CN112585299A - Chemical polishing liquid and surface treatment method using same - Google Patents
Chemical polishing liquid and surface treatment method using same Download PDFInfo
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- CN112585299A CN112585299A CN201980054658.1A CN201980054658A CN112585299A CN 112585299 A CN112585299 A CN 112585299A CN 201980054658 A CN201980054658 A CN 201980054658A CN 112585299 A CN112585299 A CN 112585299A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/02—Light metals
- C23F3/03—Light metals with acidic solutions
Abstract
Disclosed is a chemical polishing liquid for aluminum or aluminum alloys, which contains hydrogen peroxide (A), a fluorine compound (B), an inorganic acid (C) that does not belong to the fluorine compound (B), and a hydroxyl group-containing hydrocarbon compound (D), wherein the content of the hydrogen peroxide (A) is 2-20 mass% based on the total amount of the chemical polishing liquid, the content of the fluorine compound (B) in terms of fluorine atoms is 3-17 mass% based on the total amount of the chemical polishing liquid, the content of the inorganic acid (C) is 20-55 mass% based on the total amount of the chemical polishing liquid, and the content of the hydroxyl group-containing hydrocarbon compound (D) is 2-15 mass% based on the total amount of the chemical polishing liquid.
Description
Technical Field
The present invention relates to a chemical polishing liquid and a method for surface treatment of aluminum or an aluminum alloy using the chemical polishing liquid.
Background
Conventionally, as a chemical polishing liquid for smoothing the surface of aluminum or an alloy thereof and imparting gloss, a chemical polishing liquid in which phosphoric acid and nitric acid are mixed has been generally used. However, when such a nitric acid-containing chemical polishing liquid is used, the nitric acid may decompose and generate toxic nitrogen oxides during the chemical polishing, and the temperature of the chemical polishing liquid may become high, such as about 90 to 100 ℃, due to heat generated during decomposition of the nitric acid.
Therefore, for example, when a chemical polishing liquid containing nitric acid is used for a metal part of an aluminum fastener fixed to a cloth made of a polyester material, the polyester material is deteriorated by the heat generation, and the cloth may be discolored.
In order to solve such a problem, for example, patent document 1 discloses a chemical polishing liquid containing a predetermined amount of a tungsten compound.
Documents of the prior art
Patent document
Patent document 1: japanese patent No. 3629218
Disclosure of Invention
Problems to be solved by the invention
The chemical polishing liquid disclosed in patent document 1 contains a tungsten compound, and therefore, is expensive, and leaves room for improvement in terms of economy. In addition, a chemical polishing liquid more suitable for surface treatment of aluminum or an aluminum alloy has been desired.
Means for solving the problems
As a result of intensive studies, the present inventors have found that a chemical polishing liquid containing hydrogen peroxide, a fluorine compound, an inorganic acid not belonging to the fluorine compound, and a hydrocarbon compound having a hydroxyl group can solve the above-mentioned problems.
Namely, the present invention provides the following [1] to [12 ].
[1] A chemical polishing liquid for aluminum or aluminum alloy,
which comprises hydrogen peroxide (A), a fluorine compound (B), an inorganic acid (C) which is not the fluorine compound (B), and a hydrocarbon compound (D) having a hydroxyl group,
the content of the hydrogen peroxide (A) is 2 to 20% by mass based on the total amount of the chemical polishing liquid,
the fluorine compound (B) is contained in an amount of 3 to 17% by mass in terms of fluorine atoms based on the total amount of the chemical polishing liquid,
the content of the inorganic acid (C) is 20 to 55 mass% based on the total amount of the chemical polishing liquid,
the content of the hydroxyl group-containing hydrocarbon compound (D) is 2 to 15% by mass based on the total amount of the chemical polishing liquid.
[2] The chemical polishing liquid according to the above [1], wherein the chemical polishing liquid has a pH of 4 or less.
[3] The chemical polishing solution according to the above [1] or [2], wherein the fluorine compound (B) is at least 1 selected from the group consisting of acid ammonium fluoride, acid potassium fluoride, ammonium fluoride and hydrogen fluoride.
[4] The chemical polishing solution according to any one of the above [1] to [3], wherein the inorganic acid (C) contains phosphoric acid.
[5] The chemical polishing solution according to any one of the above [1] to [4], wherein the hydroxyl group-containing hydrocarbon compound (D) is at least 1 selected from the group consisting of monohydric alcohol, polyhydric alcohol and glycol ether compound having 2 or more carbon atoms.
[6] The chemical polishing solution according to any one of the above [1] to [5], wherein a content ratio [ (C)/(D) ] of the inorganic acid (C) to the hydroxyl group-containing hydrocarbon compound (D) is 2 to 25 by mass.
[7] A method for surface treatment of aluminum or an aluminum alloy, wherein the surface treatment of aluminum or an aluminum alloy is carried out using the chemical polishing liquid according to any one of the above [1] to [6 ].
[8] The surface treatment method according to the above [7], wherein the chemical polishing liquid is used at a temperature of 40 to 80 ℃ when the surface treatment of aluminum or an aluminum alloy is performed.
[9] The surface treatment method according to the above [7] or [8], wherein the surface treatment of the aluminum or the aluminum alloy is performed for 1 second or more and 10 minutes or less.
[10] A method for producing surface-treated aluminum or an aluminum alloy, comprising the step of performing surface treatment of aluminum or an aluminum alloy using the chemical polishing liquid according to any one of the above [1] to [6 ].
[11] A surface-treated aluminum or aluminum alloy, wherein an arithmetic average height (Sa) of the aluminum or aluminum alloy after surface treatment with the chemical polishing liquid described in any one of the above [1] to [6] is 200nm or less (wherein the arithmetic average height (Sa) before surface treatment is 200nm or less) with respect to aluminum having an arithmetic average height (Sa) of 150 to 250nm as measured according to ISO25178 before surface treatment or an aluminum alloy described in JIS H4140.
[12] A surface-treated aluminum or aluminum alloy, wherein the aluminum or aluminum alloy having a gloss of 200 to 350 as measured according to ISO2813 before surface treatment or the aluminum alloy described in JIS H4140 has a gloss of 150 or more (in particular, the gloss before surface treatment or more) after surface treatment with the chemical polishing liquid according to any one of the above-mentioned [1] to [6 ].
