TW201905621A - 氣體供應系統 - Google Patents
氣體供應系統Info
- Publication number
- TW201905621A TW201905621A TW107120656A TW107120656A TW201905621A TW 201905621 A TW201905621 A TW 201905621A TW 107120656 A TW107120656 A TW 107120656A TW 107120656 A TW107120656 A TW 107120656A TW 201905621 A TW201905621 A TW 201905621A
- Authority
- TW
- Taiwan
- Prior art keywords
- gas supply
- gas
- controller
- digital
- analog
- Prior art date
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F11/00—Error detection; Error correction; Monitoring
- G06F11/07—Responding to the occurrence of a fault, e.g. fault tolerance
- G06F11/16—Error detection or correction of the data by redundancy in hardware
- G06F11/20—Error detection or correction of the data by redundancy in hardware using active fault-masking, e.g. by switching out faulty elements or by switching in spare elements
- G06F11/2053—Error detection or correction of the data by redundancy in hardware using active fault-masking, e.g. by switching out faulty elements or by switching in spare elements where persistent mass storage functionality or persistent mass storage control functionality is redundant
- G06F11/2089—Redundant storage control functionality
- G06F11/2092—Techniques of failing over between control units
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/002—Details of vessels or of the filling or discharging of vessels for vessels under pressure
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
- F17C13/023—Special adaptations of indicating, measuring, or monitoring equipment having the mass as the parameter
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
- F17C13/025—Special adaptations of indicating, measuring, or monitoring equipment having the pressure as the parameter
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
- F17C13/026—Special adaptations of indicating, measuring, or monitoring equipment having the temperature as the parameter
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/04—Arrangement or mounting of valves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/12—Arrangements or mounting of devices for preventing or minimising the effect of explosion ; Other safety measures
