TW202248406A - Processing fluid, processing fluid composition, and brittle material processing fluid composition - Google Patents

Processing fluid, processing fluid composition, and brittle material processing fluid composition Download PDF

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TW202248406A
TW202248406A TW111112522A TW111112522A TW202248406A TW 202248406 A TW202248406 A TW 202248406A TW 111112522 A TW111112522 A TW 111112522A TW 111112522 A TW111112522 A TW 111112522A TW 202248406 A TW202248406 A TW 202248406A
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北村友彥
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日商出光興產股份有限公司
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    • C10M107/30Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
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    • C10M2209/00Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
    • C10M2209/10Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C10M2209/103Polyethers, i.e. containing di- or higher polyoxyalkylene groups
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    • C10M2209/00Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
    • C10M2209/10Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C10M2209/103Polyethers, i.e. containing di- or higher polyoxyalkylene groups
    • C10M2209/106Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing four carbon atoms only
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    • C10M2209/00Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
    • C10M2209/10Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C10M2209/103Polyethers, i.e. containing di- or higher polyoxyalkylene groups
    • C10M2209/107Polyethers, i.e. containing di- or higher polyoxyalkylene groups of two or more specified different alkylene oxides covered by groups C10M2209/104 - C10M2209/106
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    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
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    • C10M2215/00Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
    • C10M2215/02Amines, e.g. polyalkylene polyamines; Quaternary amines
    • C10M2215/04Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2215/042Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms containing hydroxy groups; Alkoxylated derivatives thereof
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    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2020/00Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
    • C10N2020/01Physico-chemical properties
    • C10N2020/011Cloud point
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    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
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    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/18Anti-foaming property
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    • C10N2040/00Specified use or application for which the lubricating composition is intended
    • C10N2040/20Metal working
    • C10N2040/22Metal working with essential removal of material, e.g. cutting, grinding or drilling
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    • C10N2040/20Metal working
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Abstract

The present invention relates to a processing fluid comprising the following wherein component (A), component (B), and component (C) are incorporated in prescribed contents: component (A): a compound that exhibits a cloud point for its 1 mass% aqueous solution of 20-50 DEG C, that does not have an acetylene group, and that contains a copolymer segment of ethylene oxide and an alkylene oxide other than ethylene oxide; component (B): a compound that exhibits a cloud point for its 1 mass% aqueous solution of greater than 50 DEG C and not more than 80 DEG C, that does not have an acetylene group, and that contains a copolymer segment of ethylene oxide and an alkylene oxide other than ethylene oxide; component (C): at least one selection from the group consisting of acetylene glycols having an HLB value of 4 to 12 and alkylene oxide adducts on acetylene glycols having an HLB value of 4 to 12; and component (D): water.

Description

加工液、加工液用組成物及脆性材料加工液組成物Processing fluid, composition for processing fluid, and composition for processing fluid for brittle materials

本發明係關於加工液、加工液用組成物及脆性材料加工液組成物。The present invention relates to processing fluid, composition for processing fluid, and composition for processing fluid for brittle materials.

背景技術 在半導體製品之製造上,將脆性材料之矽錠高精度地進行切削加工很重要,由加工精度及生產性之觀點,於矽錠之切削加工中,一般採用線鋸加工。 又,線鋸加工也利用在陶瓷、石英、藍寶石、玻璃等材料的加工。 一般來說,關於使用線鋸的加工方法,可列舉:游離磨粒方式,係一面朝線材與被加工物之滑動部供給游離磨粒,一面進行加工;及固定磨粒方式,係使用於線材表面預先固定有磨粒的線材進行加工。 又,為了提高切削加工時的加工效率、抑制被加工材與加工被加工材的工具的摩擦、減低因加工而產生的摩擦熱、延長工具壽命的效果、去除切屑等,於兩種方式的線鋸加工中使用加工液(冷卻液)。 關於用於前述用途等的加工液,包含:以礦物油、動植物油、合成油等作為主成分的油系加工液、及調配具有界面活性能力的化合物而賦予水溶性的水系加工液。 近年來,由作業時之安全性及環境問題之觀點,而用起了賦予水溶性的加工液。 Background technique In the manufacture of semiconductor products, it is very important to cut silicon ingots of brittle materials with high precision. From the perspective of processing accuracy and productivity, wire saws are generally used in the cutting of silicon ingots. In addition, wire saw processing is also used in the processing of materials such as ceramics, quartz, sapphire, and glass. Generally speaking, regarding the processing method using a wire saw, there are: the free abrasive method, which is to supply free abrasive grains to the sliding part of the wire rod and the workpiece while processing; and the fixed abrasive method, which is used for The wire surface is pre-fixed with abrasive grains for processing. In addition, in order to improve the machining efficiency during cutting, suppress the friction between the workpiece and the tool for machining the workpiece, reduce the frictional heat generated by machining, prolong the effect of tool life, and remove chips, etc., in the line of the two methods Machining fluid (coolant) is used in sawing. The working fluids used in the aforementioned applications include: oil-based working fluids mainly composed of mineral oil, animal and vegetable oils, synthetic oils, etc.; and water-based working fluids formulated with a compound having surface activity to impart water solubility. In recent years, water-soluble processing fluids have been used from the viewpoint of safety and environmental problems during operation.

例如於專利文獻1中揭示一種矽錠切片用水溶性切削液,特徵在於:作為必須成分,其含有數量平均分子量為500以下且具有特定結構的聚氧伸烷基加成物、與碳數(包含羰基的碳)為4~10之1價或2價的脂肪族羧酸或其鹽。 於專利文獻2揭示一種固定磨粒線鋸用水溶性加工液組成物,特徵在於:其係用於切斷稀土磁鐵者,並且係分別以規定含量含有二醇類、羧酸、溶解於水後顯示鹼性的化合物、及水而成(其中,此等成分的合計為100重量份)。 於專利文獻3中揭示一種脆性材料加工液,係分別以規定含量含有:選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;非離子界面活性劑,係HLB值為6以上且分子結構中之氧化乙烯之加成莫耳數為5以上的氧化乙烯加成物,並且不具有乙炔基;以及羧酸。 先行技術文獻 專利文獻 For example, Patent Document 1 discloses a water-soluble cutting fluid for silicon ingot slices, which is characterized in that: as an essential component, it contains a polyoxyalkylene adduct with a number average molecular weight of 500 or less and a specific structure, and a carbon number (including The carbon of the carbonyl group) is an aliphatic carboxylic acid or a salt thereof with a valence of 4 to 10 or 2. Patent Document 2 discloses a water-soluble machining fluid composition for fixed abrasive wire saws, which is characterized in that it is used for cutting rare earth magnets, and contains glycols and carboxylic acids in predetermined amounts, and is dissolved in water to display A basic compound and water (however, the total of these components is 100 parts by weight). A brittle material processing fluid is disclosed in Patent Document 3, which contains, in predetermined amounts, selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and acetylene glycol with an HLB value of 4 to 12. One or more of the group consisting of oxyalkylene adducts; non-ionic surfactants, which are ethylene oxide adducts with an HLB value of 6 or more and an ethylene oxide addition mole number of 5 or more in the molecular structure, and does not have an ethynyl group; and a carboxylic acid. Prior art literature patent documents

專利文獻1:日本特開2011-68884號公報 專利文獻2:日本特開2003-82335號公報 專利文獻3:日本特開2018-154762號公報 Patent Document 1: Japanese Patent Laid-Open No. 2011-68884 Patent Document 2: Japanese Unexamined Patent Publication No. 2003-82335 Patent Document 3: Japanese Patent Laid-Open No. 2018-154762

發明概要 發明欲解決之課題 一般來說,前述兩種方式的線鋸加工方法由於要從前述矽錠一次切出複數個矽晶圓,故使用多線鋸裝置。於多線鋸裝置中,於以固定間隔雕刻有複數個溝槽的二個以上導引輥上的各溝槽各捲繞一條線材,且各線材以固定張力平行地保持。然後,於進行切斷加工時,使各導引輥旋轉,一面使從噴嘴等噴出的加工液附著於線材上,一面使該線材朝一方向或二方向移動,將矽錠壓抵於附著有加工液的線材進行切斷。 該線鋸加工所使用的加工液係投入線鋸裝置具備的槽部中,利用線鋸裝置具備的泵由該槽部供給至加工室噴嘴,從該噴嘴噴出。從噴嘴噴出的加工液瞄準加工間隙(線材與矽錠的間隙)而供給,用於加工間隙的潤滑等之後,再度返回到前述槽部。如此於矽錠的切斷過程中,加工液於線鋸裝置內循環。 於該切斷加工時,會有因伴隨線材高線速化而起的導引輥高速旋轉等而使加工液劇烈地飛散之情形,導致加工液起泡。再者,於該切斷加工時,因加工液流下至位於線鋸裝置下部的槽部中,會有使槽內之加工液劇烈起泡、從槽中溢出之情形。進而,還有於該切斷加工中產生的微細粉屑助長加工液起泡的問題,以及,線鋸及經切斷的晶圓等被該粉屑嚴重地污染,致使為了清潔其等的負荷變大的問題。 又,例如近年來,在前述由矽錠生產矽晶圓的領域中,因為要求進一步提高生產性、可於比游離磨粒方式更短的時間內切斷且使用更細的線材工具而可提高良率等理由,固定磨粒方式越來越普遍使用。 Summary of the invention The problem to be solved by the invention Generally speaking, the aforementioned two wire saw processing methods use a multi-wire saw device because a plurality of silicon wafers are cut out from the aforementioned silicon ingot at one time. In the multi-wire saw device, one wire is wound around each groove of two or more guide rollers engraved with a plurality of grooves at fixed intervals, and each wire is held in parallel at a constant tension. Then, when the cutting process is performed, each guide roller is rotated, and while the machining liquid sprayed from the nozzle etc. is attached to the wire, the wire is moved in one direction or two directions, and the silicon ingot is pressed against the attached machining fluid. The liquid wire is cut. The machining fluid used in the wire saw processing is put into a groove provided in the wire saw device, supplied from the groove to a nozzle in the processing chamber by a pump provided in the wire saw device, and is discharged from the nozzle. The machining fluid ejected from the nozzle is supplied aiming at the machining gap (the gap between the wire rod and the silicon ingot), used for lubrication of the machining gap, etc., and then returned to the groove. In this way, during the cutting process of the silicon ingot, the processing fluid circulates in the wire saw device. During the cutting process, the machining fluid may be violently scattered due to the high-speed rotation of the guide roller accompanying the increase in the linear speed of the wire rod, resulting in foaming of the machining fluid. Furthermore, during the cutting process, since the machining fluid flows down into the groove portion located at the lower part of the wire saw device, the machining fluid in the groove may foam violently and overflow from the groove. Furthermore, there is also the problem that the fine dust produced in the cutting process promotes the foaming of the machining fluid, and the wire saw and the cut wafers are seriously polluted by the dust, resulting in a heavy load for cleaning them. Bigger problem. Also, for example, in recent years, in the field of producing silicon wafers from silicon ingots, it is required to further improve productivity, cut off in a shorter time than the free abrasive method, and use thinner wire tools. For reasons such as yield rate, the fixed abrasive method is more and more commonly used.

因此,對於加工液除了以往要求的具有適度潤滑性以外,如果可以抑制使用加工液時的起泡、提高粉屑的清潔性,則可更穩定地生產及提高加工精度。又,如前所述,近年來要求賦予水溶性的加工液。 因此,需要潤滑性、消泡性、及清潔性之平衡更加優異的加工液。 Therefore, in addition to the moderate lubricity required in the past for the machining fluid, if the foaming when using the machining fluid can be suppressed and the cleanliness of powder chips can be improved, the production can be more stable and the machining accuracy can be improved. Also, as described above, in recent years, water-soluble processing fluids have been demanded. Therefore, there is a need for a machining fluid with a better balance of lubricity, defoaming properties, and cleaning properties.

本發明係鑑於上述問題而完成者,本發明之課題係提供一種潤滑性、消泡性、及清潔性優異的加工液。 用以解決課題之手段 The present invention was made in view of the above problems, and an object of the present invention is to provide a machining fluid excellent in lubricity, defoaming property, and cleaning property. means to solve problems

經本發明人研究後,結果發現:含有水與規定的成分、且各成分含量滿足規定範圍的加工液可解決前述課題。本發明之各實施形態係基於上述研究結果而完成者。即,根據本發明之各實施形態,提供以下[1]~[17]。 [1] 一種加工液,包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 [2] 如前述[1]記載之加工液,其中以加工液之總量100質量%為基準計,成分(A)之含量為0.200質量%以下。 [3] 如前述[1]或[2]記載之加工液,其中以加工液之總量100質量%為基準計,成分(C)之含量為0.100質量%以下。 [4] 如前述[1]~[3]中任一項記載之加工液,其中成分(A)係1質量%水溶液之濁點為20℃以上且50℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 [5] 如前述[1]~[4]中任一項記載之加工液,其中成分(B)係1質量%水溶液之濁點為大於50℃且80℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 [6] 如前述[1]~[5]中任一項記載之加工液,其中成分(A)之含量與成分(B)之含量的比〔(A)/(B)〕以質量比計為1.00以上。 [7] 如前述[1]~[6]中任一項記載之加工液,其中成分(A)及成分(B)之合計含量與成分(C)之含量的比〔(A)+(B)/(C)〕以質量比計為1.00以上。 [8] 如前述[1]~[7]中任一項記載之加工液,其中以加工液之總量100質量%為基準計,成分(D)之含量為95.000質量%以上且99.979質量%以下。 [9] 如前述[1]~[8]中任一項記載之加工液,其pH為3.0以上且9.0以下。 [10] 如前述[1]~[9]中任一項記載之加工液,其係於利用線材對由脆性材料構成之被加工材進行加工時使用。 [11] 如前述[10]記載之加工液,其中前述線材為固定磨粒線材。 [12] 如前述[10]或[11]記載之加工液,其中前述脆性材料為結晶矽、藍寶石、碳化矽、氮化鎵、釹磁鐵、水晶或玻璃。 [13] 一種如前述[1]~[12]中任一項記載之加工液之製造方法,係至少調配下述成分: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述製造方法係以如下方式進行調配而獲得加工液: 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 [14] 一種加工液用組成物,包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 [15] 一種如前述[14]記載之脆性材料加工液用組成物之製造方法,係至少調配下述成分: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述製造方法係以如下方式進行調配而獲得加工液用組成物: 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 [16] 一種脆性材料加工液組成物,包含:含有下述成分(A)~(C)之添加劑混合物、及成分(D):水; 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上; 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 [17] 一種如前述[16]記載之脆性材料加工液組成物之製造方法,係至少調配含有下述成分(A)~(C)之添加劑混合物、及成分(D):水; 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上; 前述製造方法係以如下方式進行調配而獲得脆性材料加工液組成物: 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 發明效果 As a result of research by the present inventors, it was found that a machining fluid containing water and specified components, and the content of each component satisfies the specified range can solve the aforementioned problems. Each embodiment of the present invention was completed based on the above research results. That is, according to each embodiment of the present invention, the following [1] to [17] are provided. [1] A machining fluid comprising: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid. [2] The machining fluid as described in [1] above, wherein the content of component (A) is 0.200% by mass or less based on 100% by mass of the total amount of the machining fluid. [3] The machining fluid described in [1] or [2] above, wherein the content of the component (C) is 0.100% by mass or less based on 100% by mass of the total amount of the machining fluid. [4] The processing fluid described in any one of [1] to [3] above, wherein component (A) is a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, and contains ethylene oxide and The copolymerization site of propylene oxide, and does not have ethynyl groups. [5] The processing fluid described in any one of [1] to [4] above, wherein component (B) is a compound having a cloud point of 1% by mass aqueous solution of greater than 50°C and lower than 80°C, and contains ethylene oxide and The copolymerization site of propylene oxide, and does not have ethynyl groups. [6] The machining fluid described in any one of [1] to [5] above, wherein the ratio [(A)/(B)] of the content of component (A) to the content of component (B) is expressed by mass ratio 1.00 or more. [7] The machining fluid described in any one of [1] to [6] above, wherein the ratio of the total content of component (A) and component (B) to the content of component (C) [(A) + (B )/(C)] is 1.00 or more in mass ratio. [8] The machining fluid described in any one of [1] to [7] above, wherein the content of component (D) is 95.000 mass % or more and 99.979 mass % based on 100 mass % of the total amount of the machining liquid the following. [9] The working fluid according to any one of [1] to [8] above, which has a pH of 3.0 to 9.0. [10] The machining fluid described in any one of [1] to [9] above, which is used when machining a workpiece made of a brittle material with a wire rod. [11] The machining fluid as described in [10] above, wherein the wire rod is a fixed abrasive wire rod. [12] The machining fluid as described in [10] or [11] above, wherein the brittle material is crystalline silicon, sapphire, silicon carbide, gallium nitride, neodymium magnet, crystal or glass. [13] A method of manufacturing the machining fluid described in any one of the aforementioned [1] to [12], comprising at least preparing the following components: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The foregoing manufacturing method is prepared in the following manner to obtain the machining fluid: Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid. [14] A composition for machining fluid, comprising: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more. [15] A method for producing the composition for processing fluids for brittle materials as described in [14] above, comprising at least blending the following components: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The aforementioned manufacturing method is formulated in the following manner to obtain the composition for machining fluid: Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more. [16] A brittle material processing fluid composition, comprising: an additive mixture containing the following components (A)~(C), and component (D): water; Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ; In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture. [17] A method for producing the brittle material processing fluid composition as described in [16] above, comprising at least preparing an additive mixture containing the following components (A) to (C), and component (D): water; Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ; The aforementioned manufacturing method is formulated in the following manner to obtain the brittle material processing fluid composition: In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture. Invention effect

根據本發明,可提供潤滑性、消泡性、及清潔性優異的加工液。According to the present invention, it is possible to provide a working fluid excellent in lubricity, defoaming properties, and cleaning properties.

用以實施發明之形態 [加工液] 本發明之一實施形態之加工液,包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 滿足前述所有要件的加工液,潤滑性、消泡性、及清潔性之平衡優異。 form for carrying out the invention [processing fluid] A working fluid according to an embodiment of the present invention includes: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid. A machining fluid that satisfies all the aforementioned requirements, and has an excellent balance of lubricity, defoaming, and cleaning properties.

