TW201829808A - Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor - Google Patents

Abstract

A measurement assembly (100) for measuring a deposition rate of an evaporated material is described. The measurement assembly (100) includes: a first oscillation crystal (110) for measuring the deposition rate; a second oscillation crystal (120) for measuring the deposition rate; and a movable shutter (140). The movable shutter (140) is configured for blocking the evaporated material provided from a first measurement outlet (151), the first measurement outlet directed for providing evaporated material to the first oscillation crystal (110). Further, the movable shutter (140) is configured for blocking the evaporated material provided from a second measurement outlet (152), the second measurement outlet directed for providing evaporated material to the second oscillation crystal (120).

Description

Measuring component for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor

The present disclosure relates to a measuring assembly for measuring the deposition rate of a vaporized material, an evaporation source for evaporation of a material, a deposition device for supplying material to a substrate, and a measuring device A method of depositing a rate of evaporation of a material. The present disclosure relates in particular to a measuring assembly for measuring an evaporated organic material and a method therefor. Furthermore, the present disclosure relates in particular to several devices including organic materials therein, such as an evaporation source and a deposition apparatus for organic materials.

Organic vaporizers are tools for the manufacture of organic light-emitting diodes (OLEDs). OLEDs are a special form of light-emitting diodes. In OLEDs, the luminescent layer comprises a film of a specific organic compound. OLEDs are used to create television screens, computer screens, mobile phones, other handheld devices, etc. for displaying information. OLEDs can also be used as general space lighting. The range of possible colors, brightness, and viewing angles of OLED displays is greater than such characteristics of conventional liquid crystal displays (LCDs) because OLED pixels are directly illuminated and do not include a backlight. Therefore, the energy loss of an OLED display is considerably less than that of a conventional LCD. Furthermore, OLEDs that can be fabricated on flexible substrates produce other applications.

The function of the OLED depends on the coating thickness of the organic material. This thickness must be in the predetermined range. In the manufacture of OLEDs, the deposition rate of the affected coating with organic material is controlled to fall within predetermined tolerances. That is to say, the deposition rate of the organic vaporizer must be sufficiently controlled in the process.

Therefore, for OLED applications and for other evaporation processes, a high accuracy deposition rate is required for a relatively long period of time. There are several possible measurement systems available to measure the deposition rate of the evaporator. However, such measurement systems face insufficient accuracy and/or insufficient stability in the required time interval.

Accordingly, there is a continuing need to provide improved deposition rate measurement systems, deposition rate control methods, evaporators, and deposition equipment.

In view of the above, a measuring component for measuring a deposition rate of a vaporized material, an evaporation source, a deposition apparatus, and a method for measuring a deposition rate of an evaporated material according to the scope of the independent patent application provide.

In accordance with one aspect of the present disclosure, a measurement assembly for measuring the deposition rate of a vaporized material is presented. The measuring assembly includes a first oscillating crystal for measuring a deposition rate, a second oscillating crystal for measuring a deposition rate, and a movable shutter. The movable shutter system is configured to block the evaporated material supplied from a first measurement outlet, and the second measurement outlet is guided to provide the evaporated material to the first oscillating crystal. Further, the movable shutter system is configured to block the evaporated material supplied from a second measurement outlet, and the second measurement outlet is directed to provide the evaporated material to the second oscillation crystal.

According to another aspect of the present disclosure, an evaporation source for evaporation of a material is proposed. The evaporation source includes an evaporation crucible in which the evaporation crucible is assembled to evaporate a material; a distribution assembly having one or more outlets for providing vaporized material. The distribution component is in fluid communication with the evaporation crucible. Further, the evaporation source comprises a measurement assembly as in any of the embodiments described herein.

In accordance with other aspects of the present disclosure, a deposition apparatus is proposed for providing material to a substrate at a deposition rate in a vacuum chamber. The deposition apparatus includes at least one evaporation source of any of the embodiments described herein.

In accordance with another aspect of the present disclosure, a method for measuring the deposition rate of a vaporized material is presented. The method includes evaporating a material; supplying a first portion of the evaporated material to a substrate; turning a second portion of the evaporated material to a first oscillating crystal and/or a second oscillating crystal; and by using The measurement assembly of any of the embodiments described herein measures the deposition rate.

Other advantages, features, aspects and details will become apparent from the scope of the patent application, the description and the drawings. In order to better understand the above and other aspects of the present invention, the following detailed description of the embodiments and the accompanying drawings

The detailed description is to be understood by the embodiments of the present disclosure, and one or more examples of several embodiments of the present disclosure are illustrated in the drawings. In the description of the following figures, the same reference numerals are intended to refer to the same elements. In the following, there will generally be only a description of the differences between the individual embodiments. The examples are provided by way of illustration of the disclosure and are not intended to be limiting. Furthermore, the features illustrated or described as part of one embodiment can be used in other embodiments or in combination with other embodiments to achieve further embodiments. This means that the description includes such adjustments and changes.

Before the several embodiments of the present disclosure are described in more detail, several aspects of the names used herein are explained.

In the present disclosure, "the oscillating crystal for measuring the deposition rate" can be understood as measuring the change in the mass of the deposited material on the oscillating crystal per unit area by measuring the change in the frequency of the oscillating crystal resonator. An oscillating crystal. In particular, in the present disclosure, an oscillating crystal can be understood as a quartz crystal resonator. More specifically, "the oscillating crystal used to measure the deposition rate" can be understood as a quartz crystal microbalance (QCM).

In the present disclosure, a "movable shutter" is understood to mean a movable element disposed between a measuring component and a measuring outlet. The measurement outlet is used to provide the evaporated material to the measurement assembly. In particular, "movable shutter" is understood to mean an element that is assembled to move in the space between the measuring assembly and the measuring outlet. For example, the movable shutter can be assembled to be movable in a lateral direction. According to another example, the movable shutter can be assembled to be rotatable. Generally, in the first state of the movable shutter, the movable shutter assembly is configured to block the flow of evaporated material provided via the measurement outlet. In the second state of the movable shutter, the movable shutter system is assembled for unblocking the flow of evaporated material provided via the measurement outlet. Therefore, the movable shutter system is assembled for controlling the evaporated material to one of the inlet and outlet of the measuring assembly.

