CN209014871U - Photohead and exposure system for light orientation - Google Patents
Photohead and exposure system for light orientation Download PDFInfo
- Publication number
- CN209014871U CN209014871U CN201821117303.1U CN201821117303U CN209014871U CN 209014871 U CN209014871 U CN 209014871U CN 201821117303 U CN201821117303 U CN 201821117303U CN 209014871 U CN209014871 U CN 209014871U
- Authority
- CN
- China
- Prior art keywords
- photohead
- light
- exposure system
- exposure
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
The utility model proposes a kind of photohead for light orientation and use the exposure system for light orientation of the photohead, wherein, the photohead includes multiple parallel light units and photohead control unit, which includes: that exposure room and setting are exposing indoor photohead.The lower section of photohead is arranged in the exit facet of photohead for substrate-parallel, to expose under the irradiation of photohead.In photohead and exposure system disclosed by the utility model for light orientation, it is identical by the way that the multiple parallel light units for forming photohead to be obliquely installed to the distance for making the light being irradiated on substrate with special angle reach substrate, to make substrate receive uniform intensity of illumination, more stable exposure effect may be implemented.
Description
Technical field
The utility model relates to a kind of photoheads and exposure system for light orientation.
Background technique
Currently, liquid crystal display (LCD) has become the mainstream selection of electronic console.The LCD of various mode operations is
Oriented layer is needed, and the quality of oriented layer then directly affects the performance of LCD.
In the prior art, the preparation of LCD oriented layer is mainly realized by rubbed polyimide, which can give
It is orientated the azimuth direction of the liquid crystal near layer surface out.But as it is known by the man skilled in the art, mechanical friction is orientated
Layer will lead to the problems such as clast, electrostatic charge, uneven arrangement and mechanical damage, and these problems further result in LCD electro-optical characteristic
Reduction or production yield loss.Solving an above-mentioned scheme by mechanical friction institute variation is exactly with process for optical alignment
It substitutes mechanical friction and prepares oriented layer.
Process for optical alignment is contactless method for alignment.Typical light orientation technique mainly comprises the steps that
1. a light orientation material is coated on ito glass.
2. the substrate for being coated with light orientation material is exposed under ultraviolet radiation.
3. forming the light redirecting layer with specific direction.
Wherein coating light orientation material is identical as the method for polyimides for being coated with general friction, is printed using soft version
Brush machine, and in terms of orientation, replace rubbing machine using exposure machine.
Existing ultraviolet exposure machine is light source with mercury lamp 1, is provided by elements such as optically focused, reflection, optical filtering, collimations uniform flat
Row light output (as shown in Figure 1).The transmitting of mercury lamp 1 has considerable spectral line, needs optical filter to select required wavelength；This
Outside, it since emission area is big and dissipates, needs volume big and expensive optical device generates uniform and parallel light.Thus
Need that volume is big, power consumption is high and expensive mercury lamp exposure system.
LED light source has narrow emission spectrum and a large amount of wavelength selections, once confirmed required wavelength, use is corresponding
LED chip can be not suitable for optical filter.Since each LED chip is very small, only need micro optical lens can be into
Row light collimates (as shown in Figure 2).LED array with suitable collimation camera lens can produce uniform parallel area source.Present city
Has such system for adhesive curing or even photoetching on field.These systems are commonly used in impinging perpendicularly on substrate 2
Surface (as shown in Figure 3).
But in the application of some light orientations, need light from oblique angle incidence, such as 45 °, it is in this case, a kind of simpler
Single solution is canted exposure system 1, as shown in Figure 4.But in this case, to the entering proximally and distally of substrate 2
The irradiation distance for penetrating light will be different.The irradiation distance difference will lead to undesirable exposure intensity difference.Therefore, it needs to mention
For a kind of LED installation method, so that even if in the case where oblique incidence light, the distance phase of all the points in substrate 2 to light source 1
Together, to guarantee uniform irradiation.
Utility model content
In order to solve the above technical problems, the one aspect of the utility model proposes a kind of photohead for light orientation,
Photohead includes multiple parallel light units and photohead control unit, in which:
Each of multiple parallel light units include:
Light bulb, light bulb are the tilting gearings in vertical direction with angle [alpha]；
Light source, light source are arranged in one end of light bulb and are connected with external power supply；With
Camera lens is collimated, the other end of light bulb is arranged in collimation camera lens, has to pass through the light of collimation camera lens and be converted to
Angle with vertical direction is the exiting parallel light of angle [alpha]；And
Each of photohead control unit and multiple parallel light units and external power supply are connected, with control to more
The exiting light beam intensity of a parallel light unit and time.
