TW202126393A - Improved grinding and cleaning device - Google Patents
Improved grinding and cleaning device Download PDFInfo
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- TW202126393A TW202126393A TW109100791A TW109100791A TW202126393A TW 202126393 A TW202126393 A TW 202126393A TW 109100791 A TW109100791 A TW 109100791A TW 109100791 A TW109100791 A TW 109100791A TW 202126393 A TW202126393 A TW 202126393A
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- positive pressure
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- 238000004140 cleaning Methods 0.000 title claims abstract description 53
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000005498 polishing Methods 0.000 claims description 26
- 239000004744 fabric Substances 0.000 claims description 14
- 230000001105 regulatory effect Effects 0.000 claims description 12
- 230000000149 penetrating effect Effects 0.000 abstract description 2
- 238000013461 design Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 230000008595 infiltration Effects 0.000 description 4
- 238000001764 infiltration Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000007812 deficiency Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/033—Other grinding machines or devices for grinding a surface for cleaning purposes, e.g. for descaling or for grinding off flaws in the surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning In General (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
本發明係有關於一種研磨清潔裝置,特別是一種設計有正負壓一體之承載平台結構的研磨清潔改良裝置。The present invention relates to an abrasive cleaning device, in particular to an improved abrasive cleaning device designed with a bearing platform structure integrated with positive and negative pressure.
一般而言,現有技術在研磨清潔過程中,產品依靠載台真空吸附而進行清潔時,含溶劑的無塵布在產品與研磨物件的擠壓下,常會導致溶劑的滲出,並且在載台真空吸附的情況下,使得溶劑會沿著產品的非清潔面,而吸附到載台中的真空腔(vacuum cavity),在產品取片載台轉正壓時,溶劑從真空腔吹到產品的非清潔面,進而造成對產品的污染,而大大地影響到產品的可靠度(reliability)、品質(quality)甚至功能(function)。Generally speaking, in the prior art in the grinding and cleaning process, when the product is cleaned by vacuum adsorption on the stage, the solvent-containing dust-free cloth will often cause the solvent to ooze under the pressure of the product and the grinding object, and the vacuum on the stage In the case of adsorption, the solvent will be adsorbed to the vacuum cavity in the carrier along the non-clean surface of the product. When the product take-out stage is turned to positive pressure, the solvent is blown from the vacuum cavity to the non-clean surface of the product. It also causes pollution to the product, which greatly affects the reliability, quality and even function of the product.
舉例來說,一現有技術有揭露一種玻璃基板支撐平台和玻璃基板宏觀檢查裝置,其中,玻璃基板支撐平台包括框架,並排設置在所述框架上的多根橫樑、以及連接在所述橫樑上的多個吸盤。另有一現有技術揭露一種無接觸輸運與定位平台裝置及控制方法,該裝置包括運輸平台、位於運輸平台下方的固定平台、以及位於固定平台下方的基座。其中,所述的固定平台通過固定平台支撐與基座連接,並且在運輸平台上設有若干個凹槽。值得注意的是,上述目前已知的這些現有技術,皆係僅僅教示出習見常用的真空吸盤,其係僅是以常見的吸嘴來替代真空孔,藉此達到減少產品接觸面積的目的。甚或,現有技術是利用非接觸式的運輸平台,依靠正壓支撐產品移載。然而,以實際的應用層面看來,這些現有的技術方案皆對提升實際產品的可靠度、品質、或功能等良率方面並無有效且顯著的貢獻。For example, a prior art discloses a glass substrate support platform and a glass substrate macro inspection device. The glass substrate support platform includes a frame, a plurality of beams arranged side by side on the frame, and a glass substrate connected to the beam. Multiple suction cups. Another prior art discloses a non-contact transportation and positioning platform device and a control method. The device includes a transportation platform, a fixed platform located below the transportation platform, and a base located below the fixed platform. Wherein, the fixed platform is connected with the base through the fixed platform support, and a number of grooves are provided on the transportation platform. It is worth noting that the above-mentioned prior art only teaches the commonly used vacuum suction cups, which only replace the vacuum holes with common suction nozzles, thereby achieving the purpose of reducing the product contact area. Or even, the existing technology uses a non-contact transportation platform to support product transfer by positive pressure. However, from a practical application level, these existing technical solutions have no effective and significant contribution to improving the reliability, quality, or functional yield of actual products.
