JP4845757B2 - Drawing apparatus and method - Google Patents

Description

  The present invention relates to a drawing apparatus and method for drawing a two-dimensional pattern on a substrate, and more particularly to a drawing apparatus and method for drawing by moving a substrate relative to a drawing unit.

  As a drawing apparatus as described above, a spatial light modulation element such as a digital micromirror device (DMD) is provided in the drawing unit, the DMD is driven and controlled based on the drawing data, and the light beam is modulated. Various digital exposure apparatuses (also called multi-beam exposure apparatuses) that perform drawing (exposure) have been proposed. The DMD is a mirror device in which a minute micromirror is swingably attached to each memory cell (SRAM cell) arranged two-dimensionally on a semiconductor substrate, and corresponds to data (charge) written in each memory cell. The angle of the reflecting surface of the micromirror is changed by electrostatic force.

  In addition, as a digital exposure apparatus, a drawing unit is arranged so as to straddle the exposure surface of the substrate in one direction, the substrate is moved relative to the drawing unit in a direction orthogonal to the one direction, and drawing is performed in accordance with the movement. There has been proposed an apparatus that forms an image on the entire exposure surface by changing data applied to the DMD of a part. This digital exposure system enables drawing on large substrates such as printed circuit boards and glass substrates for flat panel displays, but the processing time (takt time) required for each substrate is long and production is possible. There is a problem that the nature is low.

Therefore, in order to improve productivity, two moving stages that move from the “substrate mounting position” through the drawing unit to the “substrate extraction position” are provided, and drawing on the substrate is performed on one moving stage. Meanwhile, there has been proposed a digital exposure apparatus configured to perform processing such as substrate exchange and alignment measurement of a newly mounted substrate on the other moving stage (see Patent Document 1).
JP 2005-37914 A

  However, in the apparatus described in Patent Document 1, the substrate mounting position of each moving stage is the same (the substrate extracting position is also the same), and when returning one moving stage from the substrate extracting position to the substrate mounting position after the drawing is completed, Since the moving stage and the moving path pass each other, the moving stages are separated in the vertical direction so as not to interfere with each other at the time of the passing to avoid the interference. That is, the apparatus described in Patent Document 1 requires a mechanism for avoiding interference on the movement path between the movement stages, and there is a problem that the configuration of the apparatus becomes complicated.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a drawing apparatus and method capable of simplifying the apparatus while improving productivity.

  In order to achieve the above object, a drawing apparatus according to the present invention includes a drawing unit that sequentially draws a substrate passing through a drawing region based on drawing data, and a substrate on each side of the drawing unit. A moving means for alternately reciprocating each substrate relative to the drawing means so as to pass through the drawing area, and the drawing means are controlled, and one substrate passes through the drawing area in one direction. Drawing control means for performing drawing in one period and a second period in which the other substrate passes through the drawing area in a direction opposite to the one direction; and the drawing data in the first period and the second period And a drawing data changing means for changing.

  The drawing data changing means preferably changes the drawing data so that the same pattern is drawn on each substrate in the first period and the second period.

  Further, a substrate position detecting means for detecting a positional deviation amount with respect to an appropriate position of each substrate, and a drawing data correcting means for correcting the drawing data based on the positional deviation amount detected by the substrate position detecting means, It is preferable to provide.

  Further, it is preferable that the substrate position detecting unit detects a positional deviation amount with respect to the other substrate while the drawing unit performs drawing on the one substrate.

  The moving means includes two moving stages that move on the same one-dimensional trajectory by placing a substrate on the surface, and the drawing means is fixed on the one-dimensional trajectory through which each moving stage passes. It is preferable that they are arranged. In this case, it is preferable that the substrate position detecting means is provided for each moving stage and fixedly arranged on the one-dimensional trajectory.

  In addition, examples of the drawing unit include those that expose the substrate, and it is preferable to include a spatial light modulation element that modulates incident light based on the drawing data. The spatial light modulation element is preferably a digital micromirror device. Further, it is preferable that the drawing unit includes a plurality of rows of exposure heads each including the spatial light modulation element in a direction orthogonal to a movement path of the substrate.

