TWI821707B - Evaporation mask intermediate, evaporation mask and method for manufacturing evaporation mask - Google Patents

Abstract

An evaporation mask intermediate is formed from a metal sheet, and is provided with: a strip-shaped portion, which includes edges with first and second long sides and first and second short sides, and has a plurality of masks. a hole-covering part; a frame-shaped part surrounding the strip-shaped part; and a connecting part located between the strip-shaped part and the frame-shaped part, and connecting at least the first short side of the strip-shaped part to the frame-shaped part. The band-shaped part has fragile lines, line segments and excision areas. Both ends of the fragile line are connected to the first short side, and the fragile line is a line with a protruding shape from the first short side toward the second short side. The line segment is the part clamped at both ends of the fragile line in the first short side. The resection area is surrounded by fragile lines and includes line segments and fragile lines. The evaporation mask intermediate has a through hole in the resection area, and the through hole is connected to a part of the edge surrounding the resection area.

Description

Evaporation mask intermediate, evaporation mask and method for manufacturing evaporation mask

The invention relates to a vapor deposition mask intermediate, a vapor deposition mask and a method for manufacturing the vapor deposition mask.

In order to form a display element of an organic EL device, vacuum evaporation is used. In vacuum evaporation, an evaporation mask is used in order to form a layer with a predetermined shape required for a display element. The vapor deposition mask has a strip shape formed of a metal sheet. The evaporation mask has a pair of short sides. Before using the evaporation mask, each short side has a notch, and the notch has a shape that is concave toward the other short side. When a vapor deposition mask is used, the vapor deposition mask is attached to the mask frame in a state where each short side is stretched in a direction away from a short side different from the short side (for example, see Patent Document 1). [Prior technical literature] [Patent Document]

[Patent Document 1] International Publication No. 2020/050398

[Problem to be solved by the invention]

However, the evaporation mask is formed by wet etching the metal sheet. At this time, in the metal sheet used to manufacture the vapor deposition mask, a through hole is formed in a portion corresponding to the notch of the vapor deposition mask. The area of the through hole corresponding to the notch is larger than that of other through holes formed on the evaporation mask. Therefore, since the portion of the metal sheet corresponding to the notch is exposed to more etching liquid, the etching liquid is likely to surround the metal sheet and the resist mask formed on the sheet, or the etching process is easily affected. The flow rate of the etching liquid is about 100%. As a result, the accuracy of the patterned shape is likely to decrease in the portion corresponding to the notch of the vapor deposition mask.

An object of the present invention is to provide a vapor deposition mask intermediate, a vapor deposition mask, and a method for manufacturing the vapor deposition mask that can improve the shape accuracy of pattern processing. [Means used to solve problems]

In one aspect of the present invention, an evaporation mask intermediate is provided. The evaporation mask intermediate system is formed of metal sheets. It is equipped with: a strip-shaped part, which includes an edge with first and second long sides and first and second short sides, and a mask part with a plurality of mask holes; a frame-shaped part, which surrounds the aforementioned strip-shaped part ; and a connecting portion located between the strip-shaped portion and the frame-shaped portion, and connecting at least the short side of the strip-shaped portion to the frame-shaped portion. The aforementioned band-shaped portion includes a fragile line, a line segment, and a cutout area. Both ends of the fragile line are connected to the first short side, and the fragile line has a protruding shape from the first short side toward the second short side. The aforementioned line segment is clamped at both ends of the aforementioned fragile line in the aforementioned first short side. The aforementioned resection area is surrounded by the aforementioned line segments and the aforementioned fragile lines, and includes the aforementioned line segments and the aforementioned fragile lines. The aforementioned evaporation mask intermediate system has a through hole in the aforementioned cut-out area, and the through-hole is connected to a portion of the edge surrounding the aforementioned cut-out area.

In another aspect of the invention, an evaporation mask is provided. The evaporation mask has a band shape. The evaporation mask has: an edge, which has a pair of long sides and a pair of short sides; and a mask part, which has a plurality of mask holes. Each short side includes a notch, and the notch has a U-shape that is concave toward the other short side. The notch means that at least a part of the bent portion of the U-shape, that is, the bottom, has a cut mark.

In another aspect of the present invention, a method for manufacturing an evaporation mask is provided. A method for manufacturing a vapor deposition mask includes forming a vapor deposition mask intermediate from a metal sheet, wherein the vapor deposition mask intermediate has a strip-shaped portion, a frame-shaped portion and a connecting portion, and the strip-shaped portion includes The edges of the first and second long sides and the first and second short sides, and a mask portion with a plurality of mask holes, the frame portion surrounds the aforementioned band-shaped portion, and the connecting portion is located at the aforementioned band-shaped portion and the frame-shaped part, and connect at least the short side of the strip-shaped part to the frame-shaped part; and form a vapor deposition mask from the strip-shaped part. The aforementioned band-shaped portion includes a fragile line, a line segment, and a cutout area. Both ends of the fragile portion are connected to the first short side, and have a protruding shape from the first short side toward the second short side. The aforementioned line segment is clamped at both ends of the aforementioned fragile line in the aforementioned first short side. The aforementioned resection area is surrounded by the aforementioned line segments and the aforementioned fragile lines, and includes the aforementioned line segments and the aforementioned fragile lines. The aforementioned evaporation mask intermediate system has a through hole in the aforementioned cut-out area, and the through-hole is connected to a portion of the edge surrounding the aforementioned cut-out area.

[Form used to implement the invention]

One embodiment of the vapor deposition mask intermediate, the vapor deposition mask, and the manufacturing method of the vapor deposition mask will be described with reference to FIGS. 1 to 6 . Hereinafter, the vapor deposition mask intermediate, the mask device, and the manufacturing method of the vapor deposition mask will be described in order.

