TW202126974A - Clean heat treatment apparatus - Google Patents
Clean heat treatment apparatus Download PDFInfo
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- TW202126974A TW202126974A TW109128782A TW109128782A TW202126974A TW 202126974 A TW202126974 A TW 202126974A TW 109128782 A TW109128782 A TW 109128782A TW 109128782 A TW109128782 A TW 109128782A TW 202126974 A TW202126974 A TW 202126974A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D3/00—Charging; Discharging; Manipulation of charge
- F27D3/12—Travelling or movable supports or containers for the charge
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/04—Circulating atmospheres by mechanical means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0001—Heating elements or systems
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/04—Circulating atmospheres by mechanical means
- F27D2007/045—Fans
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
- F27D2009/007—Cooling of charges therein
- F27D2009/0072—Cooling of charges therein the cooling medium being a gas
- F27D2009/0075—Cooling of charges therein the cooling medium being a gas in direct contact with the charge
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Abstract
Description
本發明係關於一種在潔淨的環境中將被處理物進行加熱或冷卻之潔淨熱處理裝置。尤其是,本發明係具有下列特點:利用旋轉台使被處理物旋轉,而可有效率且均勻地加熱被處理物、或有效率且均勻地冷卻加熱後的被處理物,並且,還可使熱處理裝置的設置面積縮小。 The present invention relates to a clean heat treatment device for heating or cooling a processed object in a clean environment. In particular, the present invention has the following characteristics: the object to be processed can be rotated by the rotating table, and the object to be processed can be heated efficiently and uniformly, or the heated object can be cooled efficiently and uniformly, and it can also be used The installation area of the heat treatment device is reduced.
以往至今,在半導體裝置、液晶顯示裝置等之製程等之中,係為了在潔淨的環境中將被處理物進行加熱或冷卻而使用潔淨熱處理裝置。 Conventionally, in the manufacturing processes of semiconductor devices, liquid crystal display devices, etc., clean heat treatment devices have been used in order to heat or cool objects to be processed in a clean environment.
此處,就此種潔淨熱處理裝置而言,在以往,已知有如專利文獻1至3所示者。 Here, as for such a clean heat treatment apparatus, those shown in Patent Documents 1 to 3 are known in the past.
而且,在這些專利文獻1至3所示者中,係將藉由加熱器等加熱後之氣體利用送風裝置導引至過濾器而使其淨化,且使如此加熱並淨化後的氣體經由安置有被處理物的處理室內部而進行循環,而將前述被處理物進行加熱處理,再者,在專利文獻3所示者中,已提出以下內容:除了以前述方式將被處理物進行加熱處理之外,還利用送風裝置,將藉由冷卻器等冷卻後之氣體導引至過濾器而使其淨化,且使如此冷卻並淨化後的氣體經由安置有被處理物的處理室內部而進行循環,而將前述被處理物進行冷卻處理。 Moreover, in the patent documents 1 to 3, the gas heated by a heater or the like is guided to the filter by a blower to purify it, and the gas thus heated and purified is passed through the The inside of the processing chamber of the object to be processed is circulated, and the aforementioned object to be processed is heated. Furthermore, in the patent document 3, the following has been proposed: In addition to the aforementioned method of heating the object to be processed In addition, the air blowing device is used to guide the gas cooled by a cooler or the like to the filter to purify it, and the thus cooled and purified gas is circulated through the inside of the processing chamber where the object to be processed is placed. And the aforementioned to-be-treated object is subjected to cooling treatment.
此處,會有下列問題:於前述專利文獻1至3所示之任一種潔淨熱處理裝置中,都只是將被處理物安置於處理室內,因此,以前述方式加熱並淨化後的氣體或冷卻並淨化後的氣體也只是從一定的方向對於安置於處理室內之被處理物噴吹,所以,被處理物的溫度會在氣體對於被處理物噴吹之上游側與下游側有所不同,而無法以使被處理物有效率且均勻地加熱或冷卻的方式進行熱處理。 Here, there is the following problem: In any of the clean heat treatment devices shown in the aforementioned Patent Documents 1 to 3, only the object to be treated is placed in the treatment chamber, and therefore, the gas after being heated and purified in the aforementioned manner or cooled and cooled The purified gas is only sprayed from a certain direction to the processed object placed in the processing chamber. Therefore, the temperature of the processed object will be different between the upstream side and the downstream side of the gas to the processed object. The heat treatment is performed in such a way that the object to be processed is heated or cooled efficiently and uniformly.
再者,於前述專利文獻1至3所示之任一種潔淨熱處理裝置中,係將對被處理物進行處理之處理室與過濾器橫向排列配置,因此,還有會使安置這些構件的面積變大,而也使設置潔淨熱處理裝置的設置面積變大的問題。 Furthermore, in any of the clean heat treatment devices shown in the aforementioned Patent Documents 1 to 3, the processing chamber and the filter for processing the object to be processed are arranged side by side. Therefore, the area where these components are arranged will also be changed. The problem is that the installation area of the clean heat treatment device becomes large.
