TW202210645A - Vapor deposition mask intermediate, vapor deposition mask, and method for manufacturing vapor deposition mask - Google Patents

Abstract

Provided is a vapor deposition mask intermediate formed from a metal sheet, said vapor deposition mask intermediate comprising: a belt-like part that includes a border having first and second long sides and first and second short sides and a mask part provided with a plurality of mask holes; a frame-like part that surrounds the belt-like part; and a connecting part that is positioned between the belt-like part and the frame-like part and that connects at least the first short side of the belt-like part to the frame-like part. The belt-like part is provided with a fragile line, a line segment, and a cutout region. Both ends of the fragile line are connected to the first short side, and the fragile line has a line shape having a shape protruding from the first short side toward the second short side. The line segment is the part of the first short side that is sandwiched between both ends of the fragile line. The cutout region is surrounded by the fragile line and includes the line segment and the fragile line. The cutout region of the vapor deposition mask intermediate is provided with a through hole that is connected to part of the border surrounding the cutout region.

Description

Evaporation mask intermediate, evaporation mask and manufacturing method of evaporation mask

The present invention relates to an evaporation mask intermediate body, an evaporation mask and a manufacturing method of the evaporation mask.

In order to form a display element included in an organic EL device, vacuum deposition is used. In vacuum evaporation, an evaporation mask is used to form a layer having a predetermined shape required for a display element. The vapor deposition mask has a belt shape formed of a metal sheet. The vapor deposition mask has a pair of short sides. Before the vapor deposition mask is used, each short side has a notch, and the notch has a shape recessed toward the other short side. When a vapor deposition mask is used, the vapor deposition mask is attached to a mask frame in a state where each short side is stretched in a direction away from a short side different from the short side (for example, see Patent Document 1). [Prior Art Literature] [Patent Literature]

[Patent Document 1] International Publication No. 2020/050398

[The problem to be solved by the invention]

However, vapor deposition masks are formed by wet etching a metal sheet. At this time, in the metal sheet for manufacturing the vapor deposition mask, a through hole is formed in a portion corresponding to the notch of the vapor deposition mask. The area of the through hole corresponding to the notch is larger than that of the other through holes formed on the vapor deposition mask. Therefore, since the portion of the metal sheet corresponding to the notch is in contact with more etching solution, the etching solution is likely to be surrounded between the metal sheet and the resist mask formed on the sheet, or the etching process is easily affected. The flow rate of the etching solution is about. As a result, in the portion corresponding to the notch of the vapor deposition mask, the accuracy of the patterned shape tends to decrease.

An object of the present invention is to provide a vapor deposition mask intermediate body, a vapor deposition mask, and a manufacturing method of the vapor deposition mask that can improve the accuracy of the shape of pattern processing. [means to solve the problem]

In one aspect of the present invention, an evaporation mask intermediate is provided. The vapor deposition mask intermediate system is formed from sheet metal. It has: a belt-shaped part, which includes edges with first and second long sides and first and second short sides, and a mask part with a plurality of mask holes; a frame-shaped part, which surrounds the belt-shaped part and a connecting portion, which is located between the strip-shaped portion and the frame-shaped portion, and connects at least the short sides of the strip-shaped portion to the frame-shaped portion. The band-shaped portion includes a line of weakness, a line segment, and a cut-out region. Both ends of the line of weakness are connected to the first short side, and the line of weakness has a protruding shape from the first short side toward the second short side. The line segment is sandwiched between the two ends of the line of weakness in the first short side. The cutout area is surrounded by the line segment and the line of weakness, and includes the line segment and the line of weakness. The vapor deposition mask intermediate system has a through hole in the cutout area, and the through hole is connected to a part of the edge surrounding the cutout area.

In another aspect of the present invention, an evaporation mask is provided. The vapor deposition mask has a strip shape. The vapor deposition mask includes an edge having a pair of long sides and a pair of short sides, and a mask portion having a plurality of mask holes. Each of the short sides includes a notch, and the notch has a U-shape recessed toward the other short side. The said notch has a cutting mark in at least a part of the bottom part which is the bent part of the said U-shape.

In another aspect of the present invention, a method for manufacturing an evaporation mask is provided. The manufacturing method of a vapor deposition mask includes: forming a vapor deposition mask intermediate body from a metal sheet, wherein the vapor deposition mask intermediate body has a belt-shaped part, a frame-shaped part, and a connecting part, and the belt-shaped part includes a Edges of the first and second long sides and the first and second short sides, and a shielding portion having a plurality of shielding holes, the frame-shaped portion surrounds the belt-shaped portion, and the connecting portion is located on the belt-shaped portion Between the frame-shaped part and the strip-shaped part, at least the short side of the strip-shaped part is connected to the frame-shaped part; and a vapor deposition mask is formed from the strip-shaped part. The band-shaped portion includes a line of weakness, a line segment, and a cut-out region. Both ends of the fragile portion are connected to the first short side, and have a protruding shape from the first short side toward the second short side. The line segment is sandwiched between the two ends of the line of weakness in the first short side. The cutout area is surrounded by the line segment and the line of weakness, and includes the line segment and the line of weakness. The vapor deposition mask intermediate system has a through hole in the cutout area, and the through hole is connected to a part of the edge surrounding the cutout area.

[Form for carrying out the invention]

1 to 6 , one embodiment of a vapor deposition mask intermediate body, a vapor deposition mask, and a method for manufacturing the vapor deposition mask will be described. Hereinafter, the vapor deposition mask intermediate body, the mask device, and the manufacturing method of the vapor deposition mask will be sequentially described.