[Vapor Deposition Mask Intermediate] The vapor deposition mask intermediate will be described with reference to FIGS. 1 to 3 . The vapor deposition mask intermediate 10 shown in FIG. 1 is formed of a metal sheet. The metal sheet is made of, for example, an iron-nickel alloy or an iron-nickel-cobalt alloy. The iron-nickel alloy is, for example, an iron-nickel alloy containing 30% by mass or more of nickel. Among iron-nickel alloys, the alloy mainly composed of 36% by mass of nickel and the remaining amount of iron, that is, Hengfan steel, is preferred. In the case where an alloy of 36% by mass of nickel and the remaining amount of iron is the main component of the metal plate, the remaining part of the metal plate may contain additives such as chromium, manganese, carbon, and cobalt.

In addition, the thermal expansion coefficient of iron-nickel-cobalt alloy is smaller than that of iron-nickel-cobalt alloy. The iron-nickel-cobalt alloy is, for example, an iron-nickel-cobalt alloy containing 30 mass% or more of nickel and 3 mass% or more of cobalt. Among the iron-nickel-cobalt alloys, an alloy mainly composed of 32% by mass of nickel, 4% by mass and less than 5% by mass of cobalt, and the remaining amount of iron, that is, super constant steel, is preferred. When an alloy of 32 mass% nickel, 4 mass% or more and 5 mass% or less cobalt and the remaining amount of iron is the main component of the metal plate, the remaining part of the metal plate may include, for example, chromium, manganese, and carbon. of additives.

The vapor deposition mask intermediate 10 includes a strip portion 11 , a frame portion 12 , and a connecting portion 13 . The strip portion 11 includes an edge 11e and a mask portion 11a. The edge 11e has a pair of long sides 11e1 and a pair of short sides 11e2. That is, edge 11e has first and second long sides 11e1 and first and second short sides 11e2. The direction in which the long side 11e1 extends is the longitudinal direction DL, and the direction in which the short side 11e2 extends is the width direction DW. The length direction DL and the width direction DW are directions orthogonal to each other. The mask portion 11a is provided with a plurality of mask holes 11h. Each mask hole 11h is a hole for forming a predetermined pattern on a film-forming object by passing a vapor deposition material through each mask hole 11h. The frame portion 12 surrounds the strip portion 11 . The connecting part 13 is located between the belt-shaped part 11 and the frame-shaped part 12, and connects at least the short side 11e2 of the belt-shaped part 11 to the frame-shaped part 12. The connecting part 13 connects a part of the long side 11e1 to the frame part 12 in addition to the short side 11e2. The vapor deposition mask intermediate 10 has a front surface 10F and a back surface 10R, and the back surface 10R is the surface opposite to the front surface 10F.

The strip-shaped portion 11 includes a plurality of mask portions 11a and peripheral portions 11b. The plurality of mask portions 11a are arranged at intervals along the longitudinal direction DL. Each mask part 11a has a rectangular shape, for example. Each mask part 11a has a plurality of mask holes 11h. In each mask portion 11a, a plurality of mask holes 11h are arranged according to predetermined rules. The peripheral portion 11b has a shape surrounding each mask portion 11a. Since the belt-shaped portion 11 of this embodiment has a plurality of mask portions 11a arranged along the longitudinal direction DL, the peripheral portion 11b has a stepped shape. The peripheral portion 11b does not have the mask hole 11h.

In the vapor deposition mask intermediate 10, the peripheral portion 11b of the strip portion 11 and the frame portion 12 have a first plate thickness. The first plate thickness is, for example, 15 μm or more and 30 μm or less. Furthermore, the mask portion 11a of the strip-shaped portion 11 may have a first plate thickness, or may have a second plate thickness that is thinner than the first plate thickness. Furthermore, when the shield part 11a has the second plate thickness, among the plurality of shield holes 11h formed in the shield part 11a, the shield holes 11h adjacent to each other are connected. Thereby, the shield part 11a has a 2nd plate thickness.

In the example shown in FIG. 1 , two strip-shaped portions 11 are arranged at intervals in the width direction DW. Furthermore, in the vapor deposition mask intermediate 10 , only one strip-shaped portion 11 may be arranged in the width direction DW, or three or more strip-shaped portions 11 may be arranged. The two strip-shaped portions 11 arranged in the width direction DW are spaced apart from each other in the longitudinal direction DL.

The frame portion 12 has a shape surrounding the strip portion 11 when viewed from a viewpoint facing the surface 10F of the vapor deposition mask intermediate 10 . The frame portion 12 has a shape that surrounds each strip portion 11 individually.

The connecting portion 13 and the slit 10S are located on the boundary between the strip portion 11 and the frame portion 12 . The slit 10S penetrates the vapor deposition mask intermediate 10 in the thickness direction of the vapor deposition mask intermediate 10 . The slit 10S is located in the width direction DW with respect to the mask portion 11 a at the boundary between the strip portion 11 and the frame portion 12 . The plurality of mask portions 11a are sandwiched between a pair of slits 10S in the width direction DW.

The connecting portion 13 is located on the entire boundary between the strip portion 11 and the frame portion 12 except for the portion where the slit 10S is located. The connecting portion 13 may be, for example, a half-etched line. The connecting part 13 may also be formed by a plurality of through-holes arranged at intervals along the boundary between the strip-shaped part 11 and the frame-shaped part 12 and a part of the metal sheet located between adjacent through-holes. Alternatively, the connecting part 13 may also be formed by a plurality of half-etched parts arranged at intervals along the boundary between the strip-shaped part 11 and the frame-shaped part 12 and a part of the metal sheet located between the adjacent half-etched parts. form.