[先行技術文獻] [Advanced Technical Literature]
[專利文獻] [Patent Literature]
專利文獻1:日本特開2004-163014號公報 Patent Document 1: Japanese Patent Application Publication No. 2004-163014
專利文獻2:日本特開2005-156089號公報 Patent Document 2: Japanese Patent Application Publication No. 2005-156089
專利文獻3:日本專利第6140264號公報 Patent Document 3: Japanese Patent No. 6140264
本發明之課題在於解決潔淨熱處理裝置中之前述問題,該潔淨熱處理裝置係在潔淨的環境中將被處理物進行加熱或冷卻。 The subject of the present invention is to solve the aforementioned problems in a clean heat treatment device that heats or cools the processed object in a clean environment.
尤其是,本發明之潔淨熱處理裝置中,課題在於:利用旋轉台使被處理物旋轉,而可使被處理物有效率且均勻地加熱、或使加熱後的被處理物有效率且均勻地冷卻,並且,還可使熱處理裝置的設置面積縮小。 In particular, in the clean heat treatment apparatus of the present invention, the problem is that the object to be processed can be rotated by a rotating table, so that the object can be heated efficiently and uniformly, or the heated object can be cooled efficiently and uniformly. In addition, the installation area of the heat treatment device can be reduced.
在本發明之潔淨熱處理裝置中,係為了解決前述課題而形成為一種具有上段部、中段部、以及下段部的潔淨熱處理裝置,其中,在前述中段部設置處理部,將處理用之氣體從導入部導引至被載置於旋轉台而被旋轉的被處理物而進行處理,並且,將被導引至被處理物之後之氣體從導出部導引至前述上段部或下段部,另一方面,在前述上段部與下段部之其中任一者,設置利用熱風用風扇將藉由加熱裝置加熱後的氣體進行送風的加熱部,而於另一者設置利用冷風用風扇將藉由冷卻裝置冷卻後的氣體進行送風的冷卻部,且在使前述加熱部與冷卻部之其中任一者運轉時使另一者停止,並且,在前述加熱部與冷卻部之其中任一者設置過濾器,而選擇性地將藉由前述加熱裝置加熱後的氣體與藉由前述冷卻裝置冷卻後的氣體之其中任一者導引至過濾器而使其淨化,且將利用過濾器淨化後的氣體導引至前述中段部的處理部中之導入部。 In the clean heat treatment apparatus of the present invention, in order to solve the aforementioned problems, a clean heat treatment apparatus having an upper section, a middle section, and a lower section is formed, wherein a processing section is provided in the middle section, and the processing gas is introduced from The part is guided to the processed object that is placed on the rotating table and rotated, and the gas guided to the processed object is guided from the outlet to the upper or lower part. On the other hand, In any one of the upper and lower sections, a heating section that uses a fan for hot air to blow the gas heated by the heating device is provided, and the other is provided with a fan for cold wind to cool the gas by the cooling device The latter gas is blown into the cooling section, and when either of the heating section and the cooling section is operated, the other is stopped, and a filter is provided in either of the heating section and the cooling section, and The gas heated by the heating device and the gas cooled by the cooling device are selectively guided to the filter for purification, and the gas purified by the filter is guided to The lead-in part in the processing part of the aforementioned middle section.
而且,如本發明之潔淨熱處理裝置般,在中段部之處理部設置用來載置被處理物並使其旋轉的旋轉台,以使被載置於該旋轉台的被處理物旋轉,並且,利用熱風用風扇,將藉由加熱部之加熱裝置加熱後的氣體導引至過濾器而使其淨化,使如此加熱並淨化後的氣體以前述方式經由導入部而朝旋轉的被處理物噴吹而進行加熱,此時,加熱並淨化後的氣體係對於旋轉的被處理物均勻地噴吹,將被處理物均勻地加熱,此外,利用冷風用風扇,將藉由冷卻部之冷卻裝置冷卻後的氣體導引至過濾器而使其淨化,使如此冷卻並淨化後的氣體以前述 方式經由導入部而朝旋轉的被處理物噴吹而進行冷卻,此時,冷卻並淨化後的氣體係對於旋轉的被處理物均勻地噴吹,將被處理物均勻地冷卻。 Moreover, like the clean heat treatment device of the present invention, a rotating table for placing and rotating the object to be processed is provided in the processing section of the middle section, so that the object to be processed placed on the rotating table is rotated, and, The hot air fan is used to guide the gas heated by the heating device of the heating part to the filter to purify it, so that the heated and purified gas is blown toward the rotating object through the introduction part in the aforementioned manner When heating is performed, the heated and purified air system uniformly sprays the rotating object to heat the object uniformly. In addition, the cooling device of the cooling unit is cooled by a fan for cold air. The gas is guided to the filter to purify it, so that the cooled and purified gas is In the method, the rotating object is sprayed through the introduction part for cooling. At this time, the cooled and purified gas system uniformly sprays the rotating object to uniformly cool the object.
