. In addition, as the actuator part 73b, for example, a ball screw mechanism may be used, an air cylinder may be used, and a linear motor may be used. In addition, as shown in FIG. 8 , the structure of the vertical movement mechanism 73 of the second holding mechanism 6 is the same as that of the vertical movement mechanism 73 of the first holding mechanism 3 .

如圖5、圖6及圖8所示,水平移動機構74是與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的水平移動機構74是介於傳遞軸71(具體而言為升降移動機構73)與第一保持機構3之間而設置,具有:Y方向導軌74a,沿著Y方向設置;彈性體74b,對第一保持機構3向Y方向導軌74a的其中一側賦予力;以及凸輪機構74c,使第一保持機構3向Y方向導軌74a的另一側移動。此處,凸輪機構74c使用偏心凸輪,藉由利用馬達等致動器使該偏心凸輪旋轉,從而可調整第一保持機構3於Y方向的移動量。As shown in FIGS. 5 , 6 and 8 , the horizontal movement mechanism 74 is provided corresponding to the first holding mechanism 3 and the second holding mechanism 6 , respectively. As shown in Figures 5 and 6, the horizontal movement mechanism 74 of the first holding mechanism 3 is provided between the transmission shaft 71 (specifically, the lifting movement mechanism 73) and the first holding mechanism 3, and has: Y direction The guide rail 74a is arranged along the Y direction; the elastic body 74b imparts force to the first holding mechanism 3 toward one side of the Y direction guide rail 74a; and the cam mechanism 74c makes the first holding mechanism 3 move toward the other side of the Y direction guide rail 74a. Move sideways. Here, the cam mechanism 74c uses an eccentric cam, and by rotating the eccentric cam with an actuator such as a motor, the amount of movement of the first holding mechanism 3 in the Y direction can be adjusted.

再者,如圖8所示,第二保持機構6的水平移動機構74的結構與第一保持機構3的升降移動機構73同樣。另外,可設為未對第二保持機構6設置有水平移動機構74的結構,亦可設為未對第一保持機構3及第二保持機構6兩者設置有水平移動機構74的結構。進而,水平移動機構74與升降移動機構73同樣地,不使用凸輪機構74c而例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。Furthermore, as shown in FIG. 8 , the structure of the horizontal movement mechanism 74 of the second holding mechanism 6 is the same as that of the vertical movement mechanism 73 of the first holding mechanism 3 . In addition, a configuration in which the horizontal movement mechanism 74 is not provided to the second holding mechanism 6 may be employed, or a configuration in which the horizontal movement mechanism 74 is not provided to both the first holding mechanism 3 and the second holding mechanism 6 may be employed. Furthermore, similarly to the vertical movement mechanism 73, the horizontal movement mechanism 74 may use a ball screw mechanism instead of the cam mechanism 74c, may use an air cylinder, and may use a linear motor.

<切斷用移動機構(加工用移動機構)> 切斷用移動機構8使兩個心軸部42A、42B的各個於X方向、Y方向及Z方向分別獨立地直線移動。 <Movement Mechanism for Cutting (Movement Mechanism for Processing)> The moving mechanism 8 for cutting linearly moves each of the two spindle parts 42A and 42B independently in the X direction, the Y direction, and the Z direction.

具體而言,如圖2、圖3、圖9所示,切斷用移動機構8包括:X方向移動部81,使心軸部42A、心軸部42B於X方向直線移動;Y方向移動部82,使心軸部42A、心軸部42B於Y方向直線移動;以及Z方向移動部83,使心軸部42A、心軸部42B於Z方向直線移動。Specifically, as shown in Fig. 2, Fig. 3 and Fig. 9, the moving mechanism 8 for cutting includes: an X direction moving part 81, which moves the mandrel part 42A and the mandrel part 42B linearly in the X direction; the Y direction moving part 82 , to linearly move the spindle part 42A and the spindle part 42B in the Y direction; and a Z-direction moving part 83 to linearly move the spindle part 42A and the spindle part 42B in the Z direction.

X方向移動部81為兩個切斷用工作台2A、2B所共用,尤其如圖2及圖3所示,具有:沿著X方向夾持兩個切斷用工作台2A、2B而設置的一對X方向導軌811;以及支持體812,沿著該一對X方向導軌811移動並且經由Y方向移動部82及Z方向移動部83支持心軸部42A、心軸部42B。一對X方向導軌811設置於沿著X方向設置的兩個切斷用工作台2A、2B的側方。另外,支持體812例如為門型,具有沿Y方向延伸的形狀。具體而言,支持體812具有自一對X方向導軌811向上方延伸的一對腳部、以及架設於該一對腳部的樑部(橫樑部),該樑部沿Y方向延伸。The X-direction moving part 81 is shared by the two cutting tables 2A, 2B, especially as shown in FIG. 2 and FIG. A pair of X-direction rails 811 ; and a support body 812 that moves along the pair of X-direction rails 811 and supports the mandrel part 42A and the mandrel part 42B via the Y-direction moving part 82 and the Z-direction moving part 83 . A pair of X direction guide rail 811 is provided in the side of two cutting tables 2A, 2B provided along the X direction. In addition, the support body 812 is, for example, a gate shape and has a shape extending in the Y direction. Specifically, the support body 812 has a pair of leg portions extending upward from the pair of X-direction rails 811 , and a beam portion (beam portion) spanning the pair of leg portions, and the beam portion extends in the Y direction.

而且,支持體812例如藉由沿X方向延伸的滾珠螺桿機構813而於一對X方向導軌811上沿著X方向直線往返移動。所述滾珠螺桿機構813由伺服馬達等驅動源(未圖示)驅動。此外,支持體812亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。Moreover, the support body 812 linearly reciprocates along the X direction on a pair of X direction guide rails 811 by, for example, a ball screw mechanism 813 extending along the X direction. The ball screw mechanism 813 is driven by a drive source (not shown) such as a servo motor. In addition, the supporting body 812 may also be configured to move back and forth by other linear motion mechanisms such as linear motors.

尤其如圖3所示,Y方向移動部82具有:Y方向導軌821,於支持體812中沿著Y方向設置;以及Y方向滑塊822,沿著該Y方向導軌821移動。Y方向滑塊822例如由線性馬達823驅動,於Y方向導軌821上直線往返移動。於本實施形態中,與兩個心軸部42A、42B對應地設置有兩個Y方向滑塊822。藉此,兩個心軸部42A、42B能夠相互獨立地於Y方向移動。此外,Y方向滑塊822亦可以藉由使用滾珠螺桿機構的其他直動機構而往返移動的方式構成。Especially as shown in FIG. 3 , the Y-direction moving part 82 has: a Y-direction rail 821 disposed in the support body 812 along the Y-direction; and a Y-direction slider 822 that moves along the Y-direction rail 821 . The Y-direction slider 822 is driven by, for example, a linear motor 823 , and linearly moves back and forth on the Y-direction guide rail 821 . In this embodiment, two Y direction sliders 822 are provided corresponding to the two spindle parts 42A and 42B. Thereby, the two spindle parts 42A, 42B can move independently of each other in a Y direction. In addition, the Y-direction slider 822 may also be configured to move back and forth by other linear motion mechanisms using a ball screw mechanism.

如圖2~圖4所示,Z方向移動部83具有:Z方向導軌831,於各Y方向滑塊822中沿著Z方向設置;以及Z方向滑塊832,沿著所述Z方向導軌831移動並且支持心軸部42A、心軸部42B。即,Z方向移動部83是與各心軸部42A、42B對應地設置。Z方向滑塊832例如由偏心凸輪機構(未圖示)驅動,於Z方向導軌831上直線往返移動。此外,Z方向滑塊832亦可以藉由滾珠螺桿機構等其他直動機構而往返移動的方式構成。As shown in FIGS. 2 to 4 , the Z direction moving part 83 has: a Z direction guide rail 831 arranged along the Z direction in each Y direction slider 822 ; and a Z direction slider 832 arranged along the Z direction guide rail 831 The mandrel part 42A, the mandrel part 42B are moved and supported. That is, the Z direction moving part 83 is provided corresponding to each spindle part 42A, 42B. The Z-direction slider 832 is driven by, for example, an eccentric cam mechanism (not shown), and linearly moves back and forth on the Z-direction guide rail 831 . In addition, the Z-direction slider 832 may also be configured to move back and forth by other linear motion mechanisms such as a ball screw mechanism.

關於所述切斷用移動機構8與傳遞軸71的位置關係,如圖1及圖4所示,以傳遞軸71於切斷用移動機構8的上方橫穿切斷用移動機構8的方式配置。具體而言,傳遞軸71以於支持體812的上方橫穿該支持體812的方式配置,傳遞軸71及支持體812成為相互交叉的位置關係。Regarding the positional relationship between the moving mechanism 8 for cutting and the transmission shaft 71, as shown in FIG. 1 and FIG. . Specifically, the transmission shaft 71 is disposed above the support body 812 so as to cross the support body 812 , and the transmission shaft 71 and the support body 812 are in a positional relationship of intersecting each other.

