TWI657550B - Extensible sheet and method for manufacturing laminated wafer - Google Patents

Extensible sheet and method for manufacturing laminated wafer Download PDF

Info

Publication number
TWI657550B
TWI657550B TW104104670A TW104104670A TWI657550B TW I657550 B TWI657550 B TW I657550B TW 104104670 A TW104104670 A TW 104104670A TW 104104670 A TW104104670 A TW 104104670A TW I657550 B TWI657550 B TW I657550B
Authority
TW
Taiwan
Prior art keywords
region
sheet
substrate
stretchable sheet
projection
Prior art date
Application number
TW104104670A
Other languages
Chinese (zh)
Other versions
TW201539685A (en
Inventor
中村優智
宮永朋治
村上幸範
Original Assignee
日商琳得科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW201539685A publication Critical patent/TW201539685A/en
Application granted granted Critical
Publication of TWI657550B publication Critical patent/TWI657550B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/4985Flexible insulating substrates

Abstract

本發明提供一種能夠在多突設工件適當地製造包含最遠位凸部的積層晶片的可延伸片材,及使用該可延伸片材製造積層晶片的方法。 The present invention provides an extendable sheet capable of appropriately producing a laminated wafer including a most distal convex portion in a multi-projection workpiece, and a method of manufacturing a laminated wafer using the stretchable sheet.

為瞭解決上述課題,提供一種可延伸片材10,其包括有熱收縮性的基材1與在基材1一方的主面上積層的黏著劑層2;加工用區域10a,由以平面視將加工用區域10a的外周作為其外周的環狀區域之第1區域11a,與位於環狀區域的第1區域11a的內周側,含有加工用區域10a的以平面視為中心的第2區域12a形成,上述加工用區域,在比可延伸片材10的基材1更近位於黏著劑層2之側的主面的第1主面,使用時應該被黏附於基板21上在厚度方向上包括複數個凸部22的被加工構件20上之區域;第1區域11a,包括由以第2區域12a為基準,作為從基材1離間方向的突起部的第1突起部11p形成的面11pa。 In order to solve the above problems, an extendable sheet 10 comprising a heat-shrinkable substrate 1 and an adhesive layer 2 laminated on one main surface of the substrate 1 and a processing region 10a by a plan view are provided. The first region 11a having the outer circumference of the processing region 10a as the outer circumferential region and the second region having the processing region 10a as the center on the inner peripheral side of the first region 11a located in the annular region 12a is formed, and the processing region is formed on the first main surface of the main surface on the side of the adhesive layer 2 closer to the substrate 1 of the extendable sheet 10, and should be adhered to the substrate 21 in the thickness direction in use. A region on the member to be processed 20 including a plurality of convex portions 22; the first region 11a includes a surface 11pa formed by the first projection 11p as a projection from the base region 1 with respect to the second region 12a. .

Description

可延伸片材以及積層晶片之製造方法 Extensible sheet and method for manufacturing laminated wafer

本發明係關於一種將半導體晶圓等被加工構件分割成小片之際所使用之可延伸片材以及使用該可延伸片材的積層晶片之製造方法。再者,於本說明書中,「片材」之用語之概念為包含「帶」之用語之概念以及「膜」之用語之概念者。 The present invention relates to an extendable sheet used for dividing a member to be processed such as a semiconductor wafer into small pieces, and a method of manufacturing a laminated wafer using the extendable sheet. Furthermore, in this specification, the term "sheet" is used to include the concept of the term "belt" and the concept of the term "film".

近年來,封裝的高密度化進步,有將矽晶圓代替基板,使用Si貫通電極(TSV、Through-Silicon Via),在其上積層晶片之情形。將這樣積層製造晶片的技術亦稱為磊晶圓(Chip on Wafer)技術(例如,參照專利文獻1)。藉由COW技術製造的積層體在矽基板上晶片呈突起之狀態,其突起高度有達到數百μm之情形。 In recent years, there has been an increase in the density of packages, in which a silicon wafer is used instead of a substrate, and a Si through electrode (TSV, Through-Silicon Via) is used to laminate a wafer thereon. The technique of manufacturing a wafer in this manner is also referred to as a chip on wafer technique (for example, refer to Patent Document 1). The laminate manufactured by the COW technique has a state in which the wafer is protruded on the substrate, and the height of the protrusion is several hundred μm.

先行技術文獻 Advanced technical literature 專利文獻 Patent literature

專利文獻1:日本特開2009-110995號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2009-110995

像這樣對基板上在厚度方向由包括複數個凸部的積層體構成的被加工構件(於本說明書中,將這樣的被加工構件亦稱為「多突設工件」。)進行分割,製造作為含有複數個凸 部中的至少一個的片狀體的積層晶片時,與存在含有溶質的加工液有進入構成積層晶片的複數個晶片間之可能性的刮刀切割(Blade Dicing)這樣的濕式切割加工相比,以隱形切割(Stealth Dicing)(註冊商標)這樣的乾式切割(dicing)加工為佳。 In this way, the workpiece to be processed (in the present specification, such a workpiece is also referred to as a "multi-projection workpiece") is divided and manufactured in the thickness direction in the thickness direction by a laminate including a plurality of convex portions. Contains a plurality of convex When the laminated wafer of the sheet-like body of at least one of the portions is compared with the wet-cutting process such as blade dicing where there is a possibility that the processing liquid containing the solute enters between the plurality of wafers constituting the laminated wafer Dry dicing such as Stealth Dicing (registered trademark) is preferred.

在此,在隱形切割(註冊商標)加工中,藉由對黏著於被加工構件的加工用片材賦予使其周緣部從中央部離間這樣的張力使加工用片材延伸,對黏著於加工用片材的被加工構件也賦予使其周緣部從其中央部離間方向之力,得到彼此離間了的複數個片狀體。於本說明書中,將用於隱形切割(註冊商標)加工等的可延伸的加工用片材稱為「可延伸片材」。 Here, in the process of the invisible dicing (registered trademark), the processing sheet is applied to the processing sheet adhered to the workpiece, and the processing sheet is stretched by the tension of the peripheral portion from the center portion, thereby adhering to the processing sheet. The member to be processed of the sheet is also provided with a force that causes the peripheral portion to be separated from the central portion thereof, and a plurality of sheet-like bodies that are separated from each other are obtained. In the present specification, an extensible processing sheet for invisible cutting (registered trademark) processing or the like is referred to as an "extensible sheet".

被加工構件為多突設工件的情形,僅對多突設工件的凸部黏附可延伸片材,基於可延伸片材的延伸,夾著分割預定線,藉由使所配置的凸部彼此離間進行多突設工件的分割。為此,多突設工件中位於離該工件中心最遠位的凸部(於本說明書中,亦稱為「最遠位凸部」),不能從位於比多突設工件中最遠位凸部更遠元的部分分離自己。故僅在凸部黏著可延伸片材的狀態,不可能將含有該最遠位凸部的積層晶片製造成適宜的大小,必要把最遠位凸部設為假定的凸部。設置這樣的假設的最遠位凸部之步驟其本身就是浪費,且從有效利用被加工構件的觀點亦期望有所改善。 In the case where the workpiece is a multi-projection workpiece, only the protrusion of the multi-projection workpiece is adhered to the extendable sheet, and based on the extension of the extendable sheet, the division line is sandwiched, and the arranged protrusions are separated from each other. Perform multi-projection division of the workpiece. For this reason, the convex portion located in the workpiece farthest from the center of the workpiece (also referred to as "the farthest convex portion" in the present specification) can not be protruded from the farthest position in the workpiece. Part of the farther yuan separates itself. Therefore, in a state in which the stretchable sheet is adhered to the convex portion, it is impossible to manufacture the laminated wafer including the most distal convex portion to an appropriate size, and it is necessary to set the most distal convex portion as a predetermined convex portion. The step of setting such a hypothetical farthest convex portion is itself wasteful, and it is expected to be improved from the viewpoint of effectively utilizing the processed member.

本發明的課題在於提供一種於多突設工件中能適宜製造含有最遠位凸部的積層晶片的可延伸片材以及使用該可延伸片材製造積層晶片之方法。 An object of the present invention is to provide an extendable sheet which can suitably produce a laminated wafer including a farthest convex portion in a multi-projection workpiece, and a method for producing a laminated wafer using the stretchable sheet.

為達成上述之目的本發明者等經過檢討,結果發現如下之新知見:以對多突設工件黏附可延伸片材之狀態,藉由可延伸片材具有在成為積層晶片的一部的部分以外之部分(於本說明書中,為最遠位殘餘部)進行黏著的部分,可以適宜製造含有最遠位凸部的積層晶片,上述部分以平面視為元於比多突設工件的最遠位凸部更遠離多突設工件中心的遠元之部分(當然不是凸部)。 In order to achieve the above-mentioned object, the inventors of the present invention have found that the following is known: in the state in which the stretchable sheet is adhered to the multi-projection workpiece, the stretchable sheet has a portion which is a part of the laminated wafer. The part to be adhered (in the present specification, the most distant residual portion) can be suitably fabricated into a laminated wafer containing the most distant convex portion, and the above portion is regarded as a farthest position of the workpiece than the multi-projected workpiece. The convex portion is farther away from the far part of the multi-projected workpiece center (of course not the convex portion).

基於上述知見完成的本發明,第1提供一種可延伸片材,其為包括有熱收縮性的基材與在上述基材一方的主面上積層有黏著劑層的可延伸片材;其特徵在於:加工用區域,由以平面視將上述加工用區域的外周作為其外周的環狀區域之第1區域,與位於環狀區域的上述第1區域的內周側,含有上述加工用區域的以平面視為中心的第2區域形成,上述加工用區域,在比上述可延伸片材的上述基材更近位於上述黏著劑層之側的主面的第1主面,使用時應該被黏附於在基板上在厚度方向上包括複數個凸部的被加工構件上之區域;上述第1區域,包括由以上述第2區域為基準,作為從上述基材離間方向的突起部的第1突起部形成的面(發明1)。 Based on the above-described findings, the first invention provides an extendable sheet which is an extensible sheet comprising a heat-shrinkable substrate and an adhesive layer laminated on one main surface of the substrate; In the processing region, the first region of the annular region in which the outer periphery of the processing region is defined as a plane in plan view, and the inner peripheral side of the first region in the annular region include the processing region. Formed in a second region having a plane as a center, and the processing region is to be adhered to the first main surface of the main surface on the side of the adhesive layer closer to the substrate of the stretchable sheet. a region on a member to be processed including a plurality of convex portions in a thickness direction on the substrate; the first region includes a first protrusion as a protrusion from the substrate in a direction away from the substrate The surface formed by the part (Invention 1).

於上述發明(發明1)中,上述被加工構件為藉由含有分割步驟的工藝而被分割成複數個片狀體者,上述分割步驟為對被加工構件照射具有透過性的雷射光線連續形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件的步驟;上述複數個片狀體,以含有被分割成至少包括一個上述複數個凸部的片狀體之積層晶片為佳(發明2)。 In the above invention (Invention 1), the member to be processed is divided into a plurality of sheet-like bodies by a process including a dividing step, and the dividing step is to continuously form a laser beam having transparency to the member to be processed. a step of dividing a member to be processed by a formation of the modified layer along a division line having a reduced strength; the plurality of sheets having a sheet divided into at least one of the plurality of protrusions A laminated wafer of the shape is preferred (Invention 2).

於上述發明(發明1或2)中,使用時,上述被加工構件中最遠位殘餘部以黏著於由上述第1突起部形成的面為佳,上述最遠位殘餘部為以平面視,位於比位於上述被加工構件的中心最遠位的凸部更遠元的部分,為成為上述積層晶片之一部的部分以外的部分(發明3)。 In the above invention (Invention 1 or 2), in use, the most distal residual portion of the workpiece is preferably adhered to the surface formed by the first projection, and the most distal residual portion is in plan view. The portion located farther than the convex portion located farthest from the center of the workpiece is the portion other than the portion of the laminated wafer (Invention 3).

於上述發明(發明1至3)中,在使用時,上述被加工構件中上述複數個凸部以黏著於上述第2區域為佳(發明4)。 In the above invention (Inventions 1 to 3), in the above-described workpiece, it is preferable that the plurality of convex portions are adhered to the second region in the workpiece (Invention 4).

於上述發明(發明1至4)中,上述可延伸片材的上述第1主面,較佳為以平面視在上述加工用區域的外周側包括第3區域,上述第3區域有由以上述第2區域為基準在從上述基材離間的方向上突出之突起部的第3突起部的面形成的第3突起區域,上述第3突起部有熱收縮性(發明5)。 In the above invention (Inventions 1 to 4), it is preferable that the first main surface of the extendable sheet includes a third region on an outer peripheral side of the processing region in a plan view, and the third region has The second region is a third projection region formed on the surface of the third projection portion of the projection protruding from the direction in which the substrate is separated from each other, and the third projection has heat shrinkability (Invention 5).

於上述發明(發明1至5)中,在上述第3區域的至少一部分區域所對應的上述可延伸片材的部分,較佳上述基材為最厚的構件(發明6)。 In the above inventions (Inventions 1 to 5), it is preferable that the substrate is the thickest member in the portion of the stretchable sheet corresponding to at least a part of the region of the third region (Invention 6).

於上述發明(發明1至6)中,將含有上述基材以及上述黏著劑層的積層體黏附於矽鏡面晶圓(Silicon mirror wafer),基於JIS Z0237:2000所測定的上述積層體的黏著力以1000mN/25mm以上20000mN/25mm以下為佳(發明7)。 In the above invention (Inventions 1 to 6), the laminate including the base material and the pressure-sensitive adhesive layer is adhered to a mirror mirror wafer, and the adhesion of the laminate is measured based on JIS Z0237:2000. It is preferably 1000 mN/25 mm or more and 20,000 mN/25 mm or less (Invention 7).

於上述發明(發明1至7)中,上述第1區域的突起部較佳為上述第2區域基準之突起高度為200μm以上(發明8)。 In the above invention (Inventions 1 to 7), it is preferable that the projection of the first region has a projection height of 200 μm or more in the second region (Invention 8).

於上述發明(發明1至8)中,上述基材以包括聚烯 烴膜為佳(發明9)。 In the above invention (Inventions 1 to 8), the above substrate comprises polyene A hydrocarbon film is preferred (Invention 9).

本發明第2提供一種積層晶片的製造方法,其為在基板上在厚度方向從包括複數個凸部的被加工構件製造至少含有1個上述複數個凸部的片狀體的積層晶片的方法,其包括分割步驟、黏附步驟、擴展步驟與拾取步驟;上述分割步驟為對被加工構件照射雷射光線於上述被加工構件連續形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件的步驟;上述黏附步驟為在經過了對被加工構件照射雷射光線於上述被加工構件連續形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件的步驟的被加工構件,以及以平面視被配置於上述被加工構件的外周側的環狀框架上,黏附上述發明(發明1至9)所述之可延伸片材,在上述被加工構件中以平面視為位於比位於上述被加工構件的中心最遠位的凸部更遠元的部分,且為上述積層晶片之一部的部分以外的部分即最遠元殘餘部上,黏著由上述第1突起部形成的面,同時在上述被加工構件的上述複數個凸部,黏著有上述第2區域的狀態的步驟;上述擴展步驟為使上述可延伸片材延伸,將上述被加工構件分割成複數個片狀體,複數個包括上述複數個凸部的至少1個的片狀體的積層晶片彼此離間地配置於上述可延伸片材上,同時使黏著於由上述第1突起部形成的面的上述被加工構件的上述凸部以外的部分為從上述積層晶片離間的狀態的步驟;上述拾取步驟為使上述積層晶片從上述可延伸片材離間的步驟。 According to a second aspect of the invention, there is provided a method of manufacturing a laminated wafer in which a laminated wafer including at least one of the plurality of convex portions is formed on a substrate from a workpiece including a plurality of convex portions in a thickness direction, The method includes a dividing step, an adhering step, an expanding step and a picking step. The dividing step is to continuously irradiate the processed member with the laser beam to form a modified layer on the processed member, and the formation of the modified layer decreases along the strength. The step of dividing the predetermined line to divide the workpiece; the sticking step is to continuously form a modified layer on the processed member after irradiating the processed member with the laser beam, and the formation of the modified layer is reduced along the strength The workpiece to be processed in the step of dividing the predetermined line to be processed, and the annular frame disposed on the outer peripheral side of the workpiece in a plan view, and the extendable sheet described in the above invention (Inventions 1 to 9) are adhered a material in which the plane is regarded as a portion farther away from a convex portion located farthest from the center of the workpiece to be processed, and is the above a portion other than a portion of the layer wafer, that is, a portion of the most distant element, a surface formed by the first protrusion, and a state in which the second region is adhered to the plurality of convex portions of the workpiece And the expanding step of extending the stretchable sheet to divide the processed member into a plurality of sheet-like bodies, and the plurality of laminated wafers including at least one of the plurality of convex portions are spaced apart from each other a portion disposed on the extendable sheet and having a portion other than the convex portion of the workpiece to be adhered to the surface formed by the first projection is a state of being separated from the laminated wafer; and the picking step is The step of separating the laminated wafer from the extensible sheet.

於上述發明(發明10)中,上述第1突起部以上述 第2區域為基準的突起高度對於上述被加工構件所包括的上述凸部的以上述基板為基準的突起高度的比例,以80%以上120%以下為佳(發明11)。 In the above invention (Invention 10), the first protruding portion is as described above The ratio of the protrusion height in the second region to the protrusion height of the convex portion included in the workpiece to be processed is preferably 80% or more and 120% or less (Invention 11).

於上述發明(發明10或11)中,上述擴展步驟藉由在上述可延伸片材中對應於上述第3區域部分的一部分對接環狀的構件,進行上述可延伸片材的延伸,加熱上述可延伸片材中上述環狀構件所對接的部分,使該部分的上述基材收縮的復元步驟,以在結束上述擴展步驟之後開始上述拾取步驟之間準備為佳(發明12)。 In the above invention (Invention 10 or 11), in the expanding step, the extending of the extendable sheet is performed by heating a part of the stretchable sheet corresponding to a part of the third region portion It is preferable that the step of abutting the portion of the annular member in the extending sheet to shrink the portion of the substrate is preferably prepared between the above-described picking steps after the end of the expanding step (Invention 12).

於上述發明(發明10至12)中,包括上述可延伸片材的上述黏著劑層,含有能量線硬化性材料,藉由對上述黏著劑層照射能量線使上述能量線硬化性材料硬化,使上述黏著劑層之對上述晶片的粘著性降低的能量線照射步驟,以在結束上述擴展步驟之後開始上述拾取步驟之間準備為佳(發明13)。 In the above invention (Inventions 10 to 12), the pressure-sensitive adhesive layer including the stretchable sheet contains an energy ray-curable material, and the energy ray-curable material is cured by irradiating the adhesive layer with an energy ray. It is preferable that the energy ray irradiation step of reducing the adhesion of the above-mentioned adhesive layer to the wafer is started between the above-described pickup steps after the completion of the expansion step (Invention 13).