此外,如本發明之潔淨熱處理裝置般,在位於設置處理部的前述中段部之上下的上段部與下段部之其中任一者,設置使藉由加熱裝置加熱後的氣體或藉由冷卻裝置冷卻後的氣體淨化的過濾器,將利用該過濾器淨化後的氣體導引至前述處理部中之導入部,此時,與將對被處理物進行處理之處理部與過濾器橫向排列配置的情況相比,可使安置這些構件的面積縮小,而也使潔淨熱處理裝置的設置面積縮小。 In addition, like the clean heat treatment apparatus of the present invention, any one of the upper and lower sections above and below the middle section where the treatment section is provided is provided with a gas heated by a heating device or cooled by a cooling device After the gas purification filter, the gas purified by the filter is guided to the introduction part of the aforementioned treatment part. At this time, the treatment part and the filter that will treat the object to be treated are arranged side by side. In comparison, the area for installing these components can be reduced, and the installation area of the clean heat treatment device can also be reduced.
此處,本發明之潔淨熱處理裝置可形成為,在前述上段部,設置利用熱風用風扇將藉由加熱裝置加熱後的氣體進行送風的前述加熱部,且設置前述過濾器,另一方面,在前述下段部,設置利用冷風用風扇將藉由冷卻裝置冷卻後的氣體進行送風的前述冷卻部,且設置利用冷風用風扇將冷卻後的氣體從該冷卻部導引至前述上段部之冷風導引管,而在前述加熱部之運轉時,利用前述熱風用風扇,將藉由前述加熱裝置加熱後的氣體導引至前述過濾器,利用該過濾器使加熱後的氣體淨化並予以導引至前述處理部中之導入部,另一方面,在前述冷卻部之運轉時,利用前述冷風用風扇,將藉由前述冷卻裝置冷卻後的氣體從前述冷風導引管導引至設置在前述上段部的前述過濾器,利用該過濾器使冷卻後的氣體淨化並予以導引至前述處理部中之導入部。 Here, the clean heat treatment device of the present invention may be formed such that the upper section is provided with the heating section that blows the gas heated by the heating device with a fan for hot air, and the filter is provided. On the other hand, The lower section is provided with the cooling section that uses a fan for cold air to blow the air cooled by the cooling device, and is provided with a cold air guide that uses the fan for cold air to guide the cooled air from the cooling section to the upper section. During the operation of the heating section, the hot air fan is used to guide the gas heated by the heating device to the filter, and the heated gas is purified and guided to the filter by the filter. The introduction part in the processing part, on the other hand, during the operation of the cooling part, the air cooled by the cooling device is guided by the cooling device from the cold air guide pipe to the upper part when the cooling part is operating. The aforementioned filter is used to purify the cooled gas and guide it to the introduction part of the aforementioned treatment part.
此處,本發明之潔淨熱處理裝置可形成為,在前述處理部之前述導入部,設置具有複數個孔的分散導入構件,該複數個孔係使處理用之氣體分散而予以導引至被載置於旋轉台而被旋轉的被處理物,並且,在供被導引至被處理 物之後之氣體導入的導出部,設置使被導引至被處理物之後之氣體分散而予以導引至導出部內部的分散導出構件。 Here, the clean heat treatment device of the present invention may be formed such that the introduction portion of the processing portion is provided with a dispersion introduction member having a plurality of holes that disperse the processing gas and guide it to the carrier. The object to be processed is placed on the rotating table and rotated, and is guided to the processed object The lead-out part for introducing the gas after the object is provided with a dispersion lead-out member that disperses the gas after being guided to the object to be processed and guides it to the inside of the lead-out part.
而且,在設置在處理部的前述分散導入構件與分散導出構件之至少一者之與旋轉台相對向的部分設置呈圓弧狀的凹部,此時,可使用來將被處理物載置於旋轉台而使其旋轉的處理部之面積更為縮小,而也使設置潔淨熱處理裝置的設置面積縮小。 In addition, at least one of the dispersion introduction member and the dispersion discharge member provided in the processing section is provided with a circular arc-shaped recessed portion facing the rotating table. In this case, the object to be processed can be placed on the rotating table. The area of the processing part that is rotated by the stage is further reduced, and the installation area for installing the clean heat treatment device is also reduced.
