TW201827377A - 備有具有用於低膜側反射率及低可見透射率的吸收層之低發射率塗層的經塗覆物件 - Google Patents

備有具有用於低膜側反射率及低可見透射率的吸收層之低發射率塗層的經塗覆物件 Download PDF

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TW201827377A
TW201827377A TW106132823A TW106132823A TW201827377A TW 201827377 A TW201827377 A TW 201827377A TW 106132823 A TW106132823 A TW 106132823A TW 106132823 A TW106132823 A TW 106132823A TW 201827377 A TW201827377 A TW 201827377A
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安東 迪特瑞曲
貝德 迪斯特朵夫
畢爾特 寇柯特
亞當 托卡茲
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美商加爾汀工業公司
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    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
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    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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    • C03C17/3652Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
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    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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    • Y10T428/2495Thickness [relative or absolute]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Abstract

具有一低發射率(低E)塗層的吸收層之設計可致使該塗層具有一有利於美觀之減少的膜側反射率。在某些實施例中,該等吸收層具金屬性或實質上金屬性(例如NiCr或NiCrNx)且各係提供在第一與第二氮化物層(例如以氮化矽為主之層)之間以減少或防止在可視需要選用的熱處置(例如熱回火、熱彎曲、及/或熱強化)期間該等吸收層的氧化反應。根據本發明之某些實例實施例之經塗覆物件可用於絕緣玻璃(IG)窗單元、其它類型的窗等。

Description

備有具有用於低膜側反射率及低可見透射率的吸收層之低發射率塗層的經塗覆物件
本發明係有關於包括一低發射率塗層的經塗覆物件。在某些實例實施例中,該低發射率塗層的吸收層之位置/設計可致使該塗層兼具(i)一低可見透射率(例如不大於50%、更佳不大於40%、且最佳不大於35%)、及(ii)一減少的可見膜側反射率。可提供一上吸收層在一上堆疊內並可提供另一吸收層在該低發射率塗層的下堆疊內。在某些實例實施例中,該等吸收層係具金屬性或實質上金屬性。且各係提供在第一與第二氮化物層(例如以氮化矽為主之層)之間以減少或防止在可視需要選用的熱處置(例如熱回火、熱彎曲、及/或熱強化)及/或製造期間該等吸收層之氧化反應,因此可預測著色及光學特徵。根據本發明之某些實例實施例的經塗覆物件可用於絕緣玻璃(IG)窗單元、車窗、其它類型之窗、或任何其它合適應用。
在本項技藝中已知經塗覆物件係用於窗應用,諸如絕緣玻璃(IG)窗單元、車窗、及/或諸如此類。在某些實例中已知最好熱處置(例如熱回火、熱彎曲及/或熱強化)此等經塗覆物件以進行回收、彎曲、或在某些實例實施例中之諸如此類。經塗覆物件之熱處置典型上需要使用以下溫度:至少580℃、更佳至少約600℃且又更佳至少620℃。此等高溫(例如費時5-10分鐘或更久)通常會導致塗層損壞及/或以不可預期的方式變質或改變。因此,若所欲,最好以不會顯著損壞該塗層的可預期方式使該等塗層可承受此等熱處置(例如熱回火)。
