TW202226407A - Pellicle frame grasping device - Google Patents
Pellicle frame grasping device Download PDFInfo
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- TW202226407A TW202226407A TW110133060A TW110133060A TW202226407A TW 202226407 A TW202226407 A TW 202226407A TW 110133060 A TW110133060 A TW 110133060A TW 110133060 A TW110133060 A TW 110133060A TW 202226407 A TW202226407 A TW 202226407A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- Microelectronics & Electronic Packaging (AREA)
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Projection-Type Copiers In General (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
本發明係關於薄膜框架把持裝置。The present invention relates to a film frame holding device.
專利文獻1中揭示一種薄膜框架把持裝置,其使用設於框體之薄膜把持部把持薄膜框架,使薄膜之黏著構件與遮罩相抵接,將測量部配置於前端附近與遮罩重疊之第1位置,測定距遮罩表面之距離即第1距離,使測量部移動至前端附近與薄膜框架重疊之第2位置,測定距薄膜之距離即第2距離。
[現有技術文獻]
[專利文獻]
[專利文獻1]日本特開2019-128501號公報[Patent Document 1] Japanese Patent Laid-Open No. 2019-128501
[發明所欲解決之問題][Problems to be Solved by Invention]
於專利文獻1所記載之發明中,可準確測定距薄膜之膜之距離等高度方向(與薄膜之膜大致正交之方向)之距離,但無法測定深度方向(與薄膜之膜大致平行之方向)之距離,於薄膜框架變形之情形時,有無法準確進行薄膜框架之把持之虞。In the invention described in
本發明係有鑑於此種事情而成者,目的在於提供一種可掌握能否準確把持薄膜框架之薄膜框架把持裝置。 [解決問題之手段] The present invention has been made in view of such matters, and an object of the present invention is to provide a film frame holding device capable of grasping whether or not the film frame can be accurately held. [means to solve the problem]
為了解決上述課題,本發明之薄膜框架把持裝置例如係一種把持薄膜者,該薄膜具有:大致中空筒狀之薄膜框架,其側面形成有溝槽;及薄膜之膜,其以覆蓋上述薄膜框架之中空部之方式設於與上述薄膜框架之上述側面大致正交之第1面;其特徵在於具備:框體,其係將複數個棒狀構件組合為大致矩形形狀之框狀構件;複數個薄膜把持構件,其等設於上述框體;及驅動部,其設於上述每一薄膜把持構件,且使上述薄膜把持構件於上述溝槽中插入上述薄膜把持構件之第1位置、與上述溝槽中未插入上述薄膜把持構件之第2位置之間沿第1方向移動;上述薄膜把持構件具有當上述薄膜把持構件處於上述第1位置時一部分插入至上述溝槽中之板狀或棒狀的前端部,於上述前端部設有表示上述前端部於上述第1方向上之位置之標記。In order to solve the above-mentioned problems, the film frame holding device of the present invention is, for example, a film holding device comprising: a substantially hollow cylindrical film frame with grooves formed on the side surfaces; and a film film covering the film frame. The hollow part is provided on the first surface that is substantially orthogonal to the side surface of the film frame; it is characterized by comprising: a frame body that combines a plurality of rod-shaped members into a substantially rectangular frame-shaped member; a plurality of films A gripping member, etc., provided in the frame body; and a driving portion, which is provided on each of the film gripping members, and inserts the film gripping member into the groove at the first position of the film gripping member, and the groove. moving in the first direction between the second positions in which the film holding member is not inserted; the film holding member has a plate-shaped or rod-shaped front end partially inserted into the groove when the film holding member is in the first position The said front-end|tip part is provided with the mark which shows the position of the said front-end|tip part in the said 1st direction.
根據本發明之薄膜框架把持裝置,薄膜把持構件具有一部分插入至薄膜框架之溝槽之板狀或棒狀的前端部。於前端部設有表示薄膜把持構件於薄膜把持構件之移動方向即第1方向上之位置的標記。藉此,可掌握前端部是否準確插入至溝槽中,即能否準確把持薄膜框架。According to the film frame holding device of the present invention, the film holding member has a plate-shaped or rod-shaped front end portion which is partially inserted into the groove of the film frame. A mark showing the position of the film holding member in the moving direction of the film holding member, that is, in the first direction is provided at the front end portion. Thereby, it can be grasped whether the front end portion is accurately inserted into the groove, that is, whether the film frame can be accurately grasped.
上述前端部由金屬形成,可藉由在上述前端部之表面設置塗佈層,而將上述標記設於上述前端部。藉此,可容易地將標記設於薄膜把持構件。The front end portion is formed of metal, and the mark can be provided on the front end portion by providing a coating layer on the surface of the front end portion. Thereby, the mark can be easily provided on the film holding member.
上述薄膜框架為經施加黑色耐酸鋁處理之鋁合金,上述塗佈層可為黑色。藉此,可使薄膜框架與標記之顏色一致,提高標記之視認性。The above-mentioned film frame is an aluminum alloy treated with black acid-resistant aluminum, and the above-mentioned coating layer can be black. Thereby, the color of the film frame and the mark can be matched, and the visibility of the mark can be improved.
上述前端部由金屬形成,可藉由切削上述前端部之表面之一部分形成凹部,而將上述標記設於上述前端部。藉此,可使標記不自前端部消失。The front end portion is formed of metal, and the mark can be provided on the front end portion by cutting a part of the surface of the front end portion to form a recessed portion. Thereby, the mark can be prevented from disappearing from the front end portion.
上述薄膜框架為經施加黑色耐酸鋁處理之鋁合金,上述標記可為將上述凹部之內部著色為黑色而形成。藉此,可使薄膜框架與標記之顏色一致,提高標記之視認性。The above-mentioned film frame is an aluminum alloy to which black acid-resistant aluminum treatment is applied, and the above-mentioned mark can be formed by coloring the inside of the above-mentioned concave portion black. Thereby, the color of the film frame and the mark can be matched, and the visibility of the mark can be improved.
上述前端部具有前端面,該前端面於上述薄膜把持構件處於上述第1位置時插入至上述溝槽中,且於與上述第1方向大致正交之第2方向上延伸設置,上述標記可表示距上述前端面之距離。藉此,可掌握前端面是否抵接於溝槽之底面,即能否準確把持薄膜框架。The front end portion has a front end surface, the front end surface is inserted into the groove when the film holding member is in the first position, and extends in a second direction substantially perpendicular to the first direction, and the mark may indicate The distance from the above-mentioned front end face. Thereby, it can be grasped whether the front end surface is in contact with the bottom surface of the groove, that is, whether the film frame can be accurately held.
上述標記可不設於夾在上述前端面與邊界線之間之前端區域,該邊界線為大致沿著上述第2方向之假想線,且配置於在上述第1方向上距上述前端面既定距離之位置。藉此,可防止切削標記而產生灰塵之情況。The mark may not be provided in the front end region sandwiched between the front end surface and the boundary line, and the boundary line is an imaginary line substantially along the second direction, and is arranged in the first direction from the front end surface. A predetermined distance. Location. Thereby, it is possible to prevent the generation of dust caused by cutting marks.
