TW202142658A - Adhesive sheet - Google Patents

Adhesive sheet Download PDF

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TW202142658A
TW202142658A TW110111288A TW110111288A TW202142658A TW 202142658 A TW202142658 A TW 202142658A TW 110111288 A TW110111288 A TW 110111288A TW 110111288 A TW110111288 A TW 110111288A TW 202142658 A TW202142658 A TW 202142658A
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TW
Taiwan
Prior art keywords
mpa
elongation
tensile stress
less
adhesive sheet
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TW110111288A
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Chinese (zh)
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佐佐木遼
川田智史
河原田有紀
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日商琳得科股份有限公司
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Publication of TW202142658A publication Critical patent/TW202142658A/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16Dicarboxylic acids and dihydroxy compounds
    • C08G63/18Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/199Acids or hydroxy compounds containing cycloaliphatic rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Abstract

This adhesive sheet comprises a substrate and an adhesive layer, the substrate not containing chlorine atoms. When a reference direction is any one direction in plan view of the substrate, and a first measurement direction is a direction in which the amount of rise of tensile stress, obtained by subtracting the tensile stress at 100% elongation from the tensile stress at 200% elongation, is smallest among a total of 18 directions in which an angle formed with the reference direction in plan view is 0 DEG, 10 DEG, 20 DEG, 30 DEG, 40 DEG, 50 DEG, 60 DEG, 70 DEG, 80 DEG, 90 DEG, 100 DEG, 110 DEG, 120 DEG, 130 DEG, 140 DEG, 150 DEG, 160 DEG, and 170 DEG, then all tensile stresses from 10% elongation to 100% elongation in the first measurement direction are in a range of 8-30 MPa, and all tensile stresses from 100% elongation to 200% elongation in the first measurement direction are in a range of 10-40 MPa. The adhesive sheet has excellent expandability.

Description

黏著片Adhesive sheet

本發明係有關於能夠適用於作為半導體晶圓等的工件的加工時所使用的工件加工用片之黏著片。The present invention relates to an adhesive sheet that can be applied to a workpiece processing sheet used in the processing of a workpiece such as a semiconductor wafer.

矽、砷化鎵等的半導體晶圓和各種封裝體類以大尺寸的狀態製造,切斷(切割,dicing)成晶片並剝離(拾取,pickup)之後,移轉至下一步的組裝製程。此時,半導體晶圓等的工件在貼附於包括基材及黏著劑層的黏著片(以下有時稱為「工件加工用片」 )上的狀態下,對其進行晶背研磨、切割、清洗、乾燥、擴片、拾取、組裝等的加工。Semiconductor wafers such as silicon and gallium arsenide and various packages are manufactured in a large-scale state. After cutting (dicing) into wafers and peeling (pickup), they are transferred to the next assembly process. At this time, the workpiece such as a semiconductor wafer is attached to an adhesive sheet (hereinafter sometimes referred to as a "workpiece processing sheet") including a base material and an adhesive layer, and the wafer is ground, cut, and diced. Processing such as cleaning, drying, expanding, picking, and assembling.

作為上述切割的手法之一,有一種藉由旋轉的圓形刀片(切割刀)將工件切斷的方法。在這種方法中,為了確保工件被切斷,通常會與工件一起將貼附於該工件上的工件加工用片也局部地切斷。像這樣在將工件加工用片與工件一起切斷的情況下,工件加工用片有時候會產生構成黏著劑層及基材的材料所形成的切削屑。As one of the above-mentioned cutting methods, there is a method of cutting the workpiece with a rotating circular blade (cutting knife). In this method, in order to ensure that the workpiece is cut, usually the workpiece processing sheet attached to the workpiece is also partially cut together with the workpiece. In the case where the workpiece processing sheet is cut together with the workpiece in this manner, the workpiece processing sheet may generate cutting chips formed by the materials constituting the adhesive layer and the base material.

若在切削屑大量附著於晶片上時直接進行晶片的密封,則附著於晶片上的切削屑會因密封的熱能而分解,這種熱分解物會破壞封裝體、或成為造成所得到的裝置運作不良的原因等。由於難以藉由清洗來去除這種切削屑,因此由於切削屑的產生而顯著地降低了切割製程的產率。因此,在利用旋轉的圓形刀片進行切割的情況下,需要防止切削屑的產生。If the chip is directly sealed when a large amount of chips are attached to the chip, the chips attached to the chip will be decomposed by the heat of the sealing. This thermal decomposition product will damage the package or cause the operation of the resulting device. Causes of defects, etc. Since it is difficult to remove such cutting chips by cleaning, the production of cutting chips significantly reduces the productivity of the cutting process. Therefore, in the case of cutting with a rotating circular blade, it is necessary to prevent the generation of cutting chips.

以抑制上述切削屑的產生為目的,專利文獻1公開了一種發明,其使用受到1~80Mrad的電子束或γ(伽馬,Gamma)射線所照射的聚烯烴類膜作為切割片的基材膜。可認為在該發明中,藉由電子束或γ射線的照射在構成基材膜的樹脂中形成了共價鍵的交聯,進而抑制了切削屑的產生。 [現有技術文獻] [專利文獻]For the purpose of suppressing the generation of cutting chips, Patent Document 1 discloses an invention that uses a polyolefin-based film irradiated with 1 to 80 Mrad of electron beams or γ (gamma) rays as the base film of the dicing sheet . It is considered that in this invention, the crosslinking of covalent bonds is formed in the resin constituting the base film by irradiation of electron beams or gamma rays, thereby suppressing the generation of cutting chips. [Prior Art Literature] [Patent Literature]

[專利文獻1] 日本專利特開平第5-211234號公報[Patent Document 1] Japanese Patent Laid-Open No. 5-211234

[發明所欲解決的課題][The problem to be solved by the invention]

在上述拾取的製程中,為了容易拾取半導體晶片,有時會從工件加工用片的與積層了半導體晶片的表面相反的表面,將半導體晶片個別地往上取起。特別是,為了抑制拾取時半導體晶片彼此之間的碰撞並同時利於拾取,通常會將工件加工用片延伸(擴展),以使得半導體晶片彼此分離。因此,工件加工用片需要具有可良好地擴展的優異的可撓性。In the above-mentioned pickup process, in order to easily pick up the semiconductor wafers, the semiconductor wafers may be individually picked up from the surface of the workpiece processing sheet opposite to the surface on which the semiconductor wafers are laminated. In particular, in order to suppress collisions between the semiconductor wafers during pick-up and facilitate pick-up at the same time, the workpiece processing sheet is usually extended (expanded) so that the semiconductor wafers are separated from each other. Therefore, the sheet for workpiece processing needs to have excellent flexibility that can be expanded well.

然而,如專利文獻1所公開的以往的切割片並不具有充分的擴展性。However, the conventional dicing sheet disclosed in Patent Document 1 does not have sufficient expandability.

本發明係有鑑於這種情況而完成的,目的在於提供具有良好的擴展性的黏著片。 [用於解決課題的手段]The present invention was completed in view of this situation, and aims to provide an adhesive sheet with good expandability. [Means used to solve the problem]

為了達成上述目的,首先,本發明提供了一種黏著片,其係包括基材、和積層於前述基材的一表面側上的黏著劑層之黏著片,其中前述基材不含有氯原子,且以前述基材的平面視角的任意一方向作為基準方向,在前述基準方向與平面視角之間所形成的角度為0°、10°、20°、30°、40°、50°、60°、70°、80°、90°、100°、110°、120°、130°、140°、150°、160°及170°共18個方向之中,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量最小之方向設為第一測量方向的情況下,對於前述基材,在前述第一測量方向上,從伸長10%時至伸長100%時的拉伸應力全部皆介於8MPa以上、30MPa以下的範圍內,且對於前述基材,在前述第一測量方向上,從伸長100%時至伸長200%時的拉伸應力全部皆介於10MPa以上、40MPa以下的範圍內(發明1)。In order to achieve the above object, first of all, the present invention provides an adhesive sheet comprising a substrate and an adhesive layer laminated on one surface side of the substrate, wherein the substrate does not contain chlorine atoms, and Taking any one direction of the plane viewing angle of the aforementioned substrate as the reference direction, the angle formed between the aforementioned reference direction and the plane viewing angle is 0°, 10°, 20°, 30°, 40°, 50°, 60°, Among 18 directions of 70°, 80°, 90°, 100°, 110°, 120°, 130°, 140°, 150°, 160° and 170°, the tensile stress at 200% elongation is reduced In the case where the direction in which the increase in tensile stress obtained by the tensile stress at 100% elongation is the smallest is set as the first measurement direction, for the substrate, in the first measurement direction, from 10% elongation to elongation The tensile stress at 100% is all within the range of 8 MPa or more and 30 MPa or less, and for the aforementioned substrate, in the aforementioned first measurement direction, the tensile stress from 100% elongation to 200% elongation is all Within the range of 10 MPa or more and 40 MPa or less (Invention 1).

根據上述發明(發明1)的黏著片,由於基材滿足上述拉伸應力的條件,因此變得具有優異的可撓性,且能夠良好地進行擴片。According to the adhesive sheet of the aforementioned invention (Invention 1), since the base material satisfies the aforementioned conditions of tensile stress, it has excellent flexibility and can be expanded well.

在上述發明(發明1)中,對於前述基材,在前述第一測量方向上,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量以1MPa以上、20MPa以下為佳(發明2)。In the above invention (Invention 1), for the substrate, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation by the tensile stress at 100% elongation in the first measurement direction 1 MPa or more and 20 MPa or less are preferable (Invention 2).

在上述發明(發明1、2)中,將為前述基材的平面視角的一方向且與前述第一測量方向之間所形成的角度為90°之方向設為第二測量方向的情況下,對於前述基材,在前述第二測量方向上,從伸長10%時至伸長100%時的拉伸應力以全部皆介於5MPa以上、30MPa以下的範圍內為佳,且對於前述基材,在前述第二測量方向上,從伸長100%時至伸長200%時的拉伸應力以全部皆介於10MPa以上、40MPa以下的範圍內為佳(發明3)。In the above inventions (Inventions 1 and 2), when one direction of the planar viewing angle of the substrate and a direction formed by an angle of 90° with the first measurement direction is set as the second measurement direction, For the aforementioned substrate, in the aforementioned second measurement direction, the tensile stress from 10% elongation to 100% elongation is preferably all within the range of 5 MPa or more and 30 MPa or less, and for the aforementioned substrate, In the aforementioned second measurement direction, it is preferable that all the tensile stresses from 100% elongation to 200% elongation are within the range of 10 MPa or more and 40 MPa or less (Invention 3).

在上述發明(發明3)中,對於前述基材,在前述第二測量方向上,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量以1MPa以上、20MPa以下為佳(發明4)。In the aforementioned invention (Invention 3), for the aforementioned substrate, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation by the tensile stress at 100% elongation in the aforementioned second measurement direction 1 MPa or more and 20 MPa or less are better (Invention 4).

在上述發明(發明1~4)中,前述基材在前述第一測量方向上的拉伸彈性模量以100MPa以上、1000MPa以下為佳(發明5)。In the above inventions (Inventions 1 to 4), the tensile modulus of the substrate in the first measurement direction is preferably 100 MPa or more and 1000 MPa or less (Invention 5).

在上述發明(發明1~5)中,前述基材在前述第一測量方向上的斷裂伸長率以100%以上、1000%以下為佳(發明6)。In the above inventions (Inventions 1 to 5), the elongation at break of the substrate in the first measurement direction is preferably 100% or more and 1000% or less (Invention 6).

在上述發明(發明1~6)中,對於將在前述第一測量方向上進行前述基材的拉伸試驗的情況下所測量出的結果繪製在以拉伸伸長率(單位:%)為橫軸且以拉伸應力(單位:MPa)為縱軸的座標平面上而得到的曲線,以前述曲線中不存在成為極大值的點為佳,或者前述曲線中存在至少一個成為極大值的點及一個成為極小值的點,而且,在前述成為極大值的點之中前述拉伸伸長率為最小值的點之前述拉伸應力的值、與在前述成為極小值的點之中前述拉伸伸長率為最小值的點之前述拉伸應力的值之間的差異的絕對值以2.0MPa以下為佳(發明7)。In the aforementioned inventions (Inventions 1 to 6), the results measured when the aforementioned substrate is subjected to the tensile test in the aforementioned first measurement direction are plotted on the basis of the tensile elongation (unit: %) as the horizontal The curve obtained on the coordinate plane with the tensile stress (unit: MPa) as the vertical axis is preferably that there is no point that becomes a maximum in the aforementioned curve, or there is at least one point that becomes a maximum in the aforementioned curve, and A point that becomes a minimum value, and the value of the tensile stress at the point where the tensile elongation is the minimum among the points where the maximum value is, and the tensile elongation at the point where the minimum value is The absolute value of the difference between the aforementioned tensile stress values at the point where the ratio is the minimum is preferably 2.0 MPa or less (Invention 7).

在上述發明(發明1~7)中,前述基材以不含有鹵素原子為佳(發明8)。In the above inventions (Inventions 1 to 7), the aforementioned substrate preferably does not contain halogen atoms (Invention 8).

在上述發明(發明1~8)中,以作為工件加工用片使用為佳(發明9)。Among the above inventions (Inventions 1 to 8), it is preferable to use it as a sheet for workpiece processing (Invention 9).

在上述發明(發明9)中,前述工件加工用片以切割片為佳(發明10)。 [本發明的效果]In the above invention (Invention 9), the aforementioned workpiece processing sheet is preferably a dicing sheet (Invention 10). [Effects of the invention]

根據本發明的黏著片具有良好的擴展性。The adhesive sheet according to the present invention has good expandability.

以下,對本發明的實施形態進行說明。 根據本實施形態的黏著片包括基材、和積層於該基材的一表面側上的黏著劑層。該黏著片可以像一般的黏著片一樣使用於各種的用途,但特別適合使用於作為為了加工半導體晶圓等的工件時所使用的工件加工用片。尤其是,根據本實施形態的黏著片適合使用於作為為了拾取半導體晶片等的工件的片材。Hereinafter, an embodiment of the present invention will be described. The adhesive sheet according to this embodiment includes a base material and an adhesive layer laminated on one surface side of the base material. This adhesive sheet can be used for various applications like general adhesive sheets, but it is particularly suitable for use as a workpiece processing sheet used for processing workpieces such as semiconductor wafers. In particular, the adhesive sheet according to this embodiment is suitable for use as a sheet for picking up workpieces such as semiconductor wafers.

1.黏著片的構造 (1)基材 本實施形態中的基材不含有氯原子。由於不含有氯原子,因此根據本實施形態的黏著片變得容易減輕環境負荷。另外,本文中所謂的「不含有氯原子」也包括實質上不含有氯原子的情況。亦即,本實施形態中的基材也可以例如在製造的過程中無意間混入了極微量的包含氯原子的成分。在此情況下,基材中的氯原子的含量也可以是0.005質量%以下,特別是也可為0.003質量%以下,且進一步也可為0.0001質量%以下。1. The structure of the adhesive sheet (1) Substrate The base material in this embodiment does not contain chlorine atoms. Since it does not contain chlorine atoms, the pressure-sensitive adhesive sheet according to this embodiment can easily reduce the environmental load. In addition, the "no chlorine atom" as used herein also includes the case where a chlorine atom is not substantially contained. That is, the base material in this embodiment may be inadvertently mixed with a very small amount of a component containing a chlorine atom during the manufacturing process, for example. In this case, the content of chlorine atoms in the base material may be 0.005% by mass or less, particularly 0.003% by mass or less, and further, may be 0.0001% by mass or less.

