TW201908537A - Copper powder metal plating layer, metal substrate, energy-saving anti-burst heat dissipation device, and preparation process thereof having advantages of eco-friendly preparation process, strong capillary strength, excellent evaporation performance, well-maintained hardness, and excellent anti-burst performance - Google Patents

Abstract

The present invention discloses a copper powder metal plating layer, a metal substrate having the metal plating layer, an energy-saving anti-burst heat dissipation device, and a preparation process thereof. The preparation process of the copper powder metal plating layer comprises: a step c of attaching a metal layer, during which the liquid in a work tank has a temperature of 1 to 15 DEG C, wherein attaching the metal layer includes at least the steps of attaching a base layer, attaching a flake-like metal layer and attaching a bonding layer. The metal layer with the flake-like structure obtained from attachment has strong capillary strength and excellent evaporation performance. The metal substrate with the copper powder metal plating layer and the energy-saving anti-burst heat dissipation device have advantages of eco-friendly preparation process, strong capillary strength, excellent evaporation performance, well-maintained hardness of the metal substrate, and excellent anti-burst performance. The energy-saving anti-burst heat dissipation device can achieve a product of 0.3 mm thickness, thereby overcoming the technical bottleneck of the prior art in which only a heat pipe heat-dissipation device of 0.6 mm thickness can be achieved.

Description

 Copper powder metal plating layer, metal substrate, energy-saving anti-expansion and blasting heat-dissipating device and preparation method thereof  

The invention relates to the technical field of heat dissipating devices, in particular to a method for preparing a copper powder metal plating layer, a metal substrate having the copper powder metal plating layer, an energy-saving anti-expansion and blasting heat dissipating device and a preparation method thereof.

As electronic products gradually develop toward integration and high speed, the heat dissipation performance of electronic products has become an urgent problem to ensure the quality of electronic products.

In the prior art, the heat dissipating device mostly uses the heat dissipating fins to dissipate heat, and in part, in order to improve the heat dissipating efficiency, the fan is added to improve the air fluidity. However, this type of heat dissipation is still difficult to meet the efficiency requirements for rapid heat dissipation. How to absorb heat in a short period of time and quickly transfer heat to release it becomes an important research topic in the field of heat dissipation.

There are also some technologies that use the capillary principle of the condenser to dissipate heat, but as of now, this technology still cannot be industrialized in the industrial field. Deciding the core of this technology is how to prepare a metal plating method with strong capillary force, fast evaporation speed and no damage to the rigidity of the metal substrate. In addition, the metal plating in the prior art is difficult to achieve a thickness of 1 mm or less, and now the thinnest of the mobile phone heat pipe can only be 0.6 mm. Therefore, in view of the deficiencies of the prior art, it is necessary to provide a method for preparing a copper metal plating layer, a metal substrate having the metal plating layer, an energy-saving anti-expansion heat-dissipating device, and a preparation method thereof to solve the prior art.

One of the objects of the present invention is to avoid the deficiencies of the prior art, and to replace the method for preparing a copper powder metal plating layer by a conventional method for processing a uniform temperature plate. The copper powder metal plating layer prepared by the preparation method has a snowflake shape or a coral shape. The surface area is large, the evaporation speed is fast, the capillary force is stronger, the thickness is thinner, and the thickness can be 0.1 mm, and the prepared copper powder metal plating layer and the metal substrate have strong adhesion. In the preparation process, the rigidity of the metal substrate is not damaged by high-temperature sintering, the hardness and the firmness of the metal substrate can be maintained, and the welding method of the high-temperature copper solder paste is replaced by laser or friction welding, and the preparation method has short time and consumption. It can be small and has the characteristics of energy saving and environmental protection.

The above object of the present invention is achieved by the following technical means.

A method for preparing a copper powder metal plating layer, comprising the steps of: a. cleaning the metal substrate; b. wrapping the other surface of the metal substrate to expose only the working surface to which the metal layer needs to be attached; c. attaching the metal layer, by using the fixture The metal substrate exposing only the working surface is immersed in the working tank, and in the attaching step, the temperature of the liquid in the working tank is maintained at 1 to 15 degrees C, so that the shape of the copper powder is controlled to be a snowflake or a coral. High temperature copper ion activity becomes stronger, which is not conducive to adhesion, and it is easy to be burnt black and easy to oxidize at high current; the liquid in the working tank maintains the following composition ratio: sulfuric acid concentration is 70 to 85g/L, copper sulfate concentration It is 250 to 260 g/L, and the solvent is pure water; the adhesion metal layer includes at least a step of attaching the underlayer, attaching the snow-like metal layer, and attaching the fastening layer, wherein the underlying metal particle has a particle size of 0.1. Up to 1 nm, the thickness of the underlayer is 0.01 to 0.05 mm, and the bottom layer is connected to the working surface of the metal substrate, and then the snow-like metal layer is attached. The particle size of the metal particles of the snowflake metal layer is 1.5 to 10 nm, and the snow-like metal layer The thickness is 0.1 to 2 mm, and then the fastening layer is attached, the metal particles of the fastening layer have a particle diameter of 0.5 to 1.5 nm, and the fastening layer has a thickness of 1 to 5 nm; d. the metal substrate to which the metal layer is attached Cleaning; and e. drying the metal substrate after the step d cleaning and drying the liquid to obtain a copper powder metal plating layer having a liquid absorbing capillary force.