在某些情況下,經塗覆物件的設計者力求具有所欲可見透射率、所欲色彩、低發射率(或發射度)、及低薄膜電阻(Rs)的組合。低發射率(低E)及低薄膜電阻特徵可以使此等經塗覆物件能阻斷大量IR輻射以減少,例如車輛或建築物內部之非所欲高溫。通常,可藉較少的可見透射率而阻斷(其包括反射)較多的IR輻射。
美國專利第7,597,965號揭示一具有一NiCr吸收劑層在該下介電堆疊內之低發射率塗層。然而,在該第7,597,965號專利內之實例塗層係為了一高可見透射率而設計且的確具有一59%之可見透射率(Tvis或TY)。較低的可見透射率通常為所欲。例如就美觀及/或光學目的而言,通常最好提供具有可見透射率不大於50%、更佳不大於40%、且有時不大於約35%之經塗覆物件(其包括低發 射率塗層)。然而,當一經塗層物件之可見透射率經由一低發射率塗層設計而減少時,該塗層之膜側反射率典型上會增加。
美國專利第7,648,769號揭示一具有一NiCr吸收劑層在該中間介電堆疊內而非在該塗層之上及下介電堆疊內之低發射率塗層(例如見該7,648,769號專利之圖1)。在該第7,648,769號專利內之實例1經由單片測定可獲得一54.5%之可見透射率及一19.5%之膜側反射率,且當在一絕緣玻璃(IG)窗單元內經測定時,該等數值可改變成一50%之可見透射率及一23%之膜側反射率。在該7,648,769號專利內之實例2以一類似方式可獲得一經整片式測定為67.5%之可見透射率及11.5%之膜側反射率,且當在一絕緣玻璃(IG)窗單元內經測定時,該等數值可改變成62%之可見透射率及17%之膜側反射率。在該7,648,769號專利內之該等實例教示當可見透射率下降時,膜側反射率會上升。
在實施方式段落內亦解釋僅提供一吸收劑層在一具有約40%之可見透射率之低發射率塗層的該中間介電堆疊內可得到一超過30%之非所欲高的可見膜側反射率(RfY)。
因此,可知很難獲得兼具(i)所欲低可見透側率、及(ii)低膜側反射率之組合的含低發射率塗層之經塗覆物件。熟悉本項技藝者可知在本項技藝內存在一對於一具有低發射率(或低薄膜電阻)及兼具低可見透射率(例 如不大於50%、更佳不大於40%、且最佳不大於約35%)與低膜側反射率的組合之經塗覆物件的需求。
一經塗覆物件,其包括一低發射率塗層。在某些實例實施例中,在該低發射率塗層內之吸收層的位置/設計可致使該低發射率塗層兼具(i)一低可見透射率(例如不大於50%、更佳不大於40%、且最佳不大於35%)、及(ii)有利於美觀目的之低可見膜側反射率。提供一吸收層在該低發射率塗層的上堆疊內且提供另一吸收層在該低發射率塗層的下堆疊內,且在某些雙銀實施例中,在該低發射率塗層之中央堆疊內並無類似的吸收層。該等吸收層具金屬性或實質上金屬性(例如NiCr或NiCrNx)。且在某些實例實施例中,其等各係提供該中間堆疊內之吸收層在第一及第二氮化物層(例如以氮化矽為主的層體)之間以減少或防止在可視需要選用的熱處置(例如熱回火、熱彎曲、及/或熱強化)及/或製造期間該等吸收層之氧化反應,因此可預測能獲得之著色及光學特徵。業經發現在該塗層之上及下部份內而非在該等銀層之間之該塗層的中間介電堆疊內使用此等吸收層令人驚訝地且非可預期地可同時獲得低可見透射率及低膜側反射率的組合。在某些實例實施例中,在IG及/或整片式應用內,該經塗覆物件之可見膜側反射率(RfY)可小於其可見玻璃側反射率(RgY)。根據本發明之某些實例實施例的經塗覆物件可用於IG窗 單元、車窗、其它類型之窗、或任何其它合適應用。
在本發明之某些實例實施例中,係提供一包括一藉玻璃基板而承載的塗層之經塗覆物件,該塗層包含:第一及第二紅外線(IR)反射層,其中該等IR反射層係藉至少一位於其間之至少一介電層而彼此分隔,且其中該第一IR反射層之位置比該第二IR反射層更接近該玻璃基板;第一實質上金屬性或金屬性吸收層之位置可致使該第一吸收層位於該玻璃基板與該第一IR反射層之間;第二實質上金屬性或金屬性吸收層之位置可致使該第一與第二IR反射層皆位於該玻璃基板與該第二吸收層之間,且其中該第一吸收層及第二吸收層係各夾在含氮化矽的介電層之間且接觸其等。
1‧‧‧玻璃基板
2‧‧‧另一玻璃基板
3‧‧‧底介電氮化矽層
4,25‧‧‧金屬性或實質上金屬性吸收層
7‧‧‧第一下接觸層
9‧‧‧底IR反射層
11‧‧‧第一上接觸層
13‧‧‧介電層
14‧‧‧以介電性氮化矽為主及/或包含其之層
14’‧‧‧額外之介電性氮化矽層
15‧‧‧以氧化錫為主及/或包含其之中間層
17‧‧‧第二下接觸層
19‧‧‧第二導電性且較佳為金屬性或實質上金屬性IR反射層
26‧‧‧以氮化物為主之介電層
30‧‧‧低發射率塗層
40‧‧‧間隔物(群)、密封劑(群)
50‧‧‧間隙
圖1為根據本發明一實例實施例之經塗覆物件的橫截面圖。