而且,本實施形態中的基材,在將其平面視角中預定的方向設為第一測量方向的情況下,在該第一測量方向上,從伸長10%時至伸長100%時的拉伸應力全部皆介於8MPa以上、30MPa以下的範圍內,且在該第一測量方向上,從伸長100%時至伸長200%時的拉伸應力全部皆介於10MPa以上、40MPa以下的範圍內。Furthermore, in the case of the substrate in the present embodiment, when the predetermined direction in its planar viewing angle is set as the first measurement direction, the stretching in the first measurement direction from 10% elongation to 100% elongation The stresses are all within the range of 8 MPa or more and 30 MPa or less, and in the first measurement direction, the tensile stresses from 100% elongation to 200% elongation are all within the range of 10 MPa or more and 40 MPa or less.

根據本實施形態的黏著片,由於基材滿足這些條件,因此變得具有非常優異的可撓性。因此,根據本實施形態的黏著片在使用於工件的加工時,變得可進行良好的擴展。如此一來,在後續的拾取製程中,變得容易從晶片的背面往上取起,故變得可進行良好的拾取。According to the adhesive sheet of this embodiment, since the base material satisfies these conditions, it has very excellent flexibility. Therefore, when the adhesive sheet according to this embodiment is used for processing a workpiece, it can be expanded well. In this way, in the subsequent pick-up process, it becomes easy to pick up from the back of the wafer, so it becomes possible to perform good pick-up.

此處,上述第一測量方向,簡而言之意指在進行基材的拉伸試驗的情況下,從伸長100%時至伸長200%時的拉伸應力的增加量變得最小之拉伸的方向。更具體而言,以基材的平面視角的任意一方向作為基準方向,在該基準方向與平面視角之間所形成的角度為0°、10°、20°、30°、40°、50°、60°、70°、80°、90°、100°、110°、120°、130°、140°、150°、160°及170°共18個方向之中,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量為最小之方向係第一測量方向。Here, the above-mentioned first measurement direction means, in short, the tensile stress from 100% elongation to 200% elongation when the increase in tensile stress becomes the smallest in the case of a tensile test of the base material. direction. More specifically, taking any direction of the planar viewing angle of the substrate as the reference direction, the angle formed between the reference direction and the planar viewing angle is 0°, 10°, 20°, 30°, 40°, 50° , 60°, 70°, 80°, 90°, 100°, 110°, 120°, 130°, 140°, 150°, 160° and 170° in 18 directions. The direction in which the increase in tensile stress obtained by subtracting the tensile stress at 100% elongation from the tensile stress is the smallest is the first measurement direction.

另外,在基材為如後續描述的樹脂膜的情況下,與其製造時的輸送方向垂直的方向(TD方向)大多與上述第一測量方向一致。In addition, in the case where the substrate is a resin film as described later, the direction (TD direction) perpendicular to the transport direction at the time of manufacture often coincides with the above-mentioned first measurement direction.

從更有效地實現良好的擴展性的觀點來看,從伸長10%時至伸長100%時的拉伸應力所介於的範圍的下限值以9MPa以上為佳,且以10MPa以上為特佳。再者,該範圍的上限值以25MPa以下為佳,以20MPa以下為特佳,且以15MPa以下為更佳。From the viewpoint of achieving good extensibility more effectively, the lower limit of the range of the tensile stress from 10% elongation to 100% elongation is preferably 9 MPa or more, and particularly preferably 10 MPa or more . Furthermore, the upper limit of the range is preferably 25 MPa or less, particularly preferably 20 MPa or less, and more preferably 15 MPa or less.

再者,從同樣的觀點來看,上述從伸長100%時至伸長200%時的拉伸應力所介於的範圍的下限值以11MPa以上為佳,且以12MPa以上為特佳。再者,該範圍的上限值以30MPa以下為佳,且以20MPa以下為特佳。In addition, from the same viewpoint, the lower limit of the range of the tensile stress from 100% elongation to 200% elongation is preferably 11 MPa or more, and particularly preferably 12 MPa or more. Furthermore, the upper limit of the range is preferably 30 MPa or less, and particularly preferably 20 MPa or less.

另外,上述拉伸應力的測量方法的細節,如後續描述的試驗例所記載。In addition, the details of the above-mentioned tensile stress measurement method are as described in the test example described later.

(1-1)基材的物性 本實施形態中的基材,在第一測量方向上,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量以1MPa以上為佳,以1.5MPa以上為特佳,且以1.8MPa以上為更佳。再者,上述增加量以20MPa以下為佳,以15MPa以下為較佳,以10MPa以下為特佳,且以5MPa以下為更佳。由於上述增加量為1MPa以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述增加量為20MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述增加量,根據本實施形態的黏著片變得具有更加優異的擴展性。(1-1) Physical properties of base material For the substrate in this embodiment, in the first measurement direction, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation by the tensile stress at 100% elongation is preferably 1 MPa or more. 1.5 MPa or more is particularly preferable, and 1.8 MPa or more is more preferable. Furthermore, the above-mentioned increase is preferably 20 MPa or less, preferably 15 MPa or less, particularly preferably 10 MPa or less, and more preferably 5 MPa or less. Since the amount of increase is 1 MPa or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and it becomes easy to effectively suppress the breakage of the base material. On the other hand, since the increase amount is 20 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easy to separate well. Therefore, by satisfying the above-mentioned increase amount, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第一測量方向上,將伸長200%時的拉伸應力減掉伸長10%時的拉伸應力所得到的拉伸應力的增加量以0.5MPa以上為佳,以1MPa以上為較佳,以1.5MPa以上為特佳,且以2MPa以上為更佳。再者,上述增加量以25MPa以下為佳,以15MPa以下為特佳,且以5MPa以下為更佳。由於上述增加量為0.5MPa以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述增加量為25MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述增加量,根據本實施形態的黏著片變得具有更加優異的擴展性。Furthermore, for the substrate in this embodiment, in the first measurement direction, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation from the tensile stress at 10% elongation is 0.5 MPa or more Preferably, 1 MPa or more is preferable, 1.5 MPa or more is particularly preferable, and 2 MPa or more is more preferable. Furthermore, the above increase amount is preferably 25 MPa or less, particularly preferably 15 MPa or less, and more preferably 5 MPa or less. Since the increase is 0.5 MPa or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and therefore it becomes easy to effectively suppress the breakage of the base material. On the other hand, since the amount of increase is 25 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easily and well separated from each other. Therefore, by satisfying the above-mentioned increase amount, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第一測量方向上,伸長200%時的拉伸應力相對於伸長100%時的拉伸應力的比例以0.5以上為佳,以0.75以上為特佳,且以1以上為更佳。再者,上述比例以3以下為佳,以2.5以下為較佳,以2以下為特佳,且以1.5以下為更佳。由於上述比例為0.5以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述比例為3以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述比例,根據本實施形態的黏著片變得具有更加優異的擴展性。Furthermore, in the first measurement direction of the substrate in this embodiment, the ratio of the tensile stress at 200% elongation to the tensile stress at 100% elongation is preferably 0.5 or more, particularly preferably 0.75 or more , And more preferably 1 or more. Furthermore, the above ratio is preferably 3 or less, preferably 2.5 or less, particularly preferably 2 or less, and more preferably 1.5 or less. Since the above-mentioned ratio is 0.5 or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and it becomes easy to effectively suppress the cracking of the base material. On the other hand, since the above-mentioned ratio is 3 or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to be stretched uniformly, so that the wafers become easy to separate well. Therefore, by satisfying the above ratio, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第一測量方向上的拉伸彈性模量以100MPa以上為佳,以200MPa以上為特佳,且以300MPa以上為更佳。再者,上述拉伸彈性模量以1000MPa以下為佳,以800MPa以下為特佳,且以600MPa以下為更佳。由於上述拉伸彈性模量為100MPa以上,因此本實施形態中的基材變得容易具有適當的強度,且在黏著片變得具有良好的操作性的同時,也變得容易良好地進行所期望的工件加工。此外,在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。再者,由於上述拉伸彈性模量為1000MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由使得基材在第一測量方向上的拉伸彈性模量介於上述上限值及下限值的範圍內,根據本實施形態的黏著片變得具有更加優異的擴展性。另外,上述拉伸彈性模量的測量方法的細節,如後續描述的試驗例所記載。Furthermore, the tensile modulus of the substrate in the present embodiment in the first measurement direction is preferably 100 MPa or more, particularly preferably 200 MPa or more, and more preferably 300 MPa or more. Furthermore, the above-mentioned tensile elastic modulus is preferably 1000 MPa or less, particularly preferably 800 MPa or less, and more preferably 600 MPa or less. Since the above-mentioned tensile modulus of elasticity is 100 MPa or more, the base material in this embodiment becomes easy to have appropriate strength, and the adhesive sheet becomes easy to perform well while having good handleability. Workpiece processing. In addition, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, so that it becomes easy to effectively suppress the cracking of the base material. Furthermore, since the above-mentioned tensile modulus of elasticity is 1000 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easily and well separated from each other. Therefore, by making the tensile elastic modulus of the substrate in the first measurement direction fall within the above upper limit and lower limit, the adhesive sheet according to this embodiment has more excellent expandability. In addition, the details of the above-mentioned measuring method of tensile elastic modulus are as described in the test example described later.

再者,本實施形態中的基材,在第一測量方向上的斷裂伸長率以100%以上為佳,以200%以上為特佳,且以300%以上為更佳。再者,上述斷裂伸長率以1000%以下為佳,以800%以下為特佳,且以600%以下為更佳。由於上述斷裂伸長率為100%以上,因此本實施形態中的基材變得容易具有所期望的伸長性,且根據本實施形態的黏著片變得容易實現優異的擴展性和拾取性。由於上述斷裂伸長率為1000%以下,因此基材的加工性變得更加優異,且變得容易製造出所期望的黏著片。另外,上述斷裂伸長率的測量方法的細節,如後續描述的試驗例所記載。Furthermore, in the present embodiment, the elongation at break in the first measurement direction is preferably 100% or more, particularly preferably 200% or more, and more preferably 300% or more. Furthermore, the above-mentioned elongation at break is preferably 1000% or less, particularly preferably 800% or less, and more preferably 600% or less. Since the above-mentioned elongation at break is 100% or more, the base material in the present embodiment becomes easy to have the desired extensibility, and the adhesive sheet according to the present embodiment becomes easy to achieve excellent expandability and pick-up properties. Since the above-mentioned elongation at break is 1000% or less, the workability of the base material becomes more excellent, and it becomes easy to manufacture the desired adhesive sheet. In addition, the details of the above-mentioned measuring method of breaking elongation are as described in the test example described later.

進一步而言,本實施形態中的基材,對於將在第一測量方向上進行前基材的拉伸試驗的情況下所測量出的結果繪製在以拉伸伸長率(單位:%)為橫軸且以拉伸應力(單位:MPa)為縱軸的座標平面上而得到的曲線,以滿足以下的兩項條件的任一者為佳。 (條件1)曲線中不存在成為極大值的點(以下有時稱為「極大點」)。 (條件2)曲線中存在至少一個成為極大值的點及一個成為極小值的點(以下有時稱為「極小點」),而且,在成為極大值的點之中拉伸伸長率為最小值的點之拉伸應力的值、與在成為極小值的點之中拉伸伸長率為最小值的點之拉伸應力的值之間的差異的絕對值為2.0MPa以下。Furthermore, for the base material in this embodiment, the result measured when the tensile test of the front base material is carried out in the first measurement direction is plotted on the basis of the tensile elongation (unit: %) as the horizontal The curve obtained on the coordinate plane with the tensile stress (unit: MPa) as the vertical axis should satisfy either of the following two conditions. (Condition 1) There is no point that becomes a maximum value in the curve (hereinafter sometimes referred to as "maximum point"). (Condition 2) There is at least one point that becomes a maximum value and one point that becomes a minimum value in the curve (hereinafter sometimes referred to as "minimum point"), and among the points that become the maximum value, the tensile elongation is the minimum The absolute value of the difference between the value of the tensile stress at the point where the minimum value is and the value of the tensile stress at the point where the tensile elongation is the minimum is 2.0 MPa or less.

針對上述條件1及2,參照圖1更具體地說明。在圖1中,繪示出在以拉伸伸長率(單位:%)為橫軸且以拉伸應力(單位:MPa)為縱軸的座標平面中,存在曲線C1 及曲線C2 的狀態。首先,曲線C1 係在滿足上述條件1的情況下的範例。在曲線C1 中,隨著拉伸伸長率從0%增加,拉伸應力也相應地增加(但是,當接近預定的拉伸應力的值時會變得不再明顯增加)。因此,曲線C1 中不存在拉伸應力從增加轉變為減少的點,亦即極大點。Regarding the above-mentioned conditions 1 and 2, it will be described in more detail with reference to FIG. 1. In Fig. 1, the state where the curve C 1 and the curve C 2 exist in the coordinate plane with the tensile elongation (unit: %) as the horizontal axis and the tensile stress (unit: MPa) as the vertical axis . First, the curve C 1 is an example when the above condition 1 is satisfied. In the curve C 1, with the tensile elongation increases from 0%, the tensile stress increased correspondingly (However, when a value close to a predetermined tensile stress will become less significant increase). Therefore, there is no point in the curve C 1 where the tensile stress changes from an increase to a decrease, that is, a maximum point.

另一方面,曲線C2 係在滿足條件2的情況下的範例。在曲線C2 中,在拉伸伸長率從0%增加的情況下,拉伸應力首先增加到點A的位置。然後,以該點A為端點,拉伸應力開始轉為減少。亦即,曲線C2 具有稱為點A的極大點。超過點A後,進一步增加拉伸伸長率,接著以點B為端點,拉伸應力從減少開始轉為增加,然後持續增加。亦即,曲線C2 具有稱為點B的極小點。此處,由於點A與點B的拉伸應力值之差異的絕對值(圖1中以「△」所表示的值)為2.0MPa以下,因此曲線C2 變得滿足條件2。On the other hand, the curve C 2 is an example when the condition 2 is satisfied. In the curve C 2, in a case where the tensile elongation increases from 0%, the tensile stress is first added to the position of the point A. Then, taking this point A as the end point, the tensile stress begins to decrease. That is, the curve C 2 has a maximum point called point A. After the point A is exceeded, the tensile elongation is further increased, and then with the point B as the end point, the tensile stress starts from a decrease to an increase, and then continues to increase. That is, the curve C 2 has a minimum point called point B. Here, since the absolute value of the difference between the tensile stress values of the point A and the point B (the value represented by “△” in FIG. 1) is 2.0 MPa or less, the curve C 2 becomes to satisfy the condition 2.

另外,在圖1的曲線C2 中,存在一個極大點及一個極小點,而有時即使是存在複數極大點和極小點的情況下也可以滿足條件2。在此情況下,從存在的複數極大點及極小點之中,選擇拉伸伸長率的值為最小之極大點、和拉伸伸長率的值為最小之極小點,並根據兩者之間的差異的絕對值是否為2.0MPa以下來判斷是否滿足條件2。In addition, in the curve C 2 of FIG. 1, there is one maximum point and one minimum point, and condition 2 may be satisfied even when there are complex maximum points and minimum points. In this case, from the existing plural maximum points and minimum points, select the maximum point with the smallest value of tensile elongation and the minimum point with the smallest value of tensile elongation, and according to the difference between the two Whether the absolute value of the difference is 2.0 MPa or less is used to determine whether condition 2 is satisfied.