ADVANTAGEOUS EFFECTS OF INVENTION
When the surface treatment of aluminum or an aluminum alloy is performed using the chemical polishing liquid according to a preferred embodiment of the present invention, the surface of aluminum or the like can be polished and smoothed, and excellent gloss can be imparted. The chemical polishing liquid according to a preferred embodiment of the present invention is also excellent in operational safety.
Detailed Description
[ chemical polishing solution ]
The chemical polishing liquid of the present invention is a chemical polishing liquid for aluminum or an aluminum alloy (also collectively referred to as "aluminum or the like" in the present specification), and contains hydrogen peroxide (a), a fluorine compound (B), an inorganic acid (C) not belonging to the fluorine compound (B), and a hydrocarbon compound (D) containing a hydroxyl group (hereinafter, in the present specification, hydrogen peroxide (a), the fluorine compound (B), the inorganic acid (C) not belonging to the fluorine compound (B), and the hydrocarbon compound (D) containing a hydroxyl group are also referred to as a component (a), a component (B), a component (C), and a component (D), respectively).
It is considered that when the surface of aluminum or the like is oxidized with hydrogen peroxide (a) and the fluorine compound (B) acts on the oxidized surface to smooth the surface, the chemical polishing liquid of the present invention improves the smoothness of the surface of aluminum or the like with the inorganic acid (C) and the hydrocarbon compound (D) containing a hydroxyl group, contributes to imparting excellent gloss, suppresses the progress of a rapid reaction at the time of surface treatment, and improves the operational safety. The mechanism of action in the present invention is not limited to the above.
The pH of the chemical polishing liquid according to an embodiment of the present invention is preferably 4 or less, more preferably 3.5 or less, further preferably 3 or less, and particularly preferably 2.5 or less, and the lower limit value may be appropriately set, but is preferably 1.1 or more. When a chemical polishing liquid having a pH of 4 or less is formed and surface treatment (hereinafter, also referred to as "polishing" in the present specification) of aluminum or an aluminum alloy is performed, aluminum is dissolved as aluminum ions, surface treatment of the surface is promoted, and the smoothness of the polished surface can be further improved.
In the present specification, the pH of the chemical polishing liquid refers to a value measured at 25 ℃ according to JIS Z8802.
The chemical polishing liquid according to one embodiment of the present invention may further contain a diluting solvent such as water or an organic solvent (excluding the organic solvent belonging to the component (D)).
The chemical polishing liquid according to one embodiment of the present invention may contain active ingredients other than the components (a) to (D) within a range not impairing the effects of the present invention. In the present specification, the "active ingredient" refers to an ingredient other than a diluting solvent such as water in the chemical polishing liquid.
In the chemical polishing liquid according to one embodiment of the present invention, the content of the active ingredient (active ingredient concentration) is preferably 20 to 95% by mass, more preferably 35 to 85% by mass, still more preferably 45 to 80% by mass, yet more preferably 47 to 77% by mass, and particularly preferably 50 to 75% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
In the chemical polishing liquid according to one embodiment of the present invention, the total content of the components (a), (B), (C), and (D) is preferably 60 to 100% by mass, more preferably 70 to 100% by mass, even more preferably 80 to 100% by mass, and particularly preferably 90 to 100% by mass, based on the total amount (100% by mass) of the active ingredients in the chemical polishing liquid.
The respective components will be described below.
< hydrogen peroxide (A): component (A) >, a
The chemical polishing liquid of the present invention contains 2 to 20 mass% of hydrogen peroxide (A) based on the total amount (100 mass%) of the chemical polishing liquid.
If the content of the hydrogen peroxide (a) is less than 2 mass%, the surface of aluminum or the like as the object of the surface treatment is likely to be insufficiently oxidized, and it is difficult to form a smooth surface. On the other hand, if the content of the hydrogen peroxide (a) exceeds 20 mass%, the surface of aluminum or the like is excessively oxidized, and it is difficult to form a smooth surface.
From the above viewpoint, the content of the hydrogen peroxide (a) in the chemical polishing liquid according to one embodiment of the present invention is preferably 3 to 18% by mass, more preferably 4 to 16% by mass, even more preferably 4 to 15% by mass, particularly preferably 5 to 15% by mass, and may be 5 to 12% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
In one embodiment of the present invention, the hydrogen peroxide (a) may be mixed with other components in the form of an aqueous solution, that is, a hydrogen peroxide solution to produce the chemical polishing liquid. At this time, the amount of the hydrogen peroxide solution to be mixed in the chemical polishing liquid is adjusted so that the content of the hydrogen peroxide (a) is within the above range in consideration of the concentration of the hydrogen peroxide solution.
< fluorine compound (B): component (B) >
The chemical polishing liquid of the present invention contains 3 to 17 mass% of a fluorine compound (B) in terms of fluorine atoms based on the total amount (100 mass%) of the chemical polishing liquid.
When the content of the fluorine compound (B) in terms of fluorine atoms is less than 3% by mass, the surface of aluminum or the like oxidized with hydrogen peroxide (a) tends to be insufficiently smoothed. In addition, the gloss of the surface of aluminum or the like is not sufficiently imparted. On the other hand, if the content of the fluorine compound (B) in terms of fluorine atoms exceeds 17 mass%, the load on the drainage treatment of the obtained chemical polishing liquid tends to increase.
From the above viewpoint, the content of the fluorine compound (B) in the chemical polishing liquid according to one embodiment of the present invention in terms of fluorine atoms is preferably 5 to 15% by mass, more preferably 7 to 13% by mass, even more preferably 8 to 12% by mass, even more preferably 8 to 11% by mass, and particularly preferably 8 to 10% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
The content of the component (B) in terms of fluorine atoms can be calculated by multiplying the actual amount of the component (B) to be mixed by the fluorine atom content fraction in the component (B).