此外,本發明之潔淨熱處理裝置中,可在處理部之下之下段部內部,設置使前述處理部之旋轉台旋轉的旋轉裝置。如此一來,可防止以下情況:在處理部內部設置旋轉裝置時,於處理部內部配置利用旋轉裝置旋轉的旋轉台之位置產生問題,或是在將被處理物進行加熱處理或冷卻處理時,使旋轉裝置被加熱、冷卻而故障。 In addition, in the clean heat treatment device of the present invention, a rotating device for rotating the rotating table of the above-mentioned treatment part may be provided in the lower part of the treatment part. In this way, the following situations can be prevented: when the rotating device is installed inside the processing unit, problems with the position of the rotating table rotated by the rotating device are arranged inside the processing unit, or when the processing object is heated or cooled, The rotating device is heated and cooled and malfunctions.
本發明之潔淨熱處理裝置中,以前述方式在中段部之處理部設置用來載置被處理物而使其旋轉的旋轉台,以使被載置於該旋轉台的被處理物旋轉,並且,利用熱風用風扇,將藉由加熱部之加熱裝置加熱後的氣體導引至過濾器而使其淨化,使如此加熱並淨化後的氣體以前述方式經由導入部而朝旋轉的被處理物噴吹而進行加熱,因此,會使加熱並淨化後的氣體對於旋轉的被處理物均勻地噴吹,將被處理物均勻地加熱,此外,利用冷風用風扇,將藉由冷卻部之冷卻裝置冷卻後的氣體導引至過濾器而使其淨化,使如此冷卻並淨化後的氣體以前述方式經由導入部而朝旋轉的被處理物噴吹而進行冷卻,因此,會使冷卻並淨化後的氣體對於旋轉的被處理物均勻地噴吹,將被處理物均勻地冷卻。 In the clean heat treatment device of the present invention, a rotating table for placing and rotating the object to be treated is provided in the processing section of the middle section in the aforementioned manner, so that the object to be treated placed on the rotating table is rotated, and, The hot air fan is used to guide the gas heated by the heating device of the heating part to the filter to purify it, so that the heated and purified gas is blown toward the rotating object through the introduction part in the aforementioned manner The heating is performed, so that the heated and purified gas is evenly sprayed on the rotating object to heat the object uniformly. In addition, the cooling device of the cooling unit is cooled by the cooling device using a cold air fan. The gas is guided to the filter to be purified, so that the cooled and purified gas is sprayed to the rotating object through the introduction part in the aforementioned manner to be cooled. Therefore, the cooled and purified gas is The rotating object is sprayed evenly to cool the object evenly.
此外,本發明之潔淨熱處理裝置中,以前述方式在位於設置處理部的中段部之上下的上段部與下段部之其中任一者,設置使藉由加熱裝置加熱後的氣體或藉由冷卻裝置冷卻後的氣體淨化的過濾器,將利用該過濾器淨化後的氣體導引至處理部中之導入部,此時,與將對被處理物進行處理之處理部與過濾器橫向排列配置的情況相比,可使安置這些構件的面積縮小,而也使潔淨熱處理裝置的設置面積縮小。 In addition, in the clean heat treatment apparatus of the present invention, the gas heated by the heating device or the cooling device is provided in either of the upper and lower sections located above and below the middle section where the processing section is provided in the aforementioned manner. The cooled gas purification filter guides the gas purified by the filter to the introduction part of the treatment part. At this time, it is arranged side by side with the treatment part and the filter that will treat the object to be treated. In comparison, the area for installing these components can be reduced, and the installation area of the clean heat treatment device can also be reduced.
10:裝置本體 10: Device body
11:上棚板 11: Upper shed board
11a:送風口 11a: Air supply outlet
11b:回流開口部 11b: Return opening
11c:導引孔 11c: guide hole
12:下棚板 12: Lower shed board
12a:回流孔 12a: Recirculation hole
12b:貫通孔 12b: Through hole
13:上段部 13: Upper section
14:中段部 14: Middle section
15:下段部 15: Lower part
20:加熱部 20: Heating section
21:加熱裝置 21: heating device
22:安裝板 22: Mounting plate
23:熱風用風扇 23: Fan for hot air
30:處理部 30: Processing Department
31:導入部 31: Introduction Department
32:旋轉台 32: Rotating table
33:旋轉裝置 33: Rotating device
34:分散導入構件 34: Distributed import components
34a:孔 34a: hole
34b:凹部 34b: recess
35:導出部 35: export department
36:分散導出構件 36: Decentralized export components
36a:孔 36a: hole
40:冷卻部 40: Cooling part
41:回流管 41: Return pipe
41a:回流分歧管 41a: return branch pipe
42:回流側開閉閥 42: Return side opening and closing valve
43:冷卻裝置 43: cooling device
44:冷風用風扇 44: Fan for cold wind
45:冷風導引管 45: Cold wind guide tube
45a:分歧冷風導引管 45a: Branch cold air guide tube
46:輸送側開閉閥 46: Conveying side opening and closing valve
F:過濾器 F: filter
x:被處理物 x: object to be processed
圖1為概略說明圖,其係顯示在本發明一實施型態之潔淨熱處理裝置中,於上段部設置加熱部、於中段部設置處理部、且於下段部設置冷卻部的情形,並以使前述上段部、中段部與下段部分離之方式進行顯示以便於理解該等部位的內部構造。 Figure 1 is a schematic explanatory diagram showing the situation in which a heating section is provided in the upper section, a processing section is provided in the middle section, and a cooling section is provided in the lower section in a clean heat treatment apparatus of an embodiment of the present invention, and The above-mentioned upper section, middle section and lower section are displayed in such a way that they are separated to facilitate understanding of the internal structure of these parts.