Preferably, in the method for preparing the copper powder metal plating layer, the current is controlled to be 0.8 to 1.1 amps in the step of attaching the underlayer, and the adhesion time is 10 to 15 minutes; in the step of attaching the snowflake metal layer, the current is controlled at 1.5 to 8.0. Amperage, the attachment time is 2 to 10 minutes; in the step of attaching the fastening layer, the current is controlled to be 0.3 to 1.0 ampere according to the size of the surface, and the time is controlled to be 1 to 2 hours.

Preferably, the underlying layer, the snowflake-shaped metal layer and the fastening layer are respectively one or more layers.

Preferably, the method for preparing a copper powder metal plating layer is as follows: when the current is controlled at 1.5 amps, and the adhesion is 2 minutes to obtain a snowflake metal layer with a thickness of 0.1 mm; or the current is adjusted. 2.5 amps, attaching 2 minutes to obtain a snowflake-like metal layer with a thickness of 0.15 to 0.2 mm; or adjusting the current to 3.0 amps, attaching for 2.5 minutes to obtain a snowflake-like metal layer with a thickness of 0.25 to 0.3 mm; or adjusting the current to 4.0 amps , attaching for 3 minutes to obtain a snowflake metal layer with a thickness of 0.35 mm; or adjusting the current to 4.5 to 5.0 amps, attaching for 3 minutes to obtain a snowflake metal layer with a thickness of 0.4 mm; or adjusting the current to 5.5 amps, attaching for 4 minutes Obtain a snowflake metal layer with a thickness of 0.5 mm; or adjust the current to 6 amps, attach for 5 minutes to obtain a snowflake metal layer with a thickness of 0.6 mm; or adjust the current to 6.5 amps, and attach for 5 minutes to obtain an adhesion thickness of 0.7 to 0.8mm snowflake metal layer; or adjust the current to 7 amps, attach for 6 minutes to obtain a snowflake metal layer with a thickness of 0.9mm; or adjust The current was 8 amps and attached for 6 minutes to obtain a snowflake-like metal layer with a thickness of 1 mm.

Preferably, the above step a is specifically washing with 5% to 15% of dilute sulfuric acid for 4 to 5 minutes, and then washing at least three times with pure water to clean the surface of the metal substrate; and step d cleaning the metal plate to which the metal layer is attached Specifically, the metal substrate is placed in a cleaning tank containing 5 wt% soda ash, and the liquid in the cleaning tank is heated to 40 to 60 ° C by ultrasonic waves, washed for 10 to 15 minutes, and then washed with water for two to three times; The cleaned metal plate is used to absorb residual moisture in the metal layer with absorbent paper, and then dried in a nitrogen protective case to obtain a copper powder metal plating layer having water absorbing capillary force to prevent oxidation.

The preparation method of the copper powder metal plating layer of the invention is completed in about three hours, the preparation process is short, the energy consumption is small, and the energy saving and environmental protection features are characterized. The prepared copper powder copper powder metal coating has a snowflake shape or a coral shape, a large surface area, a fast evaporation speed, a stronger capillary force, a thinner thickness, and a thickness of 0.1 mm, and the prepared copper powder metal plating layer is attached to the metal substrate. Strong. In the preparation process, the rigidity of the metal substrate is not damaged without high-temperature sintering, and the hardness of the metal substrate can be maintained.

Another object of the present invention is to provide a metal substrate having a copper powder metal plating layer which is prepared by the above-described preparation method. The copper powder metal plating layer of the prepared metal substrate has good adhesion, strong capillary force, excellent evaporation performance, and good anti-explosion performance of the metal substrate.

The invention also provides a preparation method of the energy-saving anti-explosion-expanding heat-dissipating device, comprising the following steps: (1) electroplating copper powder metal by using the above-mentioned copper powder metal plating layer as a metal substrate upper plate and a metal substrate lower plate respectively (2) The upper and lower plates plated with the copper powder metal plating are sealed by laser welding; (3) the high-frequency welding degassing head is used to obtain the temperature equalizing plate, and then the degassing head is uniformly heated. The inside of the plate is filled with refrigerant; (4) the first vacuum is applied, so that the internal air pressure of the chamber of the temperature equalizing plate reaches 6.0 ^-1 to 8.0 ^-2 Pa; (5) the second degassing, the first vacuum is taken The heating plate is heated to 100 to 150 degrees C, so that the gas that has not been pumped out in step (4) is concentrated on the top of the deaeration head, and the degassing head is cut off from the end of the degassing head; (6) the degassing head is cut off Port sealing welding; and (7) external shaping to obtain a finished heat sink.