本實施形態中的基材,由於滿足上述條件1及2的至少一者,因此根據本實施形態的黏著片變得容易具有優異的擴展性。從此觀點來看,條件2中的絕對值的差異(Δ)以1.8MPa以下為佳,以1.6MPa以下為較佳,以1.5MPa以下為特佳,以1.3MPa以下為更佳,且以1.0MPa以下為最佳。另一方面,關於前述絕對值的差異(Δ)的下限值,並沒有特別限定,例如可以超過0。另外,是否滿足上述條件1及條件2的測量方法的細節,如後續描述的試驗例所記載。Since the base material in this embodiment satisfies at least one of the above-mentioned conditions 1 and 2, the adhesive sheet according to this embodiment can easily have excellent expandability. From this point of view, the absolute value difference (Δ) in Condition 2 is preferably 1.8 MPa or less, preferably 1.6 MPa or less, particularly preferably 1.5 MPa or less, more preferably 1.3 MPa or less, and 1.0 Below MPa is the best. On the other hand, the lower limit of the difference (Δ) in the aforementioned absolute value is not particularly limited, and may exceed 0, for example. In addition, the details of the measurement method of whether the above condition 1 and condition 2 are satisfied are as described in the test example described later.

本實施形態中的基材,在將為該基材的平面視角中的一方向且與上述第一測量方向之間所形成的角度為90°之方向設為第二測量方向的情況下,在該第二測量方向上,從伸長10%時至伸長100%時的拉伸應力以全部皆介於5MPa以上、30MPa以下的範圍內為佳,且在第二測量方向上,從伸長100%時至伸長200%時的拉伸應力以全部皆介於10MPa以上、40MPa以下的範圍內為佳。由於滿足這些條件,因此基材變得容易具有更加優異的可撓性,且變得容易得到更良好的擴展性。In the case of the substrate in this embodiment, in the case where the direction in which the angle formed between the substrate and the first measurement direction is 90° is set as the second measurement direction in one of the planar viewing angles of the substrate, In the second measurement direction, the tensile stress from 10% elongation to 100% elongation is preferably all within the range of 5 MPa or more and 30 MPa or less, and in the second measurement direction, from the elongation of 100% The tensile stress at 200% elongation is preferably all within the range of 10 MPa or more and 40 MPa or less. Since these conditions are satisfied, the substrate becomes easier to have more excellent flexibility, and it becomes easier to obtain better expandability.

從更加有效地實現良好的擴展性的觀點來看,關於上述第二測量方向,從伸長10%時至伸長100%時的拉伸應力所介於的範圍的下限值以7.5MPa以上為特佳,且以10MPa以上為更佳。再者,該範圍的上限值以25MPa以下為特佳,且以20MPa以下為更佳。From the viewpoint of achieving good extensibility more effectively, with regard to the second measurement direction, the lower limit of the range of the tensile stress from the time of elongation of 10% to the time of elongation of 100% is 7.5 MPa or more. Better, and more preferably 10 MPa or more. Furthermore, the upper limit of the range is particularly preferably 25 MPa or less, and more preferably 20 MPa or less.

再者,從同樣的觀點來看,關於上述第二測量方向,從伸長100%時至伸長200%時的拉伸應力所介於的範圍的下限值以11MPa以上為特佳,且以12MPa以上為更佳。再者,該範圍的上限值以35MPa以下為特佳,且以30MPa以下為更佳。Furthermore, from the same point of view, with regard to the second measurement direction, the lower limit of the range of the tensile stress from 100% elongation to 200% elongation is particularly preferably 11 MPa or more, and 12 MPa The above is better. Furthermore, the upper limit of the range is particularly preferably 35 MPa or less, and more preferably 30 MPa or less.

另外,這些關於第二測量方向的拉伸應力的測量方法的細節,如後續描述的試驗例所記載。In addition, the details of the method for measuring the tensile stress in the second measurement direction are as described in the test example described later.

此外,本實施形態中的基材,在第二測量方向上,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量以1MPa以上為佳,以2MPa以上為特佳,且以3MPa以上為更佳。再者,上述增加量以20MPa以下為佳,以15MPa以下為特佳,且以10MPa以下為更佳。由於上述增加量為1MPa以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述增加量為20MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述增加量,根據本實施形態的黏著片變得具有更加優異的擴展性。In addition, for the substrate in this embodiment, in the second measurement direction, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation from the tensile stress at 100% elongation is preferably 1 MPa or more. , 2MPa or more is particularly preferred, and 3MPa or more is more preferred. Furthermore, the above-mentioned increase amount is preferably 20 MPa or less, particularly preferably 15 MPa or less, and more preferably 10 MPa or less. Since the amount of increase is 1 MPa or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and it becomes easy to effectively suppress the breakage of the base material. On the other hand, since the increase amount is 20 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easy to separate well. Therefore, by satisfying the above-mentioned increase amount, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第二測量方向上,將伸長200%時的拉伸應力減掉伸長10%時的拉伸應力所得到的拉伸應力的增加量以1MPa以上為佳,以2MPa以上為較佳,以3MPa以上為特佳,且以4MPa以上為更佳。再者,上述增加量以30MPa以下為佳,以25MPa以下為特佳,且以20MPa以下為更佳。由於上述增加量為1MPa以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述增加量為30MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述增加量,根據本實施形態的黏著片變得具有更加優異的擴展性。Furthermore, for the substrate in this embodiment, in the second measurement direction, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation from the tensile stress at 10% elongation is 1 MPa or more Preferably, 2 MPa or more is preferable, 3 MPa or more is particularly preferable, and 4 MPa or more is more preferable. Furthermore, the above-mentioned increase is preferably 30 MPa or less, particularly preferably 25 MPa or less, and more preferably 20 MPa or less. Since the amount of increase is 1 MPa or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and it becomes easy to effectively suppress the breakage of the base material. On the other hand, since the increase amount is 30 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easily separated well. Therefore, by satisfying the above-mentioned increase amount, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第二測量方向上,將伸長150%時的拉伸應力減掉伸長50%時的拉伸應力所得到的拉伸應力的增加量以0.5MPa以上為佳,以1MPa以上為較佳,以1.5MPa以上為特佳,且以2MPa以上為更佳。再者,上述增加量以20MPa以下為佳,以15MPa以下為特佳,且以10MPa以下為更佳。由於上述增加量為0.5MPa以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述增加量為20MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述增加量,根據本實施形態的黏著片變得具有更加優異的擴展性。Furthermore, for the substrate in this embodiment, the increase in tensile stress obtained by subtracting the tensile stress at 150% elongation from the tensile stress at 50% elongation in the second measurement direction is 0.5 MPa or more Preferably, 1 MPa or more is preferable, 1.5 MPa or more is particularly preferable, and 2 MPa or more is more preferable. Furthermore, the above-mentioned increase amount is preferably 20 MPa or less, particularly preferably 15 MPa or less, and more preferably 10 MPa or less. Since the increase is 0.5 MPa or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and therefore it becomes easy to effectively suppress the breakage of the base material. On the other hand, since the increase amount is 20 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easy to separate well. Therefore, by satisfying the above-mentioned increase amount, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第二測量方向上,將伸長250%時的拉伸應力減掉伸長50%時的拉伸應力所得到的拉伸應力的增加量以2MPa以上為佳,以4MPa以上為特佳,以5MPa以上為更佳,且進一步以6MPa以上為更佳。再者,上述增加量以30MPa以下為佳,以25MPa以下為特佳,且以20MPa以下為更佳。由於上述增加量為2MPa以上,因此在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。另一方面,由於上述增加量為30MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由滿足上述增加量,根據本實施形態的黏著片變得具有更加優異的擴展性。Furthermore, for the substrate in this embodiment, in the second measurement direction, the increase in tensile stress obtained by subtracting the tensile stress at 250% elongation from the tensile stress at 50% elongation is 2 MPa or more Preferably, 4 MPa or more is particularly preferable, 5 MPa or more is more preferable, and 6 MPa or more is further more preferable. Furthermore, the above-mentioned increase is preferably 30 MPa or less, particularly preferably 25 MPa or less, and more preferably 20 MPa or less. Since the amount of increase is 2 MPa or more, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, and it becomes easy to effectively suppress the breakage of the base material. On the other hand, since the increase amount is 30 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easily separated well. Therefore, by satisfying the above-mentioned increase amount, the adhesive sheet according to the present embodiment has more excellent expandability.

再者,本實施形態中的基材,在第二測量方向上的拉伸彈性模量以100MPa以上為佳,以200MPa以上為特佳,且以300MPa以上為更佳。再者,上述拉伸彈性模量以1000MPa以下為佳,以800MPa以下為特佳,且以600MPa以下為更佳。由於上述拉伸彈性模量為100MPa以上,因此本實施形態中的基材變得容易具有適當的強度,且在黏著片變得具有良好的操作性的同時,也變得容易良好地進行所期望的工件加工。此外,在將根據本實施形態的黏著片擴展時,應力變得難以集中在基材的一部分上,故變得容易有效地抑制基材的破裂。再者,由於上述拉伸彈性模量為1000MPa以下,因此在將根據本實施形態的黏著片擴展時,基材變得容易均勻地拉伸,故晶片彼此之間變得容易良好地分離。因此,藉由使得基材在第二測量方向上的拉伸彈性模量介於上述上限值及下限值的範圍內,根據本實施形態的黏著片變得具有更加優異的擴展性。另外,上述拉伸彈性模量的測量方法的細節,如後續描述的試驗例所記載。Furthermore, in the present embodiment, the tensile modulus of elasticity in the second measurement direction is preferably 100 MPa or more, particularly preferably 200 MPa or more, and more preferably 300 MPa or more. Furthermore, the above-mentioned tensile elastic modulus is preferably 1000 MPa or less, particularly preferably 800 MPa or less, and more preferably 600 MPa or less. Since the above-mentioned tensile modulus of elasticity is 100 MPa or more, the base material in this embodiment becomes easy to have appropriate strength, and the adhesive sheet becomes easy to perform well while having good handleability. Workpiece processing. In addition, when the pressure-sensitive adhesive sheet according to the present embodiment is expanded, the stress becomes difficult to concentrate on a part of the base material, so that it becomes easy to effectively suppress the cracking of the base material. Furthermore, since the above-mentioned tensile modulus of elasticity is 1000 MPa or less, when the adhesive sheet according to the present embodiment is expanded, the base material becomes easy to stretch uniformly, so that the wafers become easily and well separated from each other. Therefore, by making the tensile elastic modulus of the substrate in the second measurement direction fall within the range of the above upper limit and lower limit, the adhesive sheet according to this embodiment has more excellent expandability. In addition, the details of the above-mentioned measuring method of tensile elastic modulus are as described in the test example described later.

(1-2)基材的組成 本實施形態中的基材,只要基本上不包含氯原子,且同時滿足關於從伸長10%時至伸長100%時的拉伸應力及從伸長100%時至伸長200%時的拉伸應力之前述物性,則其組成並沒有限定。(1-2) Composition of base material The base material in this embodiment basically does not contain chlorine atoms, and at the same time satisfies the requirements regarding the tensile stress from 10% elongation to 100% elongation and the tensile stress from 100% elongation to 200% elongation. For the aforementioned physical properties, the composition is not limited.

從將根據本實施形態的黏著片作為工件加工用片使用時容易發揮出所期望的功能的觀點來看,本實施形態中的基材以樹脂系的材料為主成分之樹脂膜為佳。From the viewpoint that the pressure-sensitive adhesive sheet according to the present embodiment can easily exhibit a desired function when used as a workpiece processing sheet, the base material in the present embodiment is preferably a resin film having a resin-based material as a main component.

作為上述樹脂的範例,可列舉出聚乙烯、聚丙烯、聚丁烯、聚丁二烯、聚甲基戊烯、乙烯-降冰片烯共聚物、降冰片烯樹脂等的聚烯烴類;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二醇酯等的聚酯類樹脂;乙烯-乙酸乙烯酯共聚物;乙烯-(甲基)丙烯酸共聚物、乙烯-(甲基)丙烯酸甲酯共聚物;其他的乙烯-(甲基)丙烯酸酯共聚物等的乙烯類共聚物等;(甲基)丙烯酸酯共聚物;聚氨酯;聚醯亞胺;聚苯乙烯;聚碳酸酯;氟樹脂等。再者,也可以是這些樹脂的交聯樹脂、離聚物樹脂等的改性樹脂。另外,在本說明書中,所謂的「(甲基)丙烯酸」係意味著丙烯酸及甲基丙烯酸兩者。其他類似的用語也是如此。再者,本說明書中的「聚合物」也包括「共聚物」的概念。Examples of the above-mentioned resins include polyolefins such as polyethylene, polypropylene, polybutene, polybutadiene, polymethylpentene, ethylene-norbornene copolymer, norbornene resin; Polyester resins such as ethylene phthalate, polybutylene terephthalate, and polyethylene naphthalate; ethylene-vinyl acetate copolymer; ethylene-(meth)acrylic acid copolymer, ethylene -(Meth)acrylate copolymer; other ethylene-(meth)acrylate copolymers and other vinyl copolymers; (meth)acrylate copolymer; polyurethane; polyimide; polystyrene ; Polycarbonate; Fluororesin etc. Furthermore, modified resins such as crosslinked resins and ionomer resins of these resins may also be used. In addition, in this specification, the "(meth)acrylic" type means both acrylic acid and methacrylic acid. The same goes for other similar terms. Furthermore, the "polymer" in this specification also includes the concept of "copolymer".

再者,本實施形態中的基材也可以是積層了複數層上述樹脂的膜所形成的積層膜。在此積層膜中,構成各層的材料可以是相同種類,或者也可以是不同種類。In addition, the base material in this embodiment may be a laminated film formed by laminating a plurality of layers of the above-mentioned resin film. In this laminated film, the materials constituting each layer may be of the same kind or different kinds.

在上述樹脂之中,以使用氟樹脂、聚氨酯及聚酯類樹脂中的至少一種為佳。特別是在使用這些樹脂的膜中,主成分樹脂(氟樹脂、聚氨酯或聚酯類樹脂)的含量以50質量%以上為佳,以60質量%以上為較佳,以70質量%以上為特佳,且以80質量%以上為更佳。藉由使用這些膜,變得容易滿足關於前述拉伸應力的物性。Among the above resins, it is preferable to use at least one of fluororesin, polyurethane, and polyester resin. Especially in films using these resins, the content of the main component resin (fluororesin, polyurethane or polyester resin) is preferably 50% by mass or more, preferably 60% by mass or more, and particularly 70% by mass or more. Preferably, it is more preferably 80% by mass or more. By using these films, it becomes easy to satisfy the physical properties regarding the aforementioned tensile stress.

