JP2008203556A - Digital exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent an increase in a floor possession area, to suppress an increase in the length of a cable, and to improve exposure accuracy. <P>SOLUTION: A digital exposure apparatus 2 is equipped with an apparatus main body 2, image processing units 4a to 4j, a mount base 5, light source units 6a to 6t, an optical fiber 22, and a signal cable 21. The apparatus has a two-story structure in which the mount base 5 is placed above the apparatus main body 3 and the image processing units 4a to 4j and the light source units 6a to 6j are mounted on the upper face of the mount base 5. The image processing units 4a to 4j and the light source units 6a to 5t are positioned close to an exposure head built in the apparatus main body 3. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a digital exposure apparatus that exposes a two-dimensional pattern onto a substrate.

    A digital exposure apparatus (such as a digital micromirror device (DMD)) is provided in the exposure unit, and the DMD is driven and controlled based on image data to modulate the light beam, thereby exposing the substrate. (Also called a multi-beam exposure apparatus) has been commercialized. The DMD is a mirror device in which a minute micromirror is swingably attached to each memory cell (SRAM cell) arranged two-dimensionally on a semiconductor substrate, and corresponds to data (charge) written in each memory cell. The angle of the reflecting surface of the micromirror changes due to electrostatic force.

  On the other hand, in recent years, liquid crystal display devices are becoming more and more popular, and particularly those having large screens are desired. Therefore, the above-described digital exposure apparatus is used in order to manufacture the substrate constituting the liquid crystal display device at low cost and efficiently. However, as the screen size of the liquid crystal display device is increased, the digital exposure apparatus that manufactures the same is also used. It tends to be larger.

Therefore, in the exposure apparatus described in Patent Document 1, a concave portion recessed inside is formed in the chamber constituting the main body, and peripheral devices are arranged in the concave portion to reduce the floor area occupied area and improve the maintainability. I am trying. In Patent Document 2, the exposure apparatus main body and the maintenance area of the laser device as the light source are made common to reduce the required floor area.
JP 2005-37914 A

  However, the digital exposure apparatus corresponding to the large-sized substrate as described above has to arrange a large number of image processing units and light source units, and occupies the floor surface for the space necessary for the production and the space for maintenance. Although the area tends to increase, in the exposure apparatuses described in Patent Documents 1 and 2 above, a space for arranging a large number of image processing units and light source units is not considered, and space efficiency of the floor occupied area is improved. It is difficult. Furthermore, cable cables such as signal cables that transmit image data and optical fibers that transmit light beams are continuing to be long, and this lengthening of cables such as noise mixing and transmission efficiency Causes a drop.

  Substrates for liquid crystal displays are required to have larger screens and higher performance than conventional ones, so the exposure accuracy to the substrate must be improved. The problems of noise mixing and transmission efficiency associated therewith cause a reduction in exposure accuracy.

  The present invention has been made in consideration of the above circumstances, and prevents an increase in the floor area occupation area and suppresses an increase in the length of cables, thereby improving maintainability and improving exposure accuracy. An object of the present invention is to provide a possible digital exposure apparatus.

  In order to achieve the above object, a digital exposure apparatus according to the present invention includes an apparatus body in which an exposure head performs a drawing process on a substrate, a plurality of light source units that input a light beam to the exposure head, and the exposure head on the substrate. A plurality of image processing units for inputting image data to be exposed; an optical cable for transmitting a light beam from the light source unit to the exposure unit; and a signal cable for transmitting image data from the image processing unit to the exposure head. In the image processing apparatus, the image processing unit has a two-story structure in which the image processing unit and the light source unit are disposed above the apparatus main body, and the image processing unit is disposed at a position close to the exposure head. And

  The exposure head and the image processing unit are preferably arranged separately from each other. Furthermore, it is preferable that the light source unit and the exposure head are arranged close to each other. Alternatively, it is also effective to arrange the image processing unit within the range of the floor area occupied by the apparatus main body.

  It is preferable that the apparatus main body, the image processing unit, and the light source unit are each provided with a power cut-off means for independently cutting off the power supplied to the apparatus main body, the image processing unit, and the light source unit.

