TW201931510A - Method and apparatus for contactlessly levitating a masking device - Google Patents

Abstract

A contactless levitation method includes contactlessly levitating a mask assembly (200). The mask assembly includes a carrier (210) and a masking device (20) supported by the carrier. The method includes controlling a shape of the carrier while the mask assembly is contactlessly levitated.

Description

Method for non-contact suspension-shading device

Several embodiments described herein relate to non-contact suspension of a screening device, and more particularly to a screening device for shielding a substrate. More particularly, the various embodiments described herein relate to non-contact suspension of a plurality of screening devices that are configured to shield a plurality of large-area substrates in a vertical orientation.

Several methods for depositing materials on a substrate are known. For example, the substrate can be coated by an evaporation process such as a physical vapor deposition (PVD) process, a chemical vapor deposition (CVD) process, a sputtering process, or a spray coating (spraying). ) Process, etc. The process can be performed in a processing chamber of the deposition apparatus to tie the coated substrate to the processing chamber. A deposition material is provided in the processing chamber. Several materials are, for example, small molecules, metals, oxides, nitrides, and carbides that can be used to deposit on a substrate. Further, other processes such as etching, structuring, annealing, or the like can be performed in the processing chamber.

The coated substrate can be used in several applications and in several technical fields. For example, one application is in the field of organic light emitting diode (OLED) panels. Other applications include insulating panels, such as microelectronics for semiconductor devices, substrates with thin film transistors (TFTs), color filters, or the like.

OLEDs are solid-state devices consisting of thin films of (organic) molecules. In the case of application of electricity, the film of (organic) molecules produces light. OLEDs can provide bright displays on electronic devices and use less power than, for example, light-emitting diodes (LEDs) or liquid crystal displays (LCDs). In the processing chamber, organic molecules are produced (for example by evaporation, sputtering, or spraying, etc.) and provided to condense into a film on the substrate. The particles pass through a mask having a specific pattern to form an OLED pattern on the substrate.

In order to reduce the footprint of the deposition apparatus, there is a deposition apparatus that allows processing of shielding the substrate in a vertical orientation. That is, the substrate and the mask are vertically disposed in the processing chamber. Accurate alignment of the mask to the target location is advantageous because misaligned masks can cause degradation of the quality of the layers deposited on the substrate. For example, in order to provide a pattern having a very small size on a substrate to exemplify the fabrication of an OLED, accurate alignment of the masking device is desirable.

In view of the above, methods and apparatus for providing improved alignment of the screening device are desirable.

According to an embodiment, a method is presented. This method includes a non-contact suspension-mask assembly. The mask assembly includes a carrier and a shielding device supported by the carrier. The method includes controlling the shape of one of the carriers when the mask assembly is in non-contact suspension.

According to other embodiments, a method is presented. The method includes non-contact suspension of a first mask assembly by a first set of magnetic levitation forces. The first mask assembly includes a first carrier and a first shielding device, and the first shielding device is supported by the first carrier. The method includes measuring one of the alignments of the first screening device when the first mask assembly is non-contact suspended by the first set of magnetic levitation forces. The method includes calculating a second set of magnetic levitation forces. The method includes non-contact suspension of a mask assembly by a second set of magnetic levitation forces. The mask assembly includes a carrier and a shielding device supported by the carrier. The mask assembly is a first mask assembly or a second mask assembly. The second set of magnetic levitation forces provides for deformation of one of the carriers.

According to other embodiments, an apparatus is presented. The device includes a magnetic suspension system comprising a plurality of magnetic units. The device is a mask assembly comprising a carrier and a shielding device supported by the carrier. The device includes a control unit coupled to the magnetic units. This device is assembled for controlling the shape of one of the carriers when the mask assembly is in non-contact suspension. In order to better understand the above and other aspects of the present invention, the following detailed description of the embodiments and the accompanying drawings

The detailed description will now be made in a number of embodiments, and one or more examples of several embodiments are illustrated in the drawings. In the description of the figures below, the same reference numerals are intended to refer to the same elements. In general, only the differences between the individual embodiments are described. The examples are provided by way of illustration and are not meant as a limitation. Furthermore, the features illustrated or described as part of one embodiment can be used in other embodiments or in combination with other embodiments to achieve further embodiments. This means that the description includes such adjustments and changes.

Several embodiments described herein include non-contact suspension of the mask assembly. The term "non-contact" as used throughout this disclosure is understood to mean that the weight of the mask assembly is not supported by mechanical or mechanical forces, but is supported by magnetic forces. In particular, the mask assembly can be supported in a suspended or floating state by magnetic force instead of mechanical force. In some applications, there may be no mechanical contact between the mask assembly and the rest of the device during the suspension of the mask assembly in the system and during the exemplification of the alignment.

In contrast to mechanical devices used to guide the mask assembly in a processing system, the advantage is that the non-contact suspension does not face friction and affects the linearity and/or precision of the positioning and alignment of the mask assembly. The non-contact suspension of the mask assembly provides frictionless movement of the mask assembly, wherein the position of the substrate of the mask assembly relative to the shield during the deposition process can be controlled and maintained with high precision.

For example, during the deposition process, the non-contact suspension of the mask assembly is advantageous, and no particles are produced by mechanical contact between the mask assembly and the components of the device, such as mechanical tracks. Thus, the non-contact suspension provides a layer of deposition that improves purity and uniformity on the substrate, particularly since particle generation is minimized when using non-contact suspension.

According to several embodiments, which may be combined with other embodiments described herein, the deposition or coating process may be or include a thermal evaporation process, a physical vapor deposition (PVD) process, a chemical vapor deposition (CVD) process, and/or Sputtering process. A deposition source can be provided for performing the deposition process.

In the present disclosure, a plurality of terms of "substantially horizontal" direction may include a plurality of directions that form a small angle of 10 degrees or even 15 degrees with each other. The terms "a substantially vertical" direction may include a plurality of directions that form an angle of less than 90 degrees with each other, for example at least 80 degrees or at least 75 degrees. Similar considerations apply to concepts that are substantially parallel or perpendicular to the axis, plane, area, orientation, or the like.

Some embodiments described herein include the concepts of "substantially perpendicular" directions, planes, orientations, and the like. The substantially vertical direction is considered to be a direction substantially parallel to the direction extending along the force of gravity. The substantially vertical direction can be offset from an accurate verticality (the latter defined by gravity) as an angle of up to 15 degrees.

The various embodiments described herein may further encompass the concepts of "substantially horizontal" directions, planes, orientations, and the like. The substantially horizontal direction is understood to be different from the substantially vertical direction. The substantially horizontal direction may be substantially perpendicular to the exact vertical direction defined by gravity.

FIG. 1 is a schematic view showing a deposition process for fabricating OLEDs on a substrate 10.

