TW201819687A - Electrode for electrolysis - Google Patents

Electrode for electrolysis Download PDF

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TW201819687A
TW201819687A TW106140318A TW106140318A TW201819687A TW 201819687 A TW201819687 A TW 201819687A TW 106140318 A TW106140318 A TW 106140318A TW 106140318 A TW106140318 A TW 106140318A TW 201819687 A TW201819687 A TW 201819687A
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electrolysis
electrode
catalyst layer
ruthenium
transition metal
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TWI661091B (en
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宮阪豊光
西澤誠
角佳典
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日商旭化成股份有限公司
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    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
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    • C25B1/00Electrolytic production of inorganic compounds or non-metals
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    • C25B1/34Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C25B1/46Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
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    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
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    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/097Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
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    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
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    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
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    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C25B9/23Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded

Abstract

This electrode for electrolysis is provided with a conductive base material and a catalyst layer that is formed on the surface of the conductive base material. The catalyst layer contains elemental ruthenium, elemental iridium, elemental titanium and at least one first transition metal element selected from the group consisting of Sc, V, Cr, Fe, Co, Ni, Cu and Zn; the content ratio of the first transition metal element contained in the catalyst layer relative to 1 mole of the elemental titanium is 0.25% by mole or more but less than 3.4% by mole; and the D value serving as an index for the electric double layer capacity of this electrode for electrolysis is from 120 C/m2 to 420 C/m2 (inclusive).

Description

電解用電極Electrolysis electrode

本發明係關於一種電解用電極及其製造方法、以及具備該電解用電極之電解槽。The present invention relates to an electrode for electrolysis, a method for manufacturing the same, and an electrolytic cell including the electrode for electrolysis.

離子交換膜法食鹽電解係如下方法:使用電解用電極對鹽水進行電解(electrolytic),而製造苛性鈉、氯、及氫。於離子交換膜法食鹽電解製程中,為了削減耗電量而要求一種可持續長期地維持較低之電解電壓之技術。 若詳細地對電解電壓之詳細內容進行分析,則明確了如下情況:除理論上所需之電解電壓以外,亦包括起因於離子交換膜之電阻及電解槽之構造電阻之電壓、作為電解用電極之陽極及陰極之過電壓、起因於陽極與陰極之間之距離之電壓等。又,若持續長期地繼續電解,則亦有產生由鹽水中之雜質等各種原因引起之電壓上升等之情況。 於上述電解電壓中,為了減小氯產生用陽極之過電壓而進行過各種研究。例如於專利文獻1中,揭示有於鈦基材上被覆釕等鉑族金屬之氧化物而成之不溶性陽極之技術。該陽極係稱為DSA(註冊商標,Dimension Stable Anode:尺寸穩定性陽極)。又,於非專利文獻1中,記載有使用DSA之鈉電解技術之變遷。 關於上述DSA,迄今為止亦實施過各種改良,並進行過針對性能改善之研究。 例如於專利文獻2中,報告有著眼於鉑族中鈀之較低氯過電壓與較高氧過電壓,而將鉑與鈀合金化而成之氯產生用電極。於專利文獻3及專利文獻4中,提出有對鉑-鈀合金之表面進行氧化處理,而於表面形成有氧化鈀之電極。又,於專利文獻5中,提出有經以錫之氧化物作為主成分且含有釕、銥、鈀、及鈮之各氧化物之外部觸媒層被覆之電極。為了藉由該電極獲得氧濃度較低之高純度氯而進行過欲抑制與氯產生同時發生之陽極中之氧產生反應的嘗試。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特公昭46-021884號公報 [專利文獻2]日本專利特公昭45-11014號公報 [專利文獻3]日本專利特公昭45-11015號公報 [專利文獻4]日本專利特公昭48-3954號公報 [專利文獻5]日本專利特表2012-508326號公報 [非專利文獻] [非專利文獻1]相川洋明著,「國立科學博物館 技術之系統化調查報告 第8集」,獨立行政法人 國立科學博物館發行,2007年3月30日,p32The ion-exchange membrane method of salt electrolysis is a method in which brine is electrolyzed using an electrode for electrolysis to produce caustic soda, chlorine, and hydrogen. In the salt-electrolysis process of the ion-exchange membrane method, in order to reduce power consumption, a technique for maintaining a low electrolytic voltage for a long period of time is required. If the detailed content of the electrolytic voltage is analyzed in detail, it is clear that in addition to the theoretically required electrolytic voltage, it also includes the voltage caused by the resistance of the ion exchange membrane and the structural resistance of the electrolytic cell, and serves as the electrode for electrolysis Over voltage of anode and cathode, voltage due to the distance between anode and cathode, etc. In