TW202020227A - Chemical polishing liquid and surface treatment method using same - Google Patents

Chemical polishing liquid and surface treatment method using same Download PDF

Info

Publication number
TW202020227A
TW202020227A TW108131521A TW108131521A TW202020227A TW 202020227 A TW202020227 A TW 202020227A TW 108131521 A TW108131521 A TW 108131521A TW 108131521 A TW108131521 A TW 108131521A TW 202020227 A TW202020227 A TW 202020227A
Authority
TW
Taiwan
Prior art keywords
polishing liquid
chemical polishing
aluminum
surface treatment
mass
Prior art date
Application number
TW108131521A
Other languages
Chinese (zh)
Inventor
黑澤伸也
藤井智子
松永裕嗣
Original Assignee
日商三菱瓦斯化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱瓦斯化學股份有限公司 filed Critical 日商三菱瓦斯化學股份有限公司
Publication of TW202020227A publication Critical patent/TW202020227A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means
    • C23F3/02Light metals
    • C23F3/03Light metals with acidic solutions

Abstract

The present invention provides a chemical polishing liquid which is used for aluminum or an aluminum alloy, and which contains (A) hydrogen peroxide, (B) a fluorine compound, (C) an inorganic acid that is not the fluorine compound (B), and (D) a hydroxyl group-containing hydrocarbon compound. The content of the hydrogen peroxide (A) is 2-20% by mass based on the total amount of the chemical polishing liquid; the content of the fluorine compound (B) in terms of fluorine atoms is 3-17% by mass based on the total amount of the chemical polishing liquid; the content of the inorganic acid (C) is 20-55% by mass based on the total amount of the chemical polishing liquid; and the content of the hydroxyl group-containing hydrocarbon compound (D) is 2-15% by mass based on the total amount of the chemical polishing liquid.

Description

化學研磨液及使用此化學研磨液之表面處理方法Chemical polishing liquid and surface treatment method using the chemical polishing liquid

本發明關於化學研磨液、及使用此化學研磨液之鋁或鋁合金之表面處理方法。The invention relates to a chemical polishing liquid and a surface treatment method of aluminum or aluminum alloy using the chemical polishing liquid.

傳統上,就用以使鋁、或其合金之表面平滑化同時賦予其光澤之化學研磨液而言,一般係使用摻合有磷酸與硝酸者。然而,使用如此之含有硝酸之化學研磨液時,在化學研磨之過程中有時會有因硝酸分解而產生有毒之氮氧化物之情況,此外,因硝酸分解時的放熱,化學研磨液之溫度會成為約90~100℃之高溫。 因此,例如,對固定在聚酯素材之布料之鋁製之緊固件之金屬配件使用含有硝酸之化學研磨液時,會有因上述之放熱而導致聚酯素材變質,布料變色之情況。 為了改善如此之問題,例如專利文獻1揭示一種化學研磨液,其摻合有特定量之鎢化合物。 [先前技術文獻] [專利文獻]Conventionally, as for the chemical polishing liquid for smoothing the surface of aluminum or its alloy while giving gloss, it is common to use a mixture of phosphoric acid and nitric acid. However, when using such a chemical polishing liquid containing nitric acid, there may be cases where toxic nitrogen oxides are generated due to the decomposition of nitric acid during the chemical polishing. In addition, the temperature of the chemical polishing liquid due to the exothermic heat during the decomposition of nitric acid Will become a high temperature of about 90 ~ 100 ℃. Therefore, for example, when using a chemical polishing solution containing nitric acid for the metal fittings of aluminum fasteners fixed to the fabric of the polyester material, the polyester material may be deteriorated due to the above heat and the fabric may be discolored. In order to improve such a problem, for example, Patent Document 1 discloses a chemical polishing liquid in which a specific amount of tungsten compound is blended. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特許第3629218號公報[Patent Document 1] Japanese Patent No. 3629218

[發明所欲解決之課題][Problems to be solved by the invention]

專利文獻1揭示之化學研磨液含有鎢化合物,故成本高,在經濟面上仍有改善之餘地。此外,需求更適用於鋁或鋁之合金之表面處理之化學研磨液。 [解決課題之手段]The chemical polishing liquid disclosed in Patent Document 1 contains a tungsten compound, so the cost is high, and there is still room for improvement in economic terms. In addition, the demand is more suitable for chemical polishing liquids for surface treatment of aluminum or aluminum alloys. [Means to solve the problem]

本發明人等進行深入研究後之結果發現:含有過氧化氫、氟化合物、不屬於氟化合物之無機酸、及含羥基之烴化合物之化學研磨液可解決上述課題。 亦即,本發明提供下述[1]~[12]。 [1]一種化學研磨液,係用於鋁或鋁合金; 含有過氧化氫(A)、氟化合物(B)、不屬於該氟化合物(B)之無機酸(C)、及含羥基之烴化合物(D); 以該化學研磨液之總量為基準計,該過氧化氫(A)之含量為2~20質量%; 以該化學研磨液之總量為基準計,該氟化合物(B)之以氟原子換算計之含量為3~17質量%; 以該化學研磨液之總量為基準計,該無機酸(C)之含量為20~55質量%; 以該化學研磨液之總量為基準計,該含羥基之烴化合物(D)之含量為2~15質量% [2]如上述[1]之化學研磨液,該化學研磨液之pH係4以下。 [3]如[1]或[2]之化學研磨液,其中,該氟化合物(B)係選自由酸性氟化銨、酸性氟化鉀、氟化銨、及氟化氫構成之群組中之1種以上。 [4]如[1]至[3]中任一項之化學研磨液,其中,該無機酸(C)包含磷酸。 [5]如[1]至[4]中任一項之化學研磨液,其中,該含羥基之烴化合物(D)係選自由碳數2以上之一元醇、多元醇、及二醇醚化合物構成之群組中之1種以上。 [6]如[1]至[5]中任一項之化學研磨液,其中,該無機酸(C)與該含羥基之烴化合物(D)之含量比[(C)/(D)],以質量比計為2~25。 [7]一種鋁或鋁合金之表面處理方法,係使用如[1]至[6]中任一項之化學研磨液進行鋁或鋁合金之表面處理。 [8]如[7]之鋁或鋁合金之表面處理方法,其中,在進行鋁或鋁合金之表面處理時之該化學研磨液之溫度為40~80℃。 [9]如[7]或[8]之鋁或鋁合金之表面處理方法,其中,進行鋁或鋁合金之表面處理之時間為1秒以上且10分鐘以下。 [10]一種經表面處理之鋁或鋁合金之製造方法,包括以下步驟: 使用如[1]至[6]中任一項之化學研磨液進行鋁或鋁合金之表面處理。 [11]一種經表面處理之鋁或鋁合金,係使用如[1]至[6]中任一項之化學研磨液,對表面處理前之依據ISO 25178測得之算術平均高度(Sa)為150~250nm的鋁或JIS H4140所記載之鋁合金進行表面處理,表面處理後之該鋁或鋁合金之算術平均高度(Sa)為200nm以下,且表面處理後之該算術平均高度係表面處理前之算術平均高度(Sa)以下。 [12]一種經表面處理之鋁或鋁合金,係使用如[1]至[6]中任一項之化學研磨液,對表面處理前之依據ISO 2813測得之光澤度為200~350的鋁或JIS H4140所記載之鋁合金進行表面處理,表面處理後之該鋁或鋁合金之光澤度為150以上,且表面處理後之該光澤度係表面處理前之光澤度以上。 [發明之效果]The inventors conducted intensive studies and found that chemical polishing liquids containing hydrogen peroxide, fluorine compounds, inorganic acids that are not fluorine compounds, and hydroxyl-containing hydrocarbon compounds can solve the above-mentioned problems. That is, the present invention provides the following [1] to [12]. [1] A chemical polishing liquid used for aluminum or aluminum alloy; Contains hydrogen peroxide (A), fluorine compound (B), inorganic acid (C) which is not the fluorine compound (B), and hydrocarbon compound (D) containing hydroxyl group; Based on the total amount of the chemical polishing liquid, the content of the hydrogen peroxide (A) is 2-20% by mass; Based on the total amount of the chemical polishing liquid, the content of the fluorine compound (B) in terms of fluorine atoms is 3 to 17% by mass; Based on the total amount of the chemical polishing liquid, the content of the inorganic acid (C) is 20 to 55% by mass; Based on the total amount of the chemical polishing liquid, the content of the hydroxyl-containing hydrocarbon compound (D) is 2 to 15% by mass [2] The chemical polishing liquid as described in [1] above, the pH of the chemical polishing liquid is 4 or less. [3] The chemical polishing liquid according to [1] or [2], wherein the fluorine compound (B) is selected from the group consisting of acidic ammonium fluoride, acidic potassium fluoride, ammonium fluoride, and hydrogen fluoride More than one species. [4] The chemical polishing liquid according to any one of [1] to [3], wherein the inorganic acid (C) contains phosphoric acid. [5] The chemical polishing liquid according to any one of [1] to [4], wherein the hydroxyl group-containing hydrocarbon compound (D) is selected from monovalent alcohols having a carbon number of 2 or more, polyhydric alcohols, and glycol ether compounds One or more of the groups formed. [6] The chemical polishing liquid according to any one of [1] to [5], wherein the content ratio of the inorganic acid (C) to the hydroxyl-containing hydrocarbon compound (D) [(C)/(D)] , In terms of mass ratio is 2~25. [7] A surface treatment method of aluminum or aluminum alloy, which uses the chemical polishing liquid as described in any one of [1] to [6] to perform the surface treatment of aluminum or aluminum alloy. [8] The surface treatment method of aluminum or aluminum alloy according to [7], wherein the temperature of the chemical polishing liquid during the surface treatment of aluminum or aluminum alloy is 40 to 80°C. [9] The aluminum or aluminum alloy surface treatment method according to [7] or [8], wherein the time for performing the aluminum or aluminum alloy surface treatment is 1 second or more and 10 minutes or less. [10] A manufacturing method of surface-treated aluminum or aluminum alloy, including the following steps: The surface treatment of aluminum or aluminum alloy is performed using the chemical polishing liquid as described in any one of [1] to [6]. [11] A surface-treated aluminum or aluminum alloy using the chemical polishing liquid as described in any one of [1] to [6], the arithmetic mean height (Sa) measured according to ISO 25178 before the surface treatment is 150-250nm aluminum or aluminum alloy described in JIS H4140 is surface-treated, the arithmetic average height (Sa) of the aluminum or aluminum alloy after surface treatment is 200nm or less, and the arithmetic average height after surface treatment is before surface treatment The arithmetic mean height (Sa) is below. [12] A surface-treated aluminum or aluminum alloy, using a chemical polishing liquid as described in any one of [1] to [6], before the surface treatment, the gloss measured according to ISO 2813 is 200 to 350 Aluminum or the aluminum alloy described in JIS H4140 is subjected to surface treatment. The gloss of the aluminum or aluminum alloy after surface treatment is 150 or more, and the gloss after surface treatment is more than the gloss before surface treatment. [Effect of invention]

使用本發明之理想之一態樣之化學研磨液,進行鋁或鋁合金之表面處理時,可研磨鋁等之表面而使其平滑化,同時賦予優異之光澤。此外,本發明之理想之一態樣之化學研磨液,在作業安全性亦優異。When the surface of aluminum or aluminum alloy is treated with the chemical polishing liquid which is an ideal aspect of the present invention, the surface of aluminum or the like can be polished and smoothed, while giving excellent gloss. In addition, the ideal chemical polishing liquid of the present invention is excellent in operation safety.