<加工屑收容部> 另外,如圖1所示,本實施形態的切斷裝置100更包括:加工屑收容部17,收容因密封完畢基板W的切斷而產生的端材等加工屑S。 <Swarf Storage Unit> In addition, as shown in FIG. 1 , the cutting device 100 of the present embodiment further includes a machining waste storage unit 17 for storing machining waste S such as end materials generated by cutting the sealed substrate W. As shown in FIG.

如圖2~圖4所示,所述加工屑收容部17設置於切斷用工作台2A、切斷用工作台2B的下方,具有:導引滑槽171,具有於平面視時包圍切斷用工作台2A、切斷用工作台2B的上部開口171X;以及回收容器172,將由該導引滑槽171所導引的加工屑S回收。藉由將加工屑收容部17設置於切斷用工作台2A、切斷用工作台2B的下方,從而可提高加工屑S的回收率。As shown in FIGS. 2 to 4 , the machining waste storage unit 17 is arranged below the cutting table 2A and the cutting table 2B, and has: a guide chute 171 that surrounds the cutting machine in plan view. The machining chips S guided by the guide chute 171 are recovered by using the upper opening 171X of the table 2A and the table 2B for cutting, and the recovery container 172 . The recovery rate of the machining waste S can be improved by providing the machining waste storage unit 17 below the cutting table 2A and the cutting table 2B.

導引滑槽171將自切斷用工作台2A、切斷用工作台2B飛散或掉落的加工屑S導引至回收容器172。於本實施形態中,以導引滑槽171的上部開口171X包圍切斷用工作台2A、切斷用工作台2B的方式構成(參照圖3),故而不易漏掉加工屑S,可進一步提高加工屑S的回收率。另外,導引滑槽171以包圍設置於切斷用工作台2A、切斷用工作台2B之下的旋轉機構9A、旋轉機構9B的方式設置(參照圖4),以保護旋轉機構9A、旋轉機構9B免受加工屑S及切削水的方式構成。The guide chute 171 guides the machining chips S scattered or dropped from the cutting table 2A and the cutting table 2B to the recovery container 172 . In this embodiment, the upper opening 171X of the guide chute 171 surrounds the table 2A for cutting and the table 2B for cutting (refer to FIG. 3 ), so it is difficult to miss the machining chips S, and further improvement can be achieved. The recovery rate of machining chips S. In addition, the guide chute 171 is provided in a manner to surround the rotation mechanism 9A and the rotation mechanism 9B provided under the cutting table 2A and the cutting table 2B (see FIG. 4 ), so as to protect the rotation mechanism 9A and the rotation mechanism. The mechanism 9B is constructed so as to avoid machining chips S and cutting water.

於本實施形態中,加工屑收容部17為兩個切斷用工作台2A、2B所共用,但亦可與切斷用工作台2A、切斷用工作台2B分別對應地設置。In the present embodiment, the chip storage unit 17 is shared by the two cutting tables 2A and 2B, but may be provided correspondingly to the cutting table 2A and the cutting table 2B, respectively.

回收容器172將因自重而通過導引滑槽171的加工屑S回收,於本實施形態中,如圖4等所示,與兩個切斷用工作台2A、2B分別對應地設置。而且,兩個回收容器172配置於傳遞軸的近前側,以可分別獨立地自切斷裝置100的近前側卸除的方式構成。藉由所述結構,可提高加工屑S的廢棄等的維護性。再者,回收容器172可考慮密封完畢基板W的尺寸或加工屑S的尺寸及量、作業性等而於所有切斷用工作台之下總體設置一個,亦可分為三個以上而設置。The recovery container 172 recovers the machining chips S passing through the guide chute 171 by its own weight, and in this embodiment, as shown in FIG. Furthermore, the two recovery containers 172 are disposed on the near side of the transmission shaft, and are configured to be independently detachable from the near side of the cutting device 100 . With such a configuration, maintainability such as disposal of machining waste S can be improved. In addition, one recovery container 172 may be installed under all cutting tables in consideration of the size of the sealed substrate W, the size and amount of the processing waste S, and workability, or may be divided into three or more.

另外,如圖4等所示,加工屑收容部17具有將切削水與加工屑分離的分離部173。作為所述分離部173的結構,例如可想到於回收容器172的底面設置使切削水通過的多孔板等過濾器。藉由所述分離部173,可不於回收容器172蓄積切削水而將加工屑S回收。In addition, as shown in FIG. 4 and the like, the chip storage unit 17 has a separating portion 173 for separating cutting water and chips. As a structure of the separation unit 173 , for example, a filter such as a perforated plate through which the cutting water passes is provided on the bottom surface of the recovery container 172 . The machining chips S can be recovered by the separation unit 173 without accumulating cutting water in the recovery container 172 .

<第一清潔機構> 另外,如圖1及圖5所示,本發明的切斷裝置100更包括:第一清潔機構18,將保持於切斷用工作台2A、切斷用工作台2B的多個製品P的上表面側(引線面)清潔。所述第一清潔機構18藉由對保持於切斷用工作台2A、切斷用工作台2B的多個製品P的上表面噴射洗淨液及/或壓縮空氣的噴射噴嘴18a(參照圖5),來清潔製品P的上表面側。 <First Cleaning Organization> In addition, as shown in FIGS. 1 and 5 , the cutting device 100 of the present invention further includes: a first cleaning mechanism 18 that cleans the plurality of products P held on the cutting table 2A and the cutting table 2B. The surface side (lead side) is clean. The first cleaning mechanism 18 uses spray nozzles 18a (refer to FIG. ), to clean the upper surface side of the product P.

如圖5所示,所述第一清潔機構18以能夠與第一保持機構3一起沿著傳遞軸71移動的方式構成。此處,第一清潔機構18設置於滑動構件723,所述滑動構件723於設置於傳遞軸71的導軌721上滑動。此處,於第一清潔機構18與滑動構件723之間,設置有用以使第一清潔機構18於Z方向升降移動的升降移動機構181。關於所述升降移動機構181,例如可想到使用齒條與小齒輪機構,使用滾珠螺桿機構,或使用氣缸等。As shown in FIG. 5 , the first cleaning mechanism 18 is configured to be movable along the transmission shaft 71 together with the first holding mechanism 3 . Here, the first cleaning mechanism 18 is disposed on the sliding member 723 , and the sliding member 723 slides on the guide rail 721 disposed on the transmission shaft 71 . Here, between the first cleaning mechanism 18 and the sliding member 723, a lifting mechanism 181 for moving the first cleaning mechanism 18 up and down in the Z direction is provided. For the above-mentioned elevating movement mechanism 181, it is conceivable to use a rack and pinion mechanism, a ball screw mechanism, or an air cylinder, for example.

<第二清潔機構> 進而,如圖1所示,本發明的切斷裝置100更包括:第二清潔機構19,將保持於第二保持機構6的多個製品P的下表面側(封裝面)清潔。所述第二清潔機構19設置於切斷用工作台2B與檢查部13之間,藉由向保持於第二保持機構6的多個製品P的下表面噴射洗淨液及/或壓縮空氣,從而清潔製品P的下表面側。即,於第二保持機構6沿著傳遞軸71移動的中途,第二清潔機構19將製品P的下表面側清潔。 <Second Cleaning Organization> Furthermore, as shown in FIG. 1 , the cutting device 100 of the present invention further includes a second cleaning mechanism 19 for cleaning the lower surface side (packaging surface) of the plurality of products P held by the second holding mechanism 6 . The second cleaning mechanism 19 is provided between the cutting table 2B and the inspection unit 13, and sprays cleaning liquid and/or compressed air to the lower surfaces of the plurality of products P held by the second holding mechanism 6, The lower surface side of the article P is thereby cleaned. That is, the second cleaning mechanism 19 cleans the lower surface side of the product P while the second holding mechanism 6 is moving along the transmission shaft 71 .

<切斷裝置的動作的一例> 繼而,對切斷裝置100的動作的一例加以說明。圖9中,表示切斷裝置100的動作中的第一保持機構3的移動路徑、及第二保持機構6的移動路徑。再者,於本實施形態中,切斷裝置100的動作、例如密封完畢基板W的搬送、密封完畢基板W的切斷、製品P的檢查等所有動作或控制是由控制部CTL(參照圖1)進行。 <An example of the operation of the cutting device> Next, an example of the operation of the cutting device 100 will be described. FIG. 9 shows the movement path of the first holding mechanism 3 and the movement path of the second holding mechanism 6 during the operation of the cutting device 100 . Furthermore, in the present embodiment, all operations or control of the operation of the cutting device 100, such as conveyance of the sealed substrate W, cutting of the sealed substrate W, inspection of the product P, etc., are performed or controlled by the control unit CTL (see FIG. 1 )conduct.