圖2為概略剖面說明圖,其係顯示在前述實施型態之潔淨熱處理裝置中,利用旋轉裝置使載置於設置在中段部之處理部的旋轉台之上的被處理物旋轉,並且將在上段部的加熱部中被加熱而利用過濾器淨化後的加熱用之處理用氣體予以導引至前述處理部,而對被處理物進行加熱處理之狀態。 Figure 2 is a schematic cross-sectional explanatory view showing that in the clean heat treatment device of the foregoing embodiment, the object to be processed placed on the rotating table of the processing section in the middle section is rotated by the rotating device, and will be The heating processing gas purified by the filter in the heating section of the upper stage is heated and guided to the processing section to heat the object to be processed.
圖3為概略剖面說明圖,其係顯示在前述實施型態之潔淨熱處理裝置中,利用旋轉裝置使載置於設置在中段部之處理部的旋轉台之上的被處理物旋轉,並且利用上段部的過濾器使在下段部的冷卻部中被冷卻後的氣體淨化,將淨化後的冷卻用之處理用氣體導引至前述處理部,而對被處理物進行冷卻處理之狀態。 3 is a schematic cross-sectional explanatory view showing that in the clean heat treatment device of the foregoing embodiment, the object to be processed placed on the rotating table of the processing section in the middle section is rotated by the rotating device, and the upper section is used The filter in the lower section purifies the gas cooled in the cooling section of the lower section, and guides the purified cooling processing gas to the processing section to cool the processed object.
圖4為變更例的概略立體圖,其係顯示在前述實施型態之潔淨熱處理裝置中,使處理用之氣體從導入部經由分散導入構件而予以導引至載置於設置在處理部的旋轉台之上的被處理物之際,在前述分散導入構件之與旋轉台相對向的部分設置有呈圓弧狀的凹部之變更例。 Fig. 4 is a schematic perspective view of a modified example, which shows that in the clean heat treatment device of the aforementioned embodiment, the gas for processing is guided from the introduction part through the dispersion introduction member to the rotating table mounted on the processing part In the case of the above to-be-processed object, a modified example of a concave portion having an arc shape is provided in the portion of the dispersion introduction member facing the rotating table.
以下,根據所附圖式,具體地說明本發明實施型態之潔淨熱處理裝置。另外,本發明之潔淨熱處理裝置不限定於下述實施型態所示者,而為可在未變更發明要旨的範圍中適宜地變更而實施者。 Hereinafter, the clean heat treatment device according to the embodiment of the present invention will be specifically explained based on the accompanying drawings. In addition, the clean heat treatment apparatus of the present invention is not limited to those shown in the following embodiments, but can be implemented in a range where the gist of the invention is not changed as appropriate.