上述前端部為板狀,上述標記設於上述前端部之最寬闊之面,上述標記具有沿上述邊界線排列之第1標記、第2標記及第3標記,上述第1標記、上述第2標記及上述第3標記之各者之上述第1方向之長度可不同。藉此,進一步可容易地瞭解使前端部移動何種程度而將前端部確實地插入至溝槽中。The front end portion is plate-shaped, the mark is provided on the widest surface of the front end portion, and the mark includes a first mark, a second mark, and a third mark arranged along the boundary line, the first mark, and the second mark. The length in the above-mentioned first direction may be different for each of the above-mentioned third marks. Thereby, it can be further easily understood how far the front end portion is moved and the front end portion is surely inserted into the groove.
上述標記具有分別各2個上述第1標記、上述第2標記及上述第3標記,上述第1標記、上述第2標記及上述第3標記可分別設於沿著上述薄膜把持構件之長度方向的中心線之兩側。藉此,即便反射板等設於前端部之鉛直方向上側,亦可確實地視認標記。The above-mentioned marks have two each of the above-mentioned first mark, the above-mentioned second mark and the above-mentioned third mark, respectively, and the above-mentioned first mark, the above-mentioned second mark and the above-mentioned third mark may be respectively provided in the longitudinal direction of the film holding member. both sides of the centerline. Thereby, even if a reflector etc. are provided in the vertical direction upper side of a front-end|tip part, a mark can be visually recognized reliably.
於將上述框體沿水平方向延伸設置時,上述標記可設於可自上方或斜上方視認之位置。藉此,可容易地視認標記。When the frame body is extended in the horizontal direction, the mark can be set at a position that can be seen from above or obliquely above. Thereby, the mark can be visually recognized easily.
具備拍攝上述標記之拍攝部,於將上述框體沿水平方向延伸設置時,上述拍攝部可設於較上述框體高之位置。藉此,於內部空間,作業人員無需目視標記,可防止灰塵之產生。The imaging part is provided for imaging the mark, and when the frame body is extended in the horizontal direction, the imaging part can be installed at a position higher than the frame body. Thereby, in the inner space, the operator does not need to visually mark, and the generation of dust can be prevented.
上述框體具有隔著間隔保持為大致平行之棒狀之第1縱框及第2縱框,上述薄膜把持構件設於上述第1縱框及上述第2縱框各者,上述拍攝部分別與上述第1縱框及上述第2縱框鄰接設置,自鉛直方向上側觀察時,上述拍攝部可設於上述第1縱框與上述第2縱框所夾之區域之外側。藉此,可避免標記被薄膜框架遮擋而無法拍攝之情況發生。 [發明之效果] The frame body has a rod-shaped first vertical frame and a second vertical frame held substantially parallel to each other with an interval therebetween, the film holding member is provided on each of the first vertical frame and the second vertical frame, and the imaging portion is connected to each of the first vertical frame and the second vertical frame. The first vertical frame and the second vertical frame are provided adjacent to each other, and the imaging portion may be provided outside the region sandwiched between the first vertical frame and the second vertical frame when viewed from a vertical upper side. In this way, it can be avoided that the mark is blocked by the film frame and cannot be photographed. [Effect of invention]
根據本發明,可掌握能否準確把持薄膜框架。According to the present invention, it is possible to grasp whether or not the film frame can be accurately held.
以下,參照圖式對本發明之實施形態詳細地進行說明。於各圖式中,對相同要素標註相同符號,重複部分省略說明。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In each of the drawings, the same elements are denoted by the same symbols, and descriptions of overlapping parts are omitted.
<第1實施形態>
圖1係表示第1實施形態之薄膜把持裝置1之概略之前視圖。薄膜把持裝置1設於未圖示之薄膜貼附裝置內。薄膜貼附裝置係將薄膜把持裝置1所把持之薄膜100貼附於大致沿鉛直方向保持之大致板狀遮罩(未圖示)者。
<First Embodiment>
FIG. 1 is a schematic front view showing a
