TWI625876B - Linear distribution pipe, a material deposition arrangement and a vacuum deposition apparatus using the same, and a method therefor - Google Patents

Abstract

A linear distribution tube (106) for depositing evaporated material onto a substrate (121) in a vacuum chamber (110). The linear distribution tube (106) includes a distribution tube housing (116) extending along a first direction (136), wherein the first direction provides a linear extension of the linear distribution tube, and wherein the distribution tube housing includes a first Housing material. The linear distribution tube (106) further includes a plurality of openings in the distribution tube housing (116), wherein the openings are distributed along a linear extension of the linear distribution tube. Further, the linear distribution tube includes a plurality of nozzles (712) for linearly distributing the tubes (106), wherein the nozzles (712) are assembled for guiding the evaporated material in the vacuum chamber (110). The nozzles (712) include a first nozzle material having a thermal conductivity greater than the first housing material and/or greater than 21 W/mk.

Description

Linear distribution tube and material deposition configuration and vacuum deposition apparatus using the same Method for material deposition configuration

Several embodiments are directed to a material deposition configuration, a deposition apparatus having a material deposition configuration, and a method for providing a distribution tube for use in a material deposition configuration. A number of embodiments are particularly directed to a material deposition configuration for a vacuum deposition chamber, a vacuum deposition apparatus having a material deposition configuration, and a material deposition for providing a material in a vacuum deposition chamber. A method of distributing a tube, in particular a material source, a deposition apparatus, and a method for an evaporation process.

The organic vaporizer is a device for producing organic light-emitting diodes (OLEDs). OLEDs are a special form of light-emitting diodes in which the light-emitting layer comprises a film of a specific organic compound. OLEDs are used in the manufacture of television screens, computer screens, cell phones, other handheld devices, etc. for displaying information. OLEDs can also be used as a general space photo Bright. OLED displays may have a larger range of colors, brightness, and viewing angles than conventional liquid crystal displays (LCDs) because OLED pixels emit light directly without the use of backlights. Therefore, the energy loss of the OLED display is much less than the energy loss of the conventional liquid crystal display. Furthermore, OLEDs can be fabricated on flexible substrates to create more applications. A typical OLED display example can include a plurality of layers of organic material between two electrodes, all of which are deposited on a substrate to form a matrix display panel having individual energized pixels. The OLED is typically placed between two glass panels, and the edges of the glass panel are sealed to encapsulate the OLED therein.

Manufacturing such display devices faces many challenges. OLED displays or OLED lighting applications include stacks formed from a number of organic materials, such as evaporating in a vacuum. The organic materials are deposited in a continuous manner via shadow masks. In order to manufacture an OLED stack with high efficiency, it is desirable to co-deposition or co-evaporate two or more materials into a mixed/doped layer, two or more materials being exemplified as the main body ( Host) and dopant. Furthermore, many processing conditions for evaporating very sensitive organic materials must be considered.

In order to deposit material on the substrate, the material is heated until the material evaporates. Further, for example, to maintain the vaporized material at a controlled temperature or to prevent condensation of the evaporated material in the tube, the tube guiding the material to the substrate can be heated. A heating element for the tube can be provided to surround the tube, and in some systems, the heated device of the evaporator is further provided with a heating mask to reduce heat loss. However, due to the complex geometry of such tubes, the heating element and the heating mask cannot ensure the distribution tube Uniform temperature.

In view of the foregoing, it is an object of the embodiments described herein to provide a material deposition arrangement, a deposition apparatus having a material deposition configuration, a linear distribution tube, and a distribution tube for providing a material deposition configuration. The method to overcome at least some of the problems in this field.

In view of the above, the material deposition according to the scope of the independent patent application Means, deposition equipment, nozzles for distribution tubes, and methods for providing distribution tubes for material deposition configurations are provided. Other aspects, advantages, and features of the several embodiments are apparent from the scope of the appended claims, the description and the accompanying drawings.

According to one embodiment, a linear distribution tube system for depositing evaporated material onto a substrate in a vacuum chamber is provided. The linear distribution tube includes a distribution tube housing extending along a first direction, wherein the first direction provides a linear extension of the linear distribution tube. The distribution tube housing includes a first housing material. The linear distribution tube further includes a plurality of openings in the distribution tube housing, wherein the openings are distributed along a linear extension of the linear distribution tube. Further, the linear distribution tube includes a plurality of nozzles for linearly distributing the tubes, wherein the nozzles are assembled for guiding the evaporated material in the vacuum chamber. The nozzles include a first nozzle material having a thermal conductivity greater than the first housing material and/or greater than 21 W/mk.

In accordance with another embodiment, a material deposition arrangement for depositing a material on a substrate in a vacuum chamber is provided. The material deposition configuration includes an evaporation source for providing evaporation and deposition of the material on the substrate; a distribution tube, flow The body circulates in an evaporation source, and the evaporation source supplies the evaporated material to the distribution tube. The material deposition configuration further includes a nozzle for directing the vaporized material in the vacuum chamber. The nozzle includes a first nozzle material having a thermal conductivity greater than 21 W/mK.

According to other embodiments, a vacuum deposition apparatus is provided. The vacuum deposition apparatus includes a vacuum chamber; and a material deposition configuration in accordance with one of the embodiments described herein. The evaporation source is an evaporation crucible for one of several organic materials. The distribution tube of the material deposition configuration is connected to the evaporation crucible, and the distribution tube is used to guide the evaporated material from the evaporation crucible into the vacuum chamber. The nozzle includes a second nozzle material that is chemically inert to the vaporized organic material. Further, the nozzles of the material deposition arrangement are arranged to direct the evaporated material toward one of the substrates in the vacuum chamber.

In accordance with other embodiments, a method for providing a material deposition configuration for a vacuum deposition apparatus is provided. The method includes providing an evaporation source for vaporizing a material to be deposited on a substrate; and fluidly connecting a distribution tube and a nozzle to the evaporation source to provide fluid communication between the evaporation source and the distribution tube and the nozzle. The nozzle includes a first nozzle material having a heat transfer value greater than 21 W/mK.