In the chemical polishing liquid according to one embodiment of the present invention, the content of the fluorine compound (B) may be appropriately set so that the content in terms of fluorine atoms falls within the above range, and is, for example, preferably 5 to 25% by mass, more preferably 8 to 22% by mass, further preferably 10 to 20% by mass, further preferably 12 to 18% by mass, and particularly preferably 12 to 15% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
The fluorine compound (B) may be a compound containing a fluorine atom, and examples thereof include nonmetallic fluorine compounds such as ammonium fluoride, acidic ammonium fluoride, cerium fluoride, silicon tetrafluoride, silicic acid fluoride (hexafluorosilicic acid, etc.), nitrogen fluoride (nitrogen trifluoride, etc.), phosphorus fluoride (phosphorus trifluoride, phosphorus pentafluoride, etc.), vinylidene fluoride, boron trifluoride, fluoroboric acid (tetrafluoroboric acid, etc.), ammonium fluoroborate, monoethanolamine hydrogen fluoride, methylamine hydrogen fluoride, ethylamine hydrogen fluoride, propylamine hydrogen fluoride, tetramethylammonium fluoride, tetraethylammonium fluoride, triethylmethylammonium fluoride, trimethylhydroxyethylammonium fluoride, tetraethoxyammonium fluoride, methyltriethoxyammonium fluoride, and hydrogen fluoride; metal fluorides such as lithium fluoride, sodium acid fluoride, potassium acid fluoride, potassium fluorosilicate, potassium hexafluorophosphate, magnesium fluoride, calcium fluoride, strontium fluoride, barium fluoride, zinc fluoride, aluminum fluoride, stannous fluoride, lead fluoride, and antimony trifluoride; and the like.
These fluorine compounds (B) may be used alone or in combination of 2 or more.
In the present specification, a fluorine-containing inorganic acid such as hydrogen fluoride is classified as the component (B).
Among them, the fluorine compound (B) used in one embodiment of the present invention is preferably a fluoride. In the present specification, "fluoride" means that a fluorine atom is capable of forming an anion (F)-) The compound in the state of (1) is more specifically dissolved when blended to form a chemical polishing liquid, and fluorine ions (F) can be generated in the chemical polishing liquid-) The compound of (1).
Examples of such fluoride include ammonium fluoride, ammonium acid fluoride, cerium fluoride, silicic acid fluoride (hexafluorosilicic acid), phosphorus fluoride (phosphorus trifluoride, phosphorus pentafluoride), fluoroboric acid (tetrafluoroboric acid), ammonium borate fluoride, monoethanolamine hydrogen fluoride, methylamine hydrogen fluoride, ethylamine hydrogen fluoride, propylamine hydrogen fluoride, tetramethylammonium fluoride, tetraethylammonium fluoride, triethylmethylammonium fluoride, trimethylhydroxyethylammonium fluoride, tetraethoxyammonium fluoride, methyltriethoxyammonium fluoride, hydrogen fluoride, lithium fluoride, sodium acid fluoride, potassium acid fluoride, potassium silicate fluoride, and potassium hexafluorophosphate.
The fluorine compound (B) used in one embodiment of the present invention is preferably a fluoride, and among the fluorides, 1 or more selected from the group consisting of acid ammonium fluoride, acid potassium fluoride, ammonium fluoride and hydrogen fluoride is particularly preferable, and acid ammonium fluoride is particularly preferable.
< inorganic acid (C): component (C) >
The chemical polishing liquid of the present invention contains 20 to 55 mass% of an inorganic acid (C) which is not a fluorine compound (B) based on the total amount (100 mass%) of the chemical polishing liquid.
A chemical polishing liquid containing less than 20% by mass or more than 55% by mass of the inorganic acid (C) is likely to cause defects such as a reduction in the smoothness of the surface of aluminum or the like, and difficulty in imparting a desired gloss. In addition, such a chemical polishing liquid has disadvantages that the reaction of aluminum and the like is likely to progress rapidly, and therefore, the working safety is deteriorated and the surface after polishing is likely to become rough.
From the above viewpoint, the content of the inorganic acid (C) in the chemical polishing liquid according to one embodiment of the present invention is preferably 20 to 50% by mass, more preferably 22 to 45% by mass, still more preferably 25 to 45% by mass, particularly preferably 30 to 45% by mass, and may be 35 to 40% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
The inorganic acid (C) used in one embodiment of the present invention includes, for example, 1 or more selected from phosphoric acid, sulfuric acid, hydrochloric acid, and nitric acid, but preferably contains phosphoric acid from the viewpoint of forming a chemical polishing liquid capable of improving the smoothness of the surface of aluminum or the like and imparting excellent gloss.
The content ratio of phosphoric acid in the inorganic acid (C) used in one embodiment of the present invention is preferably 70 to 100% by mass, more preferably 80 to 100% by mass, even more preferably 90 to 100% by mass, even more preferably 95 to 100% by mass, and particularly preferably 100% by mass, based on the total amount (100% by mass) of the inorganic acid (C).
The chemical polishing liquid containing nitric acid has an environmental problem that nitric acid is decomposed during surface treatment of aluminum or the like to generate toxic nitrogen oxides. Further, since decomposition of nitric acid generates heat, for example, when a chemical polishing liquid containing nitric acid is used for a metal part of an aluminum fastener fixed to a cloth made of a polyester material, the polyester material may be deteriorated due to the heat generation, and the cloth may be discolored.
From the viewpoint of suppressing such a disadvantage, the chemical polishing liquid according to one embodiment of the present invention preferably contains a smaller amount of nitric acid.
The content of nitric acid in the inorganic acid (C) used in one embodiment of the present invention is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, still more preferably 0 to 1% by mass, and particularly preferably 0% by mass, based on the total amount (100% by mass) of the inorganic acid (C).
< hydrocarbon compound containing hydroxyl group (D): component (D) >
The chemical polishing liquid of the present invention contains 2 to 15 mass% of a hydroxyl group-containing hydrocarbon compound (D) based on the total amount (100 mass%) of the chemical polishing liquid.
A chemical polishing liquid containing less than 2 mass% or more than 15 mass% of the hydroxyl group-containing hydrocarbon compound (D) is likely to cause defects such as a reduction in the smoothness of the surface of aluminum or the like after polishing, and difficulty in imparting a desired gloss. In addition, such a chemical polishing liquid has disadvantages that the reaction of aluminum and the like is likely to progress rapidly, and therefore, the working safety is deteriorated and the surface after polishing is likely to become rough.