To produce OLEDs, organic molecules are produced by deposition source 30 (e.g., evaporation, sputtering, spraying, etc.) and deposited on substrate 10. The shielding device 20 is located between the substrate 10 and the deposition source 30. The screening device 20 can have a particular pattern, such as a particular pattern provided by a plurality of apertures or apertures 23, such that organic molecules (e.g., along path 32) pass through the apertures and apertures 23 to deposit an organic compound layer or film. On the substrate 10. A plurality of layers or films may be deposited on the substrate 10 using different masking means or different locations relative to the masking means 20 of the substrate 10, for example to produce pixels having different color characteristics. For example, a first layer or film can be deposited to produce red pixels 34, a second layer or film can be deposited to produce green pixels 36, and a third layer or film can be deposited to produce blue pixels 38. The layer or film is exemplified by an organic semiconductor and can be disposed between two electrodes. The two electrodes are, for example, an anode and a cathode (not shown). At least one of the electrodes of the two electrodes may be transparent.

During the deposition process, the substrate 10 and the screening device 20 can be disposed in a substantially vertical orientation. In Fig. 1, several arrows indicate one vertical direction 40 and two horizontal directions 50 and 60.

According to several embodiments, which can be combined with other embodiments described herein, the screening device 20 is assembled for example to shield the substrate 10 during the deposition process. The screening device 20 prevents one or more portions of the substrate 10 from being coated during the deposition process. The deposition material is emitted toward the substrate 10 during deposition. The screening means can be configured such that portions of the deposited material emerging toward the substrate 10 impinge on the screening means 20 to avoid coating a portion of the substrate 10.

According to several embodiments, which can be combined with other embodiments described herein, the screening device 20 can include a plurality of apertures. The openings are configurable for passing the deposited material through the screening device 20 and onto the substrate 10 that is shielded by the screening device 20. These openings define a pattern.

According to several embodiments, which can be combined with other embodiments described herein, the screening device 20 can be a flexible screening device. The screening device 20 can have mechanical properties similar to a foil or plate. The screening device 20 can be or include a panel of masking material. According to several embodiments described herein, the screening arrangement 20 can be supported by a mask support, such as a mask frame.

According to several embodiments, which can be combined with other embodiments described herein, the screening device 20 can be configured to shield a large area substrate.

2 is a schematic diagram of a mask assembly 200 in accordance with embodiments described herein. The mask assembly 200 includes a carrier 210. The mask assembly 200 includes a screening device 20 that is supported by a carrier 210. The mask assembly 200 shown in Figure 2 is oriented substantially horizontally.

According to several embodiments, which may be combined with other embodiments described herein, the carrier 210 may be a carrier suitable for carrying or supporting the screening device 20. Carrier 210 can define a plane.

The carrier 210 shown in Fig. 2 is in an undeformed state. For example, the carrier 210 can be a carrier 210 that is disposed on a planar support in a horizontal orientation of the carrier 210. A force that does not act to change the shape of the carrier 210 is supplied to the carrier 210. The periphery of the undeformed carrier can include substantially straight edges, as shown in Figure 2. The shielding device 20 shown in Fig. 2 is in an undeformed state. The undeformed screening device 20 can have a rectangular shape. The perimeter of the undeformed screening device can include substantially straight edges, as shown in FIG.

According to several embodiments, which can be combined with other embodiments described herein, the mask assembly 200 can include a mask support. FIG. 3 depicts the mask assembly 200, which includes a mask support 310. In the exemplary embodiment shown in FIG. 3, the mask support 310 is a mask frame. The screening device 20 is exemplified by a flexible shielding device supported by a mask support 310. The screening device 20 is attached to the mask support 310, for example by spot welding to the mask support 310. The mask support 310 is attached to the carrier 210, for example by being attached to the carrier 210 by one or more fasteners. The one or more fasteners are for example screws or bolts. The mask assembly 200, shown in Figure 3, is disposed in a substantially horizontal orientation. The carrier 210, the mask support 310, and the shielding device 20 shown in Fig. 3 are in an undeformed state. The perimeter of the undeformed mask support can include substantially straight edges, as shown in FIG. The mask support is exemplified by a mask frame.

The components of the mask assembly can be connected to one another to assemble the mask assembly. The components of the mask assembly are exemplified by the carrier 210, the screening device 20 and/or the mask support 310. The assembly of the mask assembly 200 can be performed in a substantially horizontal orientation of the mask assembly 200. After the mask assembly 200 is assembled, the mask assembly 200 can be disposed in a substantially vertical orientation, such as for a subsequent coating process. The substrate can be positioned and/or fixed relative to the mask assembly 200 or the screening device 20 before, during, or after the mask assembly 200 is assembled. Other devices, such as at least one of a carrier, a substrate frame, and a substrate support arrangement, can be provided and used to position and secure the substrate.

4 is a schematic diagram of a mask assembly 200 including a carrier 210 and a screening device 20 in accordance with embodiments described herein. The mask assembly 200 is disposed in a substantially vertical orientation. According to several embodiments described herein, the mask assembly 200 can include a mask support (not shown). For example, the screening device 20 can be a flexible screening device attached to the mask frame.

The substantially vertically oriented screening device 20, shown in Figure 4, is in a deformed state. The shape of the shielding device 20 shown in Fig. 4 is different from the shape of the undeformed shielding device, and the undeformed shielding device is exemplified by the shielding device 20 shown in Fig. 3. The deformation state of the shielding device 20 is representatively shown in Fig. 4 by the curved shape of the upper and lower edges of the shielding device 20. The deformation of the screening device 20 can be caused by gravity acting on components of the mask assembly, such as the screening device or the mask support. Gravity is indicated by arrow 450. The deformed screening device 20 can include at least one curved edge, such as a curved horizontal edge.

The deformation of the screening device can be caused by the attachment of the shielding device to the mask support, which is exemplified by a mask frame. FIG. 5 depicts the mask assembly 200 in accordance with embodiments described herein. The mask assembly 200 is disposed in a substantially vertical orientation. The mask assembly 200 includes a mask frame 510. The mask frame 510 is attached to the carrier 210 by fasteners such as screws. Two fasteners 515 are shown in Figure 5. Other fasteners can be set. The mask assembly 200 includes a shielding device 20 (not shown in FIG. 5) that is coupled to the mask frame 510. The mask frame 510 can have one or more frame elements, such as a first frame element 522, a second frame element 524, a third frame element 526, and a fourth frame element 528.

Gravity acts on the mask assembly 200 and may cause at least a portion of the mask frame 510 and/or the screening device 20 to be deformed, such as by bending. Gravity can in particular cause deformation of the horizontally oriented frame element, for example by bending. The horizontally oriented frame members are, for example, a first frame member 522 and a second frame member 524 (shown in solid lines). The undeformed shape of the mask frame 510 is shown in Figure 5 by a dashed line. The shielding device 20 shown in Fig. 5 is deformed. The screening device 20 can be deformed by the shielding device 20 being attached to the mask frame 510.

The masking device and the deformed mask frame shown in the drawings are shown in schematic form. The deformed shielding device may have a shape different from the shape shown in Fig. 4. The deformed mask frame may have a shape different from the shape shown in FIG.

For example, tension can exist. Tension may affect the shape of the mask frame and/or the screening device. For example, during the deposition process, tension can be provided to handle the thermal expansion of the mask. If there is enough tension, the temperature increase only changes the mask tension, not the pixel position.

