TW201945176A - Electromagnetic-wave-permeable metallic-luster article, and decorative member - Google Patents

Electromagnetic-wave-permeable metallic-luster article, and decorative member Download PDF

Info

Publication number
TW201945176A
TW201945176A TW108114181A TW108114181A TW201945176A TW 201945176 A TW201945176 A TW 201945176A TW 108114181 A TW108114181 A TW 108114181A TW 108114181 A TW108114181 A TW 108114181A TW 201945176 A TW201945176 A TW 201945176A
Authority
TW
Taiwan
Prior art keywords
layer
metallic luster
electromagnetic wave
metal layer
luster article
Prior art date
Application number
TW108114181A
Other languages
Chinese (zh)
Inventor
宮本幸大
有本将治
中井孝洋
渡邉太一
陳暁雷
米澤秀行
梨木智剛
Original Assignee
日商日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW201945176A publication Critical patent/TW201945176A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/10Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties

Landscapes

  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention pertains to: an electromagnetic-wave-permeable metallic-luster article provided with a substrate, a metal layer formed on the substrate, and an optical adjustment layer, the metal layer including in at least a part thereof a plurality of portions that are discontinuous with each other, and the optical adjustment layer including at least one high-refractive-index layer that has a refractive index of 1.75 or higher; and a decorative member provided with an adherend member and a electromagnetic-wave-permeable metallic-luster article, the electromagnetic-wave-permeable metallic-luster article being affixed to the adherend member via an adhesive layer comprising a transparent adhesive.

Description

電磁波透過性金屬光澤物品及加飾構件Electromagnetic wave-transmitting metallic luster articles and decorative members

本發明是有關電磁波透過性金屬光澤物品及加飾構件。The present invention relates to an electromagnetic wave-transmitting metallic luster article and a decorative member.

以往,具有電磁波透過性及金屬光澤的構件因為兼備來自其金屬光澤的外觀的高級感及電磁波透過性,所以適用於收發電磁波的裝置。
例如,被要求對於前面進氣格柵(front grille)、標誌(emblem)等的汽車的前面部分所搭載的毫米波雷達的罩(cover)構件施以裝飾之兼備光輝性與電磁波透過性的雙方的金屬光澤物品。
Conventionally, a member having electromagnetic wave permeability and metallic luster has both high-grade appearance and electromagnetic wave permeability from the appearance of metallic luster, and is therefore suitable for a device for transmitting and receiving electromagnetic waves.
For example, a cover member of a millimeter-wave radar mounted on a front part of a car such as a front grille or an emblem is required to provide both decoration with both brilliance and electromagnetic wave permeability. Metallic shiny items.

毫米波雷達是將毫米波頻的電磁波(頻率約77GHz,波長約4mm)發送至汽車的前方,接收來自目標的反射波,測定、分析反射波,藉此可計測與目標的距離或目標的方向、大小。
計測結果是可利用於車間計測、速度自動調整、煞車自動調整等。
配置有如此的毫米波雷達的汽車的前面部分是所謂汽車的臉,給予使用者巨大的影響的部分,因此以金屬光澤調的前面裝飾來演出高級感為理想。然而,在汽車的前面部分使用金屬的情況,藉由毫米波雷達之電磁波的收發實質上不可能或被妨害。因此,為了不妨礙毫米波雷達的機能,不破壞汽車的設計性,而須兼備光輝性與電磁波透過性的雙方的金屬光澤物品。
The millimeter-wave radar sends millimeter-wave electromagnetic waves (frequency of about 77 GHz and wavelength of about 4 mm) to the front of the car, receives reflected waves from the target, and measures and analyzes the reflected waves to measure the distance to the target or the direction of the target. ,size.
The measurement results can be used for workshop measurement, automatic speed adjustment, and automatic brake adjustment.
The front part of a car equipped with such a millimeter-wave radar is a so-called face of a car that gives a user a great influence. Therefore, it is ideal to perform a high-end look with a metallic gloss-tone front decoration. However, in the case of using metal in the front part of the car, it is practically impossible or obstructed to transmit and receive electromagnetic waves by the millimeter wave radar. Therefore, in order not to hinder the function of the millimeter-wave radar and not to destroy the design of the car, it is necessary to have a metallic luster that has both brightness and electromagnetic wave permeability.

此種的金屬光澤物品是不僅毫米波雷達,須通訊的各種的機器,例如設置智慧鑰匙(smart key)的汽車的門把手、車載通訊機器、行動電話、個人電腦等的電子機器等的應用被期待。而且,近年來隨著IoT技術的發達,以往無進行通訊等的冰箱等的家電製品、生活機器等廣泛領域的應用也被期待。Such metallic luster items are used for various devices that not only communicate with millimeter-wave radar, but also door handles of automobiles equipped with smart keys, on-board communication devices, mobile phones, personal computers, and other electronic devices. look forward to. In addition, with the development of IoT technology in recent years, applications in a wide range of fields, such as home appliances and living appliances, which have not conventionally been used for communication, are also expected.

有關金屬光澤構件,在日本特開2007-144988號公報(專利文獻1)是揭示包括由鉻(Cr)或銦(In)所成的金屬被膜的樹脂製品。此樹脂製品是包括:包含樹脂基材及被成膜於該樹脂基材上的無機化合物的無機質底層膜,及在該無機質底層膜上藉由物理蒸鍍法所成膜的光輝性及不連續構造的鉻(Cr)或銦(In)所成的金屬皮膜。作為無機質底層膜,在專利文獻1是使用(a)金屬化合物的薄膜,例如氧化鈦(TiO、TiO2 、Ti3 O5 等)等的鈦化合物;氧化矽(SiO、SiO2 等)、氮化矽(Si3 N4 等)等的矽化合物;氧化鋁(Al2 O3 )等的鋁化合物;氧化鐵(Fe2 O3 )等的鐵化合物;氧化硒(CeO)等的硒化合物;氧化鋯(ZrO)等的鋯化合物;硫化鋅(ZnS)等的鋅化合物等、(b)無機塗料的塗膜,例如以矽、非晶質(amorphous)TiOz 等(其他上述例示的金屬化合物)作為主成分的無機塗料之塗膜。Regarding metallic luster members, Japanese Patent Application Laid-Open No. 2007-144988 (Patent Document 1) discloses a resin product including a metal film made of chromium (Cr) or indium (In). The resin product includes an inorganic underlayer film including a resin substrate and an inorganic compound formed on the resin substrate, and the brightness and discontinuity of the film formed by the physical evaporation method on the inorganic underlayer film. Structured metal film made of chromium (Cr) or indium (In). As the inorganic underlayer film, Patent Document 1 is a thin film using (a) a metal compound, for example, a titanium compound such as titanium oxide (TiO, TiO 2 , Ti 3 O 5, etc.); silicon oxide (SiO, SiO 2, etc.), nitrogen Silicon compounds such as silicon oxide (Si 3 N 4 etc.); aluminum compounds such as aluminum oxide (Al 2 O 3 ); iron compounds such as iron oxide (Fe 2 O 3 ); selenium compounds such as selenium oxide (CeO); Zirconium compounds such as zirconium oxide (ZrO); zinc compounds such as zinc sulfide (ZnS); (b) coating films of inorganic coatings; for example, silicon, amorphous TiO z, etc. (other metal compounds as exemplified above) ) A coating film of an inorganic paint as a main component.

另一方面,在日本特開2009-298006號公報(專利文獻2)是揭示:不僅鉻(Cr)或銦(In),也可以鋁(Al)、銀(Ag)、鎳(Ni)作為金屬膜形成的電磁波透過性光輝樹脂製品。
在日本特開2010-5999號公報(專利文獻3)是記載:在母材薄板形成金屬膜層,一面對母材薄板負荷張力,一面進行加熱處理,藉此製造具有龜裂的電磁波透過性的金屬膜加飾薄板之方法。
在日本特許第4601262號公報(專利文獻4)是記載:在透明樹脂成形品上,層疊具有藉由不連續的膜構造的金屬薄膜層所產生的金屬發色部分的加飾層之罩面板。
[先前技術文獻]
[專利文獻]
On the other hand, Japanese Patent Application Laid-Open No. 2009-298006 (Patent Document 2) discloses that not only chromium (Cr) or indium (In), but also aluminum (Al), silver (Ag), and nickel (Ni) can be used as the metal. Film-formed electromagnetic wave transmissive bright resin product.
In Japanese Patent Application Laid-Open No. 2010-5999 (Patent Document 3), it is described that a metal film layer is formed on a base material sheet, and heat treatment is performed while facing the base material sheet load tension, thereby producing cracked electromagnetic wave permeability. Method of decorating thin metal film.
Japanese Patent No. 4601262 (Patent Document 4) describes a cover panel in which a decorative layer having a metal colored portion generated by a metal thin film layer having a discontinuous film structure is laminated on a transparent resin molded article.
[Prior technical literature]
[Patent Literature]

[專利文獻1] 日本特開2007-144988號公報
[專利文獻2] 日本特開2009-298006號公報
[專利文獻3] 日本特開2010-5999號公報
[專利文獻4] 日本特許第4601262號公報
[Patent Document 1] Japanese Patent Laid-Open No. 2007-144988
[Patent Document 2] Japanese Patent Laid-Open No. 2009-298006
[Patent Document 3] Japanese Patent Laid-Open No. 2010-5999
[Patent Document 4] Japanese Patent No. 4601262

(發明所欲解決的課題)(Problems to be solved by the invention)

以往技術的金屬光澤物品,一般是在平滑面形成金屬層者。然而,對於金屬光澤物品的設計的需求多樣化,例如被著色的金屬光澤物品也期望。
本案發明是有鑑於上述而研發者,提供一種兼顧電磁波透過性與高的光輝性,被著色的電磁波透過性金屬光澤物品。

(用以解決課題的手段)
Conventionally, metallic luster articles are generally those in which a metal layer is formed on a smooth surface. However, the demand for the design of metallic shiny articles is diversified, and for example, colored metallic shiny articles are also desired.
The present invention has been developed in view of the above-mentioned circumstances, and provides a colored electromagnetic wave-transmitting metallic luster article that is compatible with electromagnetic wave permeability and high brightness.

(Means for solving problems)

本發明者等為了解決上述課題,經深入檢討的結果發現,藉由將通常難形成不連續構造,例如由鋁(Al)等其他的金屬所成的金屬層設為不連續構造,且具備至少包含1層折射率1.75以上的高折射率層的光學調整層,可兼顧電磁波透過性與高的光輝性,取得被著色的金屬外觀,完成本發明。In order to solve the above-mentioned problems, the inventors have conducted an in-depth review and found that it is difficult to form a discontinuous structure, for example, a metal layer made of other metals such as aluminum (Al) has a discontinuous structure and has at least The optical adjustment layer including one high refractive index layer having a refractive index of 1.75 or more can achieve both the electromagnetic wave transmission and high brightness, and obtain a colored metallic appearance, and completed the present invention.

本發明之一形態,係有關一種電磁波透過性金屬光澤物品,其係具備:基體,被形成於前述基體上的金屬層,及至少1層的光學調整層,
前述金屬層,係包括至少一部分處於互相不連續的狀態的複數的部分,
前述光學調整層,係至少包括1層折射率1.75以上的高折射率層。
One aspect of the present invention relates to an electromagnetic wave-transmitting metallic luster article including a substrate, a metal layer formed on the substrate, and at least one optical adjustment layer.
The aforementioned metal layer includes a plurality of portions in which at least a portion is in a state of being discontinuous from each other,
The optical adjustment layer includes at least one high refractive index layer having a refractive index of 1.75 or more.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述光學調整層的厚度亦可為10nm~1000nm。In one form of the electromagnetic wave transmissive metallic luster article of the present invention, the thickness of the optical adjustment layer may be 10 nm to 1000 nm.

在本發明的電磁波透過性金屬光澤物品之一形態中,設有前述光學調整層的側的波長380nm~780nm的範圍的反射率的最大值與最小值的差亦可為30%以上。In one form of the electromagnetic-wave-transmitting metallic luster article of the present invention, the difference between the maximum value and the minimum value of the reflectance in a range of wavelengths from 380 nm to 780 nm on the side where the optical adjustment layer is provided may be 30% or more.

