CN110603433A - 散射测量系统及其使用方法 - Google Patents

散射测量系统及其使用方法 Download PDF

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Publication number
CN110603433A
CN110603433A CN201880029608.3A CN201880029608A CN110603433A CN 110603433 A CN110603433 A CN 110603433A CN 201880029608 A CN201880029608 A CN 201880029608A CN 110603433 A CN110603433 A CN 110603433A
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CN
China
Prior art keywords
light
focusing element
light source
micro
scattering measurement
Prior art date
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Pending
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CN201880029608.3A
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English (en)
Chinese (zh)
Inventor
M·R·C·阿特金森
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN110603433A publication Critical patent/CN110603433A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4735—Solid samples, e.g. paper, glass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201880029608.3A 2017-05-05 2018-05-03 散射测量系统及其使用方法 Pending CN110603433A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762502001P 2017-05-05 2017-05-05
US62/502,001 2017-05-05
PCT/IB2018/053093 WO2018203282A1 (en) 2017-05-05 2018-05-03 Scatterometry system and method of using the same

Publications (1)

Publication Number Publication Date
CN110603433A true CN110603433A (zh) 2019-12-20

Family

ID=62386623

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880029608.3A Pending CN110603433A (zh) 2017-05-05 2018-05-03 散射测量系统及其使用方法

Country Status (5)

Country Link
US (1) US10989656B2 (enExample)
JP (1) JP2020518812A (enExample)
CN (1) CN110603433A (enExample)
TW (1) TW201918700A (enExample)
WO (1) WO2018203282A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023106920A1 (de) * 2023-03-20 2024-09-26 Webasto SE Verfahren und Messsystem zur winkelabhängigen Hazemessung

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WO2010127872A1 (de) * 2009-05-04 2010-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur winkelaufgelösten streulichtmessung
CN101924053A (zh) * 2009-01-13 2010-12-22 联达科技设备私人有限公司 检测晶片的系统和方法
WO2011115627A1 (en) * 2010-03-19 2011-09-22 Duke University Single-mode optical fiber-based angle-resolved low coherence interferometric (lci) (a/lci) and non-interferometric systems and methods
JP2012220224A (ja) * 2011-04-05 2012-11-12 Mitsubishi Paper Mills Ltd 反射光ムラ測定方法および装置
JP2015125090A (ja) * 2013-12-27 2015-07-06 浜松ホトニクス株式会社 散乱吸収体測定装置及び散乱吸収体測定方法
CN106170720A (zh) * 2014-04-01 2016-11-30 3M创新有限公司 具有多个光源的非对称转向膜
CN106463430A (zh) * 2014-05-12 2017-02-22 科磊股份有限公司 用于测量半导体参数的设备、技术和目标设计
CN106442564A (zh) * 2016-10-17 2017-02-22 中国科学院上海光学精密机械研究所 大口径超光滑表面缺陷的检测装置和检测方法

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US5198869A (en) 1990-10-15 1993-03-30 Vlsi Standards, Inc. Reference wafer for haze calibration
DE19713200C1 (de) * 1997-03-28 1998-06-18 Alv Laser Vertriebsgesellschaf Meßgerät zur Bestimmung der statischen und/oder dynamischen Lichtstreuung
US6294327B1 (en) 1997-09-08 2001-09-25 Affymetrix, Inc. Apparatus and method for detecting samples labeled with material having strong light scattering properties, using reflection mode light and diffuse scattering
US7630086B2 (en) 1997-09-22 2009-12-08 Kla-Tencor Corporation Surface finish roughness measurement
JP2001083080A (ja) 1999-09-13 2001-03-30 Hitachi Ltd 結晶欠陥計測装置
US20080135774A1 (en) 2006-12-08 2008-06-12 Asml Netherlands B.V. Scatterometer, a lithographic apparatus and a focus analysis method
CN101680837B (zh) 2007-07-19 2011-11-16 3M创新有限公司 光学性质传感器
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JP5357509B2 (ja) 2008-10-31 2013-12-04 株式会社日立ハイテクノロジーズ 検査装置、検査方法および検査装置の校正システム
JP2010197352A (ja) 2009-02-27 2010-09-09 Hitachi High-Technologies Corp 欠陥検査方法及び欠陥検査装置
US8184294B2 (en) 2009-03-09 2012-05-22 Honeywell International Inc. Apparatus and method for measuring haze of sheet materials or other materials
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CN102759332B (zh) 2011-04-27 2016-09-28 上海微电子装备有限公司 散射计量装置及其计量方法
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US20140154661A1 (en) * 2012-11-30 2014-06-05 Corning Incorporated Durable glass articles for use as writable erasable marker boards
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754830A (en) * 1971-10-21 1973-08-28 Science Spectrum Scattering cell employing electrostatic means for supporting a particle
US20020014407A1 (en) * 2000-07-10 2002-02-07 Allen Lisa P. System and method for improving thin films by gas cluster ion beam processing
US20040161253A1 (en) * 2002-11-29 2004-08-19 Canon Kabushiki Kaisha Image forming apparatus
US20070153285A1 (en) * 2003-04-29 2007-07-05 Nick Elton Measuring a surface characteristic
CN101924053A (zh) * 2009-01-13 2010-12-22 联达科技设备私人有限公司 检测晶片的系统和方法
WO2010127872A1 (de) * 2009-05-04 2010-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur winkelaufgelösten streulichtmessung
WO2011115627A1 (en) * 2010-03-19 2011-09-22 Duke University Single-mode optical fiber-based angle-resolved low coherence interferometric (lci) (a/lci) and non-interferometric systems and methods
JP2012220224A (ja) * 2011-04-05 2012-11-12 Mitsubishi Paper Mills Ltd 反射光ムラ測定方法および装置
JP2015125090A (ja) * 2013-12-27 2015-07-06 浜松ホトニクス株式会社 散乱吸収体測定装置及び散乱吸収体測定方法
CN106170720A (zh) * 2014-04-01 2016-11-30 3M创新有限公司 具有多个光源的非对称转向膜
CN106463430A (zh) * 2014-05-12 2017-02-22 科磊股份有限公司 用于测量半导体参数的设备、技术和目标设计
CN106442564A (zh) * 2016-10-17 2017-02-22 中国科学院上海光学精密机械研究所 大口径超光滑表面缺陷的检测装置和检测方法

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J. ENDRES等: "Numerical investigations of the influence of different commonly applied approximations in scatterometry", 《PROCEEDINGS OF SPIE》 *
JORDAN等: "Analytical first-order model of light scattering from submicron pyramidal pits", 《PROCEEDINGS OF SPIE》 *

Also Published As

Publication number Publication date
US10989656B2 (en) 2021-04-27
JP2020518812A (ja) 2020-06-25
TW201918700A (zh) 2019-05-16
WO2018203282A1 (en) 2018-11-08
US20200124528A1 (en) 2020-04-23

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Application publication date: 20191220