如圖1等所示,本實施型態之潔淨熱處理裝置中,係在裝置本體10之內部,以使裝置本體10內部上下區隔的方式設置上棚板11與下棚板12,而將裝置本體10內部分割為位於上棚板11之上的上段部13、位於上棚板11與下棚板之間的中段部14、及位於下棚板12之下的下段部15。
As shown in Figure 1 and so on, in the clean heat treatment device of this embodiment, the
而且,本實施型態之潔淨熱處理裝置中,係於前述上段部13設置加熱部20,利用設置在加熱裝置21之下游側之安裝板22的熱風用風扇23將藉由加熱裝置21加熱後的氣體進行送風,且利用此熱風用風扇23將加熱後的氣體導引至設置在送風方向下游側之位置之前述上棚板11之上的過濾器F,利用此過濾器F使加熱後的氣體淨化,且從該加熱部20使如此加熱並淨化後的處理用之氣體經由設置在位在前述過濾器F之下的上棚板11之部分的送風口11a,而予以導引至前述中段部14。
Furthermore, in the clean heat treatment apparatus of this embodiment, the
此外,在位於前述上棚板11與下棚板12之間的中段部14設置處理部30,且在比從前述過濾器F經由送風口11a而導入處理用之氣體的導入部
31更為下游側的位置,設置用來載置被處理物x而使其旋轉的旋轉台32,且利用設置在前述下棚板12之下的旋轉裝置33使該旋轉台32旋轉。
In addition, a
而且,在前述導入部31與旋轉台32之間設置具有複數個孔34a的分散導入構件34,使被導引至導入部31的處理用之氣體經由分散導入構件34之各個孔34a而朝被載置於旋轉台32而被旋轉的被處理物x噴吹。
In addition, a
再者,在將朝被載置於旋轉台32而被旋轉的被處理物x噴吹後之氣體導引至位於比旋轉台32更下游側的導出部35之途中的位置,設置具有讓前述氣體通過的複數個孔36a的分散導出構件36,以抑制從導入部31所導引的處理用之氣體立即被導引至導出部35,而利用處理用之氣體將被載置於旋轉台32而被旋轉的被處理物x均勻地加熱。
Furthermore, the gas blown toward the processed object x that is placed on the rotating table 32 and rotated is guided to a position on the way of the lead-out
而且,在前述導出部35之上棚板11的部分設置回流開口部11b,另一方面,在導出部35之下棚板12的部分設置一對回流孔12a,該回流開口部11b係將被導引至導出部35之加熱處理後之氣體導引至上段部13的加熱部20,該一對回流孔12a係將被導引至導出部35之加熱處理後之氣體送回到設置在後述下段部15的冷卻部40。
Furthermore, a
此外,在前述下棚板12之下的下段部15設置冷卻部40,而在該冷卻部40中,使從回流管41分歧的各個回流分歧管41a插通於前述導出部35之設置在下棚板12之一對的各個回流孔12a,並且,在回流分歧管41a匯集而成的回流管41設置回流側開閉閥42,將該回流側開閉閥42開啟而藉由冷卻裝置43來冷卻經由回流管41而送回的氣體。
In addition, a
而且,在冷風導引管45設置輸送側開閉閥46,其中該冷風導引管45係利用冷風用風扇44輸送如上述地藉由冷卻裝置43冷卻後的氣體,將該
輸送側開閉閥46開啟,而將經由冷風導引管45輸送來之冷卻後的氣體導引至使氣體分歧而輸送的一對分歧冷風導引管45a。
In addition, the cold
再者,使該一對分歧冷風導引管45a從設置在前述下棚板12的各個貫通孔12b經由前述中段部14的處理部30而插通於前述上棚板11之設置在過濾器F附近的各個導引孔11c,且經由各個分歧冷風導引管45a而使冷卻後的氣體輸送至前述上段部13,且將該冷卻後的氣體導引至設置在上段部13的前述過濾器F,利用該過濾器F使冷卻後的氣體淨化,且使如此冷卻並淨化後的處理用之氣體通過設置在前述過濾器F之下的上棚板11的部分的送風口11a而導引至前述中段部14。
Furthermore, the pair of branched cold
此處,根據圖2具體地說明,於本實施型態之潔淨熱處理裝置中,利用旋轉裝置33使被載置於旋轉台32的被處理物x旋轉,利用在前述加熱部20加熱後的處理用之氣體將被處理物x進行加熱處理的情況。
Here, according to FIG. 2 specifically, in the clean heat treatment apparatus of this embodiment, the rotating
此情況,係於前述下段部15之冷卻部40中,將設置在前述回流管41的回流側開閉閥42及設置在冷風導引管45的輸送側開閉閥46關閉,並且,使前述冷卻裝置43及冷風用風扇44停止。
In this case, in the
另一方面,於前述上段部13之加熱部20中,使前述加熱裝置21及熱風用風扇23作動,利用設置在安裝板22的熱風用風扇23將藉由加熱裝置21加熱後的氣體進行送風,而予以導引至設置在送風方向下游側的位置之上棚板11之上的前述過濾器F,利用該過濾器F使加熱後的氣體淨化,且使如此加熱並淨化後的處理用之氣體通過設置在前述過濾器F之下的上棚板11的部分的送風口11a而導引至中段部14的處理部30之前述導入部31。
On the other hand, in the
而且,使如此被導引至處理部30之導入部31的加熱並淨化後的處理用之氣體通過設置在比導入部31更下游側的位置的前述分散導入構件34之複數個各個孔34a,而朝被載置於前述旋轉台32之上而被旋轉的被處理物x噴吹而進行加熱。此外,將如此對被處理物x加熱後的加熱處理後之氣體通過設置在其下游側的前述分散導出構件36之複數個各個孔36a而導引至前述導出部35,且使如此被導引至導出部35的加熱處理後之氣體通過導出部35之設置在上棚板11的前述回流開口部11b而送回到加熱部20,反覆進行如前述之操作,將被載置於旋轉台32之上而被旋轉的被處理物x充分地進行加熱處理。
Then, the heated and purified processing gas guided to the
此外,本實施型態之潔淨熱處理裝置中,係將以前述方式加熱並淨化後的處理用之氣體予以從分散導入構件34之複數個各個孔34a朝被載置於旋轉台32之上而被旋轉的被處理物x噴吹,來使被處理物x加熱,因此,可對於旋轉的被處理物x均勻地噴吹加熱並淨化後的氣體,將被處理物x均勻地進行加熱處理。