作為氟樹脂的範例,可列舉出聚四氟乙烯(PTFE)、乙烯-四氟乙烯(ETFE)、四氟乙烯・六氟乙烯(FEP)、全氟烷氧基烷烴(PFA)、聚偏二氟乙烯(PVdF)等。在上述之中,以聚四氟乙烯(PTFE)為特佳。Examples of fluororesins include polytetrafluoroethylene (PTFE), ethylene-tetrafluoroethylene (ETFE), tetrafluoroethylene/hexafluoroethylene (FEP), perfluoroalkoxy alkane (PFA), polyvinylidene Vinyl fluoride (PVdF) and so on. Among the above, polytetrafluoroethylene (PTFE) is particularly preferred.

作為上述聚氨酯的範例,可列舉出聚氨酯彈性體,其中,可列舉出以熱塑性聚氨酯彈性體(TPU)為佳。As an example of the above-mentioned polyurethane, polyurethane elastomer can be cited, and among them, thermoplastic polyurethane elastomer (TPU) is preferred.

熱塑性聚氨酯彈性體通常使得長鏈多元醇、擴鏈劑、多異氰酸酯進行反應而得到,且由具有衍生自長鏈多元醇的結構單元之軟段(soft segment)、和具有擴鏈劑與多異氰酸酯反應所得到的聚氨酯結構之硬段(hard segment)所構成。Thermoplastic polyurethane elastomers are usually obtained by reacting long-chain polyols, chain extenders, and polyisocyanates, and are composed of soft segments with structural units derived from long-chain polyols, and chain extenders and polyisocyanates. The reaction is composed of hard segments of the polyurethane structure.

若根據作為其軟段成分使用的長鏈多元醇的種類,將熱塑性聚氨酯彈性體進行分類,則可區分為聚酯類聚氨酯彈性體、聚醚類聚氨酯彈性體、聚碳酸酯類聚氨酯彈性體等。在上述之中,本實施形態中的基材,以使用聚醚類聚氨酯彈性體為佳。If the thermoplastic polyurethane elastomer is classified according to the type of long-chain polyol used as its soft segment component, it can be divided into polyester-based polyurethane elastomer, polyether-based polyurethane elastomer, polycarbonate-based polyurethane elastomer, etc. . Among the above, the base material in this embodiment is preferably a polyether polyurethane elastomer.

作為上述長鏈多元醇,具體而言,可列舉出內酯類聚酯多元醇、己二酸酯類聚酯多元醇等的聚酯多元醇;聚丙烯(乙烯)多元醇、聚四亞甲基醚二醇等的聚醚多元醇;聚碳酸酯多元醇等。在上述之中,以使用聚醚多元醇為佳,其數量平均分子量通常為600~5000。As the above-mentioned long-chain polyols, specifically, polyester polyols such as lactone-based polyester polyols and adipate-based polyester polyols; polypropylene (ethylene) polyols, polytetramethylene polyols, etc. Polyether polyols such as ether glycols; polycarbonate polyols, etc. Among the above, it is better to use polyether polyol, and its number average molecular weight is usually 600-5000.

作為上述多異氰酸酯,可列舉出2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯(純MDI)、六亞甲基二異氰酸酯等。在上述之中,以使用純MDI為佳。As said polyisocyanate, 2, 4- toluene diisocyanate, 2, 6-toluene diisocyanate, 4,4'- diphenylmethane diisocyanate (pure MDI), hexamethylene diisocyanate, etc. are mentioned. Among the above, it is better to use pure MDI.

作為上述擴鏈劑,可列舉出1,4-丁二醇、1,6-己二醇等的低分子量多元醇、芳香族二胺等。Examples of the chain extender include low molecular weight polyols such as 1,4-butanediol and 1,6-hexanediol, aromatic diamines, and the like.

作為上述聚酯類樹脂的範例,除了上述之外,還可列舉出具有脂環結構的聚酯樹脂。As an example of the above-mentioned polyester resin, in addition to the above, a polyester resin having an alicyclic structure can be cited.

再者,在使用根據本實施形態的黏著片作為切割片的情況下,從容易抑制切削屑的產生的觀點來看,上述聚酯樹脂所具有的脂環結構,構成環的碳原子數以6以上為佳。再者,該碳原子數以14以下為佳,且以10以下為特佳。尤其是,上述碳原子數以6為佳。再者,該脂環結構可以是由一個環所構成的單環型,也可以是由兩個環所構成的雙環型,或者也可以是由三個以上的環所構成的結構。Furthermore, in the case of using the adhesive sheet according to this embodiment as a dicing sheet, from the viewpoint of easily suppressing the generation of cutting chips, the alicyclic structure possessed by the polyester resin has 6 carbon atoms in the ring. The above is better. Furthermore, the number of carbon atoms is preferably 14 or less, and particularly preferably 10 or less. In particular, the number of carbon atoms described above is preferably 6. Furthermore, the alicyclic structure may be a monocyclic type composed of one ring, a bicyclic type composed of two rings, or a structure composed of three or more rings.

再者,從本實施形態中的基材可變得容易具有更良好的可撓性的觀點來看,上述聚酯樹脂以包含具有脂環結構的二羧酸作為構成該聚酯樹脂的單體單元為佳。再者,從同樣的觀點來看,上述聚酯樹脂以包含具有脂環結構的二醇作為構成該聚酯樹脂的單體單元為佳。聚酯樹脂中可以僅包含這種二羧酸及二醇的任一者,而從變得容易具有更良好的可撓性的觀點來看,以聚酯樹脂包含這種二羧酸及二醇的兩者為佳。Furthermore, from the viewpoint that the base material in this embodiment can easily have better flexibility, the above-mentioned polyester resin contains a dicarboxylic acid having an alicyclic structure as a monomer constituting the polyester resin The unit is better. In addition, from the same viewpoint, the above-mentioned polyester resin preferably contains a diol having an alicyclic structure as a monomer unit constituting the polyester resin. The polyester resin may contain only any one of the dicarboxylic acid and the diol, and from the viewpoint of making it easier to have better flexibility, the polyester resin contains the dicarboxylic acid and the diol The two are better.

上述二羧酸的結構只要在具有脂環結構的同時還具有兩個羧基即可,並沒有特別限定。例如,二羧酸也可以是兩個羧基結合到脂環結構上的結構,或者也可以是烷基等進一步插入前述脂環結構與羧基之間的結構。作為這種二羧酸的較佳範例,可列舉出1,2-環己烷二羧酸、1,3-環己烷二羧酸、1,4-環己烷二羧酸、1,4-十氫萘二羧酸、1,5-十氫萘二羧酸、2,6-十氫萘二羧酸、2,7-十氫萘二羧酸等,在上述之中,以使用1,4-環己烷二羧酸為佳。這些二羧酸也可以是烷基酯等的衍生物。作為這種烷基酯衍生物,可以是例如碳原子數為1以上、10以下的烷基酯。作為更具體的範例,可列舉出二甲基酯,二乙基酯等,且以二甲基酯為特佳。The structure of the above-mentioned dicarboxylic acid is not particularly limited as long as it has an alicyclic structure and two carboxyl groups. For example, the dicarboxylic acid may be a structure in which two carboxyl groups are bonded to an alicyclic structure, or may be a structure in which an alkyl group or the like is further inserted between the alicyclic structure and the carboxyl group. As a preferable example of this dicarboxylic acid, 1,2-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, 1,4 -Decahydronaphthalene dicarboxylic acid, 1,5-decahydronaphthalene dicarboxylic acid, 2,6-decahydronaphthalene dicarboxylic acid, 2,7-decahydronaphthalene dicarboxylic acid, etc., among the above, use 1 , 4-cyclohexanedicarboxylic acid is preferred. These dicarboxylic acids may be derivatives such as alkyl esters. Such an alkyl ester derivative may be, for example, an alkyl ester having 1 or more and 10 or less carbon atoms. As a more specific example, dimethyl ester, diethyl ester, etc. can be cited, and dimethyl ester is particularly preferred.

上述二醇的結構只要在具有脂環結構的同時還具有兩個羥基即可,並沒有特別限定。例如,二醇也可以是兩個羥基結合到脂環結構上的結構,或者也可以是烷基等進一步插入前述脂環結構與羥基之間的結構。作為這種二醇的較佳範例,可列舉出1,2-環己二醇(特別是1,2-環己烷二甲醇)、1,3-環己烷二醇(特別是1,3-環己烷二甲醇)、1,4-環己二醇(特別是1,4-環己烷二甲醇)、2,2-雙-(4 -羥基環己基)-丙烷等,在上述之中,以使用1,4-環己烷二甲醇為佳。The structure of the above-mentioned diol is not particularly limited as long as it has an alicyclic structure and two hydroxyl groups. For example, the diol may be a structure in which two hydroxyl groups are bonded to an alicyclic structure, or may be a structure in which an alkyl group or the like is further inserted between the aforementioned alicyclic structure and the hydroxyl group. As a preferred example of this diol, 1,2-cyclohexanediol (especially 1,2-cyclohexanedimethanol), 1,3-cyclohexanediol (especially 1,3 -Cyclohexanedimethanol), 1,4-cyclohexanediol (especially 1,4-cyclohexanedimethanol), 2,2-bis-(4-hydroxycyclohexyl)-propane, etc., among the above Among them, 1,4-cyclohexanedimethanol is preferably used.

從基材變得容易具有所期望的可撓性且容易達到更優異的擴展性的觀點來看,上述聚酯樹脂以包含使得不飽和脂肪酸進行二聚反應而得到的二聚酸作為構成該聚酯樹脂的單體單元為佳。此處,該不飽和脂肪酸的碳原子數以10以上為佳,且以15以上為特佳。再者,上述碳原子數以30以下為佳,且以25以下為特佳。作為這種二聚酸的範例,可列舉出使得油酸、亞油酸等的碳原子數為18的不飽和脂肪酸進行二聚反應而得到的碳原子數為36之二羧酸、使得芥酸等的碳原子數為22的不飽和脂肪酸進行二聚反應而得到的碳原子數為44之二羧酸等。另外,在得到上述二聚酸時,有時候也會少量地產生使得上述不飽和脂肪酸進行三聚反應而得到的三聚酸。上述聚酯樹脂也可以包含上述二聚酸還有這種三聚酸。From the viewpoint that the base material becomes easy to have the desired flexibility and to achieve more excellent extensibility, the above-mentioned polyester resin contains a dimer acid obtained by dimerizing an unsaturated fatty acid as a constituent of the polymer resin. The monomer unit of the ester resin is preferred. Here, the number of carbon atoms of the unsaturated fatty acid is preferably 10 or more, and particularly preferably 15 or more. Furthermore, the number of carbon atoms is preferably 30 or less, and particularly preferably 25 or less. Examples of such dimer acids include dimerization of unsaturated fatty acids with 18 carbon atoms, such as oleic acid and linoleic acid, to obtain dicarboxylic acids with 36 carbon atoms and erucic acid. Dicarboxylic acid with 44 carbon atoms and the like obtained by dimerization of unsaturated fatty acids with 22 carbon atoms. In addition, when the dimer acid is obtained, the trimer acid obtained by subjecting the unsaturated fatty acid to the trimerization reaction may sometimes be produced in a small amount. The polyester resin may also contain the dimer acid and the trimer acid.

上述聚酯樹脂也可以包含除了上述二羧酸、二醇及二聚酸以外的單體作為構成該聚酯樹脂的單體單元。作為這種單體的範例,可列舉出琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸等的脂肪族二羧酸;鄰苯二甲酸、對苯二甲酸、間苯二甲酸、2,6-萘二羧酸、1,4-萘二羧酸、4,4'-二苯基二羧酸等的芳香族二羧酸等。再者,也可以包含除了具有脂環結構的二醇以外的二醇成分。例如,也可以包含乙二醇、丙二醇、丁二醇、己二醇、辛二醇、癸二醇;雙酚A、雙酚S等的環氧乙烷加成物;三羥甲基丙烷等。The said polyester resin may contain monomers other than the said dicarboxylic acid, a diol, and a dimer acid as a monomer unit which comprises this polyester resin. Examples of such monomers include aliphatic dicarboxylic acids such as succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, and sebacic acid; phthalic acid, Aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, 2,6-naphthalenedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, 4,4'-diphenyldicarboxylic acid, etc. Furthermore, a diol component other than the diol having an alicyclic structure may be included. For example, it may also contain ethylene glycol, propylene glycol, butylene glycol, hexanediol, octanediol, decanediol; ethylene oxide adducts such as bisphenol A and bisphenol S; trimethylolpropane, etc. .

再者,利用差示掃描量熱法在20℃/min的升溫速度之下對上述聚酯樹脂測量出的熔融熱以2J/g以上為佳,以5J/g以上為較佳,以10J/g以上為特佳,且以15J/g以上為更佳。由於上述熔融熱為2J/g以上,因此本實施形態中的基材的結晶性適當地提升,且基材變得具有更良好的操作性和加工性。再者,該熔融熱以150J/g以下為佳,以100J/g以下為較佳,以70J/g以下為特佳,以50J/g以下為更佳,且尤其以30J/g以下為佳。由於熔融熱為150J/g以下,因此根據本實施形態中的基材變得容易具有更加優異的可撓性。Furthermore, the heat of fusion measured on the polyester resin using differential scanning calorimetry at a heating rate of 20°C/min is preferably 2J/g or more, preferably 5J/g or more, and 10J/g g or more is particularly preferable, and 15J/g or more is more preferable. Since the heat of fusion is 2 J/g or more, the crystallinity of the substrate in this embodiment is appropriately improved, and the substrate has better handleability and processability. Furthermore, the heat of fusion is preferably 150 J/g or less, preferably 100 J/g or less, particularly preferably 70 J/g or less, more preferably 50 J/g or less, and particularly preferably 30 J/g or less . Since the heat of fusion is 150 J/g or less, the base material in this embodiment can easily have more excellent flexibility.

另外,可以根據JIS K 7121:2012,使用差示掃描量熱計(例如,由TA儀器公司所製造的DSC,產品名稱為「DSC Q2000」)測量上述熔融熱。In addition, the above-mentioned heat of fusion can be measured using a differential scanning calorimeter (for example, DSC manufactured by TA Instruments, product name "DSC Q2000") in accordance with JIS K 7121:2012.

從容易達到所期望的拉伸物性的觀點來看,上述包含聚酯樹脂作為主要材料的膜也以在包含該聚酯樹脂的同時還包含彈性體為佳。該彈性體並沒有特別限定,可以是熱固性彈性體,或者也可以是熱塑性彈性體,而從本實施形態中的基材容易具有更優異的可撓性的觀點來看,以熱塑性彈性體為佳。From the standpoint of easily achieving desired stretch properties, the film containing the polyester resin as a main material described above also preferably contains the polyester resin as well as the elastomer. The elastomer is not particularly limited, and may be a thermosetting elastomer or a thermoplastic elastomer. From the viewpoint that the substrate in this embodiment is likely to have more excellent flexibility, a thermoplastic elastomer is preferred .

上述熱塑性彈性體的範例也沒有特別限定,例如,可以使用苯乙烯類彈性體、烯烴類彈性體、聚酯類彈性體、聚矽氧類彈性體等。上述材料可以單獨使用,也可以組合2種以上使用。在上述彈性體之中,從容易具有更優異的可撓性的觀點來看,以使用苯乙烯類彈性體為佳。Examples of the above-mentioned thermoplastic elastomer are also not particularly limited. For example, styrene-based elastomers, olefin-based elastomers, polyester-based elastomers, silicone-based elastomers, etc. can be used. The above-mentioned materials may be used alone or in combination of two or more kinds. Among the above-mentioned elastomers, it is preferable to use a styrene-based elastomer from the viewpoint of easily having more excellent flexibility.

