TW201921153A - Exposure device comprising a substrate supply device and a substrate winding device - Google Patents

Exposure device comprising a substrate supply device and a substrate winding device Download PDF

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TW201921153A
TW201921153A TW107132014A TW107132014A TW201921153A TW 201921153 A TW201921153 A TW 201921153A TW 107132014 A TW107132014 A TW 107132014A TW 107132014 A TW107132014 A TW 107132014A TW 201921153 A TW201921153 A TW 201921153A
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substrate
exposure
long
winding
exposure table
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TW107132014A
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Chinese (zh)
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TWI741215B (en
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山賀勝
緑川悟
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日商奧克製作所股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075Handling workpieces outside exposure position, e.g. SMIF box
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H20/00Advancing webs
    • B65H20/02Advancing webs by friction roller
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Winding Of Webs (AREA)

Abstract

An exposure device including a Roll to Roll carrier (RtoR) transport system, wherein exposure is performed while meandering of a long substrate is suppressed. In an exposure device 10 including a RtoR transport system that transports long substrates W1 and W2, the following is provided: a substrate supply device 20, which fixes and holds supply reels 22A and 22B disposed on the upstream side of an exposure table 15; a substrate winding device 30, which fixes and holds winding reels 32A and 32B disposed on the downstream side. At the time exposure is activated, the exposure table 15 is moved in an X direction by a table moving mechanism 50, and the substrate supply device 20 and the substrate winding device 30 are moved together in the X direction by a conveyor moving mechanism 60 simultaneously.

Description

曝光裝置Exposure device

本發明係有關於一種曝光裝置,該曝光裝置係藉輥對輥搬運系統(Roll to Roll carrier,以下稱為RtoR搬運系統)搬運軟性印刷基板等之長條基板(工件)。The present invention relates to an exposure apparatus that transports a long substrate (workpiece) such as a flexible printed substrate by a roll-to-roll carrier system (hereinafter referred to as an RtoR carrier system).

在包括RtoR搬運系統之曝光裝置,分別在曝光工作台之上游側配置供給捲盤(供給捲筒),並在下游側配置捲繞捲盤(捲繞捲筒),在將印刷配線基板等之長條基板捲繞於供給捲盤、捲繞捲盤後,一面向上游側~下游側搬運一面進行曝光。In the exposure device including the RtoR conveying system, a supply reel (supply roll) is arranged on the upstream side of the exposure table, and a winding reel (roll reel) is arranged on the downstream side. After the long substrate is wound around the supply reel and the winding reel, it is exposed while being conveyed while facing the upstream side to the downstream side.

具體而言,一面使吸附並支撐長條基板之背面的曝光工作台沿著長條基板搬運方向移動,一面藉設置於長條基板之上方的曝光頭投影與投影區域(曝光對象區域)之位置對應的圖案光。曝光工作台移動至曝光結束位置時,曝光工作台下降,向最初之曝光位置回位。藉由重複地進行相同的曝光動作,對長條基板整體形成圖案。 [先行專利文獻] [專利文獻]Specifically, while the exposure table that sucks and supports the back of the long substrate is moved along the long substrate conveying direction, the position of the projection and projection area (exposure target area) of the exposure head provided above the long substrate is moved. Corresponding pattern light. When the exposure table is moved to the exposure end position, the exposure table is lowered and returned to the original exposure position. By repeating the same exposure operation, the entire long substrate is patterned. [Patent Literature] [Patent Literature]

[專利文獻1]日本特開2015-222370號公報[Patent Document 1] Japanese Patent Laid-Open No. 2015-222370

[發明所欲解決之課題][Problems to be Solved by the Invention]

以往之RtoR搬運系統係被固定於曝光裝置之基座(框體)。因此,長條基板係在曝光開始時從供給捲盤間歇地被拉出,並向下游側被送出。又,在曝光結束後伴隨曝光工作台向上游側回位,有發生長條基板之向上游側之倒捲的情況。由於這種基板之移動,而在長條基板發生蛇行,又發生曝光位置偏差、或長條基板之翹曲、皺紋或擦傷等的損害。尤其,在使複數條長條基板並行並同時進行曝光的情況,蛇行調整變成困難。The conventional RtoR transport system is fixed to the base (frame) of the exposure apparatus. Therefore, the long substrate is intermittently pulled out from the supply reel at the start of exposure, and is sent out to the downstream side. In addition, after the exposure is completed, the exposure stage may be returned to the upstream side, and the long substrate may be rolled back to the upstream side. Due to the movement of such a substrate, meandering occurs in the long substrate, and damage to the long substrate such as warping, wrinkling, or abrasion of the long substrate occurs. In particular, when a plurality of long substrates are exposed in parallel and exposed at the same time, the meandering adjustment becomes difficult.

因此,要求構成可確實地抑制長條基板之蛇行的基板搬運系統。 [解決課題之手段]Therefore, it is required to construct a substrate transfer system capable of reliably suppressing the meandering of the long substrate. [Means for solving problems]

本發明之曝光裝置係包括:曝光工作台,係支撐長條基板,並可沿著基板搬運線路進行往復移動;基板供給部,係被配置於曝光工作台的上游側,並設置供給捲盤;以及基板捲繞部,係被配置於曝光工作台的下游側,並設置捲繞捲盤。此處之「上游側」係支援曝光工作台之供給捲盤側,「下游側」係表示捲繞捲盤側。The exposure device of the present invention includes: an exposure table that supports a long substrate and can reciprocate along a substrate conveying line; a substrate supply unit that is arranged on the upstream side of the exposure table and is provided with a supply reel; The substrate winding section is arranged on the downstream side of the exposure table, and a winding reel is provided. Here, the "upstream side" refers to the supply reel side supporting the exposure table, and the "downstream side" refers to the winding reel side.