圖2為表示根據本發明一實例實施例之提供在一IG窗單元之圖1的經塗覆物件之橫截面圖。
文中之經塗覆物件可用於以下應用,諸如IG窗單元、車窗、整片式建築物的窗、住宅窗、及/或包括單一或多片玻璃基板之任何其它合適應用。
在本發明之某些實例實施例中,該塗層包括雙銀堆疊(如圖1內所示),但是在所有實例中,本發明並未如此受限。
例如在本發明之某些實例實施例中,具有多IR反射層(例如以兩分隔開的銀為主之層體)之熱處置或未經熱處置的經塗覆物件可獲得一小於或等於3.0(更佳小於或等於2.5、又更佳小於或等於2.1、且最佳小於或等於2.0)之薄膜電阻(Rs)。如文中所使用之該等名詞“熱處置法”及“熱處置”意指將該物件加熱至一足以使該含玻璃之物件進行熱回火、熱彎曲、及/或熱強化的溫度。本定義包括,例如於一至少約580℃、更佳至少約600℃的溫度下,在一烘箱或爐內將一經塗覆物件加熱,其費時足以進行回火、彎曲、及/或熱強化。在某些實例中,該HT可費時至少約4或5分鐘。在本發明的不同實施例中,該經塗覆物件可或可不經熱處置。
圖1為根據本發明之一實例非限制性實施例之經塗覆物件的側橫截面圖。該經塗覆物件包括基板1(例如厚度為自約1.0至10.0毫米、更佳自約1.0至3.5毫米之透明、綠色、青銅色、或藍-綠色玻璃基板)、及直接或間接提供在該基板1上之低發射率塗層(或層系統)30。該塗層(或層系統)30包括,例如:用於減少霧度之富矽型的Si3N4、或在本發明之不同實施例中之任何其它合適化學計量氮化矽之底介電氮化矽層3(其可以是SiN4)、金屬或實質上金屬吸收層4(例如含或包括NiCr、NiCrNx等之吸收層)、可以是用於減少霧度之該富矽型或任何其它合適化學計量氮化矽之Si3N4的額外介電性氮化矽層5、含或包括氧化鈦或任何其它合適材料之可選需要選用的介電層 6、第一下接觸層7(其可接觸底IR反射層9)、第一導電且較佳為金屬性或實質上金屬性紅外線(IR)反射層9、第一上接觸層11(其可接觸層9)、介電層13、另一以氮化矽為主及/或包含其之層14、以氧化矽為主及/或包含其之中間層15、第二下接觸層17(其可接觸IR反射層19)、第二導電性且較佳為金屬性或實質上金屬性IR反射層19、第二上接觸層21(其可接觸層19)、介電層23、可以是用於減少霧度之該富矽型或在本發明之不同實施例中之任何其它合適化學計量氮化矽的Si3N4之介電性氮化矽層24、金屬性或實質上金屬性吸收層25(例如NiCr、NiCrNx等或包括其等之吸收層)、及可以是用於減少霧度之富矽型或任何其它合適化學計量氮化矽的Si3N4之介電性氮化矽層24。該等“接觸”層7、11、及17各可接觸至少一IR反射層(例如以銀為主的層體)。前述濺鍍沉積層3-26可構成提供在玻璃或塑膠基板1上之低發射率(亦即低E)塗層30。
在整片實例中,該經塗覆物件僅包括一如在圖1內所闡明之玻璃基板。然而,文中之單片經塗覆物件可用於以下裝置,諸如層合車輛擋風玻璃、IG窗單元等。就IG窗單元而言,一IG窗單元可包括兩分隔開的玻璃基板。一實例IG窗單元係闡明且描述在,例如美國專利文件第2004/0005467號內,其揭示文在此併入本案以為參考資料。圖2表示一包括經由間隔物(群)、密封劑(群)40等而與另一玻璃基板2連結之在圖1內所示之該經塗覆玻璃基板的實例IG窗單元,玻璃基板1與玻璃基板2 之間可界定一間隙50。在某些實例中,在IG單元實施例內之該等基板間的本間隙50可充滿氣體,諸如氬(Ar)。一實例IG單元可包含一對各約3-6毫米厚之分隔開的透明玻璃基板,在某些實例情況中,其中之一者係經文中之塗覆物30塗覆,其中在該等基板間之間隙50可以是自約5至30毫米、更佳自約10至20毫米、且最佳約16毫米。在某些實例情況中,該塗覆物30可提供在面向該間隙之任一基板的內表面上(該塗覆物係顯示在圖2內之面向該間隙50之基板1的內主要表面上,而不能提供在面向該間隙50之基板2的內主要表面上)。任一基板1或基板2可以是建築物內部之該IG窗單元的最外面基板(例如在圖2中,該基板1為最接近該建築物內部之基板)。
在本發明之某些實例實施例中,吸收層4係位於以氮化物為主的介電層3與5之間且接觸彼等。在某些實例實施例中,包圍該吸收層4之層3與5各為氮化物層且係實質上或完全未經氧化。同樣,在本發明之某些實例實施例中,吸收層25位於以氮化物為主的介電層24與26之間且接觸其等。在某些實例實施例中,包圍該吸收層25之層24與26各為氮化物層且係實質上或完全未經氧化。若該層26為該塗層30之最外層且係暴露於大氣下,則該層26之最外部份可選擇性經氧化。在該吸收劑層4及25周圍使用氮化物層3、5、24、26有利的原因在其有助於防止(或降低以下之可能性)該吸收層4、25在熱處置期間經氧化,因此可更佳地使該等吸收層4、25能進行一預 期功能,尤其可吸收至少某數量(例如至少5%、更佳至少10%)可見光。可知若在熱處置期間或諸如此類,一層變得太經氧化,則其不再適於作為一吸收層。