作為上述苯乙烯類彈性體,可列舉出苯乙烯・共軛二烯共聚物及苯乙烯・烯烴共聚物。作為苯乙烯・共軛二烯共聚物的具體範例,可列舉出苯乙烯・丁二烯共聚物、苯乙烯・丁二烯・苯乙烯共聚物(SBS)、苯乙烯・丁二烯・丁烯・苯乙烯共聚物、苯乙烯・異戊二烯共聚物、苯乙烯・異戊二烯・苯乙烯共聚物(SIS)、苯乙烯・乙烯・異戊二烯・苯乙烯共聚物等的未氫化的苯乙烯・共軛二烯共聚物;苯乙烯・乙烯/丙烯・苯乙烯共聚物(SEPS)、苯乙烯・乙烯/丁烯・苯乙烯共聚物(SEBS)等的氫化苯乙烯・共軛二烯共聚物等。上述材料可以單獨使用,也可以組合2種以上使用。在上述苯乙烯類彈性體之中,從容易達到更良好的可撓性的觀點來看,以苯乙烯・共軛二烯共聚物為佳,其中以氫化苯乙烯・共軛二烯共聚物為佳,且以使用苯乙烯・乙烯/丁烯・苯乙烯共聚物為更佳。Examples of the above-mentioned styrene elastomer include styrene/conjugated diene copolymers and styrene/olefin copolymers. Specific examples of styrene and conjugated diene copolymers include styrene and butadiene copolymers, styrene, butadiene, and styrene copolymers (SBS), styrene, butadiene, and butene・Unhydrogenated styrene copolymer, styrene/isoprene copolymer, styrene, isoprene, styrene copolymer (SIS), styrene, ethylene, isoprene, styrene copolymer, etc. Styrene and conjugated diene copolymers; styrene, ethylene/propylene, styrene copolymer (SEPS), styrene, ethylene/butene, styrene copolymer (SEBS), etc. Olefin copolymer and so on. The above-mentioned materials may be used alone or in combination of two or more kinds. Among the above-mentioned styrene elastomers, from the standpoint of easily achieving better flexibility, styrene/conjugated diene copolymers are preferred, and among them, hydrogenated styrene/conjugated diene copolymers are preferred. It is better, and it is more preferable to use a styrene·ethylene/butene·styrene copolymer.

從可進一步減少環境負荷的觀點來看,本實施形態中的基材也以不含有鹵素原子為佳。作為該鹵素原子,除了前述氯原子以外,還可列舉出氟原子、溴原子、碘原子等。另外,相同於前述氯原子的情況,此處所謂的「不含有鹵素原子」也可以表示基本上不含有鹵素原子。在此情況下,基材中的鹵素原子的含量也可以是0.005質量%以下,特別是也可為0.003質量%以下,且進一步也可為0.0001質量%以下。From the viewpoint that the environmental load can be further reduced, the base material in this embodiment also preferably does not contain halogen atoms. As the halogen atom, in addition to the aforementioned chlorine atom, a fluorine atom, a bromine atom, an iodine atom, and the like can be cited. In addition, as in the case of the aforementioned chlorine atom, the term "not containing a halogen atom" herein may also mean that the halogen atom is not substantially contained. In this case, the content of the halogen atom in the base material may be 0.005% by mass or less, particularly 0.003% by mass or less, and further may be 0.0001% by mass or less.

另外,在本實施形態中的基材中也可以添加阻燃劑、增塑劑、潤滑劑、抗氧化劑、著色劑、紅外線吸收劑、紫外線吸收劑、離子清除劑等的添加劑。這些添加劑的含量並沒有特別限定,而以介於可使得基材發揮出所期望的功能的範圍內為佳。In addition, additives such as flame retardants, plasticizers, lubricants, antioxidants, colorants, infrared absorbers, ultraviolet absorbers, and ion scavengers may be added to the substrate in this embodiment. The content of these additives is not particularly limited, but is preferably within a range that allows the substrate to perform the desired function.

本實施形態中的基材的層結構可以是單層,或者也可以是複數層。再者,為了提升與黏著劑層的密合性,也可以對基材中要積層該黏著劑層的表面施加底漆處理、電暈處理、電漿處理等的表面處理。The layer structure of the substrate in this embodiment may be a single layer, or may be a plurality of layers. Furthermore, in order to improve the adhesion with the adhesive layer, surface treatments such as primer treatment, corona treatment, plasma treatment, etc. may be applied to the surface of the substrate on which the adhesive layer is to be laminated.

(1-3)基材的製法 本實施形態中的基材的製造方法並沒有特別限定,例如,可以使用T型模具法、圓形模具法等的熔融擠出成型法;壓延成型法;乾式法、濕式法等的溶液法等。在上述之中,從可效率良好地製造出基材的觀點來看,以採用熔融擠出法成型或壓延成型法為佳。(1-3) Preparation method of base material The manufacturing method of the base material in this embodiment is not particularly limited. For example, melt extrusion molding methods such as T-die method and round die method; calender molding method; solution methods such as dry method and wet method can be used. Wait. Among the above, from the viewpoint that the base material can be efficiently manufactured, it is preferable to adopt a melt extrusion molding method or a calender molding method.

在利用熔融擠出成型法製造由單層所構成的基材的情況下,可以將基材的材料均勻混合,並將所得到的混合物直接或一旦將其製造成粒料後就使用公知的擠出成型機進行製膜。再者,在利用熔融擠出成型法製造由複數層所構成的基材的情況下,可以將構成各層的成分分別均勻混合,並將所得到的混合物直接或一旦將其製造成粒料後就使用公知的擠出成型機,同時擠出複數層以進行製膜。In the case of manufacturing a substrate composed of a single layer by a melt extrusion molding method, the materials of the substrate can be uniformly mixed, and the resulting mixture can be directly or once manufactured into pellets using a known extrusion method. Take out the forming machine to make the film. Furthermore, in the case of using a melt extrusion molding method to produce a substrate composed of multiple layers, the components constituting each layer can be uniformly mixed, and the resulting mixture can be directly or once manufactured into pellets. Using a well-known extrusion molding machine, multiple layers are simultaneously extruded to form a film.

(1-4)基材的厚度 本實施形態中的基材的厚度以20μm以上為佳,以40μm以上為特佳,且以60μm以上為更佳。再者,基材的厚度以600μm以下為佳,以300μm以下為特佳,且以200μm以下為更佳。由於基材的厚度為20μm以上,因此黏著片變得容易具有適當的強度,且變得容易良好地支撐住固定於黏著片上的工件。結果,變得可有效地抑制在切割時碎裂的發生等。再者,由於基材的厚度為600μm以下,因此變得容易滿足關於從伸長時至伸長100%時的拉伸應力及從伸長100%時至伸長200%時的拉伸應力之前述物性。此外,由於基材膜的厚度為600μm以下,因此基材膜變得具有更良好的加工性。(1-4) The thickness of the base material The thickness of the substrate in this embodiment is preferably 20 μm or more, particularly preferably 40 μm or more, and more preferably 60 μm or more. Furthermore, the thickness of the substrate is preferably 600 μm or less, particularly preferably 300 μm or less, and more preferably 200 μm or less. Since the thickness of the base material is 20 μm or more, the adhesive sheet becomes easy to have appropriate strength, and it becomes easy to well support the workpiece fixed on the adhesive sheet. As a result, it becomes possible to effectively suppress the occurrence of chipping and the like at the time of cutting. Furthermore, since the thickness of the substrate is 600 μm or less, it becomes easy to satisfy the aforementioned physical properties regarding the tensile stress from the time of elongation to 100% of elongation and the tensile stress from the time of 100% elongation to 200% of elongation. In addition, since the thickness of the base film is 600 μm or less, the base film has better processability.

(2)黏著劑層 作為構成本實施形態的黏著劑層的黏著劑,只要能夠對被黏著物表現出充分的黏著力(特別是對工件具有充分的黏著力以進行工件的加工),則沒有特別限定。作為構成黏著劑層的黏著劑的範例,可列舉出丙烯酸類黏著劑、橡膠類黏著劑、聚矽氧類黏著劑、胺甲酸乙酯類黏著劑、聚酯類黏著劑、聚乙烯醚類黏著劑等。在上述之中,從容易發揮所期望的黏著力的觀點來看,以使用丙烯酸類黏著劑為佳。(2) Adhesive layer The adhesive constituting the adhesive layer of the present embodiment is not particularly limited as long as it can express sufficient adhesion to the adherend (in particular, sufficient adhesion to the workpiece for processing the workpiece). Examples of adhesives constituting the adhesive layer include acrylic adhesives, rubber adhesives, silicone adhesives, urethane adhesives, polyester adhesives, and polyvinyl ether adhesives.剂 etc. Among the above, it is preferable to use an acrylic adhesive from the viewpoint of easy development of the desired adhesive force.

構成本實施形態中的黏著劑層的黏著劑,也可以是不具有活性能量射線硬化性的黏著劑,而以具有活性能量射線硬化性的黏著劑(以下有時稱為「活性能量射線硬化性黏著劑」)為佳。由於黏著劑層由活性能量射線硬化性黏著劑所構成,因此能夠藉由照射活性能量射線使得黏著劑層硬化,黏著片對於被黏著物的黏著力容易降低。特別是,在將根據本實施形態的黏著片作為工件加工用片使用的情況下,藉由照射活性能量射線,可變得容易將加工後的工件與該黏著片分離。The adhesive that constitutes the adhesive layer in this embodiment may be an adhesive that does not have active energy ray hardenability, but an adhesive that has active energy ray hardenability (hereinafter sometimes referred to as "active energy ray hardenability"). Adhesive”) is better. Since the adhesive layer is composed of an active energy ray-curable adhesive, the adhesive layer can be hardened by irradiating the active energy ray, and the adhesive force of the adhesive sheet to the adherend is easily reduced. In particular, when the adhesive sheet according to the present embodiment is used as a sheet for workpiece processing, by irradiating active energy rays, it becomes easy to separate the processed workpiece from the adhesive sheet.

作為構成黏著劑層的活性能量射線硬化性黏著劑,可以由具有活性能量射線硬化性的聚合物作為主要成分,或者也可以由活性能量射線非硬化性聚合物(不具有活性能量射線硬化性的聚合物)和具有至少一個以上的活性能量射線硬化性基團的單體及/或低聚物之混合物作為主要成分。As the active energy ray curable adhesive constituting the adhesive layer, a polymer having active energy ray curability can be used as the main component, or it can also be composed of an active energy ray non-curable polymer (non-active energy ray curable polymer). Polymer) and a mixture of monomers and/or oligomers having at least one active energy ray-curable group as main components.

具有活性能量射線硬化性的聚合物以在側鏈導入了具有活性能量射線硬化性的官能基(活性能量射線硬化性基團)之(甲基)丙烯酸酯聚合物(以下有時稱為「活性能量射線硬化性聚合物」)為佳。此活性能量射線硬化性聚合物,以使得具有含有官能基的單體單元之丙烯酸類共聚物、和具有可與上述官能基鍵結的官能基之含有不飽和基的化合物進行反應所得到的聚合物為佳。另外,在本說明書中,所謂(甲基)丙烯酸係意味著丙烯酸及甲基丙烯酸兩者。其他類似的用語也是如此。再者,「聚合物」也包括「共聚物」的概念。The active energy ray-curable polymer is a (meth)acrylate polymer in which an active energy ray-curable functional group (active energy ray-curable group) is introduced into the side chain (hereinafter sometimes referred to as "active energy ray-curable group). Energy ray curable polymer") is preferred. This active energy ray-curable polymer is a polymerization obtained by reacting an acrylic copolymer having a functional group-containing monomer unit and an unsaturated group-containing compound having a functional group capable of bonding with the above-mentioned functional group Good things. In addition, in this specification, the (meth)acrylic type means both acrylic acid and methacrylic acid. The same goes for other similar terms. Furthermore, "polymer" also includes the concept of "copolymer".

上述活性能量射線硬化性聚合物的重量平均分子量以1萬以上為佳,以15萬以上為特佳,且以20萬以上為更佳。再者,該重量平均分子量以250萬以下為佳,以200萬以下為特佳,且以150萬以下為更佳。另外,本說明書中的重量平均分子量(Mw)係藉由凝膠滲透層析法(gel permeation chromatography,GPC)所測量出的標準聚苯乙烯換算的值。The weight average molecular weight of the active energy ray-curable polymer is preferably 10,000 or more, particularly preferably 150,000 or more, and more preferably 200,000 or more. Furthermore, the weight average molecular weight is preferably 2.5 million or less, particularly preferably 2 million or less, and more preferably 1.5 million or less. In addition, the weight average molecular weight (Mw) in this specification is a value converted from standard polystyrene measured by gel permeation chromatography (GPC).

另一方面,在活性能量射線硬化性黏著劑包括由活性能量射線非硬化性聚合物和具有至少一個以上的活性能量射線硬化性基團的單體及/或低聚物之混合物作為主要成分的情況下,作為該活性能量射線非硬化性聚合物成分,例如,可以使用使含不飽和基團的化合物進行反應之前的上述丙烯酸類共聚物。再者,作為活性能量射線硬化性的單體及/或低聚物,例如可以使用多元醇與(甲基)丙烯酸的酯等。On the other hand, the active energy ray hardening adhesive includes a mixture of active energy ray non-hardening polymers and monomers and/or oligomers having at least one active energy ray hardening group as main components. In this case, as the active energy ray non-curable polymer component, for example, the above-mentioned acrylic copolymer before reacting the unsaturated group-containing compound can be used. In addition, as active energy ray-curable monomers and/or oligomers, for example, esters of polyols and (meth)acrylic acid can be used.

作為上述活性能量射線非硬化性聚合物成分之丙烯酸類聚合物的重量平均分子量以1萬以上為佳,以15萬以上為特佳,且以20萬以上為更佳。再者,該重量平均分子量以250萬以下為佳,以200萬以下為特佳,且以150萬以下為更佳。The weight average molecular weight of the acrylic polymer as the active energy ray non-curable polymer component is preferably 10,000 or more, particularly preferably 150,000 or more, and more preferably 200,000 or more. Furthermore, the weight average molecular weight is preferably 2.5 million or less, particularly preferably 2 million or less, and more preferably 1.5 million or less.

另外,在使用紫外線作為用於將活性能量射線硬化性黏著劑硬化之活性能量射線的情況下,以對該黏著劑添加光聚合起始劑為佳。再者,也可以在該黏著劑中添加活性能量射線非硬化性聚合物成分和低聚物成分、或交聯劑等。In addition, when ultraviolet rays are used as the active energy rays for curing the active energy ray-curable adhesive, it is preferable to add a photopolymerization initiator to the adhesive. Furthermore, an active energy ray non-curable polymer component and an oligomer component, or a crosslinking agent may be added to the adhesive.