例如,可構成為基板供給部係包括上游側支撐輥,基板捲繞部設置下游側支撐輥。又,亦可由並列之複數條長條基板構成長條基板。曝光工作台係只要構成為例如一面吸附並固持長條基板一面移動,且可升降即可。For example, the substrate supply unit may include an upstream support roller, and the substrate winding unit may include a downstream support roller. The long substrate may be formed of a plurality of long substrates arranged in parallel. The exposure stage is only required to be configured to move while lifting and holding a long substrate, for example.

在本發明,基板供給部與基板捲繞部係可沿著基板搬運線路移動。此處之「基板搬運線路」係表示基板之被送出的方向或其反方向,並對應於曝光工作台之移動方向。只要作成在曝光動作時,基板供給部與基板捲繞部配合曝光工作台之移動而移動即可。In this invention, a board | substrate supply part and a board | substrate winding part are movable along a board | substrate conveying line. The "substrate transfer line" here means the direction in which the substrate is sent out or the opposite direction, and corresponds to the moving direction of the exposure table. It is only necessary that the substrate supply section and the substrate winding section are moved in accordance with the movement of the exposure table during the exposure operation.

作為曝光裝置,係可設置:工作台移動機構,係使曝光工作台沿著基板搬運線路進行往復移動;及搬運部移動機構,係使基板供給部與基板捲繞部沿著基板搬運線路進行往復移動。搬運部移動機構係例如可藉一台移動機構使基板供給部與基板捲繞部連動,即,成一體地移動。As the exposure device, a table moving mechanism can be provided to reciprocate the exposure table along the substrate transfer line; and a transfer unit moving mechanism can reciprocate the substrate supply portion and the substrate winding portion along the substrate transfer line. mobile. The conveying section moving mechanism can move the substrate supply section and the substrate winding section in an integrated manner, for example, by a single moving mechanism.

亦可設置移動控制部,該移動控制部係以維持曝光工作台與基板供給部及基板捲繞部之相對之位置關係的方式控制基板供給部與基板捲繞部的移動。例如,設置感測器,該感測器係偵測基板供給部與基板捲繞部之至少一方和曝光工作台的距離間隔,移動控制部因應於所檢測出之距離間隔,控制曝光工作台與基板供給部及基板捲繞部的移動即可。A movement control unit may be provided to control the movement of the substrate supply unit and the substrate winding unit so as to maintain a relative positional relationship between the exposure table and the substrate supply unit and the substrate winding unit. For example, a sensor is provided, which detects the distance between at least one of the substrate supply section and the substrate winding section and the exposure table, and the movement control section controls the exposure table and the exposure table in accordance with the detected distance interval. The substrate supply section and the substrate winding section may be moved.

本發明之其他的形態的曝光裝置係包括:曝光工作台,係支撐並列之複數條長條基板,並可沿著基板搬運線路進行往復移動;及複數對捲盤對,係分別相對向地被配置於曝光工作台之兩側,並搬運複數條長條基板;複數對捲盤對係與曝光工作台一起可沿著基板搬運線路進行往復移動。The exposure apparatus according to another aspect of the present invention includes: an exposure table that supports a plurality of long substrates arranged in parallel and can reciprocate along a substrate conveying line; and a plurality of pairs of reels that are relatively opposed to each other. It is arranged on both sides of the exposure table, and carries a plurality of long substrates; the pair of reel pairs and the exposure table can reciprocate along the substrate conveying line.

亦可複數對捲盤對在同一方向捲繞複數條長條基板,又,亦可構成為複數對捲盤對中至少一對捲盤對在與其他的長條基板相異的方向捲繞。A plurality of reel pairs may be used to wind a plurality of long substrates in the same direction, and at least one reel pair may be wound in a direction different from other long substrates.

本發明之其他的形態的曝光裝置係包括:曝光工作台,係支撐長條基板;一對捲盤,係分別被配置於曝光工作台之上游側與下游側;以及曝光部,係對長條基板進行曝光;曝光部係對曝光工作台及一對捲盤,可沿著基板搬運線路相對地移動。 [發明之效果]An exposure apparatus according to another aspect of the present invention includes: an exposure table supporting a long substrate; a pair of reels arranged on the upstream side and the downstream side of the exposure table; and an exposure section for the long bar. The substrate is exposed; the exposure section moves the exposure table and a pair of reels relatively along the substrate conveying line. [Effect of the invention]

若依據本發明,在包括RtoR搬運系統之曝光裝置,可一面抑制長條基板之蛇行一面進行曝光。According to the present invention, the exposure device including the RtoR transport system can perform exposure while suppressing the meandering of the long substrate.

在以下,參照圖面,說明本發明之實施形態。Hereinafter, embodiments of the present invention will be described with reference to the drawings.

圖1係本實施形態之曝光裝置之示意的構成圖。圖2係在模式上表示曝光裝置之一部分的立體圖。圖3係曝光裝置之示意的方塊圖。FIG. 1 is a schematic configuration diagram of an exposure apparatus according to this embodiment. FIG. 2 is a perspective view schematically showing a part of the exposure device. FIG. 3 is a schematic block diagram of an exposure apparatus.

曝光裝置10係包括一面搬運被捲繞成滾筒狀之長條基板W一面進行曝光動作之RtoR搬運系統的曝光裝置,並包括基板供給裝置20、基板捲繞裝置30、以及曝光部40。長條基板W係在此處是捲繞在對長條薄膜已形成銅薄膜層後塗佈(或黏貼)了光阻劑等的感光材料之長條薄膜狀的基板,而形成滾筒狀。如圖2所示,長條基板W係由寬度相同之2條(一對)基板W1、W2所構成。The exposure device 10 is an exposure device including an RtoR conveying system that performs an exposure operation while conveying a long substrate W wound into a roll shape, and includes a substrate supply device 20, a substrate winding device 30, and an exposure unit 40. The long substrate W is a long thin film-shaped substrate that is wound around a photosensitive material such as a photoresist after coating (or pasting) a copper thin film layer on the long film. As shown in FIG. 2, the long substrate W is composed of two (pair) substrates W1 and W2 having the same width.