在本發明之某些實例實施例中,吸收層4及25可以是由NiCr(任何合適比率或Ni:Cr)所組成或包括其等,且可或可未經氮化(NiCrNx)。吸收層4與25位於如圖1內所示的以氮化物為主介電層之層間並接觸其等。在某些實例實施例中,包圍該等吸收層4、25之以氮化物為主之層3、5、24、26各為氮化物層且係實質上或完全未經氧化。在某些實例實施例中,吸收層4、25可包含自0-10%氧、更佳自0-5%氧、且最佳自0-2%氧(原子%)。在某些實例實施例中,吸收層4、25包含自0-20%氮、更佳自1-15%氮、且最佳自約1-12%氮(原子%)。雖然NiCr為一用於吸收層4及25之較佳材料,但是可使用其它材料。例如在本發明之某些其它熱可處置實例實施例中,該等吸收層4及/或25可以由Ni、Cr、NiCrNx、CrN、ZrN、或TiN所組成或包括其等。在非熱可處置實施例中,可使用上述材料中之任一者、以及其它材料,諸如Ti、Zr、NiOx等,以作為該等吸收/吸收性層4及/或25。
該低發射率塗層30之吸收層4及25的設計可致使該塗層30具有一較低可見透射率、所欲著色、及低膜側反射率。在某些實例實施例中,該等金屬性或實質上金屬性吸收層(例如NiCr或NiCrNx)4及25的厚度各可以是自約80-250、更佳自約100-210、且最佳自約140-190 埃(Å)。在某些實例實施例中,該下吸收層4可以比該上吸收層25稍微薄。例如在某些實例實施例中,為了使該經塗覆物件得到所欲光學特性,該下吸收層可以比該上吸收層25還薄自約3-50埃(Å)(更佳薄自約3-20埃)。在某些實例實施例中,金屬性或實質上金屬性吸收層4、25係各提供在第一與第二氮化物層(例如以氮化矽為主之層)3、5、24、26之間以減少或防止在熱處置(例如熱回火、熱彎曲、及/或熱強化)期間其等之氧化反應,因此在熱處置後可獲得能預測的著色、透射率及反射率數值。
因此,一吸收層25係提供在該上堆疊內(高於該以Ag為主之上IR反射層19),且一第二吸收層4係提供在該堆疊之下部份內(在該玻璃基板1與該以銀為主的下IR反射層9之間)。在某些雙銀實施例(亦即其中該低放射率塗層具有兩次Ag為主的IR反射層)中,較佳並未提供類似吸收層在一對氮化物層間之中央介電堆疊內。換言之,雖然吸收劑層4與25係提供在該塗層的下及上部份內,但是並未提供氮化物間之類似吸收劑層在兩以銀為主之層9及19間的該中央堆疊內。業經發現在該塗層之該低及上部份內,但是並非在該等銀之間的塗層之中間部份內,分別使用此等吸收層4及25令人驚訝地且非可預期地可以使該包括塗層30之經塗覆物件同時得到低可見透射率及低膜側反射率的組合。在某些實例實施例中,在IG及/或整片式應用內,該經塗覆物件之可見膜側反射率(RfY)低於其可見玻璃側反射率(RgY)。
在本發明之某些實施例中,介電層3、5、14、24及26可以由氮化矽所組成或包括氮化矽。除了別的以外,氮化矽層3、5、14、24及26可改良該等經塗覆物件的熱可處置性且在可視需要選用的HT(例如熱回火等)期間可保護該等吸收層。層3、5、14、24及26的氮化矽之一或多者可以由該化學計量類型(亦即Si3N4)所組成,或在本發明之不同實施例中,係由氮化矽之富矽型所組成。在一富矽之含氮化矽層3及/或5內游離態矽的存在可以使在HT期間自該玻璃1向外遷移的某些原子(諸如鈉(Na))在抵達該銀9並損害該銀9之前,更有之地藉該富矽之含氮化矽層(群)而中止。因此,在本發明之某些實例實施例中,咸信該富矽之SixNy可減少在HT期間對於該銀層(群)造成的損害程度,因此可降低薄膜電阻(Rs)或以令人滿意的方式維持大約相同的薄膜電阻。而且,在本發明的某些實例可視需要選用的實施例中,咸信在層3、5、24或26內的該富矽之SixNy可減少在HT期間對於吸收層4(及/或25)造成的損害(例如氧化反應)程度。在某些實例實施例中,當使用富矽之氮化矽時,該如此經沉積之富矽的氮化矽層可藉SixNy層(群)而表示特徵,其中x/y可以是自0.76至1.5、更佳自0.8至1.4、又更佳自0.82至1.2。而且,在某些實例實施例中,在進行HT之前及/或後,該富矽之SixNy層(群)可具有一至少2.05、更佳至少2.07、且有時至少2.10(例如632奈米)之折射率(“n”)(附註:亦可以使用之化學計量Si3N4具有一2.02-2.04之折射率“n”)。 值得注意的是由於熱處置,n及k傾向下降。在本發明之某些實例實施例中,文中論述的該等氮化矽層中之任一及/或全部可經其它材料(諸如不銹鋼或鋁)摻雜。例如在本發明之某些實例實施例中,文中論述之任一及/或所有氮化矽層可選擇性包括自約0-15%鋁、更佳自約1至10%鋁。在本發明之特定實施例中,可在一具有氬及氮氣之氣氛下,藉濺度一Si或SiAl之靶材而沉積該氮化矽。在該等氮化矽層之特定實例中亦可提供小量氧。