藉2由使用關於本發明的可延伸片材,實施關於本發明的製造方法,可以適宜地製造含有在多突設工件最遠位凸部之積層晶片。 By using the stretchable sheet according to the present invention, the manufacturing method relating to the present invention can be suitably carried out, and a laminated wafer containing the convex portion at the farthest position of the multi-projected workpiece can be suitably produced.

10‧‧‧可延伸片材 10‧‧‧Extensible sheet

1‧‧‧基材 1‧‧‧Substrate

2‧‧‧黏著劑層 2‧‧‧Adhesive layer

10A‧‧‧可延伸片材10的第1主面 10A‧‧‧1st main face of extendable sheet 10

10a‧‧‧加工用區域 10a‧‧‧Processing area

11a‧‧‧第1區域 11a‧‧‧1st area

11p‧‧‧第1突起部 11p‧‧‧1st protrusion

11pa‧‧‧第1凸出面 11pa‧‧‧1st convex surface

12a‧‧‧第2區域 12a‧‧‧2nd area

13a‧‧‧第3區域 13a‧‧‧3rd area

13p‧‧‧第3突起部 13p‧‧‧3rd protrusion

13b‧‧‧第3凸出區域 13b‧‧‧3rd convex area

13c‧‧‧易復原區域 13c‧‧‧Recoverable area

10L‧‧‧負荷區域 10L‧‧‧ load area

20‧‧‧多突設工件 20‧‧‧Multiple artifacts

21‧‧‧基板 21‧‧‧Substrate

21R‧‧‧最遠位殘餘部 21R‧‧‧The farthest residual

21m‧‧‧改性層 21m‧‧‧modified layer

22‧‧‧複數的凸部 22‧‧‧ plural convex parts

22d‧‧‧最遠位凸部 22d‧‧‧The farthest convex

30‧‧‧環狀框架 30‧‧‧Circular frame

40‧‧‧積層晶片 40‧‧‧Multilayer wafer

40d‧‧‧最遠位積層晶片 40d‧‧‧The farthest layer of laminated wafer

50‧‧‧可延伸片材 50‧‧‧Extensible sheet

10‧‧‧第1主面 10‧‧‧1st main face

1A‧‧‧上由多突設工件 1A‧‧‧Multiple projecting

20‧‧‧和環狀框架 20‧‧‧ and ring frame

30‧‧‧積層而構成的積層構造體 30‧‧‧Laminated structural structures

60‧‧‧環狀構件 60‧‧‧ ring members

70‧‧‧擴展後的積層體 70‧‧‧Expanded laminate

圖1:係關於本發明一實施形態之可延伸片材之一例的概略剖面圖。 Fig. 1 is a schematic cross-sectional view showing an example of an extendable sheet according to an embodiment of the present invention.

圖2:係關於本發明一實施形態之可延伸片材之一例的概略平面圖。 Fig. 2 is a schematic plan view showing an example of an extendable sheet according to an embodiment of the present invention.

圖3:係關於本發明一實施形態之可延伸片材的其他之一例的概略平面圖。 Fig. 3 is a schematic plan view showing another example of the stretchable sheet according to an embodiment of the present invention.

圖4:係關於本發明一實施形態之可延伸片材的其他之一例的概略剖面圖。 Fig. 4 is a schematic cross-sectional view showing another example of the stretchable sheet according to the embodiment of the present invention.

圖5:係表示在圖1所示可延伸片材黏著多突設工件以及環狀框架而成之積層構造體的概略剖面圖。 Fig. 5 is a schematic cross-sectional view showing a laminated structure in which a stretchable sheet and a ring-shaped frame are adhered to the stretchable sheet shown in Fig. 1;

圖6:係表示對圖5所示積層構造體實施擴展步驟之狀態的概略剖面圖。 Fig. 6 is a schematic cross-sectional view showing a state in which an expansion step is performed on the laminated structure shown in Fig. 5;

圖7:係表示由圖6所示積層構造體所得的擴展後之積層體的概略剖面圖。 Fig. 7 is a schematic cross-sectional view showing the expanded laminated body obtained from the laminated structure shown in Fig. 6.

圖8:係表示對在圖3以及4所示之可延伸片材黏著多突設工件以及環狀框架而成的積層構造體實施擴展步驟之狀態的概略剖面圖。 FIG. 8 is a schematic cross-sectional view showing a state in which the laminated structure in which the workpiece and the annular frame are adhered to the stretchable sheet shown in FIGS. 3 and 4 are subjected to an expanding step.

圖9:係表示由圖8所示積層構造體所得的擴展後之積層體的概略剖面圖。 Fig. 9 is a schematic cross-sectional view showing the expanded laminated body obtained from the laminated structure shown in Fig. 8.

於以下記載中,「改性層破斷式拉伸分割」係指對於被加工構件,照射具有透過性的雷射光線連續地形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件。作為基於改性層破斷式拉伸分割的晶片的製造方法,可舉濱松赫德尼古斯公司(Hamamatsu Photonics)提唱的隱形切割(註冊商標)法等。 In the following description, the "modified layer breaking type tensile division" means that a modified layer is continuously formed by irradiating a laser beam having transparency to a member to be processed, and the formation of the modified layer is lowered along the strength. The divided planned line divides the workpiece to be processed. As a method of producing a wafer based on the modified layer breaking type stretching, a stealth cutting (registered trademark) method such as Hamamatsu Photonics sings can be mentioned.

以下,關於本發明的實施形態進行說明。 Hereinafter, embodiments of the present invention will be described.

1.可延伸片材 1. Extendable sheet

圖1係示意性地表示關於本發明之一實施形態的可延伸片材之一例的構造的剖面圖。關於本發明之一實施形態的可延伸片材10,包括有熱收縮性之基材1與積層於上述基材1之一方主面上的黏著劑層2。 Fig. 1 is a cross-sectional view schematically showing the structure of an example of an extendable sheet according to an embodiment of the present invention. The stretchable sheet 10 according to an embodiment of the present invention includes a heat-shrinkable base material 1 and an adhesive layer 2 laminated on one main surface of the base material 1.

(1)基材 (1) Substrate

關於本實施形態之可延伸片材10的基材1,具有熱收縮性,同時只要在為得到積層晶片爾使可延伸片材10伸長時(於本說明書中,將使可延伸片材10伸長的步驟亦稱為「擴展步驟」)不破斷,則其構成材料無特別限定,通常由以樹脂系的材料為主材料的膜構成。作為該膜的具體例,可以例示含有具有基於烯烴的構成單位的聚合物的膜的聚烯烴膜。作為聚烯烴膜之具體例,可舉出乙烯-乙酸乙烯酯共聚物膜、乙烯-(甲基)丙烯酸共聚物膜、乙烯-(甲基)丙烯酸酯共聚物膜等的乙烯系共聚物膜;低密度聚乙烯(LDPE)膜、直鏈低密度聚乙烯(LLDPE)膜、高密度聚乙烯(HDPE)膜等的聚乙烯膜。再者,聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、乙烯-降冰片烯共聚物膜、降冰片烯樹脂膜等亦可作為聚烯烴膜之具體例而列舉。再者,亦可使用該等聚烯烴膜之架橋膜、如離子聚合物(ionomer)膜這樣的變性膜。上述基材1可為該等1種構成的膜,進一步亦可為將該等2種類以上組合所成的積層膜。又,於本說明書中,「(甲基)丙烯酸」是指丙烯酸以及甲基丙烯酸兩方。關於其他類似用語亦同樣。 The base material 1 of the stretchable sheet 10 of the present embodiment has heat shrinkability, and at the same time, as long as the stretchable sheet 10 is stretched in order to obtain a laminated wafer (in the present specification, the stretchable sheet 10 will be elongated) The step is also referred to as "expansion step". The constituent material is not particularly limited, and is usually composed of a film mainly composed of a resin-based material. As a specific example of the film, a polyolefin film containing a film having a polymer based on a constituent unit of an olefin can be exemplified. Specific examples of the polyolefin film include an ethylene-vinyl acetate copolymer film, an ethylene-(meth)acrylic copolymer film, and an ethylene-(meth)acrylate copolymer film; A polyethylene film such as a low density polyethylene (LDPE) film, a linear low density polyethylene (LLDPE) film, or a high density polyethylene (HDPE) film. Further, a polypropylene film, a polybutene film, a polybutadiene film, a polymethylpentene film, an ethylene-norbornene copolymer film, a norbornene resin film, or the like can also be used as a specific example of the polyolefin film. List. Further, a bridge film of the polyolefin film or a degeneration film such as an ionomer film may be used. The substrate 1 may be a film of the above-described composition, or may be a laminate film formed by combining the two or more types. In the present specification, "(meth)acrylic acid" means both acrylic acid and methacrylic acid. The same is true for other similar terms.

構成基材1的膜,從熱收縮性以及擴展步驟之適性(不易破斷)的觀點考慮,以包括乙烯系共聚膜為佳。 The film constituting the substrate 1 is preferably composed of a vinyl copolymer film from the viewpoint of heat shrinkability and suitability of the expansion step (not easily broken).

基材1,在以上述樹脂系材料作為主材料的膜內,可以含有顏料、阻燃劑、可塑劑、抗靜電劑、滑劑、填料等的各種添加劑。作為顏料,例如可舉出二氧化鈦、碳黑等。又,作為填料,可例示像三聚氰胺樹脂這樣的有機系材料、像煙霧矽膠這樣的無機系材料以及像鎳粒子這樣的金屬系材料。這些添加劑的含有量並無特別限定。 The substrate 1 may contain various additives such as a pigment, a flame retardant, a plasticizer, an antistatic agent, a lubricant, and a filler in the film containing the resin material as a main material. Examples of the pigment include titanium dioxide, carbon black, and the like. Further, examples of the filler include an organic material such as melamine resin, an inorganic material such as smog, and a metal material such as nickel particles. The content of these additives is not particularly limited.

對黏著劑層2照射能量線時,使用紫外線作為能量線時,基材1對紫外線以有透過性為佳。作為對黏著劑層2進行照射的能量線使用電子線時,基材1以具有電子線透過性為佳。 When the energy ray is applied to the adhesive layer 2, when the ultraviolet ray is used as the energy ray, the substrate 1 is preferably permeable to ultraviolet rays. When the electron beam is used as the energy ray for irradiating the adhesive layer 2, the substrate 1 preferably has electron beam permeability.

再者,基材1之面對黏著劑層2的主面之反對側的面上,只要能實現所希望的機能,則可以設置各種塗膜。 Further, the surface of the substrate 1 facing the opposite side of the main surface of the adhesive layer 2 may be provided with various coating films as long as the desired function can be achieved.

基材1之厚度並無特別限定。以20μm以上450μm以下範圍為佳,以25μm以上400μm以下範圍為更佳,以50μm以上350μm以下範圍為特別佳。 The thickness of the substrate 1 is not particularly limited. The range is preferably 20 μm or more and 450 μm or less, more preferably 25 μm or more and 400 μm or less, and particularly preferably 50 μm or more and 350 μm or less.

於本實施形態中基材1的破斷伸度,作為23℃、相對濕度50%時所測定的值,以100%以上為佳,以200%以上1000%以下為特別佳。在此,破斷伸度係在基於JIS K7161:1994(ISO 527-1 1993)的拉伸試驗中試驗片破斷時的試驗片之長度相對於元有長度的拉伸率。上述破斷伸度為100%以上的基材1,於擴展步驟之際不易破斷,易於將分割多突設工件所形成的積層晶片離間。 In the present embodiment, the breaking elongation of the substrate 1 is preferably 100% or more as a value measured at 23 ° C and a relative humidity of 50%, and particularly preferably 200% or more and 1000% or less. Here, the breaking elongation is a stretching ratio of the length of the test piece with respect to the length of the test piece when the test piece is broken in the tensile test based on JIS K7161:1994 (ISO 527-1 1993). The base material 1 having a breaking elongation of 100% or more is not easily broken during the expansion step, and it is easy to separate the laminated wafer formed by dividing the multi-projection workpiece.

再者,關於本實施形態之基材1的25%應變時拉伸應力以5N/10mm以上15N/10mm以下為佳,最大拉伸應力 以15MPa以上50MPa以下為佳。在此,25%應變時拉伸應力以及最大拉伸應力藉由依據JIS K7161:1994的試驗而測定。如果25%應變時拉伸應力未滿5N/10mm或最大拉伸應力未滿15MPa,則將可延伸片材10黏附於多突設工件後,固定於環狀框架等夾具之際,因基材1發軟有發生鬆弛之虞,該鬆弛有成為搬送故障原因之情形。再者,25%應變時拉伸應力超過15N/10mm,或最大引張應力超過50MPa,則擴展步驟時有可延伸片材10從環狀框架等夾具剝離等問題易於發生之虞。又,上述破斷伸度、25%應變時拉伸應力以及最大拉伸應力,指於其原材料之長度方向對基材1進行測定所得之值。 Further, the tensile stress at the 25% strain of the substrate 1 of the present embodiment is preferably 5 N/10 mm or more and 15 N/10 mm or less, and the maximum tensile stress is obtained. It is preferably 15 MPa or more and 50 MPa or less. Here, the tensile stress and the maximum tensile stress at 25% strain were measured by the test in accordance with JIS K7161:1994. If the tensile stress is less than 5 N/10 mm at 25% strain or the maximum tensile stress is less than 15 MPa, the stretchable sheet 10 is adhered to the multi-projection workpiece, and is fixed to a jig of a ring frame or the like due to the substrate. 1 When the hair is soft, there is a possibility that the slack occurs, and the slack is a cause of the transport failure. Further, when the tensile stress at 25% strain exceeds 15 N/10 mm, or the maximum tensile stress exceeds 50 MPa, problems such as peeling of the stretchable sheet 10 from a jig such as a ring frame are likely to occur during the expansion step. Further, the breaking elongation, the tensile stress at 25% strain, and the maximum tensile stress refer to values obtained by measuring the substrate 1 in the longitudinal direction of the raw material.

(2)黏著劑層 (2) Adhesive layer

關於本實施形態之可延伸片材10之黏著劑層2,可以藉由先前習知之各種的黏著劑組成物形成。作為像這樣的黏著劑,沒有任何的限定,可以使用譬如橡膠系、丙烯系、矽樹脂系、聚乙烯醚等的黏著劑組成物。再者,亦可以使用能量線硬化型或加熱發泡型、水膨脹型的黏著劑組成物。 The adhesive layer 2 of the stretchable sheet 10 of the present embodiment can be formed by various adhesive compositions previously known. As such an adhesive, there is no limitation, and an adhesive composition such as a rubber-based, acryl-based, enamel-resin or polyvinyl ether can be used. Further, an energy ray-curing type or a heat-foaming type or water-swellable type of adhesive composition can also be used.

關於本實施形態之可延伸片材10所包括之黏著劑層2,亦有由含有藉由照射能量線產生聚合反應的成分的能量線聚合型黏著劑組成物構成之情形。作為用於該聚合之能量線,可例示X射線、紫外線之類的電磁波、電子線等。於該等能量線中,以設置設備所需成本低,作業性亦優異之紫外線為佳。 The adhesive layer 2 included in the stretchable sheet 10 of the present embodiment may be composed of an energy ray-polymerizable adhesive composition containing a component which generates a polymerization reaction by irradiation with an energy ray. Examples of the energy ray used for the polymerization include electromagnetic waves such as X-rays and ultraviolet rays, and electron beams. Among these energy lines, ultraviolet rays having a low cost required for setting up the equipment and excellent workability are preferred.

成為藉由紫外線可聚合的黏著劑組成物之一例,可列舉如下所說明之丙烯酸系聚合物(α)及能量線聚合性化合 物(β)、按照必要進一步含有架橋劑(γ)等的黏著劑組成物。 Examples of the ultraviolet ray-polymerizable adhesive composition include an acrylic polymer (α) and an energy ray polymerizable compound described below. The substance (β) further contains an adhesive composition such as a bridging agent (γ) as necessary.

(2-1)丙烯酸系聚合物(α) (2-1) Acrylic polymer (α)

用於形成關於本實施形態之黏著劑層2的黏著劑組成物之一例,含有丙烯酸系聚合物(α)。在由該黏著劑組成物形成的黏著劑層2中,丙烯酸系聚合物(α)的至少一部分作為架橋物被含有,與後述之架橋劑(γ)進行架橋反應。 An example of the adhesive composition for forming the pressure-sensitive adhesive layer 2 of the present embodiment contains an acrylic polymer (α). In the adhesive layer 2 formed of the adhesive composition, at least a part of the acrylic polymer (α) is contained as a bridging material, and a bridging reaction is carried out with a bridging agent (γ) to be described later.

作為丙烯酸系聚合物(α)可使用先前習知之丙烯酸系聚合物。丙烯酸系聚合物(α)之重量平均分子量(Mw),從用於形成上述黏著劑層2之黏著劑組成物或於其中加入溶劑所得之組成物所成的塗工液(於本說明書,將該等塗工液總稱為「黏著層形成用塗工液」)的塗層時之造膜性的觀點來考慮,以1萬以上200萬以下為佳,以10萬以上150萬以下更佳。此外,丙烯酸系聚合物(α)之玻璃轉移溫度Tg,以-70℃以上30℃以下為佳,以-60℃以上20℃以下的範圍更佳。玻璃轉移溫度,可藉由Fox式計算。 As the acrylic polymer (α), a conventionally known acrylic polymer can be used. a weight average molecular weight (Mw) of the acrylic polymer (α), a coating liquid formed from the adhesive composition for forming the above-mentioned adhesive layer 2 or a composition obtained by adding a solvent thereto (in the present specification, The film forming property in the case of the coating of the "coating liquid for forming an adhesive layer" is preferably 10,000 or more and 2,000,000 or less, more preferably 100,000 or more and 1.5 million or less. Further, the glass transition temperature Tg of the acrylic polymer (α) is preferably from -70 ° C to 30 ° C, more preferably from -60 ° C to 20 ° C. The glass transition temperature can be calculated by the Fox formula.