基板供給機構11的基板供給部112使收容於基板收容部111的密封完畢基板W向由第一保持機構3保持的保持位置RP移動。The substrate supply unit 112 of the substrate supply mechanism 11 moves the sealed substrate W stored in the substrate storage unit 111 to the holding position RP held by the first holding mechanism 3 .

繼而,搬送用移動機構7使第一保持機構3移動至保持位置RP,第一保持機構3吸附保持密封完畢基板W。其後,搬送用移動機構7使保持有密封完畢基板W的第一保持機構3移動至切斷用工作台2A、切斷用工作台2B,第一保持機構3解除吸附保持,將密封完畢基板W載置於切斷用工作台2A、切斷用工作台2B。此時,藉由主移動機構72來調整密封完畢基板W的X方向的位置,藉由水平移動機構74來調整密封完畢基板W的Y方向的位置。而且,切斷用工作台2A、切斷用工作台2B吸附保持密封完畢基板W。Next, the transport moving mechanism 7 moves the first holding mechanism 3 to the holding position RP, and the first holding mechanism 3 absorbs and holds the sealed substrate W. Thereafter, the conveyance moving mechanism 7 moves the first holding mechanism 3 holding the sealed substrate W to the cutting table 2A and the cutting table 2B, and the first holding mechanism 3 releases the adsorption and holding, and the sealed substrate W is removed. W is placed on the cutting table 2A and the cutting table 2B. At this time, the position of the sealed substrate W in the X direction is adjusted by the main moving mechanism 72 , and the position of the sealed substrate W in the Y direction is adjusted by the horizontal movement mechanism 74 . Then, the cutting table 2A and the cutting table 2B suck and hold the sealed substrate W.

此處,於使保持有密封完畢基板W的第一保持機構3移動至切斷用工作台2B的情況下,升降移動機構73使第一保持機構3上升至不與切斷用移動機構8(支持體812)發生物理干擾的位置為止。再者,於使保持有密封完畢基板W的第一保持機構3移動至切斷用工作台2B時,於使支持體812自切斷用工作台2B向移載工作台5側退避的情況下,無需如所述般使第一保持機構3升降。Here, when the first holding mechanism 3 holding the sealed substrate W is moved to the table 2B for cutting, the elevating movement mechanism 73 raises the first holding mechanism 3 so that it does not touch the moving mechanism 8 for cutting ( support 812) to the point where physical interference occurs. Furthermore, when the first holding mechanism 3 holding the sealed substrate W is moved to the cutting table 2B, when the support body 812 is retracted from the cutting table 2B to the transfer table 5 side , it is not necessary to lift and lower the first holding mechanism 3 as described.

於此狀態下,切斷用移動機構8使兩個心軸部42A、42B於X方向及Y方向依序移動,並且切斷用工作台2A、2B旋轉,藉此將密封完畢基板W切斷為格子狀而單片化。In this state, the moving mechanism 8 for cutting moves the two mandrel parts 42A, 42B sequentially in the X direction and the Y direction, and the tables 2A, 2B for cutting are rotated, whereby the sealed substrate W is cut. Singularized for a grid pattern.

於切斷後,搬送用移動機構7使第一清潔機構18移動,將保持於切斷用工作台2A、切斷用工作台2B的多個製品P的上表面側(引線面)清潔。所述清潔之後,搬送用移動機構7使第一保持機構3及第一清潔機構18退避至規定位置。After cutting, the conveyance moving mechanism 7 moves the first cleaning mechanism 18 to clean the upper surfaces (lead surfaces) of the plurality of products P held on the cutting tables 2A and 2B. After the cleaning, the transport moving mechanism 7 retracts the first holding mechanism 3 and the first cleaning mechanism 18 to predetermined positions.

繼而,搬送用移動機構7使第二保持機構6移動至切斷後的切斷用工作台2A、切斷用工作台2B,第二保持機構6吸附保持多個製品P。其後,搬送用移動機構7使保持有多個製品P的第二保持機構6移動至第二清潔機構19。藉此,第二清潔機構19將保持於第二保持機構6的多個製品P的下表面側(封裝面)清潔。Next, the conveyance moving mechanism 7 moves the second holding mechanism 6 to the cutting table 2A and cutting table 2B after cutting, and the second holding mechanism 6 adsorbs and holds a plurality of products P. Thereafter, the conveyance moving mechanism 7 moves the second holding mechanism 6 holding a plurality of products P to the second cleaning mechanism 19 . Thereby, the second cleaning mechanism 19 cleans the lower surface side (seal surface) of the plurality of products P held by the second holding mechanism 6 .

於清潔之後,保持於第二保持機構6的多個製品P藉由檢查部13及反轉機構14進行兩面檢查。其後,搬送用移動機構7使第二保持機構6移動至移載工作台5,第二保持機構6解除吸附保持,將多個製品P載置於移載工作台5。載置於移載工作台5的多個製品P根據由檢查部13所得的檢查結果(良品、不良品等)而由分類機構20分類至各種托盤21。After cleaning, a plurality of products P held by the second holding mechanism 6 are inspected on both sides by the inspection unit 13 and the reversing mechanism 14 . Thereafter, the transport moving mechanism 7 moves the second holding mechanism 6 to the transfer table 5 , and the second holding mechanism 6 releases suction and holding, and places a plurality of products P on the transfer table 5 . A plurality of products P placed on the transfer table 5 are sorted into various trays 21 by the sorting mechanism 20 according to the inspection results (defective products, defective products, etc.) obtained by the inspection unit 13 .

再者,關於兩面檢查,例如,首先於由第二保持機構6吸附保持的狀態下檢查製品P的其中一個面。繼而,自第二保持機構6將製品P移載至反轉機構14的保持工作台141,於由反轉後的保持工作台141吸附保持的狀態下檢查製品P的另一面,藉此可執行兩面檢查。而且,之後的自反轉工作台14向移載工作台5的製品P的搬送可藉由自保持工作台141移載至第二保持機構6來進行。另外,將保持工作台141設為能夠於X方向移動的結構,將保持工作台141或移載工作台5的至少其中一者設為能夠於Z方向移動的結構,使保持工作台141移動至移載工作台5的上方,藉此亦可將製品P搬送至移載工作台5並進行移載。In addition, regarding the double-sided inspection, for example, first, one of the surfaces of the product P is inspected in a state of being sucked and held by the second holding mechanism 6 . Next, the product P is transferred from the second holding mechanism 6 to the holding table 141 of the reversing mechanism 14, and the other side of the product P is inspected while being sucked and held by the reversed holding table 141, thereby performing Check both sides. Further, the subsequent conveyance of the product P from the reversing table 14 to the transfer table 5 can be performed by transferring from the holding table 141 to the second holding mechanism 6 . In addition, the holding table 141 is configured to be movable in the X direction, at least one of the holding table 141 or the transfer table 5 is configured to be movable in the Z direction, and the holding table 141 is moved to Above the transfer table 5, the product P can also be transferred to the transfer table 5 and transferred.

<切斷裝置的對準功能> 本實施形態的切斷裝置100具有下述對準功能,即,不使切斷用工作台2A、切斷用工作台2B(密封完畢基板W)旋轉,而將保持於切斷用工作台2A、切斷用工作台2B的密封完畢基板W與切斷機構4的刀片41A、刀片41B於X方向及Y方向此兩個方向進行對準。 <Alignment function of cutting device> The cutting device 100 of the present embodiment has an alignment function of holding the cutting table 2A and the cutting table 2B (sealed substrate W) without rotating the cutting table 2A. , The sealed substrate W of the table 2B for cutting is aligned with the blade 41A and the blade 41B of the cutting mechanism 4 in two directions of the X direction and the Y direction.

具體而言,如圖10所示,切斷裝置100包括:基準標記M1,設置於切斷用工作台2A、切斷用工作台2B,且與切斷用工作台2A、切斷用工作台2B的旋轉中心RC的相對位置已知;以及攝像相機24,拍攝基準標記M1及對準標記AM。Specifically, as shown in FIG. 10, the cutting device 100 includes: a reference mark M1, which is provided on the cutting table 2A and the cutting table 2B, and is connected to the cutting table 2A and the cutting table. The relative position of the rotation center RC of 2B is known; and the imaging camera 24 photographs the reference mark M1 and the alignment mark AM.

此處,如圖10及圖11所示,本實施形態的切斷用工作台2A、切斷用工作台2B具有:能夠更換的保持用板201;以及保持基部202,能夠裝卸地安裝有保持用板201,使用保持用板201來保持密封完畢基板W。再者,保持用板201是用以保持密封完畢基板W的夾具。Here, as shown in FIG. 10 and FIG. 11 , the cutting table 2A and the cutting table 2B of the present embodiment have: a replaceable holding plate 201; Using the plate 201 , the sealed substrate W is held using the holding plate 201 . Furthermore, the holding plate 201 is a jig for holding the sealed substrate W. As shown in FIG.