本實施形態中的黏著劑層的厚度以1μm以上為佳,以2μm以上為特佳,且以3μm以上為更佳。再者,黏著劑層的厚度以50μm以下為佳,以40μm以下為特佳,且以30μm以下為更佳。由於黏著劑層的厚度為1μm以上,因此根據本實施形態的黏著片變得容易發揮出所期望的黏著性。再者,由於黏著劑層的厚度為50μm以下,因此在將被黏著物從硬化後的黏著劑層分離時,變得容易進行分離。The thickness of the adhesive layer in this embodiment is preferably 1 μm or more, particularly preferably 2 μm or more, and more preferably 3 μm or more. Furthermore, the thickness of the adhesive layer is preferably 50 μm or less, particularly preferably 40 μm or less, and more preferably 30 μm or less. Since the thickness of the adhesive layer is 1 μm or more, the adhesive sheet according to this embodiment can easily exhibit the desired adhesiveness. Furthermore, since the thickness of the adhesive layer is 50 μm or less, when the adherend is separated from the cured adhesive layer, it becomes easy to separate.

(3)剝離片 在根據本實施形態的黏著片中,在將黏著劑層中與基材為相反側的表面(以下有時稱為「黏著表面」)貼附於被黏著物之前,也可以為了保護該表面而在該表面上積層剝離片。(3) Peeling sheet In the adhesive sheet according to this embodiment, before attaching the surface of the adhesive layer opposite to the substrate (hereinafter sometimes referred to as "adhesive surface") to the adherend, the surface may be protected A release sheet is laminated on this surface.

上述剝離片可具有任意的構造,例如利用剝離劑等對塑膠膜進行了剝離處理的構造。作為該塑膠膜的具體範例,可列舉出聚對苯二甲酸乙二醇酯、聚對苯二甲酸丁二醇酯、聚萘二甲酸乙二醇酯等的聚酯膜;以及聚丙烯和聚乙烯等的聚烯烴膜。作為上述剝離劑,可以使用聚矽氧類、氟類、長鏈烷基類等,在上述之中,以價格便宜且能夠得到穩定的性能的聚矽氧類為佳。The above-mentioned release sheet may have any structure, for example, a structure in which a plastic film is peeled off with a release agent or the like. As specific examples of the plastic film, polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate can be cited; as well as polypropylene and poly Polyolefin films such as ethylene. As the above-mentioned release agent, silicones, fluorines, long-chain alkyls, etc. can be used. Among the above, silicones that are inexpensive and can obtain stable performance are preferred.

對於上述剝離片的厚度並沒有特別的限制,例如可以是20μm以上、250μm以下。The thickness of the release sheet is not particularly limited, and may be, for example, 20 μm or more and 250 μm or less.

(4)其他 在根據本實施形態的黏著片中,也可以在黏著劑層中與基材為相反側的表面上積層接著劑層。在此情況下,根據本實施形態的黏著片可以用來作為切割・晶片接合片。在該片中,可以將工件貼附於接著劑層中與黏著劑層為相反側的表面上,並將接著劑層與該工件一起切割,進而得到積層了單體化的接著劑層的晶片。該晶片變得可藉由此單體化的接著劑層而容易地固定於安裝該晶片的物體上。作為構成上述接著劑層的材料,以使用含有熱塑性樹脂和低分子量的熱硬化性接著成分的材料、或含有B階段(半硬化狀)的熱硬化型接著成分的材料等為佳。(4) Other In the pressure-sensitive adhesive sheet according to this embodiment, the adhesive layer may be laminated on the surface of the pressure-sensitive adhesive layer on the side opposite to the substrate. In this case, the adhesive sheet according to this embodiment can be used as a dicing/die bonding sheet. In this sheet, the workpiece can be attached to the surface of the adhesive layer on the opposite side of the adhesive layer, and the adhesive layer can be cut together with the workpiece to obtain a wafer laminated with a singular adhesive layer . The chip can be easily fixed to the object on which the chip is mounted by the thus singulated adhesive layer. As a material constituting the adhesive layer, it is preferable to use a material containing a thermoplastic resin and a low molecular weight thermosetting adhesive component, or a material containing a B-stage (semi-cured) thermosetting adhesive component, or the like.

再者,在根據本實施形態的黏著片中,也可以在黏著劑層中的黏著表面上積層保護膜形成層。在此情況下,根據本實施形態的黏著片可以用來作為保護膜形成兼切割用片。在這種片中,可以將工件貼附於保護膜形成層中與黏著劑層為相反側的表面上,並將保護膜形成層與該工件一起切割,進而得到積層了單體化的保護膜形成層的晶片。作為該工件,以使用在一表面上形成有電路的工件為佳,在此情況下,通常在與形成了該電路的表面為相反側的表面上積層保護膜形成層。可以使得單體化的保護膜形成層以預定的時間硬化,進而在晶片上形成具有充分的耐久性的保護膜。保護膜形成層以由未硬化的硬化性接著劑所構成為佳。Furthermore, in the adhesive sheet according to this embodiment, a protective film forming layer may be laminated on the adhesive surface of the adhesive layer. In this case, the adhesive sheet according to this embodiment can be used as a protective film formation and dicing sheet. In this sheet, the workpiece can be attached to the surface of the protective film forming layer on the opposite side of the adhesive layer, and the protective film forming layer can be cut together with the workpiece to obtain a laminated protective film. Layered wafers. As the workpiece, it is preferable to use a workpiece with a circuit formed on one surface. In this case, a protective film forming layer is usually laminated on the surface opposite to the surface on which the circuit is formed. The singulated protective film forming layer can be cured in a predetermined time, and a protective film having sufficient durability can be formed on the wafer. The protective film forming layer is preferably composed of an uncured curable adhesive.

2.黏著片的製造方法 根據本實施形態的黏著片的製造方法並沒有特別限定。例如,以藉由在剝離片上形成黏著劑層之後將基材的一面積層於該黏著劑層中與剝離片為相反側的表面上進而得到黏著片為佳。2. Manufacturing method of adhesive sheet The manufacturing method of the pressure-sensitive adhesive sheet according to this embodiment is not particularly limited. For example, it is preferable to obtain an adhesive sheet by forming an adhesive layer on the release sheet and then layer an area of the base material on the surface of the adhesive layer on the opposite side of the release sheet.

可以利用公知的方法形成上述黏著劑層。例如,製備出含有用於形成黏著劑層的黏著性組合物、及根據所需進一步添加的溶劑或分散介質之塗佈液。然後,將上述塗佈液塗佈於剝離片中具有剝離性的表面(以下有時稱為「剝離表面」)上。接著,可以藉由將所得到的塗膜乾燥,以形成黏著劑層。The above-mentioned adhesive layer can be formed by a well-known method. For example, a coating liquid containing an adhesive composition for forming an adhesive layer, and a solvent or dispersion medium to be further added as required is prepared. Then, the above-mentioned coating liquid is applied to the releasable surface of the release sheet (hereinafter may be referred to as a “release surface”). Next, the obtained coating film can be dried to form an adhesive layer.

可以利用公知的方法塗佈上述塗佈液,例如,可以利用棒塗(bar coating)法、刮刀塗佈(knife coating)法、輥塗(roll coating)法、刮刀(blade coating)塗佈法、模具塗佈(die coating)法、凹版塗佈(gravure coating)法等來進行。另外,塗佈液只要可進行塗佈則其性質並沒有特別限定,若有包含用於形成黏著劑層的成分作為溶質的情況,則也有包含作為分散介質的情況。再者,可以將剝離片作為製程材料剝離,或者也可以用來保護黏著劑層,直到其貼附於被黏著物上為止。The above-mentioned coating liquid can be applied by a known method, for example, a bar coating method, a knife coating method, a roll coating method, a blade coating method, Die coating (die coating) method, gravure coating (gravure coating) method, etc. are performed. In addition, the properties of the coating liquid are not particularly limited as long as it can be applied. If it contains a component for forming an adhesive layer as a solute, it may also contain it as a dispersion medium. Furthermore, the release sheet can be used as a process material to peel off, or it can be used to protect the adhesive layer until it is attached to the adherend.

在用於形成黏著劑層的黏著性組合物包含前述交聯劑的情況下,以藉由改變上述的乾燥條件(溫度、時間等)、或藉由另外進行加熱處理,使得塗膜內的聚合物成分與交聯劑產生交聯反應,進而以在黏著劑層內具有所期望的存在密度形成交聯結構為佳。此外,為了使上述交聯反應充分地進行,也可以在將黏著劑層與基材貼合後,在例如23°C、相對濕度為50%的環境下靜置數天,以進行固化。In the case where the adhesive composition for forming the adhesive layer contains the aforementioned crosslinking agent, by changing the above-mentioned drying conditions (temperature, time, etc.), or by additionally performing heat treatment, the polymerization in the coating film The material component and the cross-linking agent produce a cross-linking reaction, and it is better to form a cross-linked structure with a desired density in the adhesive layer. In addition, in order to fully advance the above-mentioned crosslinking reaction, after bonding the adhesive layer and the base material, for example, it may be allowed to stand for several days in an environment at 23° C. and a relative humidity of 50% for curing.

3.黏著片的使用方法 根據本實施形態的黏著片可以像一般的黏著片一樣使用於各種的用途,但特別適合使用於作為為了加工半導體晶圓等的工件時所使用的工件加工用片。在此情況下,可以在將根據本實施形態的黏著片的黏著表面貼附於工件上之後,在黏著片上進行工件的加工。根據本實施形態的黏著片可以取決於該加工而作為晶背研磨片、切割片、擴展片、拾取片等的工件加工用片使用。此處,作為工件的範例,可列舉出半導體晶圓、半導體封裝體等的半導體部件、玻璃板等的玻璃部件。3. How to use the adhesive sheet The adhesive sheet according to this embodiment can be used for various applications like general adhesive sheets, but is particularly suitable for use as a workpiece processing sheet used for processing workpieces such as semiconductor wafers. In this case, after attaching the adhesive surface of the adhesive sheet according to this embodiment to the workpiece, the workpiece can be processed on the adhesive sheet. The pressure-sensitive adhesive sheet according to the present embodiment can be used as a wafer processing sheet such as a crystal back polishing sheet, a dicing sheet, an expansion sheet, and a pick-up sheet, depending on the processing. Here, as examples of the workpiece, semiconductor components such as semiconductor wafers and semiconductor packages, and glass components such as glass plates can be cited.

如同前述,根據本實施形態的黏著片能夠良好地進行擴展。因此,在上述工件加工用片之中,根據本實施形態的黏著片特別適合作為會進行擴展的片材(切割片、擴展片、拾取片等)使用。As mentioned above, the adhesive sheet according to this embodiment can be expanded well. Therefore, among the above-mentioned workpiece processing sheets, the adhesive sheet according to this embodiment is particularly suitable for use as a sheet that can be expanded (a dicing sheet, an expansion sheet, a pickup sheet, etc.).

另外,在根據本實施形態的黏著片包括前述接著劑層的情況下,該黏著片能夠作為切割・晶片接合片使用。此外,在根據本實施形態的黏著片包括前述保護膜形成層的情況下,該黏著片能夠作為保護膜形成兼切割用片。In addition, when the adhesive sheet according to this embodiment includes the aforementioned adhesive layer, the adhesive sheet can be used as a dicing/die bonding sheet. In addition, when the pressure-sensitive adhesive sheet according to the present embodiment includes the aforementioned protective film forming layer, the pressure-sensitive adhesive sheet can be used as a protective film forming and dicing sheet.

再者,在根據本實施形態的黏著片中的黏著劑層由前述活性能量射線硬化性黏著劑所構成的情況下,也以在使用時照射下列的活性能量射線為佳。亦即,在黏著片上完成工件的加工並將加工後的工件與黏著片分離的情況下,以在進行該分離之前對黏著劑層照射活性能量射線為佳。如此一來,黏著劑層硬化,黏著片對加工後的工件的黏著力良好地降低,因而變得可容易地將加工後的工件分離。Furthermore, when the adhesive layer in the adhesive sheet according to the present embodiment is composed of the aforementioned active energy ray-curable adhesive, it is also preferable to irradiate the following active energy rays during use. That is, in the case where the processing of the workpiece is completed on the adhesive sheet and the processed workpiece is separated from the adhesive sheet, it is preferable to irradiate the adhesive layer with active energy rays before the separation. In this way, the adhesive layer is hardened, and the adhesion of the adhesive sheet to the processed workpiece is reduced well, so that the processed workpiece can be easily separated.

以上說明的實施形態係為了易於理解本發明所記載,且並非用於限定本發明而記載的。因此,意味著上述實施形態中所公開的各要件也包含屬於本發明的技術範圍內的所有設計變更和均等物。The embodiments described above are described for ease of understanding of the present invention, and are not described for limiting the present invention. Therefore, it means that each requirement disclosed in the above-mentioned embodiment also includes all design changes and equivalents falling within the technical scope of the present invention.

[實施例] 以下,透過實施例等更具體地說明本發明,然而本發明的範圍並不限定於這些實施例等。[Example] Hereinafter, the present invention will be explained more specifically through examples and the like, but the scope of the present invention is not limited to these examples and the like.

[實施例1] (1)黏著性組合物的調配 將160份的產品名稱為「DOWSIL SD 4580」、40份的產品名稱為「DOWSIL 7646」、和1.5份的產品名稱為「DOWSIL SRX 212」之各種聚矽氧類樹脂混合(任一產品皆由陶氏東麗(Dow Toray)股份公司所製造),以得到聚矽氧類黏著性組合物。[Example 1] (1) Preparation of adhesive composition Mix 160 parts of the product name "DOWSIL SD 4580", 40 parts of the product name "DOWSIL 7646", and 1.5 parts of the product name "DOWSIL SRX 212" of various silicone resins (any product is made of Dow Toray (Dow Toray) Co., Ltd.) to obtain silicone adhesive composition.

(2)黏著劑層的形成 將上述所得到的聚矽氧類黏著性組合物塗佈於使用氟類剝離劑對聚對苯二甲酸乙二醇酯膜的一面進行了剝離處理而得到的剝離片(由琳得科(Lintec)股份公司所製造,產品名為「SP-PET 50E-0010YC」)之剝離處理面,並將所得到的塗膜在100℃下乾燥1分鐘。如此一來,得到了剝離片的剝離表面上形成有厚度為10μm的黏著劑層之積層體。(2) Formation of adhesive layer The silicone adhesive composition obtained above was applied to a release sheet obtained by peeling off one side of a polyethylene terephthalate film using a fluorine-based release agent (Lintec ) The peeling treatment surface manufactured by the joint stock company, the product name is "SP-PET 50E-0010YC"), and the resulting coating film is dried at 100°C for 1 minute. In this way, a laminate in which an adhesive layer having a thickness of 10 μm was formed on the release surface of the release sheet was obtained.

(3)黏著片的製作 將作為基材的聚四氟乙烯(PTFE)片(由霓佳斯(Nichias)股份公司所製造,產品名稱為「Naflon PTFE tape TOMBO 9001」,厚度:100μm)的一面與在上述步驟(2)中所得到的積層體中黏著劑層之側的表面貼合,以得到黏著片。(3) Making of adhesive sheet The side of the polytetrafluoroethylene (PTFE) sheet (manufactured by Nichias Co., Ltd., product name "Naflon PTFE tape TOMBO 9001", thickness: 100μm) as the base material is the same as in the above step (2) The surface of the adhesive layer side of the laminate obtained in the above was bonded to obtain an adhesive sheet.

[實施例2] (1)黏著性組合物的調配 利用溶液聚合法,使95質量份的丙烯酸正丁酯、和5質量份的丙烯酸進行聚合,以得到(甲基)丙烯酸酯聚合物。此丙烯酸類聚合物的重量平均分子量(Mw)以後續描述的方法測量得知為50萬。[Example 2] (1) Preparation of adhesive composition Using the solution polymerization method, 95 parts by mass of n-butyl acrylate and 5 parts by mass of acrylic acid were polymerized to obtain a (meth)acrylate polymer. The weight average molecular weight (Mw) of this acrylic polymer is determined to be 500,000 by the method described later.