上述丙烯酸系聚合物(α)可為1種丙烯酸系單體所形成之單獨聚合物,亦可為複數種丙烯酸系單體所形成之共聚物,亦可為1種或複數種丙烯酸系單體與丙烯酸系單體以外的單體所形成之共聚物。成為丙烯酸系單體之化合物之具體種類並無特別限定,具體例可舉(甲基)丙烯酸、(甲基)丙烯酸酯、其衍生物(丙烯腈等)。 The acrylic polymer (α) may be a single polymer formed of one type of acrylic monomer, or may be a copolymer of a plurality of acrylic monomers, or may be one or more acrylic monomers. A copolymer formed with a monomer other than the acrylic monomer. The specific type of the compound to be an acrylic monomer is not particularly limited, and specific examples thereof include (meth)acrylic acid, (meth)acrylic acid ester, and derivatives thereof (acrylonitrile or the like).

關於(甲基)丙烯酸酯,進一步表示具體例,則可舉出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯等的具有鏈狀骨 架之(甲基)丙烯酸酯;(甲基)丙烯酸環己酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸四氫糠酯、醯亞胺丙烯酸酯等的具有環狀骨架之(甲基)丙烯酸酯;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯等的具有羥基之(甲基)丙烯酸酯;(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸N-甲基胺基乙酯等的具有羥基以外的反應性官能團之(甲基)丙烯酸酯。此外,成為丙烯酸系單體以外的單體,可例示乙烯、降冰片烯等的烯烴、醋酸乙烯酯、苯乙烯等。再者,丙烯酸系單體為(甲基)丙烯酸烷基酯時,該烷基之碳數以1~18的範圍為佳。 Further, specific examples of the (meth) acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and butyl (meth)acrylate. Chained bone such as 2-ethylhexyl methacrylate (meth) acrylate; cyclohexyl (meth) acrylate, benzyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentyl (meth) acrylate, (meth) acrylate (meth)acrylate having a cyclic skeleton such as tetrahydrofurfuryl ester or quinone imine acrylate; 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate having a hydroxyl group (Meth) acrylate; (meth) acrylate having a reactive functional group other than a hydroxyl group such as glycidyl (meth)acrylate or N-methylaminoethyl (meth)acrylate. In addition, examples of the monomer other than the acrylic monomer include olefins such as ethylene and norbornene, vinyl acetate, and styrene. Further, when the acrylic monomer is an alkyl (meth)acrylate, the carbon number of the alkyl group is preferably in the range of 1 to 18.

作為形成關於本實施形態之黏著劑層2之黏著劑組成物,如後所述地含有可將丙烯酸系聚合物(α)架橋之架橋劑(γ)時,丙烯酸系聚合物(α)所具有的反應性官能團之種類並無特別限定,基於架橋劑(γ)的種類等適宜決定即可。例如,架橋劑(γ)為聚異氰酸酯化合物時,作為丙烯酸系聚合物(α)所具有的反應性官能團,可例示羥基、羧基、胺基等。該等之中,架橋劑(γ)係聚異氰酸酯化合物時,採用與異氰酸酯基的反應性高的羥基作為反應性官能團為佳。於丙烯酸系聚合物(α)導入羥基作為反應性官能團之方法並無特別限定。作為一例,可舉丙烯酸系聚合物(α)於骨架含有基於(甲基)丙烯酸2-羥基乙酯等的具有羥基之丙烯酸酯之構成單位之情形。 When the adhesive composition for forming the adhesive layer 2 of the present embodiment contains a bridging agent (γ) capable of bridging the acrylic polymer (α), the acrylic polymer (α) has The type of the reactive functional group is not particularly limited, and may be appropriately determined depending on the type of the bridging agent (γ). For example, when the bridging agent (γ) is a polyisocyanate compound, the reactive functional group of the acrylic polymer (α) may, for example, be a hydroxyl group, a carboxyl group or an amine group. Among these, when the bridging agent (γ) is a polyisocyanate compound, a hydroxyl group having high reactivity with an isocyanate group is preferably used as the reactive functional group. The method of introducing a hydroxyl group into the acrylic polymer (α) as a reactive functional group is not particularly limited. As an example, the acrylic polymer (α) may contain a constituent unit of a hydroxy group having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate in the skeleton.

丙烯酸系聚合物(α)具有反應性官能團時,以作為形成丙烯酸系聚合物(α)之單體換算,具有反應性官能團之單體對全單體之含有比例,以1質量%以上20質量%以下之程度為 佳,以2質量%以上10質量%以下更佳。 When the acrylic polymer (α) has a reactive functional group, the content of the monomer having a reactive functional group to the total monomer in terms of a monomer forming the acrylic polymer (α) is 1% by mass or more and 20% by mass. % below Preferably, it is more preferably 2% by mass or more and 10% by mass or less.

(2-2)能量線聚合性化合物(β) (2-2) Energy ray polymerizable compound (β)

含有作為形成關於本實施形態之黏著劑層2的黏著劑組成物之能量線聚合性化合物(β),只要是具有能量線聚合性基,可受紫外線、電子線等的能量線的照射而聚合反應,具體的構成並無特別限定。藉由聚合能量線聚合性化合物(β),可使黏著劑層2對保護膜形成用膜4的黏著性降低。 The energy ray polymerizable compound (β) which is an adhesive composition for forming the pressure-sensitive adhesive layer 2 of the present embodiment can be polymerized by irradiation with energy rays such as ultraviolet rays or electron beams as long as it has an energy ray polymerizable group. The specific configuration of the reaction is not particularly limited. By polymerizing the energy ray polymerizable compound (β), the adhesion of the adhesive layer 2 to the film for forming a protective film 4 can be lowered.

能量線聚合性基的種類並無特別限定。作為其具體例,可列舉乙烯基、(甲基)丙烯醯基等的乙烯性不飽和鍵結之官能團等。黏著劑組成物含有架橋劑(γ)時,從減少與架橋劑(γ)之進行架橋反應的部位產生功能性重複的可能性之觀點來考慮,能量線聚合性基以具有乙烯性不飽和鍵結之官能團為佳,其中,從照射能量線時之反應性高的觀點來考慮,以(甲基)丙烯醯基為更佳。 The type of the energy ray polymerizable group is not particularly limited. Specific examples thereof include functional groups such as an ethylenically unsaturated bond such as a vinyl group or a (meth) acrylonitrile group. When the adhesive composition contains a bridging agent (γ), the energy ray polymerizable group has an ethylenically unsaturated bond from the viewpoint of reducing the possibility of functional duplication at the portion where the bridging reaction (γ) undergoes bridging reaction. The functional group of the junction is preferred, and the (meth) acrylonitrile group is more preferable from the viewpoint of high reactivity when irradiating the energy ray.

能量線聚合性化合物(β)之分子量並無特別限定。其分子量過度小時,於黏著劑組成物或黏著劑層2之製造過程,有該化合物揮發之虞,此時黏著劑層2之組成的安定性降低。因此,能量線聚合性化合物(β)之分子量,作為重量平均分子量(Mw)以100以上為佳,以200以上為更佳,以300以上為特別佳。 The molecular weight of the energy ray polymerizable compound (β) is not particularly limited. When the molecular weight is excessively small, in the manufacturing process of the adhesive composition or the adhesive layer 2, the compound is volatilized, and the stability of the composition of the adhesive layer 2 is lowered. Therefore, the molecular weight of the energy ray polymerizable compound (β) is preferably 100 or more as the weight average molecular weight (Mw), more preferably 200 or more, and particularly preferably 300 or more.

能量線聚合性化合物(β)之至少一部分的分子量,作為重量平均分子量(Mw)為4,000以下為佳。作為如此之能量線聚合性化合物(β),可例示由選自具有能量線聚合性基之單官能單體及多官能單體,以及該等單體之寡聚物所組成之群之1 種或2種以上所組成之化合物。 The molecular weight of at least a part of the energy ray polymerizable compound (β) is preferably 4,000 or less as the weight average molecular weight (Mw). As such an energy ray polymerizable compound (β), a group consisting of a monofunctional monomer and a polyfunctional monomer selected from an energy ray polymerizable group, and an oligomer of the monomers can be exemplified. A compound consisting of two or more species.

上述化合物之具體的組成並無特別限定。作為上述化合物之具體例,可列舉三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯、三(甲基)丙烯酸異戊四醇酯、五(甲基)丙烯酸二異戊四醇基單羥基酯、六(甲基)丙烯酸二異戊四醇酯、二(甲基)丙烯酸1,4-丁二醇酯、二(甲基)丙烯酸1,6-己二醇酯等的具有鏈狀骨架之(甲基)丙烯酸烷基酯;二環戊二烯基二甲氧基二(甲基)丙烯酸酯、異冰片基(甲基)丙烯酸酯等的具有環狀骨架之(甲基)丙烯酸烷基酯;聚乙二醇二(甲基)丙烯酸酯、寡聚酯(甲基)丙烯酸酯、尿烷(甲基)丙烯酸酯寡聚物、環氧基變性(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯等的丙烯酸酯系化合物等。該等之中,丙烯酸酯系化合物由於對丙烯酸系聚合物(α)之相溶性高而佳。 The specific composition of the above compound is not particularly limited. Specific examples of the above compound include trimethylolpropane tri(meth)acrylate, tetramethylolmethanetetra(meth)acrylate, tris(meth)acrylic acid pentaerythritol ester, and five (A) Diisoprenyl alcohol monohydroxy ester, diisopentyl hexa(meth)acrylate, 1,4-butanediol di(meth)acrylate, di(meth)acrylic acid 1,6 - an alkyl (meth) acrylate having a chain skeleton such as hexanediol; dicyclopentadienyl dimethoxy bis(meth) acrylate or isobornyl (meth) acrylate; Alkyl (meth)acrylate having a cyclic skeleton; polyethylene glycol di(meth)acrylate, oligoester (meth)acrylate, urethane (meth)acrylate oligomer, epoxy An acrylate-based compound such as a modified (meth) acrylate or a polyether (meth) acrylate. Among these, the acrylate compound is preferred because it has high compatibility with the acrylic polymer (α).

能量線聚合性化合物(β)於一分子中所具有的能量線聚合性基之數量並無限定,惟以複數為佳,以3以上為更佳,以5以上為特別佳。 The number of the energy ray polymerizable groups of the energy ray-polymerizable compound (β) in one molecule is not limited, but is preferably a plural number, more preferably 3 or more, and particularly preferably 5 or more.

作為形成關於本實施形態之黏著劑層2之黏著劑組成物所含有之能量線聚合性化合物(β)之含量,對丙烯酸系聚合物(α)100質量部,以50質量部以上300質量部以下為佳,以75質量部以上150質量部以下為更佳。再者,於本說明書中,表示各成分之含量之「質量部」係指固體物之量之意思。藉由使能量線聚合性化合物(β)之含量在於如此之範圍,可充分確保能量線照射後黏著劑層2對多突設工件或分割其所得積層晶片之黏著性、與能量線照射前黏著劑層2對多突設工件或分 割其所得積層晶片之黏著性之差。 The content of the energy ray polymerizable compound (β) contained in the adhesive composition of the pressure-sensitive adhesive layer 2 of the present embodiment is 50 parts by mass or more and 300 parts by mass for the acrylic polymer (α) 100 parts by mass. The following is preferable, and it is more preferably 75 mass parts or more and 150 mass parts or less. In the present specification, the "mass portion" indicating the content of each component means the amount of the solid matter. By setting the content of the energy ray polymerizable compound (β) in such a range, it is possible to sufficiently ensure the adhesion of the adhesive layer 2 to the multi-projected workpiece or the laminated wafer obtained by the energy ray irradiation, and the adhesion before the energy ray irradiation. Agent layer 2 pairs of multiple protrusion workpieces or points The difference in adhesion of the laminated wafer obtained by cutting it.

作為能量線聚合性化合物(β)之其他例,可舉能量線聚合性化合物(β)係丙烯酸系聚合物,於主鏈或側鏈具有含有能量線聚合性基之構成單位者。此時,由於能量線聚合性化合物(β)具有作為丙烯酸系聚合物(α)之性質,故可簡化形成黏著劑層2之組成物的組成,具有容易控制在黏著劑層2中之能量線聚合性基之存在密度等優點。 As another example of the energy ray polymerizable compound (β), an energy ray polymerizable compound (β)-based acrylic polymer has a constituent unit containing an energy ray polymerizable group in a main chain or a side chain. In this case, since the energy ray polymerizable compound (β) has a property as an acrylic polymer (α), the composition of the composition forming the adhesive layer 2 can be simplified, and the energy ray which is easily controlled in the adhesive layer 2 can be easily obtained. The existence density of the polymerizable group and the like.

具有如上所述之丙烯酸系聚合物(α)之性質之能量線聚合性化合物(β),例如,可以用如下方法調製。藉由使包含基於含有羥基、羧基、胺基、取代胺基、環氧基等的官能團之(甲基)丙烯酸酯之構成單位及基於(甲基)丙烯酸烷基酯之構成單位而成之共聚物即丙烯酸系聚合物,與於1分子內具有可與上述官能團反應之官能團及能量線聚合性基(例如,具有乙烯性雙鍵鍵結之基)之化合物反應,可對上述丙烯酸系聚合物上加成能量線聚合性基。 The energy ray polymerizable compound (β) having the properties of the acrylic polymer (α) as described above can be prepared, for example, by the following method. Copolymerization comprising a constituent unit of a (meth) acrylate based on a functional group containing a hydroxyl group, a carboxyl group, an amine group, a substituted amine group, an epoxy group or the like and a constituent unit based on an alkyl (meth) acrylate The acrylic polymer is reacted with a compound having a functional group reactive with the functional group and an energy ray polymerizable group (for example, a group having an ethylenic double bond) in one molecule, and the acrylic polymer can be used. The upper addition energy line polymerizable group.

為使能量線聚合性化合物(β)硬化之能量線,可舉電離輻射線,即X射線、紫外線、電子線等。該等之中以照射設備相對較容易導入之紫外線為佳。 The energy rays for curing the energy ray polymerizable compound (β) include ionizing radiation, that is, X-rays, ultraviolet rays, electron beams, and the like. Among these, it is preferred that the irradiation device is relatively easy to introduce ultraviolet rays.

使用紫外線作為電離輻射線時,由容易操作的觀點使用包含波長200~380nm程度之紫外線之近紫外線即可。作為紫外線量,可按照能量線聚合性化合物(β)之種類或黏著劑層2之厚度適宜選擇即可,通常為50~500mJ/cm2左右,以100~450mJ/cm2為佳,以200~400mJ/cm2為更佳。此外,紫外線照度通常為50~500mW/cm2左右,以100~450mW/cm2為佳, 以200~400mW/cm2為更佳。作為紫外線源,並無特別限制,例如可使用高壓水銀燈、金屬鹵化物燈、UV-LED等。 When ultraviolet rays are used as the ionizing radiation, it is sufficient to use near-ultraviolet rays including ultraviolet rays having a wavelength of about 200 to 380 nm from the viewpoint of easy handling. As the amount of ultraviolet light, in accordance with the thickness of the energy ray polymerizable compound (beta]), or of the kind of the adhesive agent layer 2 can be appropriately selected, generally 50 ~ 500mJ / cm 2 or so, to 100 ~ 450mJ / cm 2 preferably to 200 ~400mJ/cm 2 is better. Further, the intensity of ultraviolet is generally 50 ~ 500mW / cm 2, and at 100 ~ 450mW / cm 2 preferably, to 200 ~ 400mW / cm 2 is more preferred. The ultraviolet light source is not particularly limited, and for example, a high pressure mercury lamp, a metal halide lamp, a UV-LED, or the like can be used.

使用電子線作為電離輻射線時,關於其加速電壓,只要按照能量線聚合性化合物(β)之種類或黏著劑層2之厚度適宜選定即可,通常加速電壓以10~1000kV程度為佳。此外,照射線量,只要設定於能量線聚合性化合物(β)適當地硬化之範圍即可,通常於10~1000krad的範圍選定。作為電子線源並無特別限制,例如可使用柯克考羅夫特-華登(Cockcroft-Walton)型、范德格拉夫(Van-de-Graaff)型、共振變壓器型、絕緣芯變壓器型或直線型、Dynamitron型、高頻波型等之各種電子線加速器。 When an electron beam is used as the ionizing radiation, the acceleration voltage is preferably selected in accordance with the type of the energy ray polymerizable compound (β) or the thickness of the adhesive layer 2, and the acceleration voltage is usually preferably from 10 to 1000 kV. In addition, the irradiation line amount may be set in a range in which the energy ray polymerizable compound (β) is appropriately cured, and is usually selected in the range of 10 to 1000 krad. The electron source is not particularly limited, and for example, a Cockcroft-Walton type, a Van-de-Graaff type, a resonant transformer type, an insulated core transformer type or Various electron line accelerators such as linear type, Dynamitron type, and high frequency wave type.

(2-3)架橋劑(γ) (2-3) bridging agent (γ)

用於形成關於本實施形態之黏著劑層2之黏著劑組成物,亦可如上所述地含有可與丙烯酸系聚合物(α)反應之架橋劑(γ)。此時,關於本實施形態之黏著劑層2,含有藉由丙烯酸系聚合物(α)與架橋劑(γ)之架橋反應所得之架橋物。 The adhesive composition for forming the adhesive layer 2 of the present embodiment may contain a bridging agent (γ) reactive with the acrylic polymer (α) as described above. At this time, the adhesive layer 2 of the present embodiment contains a bridge material obtained by bridging reaction of the acrylic polymer (α) and the bridging agent (γ).

作為架橋劑(γ)之種類,例如,可舉環氧系化合物、異氰酸酯系化合物、金屬螯合物系化合物、氮丙啶系化合物等的聚醯亞胺化合物、三聚氰胺樹脂、尿素樹脂、二醛類、羥甲基聚合物、金屬烷氧化物、金屬鹽等。該等之中,由容易控制架橋反應等的理由,架橋劑(γ)以聚異氰酸酯化合物及/或聚環氧化合物為佳。 Examples of the type of the bridging agent (γ) include a polyethylenimine compound such as an epoxy compound, an isocyanate compound, a metal chelate compound, or an aziridine compound, a melamine resin, a urea resin, and a dialdehyde. Classes, methylol polymers, metal alkoxides, metal salts, and the like. Among these, the bridging agent (γ) is preferably a polyisocyanate compound and/or a polyepoxide because of the ease of controlling the bridging reaction or the like.