以下,將水平方向設為沿著xy平面之方向,將與xy平面正交之鉛直方向設為z方向。又,x方向與y方向正交。Hereinafter, let the horizontal direction be the direction along the xy plane, and let the vertical direction orthogonal to the xy plane be the z direction. In addition, the x direction is orthogonal to the y direction.
首先,對薄膜100進行說明。圖2係表示薄膜100之概略之立體圖。圖3係圖2之A-A線段剖視圖。薄膜100主要具有薄膜框架101、張設於薄膜框架101上之薄膜之膜102及形成於薄膜框架101之下表面之黏著構件103(參照圖3)。First, the
薄膜框架101係具有大致矩形外周之框狀(大致中空筒狀)構件。薄膜框架101俯視(自圖2之紙面上方觀察)為大致矩形形狀,於中央部具有中空部101e。薄膜框架101係中空部101e之大小與光罩之大小(例如520 mm×800 mm~1620 mm×1780 mm左右)為相同程度。薄膜框架101之框狀部分之寬度為數十mm左右,厚度為2 mm~10 mm左右。The
薄膜框架101具有大致平行之上表面101a及下表面101b。又,於與薄膜框架101之上表面101a及下表面101b正交之側面101c形成有溝槽101d。於溝槽101d中插入設於框體10之薄膜把持構件21(容後詳述)。The
溝槽101d根據薄膜框架101之大小而不同。例如,於G10玻璃(1620 mm×1780 mm)用薄膜框架101之情形時,深度d為大致3 mm,寬度w為大致1.5 mm~2 mm。又,於比G10還小型之玻璃用薄膜框架101之情形時,深度d為大致2 mm,寬度w為大致1.5 mm~2 mm。The
於本實施形態中,薄膜框架101為經施加黑色耐酸鋁處理之鋁合金,但薄膜框架101之材質並不限定於此。例如可由鐵、鎳鋼、鈦、鈦合金等金屬形成薄膜框架101。In this embodiment, the
薄膜之膜102為次微米厚度之薄膜。薄膜之膜102以覆蓋薄膜框架101之中空部101e之方式張設於薄膜框架101之上表面101a。若薄膜框架101貼附於光罩基板上,則薄膜之膜102距遮罩之圖案形成面(表面)以既定間隔隔開設置。The
黏著構件103設於薄膜框架101之下表面101b。黏著構件103於薄膜框架101整周形成為邊框狀。黏著構件103可使用公知者,例如熱熔接著劑。The
於黏著構件103之下端面貼附有用於保護黏著劑之離型層(襯墊片材)。離型層設有複數個自薄膜框架101突出之凸部,藉由貼合、接著等設於薄膜收納容器(未圖示)。A release layer (a liner sheet) for protecting the adhesive is attached to the lower end surface of the
薄膜100以載置於薄膜收納容器之狀態搬入至薄膜貼附裝置內部。此時,薄膜框架101之上表面101a及下表面101b大致沿著水平方向。The
返回圖1之說明。薄膜把持裝置1主要具有框體10、薄膜把持部20及測量部31。薄膜把持部20及測量部31設於框體10。Return to the description of FIG. 1 . The
首先,對內部設有薄膜把持裝置1之薄膜貼附裝置(未圖示)之動作簡單地進行說明。於薄膜貼附裝置內部,除設有薄膜把持裝置1以外,還設有由保持部(未圖示)大致沿著鉛直方向保持之遮罩(未圖示)。於薄膜100從載置於薄膜收納容器(未圖示)之狀態大致沿著水平方向搬入至薄膜貼附裝置內部時,框體10大致沿著鉛直方向。其後,使框體10旋動而成為大致沿著水平方向之狀態,以薄膜把持部20把持薄膜100,使框體10向鉛直方向上側移動而自薄膜100剝下離型層(未圖示)。以把持露出黏著構件103(圖1中未圖示)之薄膜100之狀態旋動框體10,成為框體10大致沿著鉛直方向之狀態,使框體10平行移動而將黏著構件103貼附於遮罩。First, the operation of the film sticking device (not shown) in which the
其次,對薄膜把持裝置1之構成進行說明。框體10為將複數個棒狀構件組合為大致矩形形狀之框狀構件。框體10主要具有縱框部11,12、上框部13,14、及設於縱框部11,12及上框部13,14之外側之框15。縱框部11,12、上框部13,14及框15由金屬例如鐵、鋁等形成。Next, the structure of the
於薄膜把持部20把持薄膜100時,如圖1所示,框體10於水平方向上(大致沿著xy平面)延伸設置。When the
縱框部11,12為長度方向沿y方向設置之棒狀構件,沿框15之下端部15a及上端部15b(即沿x方向)可移動地設置。使縱框部11,12沿x方向移動之機構可使用已經公知之各種技術。再者,若框體10沿鉛直方向延伸設置,則縱框部11,12大致沿鉛直方向延伸設置。The
上框部13,14為長度方向沿x方向設置之棒狀構件,分別沿縱框部11,12(即沿y方向)可移動地設置。使上框部13,14沿y方向移動之機構可使用已經公知之各種技術。若框體10沿鉛直方向延伸設置,則上框部13,14於縱框部11,12之上端附近大致水平地延伸設置。The
再者,上框部13,14之形態並不限定於此。例如,上框部由大致水平地延伸設置之1根棒狀構件構成,該1根棒狀構件之兩端附近可設於縱框部11,12。In addition, the form of the
如此,藉由可移動縱框部11,12及上框部13,14,可改變由縱框部11,12、上框部13,14及下端部15a構成之框之大小,對應至各種大小之薄膜100。再者,薄膜100例如可例舉420 mm×720 mm之大小者、700 mm×800 mm之大小者、520 mm×680 mm之大小者、750 mm×1300 mm之大小者、1520 mm×1680 mm之大小者。In this way, by moving the
框體10由未圖示之移動機構(包含致動器)沿鉛直方向及水平方向可移動地設置。又,框體10具有設於-y側之端附近之未圖示之旋動軸,由未圖示之移動機構(包含致動器)可旋動地設置。由於使框體10移動及旋動之機構是公知的,因此省略說明。The
待機時(薄膜100之搬入時等),框體10處於由框15形成之面沿鉛直方向延伸設置(框體10沿鉛直方向延伸設置)之狀態。薄膜100搬入至薄膜貼附裝置內,若定位結束,則框體10以旋動軸為中心旋動,成為由框15形成之面沿水平方向延伸設置(框體10沿水平方向延伸設置)之狀態。藉此,薄膜把持部20可把持薄膜100。During standby (when the
若薄膜把持部20把持薄膜100,則框體10向鉛直方向上側移動,黏著構件103離開離型層。黏著構件103由於有對於突然之強力之黏著力強,而對於微弱持續之力之黏著力弱的性質,因此使黏著構件103離開離型層之處理歷經30分鐘~1小時左右緩慢進行。When the
若黏著構件103離開離型層,則框體10以旋動軸為中心旋動,框體10成為沿鉛直方向延伸設置之狀態。藉此,可將薄膜100貼附於遮罩。將薄膜100貼附於遮罩時,以上端側之下表面101b與遮罩之距離較下端側之下表面101b與遮罩之距離近之方式,使框體10相對於鉛直方向傾斜。又,將薄膜100貼附於遮罩時,使框體10從沿鉛直方向延伸設置之狀態平行於水平方向。When the
薄膜把持部20具有複數個把持薄膜框架101之側面101c之薄膜把持構件21。薄膜把持構件21設於縱框部11,12、上框部13,14、下端部15a及上端部15b。The
於圖1所示之例中,於縱框部11,12分別設有5個薄膜把持構件21,於上框部13,14分別設有1個薄膜把持構件21,於下端部15a設有5個薄膜把持構件21,於上端部15b設有1個薄膜把持構件21,但薄膜把持構件21之位置及數量並不限定於此。In the example shown in FIG. 1, five
根據薄膜100之大小,所使用之薄膜把持構件21不同。於圖1中,僅使用設於框體10之薄膜把持構件21中抵接於薄膜100(此處為側面101c)之薄膜把持構件21。The