曝光工作台(工作台)15係吸附長條基板W之背面並平坦地固持,且在背面吸附位置及與背面分開的既定分開位置之間可在Z方向升降,並藉未圖示之升降機構升降。曝光工作台15係如後述所示,由工作台移動機構50所支撐,並可沿著X方向移動。此外,在以下,以“X”表示沿著長條基板W之搬運方向(搬運線路)M的方向,以“Y”表示對搬運方向M垂直的方向(基板寬度方向),而且,以“Z”表示對X、Y垂直的方向(鉛垂方向)。The exposure table (table) 15 is designed to suck the back of the long substrate W and hold it flat, and it can be raised and lowered in the Z direction between the back suction position and a predetermined separation position separated from the back. Lifting. The exposure table 15 is supported by the table moving mechanism 50 as shown below, and is movable in the X direction. In the following, the direction along the conveying direction (conveying line) M of the long substrate W is indicated by "X", the direction (substrate width direction) perpendicular to the conveying direction M is indicated by "Y", and "Z" "Indicates a direction (vertical direction) perpendicular to X and Y.

曝光部40係被配置於從長條基板W1、W2在Z方向相距既定距離的位置,並經由未圖示之機架被固定於基座10B。如圖3所示,曝光部40係由複數個曝光頭所構成,該複數個曝光頭係各自包括半導體雷射光等之光源41、照明光學系統42、使複數個微反射鏡進行陣列排列之DMD(Digital Micro-mirror Device)43以及成像光學系統44等,對各曝光頭,規定沿著搬運方向M的曝光區域。光源41係藉光源控制部110所驅動。The exposure unit 40 is disposed at a predetermined distance from the long substrates W1 and W2 in the Z direction, and is fixed to the base 10B via a rack (not shown). As shown in FIG. 3, the exposure unit 40 is composed of a plurality of exposure heads, each of which includes a light source 41 such as a semiconductor laser light, an illumination optical system 42, and a DMD in which a plurality of micromirrors are arrayed. (Digital Micro-mirror Device) 43 and imaging optical system 44 etc. define the exposure area along the conveyance direction M for each exposure head. The light source 41 is driven by the light source control section 110.

各曝光頭之DMD係根據與從曝光控制部120所傳來之曝光區域位置對應的繪圖資料(光域資料),將微反射鏡之姿勢定位,藉此,將圖案光投影至長條基板W1、W2。藉由因應於對曝光部40之長條基板W1、W2的相對移動來切換微反射鏡之姿勢,對長條基板W1、W2之感光材料進行曝光(多重曝光等),藉此,形成圖案。控制器100(參照圖3)係控制曝光裝置10之曝光動作整體。此外,亦可藉使用遮罩之曝光部構成。The DMD of each exposure head is based on the drawing data (light field data) corresponding to the position of the exposure area transmitted from the exposure control unit 120, and positions the micromirror to position the pattern light onto the long substrate W1. , W2. The positions of the micro-mirrors are switched in accordance with the relative movement of the long substrates W1 and W2 of the exposure unit 40, and the photosensitive materials of the long substrates W1 and W2 are exposed (multiple exposure, etc.) to form a pattern. The controller 100 (see FIG. 3) controls the entire exposure operation of the exposure device 10. In addition, it can also be constituted by using an exposure portion of a mask.

基板供給裝置20係包括:供給捲盤22A、22B,係被配置於曝光工作台15的上游側;支撐輥24;以及驅動機構(未圖示),係分別使供給捲盤22A、22B進行軸轉動。驅動機構係由例如步進馬達等所構成。藉基板供給裝置20所懸臂支撐的供給捲盤22A、22B係分別以捲繞成滾筒狀之狀態保持並固定長條基板W1、W2的未曝光部分,又,藉由進行軸轉動,可向下游側送出長條基板W。此外,從曝光工作台15觀察,將供給捲盤22A、22B側當作“上游側”,並將捲繞捲盤32A、32B側當作“下游側”。The substrate supply device 20 includes: supply reels 22A and 22B, which are arranged on the upstream side of the exposure table 15; a support roller 24; and a drive mechanism (not shown) for rotating the supply reels 22A and 22B Turn. The driving mechanism is constituted by, for example, a stepping motor. The supply reels 22A and 22B supported by the substrate supply device 20 are cantilevered to hold and fix the unexposed portions of the long substrates W1 and W2 in a state of being wound into a roll, and can be rotated downstream by rotating the shaft The long substrate W is fed out sideways. In addition, when viewed from the exposure table 15, the supply reels 22A and 22B are regarded as the “upstream side” and the winding reels 32A and 32B are regarded as the “downstream side”.

基板捲繞裝置30係包括:捲繞捲盤32A、32B,係被配置於曝光工作台15的下游側;支撐輥34;以及驅動機構(未圖示),係分別使捲繞捲盤32A、32B進行軸轉動。捲繞捲盤32A、32B係分別在捲繞成滾筒狀之狀態保持並固定長條基板W1、W2的已曝光部分,又,藉由進行軸轉動,可捲繞長條基板W1、W2。藉基板供給裝置20、基板捲繞裝置30之長條基板W1、W2的捲繞處理等係由搬運控制部130(參照圖3)所控制。The substrate winding device 30 includes: winding reels 32A and 32B, which are arranged downstream of the exposure table 15; a support roller 34; and a driving mechanism (not shown), which makes the winding reels 32A and 32A, respectively. 32B performs shaft rotation. The winding reels 32A and 32B respectively hold and fix the exposed portions of the long substrates W1 and W2 in a state of being wound into a roll, and the long substrates W1 and W2 can be wound by rotating the shaft. The winding processing of the long substrates W1 and W2 by the substrate supply device 20 and the substrate winding device 30 is controlled by the conveyance control unit 130 (see FIG. 3).

