TW201918139A - Printed circuit board - Google Patents
Printed circuit board Download PDFInfo
- Publication number
- TW201918139A TW201918139A TW107125939A TW107125939A TW201918139A TW 201918139 A TW201918139 A TW 201918139A TW 107125939 A TW107125939 A TW 107125939A TW 107125939 A TW107125939 A TW 107125939A TW 201918139 A TW201918139 A TW 201918139A
- Authority
- TW
- Taiwan
- Prior art keywords
- insulating layer
- metal
- bump
- circuit board
- printed circuit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/015—Fluoropolymer, e.g. polytetrafluoroethylene [PTFE]
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Structure Of Printed Boards (AREA)
Abstract
Description
以下說明是有關於一種印刷電路板。The following description is related to a printed circuit board.
製造印刷電路板的方式有平行構成式層疊(parallel build up lamination)及漸成式層疊(sequential lamination)。平行構成式層疊包括高溫按壓,而漸成式層疊包括低溫按壓。當採用平行構成式層疊方法時,可使用糊膏(paste)作為單元層間連接結構。在此種情形中,內部配線與糊膏之間的黏合及連接性可能劣化。The manner in which printed circuit boards are manufactured is parallel build up lamination and sequential lamination. The parallel configuration stack includes high temperature presses, while the progressive stack includes low temperature presses. When a parallel composition lamination method is employed, a paste can be used as the unit interlayer connection structure. In this case, the adhesion and connectivity between the internal wiring and the paste may be deteriorated.
日本公開專利第2003-179356號闡述一種印刷電路板的實例。An example of a printed circuit board is described in Japanese Laid-Open Patent Publication No. 2003-179356.
本發明的目標是提供一種具有極佳層間黏合的印刷電路板。It is an object of the present invention to provide a printed circuit board having excellent interlayer bonding.
根據本發明的態樣,提供一種印刷電路板,其包括:絕緣層,絕緣層的下表面中嵌置有金屬接墊;開口部分,穿過絕緣層且形成於金屬接墊的上表面上;金屬凸塊,形成於開口部分中且具有突出於絕緣層的上表面上方的上表面;以及導電構件,形成於金屬接墊的下表面上,其中導電構件的熔點低於金屬凸塊的熔點,其中金屬接墊的下表面凹陷超過絕緣層的下表面。According to an aspect of the present invention, a printed circuit board includes: an insulating layer having a metal pad embedded in a lower surface thereof; an opening portion passing through the insulating layer and formed on an upper surface of the metal pad; a metal bump formed in the opening portion and having an upper surface protruding above the upper surface of the insulating layer; and a conductive member formed on a lower surface of the metal pad, wherein the melting point of the conductive member is lower than a melting point of the metal bump Wherein the lower surface of the metal pad is recessed beyond the lower surface of the insulating layer.
根據本發明的另一態樣,提供一種印刷電路板,其包括:第一絕緣層,其下表面中嵌置有第一金屬接墊;第一開口部分,穿過第一絕緣層且形成於第一金屬接墊的上表面上;第一金屬凸塊,形成於第一開口部分中;第二絕緣層,層疊於第一絕緣層上且形成於第一金屬凸塊上;以及導電構件,形成於第二金屬接墊的下表面上且接觸第一金屬凸塊的側表面。According to another aspect of the present invention, a printed circuit board includes: a first insulating layer having a first metal pad embedded in a lower surface thereof; a first opening portion passing through the first insulating layer and formed on a first metal bump formed on the upper surface of the first metal pad; a second insulating layer laminated on the first insulating layer and formed on the first metal bump; and a conductive member, Formed on a lower surface of the second metal pad and contacting a side surface of the first metal bump.
提供以下詳細說明是為了幫助讀者獲得對本文中所述方法、設備及/或系統的全面理解。然而,對於此項技術中具有通常知識者而言,本文中所述方法、設備及/或系統的各種改變、潤飾及等效形式將顯而易見。本文中所述操作順序僅為實例,且並非僅限於本文中所提及的該些操作順序,而是如對於此項技術中具有通常知識者而言將顯而易見,除必定以特定次序出現的操作以外,均可有所改變。此外,為提高清晰性及明確性,可省略對對於此項技術中具有通常知識者而言眾所習知的功能及構造的說明。The following detailed description is provided to assist the reader in a comprehensive understanding of the methods, devices and/or systems described herein. Various modifications, adaptations, and equivalents of the methods, devices, and/or systems described herein will be apparent to those skilled in the art. The order of operations described herein is merely an example, and is not limited to the order of operations referred to herein, but will be apparent to those of ordinary skill in the art, except where the operations must occur in a particular order. Other than that, it can be changed. In addition, descriptions of well-known functions and constructions of those skilled in the art can be omitted for clarity and clarity.
本文中所述特徵可被實施為不同形式,且不應被解釋為僅限於本文中所述實例。確切而言,提供本文中所述實例是為了使此揭露內容將透徹及完整,並將向此項技術中具有通常知識者傳達本發明的全部範圍。Features described herein can be implemented in different forms and should not be construed as being limited to the examples described herein. Rather, the examples described herein are provided to be thorough and complete, and the full scope of the present invention will be conveyed to those of ordinary skill in the art.
除非另有定義,否則本文中所使用的全部用語(包括技術用語及科學用語)的含義均與其被本發明所屬技術中具有通常知識者所通常理解的含義相同。在常用字典中所定義的任何用語應被解釋為具有與在相關技術的上下文中的含義相同的含義,且除非另有明確定義,否則不應將其解釋為具有理想化或過於正式的含義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning meaning meaning Any term defined in a commonly used dictionary should be interpreted as having the same meaning as in the context of the related art, and should not be construed as having an idealized or overly formal meaning unless explicitly defined otherwise.
無論圖號如何,將對相同的或對應的組件給定相同的參考編號,且將不再對相同的或對應的組件予以贅述。在本發明的說明通篇中,當闡述特定相關傳統技術確定與本發明的觀點無關時,將省略有關詳細說明。在闡述各種組件時可使用例如「第一(first)」及「第二(second)」等用語,但以上組件不應僅限於以上用語。以上用語僅用於區分各個組件。在附圖中,可誇大、省略或簡要示出一些組件,且組件的尺寸未必反映該些組件的實際尺寸。Regardless of the figure number, the same or corresponding components will be given the same reference numerals, and the same or corresponding components will not be described again. Throughout the description of the present invention, the detailed description will be omitted when it is stated that the specific related conventional techniques are not related to the viewpoint of the present invention. Terms such as "first" and "second" may be used in the description of various components, but the above components should not be limited to the above terms. The above terms are only used to distinguish between components. In the figures, some components may be exaggerated, omitted or briefly shown, and the dimensions of the components do not necessarily reflect the actual dimensions of the components.
在下文中,將參照附圖來詳細闡述本發明的特定實施例。Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings.
圖1示出根據本發明第一實施例的印刷電路板。Figure 1 shows a printed circuit board in accordance with a first embodiment of the present invention.
參照圖1,根據本發明第一實施例的印刷電路板包括上面形成有金屬接墊110的絕緣層100、形成於絕緣層100中的開口部分120、形成於開口部分120中的金屬凸塊及形成於金屬接墊110的下表面上的導電構件P1。Referring to FIG. 1, a printed circuit board according to a first embodiment of the present invention includes an insulating layer 100 having a metal pad 110 formed thereon, an opening portion 120 formed in the insulating layer 100, metal bumps formed in the opening portion 120, and The conductive member P1 formed on the lower surface of the metal pad 110.
絕緣層100是由例如樹脂等絕緣材料製成。絕緣層100的樹脂可由例如熱固性樹脂及熱塑性樹脂等各種材料製成。The insulating layer 100 is made of an insulating material such as a resin. The resin of the insulating layer 100 can be made of various materials such as a thermosetting resin and a thermoplastic resin.
絕緣層100可由具有低介電常數(Dk)及介電損耗(Df)的材料製成。具體而言,絕緣層100可由液晶聚合物(liquid crystal polymer,LCP)、聚四氟乙烯(polytetrafluoroethylene,PTFE)、聚苯醚(polyphenylene ether,PPE)、環烯烴聚合物(cyclo olefin polymer,COP)及全氟烷氧基(perfluoroalkoxy,PFA)中的至少一者形成。此種材料適合於減少用於傳輸高頻訊號的基板中的訊號損耗。The insulating layer 100 may be made of a material having a low dielectric constant (Dk) and a dielectric loss (Df). Specifically, the insulating layer 100 may be a liquid crystal polymer (LCP), a polytetrafluoroethylene (PTFE), a polyphenylene ether (PPE), or a cyclo olefin polymer (COP). And at least one of perfluoroalkoxy (PFA) is formed. This material is suitable for reducing signal loss in substrates used to transmit high frequency signals.
然而,絕緣層100並非僅限於以上材料,且可由環氧樹脂或聚醯亞胺等形成。環氧樹脂的實例包括萘環氧樹脂(naphthalene epoxy resin)、雙酚A型環氧樹脂(bisphenol A type epoxy resin)、雙酚F型環氧樹脂(bisphenol F type epoxy resin)、酚醛清漆環氧樹脂(novolac epoxy resin)、甲酚酚醛清漆環氧樹脂(cresol novolak epoxy resin)、橡膠改質環氧樹脂(rubber modified epoxy resin)、脂環族環氧樹脂(cycloaliphatic epoxy resin)、矽系環氧樹脂(silicon-based epoxy resin)、氮系環氧樹脂(nitrogen-based epoxy resin)、磷系環氧樹脂(phosphorus-based epoxy resin)等。然而,其並非僅限於此。However, the insulating layer 100 is not limited to the above materials, and may be formed of an epoxy resin, a polyimide or the like. Examples of the epoxy resin include naphthalene epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and novolac epoxy. Novolac epoxy resin, cresol novolak epoxy resin, rubber modified epoxy resin, cycloaliphatic epoxy resin, lanthanum epoxy A silicon-based epoxy resin, a nitrogen-based epoxy resin, or a phosphorus-based epoxy resin. However, it is not limited to this.