薄膜把持構件21於一部分插入至溝槽101d之插入位置、與未抵接於側面101c之退避位置之間可沿水平方向或垂直方向移動地設置。圖4係表示薄膜把持部20之概略之圖。The
薄膜把持構件21為金屬製之板狀或棒狀構件。於本實施形態中,薄膜把持構件21為不鏽鋼(例如SUS 304)製。The
薄膜把持構件21係使板狀構件彎曲而形成,主要具有前端部21a、彎曲部21b及設有驅動構件22之保持部21c。於薄膜把持構件21處於插入位置時,前端部21a之一部分插入至溝槽101d。The
於本實施形態中,薄膜把持構件21於彎曲部21b之兩端以大致直角彎曲。但是,薄膜把持構件21之彎曲角度並不限定於大致直角。In the present embodiment, the
前端部21a具有薄膜把持構件21處於插入位置時插入至溝槽101d之前端面21d。前端面21d為板狀構件之端面,沿著與薄膜把持構件21之移動方向大致正交之方向延伸設置。例如,關於設於縱框部11,12之薄膜把持構件21,移動方向為x方向,前端面21d大致沿著y方向(與yz平面大致平行地設置)。若薄膜把持構件21確實地插入至溝槽101d,則前端面21d與溝槽101d之底面抵接。The
於前端部21a,設有表示前端部21a於薄膜把持構件21之移動方向(圖4中為x方向)上之位置之標記(圖4中省略圖示)。於本實施形態中,將表示距前端面21d之距離之標記設於前端部21a。將框體10沿水平方向延伸設置時,標記設於可自上方視認之位置。於本實施形態中,前端部21a為板狀,於作為前端部21a之最寬闊之面且為鉛直方向上側(+z側)之面之面21f設有標記。作業人員藉由視認標記,可確認前端部21a之x方向之位置,進一步可確認薄膜把持構件21是否確實地插入至溝槽101d。關於標記將於後詳述。The
於薄膜把持構件21(保持部21c)設有驅動構件22。驅動構件22具有桿22a、及使桿22a移動之致動器22b。薄膜把持構件21連結於桿22a。致動器22b設於框體10(圖4中省略圖示)。The
薄膜把持構件21藉由驅動構件22,於薄膜把持構件21插入至溝槽101d之插入位置(參照圖4實線)、與薄膜把持構件21未插入溝槽101d而薄膜把持構件21不干涉薄膜框架101之退避位置(參照圖4一點鏈線)之間,沿水平方向移動。The
於薄膜把持構件21分別設有測量薄膜框架101之高度(z方向之位置)之測量部24。測量部24主要具有超音波感測器24a及反射板24b。再者,測量部24並非必須,測量部24之形態亦不限定於此。The
超音波感測器24a係朝對象物發送超音波而接收其反射波,基於訊號發送與反射波接收之時間間隔,測定距目標物之距離的測距感測器。由於超音波感測器24a是已經公知的,因此省略詳細說明。The
反射板24b設於薄膜把持構件21之上側(+z側)。反射板24b反射由超音波感測器24a發送之超音波。反射板24b之前端部24c相對於xy平面傾斜大致45度。因此,由超音波感測器24a發送之超音波向下(-z方向)反射(參照圖4之二點鏈線)。The
返回圖1之說明。測量部31具有測距感測器(例如超音波感測器)及反射板,測定遮罩或薄膜框架101之高度(z方向之位置)。測量部31設於框體10,此處設於上框部13,14。自與構成框體10之棒狀構件(例如上框部13,14)之延伸設置方向大致正交之方向(此處為z方向)觀察,測量部31設於與薄膜把持構件21不同之位置。Return to the description of FIG. 1 . The measuring
2個測量部31分別設於框體10之上側附近且左端附近,並且設於框體10之上側附近且右端附近。但是,設有測量部31之位置及數量並不限定於圖1所示之形態。The two
測量部31於前端附近與遮罩重疊之第1位置(參照圖1實線)、和前端附近與薄膜框架101重疊之第2位置(參照圖1之二點鏈線)之間,沿垂直方向可移動地設置。The measuring
其次,對設於薄膜把持構件21之標記進行說明。以下,以設於縱框部12之薄膜把持構件21為例對標記進行說明。圖5係表示標記23之一例之圖。Next, the marks provided on the
首先,對標記23之材質進行說明。藉由在薄膜把持構件21之表面設置塗佈層,而將標記23設於薄膜把持構件21。藉此,可容易地將標記23設於薄膜把持構件21。於本實施形態中,於塗佈層使用對異丙醇等溶劑具有耐性之氟素樹脂。First, the material of the
又,標記23中使用之塗佈層期望為黑色。薄膜把持構件21之未設置標記23之部分為金屬色(例如銀色)。藉由使標記23為黑色,可使黑色之薄膜框架101與標記23之顏色一致,使未設置標記23之金屬色部分顯眼。In addition, the coating layer used for the
再者,於圖5中,於薄膜把持構件21之前端部21a、彎曲部21b及保持部21c之表面設有塗佈層,但只要至少塗佈層(即標記23)設於前端部21a即可,於彎曲部21b及保持部21c之表面可不設置塗佈層。In addition, in FIG. 5, the coating layer is provided on the surface of the
其次,對標記23之形狀進行說明。標記23未設於夾於前端面21d與邊界線21g之前端區域R。邊界線21g為大致沿著前端面21d之延伸設置方向(此處為y方向)之假想線,配置於自前端面21d沿與前端面21d大致正交之方向(此處為x方向)離開既定距離(圖5中之距離l)之位置。由於邊界線21g及前端區域R為假想之線及區域,因此於圖4中以虛線示出。Next, the shape of the
前端面21d與邊界線21g之距離l期望為設於大型玻璃(G10玻璃)用之薄膜框架101之溝槽101d之深度d即3 mm以上。於本實施形態中,距離l為大致3 mm。藉此,將前端部21a插入至溝槽101d時,可使標記23不與薄膜框架101(溝槽101d之邊緣部分)接觸。The distance l between the
若標記23與溝槽101d之邊緣部分接觸,則有標記23被邊緣切削,產生灰塵之虞。由於薄膜100為貼附於遮罩者,需要極力防止灰塵之產生(期望不產生灰塵),因此期望於有接觸溝槽101d之虞之前端區域R不設置標記23。If the
標記23具有沿邊界線21g排列之第1標記23a、第2標記23b及第3標記23c。第1標記23a、第2標記23b及第3標記23c之至少x方向之長度不同。The
於本實施形態中,第1標記23a、第2標記23b及第3標記23c為正方形狀,第1標記23a之各邊之長度為大致1 mm,第2標記23b之各邊之長度為大致1.5 mm,第3標記23c之各邊之長度為大致2 mm。因此,第1標記23a表示距前端面21d之距離為大致4 mm,第2標記23b表示距前端面21d之距離為大致4.5 mm,第3標記23c表示距前端面21d之距離為大致5 mm。如此,由標記23表示距前端面21d之距離。In this embodiment, the
再者,於本實施形態中,第1標記23a、第2標記23b及第3標記23c為正方形狀,但第1標記23a、第2標記23b及第3標記23c之形狀並不限定於正方形狀,可為包含長方形狀之矩形形狀,亦可為半圓形狀或半橢圓形狀。Furthermore, in the present embodiment, the
圖6係示意性表示薄膜把持構件21之前端部21a確實地插入至G10尺寸之玻璃用之薄膜框架101之溝槽101d之情況的圖。FIG. 6 is a diagram schematically showing a state in which the
由於溝槽101d之深度d和前端面21d與邊界線21g之距離l大致相同,因此若前端部21a確實地插入至溝槽101d,則自上方觀察時,溝槽101d之開口部(側面101c)與邊界線21g重疊。因此,自上方觀察時,無法視認邊界線21g,僅可視認第1標記23a、第2標記23b及第3標記23c。Since the depth d of the