紅外線(IR)反射層9及19較佳實質上或完全金屬性及/或導電性,且可包含或基本上由銀(Ag)、金、或任何其它合適IR反射材料所組成。IR反射層9及19有助於使該塗層具有低發射率及/或良好太陽能控制特徵。然而在本發明之某些實施例中,該等IR反射層可微經氧化。
在本發明之某些實例實施例中,該等上接觸層11及21可以由以下所組成或包括以下:氧化鎳(Ni)、氧化鉻(Chromium/chrome(Cr))、NiCr或鎳合金氧化物(諸如氧化鎳鉻(NiCrOx))、或其它合適材料(群)。在這些層(11及/或21)內使用,例如NiCrOx可改善持久性。在本發明之某些實施例中,層11及/或21之NiCrOx可完全經氧化(亦即具完全化學計量性)、或可僅部份經氧化。在某些實例中,該等NiCrOx層11及/或21可至少約50%經氧化。在本發明之不同實施例中,接觸層11及/或21(例如由Ni及/或Cr之氧化物所組成或包括其之層)可或 可不以氧化反應分級。氧化反應分級意指在該層內之氧化程度隨著該層之厚度而變化,因此,例如一接觸層可經分級以便於和緊接的IR反射層之接觸介面處經氧化,其氧化程度低於該接觸層(群)之另一部份或離該緊接的IR反射層更/最遠的部份之氧化程度。氧化分級接觸層之各種類型的說明係揭示在美國專利第6,576,349號內,其揭示文在此併入本案以為參考資料。在本發明之不同實施例中,在整個IR反射層之範圍內,接觸層11及/或21(例如由Ni及/或Cr之氧化物所組成或包括其等)可或可不具連續性。
在本發明之某些實例實施例中,介電層13及23可以由氧化錫所組成或包括氧化錫。然而,就文中之其它層而言,在不同實例中可使用其它材料。
在本發明之某些實施例中,下接觸層7及/或17係由氧化鋅(例如ZnO)所組成或包括氧化鋅。層7及17之氧化鋅亦可含有其它材料,諸如鋁(例如用以形成ZnAlOx)。例如在本發明之某些實例實施例中,氧化鋅層7、17中之一或多者可經自約1至10%鋁、更佳自約1至5%鋁、且最佳約1至4%鋁摻雜。
由氧化錫所組成或包括其之中間層15係提供在IR反射層19下,因此係位於氮化矽層14’與氧化鋅層17之間。此種含氧化錫之中間層15的使用遠優於未提供該層的情況。例如業經發現此種含氧化錫之中間層15的使用可致使一經塗覆物件可獲得:(a)由於熱處置而產生之低可見透射率改變、(b)在熱處置後之較高可見透射 率、(c)由於熱處置而導致之某色值(群)的改變較小、(d)在熱處置後之實質上中性著色、(e)由於熱處置而導致更穩定或甚至降低的薄膜電阻、(f)在熱處置後之較低薄膜電阻且因此得到的較低發射率、(g)在熱處置後之改良霧度特性、及/或在熱處置前及/或後之改良機械持久性,諸如抗刮性。因此,在本發明之某些實施實施例中,在熱處置期間,可以使經塗覆物件接受較高溫度及/或費時較長的時間且不會承受非所欲顯著的透射率下降及/或薄膜電阻之增加。在某些另外實施例中,可以使用其它材料(諸如Al、Zn等)摻雜該層15之氧化錫。或者,在某些實例中,其它金屬氧化物(群)可用於層15。
在本發明之某些實例實施例中,介電層6可以由氧化鈦所組成或包括氧化鈦。在不同的實例實施例中,該氧化鈦層可以由TiO2所組成或包括TiO2、或任何其它合適化學計量。
亦可提供位於所闡明該塗層之下或上的其它層(群)。因此,雖然該層系統或塗層係直接或間接位於基板1之上或經其承載,亦可提供其它層(群)於其間。因此,例如圖1之塗層可被視為在該基板1上且經其承載,即便其它層(群)係提供在層3與基板1之間。而且,在某些實施例中,所闡明該塗層之某些層可經移除,而可添加其它層在各該層之間,或只要不違背本發明之某些實施例的總精神,在本發明之其它實施例中,在分裂部位之間各該層(群)可以與所添加的其它層(群)一起分裂。
在本發明之不同實施例中,雖然各種厚度及材料可用於層中,但是就圖1實施例內之該玻璃基板1上的各該層而言,自該玻璃基板向外算起:實例材料/厚度/;圖1實施例
可知該底吸收劑層4實質上比上吸收劑層25更厚。例如在某些實施例中,該底吸收劑層4比上吸收劑 層25厚至少40埃、更佳至少60埃、且又更佳至少80埃。而且,就吸收劑層4及/或25中之一者或兩者而言,該底氮化矽層(3及/或24)比上氮化矽層(5及/或26)更薄。例如在某些實施例中,在吸收劑層4及/或25周圍的底氮化矽層(3及/或24)比上氮化矽層(5及/或26)薄至少10埃、更佳至少約20或25埃。