Several embodiments are directed to apparatus for performing the disclosed methods, and apparatus includes apparatus components for performing the various described method features. Such method features may be performed by hardware components, by a computer suitable for software, or by any combination of the two, or by any other means. Moreover, several embodiments are also directed to methods of operating the described devices. It includes method features for performing each function of the device. In order to better understand the above and other aspects of the present invention, the preferred embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

100‧‧‧Material deposition configuration

102‧‧‧Support

104‧‧‧Evaporation crucible

106‧‧‧Distribution tube

107‧‧‧Opening

108‧‧‧Extended wall

109‧‧‧ wall

110‧‧‧vacuum chamber

112‧‧‧Alignment unit

116‧‧‧Distribution tube shell

121‧‧‧Substrate

126‧‧‧Substrate support

131‧‧‧mask frame

132‧‧‧ mask

136‧‧‧First direction

200, 712‧‧‧ nozzle

201‧‧‧Guide section

202‧‧‧Connected section

203‧‧‧ channel

205, 207‧‧‧ valve

206‧‧‧First nozzle material

208‧‧‧second nozzle material

210‧‧‧Maintenance vacuum chamber

300‧‧‧Deposition equipment

320‧‧‧Linear Guides

400‧‧‧ method

410, 420‧‧‧ squares

703‧‧‧Flange unit

710‧‧‧Internal hollow space

715‧‧‧heating unit

717‧‧‧heating cover

722‧‧‧ bolt

725‧‧‧External heating unit

726‧‧‧Central heating element

727‧‧‧ hood

732‧‧‧ steam conduit

In order to be able to understand the above-described features of the embodiments described herein in detail, the detailed description of The accompanying drawings are directed to a number of embodiments and are described below: Figures 1a through 1c illustrate schematic views of material deposition configurations in accordance with embodiments described herein; Figures 2a through 2d illustrate A schematic view of a nozzle for a distribution tube of an embodiment; FIGS. 3a and 3b are schematic and cross-sectional views of a distribution tube for a material deposition configuration according to embodiments described herein; FIG. 4 is a diagram A schematic diagram of a deposition apparatus having a material deposition configuration of the embodiments; and FIG. 5 is a flow chart of a method for providing a distribution tube for a material deposition configuration in accordance with embodiments described herein.

The detailed description is to be considered in various embodiments, and one or more examples of the embodiments are illustrated in the drawings. In the description of the following figures, the same reference numerals are intended to refer to the same elements. In general, only the differences between the individual embodiments are described. The examples are provided by way of illustration and are not meant as a limitation. Furthermore, the features illustrated or described as part of one embodiment can be used in other embodiments or in combination with other embodiments to achieve further embodiments. This means that the description includes such adjustments and changes.

As used herein, the name "fluid communication (fluid "Communication" is understood to mean that two elements in fluid communication can exchange fluid via a connection to allow fluid to flow between the two elements. In one example, such elements that are in fluid communication can include a hollow structure through which fluid can flow. According to some embodiments, at least one of such elements that are in fluid communication may be a tube-like element.

Furthermore, in the following description, a source of material is understood to provide a source that will be deposited on a substrate. In particular, the source of material can be assembled for providing material to be deposited on a substrate in a vacuum chamber, such as a vacuum deposition chamber or apparatus. According to some embodiments, the source of material may provide a material to be deposited on the substrate by assembling to evaporate the material to be deposited. For example, the source of material may comprise an evaporation source, such as an evaporator or a crucible, the evaporation source evaporating the material deposited on the substrate, and in particular releasing the evaporated material in one direction, the direction being toward the substrate or Enter the distribution tube of the material source. In some embodiments, the evaporator may be in fluid communication with the distribution tube, for example to distribute the vaporized material.

According to some embodiments described herein, a distribution tube can be understood as a tube for guiding and distributing one of the evaporated materials. In particular, the distribution tube can direct the evaporated material from the evaporator to the outlet or opening in the distribution tube. A linear distribution tube can be understood as a tube extending first, in particular in the longitudinal direction. In some embodiments, the linear distribution tube comprises a tube having a cylindrical shape, and wherein the cylinder can have a circular bottom shape or any other suitable bottom shape.

A nozzle as referred to herein is understood to mean a device for guiding a fluid, in particular for controlling the direction or characteristics of a fluid (for example, from a nozzle). Flow rate, velocity, shape, and/or pressure of the fluid). According to some embodiments described herein, the nozzle may be one of means for directing or directing steam, such as steam of evaporated material to be deposited on the substrate. The nozzle may have an inlet for receiving a fluid, an opening for guiding fluid through the nozzle (for example, a bore or a passage), and an outlet for releasing the fluid. In general, the opening or passage of the nozzle may include a defined geometry for the fluid flowing through the nozzle to achieve a defined direction or characteristic. According to some implementations, the nozzle can be part of a distribution tube or can be connected to a distribution tube that provides evaporated material and can receive evaporated material from the distribution tube.

1a through 1c illustrate schematic views of a material deposition configuration 100 in accordance with embodiments described herein. The material source may include a distribution tube 106 and an evaporation source or crucible 104 as an evaporator, as shown in Figure 1a. The distribution tube 106 can be in fluid communication with the crucible for distributing the evaporated material, which is provided by the evaporation crucible 104. The distribution tube can for example be an elongated cube with a heating unit 715. The evaporation crucible can be a reservoir for utilizing the organic material to be evaporated by the external heating unit 725. According to an exemplary embodiment that can be combined with other embodiments described herein, the distribution tube 106 provides a source of wiring. Additional details of the distribution tube and crucible will be described in more detail below. According to some embodiments described herein, the material deposition configuration 100 further includes a plurality of nozzles for releasing evaporated material toward the substrate, such as nozzles arranged along at least one of the wires.

According to embodiments described herein, a linear distribution conduit for depositing evaporated material onto a substrate in a vacuum chamber is provided. The linear distribution tube includes a distribution tube housing extending along a first direction, wherein the first direction provides a linear extension of the linear distribution tube. Generally, the distribution tube housing includes a first housing material. Linear distribution tube A plurality of apertures are included, the apertures being located in the distribution tube housing, wherein the apertures are distributed along a linear extension of the linear distribution tube. According to embodiments described herein, the linear distribution tube further includes a plurality of nozzles for linearly distributing the tubes. The nozzles are assembled for guiding the vaporized material in the vacuum chamber, and the nozzles comprise a first nozzle material having a heat transfer greater than the first shell material and/or greater than 21 W/mK rate.

