TW202119521A - Wafer expanding device - Google Patents
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- TW202119521A TW202119521A TW108141009A TW108141009A TW202119521A TW 202119521 A TW202119521 A TW 202119521A TW 108141009 A TW108141009 A TW 108141009A TW 108141009 A TW108141009 A TW 108141009A TW 202119521 A TW202119521 A TW 202119521A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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Abstract
Description
本發明係關於一種晶圓擴片裝置,且特別係關於一種具有可換擴張組件的晶圓擴片裝置。The present invention relates to a wafer expanding device, and more particularly to a wafer expanding device with a replaceable expansion component.
在現今封裝製程中,是於晶圓上預留切割道,在晶圓經由微影蝕刻後,使用刀輪或雷射將其切割成單一晶片,接著以真空吸取及頂針等裝置將晶片逐一取下,或者在切割後研磨(Dicing Before Grinding, DBG)製程或隱形切割後研磨(Stealth Dicing Before Grinding, SDBG)製程後,進行擴片之動作,將黏貼於晶圓底部的膠膜撐開拉斷,增加晶片間的距離,以利晶片的取下。若上述分割過程失敗,將導致晶片無法取下而降低產能。因此,如何預防晶片無法取下並提升產能,而探討晶圓分割的過程已成為重要的議題。In the current packaging process, dicing lanes are reserved on the wafer. After the wafer is etched by lithography, it is cut into a single chip using a cutter wheel or a laser, and then the chips are taken out one by one by devices such as vacuum suction and ejector pins. Or after the Dicing Before Grinding (DBG) process or the Stealth Dicing Before Grinding (SDBG) process, expand the film to stretch the film attached to the bottom of the wafer. , Increase the distance between the wafers to facilitate the removal of the wafers. If the above-mentioned segmentation process fails, the chip cannot be removed and the production capacity is reduced. Therefore, how to prevent the chip from being removed and increase production capacity, and the process of wafer slicing has become an important issue.
一般而言,晶圓擴張組件採用固定治具來進行擴片製程。然而,在單一設計下,現有晶圓擴張組件無法調整與控制張力,而新的材料與製程已需依照不同晶片或是材料的特性,針對特定方向來做擴片張力調整,否則可能出現局部張力不足或過大等無法調整的問題。再者,單一固定治具因其無法微調後共用會產生較高的製程花費。Generally speaking, the wafer expansion module uses a fixed jig to perform the expansion process. However, under a single design, the existing wafer expansion components cannot adjust and control the tension, and new materials and processes have to adjust the expansion tension in a specific direction according to the characteristics of different wafers or materials, otherwise local tension may occur. Problems that cannot be adjusted such as insufficient or too large. Furthermore, a single fixed fixture cannot be fine-tuned and shared, resulting in higher manufacturing costs.
本發明提出一種晶圓擴片裝置,其藉由調整晶圓擴張組件的尺寸及距離等配置,以改變貼附晶圓底部的膠膜張力進行晶圓擴片。如此,可經由改善局部(單一點)的膠膜張力或者使整體膠膜張力平均,而防止膠膜擴張未拉斷造成晶片無法在下一製程被取下,進而提升製程良率。The present invention provides a wafer expansion device, which adjusts the size and distance of the wafer expansion assembly to change the tension of the adhesive film attached to the bottom of the wafer to expand the wafer. In this way, the local (single point) film tension can be improved or the overall film tension can be evened, so as to prevent the expansion of the film without breaking and the chip cannot be removed in the next process, thereby improving the process yield.
本發明提供一種晶圓擴片裝置,包含一晶圓擴片鐵圈、一承載座、一晶圓擴張組件以及一固定機構。晶圓擴片鐵圈包含一外框及一膠膜,其中膠膜連接於外框,用以貼附一晶圓。承載座承載晶圓擴片鐵圈。晶圓擴張組件用以頂推並擴張膠膜,其中晶圓擴張組件包含不同尺寸的頂推滾輪。固定機構用以與承載座同時固定晶圓擴片鐵圈的外框,並當晶圓擴張組件向上頂推膠膜時,擴張膠膜而對晶圓進行擴片。The invention provides a wafer expanding device, which comprises a wafer expanding iron ring, a bearing seat, a wafer expanding component and a fixing mechanism. The wafer expanding iron ring includes an outer frame and an adhesive film, wherein the adhesive film is connected to the outer frame for attaching a wafer. The carrier carries the wafer expanding iron ring. The wafer expansion assembly is used to push and expand the adhesive film, and the wafer expansion assembly includes push rollers of different sizes. The fixing mechanism is used for fixing the outer frame of the wafer expanding iron ring at the same time as the supporting seat, and when the wafer expanding assembly pushes the adhesive film upward, the adhesive film is expanded to expand the wafer.