- F17C13/123—Arrangements or mounting of devices for preventing or minimising the effect of explosion ; Other safety measures for gas bottles, cylinders or reservoirs for tank vehicles or for railway tank wagons
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
- G05B19/0423—Input/output
- G05B19/0425—Safety, monitoring
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
- G05B23/0286—Modifications to the monitored process, e.g. stopping operation or adapting control
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
- G05B23/0297—Reconfiguration of monitoring system, e.g. use of virtual sensors; change monitoring method as a response to monitoring results
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F11/00—Error detection; Error correction; Monitoring
- G06F11/07—Responding to the occurrence of a fault, e.g. fault tolerance
- G06F11/16—Error detection or correction of the data by redundancy in hardware
- G06F11/20—Error detection or correction of the data by redundancy in hardware using active fault-masking, e.g. by switching out faulty elements or by switching in spare elements
- G06F11/2053—Error detection or correction of the data by redundancy in hardware using active fault-masking, e.g. by switching out faulty elements or by switching in spare elements where persistent mass storage functionality or persistent mass storage control functionality is redundant
- G06F11/2089—Redundant storage control functionality
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2201/00—Vessel construction, in particular geometry, arrangement or size
- F17C2201/03—Orientation
- F17C2201/032—Orientation with substantially vertical main axis
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0323—Valves
- F17C2205/0326—Valves electrically actuated
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0388—Arrangement of valves, regulators, filters
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
- F17C2223/0107—Single phase
- F17C2223/0123—Single phase gaseous, e.g. CNG, GNC
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