  The present invention has a two-story structure in which an image processing unit and a light source unit are disposed above the apparatus main body, and the image processing unit is disposed at a position close to the exposure head. Therefore, the length of the cables can be prevented and the maintenance can be improved, and the exposure accuracy can be improved.

  In FIG. 1, a digital exposure apparatus 2 includes an apparatus main body 3 that performs exposure on a substrate 10, a plurality of image processing units 4 a to 4 j that input image data to the apparatus main body 3, a mounting table 5, and an exposure unit 3. And a plurality of light source units 6a to 6t for inputting a light beam. The substrate 10 is a printed substrate or a glass substrate for a flat panel display, and a photosensitive material is applied or pasted on the surface thereof.

  As shown in FIGS. 1 and 2, the digital exposure apparatus 2 has a mounting table 5 disposed above the floor occupied area of the apparatus body 3, and image processing units 4 a to 4 j and a light source unit on the upper surface of the mounting table 5. It has a two-story structure on which 6a to 6j are placed. In the present embodiment, ten image processing units 4 a to 4 j are used, and all of the ten image processing units 4 a to 4 j are arranged on the upper surface of the mounting table 5. Further, in the present embodiment, a space for maintenance is ensured by arranging the apparatus main body 3 and the image processing units 4a to 4j separately with the mounting table 5 interposed therebetween.

  Further, as shown in FIG. 2, in this embodiment, 20 light source units 6a to 6t are used, and 10 light source units 6a to 6j occupying half of the 20 light source units 6 are mounted. The remaining half of the 10 light source units 6 k to 6 t are arranged on the same floor as the apparatus main body 3 on the upper surface of the mounting table 5. Furthermore, a staircase 8 is provided for ascending from the floor surface to the mounting table 5, so that the operator can perform operations and maintenance by moving the upper surface of the mounting table 5.

  As shown in FIG. 3, the apparatus main body 3 includes an exposure unit 11, moving stages 12 a and 12 b, a base 14, a guide rail 15, and a box-shaped chamber 16 that covers these. The first and second moving stages 12a and 12b have a chuck mechanism, and the chuck 10 moves the substrate 10 while holding it on the surface. The chamber 16 is formed with slits 16 a and 16 b that serve as entrances and exits of the substrate 10.

  Further, in the vicinity of the moving stages 12a and 12b, there are provided static-eliminating air blowing portions 17a and 17b for blowing out air, and a slit-like blowing port arranged in accordance with the contact surface between the substrate 10 and the moving stages 12a and 12b. Blow out air from. By discharging air from the discharge air blowing portions 17a and 17b, static electricity generated between the substrate 10 and the moving stage is removed, and the substrate 10 and the moving stages 12a and 12b are cooled.

  The base body 14 has a flat plate shape having four legs, and two guide rails 15 are extended on the upper surface so as to be parallel to each other along the longitudinal direction (Y direction). The first and second moving stages 12a and 12b are supported by the guide rail 15 so as to be reciprocally movable on the same one-dimensional trajectory, and include first and second moving stage driving units 51a and 51a configured by a linear motor or the like. Each is driven by 51b (see FIG. 9).

  A gate-shaped gate 19 is erected on the center of the base 14 in the Y direction so as to straddle the guide rail 15, and the exposure unit 11 is attached to the gate 19. The exposure unit 11 includes a total of 40 exposure heads 20 arranged in a plurality of rows (for example, 2 rows) in a direction orthogonal to the movement path of the first and second movement stages 12a and 12b, and the first and second movement stages. It is fixedly arranged on the movement paths 12a and 12b. In order to prevent the drawing from becoming complicated, 20 exposure heads 20 are shown in FIG.

  The exposure unit 11 is connected to a signal cable 21 drawn from the image processing units 4a to 4j and an optical fiber 22 drawn from the light source units 6a to 6t. Each exposure head 20 modulates the light beam input from the light source units 6a to 6t based on the frame data input from the image processing units 4a to 4j, and is conveyed by the first and second moving stages 12a and 12b. The exposed substrate 10 is exposed. Note that the number and arrangement of the exposure heads 20 may be changed as appropriate according to the size of the substrate 10 and the like. In addition, a rectangular frame 23 surrounding the periphery of the exposure unit 11 is attached to the gate 19. In FIG. 3, the optical fiber 22 and the signal cable 21 are connected to one of the 20 exposure heads 20 in order to avoid complication of the drawing. Corresponding optical fibers 22 and signal cables 21 are also connected to all the exposure heads 20.