[化學研磨液] 本發明之化學研磨液係用於鋁或鋁合金(本說明書中亦統稱為「鋁等」)之化學研磨液,含有過氧化氫(A)、氟化合物(B)、不屬於氟化合物(B)之無機酸(C)、及含羥基之烴化合物(D)(以下,本說明書中,亦將過氧化氫(A)、氟化合物(B)、不屬於氟化合物(B)之無機酸(C)、含羥基之烴化合物(D)各別稱為成分(A)、成分(B)、成分(C)、成分(D))。 據認為本發明之化學研磨液,在利用過氧化氫(A)使鋁等之表面氧化,並藉由氟化合物(B)作用於已氧化之表面使該表面得到平滑化時,無機酸(C)及含羥基之烴化合物(D)對於改善鋁等之表面之平滑性、賦予優異光澤有所貢獻,同時也抑制表面處理時反應之激烈進行,並改善作業安全性。又,本發明中之作用機制不限於此。[Chemical polishing liquid] The chemical polishing liquid of the present invention is a chemical polishing liquid for aluminum or aluminum alloy (also collectively referred to as "aluminum, etc." in this specification), which contains hydrogen peroxide (A), a fluorine compound (B), and is not a fluorine compound (B ) Inorganic acid (C), and hydroxyl-containing hydrocarbon compound (D) (hereinafter, in this specification, hydrogen peroxide (A), fluorine compound (B), inorganic acid that is not a fluorine compound (B) ( C), the hydroxyl-containing hydrocarbon compound (D) is called component (A), component (B), component (C), component (D)). It is considered that when the chemical polishing liquid of the present invention oxidizes the surface of aluminum or the like with hydrogen peroxide (A), and the fluorine compound (B) acts on the oxidized surface to smooth the surface, the inorganic acid (C ) And the hydroxyl-containing hydrocarbon compound (D) contribute to improving the smoothness of the surface of aluminum and the like and imparting excellent gloss, while also suppressing the violent reaction during surface treatment and improving the safety of work. In addition, the mechanism of action in the present invention is not limited to this.

本發明之一態樣之化學研磨液之pH,理想為4以下,較佳為3.5以下,更佳為3以下,特佳為2.5以下,此外,下限值可適宜地設定,理想為1.1以上。藉由調整為pH係4以下之化學研磨液,在進行鋁或鋁合金之表面處理(以下,本說明書中亦稱為「研磨」)時,鋁會溶解成鋁離子,並促進對該等表面之表面處理,更進一步改善研磨後之表面之平滑性。 又,本說明書中,化學研磨液之pH意旨依據JIS Z8802,在25℃之條件測定之值。The pH of the chemical polishing liquid according to one aspect of the present invention is preferably 4 or less, preferably 3.5 or less, more preferably 3 or less, particularly preferably 2.5 or less, and the lower limit can be set appropriately, and is preferably 1.1 or more . By adjusting the chemical polishing liquid to a pH of 4 or less, when performing surface treatment of aluminum or aluminum alloy (hereinafter, also referred to as "polishing" in this specification), aluminum will dissolve into aluminum ions and promote the treatment of these surfaces The surface treatment further improves the smoothness of the polished surface. In addition, in this specification, the pH of the chemical polishing liquid means a value measured under the condition of 25°C according to JIS Z8802.

本發明之一態樣之化學研磨液亦可更含有水、或有機溶劑(排除屬於成分(D)者)等稀釋溶劑。 此外,本發明之一態樣之化學研磨液,只要在不損及本發明之效果之範圍內,亦可含有成分(A)~(D)以外之有效成分。又,本說明書中,「有效成分」意旨排除化學研磨液中之水等稀釋溶劑之成分。The chemical polishing liquid according to one aspect of the present invention may further contain a dilution solvent such as water or an organic solvent (excluding those belonging to component (D)). In addition, the chemical polishing liquid according to one aspect of the present invention may contain active ingredients other than the components (A) to (D) as long as the effects of the present invention are not impaired. In addition, in this specification, "effective ingredient" is meant to exclude the components of the dilution solvent such as water in the chemical polishing liquid.

本發明之一態樣之化學研磨液中,就有效成分之含量(有效成分濃度)而言,以該化學研磨液之總量(100質量%)為基準,理想為20~95質量%,較佳為35~85質量%,更佳為45~80質量%,進一步更佳為47~77質量%,特佳為50~75質量%。In the chemical polishing liquid according to one aspect of the present invention, in terms of the content of the active ingredient (effective component concentration), based on the total amount of the chemical polishing liquid (100% by mass), it is ideally 20 to 95% by mass, which is It is preferably 35 to 85% by mass, more preferably 45 to 80% by mass, further preferably 47 to 77% by mass, and particularly preferably 50 to 75% by mass.

本發明之一態樣之化學研磨液中,以該化學研磨液中之有效成分之總量(100質量%)為基準,成分(A)、(B)、(C)、及(D)之合計含量理想為60~100質量%,較佳為70~100質量%,更佳為80~100質量%,特佳為90~100質量%。In one aspect of the chemical polishing liquid of the present invention, based on the total amount of active ingredients (100% by mass) in the chemical polishing liquid, the components (A), (B), (C), and (D) The total content is desirably 60 to 100% by mass, preferably 70 to 100% by mass, more preferably 80 to 100% by mass, and particularly preferably 90 to 100% by mass.

以下,針對各成分進行說明。 >過氧化氫(A):成分(A)> 以該化學研磨液之總量(100質量%)為基準計,本發明之化學研磨液含有2~20質量%之過氧化氫(A)。 若過氧化氫(A)之含量未滿2質量%,容易導致表面處理對象物即鋁等之表面之氧化不充分,難以形成平滑之表面。另一方面,若過氧化氫(A)之含量超過20質量%,則鋁等之表面會過度氧化,不易形成平滑之表面。Hereinafter, each component will be described. >Hydrogen peroxide (A): Composition (A)> Based on the total amount of the chemical polishing liquid (100% by mass), the chemical polishing liquid of the present invention contains 2 to 20% by mass of hydrogen peroxide (A). If the content of hydrogen peroxide (A) is less than 2% by mass, it is easy to cause insufficient oxidation of the surface of the surface treatment object, that is, aluminum, and it is difficult to form a smooth surface. On the other hand, if the content of hydrogen peroxide (A) exceeds 20% by mass, the surface of aluminum or the like will be excessively oxidized, making it difficult to form a smooth surface.

依據上述觀點,本發明之一態樣之化學研磨液中,以化學研磨液之總量(100質量%)為基準計,過氧化氫(A)之含量理想為3~18質量%,較佳為4~16質量%,更佳為4~15質量%,特佳為5~15質量%,亦可為5~12質量%。Based on the above point of view, in the chemical polishing liquid of one aspect of the present invention, based on the total amount of chemical polishing liquid (100% by mass), the content of hydrogen peroxide (A) is preferably 3 to 18% by mass, preferably It is 4 to 16% by mass, more preferably 4 to 15% by mass, particularly preferably 5 to 15% by mass, or 5 to 12% by mass.

又,本發明之一態樣中,過氧化氫(A)亦可為水溶液之形態即雙氧水之形式與其他成分摻合,進而調製出化學研磨液。此時,化學研磨液中之雙氧水之摻合量係以過氧化氫(A)之含量落入上述範圍內的方式來考量雙氧水之濃度並進行調整。Furthermore, in one aspect of the present invention, hydrogen peroxide (A) may be mixed with other components in the form of an aqueous solution, that is, in the form of hydrogen peroxide, to further prepare a chemical polishing liquid. At this time, the blending amount of hydrogen peroxide in the chemical polishing liquid is to consider and adjust the hydrogen peroxide concentration in such a manner that the content of hydrogen peroxide (A) falls within the above range.

>氟化合物(B):成分(B)> 以該化學研磨液之總量(100質量%)為基準計,本發明之化學研磨液含有以氟原子換算計為3~17質量%之氟化合物(B)。 若氟化合物(B)之以氟原子換算計之含量未滿3質量%,容易導致經過氧化氫(A)氧化之鋁等之表面之平滑化不充分。並且,也容易導致賦予鋁等之表面之光澤不充分。另一方面,若氟化合物(B)之以氟原子換算計之含量超過17質量%,則對所得之化學研磨液之排水處理之負荷有增大之傾向。>Fluorine compound (B): Ingredient (B)> Based on the total amount (100% by mass) of the chemical polishing liquid, the chemical polishing liquid of the present invention contains 3 to 17% by mass of fluorine compound (B) in terms of fluorine atoms. If the content of the fluorine compound (B) in terms of fluorine atoms is less than 3% by mass, it is easy to cause insufficient smoothing of the surface of aluminum or the like oxidized by hydrogen oxide (A). In addition, the gloss imparted to the surface of aluminum or the like may be insufficient. On the other hand, if the content of the fluorine compound (B) in terms of fluorine atoms exceeds 17% by mass, the load on the drainage treatment of the obtained chemical polishing liquid tends to increase.

依據上述觀點,本發明之一態樣之化學研磨液中,以該化學研磨液之總量(100質量%)為基準計,氟化合物(B)之以氟原子換算計之含量,理想為5~15質量%,較佳為7~13質量%,更佳為8~12質量%,進一步更佳為8~11質量%,特佳為8~10質量%。 又,成分(B)之以氟原子換算計之含量,可將成分(B)之實際摻合量乘以成分(B)中之氟原子之含量分率而算出。From the above viewpoint, in the chemical polishing liquid of one aspect of the present invention, based on the total amount (100% by mass) of the chemical polishing liquid, the content of the fluorine compound (B) in terms of fluorine atoms is preferably 5 ~15% by mass, preferably 7-13% by mass, more preferably 8-12% by mass, even more preferably 8-11% by mass, and particularly preferably 8-10% by mass. In addition, the content of the component (B) in terms of fluorine atoms can be calculated by multiplying the actual blending amount of the component (B) by the content fraction of the fluorine atoms in the component (B).

本發明之一態樣之化學研磨液中,氟化合物(B)之含量只要以氟原子換算計之含量落在上述範圍內的方式適當地設定即可,例如,以該化學研磨液之總量(100質量%)為基準計,理想為5~25質量%,較佳為8~22質量%,更佳為10~20質量%,進一步更佳為12~18質量%,特佳為12~15質量%。In the chemical polishing liquid according to one aspect of the present invention, the content of the fluorine compound (B) may be appropriately set so that the content in terms of fluorine atoms falls within the above range, for example, the total amount of the chemical polishing liquid (100% by mass) as a standard, ideally 5-25% by mass, preferably 8-22% by mass, more preferably 10-20% by mass, even more preferably 12-18% by mass, particularly preferably 12~ 15% by mass.

就氟化合物(B)而言,只要係含有氟原子之化合物即可,可列舉例如:氟化銨、酸性氟化銨、氟化鈰、四氟化矽、氟化矽酸(六氟矽酸等)、氟化氮(三氟化氮等)、氟化磷(三氟化磷、五氟化磷等)、偏二氟乙烯、三氟化硼、氟硼酸(四氟硼酸等)、氟硼酸銨、單乙醇胺氟化氫鹽、甲基胺氟化氫鹽、乙基胺氟化氫鹽、丙基胺氟化氫鹽、四甲基氟化銨、四乙基氟化銨、三乙基甲基氟化銨、三甲基羥基乙基氟化銨、四乙氧基氟化銨、甲基三乙氧基氟化銨、氟化氫等非金屬氟化合物;氟化鋰、氟化鈉、酸性氟化鈉、氟化鉀、酸性氟化鉀、氟化矽酸鉀、六氟磷酸鉀、氟化鎂、氟化鈣、氟化鍶、氟化鋇、氟化鋅、氟化鋁、氟化亞錫、氟化鉛、三氟化銻等金屬氟化合物;等。 這些氟化合物(B)可單獨使用,亦可將2種以上併用。 又,本說明書中,氟化氫等含氟無機酸係分類為成分(B)。The fluorine compound (B) may be any compound containing a fluorine atom, and examples include ammonium fluoride, acidic ammonium fluoride, cerium fluoride, silicon tetrafluoride, and fluorinated silicic acid (hexafluorosilicic acid Etc.), nitrogen fluoride (nitrogen trifluoride, etc.), phosphorus fluoride (phosphorus trifluoride, phosphorus pentafluoride, etc.), vinylidene fluoride, boron trifluoride, fluoroboric acid (tetrafluoroboric acid, etc.), fluorine Ammonium borate, monoethanolamine hydrogen fluoride, methylamine hydrogen fluoride, ethylamine hydrogen fluoride, propylamine hydrogen fluoride, tetramethylammonium fluoride, tetraethylammonium fluoride, triethylmethylammonium fluoride, tris Non-metallic fluorine compounds such as methylhydroxyethylammonium fluoride, tetraethoxyammonium fluoride, methyltriethoxyammonium fluoride, hydrogen fluoride; lithium fluoride, sodium fluoride, acidic sodium fluoride, potassium fluoride , Acidic potassium fluoride, potassium fluoride silicate, potassium hexafluorophosphate, magnesium fluoride, calcium fluoride, strontium fluoride, barium fluoride, zinc fluoride, aluminum fluoride, stannous fluoride, lead fluoride, Metal fluoride compounds such as antimony trifluoride; etc. These fluorine compounds (B) may be used alone or in combination of two or more. In this specification, fluorine-containing inorganic acids such as hydrogen fluoride are classified as component (B).