[Vapor deposition mask intermediate] 1 to 3 , the vapor deposition mask intermediate body will be described. The vapor deposition mask intermediate body 10 shown in FIG. 1 is formed of a metal sheet. The metal sheet is formed of, for example, an iron-nickel-based alloy or an iron-nickel-cobalt-based alloy. The iron-nickel-based alloy is, for example, an iron-nickel-based alloy containing 30 mass % or more of nickel. Among the iron-nickel alloys, an alloy mainly composed of an alloy of 36% by mass of nickel and the remaining amount of iron, that is, Hengfan steel, is preferred. In the case where an alloy of 36 mass % of nickel and the remaining amount of iron is the main component of the metal plate, the remaining portion of the metal plate may contain additives such as chromium, manganese, carbon, and cobalt.

In addition, the thermal expansion coefficient of the iron-nickel-cobalt-based alloy is smaller than that of the iron-nickel-based alloy. The iron-nickel-cobalt-based alloy is, for example, an iron-nickel-cobalt-based alloy containing 30 mass % or more of nickel and 3 mass % or more of cobalt. Among the iron-nickel-cobalt-based alloys, an alloy mainly composed of an alloy of 32 mass % nickel, 4 mass % or more and 5 mass % or less cobalt, and the remaining amount of iron, that is, super constant steel is preferable. When an alloy of 32 mass % nickel, 4 mass % or more and 5 mass % or less cobalt, and the remaining amount of iron are the main components of the metal plate, the remainder of the metal plate may contain, for example, chromium, manganese, and carbon, etc. of additives.

The vapor deposition mask intermediate body 10 includes a belt-shaped portion 11 , a frame-shaped portion 12 , and a connection portion 13 . The strip portion 11 includes an edge 11e and a shield portion 11a. The edge 11e has a pair of long sides 11e1 and a pair of short sides 11e2. That is, the edge 11e has first and second long sides 11e1 and first and second short sides 11e2. The direction in which the long side 11e1 extends is the longitudinal direction DL, and the direction in which the short side 11e2 extends is the width direction DW. The longitudinal direction DL and the width direction DW are mutually orthogonal directions. The mask portion 11a includes a plurality of mask holes 11h. Each mask hole 11h is a hole for forming a predetermined pattern on the film formation object by passing the vapor deposition material through each mask hole 11h. The frame-like portion 12 surrounds the belt-like portion 11 . The connection part 13 is located between the belt-shaped part 11 and the frame-shaped part 12 , and connects at least the short side 11 e2 of the belt-shaped part 11 to the frame-shaped part 12 . The connection part 13 connects a part of the long side 11e1 to the frame-shaped part 12 in addition to the short side 11e2. The vapor deposition mask intermediate body 10 has a front surface 10F and a back surface 10R, and the back surface 10R is a surface on the opposite side to the front surface 10F.

The belt-shaped portion 11 includes a plurality of shield portions 11a and a peripheral portion 11b. The plurality of mask portions 11a are arranged at intervals along the longitudinal direction DL. Each shield portion 11a has, for example, a rectangular shape. Each mask portion 11a has a plurality of mask holes 11h. In each mask portion 11a, a plurality of mask holes 11h are arranged according to a predetermined rule. The peripheral portion 11b has a shape surrounding each of the shield portions 11a. Since the band-shaped portion 11 of the present embodiment has a plurality of mask portions 11a arranged in the longitudinal direction DL, the peripheral portion 11b has a stepped shape. The peripheral portion 11b does not have the mask hole 11h.

In the vapor deposition mask intermediate body 10 , the peripheral portion 11 b of the band-shaped portion 11 and the frame-shaped portion 12 have the first plate thickness. The first plate thickness is, for example, 15 μm or more and 30 μm or less. Furthermore, the shield portion 11a of the strip portion 11 may have a first plate thickness, or may have a second plate thickness thinner than the first plate thickness. Furthermore, when the mask portion 11a has the second thickness, among the plurality of mask holes 11h formed in the mask portion 11a, the mask holes 11h adjacent to each other are connected to each other. Thereby, the shield part 11a has a 2nd plate thickness.

In the example shown in FIG. 1, two strip-shaped parts 11 are arranged at intervals in the width direction DW. In addition, in the vapor deposition mask intermediate body 10, only one strip portion 11 may be arranged in the width direction DW, or three or more may be arranged. In the longitudinal direction DL, the two strip-shaped portions 11 arranged in the width direction DW are arranged at intervals.

The frame-shaped portion 12 has a shape surrounding the belt-shaped portion 11 when viewed from a viewpoint opposite to the surface 10F of the vapor deposition mask intermediate body 10 . The frame-shaped portion 12 has a shape that surrounds each of the belt-shaped portions 11 individually.

The connection portion 13 and the slit 10S are located on the boundary between the belt-shaped portion 11 and the frame-shaped portion 12 . The slit 10S penetrates the vapor deposition mask intermediate body 10 in the thickness direction of the vapor deposition mask intermediate body 10 . The slit 10S is located in the width direction DW with respect to the mask portion 11 a in the boundary between the strip portion 11 and the frame portion 12 . The plurality of mask portions 11a are sandwiched by a pair of slits 10S in the width direction DW.

The connection part 13 is located in the whole part except the part where the slit 10S exists in the boundary of the belt-shaped part 11 and the frame-shaped part 12. The connecting portion 13 may be, for example, a half-etched line. The connecting portion 13 may be formed by a plurality of through holes arranged at intervals along the boundary between the band-shaped portion 11 and the frame-shaped portion 12, and a part of the metal sheet located between the adjacent through holes. Alternatively, the connecting portion 13 may be formed by a plurality of half-etched portions arranged at intervals along the boundary between the belt-like portion 11 and the frame-like portion 12, and a part of the metal sheet located between the adjacent half-etched portions. form.