  As shown in FIGS. 4 and 5, an opening / closing lid 24 detachably attached to the upper surface wall of the chamber 16 is provided above the exposure unit 11, and the opening / closing lid 24 is formed in a box shape. In the closed state, the exposure unit 11 is covered and concealed. In the open state, the exposure unit 11 is exposed to the outside so that connection work and maintenance can be performed. Furthermore, the opening / closing lid 24 is provided with cylindrical members 26 and 27 penetrating inward.

  The image processing units 4a to 4j have two rows, that is, positions of the image processing units 4a to 4e at positions as close as possible to the exposure head 20 in parallel with the arrangement direction of the exposure heads 20 with the opening / closing lid 24 interposed therebetween. The signal cables 21 that are arranged in a row and in the rows of the image processing units 4f to 4j and are connected to the image processing units 4a to 4j are passed through the cylindrical member 26 and connected to the exposure head 20.

  The light source units 6a to 6j located in the upper layer are arranged in the vicinity of one end side of the opening / closing lid 24 along the direction orthogonal to the arrangement direction of the exposure heads 20 and as close as possible to the exposure heads 20, The light source units 6k to 6t located in the lower layer are arranged side by side almost directly below the light source units 6a to 6j located in the upper layer. Further, when connecting to the exposure head 20, the maintenance work can be easily performed by hooking the signal cable 21 and the optical fiber 20 above the frame 23.

  Further, a pair of gates 28a and 28b are provided on the base 14 so as to straddle the guide rail 15 at positions symmetrical with respect to the gate 19 in the Y direction. The gate 28a is located on the first moving stage 12a side, and three cameras 29a are attached. These cameras 29a are fixedly arranged on the moving path of the first moving stage 12a, and include a first substrate position detecting unit 30a that performs position measurement (alignment measurement) of the substrate 10 placed on the first moving stage 12a. It is composed. The other gate 28b is located on the second moving stage 12b side, and similarly, three cameras 29b are attached. These cameras 29b are fixedly arranged on the moving path of the second moving stage 12b, and include a second substrate position detecting unit 30b that performs position measurement (alignment measurement) of the substrate 10 placed on the second moving stage 12b. It is composed. The first and second substrate position detectors 30a and 30b read the marks and patterns provided on the substrate 10 to read the amount of displacement of the substrate 10 relative to the appropriate position on the stage (deviation amounts in the X, Y, and θ directions). ) Is detected. This detected value is used for correcting the frame data. Note that the number of cameras 29a and 29b may be changed as appropriate according to the size of the substrate 10 and the like.

  Laser interference type length measuring devices 31a and 31b are respectively provided at both ends of the base 14 in the Y direction. Two length measuring devices 31a are provided at the end of the base 14 on the first moving stage 12a side so as to be separated from each other in the X direction, and a first stage position detector for measuring the position of the first moving stage 12a. 32a is constituted. The other length measuring device 31b is provided at the end of the base 14 on the second moving stage 12b side so as to be separated in the X direction, and a second stage position for measuring the position of the second moving stage 12b. The detection part 32b is comprised. The first and second stage position detectors 32a and 32b irradiate the end surfaces 33a and 33b of the first and second movable stages 12a and 12b with laser beams, respectively, and detect positions on the orbit (positions in the Y direction). To do. This detected value is used for correcting the displacement of the first and second moving stages 12a and 12b.

  FIG. 6 shows the internal configuration of the exposure head 20. The exposure head 20 includes a DMD 35 as a spatial light modulation element. On the light incident side of the DMD 35, a mirror 36 that reflects the laser light emitted from the end of the optical fiber 22 toward the DMD 35 is disposed. As shown in FIG. 7, the DMD 35 includes a micromirror 38 supported on each cell of the SRAM cell array 37 so as to be swingable by a support column. For example, the micromirrors 38 are arranged in a 600 × 800 two-dimensional square lattice, and the DMD 35 has a rectangular shape (rectangular shape) as a whole. Frame data (digital signal) is written into the SRAM cell array 37 via the DMD driver 44. The signal cable 21 is connected to the DMD driver 44, and frame data is input from the image processing units 4a to 4j.