圖7係示意性表示前端部21a未確實插入至G10尺寸之玻璃用之薄膜框架101之溝槽101d之情況的圖。FIG. 7 is a diagram schematically showing a state in which the
由於溝槽101d之深度d和前端面21d與邊界線21g之距離l大致相同,因此於前端部21a未確實插入至溝槽101d之情形時,自上方觀察時,可視認邊界線21g。而且,藉由將側面101c與邊界線21g之距離l'、和第1標記23a、第2標記23b及第3標記23c之x方向之長度進行比較,可知溝槽101d之底面與前端面21d之間隙,即進一步使前端部21a移動何種程度而將前端部21a確實地插入至溝槽101d。於圖7所示之例中,由於距離l'與第1標記23a之x方向之長度大致一致,因此可知溝槽101d之底面與前端面21d之間隙有大致1 mm。Since the depth d of the
圖8係示意性表示前端部21a確實地插入至小於G10尺寸之玻璃用之薄膜框架101之溝槽101d之情況的圖。FIG. 8 is a diagram schematically showing a state in which the
由於溝槽101d之深度d小於前端面21d與邊界線21g之距離l,其差為1 mm,因此若前端部21a準確地插入至溝槽101d,則側面101c與邊界線21g之距離l'和第1標記23a之x方向之長度大致一致。Since the depth d of the
圖9係示意性表示前端部21a未確實插入至小於G10尺寸之玻璃用之薄膜框架101之溝槽101d之情況的圖。FIG. 9 is a diagram schematically showing a state in which the
於前端部21a未確實插入至溝槽101d之情形時,側面101c與邊界線21g之距離l'多於第1標記23a之x方向之長度。而且,藉由將側面101c與邊界線21g之距離l'、和第1標記23a、第2標記23b及第3標記23c之x方向之長度進行比較,可知溝槽101d之底面與前端面21d之間隙,即進一步使前端部21a移動何種程度而將前端部21a確實地插入至溝槽101d。於圖9所示之例中,由於距離l'與第2標記23b之x方向之長度大致一致,因此可知溝槽101d之底面與前端面21d之間隙有大致0.5mm。When the
根據本實施形態,藉由視認標記23,可掌握前端部21a之位置,進一步掌握前端部21a是否確實地插入至溝槽101d。於將未設置標記23之前端部插入至溝槽之情形時,並無瞭解前端部是否插入至溝槽深處之方法,但藉由在前端部21a設置標記23,僅視認標記23便可確認能否準確把持薄膜框架101。According to the present embodiment, the position of the
又,根據本實施形態,僅視認標記23便可瞭解溝槽101d之底面與前端面21d之距離。因此,於前端部21a未確實插入至溝槽101d之情形時,藉由移動縱框部11,12或上框部13,14而移動薄膜把持構件21,或者藉由移動驅動構件22而移動薄膜把持構件21,藉此可利用薄膜把持構件21準確把持薄膜框架101。Moreover, according to the present embodiment, the distance between the bottom surface of the
圖19、圖20係示意性表示薄膜100變形之情況之圖。於圖19所示之情形時,薄膜100以薄膜100之各邊之中央部成為凹部之方式變形。於薄膜框架101貼附薄膜之膜102製成薄膜100之構造上,易於產生如圖19所示之變形,凹陷大小為大致1~2 mm。由於溝槽101d之深度為大致2 mm~3 mm,因此有藉由插入至薄膜100之+x側之邊之中央附近的薄膜把持構件21無法準確把持薄膜100之虞。19 and 20 are diagrams schematically showing how the
又,於圖20所示之情形時,薄膜100以薄膜100之+x側之邊與-x側之位置錯位(大致2 mm左右)之方式變形。於該情形時,有藉由插入至薄膜100之+y側之邊之-x側端附近的薄膜把持構件21無法準確把持薄膜100之虞。Moreover, in the case shown in FIG. 20, the
若以藉由薄膜把持構件21無法準確把持薄膜框架101之狀態使框體10向延長方向上側移動,或者使框體10旋動,則有薄膜100自框體10掉落之虞。與此相對,由於使框體10平行移動、旋動移動之前可掌握能否準確把持薄膜框架101,因此可防止薄膜100掉落之事故。If the
又,根據本實施形態,藉由在有可能插入至溝槽101d之前端區域R不設置標記23,於薄膜把持構件21插入至溝槽101d時,可防止薄膜把持構件21或薄膜框架101因切削而產生灰塵。Furthermore, according to the present embodiment, by not providing the
溝槽101d大多藉由切削加工而形成,但有因切削加工而於精加工面產生凹凸之虞。使黏著構件103離開離型層時,由於以前端部21a插入至溝槽101d之狀態使框體10向鉛直方向上側移動,因此面21f抵接於切削加工之精加工面,對面21f持續施加約1kgf之力。由於標記23設於面21f,因此若於前端區域R設置標記23,則很有可能因精加工面之凸部切削標記23而產生灰塵。與此相對,藉由不在前端區域R設置標記23,可防止灰塵之產生。Although the
再者,於本實施形態中,藉由在表面設置塗佈層而將標記23設於前端部21a,但標記之形態並不限定於此。例如,可藉由切削薄膜把持構件21之前端部21a之表面之一部分形成凹部,而將標記設於前端部21a。於該情形時,標記不會自前端部21a消失。而且,為了提高視認性,期望利用油墨等對凹部之內部進行著色。尤其是期望用黑色對凹部之內部著色,使黑色之薄膜框架101與標記之顏色一致。In addition, in this embodiment, the
又,於本實施形態中,G10尺寸之玻璃用之薄膜框架101之溝槽101d之深度d和前端面21d與邊界線21g之距離l大致相同(3 mm),但距離l為G10尺寸之玻璃用之薄膜框架101之溝槽101d之深度d以上(3 mm以上)即可。例如,於前端面21d與邊界線21g之距離為4 mm之情形時,若側面101c與邊界線21g之距離和第1標記23a之x方向之長度大致一致,則可知前端部21a確實地插入至溝槽101d,若側面101c與邊界線21g之距離大於第1標記23a之x方向之長度,則可知前端部21a未確實插入至溝槽101d。Furthermore, in this embodiment, the depth d of the
又,於本實施形態中,前端部21a為使板狀構件彎曲而形成之板狀構件,但前端部21a之形態並不限定於此。例如,前端部21a可為棒狀。又,薄膜把持構件21可彎曲,亦可不彎曲。但是,為了提高視認性,期望標記設於將框體10沿水平方向延伸設置時可自上方或斜上方視認之位置。In addition, in this embodiment, although the front-end|tip
又,於本實施形態中,於作為前端部21a之最寬闊之面且為鉛直方向上側(+z側)之面之面21f設置標記23,但設有標記23之面並不限定於面21f。例如,標記23亦可設於除面21f以外之前端部21a之最寬闊之面即面21e。於標記23設於面21e之情形時,將框體10沿鉛直方向延伸設置時,亦可視認標記23。In addition, in this embodiment, the
又,於本實施形態中,使用具有第1標記23a、第2標記23b及第3標記23c一共3個之標記23,但可使用具有第1標記23a、第2標記23b及第3標記23c中之1個或2個之標記,亦可使用具有除第1標記23a、第2標記23b及第3標記23c以外之標記(例如各邊之長度為大致2.5 mm之標記)之標記。In addition, in the present embodiment, the three