在此,關於聚異氰酸酯化合物進行詳細說明。聚異氰酸酯化合物係於1分子具有2個以上異氰酸酯基之化合物 ,例如可舉出甲苯基二異氰酸酯、二苯基甲烷二異氰酸酯、二甲苯基二異氰酸酯等的芳香族聚異氰酸酯;二環己基甲烷-4,4'-二異氰酸酯、二環庚烷三異氰酸酯、亞環戊基二異氰酸酯、亞環己烯二異氰酸酯、甲基亞環己基二異氰酸酯、加氫亞二甲苯基二異氰酸酯等的脂環式異氰酸酯化合物;六亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯、賴氨酸二異氰酸酯等的具有鏈狀骨架之異氰酸酯。 Here, the polyisocyanate compound will be described in detail. A polyisocyanate compound is a compound having two or more isocyanate groups per molecule. Examples thereof include aromatic polyisocyanates such as tolyl diisocyanate, diphenylmethane diisocyanate, and xylyl diisocyanate; dicyclohexylmethane-4,4'-diisocyanate, dicycloheptane triisocyanate, and sub An alicyclic isocyanate compound such as cyclopentyl diisocyanate, cyclohexene diisocyanate, methyl cyclohexylene diisocyanate or hydrogenated xylylene diisocyanate; hexamethylene diisocyanate, trimethyl hexamethylene Isocyanate having a chain skeleton such as bis-isocyanate or lysine diisocyanate.

此外,亦可使用該等化合物之雙縮脲體、異氰脲酸酯體,或該等的化合物,與乙二醇、三甲醇基丙烷、蓖麻油等的非芳香族性低分子活性氫含有化合物之反應物之加成物等的變性體。上述聚異氰酸酯化合物,可以為1種,亦可以為複數種。 Further, a biuret or isocyanurate of these compounds or a compound thereof may be used, and a non-aromatic low molecular active hydrogen such as ethylene glycol, trimethylolpropane or castor oil may be contained. A denatured product such as an adduct of a reactant of a compound. The polyisocyanate compound may be used alone or in combination of plural kinds.

關於本實施形態之黏著劑層2,具有基於丙烯酸系聚合物(α)與架橋劑(γ)的架橋物時,藉由調整含於黏著劑層2之架橋物之架橋密度,可控制黏著劑層2之照射前儲存彈性模數等的特性。該架橋密度,可藉由改變用於形成黏著劑層2之組成物所含有之架橋劑(γ)之含量等而進行調整。具體而言,藉由使用於形成黏著劑層2之黏著劑組成物之架橋劑(γ)之含量,對丙烯酸系聚合物(α)100質量部為5質量部以上,可容易地將黏著劑層2之照射前儲存彈性模數等控制於適當的範圍。由提高該控制性的觀點,架橋劑(γ)之含量,對丙烯酸系聚合物(α)100質量部,以10質量部以上為更佳,以20質量部以上為特別佳。架橋劑(γ)之含量之上限並無特別限定,惟含量過高時,有難以將黏著劑層2之黏著性控制在後述之範圍之情形,故 對丙烯酸系聚合物(α)100質量部,以50質量部以下為佳,以40質量部以下為更佳。 When the adhesive layer 2 of the present embodiment has a bridging material based on an acrylic polymer (α) and a bridging agent (γ), the adhesive can be controlled by adjusting the bridging density of the bridging material contained in the adhesive layer 2 The characteristics of the elastic modulus and the like are stored before the irradiation of the layer 2. The bridging density can be adjusted by changing the content of the bridging agent (γ) contained in the composition for forming the adhesive layer 2, and the like. Specifically, the amount of the bridging agent (γ) used in the adhesive composition for forming the adhesive layer 2 is 5 parts by mass or more for the mass portion of the acrylic polymer (α) 100, and the adhesive can be easily used. The storage modulus before the irradiation of the layer 2 is controlled to an appropriate range. From the viewpoint of improving the controllability, the content of the bridging agent (γ) is preferably 10 parts by mass or more, and particularly preferably 20 parts by mass or more, based on 100 parts by mass of the acrylic polymer (α). The upper limit of the content of the bridging agent (γ) is not particularly limited. However, when the content is too high, it is difficult to control the adhesion of the adhesive layer 2 to the range described later. The mass portion of the acrylic polymer (α) is preferably 50 parts by mass or less, more preferably 40 parts by mass or less.

用於形成關於本實施形態之黏著劑層2之黏著劑組成物含有架橋劑(γ)時,按照該架橋劑(γ)之種類等,含有適當的架橋促進劑為佳。例如,架橋劑(γ)為聚異氰酸酯化合物時,用於形成黏著劑層2之黏著劑組成物含有有機錫化合物等的有機金屬化合物系之架橋促進劑為佳。 When the adhesive composition for forming the adhesive layer 2 of the present embodiment contains the bridging agent (γ), it is preferred to contain an appropriate bridging promoter in accordance with the type of the bridging agent (γ). For example, when the bridging agent (γ) is a polyisocyanate compound, it is preferable that the adhesive composition for forming the adhesive layer 2 contains an organometallic compound-based bridging promoter such as an organic tin compound.

(2-4)其他的成分 (2-4) Other ingredients

用於形成關於本實施形態之可延伸片材10所包括之黏著劑層2之黏著劑組成物,加上上述成分,亦可含有具有黏著賦予樹脂或長鏈烷基之丙烯酸聚合物之寡聚物等之寡聚物成分、光聚合起始劑、染料或顏料等的著色材料、阻燃劑、填充劑、抗靜電劑等的各種添加劑。 The adhesive composition for forming the adhesive layer 2 included in the stretchable sheet 10 of the present embodiment, together with the above components, may also contain an oligomeric polymer having an adhesive-imparting resin or a long-chain alkyl group. Various additives such as an oligomer component such as a material, a photopolymerization initiator, a coloring material such as a dye or a pigment, a flame retardant, a filler, and an antistatic agent.

作為光聚合起始劑,可舉安息香化合物、苯乙酮化合物、醯基膦氧化物化合物、二茂鈦化合物、噻噸酮化合物、過氧化物化合物等的光起始劑、胺或醌等的光增感劑等,具體而言,可例示1-羥基環己基苯酮、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、苄基二苯基硫醚、四甲基秋蘭姆單硫化物、苯偶醯異丁腈、二苄基、聯乙醯、β-氯蒽醌、2,4,6-三甲基苯甲醯基二苯基氧化膦等。使用紫外線作為能量線時,藉由調合光聚合起始劑,可減少照射時間,照射量。 The photopolymerization initiator may, for example, be a photoinitiator such as a benzoin compound, an acetophenone compound, a mercaptophosphine oxide compound, a titanocene compound, a thioxanthone compound or a peroxide compound, or an amine or an anthracene. A light sensitizer or the like, specifically, 1-hydroxycyclohexyl benzophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl diphenyl sulfide, tetramethyl thiuram monosulfide Benzene, isobutyl nitrile, dibenzyl, hydrazine, β-chloropurine, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, and the like. When ultraviolet rays are used as the energy ray, the irradiation time and the amount of irradiation can be reduced by blending the photopolymerization initiator.

(2-5)厚度 (2-5) thickness

關於本實施形態之可延伸片材10所包括之黏著劑層2之厚度並無特別限定。從適當地維持黏著劑層2對被著體(多突 設工件、多突設工件分割所成之積層晶片、環狀框架等夾具等)之黏著性之觀點來考慮,黏著劑層2之厚度以1μm以上為佳,以2μm以上為更佳,以3μm以上為特別佳。再者,從降低於切割步驟中發生晶片缺損之可能性的觀點來考慮,黏著劑層2之厚度以80μm以下為佳,以50μm以下為更佳,以30μm以下為特別佳。 The thickness of the adhesive layer 2 included in the stretchable sheet 10 of the present embodiment is not particularly limited. Properly maintaining the adhesive layer 2 against the body (multiple The thickness of the adhesive layer 2 is preferably 1 μm or more, more preferably 2 μm or more, and 3 μm, from the viewpoint of adhesion of a workpiece, a laminated wafer formed by dividing a workpiece, and a jig for a ring-shaped frame. The above is especially good. Further, from the viewpoint of reducing the possibility of occurrence of wafer defects in the dicing step, the thickness of the adhesive layer 2 is preferably 80 μm or less, more preferably 50 μm or less, and particularly preferably 30 μm or less.

(2-6)黏著性 (2-6) Adhesion

關於本實施形態之可延伸片材10所包括之黏著劑層2之黏著性並無特別限定。於改性層破斷式拉伸分割中,從使所得到之晶片安定地保持於黏著劑層上之觀點來考慮,將由基材1以及黏著劑層2形成的積層體黏附於矽鏡面晶圓(Silicon mirror wafer)上所測定之基於JIS Z0237:2000的黏著力(以低減黏附於被著體後的黏著性為目的,由能量線聚合型之黏著劑組成物構成黏著劑層2的情形時,為照射能量線之前的黏著力)以1000mN/25mm以上20000mN/25mm以下為佳,以1500mN/25mm以上15000mN/25mm以下為更佳。 The adhesiveness of the adhesive layer 2 included in the stretchable sheet 10 of the present embodiment is not particularly limited. In the fracture-stretching division of the modified layer, the laminate formed of the substrate 1 and the adhesive layer 2 is adhered to the 矽 mirror wafer from the viewpoint of stably holding the obtained wafer on the adhesive layer. The adhesion based on JIS Z0237:2000 measured on the (Silicon mirror wafer) (in the case of the adhesion of the energy-polymerized adhesive composition to the adhesive layer 2 for the purpose of low adhesion to the adhesive after being adhered to the object) The adhesion before the irradiation of the energy ray is preferably 1000 mN/25 mm or more and 20,000 mN/25 mm or less, and more preferably 1500 mN/25 mm or more and 15000 mN/25 mm or less.

(3)第1主面10A (3) 1st main face 10A

關於本發明之一實施形態的可延伸片材10所黏附的被加工構件,如圖5所示,為包括基板21、與積層於基板21之一方的主面上在厚度方向突出的複數個凸部22的多突設工件20。於基板21內,沿著分割預定線,形成有改性層21m。該等凸部22內,以平面視位於從多突設工件20之中心最遠位之凸部,為最遠位凸部22d。多突設工件20中,以平面視為比最遠位凸部22d位於從多突設工件20之中心更遠元的部分,被分 割之際成為積層晶片40之一部的部分以外的部分為最遠元殘餘部21r。如圖6等所示,於多突設工件20被分割所得到之積層晶片40中,包括最遠位凸部22d之積層晶片為最遠位積層晶片40d。 As shown in FIG. 5, the member to be processed to which the stretchable sheet 10 according to the embodiment of the present invention is attached is a plurality of projections including the substrate 21 and the main surface of one of the substrates 21 which are protruded in the thickness direction. The portion 22 of the portion 22 is protruded from the workpiece 20. A modified layer 21m is formed in the substrate 21 along a predetermined dividing line. The convex portions 22 are located at the most distant position from the center of the multi-projection workpiece 20 in plan view, and are the most distal convex portions 22d. In the multi-projection workpiece 20, the plane is regarded as being located farther from the center of the multi-projection workpiece 20 than the farthest position convex portion 22d, and is divided into The portion other than the portion which becomes one of the laminated wafers 40 at the time of cutting is the farthest remaining portion 21r. As shown in FIG. 6 and the like, in the multilayer wafer 40 obtained by dividing the multi-projection workpiece 20, the laminated wafer including the farthest convex portion 22d is the farthestmost laminated wafer 40d.

位於可延伸片材10之相比基材1更近位於黏著劑層2一側之主面的第1主面10A包括加工用區域10a,該加工用區域10a為在可延伸片材10之使用時,應黏附在基板21上之在厚度方向包括複數個凸部22的部分,即被加工構件之多突設工件20上的區域。加工用區域10a的形狀當然與多突設工件20的形狀一樣。通常可延伸片材10,為對周緣部從其中心離間方向賦予張力,加工用區域10a位於第1主面10A之幾乎中央部。 The first main surface 10A located on the main surface of the stretchable sheet 10 which is closer to the adhesive layer 2 side than the substrate 1 includes a processing region 10a which is used in the stretchable sheet 10 At the time, the portion of the substrate 21 including the plurality of convex portions 22 in the thickness direction, that is, the region on the workpiece 20 to which the workpiece is to be processed, should be adhered. The shape of the processing region 10a is of course the same as the shape of the multi-projection workpiece 20. Generally, the sheet 10 can be stretched so that the peripheral portion is biased from the center of the center thereof, and the processing region 10a is located at almost the center of the first main surface 10A.

加工用區域10a由如下說明的第1區域11a及第2區域12a所構成。 The processing region 10a is composed of a first region 11a and a second region 12a which will be described below.

(3-1)第1區域11a (3-1) First area 11a

第1區域11a以平面視為將加工用區域10a的外圍作為其外圍的環形區域。第1區域11a包括由以後述第2區域12a為基準在基材1離間方向上的突起部之第1突起部11p所構成的面11pa。本說明書中,將由第1突起部11p所構成的面11pa稱為「第1凸出面」。如圖1及2所示,第1區域11a其整個面由第1凸出面11pa所構成也可。如圖3及4所示,第1區域11a其一部分由第1凸出面11pa所構成也可。作為圖3及4中第1區域11a的一部分由第1凸出面11pa所構成的情況的具體例,有第1突起部11p由復數個排列於圓環上的小凸起構 成,包含其頂點的面構成第1凸出面11pa的情況。 The first area 11a is regarded as a circular area in which the outer periphery of the processing area 10a is the outer periphery. The first region 11a includes a surface 11pa formed by the first projections 11p of the projections in the direction in which the base material 1 is separated from the second region 12a to be described later. In the present specification, the surface 11pa formed by the first projections 11p is referred to as a "first convex surface". As shown in FIGS. 1 and 2, the entire surface of the first region 11a may be constituted by the first convex surface 11pa. As shown in FIGS. 3 and 4, a part of the first region 11a may be constituted by the first convex surface 11pa. As a specific example of the case where the first region 11a is partially formed by the first convex surface 11pa in FIGS. 3 and 4, the first projection 11p has a plurality of small projections arranged on the circular ring. In the case where the surface including the apex thereof constitutes the first convex surface 11pa.

第1凸出面11pa在使用可延伸片材10時,黏附於最遠位殘餘部21r。 The first convex surface 11pa adheres to the most distal residual portion 21r when the stretchable sheet 10 is used.

(3-2)第2區域12a (3-2) 2nd area 12a

第2區域12a如上所述以平面視位於環狀的第1區域11a的內周側,包含加工用區域10a以平面視的中心。第2區域12a在使用可延伸片材10時,黏附在多突設工件20的復數個凸部22上。 As described above, the second region 12a is located on the inner peripheral side of the first region 11a that is annular in plan view, and includes the center of the processing region 10a in plan view. When the stretchable sheet 10 is used, the second region 12a is adhered to the plurality of convex portions 22 of the multi-projection workpiece 20.

由此,因加工用區域10a由第1區域11a和第2區域12a所構成,將可延伸片材10黏附於多突設工件20上時,實現於最遠位殘餘部21r上黏附有第1區域11a,於最遠位凸部22d上黏附有第2區域12a的狀態。在該狀態下若將可延伸片材10伸長,伴隨第1區域11a和黏附在最遠位凸部22d上的第2區域12a的離間,連接在最遠位凸部22d上的基板21和最遠位殘餘部21r之間被賦予離間力,可實現將最遠位殘餘部21r從最遠位積層晶片40d分離。 Thus, when the processing region 10a is composed of the first region 11a and the second region 12a, when the stretchable sheet 10 is adhered to the multi-projection workpiece 20, the first portion is adhered to the most distal residual portion 21r. In the region 11a, the second region 12a is adhered to the most distal convex portion 22d. When the stretchable sheet 10 is stretched in this state, the substrate 21 and the most connected to the most distal convex portion 22d are joined with the separation of the first region 11a and the second region 12a adhered to the most distal convex portion 22d. An detachment force is applied between the distal residual portions 21r, and the farthest residual portion 21r can be separated from the farthestmost laminated wafer 40d.

(3-3)第1突起部11p (3-3) First protrusion 11p

第1區域11a包括可維持黏附於最遠位殘餘部21r狀態的高度,在該黏附狀態下,由於可延伸片材10伸長而發生的剪切力賦予第1突起部11p時,只要可將為分離最遠位殘餘部21r和最遠位積層晶片40d所需的張力賦予最遠位殘餘部21r,則第1突起部11p的具體結構不受限定。 The first region 11a includes a height that can maintain the state of adhering to the most distant residual portion 21r. In the adhered state, when the shearing force generated by the elongation of the stretchable sheet 10 is applied to the first projection 11p, as long as it can be The tension required to separate the farthest remaining portion 21r and the farthestmost laminated wafer 40d is given to the farthest remaining portion 21r, and the specific structure of the first protruding portion 11p is not limited.

從更加穩定地實現將最遠位殘餘部21r和最遠位積層晶片40d進行適度地分離的觀點考慮,第1突起部11p的 第2區域12a基準凸出高度,相對於最遠位凸部22d的基板21基準凸出高度的比率,以80%以上120%以下為佳。若該比率過低,則第1區域11a無法適度地黏附於最遠位殘餘部21r,在擴展步驟中,第1區域11a和最遠位殘餘部21r之間發生剝離的可能性增加。與此相反,若上述比率過高,則與最遠位殘餘部21r鄰近的遠位凸部22d上,第2區域12a不能適度黏附,在擴展步驟中,第2區域12a和最遠位凸部22d之間發生剝離的可能性增加。作為第1突起部11p以第2區域12a為基準的凸出高度的具體例,可舉出200μm以上,300μm以上或400μm以上也可以作為第1突起部11p以第2區域12a為基準的凸出高度的具體例而列舉。 From the viewpoint of more stably achieving the proper separation of the farthest remaining portion 21r and the farthestmost laminated wafer 40d, the first protruding portion 11p is considered. The reference projection height of the second region 12a is preferably 80% or more and 120% or less with respect to the ratio of the reference projection height of the substrate 21 of the most distal convex portion 22d. When the ratio is too low, the first region 11a cannot be appropriately adhered to the farthest remaining portion 21r, and in the expanding step, the possibility of peeling between the first region 11a and the farthest remaining portion 21r increases. On the other hand, if the ratio is too high, the second region 12a cannot be appropriately adhered to the distal convex portion 22d adjacent to the farthest residual portion 21r, and in the expanding step, the second region 12a and the farthest convex portion The possibility of peeling between 22d increased. Specific examples of the projection height based on the second region 12a of the first projections 11p include 200 μm or more, 300 μm or more, or 400 μm or more, and may be a projection of the first projection 11p based on the second region 12a. High specific examples are listed.