又,於本說明書中,除非另有說明,所謂「氧化烯(以下也簡稱為「AO」)加成物」不僅包含加成有單體氧化烯的化合物,亦包含加成有複數個氧化烯、即多氧化烯的化合物。以下,「氧化乙烯(以下也簡稱為「EO」)加成物」、「氧化丙烯(以下也簡稱為「PO」)加成物」亦相同。 又,於本說明書中使用的「HLB值」指利用格里芬法算出的HLB(Hydrophilic-Lipophilic Balance)之值。 再者,於本說明書中,針對較佳的數值範圍(例如含量等的範圍)階段性地記載的下限值及上限值,可分別獨立地進行組合。例如,關於對應的數值範圍,亦可由「較佳為10以上、更佳為20以上、再更佳為30以上」的下限值的記載、和「較佳為90以下、更佳為80以下、再更佳為60以下」的記載,將「較佳的下限值(10)」與「再更佳的上限值(60)」組合後,將合適範圍設為「10以上、60以下」。同樣地,亦可將「再更佳的下限值(30)」與「較佳的上限值(90)」組合後,將合適範圍設為「30以上、90以下」。 同樣地,例如亦可由「較佳為10~90、更佳為20~80、再更佳為30~60」的記載,設為「10~60」、「30~90」。 再者,除非另有說明,關於較佳的數值範圍簡單記載為「10~90」時,表示10以上且90以下之範圍。 又,同樣地,亦可將應滿足的數值範圍與階段性地記載的較佳數值範圍之各者進行組合。例如,應滿足的數值範圍為5以上且100以下時,亦可將應滿足的下限值「5」與前述的「再更佳的上限值(60)」組合後,將合適範圍設為「5以上、60以下」。同樣地,亦可將「較佳的下限值(10)」與應滿足的上限值「100」組合後,將合適範圍設為「10以上、100以下」。關於此等應滿足的數值範圍與較佳數值範圍的組合,與前述較佳數值範圍彼此的組合相同,關於數值範圍及較佳的數值範圍簡稱為「5~100」、「較佳為10~90」地記載之情形亦可相同地組合。 以下,就該加工液所含有的各成分進行說明。 Also, in this specification, unless otherwise specified, the so-called "alkylene oxide (hereinafter also referred to as "AO") adduct" includes not only a compound to which monomeric alkylene oxide is added, but also a compound to which a plurality of alkylene oxides are added. , That is, polyoxyalkylene compounds. Hereinafter, the "ethylene oxide (hereinafter also abbreviated as "EO") adduct" and "propylene oxide (hereinafter also abbreviated as "PO") adduct" are also the same. In addition, the "HLB value" used in this specification means the value of HLB (Hydrophilic-Lipophilic Balance) calculated by the Griffin method. In addition, in this specification, the lower limit and the upper limit described stepwise about a preferable numerical range (for example, the range of content, etc.) can be combined independently, respectively. For example, with regard to the corresponding numerical range, the description of the lower limit of "preferably 10 or more, more preferably 20 or more, and more preferably 30 or more" and "preferably 90 or less, more preferably 80 or less" can also be included. , more preferably less than 60", after combining the "preferable lower limit (10)" and "even better upper limit (60)", set the appropriate range as "10 or more and 60 or less ". Similarly, after combining "an even better lower limit value (30)" and "preferable upper limit value (90)", the appropriate range may be set to "more than 30 and less than 90". Similarly, for example, "10-60" and "30-90" can also be set from the description of "preferably 10-90, more preferably 20-80, and still more preferably 30-60". In addition, unless otherwise stated, when "10-90" is simply stated about a preferable numerical range, it means the range of 10-90. Moreover, similarly, each of the numerical range to be satisfied and the preferable numerical range described step by step may be combined. For example, when the numerical range to be satisfied is more than 5 and less than 100, it is also possible to set the appropriate range as "Above 5 and below 60". Similarly, after combining the "preferable lower limit value (10)" and the upper limit value "100" to be satisfied, the appropriate range may be set as "more than 10 and less than 100". The combination of the numerical ranges and preferred numerical ranges that should be satisfied is the same as the combination of the aforementioned preferred numerical ranges. The numerical ranges and preferred numerical ranges are abbreviated as "5~100", "preferably 10~ 90" can also be combined in the same way. Each component contained in the machining fluid will be described below.

<成分(A)> 成分(A)係1質量%水溶液之濁點為20℃以上且50℃以下的化合物,包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基,較佳係1質量%水溶液之濁點為20℃以上且50℃以下的化合物,包含氧化乙烯與氧化丙烯的共聚部位,且不具有乙炔基。 若成分(A)之1質量%水溶液之濁點小於20℃,成分(A)對水的溶解性降低。另一方面,所謂成分(A)之1質量%水溶液之濁點大於50℃且80℃以下者,相當於後述的成分(B),但前述加工液不含成分(A)時,加工液之潤滑性降低。 因此,由獲得潤滑性優異的加工液的觀點,成分(A)之1質量%水溶液之濁點宜為22℃以上、較佳為25℃以上、更佳為30℃以上、再更佳為35℃以上,且宜為49℃以下、較佳為48℃以下、更佳為47℃以下、再更佳為46℃以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於成分(A)之一態樣,成分(A)之1質量%水溶液之濁點宜為22℃以上且49℃以下、較佳為25℃以上且48℃以下、更佳為30℃以上且47℃以下、再更佳為35℃以上且46℃以下。 又,成分(A)之1質量%水溶液之濁點值係使用後述實施例記載的方法測定的值。 <Ingredient (A)> Component (A) is a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and oxyalkylene other than ethylene oxide, and does not have an ethynyl group, and is preferably a 1% by mass aqueous solution The compound whose cloud point is not less than 20°C and not more than 50°C contains copolymerization sites of ethylene oxide and propylene oxide and does not have an ethynyl group. If the cloud point of the 1 mass % aqueous solution of component (A) is less than 20 degreeC, the solubility of component (A) to water will fall. On the other hand, the cloud point of a 1% by mass aqueous solution of component (A) that is greater than 50°C and below 80°C corresponds to component (B) described later, but when the aforementioned working fluid does not contain component (A), the working fluid Reduced lubricity. Therefore, from the viewpoint of obtaining a machining fluid with excellent lubricity, the cloud point of a 1% by mass aqueous solution of component (A) is preferably 22°C or higher, preferably 25°C or higher, more preferably 30°C or higher, and even more preferably 35°C or higher. °C or higher, preferably lower than 49°C, preferably lower than 48°C, more preferably lower than 47°C, even more preferably lower than 46°C. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, there are no special restrictions on their combinations. For example, regarding one aspect of component (A), the cloud point of a 1% by mass aqueous solution of component (A) should preferably be above 22°C and below 49°C, preferably 25°C Above 48°C, more preferably above 30°C and below 47°C, still more preferably above 35°C and below 46°C. In addition, the cloud point value of the 1 mass % aqueous solution of a component (A) is the value measured using the method described in the Example mentioned later.

關於成分(A)之包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基的化合物,可例舉選自於由EO與EO以外之AO的共聚物、或聚氧伸乙基伸烷基烷基醚所構成群組中之1種以上。The compound containing ethylene oxide and an oxyalkylene oxide other than ethylene oxide in the component (A) and having no ethynyl group may be a copolymer selected from EO and AO other than EO, or polyoxyethylene One or more of the group consisting of alkylene alkyl ethers.

關於成分(A)之EO與EO以外之AO的共聚物,係EO與後述EO以外之AO的共聚物,該EO與EO以外之AO的加成態樣可為無規加成及嵌段加成中任一種,亦可混合存在無規加成與嵌段加成,但宜為嵌段加成的共聚物。 關於成分(A)之EO以外之AO,可例舉碳數3或4之氧化烯,可列舉氧化丙烯(PO)、氧環丁烷、1,2-氧化丁烯、2,3-氧化丁烯、1,3-氧化丁烯、四氫呋喃。 關於成分(A)之EO與EO以外之AO的共聚物,較佳為EO與PO之共聚物、更佳為EO與PO之嵌段共聚物(亦稱為「具有聚乙二醇單元與聚丙二醇單元的嵌段共聚物」)、再更佳為EO與PO之三嵌段共聚物(亦稱為「具有聚乙二醇單元與聚丙二醇單元的三嵌段共聚物」)。又,關於EO與PO之三嵌段共聚物,可為末端嵌段由EO構成、且中間嵌段由PO構成的三嵌段共聚物(EO/PO/EO型),亦可為末端嵌段由PO構成、且中間嵌段由EO構成的三嵌段共聚物(所謂反向型。PO/EO/PO型)。 The copolymer of EO and AO other than EO in component (A) is a copolymer of EO and AO other than EO described later, and the addition state of EO and AO other than EO can be random addition or block addition. In any of the compositions, random addition and block addition can also be mixed, but it is preferably a block addition copolymer. Regarding AO other than EO in component (A), examples include alkylene oxides having 3 or 4 carbon atoms, such as propylene oxide (PO), oxetane, 1,2-butylene oxide, and 2,3-butylene oxide. alkenes, 1,3-butylene oxide, tetrahydrofuran. Regarding the copolymer of EO and AO other than EO in component (A), it is preferably a copolymer of EO and PO, more preferably a block copolymer of EO and PO (also known as "having a polyethylene glycol unit and a poly A block copolymer of propylene glycol units"), and more preferably a triblock copolymer of EO and PO (also known as "a triblock copolymer having polyethylene glycol units and polypropylene glycol units"). In addition, regarding the triblock copolymer of EO and PO, it may be a triblock copolymer (EO/PO/EO type) in which the terminal block is composed of EO and the middle block is composed of PO, or the terminal block may be A triblock copolymer composed of PO and a middle block composed of EO (so-called reverse type. PO/EO/PO type).

關於成分(A)之聚氧伸乙基伸烷基烷基醚,可舉例醇之EO及EO以外的AO加成物,較佳為醇之EO及PO加成物。 關於該醇,可舉例:碳數1以上且24以下之脂肪族醇。由親水性與親油性的平衡的觀點,關於該醇的碳數宜為1~14、較佳為1~10、更佳為1~6、再更佳為1~4、再更佳為1或2、然後再更佳為1。 關於該脂肪族醇,宜為一級醇或二級醇、較佳為一級醇。又,可為直鏈狀、可為支鏈狀,可為環狀,較佳為直鏈。 關於該脂肪族醇,例如可列舉:甲醇、乙醇、丙醇、異丙醇、丁醇、異丁醇、2-甲基-2丁醇、戊醇、異戊醇、己醇、3-甲基-1-戊醇、庚醇、2-庚醇、3-庚醇、辛醇、2-乙基己醇、壬醇、癸醇、十一醇、十二醇、十三醇、異十三醇、十四醇、十五醇、十六醇、十七醇、十八醇、異十八醇、十九醇、二十醇等飽和脂肪族醇;辛烯醇、癸烯醇、十二烯醇、十三烯醇、十四烯醇、十六烯醇、油醇、二十烯醇、亞麻醇等不飽和脂肪族醇;乙基環己醇、丙基環己醇、辛基環己醇、壬基環己醇、金剛烷醇等環狀脂肪族醇。 The polyoxyethylene alkylene alkyl ether of the component (A) includes EO and AO adducts other than EO of alcohols, preferably EO and PO adducts of alcohols. The alcohol may, for example, be an aliphatic alcohol having 1 to 24 carbon atoms. From the viewpoint of the balance between hydrophilicity and lipophilicity, the carbon number of the alcohol is preferably 1-14, preferably 1-10, more preferably 1-6, still more preferably 1-4, still more preferably 1 Or 2, and then more preferably 1. The aliphatic alcohol is preferably a primary alcohol or a secondary alcohol, preferably a primary alcohol. Moreover, it may be a straight chain, a branched chain, or a ring, but it is preferably a straight chain. As for the aliphatic alcohol, for example, methanol, ethanol, propanol, isopropanol, butanol, isobutanol, 2-methyl-2-butanol, pentanol, isoamyl alcohol, hexanol, 3-methyl alcohol, 1-pentanol, heptanol, 2-heptanol, 3-heptanol, octanol, 2-ethylhexanol, nonanol, decanol, undecyl alcohol, dodecanol, tridecanol, isodecaol Saturated aliphatic alcohols such as triol, myristyl alcohol, pentadecyl alcohol, hexadecanol, heptadecanol, stearyl alcohol, isostearyl alcohol, nonadecanol, and eicosanol; Unsaturated aliphatic alcohols such as dienyl alcohol, tridecenyl alcohol, tetradecenyl alcohol, hexadecenyl alcohol, oleyl alcohol, eicosyl alcohol, linolenic alcohol; ethyl cyclohexanol, propyl cyclohexanol, octyl Cycloaliphatic alcohols such as cyclohexanol, nonylcyclohexanol, and adamantanol.

關於成分(A)之聚氧伸乙基伸烷基烷基醚中之除了前述EO以外的AO,可例舉碳數3或4之氧化烯,可列舉氧化丙烯(PO)、氧環丁烷、1,2-氧化丁烯、2,3-氧化丁烯、1,3-氧化丁烯、四氫呋喃。此等之中,以PO為佳。 又,成分(A)之聚氧伸乙基伸烷基烷基醚中,在前述EO與EO以外之AO的共聚部位,該EO與EO以外之AO的加成態樣可為無規加成及嵌段加成中任一種,亦可混合存在無規加成與嵌段加成。 Regarding AO other than the aforementioned EO in the polyoxyethylene alkylene alkyl ether of the component (A), examples include alkylene oxides having 3 or 4 carbon atoms, such as propylene oxide (PO), oxetane, 1,2-Butene oxide, 2,3-Butene oxide, 1,3-Butene oxide, Tetrahydrofuran. Among them, PO is the best. In addition, in the polyoxyethylene alkylene alkyl ether of the component (A), at the copolymerization site of the aforementioned EO and AO other than EO, the addition mode of the EO and AO other than EO may be random addition and In any of block additions, random addition and block addition may be mixed.

再者,前述聚氧伸乙基伸烷基烷基醚可於前述醇加成EO及AO而合成,EO及AO朝醇的加成可以公知方法進行,亦可於無觸媒或觸媒之存在下,於常壓或加壓下以一階段或多階段進行。Furthermore, the aforementioned polyoxyethylene alkylene alkyl ethers can be synthesized by adding EO and AO to the aforementioned alcohols, and the addition of EO and AO to alcohols can be carried out by known methods, and can also be carried out without or in the presence of a catalyst. Under normal pressure or under increased pressure, it can be carried out in one or more stages.

又,成分(A)之EO與EO以外的AO的共聚部位中,來自EO的結構單元的含量於構成前述共聚部位的結構單元的總量100莫耳%中,宜為15莫耳%以上、較佳為20莫耳%以上、更佳為25莫耳%以上,且宜為85莫耳%以下、較佳為80莫耳%以下、更佳為75莫耳%以下。In addition, in the copolymerization site of EO and AO other than EO in the component (A), the content of the structural unit derived from EO is preferably 15 mol% or more, based on 100 mol% of the total amount of structural units constituting the copolymerization site. It is preferably more than 20 mol%, more preferably more than 25 mol%, and preferably less than 85 mol%, preferably less than 80 mol%, more preferably less than 75 mol%.

又,由使潤滑性提升之觀點,成分(A)之質量平均分子量(Mw)宜為500以上、較佳為1,000以上、更佳為1,500以上、再更佳為2,000以上。另一方面,由使磨粒朝工件的咬住性提高的觀點,成分(A)之質量平均分子量(Mw)宜為10,000以下、較佳為9,000以下、更佳為8,000以下、再更佳為6,000以下。 又,該質量平均分子量(Mw)之值係使用後述實施例記載的方法測定的值。 Also, from the viewpoint of improving lubricity, the mass average molecular weight (Mw) of component (A) is preferably 500 or more, preferably 1,000 or more, more preferably 1,500 or more, and still more preferably 2,000 or more. On the other hand, the mass average molecular weight (Mw) of component (A) is preferably 10,000 or less, preferably 9,000 or less, more preferably 8,000 or less, and still more preferably Below 6,000. In addition, the value of this mass average molecular weight (Mw) is the value measured using the method described in the Example mentioned later.

成分(A)可單獨使用1種,亦可組合2種以上使用。Component (A) may be used individually by 1 type, and may use it in combination of 2 or more types.

以前述加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上。若該含量小於0.010質量%,加工液之潤滑性差。 因此,由使加工液之潤滑性提高之觀點,以前述加工液之總量100質量%為基準計,成分(A)之含量宜為0.015質量%以上、較佳為0.020質量%以上、更佳為0.025質量%以上、再更佳為0.030質量%以上、再更佳為0.035質量%以上。 另一方面,由使加工液之消泡性提高之觀點,以前述加工液之總量100質量%為基準計,成分(A)之含量宜為0.200質量%以下、較佳為0.100質量%以下、更佳為0.080質量%以下、再更佳為0.075質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述加工液之一態樣,以前述加工液之總量100質量%為基準計,成分(A)之含量宜為0.010質量%以上且0.200質量%以下、較佳為0.015質量%以上且0.200質量%以下、更佳為0.020質量%以上且0.200質量%以下、再更佳為0.025質量%以上且0.100質量%以下、再更佳為0.030質量%以上且0.080質量%以下、再更佳為0.035質量%以上且0.075質量%以下。 The content of component (A) is 0.010 mass % or more based on 100 mass % of the total amount of the aforementioned machining fluid. If the content is less than 0.010% by mass, the machining fluid has poor lubricity. Therefore, from the viewpoint of improving the lubricity of the machining fluid, based on 100% by mass of the total amount of the aforementioned machining fluid, the content of component (A) should be at least 0.015% by mass, preferably at least 0.020% by mass, and more preferably at least 0.020% by mass. It is 0.025 mass % or more, still more preferably 0.030 mass % or more, still more preferably 0.035 mass % or more. On the other hand, from the viewpoint of improving the defoaming properties of the working liquid, the content of component (A) is preferably 0.200 mass % or less, preferably 0.100 mass % or less, based on 100 mass % of the total amount of the aforementioned working liquid , more preferably 0.080% by mass or less, more preferably 0.075% by mass or less. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, their combinations are not particularly limited. For example, with regard to one aspect of the aforementioned processing fluid, the content of component (A) is preferably not less than 0.010% by mass and 0.200% by mass based on 100% by mass of the total amount of the aforementioned processing fluid. Mass % or less, preferably 0.015 mass % or more and 0.200 mass % or less, more preferably 0.020 mass % or more and 0.200 mass % or less, still more preferably 0.025 mass % or more and 0.100 mass % or less, still more preferably 0.030 mass % % or more and 0.080 mass % or less, more preferably 0.035 mass % or more and 0.075 mass % or less.

<成分(B)> 成分(B)係1質量%水溶液之濁點為大於50℃且80℃以下的化合物,包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基,較佳係1質量%水溶液之濁點為大於50℃且80℃以下的化合物,包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 所謂成分(B)之1質量%水溶液之濁點為50℃以下且20℃以上者,相當於前述成分(A),但加工液不含成分(B)時,加工液之清潔性降低。因此,由獲得清潔性優異的加工液的觀點,成分(B)之1質量%水溶液之濁點宜為55℃以上、較佳為58℃以上、更佳為60℃以上。 另一方面,若成分(B)之1質量%水溶液之濁點超過80℃,加工液之清潔性降低。因此,由獲得清潔性優異的加工液的觀點,成分(B)之1質量%水溶液之濁點宜為75℃以下、較佳為70℃以下、更佳為65℃以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於成分(B)之一態樣,成分(B)之1質量%水溶液之濁點宜為55℃以上且75℃以下、較佳為58℃以上且70℃以下、更佳為60℃以上且65℃以下。 又,成分(B)之1質量%水溶液之濁點值係使用後述實施例記載的方法測定的值。 <Ingredient (B)> Component (B) is a compound whose cloud point is greater than 50°C and lower than 80°C in a 1% by mass aqueous solution, contains copolymerization sites of ethylene oxide and oxyalkylene other than ethylene oxide, and does not have an ethynyl group, and is preferably a 1% by mass aqueous solution Compounds whose cloud point is greater than 50°C and less than 80°C contain copolymerization sites of ethylene oxide and propylene oxide and do not have ethynyl groups. A 1% by mass aqueous solution of component (B) whose cloud point is not more than 50°C and not less than 20°C is equivalent to the aforementioned component (A), but if the working fluid does not contain component (B), the cleaning performance of the working fluid is reduced. Therefore, from the viewpoint of obtaining a processing fluid with excellent cleaning properties, the cloud point of a 1% by mass aqueous solution of component (B) is preferably 55°C or higher, preferably 58°C or higher, more preferably 60°C or higher. On the other hand, if the cloud point of the 1% by mass aqueous solution of component (B) exceeds 80° C., the cleanability of the processing fluid will decrease. Therefore, from the viewpoint of obtaining a machining fluid with excellent cleaning properties, the cloud point of a 1% by mass aqueous solution of component (B) is preferably 75°C or lower, preferably 70°C or lower, more preferably 65°C or lower. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, there are no special restrictions on their combinations. For example, regarding one aspect of component (B), the cloud point of a 1% by mass aqueous solution of component (B) should preferably be above 55°C and below 75°C, preferably 58°C Above 70°C, more preferably above 60°C and below 65°C. In addition, the cloud point value of the 1 mass % aqueous solution of a component (B) is the value measured using the method described in the Example mentioned later.