  Further, it is preferable that a substrate exchanging unit for alternately exchanging each substrate at a position symmetrical with respect to the drawing unit is provided.

  In order to achieve the above object, according to the drawing method of the present invention, a substrate is arranged on both sides of a drawing unit that sequentially draws on a substrate passing through a drawing region based on drawing data, and the drawing region Each substrate is alternately reciprocated relative to the drawing unit so as to pass through the first period, and one substrate passes through the drawing region in one direction, and the other substrate is in the one direction. Drawing is performed in the second period passing through the drawing area in the reverse direction, and the drawing data is changed between the first period and the second period.

  In the present invention, two substrates are reciprocated on the same one-dimensional trajectory, and drawing is performed alternately by the drawing means provided on the trajectory. Work and alignment measurement can be performed, and productivity can be improved. Further, since the substrates do not pass each other during the movement, it is not necessary to provide a conventional interference avoidance mechanism, and the apparatus can be simplified.

  In FIG. 1, a digital exposure apparatus 10 includes first and second moving stages 12a and 12b having a flat plate shape for moving a drawing target substrate 11 by sucking and holding the substrate 11 on the surface. The substrate 11 is a printed board or a glass substrate for a flat panel display, and a photosensitive material is applied or pasted on the surface thereof. Two guide rails 15 extend in parallel with each other along the longitudinal direction (Y direction) on the upper surface of the flat substrate 14 supported by the four legs 13. The first and second moving stages 12a and 12b are supported by the guide rail 15 so as to be reciprocally movable on the same one-dimensional trajectory, and include first and second moving stage driving units 51a and 51a configured by a linear motor or the like. Each is driven by 51b (see FIG. 5).

  A gate-shaped gate 16 is erected on the center of the base 14 in the Y direction so as to straddle the guide rail 15, and an exposure unit 17 is attached to the gate 16. The exposure unit 17 includes a total of 16 exposure heads 18 arranged in a plurality of rows (for example, 2 rows) in a direction orthogonal to the movement path of the first and second movement stages 12a and 12b, and the first and second movement stages. It is fixedly arranged on the movement paths 12a and 12b.

  An optical fiber 20 drawn from the light source unit 19 and a signal cable 22 drawn from the image processing unit 21 are connected to the exposure unit 17. Each exposure head 18 modulates the light beam input from the light source unit 19 based on the frame data (drawing data) input from the image processing unit 21, and is conveyed by the first and second moving stages 12a and 12b. The exposed substrate 11 is exposed (drawn). The number and arrangement of the exposure heads 18 may be changed as appropriate according to the size of the substrate 11 and the like.

  A pair of gates 23 a and 23 b are further provided on the base 14 so as to straddle the guide rail 15 at positions symmetrical with respect to the gate 16 in the Y direction. The gate 23a is located on the first moving stage 12a side, and three cameras 24a are attached. These cameras 24a are fixedly arranged on the moving path of the first moving stage 12a, and have a first substrate position detecting unit 25a for measuring the position (alignment measurement) of the substrate 11 placed on the first moving stage 12a. It is composed. The other gate 23b is located on the second moving stage 12b side, and similarly, three cameras 24b are attached. These cameras 24b are fixedly arranged on the moving path of the second moving stage 12b, and a second substrate position detecting unit 25b that measures the position (alignment measurement) of the substrate 11 placed on the second moving stage 12b. It is composed. The first and second substrate position detectors 25a and 25b read the marks and patterns provided on the substrate 11 to read the amount of displacement of the substrate 11 relative to the appropriate position on the stage (deviation amounts in the X, Y, and θ directions). ) Is detected. This detected value is used for correcting the frame data. Note that the number of the cameras 24a and 24b may be changed as appropriate according to the size of the substrate 11 and the like.

