TW202007720A - 感光性組成物、紅外光截止濾波器、固體攝像元件 - Google Patents

感光性組成物、紅外光截止濾波器、固體攝像元件 Download PDF

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Publication number
TW202007720A
TW202007720A TW108121002A TW108121002A TW202007720A TW 202007720 A TW202007720 A TW 202007720A TW 108121002 A TW108121002 A TW 108121002A TW 108121002 A TW108121002 A TW 108121002A TW 202007720 A TW202007720 A TW 202007720A
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TW
Taiwan
Prior art keywords
photosensitive composition
group
compounds
compound
mass
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TW108121002A
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English (en)
Chinese (zh)
Inventor
北島峻輔
田口貴規
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日商富士軟片股份有限公司
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Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW202007720A publication Critical patent/TW202007720A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
TW108121002A 2018-07-20 2019-06-18 感光性組成物、紅外光截止濾波器、固體攝像元件 TW202007720A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018136948 2018-07-20
JP2018-136948 2018-07-20

Publications (1)

Publication Number Publication Date
TW202007720A true TW202007720A (zh) 2020-02-16

Family

ID=69163490

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108121002A TW202007720A (zh) 2018-07-20 2019-06-18 感光性組成物、紅外光截止濾波器、固體攝像元件

Country Status (3)

Country Link
JP (1) JP7086193B2 (ja)
TW (1) TW202007720A (ja)
WO (1) WO2020017187A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023042447A1 (ja) * 2021-09-16 2023-03-23

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105190374A (zh) * 2013-03-14 2015-12-23 富士胶片株式会社 固体摄像元件及其制造方法、红外光截止滤波器形成用硬化性组合物、照相机模块
JP6305901B2 (ja) * 2014-01-21 2018-04-04 富士フイルム株式会社 近赤外線吸収性組成物、近赤外線カットフィルタおよびその製造方法、ならびに、カメラモジュールおよびその製造方法
TWI744286B (zh) * 2016-02-26 2021-11-01 日商富士軟片股份有限公司 感放射線性組成物、光學濾波器、積層體、圖案形成方法、固體攝像元件、圖像顯示裝置及紅外線感測器
JP6692428B2 (ja) * 2016-07-15 2020-05-13 富士フイルム株式会社 積層体、キット、積層体の製造方法および光学センサ
JP6824276B2 (ja) * 2016-08-30 2021-02-03 富士フイルム株式会社 感光性組成物、硬化膜、光学フィルタ、積層体、パターン形成方法、固体撮像素子、画像表示装置および赤外線センサ
JP6934021B2 (ja) * 2017-01-11 2021-09-08 富士フイルム株式会社 組成物、膜、光学フィルタ、パターン形成方法、固体撮像素子、画像表示装置および赤外線センサ

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Publication number Publication date
JPWO2020017187A1 (ja) 2021-05-13
WO2020017187A1 (ja) 2020-01-23
JP7086193B2 (ja) 2022-06-17

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