addition, if the electrolysis is continued for a long period of time, a voltage rise due to various reasons such as impurities in the brine may occur. Various studies have been conducted on the above-mentioned electrolytic voltage in order to reduce the overvoltage of the anode for generating chlorine. For example, Patent Document 1 discloses a technology of an insoluble anode formed by coating an oxide of a platinum group metal such as ruthenium on a titanium substrate. This anode is called DSA (registered trademark, Dimension Stable Anode). Also, Non-Patent Document 1 describes a change in sodium electrolysis technology using DSA. Regarding the above-mentioned DSA, various improvements have been implemented so far, and research on performance improvement has been conducted. For example, Patent Document 2 reports an electrode for chlorine generation in which platinum and palladium are alloyed with a lower chlorine overvoltage and a higher oxygen overvoltage of palladium in the platinum group. Patent Documents 3 and 4 propose an electrode in which a surface of a platinum-palladium alloy is oxidized and a palladium oxide is formed on the surface. Further, Patent Document 5 proposes an electrode coated with an external catalyst layer containing an oxide of tin as a main component and containing oxides of ruthenium, iridium, palladium, and niobium. In order to obtain high-purity chlorine with a relatively low oxygen concentration through this electrode, attempts have been made to suppress the oxygen generation reaction in the anode simultaneously with the generation of chlorine. [Prior Art Literature] [Patent Literature] [Patent Literature 1] Japanese Patent Publication No. 46-021884 [Patent Literature 2] Japanese Patent Publication No. 45-11014 [Patent Literature 3] Japanese Patent Publication No. 45-11015 Gazette [Patent Document 4] Japanese Patent Publication No. 48-3954 [Patent Document 5] Japanese Patent Publication No. 2012-508326 [Non-Patent Document] [Non-Patent Document 1] Yoko Aikawa "Systematic Investigation Report, Episode 8", issued by the National Museum of Science and Technology, March 30, 2007, p32

[發明所欲解決之問題] 然而,專利文獻1所記載之DSA等先前之陽極存在如下問題:剛開始電解後之過電壓較高,且由於觸媒之活化而穩定至較低之過電壓為止需要一定期間,因此於電解時產生耗電損失。 又,專利文獻2~4所記載之氯產生用電極存在過電壓較高、耐久性較低之情形。進而於製造專利文獻3及4所記載之電極時,除需基材本身使用合金以外,亦需要於藉由熱分解於該基材上形成氧化物後,藉由還原進行合金化,進而藉由電解氧化進行氧化鈀化等複雜之步驟,即便就實用方面而言,於製造方法上亦需較大之改善。 專利文獻5所記載之電極係對於提高缺乏耐化學品性之鈀之電解持續時間(電極壽命)有一定效果,但不可謂氯產生過電壓充分低者。 如上所述,專利文獻1~5及非專利文獻1所記載之技術無法實現電解初期之過電壓充分低,且能夠持續長期地以低電壓、低耗電量實現電解之電解用電極。 本發明係為了解決上述問題而完成者。因此,本發明之目的在於提供一種可減小電解初期之過電壓,且能夠持續長期地以低電壓、低耗電量實現電解之電解用電極及其製造方法、以及具備該電解用電極之電解槽。 [解決問題之技術手段] 本發明者等人為了解決上述課題而反覆進行了銳意研究。其結果為,發現:將具有以特定之比率含有特定之金屬元素之觸媒層之電解用電極的成為電雙層電容之指標之數值調整為特定之範圍,藉此可減小電解初期之過電壓,且能夠持續長期地以低電壓、低耗電量實現電解,以至完成本發明。 即,本發明係如下所示。 [1] 一種電解用電極,其係具備: 導電性基材、及 形成於上述導電性基材之表面上之觸媒層者,且 上述觸媒層包含釕元素、銥元素、鈦元素、以及選自由Sc、V、Cr、Fe、Co、Ni、Cu及Zn所組成之群中之至少一種第一過渡金屬元素, 上述觸媒層所包含之第一過渡金屬元素相對於上述鈦元素1莫耳之含有比率為0.25莫耳%以上且未達3.4莫耳%, 且上述電解用電極之成為電雙層電容之指標之D值為120 C/m2 以上且420 C/m2 以下。 [2] 如[1]所記載之電解用電極,其中上述第一過渡金屬元素與釕氧化物、銥氧化物及鈦氧化物之固溶體形成固溶體。 [3] 如[1]或[2]所記載之電解用電極,其中上述第一過渡金屬元素包含選自由釩、鈷、銅及鋅所組成之群中之至少一種金屬元素。 [4] 如[1]至[3]中任一項所記載之電解用電極,其中上述第一過渡金屬元素包含釩元素。 [5] 如[1]至[4]中任一項所記載之電解用電極,其中上述第一過渡金屬元素相對於上述觸媒層所包含之所有金屬元素之含有率為10莫耳%以上且30莫耳%以下。 [6] 如[1]至[5]中任一項所記載之電解用電極,其中上述觸媒層所包含之上述第一過渡金屬元素相對於上述釕元素1莫耳之含有比率為0.3莫耳以上且未達2莫耳。 [7] 如[1]至[6]中任一項所記載之電解用電極,其中上述D值為120 C/m2 以上且380 C/m2 以下。 [8] 一種電解用電極之製造方法,其係用以製造如[1]至[7]中任一項所記載之電解用電極之方法,其具有如下步驟: 製備含有釕化合物、銥化合物、鈦化合物、及包含上述第一過渡金屬元素之化合物之塗佈液; 將上述塗佈液塗佈於上述導電性基材之至少單面上而形成塗膜;及 於含氧環境下焙燒上述塗膜而形成上述觸媒層。 [9] 一種電解槽,其具備如[1]至[7]中任一項所記載之電解用電極。 [發明之效果] 根據本發明,提供一種可減小電解初期之過電壓,且能夠持續長期地以低電壓、低耗電量實現電解之電解用電極。[Problems to be Solved by the Invention] However, the previous anodes such as DSA described in Patent Document 1 have the following problems: the overvoltage immediately after the start of electrolysis is high, and it stabilizes to a low overvoltage due to the activation of the catalyst A certain period of time is required, and therefore, power loss occurs during electrolysis. In addition, the chlorine-generating electrodes described in Patent Documents 2 to 4 may have a high overvoltage and low durability. Furthermore, when manufacturing the electrodes described in Patent Documents 3 and 4, in addition to using an alloy as the base material, it is also necessary to perform alloying by reduction after forming an oxide on the base material by thermal decomposition, and then by The complicated steps such as electrolytic oxidation and palladium oxidation need to be greatly