In addition, in the clean heat treatment apparatus of this embodiment, the gas for processing heated and purified in the aforementioned manner is placed on the rotating table 32 from the plurality of
接著,根據圖3具體地說明,於本實施型態之潔淨熱處理裝置中,利用旋轉裝置33使被載置於旋轉台32的被處理物x旋轉,利用在前述冷卻部40冷卻後的處理用之氣體將被處理物x進行冷卻處理的情況。
3, in the clean heat treatment apparatus of this embodiment, the rotating
此情況,係使設置在前述上段部13之加熱部20的前述加熱裝置21及熱風用風扇23停止,而不將加熱後的處理用之氣體導引至前述過濾器F。
In this case, the
另一方面,於前述下段部15之冷卻部40中,將設置在前述回流管41的回流側開閉閥42與設置在冷風導引管45的輸送側開閉閥46開啟,並且,使前述冷卻裝置43及冷風用風扇44作動。
On the other hand, in the
而且,利用前述冷風用風扇44,從插通於導出部35之設置在下棚板12的一對的各個回流孔12a之各回流分歧管41a並經由回流管41來抽吸前述中段部14的處理部30之下游側之導出部35中的氣體,並使之導引至設置在該回流管41的前述冷卻裝置43,而藉由冷卻裝置43冷卻前述氣體,之後,利用前述冷風用風扇44,將如此冷卻後的氣體從回流管41輸送至冷風導引管45,並將冷卻後的氣體從該冷風導引管45導引至一對分歧冷風導引管45a。
Furthermore, the cooling
此處,該一對分歧冷風導引管45a係如前述方式從設置在下棚板12的各個貫通孔12b經由前述中段部14的處理部30而插通於前述上棚板11之設置在過濾器F附近的各個導引孔11c,且如前述方式將從冷風導引管45被導引至各分歧冷風導引管45a之冷卻後的氣體導引至前述上段部13,而輸送至設置在上段部13的前述過濾器F,利用該過濾器F使冷卻後的氣體淨化,且使如此冷卻並淨化後的處理用之氣體通過設置在前述過濾器F之下的上棚板11的部分的送風口11a而導引至前述中段部14的處理部30之導入部31。
Here, the pair of branch cold
而且,使如此被導引至處理部30之導入部31的冷卻並淨化後的處理用之氣體通過設置在比導入部31更下游側的位置的前述分散導入構件34之複數個各個孔34a,而朝被載置於前述旋轉台32之上而被旋轉的被處理物x朝噴吹而進行冷卻。
Then, the gas for processing after cooling and purification guided to the
此外,使如此將被處理物x冷卻後的冷卻處理後之氣體通過設置在其下游側的前述分散導出構件36之複數個各個孔36a而導引至前述導出部35,且使如此被導引至導出部35的冷卻處理後之氣體,如前述方式利用冷風用風扇44,從插通於導出部35之設置在下棚板12的一對的各個回流孔12a的各回流分歧管41a經由回流管41來予以抽吸並藉由冷卻裝置43冷卻,反覆進行如
前述之操作,將被載置於旋轉台32之上而被旋轉的被處理物x充分地進行冷卻處理。
In addition, the gas after the cooling process after the object x is cooled in this way is guided to the lead-out
而且,在使如此被載置於旋轉台32之上而被旋轉的被處理物x冷卻時,本實施型態之潔淨熱處理裝置中,也是將以前述方式冷卻並淨化後的處理用之氣體從分散導入構件34之複數個各個孔34a朝被載置於旋轉台32之上而被旋轉的被處理物x噴吹,而將被處理物x冷卻,因此,可對於旋轉的被處理物x均勻地噴吹冷卻並淨化後的氣體,而將被處理物均勻地進行冷卻處理。
In addition, when cooling the processed object x that is placed on the rotating table 32 and rotated in this way, in the clean heat treatment apparatus of this embodiment, the gas for processing that has been cooled and purified in the aforementioned manner is also removed from The plurality of
此處,本實施型態之潔淨熱處理裝置中,如前述方式就用以將來自導入部31處理用之氣體導引至被載置於旋轉台32之上而被旋轉的被處理物x的部分,設置呈平板狀的構件,以作為具有複數個孔34a的分散導入構件34,惟如圖4所示,若在分散導入構件34中之與旋轉台32相對向的部分設置呈圓弧狀的凹部34b時,可將用來使被處理物x被載置於旋轉台32而被旋轉的處理部30的面積縮小,而使設置潔淨熱處理裝置的設置面積縮小。另外,雖未圖示,就具有使被導引至被處理物x之後之氣體分散並導引至供被導引至被處理物x之後之氣體導入的導出部35之前述複數個孔36a的分散導出構件36而言,也可與前述分散導入構件34同樣地,在與旋轉台32相對向的部分設置呈圓弧狀的凹部,而使處理部30的面積縮小,而也使設置潔淨熱處理裝置的設置面積縮小。
Here, in the clean heat treatment apparatus of the present embodiment, as described above, the gas for processing from the
此外,本實施型態之潔淨熱處理裝置中,如前述方式將裝置本體10內部分割為:位於上棚板11之上的上段部13、位於上棚板11與下棚板之間的中段部14、位於下棚板12之下的下段部15,且在中段部14設置處理部30,並且,在上段部13設置加熱部20,在下段部15設置冷卻部40,而雖未圖示,但也可在上段部13設置冷卻部40,且在下段部15設置加熱部20。
In addition, in the clean heat treatment device of this embodiment, the inside of the
10:裝置本體 10: Device body
11:上棚板 11: Upper shed board
11a:送風口 11a: Air supply outlet