In one example of a distribution tube, the nozzle comprises at least one of copper (Cu), tantalum (Ta), niobium (Nb), diamond-like coating (DLC), and graphite. According to some embodiments, the nozzle comprises a material that is chemically inert to the evaporated organic material. In some embodiments, a material that is chemically inert to the evaporated material can be represented as a second nozzle material. In particular, during the evaporation process, the surface of the nozzle in contact with the evaporated organic material may be coated with a material that is chemically inert to the evaporated organic material, particularly having a thermal conductivity value greater than 21 W/mK, and The surface of the nozzle where the evaporated organic material contacts is, for example, the inside of the nozzle opening or the passage. In one example, the nozzle includes copper and is provided with a coating of material on the inside of the nozzle opening or channel, such as tantalum (Ta), niobium (Nb), titanium (Ti), diamond-like coating ( DLC), stainless steel, quartz glass or graphite.

In known systems, the distribution tube is heated such that the evaporated material is maintained at a fixed and defined temperature. However, the nozzle is the interface between the distribution tube housing and the deposition chamber, and the nozzle system is subject to temperature differences, particularly since the nozzle is not heated or may not be completely covered by the heater. The nozzle can be viewed as providing a cooling in the flow path of the vaporized material. The cooling provided by the nozzle may adversely affect the evaporated material Uniform and the quality of the coated substrate.

According to some embodiments described herein, a nozzle comprising a thermal conductivity higher than the thermal conductivity of the distribution tube housing or higher than 21 W/mK can compensate for heat loss at least in regions where the nozzle is not actively heated. The improved thermal conductivity of the nozzle helps to adjust the temperature of the nozzle to the respective temperature state in the evaporation process. For example, the temperature response of a nozzle according to embodiments described herein may be faster than a change in the temperature state of the evaporation process. In one example, the nozzle can be heated to a temperature by actively heating the distribution tube to help maintain the evaporation temperature of the evaporated material, and the nozzle is attached to the distribution tube or is part of the distribution tube. By increasing the thermal conductivity, the temperature of the distribution tube is easier and faster to guide and is applied to the nozzle. In another example, where it is desired to avoid overheating of the evaporated material, if the temperature input from the distribution tube to the nozzle is terminated, the temperature of the nozzle will decrease more rapidly. The nozzle can be cooled and ensure a suitable temperature for the material that has evaporated.

Figures 2a through 2d illustrate several embodiments of nozzles in accordance with embodiments described herein. According to embodiments described herein, the nozzle can include a guide portion that directs the evaporated material to the substrate to be coated. The guiding portion can be formed, for example, and designed such that the vapor plume released from the nozzle forms a defined shape and strength. Figures 2a through 2d illustrate schematic views of a nozzle 200 in accordance with embodiments described herein. The nozzle 200 includes a guiding portion 201 and a connecting portion 202 for connecting the nozzle to the distribution tube, for example, the distribution tube described with respect to Figures 1a to 1c. The nozzle 200 includes an opening 203 (or channel, or bore) for directing vaporized material through the nozzle. According to some embodiments, the opening of the nozzle (especially the channel The inner side can be expressed as the guiding portion of the nozzle.

2a is a schematic view of a nozzle including a first nozzle material 206 and a second nozzle material 208. For example, the first nozzle material 206 can be a material having a thermal conductivity value greater than 21 W/mK, such as copper. In some embodiments, the second nozzle material 208 can be provided inside the opening or channel 203 and can be chemically inert to the vaporized organic material. For example, the second nozzle material can be selected from the group consisting of tantalum (Ta), niobium (Nb), titanium (Ti), diamond-like coating (DLC), stainless steel, quartz glass, and graphite. As seen in the embodiment shown in Figure 2a, the second nozzle material 208 can be provided as a thin coating on the inside of the channel 203.

2b is a schematic diagram showing an embodiment of a nozzle having a first nozzle material 206 and a second nozzle material 208. The example of the nozzle illustrated in Figure 2b is comprised of a first portion and a second portion, the first portion being made of a first nozzle material 206 having a heat transfer value of, for example, greater than 21 W/mK, the second portion being The second nozzle material 208 is formed and the second nozzle material 208 can be inert to the vaporized organic material. In one example, the first and second nozzle materials can be selected as described with respect to Figure 2a. As can be seen in Figure 2b, the second nozzle material 208 is part of the nozzle and in particular not just the coating on the inner channel side.

According to some embodiments, the thickness of the second nozzle material may be representative in the range of some nanometers to several micrometers. In one example, the thickness of the second nozzle material in the nozzle opening can be representatively between about 10 nm and about 50 [mu]m, more typically between about 100 nm and about 50 [mu]m, and even more representatively between about 500 nm and about Between 50μm. In one example, the second nozzle material can have a thickness of about 10 [mu]m.

2c is a schematic view showing an embodiment of the nozzle 200, wherein the nozzle 200 is made of a first nozzle material having a thermal conductivity greater than the thermal conductivity of the distribution tube or a thermal conductivity higher than 21 W/mK, The nozzle can be connected to the distribution tube. In some embodiments, the first nozzle material 206 is inert to the vaporized organic material. In one example, the first nozzle material can be selected from the group consisting of tantalum (Ta), niobium (Nb), titanium (Ti), diamond-like coating (DLC), or graphite.

Figure 2d is a schematic illustration of a nozzle as shown in Figure 2a in accordance with embodiments described herein. A second nozzle material 208 is visible in the opening 203, while the outer side of the nozzle 200 exhibits a first nozzle material 206.

According to some embodiments described herein, the openings or channels of the nozzle may have a size ranging from about 1 mm to about 10 mm, more typically from about 1 mm to about 6 mm, and even more representatively from 2 mm to about 5 mm. The evaporated material is passed through an opening or passage of the nozzle during the evaporation process to reach the substrate to be coated. According to some embodiments, the size of the channel or opening may mean the smallest dimension of the section, for example the diameter of the channel or opening. In one embodiment, the size of the opening or passage is measured at the outlet of the nozzle. According to some embodiments described herein, the openings or channels may be fabricated in tolerance region H7, for example, to have a tolerance of between about 10 [mu]m and 18 [mu]m.

According to some embodiments described herein, the nozzle for the material deposition configuration may include threads for repeatedly connecting the nozzle to the distribution tube and uncoupling the nozzle to the distribution tube, the material deposition configuration for deposition in the vacuum deposition chamber The material is on the substrate. In some embodiments, a nozzle having a thread for attachment to a distribution tube can have There are internal threads and/or external threads for the ability to repeatedly connect the nozzles to the distribution tube, in particular without the need to damage the distribution tube or nozzle. For example, a first nozzle having a defined characteristic can be coupled to a distribution tube for the first process. After the first process is completed, the first nozzle can be disconnected and the second nozzle can be connected to the distribution tube for the second process. If the first process is to be performed again, the second nozzle can be disconnected from the distribution tube and the first nozzle can be reconnected to the distribution tube for performing the first process. According to some embodiments, the distribution tube may also include threads for the exchangeable connection of the nozzle to the distribution tube, such as by fitting the threads of the nozzle.