In one embodiment, light source is LED chip.
In one embodiment, the wavelength peak of the LED light of LED chip transmitting is 300nm-470nm.
In one embodiment, light source is laser LD chip, and collimation camera lens is to expand microscope group.
In one embodiment, angle [alpha] is between 5 degree to 85 degree, and angle [alpha] can be adjusted.
In one embodiment, multiple parallel light units are mounted in same level.
In one embodiment, multiple parallel light units are installed as multiple row, and the parallel light unit dislocation of adjacent two column
Installation.
In one embodiment, light bulb is that the inclination in vertical direction with angle [alpha] being formed on aluminium sheet is cut holes.
In one embodiment, photohead further includes radiator, and the radiator is close to the multiple directional light list
Member setting is to be the multiple parallel light unit heat dissipation during photohead work.
The utility model another aspect provides a kind of exposure systems for light orientation, comprising:
Exposure room；With
Photohead, photohead are arranged in exposure room.
In one embodiment, exposure system further includes transmission device, transmission device be arranged in the lower section of photohead and with
Control unit communication, is passed through with transporting substrate under the control of the control unit from the lower section of photohead.
In one embodiment, exposure system further includes rotating device, rotating device respectively with photohead and control unit
It is connected, to drive photohead to rotate in the horizontal plane under the control of the control unit.
In one embodiment, exposure system further includes polarizing film, and polarizing film is arranged between photohead and substrate, so that
The light that photohead issues can pass through polarizing film and be irradiated to substrate.
In one embodiment, the area of polarizing film is less than the irradiated area for the light that photohead issues.
In one embodiment, exposure system further includes mask plate, and mask plate is arranged between photohead and substrate, so that
The light that photohead issues can be irradiated to substrate locally through mask plate.
In one embodiment, exposure system further includes temperature controller and humidity controller, temperature controller and humidity
Controller can be connected with control unit respectively, to adjust the indoor temperature and humidity of exposure under the control of the control unit.
As shown in the above description, in the photohead and exposure system disclosed by the utility model for light orientation, pass through by
Composition photohead multiple parallel light units be obliquely installed make the light being irradiated to special angle on substrate reach substrate away from
From identical, so that substrate be made to receive uniform intensity of illumination, more stable exposure effect may be implemented；By by rotating device
It is connected to photohead, rotates photohead in the horizontal plane, so as to realize the incident ray adjustment of more multi-faceted degree；
By the way that transmission device is arranged in exposure room, the substrate for making the exposure system can be applied to area greater than exposure area, and
Pipelining production may be implemented；Further, by the way that polarizing film is arranged between photohead and substrate, keep substrate continuous complete
Two exposure stages are exposed at polarised light exposure and non-polarized light.
Detailed description of the invention
Fig. 1 is the schematic diagram of mercury lamp exposure system in the prior art；
Fig. 2 is the schematic diagram of the colimated light system of LED light source；
Fig. 3 is the schematic diagram of the LED area light source system of vertical irradiation in the prior art；
Fig. 4 is the schematic diagram of the LED area light source system of 45 degree of angles of inclination in the prior art irradiation；
Fig. 5 is the schematic diagram according to the photohead for light orientation of an exemplary embodiment of the utility model；
Fig. 6 is the arranged in dislocation schematic diagram of multiple parallel light units in photohead shown in Fig. 5；
Fig. 7 is the schematic diagram according to the exposure system for light orientation of an exemplary embodiment of the utility model；
With
Fig. 8 is the schematic diagram of the photohead rotation front and back in the exposure system shown in fig. 7 for light orientation.
Specific embodiment
Illustrative, non-limiting embodiment of the utility model are described in detail with reference to the accompanying drawings, to practical new according to this
The photohead and exposure system for light orientation of type are further described.
Referring to Fig. 5, the one aspect of the utility model discloses a kind of photohead 4 for light orientation, the photohead 4 packet
Multiple parallel light units and control unit (not shown) are included, each of multiple parallel light units include light bulb 41, light
Source 42 and collimation camera lens 43, plurality of parallel light unit can issue under the control of the control unit directional light with to substrate into
Row exposure.