本發明提供一種晶圓擴片裝置,包含一晶圓擴片鐵圈、一承載座、一晶圓擴張組件以及一固定機構。晶圓擴片鐵圈包含一外框及一膠膜,其中膠膜連接於外框,用以貼附一晶圓。承載座承載晶圓擴片鐵圈。晶圓擴張組件用以頂推並擴張膠膜,其中晶圓擴張組件包含距晶圓中心不同距離的頂推滾輪。固定機構用以與承載座同時固定晶圓擴片鐵圈的外框,並當晶圓擴張組件向上頂推膠膜時,擴張膠膜而對晶圓進行擴片。The invention provides a wafer expanding device, which comprises a wafer expanding iron ring, a bearing seat, a wafer expanding component and a fixing mechanism. The wafer expanding iron ring includes an outer frame and an adhesive film, wherein the adhesive film is connected to the outer frame for attaching a wafer. The carrier carries the wafer expanding iron ring. The wafer expansion assembly is used to push and expand the adhesive film. The wafer expansion assembly includes push rollers with different distances from the center of the wafer. The fixing mechanism is used for fixing the outer frame of the wafer expanding iron ring at the same time as the supporting seat, and when the wafer expanding assembly pushes the adhesive film upward, the adhesive film is expanded to expand the wafer.
本發明提供一種晶圓擴片裝置,包含一晶圓擴片鐵圈、一承載座、一晶圓擴張組件、一施力組件以及一固定機構。晶圓擴片鐵圈包含一外框及一膠膜,其中膠膜連接於外框,用以貼附一晶圓。承載座承載晶圓擴片鐵圈。晶圓擴張組件用以頂推並擴張膠膜。施力組件用以對膠膜施力,以改變膠膜的局部張力。固定機構用以與承載座同時固定晶圓擴片鐵圈的外框,並當晶圓擴張組件向上頂推膠膜時,擴張膠膜而對晶圓進行擴片。The invention provides a wafer expanding device, which comprises a wafer expanding iron ring, a bearing seat, a wafer expanding component, a force applying component and a fixing mechanism. The wafer expanding iron ring includes an outer frame and an adhesive film, wherein the adhesive film is connected to the outer frame for attaching a wafer. The carrier carries the wafer expanding iron ring. The wafer expansion component is used to push and expand the adhesive film. The force application component is used to apply force to the film to change the local tension of the film. The fixing mechanism is used for fixing the outer frame of the wafer expanding iron ring at the same time as the supporting seat, and when the wafer expanding assembly pushes the adhesive film upward, the adhesive film is expanded to expand the wafer.
基於上述,本發明提供一種晶圓擴片裝置,其在同一治具上進行簡易拆裝,以改變一晶圓擴張組件中的部分組件,或者另外加入一施力組件,以改變晶圓擴片裝置進行擴片時對於膠膜的局部張力,俾能減少擴片成本,並提升擴片良率。Based on the above, the present invention provides a wafer expansion device, which can be easily disassembled and assembled on the same jig to change some of the components in a wafer expansion assembly, or additionally add a force component to change the wafer expansion When the device expands the film, the local tension on the film can reduce the expansion cost and improve the expansion yield.
