TW202007722A - Circuit board structure and composition for forming insulating substrates - Google Patents

Circuit board structure and composition for forming insulating substrates Download PDF

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TW202007722A
TW202007722A TW107125551A TW107125551A TW202007722A TW 202007722 A TW202007722 A TW 202007722A TW 107125551 A TW107125551 A TW 107125551A TW 107125551 A TW107125551 A TW 107125551A TW 202007722 A TW202007722 A TW 202007722A
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insulating substrate
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李弘榮
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佳勝科技股份有限公司
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Abstract

A composition for forming an insulating substrate includes 100 parts by weight of modified liquid crystal polymer and 0.5-85 parts by weight of dielectric filler. The modified liquid crystal polymer has a repeat unit structure of, where Ar is 1,4-phenylene, 1,3-phenylene, 2,6-naphthalene, or 4,4'-biphenylene, Y is -O- or -NH-, and X is a carboxamido group, an imido/imino group, an amidino group, an aminocarbonylamino group, an aminothiocarbonyl group, an aminocarbonyloxy group, an aminosulfonyl group, an aminosulfonyloxy group, an aminosulfonylamino group, a carboxyl ester group, a (carboxyl ester) amino group, an (alkoxycarbonyl) oxy group, an alkoxycarbonyl group, a hydroxyamino group, an alkoxyamino group, a cyanato group, an isocyanato group, or a combination thereof.

Description

電路板結構以及用於形成絕緣基板的 組成物 Circuit board structure and composition for forming an insulating substrate

本發明是有關一種用於形成絕緣基板的組成物以及一種電路板結構。 The invention relates to a composition for forming an insulating substrate and a circuit board structure.

對消費性電子產品來說,系統化構裝(System in Package,SIP)技術所應該展現的主要特色為節省成本與縮小化。而以基板做為整合元件的平台來說,則有兩個方向。其一為運用一般常見的有機材料基板,或是多層印刷電路基板(Printed Wiring Board,PWB);另一者為無機材質的基板,例如矽基板等。後者通常具有與晶片電路或製程相結合的縮小化優勢,但成本則是一個考量指標。而對前者來說,除了具有低成本的特性之外,現今已可藉由精良的製程技術,例如高密度互連(High-Density Interconnection,HDI)技術等,再結合特殊材料複合於其中,則仍然可以達到系統化構裝的要求。 For consumer electronics products, the main features of System in Package (SIP) technology should be cost saving and miniaturization. For a platform that uses a substrate as an integrated component, there are two directions. One is to use a common organic material substrate or a multilayer printed circuit board (Printed Wiring Board, PWB); the other is an inorganic material substrate, such as a silicon substrate. The latter usually has the advantage of shrinking combined with chip circuits or manufacturing processes, but cost is a consideration. For the former, in addition to its low-cost characteristics, it can now be compounded by sophisticated process technologies, such as high-density interconnection (HDI) technology, combined with special materials. It can still meet the requirements of systematic construction.

此外,隨著資訊產品走向高速化及高頻化,未 來發展新一代產品所需的基板材料,如無線通訊網路、衛星通訊設備、高功率及寬頻產品、高速電腦與電腦工作站等都需要具有高玻璃轉移溫度(Glass Transition Temperature,Tg)、低損耗因子(Dissipation Factor,Df)與低介電常數(Dielectric Constant,Dk)的基板材料。目前印刷電路板(printed circuit board,PCB)所使用的銅箔基板,不管是數量上或是技術層面上,都是以環氧樹脂所製作的FR-4板材為主,但是FR-4的介電常數與損耗因子等電氣性質,已逐漸無法符合高頻的需求。所以,業界亟需一種具有高介電常數並且能維持低損耗因子之基板材料。 In addition, as information products move toward higher speeds and higher frequencies, the substrate materials needed for the development of new generation products in the future, such as wireless communication networks, satellite communication equipment, high-power and broadband products, high-speed computers and computer workstations, etc., need to have high Substrate materials for glass transition temperature (Tg), low dissipation factor (Df) and low dielectric constant (Dk). At present, the copper foil substrates used in printed circuit boards (PCBs) are mainly made of epoxy resin-made FR-4 sheets, regardless of the number or technical level. Electrical properties such as electric constant and loss factor have gradually failed to meet the high-frequency requirements. Therefore, there is an urgent need for a substrate material that has a high dielectric constant and can maintain a low loss factor.

本發明之一態樣是提供一種用於形成絕緣基板的組成物,藉由調整此組成物的組成成分可調控絕緣基板的介電常數值。 One aspect of the present invention is to provide a composition for forming an insulating substrate. By adjusting the composition of the composition, the dielectric constant value of the insulating substrate can be adjusted.

上述用於形成絕緣基板的組成物包含100重量份的改質液晶高分子以及0.5重量份至85重量份的介電填充劑。改質液晶高分子具有一重複單元結構為

Figure 107125551-A0101-12-0002-5
,其中Ar為
Figure 107125551-A0101-12-0002-7
(1,4-phenylene,1,4-伸苯基)、
Figure 107125551-A0101-12-0003-18
(1,3-phenylene,1,3-伸苯基)、
Figure 107125551-A0101-12-0003-19
(2,6-naphthalene,2,6-萘基)或
Figure 107125551-A0101-12-0003-17
(4,4'-biphenylene,4,4'-亞 聯苯基),Y為*-O-*或
Figure 107125551-A0101-12-0003-16
,且X為
Figure 107125551-A0101-12-0003-13
(醯胺基)、
Figure 107125551-A0101-12-0003-14
(亞胺基)、
Figure 107125551-A0101-12-0003-11
(脒基)、
Figure 107125551-A0101-12-0003-12
(氨基羰基 氨基)、
Figure 107125551-A0101-12-0003-10
(氨基硫代羰基)、
Figure 107125551-A0101-12-0003-8
(氨基羰基氧基)、
Figure 107125551-A0101-12-0003-9
(氨 基磺醯基)、
Figure 107125551-A0101-12-0004-20
(氨基磺醯氧基)、
Figure 107125551-A0101-12-0004-21
(氨基磺醯基氨基)、
Figure 107125551-A0101-12-0004-22
(羧 酸酯)、
Figure 107125551-A0101-12-0004-24
((羧酸酯)氨基)、
Figure 107125551-A0101-12-0004-25
((烷氧基羰基)氧基)、
Figure 107125551-A0101-12-0004-26
(烷氧基羰基)、
Figure 107125551-A0101-12-0004-27
(羥 胺基)、
Figure 107125551-A0101-12-0004-28
(烷氧基氨基)、
Figure 107125551-A0101-12-0004-29
(氰氧基)、
Figure 107125551-A0101-12-0004-30
(異氰 酸基)或其組合,其中R1、R2和R3可為CnH2n+1,且n為一正整數。 The above composition for forming an insulating substrate includes 100 parts by weight of a modified liquid crystal polymer and 0.5 to 85 parts by weight of a dielectric filler. The modified liquid crystal polymer has a repeating unit structure as
Figure 107125551-A0101-12-0002-5
, Where Ar is
Figure 107125551-A0101-12-0002-7
(1,4-phenylene, 1,4-phenylene),
Figure 107125551-A0101-12-0003-18
(1,3-phenylene, 1,3-phenylene),
Figure 107125551-A0101-12-0003-19
(2,6-naphthalene, 2,6-naphthyl) or
Figure 107125551-A0101-12-0003-17
(4,4 ' -biphenylene, 4,4 ' -biphenylene), Y is *-O-* or
Figure 107125551-A0101-12-0003-16
And X is
Figure 107125551-A0101-12-0003-13
(Acylamino),
Figure 107125551-A0101-12-0003-14
(Imino group),
Figure 107125551-A0101-12-0003-11
(Amidino),
Figure 107125551-A0101-12-0003-12
(Aminocarbonylamino),
Figure 107125551-A0101-12-0003-10
(Aminothiocarbonyl),
Figure 107125551-A0101-12-0003-8
(Aminocarbonyloxy),
Figure 107125551-A0101-12-0003-9
(Aminosulfonyl),
Figure 107125551-A0101-12-0004-20
(Aminosulfonyloxy),
Figure 107125551-A0101-12-0004-21
(Aminosulfonylamino),
Figure 107125551-A0101-12-0004-22
(Carboxylate),
Figure 107125551-A0101-12-0004-24
((Carboxylate) amino),
Figure 107125551-A0101-12-0004-25
((Alkoxycarbonyl)oxy),
Figure 107125551-A0101-12-0004-26
(Alkoxycarbonyl),
Figure 107125551-A0101-12-0004-27
(Hydroxylamine group),
Figure 107125551-A0101-12-0004-28
(Alkoxyamino),
Figure 107125551-A0101-12-0004-29
(Cyanooxy),
Figure 107125551-A0101-12-0004-30
(Isocyanate group) or a combination thereof, wherein R 1 , R 2 and R 3 may be C n H 2n+1 and n is a positive integer.