是以,有鑒於此,本發明人係有感於上述缺失之可改善,且依據多年來從事此方面之相關經驗,悉心觀察且研究之,並配合學理之運用,而提出一種設計新穎且有效改善上述缺失之本發明,其係揭露一種具有正負壓一體之承載平台結構的研磨清潔改良裝置,其具體之架構及實施方式將詳述於下。Therefore, in view of this, the present inventor feels that the above-mentioned deficiency can be improved, and based on years of relevant experience in this area, careful observation and research, and the use of scientific principles, propose a novel and effective design The present invention to improve the above-mentioned deficiencies discloses a polishing and cleaning improvement device with a load-bearing platform structure integrated with positive and negative pressures, and its specific structure and implementation will be described in detail below.
為解決習知技術存在的問題,本發明之一目的係在於提供一種研磨清潔的改良裝置,其係針對現行的研磨清潔裝置設計作一改良,相較於習知結構,此種新穎的研磨清潔改良裝置係有助於提供較佳的產品清潔品質並有效提升其產品良率。In order to solve the problems existing in the prior art, one purpose of the present invention is to provide an improved device for polishing and cleaning, which is an improvement in the design of the existing polishing and cleaning device. The improved device helps to provide better product cleaning quality and effectively improve its product yield.
本發明之又一目的係在於提供一種研磨清潔的改良裝置,其係藉由在承載產品的平台上同時形成一正壓區與一負壓區,以在鄰近產品之外輪廓附近形成有一氣牆,並藉由該氣牆阻絕清潔過程中無塵布內的溶劑之滲入,由此避免該溶劑汙染產品,達到有效提升產品的清潔良率之目的。Another object of the present invention is to provide an improved device for grinding and cleaning, which forms a positive pressure zone and a negative pressure zone on the platform carrying the product at the same time, so as to form an air wall near the outer contour of the adjacent product , And use the air wall to block the infiltration of the solvent in the dust-free cloth during the cleaning process, thereby avoiding the solvent from contaminating the product, and achieving the purpose of effectively improving the cleaning yield of the product.
本發明之再一目的係在於提供一種研磨清潔的改良裝置,利用此種研磨清潔的改良裝置,僅需通過此正負壓一體的載台設計,一方面可利用其中心區域的負壓區吸附產品,同時開啟正壓,以在產品的外輪廓附近形成氣牆,目前已知本發明可廣泛應用於大部分的研磨清潔相關產業,具有極高的產業應用性。Another object of the present invention is to provide an improved device for grinding and cleaning. With this improved device for grinding and cleaning, only the positive and negative pressure integrated stage design is required. On the one hand, the negative pressure zone in the central area can be used for adsorption. At the same time, the positive pressure is turned on to form an air wall near the outer contour of the product. It is currently known that the present invention can be widely used in most grinding and cleaning related industries, and has extremely high industrial applicability.
鑒於以上,本發明係揭露一種研磨清潔的改良裝置,適於清潔一產品,並提升該產品的清潔良率。此種研磨清潔的改良裝置包括有:一載台,係具有一平面用於承載該產品;以及一研磨組件,其係設置於產品之上方,以透過所述的研磨組件對該產品進行清潔,其中,載台係同時設計有一正壓區與一負壓區,所述的正壓區係對應設置於該產品之外輪廓,負壓區係對應設置於該載台之中心區域。In view of the above, the present invention discloses an improved device for grinding and cleaning, which is suitable for cleaning a product and improving the cleaning yield of the product. The improved device for polishing and cleaning includes: a stage with a flat surface for carrying the product; and a polishing component, which is arranged above the product to clean the product through the polishing component, Wherein, the carrier is designed with a positive pressure zone and a negative pressure zone at the same time, the positive pressure zone is correspondingly arranged on the outer contour of the product, and the negative pressure zone is correspondingly arranged on the central area of the carrier.
詳細而言,本發明所揭露之研磨組件係具有一轉軸,該轉軸之一端係設置有一無塵布,因此,當轉軸旋轉時,研磨組件便可通過所述的無塵布接觸產品,以對產品進行研磨清潔。其中,無塵布中係溶有清潔該產品用的溶劑。In detail, the grinding assembly disclosed in the present invention has a rotating shaft, and one end of the rotating shaft is provided with a dust-free cloth. Therefore, when the rotating shaft rotates, the grinding assembly can contact the product through the dust-free cloth to correct The product is ground and cleaned. Among them, a solvent for cleaning the product is dissolved in the dust-free cloth.