From the above viewpoint, the content of the hydrocarbon compound (D) containing hydroxyl groups in the chemical polishing liquid according to one embodiment of the present invention is preferably 3 to 12% by mass, more preferably 4 to 10% by mass, and particularly preferably 5 to 8% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
In the chemical polishing liquid according to one embodiment of the present invention, the content ratio [ (C)/(D) ] of the component (C) and the component (D) is preferably 2 to 25, more preferably 2.5 to 20, further preferably 3 to 16, particularly preferably 3.5 to 12, and may be 4 to 12, or may be 5 to 12 in terms of the mass ratio.
When the content ratio is 2 or more, a chemical polishing liquid can be formed which can improve the smoothness of the surface of aluminum or the like after polishing and can impart excellent gloss. On the other hand, when the content ratio is 25 or less, a chemical polishing liquid having excellent operation stability can be formed while maintaining these good characteristics.
The hydroxyl group-containing hydrocarbon compound (D) used in one embodiment of the present invention may be a compound having at least one hydroxyl group in the main chain and/or side chain of a hydrocarbon composed of a carbon atom and an oxygen atom, but is preferably 1 or more selected from the group consisting of monohydric alcohol, polyhydric alcohol, and glycol ether compounds having 2 or more carbon atoms from the viewpoint of forming a chemical polishing liquid which can improve the smoothness of the surface of aluminum or the like after polishing and can impart excellent gloss, and from the viewpoint of forming a chemical polishing liquid which is excellent in working safety.
From the same viewpoint as described above, the hydroxyl group-containing hydrocarbon compound (D) is preferably a compound having an alcoholic hydroxyl group.
In the present specification, the "alcoholic hydroxyl group" refers to a hydroxyl group other than the "phenolic hydroxyl group" which is a hydroxyl group directly bonded to a carbon atom of an aromatic ring as a hydroxyl group directly bonded to a carbon atom constituting a chain hydrocarbon structure or an alicyclic hydrocarbon structure.
Therefore, the hydroxyl group-containing hydrocarbon compound (D) preferably has no phenolic hydroxyl group.
Examples of the monohydric alcohol having 2 or more carbon atoms include ethanol, n-propanol, isopropanol, n-butanol, 2-butanol, pentanol, hexanol, dodecanol, stearyl alcohol, and benzyl alcohol.
The carbon number of the monohydric alcohol is preferably 2 to 20, more preferably 2 to 16.
Examples of the polyhydric alcohol include dihydric alcohols such as polyalkylene glycols such as ethylene glycol, diethylene glycol, propylene glycol, polyethylene glycol, and polypropylene glycol, 1, 3-propanediol, 1, 2-butanediol, 1, 3-butanediol, 1, 4-butanediol, 2, 3-butanediol, 3-methyl-1, 3-butanediol, triethylene glycol, 1, 2-pentanediol, 1, 3-pentanediol, 1, 4-pentanediol, 2, 4-pentanediol, 1, 5-pentanediol, 1, 2-hexanediol, 1, 6-hexanediol, 1, 3-hexanediol, 2, 5-hexanediol, 1, 5-hexanediol, 2, 4-trimethyl-1, 3-pentanediol, and phenyl glycol; triols such as glycerin, 1,2, 6-hexanetriol, 2-ethyl-1, 3-hexanediol, ethyl-1, 2, 4-butanetriol, 1,2, 3-butanetriol and 3-methylpentane-1, 3, 5-triol; and tetrahydric or higher alcohols such as sorbitol.
Examples of the glycol ether compound include ethylene glycol monoalkyl ether (ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, etc.), ethylene glycol monophenyl ether, ethylene glycol monobenzyl ether, diethylene glycol monoalkyl ether (diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, etc.), triethylene glycol monoalkyl ether (triethylene glycol monobutyl ether, etc.), tetraethylene glycol monoalkyl ether (tetraethylene glycol monomethyl ether, etc.), propylene glycol monoalkyl ether (propylene glycol monomethyl ether, propylene glycol monoethyl ether, etc.), dipropylene glycol monoalkyl ether (dipropylene glycol monomethyl ether, etc.), and the like.
Among them, the hydroxyl group-containing hydrocarbon compound (D) is preferably at least 1 selected from the group consisting of a hydroxyl group-containing aliphatic hydrocarbon compound and a hydroxyl group-containing alicyclic hydrocarbon compound, from the viewpoint of forming a chemical polishing liquid which can improve the smoothness of the surface of aluminum or the like after polishing and can impart excellent gloss, and from the viewpoint of forming a chemical polishing liquid which is excellent in operational safety.
In the chemical polishing liquid according to one embodiment of the present invention, from the viewpoint of forming a chemical polishing liquid capable of improving the smoothness of the surface of aluminum or the like after polishing and imparting excellent gloss, and from the viewpoint of forming a chemical polishing liquid excellent in work safety, the hydroxyl group-containing hydrocarbon compound (D) is preferably at least 1 selected from the group consisting of glycol and glycol ether compounds, more preferably at least 1 aliphatic hydrocarbon compound or alicyclic hydrocarbon compound selected from the group consisting of glycol and glycol ether compounds, still more preferably at least 1 selected from the group consisting of (poly) alkylene glycols and ethylene glycol monoalkyl ethers, still more preferably (poly) alkylene glycols, and particularly preferably polyethylene glycol.
In the present specification, the term "(poly) alkylene glycol" is used as a term indicating both "alkylene glycol" and "polyalkylene glycol".
The number average molecular weight (Mn) of the polyalkylene glycol such as polyethylene glycol or polypropylene glycol is preferably 100 to 8000, more preferably 200 to 5000, further preferably 300 to 3000, particularly preferably 400 to 1500.
In the present specification, the number average molecular weight (Mn) is a value in terms of standard polystyrene measured by a Gel Permeation Chromatography (GPC) method.
< dilution solvent >
The chemical polishing liquid according to one embodiment of the present invention may further contain a diluting solvent such as water or an organic solvent (excluding the solvent belonging to the component (D)).
The diluting solvent is preferably water from the viewpoint of solubility of the components (a) to (D).
The water is not particularly limited, but is preferably water obtained by removing metal ions, organic impurities, particles, and the like by distillation, ion exchange treatment, filter treatment, various adsorption treatments, and the like, more preferably pure water, and particularly preferably ultrapure water.
