TW201933497A - 接合機用接合工具、半導體元件接合用接合機及相關方法 - Google Patents
接合機用接合工具、半導體元件接合用接合機及相關方法 Download PDFInfo
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- TW201933497A TW201933497A TW108102099A TW108102099A TW201933497A TW 201933497 A TW201933497 A TW 201933497A TW 108102099 A TW108102099 A TW 108102099A TW 108102099 A TW108102099 A TW 108102099A TW 201933497 A TW201933497 A TW 201933497A
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
- B23K1/0016—Brazing of electronic components
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/008—Soldering within a furnace
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- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/08—Auxiliary devices therefor
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Abstract
本發明提供一種用於在接合機上將半導體元件接合到基板的接合工具。所述接合工具包括一本體部,所述本體部包括用於在接合機上的接合製程期間接觸半導體元件的接觸區域。所述接合工具還包括從本體部延伸的支座,並且該支座配置為在接合製程的至少一部分期間接觸基板。
Description
本發明涉及半導體封裝的形成,並且更具體地,涉及用於與半導體元件接合用接合機結合使用的改良的接合工具。
在半導體封裝工業的某些態樣中,半導體元件被接合到接合位置。例如,在傳統的晶粒附接(也稱為晶粒接合)應用中,半導體晶粒被接合到基板的接合位置(例如,導線架、堆疊晶粒應用中的另一晶粒、間隔物等)。在先進的封裝應用中,半導體元件(例如,裸半導體晶粒、封裝的半導體晶粒等)被接合到基板的接合位置(例如,導線架、PCB、載體、半導體晶圓、BGA基板、另一半導體元件等)具有導電結構(例如,導電凸塊、接觸墊、焊料凸塊、導電柱、銅柱等),用於提供半導體元件和基板之間的電連接。
在熱壓接合的某些應用中,在熱壓接合操作完成之後,在半導體元件和基板之間的區域中施加材料(例如,底部填充材料)。遺憾的是,所述區域可能變化(例如,就體積而言,例如,由於裝置變化(例如,基板上的焊料遮罩層的厚度的變化))。
因此,期望提供改良的接合工具、包括這種接合工具的接合機以及相關方法。
根據本發明的示例性實施方式,提供一種用於在接合機上將半導體元件接合到基板的接合工具。所述接合工具包括本體部,所述本體部包括用於在接合機上的接合製程期間接觸半導體元件的接觸區域。所述接合工具還包括從本體部延伸的支座,並且所述支座配置為在接合製程的至少一部分期間接觸基板。
根據本發明的另一示例性實施方式,提供一種用於將半導體元件接合到基板的接合機。所述接合機包括接合工具。所述接合工具包括:(a)一本體部,包含用於在接合機上的接合製程期間接觸半導體元件的接觸區域;以及(b)一支座,從所述本體部延伸,並配置成在所述接合製程的至少一部分期間接觸所述基板。所述接合機還包括用於支撐基板的支撐結構。