根據本發明之某些實施方式,介電填充劑係選自於由一陶瓷材料、一改質陶瓷材料、一導電粒子、一改質導電粒子、一有機材料以及一改質有機材料所組成之群組。 According to some embodiments of the present invention, the dielectric filler is selected from the group consisting of a ceramic material, a modified ceramic material, a conductive particle, a modified conductive particle, an organic material, and a modified organic material Group.

根據本發明之某些實施方式,陶瓷材料係選自於由鈦酸鋇、鈦酸鉛、鈦酸鍶鋇(BST)、氧化鈦、氧化鉛、鋯 鈦酸鉛(PZT)、鈣鈦礦立方晶系結構(CaCu3Ti4O12,CCTO)以及鈮鎂酸鉛-鈦酸鉛(PMN-PT)所組成之群組。 According to some embodiments of the invention, the ceramic material is selected from the group consisting of barium titanate, lead titanate, barium strontium titanate (BST), titanium oxide, lead oxide, lead zirconate titanate (PZT), and perovskite cubic The group consisting of crystal structure (CaCu 3 Ti 4 O 12 , CCTO) and lead niobate-lead titanate (PMN-PT).

根據本發明之某些實施方式,改質陶瓷材料包含一改質基團,此改質基團包含矽烷基。 According to some embodiments of the present invention, the modified ceramic material includes a modified group, and the modified group includes a silane group.

根據本發明之某些實施方式,導電粒子包含一碳類粒子及一金屬粒子。 According to some embodiments of the present invention, the conductive particles include a carbon-based particle and a metal particle.

根據本發明之某些實施方式,碳類粒子係選自於由碳六十(C60)、石墨烯、碳黑、碳纖維以及奈米碳管(Carbon Nanotube,CNT)所組成之群組。 According to some embodiments of the present invention, the carbon-based particles are selected from the group consisting of carbon sixty (C 60 ), graphene, carbon black, carbon fiber, and carbon nanotube (CNT).

根據本發明之某些實施方式,金屬粒子係選自於由銀、鋁、銅、鎳、鋅及鐵所組成之群組。 According to some embodiments of the invention, the metal particles are selected from the group consisting of silver, aluminum, copper, nickel, zinc, and iron.

根據本發明之某些實施方式,改質導電粒子包含一改質碳類粒子,此改質碳類粒子包含一改質基團,此改質基團係選自於由胺基、苯胺基、醯胺基、羧基以及羥基所組成之群組。 According to some embodiments of the present invention, the modified conductive particles include a modified carbon-based particle, the modified carbon-based particle includes a modified group, and the modified group is selected from the group consisting of an amine group, an aniline group, The group consisting of amide group, carboxyl group and hydroxyl group.

根據本發明之某些實施方式,有機材料係選自於由導電聚苯胺及鈦菁銅(CuPc)所組成之群組。 According to some embodiments of the invention, the organic material is selected from the group consisting of conductive polyaniline and copper titanium cyanide (CuPc).

根據本發明之某些實施方式,改質有機材料包含一改質基團,此改質基團係選自於由磺酸基、羥基、醚基、氨基以及(對氯甲基苯)乙烯基所組成之群組。 According to some embodiments of the present invention, the modified organic material includes a modified group selected from the group consisting of sulfonic acid group, hydroxyl group, ether group, amino group and (p-chloromethylbenzene) vinyl group The group formed.

根據本發明之某些實施方式,改質有機材料包含一改質基團,此改質基團係選自於由磺酸基、羥基、醚基、氨基以及(對氯甲基苯)乙烯基所組成之群組。 According to some embodiments of the present invention, the modified organic material includes a modified group selected from the group consisting of sulfonic acid group, hydroxyl group, ether group, amino group and (p-chloromethylbenzene) vinyl group The group formed.

本發明之另一態樣是提供一種電路板結構。此 電路板結構包含至少一絕緣基板以及至少一重佈線層。此至少一絕緣基板包含如上所述之用於形成絕緣基板的組成物。此至少一重佈線層位於絕緣基板上。 Another aspect of the present invention is to provide a circuit board structure. The circuit board structure includes at least one insulating substrate and at least one redistribution layer. The at least one insulating substrate includes the composition for forming an insulating substrate as described above. The at least one redistribution layer is located on the insulating substrate.

根據本發明之某些實施方式,此電路板結構更包含一黏著層位於絕緣基板與重佈線層之間。 According to some embodiments of the present invention, the circuit board structure further includes an adhesive layer between the insulating substrate and the redistribution layer.

根據本發明之某些實施方式,黏著層係選自於由氟樹酯、聚苯醚樹酯、芳烷型環氧樹酯、環氧樹脂、苯氧基樹脂、丙烯酸樹脂、胺基甲酸乙酯樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、液晶聚合物、雙馬來醯亞胺系樹脂及聚醯亞胺樹脂所組成之群組。 According to some embodiments of the present invention, the adhesive layer is selected from the group consisting of fluororesin, polyphenylene ether resin, aralkyl-type epoxy resin, epoxy resin, phenoxy resin, acrylic resin, urethane The group consisting of ester resin, silicone rubber-based resin, parylene resin, liquid crystal polymer, bismaleimide resin and polyimide resin.

