TW201918700A - 散射測量系統及其使用方法 - Google Patents
散射測量系統及其使用方法 Download PDFInfo
- Publication number
- TW201918700A TW201918700A TW107115006A TW107115006A TW201918700A TW 201918700 A TW201918700 A TW 201918700A TW 107115006 A TW107115006 A TW 107115006A TW 107115006 A TW107115006 A TW 107115006A TW 201918700 A TW201918700 A TW 201918700A
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- light source
- focusing element
- micro
- detector
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 56
- 238000005259 measurement Methods 0.000 claims description 77
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
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- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- 238000010998 test method Methods 0.000 description 5
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 4
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- 230000016776 visual perception Effects 0.000 description 4
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 3
- 229920001621 AMOLED Polymers 0.000 description 3
- 101000687727 Homo sapiens Transcriptional regulator PINT87aa Proteins 0.000 description 3
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- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 2
- ZVYGIPWYVVJFRW-UHFFFAOYSA-N 3-methylbutyl prop-2-enoate Chemical compound CC(C)CCOC(=O)C=C ZVYGIPWYVVJFRW-UHFFFAOYSA-N 0.000 description 2
- FOXXZZGDIAQPQI-XKNYDFJKSA-N Asp-Pro-Ser-Ser Chemical compound OC(=O)C[C@H](N)C(=O)N1CCC[C@H]1C(=O)N[C@@H](CO)C(=O)N[C@@H](CO)C(O)=O FOXXZZGDIAQPQI-XKNYDFJKSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- SQEHCNOBYLQFTG-UHFFFAOYSA-M lithium;thiophene-2-carboxylate Chemical compound [Li+].[O-]C(=O)C1=CC=CS1 SQEHCNOBYLQFTG-UHFFFAOYSA-M 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 239000000123 paper Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- BGRJZZKXQDPZCK-UHFFFAOYSA-N ethyl N-(2,2,2-trifluoroethyl)carbamate Chemical compound CCOC(=O)NCC(F)(F)F BGRJZZKXQDPZCK-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229940004975 interceptor Drugs 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4704—Angular selective
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4704—Angular selective
- G01N2021/4711—Multiangle measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4735—Solid samples, e.g. paper, glass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/068—Optics, miscellaneous
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762502001P | 2017-05-05 | 2017-05-05 | |
| US62/502,001 | 2017-05-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201918700A true TW201918700A (zh) | 2019-05-16 |
Family
ID=62386623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107115006A TW201918700A (zh) | 2017-05-05 | 2018-05-03 | 散射測量系統及其使用方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10989656B2 (enExample) |
| JP (1) | JP2020518812A (enExample) |
| CN (1) | CN110603433A (enExample) |
| TW (1) | TW201918700A (enExample) |
| WO (1) | WO2018203282A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102023106920A1 (de) * | 2023-03-20 | 2024-09-26 | Webasto SE | Verfahren und Messsystem zur winkelabhängigen Hazemessung |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3754830A (en) * | 1971-10-21 | 1973-08-28 | Science Spectrum | Scattering cell employing electrostatic means for supporting a particle |
| US4676641A (en) * | 1986-01-08 | 1987-06-30 | Coulter Electronics Of New England, Inc. | System for measuring the size distribution of particles dispersed in a fluid |
| US5198869A (en) | 1990-10-15 | 1993-03-30 | Vlsi Standards, Inc. | Reference wafer for haze calibration |
| DE19713200C1 (de) * | 1997-03-28 | 1998-06-18 | Alv Laser Vertriebsgesellschaf | Meßgerät zur Bestimmung der statischen und/oder dynamischen Lichtstreuung |
| US6294327B1 (en) | 1997-09-08 | 2001-09-25 | Affymetrix, Inc. | Apparatus and method for detecting samples labeled with material having strong light scattering properties, using reflection mode light and diffuse scattering |
| US7630086B2 (en) | 1997-09-22 | 2009-12-08 | Kla-Tencor Corporation | Surface finish roughness measurement |