絕緣層100可為將例如玻璃布(glass cloth)等纖維加強材料(fiber reinforcement material)包含於樹脂中的預浸體(prepreg,PPG)。絕緣層100可為將例如二氧化矽(silica)等無機填料填充於樹脂中的構成膜。可使用味之素構成膜(ajinomoto build-up film,ABF)等作為此種構成膜。The insulating layer 100 may be a prepreg (PPG) in which a fiber reinforcement material such as glass cloth is contained in a resin. The insulating layer 100 may be a constituent film in which an inorganic filler such as silica is filled in the resin. As the constituent film, an ajinomoto build-up film (ABF) or the like can be used.
絕緣層100可由例如感光成像介電(photoimageable dielectric,PID)等感光性材料形成。The insulating layer 100 may be formed of a photosensitive material such as a photoimageable dielectric (PID).
絕緣層100上形成有電路111及金屬接墊110。具體而言,電路111及金屬接墊110可嵌置於絕緣層100的下表面中。電路111是被圖案化以傳輸電性訊號的導體。金屬接墊110是連接至電路111的端部的導體。電路111及金屬接墊110是由例如銅(Cu)、鈀(Pd)、鋁(Al)、鎳(Ni)、鈦(Ti)、金(Au)、鉑(Pt)或其合金等金屬形成。A circuit 111 and a metal pad 110 are formed on the insulating layer 100. Specifically, the circuit 111 and the metal pad 110 may be embedded in the lower surface of the insulating layer 100. Circuit 111 is a conductor that is patterned to transmit electrical signals. Metal pad 110 is a conductor that is connected to the end of circuit 111. The circuit 111 and the metal pad 110 are formed of a metal such as copper (Cu), palladium (Pd), aluminum (Al), nickel (Ni), titanium (Ti), gold (Au), platinum (Pt) or alloy thereof. .
金屬接墊110的下表面凹陷超過絕緣層100的下表面。金屬接墊110的下表面相較於絕緣層100的下表面而言進入絕緣層100內部。因此,在金屬接墊110的下表面與絕緣層100的下表面之間形成台階高度(step-height),且金屬接墊110的下表面與絕緣層100提供預定空間(參見圖7中的110’)。The lower surface of the metal pad 110 is recessed beyond the lower surface of the insulating layer 100. The lower surface of the metal pad 110 enters the inside of the insulating layer 100 as compared with the lower surface of the insulating layer 100. Therefore, a step-height is formed between the lower surface of the metal pad 110 and the lower surface of the insulating layer 100, and the lower surface of the metal pad 110 and the insulating layer 100 provide a predetermined space (see 110 in FIG. 7). ').
電路111的下表面亦可凹陷超過絕緣層100的下表面。亦即,電路111的下表面相較於絕緣層100的下表面而言進入絕緣層100內部。因此,在電路111的下表面與絕緣層100的下表面之間形成台階高度,且電路111的下表面與絕緣層100可提供預定空間(參見圖7中的111’)。The lower surface of the circuit 111 may also be recessed beyond the lower surface of the insulating layer 100. That is, the lower surface of the circuit 111 enters the inside of the insulating layer 100 as compared with the lower surface of the insulating layer 100. Therefore, a step height is formed between the lower surface of the circuit 111 and the lower surface of the insulating layer 100, and the lower surface of the circuit 111 and the insulating layer 100 can provide a predetermined space (see 111' in Fig. 7).
開口部分120形成於絕緣層100中。開口部分120被形成為穿過絕緣層100以位於金屬接墊110的上表面上。開口部分120形成於金屬接墊110的上表面上,以使金屬接墊110的上表面的至少一部分經由開口部分120暴露出。開口部分120可形成為圓柱形。The opening portion 120 is formed in the insulating layer 100. The opening portion 120 is formed to pass through the insulating layer 100 to be located on the upper surface of the metal pad 110. The opening portion 120 is formed on the upper surface of the metal pad 110 such that at least a portion of the upper surface of the metal pad 110 is exposed through the opening portion 120. The opening portion 120 may be formed in a cylindrical shape.
金屬凸塊130形成於開口部分120中。金屬凸塊130的上表面可突出於絕緣層100的上表面上方。Metal bumps 130 are formed in the opening portion 120. The upper surface of the metal bump 130 may protrude above the upper surface of the insulating layer 100.
金屬凸塊130可形成為兩個層。在此種情形中,金屬凸塊130可包括高熔點凸塊131及低熔點凸塊132。高熔點凸塊131是由熔點相對高於低熔點凸塊132的金屬製成的凸塊,而低熔點凸塊132是由熔點相對低於高熔點凸塊131的金屬製成的凸塊。例如,分別而言,高熔點凸塊131可由包括銅的金屬製成,而低熔點凸塊132可由包括錫的金屬製成。The metal bumps 130 may be formed in two layers. In this case, the metal bumps 130 may include high melting point bumps 131 and low melting point bumps 132. The high melting point bump 131 is a bump made of a metal whose melting point is relatively higher than that of the low melting point bump 132, and the low melting point bump 132 is a bump made of a metal whose melting point is relatively lower than that of the high melting point bump 131. For example, respectively, the high melting point bump 131 may be made of a metal including copper, and the low melting point bump 132 may be made of a metal including tin.
低熔點凸塊132可位於高熔點凸塊131上方,且低熔點凸塊132的厚度可小於高熔點凸塊131的厚度。高熔點凸塊131的上表面可位於絕緣層100的上表面之下,且低熔點凸塊132的上表面可位於絕緣層100的上表面上方。亦即,金屬凸塊130的上表面突出於絕緣層100的上表面上方,且高熔點凸塊131與低熔點凸塊132之間的介面可位於絕緣層100的上表面之下。The low melting point bumps 132 may be located above the high melting point bumps 131, and the low melting point bumps 132 may have a thickness less than the thickness of the high melting point bumps 131. The upper surface of the high melting point bump 131 may be located below the upper surface of the insulating layer 100, and the upper surface of the low melting point bump 132 may be located above the upper surface of the insulating layer 100. That is, the upper surface of the metal bump 130 protrudes above the upper surface of the insulating layer 100, and the interface between the high melting point bump 131 and the low melting point bump 132 may be located below the upper surface of the insulating layer 100.
導電構件P1形成於金屬接墊110的下表面上,金屬接墊110的下表面凹陷超過絕緣層100的下表面。亦即,導電構件P1可形成於由金屬接墊110的下表面與絕緣層100形成的空間110’中。導電構件P1可藉由金屬接墊110的下表面與絕緣層100的下表面之間的台階高度而形成。在此種情形中,導電構件P1的下表面可位於與絕緣層100的下表面相同的平面上。The conductive member P1 is formed on the lower surface of the metal pad 110, and the lower surface of the metal pad 110 is recessed beyond the lower surface of the insulating layer 100. That is, the conductive member P1 may be formed in the space 110' formed by the lower surface of the metal pad 110 and the insulating layer 100. The conductive member P1 can be formed by a step height between the lower surface of the metal pad 110 and the lower surface of the insulating layer 100. In this case, the lower surface of the conductive member P1 may be located on the same plane as the lower surface of the insulating layer 100.
導電構件P1可包含例如銅(Cu)、錫(Sn)及銀(Ag)等金屬。具體而言,導電構件P1可為含有金屬的糊膏。然而,其並非僅限於該些材料。可使用具有導電性的任何材料。形成導電構件P1的金屬可與形成低熔點凸塊132的金屬相同。The conductive member P1 may include a metal such as copper (Cu), tin (Sn), and silver (Ag). Specifically, the conductive member P1 may be a paste containing a metal. However, it is not limited to these materials. Any material that is electrically conductive can be used. The metal forming the conductive member P1 may be the same as the metal forming the low melting point bump 132.
導電構件P1的熔點可低於金屬接墊110的熔點,可低於高熔點凸塊131的熔點,且可等於或低於低熔點凸塊132的熔點。The melting point of the conductive member P1 may be lower than the melting point of the metal pad 110, may be lower than the melting point of the high melting point bump 131, and may be equal to or lower than the melting point of the low melting point bump 132.
導電構件P1可更形成於電路111的下表面上,電路111的下表面凹陷超過絕緣層100的下表面。亦即,導電構件P1可形成於由電路111的下表面與絕緣層100形成的空間111’中。導電構件P1可藉由電路111的下表面與絕緣層100的下表面之間的台階高度而形成。在此種情形中,導電構件P1的下表面可位於與絕緣層100的下表面相同的平面上。The conductive member P1 may be formed more on the lower surface of the circuit 111, and the lower surface of the circuit 111 is recessed beyond the lower surface of the insulating layer 100. That is, the conductive member P1 may be formed in the space 111' formed by the lower surface of the circuit 111 and the insulating layer 100. The conductive member P1 can be formed by the step height between the lower surface of the circuit 111 and the lower surface of the insulating layer 100. In this case, the lower surface of the conductive member P1 may be located on the same plane as the lower surface of the insulating layer 100.
根據本發明第一實施例的印刷電路板可為多層式板。多層式印刷電路板包括多個絕緣層100及200、電路111及211、金屬接墊110及210、開口部分120、220、金屬凸塊130、230、導電構件P1、P2等。將對此予以詳細闡述。The printed circuit board according to the first embodiment of the present invention may be a multi-layer board. The multilayer printed circuit board includes a plurality of insulating layers 100 and 200, circuits 111 and 211, metal pads 110 and 210, opening portions 120, 220, metal bumps 130, 230, conductive members P1, P2, and the like. This will be elaborated on.