  Each cell of the SRAM cell array 37 is configured by a flip-flop circuit, and the charge state is switched according to data (“0” or “1”) to be written. In each micromirror 38, the inclination of each micromirror 38 is switched by the electrostatic force according to the charge state of the SRAM cell, and the reflection direction of the laser light incident from the mirror 36 is changed. That is, the DMD 35 modulates and reflects the incident laser light according to the frame data, and causes the reflected light to enter the lens system 39. For example, only the reflected light from the micromirror 38 of the SRAM cell in which data “0” is written enters the lens system 39, and the reflected light from the micromirror 38 of the SRAM cell in which data “1” is written is not shown. It is absorbed by the light absorber and does not contribute to exposure.

  The lens systems 39 and 40 are configured as a magnifying optical system, which enlarges the cross-sectional area of the reflected light from the DMD 35 to a predetermined size, and displays an enlarged image of the reflected light on the microlens array 41 provided on the exit side. Make it incident. In the microlens array 41, a plurality of microlenses 41a are integrally formed so as to correspond to the micromirrors 38 of the DMD 35 on a one-to-one basis. Each microlens 41a is a laser that has passed through lens systems 39 and 40. It is arranged on each optical axis of light. The microlens array 41 sharpens the incident enlarged image and makes it incident on the lens system 42. The lens systems 42 and 43 are configured as, for example, equal-magnification optical systems, and project (expose) images onto the substrate 10. The exposure head 20 is arranged so that the exposure surface of the substrate 10 is positioned at the rear focal position of the lens systems 42 and 43.

  As shown in FIG. 8, the exposure area (drawing area) 45 on the substrate 10 by each exposure head 20 has a shape (rectangular shape) similar to the DMD 35. The DMD 35 is arranged with a short side slightly inclined (for example, 0.1 ° to 0.5 °) with respect to the stage moving direction (Y direction), and the exposure area 45 is inclined accordingly. Yes. As a result, the arrangement direction of square lattice-like exposure points (drawing points) by the micromirrors 38 of the DMD 35 is inclined with respect to the scanning direction, and the pitch (interval in the X direction) of the scanning trajectory (scanning line) by the exposure points. Since it becomes narrower, the resolution can be improved than when the DMD 35 is not inclined.

  Each exposure head 20 is divided into two rows in a direction (X direction) orthogonal to the stage moving direction, and is arranged without a gap in each row. Further, the exposure heads 20 are arranged with a predetermined interval (1/2 times the arrangement pitch) shifted in the arrangement direction between the first line and the second line. As a result, a portion that cannot be exposed by the exposure head 20 in the first row is exposed by the exposure head 20 in the second row, and a strip-shaped exposed region 46 formed as the stage moves is formed without gaps in the X direction. The

  FIG. 9 shows an electrical configuration of the digital exposure apparatus 2. The digital exposure apparatus 10 is provided with an overall control unit 50 that controls the entire apparatus. The overall control unit 50 controls the first and second moving stage driving units 51a and 51b that move the first and second moving stages 12a and 12b, respectively, and moves the stage, and also the light source units 6a to 6t and the image. The processing units 4a to 4j are controlled to perform exposure. The overall control unit 50 controls the first and second stage position detection units 32a and 32b, and feeds back the detected value of the stage position to the control of the first and second moving stage drive units 51a and 51b. While correcting the position of the stage, the first and second substrate position detectors 30a and 30b are controlled, and the detected values of the substrate positions are given to the frame data generator 52 in the image processing units 4a to 4j, and the frame data Make corrections.

  The image processing units 4 a to 4 j include an image data storage unit 55 that stores rasterized first and second image data 54 a and 54 b output from the external image data output device 53. The first image data 54a is used when exposing the substrate 10 on the first moving stage 12a, and the second image data 54b is used when exposing the substrate 10 on the second moving stage 12b. The first and second moving stages 12a and 12b have different movement directions (scanning directions) during exposure, that is, 180 ° different from each other. When exposure is performed based on the same image data, the first and second moving stages 12a and 12b Since the same pattern is not drawn, two types of image data (first and second image data 54a and 54b) are prepared in the image data output device 53 so that the same pattern is drawn.

