TW202227889A - Light irradiation device and exposure device including the same - Google Patents
Light irradiation device and exposure device including the same Download PDFInfo
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- TW202227889A TW202227889A TW111100847A TW111100847A TW202227889A TW 202227889 A TW202227889 A TW 202227889A TW 111100847 A TW111100847 A TW 111100847A TW 111100847 A TW111100847 A TW 111100847A TW 202227889 A TW202227889 A TW 202227889A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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Abstract
Description
本發明係關於主要於製造液晶面板之際的曝光用途使用之光照射裝置、及具備它之曝光裝置。The present invention relates to a light irradiation apparatus mainly used for exposure applications in manufacturing liquid crystal panels, and an exposure apparatus provided with the same.
在將液晶做成TN方式的表示面板使用之際,液晶封入2片玻璃基板之間,只對於在彼等玻璃板的內面所形成之透明電極施加電壓是無法正常的動作的。這是因為液晶分子是散亂的狀態所致。When the liquid crystal is used as a TN-type display panel, the liquid crystal is enclosed between two glass substrates, and it is impossible to operate normally only by applying a voltage to the transparent electrodes formed on the inner surfaces of the glass plates. This is because the liquid crystal molecules are in a scattered state.
為了使液晶正常的TN方式動作,則就必須將液晶分子配向於一定方向,並且液晶分子的立起方向也必是一定的。具體而言,將液晶分子配向成相對於玻璃基板為傾斜3°左右方向,此種的傾斜角度稱為預傾角預傾(pre-tilt)角。In order to make the liquid crystal operate in the normal TN mode, the liquid crystal molecules must be aligned in a certain direction, and the rising direction of the liquid crystal molecules must also be certain. Specifically, the liquid crystal molecules are aligned in a direction inclined by about 3° with respect to the glass substrate, and such an inclination angle is referred to as a pre-tilt angle.
接著,在類有液晶的配向性能之一對的玻璃基板之中,按照使一側的玻璃基板配向在X方向的方式配置,將相對面之其他側的玻璃基板配置在垂直於X方向之Y方向。(TN方式)Next, among the pair of glass substrates having a liquid crystal-like alignment property, one of the glass substrates is arranged in the X direction, and the other glass substrate on the opposite side is arranged in the Y direction perpendicular to the X direction. direction. (TN method)
如此,在液晶面板的製造上就需要進行液晶配向處理;自過往以來,它一直是進行對於玻璃基板的表面實施物理擦摩之摩擦處理(例如,專利文献1)。此種的摩擦處理為一種經由以長毛布等對於形成在玻璃基板上之有機高分子膜以預定的方向摩擦,藉以能夠形成使液晶分子配向於一定方向的膜之處理方法。In this way, liquid crystal alignment treatment is required in the manufacture of liquid crystal panels; conventionally, it has been rubbing treatment in which physical rubbing is performed on the surface of the glass substrate (for example, Patent Document 1). Such a rubbing treatment is a treatment method for forming a film that aligns liquid crystal molecules in a certain direction by rubbing the organic polymer film formed on the glass substrate with a long felt cloth in a predetermined direction.
隨著摩擦處理的普及,使得應答速度快速之TN方式成為一般化,因此,能夠廉價地量產安定性能之液晶面板;進而做成個人電腦等之OA機器用顯示監視器或遊戲機用之監視器,於是液晶監視器就有成為普及的趨勢。With the popularization of rubbing treatment, the TN method with a fast response speed has become common, so it is possible to mass-produce liquid crystal panels with stable performance at low cost, and furthermore, it can be used as a display monitor for OA equipment such as personal computers or a monitor for game machines. Therefore, the LCD monitor has become a popular trend.
但是,在摩擦方式方面會有缺乏均一性、有發生TFT的靜電破壞之可能性的問題;更且,也會有摩擦時所產生的粉末碎屑附著之有關信賴性的問題。However, in terms of the rubbing method, there is a problem of lack of uniformity and the possibility of electrostatic breakdown of the TFT. Furthermore, there is also a problem of reliability due to the adhesion of powder debris generated during rubbing.