根據本發明第一實施例的印刷電路板可包括上面形成有第一金屬接墊110的第一絕緣層100、上面形成有第二金屬接墊210的第二絕緣層200、形成於絕緣層100中的第一開口部分120、形成於第二絕緣層200中的第二開口部分220、形成於第一開口部分120中的第一金屬凸塊130、形成於第二開口部分220中的第二金屬凸塊230及形成於第二金屬接墊210的下表面上的導電構件P2。The printed circuit board according to the first embodiment of the present invention may include a first insulating layer 100 having a first metal pad 110 formed thereon, a second insulating layer 200 having a second metal pad 210 formed thereon, and being formed on the insulating layer 100. a first opening portion 120, a second opening portion 220 formed in the second insulating layer 200, a first metal bump 130 formed in the first opening portion 120, and a second formed in the second opening portion 220 The metal bump 230 and the conductive member P2 formed on the lower surface of the second metal pad 210.
第一絕緣層100及第二絕緣層200與上述絕緣層相同。第一絕緣層100與第二絕緣層200可由相同的材料形成,且第二絕緣層200可堆疊於第一絕緣層100上。The first insulating layer 100 and the second insulating layer 200 are the same as the above insulating layer. The first insulating layer 100 and the second insulating layer 200 may be formed of the same material, and the second insulating layer 200 may be stacked on the first insulating layer 100.
第一電路111及第一金屬接墊110嵌置於第一絕緣層100的下表面中。另外,第二電路211及第二金屬接墊210嵌置於第二絕緣層200的下表面中。因此,第二電路211的下表面及第二金屬接墊210的下表面位於第一絕緣層100與第二絕緣層200之間的介面處。The first circuit 111 and the first metal pad 110 are embedded in the lower surface of the first insulating layer 100. In addition, the second circuit 211 and the second metal pad 210 are embedded in the lower surface of the second insulating layer 200. Therefore, the lower surface of the second circuit 211 and the lower surface of the second metal pad 210 are located at the interface between the first insulating layer 100 and the second insulating layer 200.
第二金屬接墊210的下表面凹陷超過第二絕緣層200的下表面。第二金屬接墊210的下表面相較於第二絕緣層200的下表面而言進入第二絕緣層200內部。因此,在第二金屬接墊210的下表面與第二絕緣層200的下表面之間形成台階高度。金屬接墊210的下表面與第二絕緣層200提供預定空間。The lower surface of the second metal pad 210 is recessed beyond the lower surface of the second insulating layer 200. The lower surface of the second metal pad 210 enters the inside of the second insulating layer 200 compared to the lower surface of the second insulating layer 200. Therefore, a step height is formed between the lower surface of the second metal pad 210 and the lower surface of the second insulating layer 200. The lower surface of the metal pad 210 and the second insulating layer 200 provide a predetermined space.
第二電路211的下表面亦可凹陷超過第二絕緣層200的下表面。亦即,第二電路211的下表面相較於第二絕緣層200的下表面而言進入第二絕緣層200內部。因此,在第二電路211的下表面與第二絕緣層200的下表面之間形成台階高度。第二電路211的下表面與第二絕緣層200提供預定空間。The lower surface of the second circuit 211 may also be recessed beyond the lower surface of the second insulating layer 200. That is, the lower surface of the second circuit 211 enters the inside of the second insulating layer 200 as compared with the lower surface of the second insulating layer 200. Therefore, a step height is formed between the lower surface of the second circuit 211 and the lower surface of the second insulating layer 200. The lower surface of the second circuit 211 and the second insulating layer 200 provide a predetermined space.
必要時,第一金屬接墊110的下表面及第二金屬接墊210的下表面可凹陷超過第一絕緣層100的下表面。第一金屬接墊110的下表面相較於第一絕緣層100的下表面而言進入第一絕緣層100內部。因此,在第一金屬接墊110的下表面與第一絕緣層100的下表面之間形成台階高度。第一金屬接墊110的下表面與第一絕緣層100提供預定空間。The lower surface of the first metal pad 110 and the lower surface of the second metal pad 210 may be recessed beyond the lower surface of the first insulating layer 100 as necessary. The lower surface of the first metal pad 110 enters the inside of the first insulating layer 100 compared to the lower surface of the first insulating layer 100. Therefore, a step height is formed between the lower surface of the first metal pad 110 and the lower surface of the first insulating layer 100. The lower surface of the first metal pad 110 and the first insulating layer 100 provide a predetermined space.
第一電路111的下表面亦可凹陷超過第一絕緣層100的下表面。亦即,第一電路11的下表面相較於第一絕緣層100的下表面而言進入第一絕緣層100內部。在第一電路111的下表面與第一絕緣層100的下表面之間形成台階高度,且第一電路111的下表面與第一絕緣層100提供預定空間。The lower surface of the first circuit 111 may also be recessed beyond the lower surface of the first insulating layer 100. That is, the lower surface of the first circuit 11 enters the inside of the first insulating layer 100 as compared with the lower surface of the first insulating layer 100. A step height is formed between the lower surface of the first circuit 111 and the lower surface of the first insulating layer 100, and the lower surface of the first circuit 111 and the first insulating layer 100 provide a predetermined space.
第一開口部分120穿過第一絕緣層100形成於第一金屬接墊110的上表面上,且第二開口部分220穿過第二絕緣層200形成於第二金屬接墊210的上表面上。第一開口部分120與第二開口部分220被設置成彼此重疊。第一開口120與第二開口220彼此重疊此一事實意指當在同一平面上進行虛擬投影時第一開口120與第二開口220彼此重疊。較佳地,第一開口120與第二開口220可被排列成一行,以使第一開口120的中心與第二開口220的中心彼此重合。The first opening portion 120 is formed on the upper surface of the first metal pad 110 through the first insulating layer 100, and the second opening portion 220 is formed on the upper surface of the second metal pad 210 through the second insulating layer 200. . The first opening portion 120 and the second opening portion 220 are disposed to overlap each other. The fact that the first opening 120 and the second opening 220 overlap each other means that the first opening 120 and the second opening 220 overlap each other when the virtual projection is performed on the same plane. Preferably, the first opening 120 and the second opening 220 may be arranged in a row such that the center of the first opening 120 and the center of the second opening 220 coincide with each other.
第一金屬凸塊130形成於第一開口部分120中,且第二金屬凸塊230形成於第二開口部分220中。第一金屬凸塊130及第二金屬凸塊230與上述金屬凸塊無異。當第一開口部分120與第二開口部分220被形成為彼此重疊時,第一金屬凸塊130與第二金屬凸塊230亦被形成為彼此重疊。The first metal bump 130 is formed in the first opening portion 120, and the second metal bump 230 is formed in the second opening portion 220. The first metal bumps 130 and the second metal bumps 230 are the same as the metal bumps described above. When the first opening portion 120 and the second opening portion 220 are formed to overlap each other, the first metal bump 130 and the second metal bump 230 are also formed to overlap each other.
導電構件P2可形成於第二金屬接墊210的下表面上以執行層間結合。此與上述導電構件P1無異。The conductive member P2 may be formed on a lower surface of the second metal pad 210 to perform interlayer bonding. This is no different from the above-described conductive member P1.
亦即,導電構件P2的熔點可低於第二金屬接墊210的熔點,低於高熔點凸塊231的熔點,且等於或低於低熔點凸塊232的熔點。That is, the melting point of the conductive member P2 may be lower than the melting point of the second metal pad 210, lower than the melting point of the high melting point bump 231, and equal to or lower than the melting point of the low melting point bump 232.
導電構件P2可包含例如銅(Cu)、錫(Sn)及銀(Ag)等金屬,且具體而言,導電構件P2可為含有金屬的糊膏。然而,材料並非僅限於該些材料,且可使用具有導電性的任何材料。導電構件P2中所含有的金屬可與低熔點凸塊232中所含有的金屬相同。The conductive member P2 may include a metal such as copper (Cu), tin (Sn), and silver (Ag), and specifically, the conductive member P2 may be a paste containing a metal. However, the materials are not limited to the materials, and any material having electrical conductivity may be used. The metal contained in the conductive member P2 may be the same as the metal contained in the low-melting-point bump 232.
導電構件P2可形成於第二金屬接墊210的下表面上,第二金屬接墊210的下表面凹陷超過第二絕緣層200的下表面。第一金屬凸塊130突出超過第一絕緣層100的上表面,且第一金屬凸塊130的突出的上部部分可凹陷至在第二金屬接墊210的下表面上形成的導電構件P2中。導電構件P2可因此接觸第一金屬凸塊130的側表面。導電構件P2與第一金屬凸塊130彼此接觸的區域中形成有金屬間化合物(intermetallic compound,IMC)。The conductive member P2 may be formed on a lower surface of the second metal pad 210, and a lower surface of the second metal pad 210 may be recessed beyond a lower surface of the second insulating layer 200. The first metal bump 130 protrudes beyond the upper surface of the first insulating layer 100, and the protruding upper portion of the first metal bump 130 may be recessed into the conductive member P2 formed on the lower surface of the second metal pad 210. The conductive member P2 may thus contact the side surface of the first metal bump 130. An intermetallic compound (IMC) is formed in a region where the conductive member P2 and the first metal bump 130 are in contact with each other.
導電構件P2形成於第二金屬接墊210的整個下表面上,以使導電構件P2可設置於第一金屬凸塊130的上表面與第二金屬接墊210的下表面之間以及第一金屬凸塊130的側表面上。The conductive member P2 is formed on the entire lower surface of the second metal pad 210 such that the conductive member P2 can be disposed between the upper surface of the first metal bump 130 and the lower surface of the second metal pad 210 and the first metal On the side surface of the bump 130.