在供給捲盤22A、22B、捲繞捲盤32A、32B與曝光工作台15之間分別配置的支撐輥24、34係支撐長條基板W1、W2,並構成為在搬運長條基板W1、W2時進行軸轉動的張力調節輥。支撐輥24、34係以長條基板W1、W2在曝光面高度或比曝光面高度稍低之位置向下游側移動的方式調整其高度,並分別由基板供給裝置20、基板捲繞裝置30所懸臂支撐。在長條基板W1、W2,適當之張力作用於支撐輥24、34之區間T(參照圖1)的架設部分,長條基板W1、W2係在無皺紋或伸長之狀態被搬運下去。The support rollers 24 and 34 respectively disposed between the supply reels 22A and 22B, the winding reels 32A and 32B, and the exposure table 15 support the long substrates W1 and W2 and are configured to transport the long substrates W1 and W2. The tension adjustment roller is rotated at the time of shaft rotation. The support rollers 24 and 34 adjust the height of the long substrates W1 and W2 so that they are moved downstream at the exposure surface height or a position slightly lower than the exposure surface height, and are controlled by the substrate supply device 20 and the substrate winding device 30 respectively Cantilever support. In the long substrates W1 and W2, an appropriate tension acts on the erection portion of the interval T (see FIG. 1) of the support rollers 24 and 34, and the long substrates W1 and W2 are carried without wrinkles or elongation.

供給捲盤22A、22B及捲繞捲盤32A、32B係包括在安裝基板時固定長條基板W1、W2之滾筒狀的捲繞部分之周知的機構26A、26B及36A、36B。又,基板供給裝置20、基板捲繞裝置30之各個的驅動機構係分別使供給捲盤22A與捲繞捲盤32A、供給捲盤22B與捲繞捲盤32B進行同步轉動,而對長條基板W1、W2間歇地只搬運既定長度。The supply reels 22A and 22B and the winding reels 32A and 32B are well-known mechanisms including 26A, 26B, 36A, and 36B that include roll-shaped winding portions for fixing the long substrates W1 and W2 when the substrate is mounted. The drive mechanisms of the substrate supply device 20 and the substrate winding device 30 rotate the supply reels 22A and 32A, and the supply reels 22B and 32B, respectively, to rotate the long substrate W1 and W2 intermittently carry only a predetermined length.

工作台移動機構50係包括:移動構件52,係配備對曝光工作台15懸臂支撐的升降機構(未圖示);及一對導軌54A、54B與致動器55,係被設置於基座10B。一對導軌54A、54B係沿著X方向延伸,移動構件52係可沿著導軌54A、54B在X方向及其反方向移動。致動器55係由例如滾珠螺桿所構成。The table moving mechanism 50 includes a moving member 52 provided with a lifting mechanism (not shown) for cantilevering the exposure table 15 and a pair of guide rails 54A and 54B and an actuator 55 provided on the base 10B. . The pair of guide rails 54A and 54B extend along the X direction, and the moving member 52 is movable along the guide rails 54A and 54B in the X direction and the opposite direction thereof. The actuator 55 is composed of, for example, a ball screw.

搬運部移動機構60係包括板狀之移動構件62、及被設置於基座10B之一對導軌64A、64B與致動器65。基板供給裝置20與基板捲繞裝置30係被搭載於移動構件62之上,並成一體地移動(連動)。一對導軌64A、64B係沿著X方向延伸,移動構件62係可沿著導軌64A、64B在X方向及其反方向移動。The transport unit moving mechanism 60 includes a plate-shaped moving member 62, and a pair of guide rails 64A and 64B and an actuator 65 provided on one of the bases 10B. The substrate supply device 20 and the substrate winding device 30 are mounted on a moving member 62 and are moved (interlocked) integrally. A pair of guide rails 64A and 64B extend along the X direction, and the moving member 62 can move along the guide rails 64A and 64B in the X direction and the opposite direction.

在基座10B所設置之移動控制部70係控制致動器55、65之驅動,而維持搬運系統(基板供給裝置20及基板捲繞裝置30)與曝光工作台15之相對的位置關係。即,以相對之距離間隔成為定值的方式對曝光工作台15與基板供給裝置20、基板捲繞裝置30之移動進行回授控制。The movement control unit 70 provided in the base 10B controls the driving of the actuators 55 and 65 and maintains the relative positional relationship between the transport system (the substrate supply device 20 and the substrate winding device 30) and the exposure table 15. That is, the movement of the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 is fed back so that the relative distance interval becomes a constant value.

為了測量曝光工作台15與基板供給裝置20(基板捲繞裝置30)之沿著搬運方向M之相對的距離間隔,將位置檢測用光感測器90配置於基板供給裝置20之與曝光工作台15相對向的側面(參照圖2)。位置檢測用光感測器90係內建LED等的光源,並照射曝光工作台15的側面。曝光工作台15的側面係以在光的照射位置位於基準位置與基準位置以外的位置之間發生光量差的方式所形成。移動控制部70係根據因應於檢測光量之相對的距離間隔與成為基準之相對的距離間隔之差,控制致動器55、65。In order to measure the relative distance between the exposure table 15 and the substrate supply device 20 (the substrate winding device 30) along the conveying direction M, a position detection light sensor 90 is arranged on the substrate supply device 20 and the exposure table. 15 opposite side (see FIG. 2). The position detection light sensor 90 is a built-in light source such as an LED, and illuminates the side surface of the exposure table 15. The side surface of the exposure table 15 is formed so that a difference in light amount occurs between a position where the light is irradiated is located at a reference position and a position other than the reference position. The movement control unit 70 controls the actuators 55 and 65 based on the difference between the relative distance interval corresponding to the detected light amount and the relative distance interval serving as a reference.

