TW202013063A - Photomask protection component structure by which the quantity of residual adhesives is reduced, the exposed thickness of the adhesive is reduced, and the generated haze is also reduced - Google Patents

Abstract

This invention discloses a photomask protection component structure including a framework and a protective film. The framework is shaped like an annular frame. Two grooves surrounding the framework are recessed in the bottom surface of the framework. A concave-convex wall surface is formed between the two grooves, and a plurality of continuously arranged concave parts and convex parts are formed on the concave-convex wall surface. The protective film is fitted to the top surface of the framework. In this way, each of the grooves and each of the concave parts are filled with an adhesive, and the framework can be adhered to the surface of a photomask component by virtue of the adhesive. A chamber is formed between the protective film and the photomask component in the framework. Because the two grooves are matched with the plurality of concave parts and convex parts, the adhesive strength of the adhesive in the grooves is greatly improved. Therefore, it is easier to separate the framework from the surface of the photomask component, meanwhile, the quantity of residual adhesives is reduced, the exposed thickness of the adhesive is reduced, and the generated haze is also reduced.

Description

Photomask protection component structure

The invention relates to a structure of a photomask protection component, which is a protective frame used for being combined with a photomask component of a semiconductor manufacturing process and used for isolating external contaminants.

In the current semiconductor device manufacturing technology, the circuit pattern of the semiconductor device is transferred to the surface of the silicon wafer through a lithography process, specifically, a light source of a specific wavelength is projected through a photomask To transfer the circuit pattern on the photomask to the surface of the silicon wafer.

Generally, a photomask component is provided with a protective component outside the circuit pattern on the surface, and usually the protective component is adhered to the photomask component on the bottom surface through an adhesive with a height of 0.2 mm to 1 mm, and the top surface of the protective component It is covered with a layer of protective film to protect the circuit pattern on the surface of the photomask assembly, so as to prevent fine dust from falling into the surface of the photomask and causing circuit exposure failure.

However, at present, the adhesive is usually a source of released contaminants. Therefore, after being used for a period of time, the circuit pattern on the surface of the reticle assembly must be contaminated, causing the reticle assembly to be cleaned. The premise of cleaning the reticle assembly is to The protective component is removed from the surface of the photomask component. However, since there is an adhesive between the surface of the photomask component and the protective component, after separation, a lot of adhesive residue will remain on the surface of the photomask component, so Manufacturers often have to repeatedly clean through the solvent before it is possible to remove the residual glue components on the surface of the reticle assembly. If the residual glue is difficult to remove, you must first use a potion or cotton swab to coat the residual glue area and dissolve it. After cleaning, the more the amount of residual glue, the greater the difficulty.

In addition, the height of the adhesive is usually 0.2 mm to 1 mm. Such a height is usually completely exposed to the outside of the frame. This height represents the interval where the adhesive 3 releases contaminants (for example: haze) , So that a large amount of pollutants are released, causing pollution on the surface of the photomask.

Therefore, if the adhesion strength between the bottom of the protective component and the adhesive can be increased, it is easier to separate the protective component from the surface of the photomask component when the photomask is separated from the frame, and the residual on the surface of the photomask component The amount of glue will also be greatly reduced, as well as the formation of overall pollutants, which is the solution of the invention.

The structure of the photomask protection assembly of the present invention includes a frame and a protective film. The frame is in the shape of a ring frame. Two grooves surrounding the frame are recessed in the bottom surface of the frame. A concave and convex wall surface is formed between them, and a large number of continuously arranged concave and convex portions are formed on the concave and convex wall surface, and the protective film is attached to the top surface of the frame and is transparent, so that each The groove and each of the recesses are used to fill in an adhesive, and through the adhesive, the frame can be adhered to the surface of a reticle assembly, so that the frame is formed between the protective film and the reticle assembly One chamber.

Through the arrangement of two grooves and a large number of concave and convex portions, a large number of concave and convex shapes are formed on the bottom surface of the frame, therefore, the adhesive contact area of the adhesive and the frame is greatly improved, so that the adhesive is in the groove The bonding strength will be greater than the surface of the reticle. Therefore, it is easier to separate the frame from the surface of the reticle assembly. At the same time, the amount of residual glue on the surface of the reticle will be greatly reduced. In addition, due to most of the adhesion The adhesive is filled into each of the grooves, so the thickness of the adhesive exposed outside the groove is reduced to less than 0.1mm, which is equivalent to 2 to 10 times less than conventionally known, which can reduce the release of the adhesive Produced pollutants.