除此之外,以摩擦方式所能夠達成之預傾角,如上所述,在以水平配向液晶模式為代表的TN方式之中為3°左右,因此,難以構成對應於低電壓驅動、高速應答之液晶模式的顯示面板。In addition, the pretilt angle that can be achieved by the rubbing method is, as described above, about 3° in the TN method represented by the horizontally aligned liquid crystal mode. Therefore, it is difficult to form a system capable of low-voltage driving and high-speed response. LCD display panel.
為了對付此種摩擦方式的問題,現在,已經提案了一種能夠實施光配向處理之曝光機;在此種曝光機中,曾試著使用長弧(long arc)水銀燈來做為光源。 <先行技術文献> <專利文献> In order to deal with the problem of such a rubbing method, an exposure machine capable of performing a photo-alignment process has been proposed. In such an exposure machine, an attempt has been made to use a long arc mercury lamp as a light source. <Prior Art Documents> <Patent Literature>
<專利文献1> 特開2007-17475號公報<Patent Document 1> Japanese Patent Laid-Open No. 2007-17475
<發明所欲解決之問題><Problems to be solved by the invention>
然而,使用長弧水銀燈之曝光機也被推斷是有問題的。一般而言,在將曝光材料設定成具有反應特定波長頻寬的光之感光特性時,當觀察來自水銀燈的光之分光特性時,就可明白該光是由多量的水銀線的亮輝線所構成。However, exposure machines using long arc mercury lamps have also been inferred to be problematic. In general, when the exposure material is set to have a photosensitive characteristic that reflects light of a specific wavelength bandwidth, when the spectral characteristics of the light from a mercury lamp are observed, it can be understood that the light is composed of a large number of bright lines of mercury lines. .
因此,將水銀燈做為曝光用的光源使用的情況,因為曝光材料的偏離感光特性之波長的光變多,所以可推想會有因該感光波長頻寬以外之波長的光而造成曝光材料過曝光之虞。Therefore, when a mercury lamp is used as the light source for exposure, since the light of the wavelength deviating from the photosensitive characteristic of the exposure material increases, it is presumed that the exposure material may be overexposed by light of a wavelength other than the photosensitive wavelength bandwidth. Danger.
當然,藉由選擇波長反射膜也有截斷偏離感光特性之波長的光線(短波側及長波側)的可能性,然而,就會需要一種窄頻寬的截止濾波器(頻通濾波器),而且,因為要高的精度,所以,結果就會導致裝置的成本上昇。Of course, it is also possible to cut off light with wavelengths deviating from the photosensitive characteristics (short-wave side and long-wave side) by selecting the wavelength reflective film. However, a narrow-band cut-off filter (frequency-pass filter) is required. Since high precision is required, the cost of the device increases as a result.
又,由長弧水銀燈所發射出的光會於廣範圍擴散,所以,為了實施光配向處理所用的來自重要之水銀燈的光之照射角就會變得難以控制了,例如,雖然曾檢討以百葉窗(louver)等遮住多餘的光之手法;然而,在此種的情況下,則將會有從水銀燈所發射出之光的利用效率低下之另外的問題。Furthermore, the light emitted by the long-arc mercury lamp spreads over a wide range, so it becomes difficult to control the irradiation angle of the light from the important mercury lamp used for the photo-alignment process. (louver), etc. to block the excess light; however, in such a case, there is another problem that the utilization efficiency of the light emitted from the mercury lamp is low.
此外,雖然也有將準直的(平行化)光斜向地照射玻璃基板之方法;然而,此種手法因為會是光學系統變得複雜,所以,推想會有裝置變得大型化且昂貴之類的問題。In addition, there is also a method of irradiating a glass substrate with collimated (parallelized) light obliquely; however, since this method complicates the optical system, it is presumed that the device becomes large and expensive. The problem.
又,雖然也可以考慮實施一種使從光源所發射出通過偏光元件的光斜向地入射於工件之光配向處理,然而,在此種情況下,在從光源發射出以後,由於在偏光元件的表面反射之一部分的光會有以不是所想要的角度再度進入偏光元件中,以致會有對工件之光配向處理的精度惡化之類的問題。Also, although it may be considered to perform a photo-alignment process in which the light emitted from the light source passing through the polarizing element is incident on the workpiece obliquely, however, in this case, after the light is emitted from the light source, since the polarization of the polarizing element A part of the light reflected from the surface may re-enter the polarizing element at an unintended angle, so that there may be problems such as deterioration of the precision of the photo-alignment process on the workpiece.