關於成分(B)之包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基的化合物,可例舉選自於由EO與EO以外之AO的共聚物、或聚氧伸乙基伸烷基烷基醚所構成群組中之1種以上。此等之中,較佳為EO與EO以外之AO的共聚物。The compound containing ethylene oxide and an oxyalkylene oxide other than ethylene oxide in the component (B) and having no ethynyl group may be a copolymer selected from EO and AO other than EO, or polyoxyethylene One or more of the group consisting of alkylene alkyl ethers. Among them, a copolymer of EO and AO other than EO is preferable.

於前述成分(B)之EO與EO以外之AO的共聚物中,該EO與EO以外之AO的加成態樣可為無規加成及嵌段加成中任一種,亦可混合存在無規加成與嵌段加成,但宜為嵌段加成的共聚物。 關於前述成分(B)之EO以外之AO,可例舉碳數3或4之氧化烯,可列舉氧化丙烯(PO)、氧環丁烷、1,2-氧化丁烯、2,3-氧化丁烯、1,3-氧化丁烯、四氫呋喃。 關於前述成分(B)之EO與EO以外之AO的共聚物,較佳為EO與PO之共聚物、更佳為EO與PO之嵌段共聚物、再更佳為EO與PO之三嵌段共聚物、再更佳為於聚丙二醇加成氧化乙烯的普洛尼克(Pluronic)型共聚物(EO-PO-EO型三嵌段共聚物)。 In the copolymer of EO and AO other than EO in the aforementioned component (B), the addition state of the EO and AO other than EO may be any of random addition and block addition, and may also be present in admixture. Regular addition and block addition, but block addition copolymers are preferred. Regarding AO other than EO in the aforementioned component (B), examples include alkylene oxides having 3 or 4 carbon atoms, such as propylene oxide (PO), oxetane, 1,2-butylene oxide, 2,3-oxide Butene, 1,3-Butene Oxide, Tetrahydrofuran. Regarding the copolymer of EO and AO other than EO in the aforementioned component (B), it is preferably a copolymer of EO and PO, more preferably a block copolymer of EO and PO, and even more preferably a triblock of EO and PO The copolymer is more preferably a Pluronic type copolymer (EO-PO-EO type tri-block copolymer) in which ethylene oxide is added to polypropylene glycol.

又,前述成分(B)之EO與EO以外的AO的共聚物中,來自EO的結構單元的含量於構成前述共聚物的結構單元的總量100莫耳%中,宜為25莫耳%以上、較佳為30莫耳%以上、更佳為35莫耳%以上、再更佳為40莫耳%以上,且宜為75莫耳%以下、較佳為70莫耳%以下、更佳為65莫耳%以下、再更佳為60莫耳%以下。In addition, in the copolymer of EO of the aforementioned component (B) and AO other than EO, the content of the structural unit derived from EO is preferably 25 mol% or more in the total amount of 100 mol% of the structural units constituting the aforementioned copolymer. , preferably more than 30 mol%, more preferably more than 35 mol%, more preferably more than 40 mol%, and preferably less than 75 mol%, preferably less than 70 mol%, more preferably 65 mole % or less, more preferably 60 mole % or less.

關於成分(B)之聚氧伸乙基伸烷基烷基醚,除了濁點不同外,與關於成分(A)之聚氧伸乙基伸烷基烷基醚所說明者相同,其較佳態樣也相同。The polyoxyethylene alkylene alkyl ether of the component (B) is the same as that described for the polyoxyethylene alkylene alkyl ether of the component (A) except that the cloud point is different, and its preferred embodiment Also the same.

又,由使潤滑性提升之觀點,成分(B)之質量平均分子量(Mw)宜為500以上、較佳為1,000以上、更佳為1,500以上、再更佳為2,000以上。另一方面,由使磨粒朝工件的咬住性提高的觀點,成分(B)之質量平均分子量(Mw)宜為10,000以下、較佳為9,000以下、更佳為8,000以下、再更佳為6,000以下。 又,該質量平均分子量(Mw)之值係使用後述實施例記載的方法測定的值。 Also, from the viewpoint of improving lubricity, the mass average molecular weight (Mw) of component (B) is preferably 500 or more, preferably 1,000 or more, more preferably 1,500 or more, and still more preferably 2,000 or more. On the other hand, the mass average molecular weight (Mw) of component (B) is preferably 10,000 or less, preferably 9,000 or less, more preferably 8,000 or less, and still more preferably Below 6,000. In addition, the value of this mass average molecular weight (Mw) is the value measured using the method described in the Example mentioned later.

成分(B)可單獨使用1種,亦可組合2種以上使用。Component (B) may be used individually by 1 type, and may use it in combination of 2 or more types.

以前述加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上。若該含量小於0.005質量%,加工液之清潔性差。 因此,由使加工液之清潔性提高之觀點,以前述加工液之總量100質量%為基準計,成分(B)之含量宜為0.010質量%以上、較佳為0.012質量%以上、更佳為0.015質量%以上。 另一方面,以前述加工液之總量100質量%為基準計,成分(B)之含量宜為0.090質量%以下。若該含量超過0.090質量%,加工液之潤滑性差。 因此,由使加工液之潤滑性提高之觀點,以前述加工液之總量100質量%為基準計,成分(B)之含量宜為0.080質量%以下、較佳為0.050質量%以下、更佳為0.030質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述加工液之一態樣,以前述加工液之總量100質量%為基準計,成分(B)之含量宜為0.010質量%以上且0.080質量%以下、較佳為0.012質量%以上且0.050質量%以下、更佳為0.015質量%以上且0.030質量%以下。 The content of component (B) is 0.005% by mass or more based on 100% by mass of the total amount of the aforementioned machining fluid. If the content is less than 0.005% by mass, the cleaning property of the working fluid is poor. Therefore, from the viewpoint of improving the cleanliness of the machining fluid, based on 100% by mass of the total amount of the aforementioned machining fluid, the content of component (B) should be at least 0.010% by mass, preferably at least 0.012% by mass, and more preferably at least 0.012% by mass. 0.015% by mass or more. On the other hand, the content of component (B) is preferably 0.090% by mass or less based on 100% by mass of the total amount of the aforementioned machining fluid. If the content exceeds 0.090% by mass, the lubricity of the machining fluid is poor. Therefore, from the viewpoint of improving the lubricity of the machining fluid, based on 100% by mass of the total amount of the aforementioned machining fluid, the content of component (B) is preferably 0.080% by mass or less, preferably 0.050% by mass or less, more preferably 0.030% by mass or less. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, their combinations are not particularly limited. For example, with regard to one aspect of the aforementioned machining fluid, based on the total amount of the aforementioned machining fluid of 100% by mass, the content of component (B) is preferably not less than 0.010% by mass and 0.080% by mass. % by mass or less, preferably not less than 0.012 mass % and not more than 0.050 mass %, more preferably not less than 0.015 mass % and not more than 0.030 mass %.

又,由使加工液之潤滑性提高之觀點,前述加工液中之前述成分(A)之含量與前述成分(B)之含量的比〔(A)/(B)〕,以質量比計宜為1.00以上、較佳為1.50以上、更佳為2.00以上。 另一方面,由使加工液之清潔性及加工精度提高之觀點,前述加工液中之前述成分(A)之含量與前述成分(B)之含量的比〔(A)/(B)〕,以質量比計宜為20.00以下、較佳為15.00以下、更佳為10.00以下。 Also, from the viewpoint of improving the lubricity of the machining fluid, the ratio [(A)/(B)] of the content of the aforementioned component (A) in the aforementioned machining fluid to the content of the aforementioned component (B) is preferably expressed as a mass ratio 1.00 or more, preferably 1.50 or more, more preferably 2.00 or more. On the other hand, from the viewpoint of improving the cleanliness and machining accuracy of the machining fluid, the ratio [(A)/(B)] of the content of the aforementioned component (A) in the aforementioned machining fluid to the content of the aforementioned component (B) is, In terms of mass ratio, it is preferably 20.00 or less, preferably 15.00 or less, more preferably 10.00 or less.

<成分(C)> 成分(C)係選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上。 前述加工液不含成分(C)時,加工液之消泡性及清潔性惡化。 於此,如前所述,在不含成分(B)時加工液之清潔性亦會惡化,但僅只是包含任一種成分時無法獲得具有良好清潔性的加工液。亦即,藉由包含成分(B)及成分(C)兩者,可獲得具有良好清潔性的加工液。 因此,藉由以滿足規定量之方式包含所有的成分(A)、成分(B)及成分(C),可獲得潤滑性、消泡性及清潔性均優異的加工液。 <Ingredient (C)> Component (C) is at least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 . When the aforementioned working fluid does not contain component (C), the defoaming property and cleanability of the working fluid deteriorate. Here, as mentioned above, when the component (B) is not included, the cleanability of the working fluid deteriorates, but a working fluid with good cleanability cannot be obtained when only one of the components is included. That is, by including both the component (B) and the component (C), a working fluid having good cleaning properties can be obtained. Therefore, by including all of the component (A), component (B) and component (C) in a predetermined amount, a machining fluid excellent in lubricity, defoaming property and cleanability can be obtained.

又,若成分(C)之HLB值小於4,成分(C)對水之溶解性差。因此,由使成分(C)對水之溶解性提高之觀點,成分(C)之HLB值宜為5以上、較佳為6以上、更佳為7以上。 另一方面,若該成分(C)之HLB值超過12,則加工液之消泡性及清潔性惡化。因此,由使加工液之消泡性及清潔性提高之觀點,成分(C)之HLB值宜為11以下、較佳為10以下、更佳為9以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於成分(C)之一態樣,成分(C)之HLB值宜為5以上且11以下、較佳為6以上且10以下、更佳為7以上且9以下。 又,成分(C)之HLB值如前所述為藉由格里芬法算出的值。 Also, if the HLB value of the component (C) is less than 4, the solubility of the component (C) to water is poor. Therefore, from the viewpoint of improving the solubility of the component (C) in water, the HLB value of the component (C) is preferably 5 or more, preferably 6 or more, more preferably 7 or more. On the other hand, when the HLB value of the component (C) exceeds 12, the defoaming property and cleanability of the processing fluid deteriorate. Therefore, the HLB value of component (C) is preferably 11 or less, preferably 10 or less, more preferably 9 or less, from the viewpoint of improving the defoaming and cleaning properties of the working fluid. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, there is no particular limitation on their combinations. For example, regarding an aspect of component (C), the HLB value of component (C) is preferably 5 or more and 11 or less, preferably 6 or more and 10 or less, more preferably 7 or more and 9 or less. Moreover, the HLB value of a component (C) is the value computed by the Griffin's method as mentioned above.

關於前述乙炔二醇可例舉下述通式(1)所示之化合物。The compound represented by the following general formula (1) is mentioned about said acetylene diol.

[化學式1]

Figure 02_image001
[chemical formula 1]
Figure 02_image001

通式(1)中,R 1~R 4分別獨立地表示碳數1以上且5以下之烷基。 關於R 1~R 4可採用的碳數1以上且5以下之烷基,具體而言可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、1-甲基丁基、2-甲基丁基、3 -甲基丁基、1,1-二甲基丙基、1,2-二甲基丙基、2,2-二甲基丙基。 其等之中,關於R 1及R 3宜為異丁基或3-甲基丁基。又,關於R 2及R 4宜為甲基。 又,關於通式(1)所示化合物,較佳為具有R 1及R 3彼此相同的結構或R 2及R 4彼此相同的結構的化合物,更佳為具有R 1及R 3彼此相同、且R 2及R 4彼此相同的結構的化合物。 In the general formula (1), R 1 to R 4 each independently represent an alkyl group having 1 to 5 carbon atoms. Regarding the alkyl group having 1 to 5 carbon atoms that can be adopted for R 1 to R 4 , specific examples include: methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, secondary Butyl, tertiary butyl, n-pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl, 1,2-dimethyl Propyl, 2,2-Dimethylpropyl. Among them, R 1 and R 3 are preferably isobutyl or 3-methylbutyl. Also, R 2 and R 4 are preferably methyl groups. Also, with regard to the compound represented by the general formula (1), it is preferably a compound having the same structure of R 1 and R 3 or a structure of R 2 and R 4 being the same as each other, more preferably having the same structure of R 1 and R 3 , and R 2 and R 4 are compounds having the same structure as each other.

又,關於前述乙炔二醇之氧化烯加成物,較佳可舉例於通式(1)所示化合物之各羥基加成有AO的通式(1)所示化合物之氧化烯加成物,更佳為加成有EO及/或PO的通式(1)所示化合物之氧化烯加成物,再更佳為加成有EO的通式(1)所示化合物之氧化烯加成物。再者,形成該乙炔二醇之氧化烯加成物的乙炔二醇的較佳態樣,與前述以通式(1)表示之化合物之較佳態樣相同。 又,包含鍵結有來自EO之結構(例如伸乙基氧基或聚(氧乙烯)結構)及來自PO之結構(例如伸丙基氧基或聚(氧丙烯)結構)的結構時,各結構可彼此以無規型鍵結、亦可以嵌段型鍵結,較佳為嵌段型。 Also, as for the alkylene oxide adducts of the above-mentioned acetylene diol, preferably, the alkylene oxide adducts of the compounds represented by the general formula (1) having AO added to each hydroxyl group of the compound represented by the general formula (1) can be exemplified. More preferably, it is an alkylene oxide adduct of a compound represented by the general formula (1) to which EO and/or PO is added, and even more preferably an alkylene oxide adduct of a compound represented by the general formula (1) to which EO is added . In addition, the preferable aspect of the acetylene diol which forms the alkylene oxide adduct of this acetylene diol is the same as the preferable aspect of the compound represented by general formula (1) mentioned above. Also, when including a structure to which a structure derived from EO (such as an ethylenyloxy group or a poly(oxyethylene) structure) and a structure derived from PO (such as a propyleneoxy group or a poly(oxypropylene) structure) are bonded, each The structures may be bonded to each other in a random type or in a block type, preferably a block type.

關於成分(C),可列舉:2,5,8,11-四甲基-6-十二炔-5,8-二醇、5,8-二甲基-6-十二炔-5,8-二醇、2,4,7,9-四甲基-5-十二炔-4,7-二醇、8-十六炔-7,10-二醇、7-十四炔-6,9-二醇、2,3,6,7-四甲基-4-辛炔-3,6-二醇、3,6-二乙基-4-辛炔-3,6-二醇、2,5-二甲基-3-己炔-2,5-二醇、2,4,7,9-四甲基-5-癸炔-4,7-二醇、及3,6-二甲基-4-辛炔-3,6-二醇等的通式(1)所示之乙炔二醇;以及,通式(1)所示之乙炔二醇之氧化烯加成物等。關於該氧化烯可列舉EO及/或PO等。 其等之中,宜為選自於由2,5,8,11-四甲基-6-十二炔-5,8-二醇、5,8-二甲基-6-十二炔-5,8-二醇、2,4,7,9-四甲基-5-十二炔-4,7-二醇、8-十六炔-7,10-二醇、7-十四炔-6,9-二醇、2,3,6,7-四甲基-4-辛炔-3,6-二醇、3,6-二乙基-4-辛炔-3,6-二醇、2,5-二甲基-3-己炔-2,5-二醇、2,4,7,9-四甲基-5-癸炔-4,7-二醇及3,6-二甲基-4-辛炔-3,6-二醇所構成群組中之1種以上之氧化烯加成物,較佳為選自於由2,5,8,11-四甲基-6-十二炔-5,8-二醇、5,8-二甲基-6-十二炔-5,8-二醇、2,4,7,9-四甲基-5-十二炔-4,7-二醇、8-十六炔-7,10-二醇、7-十四炔-6,9-二醇、2,3,6,7-四甲基-4-辛炔-3,6-二醇、3,6-二乙基-4-辛炔-3,6-二醇、2,5-二甲基-3-己炔-2,5-二醇、2,4,7,9-四甲基-5-癸炔-4,7-二醇及3,6-二甲基-4-辛炔-3,6-二醇所構成群組中之1種以上之氧化乙烯加成物,更佳為選自於由2,5,8,11-四甲基-6-十二炔-5,8-二醇之氧化乙烯加成物及2,4,7,9-四甲基-5-癸炔-4,7-二醇之氧化乙烯加成物所構成群組中之1種以上,再更佳為2,5,8,11-四甲基-6-十二炔-5,8-二醇之氧化乙烯加成物。 再者,成分(C)可單獨使用1種,亦可組合2種以上使用。 Component (C) includes: 2,5,8,11-tetramethyl-6-dodedecyne-5,8-diol, 5,8-dimethyl-6-dodedecyn-5, 8-diol, 2,4,7,9-tetramethyl-5-dodedecyn-4,7-diol, 8-hexadeyn-7,10-diol, 7-tetradecyn-6 ,9-diol, 2,3,6,7-tetramethyl-4-octyne-3,6-diol, 3,6-diethyl-4-octyne-3,6-diol, 2,5-Dimethyl-3-hexyne-2,5-diol, 2,4,7,9-tetramethyl-5-decyne-4,7-diol, and 3,6-diol Acetylene glycol represented by the general formula (1) such as methyl-4-octyne-3,6-diol; and an alkylene oxide adduct of the acetylene glycol represented by the general formula (1), etc. EO and/or PO etc. are mentioned about this alkylene oxide. Among them, it is preferably selected from 2,5,8,11-tetramethyl-6-dodedecyn-5,8-diol, 5,8-dimethyl-6-dodedecyn- 5,8-diol, 2,4,7,9-tetramethyl-5-dodecyn-4,7-diol, 8-hexadecane-7,10-diol, 7-tetradecyne -6,9-diol, 2,3,6,7-tetramethyl-4-octyne-3,6-diol, 3,6-diethyl-4-octyne-3,6-diol alcohol, 2,5-dimethyl-3-hexyne-2,5-diol, 2,4,7,9-tetramethyl-5-decyne-4,7-diol and 3,6- One or more alkylene oxide adducts in the group consisting of dimethyl-4-octyne-3,6-diol, preferably selected from 2,5,8,11-tetramethyl- 6-Dodedecyn-5,8-diol, 5,8-Dimethyl-6-dodeyn-5,8-diol, 2,4,7,9-tetramethyl-5-dodeca Alkyne-4,7-diol, 8-hexadecane-7,10-diol, 7-tetradecyn-6,9-diol, 2,3,6,7-tetramethyl-4-octane Alkyne-3,6-diol, 3,6-diethyl-4-octyne-3,6-diol, 2,5-dimethyl-3-hexyne-2,5-diol, 2 , one of the group consisting of 4,7,9-tetramethyl-5-decyne-4,7-diol and 3,6-dimethyl-4-octyne-3,6-diol The above ethylene oxide adducts are more preferably selected from 2,5,8,11-tetramethyl-6-dodecyn-5,8-diol ethylene oxide adducts and 2,4, One or more of the group consisting of ethylene oxide adducts of 7,9-tetramethyl-5-decyne-4,7-diol, more preferably 2,5,8,11-tetramethyl - Ethylene oxide adduct of 6-dodecyne-5,8-diol. In addition, a component (C) may be used individually by 1 type, and may use it in combination of 2 or more types.