improved in terms of manufacturing method, even in terms of practical aspects. The electrode system described in Patent Document 5 has a certain effect on improving the electrolysis duration (electrode life) of palladium, which lacks chemical resistance, but it cannot be said that the overvoltage generated by chlorine is sufficiently low. As described above, the techniques described in Patent Documents 1 to 5 and Non-Patent Document 1 cannot achieve an overvoltage that is sufficiently low in the initial stage of electrolysis, and can continuously achieve electrolysis with low voltage and low power consumption for a long time. The present invention has been made to solve the above problems. Therefore, an object of the present invention is to provide an electrode for electrolysis that can reduce overvoltage in the initial stage of electrolysis, and can continuously perform electrolysis with low voltage and low power consumption for a long period of time, a method for manufacturing the same, and electrolysis provided with the electrode groove. [Technical Means for Solving the Problem] The present inventors and the like have made intensive studies in order to solve the above problems. As a result, it was found that by adjusting the value of the electric double-layer capacitance index of an electrolytic electrode having a catalyst layer containing a specific metal element at a specific ratio to a specific range, the initial stage of electrolysis can be reduced. Voltage, and can achieve electrolysis with low voltage and low power consumption for a long period of time, so that the present invention is completed. That is, the present invention is as follows. [1] An electrode for electrolysis, comprising: a conductive substrate and a catalyst layer formed on a surface of the conductive substrate, wherein the catalyst layer includes a ruthenium element, an iridium element, a titanium element, and At least one first transition metal element selected from the group consisting of Sc, V, Cr, Fe, Co, Ni, Cu, and Zn, and the first transition metal element included in the catalyst layer is 1 mole relative to the titanium element. The ear content ratio is 0.25 mol% or more and less than 3.4 mol%, and the D value of the above-mentioned electrode for electrolysis to be an electric double-layer capacitor is 120 C / m 2 or more and 420 C / m 2 or less. [2] The electrode for electrolysis according to [1], wherein the first transition metal element and the solid solution of ruthenium oxide, iridium oxide, and titanium oxide form a solid solution. [3] The electrode for electrolysis according to [1] or [2], wherein the first transition metal element includes at least one metal element selected from the group consisting of vanadium, cobalt, copper, and zinc. [4] The electrode for electrolysis according to any one of [1] to [3], wherein the first transition metal element includes a vanadium element. [5] The electrode for electrolysis according to any one of [1] to [4], wherein the content ratio of the first transition metal element to all the metal elements contained in the catalyst layer is 10 mol% or more And 30 mol% or less. [6] The electrode for electrolysis according to any one of [1] to [5], wherein a content ratio of the first transition metal element contained in the catalyst layer to 1 mol of the ruthenium element is 0.3 mol Above the ear and less than 2 moles. [7] The electrode for electrolysis according to any one of [1] to [6], wherein the D value is 120 C / m 2 or more and 380 C / m 2 or less. [8] A method for manufacturing an electrode for electrolysis, which is a method for manufacturing the electrode for electrolysis according to any one of [1] to [7], which has the following steps: preparing a ruthenium compound, an iridium compound, A coating liquid of a titanium compound and a compound containing the first transition metal element; forming the coating film by coating the coating liquid on at least one side of the conductive substrate; and firing the coating in an oxygen-containing environment Film to form the catalyst layer. [9] An electrolytic cell provided with the electrode for electrolysis according to any one of [1] to [7]. [Effects of the Invention] According to the present invention, it is possible to provide an electrode for electrolysis that can reduce overvoltage in the initial stage of electrolysis and can achieve electrolysis with low voltage and low power consumption for a long period of time.