In the present disclosure, "evaporation source for evaporation of material" is understood to be a configuration that is assembled to provide a material to be deposited on a substrate. In particular, the evaporation source can be configured to provide a material to be deposited on the substrate in a vacuum chamber, such as a vacuum deposition chamber of a vacuum deposition apparatus. According to some embodiments, the evaporation source may include an evaporator or crucible and a distribution assembly. The evaporator or crucible evaporates the material that will be deposited on the substrate. The distribution component is exemplified by a distribution tube or one or more point sources that can be configured along a vertical axis. For example, the distribution assembly can be assembled to release the evaporated material via an outlet or nozzle, for example, in one direction toward the substrate.

In the present disclosure, "shabu" is understood to mean a device or reservoir that provides or contains material to be deposited. Generally, the crucible can be heated to evaporate the material to be deposited on the substrate. The crucible can be in fluid communication with the distribution assembly and the material evaporated by the crucible can be transferred to the distribution assembly. In one example, the crucible may be a crucible for evaporating organic material, and the organic material is exemplified by an organic material having an evaporation temperature of about 100 ° C to about 600 ° C.

In the present disclosure, the term "fluid communication" is understood to mean that two elements in fluid communication can exchange fluid via a connector to allow fluid to flow between the two elements. In one example, the fluidly communicating element can include a hollow structure through which fluid can flow. According to some embodiments, at least one element in fluid communication may be a tubular element.

In the present disclosure, a "distribution component" is understood to mean a distribution tube for guiding and distributing evaporated material, or one or more point sources that can be arranged along a vertical axis. In particular, the distribution tube or the one or more point sources can be assembled for providing vaporized material from the evaporator to the outlet (eg, a nozzle or opening) in the distribution tube or the one or more point sources. For example, where the distribution component is in the form of a distribution tube, the distribution tube can be a linear distribution tube that extends in the longitudinal direction. For example, the distribution tube can comprise a tube having the shape of a cylinder, wherein the cylinder can have a round, triangular or square-like bottom shape or can be any other suitable bottom shape.

Illustratively with reference to Figures 1A through 1C, the measurement assembly 100 for measuring the deposition rate of evaporated material in accordance with embodiments described herein includes a first oscillating crystal 110, a second oscillating crystal 120, and a movable shutter 140. The first oscillating crystal 110 is used to measure the deposition rate, and the second oscillating crystal 120 is used to measure the deposition rate. The movable shutter 140 is assembled to block the evaporated material supplied from the first measurement outlet 151, and the first measurement outlet 151 is used to supply the evaporated material to the first oscillating crystal 110. In particular, the first measurement outlet 151 is oriented for providing the evaporated material to the first oscillating crystal 110. Further, the movable shutter 140 is assembled to block the evaporated material provided from the second measurement outlet 152. In particular, the second measurement outlet 152 is directed to provide the evaporated material to the second oscillating crystal 120.

In particular, Figure 1A shows a schematic diagram of a measurement assembly in a first state. In the first state, the second measurement outlet 152 is blocked by the movable shutter 140 such that the inlet and outlet of the vaporized material provided via the second measurement outlet 152 to the second oscillating crystal 120 is blocked. Again, as exemplarily shown in FIG. 1A, the measurement assembly can be assembled such that the inlet and outlet of the vaporized material provided via the first measurement outlet 151 to the first oscillating crystal 110 is provided, while the second measurement outlet 152 is blocked. Therefore, when the second oscillating crystal 120 can be cleaned, the deposition rate can be measured by the first oscillating crystal 110. For example, the second oscillating crystal 120 can be cleaned by heating, particularly by providing a heating temperature corresponding to the evaporation temperature of the evaporated material deposited on the second oscillating crystal 120. For example, the heating temperature can be provided by a heating element. The heating element is disposed in the movable shutter 140 and/or the heating element is disposed in the support for the second oscillating crystal 120.

FIG. 1B is a schematic diagram showing a second state of the measuring component. In the second state, the movable shutter 140 has been moved to a position in which the first measurement outlet 151 and the second measurement outlet 152 are opened to provide the evaporated material to the first oscillating crystal 110 and The entrance and exit of the evaporated material of both of the second oscillating crystals 120. Therefore, the first oscillating crystal 110 and the second oscillating crystal 120 can be applied to measure the deposition rate so that redundant measurements can be performed.

In Figure 1C, the third state of the measurement assembly is depicted. In the third state, the movable shutter 140 has moved to a position in which the entrance and exit of the evaporated material provided via the first measurement outlet 151 to the first oscillating crystal 110 is blocked. Therefore, as exemplarily shown in FIG. 1C, when the first oscillating crystal 110 can be cleaned, the deposition rate can be measured by the second oscillating crystal 120. For example, the first oscillating crystal 110 can be cleaned by heating, particularly by providing a heating temperature corresponding to the evaporation temperature of the evaporated material deposited on the first oscillating crystal 110. For example, the heating temperature can be provided by a heating element. The heating element is disposed in the movable shutter 140 and/or the heating element is disposed in the support for the first oscillating crystal 110.

According to several embodiments, which can be combined with any of the other embodiments described herein, the movable shutter can be attached to the drive. The actuator is exemplified by a linear actuator that is assembled for providing a translational movement of the movable shutter, as exemplarily illustrated by the arrows on the movable shutter 140 in Figures 1A and 1C. In particular, the driver can be configured to move the movable shutter between the first measurement outlet blocking state and the second measurement outlet blocking second state. Thus, with reference to the exemplary illustrations of Figures 1A through 1C, it will be understood that the driver can be configured for linear lateral alternating motion to block/open the first measurement outlet and the second measurement outlet.

Thus, the measurement assembly as described herein provides the possibility to continuously measure the deposition rate of the evaporated material. In particular, an improved measurement component is provided by providing a measurement component in which the deposition rate can be measured by the first oscillating crystal and the second oscillating crystal can be simultaneously cleaned. For example, since the first oscillating crystal and the second oscillating crystal can be cleaned in an alternating manner, the negative effect of the deposited material on the accuracy of the deposition rate measurement can be reduced or even eliminated. Again, the measurement components as described herein provide the possibility to process excess deposition rate measurements. For example, in the state of the measurement component in which the first measurement outlet and the second measurement outlet are opened, that is, the inlet and outlet of the evaporated material supplied through the first measurement outlet and the second measurement outlet are supplied to the first oscillation crystal and The second oscillating crystal, which can be used for deposition rate measurement, is advantageous for increasing measurement accuracy.