- F17C2223/033—Small pressure, e.g. for liquefied gas
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
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- F17C2227/0302—Heat exchange with the fluid by heating
- F17C2227/0304—Heat exchange with the fluid by heating using an electric heater
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
- F17C2227/03—Heat exchange with the fluid
- F17C2227/0367—Localisation of heat exchange
- F17C2227/0369—Localisation of heat exchange in or on a vessel
- F17C2227/0376—Localisation of heat exchange in or on a vessel in wall contact
- F17C2227/0383—Localisation of heat exchange in or on a vessel in wall contact outside the vessel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
- F17C2250/03—Control means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
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- F17C2250/0404—Parameters indicated or measured
- F17C2250/0421—Mass or weight of the content of the vessel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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- F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
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Abstract
本發明之氣體供應系統係裝設有一圓筒裝置,其具有一將製程氣體供應至製程艙的氣動閥,及一藉由供應或停止該閥致動氣體流至該氣動閥來打開或關閉該氣動閥之電磁閥;及一氣體供應控制裝置,其控制該電磁閥之致動。此外,該氣體供應控制裝置包含一主控制器,其在正常操作期間控制該電磁閥的致動;及一次控制器,其檢測該主控制器之異常狀態,及若檢測到異常時,取代該主控制器來控制該電磁閥的致動。
Description
本申請案主張2017年6月15日提出的KR申請案案號:10-2017-0075558之優先權,其以參考之方式併入本文。本發明係關於一種用以將製程氣體供應至半導體設備的氣體供應系統。
通常來說,半導體係藉由重覆進行許多製程,包括光微影光刻、蝕刻及薄膜形成而製造。此等製造製程大部分在密閉式製程艙中藉由製程氣體來進行。為此目的,在多種工業設備諸如半導體製造設備中皆使用氣體供應裝置。
該氣體供應系統包含一儲存槽,其可係一貯存高壓氣體的圓筒;一氣體供應控制裝置,其藉由一連接管連接至該儲存槽;及一氣體供應控制裝置,其控制流自該儲存槽的氣體之流動,以便經由該製程線供應該氣體。
該氣體供應控制裝置可藉由打開及關閉一氣動閥來控制該製程氣體流入該製程艙中。於此情況中,該氣動閥可藉由一電磁閥來開啟(打開)/關掉(關閉)。
在半導體製造方法中,持續供應氣體係關鍵。若發生問題(即,控制裝置出錯)諸如氣體供應控制裝置的異常狀態,例如,主電源中斷或電磁閥故障時,則可由於當氣動閥關閉時之製程氣體供應突然中斷而發生製程缺陷。
由本申請人所提出之已註冊的專利案號10-0347227建議一藉由檢測控制裝置的出錯及產生分別的製程訊號將該閥保持在打開狀態之方法來避免如上所述之氣體突然停止供應。
但是,於該專利中,雖然當在該控制裝置中檢測到出錯時可將該氣動閥保持打開,但其無法致動能防止該製程氣體液化之加熱器。此外,因為無法接收類比信號,該專利具有無法知曉該製程氣體的壓力及圓筒重量等等之缺點。
此外,於該專利中,當在控制裝置中發生出錯時,於該氣體供應控制裝置與中央控制室間之通訊變得不可能。結果,變成無法由中央控制室監視氣體及變成中央控制室無法知曉該氣體供應系統之準確狀態。