在擴展步驟中,從更穩定容易地將最遠位殘餘部21r從最遠位凸部22d離間的觀點考慮,第1突起部11p在23℃時的儲能模量以0.01MPa以上為佳,以0.1MPa以上10000MPa以下為更佳,以1MPa以上1000MPa以下為特別佳。第1突起部11p在23℃時的儲能模量為0.01MPa以上,則在擴展步驟中可延伸片材10破斷的可能性減少。若第1突起部11p在23℃時的儲能模量為10000MPa以下,則可提高可延伸片材10對多突設工件20的黏著性。 In the expansion step, the storage modulus of the first projection 11p at 23 ° C is preferably 0.01 MPa or more from the viewpoint of more stably and easily separating the distal-most residual portion 21 r from the distal-most convex portion 22 d. It is more preferably 0.1 MPa or more and 10000 MPa or less, and particularly preferably 1 MPa or more and 1000 MPa or less. When the storage modulus of the first projection 11p at 23 ° C is 0.01 MPa or more, the possibility that the stretchable sheet 10 is broken in the expansion step is reduced. When the storage modulus of the first projection 11p at 23 ° C is 10000 MPa or less, the adhesion of the stretchable sheet 10 to the multi-projection workpiece 20 can be improved.

構成第1突起部11p的材料,只要可維持所定的凸出高度以及對最遠位殘餘部21r的剝離強度適合,則無特別限制。此外,「對最遠位殘餘部21r的剝離強度適合」意味著在擴展步驟中,在第1區域11a和最遠位殘餘部21r之間不產生剝離。此外,也有意味著擴展步驟結束後,可將由最遠位殘 餘部21r構成的片狀體從可延伸片材10上適當剝離的情況。 The material constituting the first projection 11p is not particularly limited as long as it can maintain a predetermined projection height and is suitable for the peel strength of the most distal residual portion 21r. Further, "the peeling strength of the most distant residual portion 21r is suitable" means that no peeling occurs between the first region 11a and the farthest remaining portion 21r in the expanding step. In addition, it means that after the expansion step is over, the farthest disability can be The sheet-like body composed of the remaining portion 21r is appropriately peeled off from the stretchable sheet 10.

為了實現將第1區域11a黏附於最遠位殘餘部21r上,第1凸出面11pa以具有黏著性為佳。作為第1凸出面11pa為具有黏著性的第1突起部11p的具體例,可舉出由包括以樹脂系材料構成的薄膜(樹脂薄膜)和黏著劑層的積層體、由黏著劑層構成的積層體(各層也可以為復數)和自帶黏性樹脂構成的構造體等。 In order to adhere the first region 11a to the most distal residual portion 21r, the first convex surface 11pa preferably has adhesiveness. Specific examples of the first projection 11p having adhesiveness as the first projection surface 11pa include a laminate including a film (resin film) made of a resin material and an adhesive layer, and an adhesive layer. The laminate (each layer may be plural) and a structure composed of a self-adhesive resin.

作為上述積層體的樹脂薄膜的具體例,可舉出乙烯-乙酸乙烯酯共聚物膜、乙烯-(甲基)丙烯酸共聚物膜、乙烯-(甲基)丙烯酸酯共聚物膜等的乙烯系共聚物膜;低密度聚乙烯(LDPE)膜、直鏈低密度聚乙烯(LLDPE)膜、高密度聚乙烯(HDPE)膜等的聚乙烯膜;聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、乙烯-降冰片烯共聚物膜、降冰片烯樹脂膜等聚烯烴類膜;聚氯乙烯膜、氯乙烯共聚物膜等聚氯乙烯膜;聚對苯二甲酸乙二醇酯膜、聚對苯二甲酸丁二醇酯膜等聚酯類薄膜;聚氨酯膜;聚醯亞胺膜;聚苯乙烯膜;聚碳酸酯膜;氟樹脂膜等。再者,亦可使用該等之架橋膜、如離子聚合物(ionomer)膜這樣的變性膜。此外,作為樹脂薄膜,還可使用以能量線將能量線硬化性組成物硬化而構成的硬化物。作為上述硬化物,可舉出日本專利第4841802號中作為中間層使用的、將含有聚氨酯低聚物的組成物成膜並硬化而構成的薄膜(聚氨酯薄膜)。以能量線將能量線硬化性組成物硬化而構成的層,可以為無溶劑型,幹燥步驟可省略。因此,樹脂薄膜為流延膜時,可在不降低生產率的情況下得到厚膜,使 第1突起部11p的高度變高。 Specific examples of the resin film of the laminate include ethylene copolymerization such as an ethylene-vinyl acetate copolymer film, an ethylene-(meth)acrylic copolymer film, and an ethylene-(meth)acrylate copolymer film. Film; polyethylene film of low density polyethylene (LDPE) film, linear low density polyethylene (LLDPE) film, high density polyethylene (HDPE) film, polypropylene film, polybutene film, polybutadiene a polyolefin film such as a film, a polymethylpentene film, an ethylene-norbornene copolymer film, or a norbornene resin film; a polyvinyl chloride film such as a polyvinyl chloride film or a vinyl chloride copolymer film; and a poly(ethylene terephthalate); A polyester film such as a glycol ester film or a polybutylene terephthalate film; a polyurethane film; a polyimide film; a polystyrene film; a polycarbonate film; a fluororesin film. Further, such a bridging film, a degradable film such as an ionomer film may also be used. Further, as the resin film, a cured product obtained by curing an energy ray-curable composition by an energy ray can also be used. The cured product is a film (urethane film) which is used as an intermediate layer in Japanese Patent No. 4841802 and which is formed by forming and curing a composition containing a urethane oligomer. The layer formed by hardening the energy ray hardenable composition by the energy ray may be a solventless type, and the drying step may be omitted. Therefore, when the resin film is a cast film, a thick film can be obtained without lowering the productivity, so that The height of the first protrusion 11p is increased.

上述積層體的黏著劑層,可通過已知的各種黏著劑組合物形成。作為這樣的黏著劑組合物,雖然沒有任何限制,但可以使用例如橡膠類、丙烯酸類、矽類、聚醚乙烯類等黏著劑組合物。並且可使用如上所述的能量線硬化型黏著劑組合物。另外,還可使用加熱發泡型、水膨脹型的黏著劑組合物。 The adhesive layer of the above laminated body can be formed by various known adhesive compositions. As such an adhesive composition, although not limited, an adhesive composition such as rubber, acrylic, hydrazine or polyether vinyl can be used. And an energy ray-curable adhesive composition as described above can be used. Further, a heat-foaming type or water-swellable type of adhesive composition can also be used.

作為自黏性樹脂,可以列舉丙烯酸樹脂和具有膜厚度的矽樹脂、乙烯-乙酸乙烯酯共聚物和聚氨酯樹脂等。作為具有自黏性的丙烯酸樹脂,可以列舉丙烯酸酯共聚物。用於該目的的丙烯酸酯共聚物的重均分子量為100,000以上,以100,000~1,500,000為佳,以150,000~1,000,000為特別佳。丙烯酸酯共聚物由(甲基)丙烯酸、(甲基)丙烯酸酯單體或從其衍生物等中衍生出的構成單位所構成。作為(甲基)丙烯酸酯單體,使用了烷基的碳原子數為1~18的(甲基)丙烯酸烷基酯。作為(甲基)丙烯酸酯單體的衍生物,可以列舉二甲基丙烯醯胺、二甲基甲基丙烯醯胺、二乙基丙烯醯胺、二乙基甲基丙烯醯胺等的二烷基(甲基)丙烯醯胺。其中,特別以丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸丙酯、甲基丙烯酸丙酯、丙烯酸丁酯、甲基丙烯酸丁酯、丙烯酸異丁酯、甲基丙烯酸異丁酯、丙烯酸-2-乙基己酯、甲基丙烯酸-2-乙基己酯、丙烯酸-2-羥基乙酯、甲基丙烯酸-2-羥基乙酯、二甲基丙烯醯胺等為佳。除了這些單體外,由乙酸乙烯酯、苯乙烯、醋酸乙烯酯等共聚合也可。 Examples of the self-adhesive resin include an acrylic resin and a enamel resin having a film thickness, an ethylene-vinyl acetate copolymer, a urethane resin, and the like. As an acrylic resin which has self-adhesiveness, an acrylate copolymer is mentioned. The acrylate copolymer used for this purpose has a weight average molecular weight of 100,000 or more, preferably 100,000 to 1,500,000, and particularly preferably 150,000 to 1,000,000. The acrylate copolymer is composed of a (meth)acrylic acid, a (meth) acrylate monomer, or a constituent unit derived from a derivative thereof or the like. As the (meth) acrylate monomer, an alkyl (meth) acrylate having an alkyl group having 1 to 18 carbon atoms is used. Examples of the derivative of the (meth) acrylate monomer include dioxane such as dimethyl acrylamide, dimethyl methacrylamide, diethyl acrylamide, and diethyl methacrylamide. Base (meth) acrylamide. Among them, especially methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, propyl acrylate, propyl methacrylate, butyl acrylate, butyl methacrylate, isobutyl acrylate, A Isobutyl acrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, dimethyl methacrylate It is better. In addition to these monomers, copolymerization of vinyl acetate, styrene, vinyl acetate or the like is also possible.

作為具有官能團的丙烯酸酯共聚物,具有2-羥乙 基丙烯酸酯、2-羥乙基甲基丙烯酸酯、2-羥丙基丙烯酸酯、2-羥丙基甲基丙烯酸酯、2-羥丁基丙烯酸酯、2-羥丁基甲基丙烯酸酯等含羥基的丙烯酸酯、丙烯酸、甲基丙烯酸等含羧基化合物作為構成單位。 As an acrylate copolymer having a functional group, having 2-hydroxyethyl Hydroxy group-containing acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate A carboxyl group-containing compound such as acrylate, acrylic acid or methacrylic acid is used as a constituent unit.

丙烯酸酯共聚物是作為黏著劑而通用的聚合物,較多時,具有黏著劑特有的黏稠感。因此,作為自黏性樹脂層使用時,以架橋劑進行部分架橋,抑製粘稠感,為得到前面所述的儲能模量值而進行調整。作為架橋劑,可以列舉有機多元異氰酸酯化合物、有機多元環氧化合物、有機多元亞胺化合物等。一般情況下,如果架橋劑的使用量增多,則丙烯酸酯共聚物的黏稠性降低,儲能模量上升。 The acrylate copolymer is a polymer which is commonly used as an adhesive, and when it is large, it has a sticky feeling peculiar to the adhesive. Therefore, when it is used as a self-adhesive resin layer, partial bridging is carried out with a bridging agent to suppress a sticky feeling, and it is adjusted in order to obtain the storage modulus value mentioned above. Examples of the bridging agent include an organic polyvalent isocyanate compound, an organic polyvalent epoxy compound, and an organic polyimine compound. In general, if the amount of the bridging agent used is increased, the viscosity of the acrylate copolymer is lowered and the storage modulus is increased.

從更加穩定地表現自黏性的觀點考慮,在由自黏性樹脂構成的構造體中構第1突起部11p時,表面的算術平均粗糙度Ra以1μm以下為佳,以0.7μm以下為更佳,以0.0001μm以上0.2μm以下為特別佳。 When the first protrusion 11p is formed in the structure made of a self-adhesive resin, the arithmetic mean roughness Ra of the surface is preferably 1 μm or less, and 0.7 μm or less. Preferably, it is particularly preferably 0.0001 μm or more and 0.2 μm or less.

(3-4)第3區域13a (3-4) Third area 13a

可延伸片材10的第1主面10A由加工用區域10a、平面視時為加工用區域10a的外周側區域的第3區域13a構成。 The first main surface 10A of the extendable sheet 10 is composed of a processing region 10a and a third region 13a which is an outer peripheral side region of the processing region 10a in plan view.

通常,第3區域13a的外周近處區域黏於環狀框架30等的夾具。並且,在擴展步驟中,對位於環狀框架30的內周側多突設工件20外側的可延伸片材10的第3區域13a相對應的部分,按下環狀構件60,該環狀構件與環狀框架30等夾具的垂直方向相符位置發生變化(一般而言,在與可延伸片材10的第1主面10A相反一側的面上,使環狀構件60相撞。 )。其結果,以平面視時位於環狀構件60的內周側的可延伸片材10的部分和環狀框架30黏著的可延伸片材10的部分,在垂直方向上位置出現差異,可延伸片材10根據其位置差異量伸長。 Usually, the outer peripheral region of the third region 13a is adhered to the jig of the annular frame 30 or the like. Further, in the expanding step, the annular member 60 is pressed against the portion corresponding to the third region 13a of the extendable sheet 10 on the outer peripheral side of the annular frame 30, and the annular member 60 is pressed. The position corresponding to the vertical direction of the jig such as the annular frame 30 is changed (generally, the annular member 60 is collided on the surface opposite to the first main surface 10A of the extendable sheet 10). ). As a result, the portion of the extendable sheet 10 which is located on the inner peripheral side of the annular member 60 in plan view and the portion of the extendable sheet 10 to which the annular frame 30 is adhered are different in position in the vertical direction, and the extendable sheet The material 10 is elongated according to its positional difference.

此時,可延伸片材10與環狀構件60相接的部分,或其近處部分,特別容易受到機械負荷,會成為最為伸長的部分。即,可延伸片材10中與第3區域13a相對應的部分,在擴展步驟中,包括最為伸長的部分。 At this time, the portion of the extendable sheet 10 that is in contact with the annular member 60, or a portion thereof, is particularly susceptible to mechanical load and becomes the most elongated portion. That is, the portion of the extendable sheet 10 corresponding to the third region 13a includes the most elongated portion in the expanding step.

如後所述,從提高操縱性的觀點等考慮,有對可延伸片材10中與第3區域13a相對應部分實施熱收縮(復原步驟)的情況。為使該部分的熱收縮得以適當實施,與本發明一實施形態相關的可延伸片材10包括以下構成也可。 As will be described later, from the viewpoint of improving maneuverability and the like, there is a case where heat shrinkage (restoration step) is performed on a portion corresponding to the third region 13a in the stretchable sheet 10. In order to properly perform heat shrinkage of the portion, the stretchable sheet 10 according to an embodiment of the present invention may have the following constitution.

(3-4-1)第3凸出區域13b (3-4-1) 3rd convex area 13b

第3區域13a包括以第2區域12a為基準,由向從基材11離間的方向凸出的突起部第3突起部13p的面構成的第3凸出區域13b也可。第3凸出區域13b為第3區域13a的一部分也可,如圖1及2中所示,為第3區域13a的全部也可。 The third region 13a may include a third protruding region 13b formed of a surface of the protruding portion third protruding portion 13p that protrudes from the base material 11 with respect to the second region 12a. The third protruding region 13b may be a part of the third region 13a, and may be all of the third region 13a as shown in FIGS. 1 and 2.

第1突起部11p與第3突起部13p的關系沒有特別的限制。它們可以由相互不同的構件構成,也可以由同樣的構件構成。此外,第1突起部11p與第3突起部13p可以具有相連續的部分,也可以不連續。圖1及2中所示的可延伸片材10中,第1突起部11p與第3突起部13p是連續的。 The relationship between the first protrusion 11p and the third protrusion 13p is not particularly limited. They may be composed of members that are different from each other or may be composed of the same members. Further, the first protrusions 11p and the third protrusions 13p may have continuous portions or may be discontinuous. In the extendable sheet 10 shown in Figs. 1 and 2, the first projection 11p and the third projection 13p are continuous.

第3突起部13p的材料與結構(特別是積層結構)沒有特別的限制。第3突起部13p以具有熱收縮性為佳,以與 基材1具有同樣的熱收縮性為更佳。第3突起部13p與基材1具有同樣的熱收縮性時,通過加熱,可延伸片材10進行熱收縮時,第3突起部13p先收縮或基材1先收縮的可能性降低,其結果,第3凸出區域3B中妨礙基材1的熱收縮的可能性降低。 The material and structure (especially the laminated structure) of the third protrusion 13p are not particularly limited. It is preferable that the third protrusion 13p has heat shrinkability to It is more preferable that the substrate 1 has the same heat shrinkability. When the third protrusion 13p has the same heat shrinkability as the substrate 1, when the stretchable sheet 10 is thermally shrunk by heating, the third protrusion 13p shrinks first or the substrate 1 shrinks first. In the third protruding region 3B, the possibility of hindering heat shrinkage of the substrate 1 is lowered.

第3突起部13p也可以包括基材1中包括的熱收縮性材料。這種情況下,第3突起部13p與基材1同樣可進行熱收縮,因此可更穩定地減小可延伸片材10的松動量(以可延伸片材10中與環狀框架30相黏部分的下側面為基準,可延伸片材10的底面垂直方向的離間距離)。 The third protrusion 13p may also include a heat shrinkable material included in the substrate 1. In this case, the third projections 13p can be thermally contracted in the same manner as the base material 1, so that the amount of loosening of the extendable sheet 10 can be more stably reduced (adhering to the annular frame 30 in the extendable sheet 10) The lower side of the portion is the reference, and the distance between the bottom surface of the sheet 10 and the vertical direction of the sheet 10 can be extended.

第3突起部13p在通常的使用形態中由於不黏附於被加工構件(多突設工件20),因此第3凸出區域13b不包括黏著性也可。但,如上所述,因第1突起部11p與第3突起部13p有連續部分等理由,在第1突起部11p和第3突起部13p為同樣材料構成時,第3區域13a也可以不具有黏著性。這種情況下,從提高熱收縮後可延伸片材10的形狀穩定性觀點考慮,第1突起部11p與第3突起部13p以包括基材1所包括的的熱收縮性材料為佳。 Since the third projections 13p are not adhered to the workpiece (the multi-projection workpiece 20) in the normal use mode, the third projections 13b may not include adhesiveness. However, as described above, when the first projection 11p and the third projection 13p have a continuous portion, the third projection 13p and the third projection 13p may have the same material, and the third region 13a may not have the third region 13a. Adhesive. In this case, from the viewpoint of improving the shape stability of the stretchable sheet 10 after heat shrinkage, the first projections 11p and the third projections 13p preferably include a heat-shrinkable material included in the substrate 1.

(3-4-2)易復原區域13c (3-4-2) Easy recovery area 13c

第3區域13a對應該區域的可延伸片材10的部分也可以包括基材1為最厚構件的易復原區域13c。易復原區域13c可以為第3區域13a的一部分,也可以為第3區域13a的全部。圖3及4中所示的可延伸片材10中,第3區域13a全部由易復原區域13c構成。通過這樣的構成,可延伸片材10中與易 復原區域13c對應的部分加熱時,通過使基材1熱收縮,可延伸片材10的變形變得容易。第3區域13a也可以包括第3凸出區域13b和易復原區域13c的兩方。此外,與第3區域13a對應的可延伸片材10部分的總厚度中所占據的基材的厚度比率,以50%以上為佳,以70%以上100%以下為更佳,以90%以上100%以下為特別佳。可延伸片材10的總厚度中所占據的基材的厚度比率越厚,藉由基材以外構件的存在,易復原區域13c加熱時,妨礙可延伸片材10變形將被防止。 The portion of the third region 13a corresponding to the stretchable sheet 10 of the region may also include the easily recoverable region 13c in which the substrate 1 is the thickest member. The easily recoverable region 13c may be a part of the third region 13a or may be all of the third region 13a. In the extendable sheet 10 shown in Figs. 3 and 4, the third region 13a is entirely composed of the easily recoverable region 13c. With such a configuration, the sheet 10 can be stretched and easily When the portion corresponding to the restoration region 13c is heated, the deformation of the stretchable sheet 10 is facilitated by thermally shrinking the substrate 1. The third region 13a may include both the third protruding region 13b and the easily recoverable region 13c. Further, the thickness ratio of the substrate occupied by the total thickness of the stretchable sheet 10 portion corresponding to the third region 13a is preferably 50% or more, more preferably 70% or more and 100% or less, and more preferably 90% or more. 100% or less is especially good. The thicker the thickness ratio of the substrate occupied by the total thickness of the stretchable sheet 10, the deformation of the stretchable sheet 10 is prevented from being prevented when the easily recoverable region 13c is heated by the presence of a member other than the substrate.