Illustratively with reference to Figures 2A through 2D, a measurement assembly 100 for measuring the deposition rate of a deposited material in accordance with other embodiments is illustrative. According to several embodiments, which can be combined with any of the other embodiments described herein, the movable shutter 140 can be a rotatable element having at least one aperture 160. The at least one aperture 160 can be configured to provide access to the evaporated material from the first measurement outlet to the first oscillating crystal 110 when the rotatable element is in the first state, as exemplarily shown in FIG. 2A . For example, the rotatable element can be a rotatable disc having a substantially circular shape, as exemplarily shown in Figures 2A through 2D. Alternatively, the rotatable element can be a rotatable sheet having an elliptical shape, a rectangular shape or any other suitable shape.

For example, the rotatable element can be coupled to a driver that is assembled for providing rotational motion about a rotational axis of the rotatable element, as exemplarily shown in Figures 2A through 2D.

According to several embodiments, which can be combined with any of the other embodiments described herein, the at least one aperture 160 is configured for providing a second measurement exit to a second oscillation when the rotatable element is in the second state The vaporized material of the crystal 120 is in and out. For example, when the rotatable element having the at least one hole is rotated 180° from the first state exemplarily shown in FIG. 2A to the second state, for exiting from the second measurement exit to the second oscillating crystal 120 The inlet and outlet of the evaporated material can be provided.

Illustratively with reference to Figures 2A through 2D, the at least one aperture 160 can include a first aperture 161 and a second aperture 162, a first aperture 161 and a plurality of embodiments, in accordance with any of the other embodiments described herein. The two holes 162 are arranged in diameter relative to each other. Such an assembly is particularly advantageous for providing the vaporized material to the inlet and outlet of the first oscillating crystal and the second oscillating crystal simultaneously, so that redundant position measurements can be performed.

Furthermore, according to several embodiments, which may be combined with any of the other embodiments described herein, the at least one hole 160 may include a third hole 163 and a fourth hole 164, and the third hole 163 and the fourth hole 164 may be disposed on On the opposite side of the first hole 161, as exemplarily shown in Figs. 2A to 2C. The third aperture 163 and the fourth aperture 164 may be additionally or selectively disposed on opposite sides of the second aperture 162 (not explicitly shown). In particular, the third aperture 163 and the fourth aperture 164 can be disposed in a radial position that substantially corresponds to a radial position of the first aperture 161 and/or a radial position of the second aperture 162. The radial position of the at least one hole is exemplarily shown by arrows and dotted lines in the 2A to 2D drawings. The radial positions of the at least one hole are exemplified by the first hole 161, the second hole 162, and the third hole. 163, and the radial position of the fourth hole 164.

For example, as exemplarily shown in FIG. 2C, the third hole 163 and the fourth hole 164 may be provided at an angle α of α=45° with respect to the position of the first hole 161. Although not explicitly shown, the third aperture 163 and the fourth aperture 164 may additionally or alternatively be provided at an angle a of a = 45° relative to the position of the second aperture 162. Thus, as can be seen from Figures 2A to 2D, the movable shutter can be provided with four different states: in the first state, when the evaporated material is supplied to the second oscillating crystal 120 via the second measurement exit When the inlet and outlet are blocked, the inlet and outlet of the evaporated material supplied through the first measurement outlet are supplied to the first oscillating crystal 110, as exemplarily shown in FIG. 2A; in the second state, the first measurement outlet and the second Measuring the outlet barrier, as exemplarily illustrated in FIG. 2B; in the third state, when the inlet and outlet of the evaporated material provided via the first measurement outlet to the first oscillating crystal 110 is blocked, via the second measurement outlet Provided to the inlet and outlet of the vaporized material of the second oscillating crystal 120, as exemplarily illustrated in FIG. 2C; and in the fourth state, the evaporated material provided to the second oscillating crystal 120 via the second measurement outlet The inlet and outlet and the inlet and outlet of the vaporized material provided via the first measurement outlet to the first oscillating crystal 110 are provided.

Thus, the movable shutter assembly of the measuring assembly as described herein is configured to block/open the vaporized material provided from the first measurement outlet to the first oscillating crystal, and to block/open from the second measurement outlet to The second oscillating crystal provides the evaporated material. As such, when the first measurement exit is blocked, the first oscillating crystal can be exemplified by cleaning by heating, and the deposition rate measurement can be performed simultaneously with the second oscillating crystal, and vice versa. Thus, an improved measurement component is provided to perform continuous deposition rate measurements. Furthermore, the measurement assembly according to the embodiments described herein provides the possibility of cleaning the oscillating crystals for measurement in situ.

As exemplarily illustrated in FIGS. 2A-2D, the first oscillating crystal 110 and the second oscillating crystal 120 may be fixed to the support member 150 according to several embodiments that may be combined with other embodiments described herein. In Figure 3). By way of example with reference to FIG. 2C, the support 150 can include at least one heating element 170 in accordance with some embodiments that can be combined with other embodiments described herein. The at least one heating element 170 is assembled and configured such that the material deposited on the shutter can be vaporized by the heat provided, particularly the material deposited on one side of the shutter facing the support can be vaporized by the heat provided. Therefore, the material deposited on the shutter can be cleaned. For example, as exemplarily shown in FIG. 2C, at least one heating element 170 can include a first heating element 171 and/or a second heating element 172 and/or a third heating element 173 and/or a fourth heating element 174. And/or fifth heating element 175 and/or sixth heating element 176. In particular, the heating element can be disposed on the support member 150 in a circular manner, for example, on a circle having a radius R, the circle having the radius R substantially corresponding to the at least one hole 160 being provided in the movable shutter 140 The radius R. According to an exemplary application, the heating elements are arranged equidistant from one another, for example with an angle of 45[deg.] between adjacent heating elements, as exemplarily illustrated in Figure 2C. Alternatively, as exemplarily shown in FIG. 2D, the at least one heating element 170 can be assembled into a ring segment element having a width corresponding to at least one of the openings of the at least one hole 160, as in FIG. 2D An example is shown. For example, a first loop segment heating element 177 and a second loop segment heating element 178 can be provided. Again, it will be understood that the at least one heating element 170 can have any suitable shape or fit.