由金屬凸塊與導電構件構成的結合結構可重覆地形成於多個絕緣層中。換言之,儘管以上說明中闡述了第一絕緣層100及第二絕緣層200,然而印刷電路板可包括三個或更多個絕緣層。此亦適用於彼此相鄰的至少兩個絕緣層。A bonding structure composed of a metal bump and a conductive member may be repeatedly formed in the plurality of insulating layers. In other words, although the first insulating layer 100 and the second insulating layer 200 are explained in the above description, the printed circuit board may include three or more insulating layers. This also applies to at least two insulating layers adjacent to each other.
導電構件P1可形成於第一金屬接墊110的下表面上,第一金屬接墊110的下表面凹陷超過第一絕緣層100的下表面。此種導電構件P1可設置於堆疊於第一絕緣層100下方的另一絕緣層的金屬凸塊上。The conductive member P1 may be formed on a lower surface of the first metal pad 110, and a lower surface of the first metal pad 110 is recessed beyond a lower surface of the first insulating layer 100. Such a conductive member P1 may be disposed on a metal bump of another insulating layer stacked under the first insulating layer 100.
視需要,導電構件P3及P4亦可形成於第一電路111的下表面上及第二電路211的下表面上。導電構件P3及P4可形成於電路111及211的下表面的整個部分或一部分上。Conductive members P3 and P4 may also be formed on the lower surface of the first circuit 111 and the lower surface of the second circuit 211, as needed. The conductive members P3 and P4 may be formed on the entire portion or a portion of the lower surface of the circuits 111 and 211.
圖2示出根據本發明第二實施例的印刷電路板。Figure 2 shows a printed circuit board in accordance with a second embodiment of the present invention.
參照圖2,根據本發明第二實施例的印刷電路板包括上面形成有第一金屬接墊110的第一絕緣層100、上面形成有第二金屬接墊210的第二絕緣層100、形成於第一絕緣層100中的第一開口部分120、形成於第二絕緣層200中的第二開口部分220、形成於第一開口部分120中的第一金屬凸塊130、形成於第二開口部分220中的第二金屬凸塊230及形成於第二金屬接墊210的下表面上的導電構件P2。Referring to FIG. 2, a printed circuit board according to a second embodiment of the present invention includes a first insulating layer 100 having a first metal pad 110 formed thereon, and a second insulating layer 100 having a second metal pad 210 formed thereon, formed on a first opening portion 120 in the first insulating layer 100, a second opening portion 220 formed in the second insulating layer 200, a first metal bump 130 formed in the first opening portion 120, and a second opening portion formed in the second opening portion The second metal bump 230 in 220 and the conductive member P2 formed on the lower surface of the second metal pad 210.
在根據本發明第二實施例的印刷電路板中,導電構件P2接觸第一金屬凸塊130的側表面的預定區域或更多區域。此處,導電構件P2環繞第一金屬凸塊130的側表面的一部分或整個部分。「預定區域」可為第一金屬凸塊130位於由第二金屬接墊210的下表面與第二絕緣層200的下表面界定的空間中的區域。亦即,導電構件P2可接觸第一金屬凸塊130超過第一絕緣層100與第二絕緣層200之間的邊界的側表面。具體而言,當第一絕緣層100與第一金屬凸塊130的側表面之間存在間隙且第一絕緣層100及第二絕緣層200被按壓及層疊時,導電構件P2可流動至間隙中且因此,導電構件P2可覆蓋第一金屬凸塊130的側表面的整體的預定區域或更多區域。較佳地,導電構件P2可覆蓋第一金屬凸塊130的整體。導電構件P2與第一金屬凸塊130彼此接觸的區域中形成有金屬間化合物(IMC)。導電構件P2與第一金屬凸塊130之間的接觸區域越大,則黏合越強。In the printed circuit board according to the second embodiment of the present invention, the conductive member P2 contacts a predetermined area or more of the side surface of the first metal bump 130. Here, the conductive member P2 surrounds a part or the entire portion of the side surface of the first metal bump 130. The "predetermined region" may be a region in which the first metal bump 130 is located in a space defined by the lower surface of the second metal pad 210 and the lower surface of the second insulating layer 200. That is, the conductive member P2 may contact the side surface of the first metal bump 130 beyond the boundary between the first insulating layer 100 and the second insulating layer 200. Specifically, when there is a gap between the first insulating layer 100 and the side surface of the first metal bump 130 and the first insulating layer 100 and the second insulating layer 200 are pressed and laminated, the conductive member P2 may flow into the gap. And thus, the conductive member P2 may cover a predetermined area or more of the entire side surface of the first metal bump 130. Preferably, the conductive member P2 may cover the entirety of the first metal bump 130. An intermetallic compound (IMC) is formed in a region where the conductive member P2 and the first metal bump 130 are in contact with each other. The larger the contact area between the conductive member P2 and the first metal bump 130, the stronger the adhesion.
另外,可存在第二金屬接墊210中不形成第二導電接墊P2的區。導電構件P2可不形成於除其中第一金屬凸塊130接觸第二金屬接墊210的下表面的中心區以外的區中。然而,在第二實施例中,不排除如圖4中所示導電構件P2形成於第二金屬接墊210的整個下表面上的情形。In addition, there may be a region in the second metal pad 210 where the second conductive pad P2 is not formed. The conductive member P2 may not be formed in a region other than a central region in which the first metal bump 130 contacts the lower surface of the second metal pad 210. However, in the second embodiment, the case where the conductive member P2 is formed on the entire lower surface of the second metal pad 210 as shown in FIG. 4 is not excluded.
必要時,導電構件P2可藉由改變第一絕緣層100及第二絕緣層200的層疊條件而不位於第一金屬凸塊130的上表面與第二金屬接墊210的上表面之間。亦即,第一金屬凸塊130的上表面可接觸第二金屬接墊210的下表面。The conductive member P2 may be located between the upper surface of the first metal bump 130 and the upper surface of the second metal pad 210 by changing the lamination conditions of the first insulating layer 100 and the second insulating layer 200 as necessary. That is, the upper surface of the first metal bump 130 may contact the lower surface of the second metal pad 210.
舉例而言,若間隙的體積大或者第一金屬凸塊130朝向第二金屬接墊210一側的壓力相對高,則導電構件P2中的所有者流動至間隙中,導電構件P2可不位於第一金屬凸塊130的上表面與第二金屬接墊210的下表面之間。此處,導電構件P2與第二金屬接墊210的下表面之間的接觸區域可等於導電構件P2的厚度。For example, if the volume of the gap is large or the pressure of the first metal bump 130 toward the side of the second metal pad 210 is relatively high, the owner in the conductive member P2 flows into the gap, and the conductive member P2 may not be located first. The upper surface of the metal bump 130 is between the lower surface of the second metal pad 210. Here, the contact area between the conductive member P2 and the lower surface of the second metal pad 210 may be equal to the thickness of the conductive member P2.
第一金屬凸塊130的上表面接觸第二金屬接墊210的下表面,且導電構件P2可形成於第二金屬接墊210的下表面中除與第一金屬凸塊130接觸的區以外的部位。亦即,導電構件P2可形成於第二金屬接墊210的不接觸第一金屬凸塊130的下表面上。The upper surface of the first metal bump 130 contacts the lower surface of the second metal pad 210, and the conductive member P2 may be formed in the lower surface of the second metal pad 210 except the region in contact with the first metal bump 130. Part. That is, the conductive member P2 may be formed on the lower surface of the second metal pad 210 that does not contact the first metal bump 130.
圖3示出根據本發明第三實施例的印刷電路板。Figure 3 shows a printed circuit board in accordance with a third embodiment of the present invention.
參照圖3,根據本發明第三實施例的印刷電路板包括上面形成有第一金屬接墊110的第一絕緣層100、上面形成有第二金屬接墊210的第二絕緣層200、形成於第一絕緣層100中的第一開口部分120、形成於第二絕緣層200中的第二開口部分220、形成於第一開口部分120中的第一金屬凸塊130、形成於第二開口部分220中的第二金屬凸塊230及形成於第二金屬接墊210的下表面上的導電構件P2。Referring to FIG. 3, a printed circuit board according to a third embodiment of the present invention includes a first insulating layer 100 having a first metal pad 110 formed thereon, and a second insulating layer 200 having a second metal pad 210 formed thereon, formed on a first opening portion 120 in the first insulating layer 100, a second opening portion 220 formed in the second insulating layer 200, a first metal bump 130 formed in the first opening portion 120, and a second opening portion formed in the second opening portion The second metal bump 230 in 220 and the conductive member P2 formed on the lower surface of the second metal pad 210.
在根據本發明第三實施例的印刷電路板中,導電構件P2可延伸至第二金屬接墊210的側表面以覆蓋第二金屬接墊210的側表面。當第二金屬接墊210與第二絕緣層200之間存在間隙時,此可為導電構件P2流動至所述間隙中的結果。In the printed circuit board according to the third embodiment of the present invention, the conductive member P2 may extend to the side surface of the second metal pad 210 to cover the side surface of the second metal pad 210. When there is a gap between the second metal pad 210 and the second insulating layer 200, this may be a result of the flow of the conductive member P2 into the gap.
導電構件P2可覆蓋第一金屬凸塊130的側表面的預定區域或更多區域,且亦覆蓋第二金屬接墊210的側表面。另外,導電構件P2可自第一金屬凸塊130的側表面連續形成至第二金屬接墊210的側表面。導電構件P2接觸第一金屬凸塊130及第二金屬接墊210的區域中形成有金屬間化合物(IMC)。導電構件P2與第一金屬凸塊130之間的接觸區域越大,則黏合越強。The conductive member P2 may cover a predetermined area or more of the side surface of the first metal bump 130 and also cover a side surface of the second metal pad 210. In addition, the conductive member P2 may be continuously formed from the side surface of the first metal bump 130 to the side surface of the second metal pad 210. An intermetallic compound (IMC) is formed in a region where the conductive member P2 contacts the first metal bump 130 and the second metal pad 210. The larger the contact area between the conductive member P2 and the first metal bump 130, the stronger the adhesion.