  Laser interference type length measuring devices 26a and 26b are provided at both ends of the base 14 in the Y direction. Two length measuring devices 26a are provided at the end of the base 14 on the first moving stage 12a side so as to be separated from each other in the X direction, and a first stage position detecting unit that measures the position of the first moving stage 12a. 27a is constituted. The other length measuring device 26b is provided at the end of the base 14 on the second moving stage 12b side so as to be separated in the X direction, and a second stage position for measuring the position of the second moving stage 12b. The detection unit 27b is configured. The first and second stage position detectors 27a and 27b irradiate the end faces 28a and 28b of the first and second movable stages 12a and 12b with laser beams, respectively, and detect positions on the orbit (positions in the Y direction). To do. This detected value is used for correcting the displacement of the first and second moving stages 12a and 12b.

  FIG. 2 shows the internal configuration of the exposure head 18. The exposure head 18 includes a DMD 30 as a spatial light modulation element. On the light incident side of the DMD 30, a mirror 31 is disposed that reflects the laser light emitted from the end of the optical fiber 20 toward the DMD 30. As shown in FIG. 3, the DMD 30 includes a micromirror 33 supported on each cell of the SRAM cell array 32 so as to be swingable by a support column. For example, the micromirrors 33 are arranged in a 600 × 800 two-dimensional square lattice shape, and the DMD 30 has a rectangular shape (rectangular shape) as a whole. Frame data (digital signal) is written into the SRAM cell array 32 via the DMD driver 39. The DMD driver 39 is connected to the signal cable 22 described above, and receives frame data from the image processing unit 21.

  Each cell of the SRAM cell array 32 is constituted by a flip-flop circuit, and the charge state is switched according to data (“0” or “1”) to be written. In each micromirror 33, the inclination of each micromirror 33 is switched by the electrostatic force according to the charge state of the SRAM cell, and the reflection direction of the laser light incident from the mirror 31 is changed. That is, the DMD 30 modulates and reflects the incident laser light according to the frame data, and causes the reflected light to enter the lens system 34. For example, only the reflected light from the micromirror 33 of the SRAM cell in which data “0” is written enters the lens system 34, and the reflected light from the micromirror 33 of the SRAM cell in which data “1” is written is not shown. It is absorbed by the light absorber and does not contribute to exposure.

  The lens systems 34 and 35 are configured as magnifying optical systems, and the cross-sectional area of the reflected light from the DMD 30 is enlarged to a predetermined size, and an enlarged image of the reflected light is displayed on the microlens array 36 provided on the exit side. Make it incident. In the microlens array 36, a plurality of microlenses 36a are integrally formed so as to correspond to the micromirrors 33 of the DMD 30 on a one-to-one basis. Each microlens 36a is a laser that has passed through lens systems 34 and 35. It is arranged on each optical axis of light. The microlens array 36 sharpens the incident enlarged image and makes it incident on the lens system 37. The lens systems 37 and 38 are configured as, for example, equal-magnification optical systems, and project (expose) images onto the substrate 11. The exposure head 18 is arranged so that the exposure surface of the substrate 11 is positioned at the rear focal position of the lens systems 37 and 38.

  As shown in FIG. 4, the exposure area (drawing area) 40 on the substrate 11 by each exposure head 18 has a shape (rectangular shape) similar to the DMD 30. The DMD 30 is arranged such that the short side is slightly inclined (for example, 0.1 ° to 0.5 °) with respect to the stage moving direction (Y direction), and the exposure area 40 is inclined accordingly. Yes. Thereby, the arrangement direction of the square lattice-like exposure points (drawing points) by the micromirrors 33 of the DMD 30 is inclined with respect to the scanning direction, and the pitch of the scanning locus (scanning line) by the exposure points (interval in the X direction). Since it becomes narrower, the resolution can be improved than when the DMD 30 is not inclined.