這些之中,用於本發明之一態樣之氟化合物(B)理想為氟化物。又,本說明書中,「氟化物」意旨氟原子可成為陰離子(F- )之狀態之化合物,更具體而言,意旨摻合後成為化學研磨液時,會溶解並在化學研磨液中產生氟離子(F- )之化合物。 就如此之氟化物而言,可列舉例如:氟化銨、酸性氟化銨、氟化鈰、氟化矽酸(六氟矽酸)、氟化磷(三氟化磷、五氟化磷)、氟硼酸(四氟硼酸)、氟硼酸銨、單乙醇胺氟化氫鹽、甲基胺氟化氫鹽、乙基胺氟化氫鹽、丙基胺氟化氫鹽、四甲基氟化銨、四乙基氟化銨、三乙基甲基氟化銨、三甲基羥基乙基氟化銨、四乙氧基氟化銨、甲基三乙氧基氟化銨、氟化氫、氟化鋰、氟化鈉、酸性氟化鈉、氟化鉀、酸性氟化鉀、氟化矽酸鉀、六氟磷酸鉀等。Among these, the fluorine compound (B) used in one aspect of the present invention is preferably a fluoride. Furthermore, the present specification, "fluoride" can be a fluorine atom intention anion (F -) state of the compound, and more specifically, when the intention to become blended chemical polishing solution, dissolved and produce fluorine in the chemical polishing solution ion (F -) of the compound. Examples of such fluorides include ammonium fluoride, acidic ammonium fluoride, cerium fluoride, fluorinated silicic acid (hexafluorosilicic acid), and phosphorus fluoride (phosphorus trifluoride, phosphorus pentafluoride) , Fluoroboric acid (tetrafluoroborate), ammonium fluoroborate, monoethanolamine hydrogen fluoride, methylamine hydrogen fluoride, ethylamine hydrogen fluoride, propylamine hydrogen fluoride, tetramethylammonium fluoride, tetraethylammonium fluoride, Triethylmethylammonium fluoride, trimethylhydroxyethylammonium fluoride, tetraethoxyammonium fluoride, methyltriethoxyammonium fluoride, hydrogen fluoride, lithium fluoride, sodium fluoride, acid fluoride Sodium, potassium fluoride, acidic potassium fluoride, potassium fluoride silicate, potassium hexafluorophosphate, etc.

就本發明之一態樣所使用之氟化合物(B)而言,理想為氟化物,氟化物之中較佳為以選自由酸性氟化銨、酸性氟化鉀、氟化銨、及氟化氫構成之群組中之1種以上,特佳為酸性氟化銨。The fluorine compound (B) used in one aspect of the present invention is preferably a fluoride, and the fluoride is preferably selected from the group consisting of acidic ammonium fluoride, acidic potassium fluoride, ammonium fluoride, and hydrogen fluoride More than one species in the group, particularly preferred is acidic ammonium fluoride.

>無機酸(C):成分(C)> 以該化學研磨液之總量(100質量%)為基準計,本發明之化學研磨液含有20~55質量%之不屬於氟化合物(B)之無機酸(C)。 無機酸(C)之含量未滿20質量%、或超過55質量%之化學研磨液,容易發生鋁等之表面之平滑性降低之情形、或難以賦予所期望之光澤等不良影響。此外,如此之化學研磨液,由於鋁等之反應容易激烈地進行,導致也會有作業安全性劣化、研磨後之表面容易粗糙等不良影響。>Inorganic acid (C): composition (C)> Based on the total amount of the chemical polishing liquid (100% by mass), the chemical polishing liquid of the present invention contains 20 to 55% by mass of inorganic acid (C) that is not a fluorine compound (B). Chemical polishing liquids with an inorganic acid (C) content of less than 20% by mass or more than 55% by mass are likely to cause a decrease in the smoothness of the surface of aluminum or the like, or it is difficult to impart the desired gloss and other adverse effects. In addition, such a chemical polishing liquid tends to violently react with aluminum and the like, which may cause adverse effects such as deterioration in work safety and roughness of the surface after polishing.

依據上述觀點,本發明之一態樣之化學研磨液中,以該化學研磨液之總量(100質量%)為基準計,無機酸(C)之含量理想為20~50質量%,較佳為22~45質量%,更佳為25~45質量%,特佳為30~45質量%,亦可為35~40質量%。Based on the above point of view, in the chemical polishing liquid of one aspect of the present invention, based on the total amount of the chemical polishing liquid (100% by mass), the content of the inorganic acid (C) is preferably 20-50% by mass, preferably It is 22 to 45% by mass, more preferably 25 to 45% by mass, particularly preferably 30 to 45% by mass, or 35 to 40% by mass.

就本發明之一態樣所使用之無機酸(C)而言,可列舉例如選自由磷酸、硫酸、鹽酸、及硝酸構成之群組中之1種以上,考慮到製成可改善鋁等之表面之平滑性,並賦予優異光澤之化學研磨液之觀點,理想為含有磷酸。 就本發明之一態樣所使用之無機酸(C)中之磷酸之含有比例而言,以無機酸(C)之總量(100質量%)為基準計,理想為70~100質量%,較佳為80~100質量%,更佳為90~100質量%,進一步更佳為95~100質量%,特佳為100質量%。Examples of the inorganic acid (C) used in one aspect of the present invention include one or more selected from the group consisting of phosphoric acid, sulfuric acid, hydrochloric acid, and nitric acid. From the viewpoint of the smoothness of the surface and the chemical polishing liquid that imparts excellent gloss, it is desirable to contain phosphoric acid. The content of phosphoric acid in the inorganic acid (C) used in one aspect of the present invention is preferably 70 to 100% by mass based on the total amount of inorganic acid (C) (100% by mass). It is preferably 80 to 100% by mass, more preferably 90 to 100% by mass, even more preferably 95 to 100% by mass, and particularly preferably 100% by mass.

又,含有硝酸之化學研磨液,會有在鋁等之表面處理之過程中硝酸分解並產生有毒之氮氧化物之環境面上之問題。此外,由於硝酸分解時會放熱,故例如對固定在聚酯素材之布料之鋁製之緊固件之金屬配件使用含有硝酸之化學研磨液時,會有因放熱而導致聚酯素材變質,布料變色之情形。 考慮到抑制如此之不良影響之觀點,本發明之一態樣之化學研磨液中,硝酸之含量越少越好。 就本發明之一態樣所使用之無機酸(C)中之硝酸之含有比例而言,以無機酸(C)之總量(100質量%)為基準計,理想為0~10質量%,較佳為0~5質量%,更佳為0~1質量%,特佳為0質量%。In addition, the chemical polishing liquid containing nitric acid has a problem in the environmental surface where nitric acid decomposes during the surface treatment of aluminum and the like and produces toxic nitrogen oxides. In addition, since nitric acid decomposes, it will release heat, so for example, when using chemical polishing liquid containing nitric acid on metal parts of aluminum fasteners fixed on polyester material fabric, the polyester material will be deteriorated due to heat release, and the fabric will be discolored Situation. In view of suppressing such adverse effects, in the chemical polishing liquid according to one aspect of the present invention, the smaller the content of nitric acid, the better. In terms of the content of nitric acid in the inorganic acid (C) used in one aspect of the present invention, based on the total amount of inorganic acid (C) (100% by mass), it is ideally 0 to 10% by mass. It is preferably 0 to 5% by mass, more preferably 0 to 1% by mass, and particularly preferably 0% by mass.

>含羥基之烴化合物(D):成分(D)> 以該化學研磨液之總量(100質量%)為基準,本發明之化學研磨液含有2~15質量%之含羥基之烴化合物(D)。 含羥基之烴化合物(D)之含量未滿2質量%、或超過15質量%之化學研磨液,容易會有研磨後之鋁等之表面之平滑性降低之情形、難以賦予所期望之光澤等不良影響。此外,如此之化學研磨液,由於鋁等之反應容易激烈地進行,故也容易有作業安全性劣化,研磨後之表面容易粗糙等不良影響。>Hydroxy-containing hydrocarbon compound (D): component (D)> Based on the total amount of the chemical polishing liquid (100% by mass), the chemical polishing liquid of the present invention contains 2 to 15% by mass of the hydroxyl-containing hydrocarbon compound (D). If the content of the hydroxyl-containing hydrocarbon compound (D) is less than 2% by mass or more than 15% by mass, the chemical polishing liquid is likely to reduce the smoothness of the surface of aluminum after polishing, and it is difficult to give the desired gloss, etc. Adverse effects. In addition, in such a chemical polishing liquid, since the reaction of aluminum or the like easily progresses violently, the work safety is also likely to be deteriorated, and the surface after polishing is likely to be adversely affected.

依據上述觀點,本發明之一態樣之化學研磨液中,以該化學研磨液之總量(100質量%)為基準,含羥基之烴化合物(D)之含量理想為3~12質量%,較佳為4~10質量%,特佳為5~8質量%。Based on the above point of view, in the chemical polishing liquid of one aspect of the present invention, based on the total amount of the chemical polishing liquid (100% by mass), the content of the hydroxyl-containing hydrocarbon compound (D) is preferably 3 to 12% by mass. It is preferably 4 to 10% by mass, and particularly preferably 5 to 8% by mass.

本發明之一態樣之化學研磨液中,成分(C)與成分(D)之含量比[(C)/(D)],以質量比計,理想為2~25,較佳為2.5~20,更佳為3~20,進一步更佳為3~16,特佳為3.5~12,亦可為4~12,且亦可為5~12。 只要該含量比為2以上,即可成為能改善研磨後之鋁等之表面之平滑性,並賦予優異光澤之化學研磨液。另一方面,只要該含量比為25以下,即可成為維持這些良好之特性,同時作業安定性優異之化學研磨液。In the chemical polishing liquid according to one aspect of the present invention, the content ratio of component (C) to component (D) [(C)/(D)], based on the mass ratio, is preferably 2 to 25, preferably 2.5 to 20, more preferably 3-20, even more preferably 3-16, particularly preferably 3.5-12, 4-12, and 5-12. As long as the content ratio is 2 or more, it can become a chemical polishing liquid that can improve the smoothness of the surface of aluminum and the like after polishing and impart excellent gloss. On the other hand, as long as the content ratio is 25 or less, it becomes a chemical polishing liquid that maintains these good characteristics and has excellent work stability.

本發明之一態樣所使用之含羥基之烴化合物(D),只要係在由碳原子與氧原子構成之烴之主鏈及/或側鏈上包含至少1個羥基之化合物即可,考慮到製成可改善研磨後之鋁等之表面之平滑性,並賦予優異光澤之化學研磨液、及製成作業安全性優異之化學研磨液之觀點,理想為選自由碳數為2以上之一元醇、多元醇、及二醇醚化合物構成之群組中1種以上。The hydroxyl-containing hydrocarbon compound (D) used in one aspect of the present invention may be a compound containing at least one hydroxyl group in the main chain and/or side chain of a hydrocarbon composed of carbon atoms and oxygen atoms. From the viewpoint of making a chemical polishing liquid that improves the surface smoothness of polished aluminum and the like, imparts excellent gloss, and makes a chemical polishing liquid with excellent work safety, it is preferably selected from the group consisting of a carbon number of 2 or more One or more of the group consisting of alcohol, polyol, and glycol ether compound.