(4)剝離片 (4) peeling sheet

本發明一實施形態相關的可延伸片材10的第1主面10A,直到使用時剝離片的剝離面一直被黏附也可。剝離片的構成為任意,可以列舉將塑膠薄膜用剝離劑進行了剝離處理的剝離片。作為塑膠薄膜的具體例,可以舉出聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二醇酯等聚酯薄膜;聚丙烯和聚乙烯等聚烯烴薄膜。作為剝離劑,雖然可以使用矽酮類、氟類、長鏈烷基類等,但其中價格低廉、可獲得穩定性能的矽酮類為佳。對於剝離片的厚度沒有特別限制,但通常為20μm以上250μm以下左右。 The first main surface 10A of the stretchable sheet 10 according to the embodiment of the present invention may be adhered to the peeling surface of the release sheet until use. The composition of the release sheet is arbitrary, and a release sheet in which the plastic film is peeled off with a release agent is exemplified. Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; and polyolefin films such as polypropylene and polyethylene. . As the release agent, an anthrone, a fluorine, a long-chain alkyl or the like can be used, but an anthrone having a low cost and a stable performance can be preferably used. The thickness of the release sheet is not particularly limited, but is usually about 20 μm or more and 250 μm or less.

(5)長尺體、卷收體 (5) long body, retractable body

本發明一實施形態相關的可延伸片材10,也可以為其復數朝著同一方向連續排列所構成的長尺體之形態。作為此種情況的具體例,可以列舉基材1裁斷前的長尺布卷狀態,以該布卷將基材1作為共同構件的復數個可延伸片材10所構成的長尺體。該長尺體也可以卷取作為卷收體進行保管和運 輸。使用時將卷收體展開,從長尺的布卷中將基材1裁斷,可製造可延伸片材10。 The stretchable sheet 10 according to an embodiment of the present invention may be in the form of a long-length body in which a plurality of the plurality of stretchable sheets are continuously arranged in the same direction. Specific examples of such a case include a long-length cloth roll state in which the base material 1 is cut before the cutting of the base material 1 and a plurality of stretchable sheets 10 in which the base material 1 has a base member 1 as a common member. The long ruler can also be taken up as a retractable body for storage and transportation. lose. The retractable body is unfolded at the time of use, and the substrate 1 is cut from a long-length cloth roll to manufacture the stretchable sheet 10.

本發明一實施形態相關的可延伸片材10,還可以為與剝離片的積層體為長尺體的形態。作為此種情況的具體例,可列舉在長尺的剝離片上沿著該長尺方向復數個可延伸片材10排列所構成的長尺體。該長尺體也可以卷取作為卷收體進行保管和運輸。使用時將卷收體展開,從剝離片上將可延伸片材10剝離即可。 The stretchable sheet 10 according to an embodiment of the present invention may be in the form of a long body with the laminate of the release sheet. Specific examples of such a case include a long ruler in which a plurality of stretchable sheets 10 are arranged along the long-length direction on a long-length release sheet. The long ruler can also be taken up as a retractable body for storage and transportation. The retractable body is unfolded at the time of use, and the stretchable sheet 10 is peeled off from the peeling sheet.

2.可延伸片材10的製造方法 2. Method of manufacturing extendable sheet 10

可延伸片材10的製造方法沒有特別的限制。對於所定材料實施裁斷(包括半切。)操作及積層操作(包括形成膜狀構件的操作。)即可製造。以下,對可延伸片材10和剝離片的積層體的製造方法的一例進行說明。 The method of manufacturing the stretchable sheet 10 is not particularly limited. The cutting (including half cut) operation and the lamination operation (including the operation of forming the film member) can be performed for the predetermined material. Hereinafter, an example of a method of producing a laminate of the stretchable sheet 10 and the release sheet will be described.

首先,準備提供基材1的長尺布卷。其次,在長尺布卷一側的主面上,對為形成黏著劑層2的黏著劑組合物進行塗布獲得塗膜。塗布方法沒有限制。根據黏著劑組合物的組成及黏著劑層2的厚度,進行適當設定即可。具體可列舉模塗布、簾式塗布、噴霧塗布、狹縫塗布、刮刀塗布等已知的塗布方法。通過對長尺布卷上的塗膜進行幹燥,可以得到長尺布卷和黏著劑層2的積層體(以下稱為「第1積層體」。)。該幹燥條件無特別限制,根據黏著劑組合物的組成及黏著劑層2的厚度適當設定即可。作為幹燥條件的具體例,可列舉在70℃以上130℃以下時進行20秒至3分鐘左右的幹燥。 First, a long-length cloth roll of the substrate 1 is prepared. Next, a coating film is obtained by coating the adhesive composition for forming the adhesive layer 2 on the main surface on the side of the long-length cloth roll. The coating method is not limited. The composition of the adhesive composition and the thickness of the adhesive layer 2 may be appropriately set. Specific examples thereof include known coating methods such as die coating, curtain coating, spray coating, slit coating, and blade coating. By laminating the coating film on the long-length cloth roll, a laminate of the long-length cloth roll and the adhesive layer 2 (hereinafter referred to as a "first laminate") can be obtained. The drying conditions are not particularly limited, and may be appropriately set depending on the composition of the adhesive composition and the thickness of the adhesive layer 2. Specific examples of the drying conditions include drying at a temperature of from 70 ° C to 130 ° C for about 20 seconds to 3 minutes.

然後,在由第1積層體的黏著劑層2構成的面上 形成第1突起部11p。形成第1突起部11p的方法沒有特別限制。具體例如下所述。準備為形成第1突起部11p的液體組合物,將該液體組合物在適當的支持體上塗布,通過將得到的塗膜幹燥或硬化,得到提供第1突起部11p的膜狀構件(樹脂薄膜及黏著劑層)。對該膜狀構件進行半切或將不需要部分切除的修剪程式,即可得到提供所希望形狀的第1突起部11p的構件。將這種提供第1突起部11p的構件黏附於由第1積層體的黏著劑層2所構成的面上,除去支持體,則可形成於第1積層體的黏著劑層2所構成的面上。如果提供第1突起部11p的構件為樹脂薄膜,樹脂薄膜為通過壓出成型等所得到的的薄膜也可。提供第1突起部11p的構件如果為包括樹脂薄膜和黏著劑層的積層體,則最好在修剪各自要素之前提前積層。 Then, on the surface composed of the adhesive layer 2 of the first laminate The first protrusion 11p is formed. The method of forming the first protrusions 11p is not particularly limited. Specifically, for example, as described below. The liquid composition for forming the first projection 11p is prepared, and the liquid composition is applied onto a suitable support, and the obtained coating film is dried or cured to obtain a film-like member (resin film) that provides the first projection 11p. And adhesive layer). The member in which the film-shaped member is half-cut or the portion which is not required to be partially cut off is obtained, and a member which provides the first protrusion 11p of a desired shape can be obtained. The member for providing the first projection 11p is adhered to the surface of the first laminate body by the adhesive layer 2, and the support is removed to form the surface of the adhesive layer 2 of the first laminate. on. The member that provides the first projection 11p is a resin film, and the resin film may be a film obtained by extrusion molding or the like. When the member providing the first projection 11p is a laminate including a resin film and an adhesive layer, it is preferable to laminate the layers before trimming the respective elements.

作為用於形成第1突起部11p的其他具體例,也可以使用分配器、旋塗、噴墨、絲網印刷等印刷,3D列印機等積層造型法、射出成型等,將為形成第1突起部11p的液體組合物等在由第1積層體的黏著劑層2所構成的面上實施印出、造型等,通過對印出物等進行幹燥或硬化,得到第1突起部11p。這種情況下,無需如前所述的修剪,即可將所希望形狀的第1突起部11p形成於由第1積層體的黏著劑層2所構成的面上。通過分配器等形成第1突起部11p,不是在由黏著劑層2所構成的面上實施,例如也可以在基材1上直接形成。 As another specific example for forming the first protrusions 11p, it is also possible to use a dispenser, a spin coating, an inkjet, a screen printing or the like, a laminate molding method such as a 3D printer, or injection molding, etc., to form the first one. The liquid composition or the like of the projections 11p is printed, molded, or the like on the surface of the adhesive layer 2 of the first laminate, and the printed matter or the like is dried or cured to obtain the first projections 11p. In this case, the first projection 11p of a desired shape can be formed on the surface of the adhesive layer 2 of the first laminate without the trimming as described above. The first projection 11p is formed by a dispenser or the like, and is not formed on the surface formed by the adhesive layer 2, and may be formed directly on the substrate 1, for example.

第3突起部13p基本上也可使用與形成第1突起部11p的方法同樣的方法形成。通過包括塗布在內的操作,製造第1突起部11p時,從生產率觀點考慮,第3突起部13p在 形成第1突起部11p的同時形成為佳。具體而言,在進行修剪時通過改變半切位置,減少除去不需要部分的量,可形成與第1突起部11p連續的第3突起部13p。 The third protrusion 13p can be basically formed by the same method as the method of forming the first protrusion 11p. When the first projection 11p is manufactured by an operation including coating, the third projection 13p is in view of productivity. It is preferable to form the first protrusions 11p at the same time. Specifically, when the trimming is performed, the half-cut position is changed, and the amount of the unnecessary portion is reduced, whereby the third projection 13p continuous with the first projection 11p can be formed.

由此,在第1積層體上形成第1突起部11p等,在第1積層體上第1突起部11p等形成的側的面上黏附剝離片。對於得到的第1積層體和剝離片的積層體,從第1積層體一側實施半切,除去不需要部分,形成基材1。通過上述操作,在剝離片上可延伸片材10以第1主面10A與剝離面呈對向的方式黏附在剝離片上的狀態而獲得。 As a result, the first protrusions 11p and the like are formed on the first layered body, and the release sheet is adhered to the side of the first layered body on the side where the first protrusions 11p and the like are formed. The laminated body of the obtained first laminate and the release sheet was subjected to half-cutting from the side of the first laminate to remove unnecessary portions, thereby forming the substrate 1. By the above operation, the stretchable sheet 10 is obtained by sticking the stretchable sheet 10 to the peeling sheet so that the first main surface 10A and the peeling surface face each other.

3.積層晶片40的製造方法 3. Method of manufacturing laminated wafer 40

以下,為形成改性層,對多突設工件20實施雷射光照射,根據多突設工件20的基板21內預計分割線,在形成改性層21m的狀態下的多突設工件20中,使用可延伸片材10,對製造積層晶片40的方法進行說明。 In the following, in order to form the modified layer, the multi-projection workpiece 20 is irradiated with laser light, and in the multi-projection workpiece 20 in a state in which the modified layer 21m is formed, according to the estimated dividing line in the substrate 21 of the multi-projecting workpiece 20, A method of manufacturing the laminated wafer 40 will be described using the extendable sheet 10.

(1)黏附步驟 (1) Adhesion step

在經過改性層形成的多突設工件20及以平面視時多突設工件20的外周側排列的環狀框架30上,將可延伸片材10進行黏附。其結果,如圖5所示,得到由第1突起部11p所構成的面黏附於最遠位殘餘部21r上的同時,第2區域12a黏附於多突設工件20的復數個凸部22上的狀態。這樣得到在可延伸片材10的第1主面1A上,由多突設工件20及環狀框架30積層而形成的積層構造體50。在此,如上所述,從使最遠位殘餘部21r和最遠位積層晶片40d的適度分離能夠更加穩定實現的觀點考慮,在黏附步驟結束的階段,第1突起部11p以第2 區域12a為基準的凸出高度,與最遠位凸部22d以基板21為基準的凸出高度之比率,以80%以上120%以下為佳。 The stretchable sheet 10 is adhered to the multi-projection workpiece 20 formed by the modified layer and the annular frame 30 arranged on the outer peripheral side of the multi-projection workpiece 20 in plan view. As a result, as shown in FIG. 5, the surface formed by the first projection 11p is adhered to the most distal residual portion 21r, and the second region 12a is adhered to the plurality of projections 22 of the multi-projection workpiece 20. status. In this way, the laminated structure 50 formed by laminating the multi-projection workpiece 20 and the annular frame 30 on the first main surface 1A of the extendable sheet 10 is obtained. Here, as described above, from the viewpoint of achieving a more stable separation between the most distant residual portion 21r and the farthest layer laminated wafer 40d, the first projection 11p is second at the end of the adhesion step. The ratio of the projection height of the region 12a to the reference is preferably 80% or more and 120% or less of the ratio of the projection height of the most distal convex portion 22d based on the substrate 21.

(2)擴展步驟 (2) Extension steps

然後,積層構造體50在平面視時可延伸片材10的第1主面10A露出的環狀區域,即在與第3區域13a的一部分對應的部分,從與第1主面10A相反的主面一側按下環狀構件60。本說明書中,將可延伸片材10的環狀構件60被按下的部分及與其周圍對應的第1主面1A的區域稱作「負荷區域10L」。 Then, the laminated structure 50 extends the annular region in which the first main surface 10A of the sheet 10 is exposed in plan view, that is, the portion corresponding to a portion of the third region 13a, from the main opposite to the first main surface 10A. The ring member 60 is pressed on the side of the face. In the present specification, the portion where the annular member 60 of the stretchable sheet 10 is pressed and the region of the first main surface 1A corresponding thereto are referred to as "load region 10L".

並且,為達到使環狀構件60對可延伸片材10的接觸部分的,以可延伸片材10中黏附在環狀框架30的部分的下側面為基準的垂直方向的離間距離變大的目的,將環狀構件60朝著垂直方向移動。其結果,對可延伸片材10以平面視從中央部分向外周部分方向賦予張力。 Further, in order to achieve the contact portion of the annular member 60 with respect to the stretchable sheet 10, the distance in the vertical direction with respect to the lower side surface of the portion of the extendable sheet 10 adhered to the annular frame 30 is increased. The annular member 60 is moved in the vertical direction. As a result, the stretchable sheet 10 is given tension in a plane view from the central portion toward the outer peripheral portion.

此被賦予的張力,通過黏著劑層2,傳達至多突設工件20的凸部22及通過第1突起部11p,傳達至多突設工件20的最遠位殘餘部21r,在多突設工件20的最遠位凸部22d與最遠位殘餘部21r之間,在離間它們的方向上產生力。通過該力,產生最遠位凸部22d和最遠位殘餘部21r的破斷和它們的離間。另外,通過為形成改性層而照射雷射光,雖然也有最遠位凸部22d和最遠位殘餘部21r已經破斷的情況,但是這種情況時,由於上述離間方向上的力,最遠位凸部22d和最遠位殘餘部21r離間。因此,最遠位積層晶片40d可以在與最遠位殘餘部21r相分離的狀態下得到。由此,在可延伸片材10上,包括最遠位積層晶片40d的多數積層晶片40以彼此離間的 狀態排列,同時可以得到以平面視時,外周部近處有環狀框架30黏附而構成的積層構造體(以下稱為「擴展後積層體70」。) The tension applied thereto is transmitted to the convex portion 22 of the multi-projection workpiece 20 through the adhesive layer 2, and is transmitted to the most distal residual portion 21r of the multi-projection workpiece 20 by the first projection portion 11p, and the workpiece 20 is multi-projected. Between the farthest position convex portion 22d and the farthest position residual portion 21r, a force is generated in a direction separating them. By this force, the breakage of the farthest convex portion 22d and the farthest residual portion 21r and their separation are generated. Further, by irradiating the laser light for forming the modified layer, although the farthest convex portion 22d and the farthest residual portion 21r have been broken, in this case, the force in the above-mentioned separation direction is the farthest. The position convex portion 22d and the farthest position residual portion 21r are separated from each other. Therefore, the farthestmost layered wafer 40d can be obtained in a state of being separated from the farthest position remaining portion 21r. Thus, on the extensible sheet 10, the majority of the laminated wafers 40 including the farthestmost layered wafer 40d are separated from each other. In the state of the arrangement, it is possible to obtain a laminated structure in which the annular frame 30 is adhered in the vicinity of the outer peripheral portion in a plan view (hereinafter referred to as "expanded laminated body 70").

(3)拾取步驟 (3) Picking step

在拾取步驟中,將擴展後積層體70包括的積層晶片40從可延伸片材10上離間。 In the pickup step, the laminated wafer 40 included in the expanded laminated body 70 is separated from the stretchable sheet 10.

(4)復原步驟 (4) Recovery steps

如上所述,可延伸片材10中與負荷區域10L相對應的部分,相對而言被賦予最強的外力,對於此部分,可延伸片材10處為最為伸長的狀態。因此,將與擴展後積層體70接觸的環狀構件60離間,使可延伸片材10處於無負荷狀態,如圖7及9所示,擴展後積層體70包括的可延伸片材10變松,黏附於環狀框架30上的可延伸片材10的部分和可延伸片材10的中央部分在垂直方向離間。該松動量過多,則在運輸時可延伸片材10變松的底面或其近處容易與異物碰撞,擴展後積層體70在使用時操作性降低。 As described above, the portion of the extendable sheet 10 corresponding to the load region 10L is relatively given the strongest external force, and for this portion, the stretchable sheet 10 is in the most stretched state. Therefore, the annular member 60 in contact with the expanded laminated body 70 is separated, and the extendable sheet 10 is placed in an unloaded state. As shown in FIGS. 7 and 9, the expanded sheet 10 included in the expanded laminated body 70 becomes loose. The portion of the extendible sheet 10 adhered to the annular frame 30 and the central portion of the extendable sheet 10 are spaced apart in the vertical direction. When the amount of looseness is too large, the bottom surface of the stretchable sheet 10 at the time of transportation or the vicinity thereof is likely to collide with foreign matter, and the laminated body 70 is reduced in workability when it is used.