When the connecting portion 13 includes a plurality of half-etched portions or a plurality of through holes, for example, the length of the half-etched portions or the through-holes may be 90 μm or more and 180 μm or less, and the width may be 60 μm or more and 90 μm or less, and they are arranged. The equal pitch may be 180 μm or more and 270 μm or less. In addition, the length of the half-etched portion or the through hole is the size along the direction in which the connecting portion 13 extends, and the width is the size along the direction orthogonal to the direction in which the connecting portion 13 extends. Furthermore, the depth of the half-etched portion may be, for example, 50% or more and 80% or less of the first plate thickness.

Alternatively, the connection portion 13 may be formed by a half-etched line and a plurality of through holes arranged at intervals on the half-etched line. In this case, the width of the half-etched line may be, for example, 100 μm or more and 150 μm or less. The depth of the half-etched line may be, for example, 50% or more and 80% or less of the first plate thickness. The diameter of the through hole on the half-etched line may be, for example, 50% or more and 80% or less of the width of the half-etched line. The pitch at which the through holes are arranged on the half-etched line may be, for example, 100 μm or more and 500 μm or less.

Furthermore, the half-etched line and the half-etched portion are portions that etch a part of the metal sheet in the thickness direction. The connection portion 13 is a portion whose mechanical strength is lower than that of the belt-shaped portion 11 and the frame-shaped portion 12 .

FIG. 2 shows a cross-sectional structure of the mask portion 11a along a plane that is orthogonal to the surface 10F and extends in the width direction DW. As shown in FIG. 2 , each of the mask holes 11h formed in the mask portion 11a has a large hole 11hL and a small hole 11hS. The large hole 11hL is opened on the surface 10F of the vapor deposition mask intermediate body 10 . On the other hand, the small hole 11hS is opened on the back surface 10R of the vapor deposition mask intermediate body 10 . From the viewpoint opposite to the surface 10F, the openings of the large holes 11hL located on the surface 10F are larger than the openings of the small holes 11hS located on the rear surface 10R. In the middle of the vapor deposition mask intermediate body 10 in the thickness direction, a large hole 11hL is connected to a small hole 11hS.

The plurality of mask holes 11h included in the mask portion 11a are formed by wet etching of the aforementioned sheet. In the wet etching of the sheet, first, a plurality of small holes 11hS are formed by etching the sheet from the back surface of the sheet toward the surface. The etching step for forming the small holes 11hS is the first etching step. Next, the large holes 11hL connected to the small holes 11hS one by one are formed by etching from the surface of the sheet toward the back of the sheet. The etching step for forming the large hole 11hL is the second etching step.

Viewed from a viewpoint opposite to the surface 10F of the vapor deposition mask intermediate body 10, on each mask portion 11a, a display device having a resolution of 300 ppi or more and 1000 ppi or less is formed on each mask portion 11a with a predetermined size and arrangement. A plurality of mask holes 11h.

FIG. 3 shows a portion of the strip portion 11 including one short side 11e2 and a portion of the frame portion 12 located around the short side 11e2. Furthermore, in the belt portion 11 , the positions of the portion including one short side 11e2 and the portion including the other short side 11e2 in the longitudinal direction DL are different from each other, and on the other hand, from the plane extending from the belt portion 11 The configuration is the same in the opposite top view point of view.

As shown in FIG. 3 , the band-shaped portion 11 includes a linear line of weakness 11RC1 and a cut-out region 11RC. Both ends of the fragile line 11RC1 are connected to the short side 11e2, and the fragile line 11RC1 has a protruding shape from the short side 11e2 toward the other short side 11e2. That is, the line of weakness 11RC1 has a protruding shape from the first short side 11e2 toward the second short side 11e2. The cutout region 11RC is surrounded by the line segment 11e21 and the line of weakness 11RC1 in the short side 11e2 sandwiched by both ends of the line of weakness 11RC1, and includes the line segment 11e21 and the line of weakness 11RC1. The vapor deposition mask intermediate body 10 includes through holes 11RC2. The through hole 11RC2 is connected to a part of the edge surrounding the cutout region 11RC within the cutout region 11RC. In this embodiment, since both the line segment 11e21 and the fragile line 11RC1 are separated by the through hole 11RC2, the cutout region 11RC is surrounded by the edge of the open loop formed by the line segment 11e21 and the fragile line 11RC1.

When a metal sheet is patterned by wet etching to manufacture the vapor deposition mask intermediate 10, since the through-hole 11RC2 is formed only in a part of the cutout region 11RC, it is different from that of the entire cutout region by wet etching. Compared with the case of 11RC penetration, the area exposed to the etching solution in the metal sheet is small. Therefore, it is difficult for the etching solution to form a circle between the resist mask and the sheet, and the shape of the vapor deposition mask intermediate 10 formed by wet etching is difficult to be affected by the flow rate of the etching solution used for wet etching. . Therefore, it is possible to suppress tooth marks caused by wet etching as in the case where the entire cutout region 11RC is removed by wet etching. As a result, the accuracy of the patterned shape can be improved.

Furthermore, as described above, since the cutout region 11RC is surrounded by a part of the connecting portion 13 and the fragile line 11RC1, by cutting the connecting portion 13 and the fragile line 11RC1, it can be formed from the short side 11e2 relative to each short side. 11e2 is a recessed notch toward the other short side 11e2.

The first dummy line L1 and the second dummy line L2 can also be set in the vapor deposition mask intermediate body 10 . The first imaginary line L1 is a line extending along the central portion of each short side 11e2. The center portion of each short side 11e2 is connected to a line segment 11e21 including the center of the short side 11e2 in the width direction DW. The center part of the short side 11e2 is, for example, the center after dividing the short side 11e2 into three in the width direction DW. The second dummy line L2 is connected to both ends of the first dummy line L1, and has a protruding line from the first dummy line L1 toward another first dummy line L1. In this embodiment, the second virtual line L2 has a U-shape from one short side 11e2 to the other short side 11e2. Furthermore, the second dummy line L2 may have a substantially V-shape, for example.