必要時,導電構件P2可藉由改變第一絕緣層100及第二絕緣層200的層疊條件而不位於第一金屬凸塊130的上表面與第二金屬接墊210的下表面之間。亦即,第一金屬凸塊130的上表面可接觸第二金屬接墊210的下表面。舉例而言,若間隙的體積大或者第一金屬凸塊130朝向第二金屬接墊210一側的壓力相對高,則導電構件P2中的所有者流動至間隙中,導電構件P2可不位於第一金屬凸塊130的上表面與第二金屬接墊210的下表面之間。The conductive member P2 may be located between the upper surface of the first metal bump 130 and the lower surface of the second metal pad 210 by changing the lamination conditions of the first insulating layer 100 and the second insulating layer 200 as necessary. That is, the upper surface of the first metal bump 130 may contact the lower surface of the second metal pad 210. For example, if the volume of the gap is large or the pressure of the first metal bump 130 toward the side of the second metal pad 210 is relatively high, the owner in the conductive member P2 flows into the gap, and the conductive member P2 may not be located first. The upper surface of the metal bump 130 is between the lower surface of the second metal pad 210.
圖4示出根據本發明第四實施例的印刷電路板。Figure 4 shows a printed circuit board in accordance with a fourth embodiment of the present invention.
參照圖4,根據本發明第四實施例的印刷電路板包括上面形成有第一金屬接墊110的第一絕緣層100、上面形成有第二金屬接墊210的第二絕緣層200、形成於第一絕緣層100中的第一開口部分120、形成於第二絕緣層200中的第二開口部分220、形成於第一開口部分120中的第一金屬凸塊130、形成於第二開口部分220中的第二金屬凸塊230及形成於第二金屬接墊210的下表面上的導電構件P2。Referring to FIG. 4, a printed circuit board according to a fourth embodiment of the present invention includes a first insulating layer 100 on which a first metal pad 110 is formed, and a second insulating layer 200 on which a second metal pad 210 is formed, formed on a first opening portion 120 in the first insulating layer 100, a second opening portion 220 formed in the second insulating layer 200, a first metal bump 130 formed in the first opening portion 120, and a second opening portion formed in the second opening portion The second metal bump 230 in 220 and the conductive member P2 formed on the lower surface of the second metal pad 210.
在根據本發明第四實施例的印刷電路板中,金屬凸塊130可形成為單個層。在此種情形中,金屬凸塊130可由例如銅等金屬製成。亦即,第一金屬凸塊130與第二金屬凸塊230可各自形成為單個層。In the printed circuit board according to the fourth embodiment of the present invention, the metal bumps 130 may be formed as a single layer. In this case, the metal bumps 130 may be made of a metal such as copper. That is, the first metal bumps 130 and the second metal bumps 230 may each be formed as a single layer.
在此種情形中,導電構件P2的位置並不限於如圖4中所示者,而是可被替換為第一實施例至第三實施例中所述的導電構件P2的位置。In this case, the position of the conductive member P2 is not limited to that shown in FIG. 4, but may be replaced with the position of the conductive member P2 described in the first to third embodiments.
圖5示出根據本發明第五實施例的印刷電路板。Figure 5 shows a printed circuit board in accordance with a fifth embodiment of the present invention.
參照圖5,根據本發明第五實施例的印刷電路板包括上面形成有金屬接墊110的絕緣層100、形成於絕緣層100中的開口部分120、形成於開口部分120中的金屬凸塊130及形成於金屬接墊110的下表面上的導電構件P1。此外,金屬接墊110的下表面上形成有凹陷,且導電構件P1填充於凹陷中。Referring to FIG. 5, a printed circuit board according to a fifth embodiment of the present invention includes an insulating layer 100 on which a metal pad 110 is formed, an opening portion 120 formed in the insulating layer 100, and a metal bump 130 formed in the opening portion 120. And a conductive member P1 formed on a lower surface of the metal pad 110. Further, a recess is formed on the lower surface of the metal pad 110, and the conductive member P1 is filled in the recess.
根據本發明第五實施例的多層式印刷電路板包括上面形成有第一金屬接墊110的第一絕緣層100、上面形成有第二金屬接墊210的第二絕緣層200、形成於第一絕緣層100中的第一開口部分120、形成於第二絕緣層200中的第二開口部分220、形成於第一開口部分120中的第一金屬凸塊130、形成於開口部分220中的第二金屬凸塊230及形成於第二金屬接墊210的下表面上的導電構件P2。第二金屬接墊210的下表面上可形成有凹陷300,且凹陷300的橫截面積可小於第二金屬接墊210的橫截面積。導電構件P2填充於凹陷300中。第一金屬凸塊130可插入凹陷300中。A multilayer printed circuit board according to a fifth embodiment of the present invention includes a first insulating layer 100 on which a first metal pad 110 is formed, and a second insulating layer 200 on which a second metal pad 210 is formed, formed in the first a first opening portion 120 in the insulating layer 100, a second opening portion 220 formed in the second insulating layer 200, a first metal bump 130 formed in the first opening portion 120, and a first portion formed in the opening portion 220 The second metal bump 230 and the conductive member P2 formed on the lower surface of the second metal pad 210. The recess 300 may be formed on the lower surface of the second metal pad 210, and the cross-sectional area of the recess 300 may be smaller than the cross-sectional area of the second metal pad 210. The conductive member P2 is filled in the recess 300. The first metal bump 130 can be inserted into the recess 300.
在圖5中,第一金屬凸塊130形成為兩層式結構,但第五實施例不排除呈單層式結構的第一金屬凸塊130。In FIG. 5, the first metal bump 130 is formed in a two-layer structure, but the fifth embodiment does not exclude the first metal bump 130 in a single layer structure.
當第一金屬凸塊130與第一絕緣層100之間存在間隙時,導電構件P2流動至間隙中以覆蓋第一金屬凸塊130的側表面的預定區域或更多區域。When there is a gap between the first metal bump 130 and the first insulating layer 100, the conductive member P2 flows into the gap to cover a predetermined area or more of the side surface of the first metal bump 130.
另一方面,視例如導電構件P2的流動距離、間隙的體積、層疊壓力等條件而定,導電構件P2可移動超過凹陷300而到達第二金屬接墊210的下表面(未示出)。此外,當第二金屬接墊210與第二絕緣層200之間存在間隙時,導電構件P2可流動至間隙中以覆蓋第二金屬接墊210的側表面(未示出)。On the other hand, depending on conditions such as the flow distance of the conductive member P2, the volume of the gap, the lamination pressure, and the like, the conductive member P2 may move beyond the recess 300 to reach the lower surface (not shown) of the second metal pad 210. Further, when there is a gap between the second metal pad 210 and the second insulating layer 200, the conductive member P2 may flow into the gap to cover a side surface (not shown) of the second metal pad 210.
在下文中,將闡述製造印刷電路板的方法。Hereinafter, a method of manufacturing a printed circuit board will be explained.
圖6至圖9是示出製造根據本發明實施例的印刷電路板的方法中所使用的各製程的剖視圖。6 to 9 are cross-sectional views showing respective processes used in a method of manufacturing a printed circuit board according to an embodiment of the present invention.
參照圖6,提供載體,在所述載體中絕緣材料C0的兩個表面上層疊有金屬箔。絕緣材料C0可為預浸體等。金屬箔可以兩層式結構形成於絕緣材料C0的每一側上,且所述兩層式結構可為銅層。接觸於絕緣材料C0的兩個表面上的金屬箔可為厚度為18微米(μm)的載體金屬箔C1,且層疊於載體金屬箔C1上的金屬箔可為厚度為5微米的晶種金屬箔C2。Referring to Fig. 6, a carrier is provided in which metal foils are laminated on both surfaces of an insulating material C0. The insulating material C0 may be a prepreg or the like. The metal foil may be formed on each side of the insulating material C0 in a two-layer structure, and the two-layer structure may be a copper layer. The metal foil on both surfaces contacting the insulating material C0 may be a carrier metal foil C1 having a thickness of 18 micrometers (μm), and the metal foil laminated on the carrier metal foil C1 may be a seed metal foil having a thickness of 5 μm. C2.
在圖6中,自第二步驟起示出絕緣材料C0的僅一個表面,但可對絕緣材料C0的兩個表面執行相同的製程。In Fig. 6, only one surface of the insulating material C0 is shown from the second step, but the same process can be performed on both surfaces of the insulating material C0.
參照圖6,在金屬箔上塗覆抗蝕劑膜R,且藉由包括曝光及顯影的微影製程(photolithography process)將抗蝕劑膜R圖案化。藉由執行圖案鍍覆(pattern plating)將電路111及金屬接墊110圖案化。可藉由電解鍍覆(electrolytic plating)執行圖案鍍覆,在電解鍍覆中電子通過載體的金屬箔移動。Referring to FIG. 6, a resist film R is coated on a metal foil, and the resist film R is patterned by a photolithography process including exposure and development. The circuit 111 and the metal pad 110 are patterned by performing pattern plating. Pattern plating can be performed by electrolytic plating in which electrons move through the metal foil of the carrier.
移除抗蝕劑膜R,且在載體上層疊絕緣層100。絕緣層100可由LCP、環氧樹脂或PID等製成。The resist film R is removed, and the insulating layer 100 is laminated on the carrier. The insulating layer 100 may be made of LCP, epoxy, PID, or the like.