以下,對用以實施本發明之形態(以下,簡稱為「本實施形態」)詳細地進行說明。以下之本實施形態係用以說明本發明之例示,並非為將本發明限定於以下之內容之宗旨。本發明可於其主旨之範圍內適當地變化而實施。 本實施形態之電解用電極係具備導電性基材、及形成於上述導電性基材之表面上之觸媒層者,上述觸媒層包含釕元素、銥元素、鈦元素、以及選自由鈧、釩、鉻、鐵、鈷、鎳、銅及鋅所組成之群中之至少一種第一過渡金屬元素(以下,亦將該等過渡金屬元素統稱為「第一過渡金屬元素」)。進而,本實施形態之電解用電極係以如下方式構成:上述觸媒層所包含之第一過渡金屬元素相對於上述鈦元素1莫耳之含有比率為0.25莫耳%以上且未達3.4莫耳%,上述電解用電極之成為電雙層電容之指標之D值為120 C/m2 以上且420 C/m2 以下。 本實施形態中,於觸媒層中除釕元素、銥元素及鈦元素以外,亦使用第一過渡金屬元素,藉此成為如下電解用電極,即藉由X射線光電子光譜法(XPS)所測定之屬於源自RuO2 之Ru3d5/2之波峰的峰位置自RuO2 之280.5 eV位移至高結合能側。再者,XPS之帶電修正係以Ti2p3/2之結合能成為458.4 eV之方式進行修正。Ru3d5/2之峰位置向高結合能側之位移係表示Ru因電荷而被氧化之狀態,認為該狀態係起因於第一過渡金屬元素之添加。例如於添加釩作為第一過渡金屬元素時,產生以下之極化。 RuO2 +VO2 →RuO2 δ+ +VO2 δ- RuO2 δ+ 成為吸附氯之活性吸附部位,且可藉由促進氯吸附而減小氯產生過電壓。 本發明之宗旨並非限定於上述作用機制,本實施形態之電解用電極由於具有上述構成,故而於使用該電解用電極進行電解之情形時,可減小電解初期之過電壓,且能夠持續長期地以低電壓、低耗電量實現電解。本實施形態之電解用電極尤其是於離子交換膜法食鹽電解中可較佳地用作氯產生用電極。 (導電性基材) 本實施形態之電解用電極係於接近飽和之高濃度之食鹽水中並在氯氣產生環境下使用。因此,作為本實施形態中之導電性基材之材質,較佳為具有耐蝕性之閥金屬。作為閥金屬,並不限定於以下,例如可列舉鈦、鉭、鈮、鋯等。就經濟性及與觸媒層之親和性之觀點而言,較佳為鈦。 導電性基材之形狀並無特別限定,可根據目的而選擇適當之形狀。例如可較佳地使用延伸形狀、多孔板、金屬絲網等形狀。導電性基材之厚度較佳為0.1~2 mm。 為了提高與觸媒層之密接性,導電性基材之與觸媒層之接觸表面較佳為實施表面積增大處理。作為表面積增大處理之方法,並不限定於以下,例如可列舉:使用切斷絲(cut wire)、鋼礫、鋁礫等之噴砂處理;使用硫酸或鹽酸之酸處理等。於該等處理中,較佳為如下方法:於藉由噴砂處理而於導電性基材之表面形成凹凸後,進而進行酸處理。 (觸媒層) 形成於實施過上述處理之導電性基材之表面上之觸媒層包含釕元素、銥元素、鈦元素及第一過渡金屬元素。 釕元素、銥元素、及鈦元素較佳為分別處於氧化物之形態。 作為釕氧化物,並不限定於以下,例如可列舉RuO2 等。 作為銥氧化物,並不限定於以下,例如可列舉IrO2 等。 作為鈦氧化物,並不限定於以下,例如可列舉TiO2 等。 於本實施形態之觸媒層中,釕氧化物、銥氧化物、及鈦氧化物較佳為形成固溶體。藉由釕氧化物、銥氧化物、及鈦氧化物形成固溶體,而釕氧化物之耐久性進一步提高。 所謂固溶體,通常係指2種以上之物質相互溶合,整體成為均勻之固相者。作為形成固溶體之物質,可列舉金屬單體、金屬氧化物等。尤其是於適於本實施形態之金屬氧化物之固溶體之情形時,在氧化物結晶構造中之單位晶格中之等效晶格點上不規則地排列有2種以上的金屬原子。具體而言,較佳為釕氧化物、銥氧化物與鈦氧化物相互地混合,若自釕氧化物之側觀察,則釕原子經銥原子或鈦原子或者該等兩者取代之取代型固溶體。其固溶狀態並無特別限定,亦可存在局部固溶之區域。 因固溶而結晶構造中之單位晶格之尺寸略微產生變化。