第1圖繪示本發明較佳實施例中晶圓擴片裝置的俯視示意圖及剖面示意圖,其中第1(a)圖繪示晶圓擴片裝置的俯視示意圖,而第1(b)-1(c)圖繪示晶圓擴片裝置的剖面示意圖。如第1圖所示,一晶圓擴片裝置100包含一晶圓擴片鐵圈110、一承載座120、一晶圓擴張組件130以及一固定機構140。晶圓擴片鐵圈110可包含一膠膜112及一外框114。膠膜112連接於外框114,且膠膜112貼附一晶圓10。晶圓10已於前製程中切割晶圓10中各晶片之間的切割道,使晶圓10中的各晶片沿切割道區隔,僅由膠膜112彼此相連。在本實施例中,晶圓10則置於膠膜112上,當拉伸膠膜112時,晶圓10中的各晶片之間的距離增加至膠膜112拉斷後各晶片彼此分離。承載座120則用以承載加工物。Figure 1 is a schematic top view and a schematic cross-sectional view of a wafer expanding device in a preferred embodiment of the present invention. Figure 1(a) shows a schematic top view of the wafer expanding device, and 1(b)-1 (C) The figure shows a schematic cross-sectional view of the wafer expanding device. As shown in FIG. 1, a
晶圓擴張組件130,用以頂推並擴張膠膜112。固定機構140,用以與承載座120同時固定晶圓擴片鐵圈110的外框114。在本實施例中,當晶圓擴張組件130向上移動頂推膠膜112時,則可擴張膠膜112而對晶圓10進行擴片。在其他實施例中固定機構140也可用以當固定晶圓擴片鐵圈110的外框114於承載座120上時下壓晶圓擴片鐵圈110的外框114,以擴張膠膜112而對晶圓10進行擴片。在本實施例中,晶圓擴張組件130設置為包含複數個相同尺寸的頂推滾輪132。頂推滾輪130圍繞晶圓10設置,且頂推滾輪130呈一圓形分佈。在一實施例中,擴片步驟可如第1(b)-1(c)圖所示。首先,如第1(b)圖所示,晶圓擴片鐵圈110平置於承載座120上,且夾置於承載座120以及固定機構140之間。接著,如第1(c)圖所示,晶圓擴張組件130向上移動頂推膠膜112,使膠膜112因晶圓擴張組件130相對向上頂推,而增加膠膜112向外的張力F而擴張膠膜112,如此以進行擴片。The
以下提出一種晶圓擴張組件130的實施態樣,如第2圖所示,繪示本發明較佳實施例中晶圓擴張組件的立體示意圖。在本實施例中,將晶圓擴張組件130設置為包含複數個相同尺寸的頂推滾輪132。各頂推滾輪132突出於一底座134上,使晶圓擴張組件130僅有頂推滾輪132接觸膠膜112,而膠膜112懸空於底座134上方。各頂推滾輪132與晶圓10的中心或者邊緣皆具有相同的距離,如此以對於膠膜112在各局部位置提供相同的張力F,俾能在晶圓10的各局部均勻擴片,以提升製程良率。An implementation aspect of the
隨著新的材料與製程的改進,則需要依照不同晶片或是材料的特性條件,針對指定方向或著指定位置進行擴片張力調整。如使用單一固定的治具,因無法微調後共用需較高的製程花費,而出現局部張力不足或過大的等無法調整的問題。為因應不同晶片尺寸及膠膜種類等變化,以下再提出三種改良的晶圓擴片裝置來全方向的調整張力。With the improvement of new materials and manufacturing processes, it is necessary to adjust the expansion tension in the specified direction or position according to the characteristics of different wafers or materials. If a single fixed jig is used, it will require a higher process cost for sharing after fine-tuning, and there will be problems such as insufficient or excessive local tension that cannot be adjusted. In order to respond to changes in different chip sizes and types of adhesive films, three improved wafer expansion devices are proposed below to adjust the tension in all directions.