According to some embodiments, which may be combined with other embodiments described herein, the nozzles referred to herein may be designed to form a plume having a contour similar to the cos ⁿ shape, wherein n is particularly greater than four. In one example, the nozzle system is designed to form a plume having a contour similar to a cos ⁶ shape. A nozzle that achieves a vaporized material of the cos ⁶ form plume can be useful if a narrowly shaped plume is desired. For example, a deposition process including a mask for a substrate having a small opening (for example, an opening having a size of about 50 μm or less, for example, about 20 μm) can benefit from a narrow cos ⁶ shaped plume And since the plume of the evaporated material does not spread over the mask but through the opening of the mask, material utilization can be increased. According to some embodiments, the nozzle can be designed such that the relationship between the length of the nozzle and the diameter of the passage of the nozzle is a defined relationship, for example having a ratio of 2:1 or higher. According to additional or alternative embodiments, the passage of the nozzle may include steps, ramps, collimator structures, and/or pressure stages to achieve the desired plume shape.

Figures 3a and 3b illustrate materials for use in accordance with embodiments described herein A cross-sectional view of an embodiment of a distribution tube 106 of a deposition configuration. According to some embodiments, the distribution tube 106 includes a distribution tube housing 116 that includes or is fabricated from a first distribution tube housing material. As can be seen in the embodiments shown in Figures 3a and 3b, the distribution tube is a linear distribution tube that extends along a first direction 136.

Figure 3a shows a schematic view of a distribution tube having a plurality of openings 107 that are aligned along a first direction in the distribution tube housing. In some embodiments, the apertured wall 109 in the distribution tube can be understood as a nozzle in accordance with embodiments described herein. For example, the walls 109 of the openings 107 may include a first nozzle material (for example coated with a first nozzle material), wherein the heat conductivity value of the first nozzle material is greater than the thermal conductivity of the first distribution tube material or greater than 21W/mK. In one example, the walls 109 of the openings 107 may be coated with copper. In one embodiment, the wall may be covered with copper and a second nozzle material, such as chemically inert to the vaporized organic material.

Figure 3b is a schematic illustration of one embodiment of a distribution tube in accordance with embodiments described herein. The distribution tube 106, shown in Figure 3b, includes an opening 107 provided with an extension wall 108. Generally, the extension wall 108 of the aperture 107 extends in a direction that is substantially perpendicular to the first direction 136 of the distribution tube housing 116. According to some embodiments, the extension wall 108 of the aperture 107 can extend from the distribution tube at any suitable angle. In some embodiments, the extension wall 108 of the opening 107 of the distribution tube housing 116 can provide a nozzle for the distribution tube 106. For example, the extension wall 108 can include a first nozzle material or can be made from a first nozzle material. According to some implementations For example, the extension wall 108 can be coated with a first and/or second nozzle material on the inside, such as a material that is chemically inert to the evaporated organic material.

In some embodiments, the extension wall 108 provides a fixed aid for securing the nozzle to the distribution tube housing 116, such as the nozzles exemplarily shown in Figures 2a through 2d. According to some embodiments, the extension wall 108 can provide threads for locking the nozzle to the distribution tube housing 116.

Returning to Figures 1a through 1c, Figures 1a through 1c illustrate schematic views of a material deposition configuration that can be used in a material deposition configuration in accordance with the embodiments described herein. According to some embodiments, which can be combined with other embodiments described herein, the nozzle of the distribution tube can be adjusted for releasing the evaporated material from a direction that is different from the length direction of the distribution tube, for example substantially vertical In the length direction of the distribution tube. According to some embodiments, the nozzles are arranged to have a primary evaporation direction of +-20° to the level. According to some particular embodiments, the evaporation direction may be slightly upwardly oriented, for example in the range of 15° from the horizontal, for example 3° to 7° upward. Therefore, the substrate can be slightly inclined to be substantially perpendicular to the evaporation direction. It can reduce the generation of unwanted particles. However, nozzle and material deposition configurations in accordance with embodiments described herein can also be used in deposition apparatus that is assembled for depositing materials onto a horizontally oriented substrate.

In one example, the length of the distribution tube 106 corresponds at least to the height of the substrate to be deposited in the deposition apparatus. In many cases, the length of the distribution tube 106 will be at least 10% or even 20% longer than the height at which the substrate will be deposited. A distribution tube having a height longer than the substrate, providing uniform deposition at the upper end of the substrate and/or at the lower end of the substrate product.

According to some embodiments, which may be combined with other embodiments described herein, the length of the distribution tube may be 1.3 m or more, for example 2.5 m or more. According to one configuration, as shown in Figure 1a, the evaporation crucible 104 is provided at the lower end of the distribution tube 106. The organic material is evaporated in the evaporation crucible 104. The vapor of the organic material enters the distribution tube 106 at the bottom of the distribution tube and is essentially laterally directed through the nozzles in the distribution tube toward the substrate, which is, for example, substantially perpendicular.

Figure 1b shows an enlarged view of a portion of the material source in which the distribution tube 106 is attached to the evaporation crucible 104. The flange unit 703 is assembled to provide a connection between the evaporation crucible 104 and the distribution tube 106. For example, an evaporation crucible and a distribution tube are provided as separate units that can be separated and attached or assembled to a flange unit, for example for operation of a material source.

The distribution tube 106 has an internal hollow space 710. A heating unit 715 can be provided to heat the distribution tube. Therefore, the distribution pipe 106 can be heated to a temperature such that the vapor of the organic material does not condense inside the wall of the distribution pipe 106, and the vapor of the organic material is supplied by the evaporation crucible 104.

For example, the distribution tube can be maintained at a temperature that is typically from about 1 ° C to about 20 ° C, more typically from about 5 ° C to about 20 ° C, and even more representatively from about 10 ° C to about 15 ° C. The evaporation temperature of the material to be deposited on the substrate. Two or more heating shields 717 are provided around the tubes of the distribution tube 106.