因此,對擴展後積層體70的可延伸片材10中的負荷區域10L對應的部分實施加熱的復原步驟也可。通過加熱該部分,可延伸片材10的基材1進行熱收縮,可減少擴展後積層體70可延伸片材10的松動量。 Therefore, the restoration step of heating the portion corresponding to the load region 10L in the stretchable sheet 10 of the expanded laminated body 70 may be performed. By heating the portion, the substrate 1 of the stretchable sheet 10 is thermally shrunk, and the amount of looseness of the stretchable sheet 10 of the expanded laminate 70 can be reduced.

如圖7所示,負荷區域10L與第3凸出區域13b重復的情況,第3突起部13p由熱收縮性材料構成的情況時,對可延伸片材10中負荷區域10L對應的部分加熱,可將第3突起部13p與基材1一同進行熱收縮。第3突起部13p在包括基材1所包括的的熱收縮性材料的情況時,則與基材 1同樣熱收縮,可以更穩定地降低可延伸片材10的松動量。 As shown in FIG. 7, when the load region 10L overlaps with the third convex region 13b, when the third projection 13p is made of a heat-shrinkable material, the portion corresponding to the load region 10L of the extendable sheet 10 is heated. The third protrusion 13p can be thermally contracted together with the substrate 1. When the third protrusion 13p includes the heat-shrinkable material included in the substrate 1, the substrate is bonded to the substrate. The same heat shrinkage 1 can more stably reduce the looseness of the stretchable sheet 10.

如圖9所示,負荷區域10L與易復原區域13c重復的情況時,可延伸片材10中易復原區域13c對應部分的熱收縮特性為,在這一部分最厚的構件基材1的影響大,因此由於基材1的熱收縮,可以更穩定地降低可延伸片材10的松動量。 As shown in Fig. 9, when the load region 10L overlaps with the easily recoverable region 13c, the heat shrinkage characteristic of the portion corresponding to the easily recoverable region 13c in the stretchable sheet 10 is such that the influence of the thickest member substrate 1 in this portion is large. Therefore, due to the heat shrinkage of the substrate 1, the amount of looseness of the stretchable sheet 10 can be more stably lowered.

對可延伸片材10的負荷區域10L對應部分加熱時的條件(具體列舉溫度與時間等。)為,構成可延伸片材10的構件的至少一個,只要由於熱收縮可以降低可延伸片材10的松動量,則沒有特別限制。作為加熱條件的具體一例,可以列舉可延伸片材10在50℃到70℃左右的溫度狀態下保持1分鐘左右。 The conditions (specifically, temperature, time, etc.) at the time of heating the corresponding portion of the load region 10L of the stretchable sheet 10 are at least one of the members constituting the stretchable sheet 10 as long as the stretchable sheet 10 can be lowered due to heat shrinkage. There is no particular limitation on the amount of looseness. As a specific example of the heating conditions, the stretchable sheet 10 is kept at a temperature of about 50 ° C to 70 ° C for about 1 minute.

在實施復原步驟的情況下,只要其實施時間在擴展步驟後就沒有特別限制。在到拾取步驟開始前的時間內實施為佳,接著擴展步驟實施為更佳。 In the case where the restoration step is carried out, there is no particular limitation as long as the implementation time thereof is after the expansion step. It is preferred to perform the time before the start of the picking step, and then the expansion step is implemented to be better.

(5)能量線照射步驟 (5) Energy line irradiation step

具有可延伸片材10的黏著劑層2,在含有能量線硬化材料(作為具體例,可以舉出包括上述能量線聚合性化合物(β)的材料。)的情況時,通過能量線的照射,將上述能量線硬化性材料進行硬化,降低黏著劑層2對多突設工件20的黏著性的步驟即能量線照射步驟,通常在拾取步驟開始前進行。能量線照射步驟的實施時間與復原步驟的實施時間之間的關係沒有限制。 In the case where the energy ray-curable material (for example, a material including the energy ray-polymerizable compound (β) is included as a specific example), the adhesive layer 2 having the stretchable sheet 10 is irradiated with energy rays. The step of curing the energy ray-curable material to reduce the adhesion of the adhesive layer 2 to the multi-projection workpiece 20, that is, the energy ray irradiation step, is usually performed before the start of the pickup step. There is no limitation on the relationship between the implementation time of the energy ray irradiation step and the implementation time of the restoration step.

以上說明的實施形態,是為了易於對本發明的理 解而記述的,並不是對本發明進行限定而進行的記述。因此,上述實施形態中所公開的各要素,也包括屬於本發明的技術範圍的所有設計變更以及均等物。 The embodiment described above is for the purpose of facilitating the invention. The description of the present invention is not intended to limit the present invention. Therefore, each of the elements disclosed in the above embodiments includes all design changes and equivalents belonging to the technical scope of the present invention.

例如,可延伸片材10在第1主面10A上的第2區域12a,在上述實施形態中雖然由以黏著劑層2所構成的面構成,但並不局限於此。例如,也可以是在黏著劑層2上由另外的膜狀構件積層,通過由該積層體構成的面構成上述第2區域12a。作為這種薄膜狀構件的具體例,可舉出在積層晶片40上積層,直接或較佳通過加熱及能量線照射而硬化形成的作為積層晶片40的保護膜的構件、為將積層晶片40與其他構件黏附而使用的作為黏附層的構件(以下稱為「硬化性薄膜等」。)。 For example, the second region 12a of the stretchable sheet 10 on the first main surface 10A is constituted by a surface composed of the adhesive layer 2 in the above embodiment, but is not limited thereto. For example, the adhesive layer 2 may be laminated with another film-like member, and the second region 12a may be formed by a surface composed of the laminate. Specific examples of such a film-like member include a member which is laminated on the laminated wafer 40 and which is formed by directly or preferably being cured by heating and energy ray irradiation as a protective film of the laminated wafer 40, and the laminated wafer 40 is laminated. A member used as an adhesive layer for adhering to other members (hereinafter referred to as "curable film or the like").

此外,黏著劑層2其本身為硬化性薄膜等也可。此時,在拾取步驟中,積層晶片40和硬化性薄膜等黏著劑層2的積層體在可延伸片材10中除去。 Further, the adhesive layer 2 itself may be a curable film or the like. At this time, in the pickup step, the laminated body of the laminated wafer 40 and the adhesive layer 2 such as a curable film is removed in the stretchable sheet 10.

實施例 Example

以下,通過實施例等進一步對本發明進行具體說明,但是本發明的範圍並不受這些實施例等的限定。 The present invention will be specifically described by the following examples, but the scope of the present invention is not limited by the examples and the like.

〔實施例1〕 [Example 1]

(1)可延伸片材的製作 (1) Production of extendable sheets

準備黏合有厚度為38μm的矽酮剝離處理聚對苯二甲酸乙二酯類剝離薄膜的乙烯甲基丙烯酸共聚物薄膜及兩張由丙烯酸類黏著劑所構成的厚度為220μm的黏附片,將1張上的剝離薄膜除去。將未除去剝離薄膜的黏附片的薄膜面與除去剝離薄膜的黏附片面相黏合的方式將兩層進行積層,得到除 剝離薄膜以外總厚度為440μm的構件。對該構件,通過將除去剝離薄膜的構件完全切斷的半切及對不需要部分的修剪進行形狀加工。由此,得到帶有缺損部分以平面視為環狀(外徑:270mm、內徑:194mm)的構件,作為提供突起部的構件。在由作為基材厚度為80μm的乙烯甲基丙烯酸共聚物薄膜及作為黏著劑層厚度為10μm的丙烯酸類黏著劑所構成的黏附片(以下稱為「第1黏附片」。)的黏著劑層所構成的主面上,將上述提供突起部的構件,與該提供突起部構件的薄膜面以對向的方式進行黏合,得到積層體。 An ethylene methacrylic acid copolymer film having a thickness of 38 μm of an anthrone release-treated polyethylene terephthalate release film and two adhesive sheets having a thickness of 220 μm composed of an acrylic adhesive are prepared. The release film on the sheet was removed. The two layers are laminated in such a manner that the film surface of the adhesive sheet from which the release film is not removed is bonded to the surface of the adhesive sheet from which the release film is removed, thereby obtaining A member having a total thickness of 440 μm other than the release film. This member was subjected to shape processing by half-cutting and cutting of the unnecessary portion of the member from which the release film was removed. Thus, a member having a defect portion in a plane as a ring shape (outer diameter: 270 mm, inner diameter: 194 mm) was obtained as a member for providing a projection. Adhesive layer of an adhesive sheet (hereinafter referred to as "first adhesive sheet") composed of an ethylene methacrylic acid copolymer film having a substrate thickness of 80 μm and an acrylic adhesive having an adhesive layer thickness of 10 μm. On the main surface of the main surface, the member for providing the projection is bonded to the film surface of the projection member so as to face each other to obtain a laminate.

其後,進行整體裁斷,得到以平面視時外徑為270mm包括上述突起部的可延伸片材。 Thereafter, the entire cutting was performed to obtain an extendable sheet including the above-mentioned projections having an outer diameter of 270 mm in plan view.

該可延伸片材的加工用區域從平面視,為與可延伸片材為共同中心的直徑200mm的圓形區域。因此,第1區域為由第1凸出區域構成,外徑為200mm、內徑為194mm的圓環狀區域。此外,第3區域為由第3凸出區域構成,外徑為270mm、內徑為200mm的圓環狀區域。 The processing region of the stretchable sheet is a circular region having a diameter of 200 mm which is co-centered with the stretchable sheet as viewed in plan. Therefore, the first region is an annular region composed of the first convex region and having an outer diameter of 200 mm and an inner diameter of 194 mm. Further, the third region is an annular region composed of a third convex region and having an outer diameter of 270 mm and an inner diameter of 200 mm.

(2)積層晶片的製造 (2) Manufacturing of laminated wafers

在具有以平面視直徑為200mm的圓形的矽晶圓的一側主面,在以平面視與矽晶圓擁有共同中心的直徑為180mm的圓形區域,準備長寬為5mm×5mm、高度為400μm的方柱,以平面視時與距離最近的方柱的離間距離為5mm,以有序排列的狀態固定而構成的構件作為被加工構件。 In a circular main surface having a circular tantalum wafer having a plane viewing diameter of 200 mm, a circular area having a diameter of 180 mm which is common to both the planar view and the tantalum wafer is prepared to have a length and width of 5 mm × 5 mm and a height. The square column of 400 μm is a member to be processed in a state in which the distance between the plane and the closest square column is 5 mm, and the state is fixed in an ordered arrangement.

使用黏帶設備(LINTEC公司製,「RAD2700m/8」),將通過實施例與比較例製成的可延伸片材的基材側與相反側 主面,對經過上述形成改性層步驟的被加工構件及環狀框架(內徑250mm),進行黏附使他們成為同心圓。 The substrate side and the opposite side of the stretchable sheet produced by the examples and the comparative examples were bonded using an adhesive tape apparatus ("RAD 2700 m/8" manufactured by LINTEC Co., Ltd.) On the main surface, the member to be processed and the annular frame (inner diameter 250 mm) subjected to the above-described step of forming the modified layer were adhered so as to become concentric circles.

對於被加工構件的矽晶圓,用波長為1064nm的脈沖雷射光照射可延伸片材的基材側,沿著20mm×20mm的預計分割線,在矽晶圓內形成改性層。 For the tantalum wafer of the member to be processed, the substrate side of the stretchable sheet was irradiated with pulsed laser light having a wavelength of 1064 nm, and a modified layer was formed in the tantalum wafer along a projected dividing line of 20 mm × 20 mm.

對於依據黏附步驟所得到的可延伸片材、被加工構件及以環狀框架構成的積層構造體,使用分離擴片機(DISCO公司製,「DDS2300」),按照以下條件實施以加熱器擴展分割晶片的擴展步驟。其結果,被加工構件被分割,在可延伸片材上形成若幹以20mm×20mm的片狀體所構成的積層晶片。 For the stretchable sheet, the member to be processed, and the laminated structure formed by the annular frame, the separation expander ("DDS2300" manufactured by DISCO Corporation) was used to perform the heater expansion division according to the following conditions. The expansion step of the wafer. As a result, the member to be processed was divided, and a plurality of laminated wafers each having a sheet shape of 20 mm × 20 mm were formed on the stretchable sheet.

<擴展條件> <Extended condition>

溫度:23℃ Temperature: 23 ° C

壓力速度:1mm/S Pressure speed: 1mm/S

壓力量:12mm Pressure: 12mm

壓力後維持時間:1分鐘 Maintenance time after pressure: 1 minute

使用上述分離擴片機,對可延伸片材上以平面視位於被加工構件與環狀框架之間的部分(第3區域的一部分)實施進行加熱的復原步驟。具體而言,從兩個位置的送風口噴射暖風,以1°/S的速度旋轉著進行180秒。加熱條件如下所述。其結果,該部分熱收縮,可延伸片材的松動量減少。 A portion of the stretchable sheet which is placed in a plane between the member to be processed and the annular frame (a part of the third region) is heated by the above-described separating and expanding machine. Specifically, the warm air was sprayed from the air blowing ports at the two positions, and rotated at a speed of 1°/S for 180 seconds. The heating conditions are as follows. As a result, the portion is thermally contracted, and the amount of looseness of the stretchable sheet is reduced.

<擴展條件> <Extended condition>

溫度:23℃ Temperature: 23 ° C

壓力速度:1mm/S Pressure speed: 1mm/S

壓力量:12mm Pressure: 12mm

<復原條件> <recovery condition>

暖風輸入溫度:220℃ Warm air input temperature: 220 ° C

送風口~可延伸片材之間距離:20mm Air supply port ~ distance between extendable sheets: 20mm

速度:1°/S、180秒加溫 Speed: 1°/S, 180 seconds heating

對於經過復原步驟的可延伸片材,實施將黏附的復數個積層晶片分別從可延伸片材上單獨分離的拾取步驟。 For the stretchable sheet subjected to the restoring step, a picking step of separately separating the plurality of laminated wafers from the stretchable sheet is carried out.

由此,在被加工構件上使用可延伸片材製造積層晶片。 Thereby, a laminate wafer is produced using the stretchable sheet on the member to be processed.

〔實施例2〕 [Example 2]

準備將能量線硬化性組合物通過能量線照射硬化的聚氨酯薄膜及丙烯酸類黏著劑所構成的厚度為330μm的黏附片(以下稱為「第2黏附片」。)和在第2黏附片的丙烯酸類黏著劑側的面上,黏附其剝離面的厚度為38μm的矽酮剝離處理聚對苯二甲酸乙二酯類剝離薄膜所構成的積層體。在該積層體的聚氨酯薄膜一側實施將第2黏附片完全切斷的半切及對不需要部分的修剪,進行形狀加工。由此,在剝離片上得到平面視時圓環形狀(外徑:272mm、內徑:266mm)的構件,作為提供第1突起部的構件。將該提供第1突起部的構件和由剝離片構成的積層體提供第1突起部構件側的面(薄膜面),黏合在由實施例1中使用的第1黏附片與由同種黏附片黏著劑層構成的主面上。將由此得到的積層體的第1黏附片裁斷,使其成為平面視時外徑為270mm的圓形。此時,使該圓與提供第1突起部的構件以平面視時界限明顯突出的2個圓(內周側的圓和外周側的圓)為同心圓。由此,得到平面視時外徑為270mm,包括第1突起部的可延伸片材。使用該可延伸片材,以 下,與實施例1同樣地操作,由被加工構件製造積層晶片。 An adhesive sheet having a thickness of 330 μm (hereinafter referred to as a "second adhesive sheet") composed of a polyurethane film and an acrylic adhesive which are cured by an energy ray-curable composition, and an acrylic sheet in the second adhesive sheet. On the adhesive-like side surface, a laminate comprising a fluorene ketone peel-treated polyethylene terephthalate release film having a thickness of 38 μm on the release surface was adhered. The half-cut and the unnecessary portion of the second adhesive sheet are completely cut on the polyurethane film side of the laminate, and the shape is processed. Thereby, a member having a circular shape in plan view (outer diameter: 272 mm, inner diameter: 266 mm) was obtained on the release sheet as a member for providing the first projection. The member for providing the first projection and the laminate formed of the release sheet are provided on the surface (film surface) on the side of the first projection member, and are bonded to the first adhesive sheet used in the first embodiment and adhered to the same adhesive sheet. The main surface of the agent layer. The first adhesive sheet of the thus obtained laminated body was cut into a circular shape having an outer diameter of 270 mm in plan view. At this time, the two circles (the inner circumference side circle and the outer circumference side circle) in which the circle and the member providing the first protrusion portion are significantly protruded in plan view time are concentric circles. Thereby, an extendable sheet including the first projection portion having an outer diameter of 270 mm in plan view was obtained. Use the extendable sheet to Next, in the same manner as in the first embodiment, a laminated wafer was produced from the member to be processed.

〔比較例1〕 [Comparative Example 1]

將作為基材的乙烯甲基丙烯酸共聚物薄膜與由作為黏著劑層的丙烯酸類黏著劑構成的厚度為90μm的黏附片裁斷,作為平面視時外徑為270mm的可延伸片材。使用該可延伸片材,以下,與實施例1同樣地操作,由被加工構件製造積層晶片。 An ethylene methacrylic acid copolymer film as a substrate and an adhesive sheet having a thickness of 90 μm composed of an acrylic adhesive as an adhesive layer were cut as an extendable sheet having an outer diameter of 270 mm in plan view. Using the stretchable sheet, a laminate wafer was produced from the workpiece to be processed in the same manner as in the first embodiment.

〔試驗例1〕<黏附狀態的觀察> [Test Example 1] <Observation of adhesion state>

對經過黏附步驟所得到的可延伸片材、被加工構件及環狀框架所構成的積層構造體,以肉眼觀察以下觀點。 The laminated structure of the stretchable sheet, the workpiece to be processed, and the annular frame obtained by the adhesion step was visually observed.

(觀點1)對被加工構件的最遠位殘餘部的第1凸出區域的黏附狀態 (View 1) Adhesion state of the first convex region of the most distant residual portion of the member to be processed

(觀點2)對被加工構件的凸部的第2區域的黏附狀態 (View 2) Adhesion state of the second region of the convex portion of the member to be processed

對於觀察結果,按照如下判定標準進行評估。 For the observation results, the evaluation was performed according to the following criteria.

A:適度黏附(良好) A: Moderate adhesion (good)

B:未適度黏附(不良) B: not moderately adhered (bad)

將評估結果示於表1。 The evaluation results are shown in Table 1.

〔試驗例2〕<擴展性評估> [Test Example 2] <Extensibility Evaluation>

觀察擴展步驟後的可延伸片材,按照如下判定標準進行評估。 The stretchable sheet after the expansion step was observed and evaluated according to the following criteria.