本發明係有監於上述之問題而完成者,其目的係在於:提供一種曝光裝置用的光照射裝置,其為在實施一種藉由使從光源發射出通過偏光元件之光斜向地入射工件之光配向處理的情況中,能夠避免對工件之光配向處理的精度惡化的事項。 <用以解決問題之手段> The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a light irradiation device for an exposure device that implements a method by making light emitted from a light source and passing through a polarizing element obliquely incident on a workpiece In the case of the photo-alignment process, it is possible to avoid a matter of deteriorating the accuracy of the photo-alignment process on the workpiece. <Means to solve the problem>
根據本發明的一觀點,可以提供一種光照射裝置,其特徵在於具備: 一光源,其係具有用以發射出斜向入射於工件的光之複數個光照射單元;以及 一偏光元件,其為接收來自前述光源的前述光並將所透過的前述光照射於前述工件;其中 前述各光照射單元係分別具有LED、及可安裝前述LED之散熱器; 朝向前述偏光元件、且被從另外的前述光照射單元所放射而在前述偏光元件的表面反射之光所照射的前述散熱器之面係實施過抗光反射處理的。 According to an aspect of the present invention, a light irradiation device can be provided, characterized by comprising: a light source having a plurality of light irradiation units for emitting light obliquely incident on the workpiece; and a polarizing element, which receives the light from the light source and irradiates the transmitted light on the workpiece; wherein Each of the above-mentioned light irradiation units respectively has LEDs and a heat sink capable of installing the above-mentioned LEDs; The surface of the heat sink facing the polarizing element and irradiated by the light radiated from another light irradiating unit and reflected on the surface of the polarizing element is subjected to anti-reflection treatment.
又,據本發明之其他的觀點,可以提供一種光照射裝置,其特徵在於具備: 一光源,其係具有用以發射出斜向入射於工件的光之複數個光照射單元;以及 一偏光元件,其係接收來自前述光源的前述光並將透所過的前述光照射於前述工件;其中 前述各光照射單元係分別具有LED、及可安裝前述LED之散熱器; 朝向前述偏光元件且被從另外的前述光照射單元所放射而在前述偏光元件的表面反射之光所照射的前述散熱器之面係配置有遮光板,其表面為經實施過抗光反射處理的。 Furthermore, according to another aspect of the present invention, there can be provided a light irradiation device characterized by comprising: a light source having a plurality of light irradiation units for emitting light obliquely incident on the workpiece; and a polarizing element, which receives the light from the light source and irradiates the passed light to the workpiece; wherein Each of the above-mentioned light irradiation units respectively has LEDs and a heat sink capable of installing the above-mentioned LEDs; The surface of the heat sink facing the polarizing element and irradiated by the light radiated from the other light irradiating unit and reflected on the surface of the polarizing element is arranged with a light shielding plate, and the surface of which has been subjected to anti-light reflection treatment. .
此外,根據本發明的另一個觀點,可以提供一種光照射裝置,其特徵在於具備: 一光源,其係具有用以發射出斜向入射於工件的光之複數個光照射單元; 一偏光元件,其係接收來自前述光源的前述光並將所透過之前述光照射於前述工件;其中 前述各光照射單元係分別具有LED、及可安裝前述LED之散熱器;其中 朝向前述偏光元件且被從另外的前述光照射單元所放射而在前述偏光元件的表面反射之光所照射的前述散熱器之面、與前述偏光元件的前述表面所形成之角度為90°-(α/2)以上。 另外,此處的「α」係指在由另外的前述光照射單元所發射出的前述光之中,具有與前述光照射單元的光軸形成最大角度之光、與前述偏光元件的前述表面所形成之度。 Furthermore, according to another aspect of the present invention, there can be provided a light irradiation device characterized by comprising: a light source having a plurality of light irradiating units for emitting light obliquely incident on the workpiece; a polarizing element, which receives the light from the light source and irradiates the transmitted light on the workpiece; wherein Each of the above-mentioned light irradiation units respectively has an LED and a heat sink on which the above-mentioned LED can be installed; wherein The angle formed by the surface of the heat sink facing the polarizer and irradiated by the light emitted from the other light irradiation unit and reflected on the surface of the polarizer and the surface of the polarizer is 90°-( α/2) or more. In addition, "α" here refers to the light having the largest angle with the optical axis of the light irradiating unit among the light emitted by the other light irradiating unit, and the light having the largest angle with the surface of the polarizing element. degree of formation.