By way of example with reference to FIG. 3, in accordance with several embodiments that can be combined with any of the other embodiments described herein, the measurement assembly can include a heater 114 that is configured to provide heat to the first oscillating crystal 110 and/or second. The crystal 120 is oscillated such that the material deposited on the first oscillating crystal 110 and/or the second oscillating crystal 120 can be evaporated. For example, the heater 114 can be disposed in the support 150, and the first oscillating crystal 110 and/or the second oscillating crystal 120 can be disposed in the support 150. The support 150 can include a measurement aperture 122. The measurement opening 122 can be assembled and configured such that evaporated material can be deposited on the first oscillating crystal 110 and/or the second oscillating crystal 120 to measure the deposition rate of the evaporated material. As exemplarily shown in FIG. 3, other heaters 115 may be additionally or selectively disposed in the movable shutter 140, for example, in the movable shutter described with reference to FIGS. 1A to 1C, or with reference to the 2A. In the movable cover shown in the 2D diagram. In particular, other heaters 115 disposed on the movable shutter 140 are assembled for providing heat to the movable shutter such that material deposited on the movable shutter can evaporate. In general, heater 114 and/or other heaters 115 are configured to provide a heating temperature that corresponds at least to the evaporation temperature of the material deposited on the oscillating crystal and/or deposited on the shutter. Thus, the oscillating crystal can be cleaned by heating as described herein. Furthermore, the shutter can also be cleaned by heating the shutter.

By way of example with reference to FIG. 3, the movable shutter 140 can include a thermal shield 116 in accordance with some embodiments that can be combined with other embodiments described herein. As exemplarily shown in FIG. 3, the thermal protection mask 116 may be disposed on one side of the movable shutter 140. This side of the movable shutter 140 faces the measurement outlet, for example, the first measurement outlet 151 or the second measurement outlet 152. In particular, the thermal protection mask 116 can be assembled to reflect the thermal energy provided by the evaporated material, which is provided through the measurement outlet. According to several embodiments, which may be combined with other embodiments described herein, the thermal shield 116 may be a sheet material, such as a metal sheet. Alternatively, the thermal protection mask 116 may comprise two or more sheets, such as sheet metal, spaced apart from each other by a gap of 0.1 mm or more. For example, the metal sheet may have a thickness of 0.1 mm to 3.0 mm. In particular, the thermal protection mask comprises a ferrous or non-ferrous material, for example selected from the group consisting of copper (Cu), aluminum (Al), copper alloys, aluminum alloys, brass, iron, titanium. At least one material of the group consisting of (Ti), ceramics, and other suitable materials.

According to several embodiments, which may be combined with any of the other embodiments described herein, other heaters 115 of the movable shutter 140 may be disposed on one side of the movable shutter 140. The side of the movable shutter 140 faces the oscillating crystal, for example, the first oscillating crystal 110 or the second oscillating crystal 120. Thus, by providing a heater as described herein, and the heater is exemplified as being disposed in a support or a shutter, the oscillating crystal of the measuring assembly as described herein can be evaporated and deposited by the heat provided by the heater. The material on the crystal is oscillated for in situ cleaning. This can be beneficial to the overall lifetime of the oscillating crystal and measurement accuracy can be achieved.

The measurement assembly 100 can include a thermal adder 132 in accordance with several embodiments that can be combined with other embodiments described herein. In particular, the heat exchanger can be disposed in the support, for example near or adjacent to the oscillating crystal and/or adjacent or adjacent to the heater 114. The heat exchanger 132 can be configured to exchange heat with the oscillating crystal and/or the support 150 and/or the heater 114. For example, the heat exchanger can include a tube through which a cooling fluid can be supplied. The cooling fluid can be a liquid or a gas. The liquid is exemplified by water, and the gas is exemplified by air. The heat exchanger may additionally or alternatively include one or more Peltier elements. Generally, the heat exchanger is applied during the measurement of the oscillating crystal and is turned off during the cleaning process of the heated oscillating crystal performed by the heater. Thus, by providing a measurement assembly having a heat exchanger 132, the negative effects of high temperature on the quality, accuracy, and stability of the deposition rate measurement can be reduced or even eliminated. In particular, after the measuring device has been cleaned by heating to evaporate the deposited material from the deposition rate measuring device, providing a measuring assembly having a heat exchanger can facilitate cooling the measuring device.

By way of example with reference to FIG. 3, in accordance with several embodiments that may be combined with other embodiments described herein, the measurement assembly 100 can include a temperature sensor 117 for measuring the temperature of the oscillating crystal and/or the support 150. By providing the measuring component 100 with the temperature sensor 117, information about the temperature of the measuring component can be obtained so that the critical temperature at which the oscillating crystal is easy to measure inaccurate can be detected. Therefore, in the case where the critical temperature of the oscillating crystal is detected by the temperature sensor, an appropriate reaction can be initiated, for example, by applying a heat exchanger for cooling.

According to several embodiments, which may be combined with other embodiments described herein, particularly the measurement assembly 100 for measuring deposition rate may include a temperature control system for controlling the temperature of the oscillating crystal and/or the temperature of the support. In particular, the temperature control system can include one or more of temperature sensor 117, heat exchanger 132, heater 114, and sensor controller 133. As exemplarily shown in FIG. 3, the sensor controller 133 can be coupled to the temperature sensor 117 for receiving data measured by the temperature sensor 117. Furthermore, the sensor controller 133 can be coupled to the heat exchanger 132 for controlling the temperature of the support 150 and/or the oscillating crystal. Further, the sensor controller 133 can be coupled to the heater 114 and/or other heaters 115 to, for example, control the heating temperature of the support 150 and/or the oscillating crystal during cleaning as described herein.