緣此,本發明主要係藉由在其載台設計有對應產品外輪廓的正壓區,以在產品之外輪廓附近形成所述的氣牆,並且通過該氣牆阻絕清潔過程中無塵布內的溶劑滲入並汙染該產品。For this reason, the present invention mainly designs a positive pressure zone corresponding to the outer contour of the product on the carrier to form the air wall near the outer contour of the product, and the air wall prevents the dust-free cloth during the cleaning process. The solvent inside penetrates and contaminates the product.
根據本發明之一實施例,其中,所述的正壓區係鄰近成形於產品之側邊,且落在其外輪廓之內。According to an embodiment of the present invention, the positive pressure zone is formed adjacent to the side of the product and falls within the outer contour of the product.
正壓區係可包含有複數個正壓孔,以通過該些正壓孔開啟正壓。The positive pressure zone may include a plurality of positive pressure holes to open the positive pressure through the positive pressure holes.
舉例而言,正壓區的範圍例如可為一環型槽。For example, the range of the positive pressure zone can be, for example, an annular groove.
另一方面而言,根據本發明之一實施例,其中,所述的負壓區係可包含複數個真空孔,並通過該些真空孔開啟負壓,並吸附產品。On the other hand, according to an embodiment of the present invention, the negative pressure zone may include a plurality of vacuum holes, and the negative pressure is opened through the vacuum holes and the product is adsorbed.
是以,藉由此等新穎的創新設計,本發明所揭露之研磨清潔的改良裝置,自然可利用其正壓區所形成的氣牆,阻絕溶劑的滲入與汙染,由此解決先前技術中所存在的缺失,並提升產品的清潔品質及其良率。Therefore, with this novel and innovative design, the improved device for grinding and cleaning disclosed in the present invention can naturally use the air wall formed in its positive pressure zone to block the infiltration and pollution of solvents, thereby solving the problems in the prior art. Existing deficiencies, and improve the cleaning quality of the product and its yield rate.
更進一步而言,所述的正壓區係連接有一第一氣壓源,此第一氣壓源可包含有至少一電磁閥或調壓閥,以利用該電磁閥或調壓閥控制正壓的開關與大小。其中,此第一氣壓源與所述的正壓區之間係具有至少一進氣軟管,以透過該進氣軟管提供正壓。Furthermore, the positive pressure zone is connected to a first air pressure source, and the first air pressure source may include at least one solenoid valve or a pressure regulating valve, so that the solenoid valve or the pressure regulating valve can be used to control the switch of the positive pressure With size. Wherein, there is at least one air inlet hose between the first air pressure source and the positive pressure zone to provide positive pressure through the air inlet hose.
同樣地,所述的負壓區亦可選擇性地連接至一第二氣壓源,此第二氣壓源可包含有至少一電磁閥或調壓閥,以利用該電磁閥或調壓閥控制負壓的開關與大小。其中,所述的第二氣壓源與負壓區之間可具有至少一出氣軟管,以透過該出氣軟管提供負壓。Similarly, the negative pressure zone can also be selectively connected to a second air pressure source, and this second air pressure source can include at least one solenoid valve or a pressure regulating valve, so that the solenoid valve or the pressure regulating valve can be used to control the negative pressure. The switch and size of the pressure. Wherein, there may be at least one air outlet hose between the second air pressure source and the negative pressure zone, so as to provide negative pressure through the air outlet hose.
以下,本發明係藉由具體實施例配合所附的圖式詳加說明,當可使本領域之人士更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。Hereinafter, the present invention is described in detail with specific embodiments in conjunction with the accompanying drawings, which will make it easier for those skilled in the art to understand the purpose, technical content, characteristics and effects of the present invention.
以上有關於本發明的內容說明,與以下的實施方式係用以示範與解釋本發明的精神與原理,並且提供本發明的專利申請範圍更進一步的解釋。有關本發明的特徵、實作與功效,茲配合圖式作較佳實施例詳細說明如下。The above description of the content of the present invention, and the following embodiments are used to demonstrate and explain the spirit and principle of the present invention, and provide a further explanation of the patent application scope of the present invention. With regard to the features, implementation and effects of the present invention, preferred embodiments are described in detail as follows in conjunction with the drawings.