The connection portion 13 includes the short-side fragile line 13a. The strip portion 11 includes a cutout region 11RC and the aforementioned line of weakness 11RC1. The line of weakness 11RC1 is located along at least a portion of the second virtual line L2. The cutout region 11RC is a region surrounded by the first imaginary line L1 and the second imaginary line L2. The vapor deposition mask intermediate body 10 includes through holes 11RC2. The through hole 11RC2 is connected to a part of the edge surrounding the cutout region 11RC within the cutout region 11RC. When the cutout region 11RC is defined by the first dummy line L1 and the second dummy line L2, the first dummy line L1 and the second dummy line L2 form an edge having a closed loop surrounding the cutout region 11RC.

The through hole 11RC2 has a shape extending from the first end portion RC21 toward the second end portion RC22. The first end portion RC21 is connected to the line segment 11e21. The second end RC22 is connected to the frangible line 11RC1.

Since the through hole 11RC2 is connected to the line segment 11e21 and the line of weakness 11RC1, the through hole 11RC2 can be used as a starter to cut both the line of weakness 13a and the line of weakness 11RC1 along the short side of the line segment 11e21 in the connecting portion 13. Therefore, compared with the case where the through-hole 11RC2 is not connected to any one of the line segment 11e21 and the fragile line 11RC1, the connecting portion 13 and the fragile line 11RC1 are easily cut off.

Furthermore, the short-side fragile line 13a is located on a portion of the first dummy line L1 other than the portion to which the first end portion RC21 is connected. That is, the short-side fragile line 13a is blocked by the first end portion RC21 of the through hole 11RC2. The frangible line 11RC1 is located on a portion of the second dummy line L2 other than the portion to which the second end portion RC22 is connected. That is, the fragile line 11RC1 is blocked by the second end portion RC22 of the through hole 11RC2.

The frangible line 11RC1 has a substantially U-shape. In this embodiment, the fragile line 11RC1 is cut off by the through hole 11RC2, and has a shape that lacks a part of the U-shaped bent portion. The through-hole 11RC2 has a strip shape extending along the long side 11e1. In other words, the through hole 11RC2 extends in the longitudinal direction DL. Therefore, the second end portion RC22 of the through hole 11RC2 is connected to the curved portion of the fragile line 11RC1, in other words, the curved portion of the second dummy line L2. In this way, since the through hole 11RC2 extends along the long side 11e1, the bent portion of the fragile line 11RC1 can be cut off by the through hole 11RC2. Therefore, compared with the case where the through-hole 11RC2 extends along the short side 11e2, the frangible line 11RC1 can be cut more easily.

The first end portion RC21 bisects the line segment 11e21 in the width direction DW. In addition, the second end portion RC22 bisects the length of the fragile line 11RC1. That is, the first end portion RC21 is connected to the center of the first dummy line L1 in the width direction DW in which the short side 11e2 extends. The second end portion RC22 is connected to the bottom of the U shape in the second dummy line L2. The bottom is a U-shaped curved part. Thereby, since the cutout region 11RC is divided into two parts by the through hole 11RC2, compared with the case where the cutout region 11RC is divided into two parts by the through hole 11RC2 with a deviation, it is not easy to remove the cutout region 11RC. Variation occurs in the load required for each part formed by dividing into two parts. Therefore, the cutout region 11RC is easily removed.

In other words, the through hole 11RC2 has a strip shape connecting the position closest to the other short side 11e2 in the cutout region 11RC and the position opposite to the short side 11e2 in the frame-shaped portion 12 . That is, the through hole 11RC2 has a band shape including the position closest to the second short side 11e2 in the cutout region 11RC and the position of the frame-shaped portion 12 facing the first short side 11e2. Since the through-hole 11RC2 communicates the fragile line 11RC1 and the connecting portion 13 , both the fragile line 11RC1 and the connecting portion 13 can be cut off by the through-hole 11RC2 starting from the through-hole 11RC2 . Therefore, compared with the case where the through-hole 11RC2 does not communicate with the fragile line 11RC1 and the connecting portion 13, the fragile line 11RC1 and the connecting portion 13 are more easily cut.

In the width direction DW, the sum of the length of the first end portion RC21 and the length of the second end portion RC22 is the first length. The sum of the length of the line segment 11e21 and the length of the fragile line 11RC1 is the second length. The second length is greater than the first length.

Furthermore, the width of the through hole 11RC2 along the width direction DW may be, for example, 1 mm or more and 5 mm or less, and the length of the through hole 11RC2 along the longitudinal direction DL may be, for example, 20 mm or more and 4050 mm or less. In addition, the length of the line segment 11e21 may be, for example, 15 mm or more and 40 mm or less.

The vapor deposition mask intermediate 10 is formed on a metal sheet conveyed by a roll-to-roll device. In the vapor deposition mask intermediate body 10 , since the second length is longer than the first length, compared with the case where the second length is shorter than the first length, the cutout region 11RC after the through hole 11RC2 is formed can be formed by the frame portion 12 . Stable support. Therefore, when the vapor deposition mask intermediate body 10 is conveyed, the cutout region 11RC can be prevented from being cut from the frame-shaped portion 12 .