Preferably, at least one of the upper plate and the lower plate is provided with a plurality of columns, and the plurality of columns are welded to one of the upper plate or the lower plate or both; the upper plate and the lower plate are At least one of the support ribs is provided, and the support rib is integrally formed on one or both of the upper plate and the lower plate; the exposed surface of the column body and the support rib is also adhered with a copper powder metal plating layer as a refrigerant conductor; When the upper plate and the lower plate are matched, the end of the column provided by one of the two is abutted against the other, and the supporting rib provided by one of the two supports the other one, which is favorable for the upper and lower sides. The thermal conversion of the refrigerant between the plates reduces the temperature more quickly.

Preferably, the upper plate and the lower plate are copper plates, aluminum plates, zinc plates, tin plates, titanium plates or stainless steel plates; and the plurality of columns are laser welded or friction welded to the upper plate or the lower plate; step (5) The secondary degassing is specifically heating the first vacuum plated isothermal plate to 120 degrees C, so that the gas that has not been exhausted in step (4) is concentrated on the top of the deaeration head; step (6) will cut the degassing head. The port is sealed by laser welding; step (7) is externally shaped, specifically to remove the corner burrs and smooth the operation.

The invention also provides an energy-saving anti-expansion and detonation heat dissipating device, which is prepared by the above preparation method.

The preparation method of the energy-saving anti-expansion and blasting heat dissipating device of the invention and the energy-saving anti-expansion and blasting heat dissipating device prepared by the invention, the preparation process of the copper powder metal plating layer on the upper plate and the lower plate is energy-saving and environmentally friendly, and the adhesion between the copper powder metal plating layer and the metal substrate is firm. The capillary force is strong and the evaporation performance is good. Since the DC circuit is used, the rigidity of the metal substrate is not damaged, and the hardness of the metal substrate can be maintained. The prepared heat dissipating device has heat conduction, rapid heat dissipation, and good anti-expansion performance. The energy-saving anti-expansion and heat-dissipating device can realize a product with a thickness of 0.3 mm, and solves the technical bottleneck of the heat pipe heat-dissipating device which can only achieve 0.6 mm thickness in the prior art.

In summary, the invention will be described in detail below with specific embodiments. The following examples are for illustrative purposes only and are not intended to limit the scope of the invention. Those skilled in the art will readily appreciate various non-critical parameters that can be changed or adjusted to produce substantially the same results.

100‧‧‧Upper board

200‧‧‧ Lower board

300‧‧‧ cylinder

400‧‧‧Support ribs

500‧‧‧copper powder metal plating

600‧‧‧Degas head

700‧‧‧heat source

Fig. 1 is a schematic view showing the microstructure of a copper powder metal plating layer of the present invention magnified 500 times.

Fig. 2 is a schematic view showing the microstructure of a copper powder metal plating layer prepared in the prior art at a magnification of 500 times.

Figure 3 is a schematic view showing the structure of an energy-saving anti-expansion and heat-dissipating device of the present invention.

Figure 4 is a schematic view showing the structure of the upper plate of the fourth embodiment of the energy-saving anti-expansion and heat-dissipating device of the present invention.

FIG. 5 is a schematic structural view of a lower plate of Embodiment 4 of an energy-saving anti-expansion and heat-dissipating device according to the present invention.

FIG. 6 is a schematic view showing the working principle of Embodiment 4 of an energy-saving anti-expansion and blasting heat dissipation device according to the present invention.

The invention is further described in conjunction with the following examples.

Example 1.

A method for preparing a copper powder metal plating layer comprises the following steps: a. cleaning the metal substrate, specifically, washing with 5% to 15% of dilute sulfuric acid for 4 to 5 minutes, and then washing at least three times with pure water to clean the surface of the metal substrate. Wherein, the metal substrate may be a copper plate, an aluminum plate, a zinc plate, a tin plate, a titanium plate or a stainless steel plate; and the like; b. wrapping the other faces of the metal substrate to expose only the working surface to which the metal layer needs to be attached; c. attaching the metal layer, The metal substrate exposing only the working surface is immersed in the working tank by the jig. In the attaching step, the temperature of the liquid in the working tank is maintained at 1 to 15.5 degrees C, so that the shape of the copper powder is controlled to be a snowflake or a coral. The liquid temperature is the key to determine the plating effect. The high temperature copper ion activity becomes stronger, which is not conducive to adhesion, and it is easy to be burnt black and easy to oxidize when the current is high; the liquid in the working tank maintains the following composition ratio: the concentration of sulfuric acid is 70 Up to 85g/L, the concentration of copper sulfate is 250 to 260g/L, and the solvent is pure water; the adhesion metal layer includes at least the steps of attaching the underlayer, attaching the snow-like metal layer and attaching the fastening layer, including: first attaching the underlayer, The particle size of the underlying metal particles is 0.1 to 1 nm, and the thickness of the underlying layer is 0.01 to 0.05 mm. The underlayer is bonded to the working surface of the metal substrate; the metal layer of the snowflake metal layer is attached to the metal layer of the snowflake metal layer. The particle size is 1.5 to 10 nm, the thickness of the snowflake metal layer is 0.1 to 2 mm; finally, the fastening layer is attached, the particle diameter of the fastening layer metal particles is 0.5 to 1.5 nm, and the thickness of the fastening layer is 1 to 5 nm; The metal plate to which the metal layer is attached is cleaned, specifically, the metal substrate is placed in a cleaning tank containing 5 wt% soda ash, and the liquid in the cleaning tank is heated to 40 to 60 ° C by ultrasonic waves, and washed for 10 to 15 minutes. Wash with water 2 3 times; e. After the liquid substrate washed in step d is liquid-absorbed and dried to obtain a copper powder metal plating layer having a liquid absorbing capillary force, specifically, the metal plate after washing is used to absorb residual moisture in the metal layer with absorbent paper. It is placed in a nitrogen protection box for drying to obtain a copper powder metal plating layer with water absorbing capillary force to prevent oxidation.