Light bulb 41 is the installation foundation of each parallel light unit, light source 42 and collimation camera lens 43 in each parallel light unit
It is installed in light bulb 41.Light bulb 41 can be tubular or other shapes open at one end, and the light bulb in specific installation
41 axis direction is α in vertical direction with angle, so that the angle for the light and vertical direction being emitted from light bulb 41 is α.It needs
It is noted that light bulb 41 can be the separately formed device for installing light source 42 and collimating camera lens 43, it is also possible to lead to
The inclined hole milling that milling process is formed on aluminium sheet or other plates is crossed, to make the more compact structure of photohead, stabilization.
Light source 42 is arranged in one end of light bulb 41 and is connected with external power supply, to obtain electric energy from external power supply, and light source 42
Type can be selected according to the concrete application field of photohead 4.The other end of light bulb 41 is arranged in collimation camera lens 43, from
The light that light source 42 issues projects after passing through collimation camera lens 43 from light bulb 41.In this way, due to the angle of light bulb 41 and vertical direction
For α, the parallel rays being emitted after collimating camera lens 43 and vertical direction also have angle α, and then can tilt injection substrate.
Control unit is connected with multiple parallel light units and external power supply, and multiple instruction is stored in control unit, works as control
Unit processed executes the exiting light beam intensity that the light source 42 of each of multiple parallel light units is controlled when these instructions and time.It needs
It is noted that the instruction that storage executes in a control unit and by control unit is that those skilled in the art are commonly used to control
The computer instruction of light source luminescent intensity and time processed, is not particularly limited herein.
By above description it is recognised that the photohead 4 disclosed by the utility model for light orientation will be by will be each parallel
The light bulb 41 of light unit be set as with vertical direction angle α, and one end of light bulb 41 be arranged collimation camera lens 43, make from each
The parallel rays of parallel light unit outgoing and the angle of horizontal plane are α.
In one embodiment, light source 42 is LED chip.The spectral region of typical LED light source is narrow, available
Wave-length coverage it is more, therefore operator can select different LED chips according to different orientation material requirements.Meanwhile LED
Chip volume is small, and light collimating effect (as shown in Figure 2) can be realized using very small collimation camera lens 43；LED light source also has
There is the advantages of low power consumption, long service life, the cost of user can be reduced.In one embodiment of the utility model,
The wavelength peak for the LED light that LED chip issues is between 300nm-470nm.But as above, those skilled in the art can
To select the LED light source of different wave length according to specific needs.
In another embodiment, light source 42 is laser diode LD chip, and collimation camera lens is to expand microscope group.Use LD core
Piece has that response speed is very fast, the spectral region of light beam is relatively narrow, beam divergence angle is smaller and output intensity and high-efficient excellent
Point.It can expand the diameter of LD light beam at the other end setting beam expanding lens of light bulb and reduce the angle of divergence, make exposure to substrate more
Add precisely.
In one embodiment, the angle α of the axis direction and vertical direction of light bulb 41 is between 5 degree to 85 degree, and
Angle [alpha] can be adjusted.In this way, user can select equivalent inclination according to desired orientation effect (for example, liquid crystal aligning)
Angle, without replacing photohead 4.In a preferred embodiment of the utility model, the axis direction of light bulb 41 and perpendicular
Histogram to angle α be 45 degree, in a particular application have widely adaptation environment.
With continued reference to Fig. 5, multiple parallel light units are mounted in same level, so that composition photohead 4 is multiple flat
The length that light source 42 in row light unit reaches horizontal irradiation face is identical, to guarantee the photograph having the same in same plane of exposure
Intensity is penetrated, realizes more uniform exposure effect.
Referring to Fig. 6, in one embodiment, multiple parallel light units of composition photohead 4 are installed as multiple row, and adjacent
The parallel light unit arranged in dislocation of two column, for example, column 4a, 4b and 4c of parallel light unit composition successively misplace, it is more equal to realize
Even exposure density.It is same to forming but it will be apparent to a skilled person that in order to realize different exposure effects
Multiple parallel light units of one photohead 4 can be used a variety of different installation methods and be not limited to above-mentioned arranged in dislocation.
It will be apparent that in order to improve photohead using safe and prolong the service life, exposure disclosed by the utility model
Shaven head further includes radiator (not shown).Radiator is arranged close to multiple parallel light units, to work in photohead
The heat of generation is shed in time in the process, reduces loss of the high temperature to photohead.The radiator can be, for example, heat dissipation
Piece, fan, water-cooling and other radiators with heat sinking function commonly used in the art, are not specifically limited herein.
The utility model another aspect provides a kind of exposure system for light orientation using above-mentioned photohead,
The exposure system is described further with reference to the accompanying drawings.