根據本發明的又一示例性實施方式,提供一種操作接合機的方法。所述方法包括:(a)以一接合工具承載一半導體元件;(b)開始所述半導體元件的導電結構與一基板的相應導電結構之間的接觸;(c)在步驟(b)之後降低所述接合工具,使得所述接合工具的一支座接觸所述基板的一上表面;以及(d)在步驟(c)之後升高所述接合工具。
根據本發明的又一示例性實施方式,提供一種操作接合機的方法。所述方法包括:(a)以一接合工具承載一半導體元件;(b)開始所述半導體元件與一基板上的黏合材料之間的接觸;以及(c)在步驟(b)之後降低所述接合工具,使得所述接合工具的一支座接觸所述基板的上表面。
如在此所使用,術語「半導體元件」旨在表示包括(或配置為包括在後面的步驟中)半導體晶片或晶粒的任何結構。示例性半導體元件包括裸半導體晶粒、基板上的半導體晶粒(例如,導線架、PCB、載體、半導體晶片、半導體晶圓、BGA基板、半導體元件等)、封裝的半導體裝置、倒裝的晶片半導體裝置、嵌入基板中的晶粒、半導體晶粒的堆疊等。此外,半導體元件可包括配置為接合或以其他方式包括在半導體封裝中的元件(例如,以堆疊晶粒配置接合的間隔物、基板等)。
如本文所使用,術語「基板」旨在表示半導體元件可以接合(例如,熱壓接合、超音波接合、熱音波接合、晶粒接合等)到的任何結構。示例性基板包括:例如,導線架、PCB、載體、半導體晶片、半導體晶圓、BGA基板、半導體元件等。根據本發明的某些示例性態樣,支座(包括在接合工具中)在接合製程的至少一部分期間可接觸基板:應當理解,支座(或支座的任何延伸部)可接觸基板的任何部分(或基板的任何延伸部)。
根據本發明的示例性態樣,提供用於接合機的接合工具(例如,放置工具),諸如:熱壓接合機(TCB)、倒裝晶片接合機等。例如,這種接合工具可附接到加熱器(例如,脈衝加熱器)或與加熱器(例如,脈衝加熱器)結合,以加熱與熱壓接合操作相關的半導體元件。在本發明的其他實施方式中,提供用於晶粒附接機或其他接合機的接合工具。
與熱壓接合製程有關,接合工具將半導體元件(例如,半導體晶粒、插入物等)放置在基板上,並將半導體元件接合到基板(例如,半導體晶片、晶圓等)。配置成接收半導體元件的基板為半導體元件提供機械支撐,但也可提供與半導體元件的電連接(通過基板和半導體元件中的每一個上的相應導電結構)。例如,半導體元件到基板的倒裝晶片接合可包括通過在放置的半導體元件上原位熔化並重新固化焊料凸塊。在特定示例中,可例如通過蝕刻層壓到非導電材料上的銅片來形成基板上的導電結構。
經常,基板包括頂部的焊料遮罩層,其具有在焊點形成期間約束焊料位置的開口。在實務中,焊料遮罩層厚度在相同基板上從一個位置到另一個位置變化,並且在不同的生產批次中從一批到另一批變化。在將一個或複數個半導體元件熱壓接合到基板之後,該接合的基板可通過清潔製程和封裝化合物模製製程。
關於某些接合機(例如,倒裝晶片接合機、TCB機等)的操作,可以界定「支座高度」。例如,支座高度(SOH)可以指:(a)被接合的半導體元件的頂表面和(b)基板的上表面(在基板包括焊料遮罩層的實施例中,可以是焊料遮罩層的上表面)之間的距離。圖1提供支座高度的示例性圖示。支座高度(SOH)的一致性可顯著影響模製一致性。遺憾的是,由於基板上的焊料遮蔽厚度的變化,至少部分地可能難以在各裝置之間維持支座高度。
本發明的各態樣涉及接合/放置工具(和相關的接合機)、以及操作接合機的方法,以補償諸如焊料遮蔽變化的問題,從而提供更一致的支座高度。在本發明的具體示例中,接合/放置工具包括一個或複數個支座(例如,從工具的接觸表面延伸),其可用於在熱壓接合期間檢測焊料遮罩層。使用這種方法,可以使從半導體元件到基板的上表面的最終距離(例如,支座高度)更加一致。
在接合/放置工具上提供的「支座」可以例如是柱、複數個柱、壁、複數個壁以及其他結構。
接合工具可以是加熱的工具,其中,加熱器和所述工具集成在一個部件中。在其他示例中,可以提供與接合工具分開的加熱器。在其他示例中,可以利用非加熱的接合工具。根據本發明的接合工具可以界定一個或複數個真空路徑,以提供用於保持半導體元件的真空。