為了有效解決先前技術所提,由於現有技術在產品的研磨清潔過程中,多因清潔溶劑的滲出而造成產品的汙染;促使本發明遂針對此目標提出一種較佳的改良設計,其係為一種研磨清潔的改良裝置。其中,為了能更佳地理解本發明所述之技術內容,首先,請先參閱第1圖所示結構,其係為根據本發明一實施例研磨清潔的改良裝置之結構示意圖,如圖所示,此研磨清潔的改良裝置係包括一載台10,該載台10係具有一平面12,可用於承載一產品20,一研磨組件30係設置於產品20之上方,研磨組件30具有一轉軸31,轉軸31之一端係設置有一無塵布33,無塵布33中係溶有用以清潔產品20用的一溶劑(solvent)。因此,當轉軸31開始旋轉時,研磨組件30便可通過該溶有溶劑的無塵布33接觸於該產品20,並對產品20進行研磨清潔。In order to effectively solve the problem mentioned in the prior art, since the prior art in the grinding and cleaning process of the product, the product is often polluted due to the exudation of the cleaning solvent; this has prompted the present invention to propose a better improved design for this goal, which is a kind of Improved device for grinding and cleaning. Among them, in order to better understand the technical content of the present invention, first of all, please refer to the structure shown in Figure 1, which is a schematic structural diagram of an improved device for polishing and cleaning according to an embodiment of the present invention, as shown in the figure. The improved device for polishing and cleaning includes a
為了避免溶劑在研磨清潔過程中對產品造成汙染,本發明係設計載台10係為一種具有正負壓一體的改良結構,請一併參閱第2圖至第4圖所示結構之示意圖,其中,第2圖係為根據本發明一實施例之正負壓一體的載台結構之側視圖,第3圖係為根據本發明一實施例之正負壓一體的載台結構之上視圖,第4圖係為根據第3圖所示之載台用以承載產品後之示意圖;本發明係根據該等圖示據此進行詳細之說明,其係揭露如下。In order to prevent the solvent from contaminating the product during the grinding and cleaning process, the present invention designs the
首先,如該些圖示所繪製,本發明所揭露之載台10係同時具有一正壓區22與一負壓區24,該正壓區22係對應設置於產品20之外輪廓,並且,正壓區22係鄰近成形於產品20之側邊,且落在其產品外輪廓(如第4圖中較粗實線所示區域)之內。負壓區24則係對應設置於該載台10之中心區域。First, as drawn in these figures, the
其中,第5圖係為根據本發明實施例具有正壓孔及真空孔之正負壓一體的載台結構之示意圖。請配合參見本發明圖示第3、第4圖及第5圖所示,其中,正壓區22的設置範圍例如可為一環型槽(groove),並且如第5圖所示,該正壓區22的環形槽內亦可包含有複數個正壓孔55,以經由這些正壓孔55提供正壓。在本發明之一實施例中,一般而言,正壓區22係連接一第一氣壓源,且第一氣壓源與該正壓區22之間係具有至少一進氣軟管,以透過該進氣軟管提供正壓。除此之外,此第一氣壓源中更可包含有至少一電磁閥或調壓閥,以利用此電磁閥或調壓閥控制正壓氣源的開關與正壓數值的大小。Wherein, FIG. 5 is a schematic diagram of the structure of the integrated positive and negative pressure stage having a positive pressure hole and a vacuum hole according to an embodiment of the present invention. Please refer to the figures 3, 4 and 5 of the drawings of the present invention. The setting range of the
藉由此設計,本發明所設計的正壓區22便可在產品20之外輪廓附近形成有一氣牆,並藉由此氣牆阻絕清潔過程中溶劑滲入並汙染產品的問題發生。With this design, the
另一方面而言,如第5圖所示,載台10中係同時設計有負壓區24,並在該負壓區24中提供有複數個真空孔44,以通過該些真空孔44開啟負壓,並吸附住產品20。根據本發明之實施例,一般而言,負壓區24係連接一第二氣壓源,且第二氣壓源與該負壓區24之間係具有至少一出氣軟管,以透過該出氣軟管提供負壓以完成吸附產品20。除此之外,此第二氣壓源中亦可選擇性地包含有至少一電磁閥或調壓閥,以利用此電磁閥或調壓閥控制負壓氣源的開關與負壓數值的大小。On the other hand, as shown in Figure 5, a
職故,本發明便可利用此正負壓一體的載台設計,在產品的外輪廓附近形成氣牆,消弭在真空下溶劑滲入產品的缺失產生,當產品放置到載台上時,載台一方面可利用其中心區域的負壓區吸附產品,同時開啟正壓,以在產品的外輪廓附近形成氣牆,達到避免溶劑滲入並影響產品的最佳化功效,惟值得在此說明的是,本發明前述所舉,正壓區設計為一環型槽之實施態樣,乃為根據本發明技術思想之一示性例,而並非用以限制本發明之技術範疇。換言之,根據本發明所教示之技術方案,本領域具通常知識者當可在其實際實施層面上自行變化其正壓區之設計形狀、範圍、甚或長寬尺寸,而皆應隸屬於本發明之發明範圍。本發明在前述段落中所列舉出之示性例,其目的是為了善加解釋本發明主要之技術特徵,而使本領域人員可理解並據以實施之,唯本發明當不以該示性例為限。For this reason, the present invention can use this integrated positive and negative pressure carrier design to form an air wall near the outer contour of the product to eliminate the lack of solvent penetration into the product under vacuum. When the product is placed on the carrier, the carrier On the one hand, the negative pressure zone in the central area can be used to adsorb the product, and at the same time, the positive pressure can be turned on to form an air wall near the outer contour of the product to avoid solvent infiltration and affect the optimal effect of the product, but it is worth explaining here As mentioned above in the present invention, the embodiment in which the positive pressure zone is designed as an annular groove is an exemplary embodiment based on the technical idea of the present invention, and is not intended to limit the technical scope of the present invention. In other words, according to the technical solution taught in the present invention, those with ordinary knowledge in the field can change the design shape, range, or length and width dimensions of the positive pressure zone at the actual implementation level, and they should all belong to the present invention. Scope of invention. The illustrative examples listed in the foregoing paragraphs of the present invention are intended to better explain the main technical features of the present invention so that those skilled in the art can understand and implement them accordingly. Examples are limited.