基準標記M1設置於切斷用工作台2A、切斷用工作台2B的保持用板201的上表面。所述保持用板201保持矩形形狀的密封完畢基板W,於與所述密封完畢基板W的短邊部相對應的部位設置有兩個基準標記M1。再者,基準標記M1可為一個,亦可為三個以上。The reference mark M1 is provided on the upper surface of the holding plate 201 of the cutting table 2A and the cutting table 2B. The holding plate 201 holds the sealed substrate W having a rectangular shape, and two reference marks M1 are provided at positions corresponding to short sides of the sealed substrate W. As shown in FIG. Furthermore, there may be one reference mark M1, or three or more reference marks.

另外,於切斷用工作台2A、切斷用工作台2B的保持基部202的上表面,設置有用以求出切斷用工作台2A、切斷用工作台2B的旋轉中心RC的中心算出用標記M2。所述中心算出用標記M2設置於在保持基部202安裝有保持用板201的狀態下能夠藉由攝像相機24拍攝的位置處。本實施形態的中心算出用標記M2以於藉由切斷用工作台2A、切斷用工作台2B使密封完畢基板W的長邊方向與Y方向一致的狀態下與旋轉中心RC於X方向位於同一直線上的方式設置(參照圖10)。In addition, on the upper surface of the holding base 202 of the table 2A for cutting and the table 2B for cutting, a center calculation device for obtaining the center of rotation RC of the table 2A for cutting and the table 2B for cutting is provided. Mark M2. The center calculation mark M2 is provided at a position where it can be imaged by the imaging camera 24 in a state where the holding plate 201 is attached to the holding base 202 . The mark M2 for center calculation of the present embodiment is located in the X direction with respect to the rotation center RC in a state where the long side direction of the sealed substrate W coincides with the Y direction by the cutting table 2A and the cutting table 2B. Set on the same straight line (refer to Figure 10).

如圖1~圖3及圖10所示,攝像相機24設置於兩個心軸部42A、42B的其中一者(此處為心軸部42A),與所述心軸部42A一起移動。即,攝像相機24能夠沿著切斷用移動機構8的X方向導軌811於X方向移動,能夠沿著支持體812於Y方向移動。本實施形態的攝像相機24是廣視野且高解析度的相機,能夠於一次拍攝中檢測多個標記。As shown in FIGS. 1 to 3 and 10 , the imaging camera 24 is installed on one of the two spindle parts 42A and 42B (here, the spindle part 42A), and moves together with the spindle part 42A. That is, the imaging camera 24 can move in the X direction along the X direction guide rail 811 of the moving mechanism 8 for cutting, and can move in the Y direction along the support body 812 . The imaging camera 24 of this embodiment is a camera with a wide field of view and high resolution, and can detect a plurality of marks in one shot.

而且,切斷裝置100使攝像相機24相對於密封完畢基板W於一方向(此處為長邊方向)移動的同時拍攝密封完畢基板W的對準標記AM,基於所拍攝的對準標記AM及基準標記M1,進行於長邊方向及短邊方向的密封完畢基板W與切斷機構4的刀片41A、刀片41B的對準。Then, the cutting apparatus 100 images the alignment mark AM of the sealed substrate W while moving the imaging camera 24 in one direction (here, the longitudinal direction) relative to the sealed substrate W, and based on the imaged alignment mark AM and The reference marks M1 are used to align the sealed substrate W with the blades 41A and 41B of the cutting mechanism 4 in the longitudinal direction and the lateral direction.

具體而言,對於切斷裝置100,設為保持於切斷用工作台2A、切斷用工作台2B的密封完畢基板W的長邊方向沿著Y方向的狀態,於此狀態下使攝像相機24沿著支持體812於Y方向移動的同時分別拍攝設置於密封完畢基板W的多個對準標記AM。Specifically, in the cutting device 100, the longitudinal direction of the sealed substrate W held on the cutting table 2A and the cutting table 2B is in the Y direction, and the imaging camera is set in this state. 24 moves in the Y direction along the support body 812 and photographs a plurality of alignment marks AM provided on the sealed substrate W, respectively.

於本實施形態中,於密封完畢基板W的沿著長邊方向的兩個相向邊部分別設置有多個對準標記AM,如圖12所示,使其中一個相向邊部(於圖12中為左側邊部)的多個對準標記AM沿著Y方向(長邊方向)移動,同時進行拍攝,其後,使支持體812於X方向移動,使另一相向邊部(於圖12中為右側邊部)的多個對準標記AM沿著Y方向(長邊方向)移動,同時進行拍攝。In this embodiment, a plurality of alignment marks AM are respectively provided on two facing sides of the sealed substrate W along the longitudinal direction, as shown in FIG. 12 , one of the facing sides (in FIG. 12 A plurality of alignment marks AM on the left side) is moved along the Y direction (long side direction) and photographed at the same time, and then the support body 812 is moved in the X direction to make the other opposite side (in FIG. 12 A plurality of alignment marks AM on the right side) moves along the Y direction (long side direction) and shoots at the same time.

於圖12的密封完畢基板W的對準動作中,進行兩次拍攝基準標記M1的動作以及十次拍攝對準標記AM的動作、即共計十二次的動作。即,於各拍攝動作中攝像相機24被定位於規定的攝像位置。再者,於圖12所示的密封完畢基板W中設置有十二個對準標記AM,但於本實施形態的攝像相機24中,藉由一次拍攝動作拍攝分別位於四個角的兩個對準標記AM。具體而言,將兩個對準標記AM所示的切斷線交叉的點配置於圖像的中央來進行拍攝後,檢測對準標記AM的位置。In the alignment operation of the sealed substrate W in FIG. 12 , the operation of imaging the reference mark M1 twice and the operation of imaging the alignment mark AM ten times, that is, a total of twelve operations are performed. That is, the imaging camera 24 is positioned at a predetermined imaging position in each imaging operation. Furthermore, twelve alignment marks AM are provided on the sealed substrate W shown in FIG. Associate Mark AM. Specifically, a point where the cutting lines indicated by two alignment marks AM intersect is arranged at the center of the image and photographed, and then the position of alignment marks AM is detected.

另外,本實施形態的切斷裝置100具有使用中心算出用標記M2來算出切斷用工作台2A、切斷用工作台2B的旋轉中心RC的功能。具體而言,於圖13的(a)的狀態、即中心算出用標記M2位於左側的狀態下,對中心算出用標記M2進行拍攝,並且於圖13的(b)的狀態、即、使切斷用工作台2A、切斷用工作台2B旋轉規定角度(於本實施形態中為180度)而中心算出用標記M2位於右側的狀態下,對中心算出用標記M2進行拍攝。根據拍攝所述兩個攝像圖像時的攝像相機24的位置、與旋轉前的中心算出用標記M2的座標及旋轉後的中心算出用標記M2的座標,算出切斷用工作台2A、切斷用工作台2B的旋轉中心RC的座標。In addition, the cutting device 100 of the present embodiment has a function of calculating the rotation center RC of the cutting table 2A and the cutting table 2B using the center calculation marker M2. Specifically, in the state of (a) of FIG. 13 , that is, in the state where the center calculation mark M2 is on the left side, the center calculation mark M2 is photographed, and in the state of (b) of FIG. 13 , that is, the cut The center calculation mark M2 is photographed in a state in which the cutting table 2A and the cutting table 2B are rotated by a predetermined angle (180 degrees in this embodiment) and the center calculation mark M2 is located on the right side. Based on the position of the imaging camera 24 when the two captured images are taken, the coordinates of the center calculation mark M2 before rotation, and the coordinates of the center calculation mark M2 after rotation, the table 2A for cutting and the cutting table 2A are calculated. Use the coordinates of the center of rotation RC of table 2B.

另外,本實施形態的切斷裝置100於拍攝密封完畢基板W的對準標記AM之前,藉由攝像相機24拍攝基準標記M1,算出攝像相機24的位置的偏移量(特別是Y方向的偏移量)。然後,切斷裝置100修正攝像相機24的偏移量,同時拍攝多個對準標記AM。藉由如此使用基準標記M1來修正攝像相機24的位置的偏移量,而無需高精度的線性標度尺(linear scale),例如可使用內置於伺服馬達的旋轉編碼器。In addition, before the cutting apparatus 100 of this embodiment images the alignment mark AM of the sealed substrate W, the imaging camera 24 images the reference mark M1, and calculates the displacement amount of the imaging camera 24 (especially, the deviation in the Y direction). displacement). Then, the cutting device 100 corrects the displacement amount of the imaging camera 24, and simultaneously images a plurality of alignment marks AM. By using the reference mark M1 in this way to correct the displacement of the position of the imaging camera 24, a high-precision linear scale (linear scale) is not required, for example, a rotary encoder built in a servo motor can be used.