在本發明的電磁波透過性金屬光澤物品之一形態中,在前述基體與前述金屬層之間更具備含氧化銦層為理想。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, it is preferable to further include an indium oxide-containing layer between the substrate and the metal layer.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述含氧化銦層係以連續狀態設置為理想。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, it is preferable that the indium oxide-containing layer is provided in a continuous state.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述含氧化銦層,係包含氧化銦(In2 O3 )、銦錫氧化物(ITO)、或銦鋅氧化物(IZO)的任一者為理想。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, the indium oxide-containing layer includes any one of indium oxide (In 2 O 3 ), indium tin oxide (ITO), or indium zinc oxide (IZO). One is ideal.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述含氧化銦層的厚度為1nm~1000nm為理想。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, the thickness of the indium oxide-containing layer is preferably 1 nm to 1000 nm.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述金屬層的厚度為20nm~100nm為理想。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, the thickness of the metal layer is preferably 20 nm to 100 nm.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述金屬層的厚度與前述含氧化銦層的厚度的比(前述金屬層的厚度/前述含氧化銦層的厚度)亦可為0.02~100。In one form of the electromagnetic wave transmissive metallic luster article of the present invention, the ratio of the thickness of the metal layer to the thickness of the indium oxide-containing layer (the thickness of the metal layer / the thickness of the indium oxide-containing layer) may be 0.02 to 100.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述複數的部分係亦可形成島狀。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, the plurality of portions may be formed in an island shape.

在本發明的電磁波透過性金屬光澤物品之一形態中,薄膜電阻為100Ω/□以上為理想。In one form of the electromagnetic wave-transmitting metallic luster article of the present invention, the sheet resistance is preferably 100 Ω / □ or more.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述金屬層,係鋁(Al)、鋅(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)、或該等的合金的任一者。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, the metal layer is aluminum (Al), zinc (Zn), lead (Pb), copper (Cu), silver (Ag), or an alloy thereof. Either.

在本發明的電磁波透過性金屬光澤物品之一形態中,前述基體,係基材薄膜、樹脂成型物基材、玻璃基材、或應賦予金屬光澤的物品的任一者。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, the substrate is any one of a substrate film, a resin molded article substrate, a glass substrate, or an article to be provided with metallic luster.

在本發明的電磁波透過性金屬光澤物品之一形態中,更具備由透明黏著劑所成的黏著劑層為理想。In one aspect of the electromagnetic wave-transmitting metallic luster article of the present invention, it is preferable to further include an adhesive layer made of a transparent adhesive.

本發明之一形態,係有關一種加飾構件,其係具備:被黏著構件,及前述電磁波透過性金屬光澤物品,
前述電磁波透過性金屬光澤物品係經由前述黏著劑層來貼附於前述被黏著構件。
One aspect of the present invention relates to a decorative member comprising: an adhered member and the aforementioned electromagnetic wave-transmitting metallic luster article,
The electromagnetic wave-transmitting metallic luster article is adhered to the adherend member via the adhesive layer.

在本發明的加飾構件之一形態中,在前述被黏著構件側的反射光的CIE-Lab表色系中,a* 值及b* 值的二次方和的平方根為5.0以上為理想。In one form of the decorative member of the present invention, in the CIE-Lab color system of the reflected light on the adhered member side, the square root of the square sum of the a * value and the b * value is preferably 5.0 or more.

在本發明的加飾構件之一形態中,前述被黏著構件側的波長380nm~780nm的範圍的反射率的最大值與最小值的差為20%以上為理想。

[發明的效果]
In one form of the decorative member of the present invention, the difference between the maximum value and the minimum value of the reflectance in the wavelength range of 380 nm to 780 nm on the side of the adhered member is preferably 20% or more.

[Effect of the invention]

若根據本發明,則可提供一種兼顧電磁波透過性與高的光輝性,具有被著色的金屬外觀之電磁波透過性金屬光澤物品及金屬薄膜。According to the present invention, it is possible to provide an electromagnetic wave transmissive metallic luster and a metal film that have both the electromagnetic wave permeability and high brightness and have a metallic appearance that is colored.

以下,一面參照圖面,一面說明有關本發明之一個的適宜的實施形態。以下,為了說明的方便起見,只顯示本發明的適宜的實施形態,但當然本發明並非限於此。Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. In the following, for convenience of explanation, only suitable embodiments of the present invention will be shown, but the present invention is not limited thereto.

<1.基本構成>
在圖1顯示本發明之一實施形態的電磁波透過性金屬光澤物品(以下稱為「金屬光澤物品」)1的概略剖面圖,在圖3顯示本發明之一實施形態的金屬光澤物品1的表面的電子顯微鏡照片(SEM畫像)。並且,在圖9顯示本發明之一實施形態的島狀構造的金屬層11的剖面的透過型電子顯微鏡照片(TEM畫像)。
< 1. Basic structure >
FIG. 1 shows a schematic cross-sectional view of an electromagnetic wave-transmitting metallic luster article (hereinafter referred to as a “metal luster article”) 1 according to an embodiment of the present invention, and FIG. 3 illustrates a surface of the metallic luster article 1 according to an embodiment of the present invention. Electron micrograph (SEM image). In addition, FIG. 9 shows a transmission electron microscope photograph (TEM image) of a cross section of the metal layer 11 of the island structure according to the embodiment of the present invention.

金屬光澤物品1是包括基體10,被形成於基體10上的金屬層12及光學調整層13。The metallic gloss article 1 includes a base body 10, a metal layer 12 and an optical adjustment layer 13 formed on the base body 10.

金屬層12是被形成於基體10上。金屬層12是包括複數的部分12a。金屬層12的該等的部分12a是至少一部分處於互相不連續的狀態,換言之,至少一部分藉由間隙12b來隔開。因為藉由間隙12b隔開,所以金屬光澤物品的薄膜電阻變大,與電波的相互作用降低,因此可容易使電波透過。該等的各部分12a是亦可為藉由將金屬蒸鍍、濺射等來形成的濺射粒子的集合體。The metal layer 12 is formed on the base body 10. The metal layer 12 includes a plurality of portions 12a. Such portions 12a of the metal layer 12 are at least partially discontinuous from each other, in other words, at least a portion is separated by a gap 12b. Since they are separated by the gap 12b, the sheet resistance of the metallic luster article is increased, and the interaction with the radio wave is reduced, so that the radio wave can be easily transmitted. Each of these portions 12a is an aggregate of sputtered particles that may be formed by metal deposition, sputtering, or the like.

另外,在本說明書所謂的「不連續的狀態」是意思藉由間隙12b來互相隔開,此結果,彼此被電性絕緣的狀態。藉由被電性絕緣,薄膜電阻變大,可取得所望的電磁波透過性。亦即,若根據以不連續的狀態形成的金屬層12,則容易取得充分的光輝性,亦可確保電磁波透過性。不連續的形態不是被特別限定者,例如包含島狀構造、龜裂構造等。在此所謂「島狀構造」是如圖3所示般,金屬粒子彼此間各自獨立,該等的粒子彼此些微離間或部分接觸的狀態下鋪滿而成的構造。In addition, the "discontinuous state" referred to in this specification means a state separated from each other by the gap 12b. As a result, the states are electrically insulated from each other. By being electrically insulated, the sheet resistance is increased, and desired electromagnetic wave permeability can be obtained. That is, when the metal layer 12 is formed in a discontinuous state, sufficient brightness is easily obtained, and electromagnetic wave permeability is also ensured. The discontinuous form is not particularly limited, and includes, for example, an island structure and a cracked structure. The "island-like structure" here is a structure in which metal particles are independent from each other as shown in FIG. 3, and such particles are in a state of being slightly apart or partially in contact with each other.

所謂龜裂構造是金屬薄膜會藉由龜裂而被分斷的構造。
龜裂構造的金屬層12是例如可藉由在基材薄膜上設置金屬薄膜層,彎曲延伸使龜裂產生於金屬薄膜層而形成。此時,在基材薄膜與金屬薄膜層之間缺乏伸縮性,亦即藉由設置由容易因延伸而產生龜裂的素材所成的脆性層,可容易形成龜裂構造的金屬層12。
The crack structure is a structure in which a metal thin film is broken by cracks.
The metal layer 12 with a cracked structure can be formed, for example, by providing a metal thin film layer on a base film, and bending and extending to cause cracks in the metal thin film layer. At this time, there is a lack of elasticity between the base film and the metal thin film layer, that is, a metal layer 12 having a cracked structure can be easily formed by providing a brittle layer made of a material that is easily cracked by extension.

如上述般,金屬層12成為不連續的形態是不被特別限定,但從生產性的觀點,島狀構造為理想。As described above, it is not particularly limited that the metal layer 12 has a discontinuous form, but an island structure is preferable from the viewpoint of productivity.

金屬光澤物品1的電磁波透過性是例如可藉由電波透過衰減量來評價。
另外,在微波頻帶(5GHz)的電波透過衰減量與毫米波雷達的頻帶(76~80GHz)的電波透過衰減量之間是有相關性,因為顯示比較接近的值,所以微波頻帶的電磁波透過性佳的金屬光澤物品是在毫米波雷達的頻帶的電磁波透過性也佳。
微波頻帶(5GHz)的電波透過衰減量是10[-dB]以下為理想,5[-dB]以下更理想,2[-dB]以下更加理想。若比10[-dB]大,則有90%以上的電波被遮斷的問題。
The electromagnetic wave permeability of the metallic glossy article 1 can be evaluated, for example, by the amount of attenuation of radio wave transmission.
In addition, there is a correlation between the radio wave transmission attenuation of the microwave band (5GHz) and the radio wave transmission attenuation of the millimeter-wave radar band (76 to 80GHz). Since the values are shown to be relatively close, the electromagnetic wave transmission of the microwave band Good metallic luster items have good electromagnetic wave permeability in the millimeter wave radar frequency band.
The microwave wave (5GHz) radio wave transmission attenuation is preferably 10 [-dB] or less, more preferably 5 [-dB] or less, and 2 [-dB] or less. If it is larger than 10 [-dB], more than 90% of the radio waves are blocked.

金屬光澤物品1的薄膜電阻也與電磁波透過性有相關。
金屬光澤物品1的薄膜電阻是100Ω/□以上為理想,此情況微波頻帶(5GHz)的電波透過衰減量是成為10~0.01[-dB]程度。
金屬光澤物品1的薄膜電阻是200Ω/□以上更理想,600Ω/□以上更加理想。
並且,特別理想是1000Ω/□以上。
金屬光澤物品1的薄膜電阻是可遵照JIS-Z2316-1:2014,藉由渦電流測定法來測定。
The sheet resistance of the metallic glossy article 1 is also related to the electromagnetic wave permeability.
The sheet resistance of the metallic glossy article 1 is preferably 100 Ω / □ or more. In this case, the radio wave transmission attenuation of the microwave band (5 GHz) is about 10 to 0.01 [-dB].
The sheet resistance of the metallic glossy article 1 is more preferably 200 Ω / □ or more, and more preferably 600 Ω / □ or more.
In addition, it is particularly preferably 1000 Ω / □ or more.
The sheet resistance of the metallic luster article 1 can be measured by an eddy current measurement method in accordance with JIS-Z2316-1: 2014.

金屬光澤物品1的電波透過衰減量及薄膜電阻是依金屬層12的材質或厚度等而受影響。
並且,在金屬光澤物品1具備含氧化銦層11的情況,也依含氧化銦層11的材質或厚度等而受影響。
The amount of radio wave transmission attenuation and sheet resistance of the metallic glossy article 1 are affected depending on the material or thickness of the metal layer 12.
In addition, the case where the metallic luster article 1 includes the indium oxide-containing layer 11 is affected depending on the material, thickness, and the like of the indium oxide-containing layer 11.

在本實施形態的電磁波透過性金屬光澤物品中,設有光學調整層的側的波長380nm~780nm的範圍的反射率的最大值與最小值的差為30%以上為理想。若反射率的最大值與最小值的差為30%以上,則可將金屬外觀的著色設為濃者。從著色的濃度的觀點,35%以上更理想,40%以上更加理想。另外,反射率的最大值與最小值的差的上限是不被特別限制。反射率是可藉由實施例記載的方法來測定。In the electromagnetic-wave-transmitting metallic luster article of this embodiment, the difference between the maximum value and the minimum value of the reflectance in the wavelength range of 380 nm to 780 nm on the side where the optical adjustment layer is provided is preferably 30% or more. If the difference between the maximum value and the minimum value of the reflectance is 30% or more, the tint of the appearance of the metal can be made thicker. From the viewpoint of the coloring density, 35% or more is more preferable, and 40% or more is more preferable. The upper limit of the difference between the maximum value and the minimum value of the reflectance is not particularly limited. The reflectance can be measured by the method described in Examples.