該變化之程度例如可根據如下等情況進行確認:於粉末X射線繞射之測定中,起因於結晶構造之繞射圖案不會產生變化,而起因於單位晶格之尺寸之峰位置產生變化。 於本實施形態之觸媒層中,關於釕元素、銥元素、及鈦元素之含有比率,較佳為相對於釕元素1莫耳,銥元素為0.06~3莫耳,且鈦元素為0.2~8莫耳;更佳為相對於釕元素1莫耳,銥元素為0.2~3莫耳,且鈦元素為0.2~8莫耳;進而較佳為相對於釕元素1莫耳,銥元素為0.3~2莫耳,且鈦元素為0.2~6莫耳;尤佳為相對於釕元素1莫耳,銥元素為0.5~1.5莫耳,且鈦元素為0.2~3莫耳。藉由將3種元素之含有比率設為上述範圍,而有電解用電極之長期耐久性更為提高之傾向。銥、釕、及鈦亦可分別以除氧化物以外之形態、例如以金屬單質之形式包含於觸媒層中。 本實施形態之觸媒層係將第一過渡金屬元素與上述釕元素、銥元素、及鈦元素一併包含。第一過渡金屬元素之存在形態並無特別限定,只要包含於觸媒層中,則例如可為氧化物之形態,亦可為金屬單質,亦可為合金。於本實施形態中,就觸媒層之耐久性之觀點而言,第一過渡金屬元素較佳為與釕氧化物、銥氧化物及鈦氧化物之固溶體形成固溶體。例如可藉由XRD(X-ray Diffraction,X射線繞射測定)而確認形成有此種固溶體。又,可藉由將形成觸媒層時之焙燒溫度或第一過渡金屬元素之添加量等調整為適當之範圍而形成上述固溶體。 於本實施形態中,就兼顧觸媒層之電壓與耐久性之觀點而言,第一過渡金屬元素較佳為包含選自由釩、鈷、銅及鋅所組成之群中之金屬元素,第一過渡金屬元素更佳為包含釩元素。 本實施形態中之上述第一過渡金屬元素相對於觸媒層所包含之所有金屬元素之含有率較佳為10莫耳%以上且30莫耳%以下,更佳為超過10莫耳%且22.5莫耳%以下,進而較佳為12莫耳%以上且20莫耳%以下。於第一過渡金屬元素包含釩之情形時,釩相對於觸媒層所包含之所有金屬元素之含有率特佳為滿足上述範圍。 上述含有比率係主要源自於下述較佳之電解用電極之製造方法中所製備之塗佈液中的各元素之饋入比者,可藉由下述之剖面STEM(Scanning Transmission Electron Microscope,掃描穿透式電子顯微鏡)-EDX(Energy Dispersive X-Ray Analysis,能量分散型X射線分析)或利用X射線光電子光譜法(XPS)進行之深度方向分析而確認。 於第一過渡金屬元素之含有比率為10莫耳%以上之情形時,有可自電解初期減小氯產生過電壓或電解電壓之傾向。又,於第一過渡金屬元素之含有比率為30莫耳%以下之情形時,有充分地確保釕氧化物之耐久性之傾向。 本實施形態中之觸媒層所包含之上述第一過渡金屬元素相對於上述釕元素1莫耳之含有比率較佳為0.3莫耳以上且未達2莫耳,更佳為0.5莫耳以上且未達2莫耳,進而較佳為0.5莫耳以上且未達1.8莫耳。於第一過渡金屬元素包含釩之情形時,特佳為釩相對於觸媒層所包含之釕元素1莫耳之含有比率滿足上述範圍。 上述含有比率係主要源自於下述較佳之電解用電極之製造方法中所製備之塗佈液中的各元素之饋入比者,可藉由下述之利用剖面STEM-EDX或X射線光電子光譜法(XPS)之深度方向分析而確認。 於第一過渡金屬元素之含有比率以相對於釕元素1莫耳之莫耳數計為0.3莫耳以上之情形時,有可自電解初期減小氯產生過電壓或電解電壓之傾向,且有可充分地提高下述之成為電雙層電容之指標之D值的傾向。又,於未達2莫耳之情形時,有充分地確保釕氧化物之耐久性之傾向。 本實施形態中之觸媒層所包含之上述第一過渡金屬元素相對於上述鈦元素1莫耳之含有比率為0.25莫耳以上且未達3.4莫耳,較佳為0.25莫耳以上且未達2.6莫耳。於第一過渡金屬元素包含釩之情形時,特佳為釩相對於觸媒層所包含之鈦元素1莫耳之含有比率滿足上述範圍。 上述含有比率係主要源自於下述較佳之電解用電極之製造方法中所製備之塗佈液中的各元素之饋入比者,可藉由下述之利用剖面STEM-EDX或X射線光電子光譜法(XPS)之深度方向分析而確認。 