When the connection part 13 has a plurality of half-etched parts or a plurality of through-holes, for example, the length of the half-etched parts or the through-holes may be 90 μm or more and 180 μm or less, and the width may be 60 μm or more and 90 μm or less, and the other half-etched parts or through-holes may be arranged. The equal pitch may be 180 μm or more and 270 μm or less. Furthermore, the length of the half-etched portion or the through-hole is the size along the direction in which the connecting portion 13 extends, and the width is the size in the direction orthogonal to the direction in which the connecting portion 13 extends. Furthermore, the depth of the half-etched portion may be, for example, 50% or more and 80% or less of the first plate thickness.

Alternatively, the connecting portion 13 may be formed by a half-etched line and a plurality of through-holes arranged at intervals on the half-etched line. In this case, the width of the half-etched line may be, for example, 100 μm or more and 150 μm or less. The depth of the half etching line may be, for example, 50% or more and 80% or less of the first plate thickness. The diameter of the through hole located on the half-etched line may be, for example, 50% or more and 80% or less of the width of the half-etched line. The pitch at which the through holes are arranged on the half-etched line may be, for example, 100 μm or more and 500 μm or less.

Furthermore, the half-etched line and the half-etched portion are portions that etch a portion of the metal sheet in the thickness direction. The connecting portion 13 is a portion with lower mechanical strength than the strip portion 11 and the frame portion 12 .

FIG. 2 shows a cross-sectional structure of the mask portion 11a along a plane orthogonal to the surface 10F and extending in the width direction DW. As shown in FIG. 2 , each mask hole 11h formed in the mask portion 11a has a large hole 11hL and a small hole 11hS. The large hole 11hL is opened on the surface 10F of the evaporation mask intermediate 10. On the other hand, the small hole 11hS is opened in the back surface 10R of the vapor deposition mask intermediate 10 . Viewed from the viewpoint opposite to the surface 10F, the opening of the large hole 11hL located on the surface 10F is larger than the opening of the small hole 11hS located on the back surface 10R. In the middle of the thickness direction of the evaporation mask intermediate 10, a large hole 11hL is connected to a small hole 11hS.

The plurality of mask holes 11h provided in the mask portion 11a are formed by wet etching of the sheet. In the wet etching of the sheet, first, a plurality of small holes 11hS are formed by etching the sheet from the back to the surface. The etching step for forming the small hole 11hS is the first etching step. Next, the large holes 11hL connected to each of the small holes 11hS one by one are formed by etching the sheet from the surface to the back of the sheet. The etching step used to form the large hole 11hL is the second etching step.

Viewed from a viewpoint facing the surface 10F of the vapor deposition mask intermediate 10 , each mask portion 11 a is formed with a predetermined size and arrangement in such a manner that a display device having a resolution of 300 ppi or more and 1000 ppi or less can be manufactured. A plurality of mask holes 11h.

FIG. 3 also shows a portion of the strip portion 11 including a short side 11e2 and a portion of the frame portion 12 located around the short side 11e2. Furthermore, in the belt-shaped portion 11, the positions of the portion including the one short side 11e2 and the portion including the other short side 11e2 in the longitudinal direction DL are different from each other. The structure from the opposite top view is the same.

As shown in FIG. 3 , the belt-shaped portion 11 has a linear fragile line 11RC1 and a cutout area 11RC. Both ends of the fragile line 11RC1 are connected to the short side 11e2, and the fragile line 11RC1 has a protruding shape from the short side 11e2 toward the other short side 11e2. That is, the fragile line 11RC1 has a protruding shape from the first short side 11e2 toward the second short side 11e2. The resection area 11RC is surrounded by the line segment 11e21 and the fragile line 11RC1 sandwiched between the two ends of the fragile line 11RC1 in the short side 11e2, and includes the line segment 11e21 and the fragile line 11RC1. The vapor deposition mask intermediate 10 is provided with the through hole 11RC2. The through hole 11RC2 is connected to a part of the edge surrounding the cutout area 11RC within the cutout area 11RC. In this embodiment, since the line segment 11e21 and the fragile line 11RC1 are separated by the through hole 11RC2, the resection area 11RC is surrounded by the edges of the open loop formed by the line segment 11e21 and the fragile line 11RC1.

When the vapor deposition mask intermediate 10 is manufactured by patterning a metal sheet by wet etching, since the through hole 11RC2 is formed only in a part of the cutout area 11RC, it is different from the entire cutout area by wet etching. Compared with the case of 11RC penetration, the area of the metal sheet exposed to the etching liquid is smaller. Therefore, it is difficult for the etching liquid to surround the resist mask and the sheet, and the shape of the vapor deposition mask intermediate 10 formed by wet etching is difficult to be affected by the flow rate of the etching liquid used for wet etching. . Therefore, tooth marks caused by wet etching, such as when the entire cutout region 11RC is removed by wet etching, can be suppressed. As a result, the accuracy of the patterned shape can be improved.

Furthermore, as mentioned above, since the cutout area 11RC is surrounded by a part of the connection part 13 and the fragility line 11RC1, by cutting the connection part 13 and the fragility line 11RC1, it is possible to form a section from the short side 11e2 with respect to the short side. 11e2 is a concave notch toward the other short side 11e2.

The first virtual line L1 and the second virtual line L2 may also be set in the evaporation mask intermediate 10 . The first virtual line L1 is a line extending along the center portion of each short side 11e2. The center portion of each short side 11e2 is a line segment 11e21 including the center of the short side 11e2 in the width direction DW. The center portion of the short side 11e2 is, for example, the center of the short side 11e2 divided into three parts in the width direction DW. The second virtual line L2 is connected to both ends of the first virtual line L1 and has a protruding line from the first virtual line L1 toward the other first virtual line L1. In this embodiment, the second virtual line L2 has a U-shape from one short side 11e2 to the other short side 11e2. Furthermore, the second virtual line L2 may have a substantially V-shape, for example.