<2.基體>
在本實施形態的電磁波透過性金屬光澤物品中,從電磁波透過性的觀點,基體10是可舉樹脂、玻璃、陶瓷等。
基體10是亦可為基材薄膜、樹脂成型物基材、玻璃基材、或應賦予金屬光澤的物品的任一者。
更具體而言,基材薄膜是例如可使用由聚對苯二甲酸乙二酯(PET)、聚對荼二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯、聚醯胺、聚氯乙烯、聚碳酸酯(PC)、環烯烴聚合物(COP)、聚苯乙烯、聚丙烯(PP)、聚乙烯、聚環烯烴、聚氨酯、丙烯酸(PMMA)、ABS等的單獨聚合物或共聚合物所成的透明薄膜。
< 2. Matrix >
In the electromagnetic wave-transmitting metallic luster article of this embodiment, the base 10 may be resin, glass, ceramic, or the like from the viewpoint of electromagnetic wave permeability.
The base body 10 may be any of a base film, a resin molded base, a glass base, or an article to be provided with a metallic luster.
More specifically, the base film can be made of, for example, polyethylene terephthalate (PET), polyethylene terephthalate (PEN), polybutylene terephthalate, polyamide, Individual polymers of polyvinyl chloride, polycarbonate (PC), cycloolefin polymer (COP), polystyrene, polypropylene (PP), polyethylene, polycycloolefin, polyurethane, acrylic (PMMA), ABS, etc. or Copolymer is a transparent film.

若根據該等的構件,則亦無影響光輝性或電磁波透過性的情形。但,從之後形成含氧化銦層11或金屬層12的觀點,可耐於蒸鍍或濺射等的高溫者為理想,因此上述材料之中,例如,聚對苯二甲酸乙二酯、聚對荼二甲酸乙二酯、丙烯酸、聚碳酸酯、環烯烴聚合物、ABS、聚丙烯、聚氨酯為理想。其中又從耐熱性與成本的平衡佳的觀點,聚對苯二甲酸乙二酯或環烯烴聚合物、聚碳酸酯、丙烯酸為理想。According to these components, there is no case that the brightness or electromagnetic wave transmission is affected. However, from the viewpoint of forming the indium oxide-containing layer 11 or the metal layer 12 later, those which can withstand high temperatures such as evaporation and sputtering are desirable. Therefore, among the above materials, for example, polyethylene terephthalate, poly Ethylene terephthalate, acrylic acid, polycarbonate, cycloolefin polymer, ABS, polypropylene, and polyurethane are ideal. Among them, polyethylene terephthalate, a cycloolefin polymer, polycarbonate, and acrylic acid are preferable from the viewpoint of a good balance between heat resistance and cost.

基材薄膜是亦可為單層薄膜,或亦可為層疊薄膜。從加工的容易度等,基材薄膜的厚度是例如6μm~250μm程度為理想。為了增強與含氧化銦層11或金屬層12的附著力,亦可實施電漿處理或易黏著處理等。
基體10為基材薄膜時,金屬層12是只要設於基材薄膜上的至少一部分即可,亦可只設在基材薄膜的一面,或亦可設在兩面。
The base film may be a single-layer film or a laminated film. From the ease of processing and the like, the thickness of the base film is preferably about 6 μm to 250 μm, for example. In order to enhance the adhesion with the indium oxide-containing layer 11 or the metal layer 12, a plasma treatment or an easy adhesion treatment may be performed.
When the substrate 10 is a base film, the metal layer 12 may be provided on at least a part of the base film, or may be provided on only one side of the base film, or may be provided on both sides.

基材薄膜是亦可因應所需,形成平滑性或防眩性硬塗層。藉由設置硬塗層,可使金屬薄膜的擦傷性提升。藉由設置平滑性硬塗層,金屬光澤感會增加,相反的,藉由防眩性硬塗層,可防止眩光。硬塗層是可藉由塗佈含有硬化性樹脂的溶液來形成。The base film can be formed into a smooth or anti-glare hard coat layer as required. By providing a hard coat layer, the abrasion resistance of the metal thin film can be improved. By providing a smooth hard coat layer, the metallic luster is increased. Conversely, with an anti-glare hard coat layer, glare can be prevented. The hard coat layer can be formed by applying a solution containing a curable resin.

硬化性樹脂是可舉熱硬化型樹脂、紫外線硬化型樹脂、電子線硬化型樹脂等。硬化性樹脂的種類是可舉聚酯系、丙烯酸系、胺基甲酸乙酯系、丙烯酸聚氨酯系、醯胺系、矽酮系、矽酸鹽系、環氧系、三聚氰胺系、噁丁環系、丙烯酸聚氨酯系等的各種的樹脂。該等硬化性樹脂是可適當地選擇使用一種或二種以上。該等之中又以丙烯酸系樹脂、丙烯酸聚氨酯系樹脂、及環氧系樹脂為理想,因為硬度高,紫外線硬化可能,生產性佳。Examples of the curable resin include thermosetting resin, ultraviolet curing resin, and electron beam curing resin. Types of the curable resin are polyester, acrylic, urethane, acrylic polyurethane, amine, silicone, silicate, epoxy, melamine, and oxetane. And acrylic resins. These curable resins can be used by selecting one or two or more of them as appropriate. Among these, acrylic resins, acrylic urethane resins, and epoxy resins are preferable, because they have high hardness, are likely to be cured by ultraviolet rays, and have good productivity.

在此,應注意基材薄膜只是可在其表面上形成金屬層12的對象(基體10)之一例的點。基體10是如上述般除了基材薄膜以外,亦包括樹脂成型物基材、玻璃基材、應賦予金屬光澤的物品本身。作為樹脂成型物基材及應賦予金屬光澤的物品是例如可舉車輛用構造零件、車輛搭載用品、電子機器的框體、家電機器的框體、構造用零件、機械零件、各種的汽車用零件、電子機器用零件、傢具、廚房用品等的家居傾向用途、醫療機器、建築資材的零件、其他的構造用零件或外裝用零件等。Here, it should be noted that the base film is only one example of an object (substrate 10) on which the metal layer 12 can be formed on the surface. As described above, the base body 10 includes, in addition to the base material film, a resin molded article base material, a glass base material, and an article itself that should be provided with a metallic luster. Resin-molded article substrates and articles that should be provided with metallic luster are, for example, structural parts for vehicles, vehicle-mounted articles, housings of electronic devices, housings of home appliances, structural parts, mechanical parts, and various automotive parts , Electronic equipment parts, furniture, kitchen appliances and other household applications, medical equipment, construction materials parts, other structural parts or exterior parts.

金屬層12是可形成於該等全部的基體上,亦可形成於基體的表面的一部分,或亦可形成於基體的表面的全部。此情況,應賦予金屬層12的基體10是符合與上述的基材薄膜同樣的材質、條件為理想。The metal layer 12 may be formed on all the substrates, may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. In this case, the base body 10 to be provided to the metal layer 12 is preferably made of the same material and conditions as those of the above-mentioned base film.

<3.含氧化銦層>
又,一實施形態的電磁波透過性金屬光澤物品1是如圖2所示般,亦可在基體10與金屬層12之間更具備含氧化銦層11。含氧化銦層11是亦可直接設於基體10的面,或亦可經由被設在基體10的面的保護膜等來間接地設置。含氧化銦層11是在應賦予金屬光澤的基體10的面以連續狀態換言之無間隙設置為理想。藉由以連續狀態設置,可使含氧化銦層11、進一步金屬層12或金屬光澤物品1的平滑性或耐蝕性提升,且亦容易面內無偏差形成含氧化銦層11。
< 3. Indium oxide-containing layer >
In addition, as shown in FIG. 2, the electromagnetic-wave-transmitting metallic luster article 1 according to an embodiment may further include an indium oxide-containing layer 11 between the substrate 10 and the metal layer 12. The indium oxide-containing layer 11 may be directly provided on the surface of the substrate 10, or may be provided indirectly through a protective film or the like provided on the surface of the substrate 10. The indium oxide-containing layer 11 is preferably provided in a continuous state, that is, without gaps, on the surface of the substrate 10 that should be provided with metallic gloss. By setting in a continuous state, the smoothness or corrosion resistance of the indium oxide-containing layer 11, the further metal layer 12, or the metallic luster article 1 can be improved, and the indium oxide-containing layer 11 can be easily formed without deviation in the plane.

若藉由如此在基體10與金屬層12之間更具備含氧化銦層11,亦即在基體10上形成含氧化銦層11,在其上形成金屬層12,則容易以不連續的狀態形成金屬層12,因此為理想。其機構的詳細未必明確,但可思考藉由金屬的蒸鍍或濺射之濺射粒子在基體上形成薄膜時,在基體上的粒子的表面擴散性會影響薄膜的形狀,基體的溫度高,金屬層對於基體的浸潤性小,金屬層的材料的融點低較容易形成不連續構造。而且,藉由在基體上設置含氧化銦層,其表面上的金屬粒子的表面擴散性會被促進,容易使金屬層以不連續的狀態成長。If the indium oxide-containing layer 11 is further provided between the substrate 10 and the metal layer 12 in this way, that is, the indium oxide-containing layer 11 is formed on the substrate 10 and the metal layer 12 is formed thereon, it is easy to form it in a discontinuous state. The metal layer 12 is therefore preferable. The details of the mechanism may not be clear, but it can be considered that when a thin film is formed on a substrate by sputtering particles of metal evaporation or sputtering, the surface diffusivity of the particles on the substrate will affect the shape of the film, and the temperature of the substrate is high. The wettability of the metal layer to the substrate is small, and the melting point of the material of the metal layer is low, and it is easy to form a discontinuous structure. Moreover, by providing an indium oxide-containing layer on the substrate, the surface diffusivity of the metal particles on the surface is promoted, and the metal layer is easily grown in a discontinuous state.

作為含氧化銦層11,亦可使用氧化銦(In2 O3 )本身,或例如亦可使用銦錫氧化物(ITO)或銦鋅氧化物(IZO)之類的含金屬物。但,含有第二金屬的ITO或IZO在濺射工程的放電安定性較高的點,更理想。藉由使用該等的含氧化銦層11,亦可容易沿著基體的面來形成連續狀態的膜,且此情況容易將被層疊於含氧化銦層上的金屬層例如設為島狀的不連續構造,因此為理想。而且,如後述般,此情況,在金屬層中,不僅鉻(Cr)或銦(In),容易含通常難形成不連續構造,難適用於本用途的鋁等的各種的金屬。As the indium oxide-containing layer 11, indium oxide (In 2 O 3 ) itself may be used, or for example, a metal-containing substance such as indium tin oxide (ITO) or indium zinc oxide (IZO) may be used. However, ITO or IZO containing a second metal is more desirable at the point of higher discharge stability of the sputtering process. By using such an indium oxide-containing layer 11, it is also easy to form a continuous film along the surface of the substrate, and in this case, it is easy to make the metal layer laminated on the indium oxide-containing layer into an island-like layer. Continuous structure is ideal. In addition, as will be described later, in this case, not only chromium (Cr) or indium (In), but also various metals such as aluminum, which are generally difficult to form a discontinuous structure and difficult to apply to the present application, are easily contained in the metal layer.