Referring to Fig. 7, the exposure system for light orientation includes exposure room 6, photohead 4, and the wherein setting of photohead 4 is exposing
In light room 6, in operating process, the parallel rays that photohead 4 issues is exposed the substrate 2 being placed under photohead 4.
In order to realize better exposure effect, the components such as photohead 4 and substrate 2 are arranged in closed exposure room 6, with
The various factors in exposure process is set to be in controllable state.Substrate 2 is to be exposed body, for example, the glass base of liquid crystal display
After being coated with photo-alignment layer photochemical reaction can occur under the irradiation of light for plate, so as to induce taking for liquid crystal molecule
To.In exposure process, the lower section of photohead 4 is arranged in the exit facet that substrate 2 is parallel to photohead 4, so that more in photohead 4
Each of a parallel light unit is irradiated to being equidistant for the point on substrate 2, and the light for guaranteeing that photohead 4 issues is irradiated to
The received intensity of illumination of each point institute on substrate 2 is identical, has uniform exposure effect.
With continued reference to Fig. 7, in one embodiment, the exposure system for light orientation further includes transmission device 7.Due to
The exposure area of photohead 4 is limited, therefore in the case where the area of substrate 2 is larger, substrate 2 can be placed on transmission device
On 7, control instruction is sent to transmission device 7 by control unit, so that transmission device 7 drives substrate 2 across the exposure of photohead 4
Light region.Meanwhile transporting substrate 2 using transmission device 7 and passing through exposure room 6, it can also realize the continuous exposure of multiple substrates 2,
That is, realizing quantity-produced purpose.In addition, in order to realize different exposure effects, that is, what the different location on substrate 2 was subject to
Exposure intensity is different, and different control information can be arranged in control unit, make transmission device 7 at different rates by operator
It is run with direction, extends or shorten the time and light irradiating angle that substrate 2 is exposed.
Referring to Fig. 7 and 8, in one embodiment, in order to realize that different liquid crystal orientation planar orientations, the utility model disclose
Exposure system in further include rotating device (not shown), which is connected with photohead 4 and control unit respectively
It connects.In this way, the rotational orientation angle of rotating device can be arranged in operator by control unit, to control the photograph of photohead 4
Direction and angle are penetrated, realizes the exposure to 2 different angle of substrate.
With continued reference to Fig. 7, light that LED chip is issued be it is unpolarized, therefore, in order to realize the mesh of polarised light exposure
, it further include polarizing film 5 in the exposure system disclosed by the utility model for light orientation.Polarizing film 5 setting photohead 4 with
Between substrate 2, so that the light that photohead 4 issues is irradiated on substrate 2 after polarization.Preferably, the area of polarizing film 5 is small
In the irradiated area for the light that photohead 4 issues, in this way, during mobile substrate 2 is exposed, when it passes through polarizing film
By polarizing light irradiation when 5 lower section, shone when except the exposure area that it is moved to the covering of polarizing film 5 by non-polarized light
It penetrates, to realize the two of the exposure steps process for successively using polarised light and non-polarized light.
With continued reference to Fig. 7, mask plate also can be inserted between photohead 4 and substrate 2, to carry out partial exposure, make
The different piece for obtaining substrate 2 has different exposure-processeds, this is a kind of process for manufacturing a variety of LCD.
It is more preferable in order to realize since some light orientation materials and technique are more sensitive to the temperature and humidity in exposure process
Exposure effect, the exposure system disclosed by the utility model for light orientation further include temperature controller (not shown) and
Humidity controller (not shown).Temperature controller and humidity controller be arranged in exposure room 6 and respectively with control
Unit is connected.In this way, by the temperature and humidity in temperature controller and humid control real-time monitoring exposure room 6, and by
Operator sets the temperature and humidity in exposure process in exposure room 6 by control unit and passes through temperature controller and humidity
Controller adjusts the temperature and humidity in exposure room 6.It should be noted that temperature controller disclosed in the utility model can be with
It is the temperature controlled any temperature control device that can be realized enclosure space commonly used in the art, for example, pressure type temperature control
Device processed, electronic temperature controller, are not specially limited herein.Similarly, humidity controller used in the utility model can be with
It is the moisture control device of the humid control that can be realized enclosure space commonly used in the art, is not specially limited herein.
In addition, the exposure system can also replace temperature controller and humidity controller using temperature and humidity controller, it is identical to realize
Temperature and humidity control function.