<對準動作及切斷動作的詳細情況> 以下,參照圖14對本實施形態的切斷裝置100的對準動作及切斷動作進行說明。再者,以下的對準動作及切斷動作由控制部CTL控制。 <Details of alignment and cutting operations> Hereinafter, an alignment operation and a cutting operation of the cutting device 100 according to the present embodiment will be described with reference to FIG. 14 . In addition, the following alignment operation and cutting operation are controlled by the control part CTL.

(步驟S1:旋轉中心RC的確定) 首先,於使切斷用工作台2A、切斷用工作台2B旋轉規定角度(此處為180度)之前以及使切斷用工作台2A、切斷用工作台2B旋轉規定角度(此處為180度)之後,藉由攝像相機24對設置於切斷用工作台2A、切斷用工作台2B的中心算出用標記M2進行拍攝(參照圖13的(a)及圖13的(b))。然後,控制部CTL根據由旋轉前的攝像圖像求出的旋轉前的中心算出用標記M2的座標以及由旋轉後的攝像圖像求出的中心算出用標記M2的座標,算出切斷用工作台2A、切斷用工作台2B的旋轉中心RC的座標。再者,於兩個切斷用工作台2A、2B分別進行所述動作,算出兩個切斷用工作台2A、2B各自的旋轉中心RC的座標。 (Step S1: determination of the center of rotation RC) First, before turning the table 2A for cutting and the table 2B for cutting by a predetermined angle (here, 180 degrees), and before rotating the table 2A for cutting, the table 2B for cutting by a predetermined angle (here, 180 degrees) 180 degrees), the center calculation mark M2 provided on the cutting table 2A and the cutting table 2B is photographed by the camera 24 (refer to FIG. 13 (a) and FIG. 13 (b)) . Then, the control unit CTL calculates the cutting operation based on the coordinates of the center calculation mark M2 before rotation obtained from the captured image before rotation and the coordinates of the center calculation mark M2 obtained from the captured image after rotation. The coordinates of the rotation center RC of the table 2A and the cutting table 2B. Furthermore, the above operation is performed on the two cutting tables 2A, 2B, respectively, and the coordinates of the respective rotation centers RC of the two cutting tables 2A, 2B are calculated.

(步驟S2:算出基準標記M1與旋轉中心RC的距離L1、距離L2) 繼而,對設置於保持用板201的基準標記M1分別藉由攝像相機24進行拍攝。然後,根據所述攝像圖像算出基準標記M1與切斷用工作台2A、切斷用工作台2B的旋轉中心RC的長邊方向的距離L1以及短邊方向的距離L2(參照圖15的(a)及圖15的(b))。藉此,確定基準標記M1與旋轉中心RC的相對位置。再者,該些距離L1、L2亦可使用設置於支持體812的線性標度尺(未圖示)來測定。 (Step S2: Calculate the distance L1 and distance L2 between the reference mark M1 and the rotation center RC) Next, the imaging camera 24 images each of the reference marks M1 provided on the holding plate 201 . Then, the distance L1 in the longitudinal direction and the distance L2 in the lateral direction between the reference mark M1 and the center of rotation RC of the table 2A for cutting and the table 2B for cutting are calculated from the captured image (see ( a) and (b) of Figure 15). Thereby, the relative position of the reference mark M1 and the rotation center RC is determined. Furthermore, these distances L1 and L2 can also be measured using a linear scale (not shown) provided on the support body 812 .

(步驟S3:理想切斷線的算出) 然後,控制部CTL以切斷用工作台2A、切斷用工作台2B的旋轉中心RC為基準,算出密封完畢基板W的長邊方向及短邊方向的理想切斷線。再者,理想切斷線根據密封完畢基板W的品種而決定,每次變更密封完畢基板W的品種時,進行所述步驟S1~步驟S3。 (Step S3: Calculation of ideal cutting line) Then, the control unit CTL calculates ideal cutting lines in the longitudinal direction and the short direction of the sealed substrate W with reference to the rotation centers RC of the cutting table 2A and the cutting table 2B. In addition, the ideal cutting line is determined according to the type of the sealed substrate W, and each time the type of the sealed substrate W is changed, the steps S1 to S3 are performed.

(步驟S4:密封完畢基板W的保持) 於保持用板201載置密封完畢基板W,於切斷用工作台2A、切斷用工作台2B保持密封完畢基板W。此時,切斷用工作台2A、切斷用工作台2B處於所保持的密封完畢基板W的長邊方向與Y方向(支持體812的長邊方向)一致的狀態。再者,於以下的步驟S5~步驟S8中,切斷用工作台2A、切斷用工作台2B不旋轉而被固定。 (Step S4: Holding of the sealed substrate W) The sealed substrate W is placed on the holding plate 201 , and the sealed substrate W is held on the cutting table 2A and the cutting table 2B. At this time, the cutting table 2A and the cutting table 2B are in a state where the longitudinal direction of the held sealed substrate W coincides with the Y direction (the longitudinal direction of the support 812 ). In addition, in the following steps S5 - S8, the cutting table 2A and the cutting table 2B are fixed without being rotated.

(步驟S5:算出攝像相機24的偏移量) 藉由攝像相機24對設置於保持用板201的基準標記M1進行拍攝。然後,根據所述攝像圖像及攝像相機24的位置來算出攝像相機24的位置的偏移量。 (Step S5: Calculate the offset of the imaging camera 24) The reference mark M1 provided on the holding plate 201 is imaged by the imaging camera 24 . Then, the displacement amount of the position of the imaging camera 24 is calculated from the captured image and the position of the imaging camera 24 .

(步驟S6:對準標記AM的拍攝) 控制部CTL一面修正所算出的攝像相機24的位置的偏移量,一面使攝像相機24於密封完畢基板W的長邊方向(Y方向)移動的同時分別拍攝密封完畢基板W的多個對準標記AM(參照圖12)。所述多個對準標記AM的拍攝於使切斷用工作台2A、切斷用工作台2B(密封完畢基板W)不旋轉、即密封完畢基板W的長邊方向與Y方向一致地被固定的狀態下進行。 (Step S6: Shooting of Alignment Mark AM) The control unit CTL corrects the calculated displacement of the imaging camera 24 and moves the imaging camera 24 in the longitudinal direction (Y direction) of the sealed substrate W while photographing a plurality of alignments of the sealed substrate W. Mark AM (see Figure 12). The multiple alignment marks AM are photographed when the cutting table 2A and the cutting table 2B (sealed substrate W) are not rotated, that is, the longitudinal direction of the sealed substrate W is fixed in line with the Y direction. carried out in the state.

(步驟S7:對所有對準標記進行拍攝?) 於藉由所述步驟S6對密封完畢基板W的多個對準標記AM的全部進行了拍攝的情況下,轉移至下一步驟S8。另一方面,於並未拍攝密封完畢基板W的多個對準標記AM的全部的情況下,返回至所述步驟S6。 (Step S7: Take pictures of all alignment marks?) When all of the some alignment mark AM of the sealed board|substrate W was imaged by said step S6, it transfers to next step S8. On the other hand, when not all of the some alignment mark AM of the sealed board|substrate W was imaged, it returns to said step S6.

(步驟S8:實測切斷線的算出) 控制部CTL基於所拍攝的多個對準標記AM及基準標記M1,算出密封完畢基板W的長邊方向及短邊方向的實測切斷線。即,藉由不使密封完畢基板W旋轉而僅於密封完畢基板W的長邊方向拍攝對準標記AM的動作,算出長邊方向的實測切斷線及短邊方向的實測切斷線此兩者。 (Step S8: Calculation of actually measured cutting line) The control part CTL calculates the actual measurement cutting|disconnection line of the long side direction and the short side direction of the sealed board|substrate W based on the several alignment mark AM and reference mark M1 which were imaged. That is, by imaging the alignment mark AM only in the long-side direction of the sealed substrate W without rotating the sealed substrate W, both the actually measured cutting line in the long-side direction and the actually measured cutting line in the short-side direction are calculated. By.

(步驟S9:實測切斷線的偏移量的算出) 控制部CTL算出藉由所述步驟S3所獲得的理想切斷線與藉由所述步驟S8所獲得的實測切斷線的偏移量。 (Step S9: Calculation of Offset Amount of Actually Measured Cutting Line) The control unit CTL calculates the amount of deviation between the ideal cutting line obtained in the step S3 and the measured cutting line obtained in the step S8.

(步驟S10:偏移量的修正) 控制部CTL基於藉由所述步驟S9所算出的偏移量,使切斷用工作台2A、切斷用工作台2B旋轉並且使心軸部42A、心軸部42B移動來修正偏移量。 (Step S10: correction of offset) The control unit CTL rotates the cutting table 2A and the cutting table 2B and moves the mandrel 42A and 42B based on the misalignment calculated in step S9 to correct the misalignment.