根據本發明之其他的觀點,可以提供一種曝光裝置,其係具備有上述之光照射裝置。 <發明效果> According to another viewpoint of this invention, the exposure apparatus provided with the above-mentioned light irradiation apparatus can be provided. <The effect of the invention>
根據本發明有關之光照射裝置,由於是對於構成各光照射單元的散熱器中,由另外的光照射單元所發射出而於偏光元件的表面反射之光所照射的面實施抗光反射處理過的,所以,從另外的光照射單元所發射出而於偏光元件的表面反射之光係照射在該光照射單元的散熱器,進而反射而再度射向偏光元件,由於該光是以相反於意圖方向之逆方向入射偏光元件,因此,能夠避免相對於工件之光配向處理的精度惡化。According to the light irradiating device of the present invention, since the heat sink constituting each light irradiating unit is irradiated with light emitted by another light irradiating unit and reflected on the surface of the polarizing element, anti-reflection treatment is performed. Therefore, the light emitted from another light irradiating unit and reflected on the surface of the polarizing element is irradiated on the heat sink of the light irradiating unit, and then reflected and re-emitted to the polarizing element, because the light is opposite to the intended Since the polarizing element is incident in the opposite direction of the direction, it is possible to avoid deterioration of the accuracy of the photo-alignment process with respect to the workpiece.
(光照射裝置10的構成)
以下,說明本發明所適用之實施形態有關的光照射裝置10。光照射裝置10主要是為了在製造液晶面板之際進行曝光而組合於曝光裝置來使用。此種光照射裝置10,如圖1所示,大致具備有:光源12及偏光元件20。
(Configuration of Light Irradiation Device 10 )
Hereinafter, the
光源12為朝向載置有工件(曝光對象物)X之曝光面A照射曝光用光L的構件;在本實施形態中使用複數個光照射單元14。此等光照射單元14係分別具備用以照射光之LED16、及可安裝LED16的散熱器18。The
光源12為沿著曝光面A上於一定方向移動,對於工件X進行掃描的方式來照射曝光用光L,所以,該光源12係藉由在與工件X的移動方向呈垂直之方向上約略直列地配置複數個光照射單元14所形成。當然,可以是使光照射裝置10相對於工件X移動來照射曝光用光L,也可以是使工件X及光照射裝置10的兩者移動。The
構成各光照射單元14之各LED16係依照使得此等LED16的光軸CL為以具有相對於工件X之第1角度θ1(即入射角θ1)的方式而被配置成相對於工件X(即,相對於曝光面A)傾斜。藉由在液晶面板上使用由從斜向照射角度成分變異少的光所作成之配向膜,就能夠達安定的預傾角與配向狀態,並且能夠實現任意配向模式的液晶面板。The
另外,LED16沒有限定於特定的物品,可以使用COB(Chip-On-Board)或SMD(表面實裝型);也可以是所謂的砲弾型物品。In addition, the LED16 is not limited to a specific item, and COB (Chip-On-Board) or SMD (Surface Mounting Type) can be used; it may also be a so-called gun type item.