4A and 4B are side views of an evaporation source 200 in accordance with embodiments described herein. According to several embodiments, the evaporation source 200 includes an evaporation crucible 210 in which the evaporation crucible is assembled to evaporate the material, such as an organic material. Again, evaporation source 200 includes a distribution assembly. The distribution assembly is exemplified by a distribution tube 220 having one or more outlets 222. The one or more outlets 222 are provided along the length of the distribution assembly to provide evaporated material, as exemplarily shown in FIG. 4B. According to several embodiments, the distribution tube 220 is in fluid communication with the evaporation crucible 210, for example, in fluid communication with the evaporation crucible 210 via a steam conduit. A steam conduit can be placed at the lower end of the distribution tube. Moreover, the evaporation source 200 in accordance with the embodiments described herein includes the measurement assembly 100 in accordance with the embodiments described herein, as exemplified by reference to Figures 1A through 3.

As exemplarily shown in FIGS. 4A and 4B, according to several embodiments that may be combined with other embodiments described herein, the evaporation source 200 may include a controller 250 coupled to the measurement assembly 100 and the evaporation source 200. . As described herein, the controller 250 can provide the first control signal 251 to the evaporation source 200, and in particular, can provide the first control signal 251 to the evaporation crucible 210 for adjusting the deposition rate. In general, controller 250 is assembled to receive and analyze measurement data acquired by measurement component 100. Moreover, the controller 250 can provide the second control signal 252 to the deposition rate measuring component, for example, to control the position of the door of the deposition rate measuring component. For example, the position of the shutter can be controlled such that the first measurement outlet for providing the evaporated material to the first oscillating crystal can be blocked by the shutter and/or used to provide the evaporated material to the second oscillating crystal. The second measurement outlet can be blocked by a shutter. Therefore, one of the first oscillating crystal and the second oscillating crystal of the measuring assembly can be cleaned, and the other oscillating crystals can be used simultaneously for the deposition rate measurement.

As exemplarily shown in FIG. 4A, the distribution assembly can be an extended cube, such as distribution tube 220, according to several embodiments that can be combined with other embodiments described herein. Distribution tube 220 includes a heating element 215. The evaporation crucible 210 may be a reservoir of material evaporated by the crucible heating unit 225, and the material is exemplified by an organic material. For example, the crucible heating unit 225 can be disposed in the outer casing of the evaporation crucible 210. According to several embodiments, which can be combined with other embodiments described herein, the distribution assembly can provide a source of wiring, and in particular the distribution tube 220 can provide a source of wiring. For example, as exemplarily shown in FIG. 4B, the plurality of outlets 222 are, for example, nozzles that can be configured along at least one wire. According to a selected embodiment (not shown), an extended opening extending along the at least one wire, such as a slit, may be provided. According to some embodiments, which may be combined with other embodiments described herein, the wiring source may extend substantially vertically.

According to some embodiments, which may be combined with other embodiments described herein, the length of the distribution tube may correspond to the height of the substrate onto which the material will be deposited in the deposition apparatus. Alternatively, the length of the distribution tube can be, for example, at least 10% or even 20% longer than the height of the substrate, and the material will be deposited on the substrate. Thus, uniform deposition at the upper end of the substrate and/or at the lower end of the substrate can be provided. For example, the length of the distribution tube can be 1.3 m or more, for example 2.5 m or more.

According to several embodiments, which may be combined with other embodiments described herein, the evaporation crucible 210 may be disposed at the lower end of the distribution tube as exemplarily shown in FIG. 4A. The material can be evaporated in the evaporation crucible 210, and the material is exemplified by an organic material. The evaporated material can enter the distribution tube at the bottom of the distribution tube and can be oriented substantially laterally through the outlets 222 in the distribution tube 220 as an example of a substrate that is substantially perpendicular. Illustratively with reference to FIG. 4B, the measurement assembly 100 according to embodiments described herein can be disposed over the upper portion of the distribution tube 220, such as the upper end of the distribution tube 220.

By way of example with reference to FIG. 4B, the first measurement outlet 151 and the second measurement outlet 152 may be provided in a wall of a distribution assembly, such as the back of a distribution tube, according to several embodiments that may be combined with other embodiments described herein. In the wall of side 224A, especially the upper part of the wall of the back side 224A. Although not explicitly shown, it will be understood that the first measurement outlet 151 and the second measurement outlet 152 may be provided in the top wall 224C of the distribution assembly in accordance with several embodiments that may be combined with other embodiments described herein. , in particular, the horizontal top wall above the distribution component. As exemplarily shown by the arrows in FIG. 4B, the evaporated material may be provided from the inside of the distribution tube 220 to the measurement assembly 100 via the first measurement outlet 151 and/or the second measurement outlet 152. Accordingly, the first measurement outlet 151 and/or the second measurement outlet 152 are configured and oriented such that the evaporated material can be provided to the first oscillating crystal and/or the second oscillating crystal. For example, the measurement assembly 100 can be disposed on the back side 224A of the distribution assembly, particularly on the back side 224A of the upper end portion of the distribution assembly. The distribution component is exemplified by the distribution tube 220. Generally, the back side of the end portion of the distribution assembly is facing away from the deposition direction. According to some embodiments, the measurement assembly 100 can be secured to the back side 224A of the upper end portion of the distribution assembly, particularly the back side 224A of the upper end portion of the distribution tube 220.

According to several embodiments, which may be combined with other embodiments described herein, the first measurement outlet 151 and/or the second measurement outlet 152 may have openings from 0.5 mm to 4 mm. Again, the first measurement outlet 151 and/or the second measurement outlet 152 can include a nozzle. For example, the nozzle can include an adjustable opening to adjust the flow of evaporated material provided to the measurement assembly 100. In particular, the nozzle can be assembled to provide a measured flow rate selected from a range. This range is between a lower limit and an upper limit. The lower limit is 1/70 of the total flow provided by the evaporation source, particularly 1/60 of the total flow provided by the evaporation source, more particularly 1/50 of the total flow provided by the evaporation source. The upper limit is 1/40 of the total flow provided by the evaporation source, especially 1/30 of the total flow provided by the evaporation source, more particularly 1/25 of the total flow provided by the evaporation source. For example, the nozzle can be assembled to provide a measured flow of 1/54 of the total flow provided by the evaporation source.