因此,由於本發明已進行設計來解決上述在先前技術中所描述的問題,本發明之目標為提供一種控制氣體供應的氣體供應系統,以便甚至當該控制裝置有出錯時,其不會中斷、會檢測該製程氣體壓力及圓筒重量等等並能夠致動及控制加熱器。
本發明的另一個目標為提供一種氣體供應系統,如此當檢測到該控制裝置出錯時,壓力、重量及加熱器訊息會被傳送到該氣體監視系統,以便可準確地知曉該氣體供應裝置的狀態。
為了達成上述目標,本發明之氣體供應系統裝設有一圓筒裝置,其具有一或多個氣動閥,該閥係設置在一將該儲存槽或圓筒流體連接至該製程艙的供應線中,其控制該製程氣體供應至一製程艙或一或多個製程艙;及一電磁閥(或一或多個電磁閥),其藉由供應或停止該閥致動氣體流至該氣動閥(或一或多個氣動閥)每個來打開或關閉該氣動閥(或各別地一或多個氣動閥);及一氣體供應控制裝置,其控制該電磁閥(或一或多個電磁閥)之致動。此外,該氣體供應控制裝置包含一主控制器,其在正常操作期間控制該電磁閥(或一或多個電磁閥)之致動;及一次控制器,其檢測該主控制器的異常狀態,及在檢測到異常後,取代該主控制器來控制該電磁閥(或一或多個電磁閥)之致動。於此,該主控制器及次控制器係透過數位介面來共享數位檢測訊息,及/或該主控制器及次控制器係透過類比介面來共享類比檢測訊息。
在本發明的氣體供應系統中,該數位檢測訊息可包含下列之一或多種:火焰檢測訊息,其係來自火焰檢測光學感應器之輸入;高溫檢測訊息,其係來自高溫感應器之輸入;及氣體洩漏檢測訊息,其係來自氣體洩漏感應器之輸入;該火焰檢測光學感應器、高溫感應器及氣體洩漏感應器係安裝在該圓筒裝置中。(用語「高溫感應器」之使用係與額外測量可在該圓筒裝置中使用的製程氣體或加熱器之溫度的溫度感應器型式有所區別,然而該等感應器型式可相同或不同。)
在本發明的氣體供應系統中,該主控制器係於正常操作期間根據來自額外一或多個指為「製程氣體溫度感應器」的溫度感應器之加熱溫度檢測訊息來控制該加熱器(或一或多個加熱器)之致動,以防止該製程氣體液化;及當發生異常檢測時,該次控制器係根據來自該一或多個製程氣體溫度感應器之加熱溫度檢測訊息來控制該加熱器(或一或多個加熱器)之致動,以防止該製程氣體液化。
在本發明的氣體供應系統之一個具體實例中,該類比檢測訊息可包含下列之一或多種或二或更多種:氣體供應壓力檢測訊息,其係來自壓力感應器(或一或多個壓力感測器)之輸入;圓筒重量檢測訊息,其係來自重量感應器(或一或多個重量感應器)之輸入;及製程氣體溫度檢測訊息,其係來自一或多個製程氣體溫度感應器之輸入;該壓力感應器(或一或多個壓力感測器)及重量感應器(或一或多個重量感應器)係安裝在該圓筒裝置中。
在任擇的具體實例中,上述列出之感應器全部或某些可係類比,或上述列出之感應器全部或某些可係數位,或呈任何組合。例如,在任擇的具體實例中,該一或多個重量感應器、一或多個製程氣體溫度感應器及一或多個壓力感測器可係數位,及/或該一或多個火焰檢測光學感應器、一或多個高溫感應器及一或多個氣體洩漏感應器可係類比。任擇地,若必要時,可使用類比與數位壓力感測器之混合、類比與數位重量感應器之混合、及類比與數位溫度感應器之混合及其它型式的感應器之類似物。
在本發明的氣體供應系統中,該氣體供應控制裝置進一步包含:一監視系統,其選擇性與該主控制器及次控制器通訊以連續監視該製程氣體供應狀態;及一切換開關,其在正常操作下經由通訊線讓該主控制器與監視系統互相連接,及當偵測到異常時,經由通訊線讓該次控制器與監視系統互相連接。
本發明亦提供一種使用本發明之氣體供應系統來進行下列步驟的方法:在該主控制器與該次控制器間透過數位或類比或數位與類比介面來共享數位或類比或數位與類比檢測訊息;及將該氣體供應系統之控制切換至將檢測該主控制器之異常狀態的次控制器,其中該次控制器將取代該主控制器來控制該一或多個電磁閥之致動。該方法可進一步包含在將該控制切換給次控制器後,維持該一或多個電磁閥之閥位置的步驟。
本發明具有下列優點:控制氣體供應,以便甚至當該控制裝置係呈出錯狀態時,其不會中斷;檢測製程氣體壓力及圓筒重量等等;及可操作及控制加熱器(或一或多個加熱器)。
本發明具有下列優點:當偵測到該控制裝置出錯時,將壓力、重量及加熱器訊息及/或溫度訊息傳送至該氣體監視系統,以便可準確地知曉該氣體供應裝置之狀態。
較佳實施例之詳細說明 在下文中,將參照伴隨的圖形詳細地描述本發明之較佳具體實例。
圖1闡明根據本發明之氣體供應系統的圖式組態。
參照圖1,根據本發明的氣體供應系統包含一氣體供應控制裝置100及一圓筒裝置200。圖2顯示出氣體控制裝置100的一個具體實例之闡明。圖6顯示出圓筒裝置200之闡明。要注意的是,未顯示或描述出圓筒裝置的某些態樣,於此,僅主張對本發明之操作重要的那些態樣。