Deformation of the screening device 20 may cause misalignment of the screening device 20 relative to the substrate. The quality and/or alignment of the deposited layer may be degraded. For example, for a flexible mask attached to a mask frame, the misalignment of the shielding elements due to deformation of the mask frame can be comparable to the size of the structure on the substrate provided by the screening device. An order of magnitude. For example, in the case of a mask having a device thickness of about 50 microns, the mask positioning precision can be about 2 microns, and the vertical deformation of the masking device can be about at least 2.5 microns.

Figure 6 is a schematic illustration of a method in accordance with embodiments described herein.

Figure 6 depicts several magnetic units 610. The individual magnetic units of such magnetic units 610 are indicated by reference numeral 615. Such magnetic units 610 provide a plurality of magnetic levitation forces 620. The individual magnetic levitation forces of such magnetic levitation forces 620 are indicated by reference numeral 625. Each of the magnetic levitation forces 625 of the magnetic levitation forces 620 extends in a substantially vertical direction, and the substantially vertical direction is exemplified by the second direction 694.

Figure 6 depicts a first direction 692. The first direction can be a substantially horizontal direction. Figure 6 depicts a second direction 694. The second direction 694 can be a substantially vertical direction.

FIG. 6 illustrates a mask assembly 200 that includes a carrier 210 and a screening device 20 that is supported by a carrier 210. These magnetic levitation forces 620 act on the mask assembly 200. The mask assembly 200 is non-contact suspended by the magnetic suspension force 620.

According to several embodiments, which can be combined with other embodiments described herein, when the mask assembly 200 is exemplified by non-contact suspension by such magnetic levitation forces 620, the carrier 210 has a substantially vertical orientation.

During the non-contact suspension of the mask assembly 200 by such magnetic levitation forces 620, the carrier 210 is deformed. The non-contact suspended carrier has a different shape than the undeformed carrier.

According to several embodiments, which may be combined with other embodiments described herein, the deformation of the carrier 210 may be provided by such magnetic levitation forces 620. By way of example, the magnitude of such magnetic levitation forces can be controlled by the control unit described herein to provide targeted deformation of the carrier 210.

Two or more of the magnetic levitation forces 620 may have different sizes. In Fig. 6, the different sizes of the magnetic levitation forces are indicated by upward arrows having different lengths. Magnetic suspension forces of different sizes can provide deformation of the carrier 210. In FIG. 6, the deformed carrier 210 includes a curved upper edge 630.

A deformation of the carrier 210 can be provided to align the screening device 20 supported by the carrier 210. The screening device 20 is mechanically coupled to the carrier 210 such that the shape, position and/or alignment of the screening device 20 can be adjusted and/or controlled by the deformation carrier 210.

For example, the screening device can be attached to a mask support (not shown in Figure 6), which is exemplified by a mask frame in accordance with several embodiments described herein. The mask support can be attached to the carrier 210. By deforming the carrier 210, the shape, position and/or alignment of the mask support attached to the carrier 210 can be adjusted and/or controlled. The attachment of the screening device to the mask support provides alignment of the screening device.

In Fig. 6, the screening device 20 of the non-contact suspended mask assembly 200 is in a well aligned position. The screening device 20 shown in Fig. 6 has a rectangular shape. The screening device 20 is substantially undeformed. The upper edge 640 of the screening device 20 is straight. The upper edge 640 is aligned with the reference axis 642, which defines the target alignment of the screening device 20. The lower edge 650 of the screening device 20 is straight. The lower edge 650 is aligned with the reference axis 652, which defines the target alignment of the screening device 20. The well-aligned position of the screening device 20 is provided by the deformation of the carrier 210. The deformation of the carrier 210 is provided by these magnetic levitation forces 620.

In view of the above, a method is provided. This method includes a non-contact suspension mask assembly 200. The mask assembly 200 can be exemplified by non-contact suspension by such magnetic levitation forces 620. Such magnetic levitation forces 620 can be provided by a plurality of magnetic units 610. The mask assembly includes a carrier 210 and a screening device 20 supported by a carrier. The screening device 20 can be adapted to shield the substrate. The method includes controlling the shape of the carrier when the mask assembly is in non-contact suspension.

By controlling the shape of the carrier 210, several embodiments described herein provide for alignment of the screening device 20. The misalignment of the screening device 20 can be compensated or corrected.

The misalignment that may be corrected by the various embodiments described herein may result from deformation of the screening device 20 and/or the mask support 310. The mask support 310 is exemplified by a mask frame 510 that supports the screening device 20. For example, the vertically oriented screening device 20 can be deformed during non-contact suspension because the screening device 20 is attached to the mask frame and the mask frame can be bent under the influence of gravity acting on the mask frame. The method according to several embodiments described herein provides compensation for deformation of the mask support. A well aligned screening device 20 can be provided by controlling the shape of the carrier. The shape of the control carrier 210 can include, for example, a deformed carrier 210 to compensate for deformation of the mask support and/or the screening device. A well-aligned screening device 20 has the advantage that an improved quality layer deposited on the substrate can be provided.

According to several embodiments, which can be combined with other embodiments described herein, the mask assembly 200 can be non-contact suspended by a plurality of magnetic levitation forces 620. The shape of the carrier can be controlled by controlling such magnetic levitation forces 620. The shape of the carrier 210 can be controlled by controlling the magnitude of such magnetic levitation forces 620 acting on the carrier. The shape of the carrier 210 can be controlled in a non-contact manner. For example, the deformation of the carrier can be provided in a non-contact manner. The shape of the carrier 210 need not be controlled, for example, as a mechanical component of the actuator.

According to several embodiments, which can be combined with other embodiments described herein, the shape of the carrier can be specifically controlled by non-contact forces, exemplified by magnetic levitation forces. The deformation of the carrier 210 can be provided exclusively by non-contact forces. The deformation of the carrier 210 can be non-contact deformation.

The non-contact control of the shape of the carrier has the advantage that the generation of particles can be avoided, so that the quality and purity of the layer deposited on the substrate is improved.

Moreover, the deformation of the carrier 210 provided by such magnetic levitation forces 620 can be provided by suitably assembling and controlling such magnetic units 610. No additional components or devices are required to provide the distortion, but have the advantage of providing simple equipment and saving time, energy costs and other resources. Additional components or devices are exemplified by mechanical actuators for deforming the carrier 210.

According to several embodiments, which may be combined with other embodiments described herein, controlling the shape of the carrier 210 may include providing a deformation of the carrier 210.

The deformed carrier 210 has a shape different from the shape of the carrier 210 in the case where the carrier 210 is in an undeformed state. The deformed carrier 210 is exemplified by a carrier 210 that is deformed by the magnetic levitation force 620. A magnetic levitation force can act on the carrier 210 to change the shape of the carrier 210. The carrier 210 in the deformed state may include at least one edge having a curved shape. In particular, the horizontal edge of the deformed carrier is exemplified by the upper edge 630 shown in Fig. 6, which may have a curved shape. If the carrier is in an undeformed state, the edge in question can be straight. For example, Figure 4 depicts the carrier 210 in an undeformed state with the upper edge 630 straight.