  Each exposure head 18 is divided into two rows in a direction (X direction) orthogonal to the stage moving direction, and is arranged without a gap in each row. Further, the exposure heads 18 are arranged at a predetermined interval (1/2 times the arrangement pitch) in the arrangement direction in the first row and the second row. As a result, the portion that cannot be exposed by the exposure head 18 in the first row is exposed by the exposure head 18 in the second row, and the strip-shaped exposed region 41 formed as the stage moves is formed without gaps in the X direction. The

  FIG. 5 shows an electrical configuration of the digital exposure apparatus 10. The digital exposure apparatus 10 is provided with an overall control unit 50 that controls the entire apparatus. The overall control unit 50 controls the first and second moving stage driving units 51a and 51b that move the first and second moving stages 12a and 12b, respectively, and moves the stage, and the light source unit 19 and the image processing unit. 21 is controlled to perform exposure. The overall control unit 50 controls the first and second stage position detection units 27a and 27b, and feeds back the detected value of the stage position to the control of the first and second moving stage drive units 51a and 51b. While correcting the position of the stage, the first and second substrate position detectors 25a and 25b are controlled, and the detected value of the substrate position is given to the frame data generator 52 in the image processing unit 21 to correct the frame data. Let it be done.

  The image processing unit 21 includes an image data storage unit 55 that stores rasterized first and second image data 54 a and 54 b output from an external image data output device 53. The first image data 54a is used when exposing the substrate 11 on the first moving stage 12a, and the second image data 54b is used when exposing the substrate 11 on the second moving stage 12b. As will be described in detail later, the first and second moving stages 12a and 12b have different movement directions (scanning directions) at the time of exposure in the opposite direction, that is, 180 degrees, and exposure is performed based on the same image data. Since the same pattern is not drawn on the substrate 11 on the stage, two types of image data (first and second image data 54a and 54b) are prepared in the image data output device 53 so that the same pattern is drawn. Has been.

  In the image data storage unit 55, writing is controlled by the writing control unit 56, and reading is controlled by the reading control unit 57. The writing control unit 56 writes the first and second image data 54 a and 54 b input from the image data output device 53 in the image data storage unit 55. The read control unit 57 selectively reads the first image data 54 a or the second image data 54 b from the image data storage unit 55 based on the control of the overall control unit 50 and inputs the first image data 54 a or the second image data 54 b to the frame data generation unit 52. The image data storage unit 55 may be configured as one memory device, and the first and second image data 54a and 54b may be stored in different areas within the memory area, or two memory devices. The first and second image data 54a and 54b may be stored in each memory device.

  The frame data generation unit 52 generates frame data based on the input first image data 54a or second image data 54b, and inputs the generated frame data to the DMD driver 39. Specifically, the frame data generation unit 52 generates frame data based on the coordinates of the exposure points in the exposure area 40 determined according to the arrangement of the micromirrors 33 of the DMD 30 and the arrangement of the exposure heads 18. . In addition, as described above, the frame data generation unit 52 performs exposure at the same position as when there is no positional deviation based on the positional deviation amount of the substrate 11 detected by the first and second substrate position detecting units 25a and 25b. The frame data is corrected so that points are formed.

  FIG. 6 shows a digital exposure system 60 in which an exchange (load / unload) mechanism for the substrate 11 is added to the digital exposure apparatus 10 configured as described above. The digital exposure system 60 is provided with a conveyor 61, first and second transfer robots 62a and 62b, and first and second pre-alignment stages 63a and 63b. Each unit is driven and controlled by a control unit (not shown). ing.

  The conveyor 61 is arranged so as to extend along the long side of the base 14 of the digital exposure apparatus 10, and the first and second transfer robots 62 a and 62 b are respectively opposed to the short side of the base 14. Has been placed. The conveyor 61 separates the plurality of substrates 11 at a predetermined interval and, for example, conveys the substrate 11 from the first movement stage 12a side to the second movement stage 12b side. In addition, in order to show the direction on the board | substrate 11, the character of "F" is shown as a drawing pattern.