在ITO所含的氧化錫(SnО2 )的質量比率之含有率(含有率=(SnO2 /(In2 O3 +SnO2 ))×100)是未被特別限定,例如2.5wt%~30wt%,更理想是3wt%~10wt%。並且,在IZO所含的氧化鋅(ZnO)的質量比率之含有率(含有率=(ZnO/(In2 O3 +ZnO))×100)是例如2wt%~20wt%。
含氧化銦層11的厚度,從薄膜電阻或電磁波透過性、生產性的觀點,通常1000nm以下為理想,50nm以下更理想,20nm以下更加理想。另一方面,為了容易將被層疊的金屬層12設為不連續狀態,1nm以上為理想,為了容易確實地形成不連續狀態,2nm以上更理想,5nm以上更加理想。
The content ratio (content ratio = (SnO 2 / (In 2 O 3 + SnO 2 )) × 100) of the mass ratio of tin oxide (SnО 2 ) contained in ITO is not particularly limited, for example, 2.5 wt% to 30 wt %, More preferably 3wt% ~ 10wt%. The content ratio (content ratio = (ZnO / (In 2 O 3 + ZnO)) × 100) of the mass ratio of zinc oxide (ZnO) contained in the IZO is, for example, 2 wt% to 20 wt%.
The thickness of the indium oxide-containing layer 11 is preferably 1,000 nm or less, more preferably 50 nm or less, and more preferably 20 nm or less from the viewpoints of sheet resistance, electromagnetic wave permeability, and productivity. On the other hand, in order to make the laminated metal layer 12 into a discontinuous state easily, 1 nm or more is preferable, and in order to easily and reliably form the discontinuous state, 2 nm or more is more preferable, and 5 nm or more is more preferable.

<4.金屬層>
金屬層12是被形成於基體上,包括至少一部分處於互相不連續的狀態的複數的部分。
當金屬層12在基體上為連續狀態時,雖可取得充分的光輝性,但電波透過衰減量非常大,因此無法確保電磁波透過性。
< 4. Metal layer >
The metal layer 12 is formed on a substrate, and includes a plurality of portions in which at least a portion is in a state of being discontinuous from each other.
When the metal layer 12 is in a continuous state on the substrate, sufficient brightness can be obtained, but the amount of radio wave transmission attenuation is very large, and therefore the electromagnetic wave transmission cannot be ensured.

金屬層12在基體上成為不連續狀態的機構的詳細未必明確,但大致可推測如其次般。亦即,在金屬層12的薄膜形成製程中,不連續構造的形成容易度是與在被賦予金屬層12的基體上的表面擴散有關聯性,基體的溫度高,金屬層對於基體的浸潤性小,金屬層的材料的融點低較容易形成不連續構造。因此,有關在以下的實施例特別使用的鋁(Al)以外的金屬,鋅(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)等的比較融點低的金屬也可思考以同樣的手法來形成不連續構造。The details of the mechanism in which the metal layer 12 becomes discontinuous on the substrate are not necessarily clear, but it can be presumed to be the second most. That is, in the thin film formation process of the metal layer 12, the ease of forming the discontinuous structure is related to the surface diffusion on the substrate to which the metal layer 12 is given, the temperature of the substrate is high, and the wettability of the metal layer to the substrate The small, low melting point of the material of the metal layer makes it easier to form a discontinuous structure. Therefore, regarding metals other than aluminum (Al), which are specifically used in the following examples, metals with relatively low melting points such as zinc (Zn), lead (Pb), copper (Cu), and silver (Ag) can also be considered. The same technique is used to form discontinuous structures.

在此,所謂複數的部分12a的平均粒徑是意思複數的部分12a的相當於圓的直徑的平均值。所謂部分12a的相當於圓的直徑是相當於部分12a的面積之完全的圓形的直徑。複數的部分12a的平均粒徑是可以實施例的欄記載的方法來測定。
金屬層12的部分12a的相當於圓的直徑是不被特別限定,但通常為10~1000nm程度。又,各部分12a彼此間的距離是不被特別限定,但通常是10~1000nm程度。
Here, the average particle diameter of the plural portion 12a means an average value of the diameters of the circles corresponding to the plural portion 12a. The circle-equivalent diameter of the portion 12a is the diameter of the complete circle corresponding to the area of the portion 12a. The average particle diameter of the plurality of portions 12a can be measured by the method described in the column of the examples.
The diameter corresponding to a circle of the portion 12a of the metal layer 12 is not particularly limited, but is usually about 10 to 1000 nm. The distance between the portions 12a is not particularly limited, but is usually about 10 to 1000 nm.

藉由將金屬層所含的處於互相不連續的狀態的複數的部分12a的平均粒徑設為上述的範圍,可在維持高的電磁波透過性之下,更提升光輝性。By setting the average particle diameter of the plurality of portions 12a contained in the metal layer in a state of being discontinuous to each other within the above-mentioned range, it is possible to further enhance the brightness while maintaining high electromagnetic wave permeability.

金屬層12當然是可發揮充分的光輝性,最好融點比較低者。因為金屬層12是藉由使用濺射的薄膜成長來形成為理想。基於如此的理由,作為金屬層12是融點約為1000℃以下的金屬為適,例如,從鋁(Al)、鋅(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)選擇的至少一種的金屬、及以該金屬作為主成分的合金的任一者為理想。特別是基於物質的光輝性或安定性、價格等的理由,Al及該等的合金為理想。又,使用鋁合金時,將含鋁量設為50質量%以上為理想。Of course, the metal layer 12 can exhibit sufficient brightness, and preferably has a relatively low melting point. This is because the metal layer 12 is preferably formed by growing a thin film by sputtering. For this reason, it is suitable that the metal layer 12 is a metal having a melting point of about 1000 ° C. or lower, and is selected from, for example, aluminum (Al), zinc (Zn), lead (Pb), copper (Cu), and silver (Ag). Any one of at least one metal and an alloy containing the metal as a main component is preferable. In particular, Al and these alloys are preferable for reasons such as the brightness, stability, and price of the substance. When an aluminum alloy is used, the aluminum content is preferably 50% by mass or more.

金屬層12的厚度是以發揮充分的光輝性的方式,通常20nm以上為理想,另一方面,從薄膜電阻或電磁波透過性的觀點,通常100nm以下為理想。例如,20nm~100nm為理想,30nm~70nm更理想。此厚度是也適於生產性佳形成均一的膜,且最終製品的樹脂成形品的美觀亦佳。另外,金屬層12的厚度是可以實施例的欄記載的方法來測定。The thickness of the metal layer 12 is sufficient to exhibit sufficient brightness, and is usually preferably 20 nm or more. On the other hand, from the viewpoint of sheet resistance or electromagnetic wave permeability, it is usually 100 nm or less. For example, 20 nm to 100 nm is ideal, and 30 nm to 70 nm is more ideal. This thickness is also suitable for forming a uniform film with high productivity, and the appearance of the resin molded product of the final product is also good. The thickness of the metal layer 12 can be measured by the method described in the column of the examples.

並且,基於同樣的理由,金屬層的厚度與含氧化銦層的厚度的比(金屬層的厚度/含氧化銦層的厚度)是0.1~100的範圍為理想,0.3~35的範圍更理想。For the same reason, the ratio of the thickness of the metal layer to the thickness of the indium oxide-containing layer (thickness of the metal layer / thickness of the indium oxide-containing layer) is preferably in the range of 0.1 to 100, and more preferably in the range of 0.3 to 35.

金屬層的薄膜電阻是100Ω/□以上為理想。此情況,電磁波透過性是在5GHz的波長,成為10~0.01[-dB]程度。更理想是1000Ω/□以上。The sheet resistance of the metal layer is preferably 100Ω / □ or more. In this case, the electromagnetic wave transmittance is at a wavelength of 5 GHz, and becomes approximately 10 to 0.01 [-dB]. More preferably, it is 1000Ω / □ or more.

更設置含氧化銦層時,作為金屬層與含氧化銦層的層疊體的薄膜電阻是100Ω/□以上為理想。此情況,電磁波透過性是在5GHz的波長,成為10~0.01[-dB]程度。更理想是1000Ω/□以上。此薄膜電阻的值是當然受金屬層的材質或厚度影響,從底層的含氧化銦層的材質或厚度也受到大的影響。因此,設置含氧化銦層時,與含氧化銦層的關係也須考慮後設定。When an indium oxide-containing layer is further provided, the sheet resistance of the laminate of the metal layer and the indium oxide-containing layer is preferably 100 Ω / □ or more. In this case, the electromagnetic wave transmittance is at a wavelength of 5 GHz, and becomes approximately 10 to 0.01 [-dB]. More preferably, it is 1000Ω / □ or more. The value of this sheet resistance is, of course, affected by the material or thickness of the metal layer, and the material or thickness of the underlying indium oxide-containing layer is also greatly affected. Therefore, when the indium oxide-containing layer is provided, the relationship with the indium oxide-containing layer must be set after taking into consideration.

<5.光學調整層>
光學調整層是至少包含1層,折射率1.75以上的高折射率層。
光學調整層是設在金屬層12會被視認的側為理想,可直接設在金屬層12上,亦可經由其他的層來設置。例如,在一實施形態的金屬光澤物品1中,如圖1所示般,亦可設在與金屬層12的基體10側相反的面上,如圖2所示般,亦可設在金屬層12與基體10之間。另外,將光學調整層13直接設在金屬層12上時,光學調整層13是只要被層疊於金屬層12上即可,亦可不一定要完全填埋間隙12b。
<5. Optical adjustment layer>
The optical adjustment layer is a high refractive index layer including at least one layer and having a refractive index of 1.75 or more.
The optical adjustment layer is preferably provided on the side where the metal layer 12 will be recognized, and may be directly provided on the metal layer 12 or may be provided through another layer. For example, as shown in FIG. 1, the metallic luster article 1 in one embodiment may be provided on the surface opposite to the base 10 side of the metal layer 12, as shown in FIG. 2, or may be provided on the metal layer. 12 and the base body 10. When the optical adjustment layer 13 is directly provided on the metal layer 12, the optical adjustment layer 13 may be laminated on the metal layer 12, and the gap 12 b may not necessarily be completely filled.

若高折射率層的折射率為1.75以上,則可取得著色的金屬外觀,可設為設計性佳的金屬光澤物品。為了取得顏色更濃的金屬外觀,高折射率層的折射率是1.8以上為理想,1.9以上更理想。並且,從厚度控制性的觀點,3.5以下為理想,3.0以下更理想。
光學調整層是亦可為至少1層的折射率不同的層的層疊體。
作為高折射率層的材料,例如CeO2 (2.30)、Nd2 O3 (2.15)、Nb2 O5 (2.20)、SiN(2.03)、Sb2 O3 (2.10)、TiO2 (2.35)、Ta2 O5 (2.10)、ZrO2 (2.05)、ZnO(2.10)、ZnS(2.30)等的無機物〔上述各材料的括弧內的數值是折射率〕或其混合物為理想,氧化鈮(Nb2 O5 )或SiN(2.03)為理想。
When the refractive index of the high-refractive-index layer is 1.75 or more, a colored metallic appearance can be obtained, and it can be set as a metallic glossy article with good design. In order to obtain a metallic appearance with a stronger color, the refractive index of the high refractive index layer is preferably 1.8 or more, and more preferably 1.9 or more. Further, from the viewpoint of thickness controllability, 3.5 or less is preferable, and 3.0 or less is more preferable.
The optical adjustment layer may be a laminate of at least one layer having different refractive indexes.
Examples of the material of the high refractive index layer include CeO 2 (2.30), Nd 2 O 3 (2.15), Nb 2 O 5 (2.20), SiN (2.03), Sb 2 O 3 (2.10), TiO 2 (2.35), Inorganic substances such as Ta 2 O 5 (2.10), ZrO 2 (2.05), ZnO (2.10), ZnS (2.30) (the values in parentheses of the above materials are refractive indices) or a mixture thereof is preferred. Niobium oxide (Nb 2 O 5 ) or SiN (2.03) is preferable.

光學調整層的厚度是10nm~1000nm為理想。從成本的觀點,800nm以下更理想,500nm以下更加理想。又,從顏色的觀點,15nm以上為理想,20nm以上更理想,30nm以上更加理想。The thickness of the optical adjustment layer is preferably 10 nm to 1000 nm. From a cost standpoint, 800 nm or less is more desirable, and 500 nm or less is more desirable. From a color standpoint, 15 nm or more is preferable, 20 nm or more is more preferable, and 30 nm or more is more preferable.