第3圖繪示本發明較佳實施例中改良的晶圓擴片裝置的俯視示意圖及剖面示意圖,其中第3(a)圖繪示晶圓擴片裝置的俯視示意圖,而第3(b)圖繪示晶圓擴片裝置的剖面示意圖。如第3圖所示,本實施例之一晶圓擴片裝置200與第1圖之晶圓擴片裝置100具有相同的晶圓擴片鐵圈110、承載座120以及固定機構140。本實施例僅將原來的晶圓擴張組件130改良為一晶圓擴張組件230,其中晶圓擴張組件230包含不同尺寸的頂推滾輪,以改變單一點或單一區域的局部張力。在本實施例中,頂推滾輪可包含複數個第一頂推滾輪232a以及複數個第二頂推滾輪232b,且第一頂推滾輪232a的直徑大於第二頂推滾輪232b的直徑。較佳者,第一頂推滾輪232a與第二頂推滾輪232b交錯設置,以提供膠膜112均勻的拉伸張力。更佳者,第一頂推滾輪232a彼此等距。例如,第一頂推滾輪232a以及第二頂推滾輪232b皆與晶圓10中心或邊緣具有相同的距離,且四個第一頂推滾輪232a將此以晶圓10中心為圓心的圓周上等距分為四個部分。Figure 3 shows a schematic top view and a cross-sectional schematic view of the improved wafer expanding device in a preferred embodiment of the present invention. Figure 3(a) shows a schematic top view of the wafer expanding device, and 3(b) The figure shows a schematic cross-sectional view of a wafer expanding device. As shown in FIG. 3, a
第4圖繪示本實施例的晶圓擴張組件230的立體示意圖。晶圓擴張組件230設置為包含四個彼此等距的第一頂推滾輪232a與複數個第二頂推滾輪232b。第一頂推滾輪232a與第二頂推滾輪232b突出於一底座234上,使晶圓擴張組件230僅有第一頂推滾輪232a與第二頂推滾輪232b接觸膠膜112,而膠膜112懸空於底座234上方。第一頂推滾輪232a與第二頂推滾輪232b至晶圓10的中心或者邊緣皆具有相同的距離,但第一頂推滾輪232a的直徑大於第二頂推滾輪232b的直徑,如此以調整對於膠膜112在各局部位置的張力F/F1,其中張力F1大於張力F,俾能在改變晶圓10的局部張力的情形下進行擴片,以符合製程需求,進而提升製程良率。FIG. 4 is a three-dimensional schematic diagram of the
第5圖繪示本發明較佳實施例中晶圓擴片裝置的俯視示意圖及剖面示意圖,其中第5(a)圖繪示晶圓擴片裝置的俯視示意圖,而第5(b)圖繪示晶圓擴片裝置的剖面示意圖。如第5圖所示,本實施例與第1圖之晶圓擴片裝置100具有相同的晶圓擴片鐵圈110、承載座120以及固定機構140。本實施例僅將原來的晶圓擴張組件130改良為一晶圓擴張組件330,其中晶圓擴張組件330包含距晶圓10中心不同距離的頂推滾輪,使張力平均,可解決例如晶圓10偏移機台等問題。在本實施例中,頂推滾輪可包含複數個第一組頂推滾輪332a以及複數個第二組頂推滾輪332b。第一組頂推滾輪332a以及第二組頂推滾輪332b圍繞晶圓10呈一圓形分佈設置。各第一組頂推滾輪332a具晶圓10中心或晶圓10邊緣具有相同距離,各第二組頂推滾輪332b具晶圓10中心或晶圓10邊緣具有相同距離,且第一組頂推滾輪332a距晶圓10中心的距離大於第二組頂推滾輪332b距晶圓10中心的距離。較佳者,第一組頂推滾輪332a與第二組頂推滾輪332b交錯設置,以提供膠膜112均勻的拉伸張力。更佳者,第一組頂推滾輪332a彼此等距。例如,四個第一組頂推滾輪332a將此以晶圓10中心為圓心的圓周上等距分為四個部分。Figure 5 shows a schematic top view and a schematic cross-sectional view of the wafer expanding device in a preferred embodiment of the present invention. Figure 5(a) shows the top schematic view of the wafer expanding device, and Figure 5(b) shows the top view of the wafer expanding device. The cross-sectional schematic diagram of the wafer expanding device is shown. As shown in FIG. 5, the