A:可延伸片材適度伸長(良好) A: The stretchable sheet is moderately stretched (good)

B:可延伸片材未適度伸長(不良) B: The stretchable sheet is not moderately stretched (bad)

將評估結果示於表1。 The evaluation results are shown in Table 1.

〔試驗例3〕<晶片分割性評估> [Test Example 3] <Waferability Evaluation>

觀察擴展步驟後被加工構件分割狀態,按照如下判定標準進行評估。 After the expansion step, the state of the member to be processed is divided and evaluated according to the following criteria.

A:包含最遠位凸部的積層晶片適度從最遠位殘餘部分割(良好) A: The laminated wafer including the farthest convex portion is appropriately divided from the farthest residual portion (good)

B:包含最遠位凸部的積層晶片未適度從最遠位殘餘部分割(不良) B: The laminated wafer including the farthest convex portion is not appropriately divided from the farthest residual portion (defective)

將評估結果示於表1。 The evaluation results are shown in Table 1.

〔試驗例4〕<熱收縮性評估> [Test Example 4] <Heat shrinkage evaluation>

觀察復原步驟後的可延伸片材,按照如下判定標準進行評估。 The stretchable sheet after the recovery step was observed and evaluated according to the following criteria.

A:可伸長片材的復數積層晶片在相互適度離間的同時,可延伸片材鬆弛充分減少(良好) A: The plurality of laminated sheets of the extensible sheet are sufficiently separated from each other while the stretchable sheet is sufficiently relaxed (good)

B:可延伸片材的黏附片部分雖然熱收縮,但第3凸出部未進行熱收縮,其結果可延伸片材的鬆弛未能充分減少(不良) B: Although the adhesive sheet portion of the stretchable sheet is heat-shrinked, the third projection portion is not thermally shrunk, and as a result, the slack of the stretchable sheet is not sufficiently reduced (defective).

將評估結果示於表1。此外,在比較例1中,由於晶片分割性不良,因此未進行熱收縮性評估。 The evaluation results are shown in Table 1. Further, in Comparative Example 1, since the wafer splitting property was poor, the heat shrinkage property evaluation was not performed.

由表1可知,滿足本發明條件的實施例的可延伸 片材,可以說在擴展步驟和復原步驟中都不易發生問題。 It can be seen from Table 1 that the embodiment satisfying the conditions of the present invention can be extended. Sheets can be said to be less prone to problems in both the expansion step and the recovery step.

產業上可利用性 Industrial availability

本發明相關的可延伸片材,適合用於從藉由COW技術製造的像積層體這樣的多突設工件中為得到積層晶片的片,例如適合作為切割片而使用。 The stretchable sheet according to the present invention is suitably used for obtaining a sheet of a laminated wafer from a multi-projected workpiece such as a laminate produced by COW technology, and is suitably used as a dicing sheet, for example.

Claims (13)

一種可延伸片材,其為包括有熱收縮性的基材與在上述基材一方的主面上積層有黏著劑層的可延伸片材;其特徵在於:加工用區域,由以平面視將上述加工用區域的外周作為其外周的環狀區域之第1區域,與位於環狀區域的上述第1區域的內周側,含有上述加工用區域的以平面視為中心的第2區域形成,上述加工用區域,在相比上述可延伸片材的上述基材更近位於上述黏著劑層之側的主面之第1主面上,使用時應該於基板上被黏附在厚度方向上包括複數個凸部的被加工構件之區域;上述第1區域,包括由以上述第2區域為基準在上述基材離間方向上的突起部之第1突起部形成的面。 An extendable sheet comprising an extensible sheet comprising a heat-shrinkable substrate and an adhesive layer laminated on a main surface of the substrate; wherein the processing region is to be viewed in a plan view The outer circumference of the processing region is formed as a first region of the outer circumferential region, and the inner region of the first region located in the annular region is formed by a second region including the processing region as a center. The processing region is disposed on the first main surface of the main surface on the side of the adhesive layer closer to the substrate of the stretchable sheet, and is bonded to the substrate in the thickness direction in use. a region of the member to be processed of the convex portion; the first region includes a surface formed by the first protrusion portion of the protrusion portion in the direction in which the substrate is separated from the second region. 根據申請專利範圍第1項所述的可延伸片材,上述被加工構件為藉由含有分割步驟的工程而被分割成複數個片狀體者,上述分割步驟為對被加工構件照射具有透過性的雷射光線連續形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件的步驟;上述複數個片狀體,含有被分割成至少包括一個上述複數個凸部的片狀體之積層晶片。 According to the stretchable sheet of the first aspect of the invention, the workpiece to be processed is divided into a plurality of sheet-like bodies by a process including a dividing step, and the dividing step is to irradiate the member to be processed. The laser beam continuously forms a modified layer, and the step of dividing the processed member by the formation of the modified layer along the dividing line of reduced strength; the plurality of sheets containing the plurality of sheets are divided into at least one of the plurality A laminated wafer of tabular bodies of convex portions. 根據申請專利範圍第1項所述的可延伸片材,使用時,上述被加工構件中最遠位殘餘部黏附於由上述第1突起部形成的面,上述最遠位殘餘部為於上述被加工構件以平面視,位於比位於上述被加工構件的離中心最遠位的凸部更 遠位的部分,為成為上述積層晶片之一部的部分以外的部分。 According to the stretchable sheet of the first aspect of the invention, in the use, the most distal residual portion of the workpiece is adhered to the surface formed by the first projection, and the most distal residual portion is The processing member is in a plan view and is located at a convex portion farthest from the center of the workpiece to be processed. The far portion is a portion other than the portion of the laminated wafer. 根據申請專利範圍第1項所述的可延伸片材,在使用時,上述被加工構件中上述複數個凸部黏附於上述第2區域。 According to the stretchable sheet of the first aspect of the invention, in the above-mentioned workpiece, the plurality of convex portions are adhered to the second region. 根據申請專利範圍第1項所述的可延伸片材,上述可延伸片材的上述第1主面,以平面視在上述加工用區域的外周側包括第3區域,上述第3區域有由以上述第2區域為基準在從上述基材離間的方向上突出的突起部之第3突起部的面形成的第3突起區域,上述第3突起部有熱收縮性。 According to the stretchable sheet of the first aspect of the invention, the first main surface of the extendable sheet includes a third region on the outer peripheral side of the processing region in a plan view, and the third region has The second region is a third projection region formed on the surface of the third projection portion of the projection protruding from the direction in which the substrate is spaced apart from each other, and the third projection has heat shrinkability. 根據申請專利範圍第1項所述的可延伸片材,在上述第3區域的至少一部分區域所對應的上述可延伸片材的部分,上述基材為最厚的構件。 The stretchable sheet according to claim 1, wherein the base material is the thickest member in the portion of the stretchable sheet corresponding to at least a part of the third region. 根據申請專利範圍第1項所述的可延伸片材,將含有上述基材以及上述黏著劑層的積層體黏附於矽鏡面晶圓(Silicon mirror wafer),基於JIS Z0237:2000所測定的上述積層體的黏著力為1000mN/25mm以上20000mN/25mm以下。 According to the stretchable sheet of the first aspect of the invention, the laminate including the substrate and the adhesive layer is adhered to a mirror mirror wafer, and the laminate is measured based on JIS Z0237:2000. The adhesion of the body is 1000mN/25mm or more and 20000mN/25mm or less. 根據申請專利範圍第1項所述的可延伸片材,上述第1區域的突起部相比上述第2區域基準之突起高度為200μm以上。 In the stretchable sheet according to the first aspect of the invention, the projection of the first region has a projection height of 200 μm or more as compared with the second region. 根據申請專利範圍第1項所述的可延伸片材,上述基材包括聚烯烴膜。 The extensible sheet according to item 1, wherein the substrate comprises a polyolefin film. 一種積層晶片的製造方法,其為從在基板上在厚度方向包括複數個凸部的被加工構件製造至少含有1個上述複數個凸部的片狀體之積層晶片的方法, 其包括分割步驟、黏附步驟、擴展步驟與拾取步驟;上述分割步驟為,對被加工構件照射雷射光線使上述被加工構件連續形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件的步驟;上述黏附步驟為,在經過了對被加工構件照射雷射光線使上述被加工構件連續形成改性層,藉由該改性層的形成沿著強度降低了的分割預定線分割被加工構件的步驟的被加工構件,以及以平面視被配置於上述被加工構件的外周側的環狀框架上,黏附根據申請專利範圍第1~第9項任意一項所述的可延伸片材,在上述被加工構件中以平面視為位於比位於上述被加工構件的離中心最遠位的凸部更遠位的部分,且為上述積層晶片之一部的部分以外的部分即最遠位殘餘部上,黏附由上述第1突起部形成的面,同時在上述被加工構件的上述複數個凸部,黏附有上述第2區域的狀態的步驟;上述擴展步驟為,使上述可延伸片材延伸,將上述被加工構件分割成複數個片狀體,複數個包括上述複數個凸部的至少1個的片狀體之積層晶片彼此離間地配置於上述可延伸片材上,同時使黏附於由上述第1突起部形成的面的上述被加工構件的上述凸部以外的部分為從上述積層晶片離間的狀態的步驟;上述拾取步驟為,使上述積層晶片從上述可延伸片材離間的步驟。 A method for producing a laminated wafer, which is a method for producing a laminated wafer of a sheet-like body including at least one of the plurality of convex portions from a member to be processed including a plurality of convex portions in a thickness direction on a substrate, The method includes a dividing step, an adhering step, an expanding step, and a picking step. The dividing step is: irradiating the processed member with the laser beam to continuously form the modified layer by the processed member, and the formation of the modified layer decreases along the strength The step of dividing the predetermined line to divide the workpiece; the sticking step is: forming a modified layer continuously by irradiating the processed member with the laser beam, and forming the modified layer along the strength The member to be processed which is the step of dividing the predetermined member by dividing the predetermined line, and the annular frame which is disposed on the outer peripheral side of the member to be processed in plan view, and adhered to any one of the first to ninth items of the patent application range The extendable sheet according to the above aspect, which is considered to be located at a position farther than a convex portion located farthest from the center of the workpiece to be processed in the above-mentioned workpiece, and which is one of the laminated wafers a portion other than the portion, that is, a portion farthest from the remaining portion, adheres to the surface formed by the first protrusion, and adheres to the plurality of convex portions of the member to be processed. a step of the state of the second region; the expanding step of extending the stretchable sheet, dividing the workpiece into a plurality of sheet-like bodies, and a plurality of sheets including at least one of the plurality of convex portions The laminated sheets of the body are disposed on the stretchable sheet, and the portion other than the convex portion of the workpiece to be adhered to the surface formed by the first projection is in a state of being separated from the laminated wafer. The step of picking up is a step of separating the laminated wafer from the stretchable sheet. 根據申請專利範圍第10項所述的積層晶片的製造方法,上述第1突起部以上述第2區域為基準的突起高度對於上述被加工構件所包括的上述凸部的以上述基板為基準的突起 高度的比例,為80%以上120%以下。 According to the method of manufacturing a laminated wafer according to the above aspect of the invention, the protrusion height of the first protrusion based on the second region is a protrusion based on the substrate of the convex portion included in the workpiece. The ratio of height is 80% or more and 120% or less. 根據申請專利範圍第10項所述的積層晶片的製造方法,上述擴展步驟藉由在上述可延伸片材中對應於上述第3區域部分的一部分對接環狀的構件,進行上述可延伸片材的延伸,加熱上述可延伸片材中上述環狀構件所對接的部分,使該部分的上述基材收縮的復元步驟,在結束上述擴展步驟之後開始上述拾取步驟之間。 The method for producing a laminated wafer according to claim 10, wherein the expanding step performs the stretchable sheet by abutting a ring-shaped member corresponding to a portion of the third region portion in the stretchable sheet. Extending, heating the portion of the extendable sheet that is abutted by the annular member, and shrinking the portion of the substrate, and completing the step of expanding after the step of expanding. 根據申請專利範圍第10項所述的積層晶片的製造方法,包括上述可延伸片材的上述黏著劑層,含有能量線硬化性材料,藉由對上述黏著劑層照射能量線使上述能量線硬化性材料硬化,使上述黏著劑層之對上述晶片的粘著性降低的能量線照射步驟,在結束上述擴展步驟之後開始上述拾取步驟之間。 The method for producing a laminated wafer according to claim 10, wherein the adhesive layer including the stretchable sheet contains an energy ray-curable material, and the energy ray is hardened by irradiating the adhesive layer with an energy ray. The energy material is hardened, and the energy ray irradiation step of lowering the adhesiveness of the adhesive layer to the wafer is started between the picking steps after the end of the expanding step.
TW104104670A 2014-02-13 2015-02-12 Extensible sheet and method for manufacturing laminated wafer TWI657550B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-025773 2014-02-13
JP2014025773A JP6306362B2 (en) 2014-02-13 2014-02-13 Extensible sheet and laminated chip manufacturing method

Publications (2)

Publication Number Publication Date
TW201539685A TW201539685A (en) 2015-10-16
TWI657550B true TWI657550B (en) 2019-04-21

Family

ID=53894071

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104104670A TWI657550B (en) 2014-02-13 2015-02-12 Extensible sheet and method for manufacturing laminated wafer

Country Status (3)

Country Link
JP (1) JP6306362B2 (en)
KR (1) KR102243095B1 (en)
TW (1) TWI657550B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102313586B1 (en) * 2016-03-30 2021-10-15 린텍 가부시키가이샤 Sheet for semiconductor processing
JP2018009060A (en) * 2016-07-11 2018-01-18 ダイヤプラスフィルム株式会社 Base material film for adhesive sheet and adhesive tape for automobile marking
KR102382843B1 (en) * 2016-11-02 2022-04-05 린텍 가부시키가이샤 Stealth dicing adhesive sheet and method for manufacturing semiconductor device using same
KR102481281B1 (en) * 2016-11-02 2022-12-27 린텍 가부시키가이샤 Adhesive sheet for stealth dicing
KR102319730B1 (en) * 2016-12-07 2021-11-02 후루카와 덴키 고교 가부시키가이샤 Tape for semiconductor processing
JP6989561B2 (en) * 2018-03-28 2022-01-05 古河電気工業株式会社 Semiconductor processing tape
JP6989562B2 (en) * 2018-03-28 2022-01-05 古河電気工業株式会社 Semiconductor processing tape
JP6989563B2 (en) * 2018-03-28 2022-01-05 古河電気工業株式会社 Semiconductor processing tape
JP7139047B2 (en) * 2018-07-06 2022-09-20 株式会社ディスコ Wafer processing method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005142365A (en) * 2003-11-06 2005-06-02 Disco Abrasive Syst Ltd Method for dividing wafer
JP2007005530A (en) * 2005-06-23 2007-01-11 Lintec Corp Manufacturing method of chip product
WO2009110426A1 (en) * 2008-03-03 2009-09-11 リンテック株式会社 Adhesive sheet
WO2013161891A1 (en) * 2012-04-24 2013-10-31 ボンドテック株式会社 Chip-on-wafer bonding method and bonding device, and structure comprising chip and wafer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3646349B2 (en) * 1995-05-17 2005-05-11 株式会社デンソー Manufacturing method of semiconductor device
JP4218215B2 (en) * 2001-02-06 2009-02-04 住友ベークライト株式会社 Adhesive sheet for semiconductor substrate processing
JP4830740B2 (en) 2005-11-16 2011-12-07 株式会社デンソー Manufacturing method of semiconductor chip
JP4925173B2 (en) * 2006-06-02 2012-04-25 日東電工株式会社 Dicing adhesive sheet and method of processing a cut object using the same
JP2009110995A (en) * 2007-10-26 2009-05-21 Toray Eng Co Ltd Three-dimensional packaging method and apparatus
JP5554118B2 (en) * 2010-03-31 2014-07-23 古河電気工業株式会社 Wafer processing tape
JP5964666B2 (en) * 2012-06-14 2016-08-03 株式会社ダイセル Filler for 3D mounting of semiconductor elements
JP6033116B2 (en) * 2013-02-22 2016-11-30 株式会社ディスコ Laminated wafer processing method and adhesive sheet

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005142365A (en) * 2003-11-06 2005-06-02 Disco Abrasive Syst Ltd Method for dividing wafer
JP2007005530A (en) * 2005-06-23 2007-01-11 Lintec Corp Manufacturing method of chip product
WO2009110426A1 (en) * 2008-03-03 2009-09-11 リンテック株式会社 Adhesive sheet
WO2013161891A1 (en) * 2012-04-24 2013-10-31 ボンドテック株式会社 Chip-on-wafer bonding method and bonding device, and structure comprising chip and wafer

Also Published As

Publication number Publication date
KR20150095562A (en) 2015-08-21
JP6306362B2 (en) 2018-04-04
KR102243095B1 (en) 2021-04-21
JP2015151453A (en) 2015-08-24
TW201539685A (en) 2015-10-16

Similar Documents

Publication Publication Date Title
TWI657550B (en) Extensible sheet and method for manufacturing laminated wafer
TWI709485B (en) Base material for semiconductor wafer processing sheet, semiconductor wafer processing sheet, and method for manufacturing semiconductor device
KR101880644B1 (en) Surface protective sheet
TWI423320B (en) Method for removing peeling from surface protection tape for crystal cutting and surface protection tape for crystal cutting
TWI811763B (en) Adhesive sheet and manufacturing method of processed product
US20110237050A1 (en) Method for processing wafer
KR102091963B1 (en) Method for manufacturing semiconductor device
TWI580755B (en) Cutting pieces
TW201009037A (en) Adhesive sheet, method for processing adherend using the adhesive sheet, and adhesive sheet-peeling device
JP2010100686A (en) Spontaneously winding adhesive sheet
JP2008155619A (en) Self-rolling laminated sheet and self-rolling pressure-sensitive adhesive sheet
TW201728457A (en) Mask-integrated surface protection film
JP5603453B1 (en) Adhesive tape for semiconductor wafer protection
KR20180132620A (en) Mask-integrated surface protection tape
KR102188284B1 (en) Mask-integrated surface protection tape
TWI304610B (en) Method of manufacturing a thin-film circuit substrate having penetrating structure, and protecting adhesive tape
TWI615890B (en) Wafer processing tape
WO2023068088A1 (en) Base material which is used for adhesive sheet for processing semiconductor wafer having projected part
JP6190134B2 (en) Dicing sheet base film, dicing sheet, dicing sheet base film manufacturing method, and chip-shaped member manufacturing method
WO2024063125A1 (en) Method for peeling object from adhesive sheet
KR101819292B1 (en) Wafer processing tape
JPWO2019098101A1 (en) Manufacturing method of semiconductor devices
JP2013175771A (en) Method for peeling and removing dicing surface protection tape