<6.黏著劑層>
黏著劑層14是由透明黏著劑所成的層。本實施形態的金屬光澤物品1是亦可經由黏著劑層14來貼附於被黏著構件15而使用。例如,當基體10為基材薄膜或玻璃基材時,經由黏著劑層14來貼附於透明的被黏著構件15,可從內側裝飾被黏著構件15。
< 6. Adhesive layer >
The adhesive layer 14 is a layer made of a transparent adhesive. The metallic luster article 1 of the present embodiment can also be used by being attached to an adherend 15 via an adhesive layer 14. For example, when the substrate 10 is a substrate film or a glass substrate, the transparent adhered member 15 is attached via the adhesive layer 14, and the adhered member 15 can be decorated from the inside.

形成黏著劑層14的黏著劑是只要為透明黏著劑即可,不被特別限定,例如丙烯酸系黏著劑、橡膠系黏著劑、矽酮系黏著劑、聚酯系黏著劑、胺基甲酸乙酯系黏著劑、環氧系黏著劑、及聚醚系黏著劑的單獨任一者,或組合2種類以上使用。從透明性、加工性及耐久性等的觀點,使用丙烯酸系黏著劑為理想。The adhesive forming the adhesive layer 14 is not particularly limited as long as it is a transparent adhesive, such as an acrylic adhesive, a rubber adhesive, a silicone adhesive, a polyester adhesive, and a urethane. Any one of a system-based adhesive, an epoxy-based adhesive, and a polyether-based adhesive may be used in combination of two or more types. From the viewpoints of transparency, processability, and durability, it is desirable to use an acrylic adhesive.

黏著劑層14的厚度是不被特別限定,但藉由形成薄,可使可視光透過性或膜厚精度、平坦性提升,因此100μm以下為理想,75μm以下更理想,50μm以下更加理想。The thickness of the adhesive layer 14 is not particularly limited, but by forming thin, it is possible to improve visible light transmittance, film thickness accuracy, and flatness. Therefore, the thickness is preferably 100 μm or less, 75 μm or less, and 50 μm or less.

黏著劑層14全體的全光線透過率是不被特別限定,但遵照JIS K7361來測定的任意的可視光波長的值,10%以上為理想,30%以上更理想,50%以上更加理想。黏著劑層14的全光線透過率是越高越理想。The total light transmittance of the entire adhesive layer 14 is not particularly limited, but an arbitrary visible light wavelength value measured in accordance with JIS K7361 is preferably 10% or more, more preferably 30% or more, and more preferably 50% or more. The higher the total light transmittance of the adhesive layer 14 is, the more desirable it is.

又,構成黏著劑層14的透明黏著劑是亦可被著色。
此情況,由於金屬層12會通過被著色的黏著劑層14來視認,因此可發現被著色的金屬光澤。
The transparent adhesive constituting the adhesive layer 14 may be colored.
In this case, since the metal layer 12 is visually recognized by the colored adhesive layer 14, the colored metallic luster can be found.

將透明黏著劑著色的方法是不被特別限定,例如可藉由微量添加色素來著色。The method of coloring a transparent adhesive is not specifically limited, For example, it can color by adding a small amount of pigment.

在黏著劑層14上,至貼附於被黏著構件15時為止,為了保護黏著劑層14,亦可設置剝離襯墊。A release liner may be provided on the adhesive layer 14 to protect the adhesive layer 14 until it is attached to the member 15 to be adhered.

在本實施形態的金屬光澤物品,只要可取得本發明的效果,除了上述的金屬層12、含氧化銦層11、光學調整層13、黏著劑層14以外,亦可按照用途來設置其他的層。作為其他的層是可舉用以調整顏色等的外觀的高折射材料等的光學調整層(顏色調整層)、用以使耐濕性或耐擦傷性等的耐久性提升的保護層(耐擦傷性層)、屏障層(腐蝕防止層)、易黏著層、硬塗層、反射防止層、光取出層、防眩膜(anti-glare)層等。In the metallic luster article of this embodiment, as long as the effect of the present invention can be obtained, in addition to the above-mentioned metal layer 12, the indium oxide-containing layer 11, the optical adjustment layer 13, and the adhesive layer 14, other layers may be provided according to the application. . The other layers include an optical adjustment layer (color adjustment layer) such as a high-refractive material for adjusting appearance such as color, and a protective layer (scratch resistance) for improving durability such as moisture resistance and abrasion resistance. Layer), barrier layer (corrosion prevention layer), easy adhesion layer, hard coating layer, anti-reflection layer, light extraction layer, anti-glare layer, etc.

<7.金屬光澤物品的製造>
說明有關金屬光澤物品1的製造方法之一例。雖未特別說明,但有關使用基材薄膜以外的基體的情況也可以同樣的方法製造。
<7. Manufacturing of metallic shiny articles>
An example of the manufacturing method of the metallic luster article 1 is demonstrated. Although not specifically described, when a substrate other than a base film is used, it can be produced in the same manner.

在基體10上形成金屬層12時,例如可使用真空蒸鍍、濺射等的方法。
作為光學調整層13的形成方法,例如可舉真空蒸鍍法、濺射法、離子電鍍法、塗工法等,可按照材料的種類及必要的膜厚來採用適當的方法。
When forming the metal layer 12 on the substrate 10, a method such as vacuum deposition, sputtering, or the like can be used.
Examples of the method for forming the optical adjustment layer 13 include a vacuum evaporation method, a sputtering method, an ion plating method, and a coating method. An appropriate method may be adopted according to the type of the material and the required film thickness.

並且,在基體10上形成含氧化銦層11時,在金屬層12的形成之前,藉由真空蒸鍍、濺射、離子電鍍(ion plating)等來形成含氧化銦層11。但,從大面積也可嚴格地控制厚度的點,濺射為理想。When the indium oxide-containing layer 11 is formed on the substrate 10, the indium oxide-containing layer 11 is formed by vacuum evaporation, sputtering, ion plating, or the like before the formation of the metal layer 12. However, from the point that the thickness can be strictly controlled from a large area, sputtering is preferable.

在設置黏著劑層14時,可藉由在設置黏著劑層14的面塗佈黏著劑組成物等來形成。
黏著劑組成物的塗佈是可使用慣用的塗佈機(coater),例如凹版輥塗佈機、倒轉輥塗佈機、接觸輥塗佈機、浸塗輥塗佈機、桿塗佈機、刀塗佈機、噴霧塗佈機等來進行。乾燥溫度是可適當採用,理想是40℃~200℃,更理想是50℃~180℃,特別理想是70℃~120℃。乾燥時間是可採用適當、適切的時間。上述乾燥時間,理想是5秒~20分,更理想是5秒~10分,特別理想是10秒~5分。
When the adhesive layer 14 is provided, it can be formed by applying an adhesive composition or the like to the surface on which the adhesive layer 14 is provided.
The adhesive composition can be applied by a conventional coater such as a gravure roll coater, an inverse roll coater, a touch roll coater, a dip roll coater, a rod coater, It is performed by a knife coater, a spray coater, or the like. The drying temperature can be appropriately adopted, and is preferably 40 ° C to 200 ° C, more preferably 50 ° C to 180 ° C, and particularly preferably 70 ° C to 120 ° C. The drying time is an appropriate and appropriate time. The drying time is preferably 5 seconds to 20 minutes, more preferably 5 seconds to 10 minutes, and particularly preferably 10 seconds to 5 minutes.

另外,在基體10與金屬層12之間設置含氧化銦層11時,不使其他的層介於含氧化銦層11與金屬層12之間,使直接接觸為理想。In addition, when the indium oxide-containing layer 11 is provided between the base body 10 and the metal layer 12, it is preferable that no other layers be interposed between the indium oxide-containing layer 11 and the metal layer 12 and direct contact is made.

<8.加飾構件>
本實施形態的加飾構件是具備被黏著構件及上述的電磁波透過性金屬光澤物品,前述電磁波透過性金屬光澤物品(金屬光澤物品1)會經由前述黏著劑層來貼附於前述被黏著構件。
< 8. Decoration member >
The decorative member according to this embodiment includes an adhered member and the electromagnetic wave-transmitting metallic luster article described above, and the electromagnetic wave-transmitting metallic luster article (metallic luster article 1) is attached to the adherend member through the adhesive layer.

金屬光澤物品1是亦可貼附於透明的被黏著構件2的內側的面而使用。透明的被黏著構件15是例如可使用由玻璃或塑膠所成的構件,但並非限於此。The metallic luster article 1 can also be used by sticking to the inner surface of the transparent adherend 2. The transparent adhered member 15 is, for example, a member made of glass or plastic, but is not limited thereto.

在圖4中,顯示本發明之一實施形態的加飾構件2的概略剖面圖。本發明之一實施形態的加飾構件2是金屬光澤物品1會被貼附於被黏著構件15的狀態的概略剖面圖。本實施形態的加飾構件2是具備金屬層12、含氧化銦層11、光學調整層13、基體10(基材薄膜)及黏著劑層14的金屬光澤物品1會被貼附於被黏著構件15。FIG. 4 is a schematic cross-sectional view of a decorative member 2 according to an embodiment of the present invention. The decorative member 2 according to an embodiment of the present invention is a schematic cross-sectional view of a state where the metallic luster article 1 is attached to the adhered member 15. The decorative member 2 of this embodiment is a metallic luster article 1 including a metal layer 12, an indium oxide-containing layer 11, an optical adjustment layer 13, a substrate 10 (base film), and an adhesive layer 14. 15.

圖5是本發明之一實施形態的加飾構件的概略剖面圖。加飾構件2是圖5所示的構成的金屬光澤物品1會被貼附於被黏著構件15。在圖5中,金屬光澤物品1會經由黏著劑層14來對於與透明的被黏著構件15所被視認的側(以下亦稱為外側)的面2a相反側(以下亦稱為內側)的面2b貼附,通過被黏著構件15及黏著劑層14來視認光學調整層13及金屬層12。亦即,本實施形態的金屬光澤物品1是可從內側來裝飾透明的被黏著構件15。
本實施形態的加飾構件2是將金屬光澤物品1貼附於被黏著構件15的內側而取得,因此可取得不易受傷被著色的金屬外觀。並且,可一面照原樣發揮被黏著構件15的質感,一面裝飾被黏著構件15。
5 is a schematic cross-sectional view of a decorative member according to an embodiment of the present invention. The decorative member 2 is a metallic luster article 1 having a structure shown in FIG. 5, and is adhered to the adhered member 15. In FIG. 5, the metallic lustrous article 1 passes through the adhesive layer 14 to face on the opposite side (hereinafter also referred to as the inside) of the surface 2 a of the side (hereinafter also referred to as the outside) viewed from the transparent adhered member 15. 2b is attached, and the optical adjustment layer 13 and the metal layer 12 are visually recognized through the adhered member 15 and the adhesive layer 14. That is, the metallic luster article 1 of this embodiment is a transparent adherend 15 which can be decorated from the inside.
The decorative member 2 of the present embodiment is obtained by attaching the metallic luster article 1 to the inner side of the adhered member 15, and thus it is possible to obtain a metallic appearance that is not easily damaged and colored. In addition, the texture of the adhered member 15 can be displayed as it is, and the adhered member 15 can be decorated.

將金屬光澤物品1貼附於被黏著構件2的方法是不被特別限定,例如可藉由真空成形來貼附。所謂真空成形是將金屬光澤物品1一面加熱軟化一面展開,將金屬光澤物品1的被黏著構件側的空間減壓,因應所需將相反側的空間加壓,藉此按照被黏著構件的表面的三次元立體形狀來一面將金屬光澤物品1成形一面貼附層疊的方法。
金屬光澤物品1是可援用上述的說明。
The method for attaching the metallic luster article 1 to the adhered member 2 is not particularly limited, and for example, it can be attached by vacuum forming. The so-called vacuum forming is to expand the metal luster article 1 while heating and softening it, and decompress the space on the side of the adhered member of the metal luster article 1 as needed. A three-dimensional three-dimensional shape is a method of attaching and laminating the metallic luster article 1 while forming it.
The metallic luster article 1 can apply the above description.