According to several embodiments, which may be combined with other embodiments described herein, the deformation of the carrier 210 provided by such magnetic levitation forces 620 to align the shielding device 20 may be a target deformation of the carrier 210. For example, by the control unit 1010, the magnetic levitation forces can be controlled, and in particular, the magnitude of the magnetic levitation forces can be controlled to provide deformation of the carrier 210.

In some applications, controlling the shape of the carrier 210 can include maintaining the carrier 210 in a substantially undeformed state when the carrier 210 is in non-contact suspension. In this case, a non-contact suspended suspension carrier can be provided. For example, by maintaining the carrier in an undeformed state, the upper edge of the carrier can remain substantially straight during non-contact suspension. The screening device 20 can be assembled such that the screening device 20 is in good alignment when the non-contact suspended carrier is maintained in a substantially undeformed state.

According to several embodiments described herein, the shape of the carrier can be controlled to align the screening device. For example, a deformation of the carrier 210 can be provided to align the screening device 20.

The alignment of the screening device 20 according to several embodiments described herein may be the alignment of the shape of the screening device 20. The shape of the carrier 210 can be controlled to align the shape of the shielding device to the target shape. For example, by deforming the carrier 210, the shape of the screening device 20 can be controlled such that the screening device 20 can be deformed into an undeformed shape, such as a substantially rectangular shape. Aligning the screening device 20 can include controlling the shape of the screening device such that at least one edge of the screening device, such as a horizontal edge, is substantially straight.

The alignment of the screening device 20 described herein that affects and/or controls the shape of the screening device 20 is different from the alignment of the shielding device 20 that is only changed by the translation or rotation of the shielding device. There is no need to affect the shape of the screening device. For example, the alignment of the screening device 20, which only adjusts the vertical position of the screening device 20, cannot be used to control the shape of the screening device 20.

According to several embodiments, which can be combined with other embodiments described herein, the shape of the carrier 210 can be controlled to align one of the edges of the screening device 20 in a substantially horizontal direction. This edge of the screening device 20 is exemplified by the upper edge 640 shown in FIG. The substantially horizontal direction is exemplified by the first direction 692. For example, a deformation of the carrier 210 can be provided to align the edges of the screening device in a substantially horizontal direction.

FIG. 7 is a schematic illustration of a method of aligning the screening device 20 in accordance with embodiments described herein. FIG. 7 depicts the mask assembly 200. The mask assembly 200 includes a mask frame 510. The screening device 20 is coupled to the mask frame 510. The mask frame 510 is coupled to the carrier 210. The deformation of the carrier 210 provided by the magnetic levitation forces 620 compensates for the deformation of the mask frame 510. When the mask assembly 200 is suspended by the magnetic levitation forces 620, the mask frame and the screening device are in a substantially undeformed state. The deformation of the carrier 210 provides alignment of the mask frame 510. For example, by providing a deformation of the carrier 210, the first frame member 522 and the second frame member 524 can be well aligned with the horizontal reference axes 742 and 752, respectively. The bending of the first frame member 522 and the second frame member 542 can be compensated for by the deformation of the carrier 210. When the mask assembly 200 is suspended by the magnetic levitation forces 620, the shielding device 20 attached to the mask frame 510 is in good alignment.

The mask assembly 200 can include a mask support 310 in accordance with several embodiments that can be combined with other embodiments described herein. The screening device 20 can be coupled to the mask support. The mask support 310 can be coupled to the carrier 210.

The screening device 20 can be supported by the mask support 310 and/or attached to the mask support 310. The mask support 310 can be a rigid mask support, for example to support a flexible shelter.

The mask support 310 can define a plane. The screening device 20 supported by the mask support 310 can define a plane. The plane defined by the screening device 20 supported by the mask support 310, the plane defined by the mask support 310, and/or the plane defined by the carrier supporting the screening device 20 may be parallel or substantially parallel to each other.

The mask support 310 can be a mask frame 510. The mask frame 510 can define a window or aperture. The area of the window or opening may be from 60% to 100% of the area of the screening device 20, and the screening device 20 is supported by the mask frame 510. The screening device 20 can be attached to the mask support 310 at two or more peripheral portions of the screening device 20, and the mask support 310 is exemplified as a mask frame.

The mask frame 510 can include one or more frame elements. The window defined by the mask frame 510 can be surrounded by one or more frame elements. The frame elements of the mask frame can be rod shaped. The mask frame 510 can include a first frame element 522. The mask frame 510 can include a second frame element 524. The mask frame 510 can include a third frame element 526. The mask frame 510 can include a fourth frame element 528. The third frame member 526 can be adjacent to or coupled to the first frame member 522. The second frame member 524 can be adjacent to or coupled to the third frame member 526. The fourth frame member 528 can be adjacent to or coupled to the second frame member. The first frame member 522 can be adjacent to or coupled to the fourth frame member 528. When the mask frame 510 is exemplified as being in a substantially vertical orientation when the mask assembly is in a non-contact suspension as described herein, the first frame member 522 and/or the second frame member 524 can be horizontally or substantially horizontally Extend in the direction. The third frame member 526 and/or the fourth frame member 528 can extend in a vertical or substantially vertical direction when the mask frame is in a substantially vertical orientation.

The mask support 310 can be supported by the carrier 210. The mask support 310 can be attached to the carrier 210. The mask support 310 can be attached to the carrier 210 at a number of coupling points. The mask support 310 is exemplified by a mask frame 510 that can be attached to the carrier 210 by a plurality of fasteners. These fasteners are exemplified by screws or bolts. For example, at least two fasteners can be used to attach the mask frame 510 to the carrier 210. The at least two fasteners are exemplified by three or more fasteners. The mask support 310 can be disposed between the carrier 210 and the screening device 20.

According to several embodiments, which can be combined with other embodiments described herein, the mask support 310 can be mechanically coupled to the carrier 210 such that deformation of the carrier 210 provides the shape, alignment, and/or shape of the mask support 310. Adjustment of position. For example, in the case of a mask frame that is attached to the carrier with a plurality of screws, the alignment of the mask support 310 can be changed by the deformation carrier 210.

According to several embodiments, which can be combined with other embodiments described herein, the screening device 20 supported by the carrier 210 can be mechanically coupled to the carrier 210 such that deformation of the carrier 210 provides the shape, alignment and/or shielding device 20. Or adjustment of position. For example, in the case of a flexible shielding device attached to a mask frame and in which the mask frame is attached to the carrier by a plurality of screws, the alignment of the shielding device can be changed by deforming the carrier.

According to several embodiments, which can be combined with other embodiments described herein, the shape of the carrier 210 can be controlled to compensate for the deformation of the mask support 310, particularly the compensation caused by the force of gravity acting on the mask support 310. The deformation of the mask support. For example, a deformation of the carrier 210 can be provided to compensate for the deformation of the mask support 310.