  In the image data storage unit 55, writing is controlled by the writing control unit 56, and reading is controlled by the reading control unit 57. The writing control unit 56 writes the first and second image data 54 a and 54 b input from the image data output device 53 in the image data storage unit 55. The read control unit 57 selectively reads the first image data 54 a or the second image data 54 b from the image data storage unit 55 based on the control of the overall control unit 50 and inputs the first image data 54 a or the second image data 54 b to the frame data generation unit 52. The image data storage unit 55 may be configured as one memory device, and the first and second image data 54a and 54b may be stored in different areas within the memory area, or two memory devices. The first and second image data 54a and 54b may be stored in each memory device.

  The frame data generation unit 52 generates frame data based on the input first image data 54a or second image data 54b, and inputs the generated frame data to the DMD driver 44. Specifically, the frame data generation unit 52 generates frame data based on the coordinates of the exposure points in the exposure area 40 determined according to the arrangement of the micromirrors 38 of the DMD 35 and the arrangement of the exposure heads 20. . Further, as described above, the frame data generation unit 52 performs exposure at the same position as when there is no position shift based on the position shift amount of the substrate 10 detected by the first and second substrate position detection units 30a and 30b. The frame data is corrected so that points are formed.

  The first to third interlock switches 61 to 63 are respectively attached to opening and closing members that perform opening and closing operations during maintenance, such as the apparatus body 3, the image processing units 4a to 4j, the doors of the light source units 6a to 6t, and the opening and closing lids. When the open / close members are in the open state, the interlock function is activated by being turned on. In the present embodiment, when these interlock switches 61 to 63 are turned on, power supply to the apparatus main body 3, the image processing units 4a to 4j, and the light source units 6a to 6t is independently cut off. Yes, for example, when only the interlock switch 61 attached to the apparatus main body 3 is turned on, the image processing units 4a to 4j and the light source units 6a to 6t are energized, and only the apparatus main body 3 is in the power-off state. Become. As a result, the power supply can be shut off by the interlock switches 61 to 63 only at a location where maintenance is desired without shutting off the power supply of the entire digital exposure apparatus 2, so that the power supply can be restored and the inside of the apparatus can be brought to an appropriate temperature state. The time until is shortened, and maintainability is improved.

  The temperature adjustment mechanism 64 incorporates a known air conditioning facility and adjusts the internal temperature of the chamber 16. The temperature adjustment mechanism 64 is set to a lower target temperature, for example, 22.5 ° C. Thus, since the temperature in the chamber 16 can be lowered in advance, even if the moving stages 12a and 12b rise in temperature when the digital exposure apparatus 2 performs continuous exposure on the substrate 10, the saturation temperature of the substrate 10 is increased. Therefore, it is possible to prevent the substrate 10 from being deformed by the influence of heat conducted from the moving stages 12a and 12b.

  Furthermore, the pressure adjustment mechanism 65 is attached to the chamber 16 and includes, for example, a pressure tank and a pressure adjustment valve. The pressure inside the chamber 16 can be adjusted by adjusting the opening of the pressure adjustment valve. . In this embodiment, the pressure adjustment mechanism 65 is set so that the pressure inside the chamber 16 is higher than the inside of the chamber 68 (see FIG. 10) that covers the outside of the chamber 16. As a result, foreign substances such as dust can be prevented from entering the chamber 16.

  FIG. 10 shows a digital exposure system 70 in which an exchange (load / unload) mechanism for the substrate 10 is added to the digital exposure apparatus 2 configured as described above. The digital exposure system 70 is provided with a conveyor 71, first and second transfer robots 72a and 72b, first and second pre-alignment stages 73a and 73b, and a chamber 68 that covers them. The drive is controlled by the control unit. In FIG. 10, the image processing units 4a to 4j, the light source units 6a to 6t, and the like are omitted to prevent the drawing from becoming complicated.

  The conveyor 71 is disposed so as to extend along the long side of the base 14 of the digital exposure apparatus 10, and the first and second transfer robots 72 a and 72 b are respectively opposed to the short side of the base 14. Has been placed. The conveyor 71 conveys the plurality of substrates 10 from the first moving stage 12a side to the second moving stage 12b side, for example, separated by a predetermined interval. In addition, in order to show the direction on the board | substrate 10, the character of "F" is shown as a drawing pattern.