散熱器18為將從發光中的LED16所產生之熱放射出,因而具有避免該LED16的温度變得過高的角色機能,LED16是被安裝於該散熱器18的表面。The
散熱器18的大小是被要求成:能夠將來自LED16的熱充分地放射出程度的大小之物品。又,本實施形態有關的散熱器18,其斷面係被形成為矩形狀,並且,對於具有朝向偏光元件20向及從另外的光照射單元14發射出而於偏光元件20的表面反射之光所照射側面19為實施抗光反射處理過的特徴點。此種抗光反射處理的具體例,舉例來說,可以是例如,黒色鍍敷、黒氧化鋁(Alumite)、黒色塗裝等。The size of the
另外,散熱器18的斷面形狀並沒有特別限定為矩形狀,然而,不論該斷面形狀是何種的形狀,較佳為對於在該散熱器18中之從另外的光照射單元14所發射出而於偏光元件20的表面反射之光所照射面,實施抗光反射處理。In addition, the cross-sectional shape of the
偏光元件20是一種只讓從光源12照射的光中於一方向振動之光成分透過並偏光之元件;在本實施形態中,使用線柵(wire grid)偏光元件。線柵偏光元件是一種在透明基板(玻璃基板)之一側的表面上形成有線柵而成者。在本實施形態中,線柵的形成面22可以是偏光元件20中之光源12側的面;也可以是光源12之相反側的面。又,偏光元件20較佳為被配設成平行於工件X(曝光面A)。The polarizing
(本實施形態有關的光照射裝置10的效果)
根據本實施形態有關的光照射裝置10,在構成各光照射單元14之散熱器18中,從另外的光照射單元14所放射而於偏光元件20的表面反射之光所照射面19為經過實施抗光反射處理的。
(Effects of the
藉此,如圖2所示,從另外的光照射單元14所放射而於偏光元件20的表面反射之光為抵接於該光照射單元14的散熱器18,更進一步地反射而再度朝向偏光元件20;相對於偏光元件20而言,該光乃從意圖方向之逆方向射入(參照點線的箭頭),因而,能夠避免對工件之光配向處理的精度惡化。Thereby, as shown in FIG. 2 , the light emitted from the other
(變形例1)
根據上述之實施形態有關的光照射裝置10,在構成各光照射單元14之散熱器18中,雖然是對於從另外的光照射單元14所放射而於偏光元件20的表面反射之光所照射面19實施抗光反射處理;然而,也可以是如圖3所示而改變成:將在散熱器18中於偏光元件20的表面反射之光所照射面19與偏光元件20的表面所形成之角度θ2設定成為「90°-(α/2)」以上。
(Variation 1)
According to the
該「α」係指在從另外的光照射單元14所發射出之光中,具有與該光照射單元14的光軸CL最大角度之光Lmax、及偏光元件20的表面所形成之角度。The “α” refers to the angle formed by the light Lmax having the largest angle with the optical axis CL of the
因此,即便是在從另外的光照射單元14所放射而於偏光元件20的表面反射之光為於散熱器18的表面(例如,側面)19反射的情況下,該反射光也不會朝向偏光元件20的表面,所以,與上述之實施形態同樣地,相對於偏光元件20而言,光為從與意圖方向之逆方向射入,因此,能夠避免對工件之光配向處理的精度惡化。Therefore, even in the case where the light emitted from the other
當然,也可以是將在散熱器18中於偏光元件20的表面反射之光所照射面19與偏光元件20的表面形成之角度θ2設定成如上述那樣,並且對於偏光元件20的表面反射之光所照射散熱器18的面19實施抗光反射處理。Of course, the angle θ2 formed by the
(變形例2)
又,也可以是將從各光照射單元14所發射出之光L的配光角的一半之第2角度θ3設定成比上述之第1角度θ1還小。
(Variation 2)
In addition, the second angle θ3 which is half of the light distribution angle of the light L emitted from each
(變形例3)
另外,根據上述實施形態有關的光照射裝置10,在構成各光照射單元14之散熱器18中,雖然是對於從另外的光照射單元14所放射而於偏光元件20的表面反射之光所照射面19實施抗光反射處理;然而,也可以是例如圖4所示,將它改成將遮光板30安裝於該光所照射面19。
(Variation 3)
Further, according to the
該遮光板30之表面為經實施抗光反射處理(例如,黒氧化鋁處理)為沿著以相對於偏光元件20之預定的角度被形成之散熱器18的面19配置。The surface of the
又,遮光板30中之遠離偏光元件20的一側之端部為按照不會干擾相隣配置的散熱器18的方式被彎折而成。In addition, the end of the
另外,可安裝遮光板30之散熱器18的面19可以是如圖示那樣地,將該面19與偏光元件20的表面形成之角度θ2設定為「90°-(α/2)」以上,也可以形成在那範圍以外的角度的面19(例如,如圖1所示之類的)。In addition, the
(變形例4)
又,可以是例如,如圖5所示那樣地,按照不使來自LED16的光往外部洩漏的方式,以遮光箱32覆蓋光照射裝置10。另外,較佳者為對於該遮光箱32的內面實施抗光反射處理。
(Variation 4)
Moreover, for example, as shown in FIG. 5, the
值得注意的是:此次所揭示的實施形態之全部觀點皆為例示,因而當然不是用以限制。本發明的範圍不是如上述之説明,而是意圖包括如申請專利範圍所示者、以及與申請專利範圍均等的意思及範圍內之全部的變更。It is worth noting that all the viewpoints of the embodiments disclosed this time are examples, and therefore are not intended to be limiting. The scope of the present invention is not as described above, but it is intended that the scope of the present invention includes those shown in the scope of claims, meanings equivalent to the scope of claims, and all modifications within the scope.