在絕緣層100中形成開口部分120,且開口部分120位於金屬接墊110上。金屬接墊110的上表面通過開口部分120暴露出。當絕緣層100為感光性,可藉由曝光及顯影製程形成開口部分120。另一方面,當絕緣層100為非感光性,可藉由雷射製程(laser process)形成開口部分120。The opening portion 120 is formed in the insulating layer 100, and the opening portion 120 is located on the metal pad 110. The upper surface of the metal pad 110 is exposed through the opening portion 120. When the insulating layer 100 is photosensitive, the opening portion 120 can be formed by an exposure and development process. On the other hand, when the insulating layer 100 is non-photosensitive, the opening portion 120 can be formed by a laser process.
圖7示出與圖6相關聯的製程。Figure 7 shows the process associated with Figure 6.
參照圖7,在執行除膠渣(desmear)以移除開口部分120中的殘留物(膠渣)之後,在開口部分120中形成金屬凸塊130。金屬凸塊130被形成為突出於絕緣層100的上表面上方。當金屬凸塊130形成為兩層式結構時,首先形成高熔點凸塊131,且在高熔點凸塊131上形成厚度相對較薄的低熔點凸塊132。可藉由電解鍍覆形成高熔點凸塊131及低熔點凸塊132。在此種情形中,電子通過載體的金屬箔移動。Referring to FIG. 7, after the desmear is performed to remove the residue (slag) in the opening portion 120, the metal bumps 130 are formed in the opening portion 120. The metal bump 130 is formed to protrude above the upper surface of the insulating layer 100. When the metal bump 130 is formed in a two-layer structure, the high melting point bump 131 is first formed, and the low melting point bump 132 having a relatively small thickness is formed on the high melting point bump 131. The high melting point bumps 131 and the low melting point bumps 132 can be formed by electrolytic plating. In this case, electrons move through the metal foil of the carrier.
在絕緣層100上堆疊遮罩M,且遮罩M可在隨後欲闡述的蝕刻製程等中保護金屬凸塊130。The mask M is stacked on the insulating layer 100, and the mask M can protect the metal bumps 130 in an etching process or the like to be described later.
在絕緣層100上形成遮罩M之後,移除載體。載體的金屬箔的僅一部分(特別是晶種金屬箔C2)餘留下來,且可藉由單獨的蝕刻製程移除晶種金屬箔C2。此處,當金屬接墊110與晶種金屬箔C2由相同的金屬形成時,將金屬接墊110的下表面與晶種金屬箔C2一起進行蝕刻。如此一來,金屬接墊110的下表面凹陷超過絕緣層100的下表面,且金屬接墊110的下表面與絕緣層100形成空間110’。After the mask M is formed on the insulating layer 100, the carrier is removed. Only a portion of the metal foil of the carrier (particularly the seed metal foil C2) remains, and the seed metal foil C2 can be removed by a separate etching process. Here, when the metal pad 110 and the seed metal foil C2 are formed of the same metal, the lower surface of the metal pad 110 is etched together with the seed metal foil C2. As a result, the lower surface of the metal pad 110 is recessed beyond the lower surface of the insulating layer 100, and the lower surface of the metal pad 110 forms a space 110' with the insulating layer 100.
與金屬接墊110的下表面相似,將電路111的下表面與晶種金屬箔C2一起蝕刻。如此一來,電路111的下表面凹陷超過絕緣層100的下表面。電路111的下表面與絕緣層100構成空間111’。Similar to the lower surface of the metal pad 110, the lower surface of the circuit 111 is etched together with the seed metal foil C2. As a result, the lower surface of the circuit 111 is recessed beyond the lower surface of the insulating layer 100. The lower surface of the circuit 111 and the insulating layer 100 constitute a space 111'.
在金屬接墊110的下表面上形成導電構件P1,並將導電構件P1印刷(填充)於由金屬接墊110的下表面與絕緣層100形成的空間110’中。可將具有用於暴露出金屬接墊110的下表面的孔的單獨的印刷遮罩貼合至絕緣層100的下表面,以提高導電構件P1的印刷準確性。The conductive member P1 is formed on the lower surface of the metal pad 110, and the conductive member P1 is printed (filled) in the space 110' formed by the lower surface of the metal pad 110 and the insulating layer 100. A separate printed mask having holes for exposing the lower surface of the metal pad 110 may be attached to the lower surface of the insulating layer 100 to improve the printing accuracy of the conductive member P1.
亦可在電路111的下表面上形成導電構件P3,並可將導電構件P3印刷(填充)於由電路111的下表面與絕緣層100形成的空間111’中。當印刷遮罩中設置有用於暴露出電路111的下表面的孔時,可在電路111的下表面上形成導電構件P3。然而,若印刷遮罩覆蓋電路111的下表面,則可不在電路111的下表面上形成導電構件。The conductive member P3 may also be formed on the lower surface of the circuit 111, and the conductive member P3 may be printed (filled) in the space 111' formed by the lower surface of the circuit 111 and the insulating layer 100. When a hole for exposing the lower surface of the circuit 111 is provided in the printed mask, the conductive member P3 may be formed on the lower surface of the circuit 111. However, if the printed mask covers the lower surface of the circuit 111, the conductive member may not be formed on the lower surface of the circuit 111.
參照圖8(a)及圖8(b),當堆疊於絕緣層100的上表面上的遮罩M及堆疊於絕緣層100的下表面上的印刷遮罩均被移除時,圖8(a)中的單元基板製作完成。Referring to FIGS. 8(a) and 8(b), when the mask M stacked on the upper surface of the insulating layer 100 and the printed mask stacked on the lower surface of the insulating layer 100 are removed, FIG. 8( The unit substrate in a) is completed.
圖8(b)示出圖8(a)所示下表面。金屬接墊110具有的寬度較電路111所具有的寬度寬,且在金屬接墊110的整個下表面上形成導電構件P1。可視需要在電路111的下表面的至少一部分上形成導電構件P3。Fig. 8(b) shows the lower surface shown in Fig. 8(a). The metal pad 110 has a width wider than that of the circuit 111, and a conductive member P1 is formed on the entire lower surface of the metal pad 110. The conductive member P3 may be formed on at least a portion of the lower surface of the circuit 111 as needed.
參照圖9,在高溫下按壓多個單元基板10、20及30來進行平行構成式層疊以提供多層式印刷電路板。此處,第一金屬凸塊130的上部部分在位於第一金屬凸塊130上方的第二金屬接墊210的下表面上插入導電構件P2中。Referring to Fig. 9, a plurality of unit substrates 10, 20, and 30 are pressed at a high temperature to perform parallel configuration lamination to provide a multilayer printed circuit board. Here, the upper portion of the first metal bump 130 is inserted into the conductive member P2 on the lower surface of the second metal pad 210 located above the first metal bump 130.
僅將第一金屬凸塊130插入導電構件P2中,且在導電構件P2的流動性相對小的條件下,導電構件P2不向外流動。因此可製造出根據第一實施例的印刷電路板。Only the first metal bump 130 is inserted into the conductive member P2, and under the condition that the fluidity of the conductive member P2 is relatively small, the conductive member P2 does not flow outward. Therefore, the printed circuit board according to the first embodiment can be manufactured.
在導電構件P2的流動性穩固且在第一金屬凸塊130與第一絕緣層100之間存在間隙的條件下,導電構件P2可流動至第一金屬凸塊130與第一絕緣層100之間的間隙,且可覆蓋第一金屬凸塊130的側表面的預定區域或更多區域。因此,可製造出根據第二實施例的印刷電路板。The conductive member P2 may flow between the first metal bump 130 and the first insulating layer 100 under the condition that the fluidity of the conductive member P2 is stable and there is a gap between the first metal bump 130 and the first insulating layer 100. The gap may cover a predetermined area or more of the side surface of the first metal bump 130. Therefore, the printed circuit board according to the second embodiment can be manufactured.
此處,視層疊條件而定,第二金屬接墊210的下表面中可存在不形成導電構件P2的區。亦即,可不在除第一金屬接墊130與第二金屬接墊210相接的區以外的部位形成導電構件P2。Here, depending on the lamination condition, a region where the conductive member P2 is not formed may exist in the lower surface of the second metal pad 210. That is, the conductive member P2 may not be formed at a portion other than the region where the first metal pad 130 and the second metal pad 210 are in contact with each other.
另外,第一金屬凸塊130的上表面與第二金屬接墊210的下表面可彼此接觸。此外,導電構件P2與第二金屬接墊210的下表面可僅在第一金屬凸塊130周圍進行接觸。In addition, the upper surface of the first metal bump 130 and the lower surface of the second metal pad 210 may be in contact with each other. Further, the conductive member P2 and the lower surface of the second metal pad 210 may be in contact only around the first metal bump 130.
另一方面,在導電構件P2的流動性穩固且在第二金屬接墊210與第二絕緣層200之間存在間隙的條件下,導電構件P2可流動至第二金屬接墊210與第二絕緣層200之間的間隙,且不僅覆蓋第一金屬凸塊130的側表面,而且覆蓋第二金屬接墊210的側表面。因此,可製造出根據本發明第三實施例的印刷電路板。On the other hand, under the condition that the fluidity of the conductive member P2 is stable and there is a gap between the second metal pad 210 and the second insulating layer 200, the conductive member P2 may flow to the second metal pad 210 and the second insulation. The gap between the layers 200 covers not only the side surface of the first metal bump 130 but also the side surface of the second metal pad 210. Therefore, a printed circuit board according to the third embodiment of the present invention can be manufactured.
此外,在此種情形中,導電構件P2可覆蓋第一金屬凸塊130的側表面的預定區域或更多區域。Further, in this case, the conductive member P2 may cover a predetermined area or more of the side surface of the first metal bump 130.
圖10至圖11是示出製造根據本發明的另一實施例的印刷電路板的方法中所使用的各製程的剖視圖。10 to 11 are cross-sectional views showing respective processes used in a method of manufacturing a printed circuit board according to another embodiment of the present invention.