在曝光工作台15的支撐輥24側,設置檢測出長條基板W1、W2各自之端面位置的位置感測器80。位置感測器80係可由例如線感測器等之透過式光感測器所構成。基板供給措置20與基板捲繞裝置30係分別包括控制供給捲盤22A、22B與捲繞捲盤32A、32B之軸向位置的機構(未圖示),並因應於所檢測出之端面位置,調整捲盤軸向位置,而可修正蛇行行駛。A position sensor 80 is provided on the support roller 24 side of the exposure table 15 to detect the position of each of the end faces of the long substrates W1 and W2. The position sensor 80 may be a transmissive light sensor such as a line sensor. The substrate supply device 20 and the substrate winding device 30 include a mechanism (not shown) for controlling the axial positions of the supply reels 22A and 22B and the winding reels 32A and 32B, respectively, and respond to the detected end positions. Adjust the axial position of the reel to correct the meandering.

圖4係表示曝光開始時與曝光結束時之曝光工作台及搬運系統之位置的圖。FIG. 4 is a diagram showing positions of an exposure table and a conveyance system at the start of exposure and the end of exposure.

曝光開始前,曝光工作台15係吸附並固持長條基板W1、W2,供給捲盤22A、22B與捲繞捲盤32A、32B係因為未被驅動,所以成為靜止狀態。伴隨曝光開始,曝光工作台15係沿著X方向以既定速度逐漸移動。在此時,基板供給裝置20及基板捲繞裝置30係配合曝光工作台15的移動而移動。Prior to the start of exposure, the exposure stage 15 is used to attract and hold the long substrates W1 and W2, and the supply reels 22A and 22B and the winding reels 32A and 32B are in a stationary state because they are not driven. As the exposure starts, the exposure table 15 moves gradually along the X direction at a predetermined speed. At this time, the substrate supply device 20 and the substrate winding device 30 are moved in accordance with the movement of the exposure table 15.

即,與曝光工作台15同步地開始移動,並以保持基板供給裝置20及基板捲繞裝置30與曝光工作台15之相對的位置關係的方式以與曝光工作台15相同的速度在X方向逐漸移動(並行)。因此,長條基板W1、W2係在曝光工作台15的移動前與曝光工作台15的移動中之間,向下游側未被送出,而對曝光工作台15靜止。在曝光工作台15的移動中,從曝光部40將與各曝光頭之曝光區域位置對應的圖案光投影。That is, the movement starts in synchronization with the exposure table 15 and gradually moves in the X direction at the same speed as the exposure table 15 so as to maintain the relative positional relationship between the substrate supply device 20 and the substrate winding device 30 and the exposure table 15. Move (parallel). Therefore, the long substrates W1 and W2 are not sent out to the downstream side between before the movement of the exposure table 15 and during the movement of the exposure table 15, and remain stationary to the exposure table 15. During the movement of the exposure table 15, the pattern light corresponding to the position of the exposure area of each exposure head is projected from the exposure section 40.

曝光工作台15與基板供給裝置20以及基板捲繞裝置30到達曝光結束位置時,曝光工作台15係解除長條基板W1、W2的吸附支撐,並下降。然後,供給捲盤22A、22B及捲繞捲盤32A、32B同步地轉動,而長條基板W1、W2係僅既定長度被捲繞於捲繞捲盤32A、32B。When the exposure stage 15, the substrate supply device 20 and the substrate winding device 30 reach the exposure end position, the exposure stage 15 releases the suction support of the long substrates W1 and W2 and descends. Then, the supply reels 22A and 22B and the winding reels 32A and 32B are rotated synchronously, and the long substrates W1 and W2 are wound on the winding reels 32A and 32B only by a predetermined length.

對捲繞捲盤32A、32B側之捲繞結束時,曝光工作台15與基板供給裝置20以及基板捲繞裝置30同步地移動,而向曝光開始位置回位。在此期間,供給捲盤22A、22B與捲繞捲盤32A、32B係因為未被驅動,所以成為靜止狀態。藉由重複上述之曝光動作,對長條基板W1、W2整體逐漸地形成圖案。When the winding on the winding reels 32A and 32B ends, the exposure table 15 moves in synchronization with the substrate supply device 20 and the substrate winding device 30 to return to the exposure start position. During this period, the supply reels 22A and 22B and the winding reels 32A and 32B are stationary because they are not driven. By repeating the above-mentioned exposure operation, the entire long substrates W1 and W2 are gradually patterned.

依此方式,若依據本實施形態,在包括搬運長條基板W1、W2之RtoR搬運系統的曝光裝置10,設置:基板供給裝置20,係固持在曝光工作台15之上游側所設置的供給捲盤22A、22B;及基板捲繞裝置30,係固持在下游側所設置的捲繞捲盤32A、32B。在曝光動作時,曝光工作台15係藉工作台移動機構50在X方向移動,同時,基板供給裝置20及基板捲繞裝置30藉搬運部移動機構60向X方向一起移動。In this way, according to this embodiment, the exposure device 10 including the RtoR conveying system for conveying the long substrates W1 and W2 is provided with a substrate supply device 20 that holds a supply roll provided upstream of the exposure table 15 The reels 22A and 22B and the substrate winding device 30 hold the winding reels 32A and 32B provided on the downstream side. During the exposure operation, the exposure table 15 is moved in the X direction by the table moving mechanism 50, and at the same time, the substrate supply device 20 and the substrate winding device 30 are moved together in the X direction by the transport unit moving mechanism 60.