Since the short-side fragile line 13 a is a part of the connection portion 13 , as described above, the short-side fragile line 13 a is a portion lower in mechanical strength than the belt-shaped portion 11 and the frame-shaped portion 12 . As described above, the short-side fragile line 13a may be, for example, a half-etched line. The short-side frangible line 13a can be formed by a plurality of through holes arranged at intervals along the boundary between the band-shaped portion 11 and the frame-shaped portion 12, and a part of the metal sheet located between the adjacent through-holes. Alternatively, the short-side frangible line 13a may be formed by having a plurality of half-etched portions arranged at intervals along the boundary between the strip portion 11 and the frame-like portion 12, and a metal sheet located between the adjacent half-etched portions. part of it is formed. Alternatively, the short-side fragile line 13a may be formed by a half-etched line and a plurality of through holes arranged at intervals on the half-etched line. That is, the short-side fragile line 13a may be formed by alternately arranging half-etched portions and through holes.

The weak line 11RC1 is also a portion whose mechanical strength is lower than that of the belt-shaped portion 11 and the frame-shaped portion 12 . Like the short-side fragile line 13a, the fragile line 11RC1 may be, for example, a half-etched line. The line of weakness 11RC1 may also be formed by a plurality of through holes arranged at intervals along the boundary between the band-shaped portion 11 and the frame-shaped portion 12, and a part of the metal sheet between the adjacent through holes. Alternatively, the line of weakness 11RC1 may be formed by a plurality of half-etched parts arranged at intervals along the boundary between the strip-shaped part 11 and the frame-shaped part 12, and a part of the metal sheet located between the adjacent half-etched parts. form. Alternatively, the fragile line 11RC1 may be formed by a half-etched line and a plurality of through holes arranged at intervals on the half-etched line. That is, the fragile line 11RC1 may be formed by alternately arranging half-etched portions and through holes.

When the line of weakness 11RC1 has a plurality of half-etched portions or a plurality of through holes, for example, the length of the half-etched portions or the through-holes may be 90 μm or more and 180 μm or less, and the width may be 60 μm or more and 90 μm or less, and the like may be arranged. The pitch may be 180 μm or more and 270 μm or less. In addition, the length of the half-etched portion or the through hole is the size along the direction in which the fragile line 11RC1 extends, and the width is the size in the direction orthogonal to the direction in which the fragile line 11RC1 extends. Furthermore, the depth of the half-etched portion may be, for example, 50% or more and 80% or less of the first plate thickness.

Alternatively, the fragile line 11RC1 can also be formed by a half-etched line and a plurality of through holes arranged at intervals on the half-etched line. That is, the fragile line 11RC1 may be formed by alternately arranging half-etched portions and through holes. In this case, the width of the half-etched line may be, for example, 100 μm or more and 150 μm or less. The depth of the half-etched line may be, for example, 50% or more and 80% or less of the first plate thickness. The diameter of the through hole on the half-etched line may be, for example, 50% or more and 80% or less of the width of the half-etched line. The pitch at which the through holes are arranged on the half-etched line may be, for example, 100 μm or more and 500 μm or less.

Furthermore, the structure of the short-side weak line 13a and the structure of the weak line 11RC1 may be the same or different from each other. For example, the short-side fragile line 13a can be formed by a half-etched line and a plurality of through holes arranged at intervals on the half-etched line. The fragile line 11RC1 can be formed by, for example, a plurality of through holes and a part of the metal sheet located between the adjacent through holes. Alternatively, the line of weakness 11RC1 may be formed by a plurality of half-etched portions and a portion of the metal sheet located between adjacent half-etched portions.

The through hole 11RC2 is formed by the first etching step and the second etching step. In addition, the through hole 11RC2 may be formed by any one of the first etching step and the second etching step.

In the case where the connecting portion 13 including the short-side weak line 13a has a half-etched portion or a half-etched line, the connecting portion 13 can be formed by the first etching step. Furthermore, the connecting portion 13 including the half-etched portion or the half-etched line can also be formed by the second etching step. In the case where the connecting portion 13 has a through hole, the connecting portion 13 can be formed by the first etching step and the second etching step. In addition, the connection part 13 provided with the through-hole may be formed by any one of the first etching step and the second etching step.

In the case where the fragile line 11RC1 has a half-etched portion or a half-etched line, the fragile line 11RC1 can be formed by the first etching step. Furthermore, the fragile line 11RC1 including the half-etched portion or the half-etched line can also be formed by the second etching step. In the case where the fragile line 11RC1 has a through hole, the fragile line 11RC1 can be formed by the first etching step and the second etching step. Furthermore, the fragile line 11RC1 having the through hole may be formed by any one of the first etching step and the second etching step.

When the vapor deposition mask is obtained from the vapor deposition mask intermediate body 10 , first, the connecting portion 13 is cut, and the entire belt-shaped portion 11 is cut away from the frame-shaped portion 12 . At this time, the short-side weak line 13a, which is a part of the connecting portion 13, is also cut. Next, the line of weakness 11RC1 is cut, and the entire cutout region 11RC is cut away from the belt-like portion 11 . At this time, since the frangible wire 11RC1 is cut from the portion connected to the second end portion RC22 toward the end portion located on the short side 11e2, the frangible wire 11RC1 is easily cut. Furthermore, the fragile line 11RC1 may be cut from the end portion located on the short side 11e2 toward the portion connected to the second end portion RC22.

[mask device] 4 to 6, the mask device will be described. As shown in FIG. 4 , the mask device 20 includes a mask frame 21 and a plurality of vapor deposition masks 11M. In the example shown in FIG. 4 , the mask device 20 includes two vapor deposition masks 11M, but the mask device 20 may include more than one vapor deposition mask 11M in any number.