The shape of the carrier 210 can be controlled to align the first frame member 522 of the mask frame 510 in a substantially horizontal direction, and the substantially horizontal direction is exemplified as the first direction 692. For example, a deformation of the carrier 210 can be provided to compensate for the deformation of the first frame member 522. A deformation of the carrier 210 can be provided to align the first frame member 522 in a substantially horizontal direction.

According to several embodiments, which can be combined with other embodiments described herein, the magnetic levitation force is the force acting on the mask assembly 200. The magnetic levitation force is assembled to resist the gravitational force acting on the mask assembly 200. The magnetic levitation force can be provided by one of the magnetic units of the magnetic unit 610. The magnetic levitation force extends in a vertical or substantially vertical direction.

These magnetic levitation forces 620 collectively suspend the visor assembly 200 in accordance with several embodiments that can be combined with other embodiments described herein.

According to several embodiments, which can be combined with other embodiments described herein, such magnetic levitation forces 620 are assembled for providing deformation of the carrier 210, particularly target deformation of the carrier 210. Deformation may be provided to align the screening device 20 supported by the carrier 210.

According to several embodiments, which may be combined with other embodiments described herein, the plurality of magnetic levitation forces 620 may include 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 , 15, 16, 17, 18, 19, 20 or more magnetic levitation forces.

According to several embodiments, which may be combined with other embodiments described herein, the first magnetic levitation force of such magnetic levitation forces 620 may be provided by the first magnetic unit of the magnetic units 610. The second magnetic levitation force can be provided by the second magnetic unit of the magnetic units. The third magnetic levitation force can be provided by the third magnetic unit of the magnetic units 610. Each of the magnetic units of the magnetic units 610 can provide one of these magnetic levitation forces.

The magnetic levitation forces of the magnetic levitation forces 620 have a size. This size of such magnetic levitation forces 620 is provided and/or controlled to provide for deformation of the carrier 210. According to several embodiments, which may be combined with other embodiments described herein, at least two of the magnetic levitation forces 620 may have different sizes, and in particular at least three magnetic levitation forces may have different sizes. The different sizes of these magnetic levitation forces 620 provide for deformation of the carrier 210.

The plurality of magnetic levitation forces 620 can include at least one of: a first magnetic levitation force; a second magnetic levitation force; and a third magnetic levitation force.

According to several embodiments, which can be combined with other embodiments described herein, the magnitude of the first magnetic levitation force can be different than the magnitude of the second magnetic levitation force.

According to several embodiments, which can be combined with other embodiments described herein, the magnitude of the second magnetic levitation force can be different than the magnitude of the first magnetic levitation force. The magnitude of the second magnetic levitation force may be different from the magnitude of the third magnetic levitation force.

These magnetic levitation forces 620 can be sized to have several possible distributions and profiles. The distribution of the size may be determined by the target deformation of the carrier 210, and the target deformation of the carrier 210 will be provided by the magnetic levitation forces 620. Figures 8a-b are schematic illustrations of two examples of possible distributions of such magnetic levitation forces 620. Other distributions can also be considered.

The magnetic levitation forces 620 depicted in Figures 8a-b include magnetic levitation forces 821, 822, 823, 824, and 825. As shown in Fig. 8a, the magnetic levitation force 823 acting on the central portion of the carrier 210 can be larger than the magnetic levitation forces 821 and 825 acting on the outer left and outer right portions of the carrier 210, respectively. the size of. Alternatively, as shown in FIG. 8b, the magnetic levitation forces 821 and 825 can each have a size greater than the magnitude of the magnetic levitation force 823.

As shown, the deformation of the carrier 210 provided by the magnetic levitation forces 620 illustrated in FIG. 8a is different from the carrier 210 provided by the magnetic levitation forces 620 illustrated in FIG. 8b. The deformation. In both cases, a deformation of the carrier 210 is provided to align the screening device 20.

By performing one or more measurements while the mask assembly 200 is in non-contact suspension, a special distribution of the magnitude of the magnetic levitation force can be obtained to provide information indicative of the target deformation of the carrier 210 to align the screening device 20.

For example, one or more detectors are exemplified by a camera that can be used to measure the alignment of a non-contact suspended masking device. In some cases, the misalignment of the shielding device 20 that is present may be determined. Misalignment can be corrected by providing suitable deformation of the carrier 210. Based on the misalignment of the measured screening device 20, a target distribution for the magnitude of the magnetic levitation force can be calculated to provide a target deformation of the carrier 210 to correct for misalignment. The magnitude of the magnetic levitation force of the suspension mask assembly 200 can then be employed to match the calculated target distribution. The magnetic levitation force of the suspension mask assembly provides the target deformation of the carrier 210 when the target distribution is in effect. The deformation of the suspended carrier 210 compensates for the misalignment of the screening device 20 such that the screening device 20 is now well aligned.

The process can include the processing of several masking assemblies, each of which includes, for example, a carrier of the same form and size, a screening arrangement, and an optional mask support. For example, the initial misalignment of the screening device caused by the bending of the mask support by gravity can thus be the same misalignment for all of the mask assemblies being processed. Once the target deformation for a provided carrier is determined to correct the misalignment, and once a corresponding target distribution of the magnitude of the magnetic levitation force is calculated to provide the target deformation of the carrier, the same target distribution of the size can be provided. The splicing assembly for splicing and handling, without the need to repeatedly measure the misalignment of the splicing device. The target distribution for the magnitude of the magnetic levitation force can be calculated once for a provided mask assembly and then applied to a number of successive mask assemblies that are non-contact suspended by the magnetic units.

9a-b are schematic views of a method for aligning a screening device in accordance with embodiments described herein.

Figure 9a depicts a mask assembly 200 that is non-contact suspended by a first set of magnetic levitation forces 910 provided by the magnetic units 610. The individual magnetic levitation forces of the first set of magnetic levitation forces 910 are indicated by reference numeral 915. The first set of magnetic levitation forces 910 can be an initial set of magnetic levitation forces that are not assembled to provide deformation of the carrier 210. As shown in FIG. 9a, when the mask assembly 200 is non-contact suspended by the first set of magnetic levitation forces 910, the carrier 210 can be substantially undeformed. For example, the magnitude of the first set of magnetic levitation forces 910 can all be substantially the same. The respective magnetic levitation forces of the first set of magnetic levitation forces 910 can carry an equal proportion of the total weight of the mask assembly 200.

As shown in FIG. 9a, when the first set of magnetic levitation forces 910 are non-contacting the suspension mask assembly 200, the masking means and the selected mask support member 310 (not shown) may be in a deformed state, for example by acting on The weight of the screening device 20 and/or the mask support 310 is caused by gravity. As shown in Figure 9a, when the mask assembly 200 is non-contact suspended by the first set of magnetic levitation forces 910, misalignment of the screening device 20 may be present. In the example shown in Figure 9a, the upper edge of the screening device 20 is not well aligned with the reference axis 642. The lower edge of the screening device 20 is not well aligned with the reference axis 652. The misalignment of the screening device 20 can result from the deformed state of the screening device 20 and/or the mask support 310.