In the chemical polishing liquid according to one embodiment of the present invention, the content of water is preferably 5 to 80% by mass, more preferably 15 to 65% by mass, even more preferably 20 to 55% by mass, even more preferably 23 to 53% by mass, and particularly preferably 25 to 50% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
< active ingredients other than the ingredients (A) to (D) >)
The chemical polishing liquid according to one embodiment of the present invention may further contain other active ingredients than the ingredients (a) to (D) within a range not impairing the effects of the present invention.
Examples of the other active ingredients include surfactants and hydrogen peroxide stabilizers.
However, in the chemical polishing liquid according to one embodiment of the present invention, from the viewpoint of forming a chemical polishing liquid which can impart excellent gloss to the surface of aluminum or the like and can form a smooth surface, the content of the amine compound selected from the group consisting of aminophenols and benzamides is preferably smaller.
In the present specification, the aminophenol refers to a compound having an aminophenol skeleton, and includes, for example, a compound in which at least one hydrogen of the aminophenol is substituted with an optional substituent. In addition, the benzamide also refers to a compound having a benzamide skeleton, and includes, for example, a compound in which at least one hydrogen of benzamide is substituted with an arbitrary substituent, and the like.
From the above viewpoint, the content of the amine compound is preferably less than 0.15 part by mass, more preferably less than 0.10 part by mass, still more preferably less than 0.05 part by mass, yet still more preferably less than 0.01 part by mass, and particularly preferably less than 0.001 part by mass, based on 100 parts by mass of the total amount of the components (a) to (D) in the chemical polishing liquid.
The content of the amine compound is preferably less than 0.1% by mass, more preferably less than 0.01% by mass, still more preferably less than 0.005% by mass, yet still more preferably less than 0.001% by mass, and particularly preferably less than 0.0001% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
In the chemical polishing liquid according to one embodiment of the present invention, from the viewpoint of forming a chemical polishing liquid capable of smoothing the surface of aluminum or the like, a smaller amount of azole is more preferable.
In the present specification, an azole means a compound having a 5-membered heterocyclic ring containing at least one nitrogen atom, and examples thereof include triazole, benzotriazole, tetrazole, imidazole, benzimidazole, thiazole and the like.
From the above viewpoint, the content of the azole is preferably less than 1 part by mass, more preferably less than 0.1 part by mass, further preferably less than 0.01 part by mass, and particularly preferably less than 0.001 part by mass, based on 100 parts by mass of the total amount of the components (a) to (D) in the chemical polishing liquid.
The content of the azole is preferably less than 0.1% by mass, more preferably less than 0.01% by mass, still more preferably less than 0.001% by mass, and particularly preferably less than 0.0001% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
The chemical polishing liquid according to one embodiment of the present invention is preferably a solution, that is, preferably substantially free of solid particles such as polishing particles.
In the present specification, "solid particles" mean particles having a particle diameter of 0.01 μm or more that do not dissolve in a chemical polishing liquid.
The phrase "substantially not containing solid particles" means not only a mode in which solid particles are mixed in a chemical polishing liquid for a predetermined purpose but also a mode in which solid particles are not inevitably contained in the chemical polishing liquid. However, even in the embodiment in which solid particles are inevitably contained, the content of the solid particles is preferably as small as possible.
The content of the solid particles is preferably less than 0.1% by mass, more preferably less than 0.01% by mass, still more preferably less than 0.001% by mass, and particularly preferably less than 0.0001% by mass, based on the total amount (100% by mass) of the chemical polishing liquid.
The chemical polishing liquid according to one embodiment of the present invention can be repeatedly used for surface treatment even after being used for surface treatment of aluminum or an aluminum alloy once.
Therefore, the chemical polishing liquid according to one embodiment of the present invention may contain metal atoms other than aluminum contained in aluminum or aluminum alloy eluted from aluminum or the like as a surface treatment object.
On the other hand, in the chemical polishing liquid according to one embodiment of the present invention, the content of the metal-containing compound is preferably smaller. Here, the metal-containing compound refers to an additive (e.g., a tungsten compound) containing a metal to be blended for a predetermined purpose, and is distinguished from a metal component eluted from aluminum or the like as a surface treatment object.
The content of the metal-containing compound is preferably less than 10 parts by mass, more preferably less than 5 parts by mass, still more preferably less than 1 part by mass, and particularly preferably less than 0.1 part by mass, based on 100 parts by mass of the total amount of the components (a) to (D) in the chemical polishing liquid.
< aluminum, aluminum alloy >
The chemical polishing slurry of the present invention can be suitably used for surface treatment of aluminum or an aluminum alloy.
Examples of the aluminum alloy as the object of the surface treatment include a pure aluminum-based aluminum alloy having an aluminum content of 99 mass% or more, an aluminum-copper-based aluminum alloy mainly containing copper other than aluminum, an aluminum-manganese-based aluminum alloy mainly containing manganese other than aluminum, and an aluminum-magnesium alloy mainly containing magnesium other than aluminum.
More specific examples of the aluminum alloy include pure aluminum-based a1100 alloy, a1085 alloy, and a1050 alloy, which are aluminum alloys for stretching defined in JIS H4140; an aluminum-copper-based a2024 alloy; an aluminum-manganese-based a3003 alloy; a5052 alloy of aluminum-magnesium system; all alloys such as A1000-7000 series (corrosion-resistant aluminum alloy, high-strength aluminum alloy, heat-resistant aluminum alloy, etc.) and casting aluminum alloys such as ADC 1-12 kinds (aluminum alloys for die casting).
The composition of the aluminum alloy includes, for example, a composition produced in such a manner that the content of each metal atom is in the following range with respect to the total mass (100 mass%) of the aluminum alloy.
Silicon (Si): 1.5% by mass or less
Iron (Fe): 1.0 mass% or less
Copper (Cu): 8.0 mass% or less
Manganese (Mn): 2.0 mass% or less
Magnesium (Mg): 6.0 mass% or less
Chromium (Cr): 0.50% by mass or less
Zinc (Zn): 8.0 mass% or less
Titanium (Ti): 0.30% by mass or less
Vanadium (V): 0.25% by mass or less
Bismuth (Bi): 1.0 mass% or less
Lead (Pb): 1.0 mass% or less
The balance being aluminum (Al) and unavoidable impurities.