該圓筒裝置200將製程氣體供應至一或多個製程艙300。該圓筒裝置200具有一或複數個貯存製程氣體的氣體圓筒。在一個具體實例中,如在圖6中顯示出,該圓筒裝置200交替地操作2個氣體圓筒602A、602B,其經由輸送管675將製程氣體供應至製程艙300。「交替」意謂著A側係以由圓筒602A供應之製程氣體進行操作,同時B側不進行操作。一旦A側的圓筒602A用完,則換該圓筒裝置200的B側進行操作及A側不進行操作。若該次控制器接管控制時,已知當其接管且繼續操作在該圓筒裝置200的A或B側上之圓筒裝置時,其將操作該圓筒602A或602B及電磁閥及氣動閥。要在下列描述中了解的是,該製程氣體流過該圓筒裝置200的A側或B側。當氣體在A側上流動時,使用具有標號A的元件。任擇地,當氣體在B側上流動時,使用具有B標號的元件。側A及側B二者皆包括輸送管675及沒有A或B標號的其它元件。該製程艙300透過半導體製造方法使用製程氣體來處理該半導體基材。
該圓筒裝置200將貯存在氣體圓筒中之製程氣體調整至具體指定而與該製程配方相應的壓力及流速(透過選擇性調節器605A、605B),及將該製程氣體供應至製程艙300。為此目的,該圓筒裝置200可裝設一或多個或複數個氣動閥604A1、604A2、604A3、604B1、604B2及604B3,其各者由連接至加壓氣體來源(無顯示)的電磁閥(無顯示)控制。該氣動閥604A1、604A2、604A3、604B1、604B2及604B3控制該製程氣體經由各別連接至每個圓筒602A及602B的輸送管622A、622B及連接至輸送管622A、622B的輸送管675供應至製程艙300。如所顯示出,輸送管675離開該圓筒裝置及將該製程氣體運送至製程艙300。與加壓氣體來源流體連通的每個電磁閥係藉由供應或阻擋該閥致動氣體供應至氣動閥來提供打開或關閉各別的氣動閥。該致動氣體典型係經由連接自製造設備(工廠)的加壓空氣供應器(無顯示)之輸送管(無顯示)所供應的加壓空氣(乾淨的乾空氣);但是,可使用另一種氣體,例如,加壓氮。
該圓筒裝置200可裝設一設置在主控制器100中來供應主電源之電源供應器單元,及複數個設置在該圓筒裝置200中的感應器。該感應器包含複數個(一或多個)壓力感測器306A1及306B1,其測量各別通過線622A及622B下游的各別調節器605A及605B之製程氣體壓力;及/或壓力感測器306A2及306B2,其各別測量在圓筒602A及602B處之製程氣體壓力;及複數個(一或多個)重量感應器307A、307B,其各別測量氣體圓筒602A及602B的重量。此外,該感應器包含一檢測火焰的火焰檢測光學感應器301 (UVIR)、一檢測氣體洩漏的氣體洩漏感應器303及一高溫感應器302。該高溫感應器檢測在該系統內的異常溫度;若到達具體指定的溫度時,其對該氣體供應控制裝置100供應警報訊號。若到達特定的預定溫度(例如,85℃)或超過時,該高溫感應器可在發火的情況中致動。此外,該感應器可進一步包含一EMO感應器(無顯示),其檢測緊急鈕的加壓以便外部通知該緊急狀況;及一電力感應器(無顯示),其檢測主電源供應狀態。在一個具體實例中,該電力感應器係憑藉在該次控制器與主控制器間之介面。若主控制器失去電力時,該次控制器偵測到當該主控制器失去電力(及關掉)時的電力損失。當主控制器失去電力時,次控制器接管該圓筒裝置的控制,即使僅有有限的控制。
氣體供應控制裝置100與該等感應器組合來即時監視該圓筒裝置200之操作狀態,及若主電力中斷時,其控制該圓筒裝置200之操作,以便均勻地供應該製程氣體直到現在正在製程艙300中進行的製程完成。例如,該氣體供應控制裝置100使用次控制器來對該圓筒裝置200之感應器供應電力,藉由控制該一或多個電磁閥之操作,經由一或多個氣動閥將該製程氣體連續供應至該製程艙300直到現在正在製程艙300中進行的製程完成。較佳的是,在開始該製程前,將用於主電力中斷的製程之製程條件及供應至該製程艙的製程氣體量以程式寫進該氣體控制裝置中。該製程將在該次控制器之控制下繼續直到將該已預程式化的製程氣體量供應至該製程艙。
圖2闡明圖1之氣體供應控制裝置的內部組態。
參照圖2,該氣體供應控制裝置100包含一在正常狀態下操作的主控制器110,及一在異常狀態下操作之次控制器120及一數位及/或類比介面402。
該主控制器110控制該一或多個電磁閥S604A1、S604A2、S604A3、S604B1、S604B2、S604B3(在圖6中無顯示,顯示在圖7中)之各自獨立的致動,其在正常操作期間各別控制一或多個在圖6中顯示出如為604A1、604A2、604A3、604B1、604B2、604B3的氣動閥每個。
該次控制器120檢測主控制器的異常狀態,及當檢測到異常時,其取代主控制器110來控制一或多個電磁閥之致動,其控制該致動氣體流至一或多個在圖6中顯示出如為604A1、604A2、604A3、604B1、604B2、604B3的氣動閥。
該主控制器110及次控制器120透過如顯示在圖3中的數位介面403互相共享數位檢測訊息,及透過顯示在圖4中的類比介面404共享類比檢測訊息。
例如,該主控制器110的PLC(可程式邏輯控制器)數位輸出及次控制器120的數位輸入可透過數位介面403共享。於此情況中,當在主控制器110中檢測到異常時,該次控制器120可控制一或多個電磁閥之致動,其控制該致動氣體流至各別氣動閥604A1、604A2、604A3、604B1、604B2、604B3,因此避免該製程氣體中斷供應至製程艙300。當該裝置由主控制器110控制時,無論每個電磁閥在檢測到異常那時的位置為何(打開或關閉),每個電磁閥將在次控制器之控制下保持該位置(打開或關閉)直到現在正在進行之製程完成。