又,於本實施形態中,將表示距前端面21d之距離之標記23設於前端部21a,但標記只要表示薄膜把持構件21之移動方向上之前端部21a之位置即可。例如,於薄膜把持構件21沿x方向移動之情形時,將前端部21a沿x方向分割為鄰接之複數個區域(各區域沿y方向呈帶狀延伸設置),可藉由對每一區域標註顏色不同之記號,作為表示薄膜把持構件21之移動方向上之位置之標記。於該情形時,根據可視認之標誌之顏色,可掌握前端部21a之x方向之位置,進一步掌握前端部21a是否確實地插入至溝槽101d。Moreover, in this embodiment, although the
<標記之變形例1>
於第1實施形態中,藉由在第1標記23a、第2標記23b及第3標記23c以外之部分形成塗佈層而形成標記23,但具有第1標記23a、第2標記23b及第3標記23c之標誌之形態並不限定於此。
<
圖10係表示變形例之標記23A之概略之圖。標記23A係藉由僅於第1標記23d、第2標記23e及第3標記23f之部分設置塗佈層而形成。第1標記23d、第2標記23e及第3標記23f之位置及形狀與第1標記23a、第2標記23b及第3標記23c相同。藉由視認標記23A,可掌握前端部21a是否插入至溝槽101d。FIG. 10 is a diagram showing the outline of the
再者,標記23A可藉由切削前端部21a之表面之一部分形成凹部,對其內部進行著色而形成。In addition, the
<標記之變形例2>
標記之變形例2為標記具有複數個第1標記23a、第2標記23b及第3標記23c之形態。圖11係表示變形例之標記23B之概略之圖。
<
標記23B具有分別各2個第1標記23a、第2標記23b及第3標記23c。第1標記23a、第2標記23b及第3標記23c分別設於沿著薄膜把持構件21之長度方向的中心線21h之兩側。The
圖12係示意性表示自斜上方視認標記23B之情況之圖。若自斜上方觀察標記23B,則有標記23B之一部分被反射板24b遮住而無法視認之虞。例如,如圖12所示,於以傾斜45度左右之角度自近前側俯視標記23B之情形時,無法視認標記23B之中心線21h之內側。FIG. 12 is a diagram schematically showing a state in which the
即便於此種情形時,藉由於中心線21h之兩側分別設置第1標記23a、第2標記23b及第3標記23c,亦可確實地視認第1標記23a、第2標記23b及第3標記23c。Even in such a case, since the
又,藉由將最小之第1標記23a配置於容易視認之薄膜把持構件21之兩端附近,將最大之第3標記23c設於中心線21h附近,可提高視認性。但是,第1標記23a、第2標記23b及第3標記23c之配置並不限定於圖11、圖12所示之形態。Moreover, visibility can be improved by arrange|positioning the
<標記之變形例3>
標記之變形例3為標記不具有第1標記、第2標記及第3標記之形態。圖13係表示變形例之標記23C之概略之圖。
<
標記23C具有與前端面21d大致平行之線23g、23h、23i、23j。線23g設於邊界線21g上,線23i設於+x方向上距邊界線21g大致1 mm之位置。線23h、23j較線23g、23i細且短,分別設於23g、23i之+x側距線23g、23i大致0.5 mm之位置。The
由於線23g、23h、23i、23j配置於薄膜把持構件21之兩端附近,因此即便於薄膜把持構件21上設置反射板24b,亦可確實地視認標記23C。Since the
再者,線23g、23h、23i、23j可為長度及粗細相同之線。又,線23g、23h、23i、23j為於中央相隔開之2根線,亦可為連續之1根線。又,構成標記23C之線之位置及數量亦不限定於此。Furthermore, the
再者,於使用棒狀前端部21a之情形時,由於可設置標記之面積狹窄,因此期望使用僅由線構成之本變形例之標記23C。又,由於標記23C未設於前端區域R,因此可由塗佈層形成標記23C,亦可切削前端部21a之表面之一部分而形成標記23C。Furthermore, in the case of using the rod-shaped
<標記之變形例4>
標記之變形例4為將標記設於前端區域R之形態。圖14係表示變形例之標記23D之概略之圖。
<
標記23D具有3根線23k、23l、23m。線23k設於+x方向上距前端面21d大致1 mm之位置,線23l設於+x方向上距前端面21d大致2 mm之位置,線23m設於+x方向上距前端面21d大致3 mm之位置。The
由於溝槽101d之深度d和前端面21d與線23m之距離大致相同,因此若前端部21a確實地插入至溝槽101d,則自上方觀察時,溝槽101d之開口部(側面101c)與線23m重疊,無法視認線23k、23l、23m。Since the depth d of the
與此相對,於前端部21a未確實插入至溝槽101d之情形時,自上方觀察時,可視認線23k、23l、23m之任一者。而且,藉由能否視認線23k、23l、23m中之任一者,可瞭解溝槽101d之底面與前端面21d之間隙。例如,於可視認線23l、23m之情形時,可知溝槽101d之底面與前端面21d之間隙為2 mm以上。On the other hand, when the
由於線23k、23l、23m亦配置於薄膜把持構件21之兩端附近,因此即便於薄膜把持構件21上設有反射板24b,亦可確實地視認標記23D。Since the
再者,本變形例由於在前端區域R設置標記23D,因此期望設為藉由切削前端部21a之表面之一部分製成凹部而形成之標記,而非藉由對前端部21a之表面進行塗佈而形成之標記。薄膜把持構件21插入至溝槽101d時,可使切削薄膜把持構件21或薄膜框架101而不易產生灰塵。Furthermore, in this modification, since the marking 23D is provided in the front end region R, it is desirable to use a marking formed by cutting a part of the surface of the
<標記之變形例5>
標記之變形例5為將標記亦設於前端區域R之形態。圖15係表示變形例之標記23E之概略之圖。
<Variation 5 of Marking>
Variation 5 of the mark is a form in which the mark is also provided in the front end region R. As shown in FIG. FIG. 15 is a diagram showing the outline of the
標記23E具有抵接於前端面21d且相對於前端面21d傾斜之2根線23n、及刻度線23o、23p、23q。刻度線23o、23p、23q沿與前端面21d大致正交之方向(x方向)設置。刻度線23o設於線23n與邊界線21g(距前端面21d之距離為大致3 mm)交叉之位置。刻度線23p設於線23n與於距前端面21d之距離為大致2 mm之位置繪製之假想線交叉之位置。刻度線23q設於線23n與於距前端面21d之距離為大致1 mm之位置繪製之假想線交叉之位置。The
若前端部21a確實地插入至溝槽101d,則自上方觀察時,線23n與刻度線23o交叉之位置和溝槽101d之開口部(側面101c)重疊。When the
與此相對,於前端部21a未確實插入至溝槽101d之情形時,自上方觀察時,露出線23n與刻度線23o交叉之位置。而且,藉由參照刻度線23o、23p、23q,可瞭解溝槽101d之底面與前端面21d之間隙。例如,自上方觀察時,若側面101c處於線23n與刻度線23p交叉之位置附近,則可知溝槽101d之底面與前端面21d之間隙有大致0.5 mm。On the other hand, when the