The vapor deposition mask 11M has a belt shape. The vapor deposition mask 11M has an edge 11e, and the edge 11e has a pair of long sides 11e1 and a pair of short sides 11e2. The vapor deposition mask 11M includes a plurality of mask portions 11a. The long side 11e1 of the vapor deposition mask 11M corresponds to the long side 11e1 of the strip portion 11 , and the short side 11e2 of the vapor deposition mask 11M corresponds to the short side 11e2 of the strip portion 11 . Each of the short sides 11e2 of the vapor deposition mask 11M includes a notch 11e22 , and the notch 11e22 has a U-shape recessed toward the other short side 11e2 . The notch 11e22 has a cutting mark in at least a part of the bottom part of the U-shape. The bottom is the curved part of the U shape. The vapor deposition mask 11M has a front surface 11F and a back surface 11R facing each other. The front surface 11F of the vapor deposition mask 11M is a part of the surface 10F of the vapor deposition mask intermediate body 10 , and the back surface 11R of the vapor deposition mask 11M is a part of the back surface 10R of the vapor deposition mask intermediate body 10 .

The mask frame 21 has a rectangular frame shape. The mask frame 21 is made of metal. Preferably, the mask frame 21 is formed of the same metal as that used to form the vapor deposition mask 11M.

A part of the surface 11F of each vapor deposition mask 11M is joined to the mask frame 21 . Each vapor deposition mask 11M is joined to the mask frame 21 so that the plurality of mask portions 11a included in the vapor deposition mask 11M are located in the openings divided by the mask frame 21 . Each vapor deposition mask 11M is in the longitudinal direction DL, and is joined to the mask frame 21 at a portion between one of the notch 11e22 and the mask portion 11a closest to the notch 11e22. In addition, each vapor deposition mask 11M is in the longitudinal direction DL, and is joined to the mask frame 21 at a portion between the other notch 11e22 and the mask portion 11a closest to the notch 11e22.

FIG. 5 shows an enlarged view of the area A in FIG. 4 . Region A contains the bend in the notch 11e22. 5 shows the structure of the region A in the case where the fragile line 11RC1 includes a half-etched line and a plurality of through holes located on the half-etched line.

As shown in FIG. 5 , the cutting line 11em is located on the side of the dividing notch 11e22. The cutting trace 11em is a portion formed by cutting the fragile line 11RC1. The cutting line 11em includes a plurality of curls 11em1 and a plurality of depressions 11em2. In the direction in which the cut line 11em extends, the curls 11em1 and the recesses 11em2 are alternately arranged. On the cut line 11em, a plurality of curls 11em1 are portions formed by cutting the half-etched lines. On the cutting line 11em, each recess 11em2 corresponds to a portion of each through hole.

Furthermore, in the case where the fragile line 11RC1 has only a half-etched line, the cutting line 11em has a curl on almost the entire notch 11e22. In addition, when the line of weakness 11RC1 is formed by a plurality of through holes and a part of the sheet located between the through holes, the cutting marks have curls and depressions alternately arranged along the notch 11e22.

As shown in FIG. 6 , after each vapor deposition mask 11M is joined to the mask frame 21 , in each vapor deposition mask 11M, a portion including the notch 11e22 is cut from the portion including the mask portion 11a. Then, the mask device 20 including the vapor deposition mask 11M in which the portion including the notch 11e22 has been cut out is attached to the vapor deposition device.

[Manufacturing method of vapor deposition mask] The manufacturing method of the vapor deposition mask includes the process of forming the vapor deposition mask intermediate body 10 from the metal sheet, and the process of forming the vapor deposition mask 11M from the strip portion 11 of the vapor deposition mask intermediate body 10 .

As described above, the vapor deposition mask intermediate body 10 formed in the formation of the vapor deposition mask intermediate body 10 includes the belt-shaped portion 11 , the frame-shaped portion 12 , and the connection portion 13 . The belt portion 11 has: a linear fragile line 11RC1 connected to the short side 11e2 and having a protrusion from the short side 11e2 toward the other short side 11e2; a line segment 11e21, which is clamped between the short sides 11e2 both ends; and the cut-out region 11RC, which is surrounded by the line of weakness 11RC1 and includes the line segment 11e21 and the line of weakness 11RC1. The vapor deposition mask intermediate body 10 includes a through hole 11RC2 in the cutout region 11RC, and the through hole 11RC2 is connected to a part of the edge surrounding the cutout region 11RC.

According to the manufacturing method of the vapor deposition mask 11M, when the vapor deposition mask intermediate body 10 is formed, compared with the case where the through-hole 11RC2 is formed in the entire cutout region 11RC, the resist mask for sheet etching Among them, the size of the through hole for forming the through hole 11RC2 can be reduced. Thereby, in the sheet, the area exposed from the through hole of the resist mask can be reduced, so the area in contact with the etching solution in the sheet can be reduced.

As a result, in the etching of the sheet, the etchant can be suppressed from circulating between the sheet and the resist mask. In addition, by reducing the area in contact with the etching solution, the etching amount of the sheet is less likely to be affected by the flow rate of the etching solution. Therefore, the accuracy of the patterned shape of the sheet can be improved.

As described above, according to one embodiment of the vapor deposition mask intermediate body, the vapor deposition mask, and the method for producing the vapor deposition mask, the following effects can be obtained. (1) It is difficult for the etching solution to form a circle between the resist mask and the sheet, and the shape of the vapor deposition mask intermediate 10 formed by wet etching is difficult to be affected by the flow rate of the etching solution used for wet etching. . Therefore, the precision of the shape of pattern processing can be improved.

(2) Both the short-side fragile line 13a and the fragile line 11RC1 may be cut off at the beginning with the through hole 11RC2. Therefore, compared with the case where the through-hole 11RC2 is not connected to the line segment 11e21 and the weak line 11RC1, the short-side weak line 13a and the weak line 11RC1 are more easily cut.

(3) The bent portion of the fragile line 11RC1 can be cut off by the through hole 11RC2. Therefore, compared with the case where the through-hole 11RC2 extends along the short side 11e2, the fragile line 11RC1 can be cut more easily.