In addition, table 1 exemplifies the compositions of aluminum alloys, but the compositions are not limited to them.
[ Table 1]
The aluminum alloy may be an aluminum alloy for casting, an aluminum alloy for stretching, a part formed into a predetermined shape by a die casting method, a part formed into a predetermined shape by machining, or a laminated aluminum alloy.
The stretching aluminum alloy may be a plate material or the like as an intermediate material, or may be a part formed into a predetermined shape by machining such as hot press working.
The shape of the laminated aluminum alloy is also not particularly limited, and may be, for example, a plate shape, a columnar shape, or any shape suitable for the purpose.
Further, the aluminum or aluminum alloy as the object of the surface treatment may be present in the form of an article including aluminum or aluminum alloy and a non-metallic material, such as a metal part of an aluminum fastener fixed to a cloth made of a polyester material.
[ method for treating surface of aluminum or aluminum alloy and method for producing the same ]
The present invention also provides a surface treatment method of aluminum or an aluminum alloy (hereinafter, also simply referred to as "surface treatment method") according to [1] below and a production method of aluminum or an aluminum alloy (hereinafter, also simply referred to as "production method") having undergone surface treatment according to [2] below.
[1] A method for surface treatment of aluminum or an aluminum alloy, wherein the surface treatment of aluminum or an aluminum alloy is carried out using the chemical polishing liquid of the present invention.
[2] A method for producing surface-treated aluminum or aluminum alloy, comprising the step of performing surface treatment of aluminum or aluminum alloy using the chemical polishing liquid of the present invention.
The chemical polishing liquid used in the surface treatment method and the production method of the present invention and the aluminum or aluminum alloy as the object of the surface treatment are described in detail above.
In the surface treatment method and the production method according to one aspect of the present invention, the aluminum or the like as the object to be surface-treated may be present in the form of an article including aluminum or an aluminum alloy and a non-metallic material, such as a metal part of an aluminum fastener fixed to a cloth made of a polyester material.
In the surface treatment method and the manufacturing method according to one aspect of the present invention, in the step, the chemical polishing liquid is preferably brought into contact with aluminum or an aluminum alloy as a surface treatment object to perform surface treatment of the aluminum or the aluminum alloy. The chemical polishing liquid is preferably brought into contact with aluminum or an aluminum alloy by immersing the aluminum or the aluminum alloy as a surface treatment object in the chemical polishing liquid, and another method includes a method of applying or spreading (for example, spraying) the chemical polishing liquid on the surface of the aluminum or the aluminum alloy.
In this case, the aluminum or aluminum alloy may be mechanically polished in advance, or may be heated and then brought into contact with a chemical polishing liquid (preferably, immersed in the chemical polishing liquid) as needed.
The temperature of the chemical polishing liquid for surface treatment of aluminum or an aluminum alloy is preferably 40 to 80 ℃, more preferably 45 to 75 ℃, and still more preferably 50 to 70 ℃.
If the temperature of the chemical polishing liquid is 40 ℃ or higher, the surface treatment is promoted, and the productivity can be further improved. On the other hand, when the temperature of the chemical polishing liquid is 80 ℃ or lower, for example, even when a metal part of an aluminum fastener fixed to a cloth made of a polyester material is subjected to surface treatment, the polyester material can be inhibited from being deteriorated.
The surface treatment time of aluminum or an aluminum alloy is appropriately set according to the composition and size of the aluminum or an aluminum alloy to be surface-treated, the presence or absence of preheating, and the temperature of the chemical polishing liquid, but is preferably 1 second to 10 minutes, more preferably 30 seconds to 7 minutes, and still more preferably 60 seconds to 5 minutes.
In the surface treatment method and the production method according to one embodiment of the present invention, the contact (preferably, immersion in the chemical polishing liquid) of the aluminum or the aluminum alloy as the object of the surface treatment with the chemical polishing liquid may be performed only 1 time or more.
The surface-treated aluminum or aluminum alloy obtained by the surface treatment method and the production method according to one embodiment of the present invention has a smooth surface and excellent gloss.
The arithmetic average height (Sa) of the surface-treated aluminum or aluminum alloy is influenced by the arithmetic average height (Sa) of the aluminum or aluminum alloy before treatment and the type of the aluminum alloy, and is not particularly limited.
However, for example, the arithmetic average height (Sa) after surface treatment in aluminum having an arithmetic average height (Sa) before surface treatment of 150 to 250nm or an aluminum alloy described in JIS H4140 is preferably not more than the arithmetic average height (Sa) before surface treatment, more preferably not more than 200nm (of these, not more than the arithmetic average height (Sa) before surface treatment), still more preferably not more than 140nm, still more preferably not more than 110nm, still more preferably not more than 90nm, and particularly preferably not more than 70 nm. The lower limit of the arithmetic average height (Sa) after the surface treatment is not particularly limited, but is usually 1nm or more, preferably 5nm or more.
In the present specification, the arithmetic mean height (Sa) is a value measured according to ISO25178, specifically, a value measured by the method described in examples.
The glossiness of the surface-treated aluminum or aluminum alloy is not particularly limited since it is influenced by the glossiness of the aluminum or aluminum alloy before the treatment.
However, for example, the gloss before surface treatment in aluminum having a gloss of 200 to 350 or an aluminum alloy described in JIS H4140 is preferably not less than the gloss before surface treatment, more preferably not less than 200 (of these, not less than the gloss before surface treatment), further preferably not less than 300, further preferably not less than 360, further preferably not less than 400, particularly preferably not less than 500, and usually not more than 1000.
In the present specification, the gloss is a value measured according to ISO2813, specifically, a value measured by the method described in examples.
Examples
The present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
The physical properties of the chemical polishing liquids and the physical properties of the aluminum alloys in the examples and comparative examples were determined as follows.
(1) pH of chemical polishing solution
The pH of the chemical polishing liquid was measured at 25 ℃ according to JIS Z8802 using a pH meter (product name "D-53" manufactured by horiba, Ltd.).
(2) Arithmetic mean height of aluminium alloy sheet (Sa)
The arithmetic mean height (Sa) of the aluminum alloy sheet was measured according to ISO25178 using a laser microscope (KEYENCE CORPORATION, product name "VK-X250").