於第一過渡金屬元素之含有比率以相對於鈦元素1莫耳之莫耳數計為0.25莫耳以上之情形時,有可自電解初期減小氯產生過電壓或電解電壓之傾向,且有可充分地提高下述之成為電雙層電容之指標之D值的傾向。又,於未達3.4莫耳之情形時,有充分地確保釕氧化物之耐久性之傾向。 電解用電極中之觸媒層中之V與Ti之元素比(莫耳比)例如可藉由剖面STEM-EDX或利用X射線光電子光譜法(XPS)進行之深度方向分析等而確認。例如於以下表示如下方法:藉由XPS深度方向定量分析而求出包含釕元素、銥元素、鈦元素及作為第一過渡金屬元素之釩元素之觸媒層中之V與Ti的元素比(莫耳比)。再者,此處使用Ti基材作為導電性基材。 XPS測定條件可設為如下。 裝置:ULVAC-PHI公司製造之PHI5000VersaProbeII; 激發源:單色化AlKα(15 kV×0.3 mA); 分析尺寸:約200 μmf ; 光電子提取角:45°; 通能(PassEnergy):46.95 eV(窄掃描(Narrow scan)) 又,Ar 濺鍍條件可設為如下。 加速電壓:2 kV; 掃描場範圍:2 mm見方; 有Zalar旋轉。 關於濃度之計算方法,Ru、Ir、Ti、V之定量所使用之光電子峰之分光學能階為Ru3d、Ir4f、Ti2p、V2p3/2。由於分別為Ru3p3/2與Ti2p重疊,Ti3s與Ir4f重疊,故而可藉由以下之順序進行定量。 (1)使用裝置所附帶之分析軟體「MaltiPak」求出各濺鍍時間(各深度)之Ru3d、Ir4f(包含Ti3s)、Ti2p(包含Ru3p3/2)、V2p3/2之波峰之面積強度(以下,峰面積強度)。 (2)基於Ru3d之峰面積強度而算出Ru3p3/2之峰面積強度。算出係使用MaltiPak之經修正相對感度因子(Corrected RSF)(根據通能之值而修正過之相對感度因子)之比而進行。自包含Ru3p3/2之Ti2p之峰面積強度減去上述Ru3p3/2之峰面積強度而算出僅Ti2p的峰面積強度。 (3)基於經修正之Ti2p之峰面積強度,並利用經修正相對感度因子(Corrected RSF)之比算出Ti3s之峰面積強度。自包含Ti3s之Ir4f之峰面積強度減去上述Ti3s之峰面積強度而算出僅Ir4f的峰面積強度。 關於藉由XPS深度方向定量分析所求出之觸媒層中之V與Ti之元素比(莫耳比)的實測值,係基於下述計算式而設為如下兩值之比,即累計檢測到V之觸媒層之深度範圍內之各深度時的V2p3/2之峰面積強度並除以V2p3/2之經修正相對感度因子所得之值、及累計各深度時之Ti2p之峰面積強度並除以Ti2p之經修正相對感度因子(Corrected RSF)所得之值。關於累計各元素之峰面積強度之觸媒層之深度範圍,例如於觸媒層為單層之情形時,設為自最表面直至開始檢測到源自Ti基材之Ti之信號為止之深度範圍。此處,於觸媒層為多層之情形時,關於除直接形成於Ti基材表面之觸媒層以外之層,係設為各觸媒層之深度範圍,關於直接形成於Ti基材表面之觸媒層,係設為直至開始檢測到源自Ti基材之Ti之信號為止的深度範圍。 [數1]於圖2中表示針對V與Ti之元素比(莫耳比)不同之下述4個試樣a~d,將利用上述測定方法並藉由XPS深度方向分析所求出之V/Ti的實測值、與塗佈液中之饋入V/Ti值進行繪製所得之結果。 (試樣a)V/Ti饋入比為0.11之電解用電極 使用以釕、銥、鈦與釩之元素比(莫耳比)分別成為23.75∶23.75∶47.5∶5之方式調製而成之塗佈液a並塗佈至導電性基材,除此之外,藉由與下述之實施例1相同之方法而獲得之電解用電極。 (試樣b)V/Ti饋入比為0.22之電解用電極 使用以釕、銥、鈦與釩之元素比(莫耳比)分別成為22.5∶22.5∶45∶10之方式調製而成之塗佈液b並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而獲得之電解用電極。 (試樣c)V/Ti饋入比為0.35之電解用電極 藉由與下述之實施例1相同之方法而獲得之電解用電極。 (試樣d)V/Ti饋入比為1.13之電解用電極 藉由與下述之實施例3相同之方法而獲得之電解用電極。 如圖2所示,V/Ti之實測值與饋入值顯現出正關聯,因此可藉由該校正曲線而求出包含釕元素、銥元素、鈦元素及釩元素之觸媒層中之V與Ti之元素比(莫耳比)。於觸媒層中所包含之成分產生變化之情形時,藉由相同之方法製作V/Ti之實測值與饋入值之校正曲線,藉此可求出觸媒層中之V與Ti之元素比(莫耳比)。 再者,於本實施形態之電解用電極中,觸媒層可僅包含1層,亦可為2層以上之多層構造。於為多層構造之情形時,只要其中至少1層所包含之上述第一過渡金屬元素相對於上述鈦元素1莫耳之含有比率為0.25莫耳以上且未達3.4莫耳即可,其他層亦可為不滿足該含有比率者。 本實施形態之電解用電極之特徵在於:成為電雙層電容之指標之D值為120 C/m2 以上且420 C/m2 以下。又,更佳為120 C/m2 以上且380 C/m2 以下,進而較佳為150 C/m2 以上且360 C/m2 以下。藉由D值為120 C/m2 以上而可抑制氯產生過電壓,而降低電解電壓。又,藉由為420 C/m2 以下而可維持釕氧化物之耐久性。 此處所謂成為電雙層電容之指標之D值,係利用電雙層電容之概念所算出之值,且認為電極之表面積(即,電極上之觸媒層之比表面積)越大,則該值變得越大。又,例如可藉由將第一過渡金屬元素之含量調整為上述較佳之範圍,而使D值為上述範圍。尤其是藉由使第一過渡金屬元素之含量變大,而有D值亦變大之傾向。又,藉由提昇形成觸媒層時之焙燒溫度(後烘烤溫度)而有D值變小之傾向。具體而言,可藉由下述之實施例所記載之方法、即循環伏安法,並使用相對於某一掃描速度(V/秒)所測定之電解電流密度(A/m2 )之值而算出。更詳細而言,獲得各掃描速度時所固有之電流密度差(正方向掃描時之電流密度與反方向掃描時之電流密度之差),將縱軸設為電流密度差與作為掃描範圍之0.3 V之乘積,將橫軸設為掃描速度從而繪製各資料,之後將對各繪製所得之曲線進行線性近似時之斜率設為D值。此處,電流密度差與作為掃描範圍之0.3 V之乘積係常與掃描速度成正比,因此可藉由下述式(a)表示D值。藉由將成為電雙層電容之指標之D值設為上述範圍,可不損害所獲得之電解用電極之耐久性而減小電解初期之過電壓。 D(C/m2 )=[電解電流密度之差(A/m2 )×0.3(V)]÷[掃描速度(V/秒)] (a) 本實施形態中之觸媒層含有釕元素、銥元素、鈦元素及第一過渡金屬元素,進而將第一過渡金屬元素與鈦元素之含有比率設為特定之範圍,藉此伴隨成為電雙層電容之指標之D值之增加,作為電解觸媒之功能提高,可減小電解初期之過電壓。 本實施形態中之觸媒層可僅含有上述所說明之釕元素、銥元素、鈦元素及第一過渡金屬元素作為構成元素,除該等以外亦可含有其他金屬元素。作為其他金屬元素之具體例,並不限定於以下,可列舉選自鉭、鈮、錫、鉑等之元素。作為該等其他金屬元素之存在形態,例如可列舉以包含於氧化物中之金屬元素之形式存在等。 於本實施形態中之觸媒層包含其他金屬元素之情形時,其含有比率以其他金屬元素相對於觸媒層所包含之全部金屬元素之莫耳比計,較佳為20莫耳%以下,更佳為10莫耳%以下。 本實施形態中之觸媒層之厚度較佳為0.1~5 μm,更佳為0.5~3 μm。藉由將觸媒層之厚度設為上述下限值以上,而有可充分地維持初期電解性能之傾向。又,藉由將該觸媒層之厚度設為上述上限值以下,而有獲得經濟性優異之電解用電極之傾向。 觸媒層可僅包含一層,亦可為兩層以上。 於觸媒層為兩層以上之情形時,只要其中至少一層為本實施形態中之觸媒層即可。於觸媒層為兩層以上之情形時,較佳為至少最外層為本實施形態中之觸媒層。