More specifically, the adhesive is acrylic or silicone.

More specifically, the total thickness of the adhesive ranges from 0.3 to 1 mm.

More specifically, the depth of each groove ranges from 0.2 mm to 0.9 mm.

More specifically, the thickness of the adhesive exposed outside the groove is 0.1 mm or less.

More specifically, the shape of the groove is designed to be U-shaped, V-shaped or polygonal.

More specifically, the end of the convex portion is flush with the bottom surface of the frame.

More specifically, the end of the convex portion is retracted into the groove.

More specifically, the end of the convex portion is convex to the bottom surface of the frame

Regarding other technical contents, features and effects of the present invention, it will be clearly presented in the following detailed description of the preferred embodiments with reference to the drawings.

Please refer to Figures 1~3 and 4A, which are respectively a three-dimensional schematic diagram and a cross-sectional schematic diagram of the internal structure of the mask protection component structure of the present invention. As shown in the figure, at least a frame 1 and a protective film 2 are included;

Wherein, the frame 1 is in the shape of a ring frame and can be made of aluminum. There are two grooves 11 along the frame 1 surrounding the bottom of the frame 1, and between the two grooves 11 A concave and convex wall surface 12 is formed, and a large number of continuously arranged concave portions 121 and convex portions 122 are formed on the concave and convex wall surface 12, and the protective film 2 is attached to the top surface of the frame 1;

Please refer to FIGS. 5 and 6, each of the groove 11 and each of the recesses 121 is used to fill in an adhesive 3, and the frame 1 can be adhered to the surface 41 of a photomask assembly 4 through the adhesive 3. A frame 13 is formed in the frame 1 between the protective film 2 and the reticle assembly 4, the reticle assembly 4 is provided with a pattern 42, the adhesive 3 is acrylic glue or silicone, and The range of the total thickness H1 of the adhesive 3 (equivalent to the deepest part of the groove 11 to the outermost part where the adhesive 3 is exposed) is 0.3 to 1 mm, which may include 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8mm, 0.9mm or 1mm, and the groove depth H2 of each groove 11 ranges from 0.2mm to 0.9mm, which may include 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8 mm or 0.9mm, the exposed thickness H3 of the adhesive 3 exposed outside the groove 11 is within 0.1mm, which may include 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, 0.06mm, 0.07mm , 0.08mm, 0.09mm or 0.1mm.

For the structure of the photomask protection component of the present invention, please refer to FIG. 7. After the frame 1 and the photomask component 4 are bonded, the pattern 42 is transferred to the surface of the silicon wafer through the chamber 13 through light of a specific wavelength.

For the structure of the reticle protection assembly of the present invention, please refer to FIG. 8. After the reticle assembly 4 is used after multiple transfers, the adhesive 3 will release contaminants to the chamber 13, so it will be used after a period of time Cleaning is required, so the frame 1 needs to be detached from the reticle assembly 4. When the frame 1 is removed, the thickness of the adhesive 3 in the groove 11 is greater than the exposed thickness, and the groove 11 is provided with two In combination with a large number of the concave portions 121 and the convex portions 122, the contact area between the adhesive 3 and the frame 1 is greatly increased, so that the adhesive strength of the adhesive 3 in the groove 11 will be increased. It is greater than the adhesive strength of the adhesive 3 outside the groove 11, so the frame 1 can be more easily detached from the surface 41 of the photomask assembly 4, and the adhesive 3 can be more completely retained in the frame 1, the amount of residual glue on the surface 41 of the photomask assembly 4 is reduced, or even no residual glue.

For the structure of the photomask protection component of the present invention, please refer to FIG. 4A. The groove 11 is designed to be U-shaped. Please refer to FIGS. 4B and 4C. The shape of the groove 11 can also be designed to be V-shaped or polygonal. .

For the structure of the photomask protection component of the present invention, please refer to FIG. 4A, the end of each convex portion 122 is flush with the bottom surface of the frame 1, please refer to FIG. 4D, and the end of each convex portion 122 can also be retracted As far as the groove 11 is concerned, please refer to FIG. 4E together. The end of each convex portion 122 may also be convex to the bottom surface of the frame 1, and the height of the protrusion is 0.1 mm or less, which is matched with the adhesive 3 The thickness of the groove 11 is 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm, or 0.1 mm.