According to some embodiments, a nozzle comprising a material can direct the temperature of the heated distribution tube housing to a nozzle having a heat transfer higher than the distribution tube housing The thermal conductivity of the rate or has a thermal conductivity higher than 21 W/mK. When the distribution tube according to the embodiments described herein is used, increasing the uniformity of the temperature of the nozzle and the distribution tube housing can be achieved. A consistent increase in the material deposition configuration can increase the uniformity of the evaporated material and the quality of the deposited material, coated substrate, and product.

The distribution tube 106 can be coupled to the evaporation crucible 104 at the flange unit 703 during operation. The evaporation crucible 104 is assembled to receive the organic material to be evaporated and to evaporate the organic material. According to some embodiments, the material to be evaporated may include at least one of indium tin oxide (ITO), NPD, Alq ₃ , quinacridone, Mg/AG, starburst material, and the like. Figure 1b shows a cross-sectional view through the housing of the evaporation crucible 104. The refilling opening is provided, for example, on the upper portion of the evaporation crucible, and the refilling opening can be closed using a plug 722, a lid, a cover or the like to close the inner space of the evaporation crucible 104 ( Enclosure).

An external heating unit 725 is provided in the internal space of the evaporation crucible 104. The external heating unit can extend along at least a portion of the wall of the evaporation crucible 104. One or more central heating elements 726 may be additionally or selectively provided in accordance with some embodiments that may be combined with other embodiments described herein. Figure 1b shows two central heating elements 726. According to some applications, the evaporation crucible 104 may further include a mask 727.

According to some embodiments, as illustrated with respect to Figures 1a through 1b, the evaporation crucible 104 is provided on the underside of the distribution tube 106. According to still other embodiments that may be combined with other embodiments described herein, the steam conduit 732 may be provided to the distribution tube 106 at a central portion of the distribution tube, or may be between the lower end of the distribution tube and the upper end of the distribution tube. The location is provided to the distribution tube 106. Figure 1c shows a distribution tube 106 And a schematic of an example of a source of material for the steam conduit 732 provided in the central portion of the distribution tube. The vapor of the organic material is produced in the evaporation crucible 104 and directed through the vapor conduit 732 to the central portion of the distribution tube 106. The steam exits the distribution tube 106 via a plurality of nozzles 712, which may be nozzles as illustrated with respect to Figures 2a through 2d. According to still other embodiments that may be combined with other embodiments described herein, two or more steam conduits 732 may be provided at different locations along the length of the distribution tube 106. The steam conduit 732 can be coupled to an evaporation crucible 104 or a plurality of evaporation crucibles 104. For example, each steam conduit 732 can have a corresponding evaporation crucible 104. Alternatively, the evaporation crucible 104 can be in fluid communication with two or more steam conduits 732 that are coupled to the distribution tube 106.

As described herein, the distribution tube can be a hollow cylinder. The name cylinder is understood to generally accept a circular bottom shape, a circular top shape, and a curved surface area or shell connecting the top circular and bottom circular shapes. According to other additional or alternative embodiments that may be combined with other embodiments described herein, the name cylinder may be more understood in a mathematical sense as having any bottom shape and a consistent top shape, as well as joining the top shape and bottom. The curved surface area or shell of the shape. Therefore, the cylinder does not have to be a circular section. Instead, the bottom and top surfaces may have a different shape than a circle.

4 is a schematic diagram of a deposition apparatus 300 that may be used in a deposition apparatus 300 in accordance with the material deposition configurations or nozzles described herein. The deposition apparatus 300 includes a source of material 100d in one of the vacuum chambers 110. According to some embodiments, which can be combined with other embodiments described herein, the material source is assembled for translation Move or rotate around the axis. Material source 100d has one or more evaporation crucibles 104 and one or more distribution tubes 106. Two evaporation crucibles and two distribution tubes are shown in Figure 4. The distribution tube 106 is supported by the support 102. Again, according to some embodiments, the evaporation crucible 104 can also be supported by the support 102. Two substrates 121 are provided in the vacuum chamber 110. In general, a mask 132 for masking layer deposition on a substrate can be provided between the substrate and the material source 100d. The organic material evaporates from the distribution tube 106. According to some embodiments, the material deposition configuration may be a material deposition configuration as shown in Figures 1a through 1c.

According to embodiments described herein, the substrate is coated with an organic material in an essentially vertical position. The viewing angle depicted in Figure 4 is a top view of the device including material source 100d. Generally, the distribution pipe is a linear steam distribution nozzle. In some embodiments, the distribution tube provides a source of wiring that extends substantially vertically. According to several embodiments, which can be combined with other embodiments described herein, it is understood in particular to mean that the direction of the substrate is substantially allowed to deviate by 20° or less from the vertical direction, for example 10° or less. For example, this deviation may be provided by the substrate support having some deviation from the vertical direction that may result in a more stable substrate position. However, the substrate orientation during deposition of the organic material is considered to be substantially vertical, unlike the horizontal substrate orientation. The surface of the substrate is coated by a wiring source that extends in a direction corresponding to a substrate dimension and translational motion along other directions corresponding to other substrate dimensions. According to other embodiments, the deposition apparatus can be a deposition apparatus for depositing material on a substantially horizontally oriented substrate. For example, coating the substrate in the deposition apparatus can be performed in an up or down direction.

FIG. 4 is a schematic diagram showing one embodiment of a deposition apparatus 300 for depositing organic material in a vacuum chamber 110. Material source 100d is provided on one of the tracks in vacuum chamber 110, such as an annular track or linear guide 320. A track or linear guide 320 is assembled for translational movement of the material source 100d. According to different embodiments, which may be combined with other embodiments described herein, a driver for translational motion may be provided in material source 100d, provided in rail or linear guide 320, provided in vacuum chamber 110, or a combination thereof. Figure 4 illustrates valve 205, which is exemplified by a gate valve. Valve 205 is provided to a vacuum seal to an adjacent vacuum chamber (not shown in Figure 4). The valve can be opened to transfer the substrate 121 or the mask 132 into or out of the vacuum chamber 110.

According to some embodiments, which may be combined with other embodiments described herein, other vacuum chambers, such as maintenance vacuum chamber 210, are provided adjacent to vacuum chamber 110. According to some embodiments, the vacuum chamber 110 and the maintenance vacuum chamber 210 are connected by a valve 207. Valve 207 is assembled to open and close the vacuum seal between vacuum chamber 110 and maintenance vacuum chamber 210. The material source 100d can be transferred to the maintenance vacuum chamber 210 when the valve 207 is in the open state. Thereafter, the valve can be closed to provide a vacuum seal between the vacuum chamber 110 and the maintenance vacuum chamber 210. If the valve 207 is closed, the maintenance vacuum chamber 210 can be vented and opened to maintain the material source 100d without damaging the vacuum in the vacuum chamber 110.