| JP2001083080A (ja) | 1999-09-13 | 2001-03-30 | Hitachi Ltd | 結晶欠陥計測装置 |
| JP4902088B2 (ja) * | 2000-07-10 | 2012-03-21 | ティーイーエル エピオン インク． | ガスクラスターイオンビーム処理による薄膜を改良するためのシステムおよび方法 |
| JP2004191955A (ja) * | 2002-11-29 | 2004-07-08 | Canon Inc | 画像形成装置 |
| EP1620712A1 (en) * | 2003-04-29 | 2006-02-01 | Surfoptic Limited | Measuring a surface characteristic |
| US20080135774A1 (en) | 2006-12-08 | 2008-06-12 | Asml Netherlands B.V. | Scatterometer, a lithographic apparatus and a focus analysis method |
| BRPI0811794A2 (pt) | 2007-07-19 | 2014-11-11 | 3M Innovative Properties Co | "sensor de propriedade ótica" |
| TWI378221B (en) | 2007-09-21 | 2012-12-01 | Ind Tech Res Inst | Scatterfield microscopical measuring method and apparatus |
| CN102323191B (zh) * | 2008-09-26 | 2013-11-06 | 株式会社堀场制作所 | 颗粒物性测量装置 |
| JP5357509B2 (ja) | 2008-10-31 | 2013-12-04 | 株式会社日立ハイテクノロジーズ | 検査装置、検査方法および検査装置の校正システム |
| SG163442A1 (en) * | 2009-01-13 | 2010-08-30 | Semiconductor Technologies & Instruments | System and method for inspecting a wafer |
| JP2010197352A (ja) | 2009-02-27 | 2010-09-09 | Hitachi High-Technologies Corp | 欠陥検査方法及び欠陥検査装置 |
| US8184294B2 (en) | 2009-03-09 | 2012-05-22 | Honeywell International Inc. | Apparatus and method for measuring haze of sheet materials or other materials |
| DE102009036383B3 (de) * | 2009-05-04 | 2010-12-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur winkelaufgelösten Streulichtmessung |
| EP2519563B1 (en) | 2009-12-30 | 2013-11-06 | 3M Innovative Properties Company | Methods of making polydiorganosiloxane polyoxamide copolymers |
| AU2010348375A1 (en) * | 2010-03-19 | 2012-10-11 | Duke University | Single-mode optical fiber-based angle-resolved low coherence interferometric (LCI) (a/LCI) and non-interferometric systems and methods |
| JP2012220224A (ja) * | 2011-04-05 | 2012-11-12 | Mitsubishi Paper Mills Ltd | 反射光ムラ測定方法および装置 |
| CN102759332B (zh) | 2011-04-27 | 2016-09-28 | 上海微电子装备有限公司 | 散射计量装置及其计量方法 |
| US9459206B2 (en) | 2012-05-02 | 2016-10-04 | Datacolor Holding Ag | System and apparatus for measurement of light scattering from a sample |
| US20140154661A1 (en) * | 2012-11-30 | 2014-06-05 | Corning Incorporated | Durable glass articles for use as writable erasable marker boards |
| DE102013210259B4 (de) * | 2013-06-03 | 2022-06-23 | Postnova Analytics Gmbh | Verfahren zur Messung von Streulicht und Vorrichtung zur Messung von Streulicht |
| JP6043276B2 (ja) * | 2013-12-27 | 2016-12-14 | 浜松ホトニクス株式会社 | 散乱吸収体測定装置及び散乱吸収体測定方法 |
| US9423346B2 (en) | 2014-03-14 | 2016-08-23 | Datacolor Holding Ag | System and method for haze measurement |
| US10371350B2 (en) * | 2014-04-01 | 2019-08-06 | 3M Innovative Properties Company | Asymmetric turning film with multiple light sources |
| US9784690B2 (en) * | 2014-05-12 | 2017-10-10 | Kla-Tencor Corporation | Apparatus, techniques, and target designs for measuring semiconductor parameters |
| JP6299668B2 (ja) | 2015-05-13 | 2018-03-28 | 信越半導体株式会社 | ヘイズの評価方法 |
| CN106442564B (zh) * | 2016-10-17 | 2019-12-03 | 中国科学院上海光学精密机械研究所 | 大口径超光滑表面缺陷的检测装置和检测方法 |
| US9960389B1 (en) * | 2017-05-05 | 2018-05-01 | 3M Innovative Properties Company | Polymeric films and display devices containing such films |
| WO2020023234A1 (en) * | 2018-07-23 | 2020-01-30 | Corning Incorporated | Automotive interiors and cover glass articles with improved headform impact performance and post-breakage visibility |
-
2018
- 2018-05-03 TW TW107115006A patent/TW201918700A/zh unknown
- 2018-05-03 WO PCT/IB2018/053093 patent/WO2018203282A1/en not_active Ceased
- 2018-05-03 JP JP2019560104A patent/JP2020518812A/ja not_active Withdrawn
- 2018-05-03 US US16/611,051 patent/US10989656B2/en active Active
- 2018-05-03 CN CN201880029608.3A patent/CN110603433A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN110603433A (zh) | 2019-12-20 |
| WO2018203282A1 (en) | 2018-11-08 |
| JP2020518812A (ja) | 2020-06-25 |
| US10989656B2 (en) | 2021-04-27 |
| US20200124528A1 (en) | 2020-04-23 |
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