TW201942972A - Processing device allowing an operator to clean the workpiece with a clean cleaning member without cleaning the cleaning member - Google Patents
Processing device allowing an operator to clean the workpiece with a clean cleaning member without cleaning the cleaning member Download PDFInfo
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- TW201942972A TW201942972A TW108110554A TW108110554A TW201942972A TW 201942972 A TW201942972 A TW 201942972A TW 108110554 A TW108110554 A TW 108110554A TW 108110554 A TW108110554 A TW 108110554A TW 201942972 A TW201942972 A TW 201942972A
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- plate
- workpiece
- cleaning member
- cleaning
- holding
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- 238000004140 cleaning Methods 0.000 title claims abstract description 142
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 73
- 238000005507 spraying Methods 0.000 claims description 12
- 239000004575 stone Substances 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 5
- 238000005406 washing Methods 0.000 description 27
- 239000000428 dust Substances 0.000 description 14
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 238000003754 machining Methods 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 230000006698 induction Effects 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 241000270295 Serpentes Species 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010097 foam moulding Methods 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/06—Dust extraction equipment on grinding or polishing machines
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
本發明係關於一種加工板狀工件的加工裝置。The invention relates to a processing device for processing a plate-shaped workpiece.
一種研削板狀工件的研削裝置,係使環狀配設研削磨石的研削輪旋轉並藉由研削磨石研削以保持台的保持面保持的板狀工件。並且,在使研削後的板狀工件從保持台脫離前,在保持台上清洗被研削面,之後藉由搬出手段保持板狀工件,從保持台使板狀工件分離,藉由清洗刷(例如參閱專利文獻1)或清洗海綿清洗在保持台所保持的板狀工件的下表面(被保持面)。A grinding device for grinding a plate-like workpiece is a plate-like workpiece that rotates a grinding wheel provided with a grinding grinding ring in an annular shape and grinds the grinding wheel to hold the holding surface of a holding table. Before removing the ground plate-shaped workpiece from the holding table, the surface to be ground is washed on the holding table, and then the plate-shaped workpiece is held by the lifting means, the plate-shaped workpiece is separated from the holding table, and a cleaning brush (for example, See Patent Document 1) or the cleaning sponge cleans the lower surface (the held surface) of the plate-like workpiece held on the holding table.
[習知技術文獻]
[專利文獻]
[專利文獻1] 日本特開2003-045841號公報。[Xizhi technical literature]
[Patent Literature]
[Patent Document 1] Japanese Patent Application Laid-Open No. 2003-045841.
[發明所欲解決的課題]
但是在清洗板狀工件的下表面時,附著於板狀工件的灰塵會附著於清洗刷或清洗海綿。並且,因該灰塵再次附著於板狀工件,使板狀工件無法為充分清洗的狀態。為了防之此狀況,作業員會定期進行清洗刷或清洗海綿的清掃。
因此,在清洗加工後的板狀工件的下表面(被保持面)的情況,存在有作業員即使不進行清洗刷或清洗海綿等的清洗構件的清掃作業,仍可藉由乾淨的清洗構件接著繼續清洗板狀工件之課題。[Problems to be Solved by the Invention]
However, when cleaning the lower surface of the plate-shaped workpiece, the dust attached to the plate-shaped workpiece may adhere to the cleaning brush or the cleaning sponge. In addition, the dust adheres to the plate-shaped workpiece again, so that the plate-shaped workpiece cannot be sufficiently cleaned. To prevent this situation, the operator will regularly clean the cleaning brush or sponge.
Therefore, when the lower surface (retained surface) of the plate-shaped workpiece after cleaning is processed, there is a case where the operator can continue the cleaning operation with a clean cleaning member without performing a cleaning operation such as a cleaning brush or a cleaning sponge. The problem of cleaning plate-shaped workpieces continues.
[解決課題的技術手段]
為了解決上述課題本發明為一種加工裝置,其具備:加工手段,藉研削磨石研削或藉研磨墊研磨以保持手段的保持面保持的板狀工件;搬出手段,使藉該加工手段所加工的板狀工件,以正交於該保持面的方向從該保持面分離;清洗機構,清洗該搬出手段保持的板狀工件的下表面;以及,移動手段,在該保持面方向使該搬出手段及該清洗機構相對地移動;該清洗機構具備:圓筒狀的滾筒清洗構件,在對該移動手段的移動方向交叉的方向且平行該保持面的方向上延伸;旋轉手段,使該滾筒清洗構件的中心軸為軸而旋轉;桶,使該滾筒清洗構件的側面的一部份形成在延伸方向上細長地露出之露出部,同時容納該滾筒清洗構件的該露出部以外的部分並以水浸沒;以及水供給手段,在該桶儲水;一邊使藉由該水供給手段供給的水從該桶的上部溢出,一邊使該搬出手段保持的該板狀工件的下表面抵接在該桶內旋轉的該滾筒清洗構件的該露出部,清洗該板狀工件的下表面。[Technical means to solve the problem]
In order to solve the above-mentioned problems, the present invention is a processing device including: a processing means, a plate-like workpiece held by a grinding stone grinding or a grinding pad grinding to hold a holding surface of a holding means; and a carrying-out means to make a workpiece processed by the processing means The plate-shaped workpiece is separated from the holding surface in a direction orthogonal to the holding surface; the cleaning mechanism cleans the lower surface of the plate-shaped workpiece held by the carrying-out means; and the moving means causes the carrying-out means in the direction of the holding surface and The cleaning mechanism moves relatively; the cleaning mechanism includes: a cylindrical drum cleaning member extending in a direction that intersects the moving direction of the moving means and parallel to the holding surface; and a rotating means that causes the drum cleaning member to The central axis rotates as a shaft; the barrel makes a part of the side surface of the drum cleaning member to form an exposed portion that is slenderly exposed in the extension direction, and at the same time accommodates a portion other than the exposed portion of the drum cleaning member and is submerged with water; And a water supply means for storing water in the bucket; while the water supplied by the water supply means overflows from the upper part of the bucket, the water The means for holding the lower surface of the plate-shaped workpiece abuts the exposed portion of the tub to rotate the drum cleaning member, the cleaning of the lower surface of the plate-shaped workpiece.
較佳為,上述加工裝置具備空氣噴射手段,該空氣噴射手段和所述滾筒清洗構件的延伸方向平行地延伸,且在相對於清洗板狀工件時的所述搬出手段之所述清洗機構的進行方向上配設於該清洗機構的後方側,並對該搬出手段保持的板狀工件噴射空氣,使該清洗機構所清洗的板狀工件的下表面以空氣乾燥。Preferably, the processing apparatus includes an air spraying means that extends parallel to an extending direction of the drum cleaning member, and performs the cleaning mechanism with respect to the cleaning mechanism of the unloading means when cleaning a plate-shaped workpiece. It is arranged in the rear side of the cleaning mechanism in a direction, and sprays air on the plate-shaped workpiece held by the carrying-out means, so that the lower surface of the plate-shaped workpiece cleaned by the cleaning mechanism is air-dried.
[發明功效]
本發明係一種加工裝置,其具備:清洗機構,清洗搬出手段保持的板狀工件的下表面;以及,移動手段,在保持面方向使搬出手段及清洗機構相對地移動;清洗機構具備:圓筒狀的滾筒清洗構件,在對移動手段的移動方向交叉的方向且平行保持面的方向上延伸;旋轉手段,使滾筒清洗構件的中心軸為軸而旋轉;桶,使滾筒清洗構件的側面的一部份形成在延伸方向細長地露出之露出部,同時容納滾筒清洗構件的露出部以外的部分並以水浸沒;以及,水供給手段,在桶儲水;一邊使藉由水供給手段供給的水從桶的上部溢出,一邊使搬出手段保持的板狀工件的下表面抵接在桶內旋轉的滾筒清洗構件的露出部,清洗板狀工件的下表面,為此,在工件清洗中附著於滾筒清洗構件的灰塵洗落於桶水中,不讓灰塵在清洗中從滾筒清洗構件再附著於板狀工件,可繼續以乾淨的滾筒清洗構件清洗板狀工件的下表面。[Inventive effect]
The present invention relates to a processing device including a cleaning mechanism that cleans a lower surface of a plate-shaped workpiece held by a carrying-out means; and a moving means that relatively moves the carrying-out means and the washing means in a direction of a holding surface; the washing mechanism includes: a cylinder The drum cleaning member in a shape extends in a direction intersecting with the moving direction of the moving means and in a direction parallel to the holding surface; the rotating means rotates the central axis of the drum cleaning member as an axis; and the bucket makes one of the sides of the drum cleaning member The part is formed in an exposed part that is exposed slenderly in the extension direction, while accommodating the part other than the exposed part of the drum washing member and submerged with water; and, a water supply means stores water in a bucket; while the water supplied by the water supply means Spilled from the upper part of the bucket, the lower surface of the plate-shaped workpiece held by the carrying-out means abuts the exposed portion of the drum cleaning member rotating in the bucket while cleaning the lower surface of the plate-shaped workpiece. To this end, it adheres to the drum during workpiece cleaning The dust of the cleaning member is washed in the bucket water, so that the dust is not allowed to adhere to the plate-shaped workpiece from the drum cleaning member during cleaning, which can continue Cylinder cleaning means to clean the lower surface of the plate-shaped workpiece cleaned.
加工裝置具備空氣噴射手段,該空氣噴射手段和滾筒清洗構件的延伸方向平行地延伸,且在相對於清洗板狀工件時的所述搬出手段之所述清洗機構的進行方向上配設於該清洗機構的後方側,並對搬出手段保持的板狀工件噴射空氣,藉此可藉由滾筒清洗構件清洗並同時以空氣使板狀工件的下表面乾燥,故可藉由移動手段所作之板狀工件的一方向的清洗進給而進行清洗板狀工件的下表面及使其乾燥來縮短清洗時間。The processing device includes an air spraying means that extends parallel to the extending direction of the drum cleaning member, and is disposed in the cleaning direction with respect to the proceeding direction of the cleaning mechanism of the unloading means when cleaning the plate-shaped workpiece. The rear side of the mechanism sprays air on the plate-shaped workpiece held by the carrying-out means, so that the lower surface of the plate-shaped workpiece can be dried by air while being cleaned by the drum cleaning member, so the plate-shaped workpiece can be made by moving means. The lower surface of the plate-like workpiece is cleaned and dried by the cleaning feed in one direction to shorten the cleaning time.
圖1所示的加工裝置1是藉由具備研削磨石740的加工手段7將在保持手段30保持的板狀工件W研削加工的裝置,其具備在Y軸方向延伸的基底10,以及在基底10上的後部側(+Y方向側)所立設的柱11。再者,加工裝置1亦可為藉由可旋轉地裝設的研磨墊對板狀工件W實施研磨加工的研磨裝置。The processing device 1 shown in FIG. 1 is a device for grinding and processing a plate-shaped workpiece W held by a holding device 30 by a processing means 7 including a grinding grindstone 740. The processing device 1 includes a base 10 extending in the Y-axis direction, and a base A post 11 standing on the rear side (+ Y direction side) on 10. The processing device 1 may be a polishing device that performs a polishing process on the plate-like workpiece W by a polishing pad that is rotatably mounted.
舉例而言,外形為圓形的保持手段30,具備由多孔構件等構成並吸附板狀工件W的吸附部300,及支撐吸附部300的框體301。吸附部300連通真空產生裝置等的未圖示的吸引源,吸引源吸引所產生之吸引力傳遞至作為吸附部300的露出面的保持面300a,藉此保持手段30可在保持面300a上吸引保持板狀工件W。
另外,保持手段30藉由與保持手段30共同可移動的蓋板39來環繞周圍,且藉由在保持手段30的下方所配設的旋轉手段34而可繞著Z軸方向的軸心旋轉。For example, the holding means 30 having a circular shape includes a suction portion 300 configured by a porous member or the like and sucking a plate-like workpiece W, and a frame 301 that supports the suction portion 300. The suction unit 300 communicates with a suction source (not shown) such as a vacuum generating device, and the attraction force generated by the suction source suction is transmitted to the holding surface 300a which is the exposed surface of the suction unit 300, whereby the holding means 30 can suck on the holding surface 300a. The plate-shaped workpiece W is held.
In addition, the holding means 30 is surrounded by a cover 39 that is movable together with the holding means 30, and is rotatable about the axis of the Z-axis direction by a rotating means 34 provided below the holding means 30.
在保持手段30、蓋板39,以及蓋板39所連結的蛇腹板39a的下方,配設有使保持手段30在保持面300a方向(Y軸方向)移動的移動手段14。移動手段14具備:滾珠螺桿140,具有Y軸方向的軸心;一對導軌141,和滾珠螺桿140平行配設;馬達142,和滾珠螺桿140連結且使滾珠螺桿140旋轉;以及可動板143,其在內部具備的螺帽和滾珠螺桿140螺合且底部在導軌141上滑動;當馬達142使滾珠螺桿140旋轉時,隨之可動板143被導軌141引導而在Y軸方向上移動,且在可動板143上,透過旋轉手段34配設的保持手段30及蓋板39亦在Y軸方向上移動。另外,蛇腹板39a伴隨保持手段30的移動在Y軸方向上伸縮。Below the holding means 30, the cover 39, and the bellows 39a to which the cover 39 is connected, there is provided a moving means 14 for moving the holding means 30 in the direction (Y-axis direction) of the holding surface 300a. The moving means 14 includes: a ball screw 140 having an axis center in the Y-axis direction; a pair of guide rails 141 disposed in parallel with the ball screw 140; a motor 142 connected to the ball screw 140 to rotate the ball screw 140; and a movable plate 143, The nut and ball screw 140 provided inside are screwed together and the bottom slides on the guide rail 141; when the motor 142 rotates the ball screw 140, the movable plate 143 is guided by the guide rail 141 to move in the Y-axis direction, and On the movable plate 143, the holding means 30 and the cover plate 39 provided by the rotating means 34 also move in the Y-axis direction. In addition, the snake web 39a expands and contracts in the Y-axis direction as the holding means 30 moves.
在柱11的前表面配設有加工進給手段5,其在加工手段7相對於保持手段30的保持面300a分離或接近的Z軸方向(鉛直方向)上加工進給。加工進給手段5具備:滾珠螺桿50,具有Z軸方向的軸心;一對導軌51,和滾珠螺桿50平行配設;馬達52,和滾珠螺桿50的上端連結且使滾珠螺桿50旋轉;升降板53,其內部的螺帽和滾珠螺桿50螺合且側部與導軌51滑動接觸;當馬達52使滾珠螺桿50旋轉時,隨之升降板53被導軌51引導而在Z軸方向上來回移動,且在升降板53所固定的加工手段7亦在Z軸方向上加工進給。A processing feed means 5 is arranged on the front surface of the column 11, and the processing feed means 7 feeds in the Z-axis direction (vertical direction) in which the processing means 7 is separated or approached from the holding surface 300 a of the holding means 30. The processing feed means 5 includes: a ball screw 50 having an axis center in the Z axis direction; a pair of guide rails 51 arranged parallel to the ball screw 50; a motor 52 connected to the upper end of the ball screw 50 and rotating the ball screw 50; lifting The plate 53 has a nut inside and a ball screw 50 screwed on the side and sliding contact with the guide rail 51; when the motor 52 rotates the ball screw 50, the lifting plate 53 is guided by the guide rail 51 and moves back and forth in the Z axis direction Moreover, the processing means 7 fixed on the lifting plate 53 also processes the feed in the Z-axis direction.
對在保持手段30所保持的板狀工件W進行研削加工的加工手段7,具備:旋轉軸70,軸方向為Z軸方向;外殼71,可旋轉地支撐旋轉軸70;馬達72,旋轉驅動旋轉軸70;圓形板狀的安裝件73,連接在旋轉軸70的下端;研削輪74,可裝卸地連接在安裝件73的下表面;以及支架75,支撐外殼71且其側面固定在加工進給手段5的升降板53。The processing means 7 for grinding the plate-like workpiece W held by the holding means 30 includes: a rotating shaft 70, the axial direction of which is the Z-axis direction; a housing 71 for rotatably supporting the rotating shaft 70; and a motor 72 for rotationally driving rotation A shaft 70; a circular plate-shaped mounting member 73 connected to the lower end of the rotating shaft 70; a grinding wheel 74 is detachably connected to the lower surface of the mounting member 73; and a bracket 75 supporting the housing 71 and its side is fixed to the processing shaft. Gives means 5 of the lifting plate 53.
在研削輪74的底面,環狀地固定有大致直方體形狀的多個研削磨石740。在旋轉部70的內部,連通研削水供給源並成為研削水的通道的流路徑係設為在旋轉軸70的軸方向上貫穿,且流路徑通過安裝件73,而在研削輪74的底面以可朝向研削磨石740噴出研削水的方式開口。
再者,加工手段7亦可為具備由不織布等所組成的研磨墊之研磨手段。A plurality of grinding grinding stones 740 having a substantially rectangular parallelepiped shape are fixed to the bottom surface of the grinding wheel 74 in a ring shape. Inside the rotating part 70, a flow path that communicates with the grinding water supply source and serves as a channel for the grinding water is set to pass in the axial direction of the rotating shaft 70, and the flow path passes through the mounting member 73, and the bottom surface of the grinding wheel 74 is It can be opened by spraying grinding water toward the grinding stone 740.
The processing means 7 may be a polishing means provided with a polishing pad composed of a non-woven fabric or the like.
在基底10上的柱11的前方且為加工手段7的下方的位置,例如配設有箱狀的加工室16。在構成加工室16的側板160形成有搬入搬出口161,保持手段30通過搬入搬出口161,藉此可將保持手段30容納於加工室16。搬入搬出口161藉由未圖示的遮板呈可開閉。在構成加工室16的頂版162,形成有使加工手段7進入加工室16內的圓形狀的加工手段進入口163。A box-shaped processing chamber 16 is arranged in front of the column 11 on the base 10 and below the processing means 7, for example. A carrying in / out port 161 is formed in the side plate 160 constituting the processing room 16, and the holding means 30 can be accommodated in the processing room 16 by passing the carrying in / out port 161. The loading / unloading port 161 can be opened and closed by a shutter (not shown). The top plate 162 constituting the processing chamber 16 is provided with a circular processing means inlet 163 for allowing the processing means 7 to enter the processing chamber 16.
在基底10上的保持手段30的移動經路側配設有搬出手段4,其使由加工手段7所加工的板狀工件W在與保持手段30的保持面300a正交的方向(Z軸方向)上從保持面300a分開。
舉例而言,搬出手段4具備:汽缸機構40,可將基底10上立設的後述保持墊42移動到預定的高度位置;臂部41,在汽缸機構40的上端側所固定的保持手段30的移動經路的上方側水平(+X方向)延伸;以及保持墊42,吸引保持配設於臂部41的前端側的下表面的板狀工件W。The moving means side of the holding means 30 on the base 10 is provided with a carrying-out means 4 that makes the plate-shaped workpiece W processed by the processing means 7 in a direction (Z-axis direction) orthogonal to the holding surface 300 a of the holding means 30. The upper part is separated from the holding surface 300a.
For example, the carrying-out means 4 includes a cylinder mechanism 40 that can move a later-described holding pad 42 standing on the base 10 to a predetermined height position, and an arm portion 41 of the holding mechanism 30 fixed to the upper end side of the cylinder mechanism 40. The upper side of the moving path extends horizontally (+ X direction), and the holding pad 42 attracts and holds the plate-shaped workpiece W disposed on the lower surface of the front end side of the arm portion 41.
保持墊42,舉例而言,係與板狀工件W的外型相合的矩形狀,其下表面為由多孔構件等所構成並吸引保持板狀工件之保持面。保持墊42的該保持面藉由吸引管421連通真空產生裝置等的吸引源43。The holding pad 42 is, for example, a rectangular shape conforming to the shape of the plate-shaped workpiece W, and the lower surface is a holding surface made of a porous member or the like and attracts and holds the plate-shaped workpiece. This holding surface of the holding pad 42 communicates with a suction source 43 such as a vacuum generating device via a suction pipe 421.
如圖1、2所示,加工裝置1具備清洗機構8,其清洗搬出手段4保持的板狀工件W的下表面Wa。清洗機構8配設於保持手段30的附近,與保持手段30同時藉由移動手段14在Y軸方向上可來回移動。亦即,清洗機構8例如配設於蓋板39的上表面上。
再者,清洗機構8的配設處並非限定於本實施方式所示的例子,舉例而言,亦可透過連接構件在-Y方向分開預定距離的狀態下安裝於保持手段30的框體301的側面。As shown in FIGS. 1 and 2, the processing device 1 includes a cleaning mechanism 8 that cleans the lower surface Wa of the plate-shaped workpiece W held by the carrying-out means 4. The cleaning mechanism 8 is arranged near the holding means 30 and can move back and forth in the Y-axis direction by the moving means 14 simultaneously with the holding means 30. That is, the cleaning mechanism 8 is arranged on the upper surface of the cover plate 39, for example.
The arrangement of the cleaning mechanism 8 is not limited to the example shown in this embodiment. For example, the cleaning mechanism 8 may be mounted on the housing 301 of the holding means 30 in a state of being separated by a predetermined distance in the -Y direction by a connecting member. side.
在圖2放大所示之清洗機構8具備:圓筒狀的滾筒清洗構件80,在對移動手段14使保持手段30移動的方向(Y軸方向)交叉(直角正交)的方向(X軸方向)且平行於保持手段30的保持面300a的方向上延伸;旋轉手段81,使滾筒清洗構件80的中心軸為軸而旋轉;桶82,使滾筒清洗構件80的側面的一部份形成在延伸方向(X軸方向)上細長地露出之露出部801,同時容納滾筒清洗構件80的露出部801以外的部分並以水浸沒;以及水供給手段83,在桶82供給清洗水並儲水。The cleaning mechanism 8 enlargedly shown in FIG. 2 includes a cylindrical drum cleaning member 80 that intersects (at right angles to) a direction (X-axis direction) in a direction (Y-axis direction) that moves the holding means 30 with respect to the moving means 14. ) And extend parallel to the holding surface 300a of the holding means 30; the rotation means 81 rotates the central axis of the drum cleaning member 80 as an axis; and the bucket 82 forms a part of the side of the drum cleaning member 80 in the extension The exposed portion 801 exposed in the direction (X-axis direction) is slender, and at the same time, the portion other than the exposed portion 801 of the drum cleaning member 80 is immersed in water; and the water supply means 83 supplies washing water to the bucket 82 and stores water.
在X軸方向延伸的圓筒狀的滾筒清洗構件80,在本實方式中,是將具備預定厚度的海綿成型為圓筒狀之物,具備板狀工件W的長邊方向以上的長度之長度。作為海綿,例如使用將聚氨酯發泡成形所做的海綿、PVA海綿、或將發泡劑等混入橡膠所成形的海棉等。再者,滾筒清洗構件80並非限定於海綿,例如亦可為將具備彈力性的化學纖維等形成為直毛狀且密集排列,進一步形成為滾筒狀的洗淨刷。
滾筒清洗構件80為,該筒內使旋轉手段81的旋轉軸810插入,成為對旋轉軸810固定的狀態。In the present embodiment, the cylindrical drum cleaning member 80 extending in the X-axis direction is formed by molding a sponge having a predetermined thickness into a cylindrical shape and having a length equal to or greater than the longitudinal direction of the plate-shaped workpiece W. . As the sponge, for example, a sponge formed by polyurethane foam molding, a PVA sponge, or a sponge formed by mixing a foaming agent and the like into a rubber is used. In addition, the drum cleaning member 80 is not limited to a sponge, For example, you may form the chemical fiber etc. which have elasticity in the shape of a straight hair, densely arrange, and further form a washing brush of a drum shape.
The drum cleaning member 80 is a state in which the rotation shaft 810 of the rotation means 81 is inserted into the drum, and the rotation shaft 810 is fixed.
桶82例如為,由大致長方形狀的底板82a及從底板82a的四邊所立設的4片側板所組成且上部具有開口。例如,在構成桶82的2片側板82b、82c(面對桶82的長邊方向(X軸方向)的側板82b、82c)上,具備承軸的未圖示之貫穿孔分別朝向厚度方向貫穿形成,滾筒清洗構件80所固定的旋轉軸810通過該貫穿孔插通桶82。The bucket 82 is composed of, for example, a substantially rectangular bottom plate 82a and four side plates standing from four sides of the bottom plate 82a, and has an opening at the upper portion. For example, two side plates 82b, 82c (side plates 82b, 82c facing the longitudinal direction (X-axis direction) of the bucket 82) of the bucket 82 are formed with through-holes (not shown) provided with bearing shafts, each of which penetrates in the thickness direction. The rotating shaft 810 fixed to the drum cleaning member 80 is inserted into the tub 82 through the through hole.
桶82的容積例如成為可容納滾筒清洗構件80全體的大小。如圖2所示,藉由調整滾筒清洗構件80所裝設的旋轉軸810的桶82內的配設高度位置,滾筒清洗構件80的側面的一部分成為在延伸方向(X軸方向)上細長地從桶82內突起露出的露出部801。另外,在滾筒清洗構件80與桶82的底板82a之間形成有預定大小的間隙(參閱圖4)的狀態。The volume of the tub 82 is, for example, a size that can accommodate the entire drum cleaning member 80. As shown in FIG. 2, by adjusting the arrangement height position in the barrel 82 of the rotating shaft 810 on which the drum cleaning member 80 is installed, a part of the side surface of the drum cleaning member 80 becomes elongated in the extending direction (X-axis direction). The exposed portion 801 protrudes from the inside of the barrel 82. In addition, a gap (see FIG. 4) having a predetermined size is formed between the drum cleaning member 80 and the bottom plate 82 a of the tub 82.
在旋轉軸810的+X方向側的一端藉由耦合件等連結於馬達811。馬達811使旋轉軸810旋轉,藉此裝設於旋轉軸810的滾筒清洗構件80亦在82桶內繞X軸方向的軸心旋轉。One end on the + X direction side of the rotation shaft 810 is connected to the motor 811 by a coupling or the like. The motor 811 rotates the rotation shaft 810, whereby the drum cleaning member 80 installed on the rotation shaft 810 also rotates around the axis of the X-axis direction in the 82 barrels.
如圖2、4所示,例如使桶82固定在與桶82同方向延伸且固定在蓋板39上的一對的支撐台86上,在桶82的下方的間隙配設有由具有可撓性的管等所組成的水供給管830。水供給管830連通由泵等構成並可供給純水等的清洗水之供給源831,藉由水供給管830及水供給源831構成水供給手段83,在桶82儲水。如圖4所述,例如在桶82的底板82a上形成有在桶82的延伸方向等間隔空開的多個水供給口820,各水供給口820連通水供給管830。As shown in FIGS. 2 and 4, for example, the bucket 82 is fixed on a pair of support bases 86 extending in the same direction as the bucket 82 and fixed on the cover plate 39. The water supply pipe 830 is composed of a flexible pipe and the like. The water supply pipe 830 communicates with a supply source 831 constituted by a pump or the like and can supply washing water such as pure water. The water supply pipe 830 and the water supply source 831 constitute a water supply means 83 and store water in the bucket 82. As shown in FIG. 4, for example, a plurality of water supply ports 820 are formed on the bottom plate 82 a of the bucket 82 at regular intervals in the extending direction of the bucket 82, and each of the water supply ports 820 communicates with the water supply pipe 830.
如圖2、4所示,本實施方式的加工裝置1具備空氣噴射手段2,空氣噴射手段2和滾筒清洗構件80的延伸方向(X軸方向)平行地延伸,且在相對於清洗板狀工件W時的搬出手段4之清洗機構8的行進方向(+Y方向)上配設於清洗機構8的後方側(-Y方向側),並對搬出手段4保持的板狀工件W噴射空氣。As shown in FIGS. 2 and 4, the processing apparatus 1 according to the present embodiment includes an air spraying means 2, and the air spraying means 2 and the extension direction (X-axis direction) of the drum cleaning member 80 extend in parallel and are used for cleaning a plate-like workpiece. The cleaning mechanism 8 of the carrying-out means 4 at the time of W is arranged on the rear side (-Y direction side) of the washing mechanism 8 in the advancing direction (+ Y direction), and sprays air on the plate-shaped workpiece W held by the carrying-out means 4.
空氣噴射手段2例如配設於桶82的側板。空氣噴射手段2例如具備:台部20,在X軸方向延伸;噴射口21,在台部20的上表面空開多個預定間隔並列地開口;空氣供給源22,對由壓縮機及壓縮空氣儲留槽等所組成的各噴射口21供給壓縮空氣;以及誘導板23,將從噴射口21噴射的空氣引導至例如滾筒清洗構件80側。
具備與台部20相同程度的長度的誘導板23,例如固定於台部20的上表面,向滾筒清洗構件80側緩緩彎曲。The air spraying means 2 is arranged on a side plate of the tub 82, for example. The air injection means 2 includes, for example, a table portion 20 extending in the X-axis direction, an injection port 21 opened in parallel at a plurality of predetermined intervals on the upper surface of the table portion 20, and an air supply source 22 for the compressor and compressed air. Each injection port 21 composed of a storage tank or the like supplies compressed air; and an induction plate 23 guides air ejected from the injection port 21 to, for example, the drum cleaning member 80 side.
The induction plate 23 having the same length as the stage portion 20 is fixed to the upper surface of the stage portion 20, for example, and is gently bent toward the drum cleaning member 80 side.
各噴射口21並不限定於形成如圖2所示的圓穴狀,亦可形成為例如細幅的狹縫狀,且亦可形成為在台部20的上表面一條連續地直線狀延伸的細幅狹縫。
另外,各噴射口21亦可為不朝向正上方開口,而為朝向+Y方向側的斜上方開口,且亦可不具備誘導板23。Each of the injection ports 21 is not limited to being formed in a circular cavity shape as shown in FIG. 2, and may be formed into, for example, a narrow slit shape, or may be formed to continuously and linearly extend on the upper surface of the table portion 20. Slim slit.
In addition, each injection port 21 may not be opened directly upward, but may be opened obliquely upward toward the + Y direction side, and may not include the induction plate 23.
例如,在蓋板39上的保持手段30及清洗機構8之間配設有分隔壁38,分隔壁38防止從清洗機構8的桶82溢出的混入研削屑等的灰塵的研削水流經保持手段30側。For example, a partition wall 38 is disposed between the holding means 30 on the cover plate 39 and the cleaning mechanism 8, and the partition wall 38 prevents the grinding water, which is mixed with the grinding chips and the like, overflowing from the bucket 82 of the cleaning mechanism 8 from flowing through the holding means 30. side.
以下說明將保持手段30所保持的板狀工件W研削加工的情況之加工裝置1的動作。圖1所示的板狀工件W例如為外形是矩形狀的大型基板,在圖1朝向下方的板狀工件W的下表面Wa形成有電路,朝向上方的板狀工件W的上表面Wb成為實施研削加工的被研削面。再者,板狀工件W並非限定於圖式的例子,亦可為圓形板狀的半導體晶圓等。The operation of the processing device 1 in the case of grinding the plate-shaped workpiece W held by the holding means 30 will be described below. The plate-like workpiece W shown in FIG. 1 is, for example, a large-sized substrate having a rectangular shape. A circuit is formed on the lower surface Wa of the plate-like workpiece W facing downward in FIG. Ground surface to be ground. It should be noted that the plate-shaped workpiece W is not limited to the illustrated example, and may be a circular plate-shaped semiconductor wafer or the like.
首先,使板狀工件W載置於保持手段30的保持面300a被吸引保持。接著,移動手段14使保持板狀工件W的保持手段30往+Y方向移動。另外,加工室16的未圖示遮板開啟,在使保持手段30搬入通過側板160的搬入搬出口161的加工室16內後,遮板關閉。First, the plate-shaped workpiece W is placed on the holding surface 300 a of the holding means 30 and sucked and held. Next, the moving means 14 moves the holding means 30 holding the plate-like workpiece W in the + Y direction. In addition, the shutter (not shown) of the processing chamber 16 is opened, and after the holding means 30 is carried into the processing chamber 16 passing through the loading / unloading port 161 of the side plate 160, the shutter is closed.
保持板狀工件W的保持手段30移動至加工手段7的下方,研削磨石740的旋轉軌道以通過板狀工件W的旋轉中心之方式對準板狀工件W及加工手段7。
藉由圖1所示的馬達72使旋轉軸70旋轉驅動時,隨之研削輪74旋轉。另外,加工手段7藉由圖1所示的加工進給手段5往-Z方向進給,而研削輪74通過加工手段進入口163進入加工室16內。並且,旋轉的研削磨石740抵接板狀工件W的上表面Wb,藉此進行研削加工。另外,藉旋轉手段34使保持手段30旋轉而保持面300a上所保持的板狀工件W亦旋轉,因此使板狀工件W的上表面Wb的全面被研削。研削加工中,對研削磨石740與板狀工件W的接觸部位供給研削水,使接觸部位被冷卻、清洗。The holding means 30 that holds the plate-like workpiece W is moved below the processing means 7, and the rotation track of the grinding stone 740 is aligned with the plate-like workpiece W and the processing means 7 so as to pass through the rotation center of the plate-like workpiece W.
When the rotary shaft 70 is rotationally driven by the motor 72 shown in FIG. 1, the grinding wheel 74 rotates in accordance therewith. The machining means 7 is fed in the -Z direction by the machining feed means 5 shown in FIG. 1, and the grinding wheel 74 enters the machining chamber 16 through the machining means inlet 163. The rotating grinding stone 740 abuts on the upper surface Wb of the plate-like workpiece W, thereby performing grinding processing. In addition, the rotating means 34 rotates the holding means 30 to rotate the plate-like workpiece W held on the holding surface 300a, so that the entire upper surface Wb of the plate-like workpiece W is ground. In the grinding process, grinding water is supplied to the contact portion between the grinding stone 740 and the plate-like workpiece W, and the contact portion is cooled and washed.
使板狀工件W的上表面Wb研削預定量後,加工手段7藉由加工進給手段5被往+Z方向拉起,且研削磨石740從板狀工件W分離。接著,移動手段14使保持研削完的板狀工件W的保持手段30往-Y方向移動。另外,加工室16的未圖示遮板開啟,保持手段30通過未圖示的搬入搬出口161被搬出加工室16外。After the upper surface Wb of the plate-like workpiece W is ground by a predetermined amount, the processing means 7 is pulled up in the + Z direction by the processing feed means 5, and the grinding stone 740 is separated from the plate-like workpiece W. Next, the moving means 14 moves the holding means 30 that holds the ground plate-like workpiece W in the -Y direction. In addition, a shutter (not shown) of the processing room 16 is opened, and the holding means 30 is carried out of the processing room 16 through a loading / unloading port 161 (not shown).
移動手段14使吸引保持板狀工件W的保持手段30往-Y方向移動至搬出手段4的正下方的位置。
如圖3所示汽缸機構40使保持墊42下降,使保持墊42的保持面與板狀元件W的上表面Wb接觸。吸引源43作動產生的吸引力傳遞至保持墊42的保持面,藉此保持墊42吸引保持板狀工件W。藉由保持手段30使板狀工件W的吸引保持解除,搬出手段4使在加工手段7所加工的板狀工件W從保持手段30的保持面300a在+Z方向分離。The moving means 14 moves the holding means 30 that sucks and holds the plate-like workpiece W in the -Y direction to a position immediately below the unloading means 4.
As shown in FIG. 3, the cylinder mechanism 40 lowers the holding pad 42 and brings the holding surface of the holding pad 42 into contact with the upper surface Wb of the plate-like element W. The attractive force generated by the operation of the suction source 43 is transmitted to the holding surface of the holding pad 42, whereby the holding pad 42 attracts and holds the plate-shaped workpiece W. The suction and holding of the plate-shaped workpiece W is released by the holding means 30, and the carrying-out means 4 separates the plate-shaped workpiece W processed by the processing means 7 from the holding surface 300 a of the holding means 30 in the + Z direction.
如圖4所示,水供給源831對水供給管830送出清洗水,使該清洗水儲水於桶82內。使桶82內裝滿清洗水後,持續從水供給源831的清洗水的供給,藉此清洗水呈從桶82的上部溢出的狀態,成為滾筒清洗構件80的露出部801以外的部分容納於桶82中被水浸沒的狀態。另外,滾筒清洗構件80呈全體含有充分的清洗水的狀態。As shown in FIG. 4, the water supply source 831 sends washing water to the water supply pipe 830 so that the washing water is stored in the tub 82. After the bucket 82 is filled with the washing water, the washing water is continuously supplied from the water supply source 831, whereby the washing water overflows from the upper part of the bucket 82, and the portion other than the exposed portion 801 of the drum cleaning member 80 is accommodated in The bucket 82 is submerged in water. In addition, the drum cleaning member 80 is in a state containing sufficient washing water as a whole.
吸引保持板狀工件W的搬出手段4的保持墊42以板狀工件W的下表面Wa接觸滾筒清洗構件80的露出部801之方式,藉由汽缸機構40(參閱圖3)定位於預定的高度位置。另外如圖4所示,移動手段14使清洗機構8在+Y方向以預定的清洗進給速度移動,藉此滾筒清洗構件80的露出部801相對於板狀工件W的下表面Wa接觸。亦即露出部801壓附於板狀工件W,並配合板狀工件W的板狀工件W的下表面Wa變形,使該接觸面積最大化。
在此狀態下馬達811使旋轉軸810旋轉,藉此,與旋轉軸810一同旋轉的滾筒清洗構件80從-Y方向側朝向+Y方向清洗板狀工件W的下表面Wa。The holding pad 42 of the carrying-out means 4 that sucks and holds the plate-like workpiece W is positioned at a predetermined height by the cylinder mechanism 40 (see FIG. 3) so that the lower surface Wa of the plate-like workpiece W contacts the exposed portion 801 of the drum cleaning member 80. position. In addition, as shown in FIG. 4, the moving means 14 moves the cleaning mechanism 8 in the + Y direction at a predetermined cleaning feed rate, whereby the exposed portion 801 of the drum cleaning member 80 contacts the lower surface Wa of the plate-like workpiece W. That is, the exposed portion 801 is pressed against the plate-like workpiece W and deforms the lower surface Wa of the plate-like workpiece W in cooperation with the plate-like workpiece W to maximize the contact area.
In this state, the motor 811 rotates the rotation shaft 810, whereby the drum cleaning member 80 that rotates together with the rotation shaft 810 cleans the lower surface Wa of the plate-like workpiece W from the −Y direction side toward the + Y direction.
滾筒清洗構件80的露出部801清洗板狀工件W的下表面Wa,隨之附著於板狀工件W的研削屑等的灰塵附著於旋轉的滾筒清洗構件80的側面。附著於該滾筒清洗構件80的灰塵伴隨滾筒清洗構件80的旋轉進入桶82內,藉由儲水於桶82的清洗水從滾筒清洗構件80的側面洗落。在該灰塵的比重比清洗水小的情況下,與從桶82溢出的清洗水一同於桶82的外部流下,故不會再次附著於滾筒清洗構件80。因此,從水供給源831持續使清洗水供給於桶82,藉此維持桶82內儲水有一定量的乾淨的清洗水的狀態。
一方面,該灰塵的比重比清洗水大的情況下,以該灰塵不沉澱於桶82的底板82a之方式,使清洗水從桶82的底板82a側供給,在灰塵沉澱之前一同與清洗水從桶82溢出,並維持桶82的內部為乾淨的狀態,使灰塵不會再次附著於滾筒清洗構件80。另外亦可具備排水閥(未圖示),在清洗1片板狀工件W時使桶82的清洗水排水。The exposed portion 801 of the drum cleaning member 80 cleans the lower surface Wa of the plate-shaped workpiece W, and the dust such as grinding debris adhering to the plate-shaped workpiece W adheres to the side surface of the rotating drum cleaning member 80. The dust adhering to the drum cleaning member 80 enters the tub 82 with the rotation of the drum cleaning member 80, and the washing water stored in the tub 82 is washed off from the side of the drum cleaning member 80. When the specific gravity of the dust is smaller than the washing water, the dust flows out of the bucket 82 together with the washing water overflowing from the bucket 82, so that it does not adhere to the drum washing member 80 again. Therefore, the washing water is continuously supplied to the tub 82 from the water supply source 831, thereby maintaining a state in which a certain amount of clean washing water is stored in the tub 82.
On the one hand, when the specific gravity of the dust is larger than the washing water, the washing water is supplied from the bottom plate 82a side of the bucket 82 so that the dust does not settle on the bottom plate 82a of the bucket 82, and the washing water is removed together with the washing water before the dust settles The tub 82 overflows, and the inside of the tub 82 is maintained in a clean state so that dust does not adhere to the drum cleaning member 80 again. In addition, a drain valve (not shown) may be provided to drain the washing water of the tub 82 when washing one sheet-shaped workpiece W.
本實施方式中,藉由上述清洗機構8進行清洗板狀工件W的下表面Wa,並一同藉由將板狀工件W的清洗後的下表面Wa與清洗構件8一同在+Y方向移動的空氣噴射手段2使其乾燥。亦即,空氣供給源22作動,對台部20供給壓縮空氣,使該空氣從噴射口21朝向板狀工件W的下表面Wa噴射。此結果藉由該空氣使附著於清洗的板狀工件W的下表面Wa的清洗水吹去,而板狀的工件W的下表面Wa乾燥。亦即,使板狀工件W的下表面Wa所清洗的部位以後續的方式使其乾燥。In this embodiment, the lower surface Wa of the plate-shaped workpiece W is cleaned by the cleaning mechanism 8 described above, and the air moving the + -direction of the lower surface Wa of the plate-shaped workpiece W together with the cleaning member 8 is cleaned together. The spraying means 2 makes it dry. That is, the air supply source 22 is operated to supply compressed air to the table portion 20 so that the air is ejected from the injection port 21 toward the lower surface Wa of the plate-shaped workpiece W. As a result, the cleaning water adhering to the lower surface Wa of the plate-like workpiece W to be cleaned is blown away by the air, and the lower surface Wa of the plate-like workpiece W is dried. That is, the portion cleaned by the lower surface Wa of the plate-like workpiece W is dried in a subsequent manner.
清洗構件8及空氣噴射手段2移動至通過以搬出手段4所保持的板狀工件W的下方之+Y方向的預定位置,藉此使板狀工件W的下表面Wa呈清洗乾燥的狀態。The cleaning member 8 and the air-jetting means 2 are moved to a predetermined position in the + Y direction below the plate-like workpiece W held by the carrying-out means 4, so that the lower surface Wa of the plate-like workpiece W is washed and dried.
如上述的本發明係一種加工裝置1,其具備:清洗機構8,清洗搬出手段4保持的板狀工件W的下表面Wa;以及,移動手段14,在Y軸方向使搬出手段4及清洗機構8相對地移動;清洗機構8具備:圓筒狀的滾筒清洗構件80,在對移動手段14的移動方向交叉的方向且平行保持手段30的保持面300a的方向上延伸;旋轉手段81,以滾筒清洗構件80的中心軸為軸旋轉;桶82,使滾筒清洗構件80的側面一部份形成在延伸方向上細長地露出之露出部801,同時容納滾筒清洗構件80的露出部801以外的部分並以水浸沒;以及,水供給手段83,在桶82儲水;一邊使藉由水供給手段83供給的水從桶82的上部溢出,一邊使搬出手段4保持的板狀工件W的下表面Wa抵接在桶82內旋轉的滾筒清洗構件80的露出部801,清洗板狀工件W的下表面Wa,為此,在工件清洗中附著於滾筒清洗構件80的灰塵洗落於桶82的水中,以不讓灰塵在清洗中從滾筒清洗構件80再附著於板狀工件W之方式,可繼續以乾淨的滾筒清洗構件80清洗板狀工件W的下表面Wa。The present invention as described above is a processing device 1 including the cleaning mechanism 8 to clean the lower surface Wa of the plate-shaped workpiece W held by the carrying-out means 4; and the moving means 14 to carry the carrying-out means 4 in the Y-axis direction and the washing means. 8 relatively moves; the cleaning mechanism 8 includes a cylindrical drum cleaning member 80 extending in a direction intersecting the moving direction of the moving means 14 and parallel to the holding surface 300a of the holding means 30; and a rotating means 81 using a drum The central axis of the cleaning member 80 is an axis rotation; the bucket 82 forms a part of the side surface of the drum cleaning member 80 to form an exposed portion 801 that is slenderly exposed in the extension direction, and simultaneously accommodates a portion other than the exposed portion 801 of the drum cleaning member 80 and Water immersion; and water supply means 83 stores water in the bucket 82; while the water supplied by the water supply means 83 overflows the upper part of the bucket 82, the lower surface Wa of the plate-shaped workpiece W held by the carrying out means 4 The abutting portion 801 of the drum cleaning member 80 rotating in the tub 82 cleans the lower surface Wa of the plate-shaped workpiece W. To this end, the dust adhering to the drum cleaning member 80 is washed into the water of the bucket 82 during workpiece cleaning. In this way, the lower surface Wa of the plate-like workpiece W can be continued to be cleaned by the clean roller-washing member 80 in such a manner as to prevent dust from re-adhering to the plate-like workpiece W during the cleaning.
加工裝置1具備空氣噴射手段2,空氣噴射手段2和滾筒清洗構件80的延伸方向平行地延伸,且在相對於清洗板狀工件W時的搬出手段4之清洗機構8的進行方向(+Y方向)上配設於清洗機構8的後方側,並對搬出手段4保持的板狀工件W的下表面Wa噴射空氣,藉此可使藉由滾筒清洗構件80清洗的板狀工件W的下表面Wa以後續的方式以空氣使其乾燥,可由移動手段14在板狀工件W的一方向的清洗進給(往+Y方向的1次行程的清洗進給)中進行清洗板狀工件W的下表面Wa及使其乾燥來縮短清洗時間。The processing apparatus 1 is provided with the air spraying means 2, the air spraying means 2 and the extension direction of the drum cleaning member 80 are extended in parallel, and it is with respect to the advancing direction (+ Y direction) of the cleaning mechanism 8 of the carrying-out means 4 when cleaning the plate-shaped workpiece W ) Is disposed on the rear side of the cleaning mechanism 8 and sprays air on the lower surface Wa of the plate-like workpiece W held by the carrying-out means 4, thereby enabling the lower surface Wa of the plate-like workpiece W to be cleaned by the drum cleaning member 80. The lower surface of the plate-shaped workpiece W can be cleaned by the moving means 14 in one direction of the cleaning feed of the plate-shaped workpiece W (the cleaning feed of one stroke in the + Y direction) by the moving means 14 in a subsequent manner. Wa and dry it to shorten the cleaning time.
再者,本發明的加工裝置1並不限定於上述實施方式,另外,隨附圖面所圖示的裝置的各構成之形狀等亦不限定於此,在可發揮本發明功效範圍內可進行適當變更。
舉例而言,作為在Y軸方向可移動的搬出手段4之構成,亦可為在板狀工件W的下表面Wa的清洗時,不使保持手段30在Y軸方向移動,而使保持板狀工件W的搬出手段4對保持手段30相對地移動並進行清洗。In addition, the processing device 1 of the present invention is not limited to the above-mentioned embodiment, and the shapes and the like of the various components of the device illustrated in the accompanying drawings are not limited to this, and can be performed within a range in which the effects of the present invention can be exerted. Change appropriately.
For example, as the configuration of the carrying-out means 4 that is movable in the Y-axis direction, it is also possible to prevent the holding means 30 from moving in the Y-axis direction while cleaning the lower surface Wa of the plate-like workpiece W, and to maintain the plate-like shape. The carrying-out means 4 of the workpiece W relatively moves and cleans the holding means 30.
W‧‧‧板狀工件W‧‧‧ plate workpiece
1‧‧‧加工裝置1‧‧‧Processing Equipment
10‧‧‧基座10‧‧‧ base
11‧‧‧柱11‧‧‧column
30‧‧‧保持手段30‧‧‧ means of retention
300‧‧‧吸附部300‧‧‧ Adsorption Department
300a‧‧‧保持面300a‧‧‧ holding surface
301‧‧‧框體301‧‧‧Frame
39‧‧‧蓋板39‧‧‧ Cover
39a‧‧‧蛇腹板39a‧‧‧ snake web
38‧‧‧分隔壁38‧‧‧ partition
14‧‧‧移動手段14‧‧‧ Means of movement
140‧‧‧滾珠螺桿140‧‧‧ball screw
141‧‧‧導軌141‧‧‧rail
142‧‧‧馬達142‧‧‧Motor
143‧‧‧可動板143‧‧‧movable plate
5‧‧‧加工進給手段5‧‧‧ processing feed means
7‧‧‧加工手段7‧‧‧Processing means
740‧‧‧研削磨石740‧‧‧grinding stone
16‧‧‧加工室16‧‧‧Processing Room
160‧‧‧側板160‧‧‧Side
161‧‧‧搬入搬出口161‧‧‧Moved in and out
162‧‧‧頂板162‧‧‧Top plate
163‧‧‧加工手段進入口163‧‧‧Processing entrance
4‧‧‧搬出手段4‧‧‧ means of removal
40‧‧‧汽缸機構40‧‧‧cylinder mechanism
41‧‧‧臂部41‧‧‧arm
42‧‧‧保持墊42‧‧‧Retaining pad
421‧‧‧吸引管421‧‧‧Suction tube
43‧‧‧吸引源43‧‧‧ Attraction source
8‧‧‧清洗機構8‧‧‧Cleaning mechanism
80‧‧‧滾筒清洗構件80‧‧‧ roller cleaning components
801‧‧‧露出部801‧‧‧ exposed
81‧‧‧旋轉手段81‧‧‧ Rotation means
810‧‧‧旋轉軸810‧‧‧rotation axis
811‧‧‧馬達811‧‧‧Motor
82‧‧‧桶82‧‧‧ barrels
82a‧‧‧底板82a‧‧‧ floor
82b、82c‧‧‧側板82b, 82c‧‧‧Side panels
820‧‧‧水供給口820‧‧‧Water supply port
83‧‧‧水供給手段83‧‧‧ Water supply means
830‧‧‧水供給管830‧‧‧Water supply pipe
831‧‧‧水供給源831‧‧‧ Water supply source
86‧‧‧支撐台86‧‧‧Support
2‧‧‧空氣噴射手段2‧‧‧ air jet means
圖1係表示加工裝置的一例之立體圖。FIG. 1 is a perspective view showing an example of a processing apparatus.
圖2係放大表示清洗裝置及空氣噴射手段的一例之立體圖。 FIG. 2 is an enlarged perspective view showing an example of a cleaning device and an air spraying means.
圖3係表示藉由清洗機構開始板狀工件的下表面的清洗狀態之立體圖。 Fig. 3 is a perspective view showing a state in which the lower surface of the plate-shaped workpiece is cleaned by a cleaning mechanism.
圖4係表示藉由清洗機構清洗板狀工件的下表面並藉由空氣噴射手段乾燥板狀工件的下表面狀態之剖面圖。 FIG. 4 is a cross-sectional view showing a state where the lower surface of the plate-shaped workpiece is cleaned by a cleaning mechanism and the lower surface of the plate-shaped workpiece is dried by an air spraying method.
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CN113522877A (en) * | 2021-05-21 | 2021-10-22 | 太仓顶艺半导体科技有限公司 | Deburring process for anti-sticking mold |
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