In the embodiment shown in FIG. 4, the two substrates 121 are supported on respective transport tracks in the vacuum chamber 110. Furthermore, two rails are provided for setting the mask 132 thereon. The coating of the substrate 121 may be performed by respective masks 132 Covered. According to an exemplary embodiment, the masks 132 are provided in the mask frame 131 to support the masks 132 in predetermined positions. The masks 132 are corresponding to the first masks 132 and corresponding portions of the first substrate 121. The second mask 132 of the two substrates 121.

According to some embodiments, which may be combined with other embodiments described herein, the substrate 121 may be supported by a substrate support 126 that is coupled to the alignment unit 112. The alignment unit 112 can adjust the position of the substrate 121 relative to the mask 132. FIG. 4 is a schematic diagram showing an embodiment in which the substrate holder 126 is coupled to the alignment unit 112. Thus, the substrate is moved relative to the mask 132 to provide proper alignment between the substrate and the mask during deposition of the organic material. According to a further embodiment, which may be combined with other embodiments described herein, the mask 132 and/or the mask frame 131 supporting the mask 132 may be selectively or additionally coupled to the alignment unit 112. In some embodiments, the mask can be positioned relative to the substrate 121 or both the mask 132 and the substrate 121 can be positioned relative to each other. The alignment unit 112, which is assembled to adjust the position between the substrate 121 and the mask 132 relative to each other, provides proper alignment of the shadow during deposition, facilitating the manufacture of high quality, light emitting diode (LED) displays. Or OLED display manufacturing.

As shown in Figure 4, the linear guide 320 provides the direction of the translational motion of the material source 100d. A mask 132 is provided on both sides of the material source 100d. The mask 132 can extend substantially parallel to the direction of the translational motion. Furthermore, the substrate 121 on the opposite side of the material source 100d may also extend substantially parallel to the direction of translational motion. According to an exemplary embodiment, the substrate 121 can be moved into the vacuum chamber 110 via the valve 205 and away from the vacuum chamber 110. The deposition apparatus 300 can include a substrate 121 for transferring Their respective transfer tracks. For example, the transfer track can extend parallel to the substrate position as shown in FIG. 4 and enter or exit the vacuum chamber 110.

In general, other rails are provided to support the mask frame 131 and the mask 132. Accordingly, some embodiments that may be combined with other embodiments described herein may include four tracks in the vacuum chamber 110. To move one of the masks 132 away from the chamber, for example, to clean the mask, the mask frame 131 and the mask can be moved to the transport track of the substrate 121. The respective mask frames can then exit or enter the vacuum chamber 110 on the transfer track for the substrate. Although it is possible to provide separate transport tracks for masking the frame 131 to enter and exit the vacuum chamber 110, if only two track systems extend into and out of the vacuum chamber 110 and further the mask frame 131 can be The cost of ownership of the deposition apparatus 300 can be reduced by the movement of a suitable actuator or robot to the respective transfer track for the substrate, which is the transfer track of the substrate.

FIG. 4 is a schematic diagram showing an exemplary embodiment of a material source 100d. Material source 100d includes a support 102. The mount 102 is assembled for translational movement along the linear guide 320. The support 102 supports two evaporation crucibles 104 and two distribution tubes 106, which are provided above the evaporation crucible 104. The steam generated in the evaporation crucible can move up and away from one or more nozzles or outlets of the distribution tube.

According to embodiments described herein, the material source includes one or more evaporation crucibles and one or more distribution tubes, wherein each of the one or more distribution tubes can be in fluid communication with the one or more evaporation crucibles One of each. Several applications for OLED device fabrication include processing features in which two or more organic materials are simultaneously evaporated. Thus, as shown, for example, in Figure 4, two distribution tubes and corresponding evaporation crucibles may be provided adjacent to one another. Thus, material source 100d can also be referred to as an array of material sources, for example, where more than one organic material evaporates simultaneously. As described herein, a source of material array may itself be referred to as a source of material for two or more organic materials, for example, an array of material sources may be provided for evaporating and depositing three materials onto a substrate.

The one or more nozzles of the distribution tube can include, for example, one or more nozzles that can be provided in a spray head or another vapor distribution system. The nozzles provided for the distribution tubes described herein can be the nozzles described in the embodiments described herein, such as the nozzles described with respect to Figures 2a through 2d. The distribution tube is here understood to include an internal space having a plurality of openings such that the pressure in the distribution tube is higher than the pressure on the outside of the distribution tube, for example by at least one order of magnitude. In one example, the pressure in the distribution tube can be between about ^10-2 and ^10-1 mbar, or between about ^10-2 and about ^10-3 mbar. According to some embodiments, the pressure in the vacuum chamber can be between about ^10-5 and about ^10-7 mbar.

According to several embodiments, which may be combined with other embodiments described herein, the rotation of the distribution tube may be provided by rotation of the evaporator control housing, at least the distribution piping being secured to the evaporator control housing. The distribution tube rotation can be additionally or selectively provided by moving the material source along the curved portion of the annular track. Generally, the evaporation crucible system is also fixed to the evaporator control housing. Therefore, the material source includes a distribution tube and an evaporation crucible, and the distribution tube and the evaporation crucible are rotatably fixed together as an example.

According to some embodiments, which may be combined with other embodiments described herein, the distribution tube or evaporation tube may be designed in the shape of a triangle such that the opening or spray of the distribution tube The mouths can be as close to each other as possible. Having the openings or nozzles of the distribution tube as close to one another as possible provides, for example, improved mixing of different organic materials, for example for co-evaporation of two, three or even a plurality of different organic materials.

According to several embodiments described herein, the width of the outlet side of the distribution tube (including the side of the distribution tube of the opening) is 30% or less of the largest dimension of the profile. In view of this, the opening of the distribution tube or the nozzle of the adjacent distribution tube can be provided at a small distance. This smaller distance improves the mixing of several organic materials that are vaporized adjacent to each other. Furthermore, the width of the wall facing the substrate in an essentially parallel manner may be additionally or selectively reduced, independently of improving the mixing of the organic materials. Therefore, the surface area of the wall facing the substrate in an essentially parallel manner can be reduced. This configuration reduces the thermal load provided to the mask or substrate, which is supported in the deposition area, or slightly before the deposition area.