以前述加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。若該含量小於0.006質量%,加工液之清潔性惡化。 由獲得加工液之優異清潔性之觀點,以前述加工液之總量100質量%為基準計,成分(C)之含量宜為0.007質量%以上、較佳為0.008質量%以上、更佳為0.009質量%以上。 另一方面,由使成分(C)對水之溶解性良好之觀點,以前述加工液之總量100質量%為基準計,成分(C)之含量宜為0.100質量%以下、較佳為0.070質量%以下、更佳為0.050質量%以下、再更佳為0.030質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述加工液之一態樣,以前述加工液之總量100質量%為基準計,成分(C)之含量宜為0.006質量%以上且0.100質量%以下、較佳為0.007質量%以上且0.070質量%以下、更佳為0.008質量%以上且0.050質量%以下、再更佳為0.009質量%以上且0.030質量%以下。 The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the aforementioned machining fluid. If the content is less than 0.006% by mass, the cleanability of the working fluid deteriorates. From the viewpoint of obtaining excellent cleanability of the machining fluid, the content of component (C) is preferably 0.007 mass % or more, preferably 0.008 mass % or more, more preferably 0.009 mass % based on 100 mass % of the total amount of the aforementioned machining liquid Mass% or more. On the other hand, from the viewpoint of improving the solubility of component (C) in water, the content of component (C) is preferably 0.100% by mass or less, preferably 0.070% by mass, based on 100% by mass of the total amount of the aforementioned processing fluid Mass % or less, more preferably 0.050 mass % or less, still more preferably 0.030 mass % or less. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, their combinations are not particularly limited. For example, with regard to one aspect of the aforementioned machining fluid, based on the total amount of the aforementioned machining fluid of 100% by mass, the content of component (C) is preferably not less than 0.006% by mass and 0.100% by mass. Mass % or less, preferably 0.007 mass % or more and 0.070 mass % or less, more preferably 0.008 mass % or more and 0.050 mass % or less, still more preferably 0.009 mass % or more and 0.030 mass % or less.

又,前述加工液中,前述成分(A)及成分(B)之合計含量與成分(C)之含量的比〔(A)+(B)/(C)〕,以質量比計宜為1.00以上、較佳為1.20以上、更佳為1.30以上,且宜為20.00以下、較佳為15.00以下、更佳為12.00以下。In addition, in the aforementioned processing liquid, the ratio [(A)+(B)/(C)] of the total content of the aforementioned component (A) and component (B) to the content of the component (C) is preferably 1.00 in terms of mass ratio Above, preferably above 1.20, more preferably above 1.30, preferably below 20.00, preferably below 15.00, more preferably below 12.00.

<成分(D)> 作為成分(D)之水並無特別限定,可使用蒸餾水、離子交換水(去離子水)等純化水;自來水;工業用水等,較佳為純化水、更佳為離子交換水(去離子水)。 <Ingredient (D)> The water used as component (D) is not particularly limited, and purified water such as distilled water, ion-exchanged water (deionized water) can be used; tap water; industrial water, etc., preferably purified water, more preferably ion-exchanged water (deionized water) ).

例如,由使前述加工液之阻燃性提升以提高安全性之觀點、及將加工液低黏度化而使操作性提升之觀點,以前述加工液之總量100質量%為基準計,成分(D)之含量宜為95.000質量%以上、較佳為97.500質量%以上、更佳為99.500質量%以上、再更佳為99.600質量%以上。然後,由確保前述加工液中之成分(A)、成分(B)及成分(C)之量的觀點,則為99.979質量%以下,宜為99.965質量%以下、較佳為99.950質量%以下、更佳為99.945質量%以下、再更佳為99.930質量%以下。 此處,本說明書中,所謂「加工液中之添加劑混合物」係指從前述加工液去除作為成分(D)之水後的總成分。 For example, from the viewpoint of improving the flame retardancy of the aforementioned machining fluid to improve safety, and from the perspective of lowering the viscosity of the machining fluid to improve workability, based on 100% by mass of the total amount of the aforementioned machining fluid, the components ( The content of D) is preferably at least 95.000 mass %, preferably at least 97.500 mass %, more preferably at least 99.500 mass %, even more preferably at least 99.600 mass %. Then, from the viewpoint of ensuring the amount of component (A), component (B) and component (C) in the aforementioned machining fluid, it is 99.979% by mass or less, preferably 99.965% by mass or less, preferably 99.950% by mass or less, More preferably, it is 99.945 mass % or less, More preferably, it is 99.930 mass % or less. Here, in this specification, the "additive mixture in the working fluid" refers to the total components after removing water as the component (D) from the aforementioned working fluid.

<其他成分> 於不妨礙本發明目的之範圍內,前述加工液除了前述成分(A)~(D)外,亦可進而包含其他成分。 關於其他成分,可列舉相當於成分(A)~(C)之化合物以外的界面活性劑、pH調整劑、保水性提升劑、消泡劑、金屬減活劑、殺菌劑・防腐劑、防鏽劑、抗氧化劑等添加劑。此等添加劑分別可單獨使用,或組合2種以上使用。又,於此等添加劑之中,較佳為選自於由成分(A)~(C)以外的界面活性劑、pH調整劑、以及保水性提升劑所構成群組中之1種以上、更佳為選自於由保水性提升劑及pH調整劑所構成群組中之1種以上、再更佳為pH調整劑。 再者,此等添加劑可單獨使用1種,亦可組合2種以上使用。 <Other ingredients> In addition to the aforementioned components (A) to (D), the aforementioned machining fluid may further contain other components within the range that does not interfere with the purpose of the present invention. Other components include surfactants, pH adjusters, water retention enhancers, defoamers, metal deactivators, bactericides and preservatives, antirust agents other than compounds corresponding to components (A) to (C). additives, antioxidants, etc. These additives can be used individually or in combination of 2 or more types, respectively. In addition, among these additives, preferably one or more selected from the group consisting of surfactants other than components (A) to (C), pH adjusters, and water retention enhancers, or more Preferably, it is one or more types selected from the group consisting of a water retention enhancer and a pH adjuster, and more preferably a pH adjuster. In addition, these additives may be used individually by 1 type, and may use it in combination of 2 or more types.

關於相當於成分(A)~(C)之化合物以外的界面活性劑,可列舉:陰離子界面活性劑、陽離子界面活性劑、相當於成分(A)~(C)之化合物以外的非離子界面活性劑、及兩性界面活性劑等。 關於陰離子界面活性劑,可列舉:烷基苯磺酸鹽、α烯烴磺酸鹽等。關於陽離子界面活性劑,可列舉:烷基三甲基銨鹽、二烷基二甲基銨鹽、烷基二甲基苄基銨鹽等四級銨鹽等。 關於相當於成分(A)~(C)之化合物以外的非離子界面活性劑,例如可列舉:聚氧伸乙基烷基醚;聚氧伸烷基烷基醚(其中,聚氧伸烷基部位不包含來自氧化乙烯基的結構);聚氧伸乙基烷基苯基醚等醚;1質量%水溶液之濁點為小於20℃且大於80℃的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基;HLB值為小於4且大於12的乙炔二醇;HLB值為小於4且大於12的乙炔二醇之氧化烯加成物;脂肪酸烷醇醯胺等醯胺等。 關於兩性界面活性劑,可例舉作為甜菜鹼系的烷基甜菜鹼等。 Surfactants other than compounds corresponding to components (A) to (C) include: anionic surfactants, cationic surfactants, nonionic surfactants other than compounds corresponding to components (A) to (C) agents, and amphoteric surfactants, etc. As for the anionic surfactant, alkylbenzene sulfonate, α olefin sulfonate, etc. are mentioned. As for the cationic surfactant, quaternary ammonium salts such as alkyltrimethylammonium salts, dialkyldimethylammonium salts, and alkyldimethylbenzylammonium salts, etc. are mentioned. Regarding nonionic surfactants other than the compounds corresponding to components (A) to (C), examples include: polyoxyethylene alkyl ethers; polyoxyalkylene alkyl ethers (among which, polyoxyalkylene alkyl ethers The site does not contain a structure derived from ethylene oxide); ethers such as polyoxyethylene alkylphenyl ether; compounds whose cloud point is less than 20°C and greater than 80°C in a 1% by mass aqueous solution, including ethylene oxide and other than ethylene oxide The copolymerization site of oxyalkylene without ethynyl group; acetylene glycol with HLB value less than 4 and greater than 12; oxyalkylene adduct of acetylene glycol with HLB value less than 4 and greater than 12; fatty acid alkanolamide Isoamide etc. The amphoteric surfactant may, for example, be betaine-based alkyl betaines or the like.

pH調整劑主要用於調整加工液之pH。關於該pH調整劑,可舉例各種酸成分或鹼成分,藉由調整該等成分之含量比,可適當地調整加工液之pH。 再者,該酸成分與鹼成分可互相反應而形成鹽。 因此,使用酸成分及鹼成分作為pH調整劑時,在前述加工液中存在該酸成分與鹼成分之反應物時,如前所述,亦可算出從該酸成分及鹼成分之反應物之含量算出的有助於該反應的該酸成分及鹼成分的各含量。又,此時可取代該反應物,視為含有反應前的該酸成分及鹼成分者。 The pH adjuster is mainly used to adjust the pH of the processing fluid. As the pH adjuster, various acid components or alkali components can be exemplified, and by adjusting the content ratio of these components, the pH of the processing liquid can be adjusted appropriately. Furthermore, the acid component and the base component may react with each other to form a salt. Therefore, when an acid component and an alkali component are used as a pH adjuster, when the reactant of the acid component and the alkali component exists in the aforementioned processing fluid, as described above, the ratio of the reactant of the acid component and the alkali component can also be calculated. The calculated contents of the acid component and the base component contribute to the reaction. In addition, at this time, instead of the reactant, it can be regarded as containing the acid component and the base component before the reaction.

關於用作pH調整劑的酸成分,例如可列舉:月桂酸、硬脂酸、油酸、亞油酸、亞麻酸、新癸酸、異壬酸、癸酸、異硬脂酸等各種脂肪酸;乙酸、蘋果酸、檸檬酸等羧酸;聚丙烯酸等高分子酸及其鹽;磷酸等無機酸。此等之中,較佳為脂肪酸、更佳為新癸酸、異壬酸、癸酸、十二烷二酸等碳數12以下之脂肪酸、再更佳為選自於由新癸酸、異壬酸、癸酸及十二烷二酸所構成群組中之1種以上。Regarding the acid component used as a pH adjuster, for example, various fatty acids such as lauric acid, stearic acid, oleic acid, linoleic acid, linolenic acid, neodecanoic acid, isononanoic acid, capric acid, and isostearic acid are listed; Carboxylic acids such as acetic acid, malic acid, and citric acid; Polymer acids such as polyacrylic acid and their salts; Inorganic acids such as phosphoric acid. Among these, fatty acids are preferred, fatty acids with carbon numbers below 12 such as neodecanoic acid, isononanoic acid, capric acid, and dodecanedioic acid are more preferred, and fatty acids selected from neodecanoic acid, isononanoic acid, etc. One or more species from the group consisting of nonanoic acid, capric acid and dodecanedioic acid.

關於用作pH調整劑的鹼成分,例如可列舉:單乙醇胺、二乙醇胺、三乙醇胺、單異丙醇胺、二異丙醇胺、三異丙醇胺、三正丙醇胺、三正丁醇胺、三異丁醇胺、三-三級丁醇胺、N-甲基乙醇胺、N-乙基乙醇胺、N-丁基乙醇胺、N-環己基乙醇胺、N-甲基二乙醇胺、N-乙基二乙醇胺、N-環己基二乙醇胺、N,N-二甲基乙醇胺、N,N-二乙基乙醇胺等烷醇胺;甲胺、二甲胺、乙胺、二乙胺、丙胺、二丙胺等烷基胺;氨。此等之中,較佳為三級胺、更佳為選自於由三乙醇胺、三異丙醇胺、N-甲基二乙醇胺、及N-環己基二乙醇胺所構成群組中之至少1種。As for the alkali component used as a pH adjuster, for example, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, triisopropanolamine, tri-n-propanolamine, tri-n-butyl Alcoholamine, triisobutanolamine, tri-tertiary butanolamine, N-methylethanolamine, N-ethylethanolamine, N-butylethanolamine, N-cyclohexylethanolamine, N-methyldiethanolamine, N- Ethyldiethanolamine, N-cyclohexyldiethanolamine, N,N-dimethylethanolamine, N,N-diethylethanolamine and other alkanolamines; methylamine, dimethylamine, ethylamine, diethylamine, propylamine, Alkylamines such as dipropylamine; ammonia. Among these, it is preferably a tertiary amine, more preferably at least 1 selected from the group consisting of triethanolamine, triisopropanolamine, N-methyldiethanolamine, and N-cyclohexyldiethanolamine. kind.

關於保水性提升劑,例如可列舉:乙二醇、丙二醇、1,4-丁二醇、六亞甲基二醇、新戊二醇、二乙二醇、三乙二醇、二丙二醇、三丙二醇、甘油、此等之酯衍生物、此等之醚衍生物;聚乙二醇、聚丙二醇等。 關於消泡劑,例如可列舉:聚矽氧油、氟聚矽氧油、聚醚聚矽氧烷及氟烷基醚等。 關於金屬減活劑,例如可列舉:咪唑啉、嘧啶衍生物、噻二唑及苯並三唑。 關於殺菌劑・防腐劑,例如可列舉:對羥苯甲酸酯類(對羥苯甲酸酯類)、以及苯甲酸、水楊酸、山梨酸、脫氫乙酸、對甲苯磺酸及其等之鹽類、以及苯氧基乙醇。 關於防鏽劑,例如可列舉:烷基苯磺酸酯、二壬基萘磺酸酯、烯基琥珀酸酯、多元醇酯。 關於抗氧化劑,例如可列舉:酚系抗氧化劑及胺系抗氧化劑。 Regarding the water retention improving agent, for example, ethylene glycol, propylene glycol, 1,4-butanediol, hexamethylene glycol, neopentyl glycol, diethylene glycol, triethylene glycol, dipropylene glycol, triethylene glycol, Propylene glycol, glycerin, their ester derivatives, their ether derivatives; polyethylene glycol, polypropylene glycol, etc. Examples of the antifoaming agent include silicone oil, fluorosilicone oil, polyether polysiloxane, and fluoroalkyl ether. As for the metal deactivator, for example, imidazoline, pyrimidine derivatives, thiadiazole and benzotriazole are mentioned. Regarding the fungicides and preservatives, examples include parabens (paraben esters), benzoic acid, salicylic acid, sorbic acid, dehydroacetic acid, p-toluenesulfonic acid, and salts thereof class, and phenoxyethanol. As for the rust inhibitor, for example, alkylbenzenesulfonate, dinonylnaphthalenesulfonate, alkenylsuccinate, and polyol ester are mentioned. As for antioxidant, a phenolic antioxidant and an amine antioxidant are mentioned, for example.

前述加工液含有其他成分時,以前述加工液之總量100質量%為基準計,前述加工液中之其他成分的合計含量宜為0.0001質量%以上、較佳為0.0002質量%以上、更佳為0.0003質量%以上、再更佳為0.0004質量%以上,且宜為0.0800質量%以下、較佳為0.0500質量%以下、更佳為0.0100質量%以下、再更佳為0.0050質量%以下、再更佳為0.0010質量%以下。When the aforementioned processing fluid contains other components, based on the total amount of the aforementioned processing fluid of 100% by mass, the total content of other components in the aforementioned processing fluid is preferably at least 0.0001% by mass, preferably at least 0.0002% by mass, more preferably at least 0.0002% by mass. 0.0003 mass % or more, more preferably 0.0004 mass % or more, and preferably 0.0800 mass % or less, preferably 0.0500 mass % or less, more preferably 0.0100 mass % or less, still more preferably 0.0050 mass % or less, even more preferably 0.0010% by mass or less.

又,前述加工液含有pH調整劑作為其他成分時,以前述加工液之總量100質量%為基準計,前述加工液中之pH調整劑的合計含量宜為0.0001質量%以上、較佳為0.0002質量%以上、更佳為0.0003質量%以上,且宜為0.0100質量%以下、較佳為0.0050質量%以下、更佳為0.0010質量%以下、再更佳為0.0008質量%以下。Also, when the aforementioned processing liquid contains a pH adjuster as another component, the total content of the pH adjuster in the aforementioned processing liquid is preferably 0.0001% by mass or more, preferably 0.0002% by mass, based on 100% by mass of the total amount of the aforementioned processing liquid. Mass % or more, more preferably 0.0003 mass % or more, and preferably 0.0100 mass % or less, preferably 0.0050 mass % or less, more preferably 0.0010 mass % or less, more preferably 0.0008 mass % or less.

又,由使潤滑性、消泡性及清潔性提升之觀點,以前述加工液之總量100質量%為基準計,前述加工液中之成分(A)、成分(B)、成分(C)及成分(D)的合計含量宜為99.9200質量%以上、較佳為99.9500質量%以上、更佳為99.9900質量%以上、再更佳為99.9950質量%以上、再更佳為99.9990質量%以上,且宜為100.0000質量%以下、較佳為99.9999質量%以下、更佳為99.9998質量%以下、再更佳為99.9997質量%以下、再更佳為99.9996質量%以下。Also, from the viewpoint of improving lubricity, defoaming properties, and cleanability, based on 100% by mass of the total amount of the aforementioned machining fluid, the component (A), component (B), and component (C) in the aforementioned machining fluid and the total content of component (D) is preferably at least 99.9200 mass %, preferably at least 99.9500 mass %, more preferably at least 99.9900 mass %, still more preferably at least 99.9950 mass %, even more preferably at least 99.9990 mass %, and Preferably it is 100.0000 mass % or less, preferably 99.9999 mass % or less, more preferably 99.9998 mass % or less, still more preferably 99.9997 mass % or less, still more preferably 99.9996 mass % or less.

又,將前述加工液用於脆性材料之加工時,由可抑制在後述加工液之用途之欄中的各線材及加工裝置等的腐蝕的觀點,前述加工液之pH宜為3.0以上、較佳為4.0以上、更佳為5.0以上。另一方面,例如由可抑制在加工矽等時從粉屑中產生大量氫的觀點,前述加工液之pH宜為9.0以下、較佳為8.0以下、更佳為7.0以下。 又,該加工液之pH值係使用後述實施例記載的方法測定的值。 Also, when the aforementioned machining fluid is used for machining brittle materials, the pH of the aforementioned machining fluid is preferably 3.0 or higher, preferably 3.0 or higher, from the viewpoint of suppressing corrosion of wire rods and processing equipment, etc. 4.0 or more, more preferably 5.0 or more. On the other hand, the pH of the working liquid is preferably 9.0 or less, preferably 8.0 or less, more preferably 7.0 or less, from the viewpoint of suppressing the generation of a large amount of hydrogen from powder chips during processing of silicon or the like. In addition, the pH value of this working liquid is the value measured using the method described in the Example mentioned later.

又,例如如後所述,將前述加工液用在使用線材加工由脆性材料構成之被加工材之用途時,由容易抑制於脆性材料之切斷中產生的線材的斷線的觀點,前述加工液之表面張力宜為35mN/m以下、較佳為34mN/m以下、更佳為33mN/m以下。 另一方面,前述加工液之表面張力宜為1mN/m以上、較佳為5mN/m以上、更佳為10mN/m以上。 又,該加工液之表面張力係使用後述實施例記載的方法測定的值。 Also, for example, as described later, when the aforementioned machining liquid is used for the purpose of machining a workpiece made of a brittle material using a wire rod, from the viewpoint of easily suppressing the breakage of the wire rod that occurs during the cutting of the brittle material, the aforementioned machining The surface tension of the liquid is preferably 35 mN/m or less, preferably 34 mN/m or less, more preferably 33 mN/m or less. On the other hand, the surface tension of the aforementioned working fluid is preferably not less than 1 mN/m, preferably not less than 5 mN/m, more preferably not less than 10 mN/m. In addition, the surface tension of the machining fluid is a value measured by the method described in Examples described later.

[加工液之製造方法] 前述加工液之製造方法,係至少調配下述成分: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述製造方法係以如下方式進行調配而獲得加工液: 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 [Manufacturing method of machining fluid] The manufacturing method of the aforementioned working fluid is to prepare at least the following components: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The foregoing manufacturing method is prepared in the following manner to obtain the machining fluid: Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid.