10‧‧‧電路板結構 10‧‧‧ circuit board structure

12‧‧‧絕緣基板 12‧‧‧Insulated substrate

14‧‧‧重佈線層 14‧‧‧ Redistribution layer

16‧‧‧黏著層 16‧‧‧adhesive layer

18‧‧‧導電盲孔 18‧‧‧conductive blind hole

為讓本發明之上述和其他目的、特徵、優點與實施方式能更明顯易懂,所附圖式之詳細說明如下:第1圖至第4圖繪示根據本發明多個實施方式之電路板結構的剖面示意圖。 In order to make the above and other objects, features, advantages and embodiments of the present invention more obvious and understandable, the drawings are described in detail as follows: FIGS. 1 to 4 illustrate circuit boards according to various embodiments of the present invention A schematic cross-sectional view of the structure.

為了使本揭示內容的敘述更加詳盡與完備,下文針對了本發明的實施態樣與具體實施例提出了說明性的描述;但這並非實施或運用本發明具體實施例的唯一形式。以下所揭露的各實施例,在有益的情形下可相互組合或取代,也可在一實施例中附加其他的實施例,而無須進一步的 記載或說明。 In order to make the description of this disclosure more detailed and complete, the following provides an illustrative description of the implementation form and specific embodiments of the present invention; however, this is not the only form for implementing or using specific embodiments of the present invention. The embodiments disclosed below can be combined or replaced with each other under beneficial circumstances, and other embodiments can be added to an embodiment without further description or description.

為了使本揭示內容之敘述更加詳盡與完備,可參照所附之圖式及以下所述各種實施方式,圖式中相同之號碼代表相同或相似之元件。 In order to make the description of the present disclosure more detailed and complete, reference may be made to the accompanying drawings and various embodiments described below. The same numbers in the drawings represent the same or similar elements.

於本文中通篇所使用之詞彙一般代表其通常的意涵,至於一些特殊詞彙會在下文中具體定義,以提供實踐者額外的指引。為了方便起見,某些詞彙可能被特別標示,例如使用斜體與/或引號。不論它是否被特別標示,其詞彙之範圍和含義不受任何影響,與平常詞彙的範圍和含義是相同的。相同的事情可以被一種以上的方式所描述是可以被理解的。因此,用於一個或多個的術語的替代語言與同義詞可能會在本文中所使用,而其不是要闡述一個詞彙在本文所論述的內容有其任何特殊的意義。某些詞彙的同義詞將被使用,重複的使用一個或多個同義詞,並不會排除使用其他同義詞。本說明書內所討論的任何例證只用作解說的用途,並不會以任何方式限制的本發明或其例證之範圍和意義。同樣地,本發明並不受限於本說明書中所提出的各種實施例。 The vocabulary used throughout this article generally represents its usual meaning, and some special vocabulary will be specifically defined below to provide additional guidance for practitioners. For convenience, some words may be specially marked, such as using italics and/or quotation marks. Regardless of whether it is specially marked, the scope and meaning of its vocabulary are not affected in any way, and are the same as the scope and meaning of ordinary vocabulary. It is understandable that the same thing can be described in more than one way. Therefore, alternative language and synonyms for one or more terms may be used in this article, but it is not intended to state that a vocabulary has any special meaning in what is discussed in this article. Synonyms of certain words will be used. Repeated use of one or more synonyms will not exclude the use of other synonyms. Any illustrations discussed in this specification are for illustrative purposes only and do not in any way limit the scope and meaning of the invention or its illustrations. Likewise, the present invention is not limited to the various embodiments proposed in this specification.

除非內容中有其他清楚的指稱,本文所使用的單數詞包含複數的指稱對象。透過參考「一實施方式」這樣特定的指稱,在至少其中之一的本案發明的實施方式中,表示一種特定的特徵、結構或特色,因此在各處的「在一實施方式」,這樣的片語透過特別的指稱出現時,並不需要參考相同的實施方式,更進一步,在一或多實施方式中,這些特別的特徵、結構、或特色可以依合適的情況相互組合。 Unless there are other clear references in the content, the singular terms used in this article include plural referents. By referring to the specific reference of "one embodiment", in at least one of the embodiments of the invention of the present invention, it represents a specific feature, structure, or characteristic. When the language appears through a special reference, it is not necessary to refer to the same embodiment. Furthermore, in one or more embodiments, these special features, structures, or characteristics can be combined with each other as appropriate.

本發明之一態樣係提供一種用於形成絕緣基板 的組成物,其包含100重量份的改質液晶高分子以及0.5重量份至85重量份的介電填充劑。改質液晶高分子具有以下式(1)的重複單元結構

Figure 107125551-A0101-12-0008-31
One aspect of the present invention provides a composition for forming an insulating substrate, which includes 100 parts by weight of a modified liquid crystal polymer and 0.5 to 85 parts by weight of a dielectric filler. The modified liquid crystal polymer has a repeating unit structure of the following formula (1)
Figure 107125551-A0101-12-0008-31

式(1)中的Ar可為1,4-伸苯基 (1,4-phenylene),化學式為

Figure 107125551-A0101-12-0008-32
;1,3- 伸苯基(1,3-phenylene),化學式為
Figure 107125551-A0101-12-0008-33
;2,6- 萘基(2,6-naphthalene),化學式為
Figure 107125551-A0101-12-0008-34
;或4,4'-亞聯苯基 (4,4'-biphenylene),化學式為
Figure 107125551-A0101-12-0008-35
Ar in formula (1) can be 1,4-phenylene (1,4-phenylene), the chemical formula is
Figure 107125551-A0101-12-0008-32
; 1,3-phenylene (1,3-phenylene), the chemical formula is
Figure 107125551-A0101-12-0008-33
; 2,6-naphthalene (2,6-naphthalene), the chemical formula is
Figure 107125551-A0101-12-0008-34
; Or 4,4 ' -biphenylene (4,4 ' -biphenylene), the chemical formula is
Figure 107125551-A0101-12-0008-35

式(1)中的Y可為*-O-*或

Figure 107125551-A0101-12-0008-36
。 Y in formula (1) can be *-O-* or
Figure 107125551-A0101-12-0008-36
.