本實施形態的加飾構件是在被黏著構件側的反射光的CIE-L* a* b* 表色系中,a* 值及b* 值的二次方和的平方根為5.0以上為理想。因為若a* 值及b* 值的二次方和的平方根為5.0以上,則著色成為充分。a* 值及b* 值的二次方和的平方根是10以上更理想,15以上更加理想。a* 值及b* 值的二次方和的平方根的上限值無特別限制,但70以下為理想,65以下更理想,60以下更加理想。In the decorative member of this embodiment, in the CIE-L * a * b * color system of the reflected light on the adhered member side, the square root of the square sum of the a * value and the b * value is preferably 5.0 or more. This is because if the square root of the sum of the squares of the a * value and the b * value is 5.0 or more, the coloring becomes sufficient. The square root of the squared sum of a * value and b * value is more preferably 10 or more, and more preferably 15 or more. The upper limit of the square root of the sum of the squares of the a * value and the b * value is not particularly limited, but is preferably below 70, more preferably below 65, and even more preferably below 60.

CIE-L* a* b* 表色系是CIE(國際照明委員會)在1976年推薦的表色系,L* 是表示明度,從0到100,數值越大越明亮。色度是以a* 、b* 來表示,a* 是表示從色調的紅到綠的程度的指數,若a* 的值在正方向大,則形成紅色的色調。而且,b* 是表示從色調的黃到藍的程度的指數。當a* ,b* 皆0時成為無彩色。CIE-L * a * b * The color system is the color system recommended by CIE (International Commission for Illumination) in 1976. L * is the brightness, from 0 to 100, the larger the value, the brighter it is. Chroma is represented by a * and b * , a * is an index indicating the degree from red to green of the hue, and if the value of a * is large in the positive direction, a red hue is formed. In addition, b * is an index indicating the degree from yellow to blue of a hue. When a * and b * are both 0, it becomes achromatic.

本實施形態的加飾構件2是被黏著構件側的波長380nm~780nm的範圍的反射率的最大值與最小值的差為20%以上為理想。從著色的濃度的觀點,35%以上更理想,40%以上更加理想。
反射率的最大值與最小值的差的上限值無特別限制,但90%以下為理想,85%以下更理想,80%以下更加理想。
The decorative member 2 according to the present embodiment preferably has a difference between the maximum value and the minimum value of the reflectance in the range of 380 nm to 780 nm in the side of the adhered member, which is preferably 20% or more. From the viewpoint of the coloring density, 35% or more is more preferable, and 40% or more is more preferable.
The upper limit of the difference between the maximum value and the minimum value of the reflectance is not particularly limited, but it is preferably below 90%, more preferably below 85%, and even below 80%.

<9.金屬光澤物品及加飾構件的用途>
由於本實施形態的金屬光澤物品1及金屬薄膜是具有電磁波透過性,因此使用在收發電磁波的裝置或物品及其零件等為理想。例如,可舉車輛用構造零件、車輛搭載用品、電子機器的框體、家電機器的框體、構造用零件、機械零件、各種的汽車用零件、電子機器用零件、傢具、廚房用品等的家居傾向用途、醫療機器、建築資材的零件、其他的構造用零件或外裝用零件等。
更具體而言,就車輛關係而言,可舉儀表板、中央置物箱、門把、門內飾板、變速桿、踏板類、手套箱、保險槓、引擎蓋、擋泥板、車後行李箱、車門、車頂、支柱、座位、方向盤、ECU箱、電裝零件、引擎周邊零件、驅動系・齒輪周邊零件、吸氣・排氣系零件、冷卻系零件等。
作為電子機器及家電機器,更具體而言,可舉冰箱、洗衣機、吸塵器、微波爐、空調、照明機器、電熱水器、電視、時鐘、換氣扇、投影機、揚聲器等的家電製品類、個人電腦、行動電話、智慧型手機、數位相機、平板型PC、攜帶型音樂撥放器、攜帶型遊戲機、充電器、電池等電子資訊機器等。

[實施例]
<9. Use of metallic luster articles and decorative members>
Since the metallic luster article 1 and the metal thin film of this embodiment are electromagnetic wave transmissive, they are preferably used in a device or article for transmitting and receiving electromagnetic waves, and parts thereof. For example, it is possible to use household parts such as vehicle structural parts, vehicle-mounted supplies, housings of electronic devices, housings of home appliances, structural parts, mechanical parts, various automotive parts, electronic device parts, furniture, and kitchen supplies. Intended use, medical equipment, parts of building materials, other structural parts, exterior parts, etc.
More specifically, in terms of vehicle relationship, the dashboard, central storage box, door handle, door trim, shift lever, pedals, glove box, bumper, hood, fender, rear luggage Cases, doors, roofs, pillars, seats, steering wheels, ECU boxes, electrical parts, engine peripheral parts, drive system / gear peripheral parts, air intake / exhaust system parts, cooling system parts, etc.
As electronic devices and home appliances, more specifically, refrigerators, washing machines, vacuum cleaners, microwave ovens, air conditioners, lighting equipment, electric water heaters, televisions, clocks, ventilators, projectors, speakers, and other household appliances, personal computers, mobile phones Telephones, smart phones, digital cameras, tablet PCs, portable music players, portable game consoles, chargers, batteries and other electronic information equipment.

[Example]

以下,舉實施例及比較例,更具體說明本發明。準備金屬光澤物品,評價反射率、CIE-L* a* b* 表示系的a* 值及b* 值、電波透過衰減量(-dB)、薄膜電阻。另外,基體10是使用基材薄膜。
電波透過衰減量是有關電磁波透過性的評價。電波透過衰減量的值小較為理想。
評價方法的詳細是如以下般。
Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples. A metallic shiny article was prepared, and the reflectance, CIE-L * a * b * , a * values and b * values of the system, radio wave transmission attenuation (-dB), and sheet resistance were evaluated. In addition, as the base 10, a base film is used.
The radio wave transmission attenuation is an evaluation of electromagnetic wave transmission. It is desirable that the value of radio wave transmission attenuation is small.
The details of the evaluation method are as follows.

(1)分光反射率
使用Hitachi High-Technologies Corporation製的分光光度計U-4100,針對波長380nm~780nm的範圍的可視光線,以5nm間隔,測定照射至金屬光澤物品的一方的面而反射的光的分光反射率。
另外,測定時是使上述可視光線對於被黏著構件表面射入,在表1中作為反射率(有糊劑)記載。並且,在表1中,顯示波長380nm~780nm的範圍的分光反射率(%)的最大值(max)、最小值(min)、及最大值(max)與最小值(min)的差。
(1) Spectral reflectance Using a spectrophotometer U-4100 manufactured by Hitachi High-Technologies Corporation, the visible light in a wavelength range of 380 nm to 780 nm was measured at 5 nm intervals, and the reflected light was irradiated to one side of a metallic shiny article. Spectral reflectance.
In the measurement, the visible light was incident on the surface of the member to be adhered, and Table 1 describes the reflectance (with a paste). Table 1 shows the maximum value (max), the minimum value (min), and the difference between the maximum value (max) and the minimum value (min) of the spectral reflectance (%) in the wavelength range of 380 nm to 780 nm.

(2)CIE-L* a* b* 表示系的a* 值及b*
利用以上述分光光度計U-4100測定後的波長380~780nm的分光反射率、及CIE標準光源D65的相對分光分布,來計算CIE-L* a* b* 表示系的a* 值及b* 值。將a* 值、b* 值、a* 值及b* 值的二次方和的平方根顯示於表1。
(2) CIE-L * a * b * indicates the a * value and b * value of the system. The spectral reflectance at a wavelength of 380 to 780 nm measured with the above-mentioned spectrophotometer U-4100 and the relative spectrophotometry of the CIE standard light source D65 are used. Distribution to calculate CIE-L * a * b * represents the a * value and b * value of the system. Table 1 shows the square roots of the a * value, b * value, a * value, and the second power of the b * value.

(3)電波透過衰減量
以方形導波管測定評價治具WR-187來夾住樣品,使用Anritsu Company製光譜分析儀MS4644B來測定5GHz的電波透過衰減量。
(3) Radio wave transmission attenuation amount A rectangular waveguide measurement and evaluation fixture WR-187 was used to clamp the sample, and a spectrum analyzer MS4644B manufactured by Anritsu Company was used to measure the radio wave transmission attenuation amount at 5 GHz.

(4)薄膜電阻
使用Napson Corporation製非接觸式電阻測定裝置NC-80MAP,遵照JIS-Z2316,藉由渦電流測定法來測定作為金屬層與含氧化銦層的層疊體的薄膜電阻。
此薄膜電阻是100Ω/□以上為理想,200Ω/□以上更理想,進一步600Ω/□以上更加理想。若比100Ω/□小,則有不能取得充分的電磁波透過性的問題。
(4) Sheet resistance The sheet resistance of a metal layer and an indium oxide-containing layer was measured by an eddy current measurement method in accordance with JIS-Z2316 using a non-contact resistance measurement device NC-80MAP manufactured by Napson Corporation.
The film resistance is preferably 100Ω / □ or more, more preferably 200Ω / □ or more, and more preferably 600Ω / □ or more. If it is smaller than 100Ω / □, there is a problem that sufficient electromagnetic wave permeability cannot be obtained.

(5)膜厚的評價方法
首先,從金屬光澤物品,如圖8所示般,適當地抽出一邊5cm的正方形區域3,以藉由將該正方形區域3的縱邊及橫邊各自的中心線A、B分別4等分而取得的合計5處的點「a」~「e」作為測定處。
其次,測定選擇的測定處各自如圖9所示般的剖面畫像(透過型電子顯微鏡照片(TEM畫像)),從取得的TEM畫像抽出含有5個以上的金屬部分12a的視野角區域。
將以視野角區域的橫寬來切開在5處的測定處各自被抽出的視野角區域的金屬層的總剖面積者設為各視野角區域的金屬層的厚度,將5處的測定處各自的各視野角區域的金屬層的厚度的平均值設為金屬層的厚度(nm)。
(5) Evaluation method of film thickness First, as shown in FIG. 8, a square area 3 with a side of 5 cm is appropriately extracted from a metallic luster, so that the centerline of each of the vertical and horizontal sides of the square area 3 is drawn. The points "a" to "e" at five points obtained by dividing A and B into four equal parts are taken as measurement points.
Next, a cross-sectional image (a transmission electron microscope photograph (TEM image)) of each of the selected measurement locations is shown in FIG. 9, and a viewing angle region containing five or more metal portions 12 a is extracted from the obtained TEM image.
The total cross-sectional area of the metal layer in each of the viewing angle regions that were cut out at the five measurement points by the horizontal width of the viewing angle region was defined as the thickness of the metal layer in each viewing angle region. The average value of the thickness of the metal layer in each viewing angle region is defined as the thickness (nm) of the metal layer.

[實施例1]
使用在三菱樹脂公司製PET薄膜(厚度50μm)的一方的面形成厚度2000μm的熱硬化樹脂的薄膜,作為基材薄膜。
首先,在DC磁控管濺射裝置安裝ITO標靶,一邊導入Ar氣體與O2 氣體,一邊濺射,藉此沿著基材薄膜的面來直接形成5nm的厚度的ITO層。形成ITO層時的基材薄膜的溫度是設定成130℃。在ITO所含的氧化錫(SnО2 )的含有率(含有率=(SnO2 /(In2 O3 +SnO2 ))×100)是10wt%。
[Example 1]
A film having a thermosetting resin having a thickness of 2000 μm formed on one side of a PET film (thickness: 50 μm) made by Mitsubishi Resin Co., Ltd. was used as a base film.
First, an ITO target is installed in a DC magnetron sputtering apparatus, and an Ar gas and an O 2 gas are introduced, and sputtering is performed, thereby directly forming an ITO layer with a thickness of 5 nm along the surface of the substrate film. The temperature of the base film when the ITO layer was formed was set to 130 ° C. The content rate of tin oxide (SnО 2 ) contained in ITO (content rate = (SnO 2 / (In 2 O 3 + SnO 2 )) × 100) was 10% by weight.

在交流濺射裝置(AC:40kHz)安裝鋁(Al)標靶,一邊導入Ar氣體,一邊濺射,藉此在ITO層上形成35nm的厚度的Al層(金屬層)。取得的Al層是不連續層。形成Al層時的基材薄膜的溫度是設定成130℃。An aluminum (Al) target was mounted on an alternating current sputtering apparatus (AC: 40 kHz), and an Ar gas (a metal layer) was formed on the ITO layer by sputtering while introducing an Ar gas while sputtering. The obtained Al layer is a discontinuous layer. The temperature of the base film when the Al layer was formed was set to 130 ° C.