The connection part 13 includes the short side fragile line 13a. The band-shaped portion 11 includes a cutout area 11RC and the aforementioned fragility line 11RC1. The fragile line 11RC1 is located along at least part of the second virtual line L2. The resection area 11RC is an area surrounded by the first virtual line L1 and the second virtual line L2. The vapor deposition mask intermediate 10 is provided with the through hole 11RC2. The through hole 11RC2 is connected to a portion of the edge surrounding the cutout area 11RC within the cutout area 11RC. In the case where the first virtual line L1 and the second virtual line L2 are used to define the resection area 11RC, the first virtual line L1 and the second virtual line L2 form a closed-loop edge surrounding the resection area 11RC.

The through hole 11RC2 has a shape extending from the first end RC21 toward the second end RC22. The first end RC21 is connected to the line segment 11e21. The second end RC22 is connected to the fragile line 11RC1.

Since the through hole 11RC2 is connected to the line segment 11e21 and the fragile line 11RC1, the through hole 11RC2 can be used as a starting point to cut both the short side fragile line 13a and the fragile line 11RC1 along the line segment 11e21 in the connecting part 13. Therefore, compared with the case where the through hole 11RC2 is not connected to any of the line segment 11e21 and the fragile line 11RC1, it is easier to cut the connecting part 13 and the fragile line 11RC1.

Furthermore, the short-side fragile line 13a is located on a portion of the first virtual line L1 other than the portion connected to the first end RC21. That is, the short side fragile line 13a is blocked by the first end portion RC21 of the through hole 11RC2. The fragile line 11RC1 is located on the portion of the second virtual line L2 other than the portion connected to the second end portion RC22. That is, the fragile line 11RC1 is blocked by the second end portion RC22 of the through hole 11RC2.

The fragile line 11RC1 has a substantially U-shape. In this embodiment, the fragile line 11RC1 is cut off by the through hole 11RC2 and has a shape that lacks a part of the U-shaped curved portion. The through hole 11RC2 has a strip shape extending along the long side 11e1. In other words, the through hole 11RC2 extends in the longitudinal direction DL. Therefore, the second end portion RC22 of the through hole 11RC2 is connected to the curved portion of the fragile line 11RC1, in other words, the curved portion of the second virtual line L2. In this way, since the through hole 11RC2 extends along the long side 11e1, the bent portion of the fragile line 11RC1 can be blocked by the through hole 11RC2. Therefore, compared with the case where the through hole 11RC2 extends along the short side 11e2, the fragile line 11RC1 can be cut more easily.

The first end portion RC21 bisects the line segment 11e21 in the width direction DW. Furthermore, the second end portion RC22 bisects the length of the fragile line 11RC1. That is, the first end portion RC21 is connected to the center of the first virtual line L1 in the width direction DW in which the short side 11e2 extends. The second end portion RC22 is connected to the bottom of the U-shape in the second virtual line L2. The bottom is a U-shaped curved part. Thereby, since the cutout area 11RC is divided into two halves by the through hole 11RC2, it is difficult to remove the cutout area 11RC by the cutout area 11RC compared with the case where the cutout area 11RC is divided into two halves with a deviation through the through hole 11RC2. There is a deviation in the load required for each part formed by the two divisions. Therefore, the cutout area 11RC is easily removed.

In other words, the through hole 11RC2 has a strip shape connecting the position closest to the other short side 11e2 in the cutout area 11RC and the position facing the short side 11e2 in the frame portion 12 . That is, the through hole 11RC2 has a strip shape including the position closest to the second short side 11e2 in the cutout area 11RC and the position facing the first short side 11e2 in the frame portion 12 . Since the through hole 11RC2 connects the fragile line 11RC1 and the connecting portion 13, both the fragile line 11RC1 and the connecting portion 13 can be cut off through the through hole 11RC2. Therefore, compared with the case where the through hole 11RC2 does not connect the fragile line 11RC1 and the connecting portion 13, it is easier to cut the fragile line 11RC1 and the connecting portion 13.

In the width direction DW, the sum of the length of the first end RC21 and the length of the second end RC22 is the first length. The sum of the length of the line segment 11e21 and the length of the fragile line 11RC1 is the second length. The second length is greater than the first length.

Furthermore, the width of the through hole 11RC2 in the width direction DW may be, for example, 1 mm or more and 5 mm or less, and the length of the through hole 11RC2 in the length direction DL may be, for example, 20 mm or more and 4050 mm or less. In addition, the length of the line segment 11e21 may be, for example, 15 mm or more and 40 mm or less.

The vapor deposition mask intermediate 10 is formed on a metal sheet transported by a roll-to-roll device. In the evaporation mask intermediate 10 , since the second length is longer than the first length, compared with the case where the second length is shorter than the first length, the cutout area 11RC after the through hole 11RC2 is formed can be formed by the frame portion 12 Stable support. Therefore, when the vapor deposition mask intermediate 10 is conveyed, cutting of the cutout area 11RC from the frame portion 12 can be suppressed.

Since the short-side fragile line 13a is a part of the connection part 13, as mentioned above, the short-side fragile line 13a is a part with lower mechanical strength than the belt-shaped part 11 and the frame-shaped part 12. As mentioned above, the short-side fragile line 13a may be a half-etched line, for example. The short-side fragility line 13a can be formed by a plurality of through-holes arranged at intervals along the boundary between the strip-shaped portion 11 and the frame-shaped portion 12, and a part of the metal sheet located between adjacent through-holes. Alternatively, the short-side fragility line 13a can also be formed by having a plurality of half-etched portions arranged at intervals along the boundary between the strip-shaped portion 11 and the frame-shaped portion 12, and a metal sheet located between adjacent half-etched portions. formed as part of. Alternatively, the short-side fragile line 13a may be formed by a half-etched line and a plurality of through-holes arranged at intervals on the half-etched line. That is, the short-side fragile line 13a may be formed by alternately arranged half-etched portions and through-holes.