In view of the shape of the triangle of the material source, the area of radiation directed toward the mask is additionally or selectively reduced. In addition, a stack of metal sheets can be provided to reduce heat transfer from the material source to the mask, which is exemplified by up to 10 metal sheets. According to some embodiments, which may be combined with other embodiments described herein, a heating shield or sheet may be provided with an orifice for the nozzle and may be attached to at least the front side of the source, ie facing The side of the substrate.

Although the embodiment as shown in FIG. 4 provides a deposition apparatus having a movable source, it will be understood by those of ordinary skill that the above embodiments may also be provided in several deposition apparatus in which the substrate is attached during processing. Move in. For example, the substrate to be coated can be guided and driven along a source of static material.

According to some embodiments, which may be combined with other embodiments described herein, a material deposition arrangement for depositing one, two or more vaporized materials on a substrate in a vacuum chamber is provided. The material deposition configuration includes a first material source, the first material source including a first material evaporation source or a first material evaporator, assembled to vaporize the first material to be deposited on the substrate. The first material source further includes a first distribution tube, wherein the first distribution tube includes a first distribution tube housing, wherein the first distribution tube is in fluid communication with the first material evaporation source, wherein the material source further comprises a plurality of first nozzles, wherein The first nozzles are located in the first distribution tube housing. Generally, one or more nozzles of the first nozzles include an opening length and an opening size, wherein the length of the one or more nozzles of the first nozzles is equal to or greater than 2:1. . The material deposition configuration includes a second material source, the second material source including a second material evaporator, assembled for vaporizing a second material to be deposited on the substrate. The second material source further includes a second distribution tube, the second distribution tube including a second distribution tube housing, wherein the second distribution tube is in fluid communication with the second material evaporator. The second material source further includes a plurality of second nozzles, the second nozzles being located in the second distribution tube housing. According to embodiments described herein, the distance between the first nozzle of one of the first nozzles and the second nozzle of one of the second nozzles is equal to or less than 30 mm. According to some embodiments, the first material and the second material may be the same material.

According to a further embodiment, which can be combined with other embodiments described herein, a material deposition arrangement for depositing one, two or more vaporized materials on a substrate in a vacuum chamber is provided. The material deposition configuration includes a first material source, the first material source including a first material evaporator assembled for vaporizing the first material to be deposited on the substrate. The first material source further includes a first distribution tube, and the first distribution tube includes the first a distribution tube housing, wherein the first distribution tube system fluid circulates through the first material evaporator; further, the first material source includes a plurality of first nozzles, wherein the first nozzles are located in the first distribution tube housing, wherein One or more of the first nozzles include an opening length and an opening size and are assembled to provide a first distribution direction. The one or more nozzles of the first nozzles have a length to dimension ratio equal to or greater than 2:1. The material deposition configuration further includes a second material source, the second material source including a second material evaporator, assembled for vaporizing a second material to be deposited on the substrate; and a second distribution tube. The second distribution tube includes a second distribution tube housing, wherein the second distribution tube is in fluid communication with the second material evaporator. The second source of material further includes a plurality of second nozzles, the second nozzles being located in the second distribution tube housing, wherein one or more of the second nozzles are assembled to provide a second distribution direction. According to the embodiment described herein, the first distribution direction of the one or more nozzles of the first nozzles and the second distribution direction of the one or more nozzles of the second nozzles are arranged parallel to each other, or The deviation from the parallel arrangement is up to 5°. According to some embodiments, the first material and the second material may be the same material.

According to some embodiments, which may be combined with other embodiments described herein, a distribution conduit for depositing evaporated material onto a substrate in a vacuum chamber is provided. The distribution tube includes a distribution tube housing and a nozzle, and the nozzle is located in the distribution tube housing. The nozzle includes an opening length and an opening size, wherein the length of the nozzle is equal to or greater than 2:1. Further, the nozzle includes a material that is chemically inert to the evaporated organic material. In one example, the evaporated organic material can have a temperature of about 150 ° C and about 650 ° C.

Embodiments described herein are particularly concerned with depositing organic materials, such as OLED display fabrication on large area substrates. According to some embodiments, a large area substrate or a carrier supporting one or more substrates, that is, a large area carrier, may have a size of at least 0.174 m ² . For example, the deposition apparatus can be adapted to process large-area substrates, such as 5th generation, 7.5th generation, 8.5th generation, or even 10th generation, and the 5th generation corresponds to a substrate of about 1.4m ² (1.1mx 1.3 m), 7.5G corresponding to the substrate ² of about 4.29m (1.95mx 2.2m), corresponding to about 8.5 Generation of 5.7m ² substrate (2.2mx 2.5m), the first passage 10 ² corresponding to the substrate of about 8.7m (2.85m × 3.05m). Even higher generations such as the 11th and 12th generations and corresponding substrate areas can be applied in a similar manner. According to an exemplary embodiment that can be combined with other embodiments described herein, the substrate thickness can range from 0.1 to 1.8 mm and the support configuration for the substrate can be adapted to such substrate thickness. However, in particular, the substrate thickness may be about 0.9 mm or less, such as 0.5 mm or 0.3 mm, and the support configuration is suitable for such substrate thickness. Generally, the substrate can be made of any material suitable for deposition of materials. For example, the substrate may be selected from a combination of glass (eg, soda lime glass, borosilicate glass, etc.), metal, polymer, ceramic, composite, carbon fiber material, or any other material or material that can be deposited by a process coating. Made of materials.

In accordance with embodiments described herein, a method for providing a material deposition configuration is provided. The material deposition configuration can be a material deposition configuration as described with respect to the above embodiments and/or can be a material deposition configuration useful in the deposition apparatus described in accordance with the embodiments herein. A flowchart of a method 400 in accordance with embodiments described herein can be found in FIG. The method includes providing a source of material in block 410 for vaporizing material to be deposited on the substrate, particularly in a vacuum deposition chamber.

According to some embodiments, the source of the material provided may be exemplified by The material source illustrated in Figures 1a to 3b. For example, a material source can be adapted to evaporate organic materials. In one example, the material source can be applied to an evaporative material having an evaporation temperature of from about 150 °C to about 500 °C. In some embodiments, the source of material can be a crucible.