將100質量份的以上述方法得到的(甲基)丙烯酸酯聚合物(以固體成分換算,以下亦同)、120質量份的胺甲酸乙酯丙烯酸酯(urethane acrylate)低聚物(Mw:8,000)、5質量份的異氰酸酯類交聯劑(由東曹(Tosoh)股份公司所製造,產品名稱為「Coronate L」)、和4質量份的光聚合起始劑(由IGM Resins BV公司所製造,產品名稱為「Omnirad 184」)混合,以得到活性能量射線硬化型的黏著性組合物。100 parts by mass of the (meth)acrylate polymer obtained by the above method (calculated in terms of solid content, the same applies hereinafter), and 120 parts by mass of urethane acrylate oligomer (Mw: 8,000) ), 5 parts by mass of isocyanate crosslinking agent (manufactured by Tosoh Co., Ltd., the product name is "Coronate L"), and 4 parts by mass of photopolymerization initiator (manufactured by IGM Resins BV) , The product name is "Omnirad 184") to obtain an active energy ray-curable adhesive composition.

(2)黏著劑層的形成 將在上述步驟(1)中所得到的黏著性組合物塗佈於使用聚矽氧類剝離劑對厚度為38μm的聚對苯二甲酸乙二醇酯膜的一面進行了剝離處理而得到的剝離片(由琳得科股份公司所製造,產品名為「SP-PET381031」)之剝離處理面,並將所得到的塗膜在100℃下乾燥1分鐘。如此一來,得到了剝離片的剝離表面上形成有厚度為10μm的黏著劑層之積層體。(2) Formation of adhesive layer The adhesive composition obtained in the above step (1) is applied to the peeling process of a polyethylene terephthalate film with a thickness of 38 μm using a silicone-based release agent. The peeling surface of the sheet (manufactured by Lindek Co., Ltd., product name is "SP-PET381031"), and the resulting coating film is dried at 100°C for 1 minute. In this way, a laminate in which an adhesive layer having a thickness of 10 μm was formed on the release surface of the release sheet was obtained.

(3)黏著片的製作 將作為基材的熱塑性聚氨酯彈性體(TPU)片(由巴斯夫(BASF)公司所製造,產品名稱為「Elastollan 1164D」,厚度:80μm)的一面與在上述步驟(2)中所得到的積層體中黏著劑層之側的表面貼合,以得到黏著片。(3) Making of adhesive sheet The base material of a thermoplastic polyurethane elastomer (TPU) sheet (manufactured by BASF, product name "Elastollan 1164D", thickness: 80μm) and the laminate obtained in the above step (2) The surface on the side of the middle adhesive layer is laminated to obtain an adhesive sheet.

此處,前述重量平均分子量(Mw)係使用凝膠滲透層析法(GPC)在以下的條件下所測量(GPC測量)的標準聚苯乙烯換算的重量平均分子量。 <測量條件> ・測量裝置:由東曹股份公司所製造的HLC-8320 ・GPC管柱(依下列的順序通過):由東曹股份公司所製造 TSK gel super H-H TSK gel super HM-H TSK gel super H2000 ・測量溶劑:四氫呋喃(tetrahydrofuran) ・測量溫度:40℃Here, the aforementioned weight average molecular weight (Mw) is a weight average molecular weight in terms of standard polystyrene measured (GPC measurement) using gel permeation chromatography (GPC) under the following conditions. <Measurement conditions> ・Measuring device: HLC-8320 manufactured by Tosoh Corporation ・GPC column (pass in the following order): manufactured by Tosoh Corporation TSK gel super H-H TSK gel super HM-H TSK gel super H2000 ・Measurement solvent: tetrahydrofuran (tetrahydrofuran) ・Measurement temperature: 40°C

[實施例3] 在裝設有攪拌器、餾出管及減壓裝置的反應器內加入12.90kg的1,4-環己烷二甲酸二甲酯(反式異構體比例為98%)、11.47kg的1,4-環己烷二甲醇、0.3kg的乙二醇、及0.11kg的包含10%醋酸錳四水合物的乙二醇溶液,並在氮氣流下加熱至200℃之後,在1小時內將溫度升高至230℃。將其直接靜置2小時進行酯交換反應之後,將10.30kg的芥酸衍生的二聚酸(碳原子數為44,由Croda公司所製造,產品名稱為「PRIPOL1004」)、0.11kg的包含10%磷酸三甲酯的乙二醇溶液添加至反應系內,接著在230℃下進行1小時的酯化反應。接著,添加300ppm的二氧化鍺作為縮聚催化劑並攪拌之後,在1小時內將壓力降低至133Pa以下,在此期間,將內部溫度從230℃上升至270℃,並攪拌直到在133Pa以下的高真空之下變成預定的黏度為止,以進行縮聚反應。將所得到的聚合物在水中擠出成繩股狀,並切成粒狀。[Example 3] In a reactor equipped with a stirrer, a distillation tube and a decompression device, add 12.90kg of 1,4-cyclohexanedicarboxylate (the ratio of trans isomer is 98%), 11.47kg of 1 , 4-cyclohexanedimethanol, 0.3 kg of ethylene glycol, and 0.11 kg of ethylene glycol solution containing 10% manganese acetate tetrahydrate, and heated to 200 ℃ under a nitrogen stream, the temperature was changed within 1 hour Raised to 230°C. After leaving it to stand for 2 hours for transesterification reaction, 10.30 kg of erucic acid-derived dimer acid (44 carbon atoms, manufactured by Croda, product name "PRIPOL1004"), 0.11 kg containing 10 The ethylene glycol solution of% trimethyl phosphate was added to the reaction system, followed by an esterification reaction at 230°C for 1 hour. Next, 300 ppm of germanium dioxide was added as a polycondensation catalyst and stirred, and the pressure was reduced to 133 Pa or less within 1 hour. During this time, the internal temperature was increased from 230°C to 270°C and stirred until the high vacuum was below 133 Pa The viscosity is lowered to a predetermined viscosity for the polycondensation reaction to proceed. The obtained polymer is extruded into strands in water and cut into pellets.

將以上述方式得到的聚酯樹脂(PEs)的粒料在85℃下乾燥4小時以上之後,放入設置有T型模具的單螺桿擠出機的進料斗中。然後,在氣缸溫度為220°C、模具溫度為220°C的條件下,將上述樹脂以熔融混煉的狀態從T型模具擠出,並藉由冷卻輥使其冷卻,進而得到厚度為80μm的片狀的基材。除了使用該基材以外,其餘以與實施例2相同的方式得到黏著片。After the pellets of the polyester resin (PEs) obtained in the above manner were dried at 85° C. for 4 hours or more, they were put into a hopper of a single screw extruder equipped with a T-die. Then, under the conditions of a cylinder temperature of 220°C and a mold temperature of 220°C, the above resin was extruded from the T-die in a melt-kneaded state, and cooled by a cooling roll to obtain a thickness of 80μm. The sheet-like substrate. The adhesive sheet was obtained in the same manner as in Example 2 except that the substrate was used.

另外,上述聚酯樹脂包含大約50莫耳%的1,4-環己烷二甲醇、大約40.5莫耳%的二甲基1,4-環己烷二羧酸、及9.5莫耳%的芥酸衍生的二聚酸作為構成該樹脂的單體。再者,相對於構成上述聚酯樹脂的所有二羧酸單元,上述二聚酸的比例為19.1莫耳%。In addition, the above-mentioned polyester resin contains about 50 mol% of 1,4-cyclohexane dimethanol, about 40.5 mol% of dimethyl 1,4-cyclohexane dicarboxylic acid, and 9.5 mol% of mustard. The acid-derived dimer acid serves as the monomer constituting the resin. Furthermore, the ratio of the dimer acid to all the dicarboxylic acid units constituting the polyester resin was 19.1 mol%.

此外,根據JIS K 7121:2012,使用差示掃描量熱計(由TA儀器公司所製造的DSC,產品名稱為「DSC Q2000」)所測量出的上述聚酯樹脂的熔融熱為20J/g。在該測量步驟中,首先,以20℃/min的升溫速率從常溫加熱至250℃,且在250℃下維持10分鐘,並以20℃/min的降溫速率降低至-60℃,且在-60℃下維持10分鐘。然後,再次以20℃/min的升溫速率加熱至250℃,以得到DSC曲線,並測量出熔點。In addition, according to JIS K 7121:2012, the heat of fusion of the polyester resin measured using a differential scanning calorimeter (DSC manufactured by TA Instruments, product name "DSC Q2000") was 20 J/g. In this measurement step, first, heat from normal temperature to 250°C at a temperature increase rate of 20°C/min, maintain at 250°C for 10 minutes, and lower the temperature to -60°C at a temperature decrease rate of 20°C/min, and Maintain at 60°C for 10 minutes. Then, it was heated again to 250°C at a heating rate of 20°C/min to obtain a DSC curve, and the melting point was measured.

[實施例4] 以與實施例3相同的方式得到聚酯樹脂(PEs)的粒料。然後,將該粒料在85℃下乾燥4小時以上。然後,利用雙螺桿混煉機,將70質量份的乾燥的該粒料、和30質量份的作為苯乙烯類彈性體的苯乙烯・乙烯/丁烯・苯乙烯共聚物(SBES)(苯乙烯/乙烯・丁烯比= 20/80,熔體流動速率(MFR)= 13.0g/10min(根據ISO1133在230°C、2.16 kg的負載下進行測量))混煉。將藉此得到的粒料放入設置有T型模具的單螺桿擠出機的進料斗中。然後,在氣缸溫度為220°C、模具溫度為220°C的條件下,將上述粒料以熔融混煉的狀態從T型模具擠出,並藉由冷卻輥使其冷卻,進而得到厚度為80μm的片狀的基材。除了使用該基材以外,其餘以與實施例2相同的方式得到黏著片。[Example 4] In the same manner as in Example 3, pellets of polyester resin (PEs) were obtained. Then, the pellets were dried at 85°C for 4 hours or more. Then, using a twin-screw kneader, 70 parts by mass of the dried pellets and 30 parts by mass of styrene·ethylene/butylene·styrene copolymer (SBES) (styrene /Ethylene·Butene ratio = 20/80, Melt Flow Rate (MFR) = 13.0g/10min (measured in accordance with ISO1133 at 230°C and a load of 2.16 kg)) for mixing. The pellets thus obtained are put into the hopper of a single screw extruder equipped with a T-die. Then, under the conditions of a cylinder temperature of 220°C and a mold temperature of 220°C, the pellets were extruded from the T-die in a melt-kneaded state, and cooled by a cooling roll to obtain a thickness of 80μm sheet-like substrate. The adhesive sheet was obtained in the same manner as in Example 2 except that the substrate was used.

[比較例1] 除了使用由乙烯・甲基丙烯酸共聚物(EMAA)所構成的基材(厚度:80μm)作為基材以外,其餘以與實施例2相同的方式得到黏著片。[Comparative Example 1] The adhesive sheet was obtained in the same manner as in Example 2 except that a substrate (thickness: 80 μm) composed of ethylene-methacrylic acid copolymer (EMAA) was used as the substrate.

[比較例2] 除了在使用由EMAA所構成且一表面經過電子束照射(EB)處理的基材(厚度:80μm)作為基材的同時,在該基材進行過電子束照射的表面上積層黏著劑層以外,其餘以與實施例2相同的方式得到黏著片。[Comparative Example 2] In addition to using a substrate (thickness: 80 μm) composed of EMAA and having one surface treated with electron beam irradiation (EB) as the substrate, an adhesive layer is laminated on the surface of the substrate subjected to electron beam irradiation, Otherwise, an adhesive sheet was obtained in the same manner as in Example 2.

[試驗例1](基材的拉伸物性的測量) 對於在實施例及比較例中所製作出的基材,以其平面視角的任意一方向作為基準方向,定義出在該基準方向與平面視角之間所形成的角度為0°、10°、20°、30°、40°、50°、60°、70°、80°、90°、100°、110°、120°、130°、140°、150°、160°及170°總共18個方向。[Test Example 1] (Measurement of the tensile properties of the base material) For the substrates produced in the Examples and Comparative Examples, any one of the plane viewing angles is used as the reference direction, and the angle formed between the reference direction and the plane viewing angle is defined as 0°, 10°, 20° °, 30°, 40°, 50°, 60°, 70°, 80°, 90°, 100°, 110°, 120°, 130°, 140°, 150°, 160° and 170°A total of 18 directions .

接著,藉由將上述基材切斷,以得到18種試驗片(15mm×150mm)。在進行該切斷時,將各個試驗片切斷,使得其長邊平行於上述18個方向之一。Next, by cutting the above-mentioned base material, 18 kinds of test pieces (15 mm×150 mm) were obtained. When performing this cutting, each test piece was cut so that its long side was parallel to one of the above-mentioned 18 directions.

對於這些試驗片,根據JIS K7127:1999,使用拉伸試驗機(由島津製作所所製造,產品名稱為「Autograph AG-Xplus 100N」),將卡盤之間的距離設為100mm,在23℃的環境下,以200mm/min的速度,進行在長邊方向上拉伸試驗片之拉伸試驗。For these test pieces, in accordance with JIS K7127: 1999, using a tensile testing machine (manufactured by Shimadzu Corporation, the product name is "Autograph AG-Xplus 100N"), the distance between the chucks is set to 100mm, and the temperature is at 23°C. Under the environment, at a speed of 200mm/min, perform a tensile test of the tensile test piece in the longitudinal direction.

接著,從上述試驗的結果分別計算出將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量。然後,針對該增加量最小的試驗片,將平行於該試驗片的長邊的方向(前述18個方向之中的1個方向)定義為第一測量方向。再者,將與該第一測量方向在平面視角中所形成的角度為90°之方向定義為第二測量方向。另外,上述第二測量方向與基材的MD方向(製造基材時的輸送方向)大致上平行,而上述第一測量方向與基材的TD方向(與上述MD方向垂直的方向)大致上平行。Next, the increase in tensile stress obtained by subtracting the tensile stress at 200% elongation by the tensile stress at 100% elongation was calculated from the results of the above-mentioned test. Then, for the test piece with the smallest amount of increase, the direction parallel to the long side of the test piece (one of the aforementioned 18 directions) is defined as the first measurement direction. Furthermore, the direction whose angle formed by the plane viewing angle with the first measurement direction is 90° is defined as the second measurement direction. In addition, the second measurement direction is substantially parallel to the MD direction of the substrate (the transport direction when the substrate is manufactured), and the first measurement direction is substantially parallel to the TD direction of the substrate (the direction perpendicular to the MD direction). .