  The first transfer robot 62a has a fork-shaped stacking portion 64a for loading the substrate 11 and an arm that is connected to the loading portion 64a at one end and moves the loading portion 64a in a direction approaching / separating from the first moving stage 12a. And a movable base 66a that supports the other end of the arm portion 65a and rotates in the θ direction and moves up and down in the Z direction (a direction perpendicular to the paper surface). Similarly, the second transfer robot 62b includes a fork-shaped stacking portion 64b for loading the substrate 11, and one end connected to the stacking portion 64b, in a direction in which the loading portion 64b approaches / separates from the first moving stage 12a. The arm portion 65b is moved, and a movable base 66b that supports the other end of the arm portion 65b and rotates in the θ direction and moves up and down in the Z direction.

  A plurality of lift pins (not shown) are provided on the upper surface of the conveyor 61, the first and second pre-alignment stages 63a and 63b, and the first and second moving stages 12a and 12b to lift the substrate 11 in point contact with the lower surface. ) Is provided. The first and second transfer robots 62a and 62b place the substrate 11 on the stacking portions 64a and 64b by inserting the stacking portions 64a and 64b between the lift pins and lifting the substrate 11 from the lower surface side. To do. Specifically, the first transfer robot 62a takes out one unexposed substrate 11 from the conveyor 61, transfers the substrate 11 onto the first pre-alignment stage 63a, and the first pre-alignment stage 63a. The substrate 11 whose position has been corrected is transferred onto the first moving stage 12a. The first transfer robot 62a transfers the substrate 11 that has been exposed to the conveyor 61 from the first moving stage 12a. The operation of the second transfer robot 62b is the same as the operation of the first transfer robot 62a, and the substrate 11 is transferred between the conveyor 61, the second pre-alignment stage 63b, and the second moving stage 12b.

  The first and second pre-alignment stages 63a and 63b are respectively a camera (not shown) for reading marks and patterns provided on the substrate 11, and a stage drive mechanism for moving the stage in the X, Y, and θ directions. (Not shown), and a substrate position correcting operation is performed in order to transfer the substrate 11 to an appropriate position on the first and second moving stages 12a and 12b.

  Next, the operation of the digital exposure system 60 configured as described above will be described with reference to the operation sequence diagrams of FIGS. 7 to 9 and the timing chart of FIG. First, as shown in FIG. 7A, the substrate 11 is set on the first and second moving stages 12a and 12b by the first and second transfer robots 62a and 62b, respectively. It is arranged in the direction of rotational symmetry of °. From this state, the first moving stage 12a moves in a direction (right direction) close to the second moving stage 12b, passes through the first substrate position detection unit 25a, and is moved by the first substrate position detection unit 25a. 11 alignment measurements are performed (periods t0 to t1 in FIG. 10).

  After passing through the first substrate position detector 25a, the first moving stage 12a further passes through the exposure unit 17 and moves to a position close to the second moving stage 12b as shown in FIG. 7B. (Period t1 to t2 in FIG. 10). At this time, the exposure unit 17 does not perform the exposure operation.

  Next, the first moving stage 12a moves in a direction (leftward) away from the second moving stage 12b, passes through the exposure unit 17 and is exposed to the first by the exposure unit 17 as shown in FIG. 7C. The substrate 11 on the moving stage 12a is exposed based on the first image data 54a (periods t2 to t4 in FIG. 10). Further, during this exposure, the second moving stage 12b moves in a direction (left direction) close to the first moving stage 12a, passes through the second substrate position detecting unit 25b, and is also moved to the second substrate position detecting unit. The alignment measurement of the substrate 11 is performed by 25b (periods t3 to t4 in FIG. 10).

  As shown in FIG. 8A, the first moving stage 12a moves to the initial position after passing through the exposure unit 17, and the second moving stage 12b passes through the exposure unit 17 together with the first moving stage 12a. As shown to (B), it moves to the position close | similar to the 1st movement stage 12a (period t4-t5 of FIG. 10). At this time, the exposure unit 17 does not perform the exposure operation.