此外,依據上述相同之觀點,含羥基之烴化合物(D)理想為具醇性羥基之化合物。 又,本說明書中,「醇性羥基」意旨與構成鏈烴結構或脂環族烴結構之碳原子直接鍵結之羥基,係與芳香環之碳原子直接鍵結之羥基即「苯酚性羥基」以外之羥基。 因此,含羥基之烴化合物(D)理想為不具苯酚性羥基。In addition, from the same viewpoint as described above, the hydroxyl-containing hydrocarbon compound (D) is preferably a compound having an alcoholic hydroxyl group. In addition, in this specification, "alcoholic hydroxyl group" means a hydroxyl group directly bonded to a carbon atom constituting a chain hydrocarbon structure or an alicyclic hydrocarbon structure, and a hydroxyl group directly bonded to a carbon atom of an aromatic ring is "phenolic hydroxyl group" Other than hydroxyl. Therefore, the hydrocarbon compound (D) containing a hydroxyl group is desirably free of phenolic hydroxyl groups.

就碳數為2以上之一元醇而言,可列舉例如:乙醇、正丙醇、異丙醇、正丁醇、2-丁醇、戊醇、己醇、十二烷醇、十八烷醇、苄醇等。 又,就一元醇之碳數而言,理想為2~20,較佳為2~16。Examples of monohydric alcohols having a carbon number of 2 or more include ethanol, n-propanol, isopropanol, n-butanol, 2-butanol, pentanol, hexanol, dodecanol, and stearyl alcohol. , Benzyl alcohol, etc. In addition, the carbon number of the monohydric alcohol is preferably 2-20, preferably 2-16.

就多元醇而言,可列舉例如:乙二醇、二乙二醇、丙二醇、聚乙二醇或聚丙二醇等聚伸烷基二醇、1,3-丙烷二醇、1,2-丁烷二醇、1,3-丁烷二醇、1,4-丁烷二醇、2,3-丁烷二醇、3-甲基-1,3-丁烷二醇、三乙二醇、1,2-戊烷二醇、1,3-戊烷二醇、1,4-戊烷二醇、2,4-戊烷二醇、1,5-戊烷二醇、1,2-己烷二醇、1,6-己烷二醇、1,3-己烷二醇、2,5-己烷二醇、1,5-己烷二醇、2,2,4-三甲基-1,3-戊烷二醇、苯二醇等二元醇;丙三醇、1,2,6-己烷三醇、2-乙基-1,3-己烷三醇、乙基-1,2,4-丁烷三醇、1,2,3-丁烷三醇、3-甲基-1,3,5-戊烷三醇等三元醇;己六醇(sorbitol)等四價以上之醇。Examples of polyols include polyalkylene glycols such as ethylene glycol, diethylene glycol, propylene glycol, polyethylene glycol, and polypropylene glycol, 1,3-propanediol, and 1,2-butane. Glycol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1,3-butanediol, triethylene glycol, 1 ,2-pentanediol, 1,3-pentanediol, 1,4-pentanediol, 2,4-pentanediol, 1,5-pentanediol, 1,2-hexane Glycol, 1,6-hexanediol, 1,3-hexanediol, 2,5-hexanediol, 1,5-hexanediol, 2,2,4-trimethyl-1 , 3-pentanediol, benzenediol and other glycols; glycerin, 1,2,6-hexanetriol, 2-ethyl-1,3-hexanetriol, ethyl-1, Triols such as 2,4-butanetriol, 1,2,3-butanetriol, 3-methyl-1,3,5-pentanetriol; hexavalent alcohol (sorbitol) and other tetravalents Of alcohol.

就聚乙二醇醚化合物而言,可列舉例如:乙二醇單烷基醚(乙二醇單乙基醚、乙二醇單丁基醚等)、乙二醇單苯基醚、乙二醇單苄基醚、二乙二醇單烷基醚(二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單丁基醚等)、三乙二醇單烷基醚(三乙二醇單丁基醚等)、四乙二醇單烷基醚(四乙二醇單甲基醚等)、丙二醇單烷基醚(丙二醇單甲基醚、丙二醇單乙基醚等)、二丙二醇單烷基醚(二丙二醇單甲基醚等)等。Examples of the polyglycol ether compound include ethylene glycol monoalkyl ether (ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, etc.), ethylene glycol monophenyl ether, and ethylene glycol. Alcohol monobenzyl ether, diethylene glycol monoalkyl ether (diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, etc.), triethylene glycol monoalkyl Ether (triethylene glycol monobutyl ether, etc.), tetraethylene glycol monoalkyl ether (tetraethylene glycol monomethyl ether, etc.), propylene glycol monoalkyl ether (propylene glycol monomethyl ether, propylene glycol monoethyl ether) Ether, etc.), dipropylene glycol monoalkyl ether (dipropylene glycol monomethyl ether, etc.), etc.

這些之中,考慮製成可改善研磨後之鋁等之表面之平滑性,並賦予優異光澤之化學研磨液、及製成作業安全性優異之化學研磨液之觀點,含羥基之烴化合物(D)理想為選自由含羥基之脂肪族烴化合物及含羥基之脂環族烴化合物構成之群組中之1種以上。Among these, considering the viewpoint of making a chemical polishing liquid that can improve the smoothness of the surface of aluminum and the like after polishing and imparting excellent gloss, and a chemical polishing liquid with excellent work safety, the hydroxyl-containing hydrocarbon compound (D ) Is desirably one or more kinds selected from the group consisting of a hydroxyl-containing aliphatic hydrocarbon compound and a hydroxyl-containing alicyclic hydrocarbon compound.

本發明之一態樣之化學研磨液中,考慮到製成可改善研磨後之鋁等之表面之平滑性,並賦予優異光澤之化學研磨液、及製成作業安全性優異之化學研磨液之觀點,含羥基之烴化合物(D)理想為選自由二元醇及二醇醚化合物構成之群組中之1種以上,較佳為選自由二元醇及二醇醚化合物構成之群組中之1種以上之脂肪族烴化合物或脂環族烴化合物,更佳為選自由(聚)伸烷基二醇及乙二醇單烷基醚構成之群組中之1種以上,進一步更佳為(聚)伸烷基二醇,特佳為聚乙二醇。 又,本說明書中,標示為「(聚)伸烷基二醇」係用於表示「伸烷基二醇」與「聚伸烷基二醇」兩者之用語。In one aspect of the chemical polishing liquid of the present invention, it is considered that a chemical polishing liquid that can improve the smoothness of the surface of aluminum and the like after polishing and impart excellent gloss, and a chemical polishing liquid that is excellent in production safety In view of this, the hydroxyl group-containing hydrocarbon compound (D) is preferably one or more kinds selected from the group consisting of diols and glycol ether compounds, preferably selected from the group consisting of diols and glycol ether compounds One or more aliphatic hydrocarbon compounds or alicyclic hydrocarbon compounds, more preferably one or more selected from the group consisting of (poly) alkylene glycols and ethylene glycol monoalkyl ethers, still more preferably It is (poly) alkylene glycol, especially preferably polyethylene glycol. In this specification, the term "(poly)alkylene glycol" is used to indicate both "alkylene glycol" and "polyalkylene glycol."

就聚乙二醇、或聚丙二醇等聚伸烷基二醇之數平均分子量(Mn)而言,理想為100~8,000,較佳為200~5,000,更佳為300~3,000,特佳為400~1,500。 又,本說明書中,數平均分子量(Mn)係利用膠體滲透層析(GPC)法測得之經聚苯乙烯標準品換算之值。The number average molecular weight (Mn) of polyalkylene glycols such as polyethylene glycol or polypropylene glycol is preferably 100 to 8,000, preferably 200 to 5,000, more preferably 300 to 3,000, and particularly preferably 400 ~1,500. In addition, in this specification, the number average molecular weight (Mn) is a value converted from a polystyrene standard product measured by a colloidal permeation chromatography (GPC) method.

>稀釋溶劑> 本發明之一態樣之化學研磨液可更含有水、或有機溶劑(排除屬於成分(D)者)等稀釋溶劑。 就稀釋溶劑而言,考慮到成分(A)~(D)之溶解性之觀點,理想為水。 就水而言,無特別限制,理想為利用蒸餾、離子交換處理、過濾處理、各種吸附處理等之處理而去除金屬離子、有機雜質、粒子等之水,較佳為純水,特佳為超純水。 本發明之一態樣之化學研磨液中,以該化學研磨液之總量(100質量%)為基準計,水之含量理想為5~80質量%,較佳為15~65質量%,更佳為20~55質量%,進一步更佳為23~53質量%,特佳為25~50質量%。>Dilution solvent> The chemical polishing liquid according to one aspect of the present invention may further contain water, an organic solvent (excluding those belonging to component (D)), and other diluent solvents. From the viewpoint of the dilution solvent, considering the solubility of the components (A) to (D), it is preferably water. With regard to water, there is no particular limitation, and it is desirable to use distillation, ion exchange treatment, filtration treatment, various adsorption treatments, etc. to remove metal ions, organic impurities, particles, etc., preferably pure water, particularly preferably super Pure water. In one aspect of the chemical polishing liquid of the present invention, based on the total amount of the chemical polishing liquid (100% by mass), the water content is preferably 5 to 80% by mass, preferably 15 to 65% by mass, and more It is preferably 20 to 55% by mass, further preferably 23 to 53% by mass, and particularly preferably 25 to 50% by mass.

>成分(A)~(D)以外之其他有效成分> 在不損及本發明之效果之範圍內,本發明之一態樣之化學研磨液還可更含有成分(A)~(D)以外之其他有效成分。 就其他之有效成分而言,可列舉例如:界面活性劑、過氧化氫穩定劑等。>Other active ingredients except ingredients (A)~(D)> To the extent that the effects of the present invention are not compromised, the chemical polishing liquid according to one aspect of the present invention may further contain other effective ingredients than components (A) to (D). Examples of other active ingredients include surfactants and hydrogen peroxide stabilizers.

惟,本發明之一態樣之化學研磨液中,考慮到製成可賦予鋁等之表面之優異光澤,並形成平滑表面之化學研磨液之觀點,選自由胺基苯酚類及苯甲醯胺類中之胺化合物之含量越少越好。 本說明書中,胺基苯酚類意旨具胺基苯酚骨架之化合物,例如包含胺基苯酚中之至少1個氫被取代成任意之取代基而成的化合物等。此外,苯甲醯胺類也同樣意旨具苯甲醯胺骨架之化合物,例如包含苯甲醯胺中之至少1個氫被取代成任意之取代基而成的化合物等。 依據上述觀點,以該化學研磨液中之成分(A)~(D)之總量100質量份為基準計,就前述胺化合物之含量而言,理想為未滿0.15質量份,較佳為未滿0.10質量份,更佳為未滿0.05質量份,進一步更佳為未滿0.01質量份,特佳為未滿0.001質量份。 此外,以該化學研磨液之總量(100質量%)為基準計,前述胺化合物之含量理想為未滿0.1質量%,較佳為未滿0.01質量%,更佳為未滿0.005質量份,進一步更佳為未滿0.001質量%,特佳為未滿0.0001質量%。However, the chemical polishing liquid of one aspect of the present invention is selected from the group consisting of aminophenols and benzamide in consideration of making a chemical polishing liquid that can impart excellent gloss to surfaces such as aluminum and form a smooth surface. The less the content of amine compounds in the class, the better. In the present specification, aminophenols refer to compounds having an aminophenol skeleton, for example, compounds containing at least one hydrogen in aminophenol substituted with an arbitrary substituent. In addition, benzamides also mean compounds having a benzamide skeleton, for example, compounds containing at least one hydrogen in benzamide being substituted with an arbitrary substituent. Based on the above viewpoint, based on the total amount of 100 parts by mass of the components (A) to (D) in the chemical polishing liquid, the content of the aforementioned amine compound is preferably less than 0.15 parts by mass, preferably not At least 0.10 parts by mass, more preferably less than 0.05 parts by mass, still more preferably less than 0.01 parts by mass, and particularly preferably less than 0.001 parts by mass. In addition, based on the total amount of the chemical polishing liquid (100% by mass), the content of the aforementioned amine compound is desirably less than 0.1% by mass, preferably less than 0.01% by mass, and more preferably less than 0.005 parts by mass, Even more preferably, it is less than 0.001% by mass, and particularly preferably less than 0.0001% by mass.

