TW201841234A - 複合構件及其製造方法 - Google Patents

複合構件及其製造方法 Download PDF

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Publication number
TW201841234A
TW201841234A TW106129143A TW106129143A TW201841234A TW 201841234 A TW201841234 A TW 201841234A TW 106129143 A TW106129143 A TW 106129143A TW 106129143 A TW106129143 A TW 106129143A TW 201841234 A TW201841234 A TW 201841234A
Authority
TW
Taiwan
Prior art keywords
layer
aliphatic polycarbonate
resin
composite member
metal
Prior art date
Application number
TW106129143A
Other languages
English (en)
Chinese (zh)
Inventor
下田達也
井上聡
廣瀬大亮
西岡聖司
八軒静香
冨士川亘
村川昭
白髪潤
Original Assignee
國立大學法人北陸先端科學技術大學院大學
住友精化股份有限公司
Dic股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 國立大學法人北陸先端科學技術大學院大學, 住友精化股份有限公司, Dic股份有限公司 filed Critical 國立大學法人北陸先端科學技術大學院大學
Publication of TW201841234A publication Critical patent/TW201841234A/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
TW106129143A 2016-10-05 2017-08-28 複合構件及其製造方法 TW201841234A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016197371 2016-10-05
JP2016-197371 2016-10-05

Publications (1)

Publication Number Publication Date
TW201841234A true TW201841234A (zh) 2018-11-16

Family

ID=61830872

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106129143A TW201841234A (zh) 2016-10-05 2017-08-28 複合構件及其製造方法

Country Status (3)

Country Link
JP (1) JP6337363B1 (ja)
TW (1) TW201841234A (ja)
WO (1) WO2018066203A1 (ja)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003073844A (ja) * 2001-09-05 2003-03-12 Hitachi Cable Ltd 無電解めっき方法
JP2005008909A (ja) * 2003-06-16 2005-01-13 Canon Inc 構造体の製造方法
JP2005029735A (ja) * 2003-07-10 2005-02-03 Mitsuboshi Belting Ltd ポリイミド樹脂の無機薄膜形成方法及び表面改質した無機薄膜形成用ポリイミド樹脂の製造方法
JP4737386B2 (ja) * 2005-03-31 2011-07-27 日本ゼオン株式会社 電子機器用回路基板の製造方法、電子機器用回路基板、および表示装置
JP2012077342A (ja) * 2010-09-30 2012-04-19 Yamato Denki Kogyo Kk 金属パターンの形成方法
DK2640868T3 (en) * 2010-11-16 2018-12-10 Cuptronic Tech Ltd METAL COATING OF ARTICLES USING A PLASMA POLYMERIZATION PRESERVATION
JP2013102072A (ja) * 2011-11-09 2013-05-23 Japan Science & Technology Agency 型押し構造体の製造方法、薄膜トランジスター、薄膜キャパシター、アクチュエーター、圧電式インクジェットヘッド及び光学デバイス
JP2016121387A (ja) * 2014-12-25 2016-07-07 キヤノン・コンポーネンツ株式会社 めっき皮膜付樹脂製品の製造方法

Also Published As

Publication number Publication date
JP6337363B1 (ja) 2018-06-06
WO2018066203A1 (ja) 2018-04-12
JPWO2018066203A1 (ja) 2018-10-04

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