The fragile line 11RC1 is also a portion whose mechanical strength is lower than that of the belt-shaped portion 11 and the frame-shaped portion 12 . Like the short-side fragile line 13a, the fragile line 11RC1 may be a half-etched line, for example. The fragility line 11RC1 may also be formed by a plurality of through-holes arranged at intervals along the boundary between the strip-shaped part 11 and the frame-shaped part 12 and a part of the metal sheet located between adjacent through-holes. Alternatively, the fragility line 11RC1 can also be formed by a plurality of half-etched portions arranged at intervals along the boundary between the strip-shaped portion 11 and the frame-shaped portion 12 and a part of the metal sheet located between the adjacent half-etched portions. form. Alternatively, the fragile line 11RC1 may be formed by a half-etched line and a plurality of through-holes arranged at intervals on the half-etched line. That is, the fragility line 11RC1 may be formed by alternately arranged half-etched portions and through-holes.

When the fragile line 11RC1 has a plurality of half-etched parts or a plurality of through-holes, for example, the length of the half-etched parts or the through-holes may be 90 μm or more and 180 μm or less, and the width may be 60 μm or more and 90 μm or less, and the like may be arranged. The distance may be 180 μm or more and 270 μm or less. Furthermore, the length of the half-etched portion or the through hole is the size along the direction in which the fragility line 11RC1 extends, and the width is the size in the direction orthogonal to the direction in which the fragility line 11RC1 extends. Furthermore, the depth of the half-etched portion may be, for example, 50% or more and 80% or less of the first plate thickness.

Alternatively, the fragile line 11RC1 may be formed by a half-etched line and a plurality of through-holes arranged at intervals on the half-etched line. That is, the fragile line 11RC1 may be formed by alternately arranged half-etched portions and through-holes. In this case, the width of the half-etched line may be, for example, 100 μm or more and 150 μm or less. The depth of the half etching line may be, for example, 50% or more and 80% or less of the first plate thickness. The diameter of the through hole located on the half-etched line may be, for example, 50% or more and 80% or less of the width of the half-etched line. The pitch at which the through holes are arranged on the half-etched line may be, for example, 100 μm or more and 500 μm or less.

Furthermore, the structure of the short-side fragile line 13a and the structure of the fragile line 11RC1 may be the same or different from each other. For example, the short-side fragile line 13a can be formed by a half-etched line and a plurality of through-holes arranged at intervals on the half-etched line. The fragile line 11RC1 may be formed by, for example, a plurality of through holes and a part of a metal sheet located between adjacent through holes. Alternatively, the fragility line 11RC1 may be formed by a plurality of half-etched portions and a part of the metal sheet located between adjacent half-etched portions.

The through hole 11RC2 is formed by the first etching step and the second etching step. In addition, the through-hole 11RC2 may be formed by any one of the first etching step and the second etching step.

In the case where the connecting portion 13 including the short-side fragile line 13a has a half-etched portion or a half-etched line, the connecting portion 13 can be formed by the first etching step. Furthermore, the connecting portion 13 having a half-etched portion or a half-etched line can also be formed by the second etching step. In the case where the connecting portion 13 has a through hole, the connecting portion 13 can be formed through a first etching step and a second etching step. Furthermore, the connecting portion 13 having the through hole can also be formed by any one of the first etching step and the second etching step.

In the case where the fragile line 11RC1 has a half-etched portion or a half-etched line, the fragile line 11RC1 can be formed by the first etching step. Furthermore, the fragile line 11RC1 having a half-etched portion or a half-etched line can also be formed by the second etching step. When the fragile line 11RC1 has a through hole, the fragile line 11RC1 can be formed through the first etching step and the second etching step. Furthermore, the fragile line 11RC1 having a through hole can also be formed by any one of the first etching step and the second etching step.

When obtaining the vapor deposition mask from the vapor deposition mask intermediate 10 , first, the connecting portion 13 is cut, and the entire strip portion 11 is separated from the frame portion 12 . At this time, the short-side fragile line 13a, which is a part of the connecting portion 13, is also cut. Next, the fragile line 11RC1 is cut, and the entire resection region 11RC is separated from the belt-shaped portion 11 . At this time, since the fragile wire 11RC1 is cut from the portion connected to the second end RC22 toward the end located on the short side 11e2, it is easy to cut the fragile wire 11RC1. Furthermore, the fragile line 11RC1 may be cut from the end located on the short side 11e2 toward the part connected to the second end RC22.

[Masking device] The mask device will be described with reference to FIGS. 4 to 6 . As shown in FIG. 4 , the mask device 20 includes a mask frame 21 and a plurality of vapor deposition masks 11M. In the example shown in FIG. 4 , the mask device 20 is provided with two vapor deposition masks 11M, but the mask device 20 may be provided with any number of one or more vapor deposition masks 11M.

The vapor deposition mask 11M has a strip shape. The vapor deposition mask 11M has an edge 11e having a pair of long sides 11e1 and a pair of short sides 11e2. The vapor deposition mask 11M includes a plurality of mask parts 11a. The long side 11e1 of the vapor deposition mask 11M corresponds to the long side 11e1 of the strip-shaped part 11, and the short side 11e2 of the vapor deposition mask 11M corresponds to the short side 11e2 of the strip-shaped part 11. Each short side 11e2 of the vapor deposition mask 11M includes a notch 11e22, and the notch 11e22 has a U-shape recessed toward the other short side 11e2. The notch 11e22 has a cutting mark on at least part of the bottom of the U-shape. The bottom is a U-shaped curved part. The vapor deposition mask 11M has a surface 11F and a back surface 11R that face each other. The surface 11F of the vapor deposition mask 11M is a part of the surface 10F of the vapor deposition mask intermediate 10 , and the back surface 11R of the vapor deposition mask 11M is a part of the back surface 10R of the vapor deposition mask intermediate 10 .

