JP2020518812A - 微小散乱測定システム、及びその使用方法 - Google Patents

微小散乱測定システム、及びその使用方法 Download PDF

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Publication number
JP2020518812A
JP2020518812A JP2019560104A JP2019560104A JP2020518812A JP 2020518812 A JP2020518812 A JP 2020518812A JP 2019560104 A JP2019560104 A JP 2019560104A JP 2019560104 A JP2019560104 A JP 2019560104A JP 2020518812 A JP2020518812 A JP 2020518812A
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JP
Japan
Prior art keywords
light
microscattering
measurement system
photodetector
light beam
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JP2019560104A
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Japanese (ja)
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JP2020518812A5 (enExample
Inventor
アール．シー． アトキンソン，マシュー
アール．シー． アトキンソン，マシュー
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of JP2020518812A publication Critical patent/JP2020518812A/ja
Publication of JP2020518812A5 publication Critical patent/JP2020518812A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4735—Solid samples, e.g. paper, glass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2019560104A 2017-05-05 2018-05-03 微小散乱測定システム、及びその使用方法 Withdrawn JP2020518812A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762502001P 2017-05-05 2017-05-05
US62/502,001 2017-05-05
PCT/IB2018/053093 WO2018203282A1 (en) 2017-05-05 2018-05-03 Scatterometry system and method of using the same

Publications (2)

Publication Number Publication Date
JP2020518812A true JP2020518812A (ja) 2020-06-25
JP2020518812A5 JP2020518812A5 (enExample) 2021-06-17

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JP2019560104A Withdrawn JP2020518812A (ja) 2017-05-05 2018-05-03 微小散乱測定システム、及びその使用方法

Country Status (5)

Country Link
US (1) US10989656B2 (enExample)
JP (1) JP2020518812A (enExample)
CN (1) CN110603433A (enExample)
TW (1) TW201918700A (enExample)
WO (1) WO2018203282A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023106920A1 (de) * 2023-03-20 2024-09-26 Webasto SE Verfahren und Messsystem zur winkelabhängigen Hazemessung

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US5198869A (en) 1990-10-15 1993-03-30 Vlsi Standards, Inc. Reference wafer for haze calibration
DE19713200C1 (de) * 1997-03-28 1998-06-18 Alv Laser Vertriebsgesellschaf Meßgerät zur Bestimmung der statischen und/oder dynamischen Lichtstreuung
US6294327B1 (en) 1997-09-08 2001-09-25 Affymetrix, Inc. Apparatus and method for detecting samples labeled with material having strong light scattering properties, using reflection mode light and diffuse scattering
US7630086B2 (en) 1997-09-22 2009-12-08 Kla-Tencor Corporation Surface finish roughness measurement
JP2001083080A (ja) 1999-09-13 2001-03-30 Hitachi Ltd 結晶欠陥計測装置
US6537606B2 (en) * 2000-07-10 2003-03-25 Epion Corporation System and method for improving thin films by gas cluster ion beam processing
JP2004191955A (ja) * 2002-11-29 2004-07-08 Canon Inc 画像形成装置
US7742168B2 (en) * 2003-04-29 2010-06-22 Surfoptic Limited Measuring a surface characteristic
US20080135774A1 (en) 2006-12-08 2008-06-12 Asml Netherlands B.V. Scatterometer, a lithographic apparatus and a focus analysis method
CN101680837B (zh) 2007-07-19 2011-11-16 3M创新有限公司 光学性质传感器
TWI378221B (en) 2007-09-21 2012-12-01 Ind Tech Res Inst Scatterfield microscopical measuring method and apparatus
EP2333516A4 (en) * 2008-09-26 2017-11-08 Horiba, Ltd. Device for measuring physical property of particle
JP5357509B2 (ja) 2008-10-31 2013-12-04 株式会社日立ハイテクノロジーズ 検査装置、検査方法および検査装置の校正システム
SG163442A1 (en) * 2009-01-13 2010-08-30 Semiconductor Technologies & Instruments System and method for inspecting a wafer
JP2010197352A (ja) 2009-02-27 2010-09-09 Hitachi High-Technologies Corp 欠陥検査方法及び欠陥検査装置
US8184294B2 (en) 2009-03-09 2012-05-22 Honeywell International Inc. Apparatus and method for measuring haze of sheet materials or other materials
DE102009036383B3 (de) * 2009-05-04 2010-12-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur winkelaufgelösten Streulichtmessung
EP2519563B1 (en) 2009-12-30 2013-11-06 3M Innovative Properties Company Methods of making polydiorganosiloxane polyoxamide copolymers
EP2556331A1 (en) * 2010-03-19 2013-02-13 Duke University Single-mode optical fiber-based angle-resolved low coherence interferometric (lci) (a/lci) and non-interferometric systems and methods
JP2012220224A (ja) * 2011-04-05 2012-11-12 Mitsubishi Paper Mills Ltd 反射光ムラ測定方法および装置
CN102759332B (zh) 2011-04-27 2016-09-28 上海微电子装备有限公司 散射计量装置及其计量方法
US9459206B2 (en) 2012-05-02 2016-10-04 Datacolor Holding Ag System and apparatus for measurement of light scattering from a sample
US20140154661A1 (en) * 2012-11-30 2014-06-05 Corning Incorporated Durable glass articles for use as writable erasable marker boards
DE102013210259B4 (de) * 2013-06-03 2022-06-23 Postnova Analytics Gmbh Verfahren zur Messung von Streulicht und Vorrichtung zur Messung von Streulicht
JP6043276B2 (ja) * 2013-12-27 2016-12-14 浜松ホトニクス株式会社 散乱吸収体測定装置及び散乱吸収体測定方法
US9423346B2 (en) 2014-03-14 2016-08-23 Datacolor Holding Ag System and method for haze measurement
JP2017511573A (ja) * 2014-04-01 2017-04-20 スリーエム イノベイティブ プロパティズ カンパニー 複数の光源をもつ非対称転向フィルム
US9784690B2 (en) * 2014-05-12 2017-10-10 Kla-Tencor Corporation Apparatus, techniques, and target designs for measuring semiconductor parameters
JP6299668B2 (ja) 2015-05-13 2018-03-28 信越半導体株式会社 ヘイズの評価方法
CN106442564B (zh) * 2016-10-17 2019-12-03 中国科学院上海光学精密机械研究所 大口径超光滑表面缺陷的检测装置和检测方法
US9960389B1 (en) * 2017-05-05 2018-05-01 3M Innovative Properties Company Polymeric films and display devices containing such films
CN115611528B (zh) * 2018-07-23 2024-02-20 康宁公司 具有改善的头部冲击性能及破裂后能见度的汽车内部及覆盖玻璃制品

Also Published As

Publication number Publication date
CN110603433A (zh) 2019-12-20
US10989656B2 (en) 2021-04-27
TW201918700A (zh) 2019-05-16
WO2018203282A1 (en) 2018-11-08
US20200124528A1 (en) 2020-04-23

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