The preparation method of the copper powder metal plating layer, the step c. attaching the metal layer is the most critical, the current control in the adhesion bottoming step is 0.8 to 1.1 amp, the adhesion time is 10 to 15 minutes; in the step of attaching the snowflake metal layer, the current is controlled 1.5 to 8.0 amps, the attachment time is 2 to 10 minutes; in the step of attaching the fastening layer, the current is controlled to 0.3 to 1.0 amps depending on the surface area, and the time ranges from 1 to 2 hours. Wherein, the underlying layer, the snowflake-shaped metal layer and the fastening layer may be respectively set to one or more layers as needed.

The copper powder metal plating layer preparation method of the invention adopts electroplating to reduce metal atoms into a layer of snowflake-shaped metal layer, and the metal layer is deposited in at least three layers, preferably 4 to 5 layers, and the lower layer is deposited on the bottom layer so that Effectively combined with the metal substrate, the particles of the snow-like metal layer are larger than the metal particles of the underlying layer, and the fastening layer is used for effectively combining the snow-like metal layer with the metal substrate, and the capillary force of the overall metal layer is better, and the preparation of the invention is A microstructure of the copper powder metal plating layer is shown in Fig. 1. Compared with the microstructure of the copper powder metal plating prepared by the method in the prior art, as shown in FIG. 2, it can be seen that the copper powder metal plating layer prepared by the invention has a snowflake-like or coral-like layer structure, and the structure in FIG. 2 is compared. It has a porous structure. The setting of the multi-layer metal layer, the firmness of the copper powder metal plating layer is greatly improved, and it needs mechanical damage to fall off.

It should be noted that the microstructure of the copper powder metal plating layer prepared by the invention is a small particle multi-layered structure, and the whole body exhibits a snowflake shape or a coral state. In the present invention, the structure is described in a snowflake shape or a coral shape, and the specific name thereof is specified. The description can be adjusted accordingly.

The preparation method of the copper powder metal plating layer adopts a direct current plating method in the whole process, the DC voltage is not higher than 10 amps, the temperature of the plating solution is not higher than 10 degrees C, and the high temperature causes the copper ion activity to become stronger, which is disadvantageous for adhesion. It is also easy to high-current high-temperature over-burning to become black and easy to oxidize. Therefore, it does not cause hardness damage to the metal substrate, and ensures the hardness of the metal substrate during subsequent use. The metal substrate in the prior art is overcome because the metal substrate is softened by high-temperature sintering during processing, which makes it easy to be deformed in later use, and has poor antiknock and expansion properties.

The traditional copper powder metal plating is prepared by sintering in a vacuum furnace at a temperature above 800 °C for more than 8 hours to burn. After firing, it needs 950 °C for 3 to 4 hours. This method of preparation costs electricity. Time-consuming, the most important thing is that the high-temperature copper material itself has soft hardness and is easily deformed in use and manufacture. The preparation method of the copper powder metal plating layer of the invention adopts a direct current voltage and can be completed in substantially three hours, and the preparation of a metal substrate plating layer consumes only about 1 degree, which greatly saves preparation time and greatly reduces energy consumption. It has the characteristics of energy saving and environmental protection.

The preparation method of the copper powder metal plating layer of the invention requires only copper block, sulfuric acid, copper sulfate solution and pure water for the electroplating material, and only copper block and copper ion are consumed in the whole process. Unlike the conventional technology, the copper sulfate solution does not need to be replaced. Only need to supplement copper ions, and use pure water and copper sulfate solution to adjust the concentration ratio, no other by-products are produced, the environmental performance is very good, and the preparation cost is also low.

Example 2.

A method for preparing a copper powder metal plating layer, the other features are the same as those of the first embodiment, except that the technical feature of the method for preparing a copper powder metal plating layer of the present embodiment is as follows: The current was controlled at 2.0 amps and adhered for 2 minutes to obtain a copper powder metal plating layer having a thickness of 0.1 mm. Through the control of this step, the prepared copper powder metal plating layer has better capillary properties, and 1 ml of water droplets can be adsorbed in 0.05 seconds.