再者,由於本變形例亦於前端區域設置標記23E,因此與標記23D同樣地,期望設為藉由切削前端部21a之表面之一部分設置凹部而形成之標記。In addition, since the marking 23E is also provided in the front end region in this modification example, it is desirable to use a marking formed by cutting a part of the surface of the
<第2實施形態>
於第1實施形態中,以目視確認標記23,但確認標記23之方法並不限定於目視。
<Second Embodiment>
In the first embodiment, the
本發明之第2實施形態為利用拍攝部確認標記23之形態。以下,對具有第2實施形態之薄膜把持裝置2之薄膜貼附裝置3進行說明。再者,對與第1實施形態相同之部分標註相同符號,省略詳細之說明。In the second embodiment of the present invention, the
圖16係表示薄膜把持裝置2及薄膜貼附裝置3之概略之立體圖。圖17係表示薄膜把持裝置2及薄膜貼附裝置3之概略之俯視圖。於圖16、圖17中,僅圖示主要部分,省略一部分構成之圖示。又,於圖16中,示出框體10沿鉛直方向延伸設置之情況,於圖17中,示出框體10沿水平方向延伸設置之情況。FIG. 16 is a perspective view showing the outline of the
薄膜把持裝置2設於薄膜貼附裝置3之內部,主要具有框體10、薄膜把持部20、測量部31、拍攝部32,33,34及平台40(圖17中省略圖示)。The
薄膜100藉由搬送裝置110,自薄膜貼附裝置3之開口部3a插入至薄膜貼附裝置3之內部空間3b。插入至內部空間3b之薄膜100載置於平台40。平台40具有未圖示之移動機構,可沿水平方向及鉛直方向移動。薄膜貼附裝置3具有未圖示之雷射照射部,基於由雷射照射部照射之雷射,藉由使平台40移動而進行薄膜100之定位。The
若薄膜100之定位結束,則如圖16所示使沿鉛直方向延伸之框體10旋動,如圖17所示沿水平方向延伸設置後使用薄膜把持構件21把持薄膜100。When the positioning of the
拍攝部32,33,34具有CCD、CMOS等拍攝元件,可連續拍攝對象物之圖像。拍攝部32,33與開口部3a鄰接設置,但期望設於內部空間3b之外側。拍攝部34設於內部空間3b之內部。The
拍攝部32,33,34為拍攝標記23者,將框體10沿水平方向延伸設置時設於較框體10高之位置。由於在將框體10沿水平方向延伸設置時可自上方或斜上方視認之位置設有標記23,因此可利用拍攝部32,33,34拍攝標記23。The photographing
拍攝部32與縱框部11鄰接設置,拍攝部33與縱框部12鄰接設置。又,自鉛直方向上側觀察時,拍攝部32,33設於縱框部11與縱框部12所夾之區域之外側。The
圖17中示出框體10把持G10尺寸之玻璃用薄膜100時之情況,此時縱框部11與縱框部12之間隔最寬闊。拍攝部32設於縱框部11位於最-x側時之縱框部11的x方向之位置或較其更靠-x側,拍攝部33設於縱框部12位於最+x側時之縱框部12的x方向之位置或較其更靠+x側。FIG. 17 shows the case where the
圖18係表示拍攝部32拍攝設於縱框部11之薄膜把持構件21之情況的圖,(A)為俯視圖,(B)為側視圖。於圖18中,用粗箭頭示意性表示拍攝部32拍攝標記23時之光軸方向。由於拍攝部32設於較縱框部11之x方向之位置靠+x側,因此拍攝部32可確實地拍攝標記23。若假設拍攝部32設於較縱框部11之x方向之位置靠-x側,則如圖18中虛線箭頭所示,有被上表面101a與側面101c之角所遮擋而無法拍攝標記23之虞。與此相對,自鉛直方向上側觀察時,藉由將拍攝部32,33設於縱框部11與縱框部12所夾之區域之外側,拍攝部32,33可分別確實地拍攝設於縱框部11,12之薄膜把持構件21之標記23。18 : is a figure which shows the state where the
返回圖17之說明。拍攝部34與框15之下端部15a鄰接設置。又,自鉛直方向上側觀察時,拍攝部34設於下端部15a之外側(-y側)。因此,拍攝部34可確實地拍攝設於下端部15a之薄膜把持構件21之標記23。Return to the description of FIG. 17 . The
由拍攝部32,33,34拍攝之圖像顯示於設於內部空間3b之外部之監視器(省略圖示)。拍攝部32,33,34與監視器經由未圖示之網路連接。The images captured by the
拍攝部32,33,34可構成為可調整光軸之方向。藉此,可進行每一標記23之拍攝。再者,由於拍攝部34設於內部空間3b之內部,因此為了使灰塵不落進內部空間3b,期望於拍攝部34周圍設置覆蓋物。The photographing
根據本實施形態,由於可利用由拍攝部32,33,34拍攝之圖像確認標記23,因此於內部空間3b中作業人員無需目視標記23。因此,可防止灰塵之產生,並且掌握前端部21a是否確實地插入至溝槽101d。According to this embodiment, since the
又,根據本實施形態,由於使標記23為黑色,因此拍攝部32,33,34所拍攝之圖像中,使前端部21a之未設置標記23之金屬色部分顯眼,容易確認標記23。又,由於使標記23為黑色,因此可防止拍攝部32,33,34所拍攝之圖像產生眩光。In addition, according to the present embodiment, since the
又,標記23具有正方形狀之第1標記23a、第2標記23b及第3標記23c,但拍攝部32,33,34所拍攝之圖像中,第1標記23a、第2標記23b及第3標記23c為長方形狀。例如,隨著遠離拍攝部32,所拍攝之圖像中之標記23之第1標記23a、第2標記23b及第3標記23c之深度方向之長度變長。而且,根據圖像中之第1標記23a、第2標記23b及第3標記23c之深度方向之長度,可掌握所拍攝之標記23之大致位置。In addition, although the
再者,設於薄膜把持構件21之標記並不限定於標記23,可將標記23A~23E之任一者設於薄膜把持構件21。於拍攝最靠近拍攝部32,33,34設置之薄膜把持構件21之情形時,自拍攝部32,33,34俯視薄膜把持構件21之角度為大致45度。於使用如圖12所示之標記23B之情形時,即便由反射板24b遮住標記23B之一部分,亦可由拍攝部32,33,34確實地拍攝第1標記23a、第2標記23b及第3標記23c。In addition, the mark provided on the
以上,參照圖式對該發明之實施形態進行了詳細說明,但具體之構成並不限定於該實施形態,亦包含不脫離該發明主旨之範圍之設計變更等。業者可對實施形態之各要素適當進行變更、追加、轉換等。As mentioned above, although embodiment of this invention was described in detail with reference to drawings, a specific structure is not limited to this embodiment, and design changes etc. are included in the range which does not deviate from the summary of this invention. The manufacturer can appropriately modify, add, and convert each element of the embodiment.