除將金屬凸塊130形成為單個層以外,圖10及圖11中所述製造方法實質上與參照圖6至圖9所述的方法相同。在此種情形中,將金屬凸塊130形成為突出於絕緣層100的上表面上方。藉由此種方法,可製造出根據第四實施例的印刷電路板。The manufacturing method described in FIGS. 10 and 11 is substantially the same as the method described with reference to FIGS. 6 to 9 except that the metal bumps 130 are formed as a single layer. In this case, the metal bumps 130 are formed to protrude above the upper surface of the insulating layer 100. By this method, the printed circuit board according to the fourth embodiment can be manufactured.
圖12至圖14是示出製造根據本發明又一實施例的印刷電路板的方法中所使用的各製程的剖視圖。12 to 14 are cross-sectional views showing respective processes used in a method of manufacturing a printed circuit board according to still another embodiment of the present invention.
圖12可被理解為連接在圖6所示製程之後的製程。Figure 12 can be understood as a process that is connected after the process shown in Figure 6.
參照圖12,在開口部分120中形成金屬凸塊130。將金屬凸塊130形成為突出於絕緣層100的上表面上方。當金屬凸塊130形成為兩層式結構時,首先形成高熔點凸塊131,且在高熔點凸塊131上形成厚度相對較薄的低熔點凸塊132。可藉由電解鍍覆形成高熔點凸塊131及低熔點凸塊132。在此種情形中,電子通過載體的金屬箔移動。Referring to FIG. 12, metal bumps 130 are formed in the opening portion 120. The metal bump 130 is formed to protrude above the upper surface of the insulating layer 100. When the metal bump 130 is formed in a two-layer structure, the high melting point bump 131 is first formed, and the low melting point bump 132 having a relatively small thickness is formed on the high melting point bump 131. The high melting point bumps 131 and the low melting point bumps 132 can be formed by electrolytic plating. In this case, electrons move through the metal foil of the carrier.
可在絕緣層100上堆疊遮罩M,且遮罩M可在隨後欲闡述的蝕刻製程等中保護金屬凸塊130。The mask M may be stacked on the insulating layer 100, and the mask M may protect the metal bumps 130 in an etching process or the like to be described later.
在絕緣層100上形成遮罩M之後,移除載體。載體的金屬箔的僅一部分(特別是晶種金屬箔C2)餘留下來,且可藉由單獨的蝕刻製程移除晶種金屬箔C2。此處,當金屬接墊110與晶種金屬箔C2由相同的金屬形成時,將金屬接墊110的下表面與晶種金屬箔C2一起進行蝕刻。如此一來,金屬接墊110的下表面凹陷超過絕緣層100的下表面。After the mask M is formed on the insulating layer 100, the carrier is removed. Only a portion of the metal foil of the carrier (particularly the seed metal foil C2) remains, and the seed metal foil C2 can be removed by a separate etching process. Here, when the metal pad 110 and the seed metal foil C2 are formed of the same metal, the lower surface of the metal pad 110 is etched together with the seed metal foil C2. As a result, the lower surface of the metal pad 110 is recessed beyond the lower surface of the insulating layer 100.
與金屬接墊110的下表面相似,將電路111的下表面與晶種金屬箔C2一起蝕刻。如此一來,電路111的下表面可凹陷超過絕緣層100的下表面。Similar to the lower surface of the metal pad 110, the lower surface of the circuit 111 is etched together with the seed metal foil C2. As a result, the lower surface of the circuit 111 can be recessed beyond the lower surface of the insulating layer 100.
使金屬接墊110的下表面經歷二次蝕刻(secondary etching)以形成凹陷300。凹陷300在面積上可小於金屬接墊110,且凹陷300可位於金屬接墊110的中心中。可在絕緣層100的下表面上層疊蝕刻遮罩之後執行用於形成凹陷300的二次蝕刻。蝕刻遮罩覆蓋電路111的下表面,以使電路111的下表面中可不形成凹陷300。The lower surface of the metal pad 110 is subjected to secondary etching to form the recess 300. The recess 300 may be smaller in area than the metal pad 110, and the recess 300 may be located in the center of the metal pad 110. The secondary etching for forming the recess 300 may be performed after laminating the etching mask on the lower surface of the insulating layer 100. The etch mask covers the lower surface of the circuit 111 such that the recess 300 may not be formed in the lower surface of the circuit 111.
凹陷300的深度可小於或等於金屬接墊110的厚度且可慮及電導特性而被設定為預定深度。The depth of the recess 300 may be less than or equal to the thickness of the metal pad 110 and may be set to a predetermined depth in consideration of electrical conductivity characteristics.
具體而言,在金屬接墊110的下表面上形成導電構件P1,並將導電構件P1印刷(填充)於凹陷300中。可將具有用於暴露出凹陷300的孔的單獨的印刷遮罩貼合至絕緣層100的下表面,以提高導電構件P1的印刷準確性。Specifically, the conductive member P1 is formed on the lower surface of the metal pad 110, and the conductive member P1 is printed (filled) in the recess 300. A separate printed mask having holes for exposing the recess 300 may be attached to the lower surface of the insulating layer 100 to improve the printing accuracy of the conductive member P1.
參照圖13(a)及圖13(b),當堆疊於絕緣層100的上表面上的遮罩M及堆疊於絕緣層100的下表面上的印刷遮罩均被移除時,單元基板10及20、30製作完成。Referring to FIGS. 13(a) and 13(b), when the mask M stacked on the upper surface of the insulating layer 100 and the printed mask stacked on the lower surface of the insulating layer 100 are both removed, the unit substrate 10 is removed. And 20, 30 production is completed.
圖13(b)示出圖13(a)所示下表面。金屬接墊110具有的寬度較電路111的寬度寬,且形成於凹陷300中的導電構件P1的面積小於金屬接墊110的面積。必要時,可不在電路111的下表面上形成凹陷300,且可不在電路111的下表面上形成導電構件P1。Fig. 13 (b) shows the lower surface shown in Fig. 13 (a). The metal pad 110 has a width wider than that of the circuit 111, and the area of the conductive member P1 formed in the recess 300 is smaller than the area of the metal pad 110. The recess 300 may not be formed on the lower surface of the circuit 111 as necessary, and the conductive member P1 may not be formed on the lower surface of the circuit 111.
參照圖14,在高溫下按壓多個單元基板10、20及30來進行平行構成式層疊以提供多層式印刷電路板。此處,第一金屬凸塊130的上部部分在位於第一金屬凸塊130上方的第二金屬接墊210的下表面上插入凹陷300中的導電構件P2中。如此一來,可製造出根據第五實施例的印刷電路板。Referring to Fig. 14, a plurality of unit substrates 10, 20, and 30 are pressed at a high temperature to perform parallel configuration lamination to provide a multilayer printed circuit board. Here, the upper portion of the first metal bump 130 is inserted into the conductive member P2 in the recess 300 on the lower surface of the second metal pad 210 located above the first metal bump 130. In this way, the printed circuit board according to the fifth embodiment can be manufactured.
在導電構件P2的流動性相對小的條件下,僅將第一金屬凸塊130插入導電構件P2中,且導電構件P2可不向外流動。導電構件可流動至第一金屬凸塊130與第一絕緣層100之間的間隙,且在導電構件P2的流動性穩固且在第一金屬凸塊130與第一絕緣層100之間存在間隙的條件下,導電構件P2可覆蓋第一金屬凸塊130的側表面的預定區域或更多區域。第二金屬接墊210的下表面上可存在不形成導電構件P2的區域。亦即,可不在除第一金屬接墊130與第二金屬接墊210相接的區以外的部位形成導電構件P2。Under the condition that the fluidity of the conductive member P2 is relatively small, only the first metal bump 130 is inserted into the conductive member P2, and the conductive member P2 may not flow outward. The conductive member may flow to a gap between the first metal bump 130 and the first insulating layer 100, and the fluidity of the conductive member P2 is stable and there is a gap between the first metal bump 130 and the first insulating layer 100. In the condition, the conductive member P2 may cover a predetermined area or more of the side surface of the first metal bump 130. A region where the conductive member P2 is not formed may exist on the lower surface of the second metal pad 210. That is, the conductive member P2 may not be formed at a portion other than the region where the first metal pad 130 and the second metal pad 210 are in contact with each other.
第一金屬凸塊130的上表面與第二金屬接墊210的下表面可彼此接觸。此外,導電構件P2與第二金屬接墊210的下表面可僅在第一金屬凸塊130周圍進行接觸。The upper surface of the first metal bump 130 and the lower surface of the second metal pad 210 may be in contact with each other. Further, the conductive member P2 and the lower surface of the second metal pad 210 may be in contact only around the first metal bump 130.
在導電構件P2的流動性穩固且第二金屬接墊210與第二絕緣層200之間存在間隙的條件下,導電構件P2可流動至第二金屬接墊210與第二絕緣層200之間的間隙,且導電構件P2可不僅覆蓋第一金屬凸塊130的側表面,而且覆蓋第二金屬接墊210的側表面。此外,在此種情形中,導電構件P2可覆蓋第一金屬凸塊130的側表面的預定區域或更多區域。The conductive member P2 may flow between the second metal pad 210 and the second insulating layer 200 under the condition that the fluidity of the conductive member P2 is stable and there is a gap between the second metal pad 210 and the second insulating layer 200. The gap, and the conductive member P2 may cover not only the side surface of the first metal bump 130 but also the side surface of the second metal pad 210. Further, in this case, the conductive member P2 may cover a predetermined area or more of the side surface of the first metal bump 130.