  Next, the second moving stage 12b moves in a direction (rightward) away from the first moving stage 12a, passes through the exposure unit 17, and is exposed to the second by the exposure unit 17, as shown in FIG. 8C. The substrate 11 on the moving stage 12b is exposed based on the second image data 54b (periods t5 to t7 in FIG. 10). During this exposure, the substrate 11 on the first moving stage 12a is replaced by the first transfer robot 62a (periods t5 to t6 in FIG. 10), and the first moving stage 12a loads a new substrate 11 thereon. It moves in the direction (right direction) close to the second moving stage 12b, passes through the first substrate position detector 25a, and the alignment measurement of the substrate 11 is performed by the first substrate position detector 25a (FIG. 10). Period t6 to t7).

  As shown in FIG. 9A, the second moving stage 12b passes through the exposure unit 17 and then moves to the initial position. At the same time, the first moving stage 12a passes through the exposure unit 17 and passes through the exposure unit 17. As shown to (B), it moves to the position close to the 2nd movement stage 12b (period t7-t8 of FIG. 10). At this time, the exposure unit 17 does not perform the exposure operation.

  Next, the first moving stage 12a moves in a direction (leftward) away from the second moving stage 12b, passes through the exposure unit 17, and is exposed to the first by the exposure unit 17, as shown in FIG. 9C. The substrate 11 on the moving stage 12a is exposed based on the first image data 54a (period t8 to t10 in FIG. 10). During this exposure, the substrate 11 on the second moving stage 12b is exchanged by the second transfer robot 62b (period t8 to t9 in FIG. 10), and the second moving stage 12b loads a new substrate 11 thereon. It moves toward the direction (left direction) close to the first moving stage 12a, passes through the second substrate position detector 25b, and the alignment measurement of the substrate 11 is performed by the second substrate position detector 25b (FIG. 10). Period t9 to t10). Thereafter, the same operation is repeated with the period t4 to t10 in FIG. 10 as one cycle.

  In the present digital exposure system 60, during the exposure of the substrate 11 on one moving stage, the substrate 11 is exchanged and the alignment measurement of a new substrate 11 is performed on the other moving stage, so that the tact time is one stage. Compared to a significant reduction.

  In the above embodiment, the substrates are arranged on the first and second moving stages so as to be 180 ° rotationally symmetrical with each other. However, the present invention is not limited to this, and each substrate is placed in the same direction. You may arrange | position toward.

  Moreover, in the said embodiment, although the 1st and 2nd movement stage is moved independently, respectively, this invention is not limited to this, The 1st and 2nd movement stage is moved integrally. Also good.

  Moreover, in the said embodiment, although the stage is moved with respect to the exposure part fixedly arranged, this invention is not limited to this, A stage may be fixed and an exposure part may be moved. In this case, the substrate position detection unit may be moved together with the exposure unit. Further, in the form in which the exposure unit is fixed and the stage is moved, the substrate position detection unit may be moved and the alignment measurement may be performed while the stage is stopped.

  In the above-described embodiment, two substrate position detection units are provided for each stage. However, the present invention is not limited to this, and one substrate position detection unit is provided. You may make it perform the alignment measurement of the board | substrate on each stage by moving.

  In the above embodiment, two image data are prepared, and the image data is changed between the exposure of the first moving stage and the exposure of the second moving stage. However, the present invention is limited to this. Instead, only the image data for one stage may be prepared, and the image data may be inverted by the data conversion circuit when the other stage is exposed.

  In the above embodiment, a digital exposure apparatus that performs exposure on a substrate by modulating a light beam based on drawing data is illustrated as an example of a drawing apparatus according to the present invention. However, the present invention can be applied to an ink jet drawing apparatus that performs drawing by ejecting dot-like ink based on drawing data.