At block 420, method 400 includes fluidly communicating the distribution tube with the nozzle at a source of material to provide fluid communication between the source of material and the distribution tube and the nozzle. According to some embodiments described herein, the nozzle includes a first nozzle material having a heat transfer value greater than 21 W/mK. In some embodiments, the nozzle can be made from a first nozzle material. In one example, the nozzle is coated on the inside with a second nozzle material, for example by coating the nozzle opening or the inside of the nozzle passage with a second nozzle material. According to some embodiments, the second nozzle material is a material that is chemically inert to the evaporated organic material, and the evaporated organic material may be exemplified by an organic material, typically having a temperature between about 100 ° C and about 650 ° C. Representative temperatures between about 100 ° C and about 500 ° C.

According to some embodiments, the distribution tube may be a distribution tube as described in the above embodiments, particularly the distribution tube described in the examples of Figures 1a to 3b. In some embodiments, the distribution tube can be exemplified by a triangular profile to enable space to be used in an optimized manner. In some embodiments, the nozzle of the distribution tube can be a nozzle as described with respect to Figures 2a through 2d.

In some embodiments, the method includes heating the distribution tube to or above the evaporation temperature of the material to be deposited on the substrate. Heating of the distribution tube can be performed by a heating device. In one example, the effectiveness of the heating device can be supported by a heating shield, as exemplified by the above description of Figures 1a through 1c.

Further, the use of at least one of the linear distribution tubes, material deposition configurations, and deposition apparatus having a material deposition configuration in accordance with embodiments described herein is illustrated.

In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

Claims (18)

A linear distribution tube (106) for depositing evaporated material on a substrate (121) in a vacuum chamber (110), the linear distribution tube comprising: a distribution tube housing (116) along a first a direction (136) extending, wherein the first direction provides a linear extension of the linear distribution tube (106), wherein the distribution tube housing (116) includes a first housing material; a plurality of openings are located in the distribution In the tube housing (116), wherein the openings are distributed along a linear extension of the linear distribution tube; and a plurality of nozzles (712) for the linear distribution tube (106), wherein the nozzles Mounted for directing the vaporized material in the vacuum chamber (110), the nozzles including a first nozzle material having a thermal conductivity greater than the first shell material. The linear distribution tube of claim 1, wherein the nozzles (712) comprise copper (Cu), tantalum (Ta), titanium (Ti), niobium (Nb), diamond-like coating (DLC), And at least one of graphite. The linear distribution tube of claim 1, wherein the nozzles (712) comprise a channel (203) and a coating for guiding the evaporated material through the nozzles, the coating At least on the surface of the channel (203). The linear distribution tube of claim 2, wherein the nozzles (712) comprise a channel (203) and a coating for guiding the evaporated material through the nozzles, the coating At least on the surface of the channel (203). a linear distribution tube as described in claim 3, wherein the channel The surface of (203) is coated with the first nozzle material or a second nozzle material (208) that is chemically inert to an evaporated organic material. The linear distribution tube of claim 4, wherein the surface of the channel (203) is coated with the first nozzle material or a second nozzle material (208), the second nozzle material pair has been The evaporated organic material is chemically inert. The linear distribution tube of claim 5, wherein the channel (203) of the nozzles (712) is coated with tantalum (Ta), niobium (Nb), titanium (Ti), diamond-like coating. At least one of (DLC) and graphite. The linear distribution tube of claim 1, wherein the first nozzle material has a thermal conductivity greater than 21 W/mk. A linear distribution tube according to any of the preceding claims, wherein the nozzles (712) comprise copper. The linear distribution tube of any one of claims 1 to 8, wherein the nozzles (712) are adapted to be lockable to the linear distribution tube (106). A linear distribution tube according to any one of the preceding claims, wherein the nozzles (712) include a channel (203) for guiding the evaporated material through the nozzles and providing the One of the geometry of the channel, the geometry of the channel forming a plume of the vaporized material, wherein the nozzles (712) are designed to form a plume having a contour similar to the cos ⁿ , wherein 4. A material deposition arrangement (100) for depositing a material in a vacuum chamber (110) on a substrate (121), the material deposition configuration comprising: an evaporation source for providing evaporation and deposition Material on the substrate (121) a distribution tube (106) through which the fluid circulates, the evaporation source providing the evaporated material to the distribution tube (106); and a nozzle (712) for the vacuum chamber (110) The vaporized material is guided, wherein the nozzle (712) comprises a first nozzle material having a thermal conductivity greater than 21 W/mK, wherein the nozzle (712) comprises tantalum (Ta), titanium (Ti), tantalum At least one of (Nb), diamond-like coating (DLC), and graphite. The material deposition configuration of claim 12, wherein the evaporation source is an evaporation source for providing one of the organic materials. The material deposition arrangement of claim 12, further comprising a plurality of heating elements (726) for heating the distribution tube (106) to an evaporation temperature or above of the material to be deposited. The material deposition configuration of claim 12, wherein the distribution tube (106) is a linear distribution tube according to any one of claims 1 to 8, wherein the nozzle (712) The nozzles of the nozzles of the linear distribution tube. A vacuum deposition apparatus comprising: a vacuum chamber (110); and a material deposition configuration (100) according to any one of claims 12 to 15, wherein the evaporation source is for a plurality of One of the organic materials evaporates the crucible, and the distribution tube (106) connected to the material deposition configuration (100) of the evaporation crucible is used to guide the evaporated material from the evaporation crucible to the vacuum chamber (110) in; Wherein the nozzle (712) includes a second nozzle material (208) that is chemically inert to the evaporated organic material; and wherein the nozzle (712) of the material deposition configuration (100) is arranged for guidance The evaporated material is directed toward one of the substrates (121) in the vacuum chamber (110). A method for providing a material deposition configuration (100) for a vacuum deposition apparatus, the method comprising: providing an evaporation source for vaporizing a material to be deposited on a substrate (121); and fluidly communicating a distribution a tube (106) and a nozzle (712) are provided in the evaporation source to provide fluid communication between the evaporation source and the distribution tube (106) and the nozzle (712), wherein the nozzle (712) includes a first The nozzle material has a thermal conductivity value greater than 21 W/mK, wherein the nozzle (712) comprises at least one of tantalum (Ta), titanium (Ti), niobium (Nb), diamond-like coating (DLC), and graphite. The method of claim 17, further comprising heating the distribution tube (106) to an evaporation temperature or higher of the material to be deposited on the substrate (121).