此外,本發明之一態樣之化學研磨液,考慮到製成可使鋁等之表面平滑之化學研磨液之觀點,唑類之含量也越少越好。 本說明書中,唑類係具有含至少1個氮原子之5員雜環(heterocyclic 5-membered ring)之化合物,可列舉例如:三唑、苯并三唑、四唑、咪唑、苯并咪唑、噻唑等。 依據上述觀點,就前述唑類之含量而言,以該化學研磨液中之成分(A)~(D)之總量100質量份為基準計,理想為未滿1質量份,較佳為未滿0.1質量份,更佳為未滿0.01質量份,特佳為未滿0.001質量份。 此外,前述唑類之含量,以該化學研磨液之總量(100質量%)為基準計,理想為未滿0.1質量%,較佳為未滿0.01質量%,更佳為未滿0.001質量%,特佳為未滿0.0001質量%。In addition, the chemical polishing liquid according to one aspect of the present invention is considered to be a chemical polishing liquid that can smooth the surface of aluminum or the like, and the smaller the content of azoles, the better. In the present specification, azoles are compounds having a 5-cyclic heterocyclic 5-membered ring containing at least one nitrogen atom. Examples include triazole, benzotriazole, tetrazole, imidazole, benzimidazole, Thiazole, etc. From the above viewpoint, regarding the content of the aforementioned azoles, based on the total amount of 100 parts by mass of the components (A) to (D) in the chemical polishing liquid, it is preferably less than 1 part by mass, preferably not At least 0.1 parts by mass, more preferably less than 0.01 parts by mass, particularly preferably less than 0.001 parts by mass. In addition, the content of the aforementioned azoles, based on the total amount of the chemical polishing liquid (100% by mass), is preferably less than 0.1% by mass, preferably less than 0.01% by mass, and more preferably less than 0.001% by mass , Especially good is less than 0.0001% by mass.

本發明之一態樣之化學研磨液理想為溶解液,亦即,理想為實質上不含研磨粒子等固體粒子。 本說明書中,「固體粒子」意旨在化學研磨液中仍不會溶解而存在之粒徑為0.01μm以上之粒子。 並且,「實質上不含固體粒子」意旨排除了以特定目的而在化學研磨液中摻合固體粒子之情形之態樣,其並非連化學研磨液中含無法避免之固體粒子之態樣都排除之規定。惟,即使為含有無法避免之固體粒子之態樣,固體粒子之含量仍盡量越少越好。 就具體之固體粒子之含量而言,以前述化學研磨液之總量(100質量%)為基準計,理想為未滿0.1質量%,較佳為未滿0.01質量%,更佳為未滿0.001質量%,特佳為未滿0.0001質量%。The chemical polishing liquid according to one aspect of the present invention is preferably a dissolving liquid, that is, it is ideally substantially free of solid particles such as polishing particles. In this specification, "solid particles" means particles that have a particle diameter of 0.01 μm or more and do not dissolve in the chemical polishing liquid. In addition, "substantially free of solid particles" is intended to exclude the situation in which solid particles are blended in the chemical polishing liquid for a specific purpose, and it is not even excluded that the chemical polishing liquid contains unavoidable solid particles Regulations. However, even if it contains unavoidable solid particles, the content of solid particles should be as small as possible. As for the specific solid particle content, based on the total amount of the aforementioned chemical polishing liquid (100% by mass), it is preferably less than 0.1% by mass, preferably less than 0.01% by mass, and more preferably less than 0.001 Mass%, particularly preferably less than 0.0001 mass%.

又,本發明之一態樣之化學研磨液,在鋁或鋁合金之表面處理中使用過後,仍可重複使用於表面處理。 因此,本發明之一態樣之化學研磨液中,亦可含有從表面處理對象物即鋁等溶出之金屬原子,且該金屬原子為鋁或鋁合金所含之鋁以外之金屬原子。In addition, the chemical polishing liquid of one aspect of the present invention can be reused for surface treatment after being used in the surface treatment of aluminum or aluminum alloy. Therefore, the chemical polishing liquid according to one aspect of the present invention may contain metal atoms eluted from aluminum or the like, which is a surface treatment object, and the metal atoms are metal atoms other than aluminum contained in aluminum or aluminum alloys.

另一方面,本發明之一態樣之化學研磨液中,含金屬化合物之含量越少越好。此處,含金屬化合物係以特定目的而摻合之含金屬之添加物(例如,鎢化合物),與從表面處理對象物即鋁等溶出之金屬成分存在有區別。 就具體之含金屬化合物之含量而言,以該化學研磨液中之成分(A)~(D)之總量100質量份為基準計,理想為未滿10質量份,較佳為未滿5質量份,更佳為未滿1質量份,特佳為未滿0.1質量份。On the other hand, in the chemical polishing liquid according to one aspect of the present invention, the smaller the content of the metal-containing compound, the better. Here, the metal-containing compound is a metal-containing additive (for example, a tungsten compound) blended for a specific purpose, and there is a difference from the metal component eluted from aluminum or the like which is a surface treatment object. In terms of the specific content of the metal-containing compound, based on the total of 100 parts by mass of the components (A) to (D) in the chemical polishing liquid, it is ideally less than 10 parts by mass, preferably less than 5 The part by mass is more preferably less than 1 part by mass, and particularly preferably less than 0.1 part by mass.

>鋁、鋁合金> 本發明之化學研磨液可理想地使用於鋁或鋁合金之表面處理。 就表面處理對象物即鋁合金而言,可列舉例如:鋁之含量為99質量%以上即純鋁系鋁合金;除了含鋁以外主要含有銅之鋁-銅系鋁合金;除了含鋁以外主要含有錳之鋁-錳系鋁合金;及除了含鋁以外主要含有鎂之鋁-鎂合金。>Aluminum, aluminum alloy> The chemical polishing liquid of the present invention can be ideally used for surface treatment of aluminum or aluminum alloy. As for the aluminum alloy which is a surface treatment object, for example, a pure aluminum-based aluminum alloy having an aluminum content of 99% by mass or more; an aluminum-copper-based aluminum alloy mainly containing copper in addition to aluminum; mainly other than aluminum Aluminum-manganese aluminum alloys containing manganese; and aluminum-magnesium alloys mainly containing magnesium in addition to aluminum.

就更具體之鋁合金而言,可列舉如:JIS H4140所規定之展延用鋁合金即純鋁系之A1100合金、A1085合金、A1050合金;鋁-銅系之A2024合金;鋁-錳系之A3003合金;鋁-鎂系之A5052合金;等之A1000系列~7000系列(耐腐蝕鋁合金、高強度鋁合金、耐熱鋁合金等)之全部之合金、及ADC1~12種(壓鑄用鋁合金)等之鑄造用鋁合金。As for the more specific aluminum alloys, for example, the aluminum alloys for extensions specified in JIS H4140 are pure aluminum-based A1100 alloy, A1085 alloy, and A1050 alloy; aluminum-copper-based A2024 alloy; aluminum-manganese-based alloy A3003 alloy; A5052 alloy of aluminum-magnesium series; all alloys of A1000 series to 7000 series (corrosion-resistant aluminum alloy, high-strength aluminum alloy, heat-resistant aluminum alloy, etc.), and ADC1~12 types (aluminum alloy for die casting) Aluminum alloy for casting.

就鋁合金之組成而言,可列舉例如:相對於鋁合金之總量(100質量%)計,各別之金屬原子之含量調整為以下之範圍者。 ・矽(Si):1.5質量%以下 ・鐵(Fe):1.0質量%以下 ・銅(Cu):8.0質量%以下 ・錳(Mn):2.0質量%以下 ・鎂(Mg):6.0質量%以下 ・鉻(Cr):0.50質量%以下 ・鋅(Zn):8.0質量%以下 ・鈦(Ti):0.30質量%以下 ・釩(V):0.25質量%以下 ・鉍(Bi):1.0質量%以下 ・鉛(Pb):1.0質量%以下 ・其餘部分為鋁(Al)及無法避免的雜質。 此外,表1例示鋁合金之組成,但組成並不限於此。As for the composition of the aluminum alloy, for example, the content of each metal atom is adjusted to the following range relative to the total amount of the aluminum alloy (100% by mass). ・Si (Si): 1.5% by mass or less ・Iron (Fe): 1.0% by mass or less ・Copper (Cu): 8.0% by mass or less ・Manganese (Mn): 2.0% by mass or less ・Magnesium (Mg): 6.0% by mass or less ・Chromium (Cr): 0.50% by mass or less ・Zinc (Zn): 8.0% by mass or less ・Ti (Ti): 0.30% by mass or less ・Vanadium (V): 0.25 mass% or less ・Bismuth (Bi): 1.0% by mass or less ・Lead (Pb): 1.0% by mass or less ・The rest is aluminum (Al) and unavoidable impurities. In addition, Table 1 illustrates the composition of the aluminum alloy, but the composition is not limited thereto.

[表1]

Figure 108131521-A0304-0001
[Table 1]
Figure 108131521-A0304-0001

此外,鋁合金亦可為鑄造用鋁合金、或展延用鋁合金,亦可為利用壓鑄法成形為預定形狀之構件、經機械加工成形為預定形狀之構件,更可為疊層鋁合金。 展延用鋁合金可為中間材即板材等,亦可為對它們進行熱壓加工等機械加工而成形為預定形狀之構件。 疊層鋁合金之形狀也無特別限定,例如,可為板狀及柱狀、以及適用於其用途之任意之形狀。 此外,表面處理對象物即鋁或鋁合金,例如也能以固定在聚酯素材之布料之鋁製之緊固件之金屬配件的方式,具備鋁或鋁合金及非金屬材之物品之形態存在。In addition, the aluminum alloy may be an aluminum alloy for casting or an aluminum alloy for spreading, a member formed into a predetermined shape by a die casting method, a member formed into a predetermined shape by machining, or a laminated aluminum alloy. The aluminum alloy for extension may be an intermediate material, that is, a plate or the like, or a member formed into a predetermined shape by mechanical processing such as hot pressing. The shape of the laminated aluminum alloy is not particularly limited. For example, it may be a plate shape or a column shape, and any shape suitable for its use. In addition, aluminum or aluminum alloys, which are objects to be surface-treated, can also exist in the form of articles equipped with aluminum or aluminum alloys and non-metallic materials, such as metal fittings of aluminum fasteners fixed to polyester material cloth.

[鋁或鋁合金之表面處理方法及製造方法] 本發明亦提供下述[1]之鋁或鋁合金之表面處理方法(以下亦簡稱為「表面處理方法」)及下述[2]之經表面處理之鋁或鋁合金之製造方法(以下亦簡稱為「製造方法」)。 [1]一種鋁或鋁合金之表面處理方法,係使用上述之本發明之化學研磨液進行鋁或鋁合金之表面處理。 [2]一種經表面處理之鋁或鋁合金之製造方法,包括以下步驟:使用上述之本發明之化學研磨液進行鋁或鋁合金之表面處理。 用於本發明之表面處理方法及製造方法之化學研磨液、及表面處理對象物即鋁或鋁合金之詳細如上述。 又,本發明之一態樣之表面處理方法及製造方法中,表面處理對象物即鋁等,例如也能以固定在聚酯素材之布料上之鋁製之緊固件之金屬配件的方式,具備鋁或鋁合金及非金屬材之物品之形態存在。[Aluminum or aluminum alloy surface treatment method and manufacturing method] The present invention also provides the following [1] surface treatment method of aluminum or aluminum alloy (hereinafter also referred to as "surface treatment method") and the following [2] surface-treated aluminum or aluminum alloy manufacturing method (hereinafter also (Referred to as "manufacturing method"). [1] A surface treatment method of aluminum or aluminum alloy, which uses the chemical polishing liquid of the present invention described above to perform surface treatment of aluminum or aluminum alloy. [2] A method for manufacturing a surface-treated aluminum or aluminum alloy, including the following steps: the surface treatment of aluminum or aluminum alloy is performed using the chemical polishing liquid of the present invention described above. The details of the chemical polishing liquid used in the surface treatment method and manufacturing method of the present invention, and the surface treatment object, that is, aluminum or aluminum alloy are as described above. In addition, in the surface treatment method and manufacturing method of one aspect of the present invention, the surface treatment object, that is, aluminum, etc., for example, can also be provided as a metal fitting of an aluminum fastener fixed to a polyester material cloth The form of aluminum or aluminum alloy and non-metallic materials exist.