調配成分(A)~成分(D)之順序並無特別限制,例如可對於作為成分(D)之水依序或同時調配成分(A)、成分(B)及成分(C),亦可預先調配成分(A)、成分(B)及成分(C)後,將其混合物調配於作為成分(D)之水。 又,於該製造方法中,亦可調配成分(A)~成分(D)、進而視需要調配其他成分,此時所調配的各成分的調配順序、調配方法等並無特別限定。 再者,成分(A)、成分(B)、成分(C)、成分(D)及其他成分分別與前述在加工液之欄中所敘述者相同,由於其較佳態樣亦相同,故省略其詳細說明。又,關於成分(A)、成分(B)、成分(C)、成分(D)及其他成分的較佳的調配量及各成分間的較佳的調配量比,由於分別與前述在加工液之欄中所敘述的前述加工液中的各含量及各含量比相同,故省略其詳細說明。 There is no special limitation on the order of ingredients (A)~components (D). For example, ingredients (A), ingredients (B) and ingredients (C) can be prepared sequentially or simultaneously with water as ingredient (D), or they can be prepared in advance. After preparing the component (A), the component (B) and the component (C), the mixture is prepared in the water which is the component (D). In addition, in this production method, component (A) to component (D) can also be compounded, and further other components can be compounded if necessary, and the compounding order and compounding method of each component compounded at this time are not particularly limited. Furthermore, component (A), component (B), component (C), component (D) and other components are the same as those described above in the column of processing fluid, and their preferred aspects are also the same, so they are omitted its detailed description. Also, regarding the preferred blending amounts of component (A), component (B), component (C), component (D) and other components and the preferred blending amount ratio between each component, due to the above-mentioned processing fluid respectively The respective contents and respective content ratios in the aforementioned working fluids described in the column of are the same, so detailed description thereof will be omitted.

[加工液之用途] 前述加工液可適合於利用前述線鋸、較佳為固定磨粒線鋸對由矽錠等脆性材料構成之被加工材進行線鋸加工時使用。即,前述加工液可適合於利用線材對由脆性材料構成之被加工材進行加工時使用,更可適合於利用固定磨粒線材對由脆性材料構成之被加工材進行加工時使用。 關於前述脆性材料,例如可列舉:結晶矽、藍寶石、氮化鎵、碳化矽、釹磁鐵、水晶及玻璃。由可有效地利用前述加工液所具有的優異清潔性的觀點,前述加工液更可適合於對結晶矽、藍寶石、碳化矽、氮化鎵、釹磁鐵、水晶或玻璃進行加工時使用,進一步可適合於對結晶矽、藍寶石或碳化矽進行加工時使用。 [Use of machining fluid] The aforementioned machining fluid is suitable for use when using the aforementioned wire saw, preferably a fixed abrasive wire saw, to wire saw a material to be processed consisting of brittle materials such as silicon ingots. That is, the aforementioned machining fluid is suitable for use when machining a workpiece composed of a brittle material with a wire rod, and is more suitable for use when machining a workpiece composed of a brittle material with a fixed abrasive wire rod. Regarding the aforementioned brittle materials, for example, crystalline silicon, sapphire, gallium nitride, silicon carbide, neodymium magnets, crystals, and glass can be cited. From the viewpoint of effectively utilizing the excellent cleaning properties of the aforementioned machining fluid, the aforementioned machining fluid is more suitable for use when processing crystalline silicon, sapphire, silicon carbide, gallium nitride, neodymium magnets, crystal or glass, and further can Suitable for processing crystalline silicon, sapphire or silicon carbide.

[脆性材料之加工方法] 本發明之一實施形態之脆性材料之加工方法係使用前述加工液對由矽錠等前述脆性材料構成之被加工材進行加工的方法。 此處,前述加工液係以將其供給於被加工材、使之與被加工材接觸而使用。前述加工液係潤滑前述被加工材與前述線鋸等加工用具之間。進而,亦使用在用以去除切屑(粉屑)、被加工材之防鏽、冷卻工具及被加工材等。 使用前述加工液進行的脆性材料的加工,具體而言可列舉:切削加工、研削加工、沖孔加工、拋光、引伸加工、抽伸加工、輥軋加工等各種加工,但此等之中,較佳為切削加工、研削加工,更佳為切削加工。 作為被加工材的脆性材料可例舉前述的材料。 再者,如前所述,前述加工液係適合用作對矽錠進行切斷加工時所使用者。 [Processing method of brittle materials] A method of processing a brittle material according to an embodiment of the present invention is a method of processing a workpiece composed of the aforementioned brittle material such as a silicon ingot using the aforementioned machining fluid. Here, the machining liquid is used by supplying it to the workpiece and bringing it into contact with the workpiece. The working fluid lubricates between the workpiece and a working tool such as the wire saw. Furthermore, it is also used to remove swarf (dust), rust prevention of processed materials, cooling tools and processed materials, etc. The processing of brittle materials using the above-mentioned processing fluid specifically includes various processing such as cutting processing, grinding processing, punching processing, polishing, drawing processing, drawing processing, rolling processing, etc. Among them, preferred Cutting processing, grinding processing, more preferably cutting processing. As a brittle material to be processed, the above-mentioned materials can be mentioned. Furthermore, as mentioned above, the aforementioned machining fluid is suitable for use when cutting silicon ingots.

於此,更具體而言,如前所述游離磨粒方式與固定磨粒方式之兩種方式的線鋸加工方法,由於是從前述矽錠一次切出複數個矽晶圓,故使用多線鋸裝置。於多線鋸裝置中,於以固定間隔雕刻有複數個溝槽的二個以上導引輥上的各溝槽各捲繞一條線材,且各線材以固定張力平行地保持。然後,於切斷加工時,使各導引輥旋轉,一面使從噴嘴等噴出的加工液附著於線材上,一面使該線材朝一方向或二方向移動,將矽錠壓抵於附著有加工液的線材進行切斷。又,視需要亦有對矽錠等被加工物本身一面注入加工液一面進行加工之情形。 用於加工的加工液係貯藏於槽部等,從那裡利用配管等運送至前述的加工室噴嘴。又,切斷時所使用的加工液係被切斷裝置下部的已使用加工液接收槽等回收。又,視情形有時亦於裝置內循環進行再利用。 Here, more specifically, the wire saw processing methods of the two methods of the free abrasive grain method and the fixed abrasive grain method mentioned above use multiple wires to cut out a plurality of silicon wafers from the aforementioned silicon ingot at one time. Saw device. In the multi-wire saw device, one wire is wound around each groove of two or more guide rollers engraved with a plurality of grooves at fixed intervals, and each wire is held in parallel at a constant tension. Then, during the cutting process, each guide roller is rotated, and while the machining fluid sprayed from the nozzle etc. is attached to the wire, the wire is moved in one direction or two directions, and the silicon ingot is pressed against the surface to which the machining fluid adhered. The wire is cut. Also, if necessary, the workpiece itself, such as a silicon ingot, may be processed while being poured with the processing liquid. The machining fluid used for machining is stored in a tank or the like, and is transported from there to the aforementioned machining chamber nozzles by piping or the like. In addition, the machining fluid used in the cutting is recovered by the used machining fluid receiving tank and the like at the lower part of the cutting device. In addition, depending on the situation, it may be recycled in the device.

然後,前述本發明之一實施形態之加工液由於潤滑性、消泡性及清潔性之平衡優異,故為有助於提高加工精度與生產性(良率提高)者。 因此,前述本發明之一實施形態之加工液更適合用作於如此的脆性材料的加工方法中使用的加工液,其中,更適合用作利用固定磨粒線鋸從矽錠切出矽晶圓的加工方法中所使用的加工液,尤其適合用作利用使用固定磨粒線鋸的多線材裝置從矽錠切出矽晶圓的加工方法。 又,前述本發明之一實施形態之加工液在使用具有更細線徑(絲線形)的線材(較佳為固定磨粒線材)從矽錠切出矽晶圓時,亦可發揮前述優異的效果。因此,例如更適合用在從矽錠切出太陽電池用矽晶圓的加工方法。 Then, the machining fluid according to one embodiment of the present invention contributes to improvement of machining accuracy and productivity (yield improvement) due to its excellent balance of lubricity, defoaming properties, and cleaning properties. Therefore, the aforementioned processing fluid according to one embodiment of the present invention is more suitable as a processing fluid used in such a processing method for brittle materials, among which, it is more suitable for cutting out silicon wafers from silicon ingots by using a fixed abrasive wire saw. The processing fluid used in the processing method is especially suitable as a processing method for cutting out silicon wafers from silicon ingots using a multi-wire device using a fixed abrasive wire saw. In addition, the above-mentioned processing fluid according to one embodiment of the present invention can also exert the above-mentioned excellent effect when using a wire rod (preferably a fixed abrasive wire rod) with a thinner wire diameter (wire shape) to cut out a silicon wafer from a silicon ingot. . Therefore, for example, it is more suitable for the processing method of cutting silicon wafers for solar cells from silicon ingots.

於此,用於脆性材料加工的線材的絲線徑可根據其用途而適當選擇,例如宜為55μm以下、較佳為54μm以下、更佳為53μm以下,且宜為30μm以上、較佳為35μm以上、更佳為38μm以上。Here, the wire diameter of the wire used for processing brittle materials can be appropriately selected according to the application, for example, it is preferably 55 μm or less, preferably 54 μm or less, more preferably 53 μm or less, and preferably 30 μm or more, preferably 35 μm or more , more preferably 38 μm or more.

[加工裝置] 本發明之一實施形態之脆性材料之加工裝置係使用前述本發明之一實施形態之加工液的加工裝置,較佳為多線材切斷加工裝置、更佳為具備固定磨粒線鋸的多線材切斷加工裝置、再更佳為具備矽錠切斷用之固定磨粒線鋸的多線材切斷加工裝置。 [processing device] A processing device for brittle materials according to one embodiment of the present invention is a processing device using the above-mentioned processing fluid according to one embodiment of the present invention, preferably a multi-wire cutting processing device, more preferably a multi-wire with a fixed abrasive wire saw The cutting processing device is more preferably a multi-wire cutting processing device equipped with a fixed abrasive wire saw for cutting silicon ingots.

[加工液用組成物] 又,本發明之一實施形態之加工液,亦可為例如藉由以水稀釋濃縮液或與該濃縮液相同組成的組成物而獲得者,該濃縮液係將加工液中的水減量而濃縮到20倍以上且2,000倍以下者。 即,進行前述加工時,可將前述加工液之濃縮液或與該濃縮液相同組成的前述加工液用組成物(以下也簡稱為「加工液用組成物」)以水稀釋到20倍以上且2,000倍以下後,用作前述加工液。 例如,亦可將前述加工液形成為加工液用組成物,以適合保管・運送等的態樣之形式使用。 此處,本說明書中所謂該「加工液用組成物」,如前所述不限於使加工液中的水減量而進行濃縮者,亦包含在將用水稀釋而成為加工液作為前提下進行製備的組成物。再者,關於將用水稀釋而成為加工液作為前提下進行製備的組成物,亦包含如下的組成物:只是用水稀釋並不會成為前述加工液,而在進行前述加工之前,以成為前述關於加工液之前述的各成分範圍之方式,對該組成物添加後述的一部分的成分,並調整其量而使用者。 [Composition for machining fluid] In addition, the processing liquid in one embodiment of the present invention may be obtained by diluting a concentrated liquid or a composition having the same composition as the concentrated liquid with water, and the concentrated liquid is concentrated by reducing the amount of water in the processing liquid. 20 times or more and 2,000 times or less. That is, when performing the aforementioned processing, the concentrate of the aforementioned processing fluid or the aforementioned composition for processing fluid having the same composition as the concentrate (hereinafter also simply referred to as "the composition for processing fluid") may be diluted to 20 times or more with water and After 2,000 times or less, it is used as the aforementioned processing fluid. For example, the aforementioned machining fluid may be formed into a composition for machining fluid and used in a form suitable for storage, transportation, and the like. Here, the "composition for processing fluid" in this specification is not limited to the one prepared by reducing the amount of water in the processing fluid and concentrating it as described above, but also includes those prepared on the premise of diluting with water to obtain a processing fluid. Composition. Furthermore, the composition prepared on the premise of being diluted with water to become a processing fluid also includes the following composition: just being diluted with water does not become the aforementioned processing fluid, but before the aforementioned processing is performed to become the aforementioned processing fluid. In the form of the above-mentioned range of each component of the liquid, a part of the components described later is added to the composition, and the amount is adjusted for use.

關於前述加工液用組成物之一實施形態可例舉如下的加工液用組成物,即包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 Regarding one embodiment of the aforementioned composition for working fluid, the following composition for working fluid can be exemplified, which includes: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more.

又,於不妨礙本發明目的之範圍內,前述加工液用組成物除了前述成分(A)~(D)外,亦可進而包含其他成分。 又,前述加工液用組成物中,成分(A)、成分(B)、成分(C)及成分(D)以及可任意地添加的其他成分,由於分別與前述加工液之欄中所敘述者相同,其較佳態樣亦相同,故省略其詳細說明。 又,前述加工液用組成物中,成分(A)、成分(B)、成分(C)及成分(D)、以及其他成分的合適含量的範圍並無特別限制,但將該加工液用組成物以水稀釋20倍以上且2,000倍以下後使用時,宜分別以滿足在前述加工液之欄中前述的各成分的合適含量的範圍的方式含有。 Moreover, in addition to the above-mentioned components (A)-(D), the said composition for machining fluids may further contain other components within the range which does not interfere with the object of this invention. In addition, in the above-mentioned composition for processing fluid, component (A), component (B), component (C) and component (D) and other components that can be added arbitrarily are the same as those described in the column of the above-mentioned processing fluid. The same, and its preferred form is also the same, so its detailed description is omitted. In addition, in the above-mentioned composition for working fluid, there is no particular limitation on the suitable content ranges of component (A), component (B), component (C) and component (D), and other components, but the composition for working fluid When the substance is diluted with water by 20 times or more and 2,000 times or less, it is preferably contained so as to satisfy the appropriate content ranges of the above-mentioned components in the column of the above-mentioned processing fluid.

例如,關於前述本發明之一實施形態之加工液用組成物,可列舉以下的各實施形態。 [2-1] 一種加工液用組成物,包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 [2-2] 如前述[2-1]記載之加工液用組成物,其中以加工液用組成物之總量100質量%為基準計,成分(A)之含量宜為1.000質量%以上、較佳為2.500質量%以上、更佳為5.000質量%以上,且宜為91.780質量%以下、較佳為90.900質量%以下、更佳為89.250質量%以下、再更佳為86.500質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述[2-1]記載之加工液用組成物之一態樣,以前述加工液用組成物之總量100質量%為基準計,成分(A)之含量宜為0.200質量%以上且91.780質量%以下、較佳為1.000質量%以上且90.900質量%以下、更佳為2.500質量%以上且89.250質量%以下、再更佳為5.000質量%以上且86.500質量%以下。 [2-3] 如前述[2-1]或[2-2]記載之加工液用組成物,其中以加工液用組成物之總量100質量%為基準計,成分(B)之含量宜為0.500質量%以上、較佳為1.250質量%以上、更佳為2.500質量%以上,且宜為91.680質量%以下、較佳為90.400質量%以下、更佳為88.000質量%以下、再更佳為84.000質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述[2-1]或[2-2]記載之加工液用組成物之一態樣,以前述加工液用組成物之總量100質量%為基準計,成分(B)之含量宜為0.100質量%以上且91.680質量%以下、較佳為0.500質量%以上且90.400質量%以下、更佳為1.250質量%以上且88.000質量%以下、再更佳為2.500質量%以上且84.000質量%以下。 [2-4] 如前述[2-1]~[2-3]中任一項記載之加工液用組成物,其中以加工液用組成物之總量100質量%為基準計,成分(C)之含量宜為0.600質量%以上、較佳為1.500質量%以上、更佳為3.000質量%以上,且宜為91.700質量%以下、較佳為90.500質量%以下、更佳為88.250質量%以下、再更佳為84.500質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述[2-1]~[2-3]中任一項記載之加工液用組成物之一態樣,以前述加工液用組成物之總量100質量%為基準計,成分(C)之含量宜為0.120質量%以上且91.700質量%以下、較佳為0.600質量%以上且90.500質量%以下、更佳為1.500質量%以上且88.250質量%以下、再更佳為3.000質量%以上且84.500質量%以下。 [2-5] 如前述[2-1]~[2-4]中任一項記載之加工液用組成物,其中成分(A)係1質量%水溶液之濁點為20℃以上且50℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 [2-6] 如前述[2-1]~[2-5]中任一項記載之加工液用組成物,其中成分(B)係1質量%水溶液之濁點為大於50℃且80℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 [2-7] 如前述[2-1]~[2-6]中任一項記載之加工液用組成物,其中成分(A)之含量與成分(B)之含量的比〔(A)/(B)〕以質量比計宜為1.00以上、較佳為1.50以上、更佳為2.00以上,且宜為20.00以下、較佳為15.00以下、更佳為10.00以下。 [2-8] 如前述[2-1]~[2-7]中任一項記載之加工液用組成物,其中成分(A)及成分(B)之合計含量與成分(C)之含量的比〔(A)+(B)/(C)〕,以質量比計宜為1.00以上、較佳為1.20以上、更佳為1.30以上,且宜為20.00以下、較佳為15.00以下、更佳為12.00以下。 [2-9] 如前述[2-1]~[2-8]中任一項記載之加工液用組成物,其中以加工液用組成物之總量100質量%為基準計,成分(D)之含量宜為8.000質量%以上、較佳為9.000質量%以上、更佳為10.000質量%以上、再更佳為12.000質量%以上,且宜為99.580質量%以下、較佳為97.900質量%以下、更佳為94.750質量%以下、再更佳為89.500質量%以下。 [2-10] 如前述[2-1]~[2-9]中任一項記載之加工液用組成物,其中前述加工液用組成物進而包含其他成分時,以加工液用組成物之總量100質量%為基準計,前述加工液用組成物中其他成分的合計含量宜為0.002質量%以上、較佳為0.004質量%以上、更佳為0.006質量%以上、再更佳為0.008質量%以上,且宜為40.000質量%以下、較佳為35.000質量%以下、更佳為30.000質量%以下、再更佳為27.000質量%以下、再更佳為25.000質量%以下。 For example, with regard to the composition for machining fluid according to one embodiment of the present invention described above, the following embodiments can be exemplified. [2-1] A composition for working fluid, comprising: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more. [2-2] In the composition for working fluid as described in [2-1] above, based on 100% by mass of the total amount of the composition for working fluid, the content of component (A) is preferably 1.000% by mass or more, preferably 2.500% by mass % or more, more preferably 5.000 mass % or more, and preferably 91.780 mass % or less, preferably 90.900 mass % or less, more preferably 89.250 mass % or less, more preferably 86.500 mass % or less. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, there is no particular limitation on their combinations. For example, regarding one aspect of the composition for working fluid described in [2-1] above, based on the total amount of the composition for working fluid 100% by mass, the composition The content of (A) is preferably not less than 0.200% by mass and not more than 91.780% by mass, preferably not less than 1.000% by mass and not more than 90.900% by mass, more preferably not less than 2.500% by mass and not more than 89.250% by mass, still more preferably 5.000% by mass Above and below 86.500% by mass. [2-3] The composition for working fluid as described in [2-1] or [2-2] above, wherein the content of component (B) is preferably 0.500% by mass or more based on 100% by mass of the total amount of the composition for working fluid , preferably more than 1.250 mass%, more preferably more than 2.500 mass%, and preferably less than 91.680 mass%, preferably less than 90.400 mass%, more preferably less than 88.000 mass%, more preferably less than 84.000 mass%. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, there is no particular limitation on their combinations. For example, regarding one aspect of the composition for machining fluid described in [2-1] or [2-2] above, the total amount of the composition for machining fluid mentioned above is 100% by mass. Based on %, the content of component (B) is preferably from 0.100% by mass to 91.680% by mass, preferably from 0.500% by mass to 90.400% by mass, more preferably from 1.250% by mass to 88.000% by mass, and then More preferably, it is 2.500 mass % or more and 84.000 mass % or less. [2-4] The composition for working fluid as described in any one of [2-1]~[2-3] above, wherein based on the total amount of the composition for working fluid 100% by mass, the content of component (C) is preferably 0.600 mass % or more, preferably 1.500 mass % or more, more preferably 3.000 mass % or more, and preferably 91.700 mass % or less, preferably 90.500 mass % or less, more preferably 88.250 mass % or less, more preferably 84.500 mass % Mass% or less. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, there is no particular limitation on their combinations. For example, with regard to one aspect of the composition for working fluid described in any one of [2-1] to [2-3] above, the composition for working fluid mentioned above is Based on the total amount of 100% by mass, the content of component (C) is preferably not less than 0.120% by mass and not more than 91.700% by mass, preferably not less than 0.600% by mass and not more than 90.500% by mass, more preferably not less than 1.500% by mass and not more than 88.250% by mass % or less, more preferably 3.000 mass % or more and 84.500 mass % or less. [2-5] The composition for working fluid according to any one of [2-1] to [2-4] above, wherein component (A) is a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, and Contains copolymerization sites of ethylene oxide and propylene oxide, and does not have ethynyl groups. [2-6] The composition for a working fluid according to any one of [2-1] to [2-5] above, wherein component (B) is a compound having a cloud point of a 1% by mass aqueous solution of more than 50°C and not more than 80°C, and Contains copolymerization sites of ethylene oxide and propylene oxide, and does not have ethynyl groups. [2-7] The composition for working fluid according to any one of [2-1] to [2-6] above, wherein the ratio of the content of component (A) to the content of component (B) [(A)/(B)] The mass ratio is preferably 1.00 or more, preferably 1.50 or more, more preferably 2.00 or more, and preferably 20.00 or less, preferably 15.00 or less, more preferably 10.00 or less. [2-8] The composition for working fluid as described in any one of [2-1] to [2-7] above, wherein the ratio of the total content of component (A) and component (B) to the content of component (C) [(A )+(B)/(C)], the mass ratio is preferably 1.00 or more, preferably 1.20 or more, more preferably 1.30 or more, and preferably 20.00 or less, preferably 15.00 or less, more preferably 12.00 or less. [2-9] The composition for working fluid as described in any one of [2-1] to [2-8] above, wherein based on the total amount of the composition for working fluid 100% by mass, the content of component (D) is preferably 8.000 mass % or more, preferably 9.000 mass % or more, more preferably 10.000 mass % or more, more preferably 12.000 mass % or more, preferably 99.580 mass % or less, preferably 97.900 mass % or less, more preferably 94.750 mass % Mass % or less, more preferably 89.500 mass % or less. [2-10] The composition for working fluid as described in any one of [2-1] to [2-9] above, wherein when the composition for working fluid further includes other components, the total amount of the composition for working fluid is 100% by mass Based on this, the total content of other components in the aforementioned composition for processing fluid is preferably at least 0.002% by mass, preferably at least 0.004% by mass, more preferably at least 0.006% by mass, even more preferably at least 0.008% by mass, and preferably It is 40.000 mass % or less, preferably 35.000 mass % or less, more preferably 30.000 mass % or less, still more preferably 27.000 mass % or less, still more preferably 25.000 mass % or less.