根據本發明的接合工具可以與接合機(例如,熱壓接合機(TCB機)、倒裝晶片接合機、傳統的晶粒附接機等)結合使用。關於熱壓接合機,接合工具可以是指可附接到脈衝加熱器(在加熱器與工具分開的實施方式中)上或與所述脈衝加熱器集成的部件。依據應用,接合工具有時可被稱為夾頭、晶粒夾頭、安置工具、放置工具等。
在TCB製程中,接合工具經常通過在放置的半導體元件上原位熔化並重新固化焊料凸塊將半導體元件(例如,晶粒或插入物)放置並接合到基板(例如,任何類型的基板,諸如晶片、晶圓等)。經常僅從半導體元件側施加熱量,而基板經常保持在低階段溫度,與質量回流中的等溫加熱相反。
在各個附圖中,相同的元件符號表示相同的元件。
現在參考附圖,圖1顯示接合機100(例如,熱壓接合機、倒裝晶片接合機等)。接合機100包括承載接合工具102a的接合頭組件102。接合工具102a可以例如使用高導熱率材料(諸如氮化鋁陶瓷材料)形成。當然,可以考慮其他材料用於接合工具102a(以及本發明範圍內的其他工具)。接合工具102a包括承載(例如,使用真空等)半導體元件104的本體部102a1。接合工具102a包括用於在接合製程期間接觸半導體元件104的接觸表面102a2。接合工具102a還包括支座102a3(例如,柱或類似物)。半導體元件104包括導電結構104a(例如,配置為用於焊料互連的Sn接點)。
接合機100還包括支撐結構108(例如,卡盤或類似物)(其中,由機器基座110承載支撐結構108)。由支撐結構108支撐基板106,並且包括導電結構106b,所述導電結構配置為用於連接(例如,焊料互連)到相應的導電結構104a。焊料遮罩層106a設置在基板106的上表面上。支座高度(SOH)顯示為半導體元件104的上表面和焊料遮罩層106a的上表面之間的距離/高度(當然,在圖1中,SOH顯示為具有位於上方的半導體元件104,並且未接合到基板106 ,並且還可以在如圖3E所示的接合位置測量SOH)。
圖2顯示與圖1中的接合機100非常相似的接合機100'。在圖1和圖2之間,相同的元件符號表示相同(或類似)的元件。與接合工具102a(顯示在圖1中,其包括單一個支座102a3)相比,接合工具102a'(在圖2中,包括在接合機100'的接合頭組件102'中)包括複數個支座102a3(在圖2所示的示例中,提供了兩個支座102a3)。根據給定的應用中的需要,可提供任何數量的支座。此外,支座可具有任何所需的配置,諸如柱、壁等。這些變化(例如,諸如柱或壁等的支座的數量、支柱的類型)可適用於本發明的任何應用,包括但不限於倒裝晶片接合、熱壓接合和晶粒附接製程。
圖3A-3E顯示圖1的接合機100的接合操作(為了簡化而移除了某些元件),具有單一個支座102a3,但是也適用於具有複數個支座102a3的實施方式(諸如圖2中所示)。在圖3A,接合工具102a朝向基板106移動並接近所述基板(如向下箭頭所示)。圖3B顯示兩者之間的開始接觸:(i)半導體元件104的導電結構104a與(ii)基板106的相應導電結構106b。所述開始接觸可以使用諸如接合力檢測(例如,接合力中的改變)、位置檢測(例如,使用z軸位置測量/檢測系統)、速度檢測以及其他技術的多種方法中的任何一種來檢測(及/或披露)。圖3C顯示焊料熔化等,使得成對的導電結構104a/106b已經開始改變形式。在圖3D處,支座102a3已經與基板106的焊料遮罩層106a接觸。所述接觸可以使用諸如接合力檢測(例如,接合力中的改變)、位置檢測(例如,使用z軸位置測量/檢測系統)、速度檢測以及其他技術的多種方法中的任何一種來檢測(及/或披露)。在檢測到所述接觸之後,可以將接合工具102a以預定距離升高(使得建立「最終」SOH,參見圖3E),然後成對的改變的(例如,熔化的)導電結構104a/106b將在這個位置中固化。隨著圖3E,可以在半導體元件104和基板106之間的間隙中添加底部填充材料,然後進行封裝。
本發明的各態樣也適用於晶粒附接工具、晶粒附接設備和晶粒附接製程。在這些應用中,可能希望在關於晶粒背面和基板之間的黏合劑(諸如環氧樹脂層)的厚度具有相對一致性。該厚度有時稱為「接合線厚度」(亦即BLT)。