本發明之一態樣之表面處理方法及製造方法之上述步驟,理想為藉由使上述之化學研磨液與表面處理對象物即鋁或鋁合金接觸來進行鋁或鋁合金之表面處理。就使化學研磨液與鋁或鋁合金接觸之方法而言,理想為藉由將表面處理對象物即鋁或鋁合金浸漬於化學研磨液來進行,就其他方法而言,可列舉在鋁或鋁合金之表面上塗佈或散佈(例如噴霧)化學研磨液之方法。 此時,亦可預先對鋁或鋁合金施予機械研磨,此外,亦可因應必要進行加熱後,使其與化學研磨液接觸(理想為浸漬於化學研磨液)。The above-mentioned steps of the surface treatment method and manufacturing method of one aspect of the present invention are preferably performed by bringing the chemical polishing liquid into contact with aluminum or aluminum alloy, which is the surface treatment object. The method of contacting the chemical polishing liquid with aluminum or aluminum alloy is preferably performed by immersing the aluminum or aluminum alloy, which is the surface treatment object, in the chemical polishing liquid. Other methods include aluminum or aluminum. A method of coating or spreading (eg spraying) chemical polishing liquid on the surface of the alloy. At this time, the aluminum or aluminum alloy may be mechanically polished in advance, and may be heated as necessary to contact the chemical polishing liquid (ideally immersed in the chemical polishing liquid).

就在進行鋁或鋁合金之表面處理時之前述化學研磨液之溫度而言,理想為40~80℃,較佳為45~75℃,更佳為50~70℃。 只要化學研磨液之溫度為40℃以上,即可促進表面處理且更加改善生產性。另一方面,只要化學研磨液之溫度為80℃以下,例如,在對固定在聚酯素材之布料上之鋁製之緊固件之金屬配件進行表面處理時,仍可抑制聚酯素材之變質。As for the temperature of the aforementioned chemical polishing liquid during the surface treatment of aluminum or aluminum alloy, it is preferably 40 to 80°C, preferably 45 to 75°C, and more preferably 50 to 70°C. As long as the temperature of the chemical polishing liquid is above 40°C, it can promote surface treatment and further improve productivity. On the other hand, as long as the temperature of the chemical polishing liquid is 80°C or lower, for example, when the metal fittings of aluminum fasteners fixed on the fabric of the polyester material are surface-treated, the deterioration of the polyester material can be suppressed.

此外,就鋁或鋁合金之表面處理時間而言,可依據表面處理對象物即鋁或鋁合金之組成、大小、有無預熱、及化學研磨液之溫度而適宜地設定,理想為1秒以上且10分鐘以下,較佳為30秒以上且7分鐘以下,更佳為60秒以上且5分鐘以下。In addition, as for the surface treatment time of aluminum or aluminum alloy, it can be appropriately set according to the composition, size, presence or absence of preheating of the surface treatment object, that is, aluminum or aluminum alloy, and the temperature of the chemical polishing liquid, which is preferably 1 second or more And 10 minutes or less, preferably 30 seconds or more and 7 minutes or less, more preferably 60 seconds or more and 5 minutes or less.

又,本發明之一態樣之表面處理方法及製造方法中,表面處理對象物即鋁或鋁合金之和化學研磨液之接觸(理想為浸漬於化學研磨液)可僅為1次,亦可為多次。In addition, in the surface treatment method and manufacturing method of one aspect of the present invention, the surface treatment object, that is, aluminum or aluminum alloy, can be contacted with the chemical polishing liquid (ideally immersed in the chemical polishing liquid) only once, or For many times.

利用本發明之一態樣之表面處理方法及製造方法而得之經表面處理之鋁或鋁合金,其表面係平滑化並且具有優異之光澤。 經表面處理之鋁或鋁合金之算術平均高度(Sa)會受處理前之鋁或鋁合金之算術平均高度(Sa)、或鋁合金之種類的影響,故無特別限定。 惟,例如,就表面處理前之算術平均高度(Sa)為150~250nm之鋁或JIS H4140所記載之鋁合金經表面處理後之算術平均高度(Sa)而言,理想為表面處理前之算術平均高度(Sa)以下,較佳為200nm以下,且表面處理後之該算術平均高度係表面處理前之算術平均高度(Sa)以下,更佳為140nm以下,進一步更佳為110nm以下,還更佳為90nm以下,特佳為70nm以下。此外,此時之表面處理後之算術平均高度(Sa)之下限值無特別限制,通常為1nm以上,理想為5nm以上。 又,本說明書中,算術平均高度(Sa)係依據ISO 25178而測得之值,具體而言,意旨根據實施例記載之方法而測得之值。The surface-treated aluminum or aluminum alloy obtained by using the surface treatment method and manufacturing method of one aspect of the present invention has a smooth surface and excellent gloss. The arithmetic average height (Sa) of the surface-treated aluminum or aluminum alloy is affected by the arithmetic average height (Sa) of the aluminum or aluminum alloy before treatment, or the type of aluminum alloy, so there is no particular limitation. However, for example, for the arithmetic average height (Sa) of aluminum before the surface treatment with an arithmetic average height (Sa) of 150 to 250 nm or the aluminum alloy described in JIS H4140 after surface treatment, it is ideally the arithmetic before the surface treatment The average height (Sa) or less, preferably 200 nm or less, and the arithmetic average height after surface treatment is the arithmetic average height (Sa) or less before surface treatment, more preferably 140 nm or less, even more preferably 110 nm or less, and still more It is preferably 90 nm or less, and particularly preferably 70 nm or less. In addition, the lower limit of the arithmetic mean height (Sa) after the surface treatment at this time is not particularly limited, but it is usually 1 nm or more, and ideally 5 nm or more. In addition, in this specification, the arithmetic mean height (Sa) is the value measured based on ISO 25178, specifically, the value measured according to the method described in the Examples.

此外,經表面處理之鋁或鋁合金之光澤度會受處理前之鋁或鋁合金之光澤度的影響,故無特別限定。 惟,例如,就表面處理前之光澤度為200~350之鋁或JIS H4140所記載之鋁合金經表面處理後之光澤度而言,理想為表面處理前之光澤度以上,較佳為200以上,且表面處理後之該光澤度係表面處理前之光澤度以上,更佳為300以上,進一步更佳為360以上,還更佳為400以上,特佳為500以上,此外,通常為1000以下。 又,本說明書中,光澤度係依據ISO 2813而測得之值,具體而言,意旨根據實施例記載之方法而測得之值。 [實施例]In addition, the gloss of the surface-treated aluminum or aluminum alloy is affected by the gloss of the aluminum or aluminum alloy before the treatment, so there is no particular limitation. However, for example, in terms of the gloss after the surface treatment of aluminum having a gloss of 200 to 350 before the surface treatment or the aluminum alloy described in JIS H4140, it is preferably at least the gloss before the surface treatment, preferably 200 or more , And the gloss after surface treatment is the gloss before surface treatment is more than, more preferably 300 or more, further more preferably 360 or more, still more preferably 400 or more, particularly preferably 500 or more, and usually 1000 or less . In addition, in this specification, glossiness is the value measured based on ISO 2813, specifically, the value measured according to the method described in the Example. [Example]

接著,藉由實施例更詳細地說明本發明,但本發明並不受此等例任何限制。Next, the present invention will be described in more detail by examples, but the present invention is not limited by these examples.

實施例及比較例中的化學研磨液之物性、鋁合金之物性係如下般進行測定。 (1)化學研磨液之pH 使用pH計(堀場製作所股份有限公司,製品名「D-53」),依據JIS Z8802測定25℃中之化學研磨液之pH。 (2)鋁合金片之算術平均高度(Sa) 使用雷射顯微鏡(基恩斯股份有限公司,製品名「VK-X250」),依據ISO 25178測定鋁合金片之算術平均高度(Sa)。 (3)鋁合金片之光澤度 使用光澤度計(村上色彩技術研究所股份有限公司,製品名「TrueGloss GM-26 PRO/Touch」),依據ISO 2813測定鋁合金片之光澤度。The physical properties of the chemical polishing liquid and the physical properties of the aluminum alloy in Examples and Comparative Examples were measured as follows. (1) pH of chemical polishing liquid Using a pH meter (Horiba Manufacturing Co., Ltd., product name "D-53"), the pH of the chemical polishing liquid at 25°C was measured in accordance with JIS Z8802. (2) The arithmetic mean height of aluminum alloy sheet (Sa) Using a laser microscope (Keynes Co., Ltd., product name "VK-X250"), the arithmetic mean height (Sa) of the aluminum alloy sheet was measured according to ISO 25178. (3)Glossiness of aluminum alloy sheet Using a gloss meter (Murakami Color Technology Research Institute Co., Ltd., product name "TrueGloss GM-26 PRO/Touch"), the gloss of the aluminum alloy sheet was measured according to ISO 2813.

實施例1 (1)化學研磨液之調製 將過氧化氫(三菱瓦斯化學股份有限公司製,60質量%水溶液)5質量份(過氧化氫之有效成分比)、氟化氫銨(大和化成股份有限公司製)15質量份(以氟原子換算為10質量份)、磷酸(Rasa Industries, Ltd.製,85質量%水溶液)40質量份(H3 PO4 之有效成分比)、及聚乙二醇(第一工業製藥股份有限公司製,製品名「PEG600」)7質量份混合,再添加水稀釋,調製出有效成分濃度為67質量%之化學研磨液(1)。 所調製之化學研磨液(1)之pH為2.0。Example 1 (1) Preparation of chemical polishing liquid 5 parts by mass of hydrogen peroxide (Mitsubishi Gas Chemical Co., Ltd., 60% by mass aqueous solution) (effective component ratio of hydrogen peroxide), ammonium hydrogen fluoride (Daiwa Chemical Co., Ltd.) 15 parts by mass (10 parts by mass in terms of fluorine atom), 40 parts by mass of phosphoric acid (85% by mass aqueous solution manufactured by Rasa Industries, Ltd.) (effective component ratio of H 3 PO 4 ), and polyethylene glycol ( It is manufactured by Daiichi Pharmaceutical Co., Ltd., with the product name "PEG600") 7 parts by mass, and then diluted with water to prepare a chemical polishing liquid (1) with an active ingredient concentration of 67% by mass. The pH of the prepared chemical polishing liquid (1) is 2.0.

(2)鋁合金片之表面處理 使用厚度1.5mm、縱20×橫50mm之鋁合金片(I)(JIS A5052P-H34,算術平均高度(Sa)=150nm,光澤度=304,組成相當於表1之合金號碼A5052)作為表面處理之對象。 將上述鋁合金片(I)浸漬在如上述所調製之化學研磨液(1)中,以液溫60℃之條件浸漬2分鐘。接著,從化學研磨液(1)中將浸漬後之鋁合金片(I)取出,以離子交換水充分水洗後,充分乾燥,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=65nm,光澤度=390。(2) Surface treatment of aluminum alloy sheet As the surface treatment, an aluminum alloy sheet (I) (JIS A5052P-H34, arithmetic mean height (Sa) = 150 nm, gloss = 304, composition equivalent to alloy number A5052 in Table 1) with a thickness of 1.5 mm and a length of 20×50 mm is used as the surface treatment Object. The aluminum alloy sheet (I) was immersed in the chemical polishing liquid (1) prepared as described above, and immersed for 2 minutes at a liquid temperature of 60°C. Next, the impregnated aluminum alloy sheet (I) was taken out from the chemical polishing liquid (1), washed thoroughly with ion-exchanged water, and then sufficiently dried to obtain a surface-treated alloy. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 65 nm, and gloss = 390.