鑒於以上所述,可明顯觀之,相較於習知技術,本發明所揭露之新穎的研磨清潔的改良裝置係可有效解決先前技術中常發生溶劑滲入而產生產品損耗或腐蝕現象等缺失,可大幅度且有效率的提升產品的清潔良率。根據本發明所教示之技術方案,其係藉由在載台上對應產品外輪廓的區域形成正壓區,以形成氣牆,並通過該氣牆的最佳化設計,實現本發明較優化之發明功效。In view of the above, it is obvious that, compared with the prior art, the novel polishing and cleaning improved device disclosed in the present invention can effectively solve the defects of product loss or corrosion caused by solvent infiltration in the prior art. Significantly and efficiently improve the cleaning yield of products. According to the technical solution taught by the present invention, a positive pressure zone is formed on the carrier table corresponding to the outer contour of the product to form an air wall, and through the optimized design of the air wall, the more optimized of the present invention is realized Invention effect.
綜上所述,根據本發明所揭露之研磨清潔的改良裝置,確實具有極佳之產業利用性及競爭力。顯見本發明所揭露之技術特徵、方法手段與達成之功效係顯著地不同於現行方案,實非為熟悉該項技術者能輕易完成者,故應具備有專利要件,祈 貴審查委員詳鑑之。In summary, the improved device for polishing and cleaning disclosed in the present invention does have excellent industrial applicability and competitiveness. Obviously, the technical features, methods and effects achieved by the present invention are significantly different from the current solutions. It is not something that can be easily completed by those who are familiar with the technology. Therefore, it should have the patent requirements. I hope that the review committee will review them. .
10:載台 12:平面 20:產品 22:正壓區 24:負壓區 30:研磨組件 31:轉軸 33:無塵布 44:真空孔 55:正壓孔10: Stage 12: plane 20: Products 22: Positive pressure zone 24: negative pressure zone 30: Grinding components 31: shaft 33: Clean cloth 44: Vacuum hole 55: Positive pressure hole
第1圖係為根據本發明一實施例研磨清潔的改良裝置之結構示意圖。 第2圖係為根據本發明一實施例之正負壓一體的載台結構之側視圖。 第3圖係為根據本發明一實施例之正負壓一體的載台結構之上視圖。 第4圖係為根據本發明第3圖所示之載台用以承載產品後之示意圖。 第5圖係為根據本發明一實施例具有正壓孔及真空孔之正負壓一體的載台結構之示意圖。Fig. 1 is a schematic structural diagram of an improved device for polishing and cleaning according to an embodiment of the present invention. Fig. 2 is a side view of the integrated positive and negative pressure stage structure according to an embodiment of the present invention. FIG. 3 is a top view of a carrier structure with integrated positive and negative pressure according to an embodiment of the present invention. Fig. 4 is a schematic diagram after the carrier shown in Fig. 3 is used to carry products according to the present invention. FIG. 5 is a schematic diagram of the structure of a positive and negative pressure integrated stage with a positive pressure hole and a vacuum hole according to an embodiment of the present invention.
10:載台10: Stage
12:平面12: plane
20:產品20: Products
30:研磨組件30: Grinding components
31:轉軸31: shaft
33:無塵布33: Clean cloth
44:真空孔44: Vacuum hole
55:正壓孔55: Positive pressure hole
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