Claims (16)
1. a kind of photohead for light orientation, which is characterized in that the photohead includes multiple parallel light units and photohead
Control unit, in which:
Each of the multiple parallel light unit includes:
Light bulb, the light bulb are the tilting gearings in vertical direction with angle [alpha]；
Light source, the light source are arranged in one end of the light bulb and are connected with external power supply；With
Camera lens is collimated, the other end of the light bulb is arranged in the collimation camera lens, turns to pass through the light of the collimation camera lens
It is changed to the exiting parallel light for the angle of vertical direction being the angle [alpha]；And
The photohead control unit is connected with the multiple parallel light unit and the external power supply, described more to control
The exiting light beam intensity of a parallel light unit and time.
2. photohead according to claim 1, which is characterized in that the light source is LED chip.
3. photohead according to claim 2, which is characterized in that the wavelength peak of the LED light of the LED chip transmitting
For 300nm-470nm.
4. photohead according to claim 1, which is characterized in that the light source is laser diode LD chip, the standard
Straight camera lens is to expand microscope group.
5. photohead according to claim 1, which is characterized in that the angle [alpha] is and described between 5 degree to 85 degree
Angle [alpha] can be adjusted.
6. photohead according to claim 1, which is characterized in that the multiple parallel light unit is mounted on same level
It is interior.
7. photohead according to claim 6, which is characterized in that the multiple parallel light unit is installed as multiple row, and
The parallel light unit arranged in dislocation of adjacent two column.
8. photohead according to claim 1, which is characterized in that the light bulb is to be formed on aluminium sheet and vertical direction
The inclination hole milling of angled α.
9. photohead according to claim 1, which is characterized in that the photohead further includes radiator, the heat dissipation
Device is close to the multiple parallel light unit setting to carry out during photohead work to the multiple parallel light unit
Heat dissipation.
10. a kind of exposure system for light orientation, which is characterized in that the exposure system includes:
Exposure room；With
Photohead as claimed in any one of claims 1-9 wherein, the photohead are arranged in the exposure room.
11. exposure system according to claim 10, which is characterized in that the exposure system further includes transmission device, institute
It states transmission device the lower section of the photohead is arranged in and communicates with described control unit, under the control of described control unit
Substrate is transported to pass through from the lower section of the photohead.
12. exposure system according to claim 10, which is characterized in that the exposure system further includes rotating device, institute
It states rotating device to be connected with the photohead and described control unit respectively, to drive institute under the control of described control unit
Photohead is stated to rotate in the horizontal plane.
13. exposure system according to claim 10, which is characterized in that the exposure system further includes polarizing film, described
Polarizing film is arranged between the photohead and substrate, shines so that the light that the photohead issues can pass through the polarizing film
It is mapped to substrate.
14. exposure system according to claim 13, which is characterized in that the area of the polarizing film is less than the photohead
The irradiated area of the light of sending.
15. exposure system according to claim 10, which is characterized in that the exposure system further includes mask plate, described
Mask plate is arranged between the photohead and substrate, so that the light that the photohead issues is merely able to cover locally through described
Film version is irradiated to substrate.
16. exposure system according to claim 10, which is characterized in that the exposure system further include temperature controller and
Humidity controller, the temperature controller and the humidity controller are connected with described control unit respectively, in the control
The indoor temperature and humidity of exposure is adjusted under the control of unit processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821117303.1U CN209014871U (en) | 2018-07-16 | 2018-07-16 | Photohead and exposure system for light orientation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821117303.1U CN209014871U (en) | 2018-07-16 | 2018-07-16 | Photohead and exposure system for light orientation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209014871U true CN209014871U (en) | 2019-06-21 |
Family