圖4A顯示接合機400(例如,晶粒附接機等)。接合機400包括承載接合工具402a(例如,晶粒附接工具402a)的接合頭組件402。接合工具402a包括承載(例如,使用真空等)半導體元件404(例如,半導體晶粒404)的本體部402a1。接合工具402a包括用於在晶粒附接製程期間接觸半導體元件404的接觸表面402a2。接合工具402a還包括支座402a3(例如,柱或類似物),用於在晶粒附接製程期間控制z-高度/下降。可以包括複數個支座(例如,參見圖2)。
接合機400還包括支撐結構408(例如,卡盤或類似物)(其中,由機器基座410承載支撐結構408)。基板406由支撐結構408支撐,並且包括黏合劑(例如,傳統的晶粒附接黏合劑,諸如環氧黏合劑)。
圖4B顯示已經下降的接合頭組件402,使得接合工具402a隨著在半導體元件404與基板406之間設置有黏合劑406a而將半導體元件404附接到基板406。如圖4B中所示,黏合劑406a通過晶粒附接製程已經展開。支座402a3控制接合頭組件402(包括接合工具402a)在晶粒附接製程期間下降的高度,從而控制黏合劑406a的擠壓量,從而控制接合線厚度(BLT)。
儘管已經結合具體示例結構和方法顯示並描述了本發明,但是本發明不限於此。例如,本發明的各態様可涉及具有任何期望形狀及/或配置的一個或複數個支座。此外,在與基板接觸時,可以使用這種支座來限定SOH(或BLT或其他標準), 或者可以使用這種支座通過在與基板(例如,參見圖3E)接觸之後移動開預定距離來限定SOH(或BLT或其他標準)。
此外,所述機器可以與本文提供的簡化圖式顯著地改變。例如,本發明範圍內的接合工具也可以是拾取工具(其中,接合工具從諸如晶圓的供應件「拾取」半導體元件,然後將半導體元件放置在基板上)。在其他示例中,接合工具可以通過某種類型的傳遞操作來接收半導體元件(例如,其中,傳遞是從單獨的拾取工具或單獨的傳遞工具等進行的)。
儘管主要通過參考包括一個或複數個結構支座的實施方式來說明和描述本發明,但是本發明不限於此。可以利用不同的及/或另外的技術(非接觸技術)來準確地控制接合製程期間的高度。例如,可以利用雷射系統來檢測接合表面及/或接合工具,以控制最終高度(例如,圖3E中的SOH、圖4B中的BLT高度等)。其他示例性技術包括霍爾效應感測器、接近感測器、位置感測器、運動感測器、速度感測器、電容感測器等。
儘管在此參考特定實施方式說明和描述了本發明,但是本發明並不旨在限於所示的細節。而是,可以在申請專利範圍的均等物的領域和範圍內對細節進行各種修改而不脫離本發明。
《相關申請案的引用》
本發明主張2018年1月24日申請的美國臨時申請案第 62/621,199號的優先權,其內容通過引用結合在本文中。
本發明主張2018年1月24日申請的美國臨時申請案第 62/621,199號的優先權,其內容通過引用結合在本文中。
100‧‧‧接合機
100'‧‧‧接合機
102‧‧‧接合頭組件
102 '‧‧‧接合頭組件
102a‧‧‧接合工具
102a'‧‧‧接合工具
102a1‧‧‧本體部
102a2‧‧‧接觸表面
102a3‧‧‧支座
104‧‧‧半導體元件
104a‧‧‧導電結構
106‧‧‧基板
106a‧‧‧焊料遮罩層
106b‧‧‧導電結構
108‧‧‧支撐結構
110‧‧‧機器基座
400‧‧‧接合機
402‧‧‧接合頭組件
402a‧‧‧接合工具(晶粒附接工具)
402a1‧‧‧本體部
402a2‧‧‧接觸表面
402a3‧‧‧支座
404‧‧‧半導體元件(半導體晶粒)
406‧‧‧基板
406a‧‧‧黏合劑
408‧‧‧支撐結構
410‧‧‧機器基座
SOH‧‧‧支座高度
當結合附圖閱讀時,從以下詳細描述中可以最好地理解本發明。需要強調的是,根據慣例,附圖的各種特徵未按比例繪製。相反地,為了清楚起見,各種特徵的尺寸被任意擴大或縮小。附圖中包括以下各圖:
圖1是根據本發明的示例性實施方式的接合機的方塊圖形側視圖;