The preparation method of the copper powder metal plating layer of the invention has the advantages of energy saving and environmental protection, and the prepared copper powder metal plating layer and the metal substrate have strong adhesion. The prepared electroplated layer has a multi-layer structure with a snowflake shape under the microscope, has strong capillary force and good evaporation performance, and the preparation process has no damage to the rigidity of the metal substrate, and can maintain the hardness of the metal substrate.

It should be noted that different methods can be selected in order to obtain copper powder metal plating layers of different thicknesses. It has been found through research that the following methods have better performance for obtaining copper powder metal plating layers of corresponding thicknesses. It is also possible to adjust the current to 1.5 amps for 2 minutes to obtain a snowflake-like metal layer with a thickness of 0.1 mm. It is also possible to adjust the current to 2.5 amps for 2 minutes to obtain a snowflake-like metal layer with a thickness of 0.15 to 0.2 mm. It is also possible to adjust the current to 3.0 amps, attach for 2.5 minutes, and attach a snowflake-like metal layer with a thickness of 0.25-0.3 mm. It is also possible to adjust the current to 4.0 amps, attach for 3 minutes, and attach a snowflake-like metal layer with a thickness of 0.35 mm. It is also possible to adjust the current to 4.5 to 5.0 amps for 3 minutes to adhere to a snowflake metal layer having a thickness of 0.4 mm. It is also possible to adjust the current to 5.5 amps, attach for 4 minutes, and attach a snowflake-like metal layer with a thickness of 0.5 mm. It is also possible to adjust the current to 6 amps, attach for 5 minutes, and attach a snowflake metal layer with a thickness of 0.6 mm. It is also possible to adjust the current to 6.5 amps, attach for 5 minutes, and attach a snowflake-like metal layer with a thickness of 0.7 to 0.8 mm. It is also possible to adjust the current to 7 amps, attach for 6 minutes, and attach a snowflake-like metal layer with a thickness of 0.9 mm. It is also possible to adjust the current to 8 amps, attach for 6 minutes, and attach a snowflake-like metal layer with a thickness of 1 mm.

By the control of the above method, the prepared copper powder metal plating layer has better capillary properties, and 1 ml of water droplets can be adsorbed in 0.01 to 0.05 seconds. The prepared electroplated layer has a multi-layered structure with a snowflake shape under the microscope, and has the characteristics of strong capillary force and good evaporation performance, and the preparation process has no damage to the rigidity of the metal substrate, and can maintain the hardness of the metal substrate.

Example 3.

A method for preparing an energy-saving anti-explosive heat-dissipating device includes the following steps: (1) electroplating a copper-plated metal plating layer by using the method of Embodiment 1 or 2 as a metal substrate upper plate and a metal substrate lower plate; The upper and lower plates plated with the copper powder metal plating are sealed by laser welding; (3) the high-frequency welding degassing head is used to obtain the temperature equalizing plate, and the refrigerant is injected into the uniform temperature plate by the degassing head. (4) The first vacuum is applied to make the internal air pressure of the chamber reach 6.0 ^-1 to 8.0 ^-2 Pa; (5) The second degassing, heating the first evacuated isothermal plate to 100 to 150 degrees C, preferably 120 degrees C, so that the gas that has not been pumped out in step (4) is concentrated on the top of the deaeration head, and then the degassing head is cut off from the end of the degassing head; (6) the port that will cut the degassing head Sealing welding, preferably by laser welding sealing; (7) external shaping to obtain a finished heat sink, step (7) for external shaping, specifically to remove corner burrs, smoothing operation.

FIG. 3 is a schematic structural view of an energy-saving anti-expansion and heat-dissipating device prepared by the method of the present invention. The explosion-proof heat dissipating device is composed of an upper plate 100 and a lower plate 200, and a copper powder metal plating layer 500 is attached to the inner surface of the upper plate 100. . A copper powder metal plating layer 500 is attached to the inner surface of the lower plate 200. The cavity formed between the upper plate 100 and the lower plate 200 is filled with a refrigerant, and the refrigerant may be water or alcohol or acetone or R12 refrigerant or freon or other components, which are not enumerated here.

The energy-saving anti-expansion and heat-dissipating device is normally not in operation. Since the copper powder metal plating layer 500 has good water absorption, the copper powder metal plating layer 500 of the upper plate 100 and the lower plate 200 adsorbs the refrigerant close to the saturated state. During operation, when one of the upper plate 100 or the lower plate 200 contacts the heat source, the following plate 200 contacts the heat source as an example, the lower plate 200 is heated, and the refrigerant in the copper powder metal plating layer 500 disposed in the lower plate 200 begins to evaporate and rise. The evaporated water vapor reaches the upper plate 100 and is condensed into droplets. Since the upper plate 100 is first immersed in the refrigerant, the evaporated water vapor instantaneously exchanges heat into droplets in less than one second, and the liquid droplets are returned to the lower plate. 200. With the energy-saving explosion-proof heat sink, the second-stage heat dissipation efficiency can be achieved, and the heat dissipation effect is very rapid.