According to several embodiments, which can be combined with other embodiments described herein, the alignment of the screening device and/or the mask support can be measured by one or more measuring devices. The one or more measuring devices are exemplified by a camera or a sensor. Figure 9a shows two measuring devices 912 and 914 for measuring the alignment of the screening device. A single measuring device or two or more measuring devices can also be provided. When the mask assembly 200 is non-contact suspended by the first set of magnetic levitation forces 910, the measuring device 912 and/or the measuring device 914 can be used to measure the alignment of the screening device. The misalignment of the screening device 20 can be measured. In particular, the deviation of the shape of the screening device 20 from the target shape of the screening device 20 can be determined by the alignment of the measurements of the screening device 20.

To compensate for the misalignment of the screening device 20, the target alignment of the carrier 210 can be determined. In particular, a second set of magnetic levitation forces 920 can be determined. The magnitude of the second set of magnetic levitation forces 920 can be calculated from at least the alignment measured by the screening device 20. A second set of magnetic levitation forces 20 can be assembled for providing deformation of the carrier 210 to compensate for misalignment of the screening device 20.

Figure 9b depicts a second set of magnetic levitation forces 920 of the non-contact floating visor assembly 200. A second set of magnetic levitation forces 920 is provided by the magnetic units 610. The individual magnetic levitation forces of the second set of magnetic levitation forces 920 are indicated by reference numeral 925.

As shown in Figure 9b, when the second set of magnetic levitation forces 920 are in non-contact with the suspension mask assembly 200, the carrier 210 is in a deformed state. For example, the distribution of the magnitude of the second set of magnetic levitation forces 920 can be non-uniform to provide target deformation of the carrier 210. As shown in FIG. 9b, when the mask assembly 200 is non-contact suspended by the second set of magnetic levitation forces 920, the screening device 20 and the selected mask support 310 (not shown in FIG. 9b) may be substantial. Undeformed state. As shown in Figure 9b, when the mask assembly 200 is non-contact suspended by the second set of magnetic levitation forces 920, the screening device 20 is well aligned. In the example shown in Figure 9b, the upper edge of the screening device 20 is aligned with the reference axis 642. The lower edge of the screening device 20 is aligned with the reference axis 652.

As described above, once the magnitude of the second set of magnetic levitation forces 920 is calculated for use in the screening device 20, the second set of magnetic levitation forces can also be applied to suspend and align one or more other illuminating components without repeating Measurement of misalignment and calculation of the distribution of magnetic levitation forces.

According to an embodiment, a method of aligning a screening device is presented. The method includes non-contact suspension of the first mask assembly by a first set of magnetic levitation forces 910, the first mask assembly being exemplified by the mask assembly 200. The first mask assembly includes a first carrier and a first shielding device, the first shielding device being supported by the first carrier. The first set of magnetic levitation forces can be provided by a plurality of magnetic units 610. The method includes measuring an alignment of the first screening device when the first mask assembly is non-contact suspended by the first set of magnetic levitation forces 910. The method includes calculating a second set of magnetic levitation forces 920, particularly from alignment of measurements of at least the first screening device. A second set of magnetic levitation forces 920 can be calculated for such magnetic units 610. For example, the method can include calculating a magnitude of the second set of magnetic levitation forces 920 from the measured alignment of at least the first screening device. The method includes non-contact suspension of the mask assembly by a second set of magnetic levitation forces 920. The mask assembly includes a carrier and a screening device supported by the carrier. The mask assembly is a first mask assembly or a second mask assembly. A second set of magnetic levitation forces 920 provides for deformation of the carrier. For example, a deformation of the carrier can be provided to align the screening device.

The first mask assembly according to the various embodiments described herein can be a mask assembly 200 in accordance with several embodiments described herein. The first carrier according to several embodiments described herein can be the carrier 210 according to several embodiments described herein. The first screening device according to several embodiments described herein may be the screening device 20 according to several embodiments described herein. The first mask assembly can include a mask support 310 in accordance with several embodiments described herein. The features and aspects described herein with respect to the mask assembly 200, the carrier 210, and the screening device 20 in accordance with the various embodiments described herein are also applicable to the first mask assembly in accordance with the various embodiments described herein. And a first carrier and a first shielding device.

The second set of magnetic levitation forces 920 according to the various embodiments described herein can be such magnetic levitation forces 620 in accordance with the various embodiments described herein. The second mask assembly in accordance with the various embodiments described herein can be a mask assembly 200 in accordance with several embodiments described herein. The second mask assembly can include the carrier 210, the screening device 20, and/or the mask support 310 in accordance with various embodiments described herein. The features and aspects described herein with respect to such magnetic levitation forces 620 and mask assembly 200 are also applicable to the second set of magnetic levitation forces 920 and second hood assemblies in accordance with the various embodiments described herein.

According to several embodiments, which may be combined with other embodiments described herein, at least two of the magnetic levitation forces of the second set of magnetic levitation forces may have different sizes.

According to several embodiments, which can be combined with other embodiments described herein, the method can include determining a deviation of the shape of the first screening device from the target shape from the measured alignment of at least the first screening device. The shape of the first screening device determined by the deviation may be the shape of the first shielding device during the non-contact suspension of the first shielding device by the first set of magnetic levitation forces 910. The target shape may be the shape of the first shielding device that is substantially undeformed.

According to several embodiments, which can be combined with other embodiments described herein, a second set of magnetic levitation forces 920 is provided for non-contact suspension of the first hood assembly. The method can include changing from the first set of magnetic levitation forces to the second set of magnetic levitation forces when the first mask assembly is non-contact suspended.

According to other embodiments, and as shown in FIG. 10, device 1000 is provided. Apparatus 1000 includes a magnetic suspension system including a plurality of magnetic units 610. Apparatus 1000 includes a mask assembly 200. The mask assembly 200 includes a carrier 210 and a screening device 20 that is supported by a carrier. Apparatus 1000 includes a control unit 1010 that is coupled to such magnetic units 610. Apparatus 1000 is assembled for controlling the shape of carrier 210 when mask assembly 200 is in non-contact suspension.

According to several embodiments, which can be combined with other embodiments described herein, the control unit 1010 can be assembled for controlling such magnetic units 610 to control the shape of the carrier 210 when the mask assembly 200 is in non-contact suspension.

According to several embodiments, which can be combined with other embodiments described herein, such magnetic units 610 can be assembled for providing a plurality of magnetic levitation forces 620 for the non-contact suspension mask assembly 200. Control unit 1010 can be assembled for controlling such magnetic levitation forces 620 to control the shape of carrier 210, for example to provide for deformation of carrier 210. Control unit 1010 can be assembled for controlling such magnetic levitation forces 620 to provide deformation of carrier 210 to align shield device 20.

Apparatus 1000 according to several embodiments may be adapted to perform any of the method features of several embodiments in accordance with the methods described herein, particularly any of the features described in the appended claims. The control unit as described herein may be adapted to perform any of the method features of the embodiments of the methods described herein, particularly any of the features described in the scope of the appended claims.