(步驟S11:短邊方向的切斷) 於藉由所述步驟S10修正了偏移量之後,使心軸部42A、心軸部42B於X方向(切斷進給方向)移動來切斷密封完畢基板W的短邊方向,並且使心軸部42A、心軸部42B於Y方向(間距進給方向)移動來將密封完畢基板W切斷成多個。再者,於所述短邊方向的切斷時,切斷用工作台2A、切斷用工作台2B被固定。 (Step S11: cutting in the short side direction) After the offset is corrected in step S10, the mandrel 42A and 42B are moved in the X direction (cutting feeding direction) to cut the short side direction of the sealed substrate W, and the core The shaft portion 42A and the mandrel portion 42B move in the Y direction (pitch feeding direction) to cut the sealed substrate W into a plurality of pieces. In addition, at the time of cutting in the said short-side direction, the table 2A for cutting, and the table 2B for cutting are fixed.

(步驟S12:密封完畢基板W的旋轉) 於藉由步驟S11結束了密封完畢基板W的短邊方向的切斷之後,使切斷用工作台2A、切斷用工作台2B旋轉90度,而使密封完畢基板W旋轉90度。 (Step S12: rotation of substrate W after sealing) After the cutting of the sealed substrate W in the short side direction is completed in step S11, the cutting table 2A and the cutting table 2B are rotated by 90 degrees, and the sealed substrate W is rotated by 90 degrees.

(步驟S13:長邊方向的切斷) 使心軸部42A、心軸部42B於X方向(切斷進給方向)移動來切斷密封完畢基板W的長邊方向,並且使心軸部42A、心軸部42B於Y方向(間距進給方向)移動來將密封完畢基板W切斷成多個。再者,於所述長邊方向的切斷時切斷用工作台2A、切斷用工作台2B被固定。 (Step S13: cutting in the longitudinal direction) The mandrel part 42A, 42B is moved in the X direction (cutting feed direction) to cut the longitudinal direction of the sealed substrate W, and the mandrel part 42A, the mandrel part 42B is moved in the Y direction (pitch advance direction). direction) to cut the sealed substrate W into multiple pieces. In addition, the table 2A for cutting, and the table 2B for cutting are fixed at the time of cutting in the said longitudinal direction.

<本實施形態的效果> 根據本實施形態的切斷裝置100,可於不使密封完畢基板W旋轉的情況下使攝像相機24相對於密封完畢基板W於長邊方向移動的同時拍攝對準標記AM,並基於所拍攝的對準標記AM及基準標記M1,進行於長邊方向及短邊方向此兩個方向的密封完畢基板W與切斷機構4的刀片41A、刀片41B的對準。即,根據本實施形態的切斷裝置100,僅於長邊方向進行對準動作即可,因此無需於使密封完畢基板W旋轉的前後分別拍攝密封完畢基板W的對準標記AM的動作。其結果,可減少拍攝對準標記AM的次數,縮短對準動作所花費的時間。 <Effects of this embodiment> According to the cutting device 100 of the present embodiment, the alignment mark AM can be imaged while the imaging camera 24 is moved in the longitudinal direction relative to the sealed substrate W without rotating the sealed substrate W, and based on the imaged The alignment mark AM and the reference mark M1 align the sealed substrate W with the blades 41A and 41B of the cutting mechanism 4 in two directions, the longitudinal direction and the lateral direction. That is, according to the cutting device 100 of the present embodiment, only the alignment operation is performed in the longitudinal direction, and therefore there is no need to photograph the alignment marks AM of the sealed substrate W before and after the sealed substrate W is rotated. As a result, the number of times of imaging the alignment mark AM can be reduced, and the time taken for the alignment operation can be shortened.

此外,於本實施形態中,設為藉由沿著切斷用工作台2A、切斷用工作台2B及移載工作台5的排列方向延伸的共用的傳遞軸71來使第一保持機構3及第二保持機構6移動的結構,藉由切斷用移動機構8使切斷機構4於水平面上於沿著傳遞軸71的X方向及與X方向正交的Y方向分別移動,因此可不使切斷用工作台2A、切斷用工作台2B於X方向及Y方向移動而對密封完畢基板W進行加工。因此,可不藉由滾珠螺桿機構使切斷用工作台2A、切斷用工作台2B移動,而無需用以保護滾珠螺桿機構的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果為,可使切斷裝置100的裝置結構簡化。另外,可設為不使切斷用工作台2A、切斷用工作台2B於X方向及Y方向移動的結構,可減小切斷裝置100的佔據面積。In addition, in this embodiment, it is assumed that the first holding mechanism 3 is moved by the common transmission shaft 71 extending along the arrangement direction of the cutting table 2A, the cutting table 2B, and the transfer table 5. And the structure that the second holding mechanism 6 moves, the cutting mechanism 4 is moved on the horizontal plane in the X direction along the transmission shaft 71 and the Y direction orthogonal to the X direction by the moving mechanism 8 for cutting, so it is not necessary to use The cutting table 2A and the cutting table 2B move in the X direction and the Y direction to process the sealed substrate W. Therefore, the cutting table 2A and the cutting table 2B can be moved without using the ball screw mechanism, and the bellows member for protecting the ball screw mechanism and the cover member for protecting the bellows member are unnecessary. As a result, the device structure of the cutting device 100 can be simplified. In addition, the cutting table 2A and the cutting table 2B can be configured so as not to move in the X direction and the Y direction, and the occupied area of the cutting device 100 can be reduced.

<其他變形實施形態> 再者,本發明並不限於所述實施形態。 <Other modified implementation forms> In addition, this invention is not limited to the said embodiment.

例如,於所述實施形態中,進行不使密封完畢基板W旋轉而僅於密封完畢基板W的長邊方向拍攝對準標記AM的動作,但亦可進行不使密封完畢基板W旋轉而僅於密封完畢基板W的短邊方向拍攝對準標記AM的動作。於進行僅於短邊方向拍攝對準標記AM的動作的情況下,關於切斷,可首先進行長邊方向,其後使切斷用工作台旋轉90度後進行短邊方向。For example, in the above-described embodiment, the alignment mark AM is imaged only in the longitudinal direction of the sealed substrate W without rotating the sealed substrate W. The movement of the alignment mark AM is photographed in the short side direction of the sealed substrate W. When performing the operation of imaging the alignment marks AM only in the short-side direction, cutting may be performed in the long-side direction first, and then performed in the short-side direction after rotating the table for cutting by 90 degrees.

另外,所述實施形態的加工對象物是矩形形狀的密封完畢基板W,但亦可為形成例如圓形等矩形形狀以外的形狀的加工對象物。In addition, although the object to be processed in the above-described embodiment is the sealed substrate W having a rectangular shape, it may be an object to be processed that has a shape other than a rectangular shape such as a circle, for example.

於所述實施形態中,對雙切割工作台方式且雙心軸結構的切斷裝置進行了說明,但並不限於此,亦可為單切割工作台方式且單心軸結構的切斷裝置、或單切割工作台方式且雙心軸結構的切斷裝置等。In the above-mentioned embodiment, the cutting device of the double cutting table type and the double mandrel structure has been described, but it is not limited to this, and the cutting device of the single cutting table type and the single mandrel structure, Or a cutting device with a single cutting table and a double mandrel structure.

另外,所述實施形態的移載工作台5為於分類至各種托盤21之前暫時載置的分度工作台,但亦可將移載工作台5設為反轉機構14的保持工作台141。In addition, the transfer table 5 in the above-mentioned embodiment is an index table placed temporarily before being sorted into various trays 21 , but the transfer table 5 may also be used as the holding table 141 of the reversing mechanism 14 .

進而,於所述實施形態中,為自移載工作台5分類至托盤21的結構,但亦可為將製品P搬送並貼附於框狀構件的內側所配置的黏接帶上的結構。Furthermore, in the above-mentioned embodiment, it is a structure in which it is sorted from the transfer table 5 to the tray 21, but it may be a structure in which the product P is conveyed and stuck to the adhesive tape arrange|positioned inside the frame-shaped member.

而且,於所述實施形態的結構中,亦可設為下述結構,即:於切斷用工作台2A、切斷用工作台2B中不將密封完畢基板切斷,而是形成槽。於此情況下,例如亦可設為下述結構,即:於切斷用工作台2A、切斷用工作台2B實施了槽加工的密封完畢基板W藉由第一保持機構3及搬送用移動機構7而回到基板供給部112。另外,亦可設為下述結構,即:將回到所述基板供給部112的密封完畢基板W收容於基板收容部111。Furthermore, in the configuration of the above-described embodiment, a configuration may be adopted in which grooves are formed without cutting the sealed substrate on the cutting table 2A and the cutting table 2B. In this case, for example, a structure may be adopted in which the sealed substrate W on which the groove processing has been applied to the cutting table 2A and the cutting table 2B is moved by the first holding mechanism 3 and the conveyance. mechanism 7 and returns to the substrate supply unit 112 . In addition, a configuration may be adopted in which the sealed substrate W returned to the substrate supply unit 112 is accommodated in the substrate storage unit 111 .