圖2是根據本發明的示例性實施方式的另一接合機的方塊圖形側視圖;
圖3A-3E是圖1的接合機的元件的方塊圖形側視圖,顯示根據本發明的示例性實施方式的操作接合機的方法;以及
圖4A-4B是晶粒附接機的元件的方塊圖形側視圖,顯示根據本發明示例性實施方式的操作接合機的方法。
Claims (23)
- 一種用於在接合機上將半導體元件接合到基板的接合工具,所述接合工具包括: 一本體部,包含用於在接合機上的接合製程期間接觸半導體元件的接觸區域;以及 一支座,從所述本體部延伸,並配置成在所述接合製程的至少一部分期間接觸所述基板。
- 根據申請專利範圍第1項所述的接合工具,其中,所述接合工具包括複數個所述支座,所述支座從所述本體部延伸,並且配置為在所述接合製程的至少一部分期間接觸所述基板。
- 根據申請專利範圍第1項所述的接合工具,其中,所述支座從所述本體部的接觸區域延伸。
- 根據申請專利範圍第1項所述的接合工具,其中,所述支座耦合到所述本體部。
- 根據申請專利範圍第1項所述的接合工具,其中,所述支座由包括所述本體部的整塊材料形成。
- 根據申請專利範圍第1項所述的接合工具,其中,所述接合製程是熱壓接合製程。
- 根據申請專利範圍第1項所述的接合工具,其中,所述支座配置為在所述接合製程的至少一部分期間接觸所述基板的一焊料遮罩層。
- 根據申請專利範圍第1項所述的接合工具,其中,所述支座是一支柱。
- 根據申請專利範圍第1項所述的接合工具,其中,所述支座是一壁。
- 根據申請專利範圍第1項所述的接合工具,其中,所述半導體元件是一插入物。
- 根據申請專利範圍第1項所述的接合工具,其中,所述接合工具是晶粒附接工具,並且其中,所述接合製程是晶粒附接製程。
- 根據申請專利範圍第11項所述的接合工具,其中,所述支座配置為在所述晶粒附接製程期間控制所述半導體元件與所述基板之間的黏合劑的厚度。
- 一種用於將半導體元件接合到基板的接合機,所述接合機包括: 一接合工具,所述接合工具包括:(a)一本體部,包含用於在所述接合機的接合製程期間接觸所述半導體元件的一接觸區域,以及(b)一支座,從所述本體部延伸,所述支座配置為在接合操作的至少一部分期間接觸所述基板;以及 一支撐結構,用以支撐所述基板。
- 根據申請專利範圍第13項所述的接合機,還包括:用於承載所述接合工具的一接合頭組件。
- 根據申請專利範圍第13項所述的接合機,其中,所述接合工具是用於在所述接合機上在熱壓接合操作中使用的一安置工具。
- 根據申請專利範圍第13項所述的接合機,其中,所述半導體元件是一插入物。
- 根據申請專利範圍第13項所述的接合機,其中,所述接合機是晶粒附接機,並且所述接合工具是晶粒附接工具。
- 一種操作接合機的方法,所述方法包括以下步驟: (a)以一接合工具承載一半導體元件; (b)開始所述半導體元件的導電結構與一基板的相應導電結構之間的接觸; (c)在步驟(b)之後降低所述接合工具,使得所述接合工具的一支座接觸所述基板的一上表面;以及 (d)在步驟(c)之後升高所述接合工具。
- 根據申請專利範圍第18項所述的方法,其中,步驟(c)包括:以所述支座接觸所述基板的一焊料遮罩層。
- 根據申請專利範圍第18項所述的方法,其中,步驟(d)包括:在步驟(c)之後將所述接合工具以預定量升高。
- 根據申請專利範圍第18項所述的方法,還包括: 在步驟(b)和(c)之間,至少部分地熔化以下至少其中之一的步驟: (i)半導體元件的導電結構,以及(ii)基板的相應導電結構。
- 根據申請專利範圍第21項所述的方法,還包括: 在步驟(d)之後固化所述半導體元件的導電結構以及所述基板的相應導電結構的步驟。
- 一種操作晶粒附接機的方法,所述方法包括以下步驟: (a)以一接合工具承載一半導體元件; (b)開始所述半導體元件與一基板上的一黏合材料之間的接觸;以及 (c)在步驟(b)之後降低所述接合工具,使得所述接合工具的一支座接觸所述基板的一上表面。
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