10:光照射裝置
12:光源
14:光照射單元
16:LED
18:散熱器
19:(散熱器18的)面
20:偏光元件
22:線柵的形成面
30:遮光板
32:遮光箱
X:工件(曝光對象物)
A:曝光面
L:曝光用光
CL:(LED16的)光軸
θ1:第1角度
θ2:於偏光元件20的表面反射之光所照射散熱器18的面19與偏光元件20的表面所形成之角度
θ3:第2角度
10: Light irradiation device
12: Light source
14: Light irradiation unit
16: LED
18: Radiator
19: (of radiator 18) side
20: Polarizing element
22: The formation surface of the wire grid
30: visor
32: shading box
X: Workpiece (object to be exposed)
A: Exposure surface
L: Exposure light
CL: (LED16) optical axis
θ1: 1st angle
θ2: The angle formed between the
圖1係顯示本發明所適用之具備有以複數個光照射單元14構成的光源12之光照射裝置10的圖。
圖2係用以說明從另外的光照射單元14所發射出而於偏光元件20的表面反射之光的圖。
圖3係顯示變形例1有關之光照射裝置10的圖。
圖4係顯示變形例3有關之光照射裝置10的圖。
圖5係顯示變形例4有關之光照射裝置10的圖。
FIG. 1 is a diagram showing a
10:光照射裝置 10: Light irradiation device
12:光源 12: Light source
14:光照射單元 14: Light irradiation unit
16:LED 16: LED
18:散熱器 18: Radiator
19:(散熱器18的)面 19: (of radiator 18) side
20:偏光元件 20: Polarizing element
22:線柵的形成面 22: The formation surface of the wire grid
X:工件(曝光對象物) X: Workpiece (object to be exposed)
A:曝光面 A: Exposure surface
L:曝光用光 L: Exposure light
CL:(LED16的)光軸 CL: (LED16) optical axis
θ 1:第1角度 θ 1: 1st angle
Claims (4)
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JP2021-003723 | 2021-01-13 | ||
JP2021003723 | 2021-01-13 | ||
WOPCT/JP2021/042631 | 2021-11-19 | ||
PCT/JP2021/042631 WO2022153672A1 (en) | 2021-01-13 | 2021-11-19 | Light projecting device and exposure device provided with same |
Publications (1)
Publication Number | Publication Date |
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TW202227889A true TW202227889A (en) | 2022-07-16 |
Family
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TW111100847A TW202227889A (en) | 2021-01-13 | 2022-01-07 | Light irradiation device and exposure device including the same |
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JP (1) | JP7191434B2 (en) |
KR (1) | KR20230101902A (en) |
CN (1) | CN116635781A (en) |
TW (1) | TW202227889A (en) |
WO (1) | WO2022153672A1 (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
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JPH04216614A (en) * | 1990-12-17 | 1992-08-06 | Mitsubishi Electric Corp | Laser beam irradiation device |
JP2005251588A (en) | 2004-03-04 | 2005-09-15 | Hamamatsu Photonics Kk | Light irradiation device |
JP2007017475A (en) | 2005-07-05 | 2007-01-25 | Sanyo Epson Imaging Devices Corp | Rubbing processing method and method for manufacturing liquid crystal display panel using rubbing processing method |
JP2011217241A (en) | 2010-04-01 | 2011-10-27 | Ushio Inc | Led linear light source device and light irradiation device for original reader |
JP6607003B2 (en) | 2015-11-30 | 2019-11-20 | ウシオ電機株式会社 | Light irradiation apparatus and light irradiation method |
JP2018017952A (en) | 2016-07-29 | 2018-02-01 | ウシオ電機株式会社 | Light projection apparatus and light projection method |
CN209014871U (en) | 2018-07-16 | 2019-06-21 | 香港科技大学 | Photohead and exposure system for light orientation |
-
2021
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WO2022153672A1 (en) | 2022-07-21 |
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CN116635781A (en) | 2023-08-22 |
KR20230101902A (en) | 2023-07-06 |
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