另外,構成傳遞軸71的凸輪齒條要素可將多個連結而構成,因此例如可將切斷裝置(加工裝置)100設為於第二清潔機構19與檢查部13之間能夠分離及連結(能夠裝卸)的模組結構。於此情況下,例如可於第二清潔機構19側的模組、與檢查部13側的模組之間,追加進行與檢查部13中的檢查為不同種類的檢查的模組。再者,除了此處例示的結構以外,亦可將切斷裝置(加工裝置)100設為能夠於某處分離及連結(能夠裝卸)的模組結構,亦可將追加的模組設為檢查以外的各種功能的模組。In addition, since a plurality of cam rack elements constituting the transmission shaft 71 can be connected, for example, the cutting device (processing device) 100 can be separated and connected between the second cleaning mechanism 19 and the inspection unit 13 ( Can be loaded and unloaded) module structure. In this case, for example, a module that performs a different type of inspection from the inspection in the inspection unit 13 may be added between the module on the second cleaning mechanism 19 side and the module on the inspection unit 13 side. Furthermore, in addition to the structure exemplified here, the cutting device (processing device) 100 may also have a module structure that can be separated and connected (detachable) somewhere, and an additional module may be used as an inspection Modules for various functions other than

另外,本發明的加工裝置亦可進行切斷以外的加工,例如亦可進行切削或磨削等其他機械加工。In addition, the processing device of the present invention can also perform processing other than cutting, for example, other mechanical processing such as cutting or grinding.

此外,本發明不限於所述實施形態,當然能夠於不偏離其主旨的範圍進行各種變形。 [產業上的可利用性] In addition, this invention is not limited to the said embodiment, Of course, a various deformation|transformation is possible in the range which does not deviate from the summary. [industrial availability]

根據本發明,可縮短對準動作所花費的時間。According to the present invention, the time taken for the alignment operation can be shortened.

2A、2B:切斷用工作台(加工工作台) 3:第一保持機構 4:切斷機構(加工機構) 5:移載工作台 6:第二保持機構 7:搬送用移動機構 8:切斷用移動機構(加工用移動機構) 9A、9B:旋轉機構 10A、10B:真空泵 11:基板供給機構 12:液體供給機構 13:檢查部 14:反轉機構(反轉工作台) 17:加工屑收容部 18:第一清潔機構 18a、121:噴射噴嘴 19:第二清潔機構 20:分類機構 21:托盤 22:托盤搬送機構 23:托盤收容部 24:攝像相機 31、61:吸附頭 40:旋轉工具 41A、41B:刀片 42A、42B:心軸部 71:傳遞軸 72:主移動機構 73:升降移動機構 73a:Z方向導軌 73b:致動器部 74:水平移動機構 74a:Y方向導軌 74b:彈性體 74c:凸輪機構 81:X方向移動部 82:Y方向移動部 83:Z方向移動部 100:切斷裝置(加工裝置) 111:基板收容部 112:基板供給部 113:加熱部 131:第一檢查部 132:第二檢查部 141:保持工作台 142:反轉部 171:導引滑槽 171X:上部開口 172:回收容器 173:分離部 181:升降移動機構 201:保持用板 202:保持基部 311、611:吸附部 721:導軌 722:齒條與小齒輪機構 722a:凸輪齒條 722b:小齒輪 722b1:滾子本體 722b2:滾子銷 723:滑動構件 811:X方向導軌 812:支持體 813:滾珠螺桿機構 821:Y方向導軌 822:Y方向滑塊 823:線性馬達 831:Z方向導軌 832:Z方向滑塊 CTL:控制部 P:製品 RP:保持位置 S:加工屑 M1:基準標記 M2:中心算出用標記 AM:對準標記 RC:旋轉中心 L1、L2:距離 W:密封完畢基板(加工對象物) X、Y、Z、θ:方向 S1、S2、S3、S4、S5、S6、S7、S8、S9、S10、S11、S12、S13:步驟 2A, 2B: Table for cutting (processing table) 3: The first holding mechanism 4: Cutting mechanism (processing mechanism) 5: Transfer workbench 6: The second holding mechanism 7: Moving mechanism for conveying 8: Moving mechanism for cutting (moving mechanism for processing) 9A, 9B: rotating mechanism 10A, 10B: vacuum pump 11: Substrate supply mechanism 12: Liquid supply mechanism 13: Inspection Department 14: Reverse mechanism (reverse workbench) 17: Processing swarf storage unit 18: The first cleaning agency 18a, 121: spray nozzle 19: The second cleaning mechanism 20: Classification agency 21: tray 22: Pallet transfer mechanism 23: Tray Storage Department 24: video camera 31, 61: adsorption head 40:Rotary tool 41A, 41B: Blades 42A, 42B: mandrel part 71: Transmission shaft 72: Main moving mechanism 73: Lifting and moving mechanism 73a:Z direction guide rail 73b: Actuator part 74: Horizontal movement mechanism 74a: Y direction guide rail 74b: Elastomer 74c: Cam Mechanism 81: X direction moving part 82: Y direction moving part 83: Z direction moving part 100: Cutting device (processing device) 111: Substrate storage unit 112: Substrate supply department 113: heating part 131: First Inspection Department 132:Second inspection department 141:Hold workbench 142: Inversion Department 171: guide chute 171X: Upper opening 172: Recycling container 173: Separation Department 181: Lifting and moving mechanism 201: Hold the board 202: keep the base 311, 611: adsorption part 721: guide rail 722: Rack and Pinion Mechanism 722a: Cam rack 722b: Pinion 722b1: Roller body 722b2: Roller pin 723: sliding components 811: X direction guide rail 812: Support body 813: Ball screw mechanism 821: Y direction guide rail 822: Y direction slider 823:Linear motor 831:Z direction guide rail 832:Z direction slider CTL: control department P: Products RP: hold position S: processing chips M1: fiducial mark M2: Mark for center calculation AM: Alignment Mark RC: center of rotation L1, L2: Distance W: Sealed substrate (object to be processed) X, Y, Z, θ: direction S1, S2, S3, S4, S5, S6, S7, S8, S9, S10, S11, S12, S13: steps

圖1為示意性地表示本發明的一實施形態的切斷裝置的結構的圖。 圖2為示意性地表示所述實施形態的切斷用工作台及其周邊結構的立體圖。 圖3為示意性地表示所述實施形態的切斷用工作台及其周邊結構的結構的、自Z方向觀看的圖(平面圖)。 圖4為示意性地表示所述實施形態的切斷用工作台及其周邊結構的結構的、自Y方向觀看的圖(正面圖)。 圖5為示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自Y方向觀看的圖(正面圖)。 圖6為示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自X方向觀看的圖(側面圖)。 圖7為示意性地表示所述實施形態的第二保持機構及搬送用移動機構的結構的、自Y方向觀看的圖(正面圖)。 圖8為示意性地表示所述實施形態的齒條與小齒輪(rack and pinion)機構的結構的剖面圖。 圖9為表示所述實施形態的切斷裝置的動作的示意圖。 圖10為表示所述實施形態的切斷用工作台上配置有密封完畢基板的狀態的平面圖。 圖11為表示所述實施形態的保持用板及保持基部的結構的示意圖。 圖12為示意性地表示所述實施形態的拍攝基準標記及對準標記的動作的圖。 圖13的(a)及圖13的(b)為示意性地表示所述實施形態的用以求出切斷用工作台的旋轉中心的動作的圖。 圖14為所述實施形態的對準動作及切斷動作的流程圖。 圖15的(a)及圖15的(b)為示意性地表示所述實施形態的求出自旋轉中心至基準標記的距離的方法的圖。 FIG. 1 is a diagram schematically showing the structure of a cutting device according to an embodiment of the present invention. Fig. 2 is a perspective view schematically showing the cutting table and its peripheral structures according to the embodiment. 3 is a view (plan view) seen from the Z direction, schematically showing the structure of the table for cutting and its peripheral structures according to the embodiment. 4 is a view (front view) seen from the Y direction, schematically showing the structure of the table for cutting and its peripheral structure according to the embodiment. 5 is a view (front view) seen from the Y direction, schematically showing the configuration of the first holding mechanism and the moving mechanism for conveyance according to the embodiment. 6 is a view (side view) seen from the X direction, schematically showing the configuration of the first holding mechanism and the moving mechanism for conveyance according to the embodiment. 7 is a view (front view) seen from the Y direction, schematically showing the configuration of the second holding mechanism and the moving mechanism for conveyance according to the embodiment. FIG. 8 is a cross-sectional view schematically showing the structure of a rack and pinion mechanism according to the embodiment. Fig. 9 is a schematic diagram showing the operation of the cutting device according to the embodiment. FIG. 10 is a plan view showing a state in which sealed substrates are placed on the cutting table according to the embodiment. Fig. 11 is a schematic view showing the structure of the holding plate and the holding base of the embodiment. FIG. 12 is a diagram schematically showing the operation of imaging reference marks and alignment marks in the embodiment. FIG. 13( a ) and FIG. 13( b ) are diagrams schematically showing operations for obtaining the rotation center of the cutting table in the embodiment. Fig. 14 is a flowchart of the alignment operation and the cutting operation of the embodiment. FIG. 15( a ) and FIG. 15( b ) are diagrams schematically showing a method of calculating the distance from the rotation center to the reference mark in the embodiment.