至於額外的實施例,該次控制器120的PLC(可程式邏輯控制器)數位輸入及數位輸出可透過數位介面403共享。於此情況中,當在主控制器110中檢測到異常時,該製程氣體可持續正常供應至製程艙300,因為該次控制器120取代主控制器110來控制一或多個將會控制該氣動閥604A1、604A2、604A3、604B1、604B2、604B3(如顯示在圖6中)的電磁閥(無顯示)之致動。此外,當檢測到主控制器110異常時,該次控制器120取代主控制器110來監視由溫度感應器304所測量的加熱溫度,其控制該一或多個設置成與該圓筒602A、602B接觸及/或與該一或多個圓筒下游的輸送管接觸,較佳為在接近該供應輸送管675離開該圓筒裝置200至該製程艙300處的加熱器633A、633B、633C之致動,因此防止該製程氣體液化。若需要時,致動與該輸送管675接觸的加熱器633C及/或與該供應氣體之圓筒接觸的加熱器633A或633B。
該主控制器110及次控制器120係透過類比介面來互相共享類比檢測訊息。例如,在檢測到主控制器110異常後,該次控制器120可取代主控制器110而繼續監視下列之一或多種:來自製程氣體溫度感應器304的溫度;及/或來自一或多個壓力感測器306A1、306A2、306B1、306B2(在圖4中僅顯示出為306)的氣體供應壓力;及/或來自307A或307B(在圖4中僅顯示出為307)的圓筒重量等等。要注意的是,雖然在圖6中僅顯示出一個製程氣體溫度感應器304,可在該圓筒裝置200中,特別在線622A或622B上提供額外的溫度感應器。
圖3闡明主控制器及次控制器係透過數位介面403互相連接。
參照圖3,該主控制器110及次控制器120可由於透過數位介面403之互相連接而共享數位檢測訊息。
該數位檢測訊息可包含火焰檢測訊息,其係來自火焰檢測光學感應器301之輸入;高溫檢測訊息,其係來自高溫感應器302之輸入;及氣體洩漏檢測訊息,其係來自氣體洩漏感應器303之輸入。該火焰檢測光學感應器301、高溫感應器302及氣體洩漏感應器303可安裝在該圓筒裝置200中而圖式顯示在圖6之具體實例中。
在正常操作下,該主控制器110可根據來自一或多個溫度感應器諸如304之溫度檢測訊息來控制一或多個加熱器633A、633B、633C的致動,以防止該製程氣體液化。此外,當偵測到異常時,該次控制器120可根據來自一或多個溫度感應器諸如304之加熱溫度檢測訊息來控制一或多個加熱器633A、633B、633C的致動,以防止該製程氣體液化。
圖4闡明該主控制器及次控制器係透過類比介面互相連接。
參照圖4,該主控制器110及次控制器120可由於透過類比介面之互相連接而共享類比檢測訊息。
該類比檢測訊息可包含氣體供應壓力檢測訊息,其係來自一或多個溫度感應器304、一或多個壓力感測器306A1、306A2、306B1、306B2之輸入;及圓筒重量檢測訊息,其係來自一或多個重量感應器307A、307B之輸入。於此情況中,該壓力感測器及重量感應器可安裝在該圓筒裝置中,如顯示於圖6。
圖5闡明在該氣體供應控制裝置及氣體監視系統130之主控制器110與次控制器120間的連接組態。
參照圖5,根據本發明之氣體供應控制裝置100可進一步包含一監視系統130及一切換開關140。因此,在根據本發明之氣體供應控制裝置100中,當該主控制器110發生異常狀態時,連接至通訊線502之次控制器120將取代而進行操作,以便該圓筒裝置繼續供應製程氣體,該監視系統130可繼續監視該氣體供應狀態,及根據該圓筒之壓力(藉由一或多個壓力感測器306A1、306A2、306B1、306B2測量)及重量(藉由一或多個重量感應器307A或307B測量),經由該次控制器或主控制器來控制該一或多個在該圓筒裝置200中的加熱器633A、633B、633C,及維持該能維持各別氣動閥的位置之電磁閥的閥位置(打開或關閉)。「氣體供應狀態」或「製程氣體供應狀態」指為對特別的製程來說,相對於已預程式化之流至該製程艙300的製程氣體之溫度、壓力、及/或流速及/或重量及/或製程氣體量及/或時間的變化,來自該圓筒裝置200的感應器之實際測量的溫度及壓力、及流入與已經提供進該製程艙中的製程氣體量(該量可由時間及流速及/或圓筒的重量變化決定)。在任擇的具體實例中,該裝置繼續該流動直到由技師手動地停止,或該主控制器恢復控制。
特別是,該監視系統130選擇性與該主控制器110及次控制器120通訊以持續性監視該製程氣體供應狀態。換句話說,在正常操作下,該監視系統130係經由電訊線501與主控制器110通訊以持續監視該製程氣體供應狀態;但是在異常操作時,其經由電訊線502與次控制器120通訊以繼續監視該製程氣體供應狀態。
在正常操作下,該切換開關140係經由通訊線501與主控制器110及監視系統130互相連接。比較上,在異常操作時,該切換開關140係經由通訊線502與次控制器120及監視系統130互相連接。