The energy-saving anti-expansion and heat-dissipating device, the copper-plated metal plating layer 500 of the upper plate 100 and the lower plate 200 can be as thin as about 0.1 mm, which solves the technical bottleneck of the thickness of the hot plate in the prior art, and can realize the overall energy-saving anti-expansion and detonation heat dissipation device 0.3 The technical requirements of mm overcome the technical bottleneck of the current thinner heat sinks for mobile phones, etc., which can only achieve 0.6mm, which will greatly improve the demand for heat sinks for highly integrated electronic components.

The preparation method of the energy-saving anti-expansion and blasting heat dissipating device of the invention and the energy-saving anti-expansion and blasting heat dissipating device prepared by the invention, the preparation process of the copper powder metal plating layer 500 of the upper plate 100 and the lower plate 200 is energy-saving and environmentally friendly, the copper powder metal plating layer 500 and the metal substrate The adhesiveness is firm, the capillary force is strong, and the evaporation performance is good. Since the DC circuit is used, the rigidity of the metal substrate is not damaged, and the hardness of the metal substrate can be maintained. The prepared heat dissipating device has heat conduction, rapid heat dissipation, and good anti-explosion and expansion performance.

Example 4.

An energy-saving anti-expansion and heat-dissipating device is prepared by the method of the third embodiment. Other features are the same as those of the third embodiment, and have the following technical features: as shown in FIG. 4 and FIG. 5, the explosion-proof heat dissipating device is composed of The upper plate 100 and the lower plate 200 are configured. The upper plate 100 is provided with a plurality of cylinders 300. The inner surface of the upper plate 100 is further provided with a plurality of press-formed support ribs 400, the inner surface of the upper plate 100, and the cylindrical body 300. A surface of the surface and the support rib 400 is adhered with a copper powder metal plating 500 as shown in FIG. A plurality of cylinders 300 and support ribs 400 are also disposed in the lower plate 200. The inner surface of the lower plate 200, the surface of the column 300, and the surface of the support rib 400 are adhered with a copper powder metal plating layer 500, as shown in FIG. .

The upper plate 100 is assembled with the lower plate 200 and formed into a sealed cavity by laser or friction welding. The other end of the cylinder 300 of the upper plate 100 of the cavity preferably abuts against the inner surface of the lower plate 200, and the upper plate 100 and The columns 300 provided in the lower plate 200 are in a staggered state, and each abuts against the corresponding lower plate 200 or the inner surface of the upper plate 100.

The arrangement of the support ribs 400 can also improve the support strength between the upper plate 100 and the lower plate 200, and effectively prevent the expansion and burst phenomenon occurring between the upper plate 100 and the lower plate 200 in use.

Increasing the arrangement of the cylinder 300 provides the supporting force of the cavity between the upper plate 100 and the lower plate 200 of the heat dissipating device, which can better make the mechanical performance of the overall heat dissipating device better, and prevent the upper plate 100 and the lower plate 200 from being used. There is a bursting and bursting phenomenon.

It has been found in practice that only the support ribs 400 are provided, and the probability of explosion in actual use is much higher than that of the support rib 400 and the cylinder 300 at the same time. By detecting the anti-explosion properties of the product provided with the support ribs 400 and the cylinder at the same time, in 10,000 samples, the probability of explosion is only one in ten thousand. The support ribs 400 and the cylinder 300 also provide a drainage path for cooling the backflow of the droplets, facilitating the flow of droplets that condense back along the body and support ribs 400.

A copper powder metal plating layer 500 is adhered to the supporting rib 400 and the column body 300. During the evaporation process, part of the vapor encounters the copper powder metal plating layer 500 on the column 300, and the cold water flows back along the column 300, and some of the vapor encounters the support. The copper powder metal plating layer 500 on the rib 400 is also water-cooled and aggregated, and is recirculated by the column 300 or the supporting rib 400. As shown in FIG. 6, the supporting rib 400, the column 300 and the copper powder metal plating layer 500 thereon are realized. The radiant evaporation loopback process has better heat dissipation performance.

The energy-saving anti-expansion and heat-dissipating device has the working principle that, in the non-heated state (ie, in a non-operating state), the internal refrigerant liquid is immersed in the copper powder metal plating layer 500 of the upper plate 100 and the lower plate 200, basically Saturated. When any one of the upper plate 100 or the lower plate 200 is in the heat source 700, the upper plate 100 is close to the heat source 700. When the upper plate 100 is heated, the copper powder metal plating 500 inside is evaporated by heat, and part of the vapor reaches the other end. When the plate 200 is cold, some of the vapor is encountered in the cylinder 300 or the copper powder metal plating layer 500 on the surface of the supporting rib 400 is cooled, and the condensation recirculation flows along the cylinder 300 or the supporting rib 400 to the upper plate 100, so that the heat is continuously looped. The heat dissipation loop of the upper plate 100 to the lower plate 200. The energy-saving anti-expansion heat-dissipating device has an effective time required for heat dissipation in a few seconds to a dozen seconds, as shown in FIG. The explosion-proof heat dissipating device of the present invention provides a copper powder metal plating layer 500 on the inner surfaces of the upper plate 100 and the lower plate 200, so that the evaporating heat dissipation between the upper plate 100 and the lower plate 200 can be quickly switched, thereby improving the heat dissipation effect.