According to several embodiments, which can be combined with other embodiments described herein, the plurality of magnetic units 610 can include a first magnetic unit. The plurality of magnetic units 610 can include a second magnetic unit. The plurality of magnetic units 610 can include a third magnetic unit. The plurality of magnetic units 610 can include other magnetic units. The plurality of magnetic units 610 may include 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20 or more magnetic units . For example, such magnetic units 610 can include from 5 to 20 magnetic units in one degree of freedom.

Any of the magnetic units of such magnetic units 610 can be active magnetic units, according to several embodiments that can be combined with other embodiments described herein. Such magnetic units 610 can be a plurality of active magnetic units.

According to several embodiments, which can be combined with other embodiments described herein, the active magnetic unit can be assembled for generating a magnetic field to provide a magnetic levitation force extending in a vertical direction, the vertical direction being illustrated in the drawings. The second direction is 694. The active magnetic unit is controllable to provide an adjustable magnetic field. The adjustable magnetic field can be a static or dynamic magnetic field. The active magnetic unit can be or include an element selected from the group consisting of an electromagnetic device; a solenoid; a coil; a superconducting magnet; or any combination thereof.

The term "active" magnetic unit is used herein to distinguish it from the concept of a "passive" magnetic unit. A passive magnetic unit may mean an element that has at least a plurality of magnetic properties during operation of the device, such magnetic properties being not actively controlled or adjusted. For example, the magnetic properties of a passive magnetic unit may not be subject to active control during non-contact suspension of the mask assembly. The passive magnetic unit may be a magnetic material such as a ferromagnetic material, a permanent magnet or may have magnetic properties.

Compared with the passive magnetic unit, the active magnetic unit provides more flexibility and precision in view of the adjustability and controllability of the magnetic field generated by the active magnetic unit.

When the mask assembly 200 is non-contact suspended by the magnetic units 610, the magnetic units 610 can be disposed above the mask assembly 200.

According to several embodiments, which may be combined with other embodiments described herein, device 1000 may include one or more measurement devices, such as measurement devices 912 and 914 illustrated in FIG. The one or more measuring devices can be assembled for measuring the alignment of the screening device 20 and/or the mask support 310. The one or more measuring devices can be assembled for measuring the alignment of the screening device 20 and/or the mask support 310 when the mask assembly 200 is in non-contact suspension of the magnetic units 610. Control unit 1010 can be coupled to one or more of the measurement devices. Control unit 1010 can be assembled for use in calculating the magnitude of such magnetic levitation forces 620. The size may be calculated based at least on the alignment of the screening device 20 as measured by the one or more measuring devices.

Apparatus 1000 can include a processing chamber 1120 in accordance with several embodiments that can be combined with other embodiments described herein. FIG. 11 depicts the processing chamber 1120. Such magnetic units 610 can be disposed in the processing chamber 1120. The one or more measuring devices are exemplified by measuring devices 912 and/or 914 and may be disposed in processing chamber 1120.

Processing chamber 1120 can be a vacuum chamber. The processing chamber can be a vacuum deposition chamber.

According to several embodiments, which can be combined with other embodiments described herein, apparatus 1000 can include a deposition source, particularly a deposition source for coating a substrate that is obscured by shielding device 20. The substrate may be supported by the carrier 210 or supported by other carriers during coating. The substrate may be non-contact suspended during coating. A deposition source can be disposed in the processing chamber 1120. The deposition source can include a target, such as a material having a deposition material thereon, or any other configuration to provide release for deposition on a substrate. The deposition source can include a rotatable target. The deposition material can be selected according to the deposition process and subsequent application of the coated substrate. For example, the deposition material can be an organic material used in the manufacture of OLEDs. For example, the deposition material of the deposition source may be a material including a small molecule, a polymer, and a phosphorescent material. For example, the deposition material may be selected from the group consisting of chelates (for example Alq ₃ ), fluorescent and phosphorescent dyes (for example, perylene, rubrene, quinacridone). Derivatives, etc.) and groups of conjugated dendrimers.

Figure 12 is a schematic illustration of an apparatus 1000 in accordance with embodiments described herein. Apparatus 1000, shown in FIG. 12, includes a magnetic suspension system including a plurality of magnetic units 610. Such magnetic units 610 are exemplified by active magnetic units such as electromagnetic devices, solenoids, coils or superconducting magnets. The magnetic suspension system extends in a first direction 692, which may be a substantially horizontal direction. The mask assembly 200 can be movable relative to the magnetic units 610 in the first direction 692. As shown in FIG. 12, the mask assembly 200 can be coupled to the first passive magnetic unit 1210, for example, to the first passive magnetic unit 1210. The first passive magnetic unit 1210 is exemplified by a rod of ferromagnetic material.

According to several embodiments, which can be combined with other embodiments described herein, the mask assembly 200 can be coupled to one or more magnetic units, such as the first passive magnetic unit 1210 shown in FIG. The magnetic levitation force acting on the mask assembly 200 can be provided by the interaction of the magnetic fields provided by the magnetic units 610 with the magnetic properties of the one or more magnetic units coupled to the mask assembly 200. Such magnetic units 610 are exemplified by active magnetic units, and the one or more magnetic units are exemplified by the first passive magnetic unit 1210. This interaction provides magnetic attraction between the magnetic unit 610 and the first passive magnetic unit 1210. Magnetic attraction provides an upward force on the first passive magnetic unit 1210. The mask assembly 200 coupled to the first passive magnetic unit 1210 is suspended by non-contact force by upward force.

For example, the carrier 210 of the mask assembly 200 can be mechanically coupled to the first passive magnetic unit 1210, for example, to the first passive magnetic unit 1210. The magnetic levitation force 620 can be mechanically coupled to the carrier 210 via the carrier 210 to the first passive magnetic unit 1210. Through the connection of the carrier 210 to the first passive magnetic unit 1210, the effects of the magnetic levitation forces 620 on the carrier 210 can be controlled to provide deformation of the carrier 210. For example, by providing a plurality of magnetic levitation forces 620 having different sizes, an upward force acting on the carrier 210 can be provided, wherein the upward forces have different sizes along the length of the carrier 210 in the first direction 692. Upward forces having different sizes can be assembled for providing target deformation of the carrier 210.

According to several embodiments, which may be combined with other embodiments described herein, a plurality of magnetic units 610 may be disposed in a first direction 692. Such magnetic units 610 can be linear arrays of magnetic units that extend in a first direction 692.

Such magnetic levitation forces 620 can be separated from each other in the first direction 692. The first magnetic levitation force of the magnetic levitation forces may be separated from the second magnetic levitation force of the magnetic levitation forces in the first direction 692. The third magnetic levitation force of such magnetic levitation forces may be separated from the second magnetic levitation force in the first direction 692.

Such magnetic units 610 can extend in a first direction 692 in accordance with several embodiments that can be combined with other embodiments described herein. Such magnetic levitation forces may include a first magnetic levitation force and a second magnetic levitation force. The second magnetic levitation force can be separated from the first magnetic levitation force in the first direction 692. The magnitude of the second magnetic levitation force may be different from the magnitude of the first magnetic levitation force. Such magnetic levitation forces 620 can include a third magnetic levitation force that is separated from the second magnetic levitation force in the first direction 692.