ID=66830048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821117303.1U Active CN209014871U (en) | 2018-07-16 | 2018-07-16 | Photohead and exposure system for light orientation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209014871U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021152617A (en) * | 2020-03-24 | 2021-09-30 | フェニックス電機株式会社 | Light irradiation device and exposure apparatus including the same |
| WO2021235305A1 (en) * | 2020-05-21 | 2021-11-25 | フェニックス電機株式会社 | Light projecting device, and exposure device provided therewith |
| JP2021184083A (en) * | 2020-05-21 | 2021-12-02 | フェニックス電機株式会社 | Light irradiation device and exposure device with the same |
| JP2022031802A (en) * | 2020-03-24 | 2022-02-22 | フェニックス電機株式会社 | Light irradiation device and exposure apparatus including the same |
| WO2022153672A1 (en) * | 2021-01-13 | 2022-07-21 | フェニックス電機株式会社 | Light projecting device and exposure device provided with same |
-
2018
- 2018-07-16 CN CN201821117303.1U patent/CN209014871U/en active Active
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7140430B2 (en) | 2020-03-24 | 2022-09-21 | フェニックス電機株式会社 | Light irradiation device and exposure device provided with same |
| CN115210636A (en) * | 2020-03-24 | 2022-10-18 | 凤凰电机公司 | Light irradiation device and exposure device provided with same |
| EP4130862A4 (en) * | 2020-03-24 | 2024-04-24 | Phoenix Electric Co Ltd | Light irradiation device, and exposure apparatus provided therewith |
| CN115210636B (en) * | 2020-03-24 | 2024-04-23 | 凤凰电机公司 | Light irradiation device and exposure device provided with same |
| JP2021152617A (en) * | 2020-03-24 | 2021-09-30 | フェニックス電機株式会社 | Light irradiation device and exposure apparatus including the same |
| JP2022031802A (en) * | 2020-03-24 | 2022-02-22 | フェニックス電機株式会社 | Light irradiation device and exposure apparatus including the same |
| WO2021193301A1 (en) * | 2020-03-24 | 2021-09-30 | フェニックス電機株式会社 | Light irradiation device, and exposure apparatus provided therewith |
| JP6989977B2 (en) | 2020-03-24 | 2022-01-12 | フェニックス電機株式会社 | Light irradiation device and exposure device equipped with this |
| JP7142380B2 (en) | 2020-05-21 | 2022-09-27 | フェニックス電機株式会社 | Light irradiation device and exposure device provided with same |
| JP2022184872A (en) * | 2020-05-21 | 2022-12-13 | フェニックス電機株式会社 | Light irradiation device and exposure apparatus including the same |
| JP7257719B2 (en) | 2020-05-21 | 2023-04-14 | フェニックス電機株式会社 | Light irradiation device and exposure device provided with same |
| JP2021184083A (en) * | 2020-05-21 | 2021-12-02 | フェニックス電機株式会社 | Light irradiation device and exposure device with the same |
| WO2021235305A1 (en) * | 2020-05-21 | 2021-11-25 | フェニックス電機株式会社 | Light projecting device, and exposure device provided therewith |
| WO2022153672A1 (en) * | 2021-01-13 | 2022-07-21 | フェニックス電機株式会社 | Light projecting device and exposure device provided with same |
| JPWO2022153672A1 (en) * | 2021-01-13 | 2022-07-21 | ||
| JP7191434B2 (en) | 2021-01-13 | 2022-12-19 | フェニックス電機株式会社 | Light irradiation device and exposure device provided with same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN209014871U (en) | Photohead and exposure system for light orientation | |
| KR100509124B1 (en) | Optical exposure system for alignment, optics module, process for aligning an optical alignment layer, and process for generating alignment of liquid crystal medium | |
| CN206657803U (en) | Laser aids in mating system | |
| CN105607351B (en) | A kind of ultraviolet curing device, sealant curing system and sealant curing method | |
| RU2419741C2 (en) | Optical system | |
| CN102385232B (en) | Lighting device and projector | |
| US11016230B2 (en) | Optical element and optical device | |
| KR100661241B1 (en) | Fabrication method of optical sheet | |
| US20140139810A1 (en) | Light source device and projector | |
| CN109073170A (en) | Light supply apparatus and the electronic device for utilizing it | |
| CN103026126B (en) | Phosphor-coated light-emitting device | |
| US11802077B2 (en) | Diffusion element, lighting module, and method for processing aspheric lens | |
| US10295155B2 (en) | Heat protection and homogenizing system for a luminaire | |
| US20240151371A1 (en) | Light-emitting apparatus using metasurfaces and light-emitting method thereof | |
| TW200306462A (en) | Exposure apparatus for irradiating a sensitized substrate | |
| JP7297870B2 (en) | Optical member, illumination device, and screen | |
| JP2005234266A (en) | Polarization exposure method | |
| JP7191434B2 (en) | Light irradiation device and exposure device provided with same | |
| CN109212837B (en) | Optical alignment device and method | |
| JP2004029180A (en) | Ultra-violet light polarizing light source device and manufacturing method of liquid crystal orientation film using it | |
| KR100761214B1 (en) | Optical sheet | |
| CN117706673B (en) | Liquid crystal polarization grating preparation device and preparation method | |
| CN117647918B (en) | Exposure device for preparing liquid crystal diffraction element | |
| TWI828974B (en) | Radio frequency screen, ultraviolet lamp system and method of screening radio frequency energy | |
| CN212647041U (en) | Optical polarization device and exposure device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |