TW201940627A - Conductive adhesive layer conductive adhesive containing a binder resin and a conductive filler, and the surface skewness Ssk being between -3.5 and 2.7 - Google Patents

Conductive adhesive layer conductive adhesive containing a binder resin and a conductive filler, and the surface skewness Ssk being between -3.5 and 2.7 Download PDF

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Publication number
TW201940627A
TW201940627A TW107137513A TW107137513A TW201940627A TW 201940627 A TW201940627 A TW 201940627A TW 107137513 A TW107137513 A TW 107137513A TW 107137513 A TW107137513 A TW 107137513A TW 201940627 A TW201940627 A TW 201940627A
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conductive adhesive
adhesive layer
conductive
adherend
layer
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TW107137513A
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Chinese (zh)
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TWI739040B (en
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竹下茂樹
渡邊正博
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日商拓自達電線股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0218Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/001Conductive additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Adhesive Tapes (AREA)
  • Structure Of Printed Boards (AREA)
  • Conductive Materials (AREA)

Abstract

An object of the present invention is to improve the adhesion after the temporary positioning step of the adherend, and to prevent misalignment of the conductive adhesive layer after the temporary positioning step. The conductive adhesive layer is a solution of the present invention. The conductive adhesive layer is composed of a conductive adhesive containing a binder resin and a conductive filler, and the surface skewness Ssk is between -3.5 and 2.7.

Description

導電性接著劑層Conductive adhesive layer

發明領域
本揭示發明是有關於導電性接著劑層、電磁波屏蔽膜及屏蔽配線基板。
FIELD OF THE INVENTION The present invention relates to a conductive adhesive layer, an electromagnetic wave shielding film, and a shielded wiring board.

背景技術
於印刷配線基板中大多使用導電性接著劑。此種導電性接著劑例如作為形成於絕緣保護層表面的導電性接著劑層之原料而使用在電磁波屏蔽膜等。該電磁波屏蔽膜例如接著於印刷配線基板而使導電性接著劑層與印刷配線基板之接地電路導通。
BACKGROUND ART A conductive adhesive is often used in printed wiring boards. Such a conductive adhesive is used as a raw material of the conductive adhesive layer formed on the surface of an insulating protective layer, for example, in an electromagnetic wave shielding film. This electromagnetic wave shielding film is adhered to a printed wiring board, for example, to conduct a conductive adhesive layer and a ground circuit of the printed wiring board.

不過,在將電磁波屏蔽膜接著於印刷配線基板等時,通常會在暫時定位固定於預定位置後,藉由比暫時定位固定時更嚴苛之加壓加熱條件進行壓製。However, when an electromagnetic wave shielding film is attached to a printed wiring board or the like, it is usually pressed under a more severe pressure and heating condition after temporarily positioning and fixing at a predetermined position than when temporarily positioning and fixing.

然而,於習知電磁波屏蔽膜中,大多著眼於改良加壓加熱後的接著強度,雖然加壓加熱後的接著強度高,但暫時定位固定後的接著強度差,即使一度暫時定位,當移動基板時,仍有電磁波屏蔽膜剝落而要重新作業之虞。However, most of the conventional electromagnetic shielding films focus on improving the bonding strength after pressure heating. Although the bonding strength after pressure heating is high, the bonding strength after temporary positioning and fixing is poor. Even if the positioning is temporarily temporary, when moving the substrate In some cases, the electromagnetic wave shielding film may be peeled off and the operation may be restarted.

故,為了改良與印刷配線基板等被接著體之接著強度,揭示的是用表面粗度Ra來規定導電性接著劑層之表面性狀(例如參照專利文獻1)。Therefore, in order to improve the bonding strength with an adherend such as a printed wiring board, it is disclosed that the surface roughness of the conductive adhesive layer is defined by the surface roughness Ra (for example, refer to Patent Document 1).

先前技術文獻
專利文獻
專利文獻1:日本特開2017-25280號公報
Prior Art Literature Patent Literature Patent Literature 1: Japanese Patent Laid-Open No. 2017-25280

發明概要
發明欲解決之課題
然而,即使導電性接著劑層之表面粗度Ra在特定範圍,亦會有暫時定位步驟後的接著強度差且於暫時定位步驟後產生導電性接著劑層錯位之虞。
SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, even if the surface roughness Ra of the conductive adhesive layer is within a specific range, there is a possibility that the bonding strength after the temporary positioning step is poor and the conductive adhesive layer is dislocated after the temporary positioning step .

本揭示發明是有鑑於此點而成,其目的在提升對被接著體的暫時定位步驟後的密著性,藉此防止暫時定位步驟後的導電性接著劑層之錯位。The present invention has been made in view of this point, and an object thereof is to improve adhesion after a temporary positioning step to an adherend, thereby preventing misalignment of the conductive adhesive layer after the temporary positioning step.

用以解決課題之手段
本揭示發明之導電性接著劑層之一態樣之特徵在於由含有黏結劑樹脂與導電性填料的導電性接著劑構成,並且表面之偏斜度Ssk為-3.5以上且2.7以下。
Means for Solving the Problem One aspect of the conductive adhesive layer of the present invention is that it is composed of a conductive adhesive containing a binder resin and a conductive filler, and the surface skewness Ssk is -3.5 or more and 2.7 or less.

於本揭示發明之導電性接著劑層之一態樣中,表面之最大峰高Sp可設為1.3μm以上且30μm以下。In one aspect of the conductive adhesive layer of the present invention, the maximum peak height Sp of the surface may be 1.3 μm or more and 30 μm or less.

於本揭示發明之導電性接著劑層之一態樣中,平均粒徑D50可設為3μm以上且20μm以下,並且於前述導電性接著劑中的含有率可設為10質量%以上且80質量%以下。In one aspect of the conductive adhesive layer of the present disclosure, the average particle diameter D50 may be 3 μm or more and 20 μm or less, and the content rate in the conductive adhesive may be 10% by mass or more and 80% by mass. %the following.

本揭示發明之電磁波屏蔽膜之一態樣之特徵在於具備:絕緣保護層;及本揭示發明之導電性接著劑層,其設置於該絕緣保護層之表面。One aspect of the electromagnetic wave shielding film of the present disclosure includes: an insulating protection layer; and the conductive adhesive layer of the present disclosure provided on the surface of the insulating protection layer.

本揭示發明之屏蔽配線基板之一態樣之特徵在於具備:印刷配線基板,其設置有接地電路;及本揭示發明之電磁波屏蔽膜,其以與前述接地電路導通之方式接著於前述印刷配線基板。One aspect of the shielded wiring substrate of the present disclosure includes: a printed wiring substrate provided with a ground circuit; and an electromagnetic wave shielding film of the disclosed invention which is connected to the printed wiring substrate in a manner of conducting with the ground circuit. .

發明效果
依據本揭示發明,對被接著體的暫時定位步驟後的密著性優異,可防止暫時定位步驟後的導電性接著劑層之錯位。
ADVANTAGE OF THE INVENTION According to this invention, it is excellent in the adhesiveness after a temporary positioning process with respect to an adherend, and the dislocation of the conductive adhesive layer after a temporary positioning process can be prevented.

用以實施發明之形態
以下,詳細說明本揭示發明之實施形態。以下較佳實施形態的說明在本質上不過是例示,絕非意圖限制本揭示發明、其適用物或其用途。
Embodiments for Carrying Out the Invention Embodiments of the present invention will be described in detail below. The following descriptions of the preferred embodiments are merely examples in nature, and are not intended to limit the disclosed invention, its application, or its use.

<導電性接著劑層>
(偏斜度Ssk)
本實施形態之導電性接著劑層之特徵在於其表面之偏斜度Ssk為-3.5以上且2.7以下。如圖1所示,本實施形態之導電性接著劑層100具有由凸部100a(峰部)及凹部100b(谷部)所構成的凹凸表面,作為特定其表面性狀參數的偏斜度Ssk會被控制在特定範圍,故,對被接著體(未圖示)的暫時定位步驟後的密著性優異,可防止暫時定位步驟後的導電性接著劑層100之錯位。
<Conductive Adhesive Layer>
(Skew Ssk)
The conductive adhesive layer of this embodiment is characterized in that the surface skewness Ssk is -3.5 or more and 2.7 or less. As shown in FIG. 1, the conductive adhesive layer 100 of this embodiment has a concave-convex surface composed of a convex portion 100 a (peak portion) and a concave portion 100 b (valley portion). Since it is controlled in a specific range, it has excellent adhesion to the adherend (not shown) after the temporary positioning step, and prevents the conductive adhesive layer 100 from being displaced after the temporary positioning step.

偏斜度Ssk是顯示以凹凸表面之平均面為基準的高度分布之對稱性,當偏斜度Ssk為0時,則為高度分布呈上下對稱(正規分布)的表面,另一方面,當小於0時,則為細小谷部多的表面,當大於0時,則為細小峰部多的表面。Skewness Ssk shows the symmetry of the height distribution based on the average surface of the uneven surface. When Skewness Ssk is 0, the height distribution is a symmetrical surface (regular distribution). On the other hand, when it is less than When it is 0, it is a surface with many fine valleys. When it is greater than 0, it is a surface with many fine peaks.

當導電性接著劑層100表面之偏斜度Ssk之絕對值大時,即,若為峰部或谷部多的凹凸表面,則與被接著體間之接著面積會減小,對被接著體的暫時定位步驟後的接著強度變得不足。When the absolute value of the skewness Ssk on the surface of the conductive adhesive layer 100 is large, that is, if the surface has a large number of peaks or valleys, the area of contact with the adherend will be reduced. The bonding strength after the temporary positioning step becomes insufficient.

故,令導電性接著劑層100之表面為偏斜度Ssk在以0為中心之特定範圍,亦即高度分布呈上下較為對稱的表面,藉此可增加與被接著體間之接著面積,而可提升對被接著體的暫時定位步驟後的密著性。Therefore, the surface of the conductive adhesive layer 100 is made to have a skewness Ssk in a specific range centered at 0, that is, the height distribution is a symmetrical surface up and down, thereby increasing the bonding area with the adherend, and Adhesion after the temporary positioning step to the adherend can be improved.

故,藉由減少谷部而接近於高度分布呈上下對稱的表面,會增加與被接著體間之接著面積,提升對被接著體的暫時定位步驟後的密著性,若由此觀點來看,則偏斜度Ssk為-3.5以上,理想的是-3以上,較為理想的是-2.5以上,更為理想的是-2以上。又,藉由減少峰部而接近於高度分布呈上下對稱的表面,會增加與被接著體間之接著面積,提升對被接著體的暫時定位步驟後的密著性,若由此觀點來看,則為2.7以下,理想的是2.5以下,較為理想的是2以下,更為理想的是1.5以下。Therefore, by reducing the valleys and approaching a vertically symmetrical surface with a height distribution, the bonding area with the adherend will be increased, and the adhesion after the temporary positioning step for the adherend will be improved. , The skewness Ssk is -3.5 or more, preferably -3 or more, more preferably -2.5 or more, and even more preferably -2 or more. In addition, by reducing the peaks and approaching the surface whose height distribution is symmetrical up and down, it will increase the bonding area with the adherend, and improve the adhesion after the temporary positioning step for the adherend. From this point of view, , It is 2.7 or less, preferably 2.5 or less, more preferably 2 or less, and even more preferably 1.5 or less.

另,於本說明書中,「被接著體」意指例如形成印刷配線基板之基底層的聚醯亞胺膜等樹脂膜、形成接地電路的銅箔等金屬層等。In this specification, the "adhered body" means, for example, a resin film such as a polyimide film that forms a base layer of a printed wiring board, a metal layer such as a copper foil that forms a ground circuit, and the like.

又,於本說明書中,「暫時定位步驟」意指在最終固定步驟前進行的步驟,例如藉由2片已加熱至120℃的加熱板(未圖示)自上下方向夾持導電性接著劑層100與被接著體,並以壓力0.5MPa按壓5秒鐘。In this specification, the "temporary positioning step" means a step performed before the final fixing step. For example, a conductive adhesive is held from above and below by two heating plates (not shown) heated to 120 ° C. The layer 100 and the adherend were pressed at a pressure of 0.5 MPa for 5 seconds.

再者,於本說明書中,「對被接著體的暫時定位步驟後的密著性優異」意指暫時定位步驟後的導電性接著劑層100與被接著體之180°剝離強度為0.5N/cm以上。此時,可防止暫時定位步驟後的導電性接著劑層100之錯位。另,剝離強度之具體測定方法藉由以下實施例來說明。In addition, in this specification, "excellent adhesion after the temporary positioning step to the adherend" means that the 180 ° peel strength of the conductive adhesive layer 100 and the adherend after the temporary positioning step is 0.5 N / cm or more. In this case, the conductive adhesive layer 100 can be prevented from being displaced after the temporary positioning step. In addition, the specific measurement method of peeling strength is demonstrated by the following example.

(最大峰高Sp)
又,本實施形態之導電性接著劑層100表面之最大峰高Sp宜為1.3μm以上且30μm以下。依此,本實施形態之導電性接著劑層100藉由將作為特定其表面性狀參數的最大峰高Sp控制在特定範圍,可進一步地提升對被接著體的暫時定位步驟後的密著性,從而進一步地防止暫時定位步驟後的導電性接著劑層100之錯位。
(Maximum peak height Sp)
The maximum peak height Sp of the surface of the conductive adhesive layer 100 of this embodiment is preferably 1.3 μm or more and 30 μm or less. Accordingly, by controlling the maximum peak height Sp as a specific surface property parameter of the conductive adhesive layer 100 of this embodiment in a specific range, the adhesion after the temporary positioning step for the adherend can be further improved. Thereby, the dislocation of the conductive adhesive layer 100 after the temporary positioning step is further prevented.

最大峰高Sp顯示距離凹凸表面之平均面的峰高最大值,最大峰高Sp越大,越會構成具有高峰的表面。The maximum peak height Sp shows the maximum value of the peak height from the average surface of the uneven surface. The larger the maximum peak height Sp, the more a surface having a peak is formed.

當導電性接著劑層100表面之最大峰高Sp大時,即,若為具有高峰的表面,則其高峰會變成障礙而與被接著體間之接著面積會減小,因此,對被接著體的暫時定位步驟後的接著強度變得不足。When the maximum peak height Sp of the surface of the conductive adhesive layer 100 is large, that is, if the surface has a peak, the peak becomes an obstacle and the area of contact with the adherend is reduced. The bonding strength after the temporary positioning step becomes insufficient.

故,令導電性接著劑層100之表面為最大峰高Sp在特定範圍,即最高峰之峰高較低的表面,藉此可進一步地增加與被接著體間之接著面積,從而進一步地提升對被接著體的暫時定位步驟後的密著性。Therefore, the surface of the conductive adhesive layer 100 is a surface having a maximum peak height Sp in a specific range, that is, a surface with a lower peak height of the highest peak, thereby further increasing the bonding area with the adherend, thereby further improving the alignment. Adhesion after the temporary positioning step of the adherend.

故,若由進一步地增加與被接著體間之接著面積以進一步地提升對被接著體的暫時定位步驟後的密著性之觀點來看,則最大峰高Sp宜為1.3μm以上,較為理想的是1.6μm以上。又,藉由接近於最高峰之峰高較低的表面,會進一步地增加與被接著體間之接著面積從而進一步地提升對被接著體的暫時定位步驟後的密著性,若由此觀點來看,則宜為30μm以下,較為理想的是25μm以下。Therefore, from the viewpoint of further increasing the area of contact with the adherend to further improve the adhesion after the temporary positioning step for the adherend, the maximum peak height Sp is preferably 1.3 μm or more, which is ideal. It is 1.6 μm or more. In addition, the surface close to the lower peak height of the highest peak will further increase the bonding area with the adherend, thereby further improving the adhesion after the temporary positioning step for the adherend. In view of this, the thickness is preferably 30 μm or less, and more preferably 25 μm or less.

(其他參數)
另,作為特定導電性接著劑層100之表面性狀的參數,除了偏斜度Ssk及最大峰高Sp外,例如還可舉最大谷深Sv、顯示最大峰高Sp與最大谷深Sv之和的最大高度Sz等,惟本揭示發明並非僅限於前述例示。
(Other parameters)
In addition, as the parameters of the surface properties of the specific conductive adhesive layer 100, in addition to the skewness Ssk and the maximum peak height Sp, for example, the maximum valley depth Sv, the sum of the maximum peak height Sp and the maximum valley depth Sv may be exemplified. The maximum height Sz and the like are not limited to the foregoing examples.

另一方面,本發明之發明人發現,如後述各實施例及各比較例中所示,算術平均Sa與對被接著體的暫時定位步驟後的密著性無關。其理由是算術平均Sa係表示各點(峰部與谷部)相對於凹凸表面之平均面的高度差之絕對值的平均,因此,即便是該值小之情形時,有時亦包含具有相同程度之高峰與深谷的凹凸表面。此時,吾人認為其高峰與深谷會變成障礙以致與被接著體間之接著面積減小,對被接著體的暫時定位步驟後的接著強度會變得不足。故,算術平均Sa並不適合作為特定導電性接著劑層100之表面性狀的參數,該參數是用以獲得能防止暫時定位步驟後的導電性接著劑層100之錯位的接著強度。On the other hand, the inventors of the present invention have found that, as shown in the examples and comparative examples described later, the arithmetic mean Sa has nothing to do with the adhesion after the temporary positioning step for the adherend. The reason is that the arithmetic mean Sa is an average of the absolute values of the height differences of the points (peaks and valleys) with respect to the average surface of the uneven surface. Therefore, even when the value is small, the same may be included. The uneven surface of the peaks and deep valleys. At this time, I think that the peaks and valleys will become obstacles so that the area of contact with the adherend will decrease, and the adhesion strength after the step of temporarily positioning the adherend will become insufficient. Therefore, the arithmetic mean Sa is not suitable as a parameter of the surface properties of the specific conductive adhesive layer 100, and this parameter is used to obtain a bonding strength that can prevent the dislocation of the conductive adhesive layer 100 after the temporary positioning step.

另,本揭示發明之表面性狀為根據ISO 25178-6:2010所測得之值,具體的測定方法藉由以下實施例來說明。In addition, the surface properties of the present invention are measured according to ISO 25178-6: 2010, and specific measurement methods are described by the following examples.

本實施形態之導電性接著劑層100由含有黏結劑樹脂110與導電性填料120的導電性接著劑形成。The conductive adhesive layer 100 of this embodiment is formed of a conductive adhesive containing a binder resin 110 and a conductive filler 120.

(黏結劑樹脂)
黏結劑樹脂110並無特殊限制,可使用被運用在導電性接著劑的各種樹脂。此種樹脂例如可使用聚苯乙烯系、醋酸乙烯酯系、聚酯系、聚乙烯系、聚丙烯系、聚醯胺系、橡膠系或丙烯酸系等熱塑性樹脂;酚系、環氧系、胺甲酸乙酯系、三聚氰胺系或醇酸系等熱硬化性樹脂等。該等黏結劑樹脂110可分別單獨使用,亦可併用2種以上。
(Binder resin)
The binder resin 110 is not particularly limited, and various resins used for the conductive adhesive can be used. Examples of such resins include thermoplastic resins such as polystyrene, vinyl acetate, polyester, polyethylene, polypropylene, polyamide, rubber, or acrylic; phenol, epoxy, and amine. Thermosetting resins such as ethyl formate, melamine or alkyd. These binder resins 110 may be used alone or in combination of two or more kinds.

又,出於將導電性接著劑層100之表面性狀(偏斜度Ssk及最大峰高Sp)調整為預定狀態之觀點,在不妨礙本發明效果的範圍內,可於黏結劑樹脂110中添加樹脂微粒子或無機微粒子。樹脂微粒子例如可列舉:丙烯酸樹脂微粒子、聚丙烯腈微粒子、聚胺甲酸乙酯微粒子、聚醯胺微粒子或聚醯亞胺微粒子等。又,無機微粒子例如可列舉:碳酸鈣微粒子、矽酸鈣微粒子、黏土、高嶺土、滑石、二氧化矽微粒子、玻璃微粒子、矽藻土、雲母粉、氧化鋁微粒子、氧化鎂微粒子、氧化鋅微粒子、硫酸鋇微粒子、硫酸鋁微粒子、硫酸鈣微粒子或碳酸鎂微粒子等。該等樹脂微粒子及無機微粒子可分別單獨使用,亦可併用2種以上。In addition, from the viewpoint of adjusting the surface properties (the skewness Ssk and the maximum peak height Sp) of the conductive adhesive layer 100 to a predetermined state, the adhesive resin 110 can be added to the adhesive resin 110 as long as the effect of the present invention is not hindered. Resin fine particles or inorganic fine particles. Examples of the resin fine particles include acrylic resin fine particles, polyacrylonitrile fine particles, polyurethane fine particles, polyamide fine particles, and polyimide fine particles. Examples of the inorganic fine particles include calcium carbonate fine particles, calcium silicate fine particles, clay, kaolin, talc, silica particles, glass fine particles, diatomite, mica powder, alumina fine particles, magnesium oxide fine particles, zinc oxide fine particles, Barium sulfate fine particles, aluminum sulfate fine particles, calcium sulfate fine particles, magnesium carbonate fine particles, and the like. These resin fine particles and inorganic fine particles may be used alone, or two or more of them may be used in combination.

(導電性填料)
導電性填料120並無特殊限制,可使用被運用在導電性接著劑的金屬填料、被覆金屬的樹脂填料、碳填料及該等之混合物等。金屬填料例如可列舉:銅粉、銀粉、鎳粉、銀包銅粉、金包銅粉、銀包鎳粉或金包鎳粉等。該等金屬粉例如可藉由電解法、霧化法或還原法等來製作。該等導電性填料120可分別單獨使用,亦可併用2種以上。於該等之中,理想的是銀粉、銀包銅粉及銅粉,較為理想的是銀包銅粉。
(Conductive filler)
The conductive filler 120 is not particularly limited, and metal fillers used for conductive adhesives, metal-coated resin fillers, carbon fillers, and mixtures thereof can be used. Examples of the metal filler include copper powder, silver powder, nickel powder, silver-coated copper powder, gold-coated copper powder, silver-coated nickel powder, or gold-coated nickel powder. These metal powders can be produced by, for example, an electrolytic method, an atomization method, or a reduction method. These conductive fillers 120 may be used alone or in combination of two or more kinds. Among these, silver powder, silver-coated copper powder, and copper powder are desirable, and silver-coated copper powder is more desirable.

導電性填料120之形狀可列舉如:球狀、橢圓狀、小片狀、纖維狀或樹枝狀(枝晶狀)等。又,亦可設為金屬奈米粒子。金屬奈米粒子例如可舉銀奈米粒子或金奈米粒子等。Examples of the shape of the conductive filler 120 include a spherical shape, an oval shape, a small plate shape, a fibrous shape, and a dendritic shape (dendritic shape). Moreover, it can also be set as a metal nanoparticle. Examples of the metal nano particles include silver nano particles and gold nano particles.

導電性填料120之平均粒徑D50(中值粒徑)宜為3μm以上,較為理想的是5μm以上,且宜為20μm以下,較為理想的是15μm以下。另,導電性填料120之平均粒徑D50例如可藉由雷射繞射式粒徑分布測定裝置或流動式粒子影像分析裝置等一般使用的方法進行測定。The average particle diameter D50 (median diameter) of the conductive filler 120 is preferably 3 μm or more, more preferably 5 μm or more, and more preferably 20 μm or less, and more preferably 15 μm or less. The average particle diameter D50 of the conductive filler 120 can be measured, for example, by a generally used method such as a laser diffraction particle size distribution measurement device or a flow-type particle image analysis device.

又,導電性填料120之平均粒徑D50可依照導電性接著劑層100之厚度等適當地設定。具體而言,當導電性接著劑層100之厚度為5μm左右時,理想的是3μm左右,較為理想的是5μm左右。又,當導電性接著劑層100之厚度為15~60μm左右時,理想的是20μm左右,較為理想的是15μm左右。The average particle diameter D50 of the conductive filler 120 can be appropriately set in accordance with the thickness of the conductive adhesive layer 100 and the like. Specifically, when the thickness of the conductive adhesive layer 100 is about 5 μm, it is preferably about 3 μm, and more preferably about 5 μm. When the thickness of the conductive adhesive layer 100 is about 15 to 60 μm, it is preferably about 20 μm, and more preferably about 15 μm.

導電性接著劑中導電性填料120之含有率並無特殊限制,可依照導電性接著劑之用途適當地設定,理想的是10質量%以上,且理想的是80質量%以下,較為理想的是75質量%以下,更為理想的是70質量%以下。另,導電性接著劑層100可為各向異性導電性接著劑層、各向同性導電性接著劑層中之任一者;以各向異性導電性接著劑層作使用時,導電性接著劑中導電性填料120之含有率宜為10質量%以上,較為理想的是15質量%以上,更為理想的是20質量%以上,且宜為45質量%以下,較為理想的是40質量%以下,更為理想的是35質量%以下。以各向同性導電性接著劑層作使用時,導電性接著劑中導電性填料120之含有率宜為50質量%以上,較為理想的是55質量%以上,更為理想的是60質量%以上,且宜為80質量%以下,較為理想的是75質量%以下,更為理想的是70質量%以下。The content of the conductive filler 120 in the conductive adhesive is not particularly limited, and may be appropriately set according to the use of the conductive adhesive, preferably 10% by mass or more, and preferably 80% by mass or less, and more preferably 75 mass% or less, and more preferably 70 mass% or less. The conductive adhesive layer 100 may be any of an anisotropic conductive adhesive layer and an isotropic conductive adhesive layer. When the anisotropic conductive adhesive layer is used, the conductive adhesive layer is used. The content of the medium conductive filler 120 is preferably 10% by mass or more, more preferably 15% by mass or more, more preferably 20% by mass or more, and preferably 45% by mass or less, and more preferably 40% by mass or less. More preferably, it is 35 mass% or less. When an isotropic conductive adhesive layer is used, the content of the conductive filler 120 in the conductive adhesive is preferably 50% by mass or more, more preferably 55% by mass or more, and more preferably 60% by mass or more. It should be 80% by mass or less, more preferably 75% by mass or less, and even more preferably 70% by mass or less.

藉由將導電性填料120之平均粒徑D50與導電性接著劑中導電性填料120之含有率分別設為上述特定範圍,可實現具有足可防止暫時定位步驟後導電性接著劑層100錯位之偏斜度Ssk的導電性接著劑層100。By setting the average particle diameter D50 of the conductive filler 120 and the content ratio of the conductive filler 120 in the conductive adhesive to the above specific ranges, respectively, it is possible to achieve a thickness sufficient to prevent the conductive adhesive layer 100 from being displaced after the temporary positioning step. The conductive adhesive layer 100 having the skewness Ssk.

(任意成分)
在不妨礙本發明效果的範圍內,可於導電性接著劑中添加例如消泡劑、抗氧化劑、黏度調整劑、稀釋劑、防沈劑、調平劑、耦合劑、著色劑或阻燃劑等。該等任意成分可分別單獨使用,亦可併用2種以上。於該等之中,特別是由賦予導電性接著劑阻燃性之觀點來看,宜添加阻燃劑。
(Optional ingredient)
As long as the effect of the present invention is not hindered, for example, a defoamer, an antioxidant, a viscosity modifier, a diluent, an anti-settling agent, a leveling agent, a coupling agent, a colorant, or a flame retardant may be added to the conductive adhesive. Wait. These arbitrary components can be used individually or in combination of 2 or more types. Among these, a flame retardant is preferably added from the viewpoint of imparting flame retardance to a conductive adhesive.

此種阻燃劑例如可列舉:三聚氰胺三聚氰酸鹽或多磷酸三聚氰胺等氮系阻燃劑;氫氧化鎂或氫氧化鋁等金屬水合物;磷酸酯、紅磷或磷酸鹽化合物等磷系阻燃劑等。於該等阻燃劑中,理想的是磷酸鹽化合物。Examples of such flame retardants include nitrogen-based flame retardants such as melamine melamine and melamine polyphosphate; metal hydrates such as magnesium hydroxide and aluminum hydroxide; phosphorus-based compounds such as phosphate esters, red phosphorus, and phosphate compounds Flame retardants, etc. Among these flame retardants, phosphate compounds are desirable.

當阻燃劑加入導電性接著劑中時,宜相對於黏結劑樹脂110的量100質量份,添加10質量份~60質量份。When the flame retardant is added to the conductive adhesive, it is preferable to add 10 to 60 parts by mass relative to 100 parts by mass of the amount of the binder resin 110.

<導電性接著劑層之形成方法>
其次,說明使用含有黏結劑樹脂110及導電性填料120的導電性接著劑來形成本實施形態之導電性接著劑層100的方法。
<Method for forming conductive adhesive layer>
Next, a method for forming the conductive adhesive layer 100 of this embodiment using a conductive adhesive containing the binder resin 110 and the conductive filler 120 will be described.

(導電性接著劑之調製步驟)
首先,調製使黏結劑樹脂110溶解於溶劑中以成為預定濃度而成的黏結劑樹脂溶液。溶劑例如可列舉:甲苯、丙酮、甲基乙基酮、甲醇、乙醇、丙醇或二甲基甲醯胺等,惟本揭示發明並非僅限於前述例示。另,溶液中的黏結劑樹脂110之濃度可依照導電性接著劑層100之厚度等適當地設定。
(Step of preparing conductive adhesive)
First, a binder resin solution prepared by dissolving the binder resin 110 in a solvent to a predetermined concentration is prepared. Examples of the solvent include toluene, acetone, methyl ethyl ketone, methanol, ethanol, propanol, and dimethylformamide. However, the present invention is not limited to the foregoing examples. The concentration of the binder resin 110 in the solution can be appropriately set in accordance with the thickness of the conductive adhesive layer 100 and the like.

接著,在經前述調製出的黏結劑樹脂溶液中,添加導電性填料120、視需要之任意成分而獲得混合懸浮液,將該混合懸浮液攪拌混合,來調製導電性接著劑。Next, a conductive suspension 120 is added to the prepared binder resin solution to obtain a mixed suspension as required, and a mixed suspension is obtained. The mixed suspension is stirred and mixed to prepare a conductive adhesive.

(導電性接著劑之塗覆步驟)
其次,將經前述調製出的導電性接著劑塗覆於基層130上。基層130例如可使用樹脂製之片或膜等。構成片或膜的材料例如可使用聚酯系樹脂、聚乙烯系樹脂、聚丙烯系樹脂、聚醯胺系樹脂、丙烯酸系樹脂等熱塑性樹脂及/或熱硬化性樹脂等。於基層130之表面,亦可藉由一般所用之壓紋加工施以凹凸之微細圖案。另,當形成電磁波屏蔽膜時,則將導電性接著劑塗覆於後述絕緣保護層或屏蔽層上。
(Coating step of conductive adhesive)
Next, the conductive adhesive prepared as described above is coated on the base layer 130. As the base layer 130, for example, a resin sheet or film can be used. As a material constituting the sheet or film, for example, a thermoplastic resin such as a polyester resin, a polyethylene resin, a polypropylene resin, a polyamide resin, an acrylic resin, and / or a thermosetting resin can be used. On the surface of the base layer 130, a fine pattern of irregularities can also be applied by a commonly used embossing process. When an electromagnetic wave shielding film is formed, a conductive adhesive is applied to an insulating protective layer or a shielding layer described later.

於基層130表面,視需要亦可施行脫模處理。脫模處理例如可於基層130表面形成由矽系脫模劑、非矽系脫模劑或三聚氰胺系脫模劑等所構成的層體。藉由對基層130表面施行脫模處理,在將形成於基層130上的導電性接著劑層100黏貼於被接著體後,可輕易地剝離基層130。On the surface of the base layer 130, a demolding treatment can also be performed as needed. The release treatment can form, for example, a layered body composed of a silicon-based release agent, a non-silicon-based release agent, or a melamine-based release agent on the surface of the base layer 130. By performing a mold release treatment on the surface of the base layer 130, the base layer 130 can be easily peeled off after the conductive adhesive layer 100 formed on the base layer 130 is adhered to the adherend.

又,於基層130表面,視需要亦可設有黏著劑層。藉由於基層130表面設有黏著劑層,可防止基層130意外自導電性接著劑層100剝落。此種黏著劑例如可使用丙烯酸系黏著劑或聚酯系黏著劑等公知黏著劑。In addition, an adhesive layer may be provided on the surface of the base layer 130 as needed. Since an adhesive layer is provided on the surface of the base layer 130, the base layer 130 can be prevented from being accidentally peeled off from the conductive adhesive layer 100. As such an adhesive, for example, a known adhesive such as an acrylic adhesive or a polyester adhesive can be used.

另,基層130之厚度並無特殊限制,可適當地考慮使用容易度而決定。In addition, the thickness of the base layer 130 is not particularly limited, and may be determined in consideration of ease of use as appropriate.

於基層130上塗覆導電性接著劑的方法並無特殊限制,例如可使用唇口塗佈、缺角輪塗佈、凹版塗佈或狹縫式模具塗佈等方法。The method for coating the conductive adhesive on the base layer 130 is not particularly limited. For example, a method such as lip coating, notch coating, gravure coating, or slit die coating can be used.

(導電性接著劑之乾燥步驟)
最後,藉由使已塗覆於基層130上的導電性接著劑加熱乾燥而除去溶劑,可形成本實施形態之導電性接著劑層100。乾燥方法例如可列舉:溫風乾燥、紅外線乾燥、烘箱乾燥、熱板乾燥或真空乾燥等。
(Drying step of conductive adhesive)
Finally, the conductive adhesive layer coated on the base layer 130 is dried by heating to remove the solvent, so that the conductive adhesive layer 100 of this embodiment can be formed. Examples of the drying method include warm air drying, infrared drying, oven drying, hot plate drying, and vacuum drying.

依上述所製得之本實施形態之導電性接著劑層100之厚度可依照導電性填料120之粒徑來調整。若由實現良好導電性之觀點來看,則導電性接著劑層100之厚度宜為導電性填料120之平均粒徑D50的5.5倍以下,較為理想的是3.5倍以下。又,宜為導電性填料120之平均粒徑D50的+70μm以下(即,在將導電性填料120之平均粒徑D50設為dμm時,為d+70μm以下),較為理想的是+60μm以下(d+60μm以下)。若由進行良好塗覆之觀點來看,則導電性接著劑層100之厚度宜為導電性填料120之平均粒徑D50的0.6倍以上,較為理想的是0.7倍以上。又,宜為導電性填料120之平均粒徑D50的-7μm以上(d-7μm以上),較為理想的是-5μm以上(d-5μm以上)。The thickness of the conductive adhesive layer 100 of the present embodiment obtained as described above can be adjusted according to the particle diameter of the conductive filler 120. From the viewpoint of achieving good conductivity, the thickness of the conductive adhesive layer 100 is preferably 5.5 times or less the average particle diameter D50 of the conductive filler 120, and more preferably 3.5 times or less. The average particle diameter D50 of the conductive filler 120 is preferably +70 μm or less (that is, when the average particle diameter D50 of the conductive filler 120 is d μm, it is d + 70 μm or less), and more preferably +60 μm or less. (d + 60 μm or less). From the viewpoint of good coating, the thickness of the conductive adhesive layer 100 is preferably 0.6 times or more, and more preferably 0.7 times or more, the average particle diameter D50 of the conductive filler 120. The average particle diameter D50 of the conductive filler 120 is preferably -7 μm or more (d-7 μm or more), and more preferably -5 μm or more (d-5 μm or more).

另,視需要,亦可於導電性接著劑層100中之位在要貼合基層130之面的相反側的表面貼合剝離基材(分離膜)(未圖示)。剝離基材例如可列舉:於聚對苯二甲酸乙二酯或聚萘二甲酸乙二酯等基底膜上,在其要貼合於導電性接著劑層100之側的表面塗覆有矽系或非矽系脫模劑抑或丙烯酸系或聚酯系等黏著劑者等。藉由將剝離基材貼合於導電性接著劑層100之表面,可防止導電性接著劑層100之表面損傷或是附著異物。另,剝離基材之厚度並無特殊限制,可適當地考慮使用容易度而決定。If necessary, a release substrate (separation film) (not shown) may be bonded to the surface of the conductive adhesive layer 100 on the surface opposite to the surface to be bonded to the base layer 130. Examples of the release substrate include a silicon-based coating on a surface of a base film such as polyethylene terephthalate or polyethylene naphthalate, and the surface to be bonded to the conductive adhesive layer 100. Or non-silicone release agents, or acrylic or polyester adhesives. By attaching the release substrate to the surface of the conductive adhesive layer 100, it is possible to prevent the surface of the conductive adhesive layer 100 from being damaged or from adhering foreign matter. In addition, the thickness of the release substrate is not particularly limited, and can be determined in consideration of ease of use as appropriate.

又,於以上說明中顯示出下述例子,即:藉由於基層130上塗佈導電性接著劑並進行乾燥而形成具有預定偏斜度Ssk的導電性接著劑層100,然而,亦可使用剝離基材來形成。此時,使用具有微細圖案的剝離基材,並將微細圖案轉印於導電性接著劑層100之表面,藉此,亦可將導電性接著劑層100之表面性狀作成預定狀態。In the above description, an example is shown in which the conductive adhesive layer 100 having a predetermined skewness Ssk is formed by coating and drying the conductive adhesive on the base layer 130. However, peeling may be used. Substrate. At this time, by using a release substrate having a fine pattern and transferring the fine pattern on the surface of the conductive adhesive layer 100, the surface properties of the conductive adhesive layer 100 can also be made into a predetermined state.

如以上所說明,本揭示發明之導電性接著劑層100其表面之偏斜度Ssk為-3.5以上且2.7以下,因此,對被接著體的暫時定位步驟後的密著性優異。依此,本揭示發明之導電性接著劑層100可防止暫時定位步驟後的導電性接著劑層100之錯位,因此,例如可適當地使用在電磁波屏蔽膜等。As described above, since the deflection Ssk of the surface of the conductive adhesive layer 100 of the present disclosure is -3.5 or more and 2.7 or less, the adhesiveness after the temporary positioning step on the adherend is excellent. Accordingly, the conductive adhesive layer 100 of the present disclosure can prevent the displacement of the conductive adhesive layer 100 after the temporary positioning step. Therefore, the conductive adhesive layer 100 can be suitably used in, for example, an electromagnetic wave shielding film.

<電磁波屏蔽膜>
如圖2所示,本實施形態之電磁波屏蔽膜200之特徵在於具有:絕緣保護層210;及導電性接著劑層100,其設置於絕緣保護層210之表面。依此,本實施形態之電磁波屏蔽膜200具有本實施形態之導電性接著劑層100作為導電性接著劑層,因此,對印刷配線基板等被接著體(未圖示)的暫時定位步驟後的密著性優異,可防止暫時定位步驟後的導電性接著劑層100、亦即電磁波屏蔽膜200之錯位。
< Electromagnetic wave shielding film >
As shown in FIG. 2, the electromagnetic wave shielding film 200 of this embodiment is characterized by having an insulating protective layer 210 and a conductive adhesive layer 100 provided on the surface of the insulating protective layer 210. Accordingly, the electromagnetic wave shielding film 200 of this embodiment has the conductive adhesive layer 100 of this embodiment as a conductive adhesive layer. Therefore, after the temporary positioning step of the adherend (not shown) such as a printed wiring board, The adhesiveness is excellent, and the conductive adhesive layer 100 after the temporary positioning step, that is, the displacement of the electromagnetic wave shielding film 200 can be prevented.

又,將本實施形態之電磁波屏蔽膜200以與印刷配線基板(未圖示)之接地電路導通之方式接著本實施形態之導電性接著劑層100,藉此,可使該導電性接著劑層100發揮屏蔽電磁波的機能。另,如圖3所示,本實施形態之電磁波屏蔽膜200亦可於絕緣保護層210與導電性接著劑層100間設置屏蔽層220。In addition, the electromagnetic wave shielding film 200 of this embodiment is connected to the ground circuit of a printed wiring board (not shown), and then the conductive adhesive layer 100 of this embodiment is connected to the conductive adhesive layer. 100 functions as a shield for electromagnetic waves. In addition, as shown in FIG. 3, the electromagnetic wave shielding film 200 of this embodiment may be provided with a shielding layer 220 between the insulating protection layer 210 and the conductive adhesive layer 100.

(絕緣保護層)
絕緣保護層210只要具有充分之絕緣性且可保護導電性接著劑層100及屏蔽層220,則無特殊限制,例如可使用熱塑性樹脂、熱硬化性樹脂、活性能量線硬化性樹脂等來形成。
(Insulation protective layer)
The insulating protective layer 210 is not particularly limited as long as it has sufficient insulation and can protect the conductive adhesive layer 100 and the shielding layer 220. For example, the insulating protective layer 210 can be formed using a thermoplastic resin, a thermosetting resin, an active energy ray-curable resin, or the like.

絕緣保護層210亦可為材質或硬度抑或彈性模數等物性不同的2層以上積層構造。舉例言之,若作成硬度低的外層與硬度高的內層之積層構造,則外層具有緩衝效果,因此,可在將電磁波屏蔽膜200於印刷配線基板上加熱加壓之步驟時緩和施加於屏蔽層220的壓力。故,可抑制屏蔽層220因設置於印刷配線基板的高低差而受到破壞。The insulating protective layer 210 may have a multilayer structure of two or more layers having different physical properties such as material, hardness, or elastic modulus. For example, if a laminated structure with an outer layer having a low hardness and an inner layer having a high hardness is formed, the outer layer has a buffer effect. Therefore, the electromagnetic wave shielding film 200 can be gently applied to the shield during the step of heating and pressing the electromagnetic wave shielding film 200 on the printed wiring board. Layer 220 pressure. Therefore, it is possible to prevent the shield layer 220 from being damaged due to the height difference provided on the printed wiring board.

絕緣保護層210之厚度並無特殊限制,可視需要適當地設定,理想的是1μm以上,較為理想的是4μm以上,且理想的是20μm以下,較為理想的是10μm以下,更為理想的是5μm以下。藉由將絕緣保護層210之厚度設為1μm以上,可充分地保護導電性接著劑層100及屏蔽層220。又,藉由將絕緣保護層210之厚度設為20μm以下,可確保電磁波屏蔽膜200之撓曲性,從而容易將本實施形態之電磁波屏蔽膜200應用在要求撓曲性的構件、例如撓性印刷配線基板等。There is no particular limitation on the thickness of the insulating protective layer 210, and it can be appropriately set according to needs. It is preferably 1 μm or more, more preferably 4 μm or more, and ideally 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm. the following. By setting the thickness of the insulating protective layer 210 to 1 μm or more, the conductive adhesive layer 100 and the shielding layer 220 can be sufficiently protected. In addition, by setting the thickness of the insulating protective layer 210 to 20 μm or less, the flexibility of the electromagnetic wave shielding film 200 can be ensured, and the electromagnetic wave shielding film 200 of this embodiment can be easily applied to members requiring flexibility, such as flexibility. Printed wiring boards, etc.

(屏蔽層)
屏蔽層220只要具有導電性即可,例如可藉由金屬薄膜、導電性填料、金屬蒸鍍膜等來構成。金屬薄膜例如可藉由鎳、銅、銀、錫、金、鈀、鋁、鉻、鈦、鋅等中之任一者或是含有2種以上的合金來構成。金屬薄膜例如可藉由使用金屬箔或利用加成法堆積金屬來製造。加成法例如可使用電鍍法、無電鍍敷法、濺鍍法、電子束蒸鍍法、真空蒸鍍法、化學氣相沈積(CVD)法或金屬有機氣相沈積(MOCVD)法等。
(Shield)
The shielding layer 220 is only required to have conductivity, and may be formed of, for example, a metal thin film, a conductive filler, a metal vapor-deposited film, or the like. The metal thin film may be formed of any one of nickel, copper, silver, tin, gold, palladium, aluminum, chromium, titanium, zinc, or the like, or an alloy containing two or more types. The metal thin film can be produced by, for example, using a metal foil or depositing a metal by an addition method. The addition method may be, for example, an electroplating method, an electroless plating method, a sputtering method, an electron beam evaporation method, a vacuum evaporation method, a chemical vapor deposition (CVD) method, or a metal organic vapor deposition (MOCVD) method.

當屏蔽層220由導電性填料構成時,例如可使用金屬填料、被覆金屬的樹脂填料、碳填料及該等之混合物等。金屬填料例如包括:銅粉、銀粉、鎳粉、銀包銅粉、金包銅粉、銀包鎳粉或金包鎳粉等,該等金屬粉可藉由電解法、霧化法、還原法來作成。金屬粉之形狀可列舉如:球狀、小片狀、纖維狀或樹枝狀等。又,亦可設為金屬奈米粒子。金屬奈米粒子例如可舉銀奈米粒子或金奈米粒子等。When the shielding layer 220 is made of a conductive filler, for example, a metal filler, a metal-coated resin filler, a carbon filler, or a mixture thereof can be used. Metal fillers include, for example: copper powder, silver powder, nickel powder, silver-coated copper powder, gold-coated copper powder, silver-coated nickel powder, or gold-coated nickel powder, etc. These metal powders can be processed by electrolytic method, atomization method, and reduction method. To make. Examples of the shape of the metal powder include a spherical shape, a small plate shape, a fibrous shape, and a dendritic shape. Moreover, it can also be set as a metal nanoparticle. Examples of the metal nano particles include silver nano particles and gold nano particles.

屏蔽層220之金屬材料及厚度可依照所要求之電磁屏蔽效應及反覆撓曲、滑動耐性適當地選擇,厚度可設為0.1μm~12μm左右。The metal material and thickness of the shielding layer 220 can be appropriately selected according to the required electromagnetic shielding effect and repeated flexure and sliding resistance, and the thickness can be set to about 0.1 μm to 12 μm.

另,亦可作成不具屏蔽層220而是使本實施形態之導電性接著劑層100發揮作為屏蔽層之機能的電磁波屏蔽膜200。In addition, an electromagnetic wave shielding film 200 may be prepared in which the conductive adhesive layer 100 of the present embodiment does not have the shielding layer 220 and functions as a shielding layer.

<電磁波屏蔽膜之形成方法>
其次,說明形成本實施形態之電磁波屏蔽膜200的方法。首先,利用一般所用之方法,於支持膜(未圖示)上依序形成絕緣保護層210、視需要之屏蔽層220,藉此製得積層體。支持膜可使用與上述基層130相同的樹脂製片或膜。又,支持膜亦可使用其表面具有微細圖案的支持體膜(轉印膜)。此時,藉由將微細圖案轉印於絕緣保護層210之表面,可將絕緣保護層210之表面性狀作成預定狀態。
< Method of forming electromagnetic wave shielding film >
Next, a method of forming the electromagnetic wave shielding film 200 of this embodiment will be described. First, a generally used method is used to sequentially form an insulating protection layer 210 and an optional shielding layer 220 on a supporting film (not shown), thereby preparing a laminated body. As the supporting film, the same resin sheet or film as the base layer 130 can be used. As the support film, a support film (transfer film) having a fine pattern on its surface may be used. At this time, by transferring a fine pattern on the surface of the insulating protective layer 210, the surface properties of the insulating protective layer 210 can be made into a predetermined state.

接著,將經前述所形成之積層體作為基層,且於該基層上,以與上述導電性接著劑層100之形成方法相同之方式形成本實施形態之導電性接著劑層100,藉此,可製得本實施形態之電磁波屏蔽膜200。Next, the laminated body formed as described above is used as a base layer, and the conductive adhesive layer 100 of this embodiment is formed on the base layer in the same manner as the method for forming the conductive adhesive layer 100 described above. The electromagnetic wave shielding film 200 of this embodiment is obtained.

如以上所說明,本揭示發明之電磁波屏蔽膜200具有本揭示發明之導電性接著劑層100作為導電性接著劑層,因此,對被接著體的暫時定位步驟後的密著性優異,可防止暫時定位步驟後的導電性接著劑層100、亦即電磁波屏蔽膜200之錯位。故,本揭示發明之電磁波屏蔽膜200可作成一導通導電性接著劑層100與印刷配線基板之接地電路而使導電性接著劑層100發揮屏蔽電磁波之機能的屏蔽配線基板。As described above, the electromagnetic wave shielding film 200 of the present disclosure has the conductive adhesive layer 100 of the present disclosure as a conductive adhesive layer, and therefore, it has excellent adhesion after the temporary positioning step for the adherend, and can prevent The conductive adhesive layer 100 after the temporary positioning step, that is, the dislocation of the electromagnetic wave shielding film 200. Therefore, the electromagnetic wave shielding film 200 of the present disclosure can be used as a shielded wiring substrate that conducts the grounding circuit between the conductive adhesive layer 100 and the printed wiring board, and causes the conductive adhesive layer 100 to function as a shield for electromagnetic waves.

<屏蔽配線基板>
如圖4所示,本實施形態之屏蔽配線基板400具有:印刷配線基板300,其具有接地電路320a;及本實施形態之電磁波屏蔽膜200,其以與接地電路320a導通之方式接著於印刷配線基板300。另,電磁波屏蔽膜200亦可具有屏蔽層220。
<Shielded wiring board>
As shown in FIG. 4, a shielded wiring substrate 400 according to this embodiment includes a printed wiring board 300 having a ground circuit 320a; and an electromagnetic wave shielding film 200 according to this embodiment, which is connected to the printed circuit in a manner of conducting with the ground circuit 320a Substrate 300. The electromagnetic wave shielding film 200 may include a shielding layer 220.

印刷配線基板300例如具有:基底層310;印刷電路320,其包含形成於基底層310上的接地電路320a與信號電路320b;及絕緣層330,其以露出接地電路320a之至少一部分之方式覆蓋基底層310。另,印刷配線基板300可為撓性基板,亦可為剛性基板。The printed wiring board 300 includes, for example, a base layer 310; a printed circuit 320 including a ground circuit 320a and a signal circuit 320b formed on the base layer 310; and an insulating layer 330 that covers the substrate so as to expose at least a part of the ground circuit 320a. Layer 310. The printed wiring board 300 may be a flexible substrate or a rigid substrate.

基底層310及絕緣層330可為任意者,例如可設為樹脂膜等。此時,可藉由聚丙烯、交聯聚乙烯、聚酯、聚苯并咪唑、聚醯亞胺、聚醯亞胺醯胺、聚醚醯亞胺或聚伸苯硫等樹脂來形成。印刷電路320例如可作成形成於基底層310上的銅配線圖案等。Any of the base layer 310 and the insulating layer 330 may be used, and for example, a resin film or the like may be used. At this time, it can be formed from resins such as polypropylene, cross-linked polyethylene, polyester, polybenzimidazole, polyimide, polyimide, imide, polyetherimide, or polyphenylene sulfide. The printed circuit 320 can be, for example, a copper wiring pattern formed on the base layer 310.

在將本實施形態之電磁波屏蔽膜200接著於印刷配線基板300時,係以與接地電路320a導通之方式配置電磁波屏蔽膜200。具體而言,將電磁波屏蔽膜200之導電性接著劑層100配置於接地電路320a上。又,藉由2片已加熱至預定溫度(例如120℃)的加熱板(未圖示),自上下方向夾持電磁波屏蔽膜200與印刷配線基板300,並以預定壓力(例如0.5MPa)短時間(例如5秒鐘)按壓。藉此,電磁波屏蔽膜200可暫時定位固定於印刷配線基板300。When the electromagnetic wave shielding film 200 of this embodiment is attached to the printed wiring board 300, the electromagnetic wave shielding film 200 is arranged so as to be in conduction with the ground circuit 320a. Specifically, the conductive adhesive layer 100 of the electromagnetic wave shielding film 200 is disposed on the ground circuit 320a. In addition, the electromagnetic wave shielding film 200 and the printed wiring board 300 are sandwiched from above and below by two heating plates (not shown) that have been heated to a predetermined temperature (for example, 120 ° C), and are shorted at a predetermined pressure (for example, 0.5 MPa). Time (for example, 5 seconds) to press. Thereby, the electromagnetic wave shielding film 200 can be temporarily positioned and fixed to the printed wiring board 300.

此時,本實施形態之屏蔽配線基板400由於印刷配線基板300與本實施形態之電磁波屏蔽膜200是透過本實施形態之導電性接著劑層100接著,因此,對印刷配線基板300(被接著體)的暫時定位步驟後的密著性優異,可防止暫時定位步驟後的電磁波屏蔽膜200之錯位。故,呈現電磁波屏蔽膜200已暫時定位固定於印刷配線基板300之狀態的屏蔽配線基板400在進行最終固定之前,例如可重疊屏蔽配線基板400彼此來進行保管。At this time, since the shielded wiring substrate 400 of this embodiment is bonded to the printed wiring substrate 300 and the electromagnetic wave shielding film 200 of this embodiment through the conductive adhesive layer 100 of this embodiment, the printed wiring substrate 300 (substrate) ) Is excellent in adhesion after the temporary positioning step, and can prevent misalignment of the electromagnetic wave shielding film 200 after the temporary positioning step. Therefore, the shielded wiring board 400 in a state where the electromagnetic wave shielding film 200 has been temporarily positioned and fixed to the printed wiring board 300 may be stored by overlapping the shielded wiring boards 400 with each other, for example, before final fixing.

接著,將2片加熱板之溫度設為比暫時定位固定時更高溫的預定溫度(例如170℃),並以預定壓力(例如3MPa)加壓預定時間(例如30分)。藉此,可將電磁波屏蔽膜200確實地固定於印刷配線基板300。Next, the temperature of the two heating plates is set to a predetermined temperature (for example, 170 ° C.) which is higher than that at the time of temporary positioning and fixing, and is pressurized at a predetermined pressure (for example, 3 MPa) for a predetermined time (for example, 30 minutes). Thereby, the electromagnetic wave shielding film 200 can be reliably fixed to the printed wiring board 300.

<其他實施形態>
本實施形態之導電性接著劑層100並不限用於電磁波屏蔽膜及屏蔽配線基板,舉例言之,於撓性印刷配線基板上黏貼由不鏽鋼等構成的導電性(金屬)補強板時,就可用於該黏貼上。此時,可使導電性(金屬)補強板發揮屏蔽電磁波之機能。
< Other embodiments >
The conductive adhesive layer 100 of this embodiment is not limited to an electromagnetic wave shielding film and a shielded wiring substrate. For example, when a conductive (metal) reinforcing plate made of stainless steel or the like is stuck on a flexible printed wiring substrate, Can be used for this application. In this case, the conductive (metal) reinforcing plate can be used to exhibit the function of shielding electromagnetic waves.

實施例
以下,利用實施例,詳細說明本發明。以下實施例為例示,並非意圖限制本發明。
EXAMPLES Hereinafter, the present invention will be described in detail using examples. The following examples are illustrative and are not intended to limit the invention.

<導電性接著劑之調製步驟>
使預定的黏結劑樹脂溶解於作為溶劑之甲苯或甲基乙基酮中而做成預定的固體成分濃度,以調製出黏結劑樹脂溶液。於所得黏結劑樹脂溶液中,添加預定導電性填料及視需要之任意成分,並使用行星式攪拌、脫泡裝置混合攪拌,藉此,調製出導電性接著劑。
< Step of preparing conductive adhesive >
A predetermined binder resin is dissolved in toluene or methyl ethyl ketone as a solvent to have a predetermined solid content concentration to prepare a binder resin solution. A predetermined conductive filler and optional components are added to the obtained binder resin solution, and the mixture is stirred using a planetary stirring and defoaming device to prepare a conductive adhesive.

<電磁波屏蔽膜之製作>
使用厚度為60μm且已於表面施行脫模處理的PET膜作為支持膜。於支持膜上,塗佈含有二氧化矽粒子、雙酚A型環氧系樹脂及甲基乙基酮的保護層用組成物(固體成分量30質量%),並進行加熱乾燥,藉此形成絕緣保護層。其次,於絕緣保護層之表面形成厚度為0.5μm的銅箔作為屏蔽層,藉此製得積層體(基層)。接著,於所得積層體之屏蔽層表面,塗佈經前述調製出的導電性接著劑且進行乾燥而形成預定厚度之導電性接著劑層,藉此製得電磁波屏蔽膜。
< Production of electromagnetic shielding film >
As a support film, a PET film having a thickness of 60 μm and having been subjected to a mold release treatment was used. On the support film, a composition for a protective layer (solid content: 30% by mass) containing silicon dioxide particles, a bisphenol A epoxy resin, and methyl ethyl ketone was applied and dried by heating. Insulating protective layer. Next, a copper foil having a thickness of 0.5 μm was formed on the surface of the insulating protective layer as a shielding layer, thereby obtaining a laminated body (base layer). Next, the surface of the shielding layer of the obtained laminated body is coated with the conductive adhesive prepared as described above and dried to form a conductive adhesive layer having a predetermined thickness, thereby preparing an electromagnetic wave shielding film.

使用前述所製得之電磁波屏蔽膜,並藉由以下方法,評價導電性接著劑層之厚度、表面性狀及對被接著體的暫時定位步驟後的密著性。The electromagnetic wave shielding film prepared as described above was used to evaluate the thickness, surface properties, and adhesion of the conductive adhesive layer after the temporary positioning step to the adherend by the following methods.

<導電性接著劑層之厚度>
將形成導電性接著劑層後的電磁波屏蔽膜之厚度減去形成導電性接著劑層前的積層體之厚度的值,設為導電性接著劑層之厚度。另,各個厚度是使用測微計[三豐(MITUTOYO)(股)製造,商品名:MDH-25],根據JIS C2151進行測定。
<Thickness of conductive adhesive layer>
The thickness of the electromagnetic wave shielding film after the conductive adhesive layer is formed is subtracted from the thickness of the laminated body before the conductive adhesive layer is formed, and is set to the thickness of the conductive adhesive layer. In addition, each thickness was measured using a micrometer [made by Mitutoyo Co., Ltd., trade name: MDH-25], in accordance with JIS C2151.

<導電性接著劑層之表面性狀>
使用共焦顯微鏡(雷瑟科(Lasertec)公司製造,OPTELICS HYBRID,物鏡20倍),測定導電性接著劑層表面之任意5處。然後,利用數據分析軟體(LMeye7)進行表面之傾斜改正,並根據ISO 25178-6:2010,求取偏斜度Ssk、最大峰高Sp及算術平均Sa。另,S型濾波器之截止波長設為0.0025mm,L型濾波器之截止波長設為0.8mm。又,各數值設為測定5處所得之值的平均值。
<Surface properties of conductive adhesive layer>
Using a confocal microscope (Lasertec Corporation, OPTELICS HYBRID, objective lens 20 times), any five points on the surface of the conductive adhesive layer were measured. Then, use the data analysis software (LMeye7) to correct the tilt of the surface, and obtain the skewness Ssk, the maximum peak height Sp, and the arithmetic mean Sa according to ISO 25178-6: 2010. In addition, the cut-off wavelength of the S-type filter is set to 0.0025 mm, and the cut-off wavelength of the L-type filter is set to 0.8 mm. In addition, each numerical value was made into the average value of the value obtained by measuring 5 places.

<對被接著體的暫時定位步驟後的密著性>
藉由180°剝離試驗,測定導電性接著劑層對被接著體的暫時定位步驟後的密著性。具體而言,首先,利用壓機於溫度:120℃、時間:5秒、壓力:0.5MPa之條件下,將電磁波屏蔽膜之導電性接著劑層與作為被接著體的單面覆銅積層板[尼關(NIKKAN)工業(股)製造,製品名:F30VC1 25RC1 1/2(H)]之聚醯亞胺面暫時定位固定,藉此,製得試驗用試料。
<Adhesion after the temporary positioning step for the adherend>
The 180 ° peel test was used to measure the adhesion of the conductive adhesive layer to the adherend after the temporary positioning step. Specifically, first, a conductive adhesive layer of an electromagnetic wave shielding film and a single-sided copper-clad laminated board as an adherend were formed using a press under conditions of temperature: 120 ° C, time: 5 seconds, and pressure: 0.5 MPa. The polyimide surface of [NIKKAN Industry Co., Ltd., product name: F30VC1 25RC1 1/2 (H)] was temporarily positioned and fixed, thereby preparing a test sample.

其次,利用拉伸試驗機[島津製作所(股)製造,商品名:AGS-X50S],於室溫下朝剝離角度:180°方向以拉伸速度:50mm/分將前述所製得之試驗用試料自單面覆銅積層板側剝下,並測定其斷裂時的180°剝離強度(最大值),且根據以下評價基準,評價對被接著體的暫時定位步驟後的密著性。Next, a tensile tester [manufactured by Shimadzu Corporation, trade name: AGS-X50S] was used, at room temperature, at a peeling angle: 180 ° and at a tensile speed: 50 mm / min. The sample was peeled from the single-sided copper-clad laminated board side, and the 180 ° peel strength (maximum value) at the time of breaking was measured, and the adhesion after the temporary positioning step for the adherend was evaluated based on the following evaluation criteria.

(評價基準)
○:即使180°剝離強度為0.5N/cm,於導電性接著劑層與被接著體的界面亦未發生剝離(暫時定位步驟後導電性接著劑層與被接著體的180°剝離強度為0.5N/cm以上)。
×:180°剝離強度小於0.5N/cm,且於導電性接著劑層與被接著體的界面發生剝離。
(Evaluation criteria)
○: Even if the 180 ° peel strength is 0.5 N / cm, no peeling occurs at the interface between the conductive adhesive layer and the adherend (the 180 ° peel strength of the conductive adhesive layer and the adherend after the temporary positioning step is 0.5 N / cm or more).
×: The 180 ° peel strength is less than 0.5 N / cm, and peeling occurs at the interface between the conductive adhesive layer and the adherend.

(實施例1)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為12μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為10質量%。
(Example 1)
The binder resin is an epoxy resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 12 μm and a dendritic shape. The content of the conductive filler in the conductive adhesive is set to 10% by mass.

於實施例1中製得的導電性接著劑層(各向異性)其厚度為17μm,且其表面之偏斜度Ssk為1.10、最大峰高Sp為11.87以及算術平均Sa為2.30。The conductive adhesive layer (anisotropic) prepared in Example 1 had a thickness of 17 μm, a surface skewness Ssk of 1.10, a maximum peak height Sp of 11.87, and an arithmetic average Sa of 2.30.

又,於實施例1中製得的導電性接著劑層即使在180°剝離強度為3.23N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 1 did not peel off at the interface with the adherend even at a 180 ° peel strength of 3.23 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例2)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為5μm且形狀為球狀及橢圓狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為30質量%。
(Example 2)
The binder resin is an epoxy resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 5 μm and a spherical and oval shape. The content of the conductive filler in the conductive adhesive is set to 30% by mass.

於實施例2中製得的導電性接著劑層(各向異性)其厚度為5μm,且其表面之偏斜度Ssk為1.50、最大峰高Sp為9.38以及算術平均Sa為0.55。The conductive adhesive layer (anisotropic) prepared in Example 2 had a thickness of 5 μm, a surface skewness Ssk of 1.50, a maximum peak height Sp of 9.38, and an arithmetic average Sa of 0.55.

又,於實施例2中製得的導電性接著劑層即使在180°剝離強度為5.74N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 2 did not peel off at the interface with the adherend even at a 180 ° peel strength of 5.74 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例3)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為12μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為15質量%。
(Example 3)
The binder resin is an epoxy resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 12 μm and a dendritic shape. The content of the conductive filler in the conductive adhesive is set to 15% by mass.

於實施例3中製得的導電性接著劑層(各向異性)其厚度為15μm,且其表面之偏斜度Ssk為2.31、最大峰高Sp為12.05以及算術平均Sa為1.40。The conductive adhesive layer (anisotropic) prepared in Example 3 had a thickness of 15 μm, a surface skewness Ssk of 2.31, a maximum peak height Sp of 12.05, and an arithmetic mean Sa of 1.40.

又,於實施例3中製得的導電性接著劑層即使在180°剝離強度為2.91N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 3 did not peel off at the interface with the adherend even at a 180 ° peel strength of 2.91 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例4)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為6μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為65質量%。
(Example 4)
As the binder resin, an epoxy-based resin is used, and as the conductive filler, a silver-clad copper powder having an average particle diameter D50 of 6 μm and a dendritic shape is used. The content of the conductive filler in the conductive adhesive was set to 65% by mass.

於實施例4中製得的導電性接著劑層(各向同性)其厚度為15μm,且其表面之偏斜度Ssk為-0.31、最大峰高Sp為1.67以及算術平均Sa為0.17。The conductive adhesive layer (isotropic) prepared in Example 4 had a thickness of 15 μm, a surface skewness Ssk of −0.31, a maximum peak height Sp of 1.67, and an arithmetic average Sa of 0.17.

又,於實施例4中製得的導電性接著劑層即使在180°剝離強度為4.50N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 4 did not peel off at the interface with the adherend even at a 180 ° peel strength of 4.50 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例5)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為6μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為70質量%。
(Example 5)
As the binder resin, an epoxy-based resin is used, and as the conductive filler, a silver-clad copper powder having an average particle diameter D50 of 6 μm and a dendritic shape is used. The content of the conductive filler in the conductive adhesive is set to 70% by mass.

於實施例5中製得的導電性接著劑層(各向同性)其厚度為15μm,且其表面之偏斜度Ssk為-2.47、最大峰高Sp為1.66以及算術平均Sa為0.15。The conductive adhesive layer (isotropic) prepared in Example 5 had a thickness of 15 μm, a surface skewness Ssk of −2.47, a maximum peak height Sp of 1.66, and an arithmetic average Sa of 0.15.

又,於實施例5中製得的導電性接著劑層即使在180°剝離強度為1.93N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 5 did not peel off at the interface with the adherend even at a 180 ° peel strength of 1.93 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例6)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為15μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為70質量%。
(Example 6)
The binder resin is an epoxy resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 15 μm and a dendritic shape. The content of the conductive filler in the conductive adhesive is set to 70% by mass.

於實施例6中製得的導電性接著劑層(各向同性)其厚度為60μm,且其表面之偏斜度Ssk為-0.18、最大峰高Sp為11.21以及算術平均Sa為2.82。The conductive adhesive layer (isotropic) prepared in Example 6 had a thickness of 60 μm, a surface skewness Ssk of −0.18, a maximum peak height Sp of 11.21, and an arithmetic average Sa of 2.82.

又,於實施例6中製得的導電性接著劑層雖於與被接著體間的界面發生剝離,但其斷裂時的180°剝離強度為0.5N/cm以上的1.03N/cm(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性良好。In addition, although the conductive adhesive layer prepared in Example 6 was peeled off at the interface with the adherend, the 180 ° peel strength at the time of breaking was 1.03 N / cm of 0.5 N / cm or more (evaluation result) :)). Therefore, the adhesion after the temporary positioning step for the adherend is good.

(實施例7)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為8μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為60質量%。
(Example 7)
The binder resin is an epoxy-based resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 8 μm and a dendritic shape. The content of the conductive filler in the conductive adhesive is 60% by mass.

於實施例7中製得的導電性接著劑層(各向同性)其厚度為15μm,且其表面之偏斜度Ssk為-2.83、最大峰高Sp為3.94以及算術平均Sa為1.25。The conductive adhesive layer (isotropic) prepared in Example 7 had a thickness of 15 μm, a surface skewness Ssk of −2.83, a maximum peak height Sp of 3.94, and an arithmetic average Sa of 1.25.

又,於實施例7中製得的導電性接著劑層即使在180°剝離強度為1.85N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 7 did not peel off at the interface with the adherend even at a 180 ° peel strength of 1.85 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例8)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為12μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為70質量%。
(Example 8)
The binder resin is an epoxy resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 12 μm and a dendritic shape. The content of the conductive filler in the conductive adhesive is set to 70% by mass.

於實施例8中製得的導電性接著劑層(各向同性)其厚度為60μm,且其表面之偏斜度Ssk為-0.55、最大峰高Sp為17.27以及算術平均Sa為5.26。The conductive adhesive layer (isotropic) prepared in Example 8 had a thickness of 60 μm, a surface skewness Ssk of −0.55, a maximum peak height Sp of 17.27, and an arithmetic average Sa of 5.26.

又,於實施例8中製得的導電性接著劑層即使在180°剝離強度為4.23N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 8 did not peel off at the interface with the adherend even at a 180 ° peel strength of 4.23 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例9)
黏結劑樹脂使用含有平均粒徑D50為22μm之二氧化矽粒子1質量%的環氧系樹脂,導電性填料則使用平均粒徑D50為12μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為15質量%。
(Example 9)
As the binder resin, an epoxy resin containing 1% by mass of silica particles having an average particle diameter D50 of 22 μm was used, and as the conductive filler, a copper-clad silver powder having an average particle diameter D50 of 12 μm and having a dendritic shape was used. The content of the conductive filler in the conductive adhesive is set to 15% by mass.

於實施例9中製得的導電性接著劑層(各向異性)其厚度為36μm,且其表面之偏斜度Ssk為1.36、最大峰高Sp為16.37以及算術平均Sa為2.15。The conductive adhesive layer (anisotropic) prepared in Example 9 had a thickness of 36 μm, a surface skewness Ssk of 1.36, a maximum peak height Sp of 16.37, and an arithmetic average Sa of 2.15.

又,於實施例9中製得的導電性接著劑層即使在180°剝離強度為4.28N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 9 did not peel off at the interface with the adherend even at a 180 ° peel strength of 4.28 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(實施例10)
黏結劑樹脂使用含有平均粒徑D50為22μm之二氧化矽粒子2質量%的環氧系樹脂,導電性填料則使用平均粒徑D50為12μm且形狀為枝晶狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為15質量%。
(Example 10)
As the binder resin, an epoxy resin containing 2% by mass of silica particles having an average particle diameter D50 of 22 μm was used, and as the conductive filler, a silver-clad copper powder having an average particle diameter D50 of 12 μm and having a dendritic shape was used. The content of the conductive filler in the conductive adhesive is set to 15% by mass.

於實施例10中製得的導電性接著劑層(各向異性)其厚度為40μm,且其表面之偏斜度Ssk為1.65、最大峰高Sp為22.94以及算術平均Sa為2.44。The conductive adhesive layer (anisotropic) prepared in Example 10 had a thickness of 40 μm, a surface skewness Ssk of 1.65, a maximum peak height Sp of 22.94, and an arithmetic average Sa of 2.44.

又,於實施例10中製得的導電性接著劑層即使在180°剝離強度為4.51N/cm下,其與被接著體間的界面亦未發生剝離(評價結果:○),因此,對被接著體的暫時定位步驟後的密著性非常良好。The conductive adhesive layer prepared in Example 10 did not peel off at the interface with the adherend even at a 180 ° peel strength of 4.51 N / cm (evaluation result: ○). The adhesion after the temporary positioning step of the adherend is very good.

(比較例1)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為15μm且形狀為球狀及橢圓狀的銀包銅粉。導電性接著劑中導電性填料之含有率設為5質量%。
(Comparative example 1)
The binder resin is an epoxy resin, and the conductive filler is a silver-clad copper powder having an average particle diameter D50 of 15 μm and a spherical and oval shape. The content of the conductive filler in the conductive adhesive is 5% by mass.

於比較例1中製得的導電性接著劑層(各向異性)其厚度為15μm,且其表面之偏斜度Ssk為4.05、最大峰高Sp為17.81以及算術平均Sa為0.98。The conductive adhesive layer (anisotropy) prepared in Comparative Example 1 had a thickness of 15 μm, a surface deflection Ssk of 4.05, a maximum peak height Sp of 17.81, and an arithmetic mean Sa of 0.98.

又,於比較例1中製得的導電性接著劑層在180°剝離強度為小於0.5N/cm的0.01N/cm下,其與被接著體間的界面發生剝離(評價結果:×),因此,對被接著體的暫時定位步驟後的密著性不良。The conductive adhesive layer prepared in Comparative Example 1 was peeled off at the interface with the adherend at a 180 ° peel strength of 0.01 N / cm of less than 0.5 N / cm (evaluation result: ×). Therefore, the adhesion after the temporary positioning step for the adherend is poor.

(比較例2)
黏結劑樹脂使用環氧系樹脂,導電性填料則使用平均粒徑D50為23μm且形狀為橢圓狀的銀包鎳粉。導電性接著劑中導電性填料之含有率設為35質量%。
(Comparative example 2)
As the binder resin, an epoxy-based resin is used, and as the conductive filler, an silver-clad nickel powder having an average particle diameter D50 of 23 μm and an oval shape is used. The content of the conductive filler in the conductive adhesive is 35% by mass.

於比較例2中製得的導電性接著劑層(各向異性)其厚度為30μm,且其表面之偏斜度Ssk為4.01、最大峰高Sp為29.54以及算術平均Sa為1.63。The conductive adhesive layer (anisotropic) prepared in Comparative Example 2 had a thickness of 30 μm, a surface skewness Ssk of 4.01, a maximum peak height Sp of 29.54, and an arithmetic mean Sa of 1.63.

又,於比較例2中製得的導電性接著劑層在180°剝離強度為小於0.5N/cm的0.13N/cm下,其與被接著體間的界面發生剝離(評價結果:×),因此,對被接著體的暫時定位步驟後的密著性不良。The conductive adhesive layer prepared in Comparative Example 2 had peeling at the interface with the adherend at a 180 ° peel strength of 0.13 N / cm of less than 0.5 N / cm (evaluation result: ×). Therefore, the adhesion after the temporary positioning step for the adherend is poor.

表1中顯示各實施例及各比較例所用之導電性填料之組成及導電性接著劑層之物性。Table 1 shows the composition of the conductive fillers used in the examples and comparative examples, and the physical properties of the conductive adhesive layer.

[表1]
[Table 1]

產業上之可利用性
本揭示發明之導電性接著劑層對被接著體的暫時定位步驟後的密著性優異,可防止暫時定位步驟後的導電性接著劑層之錯位,因此是極為有用的。
INDUSTRIAL APPLICABILITY The conductive adhesive layer of the present disclosure has excellent adhesion to the adherend after the temporary positioning step, and can prevent misalignment of the conductive adhesive layer after the temporary positioning step, which is extremely useful. .

100‧‧‧導電性接著劑層100‧‧‧ conductive adhesive layer

100a‧‧‧凸部 100a‧‧‧ convex

100b‧‧‧凹部 100b‧‧‧ recess

110‧‧‧黏結劑樹脂 110‧‧‧Binder Resin

120‧‧‧導電性填料 120‧‧‧ conductive filler

130‧‧‧基層 130‧‧‧ Grassroots

200‧‧‧電磁波屏蔽膜 200‧‧‧ electromagnetic shielding film

210‧‧‧絕緣保護層 210‧‧‧Insulation protective layer

220‧‧‧屏蔽層 220‧‧‧Shield

300‧‧‧印刷配線基板 300‧‧‧printed wiring board

310‧‧‧基底層 310‧‧‧ basal layer

320‧‧‧印刷電路 320‧‧‧printed circuit

320a‧‧‧接地電路 320a‧‧‧ Ground Circuit

320b‧‧‧信號電路 320b‧‧‧Signal Circuit

330‧‧‧絕緣層 330‧‧‧ Insulation

400‧‧‧屏蔽配線基板 400‧‧‧shielded wiring substrate

圖1為顯示形成於基層上的導電性接著劑層之一實施形態的截面圖。FIG. 1 is a cross-sectional view showing an embodiment of a conductive adhesive layer formed on a base layer.

圖2為一實施形態之電磁波屏蔽膜之截面圖。 Fig. 2 is a sectional view of an electromagnetic wave shielding film according to an embodiment.

圖3為顯示電磁波屏蔽膜之其他實施形態的截面圖。 FIG. 3 is a sectional view showing another embodiment of the electromagnetic wave shielding film.

圖4為一實施形態之屏蔽配線基板之截面圖。 FIG. 4 is a cross-sectional view of a shielded wiring substrate according to an embodiment.

Claims (5)

一種導電性接著劑層,其特徵在於由含有黏結劑樹脂與導電性填料的導電性接著劑構成,並且表面之偏斜度Ssk為-3.5以上且2.7以下。A conductive adhesive layer, which is composed of a conductive adhesive containing a binder resin and a conductive filler, and has a surface skewness Ssk of -3.5 or more and 2.7 or less. 如請求項1之導電性接著劑層,其中表面之最大峰高Sp為1.3μm以上且30μm以下。For example, in the conductive adhesive layer of claim 1, the maximum peak height Sp of the surface is 1.3 μm or more and 30 μm or less. 如請求項1或2之導電性接著劑層,其中前述導電性填料之平均粒徑D50為3μm以上且20μm以下,並且其於前述導電性接著劑中的含有率為10質量%以上且80質量%以下。The conductive adhesive layer according to claim 1 or 2, wherein the average particle diameter D50 of the conductive filler is 3 μm or more and 20 μm or less, and its content in the conductive adhesive is 10% by mass or more and 80% by mass %the following. 一種電磁波屏蔽膜,其特徵在於具備: 絕緣保護層;及 如請求項1至3中任一項之導電性接著劑層,其設置於該絕緣保護層之表面。An electromagnetic wave shielding film, comprising: Insulation protection; and The conductive adhesive layer according to any one of claims 1 to 3 is provided on the surface of the insulating protective layer. 一種屏蔽配線基板,其特徵在於具備: 印刷配線基板,其設置有接地電路;及 如請求項4之電磁波屏蔽膜,其以與前述接地電路導通之方式接著於前述印刷配線基板。A shielded wiring substrate, comprising: A printed wiring board provided with a ground circuit; and The electromagnetic wave shielding film according to claim 4, which is connected to the printed wiring board in a manner to be conducted to the ground circuit.
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