因為基板搬運系統(基板供給裝置20、基板捲繞裝置30)與曝光工作台15一起移動,所以在曝光工作台15之移動開始前及移動中不會向下游側送出長條基板W1、W2。因此,抑制如以往的搬運系統之曝光中的蛇行行駛,而由蛇行行駛所引起之曝光位置偏差、或基板之皺紋的產生、翹曲等不會發生。又,藉由構成這種基板搬運系統,不必設置張力輥等之機構,所以能以簡單的構成構築基板搬運系統。Since the substrate transfer system (the substrate supply device 20 and the substrate winding device 30) moves with the exposure table 15, the long substrates W1 and W2 are not sent out to the downstream side before and during the movement of the exposure table 15. Therefore, the meandering travel during the exposure of the conventional conveying system is suppressed, and the deviation of the exposure position caused by the meandering travel, the occurrence of wrinkles on the substrate, warping, and the like do not occur. In addition, by constructing such a substrate conveying system, it is not necessary to provide a mechanism such as a tension roller, so that the substrate conveying system can be constructed with a simple configuration.

基板供給裝置20與基板捲繞裝置30係在曝光中僅在下游側之一方向送出長條基板W即可,不必倒捲。因此,可實現抑制了長條基板W之蛇行的圖案曝光。尤其,對搬運難調整蛇行之2條長條基板W的曝光裝置係適合。The substrate supply device 20 and the substrate winding device 30 only need to feed the long substrate W in one direction on the downstream side during exposure, and it is not necessary to rewind the substrate. Therefore, it is possible to realize pattern exposure in which the meandering of the long substrate W is suppressed. In particular, it is suitable for the exposure apparatus of the two long substrates W which are difficult to adjust and meander in conveyance.

因為基板搬運系統移動,所以可將基板搬運長度(供給捲盤22A、22B與捲繞捲盤32A、32B之間的基板長度)構成短。藉由基板搬運長度變短,長條基板W1、W2之皺紋、伸長等難發生,而可高精度地形成圖案。尤其,可構成只是設置一支支撐輥24、34就可送出長條基板W1、W2的搬運系統。Since the substrate conveyance system moves, the substrate conveyance length (the substrate length between the supply reels 22A and 22B and the winding reels 32A and 32B) can be made short. By shortening the substrate conveying length, wrinkles, elongation, and the like of the long substrates W1 and W2 are hard to occur, and patterns can be formed with high accuracy. In particular, it is possible to configure a conveying system capable of feeding the long substrates W1 and W2 by simply providing one support roller 24 or 34.

又,在曝光動作結束後,因為在曝光工作台15未吸附並支撐長條基板W1、W2之間向下游側送出並捲繞長條基板W1、W2,所以可圓滑地捲繞。在此時,因為基板搬運長度短,所以可實現在短時間的捲繞。In addition, after the exposure operation is completed, the long substrates W1 and W2 are sent out and wound to the downstream side between the long substrates W1 and W2 that are not attracted and supported by the exposure table 15, so that they can be smoothly wound. At this time, since the substrate carrying length is short, winding in a short time can be realized.

在本實施形態,曝光工作台15與基板搬運系統(基板供給裝置20、基板捲繞裝置30)係各自藉工作台移動機構50、搬運部移動機構60分別地驅動。就長條基板W1、W2而言,供給捲盤22A、22B之滾筒狀部分、捲繞捲盤32A、32B之滾筒狀部分的捲繞直徑係在長條基板W1、W2逐漸地被捲繞於基板捲繞裝置30的過程逐漸地變化,而重量平衡成為不固定。In this embodiment, the exposure table 15 and the substrate transfer system (the substrate supply device 20 and the substrate winding device 30) are respectively driven by the table moving mechanism 50 and the conveying section moving mechanism 60. For the long substrates W1 and W2, the winding diameters of the roll-shaped portions of the reels 22A and 22B and the roll-shaped portions of the winding reels 32A and 32B are gradually wound around the long substrates W1 and W2. The process of the substrate winding device 30 gradually changes, and the weight balance becomes unstable.

可是,藉由設置與工作台移動機構50係相異的搬運部移動機構60,即使長條基板W1、W2之重量平衡有變化,亦防止對曝光工作台15之移動控制有影響。又,可在直接利用以往的工作台移動機構下構築搬運系統。However, by providing the conveying section moving mechanism 60 which is different from the table moving mechanism 50, even if the weight balance of the long substrates W1 and W2 is changed, it is prevented from affecting the movement control of the exposure table 15. In addition, a conveying system can be constructed by directly using a conventional table moving mechanism.

另一方面,基板供給裝置20與基板捲繞裝置30係一樣地被移動構件62所固定、支撐,並成一體地移動。因為基板供給裝置20與基板捲繞裝置30連動,所以在基板供給裝置20與基板捲繞裝置30之間在相對的位置關係不會發生變化,而維持與曝光工作台15之相對的維持關係成為容易。又,能以一個驅動系統集中搬運部移動機構60。On the other hand, the substrate supply device 20 is fixed and supported by the moving member 62 in the same manner as the substrate winding device 30 and moves integrally. Since the substrate supply device 20 and the substrate winding device 30 are linked, the relative positional relationship between the substrate supply device 20 and the substrate winding device 30 does not change, and the relative maintaining relationship with the exposure stage 15 becomes easily. In addition, the conveyance unit moving mechanism 60 can be concentrated by one drive system.

另一方面,移動控制部70以在曝光工作台15的移動中,保持曝光工作台15與基板供給裝置20及基板捲繞裝置30之相對的位置關係的方式對致動器55、65進行驅動控制。藉此,抑制因供給捲盤22A、22B、捲繞捲盤32A、32B接近曝光工作台15而發生長條基板W1、W2之伸長、翹曲等,又可防止曝光位置偏差。On the other hand, the movement control unit 70 drives the actuators 55 and 65 so that the relative positional relationship between the exposure table 15 and the substrate supply device 20 and the substrate winding device 30 is maintained during the movement of the exposure table 15. control. Thereby, the elongated substrates W1 and W2 are prevented from being stretched and warped due to the supply reels 22A and 22B and the winding reels 32A and 32B approaching the exposure table 15, and the exposure position deviation can be prevented.