It should be noted that the metal substrate may be a copper plate, an aluminum plate, a zinc plate, a tin plate, a titanium plate or a stainless steel plate.

It should be noted that the structure of the energy-saving anti-expansion heat-dissipating device is not limited to the form in the embodiment, and the copper-plated metal plating layer 500 may be selected only on one side. The column 300 and the support rib 400 provided on the upper plate 100 and the lower plate 200 are preferably disposed on both layers, or may be disposed on only one of them.

The preparation method of the energy-saving anti-expansion and blasting heat dissipating device of the invention and the energy-saving anti-expansion and blasting heat dissipating device prepared by the invention, the preparation process of the copper powder metal plating layer 500 of the upper plate 100 and the lower plate 200 is energy-saving and environmentally friendly, the copper powder metal plating layer 500 and the metal substrate The adhesiveness is firm, the capillary force is strong, and the evaporation performance is good. Since the DC circuit is used, the rigidity of the metal substrate is not damaged, and the hardness of the metal substrate can be maintained. The prepared heat dissipating device has heat conduction, rapid heat dissipation, and good anti-explosion performance.

Example 5.

An energy-saving anti-expansion and heat-dissipating device is prepared by the method of the third embodiment, and other features are the same as those of the fourth embodiment. The difference is that the explosion-proof heat dissipating device only has a plurality of cylinders 300 disposed on the upper plate 100. The inner surfaces of the plate 100 and the lower plate 200 are also provided with a plurality of press-formed support ribs 400. The heat dissipating device has heat conduction, rapid heat dissipation, and good anti-explosion performance.

Example 6.

An energy-saving anti-expansion and heat-dissipating device is prepared by the method of the third embodiment, and other features are the same as those of the fourth embodiment, except that the explosion-proof heat dissipating device has only a plurality of cylinders 300 disposed on the lower plate 200. The inner surfaces of the plate 100 and the lower plate 200 are also provided with a plurality of press-formed support ribs 400. The heat dissipating device has heat conduction, rapid heat dissipation, and good anti-explosion performance.

It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit the scope of the present invention. Although the present invention is described in detail with reference to the preferred embodiments, those skilled in the art The technical solutions of the present invention are modified or equivalently substituted without departing from the spirit and scope of the technical solutions of the present invention.

Claims (12)