(光學調整層的形成)
其次,在交流濺射裝置安裝Nb標靶(AC:40kHz),將Ar氣體與O2 氣體一邊導入一邊濺射,藉此在Al層上形成110nm的Nb2 O5 層作為光學調整層。
(Formation of optical adjustment layer)
Next, an Nb target (AC: 40 kHz) was installed in the AC sputtering device, and Ar gas and O 2 gas were introduced while sputtering, thereby forming a 110 nm Nb 2 O 5 layer as an optical adjustment layer on the Al layer.

藉由以上,取得基材薄膜、含氧化銦層、金屬層、光學調整層的層疊體(以下稱為層疊體)。藉由上述的方法來測定取得的層疊體(金屬光澤物品)的反射率,在表1中作為反射率(無糊劑)記載。In this way, a laminate (hereinafter referred to as a laminate) of a base film, an indium oxide-containing layer, a metal layer, and an optical adjustment layer is obtained. The reflectance of the obtained laminate (metallic luster article) was measured by the method described above, and is shown in Table 1 as the reflectance (no paste).

<黏著劑組成物的製造>
另一方面,將含有丙烯酸丁酯100質量份、丙烯酸2-羥乙酯0.01質量份、及丙烯酸5份的單體混合物下料至具備冷卻管、氮導入管、溫度計及攪拌裝置的反應容器。而且,對於前述單體混合物100質量份,將2,2’-偶氮二異丁腈0.1質量份與乙酸乙酯100質量份一起下料,作為聚合引發劑,一邊緩和攪拌,一邊導入氮氣體,氮置換之後,將反應容器內的液溫保持於55℃附近進行8小時聚合反應,調製重量平均分子量(Mw)180萬,Mw/Mn=4.1的丙烯酸系聚合物的溶液(固態份濃度30質量%)。
對於取得的丙烯酸系聚合物溶液的固態份100質量份,將過氣化苯甲醯(日本油脂公司製、NYPER®BMT)調配0.3質量份,將異氰酸酯系交聯劑(TOSOH CORPORATION製、Coronate® L)調配1質量份,而取得黏著劑組成物。
< Production of adhesive composition >
On the other hand, a monomer mixture containing 100 parts by mass of butyl acrylate, 0.01 parts by mass of 2-hydroxyethyl acrylate, and 5 parts of acrylic acid was discharged to a reaction vessel including a cooling pipe, a nitrogen introduction pipe, a thermometer, and a stirring device. In addition, with respect to 100 parts by mass of the monomer mixture, 0.1 part by mass of 2,2′-azobisisobutyronitrile and 100 parts by mass of ethyl acetate were cut off, and as a polymerization initiator, nitrogen gas was introduced while gently stirring. After nitrogen substitution, the temperature of the liquid in the reaction container was maintained at about 55 ° C for 8 hours to perform a polymerization reaction to prepare a solution of an acrylic polymer having a weight average molecular weight (Mw) of 1.8 million and Mw / Mn = 4.1 (solid concentration: 30). quality%).
With respect to 100 parts by mass of the solid portion of the obtained acrylic polymer solution, 0.3 parts by mass of over-gasified benzamidine (manufactured by Japan Oil Corporation, NYPER® BMT) was prepared, and an isocyanate-based crosslinking agent (manufactured by TOSOH CORPORATION, Coronate®) L) 1 part by mass was prepared to obtain an adhesive composition.

<金屬光澤物品的製造>
對於上述取得的層疊體的金屬層側的面,以手推滾輪(Hand roller)來塗佈上述取得的黏著劑組成物而形成黏著劑層,藉此取得具有被著色的金屬光澤之金屬光澤物品。
< Manufacture of metallic shiny articles >
With respect to the surface of the metal layer side of the obtained laminated body, a hand roller was used to apply the obtained adhesive composition to form an adhesive layer, thereby obtaining a metallic luster having a metallic luster that was colored. .

<加飾構件的製造>
使用厚度1.2mm的玻璃,作為被黏著構件。
將上述取得的金屬光澤物品的黏著劑層側貼附於被黏著構件,取得加飾構件。
< Manufacture of decorative members >
As the adhered member, a glass having a thickness of 1.2 mm was used.
The adhesive layer side of the obtained metallic luster article was attached to a member to be adhered to obtain a decorative member.

[實施例2~5]
如表1記載般,變更實施例1的光學調整層的厚度(nm),取得加飾構件。
[Examples 2 to 5]
As described in Table 1, the thickness (nm) of the optical adjustment layer of Example 1 was changed to obtain a decorative member.

[實施例6及7]
除了在實施例1的光學調整層的形成時,將Si標靶安裝於交流濺射裝置,一邊導入Ar氣體與N2 氣體,一邊濺射,藉此在Al層上以表1記載的膜厚來形成SiN(光學調整層)以外是與實施例1同樣取得加飾構件。
[Examples 6 and 7]
Except for the formation of the optical adjustment layer in Example 1, the Si target was mounted on an AC sputtering device, and the Ar gas and N 2 gas were introduced and sputtered to thereby form the film thicknesses in Table 1 on the Al layer. A decorated member was obtained in the same manner as in Example 1 except that SiN (optical adjustment layer) was formed.

[比較例1]
除了未設置實施例1的光學調整層以外是與實施例1同樣取得加飾構件。
[Comparative Example 1]
A decorative member was obtained in the same manner as in Example 1 except that the optical adjustment layer of Example 1 was not provided.

[比較例2]
除了將實施例1的光學調整層從氧化鈮(Nb2 O5 )變更成氧化鋅(ZnO)、氧化矽(SiOx)及氧化鋁(Al2 O3 )的混合物(質量比,氧化鋅:氧化矽:氧化鋁=77:20:3)的燒結體,將濺射裝置變更成DC濺射裝置以外是與實施例1同樣取得加飾構件。
[Comparative Example 2]
In addition to changing the optical adjustment layer of Example 1 from niobium oxide (Nb 2 O 5 ) to a mixture of zinc oxide (ZnO), silicon oxide (SiOx), and aluminum oxide (Al 2 O 3 ) (mass ratio, zinc oxide: oxidation A sintered body of silicon: alumina = 77: 20: 3) was obtained in the same manner as in Example 1 except that the sputtering device was changed to a DC sputtering device.

在以下的表1顯示評價結果。並且,將實施例5與比較例1的加飾構件的波長380nm~780nm的範圍的可視光線的波長與反射率(%)的關係顯示於圖6。而且,將實施例1~7、比較例1及2的加飾構件的a* 值與b* 值的關係顯示於圖7。The evaluation results are shown in Table 1 below. The relationship between the wavelength of visible light and the reflectance (%) in the range of 380 nm to 780 nm of the decorative member of Example 5 and Comparative Example 1 is shown in FIG. 6. The relationship between the a * value and the b * value of the decorative members of Examples 1 to 7 and Comparative Examples 1 and 2 is shown in FIG. 7.

如由表1明示般,由於實施例1~7是包含折射率1.75以上的高折射率層,因此其CIE-Lab表色系的a* 值及b* 值的二次方和的平方根成為13~30,可取得被著色的金屬光澤物品及加飾構件。又,由於鋁層是包含被形成不連續的狀態的複數的部分12a,因此有關電磁波透過性可取得良好的結果。
另一方面,比較例1及2的金屬光澤物品及加飾構件是反射率的差小。並且,a* 值及b* 值的二次方和的平方根也小,著色成為不充分。
As clearly shown in Table 1, since Examples 1 to 7 include high refractive index layers having a refractive index of 1.75 or more, the square root of the square sum of the a * value and b * value of the CIE-Lab color system is 13 ~ 30, can obtain colored metallic luster items and decorative members. In addition, since the aluminum layer includes a plurality of portions 12a formed in a discontinuous state, good results can be obtained regarding the electromagnetic wave permeability.
On the other hand, the metallic luster articles and decorative members of Comparative Examples 1 and 2 have small differences in reflectance. In addition, the square root of the quadratic sum of the a * value and the b * value is also small, and the coloring becomes insufficient.

另外,有關在以上的實施例特別使用的鋁(Al)以外的金屬,鋅(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)等的比較的融點低的金屬也可思考以同樣的手法來形成不連續構造。In addition, regarding metals other than aluminum (Al), which are particularly used in the above examples, metals with relatively low melting points such as zinc (Zn), lead (Pb), copper (Cu), and silver (Ag) can also be considered. A discontinuous structure is formed in the same way.

本發明是不限於前述實施例,亦可在不脫離發明的主旨的範圍適當變更而具體化。The present invention is not limited to the foregoing embodiments, and may be appropriately modified and embodied without departing from the spirit of the invention.

以上,說明有關本發明的理想的實施形態,但本發明是不限於上述的實施形態,可在不脫離本發明的範圍的範圍中,對上述的實施形態追加各種的變形及置換。
另外,本案是根據2018年4月23日申請的日本專利申請案(特願2018-082656)及2019年4月22日申請的日本專利申請案(特願2019-080625)者,其內容是在本案中作為參照而被援用。

[產業上的利用可能性]
As mentioned above, although the preferred embodiment of this invention was described, this invention is not limited to the said embodiment, Various deformation | transformation and substitution can be added to the said embodiment within the range which does not deviate from the scope of this invention.
In addition, this case is based on the Japanese patent application (Japanese Patent Application No. 2018-082656) filed on April 23, 2018 and the Japanese Patent Application (Japanese Patent Application No. 2019-080625) filed on April 22, 2019. Reference is made in this case.

[Industrial availability]

本發明的金屬光澤物品是可使用於收發電磁波的裝置或物品及其零件等。例如,亦可利用在車輛用構造零件、車輛搭載用品、電子機器的框體、家電機器的框體、構造用零件、機械零件、各種的汽車用零件、電子機器用零件、傢具、廚房用品等的家居傾向用途、醫療機器、建築資材的零件、其他的構造用零件或外裝用零件等、被要求設計性與電磁波透過性的雙方的各種的用途。The metallic luster article of the present invention is a device or article and its parts that can be used for transmitting and receiving electromagnetic waves. For example, it can also be used in structural parts for vehicles, vehicle-mounted supplies, housings of electronic devices, housings of home appliances, structural parts, mechanical parts, various automotive parts, electronic device parts, furniture, kitchen supplies, etc. For home use, medical equipment, parts for building materials, other structural parts, exterior parts, etc., there are various applications that require both design and electromagnetic wave permeability.

1‧‧‧金屬光澤物品1‧‧‧ metallic shiny items

2‧‧‧加飾構件 2‧‧‧ Decoration

10‧‧‧基體 10‧‧‧ Matrix

11‧‧‧含氧化銦層 11‧‧‧ Indium oxide layer

12‧‧‧金屬層 12‧‧‧ metal layer

12a‧‧‧部分 12a‧‧‧part

12b‧‧‧間隙 12b‧‧‧Gap

13‧‧‧光學調整層 13‧‧‧Optical adjustment layer

14‧‧‧黏著劑層 14‧‧‧ Adhesive layer

15‧‧‧被黏著構件 15‧‧‧ Adhesive member

圖1是本發明之一實施形態的電磁波透過性金屬光澤物品的概略剖面圖。FIG. 1 is a schematic cross-sectional view of an electromagnetic wave-transmitting metallic luster article according to an embodiment of the present invention.

圖2是本發明之一實施形態的電磁波透過性金屬光澤物品的概略剖面圖。 FIG. 2 is a schematic cross-sectional view of an electromagnetic wave-transmitting metallic luster article according to an embodiment of the present invention.

圖3是表示本發明之一實施形態的電磁波透過性金屬光澤物品的表面的電子顯微鏡照片的圖。 3 is a view showing an electron microscope photograph of a surface of an electromagnetic wave-transmitting metallic luster article according to an embodiment of the present invention.

圖4是本發明之一實施形態的加飾構件的概略剖面圖。 Fig. 4 is a schematic cross-sectional view of a decorative member according to an embodiment of the present invention.

圖5是本發明之一實施形態的加飾構件的概略剖面圖。 5 is a schematic cross-sectional view of a decorative member according to an embodiment of the present invention.

圖6是表示實施例5與比較例1的加飾構件的波長380nm~780nm的範圍的可視光線的波長與反射率(%)的關係的圖。 FIG. 6 is a graph showing the relationship between the wavelength of visible light and the reflectance (%) of the decorative member of Example 5 and Comparative Example 1 in a wavelength range of 380 nm to 780 nm.

圖7是表示實施例1~7、比較例1及2的加飾構件的a* 值與b* 值的關係的圖。FIG. 7 is a graph showing the relationship between a * value and b * value of the decorative members of Examples 1 to 7 and Comparative Examples 1 and 2. FIG.

圖8是用以說明本發明之一實施形態的電磁波透過性金屬光澤物品的金屬層的膜厚的測定方法的圖。 FIG. 8 is a diagram illustrating a method for measuring a film thickness of a metal layer of an electromagnetic wave-transmitting metallic luster article according to an embodiment of the present invention.

圖9是表示本發明之一實施形態的金屬層的剖面的透過型電子顯微鏡照片(TEM畫像)的圖。 9 is a view showing a transmission electron microscope photograph (TEM image) of a cross section of a metal layer according to an embodiment of the present invention.

Claims (17)

一種電磁波透過性金屬光澤物品,其特徵係具備:基體,被形成於前述基體上的金屬層,及至少1層的光學調整層, 前述金屬層,係包括至少一部分處於互相不連續的狀態的複數的部分, 前述光學調整層,係包括折射率1.75以上的高折射率層。An electromagnetic wave-transmitting metallic luster article, comprising: a base body; a metal layer formed on the base body; and at least one optical adjustment layer. The aforementioned metal layer includes a plurality of portions in which at least a portion is in a state of being discontinuous from each other, The optical adjustment layer includes a high refractive index layer having a refractive index of 1.75 or more. 如申請專利範圍第1項之電磁波透過性金屬光澤物品,其中,前述光學調整層的厚度為10nm~1000nm。For example, the electromagnetic wave-transmitting metallic luster article of the first patent application range, wherein the thickness of the optical adjustment layer is 10 nm to 1000 nm. 如申請專利範圍第1或2項之電磁波透過性金屬光澤物品,其中,設有前述光學調整層的側的波長380nm~780nm的範圍的反射率的最大值與最小值的差為30%以上。For example, in the electromagnetic wave-transmitting metallic luster article of the scope of claims 1 or 2, the difference between the maximum value and the minimum value of the reflectance in the wavelength range of 380 nm to 780 nm on the side provided with the optical adjustment layer is 30% or more. 如申請專利範圍第1~3項中的任一項所記載之電磁波透過性金屬光澤物品,其中,在前述基體與前述金屬層之間更具備含氧化銦層。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 3, further comprising an indium oxide-containing layer between the substrate and the metal layer. 如申請專利範圍第4項之電磁波透過性金屬光澤物品,其中,前述含氧化銦層係以連續狀態設置。For example, the electromagnetic wave-transmitting metallic luster article of the scope of application for patent No. 4, wherein the aforementioned indium oxide-containing layer is provided in a continuous state. 如申請專利範圍第4或5項之電磁波透過性金屬光澤物品,其中,前述含氧化銦層,係包含氧化銦(In2 O3 )、銦錫氧化物(ITO)、或銦鋅氧化物(IZO)的任一者。For example, the electromagnetic wave-transmitting metallic luster article of the scope of application for the patent item 4 or 5, wherein the aforementioned indium oxide-containing layer contains indium oxide (In 2 O 3 ), indium tin oxide (ITO), or indium zinc oxide ( IZO). 如申請專利範圍第4~6項中的任一項所記載之電磁波透過性金屬光澤物品,其中,前述含氧化銦層的厚度為1nm~1000nm。The electromagnetic wave-transmitting metallic luster article according to any one of claims 4 to 6, in which the thickness of the indium oxide-containing layer is 1 nm to 1000 nm. 如申請專利範圍第1~7項中的任一項所記載之電磁波透過性金屬光澤物品,其中,前述金屬層的厚度為20nm~ 100nm。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 7, wherein the thickness of the metal layer is 20 nm to 100 nm. 如申請專利範圍第4~7項中的任一項所記載之電磁波透過性金屬光澤物品,其中,前述金屬層的厚度與前述含氧化銦層的厚度的比(前述金屬層的厚度/前述含氧化銦層的厚度)為0.02~100。The electromagnetic wave-transmitting metallic luster article according to any one of claims 4 to 7, wherein the ratio of the thickness of the metal layer to the thickness of the indium oxide-containing layer (the thickness of the metal layer / the thickness of the metal layer) The thickness of the indium oxide layer is 0.02 to 100. 如申請專利範圍第1~9項中的任一項所記載之電磁波透過性金屬光澤物品,其中,薄膜電阻為100Ω/□以上。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 9 of the scope of patent application, wherein the sheet resistance is 100 Ω / □ or more. 如申請專利範圍第1~10項中的任一項所記載之電磁波透過性金屬光澤物品,其中,前述複數的部分係形成島狀。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 10, wherein the plurality of portions are formed in an island shape. 如申請專利範圍第1~11項中的任一項所記載之電磁波透過性金屬光澤物品,其中,前述金屬層,係鋁(Al)、鋅(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)、或該等的合金的任一者。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 11, wherein the metal layer is made of aluminum (Al), zinc (Zn), lead (Pb), or copper (Cu). , Silver (Ag), or any of these alloys. 如申請專利範圍第1~12項中的任一項所記載之電磁波透過性金屬光澤物品,其中,前述基體,係基材薄膜、樹脂成型物基材、玻璃基材、或應賦予金屬光澤的物品的任一者。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 12, in which the aforementioned substrate is a substrate film, a resin molded article substrate, a glass substrate, or a metal luster Any of the items. 如申請專利範圍第1~13項中的任一項所記載之電磁波透過性金屬光澤物品,其中,更具備由透明黏著劑所成的黏著劑層。The electromagnetic wave-transmitting metallic luster article according to any one of claims 1 to 13 of the scope of application for a patent, further including an adhesive layer made of a transparent adhesive. 一種加飾構件,其特徵係具備:被黏著構件,及如申請專利範圍第14項記載的電磁波透過性金屬光澤物品, 前述電磁波透過性金屬光澤物品係經由前述黏著劑層來貼附於前述被黏著構件。A decorative member, comprising: an adhered member, and an electromagnetic wave-transmitting metallic luster article as described in item 14 of the scope of patent application, The electromagnetic wave-transmitting metallic luster article is adhered to the adherend member via the adhesive layer. 如申請專利範圍第15項之加飾構件,其中,在前述被黏著構件側的反射光的CIE-Lab表色系中,a* 值及b* 值的二次方和的平方根為5.0以上。For example, in the decorative member of the scope of application for patent No. 15, in the CIE-Lab color system of the reflected light on the adhered member side, the square root of the square sum of the a * value and the b * value is 5.0 or more. 如申請專利範圍第16項之加飾構件,其中,前述被黏著構件側的波長380nm~780nm的範圍的反射率的最大值與最小值的差為20%以上。For example, the decorative member according to the 16th aspect of the application for a patent, wherein the difference between the maximum value and the minimum value of the reflectance in the range of 380nm to 780nm of the adhered member side is 20% or more.
TW108114181A 2018-04-23 2019-04-23 Electromagnetic-wave-permeable metallic-luster article, and decorative member TW201945176A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018082656 2018-04-23
JP2018-082656 2018-04-23
JP2019-080625 2019-04-22
JP2019080625A JP7319079B2 (en) 2018-04-23 2019-04-22 Electromagnetic wave permeable metallic luster article and decorative member

Publications (1)

Publication Number Publication Date
TW201945176A true TW201945176A (en) 2019-12-01

Family

ID=68387587

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108114181A TW201945176A (en) 2018-04-23 2019-04-23 Electromagnetic-wave-permeable metallic-luster article, and decorative member

Country Status (4)

Country Link
JP (1) JP7319079B2 (en)
KR (1) KR20210005585A (en)
CN (1) CN112020422A (en)
TW (1) TW201945176A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021132461A1 (en) * 2019-12-27 2021-07-01
JPWO2021187069A1 (en) * 2020-03-17 2021-09-23
WO2021200292A1 (en) * 2020-03-31 2021-10-07 日東電工株式会社 Layered body, electromagnetic wave permeable layered body, and article
JP7244103B2 (en) * 2020-11-20 2023-03-22 尾池工業株式会社 Metallic decorative film, metallic molded article, and metallic vehicle interior and exterior parts
WO2022156777A1 (en) * 2021-01-22 2022-07-28 WKK Mobile Technology Limited Rf signal beam transmission enhancement board

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS461262Y1 (en) 1966-07-01 1971-01-18
JPH066783B2 (en) * 1986-12-22 1994-01-26 株式会社麗光 Deposition film for packaging
JP4706596B2 (en) 2005-10-31 2011-06-22 豊田合成株式会社 Resin product, method for producing the same, and method for forming metal film
JP4863906B2 (en) * 2007-03-12 2012-01-25 株式会社アルバック Glittering film and method for producing the glittering film
JP2009286082A (en) * 2008-05-30 2009-12-10 Toyoda Gosei Co Ltd Electromagnetic wave transmitting lustrous resin product and its manufacturing method
JP2009298006A (en) 2008-06-12 2009-12-24 Toyoda Gosei Co Ltd Electromagnetic wave permeable glittering resin product and manufacturing method
JP2010005999A (en) 2008-06-30 2010-01-14 Nissha Printing Co Ltd Method of manufacturing metal film decorative sheet which has crack
US20150293025A1 (en) * 2012-12-18 2015-10-15 Toray Industries Inc. Metal dot substrate and method of manufacturing metal dot substrate
CN105849596B (en) * 2014-09-18 2018-05-04 华为技术有限公司 For blocking the material of crosstalk, optical assembly and the production method of the material
WO2018003847A1 (en) * 2016-06-30 2018-01-04 日東電工株式会社 Electromagnetic wave-transmitting metal member, article using same, and method for producing electromagnetic wave-transmitting metal film
JP6400062B2 (en) * 2016-10-24 2018-10-03 日東電工株式会社 Electromagnetic wave transmitting metallic luster member, article using the same, and metallic thin film

Also Published As

Publication number Publication date
JP2019188806A (en) 2019-10-31
JP7319079B2 (en) 2023-08-01
KR20210005585A (en) 2021-01-14
CN112020422A (en) 2020-12-01

Similar Documents

Publication Publication Date Title
TW201945176A (en) Electromagnetic-wave-permeable metallic-luster article, and decorative member
KR20210045527A (en) Metallic lustrous member with electromagnetic wave transmissibility, article using the member, and metal thin film
WO2019208493A1 (en) Electromagnetic-wave-permeable metallic-luster article, and decorative member
JP7319077B2 (en) Electromagnetic wave transparent metallic luster article and metal thin film
WO2019208499A1 (en) Electromagnetically permeable article with metallic gloss
WO2019208504A1 (en) Electromagnetic wave transparent metallic luster article, and metal thin film
WO2021065839A1 (en) Multilayer body
JP7319080B2 (en) Electromagnetic wave transparent metallic luster article and metal thin film
JP7319078B2 (en) Electromagnetic wave permeable metallic luster article
WO2019208494A1 (en) Electromagnetic wave transmissive metallic luster product and metal thin film
TW202003217A (en) Electromagnetic wave transmissive metal luster article
WO2022004670A1 (en) Electromagnetic wave-transmissive member with metallic luster, and decorative member
KR102680362B1 (en) Electromagnetic wave transparent metallic luster articles, and metallic thin films
WO2022181528A1 (en) Electromagnetically permeable member with metallic gloss, and decorative member
WO2022004671A1 (en) Electromagnetic wave-permeable metallic luster member, and decorative member
TW201943874A (en) Electromagnetically permeable article with metallic gloss
WO2019208488A1 (en) Electromagnetic wave transmissive metal luster article
KR102679771B1 (en) Electromagnetic wave transparent metallic shiny articles, and metallic thin films
JP2022129029A (en) Electromagnetic wave transmissive metallic sheen member and decorative member
WO2019208489A1 (en) Electromagnetic wave-transmitting metallic-luster article
JP2022171450A (en) Electromagnetically permeable member with metallic gloss, and decorative member
TW201945186A (en) Electromagnetic wave-permeable metal glossy article and method for manufacturing same
JP2022102748A (en) Laminate and decorative member
JP2022102747A (en) Laminate and decorative member