在本發明之某些實例實施例中,當整片式測定時,文中經塗覆物件可具下表2內所揭示的光學及太陽能特性。文中之薄膜電阻(Rs)有考慮到所有IR反射層(例如銀層9、19)。
光學/太陽能特性(整片式;預-HT)
在某些實例實施例中,在經熱處置(HT)後,例如整片或測定,文中之經塗覆物件可具有以下特徵:光學/太陽能特性(整片式;後-HT)
而且,在本發明之某些實例層合的實施例中,業經選擇性熱處置至足以進行回火的程度且業經與另一玻璃基板結合以形成一IG單元之文中的經塗覆物件可具有如圖2內所示之結構(例如其中兩玻璃薄片分別為4及6毫米厚之透明玻璃,且其間之16毫米間隙係充填90/10氬/空氣)內的以下IG單元光學/太陽能特性。可知當放在一IG窗單元內時,該膜側反射率會增加。
實例光學特性(預或後-HT之IG單元)
除非有特定主張,僅提供以下實例作為實例用,且無意限制本發明。
實例
經由濺鍍在6毫米厚透明玻璃基板上以大約具有下文揭示之層堆疊而製成以下實列1。實例1為根據 如圖1內所示之本發明的實例實施例,然而下文之比較例(CE)僅在該堆疊之中間具有一NiCr吸收層且其係用於比較。實例1大約具有以下層堆疊,其中該等厚度的單位為埃(Å),且該等NiCr吸收層4及25經輕微氮化。
實例1
除了在該比較例(CE)內,該吸收層係僅位於該等銀層間的中間堆疊內不同外,該CE具有一與實例1類似的NiCr吸收層。自該玻璃向外算起,該CE具有以下層堆疊。
比較例
下文揭示與該比較例(CE)比較之實例1的光學特性,其係經整片式測定。
實例1與比較例之比較
自上文可知,即便實例1之可見透射率(TY)亦低於該CE,亦即實例1之可見透射率為9%,而CE之可見透視率為32.3%,實例1之可見膜側反射率(RfY)令人驚訝地優於(低於)比較例(CE)。因此,在實例1之該低發射率塗層之下及上部份內的吸收層4及25(與如在該CE之僅在中央部份內不同)令人驚訝地致使該低發射率塗層具有兼具以下特性之組合:(i)一低可具透射率、及(ii)低可見膜側反射率。
在本發明之某些實例實施例中,係提供一包括藉一玻璃基板1而承載的塗層30之經塗覆物件,該塗層包含:含銀之第一及第二紅外線(IR)反射層9及19,其中該等IR反射層9及19係藉位於其間之至少一介電層(13、14、15及/或16)而此彼分隔開,且其中該第一IR反射層9之位置比第二IR反射層19更接近該玻璃基板1;含Ni及/或Cr之第一實質上金屬性或金屬性吸收層4的位置可致使該第一吸收層4位於該玻璃基板1與第一IR反射層之間,含Ni及/或Cr之第二實質上金屬性或金屬性吸收層25的位置可致使該第一及第二IR反射層9及19位於該玻璃基板1與第二吸收層25之間,且其中該第一吸收層4與該第二吸收層25各夾在含氮化矽之介電層(3、5;24、26)之間且接觸其等。
在該上一段落之經塗覆物件內,該第一及第二吸收層各可含有NiCr及/或NiCrNx
在前述兩段落中之任一者的該經塗覆物件 內,該第一及/或第二吸收層各可含自1-15%氮(原子%)。
在前述三段落中之任一者的該經塗覆物件內,該第一與第二IR反射層9、19可藉至少以下而被分隔:一含氧化錫之層13、含氮化矽之層14、及一含氧化鋅之層17,且前述順序係遠離該玻璃基板的順序。
在前述四段落中之任一者的該經塗覆物件內,在某些實例實施例中,於該第一及第二IR反射層之間並無金屬性或實質上金屬性吸收層。
在前述五段落中之任一者的該經塗覆物件內,在某些實施例中,在該塗層內僅含兩含銀之IR反射層。
在前述六段落中之任一者的該經塗覆物件內,該第一吸收層之厚度可以是自約120-200埃(Å)。
在前述七段落中之任一者的該經塗覆物件內,該第二吸收層之厚度可以是自約12-30埃(Å)。
在前述八段落中之任一者的該經塗覆物件內,該第一吸收層4可以實質上比該第二吸收層25還厚。
在前述九段落中之任一者的該經塗覆物件內,經整片式測定,該經塗覆物件可具有一自約20-43%(更佳自約24-33%)之可見透射率。
在前述十段落中之任一者的該經塗覆物件內,該經塗覆物件可經熱處置(例如熱回火)或未經熱處置。
在前述十一段落中之任一者的該經塗覆物 件內,在某些實例實施例中,該塗層可含有不超過兩含NiCr或NiCrNx之金屬性或實質上金屬性吸收層。
在前述十二段落中之任一者的該經塗覆物件內,該塗層可進一步包含一位於該第一IR反射層9與該第一吸收層4之間的含氧化鈦之層6。
在前述十三段落中之任一者的該經塗覆物件內,該第一IR反射層9及該第一吸收層4可藉至少以下而被分隔:該位於第一吸收層4之上且可接觸其之含氮化矽的層5、一含氧化鈦之層6、及含氧化鋅之層7,且前述順序係遠離該玻璃基板的順序。
在前述十四段落中之任一者的該經塗覆物件內,經整片或測定,該經塗覆物件可具有一小於或等於15%、更佳小於或等於12%之可見膜側反射率(RfY)。