 A method for preparing a copper powder metal plating layer, comprising the steps of: a. cleaning a metal substrate; b. wrapping the other surface of the metal substrate to expose only a working surface to which a metal layer needs to be attached; c. attaching the metal layer The metal substrate exposing only the working surface is immersed in a working tank by a jig, and the temperature of the liquid in the working tank is maintained at 1 to 15.5 degrees C in an attaching process, and the liquid in the working tank is maintained as follows Ingredient ratio: sulfuric acid concentration of 70 to 85g / L, copper sulfate concentration of 250 to 260g / L, the solvent is pure water, and the adhesion of the metal layer includes at least a dozen layers of adhesion, a snow-like metal layer attached and attached a step of fastening the layer, wherein the underlying metal particles have a particle diameter of 0.1 to 1 nm, and the underlayer has a thickness of 0.01 to 0.05 mm, and the underlayer realizes a working surface with the metal substrate Connecting, reattaching the snowflake metal layer, the metal particles of the snowflake metal layer having a particle diameter of 1.5 to 10 nm, the snowflake metal layer having a thickness of 0.1 to 2 mm, and then attaching the fastening layer, the fastening Layer of metal particles 0.5 to 1.5 nm, the fastening layer has a thickness of 1 to 5 nm; d. cleaning the metal substrate to which the metal layer is attached; and e. drying the metal substrate after the step d cleaning and drying The copper powder metal plating layer having a liquid absorbing capillary force.    The method for preparing a copper powder metal plating layer according to claim 1, wherein the step of attaching the primer layer is controlled to be 0.8 to 1.1 amps, and the adhesion time is 10 to 15 minutes; and the step of attaching the snowflake metal layer The medium current is controlled at 1.5 to 8.0 amps, and the attachment time is 2 to 10 minutes; in the step of attaching the fastening layer, the current is controlled to be 0.3 to 1.0 ampere depending on the surface area, and the time is controlled to be 1 to 2 hours.    The method for preparing a copper powder metal plating layer according to claim 2, wherein the underlayer, the snowflake metal layer and the fastening layer are respectively one or more layers.    The method for preparing a copper powder metal plating layer according to claim 3, wherein the method of attaching the snowflake metal layer is: when the current is controlled at 1.5 amps, and the adhesion is 2 minutes to obtain the snowflake metal with an adhesion thickness of 0.1 mm. Layer; or adjust the current to 2.5 amps, attach for 2 minutes to obtain the snowflake metal layer with an adhesion thickness of 0.15 to 0.2 mm; or adjust the current to 3.0 amps, attach 2.5 minutes to obtain the snowflake metal with an adhesion thickness of 0.25 to 0.3 mm Layer; or adjust the current to 4.0 A, adhere for 3 minutes to obtain the snowflake metal layer with an adhesion thickness of 0.35 mm; or adjust the current to 4.5 to 5.0 amps, attach for 3 minutes to obtain the snowflake metal layer with an adhesion thickness of 0.4 mm; Or adjust the current to 5.5 amps, attach for 4 minutes to obtain the snowflake metal layer with a thickness of 0.5 mm; or adjust the current to 6 amps, attach for 5 minutes to obtain the snowflake metal layer with an adhesion thickness of 0.6 mm; or adjust the current to 6.5 amps, attaching for 5 minutes to obtain the snowflake metal layer with a thickness of 0.7 to 0.8 mm; or adjusting the current to 7 amps, attaching for 6 minutes to obtain an adhesion thickness of 0 .9mm of the snowflake metal layer; or adjusting the current to 8 amps, and attaching for 6 minutes to obtain the snowflake metal layer with a thickness of 1 mm.    The method for preparing a copper powder metal plating layer according to claim 1, wherein the step a is washed with 5% to 15% of dilute sulfuric acid for 4 to 5 minutes, and then washed at least three times with pure water to surface the metal substrate. Cleaning; the step d is to clean the metal plate to which the metal layer is attached, and the metal substrate is placed in a cleaning tank containing 5 wt% soda ash, and the liquid in the cleaning tank is heated to 40 to 60 by ultrasonic waves. Degree C, washing for 10 to 15 minutes, and then washing with water for two to three times; step e is to take the cleaned metal substrate with a absorbent paper to absorb the residual moisture in the metal layer, and then put it into a nitrogen protection box for baking Drying, the copper powder metal plating layer having a water absorbing capillary force is obtained.    A metal substrate having a copper powder metal plating layer, which is prepared by the production method according to any one of claims 1 to 5.   A method for preparing an energy-saving anti-expansion and heat-dissipating device includes the following steps: (1) as a metal substrate upper plate and a metal substrate lower plate respectively, as claimed in any one of claims 1 to 5 The method described is electroplating a copper powder metal plating layer; (2) the upper plate and the lower plate plated with the copper powder metal plating layer are closed by laser welding; (3) using a high frequency welding a degassing head to obtain a a temperature equalizing plate, and then injecting a refrigerant into the temperature equalizing plate by the degassing head; (4) vacuuming for the first time, so that the air pressure inside the cavity of the temperature equalizing plate reaches 6.0 ^-1 to 8.0 ^-2 Pa (5) secondary degassing, heating the first temperature plate of the first vacuum to 100 to 150 degrees C, so that the gas that has not been exhausted in step (4) is concentrated on the top of the degassing head, and then The degassing head is cut at the end of the degassing head; (6) the port welding seal of the degassing head is cut; and (7) externally shaped to obtain a finished heat sink.  The method for preparing an energy-saving anti-expansion and heat-dissipating device according to claim 7, wherein at least one of the upper plate and the lower plate is provided with a plurality of columns, and the columns are welded to the upper plate or the One or both of the lower plates; at least one of the upper plate and the lower plate is provided with a support rib integrally formed on one or both of the upper plate or the lower plate The exposed surface of the pillar and the supporting rib is also adhered with the copper powder metal plating layer, and the steam can be quickly flowed by the copper metal plating layer attached by the pillars and the supporting rib. Thermal energy; wherein when the upper plate and the lower plate are engaged, the end of the column provided by one of the two abuts against the corresponding one, and the supporting rib is provided by one of the two The corresponding one is abutted.    The method for preparing an energy-saving anti-expansion and heat-dissipating device according to claim 8 , wherein the upper plate and the lower plate comprise a copper plate, an aluminum plate, a zinc plate, a tin plate, a titanium plate or a stainless steel plate; The step of (5) secondary degassing is to heat the first temperature plate of the first vacuum to 120 degrees C, so that step (4) fails to be pumped. The finished gas is concentrated on the top end of the degassing head; the step (6) seals the port of the degassing head by laser welding; the step (7) performs external shaping, including removing the corner burrs, and smoothing the operation.    An energy-saving anti-expansion and heat-dissipating device, which is prepared by the preparation method as described in claim 7 of the patent application.    An energy-saving anti-expansion and heat-dissipating device, which is prepared by the preparation method as described in claim 8 of the patent application.    An energy-saving anti-expansion and heat-dissipating device comprising the preparation method according to the preparation method of claim 9 of the patent application.