The mask frame 21 has a rectangular frame shape. The mask frame 21 is made of metal. Preferably, the mask frame 21 is formed of the same metal as the metal forming the evaporation mask 11M.

A part of the surface 11F of each vapor deposition mask 11M is joined to the mask frame 21 . Each vapor deposition mask 11M is joined to the mask frame 21 so that the plurality of mask portions 11 a provided in the vapor deposition mask 11M are located in the openings divided by the mask frame 21 . Each vapor deposition mask 11M is joined to the mask frame 21 in the longitudinal direction DL at a portion between one notch 11e22 and the mask portion 11a closest to the notch 11e22. In addition, each vapor deposition mask 11M is joined to the mask frame 21 in the longitudinal direction DL at a portion between the other notch 11e22 and the mask portion 11a closest to the notch 11e22.

FIG. 5 shows an enlarged view of area A in FIG. 4 . Area A includes the bend in the notch 11e22. Furthermore, FIG. 5 shows the structure of the area A in the case where the fragile line 11RC1 includes a half-etched line and a plurality of through-holes located on the half-etched line.

As shown in FIG. 5 , the cutting mark 11em is located on the side of the dividing notch 11e22. The cutting mark 11em is a portion formed by cutting the fragile line 11RC1. The cutting mark 11em has a plurality of curls 11em1 and a plurality of depressions 11em2. In the direction in which the cutting mark 11em extends, the curls 11em1 and the depressions 11em2 are alternately arranged. On the cutting mark 11em, a plurality of curls 11em1 are formed by cutting the half-etched line. On the cutting mark 11em, each depression 11em2 is a part corresponding to each through hole.

Furthermore, when the fragile line 11RC1 is only a half-etched line, the cutting mark 11em is curled over almost the entire notch 11e22. In addition, when the fragility line 11RC1 is formed by a plurality of through-holes and a part of the sheet between the through-holes, the cutting mark has curls and depressions arranged alternately along the notch 11e22.

As shown in FIG. 6 , after each vapor deposition mask 11M is joined to the mask frame 21 , in each vapor deposition mask 11M, the portion including the notch 11e22 is cut off from the portion including the mask portion 11a. Then, the mask device 20 including the vapor deposition mask 11M with the portion including the notch 11e22 cut off is attached to the vapor deposition device.

[Manufacturing method of vapor deposition mask] The manufacturing method of the vapor deposition mask includes a process of forming the vapor deposition mask intermediate 10 from a metal sheet and a process of forming the vapor deposition mask 11M from the strip portion 11 of the vapor deposition mask intermediate 10 .

As described above, the vapor deposition mask intermediate 10 formed in the formation of the vapor deposition mask intermediate 10 includes the strip-shaped portion 11 , the frame-shaped portion 12 and the connecting portion 13 . The belt-shaped portion 11 has: a linear fragile line 11RC1, which is connected to the short side 11e2 and has a protruding shape from the short side 11e2 toward the other short side 11e2; and a line segment 11e21, which is sandwiched between the short side 11e2. both ends; and the resection area 11RC, which is surrounded by the fragile line 11RC1 and includes the line segment 11e21 and the fragile line 11RC1. The vapor deposition mask intermediate 10 has a through hole 11RC2 in the cutout area 11RC, and the through hole 11RC2 is connected to a part of the edge surrounding the cutout area 11RC.

According to this manufacturing method of the vapor deposition mask 11M, when the vapor deposition mask intermediate 10 is formed, compared with the case where the through hole 11RC2 is formed in the entire cutout area 11RC, the resist mask used for etching the sheet is , the size of the through hole used to form the through hole 11RC2 can be reduced. Thereby, the area of the sheet that is exposed from the through holes of the resist mask can be reduced, and therefore the area of the sheet that is in contact with the etching liquid can be reduced.

Thereby, during etching of the sheet, the etching liquid can be prevented from surrounding the sheet and the resist mask. In addition, by reducing the area in contact with the etching liquid, the etching amount of the sheet is less likely to be affected by the flow rate of the etching liquid. Therefore, the precision of the patterned shape of the sheet can be improved.

As described above, according to one embodiment of the vapor deposition mask intermediate, the vapor deposition mask, and the manufacturing method of the vapor deposition mask, the effects described below can be obtained. (1) The etching liquid is difficult to surround between the resist mask and the sheet, and the shape of the vapor deposition mask intermediate 10 formed by wet etching is difficult to be affected by the flow rate of the etching liquid used for wet etching. . Therefore, the shape accuracy of pattern processing can be improved.

(2) The through hole 11RC2 can be used as a starting point to cut both the short side fragile line 13a and the fragile line 11RC1. Therefore, compared with the case where the through hole 11RC2 is not connected to the line segment 11e21 and the fragile line 11RC1, it is easier to cut the short side fragile line 13a and the fragile line 11RC1.

(3) The bent part of the fragile line 11RC1 can be cut off by the through hole 11RC2. Therefore, compared with the case where the through hole 11RC2 extends along the short side 11e2, it is easier to cut the fragile line 11RC1.

(4) Since the resection area 11RC is divided into two parts by the through hole 11RC2, it is difficult to remove the two parts of the resection area 11RC compared with the case where the resection area 11RC is divided into two parts by the through hole 11RC2 with deviation. There is a difference in the load required by dividing each part. Therefore, the cutout area 11RC is easily removed.