The structure of the photomask protection component provided by the present invention has the following advantages when compared with other conventional technologies: 1. By combining two grooves with a large number of concave and convex portions, the adhesive and the frame are greatly improved The adhesive contact area makes the adhesion strength of the adhesive in the groove greater than the surface of the reticle. Therefore, it is easier to separate the frame from the surface of the reticle assembly, and at the same time, let the residual on the surface of the reticle The amount of glue will also be greatly reduced. 2. Because the thickness of the adhesive exposed outside the groove is reduced to less than 0.1 mm, and conventionally exposed adhesive with a thickness of 0.2 mm to 1 mm, the pollutants released from the exposed area can be reduced by 2 to 10 times.

The above-mentioned embodiments are disclosed, which are only some of the preferred embodiments of the present invention. However, they are not intended to limit the present invention. Anyone who is familiar with this technical field and has ordinary knowledge will understand the aforementioned technical features and embodiments of the present invention. The equivalent changes or modifications made without departing from the spirit and scope of the present invention still fall within the scope of the present invention, and the patent protection scope of the present invention shall be subject to the definition of the claims attached to this specification.

1: Frame 11: Groove 12: Concave and convex wall 121: Concave part 122: Convex part 13: Chamber 2: Protective film 3: Adhesive 4: Photomask assembly 41: Surface 42: Pattern H1: Total thickness H2: Groove depth H3 : Exposed thickness

[Figure 1] It is a schematic perspective view of the frame of the mask protection assembly structure of the present invention. [Figure 2] is a schematic plan view of the frame structure of the photomask protection component structure of the present invention. [Figure 3] is a schematic cross-sectional view of the frame structure of the photomask protection component structure of the present invention. [FIG. 4A] It is a partial cross-sectional schematic view of the U-shaped groove of the mask protection component structure of the present invention. [Fig. 4B] This is a partial cross-sectional view of the V-shaped groove of the mask protection device structure of the present invention. [Fig. 4C] It is a partial cross-sectional schematic view of the polygonal groove of the mask protection device structure of the present invention. [Fig. 4D] It is a partial cross-sectional schematic diagram of the concave end of the convex portion of the mask protection component structure of the present invention. [Fig. 4E] It is a partial cross-sectional schematic view of the end of the convex part of the structure of the mask protection component of the present invention. [Figure 5] This is a perspective cross-sectional schematic view of a frame combined with a mask assembly of the mask protection assembly structure of the present invention. [Figure 6] This is a schematic cross-sectional view of a frame combined with a reticle assembly of the reticle protection assembly structure of the present invention. [Figure 7] It is a schematic cross-sectional schematic view of the implementation of the transfer structure of the photomask protection component of the present invention. [Figure 8] This is a three-dimensional schematic cross-sectional view of the implementation of the detachment frame of the mask protection assembly structure of the present invention.

1: framework

11: Groove

12: uneven wall

121: recess

122: convex

Claims (10)

A photomask protection component structure includes: a frame, which is ring-shaped, and there are two grooves encircling the frame in the bottom surface of the frame, and a groove is formed between the two grooves A concave-convex wall surface, a large number of continuously arranged concave and convex portions are formed on the concave-convex wall surface; a protective film is attached to the top surface of the frame and is transparent; thereby, each of the grooves and each The concave portion is used to fill in an adhesive, and the frame can be adhered to the surface of a reticle assembly through the adhesive, so that a cavity is formed between the protective film and the reticle assembly in the frame. The structure of a photomask protection component as described in claim 1, wherein the adhesive is acrylic glue or silicone glue. The structure of a photomask protection component as described in claim 1, wherein the total thickness of the adhesive ranges from 0.3 to 1 mm. The structure of a photomask protection component as described in claim 1, wherein the depth of each groove is in the range of 0.2 mm to 0.9 mm. The structure of a photomask protection component as claimed in claim 1, wherein the thickness of the adhesive exposed outside the groove is 0.1 mm or less. The structure of a photomask protection component as described in claim 1, wherein the shape of the groove is designed to be U-shaped, V-shaped or polygonal. The mask protection assembly structure according to claim 1, wherein the end of each convex portion is flush with the bottom surface of the frame. The mask protection assembly structure according to claim 1, wherein the end of each convex portion is retracted into the groove. The mask protection assembly structure according to claim 1, wherein the end of each convex portion is convex to the bottom surface of the frame. The mask protection assembly structure according to claim 1, wherein the height of the end of each convex portion is 0.1 mm or less.

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