第6圖繪示本實施例的晶圓擴張組件330的立體示意圖。晶圓擴張組件330設置為包含四個彼此等距的第一組頂推滾輪332a。各第一組頂推滾輪332a與各第二組頂推滾輪332b突出於底座334上,使晶圓擴張組件330僅有第一組頂推滾輪332a與第二組頂推滾輪332b接觸膠膜112,而膠膜112懸空於底座334上方。第一組頂推滾輪332a與第二組頂推滾輪332b皆具有相同尺寸,但第一組頂推滾輪332a距晶圓10中心的距離大於第二組頂推滾輪332b距晶圓10中心的距離,如此以調整對於膠膜112在各局部位置的張力F2/ F,其中第一組頂推滾輪332a施加的張力F2小於第二組頂推滾輪332b施加的張力F,俾能均勻化晶圓10中的張力以進行擴片,而解決例如晶圓10對於機台偏移等製程瑕疵,進而提升製程良率。FIG. 6 is a three-dimensional schematic diagram of the
第7圖繪示本發明較佳實施例中晶圓擴片裝置的俯視示意圖及剖面示意圖,其中第7(a)圖繪示晶圓擴片裝置的俯視示意圖,而第7(b)圖繪示晶圓擴片裝置的剖面示意圖。如第7圖所示,本實施例與第1圖之晶圓擴片裝置100具有相同的晶圓擴片鐵圈110、承載座120、晶圓擴張組件130以及固定機構140。本實施例再設置一施力組件450,用以對膠膜112施力,以改變膠膜112的單點等局部張力。在本實施例中,施力組件450包含複數個下壓滾輪452,局部下壓膠膜112,而使膠膜112產生張力F3。較佳者,下壓滾輪452分別位於晶圓10的相對兩側,以改變相對兩側單點張力。Figure 7 is a schematic top view and a cross-sectional schematic view of the wafer expanding device in a preferred embodiment of the present invention. Figure 7(a) shows the top schematic view of the wafer expanding device, and Figure 7(b) shows the top view of the wafer expanding device. The cross-sectional schematic diagram of the wafer expanding device is shown. As shown in FIG. 7, the
第8圖繪示本實施例的晶圓擴張組件130以及施力組件450的立體示意圖。施力組件450設置於晶圓擴張組件130的頂推滾輪132所分佈的圓形內,以及晶圓擴張組件130的底座134上方但不接觸底座134,以局部對於膠膜112施加張力。施力組件450的下壓滾輪452與膠膜112的接觸面較佳具有平滑表面,以避免破壞膠膜112。FIG. 8 is a three-dimensional schematic diagram of the
本發明之發明精神為安裝其他組件,以施加壓力或拉力等方式,來變更對於膠膜中指定方向或位置的局部擴張張力,而達到提升擴片良率的目的。以上提供三改良的實施例,但不以此三實施例為限,且此些實施例可視製程或裝置需要在同一擴片製程中單獨應用或者同時應用,以改良各種擴片製程中的張力不足、張力過大或者張力不均勻等問題。The inventive spirit of the present invention is to install other components to change the local expansion tension in the specified direction or position in the film by applying pressure or tension, etc., so as to achieve the purpose of improving the expansion yield. Three improved embodiments are provided above, but are not limited to these three embodiments, and these embodiments may be applied separately or simultaneously in the same expansion process depending on the process or device, so as to improve the insufficient tension in various expansion processes. , Excessive tension or uneven tension.