(4) Since the cutout region 11RC is divided into two parts by the through hole 11RC2, it is not easy to remove the cutout region 11RC by the second part of the cutout region 11RC compared with the case where the cutout region 11RC is divided into two parts with the through hole 11RC2. The load required to divide the formed parts varies. Therefore, the cutout region 11RC is easily removed.

(5) The cutout region 11RC after the through hole 11RC2 is formed is stably supported by the frame-shaped portion 12 . Therefore, when the vapor deposition mask intermediate body 10 is conveyed, the cutout region 11RC can be suppressed from being cut off from the frame-shaped portion 12 .

(6) Since the through-hole 11RC2 passes through the fragile line 11RC1 and the connecting portion 13 , both the fragile line 11RC1 and the connecting portion 13 can be cut off from the through-hole 11RC2 at the beginning. Therefore, compared with the case where the through-hole 11RC2 does not pass through the fragile line 11RC1 and the connecting portion 13, the fragile line 11RC1 and the connecting portion 13 are more easily cut.

[Variation] In addition, the above-mentioned embodiment can be changed and implemented as follows. [Through Hole] ・A plurality of through holes may be formed in the cutout region 11RC. That is, the strip portion 11 may have a plurality of through holes 11RC2.

For example, as shown in FIG. 7 , the through hole 11RC2 may have two through holes 11RC2. In the example shown in FIG. 7 , two through holes 11RC2 are connected to the second dummy line L2, and a V-shape is formed by the two through holes 11RC2. Also in this case, the same effect as the aforementioned (2) can be obtained. In addition, the strip portion 11 may have three or more through holes 11RC2.

・As shown in FIG. 8 , the strip portion 11 may have a through hole 11RC2 extending in the width direction DW and connected only to the fragile line 11RC1. That is, the strip portion 11 may have the through hole 11RC2 connected only to the second dummy line L2. In this case, since the band-shaped portion 11 has the through hole 11RC2 located in a part of the cutout region 11RC, the same effect as the aforementioned (1) can be obtained.

Furthermore, in the through-hole 11RC2 extending in the width direction DW, only one end portion may be connected to the fragile line 11RC1, that is, the second dummy line L2, or both ends may not be connected to the fragile line 11RC1, that is, the second dummy line L2. The second virtual line L2. In either case, since the band-shaped portion 11 has the through hole 11RC2 located in a part of the cutout region 11RC, the same effect as the aforementioned (1) can be obtained.

・As shown in FIG. 9 , the through hole 11RC2 may have a portion extending in the width direction DW in addition to the portion extending in the longitudinal direction DL. That is, the through hole 11RC2 may have a cross shape. In this case, the through-hole 11RC2 is connected to the fragile line 11RC1 at three locations. In other words, three parts of the through hole 11RC2 on the second dummy line L2 are connected to the second dummy line L2. Therefore, compared with the case where the through-hole 11RC2 is connected to the second dummy line L2 only at one location on the second dummy line L2, the fragile line 11RC1 can be cut more easily.

In addition, in the through-hole 11RC2 having a cross shape, one or more of the four ends may not be connected to the edge surrounding the cutout region 11RC. In this case, since the band-shaped portion 11 has the through hole 11RC2 located in a part of the cutout region 11RC, the same effect as the aforementioned (1) can be obtained.

・The through hole 11RC2 shown in FIG. 9 can also be changed to a T-shaped through hole. That is, the through-hole 11RC2 may have a T-shape in which one part is connected to the line segment 11e21 and two parts are connected to the fragile line 11RC1. In other words, the through hole may have a T-shape in which one part is connected to the first dummy line L1 and two parts are connected to the second dummy line L2. Alternatively, the through hole may have a T-shape connected to three places on the fragile line 11RC1. In other words, the through hole may have a T-shape connected to three locations on the second dummy line L2. In this case, since the band-shaped portion 11 has the through hole 11RC2 located in a part of the cutout region 11RC, the same effect as the aforementioned (1) can be obtained.

・As shown in FIG. 10 , the through hole 11RC2 may have a rhombus shape. The through hole 11RC2 is connected to one site on the line segment 11e21 and three sites on the line of weakness 11RC1. In other words, the through hole 11RC2 is connected to one location on the first dummy line L1 and three locations on the second dummy line L2. In this case, since the band-shaped portion 11 has the through hole 11RC2 located in a part of the cutout region 11RC, the same effect as the aforementioned (1) can be obtained. Furthermore, in the through-hole 11RC2 having a diamond shape, one or more of the four corners may not be connected to the edge surrounding the cutout region 11RC. Even in this case, the same effect as the aforementioned (1) can be obtained.

・The through hole 11RC2 may be located in the cutout region 11RC and not connected to the edge of the cutout region 11RC. In this case, since the strip portion 11 has the through hole 11RC2 in the cutout region 11RC, the same effect as the above (1) can be obtained. However, by connecting the through-hole 11RC2 to the edge of the cut-out region 11RC, the short-side weak line 13a and the weak line 11RC1 surrounding the cut-out region 11RC can be easily cut. In addition, the through-hole 11RC2 may have an arbitrary shape, for example, a polygonal shape, such as a triangle and a quadrangle, a circle, etc. may be sufficient.

[connection part] As shown in FIG. 11 , the connection portion 13 may include a short-side weak line 13a and a bridge portion 13b. In the vapor deposition mask intermediate body 10, the peripheral portion 11b and the frame-shaped portion 12 have the first plate thickness. The plurality of bridging portions 13b are located at spaced positions along the edge 11e of the strip portion 11, and each of the bridging portions 13b has a first plate thickness. Slots 10S are arranged along portions of the edge 11 e of the band-shaped portion 11 other than the portion where the connecting portion 13 is connected. Since the slit 10S is arranged along the portion other than the portion connected by the connecting portion 13 in the edge 11e of the band-shaped portion 11, the work of cutting the bridge portion 13b can be easily performed.