[2-11] 如前述[2-1]~[2-10]中任一項記載之加工液用組成物,其中前述加工液用組成物進而含有pH調整劑作為其他成分時,以前述加工液用組成物之總量100質量%為基準計,前述加工液用組成物中的pH調整劑的合計含量宜為0.002質量%以上、較佳為0.003質量%以上、更佳為0.004質量%以上,且宜為20.000質量%以下、較佳為10.000質量%以下、更佳為2.000質量%以下、再更佳為1.600質量%以下。 [2-12] 如前述[2-1]~[2-11]中任一項記載之加工液用組成物,其中以前述加工液用組成物之總量100質量%為基準計,前述加工液用組成物中的成分(A)、成分(B)、成分(C)及成分(D)之合計含量宜為60.000質量%以上、較佳為65.000質量%以上、更佳為70.000質量%以上、再更佳為73.000質量%以上、再更佳為75.000質量%以上,且宜為100.000質量%以下、較佳為99.998質量%以下、更佳為99.996質量%以下、再更佳為99.994質量%以下、再更佳為99.992質量%以下。 [2-13] 如前述[2-1]~[2-12]中任一項記載之加工液用組成物,其中pH宜為3.0以上、較佳為4.0以上、更佳為5.0以上,且宜為9.0以下、較佳為8.5以下、更佳為8.0以下。 [2-14] 如前述[2-1]~[2-13]中任一項記載之加工液用組成物,其係於利用線材對由脆性材料構成之被加工材進行加工時使用。 [2-15] 如前述[2-14]記載之加工液用組成物,其中前述線材為固定磨粒線材。 [2-16] 如前述[2-14]或[2-15]記載之加工液用組成物,其中前述脆性材料為結晶矽、藍寶石、碳化矽、氮化鎵、釹磁鐵、水晶或玻璃。 [2-11] The composition for working fluid as described in any one of [2-1] to [2-10] above, wherein when the composition for working fluid further contains a pH adjuster as another component, the composition for working fluid Based on the total amount of 100% by mass, the total content of the pH adjusters in the aforementioned composition for working fluid is preferably at least 0.002% by mass, preferably at least 0.003% by mass, more preferably at least 0.004% by mass, and preferably at least 20.000% by mass. Mass % or less, preferably 10.000 mass % or less, more preferably 2.000 mass % or less, still more preferably 1.600 mass % or less. [2-12] The composition for working fluid as described in any one of [2-1] to [2-11] above, wherein based on 100% by mass of the total amount of the composition for working fluid, in the composition for working fluid The total content of component (A), component (B), component (C) and component (D) is preferably 60.000 mass % or more, preferably 65.000 mass % or more, more preferably 70.000 mass % or more, and more preferably 73.000 mass % or more, more preferably 75.000 mass % or more, and preferably 100.000 mass % or less, preferably 99.998 mass % or less, more preferably 99.996 mass % or less, still more preferably 99.994 mass % or less, even more preferably It is 99.992% by mass or less. [2-13] The composition for working fluid as described in any one of [2-1] to [2-12] above, wherein the pH is preferably 3.0 or higher, preferably 4.0 or higher, more preferably 5.0 or higher, and preferably 9.0 or lower, Preferably it is 8.5 or less, More preferably, it is 8.0 or less. [2-14] The composition for a working fluid as described in any one of [2-1] to [2-13] above, which is used when machining a workpiece made of a brittle material with a wire rod. [2-15] The composition for machining fluid as described in [2-14] above, wherein the wire rod is a fixed abrasive wire rod. [2-16] The composition for machining fluid as described in [2-14] or [2-15] above, wherein the brittle material is crystalline silicon, sapphire, silicon carbide, gallium nitride, neodymium magnet, crystal or glass.

[加工液用組成物之製造方法] 前述加工液用組成物例如可藉由以下製造方法來製造。 即,前述[2-1]~[2-16]中任一項記載之加工液用組成物之製造方法,係至少調配下述成分: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述製造方法係以如下方式進行調配而獲得加工液用組成物: 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 [Manufacturing method of composition for machining fluid] The aforementioned composition for working fluid can be produced, for example, by the following production method. That is, the method for producing the composition for machining fluid described in any one of the aforementioned [2-1] to [2-16] is to prepare at least the following components: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The aforementioned manufacturing method is formulated in the following manner to obtain the composition for machining fluid: Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more.

調配成分(A)~成分(D)之順序並無特別限制,例如可對於作為成分(D)之水依序或同時調配成分(A)、成分(B)及成分(C),亦可預先調配成分(A)、成分(B)及成分(C)後,將其混合物調配於作為成分(D)之水。 又,於該製造方法中,亦可調配成分(A)~成分(D)、進而視需要調配其他成分,此時所調配的各成分的調配順序、調配方法等並無特別限定。 再者,成分(A)、成分(B)、成分(C)、成分(D)及其他成分分別與前述在加工液之欄中所敘述者相同,由於其較佳態樣亦相同,故省略其詳細說明。又,關於成分(A)、成分(B)、成分(C)、成分(D)及其他成分的較佳的調配量及各成分間的較佳的調配量比,由於亦分別與前述在[2-1]~[2-16]之欄中所敘述的前述加工液用組成物中的各含量及各含量比相同,故省略其詳細說明。 There is no special limitation on the order of ingredients (A)~components (D). For example, ingredients (A), ingredients (B) and ingredients (C) can be prepared sequentially or simultaneously with water as ingredient (D), or they can be prepared in advance. After preparing the component (A), the component (B) and the component (C), the mixture is prepared in the water which is the component (D). In addition, in this production method, component (A) to component (D) can also be compounded, and further other components can be compounded if necessary, and the compounding order and compounding method of each component compounded at this time are not particularly limited. Furthermore, component (A), component (B), component (C), component (D) and other components are the same as those described above in the column of processing fluid, and their preferred aspects are also the same, so they are omitted its detailed description. Also, regarding the preferred blending amounts of component (A), component (B), component (C), component (D) and other components and the preferred blending amount ratio between each component, because they are also the same as those mentioned above in [ 2-1] to [2-16], the respective contents and respective content ratios in the aforementioned compositions for working fluids are the same, and therefore detailed description thereof will be omitted.

[加工液用組成物之使用方法] 前述加工液用組成物如前所述,主要可用於以水進行稀釋而製備前述加工液。 即,本發明之一實施形態之加工液用組成物之使用方法,可舉例如下方法: 將前述加工液用組成物以水進行稀釋而以如下方式製備前述加工液,並將該加工液使用在於前述加工液之欄中所說明的加工液之用途及脆性材料之加工方法;該加工液包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述使用方法係以如下方式製備前述加工液: 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 [How to use the composition for machining fluid] The aforementioned composition for working fluid is mainly used for preparing the aforementioned working fluid by diluting it with water as described above. That is, the method of using the composition for machining fluid in one embodiment of the present invention can be exemplified as follows: Dilute the above-mentioned composition for processing fluid with water to prepare the above-mentioned processing fluid in the following manner, and use the processing fluid to use the application of the processing fluid and the processing method for brittle materials described in the column of the above-mentioned processing fluid; the processing fluid Include: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The aforementioned method of use is to prepare the aforementioned working fluid in the following manner: Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid.

因此,前述[2-1]~[2-16]記載之實施形態之加工液用組成物,可藉由進而以水進行稀釋,並視需要調整成分(A)~(C)之含量,而用作前述本發明之一實施形態之加工液。 關於該加工液之一實施形態,可舉例:將前述[2-1]~[2-16]記載之實施形態的加工液用組成物以水進行稀釋,並視需要調整成分(A)~(C)之含量而獲得的如前述[1]~[12]記載的實施形態的加工液。 以作為成分(D)之水將前述加工液用組成物進行稀釋時的稀釋倍率,只要可製備前述加工液並無特別限制,但以前述加工液用組成物之總量(質量)換算計,宜為20倍以上、較佳為100倍以上、更佳為250倍以上、再更佳為500倍以上,且宜為2,000倍以下、較佳為1,800倍以下、更佳為1,500倍以下、再更佳為1,000倍以下。 Therefore, the composition for machining fluid according to the embodiments described in [2-1] to [2-16] above can be further diluted with water, and the content of components (A) to (C) can be adjusted as necessary, It is used as a working fluid in one embodiment of the present invention described above. Regarding one embodiment of the processing fluid, for example: dilute the composition for processing fluid of the embodiment described in the aforementioned [2-1] to [2-16] with water, and adjust components (A) to ( C) content obtained as the processing fluid described in the aforementioned [1] to [12] embodiment. The dilution factor when diluting the composition for processing fluid with water as the component (D) is not particularly limited as long as the composition for processing fluid can be prepared, but calculated in terms of the total amount (mass) of the composition for processing fluid Preferably more than 20 times, preferably more than 100 times, more preferably more than 250 times, more preferably more than 500 times, and preferably less than 2,000 times, preferably less than 1,800 times, more preferably less than 1,500 times, and then More preferably, it is 1,000 times or less.

另一方面,如前所述,例如前述[2-1]~[2-16]記載之實施形態之加工液用組成物本身亦可為以濃縮液之形式獲得者,該濃縮液係將前述本發明之一實施形態之加工液中之作為成分(D)的水減量而濃縮而成者。關於該加工液用組成物之一實施形態,可舉例:將前述[1]~[12]記載之實施形態之加工液藉由蒸餾等操作使成分(D)減量等,而濃縮到20倍以上且2,000倍以下而獲得的前述[2-1]~[2-16]記載之實施形態之加工液用組成物。 從前述加工液使作為成分(D)之水減量而濃縮時的濃縮倍率並無特別限制,但以前述加工液之總量(質量)換算計,宜為20倍以上、較佳為100倍以上、更佳為250倍以上、再更佳為500倍以上,且宜為2,000倍以下、較佳為1,800倍以下、更佳為1,500倍以下、再更佳為1,000倍以下。 On the other hand, as mentioned above, for example, the composition for processing fluids of the embodiments described in [2-1] to [2-16] above can also be obtained in the form of a concentrated solution, which is the aforementioned The processing fluid according to one embodiment of the present invention is obtained by reducing the amount of water as the component (D) and concentrating it. As an example of an embodiment of the composition for processing fluid, the processing fluid of the embodiment described in [1] to [12] above is concentrated to 20 times or more by reducing the amount of component (D) by distillation or the like. and 2,000 times or less, the composition for machining fluid of the embodiment described in [2-1] to [2-16] above. The concentration ratio when reducing the water as component (D) from the aforementioned working liquid to concentrate is not particularly limited, but it is preferably 20 times or more, preferably 100 times or more, in terms of the total amount (mass) of the aforementioned working liquid , more preferably at least 250 times, more preferably at least 500 times, and preferably at most 2,000 times, preferably at most 1,800 times, more preferably at most 1,500 times, and even more preferably at most 1,000 times.

又,關於使用前述[2-1]~[2-16]記載之加工液用組成物獲得之加工液之用途、使用利用該加工液用組成物獲得之加工液的脆性材料之加工方法、及加工裝置,由於亦分別與在本發明之一實施形態之前述加工液之欄之對應項目中說明的內容相同,故省略詳細說明。Also, regarding the use of the machining fluid obtained using the machining fluid composition described in [2-1] to [2-16] above, the processing method of brittle materials using the machining fluid obtained using the machining fluid composition, and Since the processing devices are also the same as those described in the corresponding items in the above-mentioned processing fluid column of one embodiment of the present invention, detailed description thereof will be omitted.

[脆性材料加工液組成物] 又,關於本發明之一實施形態之脆性材料加工液組成物,可舉例以下之脆性材料加工液組成物。 一種脆性材料加工液組成物,包含:含有下述成分(A)~(C)之添加劑混合物、及成分(D):水; 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上; 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 [Fluid composition for brittle materials] In addition, the following brittle material processing fluid compositions can be exemplified as the brittle material processing fluid composition according to an embodiment of the present invention. A brittle material processing fluid composition, comprising: an additive mixture containing the following components (A)~(C), and component (D): water; Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ; In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture.

又,於不妨礙本發明目的之範圍內,前述脆性材料加工液組成物除了前述成分(A)~(D)外,亦可進而包含其他成分。 又,該脆性材料加工液組成物中,成分(A)、成分(B)、成分(C)及成分(D)、以及亦可任意地添加的其他成分,分別與在前述加工液之欄中所敘述者相同,其較佳態樣亦相同,故省略其詳細的說明。 In addition, the above-mentioned brittle material processing fluid composition may further contain other components in addition to the above-mentioned components (A) to (D) within the range that does not hinder the purpose of the present invention. In addition, in this brittle material processing fluid composition, component (A), component (B), component (C) and component (D), and other components that may be added arbitrarily are respectively the same as in the column of the aforementioned processing fluid The descriptions are the same, and the preferred aspects are also the same, so detailed description thereof is omitted.