It is a schematic perspective view which shows the structure of a digital exposure apparatus. It is a schematic diagram which shows the internal structure of an exposure head. It is a schematic perspective view which shows the structure of DMD. It is a schematic perspective view which shows the exposure area on the board | substrate by an exposure head. It is a block diagram which shows the electric constitution of a digital exposure apparatus. It is a schematic plan view which shows the structure of a digital exposure system. It is a schematic plan view (the 1) which shows the operation | movement sequence of a digital exposure system. It is a schematic plan view (the 2) which shows the operation | movement sequence of a digital exposure system. It is a schematic plan view (the 3) which shows the operation | movement sequence of a digital exposure system. It is a timing chart which shows the operation | movement sequence of a digital exposure system.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Digital exposure apparatus 11 Substrate 12a, 12b 1st and 2nd moving stage (moving means)
14 Substrate 15 Guide rail 17 Exposure part (drawing means)
18 exposure head 19 light source unit 21 image processing unit (drawing data changing means)
25a, 25b First and second substrate position detection units (substrate position detection means)
27a, 27b First and second stage position detection units 30 DMD (spatial light modulation element)
39 DMD driver 40 Exposure area (drawing area)
50 Overall control unit (drawing control means)
51a, 51b First and second moving stage drive units 52 Frame data generation unit (drawing data correction means)
54a, 54b First and second image data 55 Image data storage unit 56 Write control unit 57 Read control unit 60 Digital exposure system 61 Conveyor 62a, 62b First and second transfer robots (substrate exchange means)
63a, 63b first and second pre-alignment stages

Claims (12)

Drawing means for sequentially drawing on the substrate passing through the drawing area based on the drawing data;
Moving means for reciprocally moving each substrate relative to the drawing means alternately so as to pass through the drawing area by arranging substrates on both sides of the drawing means;
The drawing means is controlled to perform drawing in a first period in which one substrate passes through the drawing area in one direction and a second period in which the other substrate passes through the drawing area in a direction opposite to the one direction. Drawing control means to be performed;
Drawing data changing means for changing the drawing data between the first period and the second period;
A drawing apparatus comprising:   The drawing apparatus according to claim 1, wherein the drawing data changing unit changes the drawing data so that the same pattern is drawn on each substrate in the first period and the second period. . A substrate position detecting means for detecting a displacement amount with respect to an appropriate position of each substrate;
A drawing data correction unit that corrects the drawing data based on a positional deviation amount detected by the substrate position detection unit;
The drawing apparatus according to claim 1, further comprising:   4. The drawing apparatus according to claim 3, wherein the substrate position detection unit detects the amount of positional deviation with respect to the other substrate while the drawing unit performs drawing on the one substrate. .   The moving means comprises two moving stages that move on the same one-dimensional trajectory by placing a substrate on the surface, and the drawing means is fixedly arranged on the one-dimensional trajectory through which each moving stage passes. 5. The drawing apparatus according to claim 1, wherein the drawing apparatus is provided.   The moving means comprises two moving stages that move on the same one-dimensional trajectory by placing a substrate on the surface, and the drawing means is fixedly arranged on the one-dimensional trajectory through which each moving stage passes. The drawing apparatus according to claim 3, wherein the substrate position detecting means is provided for each of the moving stages and is fixedly arranged on the one-dimensional trajectory.   The drawing apparatus according to claim 1, wherein the drawing unit performs exposure on the substrate.   The drawing apparatus according to claim 7, wherein the drawing unit includes a spatial light modulation element that modulates incident light based on the drawing data.   The drawing apparatus according to claim 8, wherein the spatial light modulation element is a digital micromirror device.   10. The drawing according to claim 8, wherein the drawing unit includes a plurality of exposure heads each including the spatial light modulator arranged in a direction orthogonal to a movement path of the substrate. apparatus.   11. The drawing apparatus according to claim 1, further comprising a substrate exchanging unit that alternately replaces each substrate at a position symmetrical with respect to the drawing unit.   A substrate is arranged on both sides of a drawing unit that sequentially draws on the substrate passing through the drawing region based on the drawing data, and each substrate is alternately relative to the drawing unit so as to pass through the drawing region. In a first period in which one substrate passes through the drawing area in one direction and a second period in which the other substrate passes through the drawing area in a direction opposite to the one direction. And the drawing data is changed between the first period and the second period.

Images