10: Evaporation mask intermediate 10F: Surface 10R: Back 10S: Gap 11: Ribbon 11a: Mask part 11b: Peripheral Department 11e: Edge 11e1: long edge 11e2: Short side 11e21: Line segment 11h: Mask hole 11hL: large hole 11hS: Small hole 11RC: Resection area 11RC1: Fragile Line 11RC2: Through hole 11M: Evaporation mask 11F: Surface 11R: Back 11e22: Notch 11em: cut marks 11em1: Curl 11em2: Sag 12: Frame part 13: Links 13a: Short edge fragile line DL: length direction DW: width direction L1: first virtual line L2: Second virtual line RC21: First end RC22: Second end 20: Masking device 21: Mask Frame

FIG. 1 is a plan view showing the structure of a vapor deposition mask intermediate body according to an embodiment. FIG. 2 is a cross-sectional view showing a structure in a mask portion of the belt-shaped portion shown in FIG. 1 . FIG. 3 is a plan view showing a cutout area and a peripheral structure of the cutout area in the vapor deposition mask intermediate body shown in FIG. 1 . FIG. 4 is a plan view showing a state where the vapor deposition mask obtained from the vapor deposition mask intermediate shown in FIG. 1 is bonded to a mask frame. FIG. 5 is an enlarged plan view showing the area A shown in FIG. 4 . FIG. 6 is a plan view showing a state where a part of the vapor deposition mask shown in FIG. 4 is cut. 7 is a plan view showing a cut-out region and a peripheral structure of the cut-out region in the vapor deposition mask intermediate body of the first modification. 8 is a plan view showing a cutout region and a peripheral structure of the cutout region in the vapor deposition mask intermediate body of the second modification. 9 is a plan view showing a cutout region and a peripheral structure of the cutout region in the vapor deposition mask intermediate body of the third modification. 10 is a plan view showing a cutout region and a peripheral structure of the cutout region in the vapor deposition mask intermediate body of the fourth modification. 11 is a plan view showing the structure of a vapor deposition mask intermediate body of a fifth modification.

11: Ribbon

11e2: Short side

11e21: Line segment

11RC: Resection area

11RC1: Fragile Line

11RC2: Through hole

12: Frame part

13: Links

13a: Short edge fragile line

DL: length direction

DW: width direction

L1: first virtual line

L2: Second virtual line

RC21: First end

RC22: Second end

Claims (8)

A vapor deposition mask intermediate body, which is formed of a metal sheet, and is provided with: a strip portion, which includes an edge with first and second long sides and first and second short sides, and has a plurality of masks A hole shielding part; a frame-shaped part surrounding the strip-shaped part; and a connecting part located between the strip-shaped part and the frame-shaped part, and connecting at least the first short side of the strip-shaped part In the frame-shaped portion, the band-shaped portion includes a line of weakness, a line segment and a cut-out area, both ends of the line of weakness are connected to the first short side, and the line of weakness has a direction from the first short side to the second short side. The protruding linear shape, the line segment is sandwiched between the two ends of the fragile line in the first short side, and the cutout area is surrounded by the line segment and the fragile line, and includes the line segment and the fragile line. The wire, the vapor deposition mask intermediate body, has a through hole in the cutout area, and the through hole is connected to a part of the edge surrounding the cutout area. The vapor deposition mask intermediate body of claim 1, wherein the through hole has a first end and a second end, and has a shape extending from the first end toward the second end, and the first end Connected to the line segment, the second end is connected to the frangible line. The vapor deposition mask intermediate body of claim 2, wherein the line of weakness has a substantially U-shape, and the through hole has a strip shape extending along the long side. The vapor deposition mask intermediate body according to claim 3, wherein the first end portion bisects the length of the line segment in the extending direction of the first short side, and the second end portion is the length of the line of weakness. Divide. The vapor deposition mask intermediate according to claim 4, wherein in the extending direction of the first short side, the sum of the length of the first end portion and the length of the second end portion is the first length, and the length of the line segment is the first length. The sum of the length of the line of weakness and the length of the line of weakness is a second length, and the second length is longer than the first length. The vapor deposition mask intermediate body according to claim 1, wherein the through hole has a connection between a position in the cutout region closest to the second short side and a position in the frame portion opposite to the first short side ribbon. An evaporation mask is provided with a strip-shaped evaporation mask, which is provided with: an edge, which has a pair of long sides and a pair of short sides; and a mask part, which has a plurality of mask holes, and each short side includes The notch has a U-shape concave toward the other short side, and the notch has a cutting mark at at least a part of the bent portion of the U-shape, that is, the bottom portion. A method for manufacturing an evaporation mask, comprising the following steps: forming an evaporation mask intermediate body from a metal sheet, the evaporation mask intermediate body having a band-shaped part, a frame-shaped part and a connecting part, the band-shaped part It includes an edge with first and second long sides and first and second short sides, and a shielding portion with a plurality of shielding holes, the frame-like portion surrounds the belt-like portion, and the connecting portion is located on the belt. between the strip-shaped part and the frame-shaped part, and at least the first short side of the strip-shaped part is connected to the frame-shaped part; and a vapor deposition mask is formed from the strip-shaped part, and the strip-shaped part is provided with a line of weakness , a line segment and a cut area, the two ends of the line of weakness are connected to the first short side, the line of weakness has a linear shape with a protrusion from the first short side toward the second short side, and the line segment is clamped The portion at both ends of the line of weakness in the first short side, the cutout area, is surrounded by the line segment and the line of weakness, and includes the line segment and the line of weakness, and the vapor deposition mask intermediate is attached to the aforesaid A through hole is formed in the cut-out area, and the through-hole is connected to a part of the edge surrounding the cut-out area.

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