2A、2B:切斷用工作台(加工用工作台) 2A, 2B: Table for cutting (table for processing)

AM:對準標記 AM: Alignment Mark

M1:基準標記 M1: fiducial mark

M2:中心算出用標記 M2: Mark for center calculation

201:保持用板 201: Hold the board

202:保持基部 202: keep the base

X、Y:方向 X, Y: direction

Claims (9)

一種加工裝置,包括: 加工工作台,保持設置有對準標記的加工對象物並且能夠旋轉; 加工機構,對保持於所述加工工作台的所述加工對象物進行加工; 基準標記,設置於所述加工工作台,且與所述加工工作台的旋轉中心的相對位置已知;以及 攝像相機,拍攝所述基準標記及所述對準標記, 使所述攝像相機相對於所述加工對象物於一方向移動的同時拍攝所述對準標記,基於所拍攝的所述對準標記及所述基準標記,進行於所述一方向及與所述一方向正交的方向的所述加工對象物與所述加工機構的對準。 A processing device comprising: The processing table holds the object to be processed with the alignment mark and is capable of rotating; a processing mechanism for processing the object to be processed held on the processing table; a fiducial mark is arranged on the processing table, and its relative position to the rotation center of the processing table is known; and a camera for photographing the fiducial mark and the alignment mark, The imaging camera is moved in one direction with respect to the object to be processed, and the alignment mark is photographed, and based on the photographed alignment mark and the reference mark, the process is carried out in the one direction and in relation to the Alignment of the object to be processed and the processing mechanism in a direction perpendicular to one direction. 如請求項1所述的加工裝置,其中,所述加工對象物呈矩形形狀, 使所述攝像相機於所述加工對象物的長邊方向或短邊方向中的其中一個方向移動的同時拍攝所述對準標記,基於所拍攝的所述對準標記及所述基準標記,進行於所述長邊方向及所述短邊方向的所述加工對象物與所述加工機構的對準。 The processing device according to claim 1, wherein the object to be processed has a rectangular shape, imaging the alignment mark while moving the imaging camera in one of the long-side direction and the short-side direction of the object to be processed, and performing Alignment of the object to be processed and the processing mechanism in the long-side direction and the short-side direction. 如請求項1或請求項2所述的加工裝置,其中,所述加工工作台具有:保持用板,用以保持所述加工對象物;以及保持基部,能夠裝卸地安裝有所述保持用板,使用所述保持用板來保持所述加工對象物, 所述基準標記設置於所述保持用板或所述保持基部。 The processing device according to claim 1 or claim 2, wherein the processing table has: a holding plate for holding the object to be processed; and a holding base on which the holding plate is detachably mounted. , using the holding plate to hold the object to be processed, The reference mark is provided on the holding plate or the holding base. 如請求項1至請求項3中任一項所述的加工裝置,其中,藉由所述攝像相機拍攝所述基準標記,來修正所述攝像相機的偏移量。The processing device according to any one of claim 1 to claim 3, wherein the offset of the camera is corrected by taking pictures of the fiducial marks by the camera. 如請求項4所述的加工裝置,其中,所述偏移量得到修正的所述攝像相機拍攝所述對準標記。The processing device according to claim 4, wherein the imaging camera whose offset has been corrected captures the alignment mark. 如請求項1至請求項5中任一項所述的加工裝置,其中,所述加工工作台設置有用以算出所述加工工作台的旋轉中心的中心算出用標記, 於使所述加工工作台旋轉規定角度的前後,利用所述攝像相機拍攝所述中心用標記藉此算出所述旋轉中心,基於所述所算出的旋轉中心來算出所述基準標記與所述旋轉中心的相對位置。 The processing device according to any one of claim 1 to claim 5, wherein the processing table is provided with a center calculation mark for calculating the rotation center of the processing table, Before and after rotating the processing table by a predetermined angle, the center mark is photographed by the imaging camera to calculate the center of rotation, and the reference mark and the rotation center are calculated based on the calculated center of rotation. The relative position of the center. 如請求項1至請求項6中任一項所述的加工裝置,更包括使所述加工機構於水平面上於相互正交的X方向及Y方向移動的加工用移動機構, 所述加工用移動機構具有:一對X方向導軌,沿著所述X方向夾持所述加工工作台而設置;以及支持體,沿著所述一對X方向導軌移動,並且對所述加工機構以能夠沿著所述Y方向移動的方式予以支持。 The processing device according to any one of claim 1 to claim 6, further comprising a moving mechanism for processing that moves the processing mechanism in mutually orthogonal X and Y directions on a horizontal plane, The moving mechanism for processing has: a pair of X-direction rails provided to sandwich the processing table along the X direction; and a support body that moves along the pair of X-direction rails and supports the processing The mechanism is supported in a movable manner along said Y direction. 如請求項7所述的加工裝置,其中,所述攝像相機與所述加工機構一起沿著所述支持體於所述Y方向移動。The processing device according to claim 7, wherein the imaging camera moves along the support body in the Y direction together with the processing mechanism. 一種加工品的製造方法,使用如請求項1至請求項8中任一項所述的加工裝置來製造加工品。A method of manufacturing a processed product, using the processing device according to any one of claim 1 to claim 8 to manufacture a processed product.
TW111110436A 2021-03-29 2022-03-22 Processing apparatus, and manufacturing method of processed product TWI810856B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-055982 2021-03-29
JP2021055982A JP2022152993A (en) 2021-03-29 2021-03-29 Processing device and production method of finished product

Publications (2)

Publication Number Publication Date
TW202238795A true TW202238795A (en) 2022-10-01
TWI810856B TWI810856B (en) 2023-08-01

Family

ID=83455805

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111110436A TWI810856B (en) 2021-03-29 2022-03-22 Processing apparatus, and manufacturing method of processed product

Country Status (5)

Country Link
JP (1) JP2022152993A (en)
KR (1) KR20230121149A (en)
CN (1) CN116829308A (en)
TW (1) TWI810856B (en)
WO (1) WO2022209081A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024078289A1 (en) * 2022-10-13 2024-04-18 沈阳和研科技股份有限公司 Precision compensation method and system for double-shaft scribing machine

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3006430B2 (en) * 1994-10-19 2000-02-07 松下電器産業株式会社 Substrate position detection method
JP4485771B2 (en) * 2003-09-17 2010-06-23 株式会社ディスコ Method of aligning rotation axis of chuck table and center of microscope in cutting apparatus
JP2009170501A (en) * 2008-01-11 2009-07-30 Disco Abrasive Syst Ltd Cutting apparatus
JP5057489B2 (en) * 2010-04-02 2012-10-24 リンテック株式会社 Alignment apparatus and alignment method
JP6143668B2 (en) 2013-12-28 2017-06-07 Towa株式会社 Cutting apparatus and method for manufacturing electronic parts
JP6212507B2 (en) * 2015-02-05 2017-10-11 Towa株式会社 Cutting apparatus and cutting method
JP6339514B2 (en) * 2015-03-25 2018-06-06 Towa株式会社 Cutting apparatus and cutting method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024078289A1 (en) * 2022-10-13 2024-04-18 沈阳和研科技股份有限公司 Precision compensation method and system for double-shaft scribing machine

Also Published As

Publication number Publication date
WO2022209081A1 (en) 2022-10-06
TWI810856B (en) 2023-08-01
KR20230121149A (en) 2023-08-17
CN116829308A (en) 2023-09-29
JP2022152993A (en) 2022-10-12

Similar Documents

Publication Publication Date Title
TWI810856B (en) Processing apparatus, and manufacturing method of processed product
TWI795191B (en) Processing apparatus and producing method of processed article
TWI806486B (en) Machining apparatus and method for manufacturing workpiece
JP7430154B2 (en) Processing equipment and method for manufacturing processed products
TWI830247B (en) Processing device and method for producing processed product
TWI834199B (en) Processing device and method of manufacturing processed product
TWI826950B (en) Machining apparatus and method for manufacturing workpiece
WO2023013146A1 (en) Processing device and processed object manufacturing method
TWI830233B (en) Processing device and method for producing processed product
TW202308011A (en) Processing device, and method for manufacturing processed article
TW201723506A (en) Detecting device having a xy[theta]z alignment stage and detecting device having a multi-dimension alignment stage
TWM519742U (en) Detector with x y theta z alignment mechanism and detector with multi-dimensional alignment mechanism