Figure 5 depicts a perspective view of an evaporation source 200 in accordance with embodiments described herein. As exemplarily shown in Fig. 5, the distribution tube 220 can be designed in the shape of a triangle. As mentioned above, the shape of the triangle of the distribution tube 220 can be advantageous in situations where two or more distribution tubes are adjacent to one another. In particular, the triangular shape of the distribution tube 220 makes it feasible to have the outlets of adjacent distribution tubes as close to each other as possible. This allows for improved mixing of different materials from different distribution tubes, for example for co-evaporation of two, three or even different materials. Furthermore, the embodiment shown in FIG. 5 is generally illustrated to provide a first measurement outlet 151 and a second measurement outlet 152. The first measurement outlet 151 is for providing the first oscillating crystal of the evaporated material to the measurement assembly 100, and the second measurement outlet 152 is for providing the second oscillating crystal of the evaporated material to the measurement assembly 100. The first measurement outlet 151 and the second measurement outlet 152 are exemplified as being provided at the upper end of the distribution tube, as exemplarily described with reference to Figures 4A and 4B.

Illustratively with reference to Figure 5, the distribution tube 220 can include a wall, such as a sidewall 224B and a wall located on the back side 224A of the distribution tube. As exemplarily shown in FIG. 5, the first measurement outlet 151 and the second measurement outlet 152 may be provided in the wall of the back side 224A of the distribution tube 220. Furthermore, the side wall 224B and the wall on the back side 224A can be heated by the heating element 215. For example, the heating element 215 can be attached or attached to the wall of the distribution tube 220, as exemplarily shown in FIG. According to some embodiments, which may be combined with other embodiments described herein, the evaporation source 200 may include a mask 204. The mask 204 can reduce heat radiation toward the deposition area. Furthermore, the mask 204 can be cooled by the cooling element 216. For example, the cooling element 216 can be secured to the shroud 204 and can include a conduit for cooling the fluid.

FIG. 6 illustrates a top view of deposition apparatus 300 for providing material to substrate 333 in vacuum chamber 310 in accordance with embodiments described herein. According to several embodiments, which can be combined with other embodiments described herein, deposition apparatus 300 includes an evaporation source 200 as described herein. In particular, the evaporation source 200 can be disposed in the vacuum chamber 310 of the deposition apparatus 300, such as on a track. The track is exemplified by a linear guide 320 or an annular track. Track or linear guide 320 can be assembled for translational movement of evaporation source 200. Thus, a driver for translational motion can be provided in the vacuum chamber 310 to the orbital and/or linear guide 320 for the evaporation source 200. According to several embodiments, which may be combined with other embodiments described herein, the first valve 305 is exemplified as a gate valve that may be provided for vacuum sealing to an adjacent vacuum chamber (not shown in Figure 6). The first valve can be opened for transporting the substrate 333 or the mask 332 into the vacuum chamber 310 or the transfer substrate 333 or the mask 332 exiting the vacuum chamber 310.

According to some embodiments, which may be combined with other embodiments described herein, other vacuum chambers may be disposed adjacent to the vacuum chamber 310, such as the maintenance vacuum chamber 311, as exemplified in FIG. Painted. Therefore, the vacuum chamber 310 and the maintenance vacuum chamber 311 can be connected by the second valve 307. The second valve 307 can be configured to open and close a vacuum seal between the vacuum chamber 310 and the maintenance vacuum chamber 311. When the second valve 307 is in the open state, the evaporation source 200 can be transferred to the maintenance vacuum chamber 311. Thereafter, the second valve 307 can be closed to provide a vacuum seal between the vacuum chamber 310 and the maintenance vacuum chamber 311. If the second valve 307 is closed, the maintenance vacuum chamber 311 can be vented and opened for maintenance of the evaporation source 200 without damaging the vacuum in the vacuum chamber 310.

As exemplarily shown in FIG. 6, the two substrates can be supported on individual transport tracks in the vacuum chamber 310. Furthermore, two tracks can be provided to provide a mask thereon. Thus, during coating, the substrate 333 can be masked by individual masks. For example, a mask may be disposed in the mask frame 331 to support the mask 332 in a predetermined position.

According to some embodiments, which may be combined with other embodiments described herein, the substrate 333 may be supported by a substrate support 326 that may be coupled to the alignment unit 312. The alignment unit 312 can adjust the position of the substrate 333 relative to the mask 332. As exemplarily illustrated in FIG. 6, the substrate support 326 can be coupled to the alignment unit 312. Thus, the substrate can be moved relative to the mask 332 to provide proper alignment between the substrate and the mask during material deposition, which can facilitate high quality display fabrication. The mask 332 and/or the mask frame 331 supporting the mask 332 are selectively or additionally connected to the alignment unit 312. Thus, the mask 332 can be positioned relative to the substrate 333 or both the mask 332 and the substrate 333 can be positioned relative to each other.

As shown in FIG. 6, the linear guide 320 can provide the direction of the translational motion of the evaporation source 200. A mask 332 may be provided on both sides of the evaporation source 200. The mask may extend substantially parallel to the direction of the translational motion. Furthermore, the substrate on the opposite side of the evaporation source 200 can also extend substantially parallel to the direction of translational motion. As exemplarily shown in FIG. 6, the evaporation source 200 disposed in the vacuum chamber 310 of the deposition apparatus 300 may include a support 202. The support 202 can be assembled for translational movement along the linear guide 320. For example, the support member 202 can support two evaporation crucibles and two distribution tubes 220 disposed above the individual evaporation crucibles. According to some embodiments, the support member 202 can support three evaporation crucibles and three distribution tubes 220 disposed above the individual evaporation crucibles. Thus, the steam generated in the evaporation crucible can move up and out of the one or more outlets of the distribution tube. The distribution tube of the evaporation source can have a substantially triangular cross section. The triangular shape of the distribution tube is such that the outlets of the adjacent distribution tubes for depositing the evaporated material on the substrate are as close as possible to each other, and the outlet is exemplified by a nozzle. This allows for improved mixing of different materials from different distribution tubes, for example for co-evaporation of two, three or even different materials.

Thus, embodiments of deposition apparatus as described herein are provided for improved display manufacturing, particularly OLED manufacturing.

Exemplary embodiments of the method for measuring the deposition rate of evaporated materials are illustrated in the block diagrams of Figures 7A and 7B. According to several embodiments, which can be combined with any of the other embodiments described herein, the method 400 for measuring the deposition rate of evaporated material includes evaporating 410 material, the material being exemplified by an organic material; supplying the first portion of the 420 evaporated material And refracting a second portion of the material to the first oscillating crystal and/or the second oscillating crystal; and measuring 440 the deposition rate by using the measuring assembly 100 according to any of the embodiments described herein.