此外,亦可作成移動控制部70係在距離間隔成為臨限值以上時控制移動速度、加速度。或者,亦可對供給捲盤22A、22B及/或捲繞捲盤32A、32B進行軸轉動控制,調整成適當的張力作用於長條基板W1、W2。Alternatively, the movement control unit 70 may be configured to control the movement speed and acceleration when the distance interval becomes a threshold value or more. Alternatively, the supply reels 22A and 22B and / or the winding reels 32A and 32B may be controlled for shaft rotation, and adjusted to an appropriate tension to act on the long substrates W1 and W2.

亦可不僅2條長條基板W1、W2,而且使更多之複數條長條基板並列並同時搬運,又,亦可以一條長條基板構成。關於基板供給裝置20與基板捲繞裝置30,係亦可作成在機械上不令連結,而以不同的移動機構令移動。又,亦可作成以相同的移動機構使曝光工作台15與基板供給裝置20、基板捲繞裝置30移動。Not only the two long substrates W1 and W2, but also a plurality of long substrates may be transported side by side and carried at the same time, or it may be constituted by one long substrate. Regarding the substrate supply device 20 and the substrate winding device 30, it is also possible to make the substrate supply device 20 and the substrate supply device different from each other without moving them mechanically. In addition, the exposure table 15, the substrate supply device 20, and the substrate winding device 30 may be moved by the same moving mechanism.

在以上之實施形態,係將基板供給裝置20設置於曝光工作台15的上游側,將基板捲繞裝置30設置於曝光工作台15的下游側,並將供給捲盤22A、22B與捲繞捲盤32A、32B驅動成使長條基板W1、W2在同方向移動,但是亦可作成長條基板W1與W2彼此在反方向移動。In the above embodiment, the substrate supply device 20 is provided on the upstream side of the exposure table 15, the substrate winding device 30 is provided on the downstream side of the exposure table 15, and the supply reels 22A, 22B and the winding roll are provided. The disks 32A and 32B are driven to move the long substrates W1 and W2 in the same direction, but the long substrates W1 and W2 may also be moved in opposite directions to each other.

即,可在曝光工作台15的兩側設置2對捲盤,將供給捲盤、捲繞捲盤設置成朝向X方向捲繞一方之捲盤對,另一方面,將供給捲盤、捲繞捲盤設置成朝向-X方向捲繞另一方之捲盤對。在此情況,使組合了基板供給裝置與基板捲繞裝置之功能的一對搬運裝置對曝光工作台移動。依此方式構成為長條基板W1與W2彼此在反方向移動時,可減輕在曝光工作台之上游側與下游側的長條基板之重量平衡的變化。That is, two pairs of reels can be provided on both sides of the exposure table 15, and the supply reel and the winding reel can be set to wind one pair of reels in the X direction. The reel is set to wind the other reel pair in the -X direction. In this case, a pair of conveying devices that combine the functions of the substrate supply device and the substrate winding device are moved to the exposure table. When the long substrates W1 and W2 are moved in opposite directions to each other in this way, it is possible to reduce a change in the weight balance of the long substrates on the upstream side and the downstream side of the exposure table.

又,在以上之實施形態,係藉由曝光工作台15移動,實現長條基板W1、W2與曝光部40之相對移動而進行曝光,但是亦可作成將曝光工作台15固定於基座10B,曝光部40藉未圖示之移動裝置在基板搬運方向移動,藉此,進行相對移動。在此情況,以維持與曝光工作台15之相對之位置關係的方式將基板供給裝置20與基板捲繞裝置30固定於基座10B。In the above embodiment, the exposure stage 15 is moved to realize the relative movement of the long substrates W1 and W2 and the exposure unit 40 for exposure. However, the exposure stage 15 may be fixed to the base 10B. The exposure unit 40 is moved relative to the substrate conveyance direction by a moving device (not shown). In this case, the substrate supply device 20 and the substrate winding device 30 are fixed to the base 10B so as to maintain a relative positional relationship with the exposure table 15.

10‧‧‧曝光裝置10‧‧‧Exposure device

15‧‧‧曝光工作台15‧‧‧Exposure Workbench

20‧‧‧基板供給裝置20‧‧‧ substrate supply device

22A、22B‧‧‧供給捲盤22A, 22B‧‧‧Supply reels

30‧‧‧基板捲繞裝置30‧‧‧ substrate winding device

32A、32B‧‧‧捲繞捲盤32A, 32B‧‧‧‧Reel

40‧‧‧曝光部40‧‧‧Exposure Department

50‧‧‧工作台移動機構50‧‧‧Workbench moving mechanism

60‧‧‧搬運部移動機構60‧‧‧Transportation department moving mechanism

70‧‧‧移動控制部70‧‧‧Mobility Control Department

80‧‧‧位置感測器80‧‧‧ Position Sensor

90‧‧‧位置檢測用光感測器90‧‧‧Position sensor for position detection

[圖1]係本實施形態之曝光裝置之示意的構成圖。 [圖2]係在模式上表示曝光裝置之一部分的立體圖。 [圖3]係曝光裝置之示意的方塊圖。 [圖4]係表示曝光開始時與曝光結束時之曝光工作台及搬運系統之位置的圖。[FIG. 1] A schematic configuration diagram of an exposure apparatus according to this embodiment. FIG. 2 is a perspective view schematically showing a part of an exposure device. FIG. 3 is a schematic block diagram of an exposure apparatus. [Fig. 4] A diagram showing positions of an exposure table and a conveying system at the start of exposure and the end of exposure.