圖7顯示出在一個具體實例中,於主控制器110及次控制器120間經由電連接701與電磁閥S604A1、S604A2、S604A3或S604B1、S604B2、S604B3及加熱器633C及633A或633C及633B互相連接通訊,及維持該製程氣體供應狀態直到該已預程式化的製程完成或停止,或該主控制器恢復控制。每個電磁閥控制各別的氣動閥604A1、604A2、604A3、604B1、604B2、604B3。
本發明具有下列效應。
首先,可從開端防止由於製程氣體流中斷之製程失敗,因為甚至當該主控制器故障時,該製程氣體供應可由次控制器繼續控制。
其次,本發明具有下列優點:甚至當主控制器故障時,尚可監視氣體壓力及/或製程氣體溫度及/或圓筒重量等等,及可操作及控制一或多個加熱器。
第三,甚至當主控制器有故障時,根據本發明可藉由在監視系統與控制室(無顯示)間之電訊將監視從中央控制室切換至氣體監視系統來持續監視下列之一或多種而沒有發生通訊失敗:壓力、製程氣體溫度、重量、加熱器訊息等等;因此,其具有可精確知曉該氣體供應系統的狀況之優點。
將由熟習該項技術者從上述了解,本發明可經修改及適應於多種方法而沒有改變本發明之工藝構想或基本特徵。因此,本發明之工藝範圍應該不限於在本專利說明書的發明內容中所描述之內容,而是應該由申請專利範圍所定義。
100‧‧‧氣體供應控制裝置
110‧‧‧主控制器
120‧‧‧次控制器
130‧‧‧氣體監視系統
140‧‧‧切換開關
200‧‧‧圓筒裝置
300‧‧‧製程艙
301‧‧‧火焰檢測光學感應器
302‧‧‧高溫感應器
303‧‧‧氣體洩漏感應器
304‧‧‧溫度感應器
306,306A1,306A2,306B1,306B2‧‧‧壓力感測器
307,307A,307B‧‧‧重量感應器
402‧‧‧數位及/或類比介面
403‧‧‧數位介面
404‧‧‧類比介面
501‧‧‧電訊線,通訊線
502‧‧‧電訊線,通訊線
602A,602B‧‧‧氣體圓筒
604A1,604A2,604A3,604B1,604B2,604B3‧‧‧氣動閥
S604A1,S604A2,S604A3,S604B1,S604B2,S604B3‧‧‧電磁閥
605A,605B‧‧‧調節器
622A,622B‧‧‧線輸,送管
633A,633B,633C‧‧‧加熱器
675‧‧‧輸送管
A‧‧‧側
B‧‧‧側
圖1闡明根據本發明之氣體供應系統的示意性組態。 圖2示意性地闡明圖1的氣體供應控制裝置之內部組態。 圖3示意性地闡明該主控制器及次控制器透過數位介面互相連接。 圖4示意性地闡明該主控制器及次控制器透過類比介面互相連接。 圖5示意性地闡明在該氣體供應控制裝置與氣體監視系統之主控制器及次控制器間的連接組態。 圖6示意性地闡明本發明的圓筒裝置之一個具體實例。 圖7示意性地闡明在該氣體供應控制裝置與電磁閥及加熱器之主控制器及次控制器間的連接組態。
Claims (12)
- 一種裝設有一圓筒裝置的氣體供應系統,其具有一或多個控制一製程氣體供應至一製程艙的氣動閥;及一或多個電磁閥,其係藉由供應或停止一閥致動氣體流至該氣動閥動來打開或關閉該氣動閥;及 一氣體供應控制裝置,其控制該一或多個電磁閥之操作; 其中該氣體供應控制裝置包含: 一主控制器,其在正常操作期間控制該一或多個電磁閥之致動;及 一次控制器,其檢測該主控制器之異常狀態及在檢測到異常後,取代該進行控制的主控制器來控制該一或多個電磁閥之致動; 其中該主控制器及該次控制器係透過數位或類比或數位與類比介面來共享數位或類比或數位與類比檢測訊息。
- 如請求項1之氣體供應系統, 其中該主控制器及次控制器係透過類比介面來共享類比檢測訊息。
- 如請求項1之氣體供應系統,其中該主控制器及次控制器係透過數位介面來共享數位檢測訊息。
- 如請求項3之氣體供應系統,進一步其中該主控制器及次控制器係透過類比介面來共享類比檢測訊息。
- 如請求項3之氣體供應系統, 其中該數位檢測訊息包含至少一種選自於由下列所組成之群: 火焰檢測訊息,其係來自火焰檢測光學感應器之輸入; 高溫檢測訊息,其係來自高溫感應器之輸入;及 氣體洩漏檢測訊息,其係來自氣體洩漏感應器之輸入; 其中該火焰檢測光學感應器、高溫感應器及氣體洩漏感應器係安裝在該圓筒裝置中。
- 如請求項1之氣體供應系統, 其中該圓筒裝置進一步包含一或多個加熱器及一或多個製程氣體溫度感應器,及該主控制器係根據來自該一或多個製程氣體溫度感應器的加熱溫度檢測訊息來控制該一或多個加熱器之致動,以防止該製程氣體液化; 及其中當發生異常檢測時,該次控制器係根據該加熱溫度檢測訊息來控制該一或多個加熱器之致動,以防止該製程氣體液化。
- 如請求項2之氣體供應系統, 其中該類比檢測訊息包含至少一種選自於由下列所組成之群: 氣體供應壓力檢測訊息,其係來自一或多個壓力感測器之輸入; 圓筒重量檢測訊息,其係來自一或多個重量感應器之輸入;及 製程氣體溫度訊息,其係來自一或多個製程氣體溫度感應器之輸入; 及其中若存在時,該一或多個壓力感測器、及一或多個溫度感應器及一或多個重量感應器係安裝在該圓筒裝置中。