式(1)中的X可為醯胺基(Carboxamido),化 學式為

Figure 107125551-A0101-12-0009-37
;亞胺基(Imido/Imino),化學 式為
Figure 107125551-A0101-12-0009-38
;脒基(Amidino),化學式為
Figure 107125551-A0101-12-0009-39
;氨基羰基氨基 (Aminocarbonylamino),化學式為
Figure 107125551-A0101-12-0009-40
;氨基硫代羰基 (Aminothiocarbonyl),化學式為
Figure 107125551-A0101-12-0009-42
;氨 基羰基氧基(Aminocarbonyloxy),化學式為
Figure 107125551-A0101-12-0009-43
;氨基磺醯基(Aminosulfonyl), 化學式為
Figure 107125551-A0101-12-0009-44
;氨基磺醯氧基 (Aminosulfonyloxy),化學式為
Figure 107125551-A0101-12-0009-46
;氨 基磺醯基氨基(Aminosulfonylamino),化學式為
Figure 107125551-A0101-12-0010-47
;羧酸酯(Carboxyl ester),化學式為
Figure 107125551-A0101-12-0010-48
;(羧酸酯)氨基((Carboxyl ester) amino),化學式為
Figure 107125551-A0101-12-0010-49
;(烷氧基羰基) 氧基((Alkoxycarbonyl)oxy),化學式為
Figure 107125551-A0101-12-0010-51
;烷氧基羰基 (Alkoxycarbonyl)化學式為,
Figure 107125551-A0101-12-0010-52
; 羥胺基(Hydroxyamino),化學式為
Figure 107125551-A0101-12-0010-53
;烷 氧基氨基(Alkoxyamino),化學式為
Figure 107125551-A0101-12-0010-54
;氰氧基(Cyanato),化學式為
Figure 107125551-A0101-12-0010-55
;異氰酸基(Isocyanato),化學 式為
Figure 107125551-A0101-12-0010-57
;或其組合,其中烷氧基R1、R2和R3 的通式為CnH2n+1,且n為一正整數。 X in formula (1) may be an amide group (Carboxamido), the chemical formula is
Figure 107125551-A0101-12-0009-37
; Imino (Imido/Imino), the chemical formula is
Figure 107125551-A0101-12-0009-38
; Amidino (Amidino), the chemical formula is
Figure 107125551-A0101-12-0009-39
; Aminocarbonylamino (Aminocarbonylamino), the chemical formula is
Figure 107125551-A0101-12-0009-40
; Aminothiocarbonyl (Aminothiocarbonyl), the chemical formula is
Figure 107125551-A0101-12-0009-42
; Aminocarbonyloxy (Aminocarbonyloxy), the chemical formula is
Figure 107125551-A0101-12-0009-43
; Aminosulfonyl (Aminosulfonyl), the chemical formula is
Figure 107125551-A0101-12-0009-44
; Aminosulfonyloxy (Aminosulfonyloxy), the chemical formula is
Figure 107125551-A0101-12-0009-46
; Aminosulfonylamino (Aminosulfonylamino), the chemical formula is
Figure 107125551-A0101-12-0010-47
; Carboxyl ester (Carboxyl ester), the chemical formula is
Figure 107125551-A0101-12-0010-48
; (Carboxyl ester) amino (Carboxyl ester) amino, the chemical formula is
Figure 107125551-A0101-12-0010-49
; (Alkoxycarbonyl)oxy ((Alkoxycarbonyl)oxy), the chemical formula is
Figure 107125551-A0101-12-0010-51
; The alkoxycarbonyl (Alkoxycarbonyl) chemical formula is,
Figure 107125551-A0101-12-0010-52
; Hydroxyamino (Hydroxyamino), the chemical formula is
Figure 107125551-A0101-12-0010-53
; Alkoxyamino, the chemical formula is
Figure 107125551-A0101-12-0010-54
; Cyanato, the chemical formula is
Figure 107125551-A0101-12-0010-55
; Isocyanato (Isocyanato), the chemical formula is
Figure 107125551-A0101-12-0010-57
; Or a combination thereof, wherein the general formula of alkoxy R 1 , R 2 and R 3 is C n H 2n+1 , and n is a positive integer.

根據本發明的各種實施例,上述Ar中的任一種可以搭配任何的Y以及任何的X相互組合。在不同的組合中可能具有相同或不同的技術效果。 According to various embodiments of the present invention, any one of the above Ar can be combined with any Y and any X together. It may have the same or different technical effects in different combinations.

更詳細的說,上述的改質液晶高分子可溶解於特定的溶劑中以形成改質液晶高分子溶液。舉例來說,此特定的溶劑可選自於由N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺、γ-丁內酯、二甲基甲醯胺、2-丁氧基乙醇以及2-乙氧基乙醇所組成群組。相較於傳統的液晶高分子,可溶性液晶聚合物的溶解度在特定溶劑中高於傳統的液晶高分子。可以理解的是,改質液晶高分子溶液可藉由塗佈等類似的製程形成在一承載板上,再藉由加熱製程以蒸乾溶劑從而形成包含改質液晶高分子的絕緣基板。 In more detail, the above modified liquid crystal polymer can be dissolved in a specific solvent to form a modified liquid crystal polymer solution. For example, the specific solvent may be selected from N-methyl-2-pyrrolidone, N,N-dimethylacetamide, γ-butyrolactone, dimethylformamide, 2-butoxy Ethyl alcohol and 2-ethoxyethanol group. Compared with traditional liquid crystal polymers, the solubility of soluble liquid crystal polymers is higher than that of traditional liquid crystal polymers in certain solvents. It can be understood that the modified liquid crystal polymer solution can be formed on a carrier plate by coating and the like, and then the solvent is evaporated to form an insulating substrate containing the modified liquid crystal polymer.

舉例來說,改質液晶高分子溶液可為芳香族液晶聚酯溶液,其包含上述溶劑中的一者以及芳香族液晶聚酯。芳香族液晶聚酯之固體成分的重量百分比為1wt%至85wt%,例如可為5wt%、15wt%、25wt%、35wt%、45wt%、55wt%、65wt%或75wt%。當芳香族液晶聚酯之固體成分的重量百分比小於某一數值,例如1wt%時,絕緣基板要達到所需的厚度就需要進行多次的塗佈製程,相當耗費時間及成本。反之,當芳香族液晶聚酯之固體成分的重量百分比大於某一數值,例如85wt%時,則芳香族液晶聚酯的固體成分不易溶解於溶劑中從而產生膠化 (gelatinization)。具體的說,芳香族液晶聚酯具有重複單元結構如下:

Figure 107125551-A0101-12-0012-58
其中Ar為1,4-伸苯基、1,3-伸苯基、2,6-萘基或4,4'-亞聯苯基,Y為-O-或-NH-,且X為醯胺基、亞胺基、脒基、氨基羰基氨基、氨基硫代羰基、氨基羰基氧基、氨基磺醯基、氨基磺醯氧基、氨基磺醯基氨基、羧酸酯、(羧酸酯)氨基、(烷氧基羰基)氧基、烷氧基羰基、羥胺基、烷氧基氨基、氰氧基、異氰酸基或其組合。 For example, the modified liquid crystal polymer solution may be an aromatic liquid crystal polyester solution, which includes one of the above solvents and an aromatic liquid crystal polyester. The weight percentage of the solid component of the aromatic liquid crystal polyester is 1wt% to 85% by weight, for example, 5wt%, 15wt%, 25wt%, 35wt%, 45wt%, 55wt%, 65wt% or 75wt%. When the weight percentage of the solid component of the aromatic liquid crystal polyester is less than a certain value, such as 1 wt%, the insulating substrate needs to perform multiple coating processes to achieve the required thickness, which is quite time-consuming and costly. Conversely, when the weight percentage of the solid component of the aromatic liquid crystal polyester is greater than a certain value, for example, 85 wt%, the solid component of the aromatic liquid crystal polyester is not easily dissolved in the solvent to cause gelatinization. Specifically, the aromatic liquid crystal polyester has a repeating unit structure as follows:
Figure 107125551-A0101-12-0012-58
Wherein Ar is 1,4-phenylene, 1,3-phenylene, 2,6-naphthalene group or 4,4 '- biphenylene, Y is -O- or -NH-, and X is acyl Amino, imino, amidino, aminocarbonylamino, aminothiocarbonyl, aminocarbonyloxy, sulfamoyl, sulfamoyl, sulfamoylamino, carboxylate, (carboxylate) Amino group, (alkoxycarbonyl)oxy group, alkoxycarbonyl group, hydroxylamine group, alkoxyamino group, cyanooxy group, isocyanato group or a combination thereof.

若介電填充劑的含量大於某一數值,例如85重量份時,則介電填充劑之間會互相連通,使得材料由絕緣體變為導電體,材料的介電常數和導電率將會發生巨大的改變,進而喪失作為絕緣基板的性能。在多個實施方式中,介電填充劑係選自於由陶瓷材料、改質陶瓷材料、導電粒子、改質導電粒子、有機材料以及改質有機材料所組成之群組。更具體的說,在多個示例中,陶瓷材料係選自於由鈦酸鋇(Barium Titanate,BT)、鈦酸鉛、鈦酸鍶鋇(Barium Strontium Titanate,BST)、氧化鈦、氧化鉛、鋯鈦酸鉛(Pb(ZrTi)O3,PZT)、鈣鈦礦立方晶系結構(CaCu3Ti4O12,CCTO)以及鈮鎂酸鉛-鈦酸鉛(PMN-PT)所組成之群組。在多個示例中,改質陶瓷材料包含一改質基團,改質陶瓷材料的改質基團包含矽烷基。在多個示例中, 導電粒子包含碳類粒子及金屬粒子。舉例來說,碳類粒子係選自於由碳六十(C60)、石墨烯(Graphene)、碳黑、碳纖維以及奈米碳管(Carbon Nanotube,CNT)所組成之群組;而金屬粒子係選自於由銀、鋁、銅、鎳、鋅及鐵所組成之群組。在多個示例中,改質導電粒子包含一改質碳類粒子,此改質碳類粒子包含一改質基團,改質碳類粒子的改質基團係選自於由胺基、苯胺基、醯胺基、羧基以及羥基所組成之群組。在多個示例中,有機材料係選自於由導電聚苯胺及鈦菁銅(Copper Phthalocyanine,CuPc)所組成之群組。在多個示例中,改質有機材料包含一改質基團,改質有機材料的改質基團係選自於由磺酸基、羥基、醚基、氨基以及(對氯甲基苯)乙烯基所組成之群組。可以理解的是,介電填充劑係添加於上述改質液晶高分子的溶液中並藉由塗佈等類似的製程形成在承載板上,再藉由加熱製程以蒸乾溶劑從而形成提高介電常數的絕緣基板。值得注意的是,介電填充劑並不會溶解於改質液晶高分子的溶液中,而是均勻分散在改質液晶高分子的溶液中。 If the content of the dielectric filler is greater than a certain value, such as 85 parts by weight, the dielectric fillers will communicate with each other, so that the material changes from an insulator to a conductor, and the dielectric constant and conductivity of the material will be huge Change, and then lose the performance as an insulating substrate. In various embodiments, the dielectric filler is selected from the group consisting of ceramic materials, modified ceramic materials, conductive particles, modified conductive particles, organic materials, and modified organic materials. More specifically, in many examples, the ceramic material is selected from the group consisting of barium titanate (BT), lead titanate, barium strontium titanate (BST), titanium oxide, and lead oxide. Lead zirconate titanate (Pb(ZrTi)O 3 , PZT), perovskite cubic crystal structure (CaCu 3 Ti 4 O 12 , CCTO) and lead niobate-lead titanate (PMN-PT) group. In various examples, the modified ceramic material includes a modified group, and the modified group of the modified ceramic material includes a silane group. In many examples, the conductive particles include carbon-based particles and metal particles. For example, the carbon-based particles are selected from the group consisting of carbon sixty (C 60 ), graphene (Graphene), carbon black, carbon fiber, and carbon nanotube (CNT); and metal particles It is selected from the group consisting of silver, aluminum, copper, nickel, zinc and iron. In various examples, the modified conductive particles include a modified carbon-based particle, and the modified carbon-based particle includes a modified group, and the modified group of the modified carbon-based particle is selected from the group consisting of an amine group and an aniline A group consisting of a group, an amide group, a carboxyl group and a hydroxyl group. In various examples, the organic material is selected from the group consisting of conductive polyaniline and Copper Phthalocyanine (CuPc). In many examples, the modified organic material includes a modified group, and the modified group of the modified organic material is selected from the group consisting of sulfonic acid group, hydroxyl group, ether group, amino group and (p-chloromethylbenzene) ethylene The group formed by the base. It is understandable that the dielectric filler is added to the solution of the above modified liquid crystal polymer and formed on the carrier plate by coating and the like, and then the solvent is evaporated by heating to form an improved dielectric Constant insulation substrate. It is worth noting that the dielectric filler is not dissolved in the solution of the modified liquid crystal polymer, but is evenly dispersed in the solution of the modified liquid crystal polymer.

在一些實施方式中,介電填充劑的平均粒徑為0.1至20微米。根據多個實施例,當介電填充劑的平均粒徑小於某一數值,例如0.1微米時,則對提高介電常數的效果並不顯著。反之,當介電填充劑的平均粒徑大於某一數值,例如20微米時,則難以控制介電填充劑顆粒的分散性,且容易使介電填充劑顆粒之間相互連通,進而使後續形成的絕緣基板喪失其絕緣性能。因此,介電填充劑的平均粒徑可例如為 0.5微米、1.0微米、1.5微米、2.0微米、2.5微米、3.0微米、3.5微米、4.0微米、4.5微米、5.0微米、5.5微米、6.0微米、6.5微米、7.0微米、7.5微米、8.0微米、8.5微米、9.0微米、9.5微米、10.0微米、12.0微米、14.0微米、16.0微米或18.0微米。 In some embodiments, the average particle size of the dielectric filler is 0.1 to 20 microns. According to various embodiments, when the average particle size of the dielectric filler is less than a certain value, for example, 0.1 μm, the effect of increasing the dielectric constant is not significant. Conversely, when the average particle size of the dielectric filler is greater than a certain value, such as 20 microns, it is difficult to control the dispersibility of the dielectric filler particles, and it is easy to make the dielectric filler particles communicate with each other, so that subsequent formation Of insulating substrates lose their insulating properties. Therefore, the average particle diameter of the dielectric filler may be, for example, 0.5 microns, 1.0 microns, 1.5 microns, 2.0 microns, 2.5 microns, 3.0 microns, 3.5 microns, 4.0 microns, 4.5 microns, 5.0 microns, 5.5 microns, 6.0 microns, 6.5 Micrometer, 7.0 micrometer, 7.5 micrometer, 8.0 micrometer, 8.5 micrometer, 9.0 micrometer, 9.5 micrometer, 10.0 micrometer, 12.0 micrometer, 14.0 micrometer, 16.0 micrometer, or 18.0 micrometer.