Claims (14)

一種曝光裝置,其特徵為包括: 曝光工作台,係支撐長條基板,並可沿著基板搬運線路進行往復移動; 基板供給部,係被配置於該曝光工作台的上游側,並設置供給捲盤;以及 基板捲繞部,係被配置於該曝光工作台的下游側,並設置捲繞捲盤; 該基板供給部及該基板捲繞部係可沿著基板搬運線路移動。An exposure device is characterized in that it includes: an exposure table supporting a long substrate and reciprocating along a substrate conveying line; a substrate supply section arranged on the upstream side of the exposure table and providing a supply roll The substrate and the substrate winding section are arranged on the downstream side of the exposure table and are provided with a winding reel. The substrate supply section and the substrate winding section are movable along a substrate conveying line. 如申請專利範圍第1項之曝光裝置,其中更包括: 工作台移動機構,係使該曝光工作台沿著基板搬運線路進行往復移動;及 搬運部移動機構,係使該基板供給部與該基板捲繞部沿著基板搬運線路進行往復移動。For example, the exposure device of the first patent application scope further includes: a table moving mechanism for reciprocating the exposure table along the substrate conveying line; and a conveying part moving mechanism for the substrate supply section and the substrate. The winding unit reciprocates along a substrate conveying line. 如申請專利範圍第1或2項之曝光裝置,其中更包括移動控制部,該移動控制部係以維持該曝光工作台與該基板供給部及該基板捲繞部之相對之位置關係的方式控制該基板供給部與該基板捲繞部的移動。For example, the exposure device of the scope of patent application No. 1 or 2, which further includes a movement control section, which is controlled in a manner to maintain the relative positional relationship between the exposure table and the substrate supply section and the substrate winding section. Movement of the substrate supply section and the substrate winding section. 如申請專利範圍第3項之曝光裝置,其中更包括感測器,該感測器係偵測該基板供給部與該基板捲繞部之至少一方和該曝光工作台的距離間隔; 該移動控制部係因應於所檢測出之距離間隔,控制該曝光工作台與該基板供給部及該基板捲繞部的移動。For example, the exposure device according to item 3 of the patent application scope further includes a sensor, which detects the distance between at least one of the substrate supply portion and the substrate winding portion and the exposure table; the movement control The system controls the movement of the exposure table, the substrate supply unit, and the substrate winding unit in accordance with the detected distance interval. 如申請專利範圍第1至4項中任一項之曝光裝置,其中該基板供給部與該基板捲繞部連動。For example, the exposure apparatus according to any one of claims 1 to 4, wherein the substrate supply section is linked to the substrate winding section. 如申請專利範圍第1至5項中任一項之曝光裝置,其中該基板供給部包括上游側支撐輥; 該基板捲繞部包括下游側支撐輥。For example, the exposure apparatus according to any one of claims 1 to 5, wherein the substrate supply section includes an upstream support roller; and the substrate winding section includes a downstream support roller. 如申請專利範圍第1至6項中任一項之曝光裝置,其中以並列之複數條長條基板構成該長條基板。For example, the exposure device according to any one of claims 1 to 6, wherein the elongated substrate is constituted by a plurality of juxtaposed substrates. 如申請專利範圍第1至7項中任一項之曝光裝置,其中該曝光工作台一面吸附並固持該長條基板一面移動,且可升降。For example, the exposure device according to any one of claims 1 to 7, wherein the exposure table is moved while being adsorbed and held by the long substrate while being lifted. 一種曝光裝置,其特徵為包括: 曝光工作台,係支撐長條基板,並可沿著基板搬運線路進行往復移動;及 一對捲盤,係分別被配置於該曝光工作台之上游側與下游側,並搬運該長條基板; 該一對捲盤係與該曝光工作台一起可沿著基板搬運線路進行往復移動。An exposure device, comprising: an exposure table supporting a long substrate and reciprocating along a substrate conveying line; and a pair of reels arranged on the upstream side and downstream of the exposure table, respectively Side, and carry the long substrate; the pair of reels can reciprocate along the substrate conveying line together with the exposure table. 如申請專利範圍第9項之曝光裝置,其中該一對捲盤係藉與該曝光工作台之移動機構係相異的移動機構可沿著基板搬運線路進行往復移動。For example, the exposure device of the ninth patent application range, wherein the pair of reels can be reciprocated along the substrate conveying line by a moving mechanism different from the moving mechanism of the exposure table. 一種曝光裝置,其特徵為包括: 曝光工作台,係支撐並列之複數條長條基板,並可沿著基板搬運線路進行往復移動;及 複數對捲盤對,係分別相對向地被配置於該曝光工作台之兩側,並搬運複數條長條基板; 該複數對捲盤對係與該曝光工作台一起可沿著基板搬運線路進行往復移動。An exposure device is characterized by comprising: an exposure table supporting a plurality of long substrates juxtaposed and capable of reciprocating movement along a substrate conveying line; and a plurality of pairs of reel pairs which are respectively disposed opposite to each other. Both sides of the exposure table carry a plurality of long substrates; the plurality of reel pairs and the exposure table can reciprocate along the substrate conveying line. 如申請專利範圍第11項之曝光裝置,其中該複數對捲盤對在同一方向捲繞該複數條長條基板。For example, the exposure device of the eleventh aspect of the patent application, wherein the plurality of reel pairs wind the plurality of long substrates in the same direction. 如申請專利範圍第11項之曝光裝置,其中該複數對捲盤對中至少一對捲盤對在與其他的長條基板相異的方向捲繞。For example, the exposure device of the eleventh aspect of the patent application, wherein at least one of the plurality of reel pairs is wound in a direction different from other long substrates. 一種曝光裝置,其特徵為包括: 曝光工作台,係支撐長條基板; 一對捲盤,係分別被配置於該曝光工作台之上游側與下游側;以及 曝光部,係對該長條基板進行曝光; 該曝光部係對該曝光工作台及該一對捲盤,可沿著基板搬運線路相對地移動。An exposure apparatus is characterized by comprising: an exposure table supporting a long substrate; a pair of reels arranged on the upstream side and the downstream side of the exposure table; and an exposure section for the long substrate Performing exposure; the exposure unit is relatively movable along the substrate conveying line to the exposure table and the pair of reels.
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