  The first transfer robot 72a includes a fork-shaped stacking portion 74a for loading the substrate 10 and an arm that is connected to the loading portion 74a at one end and moves the loading portion 74a in a direction approaching / separating from the first moving stage 12a. And a movable pedestal 76a that supports the other end of the arm 75a and rotates in the θ direction and moves up and down in the Z direction (a direction perpendicular to the paper surface). Similarly, the second transfer robot 72b has a fork-shaped stacking unit 74b for stacking the substrate 10 and one end connected to the stacking unit 74b so that the stacking unit 74b approaches / separates from the first moving stage 12a. The arm part 75b to be moved and a movable base 76b that supports the other end of the arm part 75b and rotates in the θ direction and moves up and down in the Z direction.

  A plurality of lift pins (not shown) are provided on the upper surface of the conveyor 71, the first and second pre-alignment stages 73a and 73b, and the first and second moving stages 12a and 12b to lift the substrate 10 in point contact with the lower surface. ) Is provided. The first and second transport robots 72a and 72b place the substrate 10 on the stacking portions 74a and 74b by inserting the stacking portions 74a and 74b between the lift pins and lifting the substrate 10 from the lower surface side. To do. Specifically, the first transport robot 72a takes out one unexposed substrate 10 from the conveyor 71, transfers the substrate 10 onto the first pre-alignment stage 73a, and the first pre-alignment stage 73a. The substrate 10 whose position has been corrected is transferred onto the first moving stage 12a. The first transfer robot 72a transfers the substrate 10 that has been exposed to the conveyor 71 from the first moving stage 12a. The operation of the second transfer robot 72b is the same as the operation of the first transfer robot 72a, and the substrate 10 is transferred between the conveyor 71, the second pre-alignment stage 73b, and the second moving stage 12b.

  The first and second pre-alignment stages 73a and 73b are respectively a camera (not shown) for reading marks and patterns provided on the substrate 10 and a stage drive mechanism for moving the stage in the X, Y, and θ directions. (Not shown), and a preliminary substrate position correcting operation for transferring the substrate 10 to an appropriate position on the first and second moving stages 12a and 12b is performed.

  When the digital exposure system 70 configured as described above operates, the substrate 10 is set on the first and second moving stages 12a and 12b by the first and second transfer robots 72a and 72b, respectively. Are arranged in directions that are 180 ° rotationally symmetric with respect to each other. From this state, the first moving stage 12a first moves in the direction approaching the second moving stage 12b. During this movement, the alignment measurement of the substrate 10 is performed when passing through the first substrate position detector 30a. Then, the first moving stage 12a passes through the exposure unit 11 and moves in the opposite direction away from the second moving stage 12b. When the first moving stage 12a passes through the exposure unit 11 during the movement in the opposite direction, the substrate 10 is exposed based on the first image data 54a. Further, during this exposure, the second moving stage 12b moves in a direction approaching the first moving stage 12a, and the alignment measurement of the substrate 10 is performed when passing through the second substrate position detecting unit 30b.

  The first moving stage 12a returns to the initial position after passing through the exposure unit 11. At this time, the second moving stage 12b moves in a direction away from the first moving stage 12a after passing through the exposure unit 11, and when the second moving stage 12b passes through the exposure unit 11, the second moving stage 12b moves on the second moving stage 12b. The substrate 10 is exposed based on the second image data 54b. Further, during this exposure, the substrate 10 on the first moving stage 12a is exchanged by the first transfer robot 72a, and the first moving stage 12a loads a new substrate 10 and approaches the second moving stage 12b. And the alignment measurement of the substrate 10 is performed in the same manner as before. The second moving stage 12b passes through the exposure unit 11 and then returns to the initial position. At this time, the first moving stage 12a passes through the exposure unit 11 in one direction and moves in the opposite direction, and the second moving stage 12b moves in the opposite direction. Exposure is performed based on one image data 54a. Further, during this exposure, the second moving stage 12b in which the substrate 10 has been replaced by the second transfer robot 72b is loaded in the direction of approaching the first moving stage 12a with a new substrate 10 loaded thereon, The alignment measurement of the substrate 10 is performed by the two substrate position detector 30b. Thereafter, the same operation is repeated with the above steps as one cycle.