Thus, by applying a method for measuring the deposition rate of evaporated material according to the embodiments described herein, the deposition rate can be measured very accurately. In particular, by applying a method for measuring the deposition rate of an evaporated material as described herein, the thermal effect on the oscillating crystal, which may reduce the measurement accuracy, may be reduced. In particular, the negative effects of high temperatures on the quality, accuracy and stability of the deposition rate can be reduced or even eliminated. Furthermore, the method for measuring the deposition rate measurement of the evaporated material according to several embodiments described herein is provided for redundant measurement of the deposition rate, and the quality and accuracy of the measurement result can be further improved. Further, the method for measuring the deposition rate of the evaporated material as described herein provides the possibility of cleaning one of the first oscillating crystal and the second oscillating crystal, and other oscillating crystals can be used for the deposition rate measurement.

According to several embodiments, which can be combined with other embodiments described herein, evaporating 410 material includes using an evaporation crucible 210 as described herein. Further, supplying the first portion of the 420 evaporated material to the substrate can include using the evaporation source 200 in accordance with embodiments described herein. According to several embodiments, which can be combined with other embodiments described herein, turning the second portion of the evaporated material to the first oscillating crystal and/or the second oscillating crystal can comprise using the first measurement as described herein. The outlet 151 and/or the second measurement outlet 152. In particular, turning to the second portion of the vaporized material 430 to the first measurement outlet 151 and/or the second measurement outlet 152 can include providing a measured flow rate selected from a range. This range is between a lower limit and an upper limit. The lower limit is 1/70 of the total flow provided by the evaporation source, particularly 1/60 of the total flow provided by the evaporation source, more particularly 1/50 of the total flow provided by the evaporation source. The upper limit is 1/40 of the total flow provided by the evaporation source, especially 1/30 of the total flow provided by the evaporation source, more particularly 1/25 of the total flow provided by the evaporation source. For example, turning the second portion of the vaporized material 430 to the first measurement outlet 151 and/or the second measurement outlet 152 can include providing a measured flow rate of 1/54 of the total flow rate provided by the evaporation source.

According to several embodiments, which can be combined with other embodiments described herein, measuring 440 deposition rate can include exchanging heat with the measurement assembly 100 by a temperature control system as described herein, particularly with the first oscillating crystal and/or The second oscillating crystal exchanges heat. Thus, by exchanging heat with the measuring assembly as described herein, particularly with the first oscillating crystal and/or the second oscillating crystal, the negative effects of high temperature on the quality, accuracy and stability of the deposition rate measurement can be reduced. Or even eliminate it. In particular, the thermal fluctuations of the first oscillating crystal and/or the second oscillating crystal can be reduced or even eliminated by exchanging heat with the measuring assembly as described herein, thereby facilitating the accuracy of the deposition rate measurement. . Therefore, the application of the method for measuring the deposition rate as described herein can facilitate high quality display manufacturing, particularly OLED manufacturing.

By way of example with reference to Figure 7B, the method 400 for measuring the deposition rate of evaporated material may further include when the material has evaporated to the entrance and exit of the first oscillating crystal, according to several embodiments that may be combined with other embodiments described herein. The 450 first oscillating crystal is cleaned 450 by providing heat to the first oscillating crystal when blocked by a movable shutter according to embodiments described herein. Accordingly, the method 400 for measuring the deposition rate of the evaporated material may further include providing heat to the inlet and outlet of the second oscillating crystal when the inlet and outlet of the second oscillating crystal are blocked by the movable shutter according to the embodiments described herein. The second oscillating crystal cleans the 450 second oscillating crystal.

In view of the above, embodiments of the measuring assembly, the embodiment of the evaporation apparatus, the embodiment of the deposition apparatus, and the method for measuring the deposition rate, as described herein for measuring the deposition rate of the evaporated material, provide redundancy. The possibility of measuring the deposition rate and the possibility of cleaning one of the first oscillating crystal and the second oscillating crystal when other oscillating crystal systems are used for the deposition rate measurement. Thus, improved deposition rate measurements for high quality display manufacturing can provide, for example, improved deposition rate measurements for high quality OLED fabrication. In conclusion, the present invention has been disclosed in the above embodiments, but it is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

(The symbol description below is directly filled in with the modified version)