11b:回流開口部 11b: Return opening
11c:導引孔 11c: guide hole
12:下棚板 12: Lower shed board
12a:回流孔 12a: Recirculation hole
12b:貫通孔 12b: Through hole
13:上段部 13: Upper section
14:中段部 14: Middle section
15:下段部 15: Lower part
20:加熱部 20: Heating section
21:加熱裝置 21: heating device
22:安裝板 22: Mounting plate
23:熱風用風扇 23: Fan for hot air
30:處理部 30: Processing Department
31:導入部 31: Introduction Department
32:旋轉台 32: Rotating table
33:旋轉裝置 33: Rotating device
34:分散導入構件 34: Distributed import components
34a:孔 34a: hole
35:導出部 35: export department
36:分散導出構件 36: Decentralized export components
36a:孔 36a: hole
40:冷卻部 40: Cooling part
41:回流管 41: Return pipe
41a:回流分歧管 41a: return branch pipe
42:回流側開閉閥 42: Return side opening and closing valve
43:冷卻裝置 43: cooling device
44:冷風用風扇 44: Fan for cold wind
45:冷風導引管 45: Cold wind guide tube
45a:分歧冷風導引管 45a: Branch cold air guide tube
46:輸送側開閉閥 46: Conveying side opening and closing valve
F:過濾器 F: filter
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JP3279727B2 (en) * | 1993-04-30 | 2002-04-30 | 東京エレクトロン株式会社 | Heat treatment equipment |
JP3375294B2 (en) * | 1998-12-17 | 2003-02-10 | 東京エレクトロン株式会社 | Processing apparatus, processing system, and method for supplying clean air in the apparatus |
AU6904700A (en) | 1999-08-12 | 2001-03-13 | Asml Us, Inc. | Hot wall rapid thermal processor |
JP3912208B2 (en) * | 2002-02-28 | 2007-05-09 | 東京エレクトロン株式会社 | Heat treatment equipment |
JP2004353928A (en) | 2003-05-28 | 2004-12-16 | Koyo Thermo System Kk | Clean oven |
JP4280981B2 (en) * | 2003-06-27 | 2009-06-17 | 株式会社Ihi | Cooling gas air path switching device for vacuum heat treatment furnace |
CN1691209B (en) * | 2004-04-28 | 2010-05-12 | 光洋热系统株式会社 | Display board cooling device |
JP4376243B2 (en) | 2006-03-30 | 2009-12-02 | エスペック株式会社 | Clean oven |
JP5401200B2 (en) * | 2009-08-03 | 2014-01-29 | 株式会社トクヤマ | In-chamber substrate rotating apparatus and method for rotating in-chamber substrate |
WO2012114779A1 (en) | 2011-02-25 | 2012-08-30 | 株式会社村田製作所 | Elevator-type thermal processing furnace |
JP6140264B1 (en) * | 2015-12-28 | 2017-05-31 | 中外炉工業株式会社 | Industrial furnace |
CN110331945B (en) * | 2019-03-27 | 2021-12-03 | 中国石油大学(华东) | Polar region drilling platform derrick heat preservation heating experimental device and experimental method |
-
2020
- 2020-01-10 JP JP2020003052A patent/JP7073016B2/en active Active
- 2020-08-24 TW TW109128782A patent/TWI763012B/en active
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2021
- 2021-01-08 CN CN202110022398.9A patent/CN113108599A/en active Pending
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Publication number | Publication date |
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TWI763012B (en) | 2022-05-01 |
JP7073016B2 (en) | 2022-05-23 |
JP2021110506A (en) | 2021-08-02 |
CN113108599A (en) | 2021-07-13 |
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