  The effect of this embodiment will be described. FIG. 11 is a drawing of the digital exposure apparatus 2 to which the present embodiment is applied as viewed from above. As described above, the digital exposure apparatus 2 includes half of all the image processing units 4a to 4j on the upper layer of the apparatus body 3. The light source units 6a to 6j are arranged in a two-story structure, and the image processing units 4a to 4j and the light source units 6a to 6t are installed close to the exposure unit 11, so that the floor surface of the digital exposure apparatus 2 The occupation area is prevented from increasing, and further, the total length of the signal cable 21 and the optical fiber 22 connecting the exposure unit 11, the image processing units 4a to 4j, and the light source units 6a to 6t is shortened, thereby suppressing electrical noise. In addition, high transmission efficiency (optical efficiency) can be maintained.

  On the other hand, in the configuration of the conventional digital exposure apparatus 80 shown in FIG. 12, when the same number of image processing units 82 and light source units 83 as the present embodiment are arranged on the same floor surface as the apparatus main body 81, the image processing unit. 82 and the light source unit 83 occupy the floor and the space for maintenance increases, and the image processing unit 82 and the light source unit 83 must be arranged at positions away from the exposure unit 84, and the signal cable 86 and Although the optical fiber 87 is elongated, this is not the case in this embodiment.

  In the digital exposure apparatus 2, the image processing unit 4 and the light source unit 6 are arranged in the upper layer, and an opening / closing lid 24 is provided on the upper surface of the apparatus body 3, and the opening / closing lid 24 is opened to access the exposure head 20. Therefore, since most of the maintenance work can be performed on the upper surface of the apparatus main body 3, it is not necessary to provide a space for maintenance around the apparatus main body, and an increase in the floor area occupied area can be prevented.

  In the above-described embodiment, it is assumed that two moving stages are provided and the substrate is exposed alternately. However, the present invention is not limited to this, and the substrate is exposed with one moving stage. It is good also as a structure. Moreover, in the said embodiment, although the stage is moved with respect to the exposure part fixedly arranged, this invention is not limited to this, A stage may be fixed and an exposure part may be moved.

It is an external appearance perspective view of a digital exposure apparatus. It is the side view which looked at the digital exposure apparatus from the light source unit side. It is a schematic perspective view which shows the structure of an apparatus main body. It is principal part sectional drawing which shows the connection state of a signal cable and an exposure head. It is principal part sectional drawing which shows the connection state of an optical fiber and an exposure head. It is a schematic diagram which shows the internal structure of an exposure head. It is a schematic perspective view which shows the structure of DMD. It is a schematic perspective view which shows the exposure area on the board | substrate by an exposure head. It is a block diagram which shows the electric constitution of a digital exposure apparatus. It is a schematic plan view which shows the structure of a digital exposure system. 1 is a schematic plan view of a digital exposure apparatus to which the present invention is applied. It is a schematic plan view of a conventional digital exposure apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 Digital exposure apparatus 3 Apparatus main body 4a-4j Image processing unit 6a-6t Light source unit 10 Board | substrate 11 Exposure part 20 Exposure head 21 Signal cable 22 Optical fiber

Claims (5)

An apparatus main body in which an exposure head performs drawing processing on a substrate, a plurality of light source units for inputting a light beam to the exposure head, a plurality of image processing units for inputting image data to be exposed to the substrate by the exposure head, and the light source In an image processing apparatus comprising: an optical cable that transmits a light beam from a unit to the exposure unit; and a signal cable that transmits image data from the image processing unit to the exposure head.
An exposure apparatus having a two-story structure in which the image processing unit and the light source unit are disposed above the apparatus main body, and the image processing unit is disposed at a position close to the exposure head.   The exposure apparatus according to claim 1, wherein the exposure head and the image processing unit are arranged separately from each other.   3. An exposure apparatus according to claim 1, wherein the light source unit and the exposure head are arranged close to each other.   4. An exposure apparatus according to claim 1, wherein the image processing unit is disposed within a floor area occupied by the apparatus main body.   5. An exposure apparatus according to claim 1, further comprising a power cutoff unit that independently cuts off power supplied to the apparatus main body, the image processing unit, and the light source unit.

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