一般來說,由於改質液晶高分子本身具有良好的加工性、耐熱性、低吸水性、較低的介電常數(Dk)(例如,介於2至4之間)以及較低的損耗因子(Df)(例如,介於0.003至0.008)的特性,因此,本發明之用於形成絕緣基板的組成物包含上述可提高介電常數的介電填充劑,其可將介電常數提高為3至200之間,並且維持損耗因子介於0.003至0.008之間。典型地,介電材料按介電常數的高低可區分為高介電常數(例如,大於4)和低介電常數(例如,小於等於4)。高介電材料主要應用於閘極介質材料、儲能材料及無線通訊材料等領域,以降低電子產品的功耗;低介電材料主要用來製備電子封裝材料,以減少阻容延遲(RC delay)所產生的不良影響。 Generally speaking, the modified liquid crystal polymer itself has good processability, heat resistance, low water absorption, low dielectric constant (Dk) (for example, between 2 and 4) and low loss factor (Df) (for example, between 0.003 and 0.008), therefore, the composition for forming an insulating substrate of the present invention includes the above-mentioned dielectric filler that can increase the dielectric constant, which can increase the dielectric constant to 3 Between 200 and 200, and maintain a loss factor between 0.003 and 0.008. Typically, the dielectric material can be divided into a high dielectric constant (for example, greater than 4) and a low dielectric constant (for example, less than or equal to 4) according to the level of the dielectric constant. High dielectric materials are mainly used in gate dielectric materials, energy storage materials and wireless communication materials to reduce the power consumption of electronic products; low dielectric materials are mainly used to prepare electronic packaging materials to reduce RC delay (RC delay ) Adverse effects.

在其他替代的實施方式中,用於形成絕緣基板的組成物可包含改質聚醯亞胺(Polyimide,PI)以及介電填充劑。具體的說,改質聚醯亞胺包含芳香族單體和/或其他有助於降低吸水性的功能性單體。舉例來說,芳香族單體可包含芳香族二胺、芳香族二酸酐、芳香族聚醯胺、聚對苯二甲醯對苯二胺(polyphenylene terephthalamide,PPTA)、聚對苯撐苯并噁唑 ((poly(p-phenylene-2,6-benzobisoxazole,PBO)以及對羥基苯甲酸與6-羥基-2-萘酸之共聚物(poly(p-hydroxybenzoic acid-co-2-hydroxy-6-naphthoic acid))。有關介電填充劑的特徵及實施例已於前文詳細描述,故在此不再重複敘述。 In other alternative embodiments, the composition used to form the insulating substrate may include modified polyimide (Polyimide, PI) and a dielectric filler. Specifically, the modified polyimide contains aromatic monomers and/or other functional monomers that help reduce water absorption. For example, the aromatic monomer may include aromatic diamine, aromatic dianhydride, aromatic polyamidoamine, polyphenylene terephthalamide (PPTA), polyparaphenylenebenzoxylene (Poly(p-phenylene-2,6-benzobisoxazole, PBO) and copolymers of p-hydroxybenzoic acid and 6-hydroxy-2-naphthoic acid (poly(p-hydroxybenzoic acid-co-2-hydroxy-6- naphthoic acid)). The characteristics and embodiments of the dielectric filler have been described in detail above, so they will not be repeated here.

本發明之另一態樣係提供一種電路板結構10。第1圖至第4圖繪示根據本發明多個實施方式之電路板結構的剖面示意圖。請先參閱第1圖,電路板結構10包含至少一絕緣基板12以及至少一重佈線層14。此至少一絕緣基板12包含如前文所述之用於形成絕緣基板的組成物。也就是說,形成此至少一絕緣基板12的組成物包含100重量份的改質液晶高分子以及0.5重量份至85重量份的介電填充劑。有關改質液晶高分子以及介電填充劑兩者的特徵及實施例已於前文詳細描述,故在此不再重複敘述。此至少一重佈線層14位於絕緣基板上。 Another aspect of the invention provides a circuit board structure 10. 1 to 4 are schematic cross-sectional views of circuit board structures according to various embodiments of the present invention. Please refer to FIG. 1 first, the circuit board structure 10 includes at least one insulating substrate 12 and at least one redistribution layer 14. The at least one insulating substrate 12 includes the composition for forming an insulating substrate as described above. That is, the composition forming the at least one insulating substrate 12 includes 100 parts by weight of the modified liquid crystal polymer and 0.5 to 85 parts by weight of the dielectric filler. The features and embodiments of both the modified liquid crystal polymer and the dielectric filler have been described in detail above, so they will not be repeated here. The at least one redistribution layer 14 is located on the insulating substrate.

在一些實例中,重佈線層14的材料可以包含銅、鋁、鐵、銀、鈀、鎳、鉻、鉬、鎢、鋅、鉻、錳、鈷、金、錫、鉛或不鏽鋼,或是以上金屬材料中的至少兩種混合而成的合金。更詳細的說,重佈線層14可藉由蝕刻金屬箔片(metal foil),例如銅箔、鋁箔、銀箔、錫箔或/和金箔而成。在某些實施例中,重佈線層14的表面可經過鍍膜處理,使得重佈線層14的表面覆蓋一鍍膜層(圖未示),例如鎳金層、鋅層或鈷層。 In some examples, the material of the redistribution layer 14 may include copper, aluminum, iron, silver, palladium, nickel, chromium, molybdenum, tungsten, zinc, chromium, manganese, cobalt, gold, tin, lead, or stainless steel, or more An alloy formed by mixing at least two of metal materials. In more detail, the redistribution layer 14 may be formed by etching a metal foil, such as copper foil, aluminum foil, silver foil, tin foil, and/or gold foil. In some embodiments, the surface of the redistribution layer 14 may be coated, so that the surface of the redistribution layer 14 is covered with a coating layer (not shown), such as a nickel-gold layer, a zinc layer, or a cobalt layer.