比較例1 不添加磷酸,且以40質量份之水取代磷酸之有效成分比之摻合量,除此以外,和實施例1同樣地進行,調製出化學研磨液(2)。所調製之化學研磨液(2)之pH為2.0。 然後,使用上述之化學研磨液(2)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=224nm,光澤度=40。Comparative example 1 The chemical polishing liquid (2) was prepared in the same manner as in Example 1 except that the phosphoric acid was not added and 40 parts by mass of water was substituted for the blending amount of the effective component ratio of phosphoric acid. The pH of the prepared chemical polishing liquid (2) is 2.0. Then, the aluminum alloy sheet (I) similar to Example 1 was surface-treated using the above-mentioned chemical polishing liquid (2) in the same manner as Example 1, to obtain a surface-treated alloy. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 224 nm, and gloss = 40.

實施例2 使用厚度0.4mm、縱30×橫50mm之鋁合金片(II)(JIS A1100P-H14,算術平均高度(Sa)=94nm,光澤度=463,組成相當於表1之合金號碼A1100)作為表面處理之對象,除此以外,使用與實施例1所調製者相同之化學研磨液(1)進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=20nm,光澤度=745。Example 2 As the surface treatment, an aluminum alloy sheet (II) (JIS A1100P-H14, arithmetic average height (Sa) = 94 nm, gloss = 463, composition equivalent to the alloy number A1100 in Table 1) with a thickness of 0.4 mm and a length of 30 mm and a width of 50 mm is used as the surface treatment Except for this, surface treatment was performed using the same chemical polishing liquid (1) as prepared in Example 1 to obtain a surface-treated alloy. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 20 nm, and gloss = 745.

比較例2 使用與比較例1所調製者相同之化學研磨液(2)對與上述實施例2相同之鋁合金片(II),與實施例2同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=233nm,光澤度=120。Comparative example 2 Using the same chemical polishing liquid (2) as prepared in Comparative Example 1, the same aluminum alloy sheet (II) as in Example 2 above was subjected to surface treatment in the same manner as Example 2 to obtain a surface-treated alloy. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 233 nm and gloss = 120.

比較例3 不添加聚乙二醇,且以7質量份之水取代聚乙二醇之有效成分比之摻合量,除此之外,與實施例1同樣地進行,調製出化學研磨液(3)。 所調製之化學研磨液之pH為4.5。 然後,欲使用上述化學研磨液(3),在液溫60℃之條件對與上述之實施例2相同之鋁合金片(II),花費和實施例2同樣的時間進行表面處理,但由於反應激烈地進行,化學研磨液(3)從容器中溢出,故於1分鐘之處理時間結束,進而得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=42nm,光澤度=607。Comparative Example 3 The chemical polishing liquid (3) was prepared in the same manner as in Example 1 except that polyethylene glycol was not added, and the effective component ratio of polyethylene glycol was replaced with 7 parts by mass of water. The pH of the prepared chemical polishing liquid is 4.5. Then, to use the above-mentioned chemical polishing liquid (3), the aluminum alloy sheet (II) similar to the above-mentioned Example 2 was subjected to the surface treatment at the liquid temperature of 60° C. in the same time as in Example 2, but due to the reaction The process was vigorously carried out, and the chemical polishing liquid (3) overflowed from the container, so the treatment time of 1 minute ended, and a surface-treated alloy was obtained. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 42 nm, and gloss = 607.

將如上實施例1~2及比較例1~3之結果合併表示於表2。 [表2]

Figure 108131521-A0304-0002
Table 2 shows the results of Examples 1 to 2 and Comparative Examples 1 to 3 as above. [Table 2]
Figure 108131521-A0304-0002

根據表2可確認,在實施例1及2中,使用所調製之化學研磨液(1)進行鋁合金之表面處理時,鋁合金之表面經研磨而平滑化,並且成為光澤度高之表面。 另一方面,在比較例1及2中,使用所調製之化學研磨液(2)進行鋁合金之表面處理時,由於反應會激烈地進行,故與表面處理前相比,結果鋁合金之表面之算術平均高度(Sa)增大且表面之光澤度降低。 此外,使用比較例3所調製之化學研磨液(3)進行鋁合金之表面處理時,反應會過度激烈地進行,故結果不得不在1分鐘之處理時間結束,作業安全性有問題。According to Table 2, it was confirmed that in Examples 1 and 2, when the prepared chemical polishing liquid (1) was used for the surface treatment of the aluminum alloy, the surface of the aluminum alloy was polished and smoothed, and became a surface with high gloss. On the other hand, in Comparative Examples 1 and 2, when the surface treatment of the aluminum alloy was performed using the prepared chemical polishing liquid (2), the reaction proceeded violently, so the surface of the aluminum alloy was compared with that before the surface treatment The arithmetic mean height (Sa) increases and the surface gloss decreases. In addition, when the chemical polishing liquid (3) prepared in Comparative Example 3 was used for surface treatment of aluminum alloys, the reaction proceeded excessively violently, and as a result, the treatment time had to be ended within 1 minute, and the work safety was problematic.

實施例3 將過氧化氫之摻合量設定為「15質量份(作為過氧化氫之有效成分比)」,並將水之摻合量設定為「23質量份」,除此之外,與實施例1同樣地進行,調製出有效成分濃度77質量%之化學研磨液(4)。所調製之化學研磨液(4)之pH為1.60。 然後,使用上述化學研磨液(4)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=61nm,光澤度=520。Example 3 The blending amount of hydrogen peroxide is set to "15 parts by mass (as an effective component ratio of hydrogen peroxide)", and the blending amount of water is set to "23 parts by mass". In the same manner, a chemical polishing liquid (4) having an active ingredient concentration of 77% by mass was prepared. The pH of the prepared chemical polishing liquid (4) is 1.60. Then, the same aluminum alloy sheet (I) as in Example 1 was surface-treated using the above-mentioned chemical polishing liquid (4) to obtain a surface-treated alloy. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 61 nm, and gloss = 520.

實施例4 將磷酸之摻合量設定為「25質量份」,並將水之摻合量設定為「48質量份」,除此之外,與實施例1同樣地進行,調製出有效成分濃度52質量%之化學研磨液(5)。所調製之化學研磨液(5)之pH為2.90。 然後,使用上述化學研磨液(5)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=51nm,光澤度=520。Example 4 Except that the blending amount of phosphoric acid was set to "25 parts by mass" and the blending amount of water was set to "48 parts by mass", it was carried out in the same manner as in Example 1 to prepare an effective component concentration of 52 mass% The chemical polishing liquid (5). The pH of the prepared chemical polishing liquid (5) was 2.90. Then, the same aluminum alloy sheet (I) as Example 1 was surface-treated using the above-mentioned chemical polishing liquid (5) to obtain a surface-treated alloy. The arithmetic average height (Sa) of the resulting surface-treated alloy = 51 nm, and gloss = 520.

實施例5 將聚乙二醇之摻合量設定為「2質量份」,並將水之摻合量設定為「38質量份」,除此之外,與實施例1同樣地進行,調製出有效成分濃度62質量%之化學研磨液(6)。經調製之化學研磨液(6)之pH為2.20。 然後,使用上述化學研磨液(6)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=104nm,光澤度=350。Example 5 Except that the blending amount of polyethylene glycol was set to "2 parts by mass" and the blending amount of water was set to "38 parts by mass", it was carried out in the same manner as in Example 1 to prepare the effective ingredient concentration 62% by mass of chemical polishing liquid (6). The pH of the prepared chemical polishing liquid (6) is 2.20. Then, the same aluminum alloy sheet (I) as in Example 1 was surface-treated using the above-described chemical polishing liquid (6) to obtain a surface-treated alloy. The arithmetic average height (Sa) of the resulting surface-treated alloy = 104 nm, and gloss = 350.

實施例6 摻合7質量份之「乙二醇單丁基醚」取代「聚乙二醇」,除此之外,與實施例1同樣地進行,調製出有效成分濃度67質量%之化學研磨液(7)。所調製之化學研磨液(7)之pH為2.20。 然後,使用上述化學研磨液(7)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=130nm,光澤度=300。Example 6 Except for blending 7 parts by mass of "ethylene glycol monobutyl ether" instead of "polyethylene glycol", the same procedure as in Example 1 was carried out to prepare a chemical polishing solution having an effective ingredient concentration of 67% by mass (7 ). The pH of the prepared chemical polishing liquid (7) is 2.20. Then, using the above chemical polishing liquid (7), the same aluminum alloy sheet (I) as in Example 1 was surface-treated in the same manner as in Example 1 to obtain a surface-treated alloy. The arithmetic mean height (Sa) of the resulting surface-treated alloy = 130 nm and gloss = 300.

實施例7 摻合7質量份之「丙二醇」取代「聚乙二醇」,除此之外,與實施例1同樣地進行,調製出有效成分濃度67質量%之化學研磨液(8)。所調製之化學研磨液(8)之pH為2.20。 然後,使用上述化學研磨液(8)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=105nm,光澤度=300。Example 7 Except having mixed 7 mass parts of "propylene glycol" instead of "polyethylene glycol", it carried out similarly to Example 1, and prepared the chemical polishing liquid (8) with an active ingredient concentration of 67 mass %. The pH of the prepared chemical polishing liquid (8) is 2.20. Then, the same aluminum alloy sheet (I) as Example 1 was surface-treated using the above-mentioned chemical polishing liquid (8) to obtain a surface-treated alloy. The arithmetic average height (Sa) of the resulting surface-treated alloy = 105 nm, and gloss = 300.

實施例8 將氟化氫銨之摻合量設定為「5質量份(換算氟原子為3質量份)」,並將水之摻合量設定為「43質量份」,除此之外,與實施例1同樣地進行,調製出有效成分濃度57質量%之化學研磨液(9)。所調製之化學研磨液(9)之pH為1.90。 然後,使用上述化學研磨液(9)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=100nm,光澤度=240。Example 8 The blending amount of ammonium bifluoride was set to "5 parts by mass (converted fluorine atom is 3 parts by mass)", and the blending amount of water was set to "43 parts by mass", except that it was the same as Example 1. In this way, a chemical polishing liquid (9) having an active ingredient concentration of 57% by mass was prepared. The pH of the prepared chemical polishing liquid (9) was 1.90. Then, the same aluminum alloy sheet (I) as in Example 1 was surface-treated using the above-mentioned chemical polishing liquid (9) to obtain a surface-treated alloy. The arithmetic average height (Sa) of the resulting surface-treated alloy = 100 nm and gloss = 240.

實施例9 將聚乙二醇之摻合量設定為「15質量份」,並將水之摻合量設定為「25質量份」,除此以外,與實施例1相同,調製出有效成分濃度75質量%之化學研磨液(10)。所調製之化學研磨液(10)之pH為2.10。 然後,使用上述化學研磨液(10)對與實施例1相同之鋁合金片(I),與實施例1同樣地進行表面處理,得到表面處理合金。 所得之表面處理合金之算術平均高度(Sa)=109nm,光澤度=280。Example 9 Except that the blending amount of polyethylene glycol was set to "15 parts by mass" and the blending amount of water was set to "25 parts by mass", the same as in Example 1, the active ingredient concentration was 75% by mass. Of chemical polishing fluid (10). The pH of the prepared chemical polishing liquid (10) is 2.10. Then, the aluminum alloy sheet (I) similar to Example 1 was surface-treated using the above-mentioned chemical polishing liquid (10) in the same manner as Example 1 to obtain a surface-treated alloy. The arithmetic average height (Sa) of the resulting surface-treated alloy = 109 nm and gloss = 280.

如上實施例3~9之結果合併表示於表3。 [表3]

Figure 02_image001
The results of Examples 3 to 9 above are shown in Table 3 together. [table 3]
Figure 02_image001

根據表3可確認,使用實施例3~9所調製之化學研磨液(4)~(10)進行鋁合金之表面處理時,鋁合金之表面經研磨而平滑化,並且成為光澤度高之表面。According to Table 3, it can be confirmed that when the surface treatment of aluminum alloy is performed using the chemical polishing liquids (4) to (10) prepared in Examples 3 to 9, the surface of the aluminum alloy is smoothed by polishing and becomes a surface with high gloss .