然後,再次將在實施例及比較例中所製作出的基材切斷,使其長邊與第一測量方向平行,以得到尺寸為15mm×150mm的試驗片。根據JIS K7127:1999,對該試驗片測量出拉伸彈性模量及斷裂伸長率。具體而言,將上述試驗片利用拉伸試驗機(由島津製作所所製造,產品名稱為「Autograph AG-Xplus 100N」)將卡盤之間的距離設為100mm之後,在23℃的環境下,以200mm/min的速度,進行在基材膜的第一測量方向上拉伸試驗片之拉伸試驗,以測量出拉伸彈性模量(MPa)及斷裂伸長率(%)。這些結果作為根據第一測定方向的拉伸彈性模量及斷裂伸長率顯示於表1中。Then, the base materials produced in the examples and comparative examples were cut again so that the long sides were parallel to the first measurement direction to obtain a test piece with a size of 15 mm×150 mm. According to JIS K7127: 1999, the tensile modulus and elongation at break were measured for this test piece. Specifically, using a tensile testing machine (manufactured by Shimadzu Corporation, with the product name "Autograph AG-Xplus 100N") on the above-mentioned test piece, the distance between the chucks is set to 100 mm, and then in an environment of 23°C, At a speed of 200 mm/min, a tensile test of the tensile test piece in the first measurement direction of the base film is performed to measure the tensile modulus (MPa) and the elongation at break (%). These results are shown in Table 1 as the tensile modulus of elasticity and the elongation at break according to the first measurement direction.

再者,對於以與上述相同的方式獲得的試驗片,在23℃的環境下,以200mm/min的速度,進行在基材膜的第一測量方向上拉伸試驗片之拉伸試驗,以測量出拉伸伸長率(%)從0%增加到250%時的拉伸應力(MPa)的變化。Furthermore, for the test piece obtained in the same manner as described above, a tensile test was performed to stretch the test piece in the first measurement direction of the base film at a speed of 200 mm/min in an environment of 23° C. to The change in tensile stress (MPa) when the tensile elongation (%) is increased from 0% to 250% is measured.

然後,記錄下拉伸伸長率為10%、50%、100%、150%、200%及250%的時間點的拉伸應力(MPa)。此外,分別計算出拉伸伸長率從10%的時間點增加至200%的時間點的拉伸應力的增加量(MPa)及拉伸伸長率從100%的時間點增加至200%的時間點的拉伸應力的增加量(MPa)。再者,計算出拉伸伸長率為200%的時間點的拉伸應力相對於拉伸伸長率為100%的時間點的拉伸應力之比例。這些結果作為根據第一測量方向的各拉伸物性的測量值也顯示於表1中。Then, the tensile stress (MPa) at the time points at which the tensile elongation was 10%, 50%, 100%, 150%, 200%, and 250% was recorded. In addition, the increase in tensile stress (MPa) and the time when the tensile elongation increased from 100% to 200% were calculated respectively. The increase in tensile stress (MPa). Furthermore, the ratio of the tensile stress at the time when the tensile elongation was 200% to the tensile stress at the time when the tensile elongation was 100% was calculated. These results are also shown in Table 1 as measured values of each stretched physical property according to the first measurement direction.

此外,對於如以上所述的測量出的拉伸應力(MPa),將測量結果繪製於以拉伸伸長率(單位:%)為橫軸、以拉伸應力(單位:MPa)為縱軸的座標平面上,以製作出曲線。確認在該曲線中是否存在拉伸應力成為極大值之極大點,其結果顯示於表1中。此外,在存在該極大點的情況下,也進一步確認是否存在拉伸應力成為極小值之極小點,然後確定極大點(在存在複數個的情況下,其為拉伸伸長率的值為最小之極大點)與極小點(在存在複數個的情況下,其為拉伸伸長率的值為最小之極小點)之間的拉伸應力的差異的絕對值(MPa)。其結果亦如表1所示。In addition, for the tensile stress (MPa) measured as described above, the measurement result is plotted on the horizontal axis with the tensile elongation (unit: %) and the tensile stress (unit: MPa) as the vertical axis. On the coordinate plane, to make a curve. It was confirmed whether there is a maximum point where the tensile stress becomes a maximum value in the curve. The results are shown in Table 1. In addition, in the case of the existence of this maximum point, it is further confirmed whether there is a minimum point where the tensile stress becomes a minimum value, and then the maximum point is determined (if there are more than one point, it is the minimum value of the tensile elongation The absolute value (MPa) of the difference in tensile stress between the maximum point) and the minimum point (in the case of multiple points, which is the minimum point where the value of the tensile elongation is the smallest). The results are also shown in Table 1.

再者,以與上述獲得試驗片的方法相同的方式,得到用於測量根據第二測量方向的拉伸物性的試驗片。亦即,藉由將150mm的邊切斷,使其與基材的第二測量方向平行,以切割出15mm×150mm的試驗片。Furthermore, in the same manner as the method of obtaining the test piece described above, a test piece for measuring the tensile properties according to the second measurement direction was obtained. That is, by cutting the side of 150 mm so as to be parallel to the second measurement direction of the base material, a test piece of 15 mm×150 mm was cut out.

對於藉此所得到的試驗片,在以與上述相同的方式測量拉伸彈性模量(MPa)的同時,測量出拉伸伸長率(%)從0%增加到250%時的拉伸應力(MPa)的變化。然後,從拉伸應力(MPa)的變化確定在10%、50%、100%、150%、200%及250%的時間點的拉伸應力(MPa),並進一步計算出從上述數值增加的拉伸應力的增加量(MPa)。計算出從10%的時間點到200%的時間點、從50%的時間點到150%的時間點、從50%的時間點到250%的時間點、及從100%的時間點到200%的時間點的四種,作為該增加量。這些結果作為根據第二測量方向的各拉伸物性的測量值也顯示於表2中。For the test piece thus obtained, while measuring the tensile elastic modulus (MPa) in the same manner as above, the tensile stress ( MPa) change. Then, determine the tensile stress (MPa) at 10%, 50%, 100%, 150%, 200%, and 250% from the change in tensile stress (MPa), and further calculate the increase from the above value Increase in tensile stress (MPa). Calculate from 10% time point to 200% time point, from 50% time point to 150% time point, from 50% time point to 250% time point, and from 100% time point to 200 % Of the four time points, as the increase. These results are also shown in Table 2 as measured values of each stretched physical property according to the second measurement direction.

[試驗例2](擴展性的評估) 將剝離片從在實施例及比較例中所製造出的黏著片上剝離,並在將因而露出的黏著劑層的露出表面貼附於厚度為40μm的矽晶圓的一面之後,將切割用環形框架附著於黏著片中上述露出表面的周緣部分(與矽晶圓不重疊的位置)。接著,使用劃片機(由Disco股份公司所製造,產品名為「DFD6362」),在以下的條件下對該矽晶圓進行切割。 ・工件(被黏著物):矽晶圓 ・工件尺寸:直徑為6英寸,厚度為40μm ・切割刀:由Disco股份公司所製造,產品名為「27HECC」的鑽石刀 ・刀片轉速:50,000 rpm ・劃片速度:100mm/sec ・切割深度:從基材膜表面切割至20μm的深度 ・切割尺寸:8mmx8mm[Test Example 2] (Evaluation of scalability) The peeling sheet was peeled from the adhesive sheets manufactured in the examples and comparative examples, and after the exposed surface of the adhesive layer thus exposed was attached to one side of a silicon wafer with a thickness of 40 μm, the ring frame for dicing was applied Attached to the peripheral part of the exposed surface of the adhesive sheet (a position that does not overlap with the silicon wafer). Then, using a dicing machine (manufactured by Disco Co., Ltd., product name "DFD6362"), the silicon wafer was diced under the following conditions. ・Workpiece (adhesive): silicon wafer ・Workpiece size: Diameter is 6 inches, thickness is 40μm ・Cutting knife: A diamond knife manufactured by Disco Co., Ltd., with the product name "27HECC" ・Blade speed: 50,000 rpm ・Scribing speed: 100mm/sec ・Cutting depth: Cut from the surface of the base film to a depth of 20μm ・Cutting size: 8mmx8mm

然後,將貼附有藉由切割所得到的晶片及環形框架之黏著片設置在擴展裝置(由JCM股份公司所製造,產品名稱為「ME-300B」)中,並將環形框架以2mm/sec的速度拉下直到拉下量變為40mm為止。Then, the adhesive sheet to which the chip obtained by dicing and the ring frame are attached is set in the expansion device (manufactured by JCM Co., Ltd., the product name is "ME-300B"), and the ring frame is set at 2mm/sec Pull down at a speed of 40mm until the amount of pull down becomes 40mm.

接著,記錄下產生斷裂時的拉下量(mm)。然後,基於以下的標準評估擴展性。其結果如表1及表2所示(表1及表2中所示之結果相同)。 A:拉下量(mm)為40mm以上。 F:拉下量(mm)未滿40mm。Next, the amount of pull (mm) when the fracture occurred was recorded. Then, the scalability is evaluated based on the following criteria. The results are shown in Table 1 and Table 2 (the results shown in Table 1 and Table 2 are the same). A: The pull-down amount (mm) is 40mm or more. F: The pull-down amount (mm) is less than 40mm.

[表1]

Figure 02_image001
[Table 1]
Figure 02_image001

[表2]

Figure 02_image003
[Table 2]
Figure 02_image003

從表1及2可明確得知,在實施例中製造出的黏著片表現出優異的擴展性。 [產業上的可利性]It is clear from Tables 1 and 2 that the adhesive sheets manufactured in the examples exhibited excellent expandability. [Industrial Profitability]

本發明的黏著片能夠適用於作為半導體晶圓等的工件的加工時所使用的工件加工用片。The adhesive sheet of the present invention can be applied to a workpiece processing sheet used in the processing of a workpiece such as a semiconductor wafer.

無。none.

[圖1] 繪示出用於說明本實施形態中的基材的物性的曲線。[Fig. 1] A curve for explaining the physical properties of the substrate in this embodiment is drawn.

Claims (10)

一種黏著片,其係包括基材、和積層於前述基材的一表面側上的黏著劑層之黏著片,其中前述基材不含有氯原子,且以前述基材的平面視角的任意一方向作為基準方向,在前述基準方向與平面視角之間所形成的角度為0°、10°、20°、30°、40°、50°、60°、70°、80°、90°、100°、110°、120°、130°、140°、150°、160°及170°共18個方向之中,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量最小之方向設為第一測量方向的情況下,對於前述基材,在前述第一測量方向上,從伸長10%時至伸長100%時的拉伸應力全部皆介於8MPa以上、30MPa以下的範圍內,且對於前述基材,在前述第一測量方向上,從伸長100%時至伸長200%時的拉伸應力全部皆介於10MPa以上、40MPa以下的範圍內。An adhesive sheet comprising a base material and an adhesive layer laminated on one surface side of the base material, wherein the base material does not contain chlorine atoms and is in any direction from the plane viewing angle of the base material As the reference direction, the angle formed between the aforementioned reference direction and the plane viewing angle is 0°, 10°, 20°, 30°, 40°, 50°, 60°, 70°, 80°, 90°, 100° , 110°, 120°, 130°, 140°, 150°, 160° and 170° in 18 directions, the tensile stress at 200% elongation is subtracted from the tensile stress at 100% elongation When the direction with the smallest increase in tensile stress is set as the first measurement direction, for the aforementioned substrate, in the aforementioned first measurement direction, the tensile stresses from 10% elongation to 100% elongation are all between Within the range of 8 MPa or more and 30 MPa or less, and for the aforementioned substrate, in the aforementioned first measurement direction, the tensile stresses from 100% elongation to 200% elongation are all within the range of 10 MPa or more and 40 MPa or less. 如請求項1所述之黏著片,其中對於前述基材,在前述第一測量方向上,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量為1MPa以上、20MPa以下。The pressure-sensitive adhesive sheet according to claim 1, wherein for the aforementioned substrate, the tensile stress obtained by subtracting the tensile stress at 100% elongation from the tensile stress at 100% elongation in the aforementioned first measurement direction The increase is 1 MPa or more and 20 MPa or less. 如請求項1所述之黏著片,其中將為前述基材的平面視角的一方向且與前述第一測量方向之間所形成的角度為90°之方向設為第二測量方向的情況下,對於前述基材,在前述第二測量方向上,從伸長10%時至伸長100%時的拉伸應力全部皆介於5MPa以上、30MPa以下的範圍內,且對於前述基材,在前述第二測量方向上,從伸長100%時至伸長200%時的拉伸應力全部皆介於10MPa以上、40MPa以下的範圍內。The pressure-sensitive adhesive sheet according to claim 1, wherein the direction in which the angle formed between the first measurement direction and the first measurement direction is one direction of the plane viewing angle of the substrate is set as the second measurement direction, For the aforementioned substrate, in the aforementioned second measurement direction, the tensile stress from 10% elongation to 100% elongation is all within the range of 5 MPa or more and 30 MPa or less. In the measurement direction, the tensile stresses from 100% elongation to 200% elongation are all within the range of 10 MPa or more and 40 MPa or less. 如請求項3所述之黏著片,其中對於前述基材,在前述第二測量方向上,將伸長200%時的拉伸應力減掉伸長100%時的拉伸應力所得到的拉伸應力的增加量為1MPa以上、20MPa以下。The pressure-sensitive adhesive sheet according to claim 3, wherein for the aforementioned substrate, the tensile stress obtained by subtracting the tensile stress at 100% elongation from the tensile stress at 100% elongation in the aforementioned second measurement direction The increase is 1 MPa or more and 20 MPa or less. 如請求項1所述之黏著片,其中前述基材在前述第一測量方向上的拉伸彈性模量為100MPa以上、1000MPa以下。The adhesive sheet according to claim 1, wherein the tensile elastic modulus of the base material in the first measurement direction is 100 MPa or more and 1000 MPa or less. 如請求項1所述之黏著片,其中前述基材在前述第一測量方向上的斷裂伸長率為100%以上、1000%以下。The adhesive sheet according to claim 1, wherein the elongation at break of the base material in the first measurement direction is 100% or more and 1000% or less. 如請求項1所述之黏著片,其中對於將在前述第一測量方向上進行前述基材的拉伸試驗的情況下所測量出的結果繪製在以拉伸伸長率(單位:%)為橫軸且以拉伸應力(單位:MPa)為縱軸的座標平面上而得到的曲線,前述曲線中不存在成為極大值的點,或者前述曲線中存在至少一個成為極大值的點及一個成為極小值的點,而且,在前述成為極大值的點之中前述拉伸伸長率為最小值的點之前述拉伸應力的值、與在前述成為極小值的點之中前述拉伸伸長率為最小值的點之前述拉伸應力的值之間的差異的絕對值為2.0MPa以下。The pressure-sensitive adhesive sheet according to claim 1, wherein the result measured in the case where the tensile test of the substrate is performed in the first measurement direction is plotted with the tensile elongation (unit: %) as the horizontal A curve obtained on the coordinate plane with the tensile stress (unit: MPa) as the vertical axis. There is no point in the curve that reaches a maximum value, or there is at least one point that becomes a maximum value and one point that becomes a minimum in the curve. In addition, the value of the tensile stress at the point where the tensile elongation is the minimum among the points that become the maximum value, and the point where the tensile elongation is the minimum among the points that become the minimum value The absolute value of the difference between the aforementioned tensile stress values at the point of value is 2.0 MPa or less. 如請求項1所述之黏著片,其中前述基材不含有鹵素原子。The adhesive sheet according to claim 1, wherein the aforementioned base material does not contain halogen atoms. 如請求項1所述之黏著片,其用於作為工件加工用片。The adhesive sheet described in claim 1, which is used as a sheet for workpiece processing. 如請求項9所述之黏著片,其中前述工件加工用片為切割片。The adhesive sheet according to claim 9, wherein the aforementioned workpiece processing sheet is a dicing sheet.
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