請參閱第2圖,在多個實施例中,電路板結構 10可更包含黏著層16位於絕緣基板12與重佈線層14之間。更具體的說,黏著層16具有與重佈線層14相同的圖案。藉由接著層16的形成,使得絕緣基板12與重佈線層14之間可以具有更佳的結合力。在多個示例中,黏著層16係選自於由氟樹酯、聚苯醚樹酯(PPO/PPE)、芳烷型環氧樹酯、環氧樹脂、苯氧基樹脂、丙烯酸樹脂、胺基甲酸乙酯樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、液晶聚合物、雙馬來醯亞胺系樹脂及聚醯亞胺樹脂所組成之群組。舉例來說,氟樹酯可包含聚四氟乙烯(Polytetrafluoroethylene,PTFE)、四氟乙烯-全氟烷基乙烯基醚共聚物(Polyfluoroalkoxy,PFA)、四氟乙烯-六氟丙烯共聚物(Fluorinated Ethylene Propylene,FEP)、乙烯-四氟乙烯共聚物(Ethylene-tetra-fluoro-ethylen,ETFE);芳烷型環氧樹酯可包含聯苯型環氧樹脂。根據第1圖及第2圖所繪示出的電路板結構10示意圖為一單面電路板(single sided circuit board)結構。 Please refer to FIG. 2. In various embodiments, the circuit board structure 10 may further include an adhesive layer 16 between the insulating substrate 12 and the redistribution layer 14. More specifically, the adhesive layer 16 has the same pattern as the redistribution layer 14. By forming the adhesive layer 16, the insulating substrate 12 and the redistribution layer 14 can have a better bonding force. In various examples, the adhesive layer 16 is selected from the group consisting of fluororesin, polyphenylene ether resin (PPO/PPE), aralkyl epoxy resin, epoxy resin, phenoxy resin, acrylic resin, amine The group consisting of urethane resin, silicone rubber resin, parylene resin, liquid crystal polymer, bismaleimide resin and polyimide resin. For example, the fluororesin may include polytetrafluoroethylene (PTFE), tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (Polyfluoroalkoxy, PFA), and tetrafluoroethylene-hexafluoropropylene copolymer (Fluorinated Ethylene Propylene (FEP), ethylene-tetrafluoroethylene copolymer (Ethylene-tetra-fluoro-ethylen, ETFE); aralkyl epoxy resin may contain biphenyl epoxy resin. The schematic diagram of the circuit board structure 10 shown in FIGS. 1 and 2 is a single-sided circuit board (single-sided circuit board) structure.

然而,本發明不僅限於上述的單面電路板,電路板結構10也可以為多層電路板(multilayer circuit board)結構,其可依據所需的線路佈局來決定絕緣基板12與重佈線層14各自的層數。第3圖所繪示的電路板結構10與第1圖所繪示的電路板結構10不同之處在於:第3圖所繪示的電路板結構10包含兩層絕緣基板12及三層重佈線層14,且這兩層絕緣基板12各自夾置於相鄰的兩重佈線層14之間。可以理解的是,任兩層佈線層14之間的訊號傳輸是藉 由設置在絕緣基板12中的導電盲孔18來實施。因此,電路板結構10也可以更包含至少一導電盲孔18貫穿絕緣基板12。在某些實施例中,導電盲孔18的材料可以類似於重佈線層14的材料。 However, the present invention is not limited to the single-sided circuit board described above, the circuit board structure 10 may also be a multilayer circuit board structure, which can determine the respective of the insulating substrate 12 and the redistribution layer 14 according to the required circuit layout Number of layers. The circuit board structure 10 shown in FIG. 3 is different from the circuit board structure 10 shown in FIG. 1 in that the circuit board structure 10 shown in FIG. 3 includes two layers of insulating substrates 12 and three layers of redistribution Layer 14, and the two insulating substrates 12 are sandwiched between two adjacent double-wiring layers 14. It can be understood that the signal transmission between any two wiring layers 14 is implemented by the conductive blind holes 18 provided in the insulating substrate 12. Therefore, the circuit board structure 10 may further include at least one conductive blind hole 18 penetrating the insulating substrate 12. In some embodiments, the material of the conductive blind hole 18 may be similar to the material of the redistribution layer 14.

請參閱第4圖,在多個實施例中,電路板結構10可更包含黏著層16位於絕緣基板12與重佈線層14之間。更具體的說,導電盲孔18會貫穿黏著層16並電性連接相鄰的兩層佈線層14。有關黏著層16的特徵及實施例已於上文詳細描述,故在此不再重複敘述。在本發明之其他實施例中,電路板結構亦可包含兩層以上的絕緣基板,以及絕緣基板之間的重佈線層。 Please refer to FIG. 4. In various embodiments, the circuit board structure 10 may further include an adhesive layer 16 between the insulating substrate 12 and the redistribution layer 14. More specifically, the conductive blind hole 18 will penetrate the adhesive layer 16 and electrically connect the two adjacent wiring layers 14. The features and embodiments of the adhesive layer 16 have been described in detail above, so they will not be repeated here. In other embodiments of the present invention, the circuit board structure may also include two or more insulating substrates and a redistribution layer between the insulating substrates.

綜上所述,本發明之用於形成絕緣基板的組成物包含改質液晶高分子以及介電填充劑,藉由調整此組成物的組成成分大幅提升絕緣基板的介電常數,使得高介電常數(例如,4至200)絕緣基板能在高頻訊號傳輸下仍具有低介電損耗因子(例如,0.003至0.008),以減少訊號傳輸延遲或損耗的情形發生,從而提高訊號傳輸的速度和/或頻率。不僅如此,本發明之用於形成絕緣基板的組成物還能在高溫高濕的嚴苛環境條件下確保訊號傳輸的品質和穩定性。此外,本發明之用於形成絕緣基板的組成物也可以形成具有低介電常數(例如,小於等於4)的絕緣基板,此具有低介電常數的絕緣基板可與上述具有高介電常數的絕緣基板進行組合以堆疊出新的多功能性電子產品。 In summary, the composition for forming an insulating substrate of the present invention includes a modified liquid crystal polymer and a dielectric filler. By adjusting the composition of this composition, the dielectric constant of the insulating substrate is greatly improved, resulting in a high dielectric Constant (for example, 4 to 200) insulating substrate can still have a low dielectric loss factor (for example, 0.003 to 0.008) under high-frequency signal transmission, to reduce the occurrence of signal transmission delay or loss, thereby increasing the speed of signal transmission and /Or frequency. Not only that, the composition for forming an insulating substrate of the present invention can also ensure the quality and stability of signal transmission under the severe environmental conditions of high temperature and high humidity. In addition, the composition for forming an insulating substrate of the present invention can also form an insulating substrate having a low dielectric constant (for example, 4 or less). This insulating substrate having a low dielectric constant can be The insulating substrates are combined to stack new multifunctional electronic products.

雖然本發明已以實施方式揭露如上,以上所述 僅為本發明之較佳實施方式,並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之均等變化與修飾,皆應屬本發明之涵蓋範圍,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed as above in the embodiments, the above are only preferred embodiments of the present invention, and are not intended to limit the present invention. Anyone who is familiar with this skill can consider it as within the spirit and scope of the present invention. All equivalent changes and modifications shall fall within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the scope defined in the attached patent application.