又,於本發明中,「大致」為不僅包含嚴格相同之情形,還包含不失去相同性之程度之誤差或變形的概念。例如,所謂大致平行,為不限定於嚴格平行之情形,還包含例如數度左右之誤差的概念。又,例如於僅表現為平行、正交等之情形時,不僅包含嚴格平行、正交等情形,還包含大致平行、大致正交等情形。又,於本發明中,「附近」意指包含基準位置附近之某一範圍(可任意決定)之區域。例如,於A附近之情形時,為表示A附近之某一範圍之區域,且可包含或不包含A的概念。In addition, in the present invention, "substantially" is a concept that includes not only the exact same situation, but also an error or deformation to the extent that the sameness is not lost. For example, the term "substantially parallel" is not limited to being strictly parallel, and includes, for example, a concept of an error of about several degrees. Moreover, for example, when it expresses only the case of being parallel, orthogonal, etc., not only the case of strict parallel, orthogonal, etc., but also the case of substantially parallel, substantially orthogonal, etc. are included. In addition, in the present invention, "nearby" means an area including a certain range (which can be arbitrarily determined) in the vicinity of the reference position. For example, in the case of the vicinity of A, it is an area representing a certain range in the vicinity of A, and the concept of A may or may not be included.
1, 2:薄膜把持裝置
3:薄膜貼附裝置
3a:開口部
3b:內部空間
10:框體
11, 12:縱框部
13, 14:上框部
15:框
15a:下端部
15b:上端部
20:薄膜把持部
21:薄膜把持構件
21a:前端部
21b:彎曲部
21c:保持部
21d:前端面
21e, 21f:面
21g:邊界線
21h:中心線
22:驅動構件
22a:桿
22b:致動器
23, 23A, 23B, 23C, 23D, 23E:標記
23a, 23d:第1標記
23b, 23e:第2標記
23c, 23f:第3標記
23g, 23h, 23i, 23j, 23k, 23l, 23m, 23n:線
23o, 23p, 23q:刻度線
24:測量部
24a:超音波感測器
24b:反射板
24c:前端部
31:測量部
32, 33, 34:拍攝部
40:平台
100:薄膜
101:薄膜框架
101a:上表面
101b:下表面
101c:側面
101d:溝槽
101e:中空部
102:薄膜之膜
103:黏著構件
110:搬送裝置
1, 2: Film holding device
3:
[圖1]係表示第1實施形態之薄膜把持裝置1之概略之前視圖。
[圖2]係表示薄膜100之概略之立體圖。
[圖3]係圖2之A-A線段剖視圖。
[圖4]係表示薄膜把持部20之概略之圖。
[圖5]係表示標記23之一例之圖。
[圖6]係示意性表示前端部21a確實地插入至G10尺寸之玻璃用薄膜框架101之溝槽101d之情況的圖。
[圖7]係示意性表示前端部21a未確實插入至G10尺寸之玻璃用薄膜框架101之溝槽101d之情況的圖。
[圖8]係示意性表示前端部21a確實地插入至小於G10尺寸之玻璃用薄膜框架101之溝槽101d之情況的圖。
[圖9]係示意性表示前端部21a未確實插入至小於G10尺寸之玻璃用薄膜框架101之溝槽101d之情況的圖。
[圖10]係表示變形例之標記23A之概略之圖。
[圖11]係表示變形例之標記23B之概略之圖。
[圖12]係示意性表示自斜上方視認標記23B之情況之圖。
[圖13]係表示變形例之標記23C之概略之圖。
[圖14]係表示變形例之標記23D之概略之圖。
[圖15]係表示變形例之標記23E之概略之圖。
[圖16]係表示薄膜把持裝置2及薄膜貼附裝置3之概略之立體圖。
[圖17]係表示薄膜把持裝置2及薄膜貼附裝置3之概略之俯視圖。
[圖18]係表示拍攝部32拍攝設於縱框部11之薄膜把持構件21之情況的圖,(A)為俯視圖,(B)為側視圖。
[圖19]係示意性表示薄膜100變形之情況之圖。
[圖20]係示意性表示薄膜100變形之情況之圖。
1] It is a schematic front view which shows the
1:薄膜把持裝置 1: Film holding device
10:框體 10: Frame
11,12:縱框部 11,12: Vertical frame
13,14:上框部 13,14: Upper frame
15:框 15: Box
15a:下端部 15a: lower end
15b:上端部 15b: upper end
20:薄膜把持部 20: Film holding part
21:薄膜把持構件 21: Film holding member
31:測量部 31: Measurement Department
100:薄膜 100: Film
101:薄膜框架 101: Film Frame
101a:上表面 101a: Upper surface
101b:下表面 101b: Lower surface
101c:側面 101c: Side
102:薄膜之膜 102: Membrane of Thin Films
Claims (12)
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JPJP2020-215543 | 2020-12-24 | ||
JP2020215543A JP2022101135A (en) | 2020-12-24 | 2020-12-24 | Pellicle frame gripping device |
Publications (1)
Publication Number | Publication Date |
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TW202226407A true TW202226407A (en) | 2022-07-01 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW110133060A TW202226407A (en) | 2020-12-24 | 2021-09-06 | Pellicle frame grasping device |
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JP (1) | JP2022101135A (en) |
KR (1) | KR20230121724A (en) |
CN (1) | CN116529861A (en) |
TW (1) | TW202226407A (en) |
WO (1) | WO2022137874A1 (en) |
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JP4677632B2 (en) * | 2005-07-08 | 2011-04-27 | レーザーテック株式会社 | Pellicle liner or pellicle peeling apparatus, peeling method, and pattern substrate manufacturing method |
JP2011158585A (en) * | 2010-01-29 | 2011-08-18 | Shin-Etsu Chemical Co Ltd | Pellicle and method for manufacturing the same |
JP2012103638A (en) * | 2010-11-15 | 2012-05-31 | Shin Etsu Chem Co Ltd | Pellicle handling tool |
WO2016133054A1 (en) * | 2015-02-19 | 2016-08-25 | 株式会社ブイ・テクノロジー | Pellicle frame gripping device and pellicle frame gripping method |
JP6921412B2 (en) * | 2018-01-25 | 2021-08-18 | 株式会社ブイ・テクノロジー | Pellicle frame gripping device and pellicle frame gripping method |
-
2020
- 2020-12-24 JP JP2020215543A patent/JP2022101135A/en active Pending
-
2021
- 2021-09-06 TW TW110133060A patent/TW202226407A/en unknown
- 2021-11-11 WO PCT/JP2021/041615 patent/WO2022137874A1/en active Application Filing
- 2021-11-11 KR KR1020237016524A patent/KR20230121724A/en unknown
- 2021-11-11 CN CN202180077475.9A patent/CN116529861A/en active Pending
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Publication number | Publication date |
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WO2022137874A1 (en) | 2022-06-30 |
CN116529861A (en) | 2023-08-01 |
KR20230121724A (en) | 2023-08-21 |
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