(5) The cutout region 11RC after the through hole 11RC2 is formed is stably supported by the frame portion 12 . Therefore, when the vapor deposition mask intermediate 10 is transported, the cutout area 11RC can be suppressed from being cut off from the frame portion 12 .

(6) Since the through hole 11RC2 passes through the fragile line 11RC1 and the connecting portion 13, the through hole 11RC2 can be used as a starting point to cut both the fragile line 11RC1 and the connecting portion 13. Therefore, compared with the case where the through hole 11RC2 does not pass through the fragile line 11RC1 and the connecting portion 13, it is easier to cut the fragile line 11RC1 and the connecting portion 13.

[Modification] Furthermore, the above-described embodiment can be modified and implemented as follows. [through hole] ・A plurality of through holes may be formed in the resection area 11RC. That is, the band-shaped portion 11 may have a plurality of through holes 11RC2.

For example, as shown in FIG. 7 , the through hole 11RC2 may have two through holes 11RC2. In the example shown in FIG. 7 , two through holes 11RC2 are connected to the second virtual line L2, and a V shape is formed by the two through holes 11RC2. In this case, the same effect as the above-mentioned (2) can be obtained. Furthermore, the band-shaped portion 11 may have three or more through holes 11RC2.

・As shown in FIG. 8 , the belt-shaped portion 11 may have a through-hole 11RC2 extending in the width direction DW and connected only to the fragile line 11RC1. That is, the band-shaped portion 11 may have the through-hole 11RC2 connected only to the second virtual line L2. In this case, since the band-shaped portion 11 has the through-hole 11RC2 located in a part of the cut-out region 11RC, the same effect as the above-mentioned (1) can be obtained.

Furthermore, in the through hole 11RC2 extending in the width direction DW, only one end portion may be connected to the fragile line 11RC1, that is, the second virtual line L2, or both ends may not be connected to the fragile line 11RC1, that is, the fragile line 11RC1. Second virtual line L2. In any case, since the band-shaped portion 11 has the through-hole 11RC2 located in a part of the cut-out region 11RC, the same effect as the above-mentioned (1) can be obtained.

・As shown in FIG. 9 , the through hole 11RC2 may have a part extending in the width direction DW in addition to a part extending in the longitudinal direction DL. That is, the through hole 11RC2 may have a cross shape. In this case, the through hole 11RC2 is connected to the fragile line 11RC1 at three locations. In other words, three locations on the second imaginary line L2 of the through hole 11RC2 are connected to the second imaginary line L2. Therefore, compared with the case where the through hole 11RC2 is connected to the second imaginary line L2 at only one location on the second imaginary line L2, it is easier to cut the fragile line 11RC1.

Furthermore, in the through-hole 11RC2 having a cross shape, one or more of the four end portions may not be connected to the edge surrounding the cutout area 11RC. In this case, since the band-shaped portion 11 has the through-hole 11RC2 located in a part of the cut-out region 11RC, the same effect as the above-mentioned (1) can be obtained.

・The through hole 11RC2 shown in Figure 9 can also be changed into a T-shaped through hole. That is, the through hole 11RC2 may have a T-shape having one location connected to the line segment 11e21 and two locations connected to the fragile line 11RC1. In other words, the through hole may have a T-shape having one location connected to the first imaginary line L1 and two locations connected to the second imaginary line L2. Alternatively, the through hole may have a T-shape at three locations connected to the fragile line 11RC1. In other words, the through hole may have a T-shape at three locations connected to the second virtual line L2. In this case, since the band-shaped portion 11 has the through-hole 11RC2 located in a part of the cut-out region 11RC, the same effect as the above-mentioned (1) can be obtained.

・As shown in Fig. 10, the through hole 11RC2 may have a rhombus shape. The through hole 11RC2 is connected to one location on the line segment 11e21 and three locations on the fragile line 11RC1. In other words, the through hole 11RC2 is connected to one location on the first imaginary line L1 and three locations on the second imaginary line L2. In this case, since the band-shaped portion 11 has the through-hole 11RC2 located in a part of the cut-out region 11RC, the same effect as the above-mentioned (1) can be obtained. Furthermore, in the rhombus-shaped through hole 11RC2, one or more of the four corners may not be connected to the edge surrounding the cutout area 11RC. In this case, the same effect as in (1) mentioned above can be obtained.

・The through hole 11RC2 may be located within the cutout area 11RC and not connected to the edge of the cutout area 11RC. In this case, since the strip 11 has the through hole 11RC2 in the cutout area 11RC, the same effect as (1) described above can be obtained. However, by connecting the through hole 11RC2 to the edge of the cutout area 11RC, the short-side fragile line 13a and the fragile line 11RC1 surrounding the cutout area 11RC can be easily cut. Furthermore, the through hole 11RC2 may have any shape, for example, it may have a polygonal shape such as a triangle or a quadrilateral, a circle, or the like.

[Connection Department] As shown in FIG. 11 , the connection part 13 may include a short-side fragile line 13a and a bridge part 13b. In the vapor deposition mask intermediate 10, the peripheral portion 11b and the frame portion 12 have a first plate thickness. The plurality of bridge portions 13b are located at intervals along the edge 11e of the strip-shaped portion 11, and each bridge portion 13b has a first plate thickness. The slit 10S is arranged along the edge 11e of the belt-shaped portion 11 except for the portion where the connecting portion 13 is connected. Since the slit 10S is disposed along the edge 11e of the strip 11 other than the portion where the connecting portion 13 is connected, it is easy to cut the bridge portion 13b.