在前述十五段落中之任一者的該經塗覆物件內,經整片式測定,該經塗覆物件之可見膜側反射率(RfY)小於該經塗覆物件之可見玻璃側反射率(RgY);例如可見膜側反射率(RfY)比該經塗覆物件之可見玻璃側反射率(RgY)小至少5%點。
在本發明之某些實例實施例中,係提供一包括藉一玻璃基板而承載之塗層的經塗覆物件,該塗層包含:第一及第二紅外線(IR)反射層,其中該等IR反射層係藉至少一位於其間之介電層而彼此分隔,且其中該第一IR反射層的位置比該第二IR反射層更接近該玻璃基板;一第一實質上金屬性或金屬性吸收層,其位置可致使該第 一吸收層位於該玻璃基板與該第一IR反射層之間;一第二實質上金屬性或金屬性吸收層,其位置可致使該第一與第二IR反射層皆位於該玻璃基板與該第二吸收層之間,且其中該第一吸收層及該第二吸收層係各夾在該等含氮化矽之介電層之間且接觸其等。
在該上一段落之經塗覆物件內,該第一及第二吸收層可各包含NiCr及/或NiCrNx、或基本上由其等所組成。
在前述兩段落中之任一者的經塗覆物件內,該第一及/或第二吸收層可各包含自1-15%氮(原子%)。
在前述三段落中之任一者的經塗覆物件內,該第一及第二IR反射層可藉至少以下而被分隔:一含氧化錫之層、一含氮化矽之層、及一含氧化鋅之層,且前述順序係遠離該玻璃基板的順序。
在前述四段落中之任一者的經塗覆物件內,在某實例實施例中,在該第一與第二IR反射層之間並無金屬性或實質上金屬性吸收層。
在前述五段落中之任一者的經塗覆物件內,在某些實例實施例中,僅兩含銀及/或金的IR反射層包含在該塗層內。
在前述六段落中之任一者的經塗覆物件內,該第一吸收層之厚度可以是自約120-200埃(Å)。
在前述七段落中之任一者的經塗覆物件 內,該第二吸收層之厚度可以是自約12-30埃(Å)。
在前述八段落中之任一者的經塗覆物件內,該第一吸收層4可實質上比該第二吸收層25還原。
在前述九段落中之任一者的經塗覆物件內,經整片式測定,該經塗覆物件可具有一自約20-43%(更佳自約24-33%)之可見透射率。
在前述十段落中之任一者的經塗覆物件內,該經塗覆物件可經熱處置(例如熱回火)或未經熱處置。
在前述十一段落中之任一者的經塗覆物件內,在某些實例實施例中,該塗層可含有不超過兩金屬性或實質上金屬性吸收層(附註:文中之銀或金IR反射層為IR反射層而非吸收層)。
在前述十二段落中之任一者的經塗覆物件內,該塗覆層可進一步包含一位於該第一IR反射層與該第一吸收層之間的含氧化鈦之層。
在前述十三段落中之任一者的經塗覆物件內,該第一IR反射層與該第一吸收層可藉至少以下而被分隔:該位於第一吸收層之上且直接接觸其的含氮化矽之層、一含氧化鈦之層、及一含氧化鋅之層,且前述順序係遠離該玻璃基板的順序。
在前述十四段落中之任一者的經塗覆物件內,經整片式測量,該經塗覆物件可具有一小於或等於15%、更佳小於或等於12%之可見膜側反射率(RfY)。
在前述十五段落中之任一者的經塗覆物件內,經整片式測量,該經覆物件之可見膜側反射率(RfY)可小於該經塗覆物件之可見玻璃側反射率(RgY);例如一可見膜側反射率(RfY)比該經塗覆物件之可見玻璃側反射率(RgY)小至少5%點。
雖然本發明業經參考目前被認為最實用且較佳的實施例加以說明,但是應瞭解本發明並不受限於所揭示該實施例,而係恰恰相反地意欲涵蓋屬於附加申請專利之精神及範圍的各種修飾及相等安排。

Claims (17)

  1. 一種經塗覆物件,其包括一藉一玻璃基板而承載的塗層,該塗層包含:含銀之第一及第二紅外線(IR)反射層,其中該等IR反射層係藉至少一位於其間之介電層而彼此分隔,且其中該第一IR反射層的位置比該第二IR反射層更接近該玻璃基板;含Zr之第一吸收層,其位置可致使該第一吸收層位於該玻璃基板與該第一IR反射層之間;含Zr之第二吸收層,其位置可致使該第一及第二IR反射層皆位於該玻璃基板與該第二吸收層之間,其中該第一吸收層及第二吸收層係各夾在介電層之間且接觸其等介電層,其中該第一及第二吸收層各包含自0至10%氧(原子%)及自1至15%氮(原子%);其中該第一吸收層比該第二吸收層厚至少40埃(Å);其中並無金屬性吸附層位於該含銀之第一及第二IR反射層之間;其中經整片式測定,該經塗覆物件具有一自約20-43%之可見透射率;及其中經整片式測定,該經塗覆物件之可見膜側反射率(RfY)低於該經塗覆物件之可見玻璃側反射率(RgY)。
  2. 如請求項1之經塗覆物件,其中該第一及第二IR反射層係藉至少以下而被分隔:一含氧化錫之 層、一含氮化矽之層、及一含氧化鋅之層,且前述順序係遠離該玻璃基板的順序。
  3. 如請求項1之經塗覆物件,其中僅兩層含銀之IR反射層包含在該塗層內。
  4. 如請求項1之經塗覆物件,其中該第二吸收層的厚度為自約12-30埃(Å)。