Figure 107125551-A0101-11-0002-4
Figure 107125551-A0101-11-0002-4

10‧‧‧電路板結構 10‧‧‧ circuit board structure

12‧‧‧絕緣基板 12‧‧‧Insulated substrate

14‧‧‧重佈線層 14‧‧‧ Redistribution layer

Claims (14)

一種用於形成一絕緣基板的組成物,包含:一改質液晶高分子,為100重量份,該改質液晶高分子具有一重複單元結構如下:
Figure 107125551-A0101-13-0001-60
其中Ar為
Figure 107125551-A0101-13-0001-61
Figure 107125551-A0101-13-0001-62
Figure 107125551-A0101-13-0001-63
Figure 107125551-A0101-13-0001-64
, Y為*-O-*或
Figure 107125551-A0101-13-0001-66
,且X為
Figure 107125551-A0101-13-0001-67
Figure 107125551-A0101-13-0001-68
Figure 107125551-A0101-13-0002-69
Figure 107125551-A0101-13-0002-70
或其組合,其中R 1、R 2和R 3為C nH 2n+1,且n為一正整數;以及一介電填充劑,為0.5重量份至85重量份。
A composition for forming an insulating substrate, comprising: a modified liquid crystal polymer, which is 100 parts by weight. The modified liquid crystal polymer has a repeating unit structure as follows:
Figure 107125551-A0101-13-0001-60
Where Ar is
Figure 107125551-A0101-13-0001-61
,
Figure 107125551-A0101-13-0001-62
,
Figure 107125551-A0101-13-0001-63
or
Figure 107125551-A0101-13-0001-64
, Y is *-O-* or
Figure 107125551-A0101-13-0001-66
And X is
Figure 107125551-A0101-13-0001-67
,
Figure 107125551-A0101-13-0001-68
Figure 107125551-A0101-13-0002-69
Figure 107125551-A0101-13-0002-70
Or a combination thereof, wherein R 1 , R 2 and R 3 are C n H 2n+1 and n is a positive integer; and a dielectric filler is 0.5 parts by weight to 85 parts by weight.
如請求項1所述之組成物,其中該介電填充劑係選自於由一陶瓷材料、一改質陶瓷材料、一導電粒子、一改質導電粒子、一有機材料以及一改質有機材料所組成之群組。 The composition of claim 1, wherein the dielectric filler is selected from a ceramic material, a modified ceramic material, a conductive particle, a modified conductive particle, an organic material, and a modified organic material The group formed. 如請求項2所述之組成物,其中該陶瓷材料係選自於由鈦酸鋇、鈦酸鉛、鈦酸鍶鋇(BST)、氧化鈦、氧化鉛、鋯鈦酸鉛(PZT)、鈣鈦礦立方晶系結構(CaCu 3Ti 4O 12,CCTO)以及鈮鎂酸鉛-鈦酸鉛(PMN-PT)所組成之群組。 The composition of claim 2, wherein the ceramic material is selected from the group consisting of barium titanate, lead titanate, barium strontium titanate (BST), titanium oxide, lead oxide, lead zirconate titanate (PZT), calcium A group consisting of a cubic structure of titanium ore (CaCu 3 Ti 4 O 12 , CCTO) and lead niobate-lead titanate (PMN-PT). 如請求項2所述之組成物,其中該改質陶瓷材料包含一改質基團,該改質基團包含矽烷基。 The composition of claim 2, wherein the modified ceramic material includes a modified group, and the modified group includes a silane group. 如請求項2所述之組成物,其中該導電粒 子包含一碳類粒子及一金屬粒子。 The composition according to claim 2, wherein the conductive particles include a carbon-based particle and a metal particle. 如請求項5所述之組成物,其中該碳類粒子係選自於由碳六十(C 60)、石墨烯、碳黑、碳纖維以及奈米碳管所組成之群組。 The composition of claim 5, wherein the carbon-based particles are selected from the group consisting of carbon sixty (C 60 ), graphene, carbon black, carbon fiber, and carbon nanotubes. 如請求項5所述之組成物,其中該金屬粒子係選自於由銀、鋁、銅、鎳、鋅及鐵所組成之群組。 The composition of claim 5, wherein the metal particles are selected from the group consisting of silver, aluminum, copper, nickel, zinc, and iron. 如請求項2所述之組成物,其中該改質導電粒子包含一改質碳類粒子,該改質碳類粒子包含一改質基團,該改質基團係選自於由胺基、苯胺基、醯胺基、羧基以及羥基所組成之群組。 The composition according to claim 2, wherein the modified conductive particles include a modified carbon-based particle, the modified carbon-based particle includes a modified group, and the modified group is selected from the group consisting of an amine group, Aniline, amide, carboxyl and hydroxyl groups. 如請求項2所述之組成物,其中該有機材料係選自於由導電聚苯胺及鈦菁銅(CuPc)所組成之群組。 The composition of claim 2, wherein the organic material is selected from the group consisting of conductive polyaniline and copper titanium cyanide (CuPc). 如請求項2所述之組成物,其中該改質有機材料包含一改質基團,該改質基團係選自於由磺酸基、羥基、醚基、氨基以及(對氯甲基苯)乙烯基所組成之群組。 The composition according to claim 2, wherein the modified organic material comprises a modified group selected from the group consisting of sulfonic acid group, hydroxyl group, ether group, amino group and (p-chloromethylbenzene ) A group consisting of vinyl. 如請求項1所述之組成物,其中該介電填充劑之一平均粒徑為0.1至20微米。 The composition of claim 1, wherein one of the dielectric fillers has an average particle size of 0.1 to 20 microns. 一種電路板結構,包含:至少一絕緣基板,包含一如申請專利範圍第1項所述之用於形成該絕緣基板的組成物;以及至少一重佈線層,位於該絕緣基板上。 A circuit board structure includes: at least one insulating substrate, including a composition for forming the insulating substrate as described in item 1 of the patent application scope; and at least one redistribution layer located on the insulating substrate. 如請求項12所述之電路板結構,更包含一黏著層位於該絕緣基板與該重佈線層之間。 The circuit board structure according to claim 12, further comprising an adhesive layer between the insulating substrate and the redistribution layer. 如請求項13所述之電路板結構,其中該黏著層係選自於由氟樹酯、聚苯醚樹酯、芳烷型環氧樹酯、環氧樹脂、苯氧基樹脂、丙烯酸樹脂、胺基甲酸乙酯樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、液晶聚合物、雙馬來醯亞胺系樹脂及聚醯亞胺樹脂所組成之群組。 The circuit board structure according to claim 13, wherein the adhesive layer is selected from the group consisting of fluororesin, polyphenylene ether resin, aralkyl epoxy resin, epoxy resin, phenoxy resin, acrylic resin, The group consisting of urethane resin, silicone rubber-based resin, parylene resin, liquid crystal polymer, bismaleimide resin and polyimide resin.
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