The substrate 10 can be a large area substrate in accordance with several embodiments that can be combined with other embodiments described herein. The large area substrate can have a size of at least 0.67 m ² . This size may range from about 0.67 m ² (0.73 mx 0.92 m - 4.5th generation) to about 8 m ² , more particularly from about 2 m ² to about 9 m ² or even up to 12 m ² . For example, a large area substrate can be the 4.5th, 5th, 7.5th, 8.5th, or even the 10th generation. The 4.5th generation corresponds to a substrate of about 0.67 m ² (0.73 mx 0.92 m), the fifth generation corresponds to a substrate of about 1.4 m ² (1.1 mx 1.3 m), and the 7.5th generation corresponds to a substrate of about 4.29 m ² (1.95 mx). 2.2 m), the 8.5th generation corresponds to a substrate of approximately 5.7 m ² (2.2 mx 2.5 m), and the 10th generation corresponds to a substrate of approximately 8.7 m ² (2.85 m × 3.05 m). Even higher generations such as the 11th and 12th generations and corresponding substrate areas can be applied in a similar manner.

The name "substrate" as used herein may include a non-flexible substrate and a flexible substrate. The flexible substrate is exemplified by a glass substrate, a wafer, a transparent wafer such as sapphire or the like, or a glass plate. The flexible substrate is, for example, a web or a foil. According to several embodiments, which can be combined with other embodiments described herein, the various embodiments described herein can be used for display PVD, for example for sputtering deposition on a large area substrate.

In conclusion, the present invention has been disclosed in the above embodiments, but it is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

10‧‧‧Substrate

20‧‧‧shading device

23‧‧‧ openings or holes

30‧‧‧Sedimentary source

32‧‧‧ Path

34‧‧‧Red Pixels

36‧‧‧Green pixels

38‧‧‧Blue pixels

40‧‧‧Vertical direction

50, 60‧‧‧ horizontal direction

200‧‧‧mask assembly

210‧‧‧ Carrier

310‧‧‧Mask support

450‧‧‧ arrow

510‧‧‧mask frame

515‧‧‧fasteners

522‧‧‧First frame element

524‧‧‧Second frame element

526‧‧‧ Third frame component

528‧‧‧Fourth frame component

610, 615‧‧‧ magnetic unit

620, 625, 821, 822, 823, 824, 825, 915, 925 ‧ ‧ magnetic levitation force

630, 640‧‧‧ upper edge

642, 652, 742, 752‧‧‧ reference axis

650‧‧‧ lower edge

692‧‧‧First direction

694‧‧‧second direction

910‧‧‧The first set of magnetic levitation forces

912, 914‧‧‧ measuring devices

920‧‧‧Second group of magnetic levitation forces

1000‧‧‧ equipment

1010‧‧‧Control unit

1120‧‧‧Processing chamber

1210‧‧‧First passive magnetic unit

The disclosures that are sufficient and capable of being implemented by those of ordinary skill in the art are more particularly provided for the remainder of the description, and the remainder of the description includes reference to the accompanying drawings, in which: FIG. A schematic diagram showing a deposition process for fabricating an OLED; FIG. 2 is a schematic diagram of a mask assembly in a horizontal orientation; and FIG. 3 is a schematic diagram of a mask assembly in a horizontal orientation, the mask assembly including a mask Figure 4 is a schematic view of the mask assembly in a vertical orientation; Figure 5 is a schematic view of the mask assembly in a vertical orientation, the mask assembly including the mask support; Figure 6-7 A schematic diagram showing a method according to the embodiments described herein; FIGS. 8a-b are schematic views showing deformation of a carrier provided by a plurality of magnetic levitation forces; and FIGS. 9a-b are diagrams showing embodiments according to the embodiments herein A schematic of the method; and Figures 10-12 illustrate schematic views of an apparatus in accordance with embodiments described herein.

Claims (20)

A method comprising: a non-contact suspension-mask assembly (200), the mask assembly comprising a carrier (210) and a shielding device (20) supported by the carrier; and when the mask assembly is non- When contacting the suspension, one of the shapes of the carrier is controlled. The method of claim 1, wherein the mask assembly is non-contact suspended by a plurality of magnetic levitation forces (620, 920), the shape of the carrier being controlled by controlling the magnetic levitation forces . The method of claim 2, wherein the at least two magnetic levitation forces of the magnetic levitation forces have different sizes. The method of claim 1, wherein the controlling the shape of the carrier comprises providing a deformation of the carrier. The method of claim 2, wherein controlling the shape of the carrier comprises providing a deformation of the carrier. The method of claim 3, wherein the controlling the shape of the carrier comprises providing a deformation of the carrier. The method of any one of claims 1 to 6, wherein the shape of the carrier is controlled to align the screening device. The method of any one of claims 1 to 6, wherein the mask assembly further comprises a mask support (310), the shielding device being coupled to the mask support, the mask support Connected to the carrier. The method of claim 8, wherein the mask support is a mask frame (510). The method of claim 8, wherein the shape of the carrier is controlled to compensate for deformation of one of the mask supports. The method of claim 9, wherein the shape of the carrier is controlled to compensate for deformation of one of the mask supports. The method of claim 8, wherein the mask support is a mask frame (510), the mask frame comprising a first frame member (522), wherein the shape of the carrier is controlled Aligning the first frame member in a substantially horizontal direction. The method of claim 10, wherein the mask support is a mask frame (510), the mask frame comprising a first frame member (522), wherein the shape of the carrier is controlled Aligning the first frame member in a substantially horizontal direction. The method of any one of claims 1 to 6, wherein the shape of the carrier is specifically controlled by a plurality of non-contact forces. A method includes: non-contact suspension of a first mask assembly by a first set of magnetic levitation forces (910), the first mask assembly including a first carrier and a first shielding device, the first shielding device The first carrier support; measuring the alignment of one of the first shielding devices when the first mask assembly is non-contact suspended by the first set of magnetic levitation forces; calculating a second set of magnetic levitation forces (920); The mask assembly includes a carrier and a shielding device supported by the carrier by the second set of magnetic levitation force non-contact suspension mask assembly, wherein the mask assembly is the first mask assembly Or a second mask assembly; wherein the second set of magnetic levitation forces provides deformation of one of the carriers. The method of claim 15, wherein the at least two magnetic levitation forces of the second set of magnetic levitation forces have different sizes. The method of any one of claims 15 and 16, further comprising: determining, from the at least the alignment of the first screening device, the deviation of the shape of the first shielding device from a target shape . A device (1000) comprising: a magnetic suspension system comprising a plurality of magnetic units (610); a mask assembly (200) comprising a carrier (210) and a screening device (20), the shielding device being supported by the carrier Supporting; and a control unit (1010) coupled to the magnetic units; wherein the apparatus is assembled for controlling the shape of one of the carriers when the mask assembly is in non-contact suspension. The apparatus of claim 18, wherein the control unit is assembled for controlling the shape of the carrier when the mask assembly is in non-contact suspension. The apparatus of any one of claims 18 and 19, further comprising one or more measuring devices (912, 914) configured to measure alignment of one of the screening devices.