  5. 如請求項1之經塗覆物件,其中經整片式測定,該經塗覆物件具有一自約24-33%之可見透射率。
  6. 如請求項1之經塗覆物件,其中該經塗覆物件係經熱回火。
  7. 如請求項1之經塗覆物件,其中該經塗覆物件並未經熱處置。
  8. 如請求項1之經塗覆物件,其中該塗層進一步包含一位於該第一IR反射層與該第一吸收層之間的含氧化鈦之層。
  9. 如請求項1之經塗覆物件,其中該第一IR反射層及該第一吸收層係藉至少以下而被分隔:一位於第一吸收層之上且直接接觸其的含氮化矽之層、一含氧化鈦之層、及一含氧化鋅之層,且前述順序係遠離該玻璃基板的順序。
  10. 如請求項1之經塗覆物件,其中經整片式測定,該經塗覆物件具有一小於或等於15%之可見膜側反射率(RfY)。
  11. 一種經塗覆物件,其包括一藉一玻璃基板 而承載的塗層,該塗層包含:含銀之第一及第二紅外線(IR)反射層,其中該等IR反射層係藉至少一位於其間之介電層而彼此分隔,且其中該第一IR反射層之位置比該第二IR反射層更接近該玻璃基板;含NiCr之第一吸收層,其位置可致使該第一吸收層位於該玻璃基板與該第一IR反射層之間;含NiCr之第二吸收層,其位置可致使該第一及第二IR反射層皆位於該玻璃基板與該第二吸收層之間;且其中該第一吸收層與該第二吸收層係各夾在介電層之間並與介電層接觸;其中該第一及第二吸收層各包含自0至10%氧(原子%)及自1至15%氮(原子%);其中該第一吸收層比該第二吸收層厚至少40埃(Å);其中並無金屬性吸附層位於該含銀之第一及第二IR反射層之間;其中經整片式測定,該經塗覆物件具有一自約20-43%之可見透射率;及其中經整片式測定,該經塗覆物件之可見膜側反射率(RfY)低於該經塗覆物件之可見玻璃側反射率(RgY)。
  12. 如請求項11之經塗覆物件,其中該第一及第二IR反射層係藉至少以下而被分隔:一含氧化錫之層、一含氮化矽之層、及一含氧化鋅之層,且前述順序係遠離該玻璃基板的順序。
  13. 如請求項11之經塗覆物件,其中僅兩層含銀之IR反射層包含在該塗層內。
  14. 如請求項11之經塗覆物件,其中該第二吸收層的厚度為自約12-30埃(Å)。
  15. 如請求項11之經塗覆物件,其中經整片式測定,該經塗覆物件具有一小於或等於15%之可見膜側反射率(RfY)。
  16. 如請求項11之經塗覆物件,其中該第一及第二吸收層基本上由NiCr所組成。
  17. 如請求項11之經塗覆物件,其中經整片式測定,該經塗覆物件具有一小於或等於11%之可見膜側反射率(RfY)。
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TWI630183B (zh) 2018-07-21
EP2892858A2 (en) 2015-07-15
IN2015DN01872A (zh) 2015-08-07
RU2637003C2 (ru) 2017-11-29
MX2015002863A (es) 2015-10-09
JP6324386B2 (ja) 2018-05-16
WO2014039345A3 (en) 2014-07-17
EP2892858B1 (en) 2019-06-19
TW201412674A (zh) 2014-04-01
TWI605027B (zh) 2017-11-11
KR20150054863A (ko) 2015-05-20
JP2015529187A (ja) 2015-10-05
US20190047908A1 (en) 2019-02-14
US10112866B2 (en) 2018-10-30
RU2015112577A (ru) 2016-11-10
US9150003B2 (en) 2015-10-06
WO2014039345A2 (en) 2014-03-13
BR112015005017A2 (pt) 2017-07-04
US20180208502A1 (en) 2018-07-26
US20160221866A1 (en) 2016-08-04
US9919961B2 (en) 2018-03-20
PL2892858T3 (pl) 2020-03-31
US20160002102A1 (en) 2016-01-07
ES2744493T3 (es) 2020-02-25
CN104936924A (zh) 2015-09-23
US9328017B2 (en) 2016-05-03
US20140072784A1 (en) 2014-03-13
US10487011B2 (en) 2019-11-26

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