關於前述本發明之一實施形態的脆性材料加工液組成物之例,更具體而言可列舉以下各實施形態。 [3-1] 一種脆性材料加工液組成物,包含:含有下述成分(A)~(C)之添加劑混合物、及成分(D):水; 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上; 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 [3-2] 如前述[3-1]記載之脆性材料加工液組成物,其中以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量宜為24.00質量%以上、較佳為27.00質量%以上、更佳為30.00質量%以上、再更佳為40.00質量%以上,且宜為80.50質量%以下、較佳為79.50質量%以下、更佳為78.50質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述[3-1]記載之脆性材料加工液組成物之一態樣,以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量宜為20.00質量%以上且80.50質量%以下、較佳為24.00質量%以上且80.50質量%以下、更佳為27.00質量%以上且80.50質量%以下、再更佳為30.00質量%以上且80.50質量%以下、再更佳為40.00質量%以上且79.50質量%以下、再更佳為40.00質量%以上且78.50質量%以下。 [3-3] 如前述[3-1]或[3-2]記載之脆性材料加工液組成物,其中以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量宜為6.50質量%以上、較佳為8.00質量%以上、更佳為10.00質量%以上,且宜為50.00質量%以下、較佳為47.50質量%以下、更佳為45.00質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述[3-1]或[3-2]記載之脆性材料加工液組成物之一態樣,以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量宜為6.50質量%以上且50.00質量%以下、較佳為8.00質量%以上且47.50質量%以下、更佳為10.00質量%以上且45.00質量%以下。 [3-4] 如前述[3-1]~[3-3]中任一項記載之脆性材料加工液組成物,其中以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量宜為6.00質量%以上、較佳為6.50質量%以上、更佳為7.00質量%以上,且宜為55.00質量%以下、較佳為50.00質量%以下、更佳為47.00質量%以下、再更佳為42.00質量%以下。 又,如前所述,此等數值範圍之上限值及下限值可分別獨立地組合。因此,其等之組合方式並無特別限制,例如關於前述[3-1]~[3-3]中任一項記載之脆性材料加工液組成物之一態樣,以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量宜為5.00質量%以上且55.00質量%以下、較佳為6.00質量%以上且50.00質量%以下、更佳為6.50質量%以上且47.00質量%以下、再更佳為7.00質量%以上且42.00質量%以下。 [3-5] 如前述[3-1]~[3-4]中任一項記載之脆性材料加工液組成物,其中成分(A)係1質量%水溶液之濁點為20℃以上且50℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 [3-6] 如前述[3-1]~[3-5]中任一項記載之脆性材料加工液組成物,其中成分(B)係1質量%水溶液之濁點為大於50℃且80℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。 [3-7] 如前述[3-1]~[3-6]中任一項記載之脆性材料加工液組成物,其中成分(A)之含量與成分(B)之含量的比〔(A)/(B)〕以質量比計宜為1.00以上、較佳為1.50以上、更佳為2.00以上,且宜為20.00以下、較佳為15.00以下、更佳為10.00以下。 [3-8] 如前述[3-1]~[3-7]中任一項記載之脆性材料加工液組成物,其中成分(A)及成分(B)之合計含量與成分(C)之含量的比〔(A)+(B)/(C)〕,以質量比計宜為1.00以上、較佳為1.20以上、更佳為1.30以上,且宜為20.00以下、較佳為15.00以下、更佳為12.00以下。 [3-9] 如前述[3-1]~[3-8]中任一項記載之脆性材料加工液組成物,其中以前述添加劑混合物之總量100質量%為基準計,前述添加劑混合物中的成分(A)、成分(B)及成分(C)之合計含量宜為80.00質量%以上、較佳為85.00質量%以上、更佳為90.00質量%以上、再更佳為95.00質量%以上、再更佳為99.00質量%以上,且為100.00質量%以下、宜為99.90質量%以下、較佳為99.80質量%以下、更佳為99.75質量%以下、再更佳為99.70質量%以下。 [3-10] 如前述[3-1]~[3-9]中任一項記載之脆性材料加工液組成物,其中前述脆性材料加工液組成物進而包含其他成分時,以前述添加劑混合物之總量100質量%為基準計,前述脆性材料加工液組成物中的其他成分的合計含量宜為0.10質量%以上、較佳為0.20質量%以上、更佳為0.25質量%以上、再更佳為0.30質量%以上,且宜為20.00質量%以下、較佳為15.00質量%以下、更佳為10.00質量%以下、再更佳為5.00質量%以下、再更佳為1.00質量%以下。 More specifically, examples of the brittle material processing fluid composition according to one embodiment of the present invention include the following embodiments. [3-1] A brittle material processing fluid composition, comprising: an additive mixture containing the following components (A)~(C), and component (D): water; Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ; In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture. [3-2] In the brittle material processing fluid composition as described in [3-1] above, the content of component (A) is preferably 24.00% by mass or more, preferably 27.00% by mass based on 100% by mass of the total amount of the aforementioned additive mixture. Above, more preferably at least 30.00% by mass, more preferably at least 40.00% by mass, and preferably at most 80.50% by mass, preferably at most 79.50% by mass, more preferably at most 78.50% by mass. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, their combinations are not particularly limited. For example, regarding one aspect of the brittle material processing fluid composition described in [3-1] above, based on the total amount of the additive mixture 100% by mass, the component (A ) content is preferably not less than 20.00% by mass and not more than 80.50% by mass, preferably not less than 24.00% by mass and not more than 80.50% by mass, more preferably not less than 27.00% by mass and not more than 80.50% by mass, more preferably not less than 30.00% by mass and not more than 80.50% by mass 80.50 mass % or less, more preferably 40.00 mass % or more and 79.50 mass % or less, still more preferably 40.00 mass % or more and 78.50 mass % or less. [3-3] In the brittle material processing fluid composition described in [3-1] or [3-2] above, based on 100% by mass of the total amount of the additive mixture, the content of component (B) is preferably at least 6.50% by mass, It is preferably at least 8.00% by mass, more preferably at least 10.00% by mass, and is preferably at most 50.00% by mass, preferably at most 47.50% by mass, more preferably at most 45.00% by mass. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, their combinations are not particularly limited. For example, with regard to the aspect of the brittle material processing fluid composition described in the aforementioned [3-1] or [3-2], the total amount of the aforementioned additive mixture is 100% by mass. Based on the basis, the content of component (B) is preferably 6.50 mass % to 50.00 mass %, preferably 8.00 mass % to 47.50 mass %, more preferably 10.00 mass % to 45.00 mass %. [3-4] The brittle material processing fluid composition as described in any one of the aforementioned [3-1]~[3-3], wherein the content of component (C) is preferably 6.00% based on the total amount of the aforementioned additive mixture of 100% by mass Mass % or more, preferably 6.50 mass % or more, more preferably 7.00 mass % or more, preferably 55.00 mass % or less, preferably 50.00 mass % or less, more preferably 47.00 mass % or less, more preferably 42.00 mass % %the following. In addition, as mentioned above, the upper limit and lower limit of these numerical ranges can be combined independently. Therefore, their combinations are not particularly limited. For example, regarding one aspect of the brittle material processing fluid composition described in any one of the aforementioned [3-1]~[3-3], the total amount of the aforementioned additive mixture Based on 100% by mass, the content of component (C) is preferably 5.00% by mass to 55.00% by mass, preferably 6.00% by mass to 50.00% by mass, more preferably 6.50% by mass to 47.00% by mass , More preferably, it is not less than 7.00% by mass and not more than 42.00% by mass. [3-5] The brittle material processing fluid composition described in any one of [3-1] to [3-4] above, wherein component (A) is a compound having a cloud point of 1% by mass aqueous solution of not less than 20°C and not more than 50°C, And contains the copolymerization site of ethylene oxide and propylene oxide, and does not have ethynyl group. [3-6] The brittle material processing fluid composition described in any one of [3-1] to [3-5] above, wherein component (B) is a compound having a cloud point of a 1% by mass aqueous solution of greater than 50°C and less than 80°C, And contains the copolymerization site of ethylene oxide and propylene oxide, and does not have ethynyl group. [3-7] The brittle material processing fluid composition described in any one of [3-1] to [3-6] above, wherein the ratio of the content of component (A) to the content of component (B) [(A)/(B) ] The mass ratio is preferably 1.00 or more, preferably 1.50 or more, more preferably 2.00 or more, and preferably 20.00 or less, preferably 15.00 or less, more preferably 10.00 or less. [3-8] The brittle material processing fluid composition described in any one of the aforementioned [3-1]~[3-7], wherein the ratio of the total content of component (A) and component (B) to the content of component (C) [( A)+(B)/(C)], in terms of mass ratio, it is preferably 1.00 or more, preferably 1.20 or more, more preferably 1.30 or more, and preferably 20.00 or less, preferably 15.00 or less, more preferably 12.00 or less . [3-9] The brittle material processing fluid composition as described in any one of the aforementioned [3-1] to [3-8], wherein the component (A) in the aforementioned additive mixture is based on 100% by mass of the total amount of the aforementioned additive mixture , the total content of component (B) and component (C) is preferably at least 80.00% by mass, preferably at least 85.00% by mass, more preferably at least 90.00% by mass, still more preferably at least 95.00% by mass, even more preferably at least 99.00% by mass Mass % or more, and 100.00 mass % or less, preferably 99.90 mass % or less, preferably 99.80 mass % or less, more preferably 99.75 mass % or less, still more preferably 99.70 mass % or less. [3-10] The brittle material processing fluid composition described in any one of the aforementioned [3-1] to [3-9], wherein when the aforementioned brittle material processing fluid composition further includes other components, the total amount of the aforementioned additive mixture is 100% by mass Based on the basis, the total content of other components in the aforementioned brittle material processing fluid composition is preferably at least 0.10% by mass, preferably at least 0.20% by mass, more preferably at least 0.25% by mass, even more preferably at least 0.30% by mass, And it is preferably not more than 20.00 mass %, preferably not more than 15.00 mass %, more preferably not more than 10.00 mass %, still more preferably not more than 5.00 mass %, still more preferably not more than 1.00 mass %.

[3-11] 如前述[3-1]~[3-10]中任一項記載之脆性材料加工液組成物,其中相對於前述添加劑混合物100質量份,含有成分(D)宜為8質量份以上、較佳為9質量份以上、更佳為10質量份以上、再更佳為11質量份以上、再更佳為12質量份以上,且宜為1,000,000質量份以下、較佳為500,000質量份以下、更佳為250,000質量份以下、再更佳為200,000質量份以下。 [3-12] 如前述[3-1]~[3-11]中任一項記載之脆性材料加工液組成物,其中相對於前述添加劑混合物100質量份,含有成分(D)宜為1,000質量份以上、較佳為2,000質量份以上、更佳為5,000質量份以上、再更佳為10,000質量份以上、再更佳為20,000質量份以上、再更佳為25,000質量份以上,且宜為1,000,000質量份以下、較佳為500,000質量份以下、更佳為250,000質量份以下、再更佳為200,000質量份以下。 [3-13] 如前述[3-1]~[3-11]中任一項記載之脆性材料加工液組成物,其中相對於前述添加劑混合物100質量份,含有成分(D)宜為8質量份以上、較佳為9質量份以上、更佳為10質量份以上、再更佳為11質量份以上、再更佳為12質量份以上,且宜為100,000質量份以下、較佳為50,000質量份以下、更佳為25,000質量份以下、再更佳為10,000質量份以下、再更佳為5,000質量份以下、再更佳為2,000質量份以下、再更佳為1,000質量份以下。 [3-14] 如前述[3-1]~[3-13]中任一項記載之脆性材料加工液組成物,其中pH宜為3.0以上、較佳為4.0以上、更佳為5.0以上,且宜為9.0以下、較佳為8.0以下、更佳為7.0以下。 [3-15] 如前述[3-1]~[3-14]中任一項記載之脆性材料加工液組成物,其係於利用線材對由脆性材料構成之被加工材進行加工時使用。 [3-16] 如前述[3-15]記載之脆性材料加工液組成物,其中前述線材為固定磨粒線材。 [3-17] 如前述[3-15]或[3-16]記載之脆性材料加工液組成物,其中前述脆性材料為結晶矽、藍寶石、碳化矽、氮化鎵、釹磁鐵、水晶或玻璃。 [3-11] The brittle material processing fluid composition as described in any one of [3-1] to [3-10] above, wherein the component (D) is preferably at least 8 parts by mass, preferably at least 8 parts by mass, relative to 100 parts by mass of the aforementioned additive mixture 9 parts by mass or more, more preferably 10 parts by mass or more, more preferably 11 parts by mass or more, more preferably 12 parts by mass or more, and preferably 1,000,000 parts by mass or less, preferably 500,000 parts by mass or less, more preferably It is not more than 250,000 parts by mass, more preferably not more than 200,000 parts by mass. [3-12] The brittle material processing fluid composition described in any one of [3-1] to [3-11] above, wherein the component (D) is preferably contained at least 1,000 parts by mass, preferably at least 100 parts by mass of the aforementioned additive mixture 2,000 parts by mass or more, more preferably 5,000 parts by mass or more, more preferably 10,000 parts by mass or more, more preferably 20,000 parts by mass or more, more preferably 25,000 parts by mass or more, and preferably 1,000,000 parts by mass or less, more preferably Preferably, it is 500,000 mass parts or less, More preferably, it is 250,000 mass parts or less, More preferably, it is 200,000 mass parts or less. [3-13] The brittle material processing fluid composition described in any one of [3-1] to [3-11] above, wherein the content of component (D) is preferably at least 8 parts by mass, preferably at least 8 parts by mass relative to 100 parts by mass of the aforementioned additive mixture 9 parts by mass or more, more preferably 10 parts by mass or more, more preferably 11 parts by mass or more, more preferably 12 parts by mass or more, and preferably 100,000 parts by mass or less, preferably 50,000 parts by mass or less, more preferably It is not more than 25,000 parts by mass, more preferably not more than 10,000 parts by mass, still more preferably not more than 5,000 parts by mass, still more preferably not more than 2,000 parts by mass, still more preferably not more than 1,000 parts by mass. [3-14] The brittle material processing fluid composition as described in any one of the aforementioned [3-1]~[3-13], wherein the pH is preferably above 3.0, preferably above 4.0, more preferably above 5.0, and preferably below 9.0 , preferably less than 8.0, more preferably less than 7.0. [3-15] The brittle material processing fluid composition described in any one of the aforementioned [3-1] to [3-14] is used when processing a workpiece composed of a brittle material with a wire rod. [3-16] The brittle material processing fluid composition as described in [3-15] above, wherein the wire is a fixed abrasive wire. [3-17] The brittle material processing fluid composition as described in [3-15] or [3-16] above, wherein the brittle material is crystalline silicon, sapphire, silicon carbide, gallium nitride, neodymium magnet, crystal or glass.

[脆性材料加工液組成物之製造方法] 前述脆性材料加工液組成物例如可藉由以下製造方法來製造。 即,前述[3-1]~[3-17]中任一項記載之脆性材料加工液組成物之製造方法係至少調配含有下述成分(A)~(C)之添加劑混合物、及成分(D):水: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 前述製造方法係以如下方式進行調配而獲得脆性材料加工液組成物: 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 [Manufacturing method of brittle material processing fluid composition] The aforementioned brittle material processing fluid composition can be produced, for example, by the following production method. That is, the production method of the brittle material processing fluid composition described in any one of the aforementioned [3-1] to [3-17] is to prepare at least an additive mixture containing the following components (A) to (C), and components ( D): water: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as The aforementioned manufacturing method is formulated in the following manner to obtain the brittle material processing fluid composition: In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture.

調配成分(A)~成分(D)之順序並無特別限制,例如可對於作為成分(D)之水依序或同時調配成分(A)、成分(B)及成分(C),亦可預先調配成分(A)、成分(B)及成分(C)後,將其混合物調配於作為成分(D)之水。 又,於該製造方法中,亦可調配成分(A)~成分(D)、進而視需要調配其他成分,此時所調配的各成分的調配順序、調配方法等並無特別限定。 再者,成分(A)、成分(B)、成分(C)、成分(D)及其他成分由於分別與前述在加工液之欄中所敘述者相同,其較佳態樣亦相同,故省略其詳細說明。又,關於成分(A)、成分(B)、成分(C)、成分(D)及其他成分的較佳的調配量及各成分間的較佳的調配量比,由於分別與前述在[3-1]~[3-17]之欄中所敘述的各含量及各含量比相同,故省略其詳細說明。 There is no special limitation on the order of ingredients (A)~components (D). For example, ingredients (A), ingredients (B) and ingredients (C) can be prepared sequentially or simultaneously with water as ingredient (D), or they can be prepared in advance. After preparing the component (A), the component (B) and the component (C), the mixture is prepared in the water which is the component (D). In addition, in this production method, component (A) to component (D) can also be compounded, and further other components can be compounded if necessary, and the compounding order and compounding method of each component compounded at this time are not particularly limited. Furthermore, component (A), component (B), component (C), component (D) and other components are the same as those described in the column of the processing fluid above, and their preferred forms are also the same, so they are omitted its detailed description. Also, with regard to the preferred formulation amounts of component (A), component (B), component (C), component (D) and other components and the preferred formulation amount ratio between each component, due to the above-mentioned in [3 Each content and each content ratio described in the columns of -1] to [3-17] are the same, so detailed description thereof is omitted.

又,關於前述[3-1]~[3-17]記載之脆性材料加工液組成物之用途、使用該脆性加工液組成物之脆性材料之加工方法、及加工裝置,由於亦分別與在本發明之一實施形態之前述加工液之欄之對應項目中說明的內容相同,故省略詳細說明。 實施例 In addition, regarding the use of the brittle material processing fluid composition described in [3-1]~[3-17] above, the processing method of brittle material using the brittle processing fluid composition, and the processing device, because they are also the same as those in this paper The contents described in the corresponding items in the column of the aforementioned machining fluid in one embodiment of the invention are the same, so detailed description is omitted. Example

以下,利用實施例更具體地說明本發明之一實施形態,但本發明並不限定於此等示例。 又,各成分及加工液相關的各物性,依照以下所示方法進行評價。 Hereinafter, one embodiment of the present invention will be more specifically described using examples, but the present invention is not limited to these examples. In addition, each component and each physical property related to a machining fluid were evaluated according to the method shown below.

[1質量%水溶液之濁點] 成分(A)及(B)之1質量%水溶液之濁點係於200mL容量的燒杯中導入欲測定成分之1質量%水溶液100mL,一面使用磁攪拌器(攪拌子之長度:30mm)於旋轉速度400rpm之條件下攪拌該水溶液,一面以5℃/分之升溫速度進行加熱,直至該水溶液之溫度從15℃到達濁點,測定水溶液之外觀模糊時之液溫。 再者,下述表1及表2中所示之化合物之「濁點」係指該化合物之「1質量%水溶液之濁點」。 [Cloud point of 1% by mass aqueous solution] The cloud point of the 1% by mass aqueous solution of components (A) and (B) is introduced into a 200mL beaker with 100mL of the 1% by mass aqueous solution of the component to be measured, while using a magnetic stirrer (the length of the stirring bar: 30mm) at a rotational speed Stir the aqueous solution under the condition of 400rpm, while heating at a heating rate of 5°C/min until the temperature of the aqueous solution reaches the cloud point from 15°C, and measure the liquid temperature when the appearance of the aqueous solution is cloudy. In addition, the "cloud point" of the compound shown in following Table 1 and Table 2 means "the cloud point of 1 mass % aqueous solution" of the said compound.

[HLB值] 成分(C)之HLB值使用藉由格里芬法算出的值。 [HLB value] As the HLB value of the component (C), the value calculated by the Griffin method was used.

[質量平均分子量] 使用凝膠滲透層析法(GPC)測定質量平均分子量(Mw)。GPC使用東曹股份有限公司製「TSKgel(註冊商標) SuperMultiporeHZ-M」2根作為管柱,以四氫呋喃作為溶離液,於檢測器使用折射率檢測器進行測定,以聚苯乙烯作為標準試料求出質量平均分子量(Mw)。 [Mass average molecular weight] The mass average molecular weight (Mw) was determined using gel permeation chromatography (GPC). GPC uses two "TSKgel (registered trademark) SuperMultiporeHZ-M" manufactured by Tosoh Co., Ltd. as the column, tetrahydrofuran as the eluent, the detector uses a refractive index detector for measurement, and polystyrene as the standard sample. Mass average molecular weight (Mw).

[表面張力] 根據JIS K 2241:2017記載之鉑板法測定於實施例及比較例獲得之各加工液之表面張力。 [Surface Tension] The surface tension of each machining fluid obtained in Examples and Comparative Examples was measured according to the platinum plate method described in JIS K 2241:2017.

[pH值] 使用東亞DKK股份有限公司製之玻璃電極式氫離子濃度指示計(型式:HM-25R)對實施例及比較例獲得之各加工液之pH進行評價。 [pH value] The pH of each of the processing fluids obtained in Examples and Comparative Examples was evaluated using a glass electrode type hydrogen ion concentration indicator (model: HM-25R) manufactured by DKK Toa Co., Ltd.

[矽(Si)摩擦係數] 使用於實施例及比較例獲得之各加工液,按照以下試驗條件進行往復動摩擦試驗,測定摩擦係數。 往復動摩擦試驗機:ORIENTEC股份有限公司製「F-2100」 球:3/16英吋SUJ2 試驗溫度:50℃ 試驗板:多晶矽(表面研磨成鏡面) 試驗板溫度:50℃ 滑動速度:20mm/秒 滑動距離:2cm 往復次數:50次 荷重:200g [Silicon (Si) Friction Coefficient] Using the machining fluids obtained in Examples and Comparative Examples, a reciprocating dynamic friction test was performed under the following test conditions to measure the coefficient of friction. Reciprocating dynamic friction tester: "F-2100" manufactured by Orientec Co., Ltd. Ball: 3/16 inch SUJ2 Test temperature: 50°C Test board: polysilicon (surface polished to a mirror surface) Test plate temperature: 50°C Sliding speed: 20mm/sec Sliding distance: 2cm Reciprocating times: 50 times Load: 200g

[消泡性之評價] 使用於實施例及比較例獲得之各加工液,按照以下方法進行評價。 於容量100mL之量筒中導入加工液90mL,將量筒蓋上蓋子,上下劇烈搖晃10次,測定靜置20秒後的液面高度。 又,液面高度係利用量筒刻度,以單位「mL」(每0.5mL一刻度)進行對比。 此時,由於若產生起泡,該液面高度會變高、即「mL」之值變大,故該液面高度之值(mL)越小,消泡性越優異。例如,因為產生起泡而使液面高度成為93.5mL時,將從量筒搖晃前的高度90.0mL起算的增加量即3.5mL設為液面高度,顯示於下述表1及2。 [Evaluation of defoaming properties] Each processing fluid obtained in the examples and comparative examples was evaluated by the following method. Introduce 90mL of processing fluid into a measuring cylinder with a capacity of 100mL, cover the measuring cylinder, shake vigorously up and down 10 times, and measure the liquid level after standing for 20 seconds. In addition, the height of the liquid level is compared with the unit "mL" (every 0.5mL scale) using the scale of the graduated cylinder. At this time, when foaming occurs, the liquid level becomes higher, that is, the value of "mL" becomes larger, so the smaller the value of the liquid level (mL), the better the defoaming property. For example, when the liquid level becomes 93.5 mL due to foaming, 3.5 mL, which is an increase from the height of 90.0 mL before shaking the measuring cylinder, is defined as the liquid level, as shown in Tables 1 and 2 below.