Claims (12)

一種化學研磨液,係用於鋁或鋁合金; 含有過氧化氫(A)、氟化合物(B)、不屬於該氟化合物(B)之無機酸(C)、及含羥基之烴化合物(D); 以該化學研磨液之總量為基準計,該過氧化氫(A)之含量為2~20質量%; 以該化學研磨液之總量為基準計,該氟化合物(B)之以氟原子換算計之含量為3~17質量%; 以該化學研磨液之總量為基準計,該無機酸(C)之含量為20~55質量%; 以該化學研磨液之總量為基準計,該含羥基之烴化合物(D)之含量為2~15質量%。A chemical polishing liquid used for aluminum or aluminum alloy; Contains hydrogen peroxide (A), fluorine compound (B), inorganic acid (C) which is not the fluorine compound (B), and hydrocarbon compound (D) containing hydroxyl group; Based on the total amount of the chemical polishing liquid, the content of the hydrogen peroxide (A) is 2-20% by mass; Based on the total amount of the chemical polishing liquid, the content of the fluorine compound (B) in terms of fluorine atoms is 3 to 17% by mass; Based on the total amount of the chemical polishing liquid, the content of the inorganic acid (C) is 20 to 55% by mass; Based on the total amount of the chemical polishing liquid, the content of the hydroxyl-containing hydrocarbon compound (D) is 2 to 15% by mass. 如申請專利範圍第1項之化學研磨液,該化學研磨液之pH係4以下。For example, if the chemical polishing liquid of patent application item 1 is used, the pH of the chemical polishing liquid is 4 or less. 如申請專利範圍第1或2項之化學研磨液,其中,該氟化合物(B)係選自由酸性氟化銨、酸性氟化鉀、氟化銨、及氟化氫構成之群組中之1種以上。The chemical polishing liquid as claimed in item 1 or 2 of the patent application, wherein the fluorine compound (B) is at least one selected from the group consisting of acidic ammonium fluoride, acidic potassium fluoride, ammonium fluoride, and hydrogen fluoride . 如申請專利範圍第1至3項中任一項之化學研磨液,其中,該無機酸(C)包含磷酸。The chemical polishing liquid according to any one of claims 1 to 3, wherein the inorganic acid (C) contains phosphoric acid. 如申請專利範圍第1至4項中任一項之化學研磨液,其中,該含羥基之烴化合物(D)係選自由碳數2以上之一元醇、多元醇、及二醇醚化合物構成之群組中之1種以上。The chemical polishing liquid according to any one of items 1 to 4 of the patent application scope, wherein the hydroxyl-containing hydrocarbon compound (D) is selected from the group consisting of monovalent alcohols with a carbon number of 2 or more, polyhydric alcohols, and glycol ether compounds More than one type in the group. 如申請專利範圍第1至5項中任一項之化學研磨液,其中,該無機酸(C)與該含羥基之烴化合物(D)之含量比[(C)/(D)],以質量比計為2~25。For example, the chemical polishing liquid according to any one of claims 1 to 5, wherein the content ratio of the inorganic acid (C) to the hydroxyl-containing hydrocarbon compound (D) [(C)/(D)], to The mass ratio is 2~25. 一種鋁或鋁合金之表面處理方法,係使用如申請專利範圍第1至6項中任一項之化學研磨液進行鋁或鋁合金之表面處理。A surface treatment method for aluminum or aluminum alloy is to use a chemical polishing liquid as described in any one of patent application items 1 to 6 to perform surface treatment for aluminum or aluminum alloy. 如申請專利範圍第7項之鋁或鋁合金之表面處理方法,其中,在進行鋁或鋁合金之表面處理時之該化學研磨液之溫度為40~80℃。For example, the surface treatment method of aluminum or aluminum alloy according to item 7 of the patent application scope, wherein the temperature of the chemical polishing liquid during the surface treatment of aluminum or aluminum alloy is 40 to 80°C. 如申請專利範圍第7或8項之鋁或鋁合金之表面處理方法,其中,進行鋁或鋁合金之表面處理之時間為1秒以上且10分鐘以下。For example, the surface treatment method of aluminum or aluminum alloy according to item 7 or 8 of the patent application scope, wherein the surface treatment time of aluminum or aluminum alloy is 1 second or more and 10 minutes or less. 一種經表面處理之鋁或鋁合金之製造方法,包括以下步驟: 使用如申請專利範圍第1至6項中任一項之化學研磨液進行鋁或鋁合金之表面處理。A method for manufacturing surface-treated aluminum or aluminum alloy includes the following steps: The surface treatment of aluminum or aluminum alloy is carried out using the chemical polishing liquid according to any one of items 1 to 6 of the patent application. 一種經表面處理之鋁或鋁合金,係使用如申請專利範圍第1至6項中任一項之化學研磨液,對表面處理前之依據ISO 25178測得之算術平均高度(Sa)為150~250nm的鋁或JIS H4140所記載之鋁合金進行表面處理,表面處理後之該鋁或鋁合金之算術平均高度(Sa)為200nm以下,且表面處理後之該算術平均高度係表面處理前之算術平均高度(Sa)以下。A surface-treated aluminum or aluminum alloy that uses a chemical polishing liquid as described in any of items 1 to 6 of the patent application. The arithmetic average height (Sa) measured according to ISO 25178 before surface treatment is 150~ 250nm aluminum or aluminum alloy described in JIS H4140 is surface-treated, the arithmetic average height (Sa) of the aluminum or aluminum alloy after surface treatment is 200nm or less, and the arithmetic average height after surface treatment is the arithmetic before surface treatment Below average height (Sa). 一種經表面處理之鋁或鋁合金,係使用如申請專利範圍第1至6項中任一項之化學研磨液,對表面處理前之依據ISO 2813測得之光澤度為200~350的鋁或JIS H4140所記載之鋁合金進行表面處理,表面處理後之該鋁或鋁合金之光澤度為150以上,且表面處理後之該光澤度係表面處理前之光澤度以上。A surface-treated aluminum or aluminum alloy, which uses a chemical polishing liquid as described in any one of the patent application items 1 to 6, before the surface treatment, according to ISO 2813, the gloss of 200-350 aluminum or The aluminum alloy described in JIS H4140 is subjected to surface treatment. The gloss of the aluminum or aluminum alloy after the surface treatment is 150 or more, and the gloss after the surface treatment is more than the gloss before the surface treatment.
TW108131521A 2018-09-03 2019-09-02 Chemical polishing liquid and surface treatment method using same TW202020227A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-164437 2018-09-03
JP2018164437 2018-09-03

Publications (1)

Publication Number Publication Date
TW202020227A true TW202020227A (en) 2020-06-01

Family

ID=69723184

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108131521A TW202020227A (en) 2018-09-03 2019-09-02 Chemical polishing liquid and surface treatment method using same

Country Status (4)

Country Link
JP (1) JP7310826B2 (en)
CN (1) CN112585299B (en)
TW (1) TW202020227A (en)
WO (1) WO2020050204A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7145253B2 (en) * 2021-02-18 2022-09-30 三愛オブリテック株式会社 Chemical polishing liquid and chemical polishing method
CN113390911B (en) * 2021-05-26 2023-02-07 中国工程物理研究院材料研究所 Extracting corrosive agent and extracting method for beryllium phase three-dimensional microscopic morphology of beryllium-aluminum alloy

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503925A (en) * 1973-05-16 1975-01-16
JP3291512B2 (en) * 1995-03-16 2002-06-10 日本パーオキサイド株式会社 Stabilizer for acidic solution containing hydrogen peroxide, ammonium hydrogen fluoride, and sulfuric acid, and chemical dissolution treatment solution for iron-nickel alloy using the same
JP2004298938A (en) * 2003-03-31 2004-10-28 Kobe Steel Ltd Aluminum sheet and aluminum foil and method for manufacturing them
JP2012143798A (en) * 2011-01-13 2012-08-02 Hikari Keikinzoku Kogyo Kk Plated aluminum alloy casting and method for production thereof
JP5608133B2 (en) * 2011-06-14 2014-10-15 株式会社神戸製鋼所 Method for manufacturing aluminum substrate for magnetic recording medium
CN102796458B (en) * 2012-07-17 2014-04-23 清华大学 Chemical mechanical polishing aqueous composite and chemical mechanical polishing process of titanium substrate
CN102747371A (en) * 2012-07-17 2012-10-24 许泽波 Chemical polish for copper and alloy surface treatment and preparation method thereof
GB2508827A (en) * 2012-12-11 2014-06-18 Henkel Ag & Co Kgaa Aqueous compositions and processes for passivating and brightening stainless steel surfaces
CN104388940A (en) * 2014-11-20 2015-03-04 无锡鸿声铝业有限公司 Chemical polishing liquid with aluminum and aluminum alloy
CN105369273A (en) * 2015-10-15 2016-03-02 当涂县维思共创工业产品设计有限公司 Aluminum profile surface cleaning and polishing agent
CN106757039B (en) * 2017-02-23 2019-03-26 浙江大学 A kind of alumina polishing fluid and preparation method thereof

Also Published As

Publication number Publication date
CN112585299B (en) 2023-09-22
JP7310826B2 (en) 2023-07-19
JPWO2020050204A1 (en) 2021-08-26
WO2020050204A1 (en) 2020-03-12
CN112585299A (en) 2021-03-30

Similar Documents

Publication Publication Date Title
KR101897771B1 (en) Method for the manufacture of a substrate provided with a chromium VI-free and cobalt-free passivation
CN104593793B (en) A kind of aluminium and aluminum alloy surface pre-process neutralizer
TW202020227A (en) Chemical polishing liquid and surface treatment method using same
KR101493458B1 (en) Agent for the production of anti-corrosion layers on metal surfaces
WO2013108785A1 (en) Method for preventing yellow discolouration of surface of acid-cleaned steel sheet
US20170120395A1 (en) Bonding material and bonding method using same
CN104151909B (en) The production method of oiliness high-temperature resistant coating and application and titanium ingot
KR101559285B1 (en) Conversion Coating Composition of Magnesium and Magnesium Alloy and Surface Treating Method Using The Same
US9963788B2 (en) Concentrate for use in corrosion resistant treatment of metal surfaces
JP7399080B2 (en) pH stable trivalent chromium coating liquid
CN106555181A (en) A kind of inactivating treatment liquid on copper piece surface
TW201723232A (en) Rust-removal composition and acidic rust-removal method using same which comprises: phosphoric aqueous solution, polyacid, polyol aqueous solution, polyphosphate, corrosion inhibitor, surfactant and water
KR101469610B1 (en) Conversion Coating Composition of Magnesium and Magnesium Alloy and Surface Treating Method Using The Same
JP6068687B2 (en) High temperature conversion coatings on steel and iron substrates
JP2013127093A (en) Method of manufacturing high strength steel sheet having superior phosphate treatability
EP2956569B1 (en) Method for coating metallic surfaces for preventing pinholes on zinc-containing metal surfaces
CN107254676A (en) A kind of chrome-free tanning agent and preparation method thereof
JP2009248763A (en) Manufacturing method of aluminum wheel, and aluminum wheel
KR101408272B1 (en) Colourless surface lubricant for warm and hot forging, a manufacturing method thereof and a manufacturing method of forging product using the same
KR102513335B1 (en) Method for manufacturing advanced high strength steel sheet containing phosphate coating
WO2023176959A1 (en) Silicon-containing aluminum alloy desmutting agent and method for desmutting silicon-containing aluminum alloy
KR102213104B1 (en) Scaling cleaning agent for removing scaling of aluminum alloy which is generated during heat treatment and heat treatment method of aluminum alloy using the same
KR101584665B1 (en) Remove Film Oxide Composition and Removing Methed of Film Oxide
CN112921327A (en) Preparation method of environment-friendly degreasing agent
KR101803434B1 (en) Desmut composition for aluminium material