100‧‧‧Measurement components

110‧‧‧First oscillating crystal

114‧‧‧heater

115‧‧‧Other heaters

116‧‧‧ Thermal protective coverings

117‧‧‧temperature sensor

120‧‧‧Second oscillating crystal

122‧‧‧Measurement opening

132‧‧‧Hot adder

133‧‧‧Sensor Controller

140‧‧‧ movable cover

150‧‧‧Support

151‧‧‧ Dijon measurement export

152‧‧‧Second measurement exit

160‧‧‧ hole

161‧‧‧ first hole

162‧‧‧ second hole

163‧‧‧ third hole

164‧‧‧ fourth hole

170, 215‧‧‧ heating elements

171‧‧‧First heating element

172‧‧‧Second heating element

173‧‧‧ Third heating element

174‧‧‧fourth heating element

175‧‧‧ fifth heating element

176‧‧‧ sixth heating element

177‧‧‧First ring section heating element

178‧‧‧Second ring section heating element

200‧‧‧ evaporation source

202‧‧‧Support

204‧‧‧Mask

210‧‧‧Evaporation crucible

216‧‧‧ cooling element

220‧‧‧Distribution tube

222‧‧‧Export

224A‧‧‧ Back side

224B‧‧‧ side wall

224C‧‧‧Top wall

225‧‧‧坩heater unit

250‧‧‧ Controller

251‧‧‧First control signal

252‧‧‧Second control signal

300‧‧‧Deposition equipment

305‧‧‧first valve

307‧‧‧Second valve

310‧‧‧vacuum chamber

311‧‧‧Maintenance vacuum chamber

312‧‧‧Alignment unit

320‧‧‧Linear Guides

326‧‧‧Substrate support

331‧‧‧mask frame

332‧‧‧ mask

333‧‧‧Substrate

400‧‧‧ method

410, 420, 430, 440, 450‧‧‧ process steps

R‧‧‧ Radius

‧‧‧‧ angle

In order to make the above-described features of the present disclosure more detailed, a more detailed description of the present disclosure may be made by reference to the several embodiments. The accompanying drawings are in connection with the several embodiments of the disclosure and are described below. 1A to 1C are schematic views showing measurement components for measuring the deposition rate of evaporated materials in different states according to embodiments described herein; FIGS. 2A to 2D are diagrams showing other embodiments according to the embodiments herein. A schematic diagram of a measurement component for measuring the deposition rate of an evaporated material in different states; FIG. 3 is a schematic diagram of a portion of a measurement component according to other embodiments described herein; FIGS. 4A and 4B are diagrams Side view of an evaporation source according to embodiments described herein; FIG. 5 is a perspective view of an evaporation source according to embodiments described herein; and FIG. 6 is a view showing a vacuum according to embodiments described herein A top view of a deposition apparatus for supplying material on a substrate in a chamber; and FIGS. 7A and 7B are block diagrams illustrating an embodiment of a method for measuring a deposition rate of an evaporated material as described herein.

Claims (20)

A measuring assembly (100) for measuring a deposition rate of an evaporated material, comprising: a first oscillating crystal (110) for measuring the deposition rate; and a second oscillating crystal (120) for measuring the a deposition rate; and a movable shutter (140), wherein the movable shutter (140) is configured to block the evaporated material supplied from a first measurement outlet (151), the first measurement outlet Orienting to provide evaporated material to the first oscillating crystal (110); and wherein the movable shutter (140) is assembled for blocking the evaporated material provided from a second measurement outlet (152), The second measurement outlet (152) is directed to provide the vaporized material to the second oscillating crystal (120). The measuring assembly (100) of claim 1, wherein the movable shutter is a rotatable element having at least one hole (160), wherein the at least one hole (160) is assembled for use in When the rotatable element is in a first state, an ingress and egress of the evaporated material from the first measurement outlet (151) to the first oscillating crystal (110) is provided. The measuring assembly (100) of claim 2, wherein the rotatable element is a rotatable disc. The measuring assembly (100) of claim 2, wherein the at least one hole (160) is assembled for providing the second measuring outlet when the rotatable element is in a second state (152) entering and exiting the evaporated material to the second oscillating crystal (120). The measuring assembly (100) of claim 3, wherein the at least one hole (160) is assembled for providing the second measuring outlet when the rotatable element is in a second state (152) entering and exiting the evaporated material to the second oscillating crystal (120). The measuring component (100) of claim 2, wherein the at least one hole (160) comprises a first hole (161) and a second hole (162), the first hole and the second hole They are completely configured relative to each other. The measuring component (100) of claim 4, wherein the at least one hole (160) comprises a first hole (161) and a second hole (162), the first hole and the second hole They are completely configured relative to each other. The measuring assembly (100) of claim 5, wherein the at least one hole (160) comprises a first hole (161) and a second hole (162), the first hole and the second hole They are completely configured relative to each other. The measuring component (100) of claim 6, wherein the at least one hole (160) further comprises a third hole (163) and a fourth hole (164), the third hole and the fourth The hole system is disposed on a plurality of opposite sides of the first hole (161) and/or the second hole (162), wherein the third hole (163) and the fourth hole (164) are disposed in a radial direction The position, the radial position substantially corresponds to a radial position of one of the first holes (161) and/or a radial position of the second hole (162). The measuring assembly (100) of any one of claims 1 to 9 further comprising a heater (114) for assembling heat to the first oscillating crystal (110) and/or The second oscillating crystal (120) causes the material deposited on the first oscillating crystal (110) and/or the second oscillating crystal (120) to evaporate. The measuring assembly (100) according to any one of claims 1 to 9, further comprising a further heater (115) disposed in the movable shutter (140), the other heater assembly For providing heat to the movable shutter, such that the material deposited on the movable shutter can evaporate. The measuring assembly (100) of claim 10, further comprising a further heater (115) disposed in the movable shutter (140), the other heater being assembled for providing heat to The movable shutter allows the material deposited on the movable shutter to evaporate. The measuring assembly (100) of claim 10, wherein the heater is disposed in a first support member for the first oscillating crystal (110) and the second oscillating crystal (120) In a second support member. An evaporation source (200) for evaporation of material, the evaporation source comprising: an evaporation crucible (210), wherein the evaporation crucible is assembled to evaporate a material; a distribution assembly having one or more outlets (222) And a measuring assembly according to any one of the preceding claims, wherein the measuring component is provided in a direction of deposition, wherein the distribution component is in fluid communication with the evaporation crucible; and the measuring assembly of any one of claims 1 to 13. The evaporation source (200) according to claim 14 further includes a first measurement outlet (151) and a second measurement outlet (152), wherein the first measurement outlet is used to provide the evaporated material to the The first oscillating crystal (110) of the measuring assembly (100) is configured to provide the evaporated material to the second oscillating crystal (120) of the measuring component (100). The evaporation source (200) of claim 15, wherein the first measurement outlet (151) and/or the second measurement outlet (152) are assembled to provide a measurement flow rate, the measurement flow rate It is 1/70 of the total flow rate supplied from the evaporation source to 1/25 of the total flow rate provided by the evaporation source. The evaporation source (200) of claim 16, wherein the first measurement outlet (151) and the second measurement outlet (152) are provided on a back side of one of the end portions of the distribution component, wherein The measuring component (100) is disposed on the back side of the end portion of the distribution component, and wherein the back side of the end portion of the distribution component is opposite to the deposition direction. A deposition apparatus (300) for providing material to a substrate at a deposition rate in a vacuum chamber (310), the deposition apparatus comprising at least one of any one of claims 14 to 17 Evaporation source (200). A method (400) for measuring a deposition rate of an evaporated material, comprising: evaporating (410) a material; supplying (420) a first portion of the evaporated material to a substrate; turning to the evaporated material a second portion to a first oscillating crystal and/or a second oscillating crystal; and measuring (440) the deposition by using the measuring assembly according to any one of claims 1 to 13 rate. The method (400) of claim 19, further comprising: when the movable shutter blocks the evaporated material to one of the first oscillating crystal and/or the second oscillating crystal The first oscillating crystal and/or the second oscillating crystal are supplied to the first oscillating crystal and/or the second oscillating crystal.