綜上所述,本發明提供一種晶圓擴片裝置,其在同一治具上進行簡易拆裝,以改變一晶圓擴張組件中的部分組件,或者另外加入一施力組件,以改變晶圓擴片裝置進行擴片時對於膠膜的局部張力,俾能減少擴片成本,並提升擴片良率。具體而言,晶圓擴片裝置包含一晶圓擴片鐵圈、一承載座、晶圓擴張組件以及一固定機構。晶圓擴片鐵圈包含一外框及一膠膜,其中膠膜連接於外框,用以貼附一晶圓。承載座承載晶圓擴片鐵圈。晶圓擴張組件用以頂推並擴張膠膜。固定機構用以與承載座同時固定晶圓擴片鐵圈的外框,並當晶圓擴張組件向上頂推膠膜時,擴張膠膜而對晶圓進行擴片。晶圓擴張組件可包含不同尺寸的頂推滾輪或/且包含距晶圓中心不同距離的頂推滾輪;施力組件可位於晶圓擴張組件的頂推滾輪的分佈曲線內及膠膜上方,但本發明不以此為限。 以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。In summary, the present invention provides a wafer expansion device that can be easily disassembled and assembled on the same jig to change some of the components in a wafer expansion assembly, or add a force component to change the wafer The local tension of the film when the expansion device performs expansion can reduce the expansion cost and improve the expansion yield. Specifically, the wafer expansion device includes a wafer expansion iron ring, a carrier, a wafer expansion assembly, and a fixing mechanism. The wafer expanding iron ring includes an outer frame and an adhesive film, wherein the adhesive film is connected to the outer frame for attaching a wafer. The carrier carries the wafer expanding iron ring. The wafer expansion component is used to push and expand the adhesive film. The fixing mechanism is used for fixing the outer frame of the wafer expanding iron ring at the same time as the supporting seat, and when the wafer expanding assembly pushes the adhesive film upward, the adhesive film is expanded to expand the wafer. The wafer expansion assembly can include push rollers of different sizes or/and push rollers with different distances from the center of the wafer; the force application component can be located within the distribution curve of the push roller of the wafer expansion assembly and above the film, but The present invention is not limited to this. The foregoing descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made in accordance with the scope of the patent application of the present invention shall fall within the scope of the present invention.
10:晶圓
100、200:晶圓擴片裝置
110:晶圓擴片鐵圈
112:膠膜
114:外框
120:承載座
130、230、330:晶圓擴張組件
132:頂推滾輪
134、234、334:底座
140:固定機構
232a:第一頂推滾輪
232b:第二頂推滾輪
332a:第一組頂推滾輪
332b:第二組頂推滾輪
450:施力組件
452:下壓滾輪
F、F1、F2、F3:張力10:
第1圖繪示本發明較佳實施例中晶圓擴片裝置的俯視示意圖及剖面示意圖。 第2圖繪示本發明較佳實施例中晶圓擴張組件的立體示意圖。 第3圖繪示本發明較佳實施例中改良的晶圓擴片裝置的俯視示意圖及剖面示意圖。 第4圖繪示本發明較佳實施例中晶圓擴張組件的立體示意圖。 第5圖繪示本發明較佳實施例中改良的晶圓擴片裝置的俯視示意圖及剖面示意圖。 第6圖繪示本發明較佳實施例中晶圓擴張組件的立體示意圖。 第7圖繪示本發明較佳實施例中改良的晶圓擴片裝置的俯視示意圖及剖面示意圖。 第8圖繪示本發明較佳實施例中晶圓擴張組件的立體示意圖。FIG. 1 shows a schematic top view and a schematic cross-sectional view of a wafer expanding device in a preferred embodiment of the present invention. Figure 2 is a perspective view of a wafer expansion assembly in a preferred embodiment of the present invention. FIG. 3 shows a schematic top view and a schematic cross-sectional view of an improved wafer expanding device in a preferred embodiment of the present invention. Figure 4 is a perspective view of a wafer expansion assembly in a preferred embodiment of the present invention. FIG. 5 shows a schematic top view and a schematic cross-sectional view of an improved wafer expanding device in a preferred embodiment of the present invention. FIG. 6 is a three-dimensional schematic diagram of a wafer expansion assembly in a preferred embodiment of the present invention. FIG. 7 shows a schematic top view and a schematic cross-sectional view of an improved wafer expanding device in a preferred embodiment of the present invention. FIG. 8 is a three-dimensional schematic diagram of a wafer expansion assembly in a preferred embodiment of the present invention.
10:晶圓10: Wafer
110:晶圓擴片鐵圈110: Wafer expanding iron ring
112:膠膜112: Film
114:外框114: Outer Frame
120:承載座120: bearing seat
140:固定機構140: fixed mechanism
200:晶圓擴片裝置200: Wafer expanding device
230:晶圓擴張組件230: Wafer expansion module
232a:第一頂推滾輪232a: The first push roller
232b:第二頂推滾輪232b: The second push roller
F、F1:張力F, F1: Tension
Claims (13)
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KR1020190176576A KR20210058606A (en) | 2019-11-12 | 2019-12-27 | Wafer expanding device |
JP2020004031A JP6851517B1 (en) | 2019-11-12 | 2020-01-15 | Wafer expansion device |
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