[清潔性之評價] 使用於實施例及比較例獲得之各加工液,按照以下方法進行評價。 (筒體壁面之污垢評價) 於容量100mL之量筒中導入加工液90mL、微粉(「石墨粉末」、富士膠片和光純藥工業股份有限公司製、特級)0.5g,將量筒蓋上蓋子,上下劇烈搖晃10次,藉由以下基準評價量筒內壁上部之污垢程度。 ・A:微粉導致的筒體壁面的污垢為輕度,可以看透液面附近的背景。 ・B:微粉導致的筒體壁面的污垢為重度,無法看透液面附近的背景。 [Evaluation of cleanliness] Each processing fluid obtained in the examples and comparative examples was evaluated by the following method. (Evaluation of fouling on the cylinder wall) Introduce 90mL of processing fluid and 0.5g of micropowder ("graphite powder", manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., special grade) into a measuring cylinder with a capacity of 100mL, cover the measuring cylinder, shake vigorously up and down 10 times, and use the following criteria Evaluate the degree of dirt on the upper part of the inner wall of the measuring cylinder. ・A: The dirt on the cylinder wall surface caused by fine powder is slight, and the background near the liquid surface can be seen through. ・B: Severe dirt on the cylinder wall surface caused by fine powder, and the background near the liquid surface cannot be seen through.

[實施例1~8、以及比較例1~8] 以成為下述表1及2所示之組成之方式調配各成分,調製實施例1~8以及比較例1~8之各加工液。依照前述評價方法,評價各實施例及比較例之加工液。將獲得之結果顯示於下述表1及2。 [Examples 1 to 8, and Comparative Examples 1 to 8] Each component was prepared so that it might become the composition shown in following Table 1 and 2, and each processing liquid of Examples 1-8 and Comparative Examples 1-8 was prepared. According to the aforementioned evaluation method, the processing fluids of each example and comparative example were evaluated. The obtained results are shown in Tables 1 and 2 below.

再者,下述表1及2所示之各成分分別表示以下的化合物。 <成分(A)> ・化合物A1:聚氧伸烷基部分由氧化乙烯(EO)與氧化丙烯(PO)之無規共聚物構成之聚氧伸烷基烷基醚(末端甲基(末端之烷基部分)、質量平均分子量(Mw)=4,597、EO/PO比(莫耳比)=42/58、1質量%水溶液之濁點=43℃) ・化合物A2:聚(氧化丙烯)-聚(氧化乙烯)-聚(氧化丙烯)型嵌段共聚物(質量平均分子量(Mw)=4,261、EO/PO比(莫耳比)=30/70、1質量%水溶液之濁點=38℃) ・化合物A3:聚(氧化乙烯)-聚(氧化丙烯)-聚(氧化乙烯)型嵌段共聚物(1質量%水溶液之濁點=23℃) In addition, each component shown in following Table 1 and 2 represents the following compound, respectively. <Ingredient (A)> ・Compound A1: Polyoxyalkylene alkyl ether (terminal methyl group (terminal alkyl part), mass Average molecular weight (Mw)=4,597, EO/PO ratio (molar ratio)=42/58, cloud point of 1% by mass aqueous solution=43°C) ・Compound A2: Poly(oxypropylene)-poly(ethylene oxide)-poly(oxypropylene) type block copolymer (mass average molecular weight (Mw)=4,261, EO/PO ratio (molar ratio)=30/70, Cloud point of 1% by mass aqueous solution = 38°C) ・Compound A3: Poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) type block copolymer (cloud point of 1% by mass aqueous solution=23°C)

<成分(B)> ・化合物B1:聚(氧化乙烯)-聚(氧化丙烯)-聚(氧化乙烯)型嵌段共聚物(質量平均分子量(Mw)=5,654、EO/PO比(莫耳比)=48/52、1質量%水溶液之濁點=63℃) ・化合物B2:聚(氧化乙烯)-聚(氧化丙烯)-聚(氧化乙烯)型嵌段共聚物(質量平均分子量(Mw)=5,498、EO/PO比(莫耳比)=52/48、1質量%水溶液之濁點=61℃) <Ingredient (B)> ・Compound B1: Poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) type block copolymer (mass average molecular weight (Mw)=5,654, EO/PO ratio (molar ratio)=48/52, Cloud point of 1% by mass aqueous solution = 63°C) ・Compound B2: Poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) type block copolymer (mass average molecular weight (Mw)=5,498, EO/PO ratio (molar ratio)=52/48, Cloud point of 1% by mass aqueous solution = 61°C)

<成分(C)> ・化合物C1:2,5,8,11-四甲基-6-十二炔-5,8-二醇之EO加成物(乙炔二醇之EO加成物、HLB=8) <成分(D)> ・離子交換水 <Ingredient (C)> ・Compound C1: EO adduct of 2,5,8,11-tetramethyl-6-dodeyn-5,8-diol (EO adduct of acetylene diol, HLB=8) <Ingredient (D)> ・Ion exchanged water

<其他成分> ・化合物S1:2,4,7,9-四甲基-5-癸炔-4,7-二醇之EO付加物(乙炔二醇之EO加成物、HLB=13) ・pH調整劑1:異壬酸 ・pH調整劑2:三異丙醇胺 <Other ingredients> ・Compound S1: EO adduct of 2,4,7,9-tetramethyl-5-decyne-4,7-diol (EO adduct of acetylene diol, HLB=13) ・pH adjuster 1: Isononanoic acid ・pH adjuster 2: Triisopropanolamine

[表1]

Figure 02_image003
[Table 1]
Figure 02_image003

[表2]

Figure 02_image005
[Table 2]
Figure 02_image005

如表1所示,實施例1~8之加工液由於包含成分(A)~成分(D),且分別以規定含量包含成分(A)~成分(C),故所有加工液的潤滑性、消泡性及清潔性均優異,確認為潤滑性、消泡性及清潔性之平衡優異的加工液。 另一方面,如表2所示,比較例1~8之加工液由於不含成分(A)、成分(B)及成分(C)中任一者(比較例1、3、6及7),或不滿足以規定含量包含成分(A)~(C)之要件(比較例2、4、5及8),故確認潤滑性、消泡性及清潔性之任一特性差。 使用實施例1記載之加工液、使用固定磨粒方式之多線鋸裝置並使用絲線徑52μm之固定磨粒線材對矽錠進行切斷加工,結果確認加工時該加工液之消泡性及清潔性優異。又,亦確認該矽錠之切斷精度良好,線材之斷線率亦小於5%。 又,前述「切斷精度」係測定所切出的矽晶圓的厚度偏差、即TTV(Total Thickness Variation)來進行評價。於實施例1中,於切斷一個矽錠所獲得的矽晶圓的TTV平均值為15μm,屬於良好。相對於此,於比較例1中,於切斷一個矽錠所獲得的矽晶圓的TTV平均值大於15μm。 又,前述「線材之斷線率(單位:%)」係由「線材斷線產生的次數/矽錠的切斷個數×100」算出的值,例如對100個矽錠進行切斷加工時,在加工其中的5個矽錠時產生線材斷線時,評價斷線率為5%。 產業上之可利用性 As shown in Table 1, since the machining fluids of Examples 1 to 8 contain components (A) to (D), and contain components (A) to (C) in predetermined amounts, the lubricity, Excellent in both defoaming and cleaning properties, and confirmed to be a machining fluid with an excellent balance of lubricity, defoaming and cleaning properties. On the other hand, as shown in Table 2, since the machining fluids of Comparative Examples 1 to 8 did not contain any of Component (A), Component (B) and Component (C) (Comparative Examples 1, 3, 6 and 7) , or did not meet the requirement to contain components (A) to (C) at a specified content (comparative examples 2, 4, 5 and 8), so it was confirmed that any one of the characteristics of lubricity, defoaming and cleaning properties was poor. Using the machining fluid described in Example 1, using a multi-wire saw device with a fixed abrasive grain method, and using a fixed abrasive grain wire rod with a wire diameter of 52 μm, the silicon ingot was cut and processed, and the defoaming and cleaning properties of the machining fluid were confirmed during processing. excellent. In addition, it was also confirmed that the cutting precision of the silicon ingot was good, and the wire breakage rate was less than 5%. In addition, the above-mentioned "cutting accuracy" was evaluated by measuring the thickness variation of the cut out silicon wafer, that is, TTV (Total Thickness Variation). In Example 1, the average TTV of the silicon wafer obtained by cutting one silicon ingot was 15 μm, which was good. On the other hand, in Comparative Example 1, the average TTV value of the silicon wafer obtained by cutting one silicon ingot was greater than 15 μm. In addition, the aforementioned "wire breakage rate (unit: %)" is a value calculated from "the number of wire breakages/the number of silicon ingots cut x 100", for example, when cutting 100 silicon ingots , when wire breakage occurred during the processing of 5 silicon ingots, the estimated breakage rate was 5%. Industrial availability

前述本發明之一實施形態之加工液,其潤滑性、消泡性及清潔性之平衡優異。 由於潤滑性優異,故可期待提升對由矽錠等脆性材料構成的被加工材進行切斷加工時的加工效率、抑制被加工材與加工被加工材的工具的摩擦、減低因加工所產生的摩擦熱、延長工具壽命的效果。進而,在使用更細的線材進行加工時,亦可獲得優異的加工精度。 又,例如在前述對被加工材進行切斷加工之際的加工時,可抑制該加工液之起泡,可防止該加工液因為起泡而從接收該加工液的槽部溢出(產生溢流)的問題、或因為起泡而發生的加工精度降低等不良影響。 又,由於清潔性優異,故例如在前述對被加工材進行切斷加工之際的加工時,可抑制因粉屑等微粉而污染用於該加工之切斷機等加工機或被切削材等被加工材。結果,容易洗淨加工機及加工物。 如上所述,前述本發明之一實施形態之加工液由於潤滑性、消泡性及清潔性之平衡優異,故可有助於提高對由矽錠等脆性材料構成之被加工材進行切斷加工而獲得的製品的生產性。 然後,如前所述,前述本發明之一實施形態之加工液係適合用作矽錠等脆性材料之切斷加工所用的加工液。然後,前述本發明之一實施形態之加工液由於潤滑性、消泡性及清潔性之平衡優異,亦可抑制線材斷線等,有助於提高加工精度與生產性(良率提高),故更適合用作使用固定磨粒線材從矽錠切出矽晶圓的加工的冷卻液。 The aforementioned working fluid according to one embodiment of the present invention has an excellent balance of lubricating properties, defoaming properties, and cleansing properties. Due to the excellent lubricity, it can be expected to improve the processing efficiency when cutting the workpiece composed of brittle materials such as silicon ingots, suppress the friction between the workpiece and the tool for processing the workpiece, and reduce the friction caused by processing. Frictional heat, prolonging the tool life effect. Furthermore, excellent processing accuracy can also be obtained when processing with a thinner wire rod. Also, for example, during the above-mentioned processing when the workpiece is cut and processed, the foaming of the processing liquid can be suppressed, and the processing liquid can be prevented from overflowing from the groove that receives the processing liquid due to foaming (generating overflow). ) problems, or adverse effects such as reduced processing accuracy due to foaming. In addition, since the cleanliness is excellent, for example, during the processing of cutting the workpiece as described above, it is possible to prevent contamination of processing machines such as cutting machines or the workpiece used for the processing with fine powder such as dust. The processed material. As a result, the processing machine and the processed product can be easily cleaned. As mentioned above, the machining fluid according to one embodiment of the present invention is excellent in balance of lubricity, defoaming property, and cleanability, so it can contribute to improving the cutting process of workpieces made of brittle materials such as silicon ingots. The productivity of the obtained products. Then, as mentioned above, the machining fluid according to one embodiment of the present invention is suitably used as a machining fluid for cutting and machining brittle materials such as silicon ingots. Furthermore, the machining fluid according to one embodiment of the present invention is excellent in balance among lubricity, defoaming properties, and cleaning properties, and can also suppress wire breakage, etc., and contribute to the improvement of machining accuracy and productivity (yield improvement), so It is more suitable as a coolant for the process of cutting silicon wafers from silicon ingots using fixed abrasive wires.

(無)(none)

Claims (17)

一種加工液,包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 A processing fluid comprising: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid. 如請求項1之加工液,其中以加工液之總量100質量%為基準計,成分(A)之含量為0.200質量%以下。The machining fluid according to Claim 1, wherein the content of component (A) is 0.200% by mass or less based on 100% by mass of the total amount of the machining fluid. 如請求項1或2之加工液,其中以加工液之總量100質量%為基準計,成分(C)之含量為0.100質量%以下。The machining fluid according to claim 1 or 2, wherein the content of component (C) is 0.100% by mass or less based on 100% by mass of the total amount of the machining fluid. 如請求項1至3中任一項之加工液,其中成分(A)係1質量%水溶液之濁點為20℃以上且50℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。The processing fluid according to any one of claims 1 to 3, wherein component (A) is a compound having a cloud point of 20°C or higher and 50°C or lower in a 1% by mass aqueous solution, and contains copolymerization sites of ethylene oxide and propylene oxide, and Does not have an ethynyl group. 如請求項1至4中任一項之加工液,其中成分(B)係1質量%水溶液之濁點為大於50℃且80℃以下的化合物,並包含氧化乙烯與氧化丙烯之共聚部位,且不具有乙炔基。The processing fluid according to any one of claims 1 to 4, wherein component (B) is a compound having a cloud point of greater than 50°C and less than 80°C in a 1% by mass aqueous solution, and contains copolymerization sites of ethylene oxide and propylene oxide, and Does not have an ethynyl group. 如請求項1至5中任一項之加工液,其中成分(A)之含量與成分(B)之含量的比〔(A)/(B)〕以質量比計為1.00以上。The machining fluid according to any one of claims 1 to 5, wherein the ratio [(A)/(B)] of the content of component (A) to the content of component (B) is 1.00 or more in mass ratio. 如請求項1至6中任一項之加工液,其中成分(A)及成分(B)之合計含量與成分(C)之含量的比〔(A)+(B)/(C)〕以質量比計為1.00以上。The processing fluid according to any one of claims 1 to 6, wherein the ratio of the total content of component (A) and component (B) to the content of component (C) [(A)+(B)/(C)] is equal to or greater than The mass ratio is 1.00 or more. 如請求項1至7中任一項之加工液,其中以加工液之總量100質量%為基準計,成分(D)之含量為95.000質量%以上且99.979質量%以下。The machining fluid according to any one of claims 1 to 7, wherein the content of component (D) is not less than 95.000% by mass and not more than 99.979% by mass based on 100% by mass of the total amount of the machining fluid. 如請求項1至8中任一項之加工液,其pH為3.0以上且9.0以下。The working fluid according to any one of claims 1 to 8, which has a pH of not less than 3.0 and not more than 9.0. 如請求項1至9中任一項之加工液,其係於利用線材對由脆性材料構成之被加工材進行加工時使用。The processing fluid according to any one of claims 1 to 9, which is used when processing a workpiece made of a brittle material with a wire rod. 如請求項10之加工液,其中前述線材為固定磨粒線材。The machining fluid according to claim 10, wherein the wire is a fixed abrasive wire. 如請求項10或11之加工液,其中前述脆性材料為結晶矽、藍寶石、碳化矽、氮化鎵、釹磁鐵、水晶或玻璃。The machining fluid according to claim 10 or 11, wherein the brittle material is crystalline silicon, sapphire, silicon carbide, gallium nitride, neodymium magnet, crystal or glass. 一種如請求項1至12中任一項之加工液之製造方法,係至少調配下述成分: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述製造方法係以如下方式進行調配而獲得加工液: 以加工液之總量100質量%為基準計,成分(A)之含量為0.010質量%以上; 以加工液之總量100質量%為基準計,成分(B)之含量為0.005質量%以上且0.090質量%以下;並且, 以加工液之總量100質量%為基準計,成分(C)之含量為0.006質量%以上。 A method of manufacturing a machining fluid according to any one of Claims 1 to 12, comprising at least preparing the following components: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The foregoing manufacturing method is prepared in the following manner to obtain the machining fluid: Based on 100% by mass of the total amount of processing fluid, the content of component (A) is 0.010% by mass or more; The content of component (B) is not less than 0.005% by mass and not more than 0.090% by mass based on 100% by mass of the total amount of the machining fluid; and, The content of the component (C) is 0.006% by mass or more based on 100% by mass of the total amount of the machining fluid. 一種加工液用組成物,包含: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 A composition for working fluid, comprising: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more. 一種如請求項14之加工液用組成物之製造方法,係至少調配下述成分: 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上;以及 成分(D):水; 前述製造方法係以如下方式進行調配而獲得加工液用組成物: 以加工液用組成物之總量100質量%為基準計,成分(A)之含量為0.200質量%以上; 以加工液用組成物之總量100質量%為基準計,成分(B)之含量為0.100質量%以上且92.000質量%以下;並且, 以加工液用組成物之總量100質量%為基準計,成分(C)之含量為0.120質量%以上。 A method of manufacturing a composition for machining fluid according to claim 14, comprising at least preparing the following components: Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ;as well as Ingredient (D): water; The aforementioned manufacturing method is formulated in the following manner to obtain the composition for machining fluid: Based on 100% by mass of the total amount of the composition for machining fluids, the content of component (A) is 0.200% by mass or more; The content of component (B) is 0.100 mass % or more and 92.000 mass % or less based on 100 mass % of the total amount of the composition for machining fluid; and, Based on 100% by mass of the total amount of the composition for machining fluid, the content of component (C) is 0.120% by mass or more. 一種脆性材料加工液組成物,包含:含有下述成分(A)~(C)之添加劑混合物、及成分(D):水; 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上; 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 A brittle material processing fluid composition, comprising: an additive mixture containing the following components (A)~(C), and component (D): water; Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a cloud point of greater than 50°C and less than 80°C in a 1% by mass aqueous solution, which contains a copolymerization site of ethylene oxide and an alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ; In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture. 一種如請求項16之脆性材料加工液組成物之製造方法,係至少調配含有下述成分(A)~(C)之添加劑混合物、及成分(D):水; 成分(A):1質量%水溶液之濁點為20℃以上且50℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(B):1質量%水溶液之濁點為大於50℃且80℃以下的化合物,其包含氧化乙烯與氧化乙烯以外之氧化烯的共聚部位,且不具有乙炔基; 成分(C):選自於由HLB值為4以上且12以下之乙炔二醇、及HLB值為4以上且12以下之乙炔二醇之氧化烯加成物所構成群組中之1種以上; 前述製造方法係以如下方式進行調配而獲得脆性材料加工液組成物: 前述添加劑混合物中, 以前述添加劑混合物之總量100質量%為基準計,成分(A)之含量為20.00質量%以上; 以前述添加劑混合物之總量100質量%為基準計,成分(B)之含量為5.00質量%以上且53.50質量%以下;並且, 以前述添加劑混合物之總量100質量%為基準計,成分(C)之含量為5.00質量%以上。 A method of manufacturing a brittle material processing fluid composition according to claim 16, comprising at least preparing an additive mixture containing the following components (A)~(C), and component (D): water; Component (A): a compound having a cloud point of 20°C to 50°C in a 1% by mass aqueous solution, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Ingredient (B): a compound having a 1% by mass aqueous solution whose cloud point is higher than 50°C and lower than 80°C, which contains copolymerization sites of ethylene oxide and alkylene oxide other than ethylene oxide, and does not have an ethynyl group; Component (C): At least one selected from the group consisting of acetylene glycol with an HLB value of 4 to 12 and an alkylene oxide adduct of acetylene glycol with an HLB value of 4 to 12 ; The aforementioned manufacturing method is formulated in the following manner to obtain the brittle material processing fluid composition: In the aforementioned additive mixture, Based on 100% by mass of the total amount of the aforementioned additive mixture, the content of component (A) is 20.00% by mass or more; The content of component (B) is not less than 5.00% by mass and not more than 53.50% by mass based on 100% by mass of the total amount of the aforementioned additive mixture; and, The content of the component (C) is 5.00% by mass or more based on 100% by mass of the total amount of the aforementioned additive mixture.
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