10: Evaporation mask intermediate 10F: Surface 10R: Back 10S: Gap 11: Band part 11a: Mask part 11b: Peripheral Department 11e:Edge 11e1: Long side 11e2: short side 11e21: Line segment 11h: Mask hole 11hL: Large hole 11hS: small hole 11RC:Resection area 11RC1: fragile line 11RC2:Through hole 11M: Evaporation mask 11F: Surface 11R: Back 11e22: Gap 11em: cutting mark 11em1:curl 11em2:dent 12: Frame part 13:Connection Department 13a: Short side fragile line DL: length direction DW: width direction L1: first virtual line L2: Second virtual line RC21: first end RC22: Second end 20: Masking device 21: Mask frame

FIG. 1 is a plan view showing the structure of a vapor deposition mask intermediate according to one embodiment. FIG. 2 is a cross-sectional view showing the structure of the mask portion of the strip-shaped portion shown in FIG. 1 . FIG. 3 is a top view showing all the cut-out areas and the peripheral structure of the cut-out areas in the vapor deposition mask intermediate shown in FIG. 1 . FIG. 4 is a plan view showing a state in which a vapor deposition mask obtained from the vapor deposition mask intermediate shown in FIG. 1 is joined to a mask frame. FIG. 5 is an enlarged plan view showing the area A shown in FIG. 4 . FIG. 6 is a plan view showing a partially cutaway state of the vapor deposition mask shown in FIG. 4 . 7 is a plan view showing all the cut-out areas and the peripheral structure of the cut-out areas in the vapor deposition mask intermediate according to the first modification example. 8 is a plan view showing all the cut-out areas and the peripheral structure of the cut-out areas in the vapor deposition mask intermediate according to the second modification example. 9 is a plan view showing all the cut-out areas and the peripheral structure of the cut-out areas in the vapor deposition mask intermediate according to the third modification example. FIG. 10 is a plan view showing all the cut-out areas and the peripheral structure of the cut-out areas in the vapor deposition mask intermediate according to the fourth modification example. FIG. 11 is a plan view showing the structure of a vapor deposition mask intermediate according to a fifth modification example.

11: Band part

11e2: short side

11e21: Line segment

11RC:Resection area

11RC1: fragile line

11RC2:Through hole

12: Frame part

13:Connection Department

13a: Short side fragile line

DL: length direction

DW: width direction

L1: first virtual line

L2: Second virtual line

RC21: first end

RC22: Second end

Claims (8)

An evaporation mask intermediate is formed from a metal sheet and is provided with: a strip-shaped portion, which includes an edge with a pair of long sides and a pair of short sides, and a mask portion with a plurality of mask holes; a frame-shaped portion surrounding the belt-shaped portion; and a connecting portion located between at least the short side of the belt-shaped portion and the frame-shaped portion, and connecting the belt-shaped portion to the frame-shaped portion, the belt The shape part has: a linear fragile line, both ends of which are connected to the short side and have a protruding shape from the short side toward the other short side; a line segment is clamped at the two ends of the short side; and cut off The area is surrounded by the fragility line and includes the line segment and the fragility line. The vapor deposition mask intermediate has a through hole in the resection area, and the through hole is connected to a part of the edge surrounding the resection area. The evaporation mask intermediate of claim 1, wherein the through hole has a shape extending from the first end toward the second end, the first end is connected to the line segment, and the second end is connected to the fragile String. The evaporation mask intermediate of Claim 2, wherein the fragile line has a substantially U-shape, and the through-hole has a strip shape extending along the long side. Such as the evaporation mask intermediate of claim 3, wherein the first end is two equal parts of the line segment in the direction in which the short side extends. The second end portion divides the length of the fragile line into two equal parts. The evaporation mask intermediate of claim 4, wherein in the direction in which the short side extends, the sum of the length of the first end and the length of the second end is the first length, and the length of the line segment is the same as the length of the second end. The sum of the lengths of the fragile lines is the second length, and the second length is longer than the first length. The evaporation mask intermediate of claim 1, wherein the through hole has a strip shape connecting the position closest to the other short side in the cut-out area and the position opposite to the short side in the frame-shaped portion. . An evaporation mask, which is a strip-shaped evaporation mask, and is provided with: an edge, which has a pair of long sides and a pair of short sides; and a mask part, which has a plurality of mask holes, and each short side includes Notch, the notch has a U-shape recessed toward the other short side, and has two straight portions and a curved portion connecting the ends of each straight portion; the aforementioned curved portion in the aforementioned notch has an etching mark and a cut The etching mark is arranged in the bending portion at the position closest to the other short side and is etched covering the entire thickness direction of the evaporation mask; the cutting mark is formed by the aforementioned cutting mark. Etching marks are the cutting marks of a plurality of half-etched lines separated by etching marks. A method for manufacturing an evaporation mask, which has the following processes: Process: forming a vapor deposition mask intermediate from a metal sheet. The vapor deposition mask intermediate has a belt-shaped part, a frame-shaped part and a connecting part. The belt-shaped part includes a pair of long sides and a pair of short sides. The edge, and the mask portion having a plurality of mask holes, the frame-shaped portion surrounds the aforementioned band-shaped portion, the connecting portion is located between at least the short side of the aforementioned band-shaped portion and the aforementioned frame-shaped portion, and connects the aforementioned The belt-shaped part is connected to the aforementioned frame-shaped part; and an evaporation mask is formed from the aforementioned belt-shaped part. The aforementioned belt-shaped part is provided with: a linear fragile line, both ends of which are connected to the aforementioned short side, and have a direction from the short side toward the other side. A protrusion of a short side; a line segment, clamped at the two ends of the aforementioned short side; and a resection area, surrounded by the aforementioned fragile line, and including the aforementioned line segment and the aforementioned fragile line, the aforementioned evaporation mask intermediate, There is a through-hole in the cut-out area, and the through-hole is connected to a part of the edge surrounding the cut-out area.