(3) Gloss of aluminum alloy sheet
The gloss of the aluminum alloy sheet was measured according to ISO2813 using a gloss meter (product name "Truegloss GM-26 PRO/Touch" of color technology research institute in village, K.K.).
Example 1
(1) Production of chemical polishing liquid
5 parts by mass (as an effective component ratio of hydrogen peroxide) of hydrogen peroxide (60% by mass aqueous solution manufactured by Mitsubishi Gas Chemical Company, Inc.), 15 parts by mass (10 parts by mass in terms of fluorine atoms) of ammonium acid fluoride (manufactured by Daghuazai Chemical Co., Ltd.), and 40 parts by mass (as H) of phosphoric acid (85% by mass aqueous solution manufactured by Rasa Industries, LTD)3PO4The effective component ratio of (a), and 7 parts by mass of polyethylene glycol (product name "PEG 600" manufactured by first industrial pharmaceutical co., ltd.) were mixed, and further diluted with water to prepare a chemical polishing liquid (1) having an effective component concentration of 67% by mass.
The pH of the produced chemical polishing slurry (1) was 2.0.
(2) Surface treatment of aluminum alloy sheet
An aluminum alloy sheet (I) having a thickness of 1.5mm and a length of 20 × a width of 50mm (JIS a5052P-H34, an arithmetic mean height (Sa) of 150nm, a gloss of 304, and a composition corresponding to alloy number a5052 of table 1) was used as an object of surface treatment.
The aluminum alloy sheet (I) was immersed in the chemical polishing solution (1) prepared as described above at a liquid temperature of 60 ℃ for 2 minutes. And then taking out the immersed aluminum alloy sheet (I) from the chemical grinding liquid (1), fully washing the aluminum alloy sheet with ion exchange water, and fully drying the aluminum alloy sheet to obtain the surface treatment alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 65nm and the gloss was 390.
Comparative example 1
A chemical polishing liquid (2) was produced in the same manner as in example 1, except that the amount of phosphoric acid added was not added, and 40 parts by mass of the amount added as the effective component ratio of phosphoric acid was replaced with water. The pH of the produced chemical polishing slurry (2) was 2.0.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (2) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 224nm, and the gloss was 40.
Example 2
A surface-treated alloy was obtained by performing a surface treatment using the same chemical polishing liquid (1) as the chemical polishing liquid produced in example 1 except that an aluminum alloy sheet (II) having a thickness of 0.4mm and a length of 30 × a width of 50mm (JIS a1100P-H14, an arithmetic mean height (Sa) of 94nm, a gloss of 463, and a composition corresponding to alloy No. a1100 in table 1) was used as a target of the surface treatment.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 20nm and the glossiness was 745.
Comparative example 2
A surface-treated alloy was obtained in the same manner as in example 2 by using the same chemical polishing liquid (2) as the chemical polishing liquid produced in comparative example 1 for the same aluminum alloy sheet (II) as in example 2.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 233nm and the gloss was 120.
Comparative example 3
A chemical polishing liquid (3) was produced in the same manner as in example 1, except that no polyethylene glycol was added, and that 7 parts by mass of the amount added as the effective component ratio of polyethylene glycol was replaced with water.
The pH of the manufactured chemical polishing slurry was 4.5.
Next, the same aluminum alloy sheet (II) as in example 2 was surface-treated with the chemical polishing liquid (3) at a liquid temperature of 60 ℃ for the same time as in example 2, but the reaction rapidly proceeded and the chemical polishing liquid (3) overflowed from the vessel, and thus a surface-treated alloy was obtained after the treatment time of 1 minute.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 42nm, and the glossiness was 607.
The results of examples 1 to 2 and comparative examples 1 to 3 are summarized in Table 2.
[ Table 2]
As is clear from table 2, in examples 1 and 2, when the surface treatment of the aluminum alloy was performed using the produced chemical polishing liquid (1), the surface of the aluminum alloy was polished to be smooth and a surface having high glossiness was formed.
On the other hand, in comparative examples 1 and 2, when the surface treatment of the aluminum alloy was performed using the produced chemical polishing liquid (2), the reaction rapidly proceeded, and as a result, the arithmetic average height (Sa) of the surface of the aluminum alloy was increased and the glossiness of the surface was also decreased compared to that before the surface treatment.
In addition, in the case of surface treatment of an aluminum alloy using the chemical polishing liquid (3) produced in comparative example 3, the reaction proceeded rather rapidly, and therefore the treatment time had to be 1 minute, which resulted in a problem in work safety.
Example 3
A chemical polishing liquid (4) having an active ingredient concentration of 77 mass% was produced in the same manner as in example 1, except that the blending amount of hydrogen peroxide was "15 parts by mass (as an active ingredient ratio of hydrogen peroxide)" and the blending amount of water was "23 parts by mass". The pH of the produced chemical polishing liquid (4) was 1.60.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (4) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 61nm and the glossiness was 520.
Example 4
A chemical polishing liquid (5) having an active ingredient concentration of 52 mass% was produced in the same manner as in example 1, except that the amount of phosphoric acid added was "25 parts by mass" and the amount of water added was "48 parts by mass". The pH of the produced chemical polishing slurry (5) was 2.90.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (5) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 51nm, and the glossiness was 520.
Example 5
A chemical polishing liquid (6) having an active ingredient concentration of 62 mass% was produced in the same manner as in example 1, except that the blending amount of polyethylene glycol was changed to "2 parts by mass" and the blending amount of water was changed to "38 parts by mass". The pH of the produced chemical polishing slurry (6) was 2.20.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (6) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 104nm and the gloss was 350.
Example 6
A chemical polishing liquid (7) having an active ingredient concentration of 67 mass% was produced in the same manner as in example 1, except that 7 parts by mass of "ethylene glycol monobutyl ether" was added instead of "polyethylene glycol". The pH of the produced chemical polishing slurry (7) was 2.20.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (7) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 130nm, and the gloss was 300.
Example 7
A chemical polishing liquid (8) having an active ingredient concentration of 67 mass% was produced in the same manner as in example 1, except that 7 parts by mass of "propylene glycol" was added instead of "polyethylene glycol". The pH of the produced chemical polishing slurry (8) was 2.20.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (8) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 105nm, and the gloss was 300.