- 如請求項1之氣體供應系統,其中 該氣體供應控制裝置進一步包含: 一監視系統,其選擇性與該主控制器及次控制器通訊以持續監視該製程氣體供應狀態;及 一切換開關,其中在正常操作下,該主控制器經由該通訊線與該監視系統互相連接;及當偵測到異常時,該次控制器經由該通訊線與該監視系統互相連接。
- 如請求項5之氣體供應系統,其中該數位檢測訊息包含至少二種選自於由下列所組成之群: 火焰檢測訊息,其係來自火焰檢測光學感應器之輸入; 高溫檢測訊息,其係來自高溫感應器之輸入;及 氣體洩漏檢測訊息,其係來自氣體洩漏感應器之輸入。
- 如請求項7之氣體供應系統, 其中該類比檢測訊息包含至少二種選自於由下列所組成之群: 氣體供應壓力檢測訊息,其係來自一或多個壓力感測器之輸入; 圓筒重量檢測訊息,其係來自一或多個重量感應器之輸入;及 製程氣體溫度訊息,其係來自一或多個製程氣體溫度感應器之輸入。
- 一種控制一氣體供應系統的方法,其中該系統包含一或多個控制該製程氣體供應至該製程艙的氣動閥,及一或多個藉由供應或停止該閥致動氣體流至該氣動閥每個來打開或關閉每個氣動閥的電磁閥;及 一氣體供應控制裝置,其控制該一或多個電磁閥之操作; 其中該氣體供應控制裝置進一步包含: 一主控制器,其在正常操作期間控制該一或多個電磁閥之致動;及一次控制器,該方法其步驟包括: 在該主控制器與該次控制器間透過數位或類比或數位與類比介面來共享數位或類比或數位與類比檢測訊息;及 將該氣體供應系統之控制切換至檢測該主控制器的異常狀態之次控制器,其中該次控制器取代該主控制器來控制該一或多個電磁閥的致動。
- 如請求項11之方法,更包含下列步驟: 在將該控制切換至該次控制器後,維持該一或多個電磁閥的閥位置。
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JP5874691B2 (ja) * | 2013-06-26 | 2016-03-02 | 株式会社ダイフク | 不活性気体供給設備 |
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2017
- 2017-06-15 KR KR1020170075558A patent/KR101988361B1/ko active IP Right Grant
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2018
- 2018-06-15 CN CN201880039077.6A patent/CN110785221A/zh active Pending
- 2018-06-15 JP JP2019569327A patent/JP6959368B2/ja active Active
- 2018-06-15 EP EP18816784.5A patent/EP3655143B1/en active Active
- 2018-06-15 US US16/622,415 patent/US11755437B2/en active Active
- 2018-06-15 WO PCT/US2018/037834 patent/WO2018232292A1/en unknown
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI809498B (zh) * | 2020-09-18 | 2023-07-21 | 美商慧盛材料美國責任有限公司 | 材料供應系統及使從氣體供應和分配系統分配的氣體的壓力變化實質上降低之方法 |
Also Published As
Publication number | Publication date |
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CN110785221A (zh) | 2020-02-11 |
KR20190018064A (ko) | 2019-02-21 |
JP6959368B2 (ja) | 2021-11-02 |
US11755437B2 (en) | 2023-09-12 |
US20200208783A1 (en) | 2020-07-02 |
EP3655143A4 (en) | 2021-06-09 |
TWI719319B (zh) | 2021-02-21 |
EP3655143A1 (en) | 2020-05-27 |
EP3655143B1 (en) | 2023-12-06 |
JP2020524403A (ja) | 2020-08-13 |
WO2018232292A1 (en) | 2018-12-20 |
KR101988361B1 (ko) | 2019-06-12 |
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