儘管本發明包括特定實例,然而對於此項技術中具有通常知識者而言將顯而易見,在不背離申請專利範圍及其等效範圍的精神及範圍的條件下,可在該些實例中作出各種形式及細節上的變化。本文中所述實例應被視作僅用於說明意義,而非用於限制。對每一實例中的特徵或態樣的說明應被視作適用於其他實例中的相似特徵或態樣。若以不同的次序執行所述技術及/或若以不同的方式對所述系統、架構、裝置或電路中的組件加以組合及/或以其他組件或其等效組件進行替換或補充,則可達成適合的結果。因此,本發明的範圍並非由詳細說明界定,而是由申請專利範圍及其等效範圍界定,且處於申請專利範圍及其等效範圍的範圍內的所有變動皆應被視作包含於本發明中。Although the present invention includes specific examples, it will be apparent to those skilled in the art that various forms can be made in the examples without departing from the spirit and scope of the scope of the claims. And changes in the details. The examples described herein are to be considered as illustrative only and not as limiting. Descriptions of features or aspects in each instance should be considered as suitable features or aspects in other examples. If the techniques are performed in a different order and/or if components in the system, architecture, apparatus, or circuitry are combined and/or replaced or supplemented with other components or equivalent components thereof, Achieve a suitable result. Therefore, the scope of the invention is not to be limited by the details of the invention, but the scope of the claims and the equivalents thereof in.
10、20、30‧‧‧單元基板10, 20, 30‧‧‧ unit substrate
100、200‧‧‧絕緣層100, 200‧‧‧ insulation
110、210‧‧‧金屬接墊110, 210‧‧‧ metal pads
110’、111’‧‧‧空間110’, 111’‧‧‧ space
111、211‧‧‧電路111, 211‧‧‧ circuits
120、220‧‧‧開口部分120, 220‧‧‧ openings
130、230‧‧‧金屬凸塊130, 230‧‧‧ metal bumps
131、231‧‧‧高熔點凸塊131, 231‧‧‧ high melting point bumps
132、232‧‧‧低熔點凸塊132, 232‧‧‧low melting point bumps
300‧‧‧凹陷300‧‧‧ dent
P1、P2、P3、P4‧‧‧導電構件P1, P2, P3, P4‧‧‧ conductive members
C0‧‧‧絕緣材料C0‧‧‧Insulation material
C1‧‧‧載體金屬箔C1‧‧‧ carrier metal foil
C2‧‧‧晶種金屬箔C2‧‧‧ seed metal foil
R‧‧‧抗蝕劑膜R‧‧‧resist film
M‧‧‧遮罩M‧‧‧ mask
圖1示出根據本發明第一實施例的印刷電路板。 圖2示出根據本發明第二實施例的印刷電路板。 圖3示出根據本發明第三實施例的印刷電路板。 圖4示出根據本發明第四實施例的印刷電路板。 圖5示出根據本發明第五實施例的印刷電路板。 圖6至圖9是示出製造根據本發明實施例的印刷電路板的方法中所使用的各製程的剖視圖。 圖10至圖11是示出製造根據本發明另一實施例的印刷電路板的方法中所使用的各製程的剖視圖。 圖12至圖14是示出製造根據本發明又一實施例的印刷電路板的方法中所使用的各製程的剖視圖。 在所有圖式及詳細說明通篇中,相同的參考編號指代相同的元件。各圖式可能並非按比例繪製,且為清晰、示出及方便起見,可誇大圖式中的元件的相對大小、比例及繪示。Figure 1 shows a printed circuit board in accordance with a first embodiment of the present invention. Figure 2 shows a printed circuit board in accordance with a second embodiment of the present invention. Figure 3 shows a printed circuit board in accordance with a third embodiment of the present invention. Figure 4 shows a printed circuit board in accordance with a fourth embodiment of the present invention. Figure 5 shows a printed circuit board in accordance with a fifth embodiment of the present invention. 6 to 9 are cross-sectional views showing respective processes used in a method of manufacturing a printed circuit board according to an embodiment of the present invention. 10 to 11 are cross-sectional views showing respective processes used in a method of manufacturing a printed circuit board according to another embodiment of the present invention. 12 to 14 are cross-sectional views showing respective processes used in a method of manufacturing a printed circuit board according to still another embodiment of the present invention. Throughout the drawings and the detailed description, the same reference numerals refer to the same elements. The figures may not be drawn to scale, and the relative size, proportions, and depictions of the elements in the drawings may be exaggerated for clarity, illustration, and convenience.
Claims (23)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
??10-2017-0136856 | 2017-10-20 | ||
KR1020170136856A KR102442386B1 (en) | 2017-10-20 | 2017-10-20 | Printed circuit board |
KR10-2017-0136856 | 2017-10-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201918139A true TW201918139A (en) | 2019-05-01 |
TWI813580B TWI813580B (en) | 2023-09-01 |
Family
ID=66285817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107125939A TWI813580B (en) | 2017-10-20 | 2018-07-26 | Printed circuit board |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7358715B2 (en) |
KR (1) | KR102442386B1 (en) |
TW (1) | TWI813580B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12068172B2 (en) * | 2019-07-30 | 2024-08-20 | Intel Corporation | Sacrificial pads to prevent galvanic corrosion of FLI bumps in EMIB packages |
CN113838760A (en) * | 2020-06-23 | 2021-12-24 | 群创光电股份有限公司 | Circuit structure and manufacturing method thereof |
CN114501840B (en) * | 2020-10-26 | 2024-07-05 | 鹏鼎控股(深圳)股份有限公司 | Manufacturing method of circuit board assembly and circuit board assembly |
CN115842254B (en) * | 2023-03-01 | 2023-05-12 | 上海合见工业软件集团有限公司 | Stacked interconnection system and circuit board |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0955569A (en) * | 1995-08-11 | 1997-02-25 | Hitachi Ltd | Thin film wiring sheet, multilayer wiring board and their production |
TW512653B (en) * | 1999-11-26 | 2002-12-01 | Ibiden Co Ltd | Multilayer circuit board and semiconductor device |
JP2001320167A (en) * | 2000-05-10 | 2001-11-16 | Ibiden Co Ltd | Method of manufacturing multilayer circuit board |
US6573460B2 (en) * | 2001-09-20 | 2003-06-03 | Dpac Technologies Corp | Post in ring interconnect using for 3-D stacking |
JP3572305B2 (en) | 2001-09-27 | 2004-09-29 | 松下電器産業株式会社 | INSULATING SHEET, MULTI-LAYER WIRING BOARD, AND ITS MANUFACTURING METHOD |
JP2003243837A (en) * | 2002-02-20 | 2003-08-29 | Sumitomo Bakelite Co Ltd | Multilayer wiring board |
JP4239650B2 (en) * | 2003-03-31 | 2009-03-18 | 住友ベークライト株式会社 | Manufacturing method of multilayer wiring board |
JP2006108211A (en) * | 2004-10-01 | 2006-04-20 | North:Kk | Wiring board, multilayered wiring circuit board using the board, and method of manufacturing the multilayered wiring circuit board |
JP2007173343A (en) * | 2005-12-20 | 2007-07-05 | Sumitomo Bakelite Co Ltd | Multilayer board and electronic apparatus |
JP4431606B2 (en) * | 2007-10-05 | 2010-03-17 | シャープ株式会社 | Semiconductor device, semiconductor device mounting method, and semiconductor device mounting structure |
JP2012129369A (en) * | 2010-12-15 | 2012-07-05 | Ngk Spark Plug Co Ltd | Wiring board |
JP2012190887A (en) * | 2011-03-09 | 2012-10-04 | Murata Mfg Co Ltd | Electronic component |
JP2015034282A (en) * | 2013-08-08 | 2015-02-19 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | Composite material for circuit board production, and circuit board ingredient material produced using the same |
-
2017
- 2017-10-20 KR KR1020170136856A patent/KR102442386B1/en active IP Right Grant
-
2018
- 2018-07-25 JP JP2018139486A patent/JP7358715B2/en active Active
- 2018-07-26 TW TW107125939A patent/TWI813580B/en active
Also Published As
Publication number | Publication date |
---|---|
JP2019080043A (en) | 2019-05-23 |
TWI813580B (en) | 2023-09-01 |
JP7358715B2 (en) | 2023-10-11 |
KR20190044428A (en) | 2019-04-30 |
KR102442386B1 (en) | 2022-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI813580B (en) | Printed circuit board | |
TWI778105B (en) | Printed circuit board | |
CN107770947A (en) | The manufacture method of printed wiring board and printed wiring board | |
TWI806865B (en) | Printed circuit board | |
KR102069659B1 (en) | Method for manufacturing semiconductor package substrate and semiconductor package substrate manufactured using the same | |
US10798828B2 (en) | Circuit board structures and methods of fabricating the same | |
JP2018032660A (en) | Printed wiring board and method for manufacturing the same | |
JP2010171387A (en) | Circuit board structure and production method therefor | |
KR20070068268A (en) | Method for manufacturing wiring board | |
JP5715237B2 (en) | Flexible multilayer board | |
CN107770946B (en) | Printed wiring board and method for manufacturing the same | |
JP2008244030A (en) | Wiring board incorporating capacitor | |
JP2019021863A (en) | Multilayer substrate | |
JP2010034430A (en) | Wiring board and method for manufacturing the same | |
JP6637608B2 (en) | Component-embedded substrate and manufacturing method thereof | |
JP7214951B2 (en) | printed circuit board | |
CN102573333B (en) | Method for manufacturing printed wiring board, printed wiring board, and electronic device | |
JP2004253648A (en) | Printed circuit board and method for manufacturing the same, and multi-layer printed wiring board and method for manufacturing the same | |
TWI527164B (en) | Method for forming a package substrate | |
JP2019080042A (en) | Printed circuit board | |
KR20140025824A (en) | Manufacturing method of electronic chip embedded circuit board | |
JP5122846B2 (en) | Wiring board with built-in capacitor | |
KR20190072331A (en) | Printed circuit board and method for manufacturing the same | |
KR20190046505A (en) | Printed circuit board | |
JP2017103261A (en) | Wiring board and manufacturing method of the same |