Example 8
A chemical polishing liquid (9) having an active ingredient concentration of 57 mass% was produced in the same manner as in example 1, except that the blending amount of the acid ammonium fluoride was "5 parts by mass (3 parts by mass in terms of fluorine atoms)" and the blending amount of the water was "43 parts by mass". The pH of the produced chemical polishing slurry (9) was 1.90.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (9) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 100nm and the gloss was 240.
Example 9
A chemical polishing liquid (10) having an active ingredient concentration of 75 mass% was produced in the same manner as in example 1, except that the blending amount of polyethylene glycol was "15 parts by mass" and the blending amount of water was "25 parts by mass". The pH of the produced chemical polishing slurry (10) was 2.10.
Next, the same aluminum alloy sheet (I) as in example 1 was subjected to surface treatment using the chemical polishing liquid (10) in the same manner as in example 1 to obtain a surface-treated alloy.
The arithmetic average height (Sa) of the obtained surface-treated alloy was 109nm and the gloss was 280.
The results of examples 3 to 9 are summarized in Table 3.
[ Table 3]
From table 3, it was confirmed that when the surface treatment of the aluminum alloy was performed using the chemical polishing liquids (4) to (10) produced in examples 3 to 9, the surface of the aluminum alloy was polished to be smooth and to form a high-gloss surface.
Claims (12)
1. A chemical polishing liquid for aluminum or aluminum alloy,
which comprises hydrogen peroxide (A), a fluorine compound (B), an inorganic acid (C) which is not the fluorine compound (B), and a hydrocarbon compound (D) having a hydroxyl group,
the content of the hydrogen peroxide (A) is 2-20% by mass based on the total amount of the chemical polishing liquid,
the fluorine compound (B) is contained in an amount of 3 to 17% by mass in terms of fluorine atoms based on the total amount of the chemical polishing liquid,
the content of the inorganic acid (C) is 20-55 mass% based on the total amount of the chemical polishing liquid,
the content of the hydroxyl group-containing hydrocarbon compound (D) is 2 to 15 mass% based on the total amount of the chemical polishing liquid.
2. The chemical polishing solution according to claim 1, wherein the chemical polishing solution has a pH of 4 or less.
3. The chemical polishing solution according to claim 1 or 2, wherein the fluorine compound (B) is 1 or more selected from the group consisting of acid ammonium fluoride, acid potassium fluoride, ammonium fluoride and hydrogen fluoride.
4. The chemical polishing solution according to any one of claims 1 to 3, wherein the inorganic acid (C) contains phosphoric acid.
5. The chemical polishing solution according to any one of claims 1 to 4, wherein the hydroxyl group-containing hydrocarbon compound (D) is at least 1 selected from the group consisting of monohydric alcohol having 2 or more carbon atoms, polyhydric alcohol, and glycol ether compound.
6. The chemical polishing solution according to any one of claims 1 to 5, wherein a content ratio [ (C)/(D) ] of the inorganic acid (C) to the hydroxyl group-containing hydrocarbon compound (D) is 2 to 25 in terms of a mass ratio.
7. A method for surface treatment of aluminum or an aluminum alloy, wherein the chemical polishing liquid according to any one of claims 1 to 6 is used for surface treatment of aluminum or an aluminum alloy.
8. The surface treatment method according to claim 7, wherein the temperature of the chemical polishing liquid at the time of the surface treatment of aluminum or an aluminum alloy is 40 to 80 ℃.
9. The surface treatment method according to claim 7 or 8, wherein the surface treatment of aluminum or an aluminum alloy is performed for 1 second or more and 10 minutes or less.
10. A method for producing surface-treated aluminum or aluminum alloy, comprising the step of performing surface treatment of aluminum or aluminum alloy using the chemical polishing liquid according to any one of claims 1 to 6.
11. A surface-treated aluminum or aluminum alloy, wherein the arithmetic average height (Sa) of the aluminum or aluminum alloy after surface treatment with the chemical polishing liquid according to any one of claims 1 to 6 is 200nm or less (wherein the arithmetic average height (Sa) is not more than before surface treatment) for aluminum having an arithmetic average height (Sa) of 150 to 250nm as measured according to ISO25178 before surface treatment or for an aluminum alloy described in JIS H4140.
12. A surface-treated aluminum or aluminum alloy, wherein the aluminum or aluminum alloy having a gloss measured according to ISO2813 before surface treatment of 200 to 350 or the aluminum alloy described in JIS H4140 has a gloss of 150 or more (wherein the gloss is not less than the gloss before surface treatment) after surface treatment using the chemical polishing liquid according to any one of claims 1 to 6.
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| JP2018164437 | 2018-09-03 | ||
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| PCT/JP2019/034388 WO2020050204A1 (en) | 2018-09-03 | 2019-09-02 | Chemical polishing liquid and surface treatment method using same |
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| CN113390911B (en) * | 2021-05-26 | 2023-02-07 | 中国工程物理研究院材料研究所 | Extracting corrosive agent and extracting method for beryllium phase three-dimensional microscopic morphology of beryllium-aluminum alloy |
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| JP2004298938A (en) * | 2003-03-31 | 2004-10-28 | Kobe Steel Ltd | Aluminum sheet and aluminum foil and method for manufacturing them |
| JP2012143798A (en) * | 2011-01-13 | 2012-08-02 | Hikari Keikinzoku Kogyo Kk | Plated aluminum alloy casting and method for production thereof |
| JP5608133B2 (en) * | 2011-06-14 | 2014-10-15 | 株式会社神戸製鋼所 | Method for manufacturing aluminum substrate for magnetic recording medium |
| CN106757039B (en) * | 2017-02-23 | 2019-03-26 | 浙江大学 | A kind of alumina polishing fluid and preparation method thereof |
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- 2019-09-02 WO PCT/JP2019/034388 patent/WO2020050204A1/en active Application Filing
- 2019-09-02 JP JP2020541202A patent/JP7310826B2/en active Active
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| JPWO2020050204A1 (en) | 2021-08-26 |
| CN112585299B (en) | 2023-09-22 |
| WO2020050204A1 (en) | 2020-03-12 |
| TW202020227A (en) | 2020-06-01 |
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