以相同之組成或不同之組成具有本實施形態中之觸媒層兩層以上的態樣亦較佳。 即便於觸媒層為兩層以上之情形時,本實施形態之觸媒層之厚度亦如上所述,較佳為0.1~5 μm,更佳為0.5~3 μm。 (電解用電極之製造方法) 其次,對本實施形態之電解用電極之製造方法之一例詳細地進行說明。 本實施形態之電解用電極例如可藉由於實施過上述表面積增大處理之導電性基材上形成包含釕元素、銥元素、鈦元素及第一過渡金屬元素之觸媒層而製造。該觸媒層之形成較佳為藉由熱分解法進行。 關於利用熱分解法之製造方法,可藉由於導電性基材上塗佈包含含有上述元素之化合物(前驅物)之混合物之塗佈液後,於含氧環境下進行焙燒,使塗佈液中之成分熱分解而形成觸媒層。根據該方法,可以少於先前之製造方法之步驟數且以較高之生產性製造電解用電極。 此處所謂熱分解,意指於含氧環境下對成為前驅物之金屬鹽等進行焙燒而分解為金屬氧化物或金屬與氣體狀物質。可藉由作為原料調配於塗佈液中之前驅物所包含之金屬種類、金屬鹽之種類、進行熱分解之環境等而控制所獲得之分解產物。通常於氧化性環境下,多量之金屬有易於形成氧化物之傾向。於電解用電極之工業製造製程中,熱分解係通常於空氣中進行。於本實施形態中,焙燒時之氧濃度之範圍亦無特別限定,於空氣中進行即可。然而,亦可視需要,使空氣於焙燒爐內流通、或者供給氧。 作為本實施形態之電解用電極之製造方法之較佳態樣,較佳為具有如下步驟:製備含有釕化合物、銥化合物、鈦化合物、及包含第一過渡金屬元素之化合物之塗佈液;將上述塗佈液塗佈於導電性基材之至少單面上而形成塗膜;及於含氧環境下焙燒上述塗膜而形成觸媒層。再者,釕化合物、銥化合物、鈦化合物、及包含第一過渡金屬元素之化合物係相當於含有本實施形態中之觸媒層所包含之金屬元素的前驅物。藉由上述方法,可製造具有均勻之觸媒層之電解用電極。 於塗佈液所包含之化合物中,釕化合物、銥化合物、及鈦化合物亦可為氧化物,但並非必須為氧化物。例如亦可為金屬鹽等。作為該等金屬鹽,並不限定於以下,例如可列舉選自由氯化物鹽、硝酸鹽、二亞硝基二氨錯合物、亞硝基硝酸鹽、硫酸鹽、乙酸鹽、及金屬烷氧化物所組成之群中之任一種。 作為釕化合物之金屬鹽,並不限定於以下,例如可列舉氯化釕、硝酸釕等。 作為銥化合物之金屬鹽,並不限定於以下,例如可列舉氯化銥、硝酸銥等。 作為鈦化合物之金屬鹽,並不限定於以下,例如可列舉四氯化鈦等。 於塗佈液所包含之化合物中,含有第一過渡金屬元素之化合物可為氧化物,但並非必須為氧化物。例如,較佳為選自由釩之含氧酸以及其鹽;釩之氯化物;釩之硝酸鹽所組成之群中之1種以上。 作為上述含氧酸鹽中之抗衡陽離子,並不限定於以下,例如可列舉Na+ 、K+ 、Ca2+ 等。 關於此種化合物之具體例,作為含氧酸或其鹽,例如可列舉偏釩酸鈉、原釩酸鈉、原釩酸鉀等;作為氯化物,例如可列舉氯化釩等;作為硝酸鹽,例如可列舉硝酸釩等。 上述化合物係視觸媒層中之所需之金屬元素比而適當地選擇來使用。 於塗佈液中,亦可進而包含除上述化合物所包含之化合物以外之其他化合物。作為其他化合物,並不限定於以下,例如可列舉含有鉭、鈮、錫、鉑、銠等金屬元素之金屬化合物;含有鉭、鈮、錫、鉑、銠等金屬元素之有機化合物等。 塗佈液較佳為將上述化合物群溶解或分散於適當之溶劑中而成之液體狀組成物。作為此處所使用之塗佈液之溶劑,可視上述化合物之種類而選擇。例如可使用水;丁醇等醇類等。塗佈液中之總化合物濃度並無特別限定,就適當地控制觸媒層之厚度之觀點而言,較佳為10~150 g/L。 作為將塗佈液塗佈於導電性基材上之表面之方法,並不限定於以下,例如可使用如下方法等:將導電性基材浸漬於塗佈液中之浸漬法;利用毛刷將塗佈液塗敷於導電性基材之表面之方法;使導電性基材通過含浸有塗佈液之海綿狀輥之輥法;使導電性基材與塗佈液帶有相反電荷而進行噴霧之靜電塗佈法。於該等塗佈法中,就工業上之生產性優異之觀點而言,較佳為輥法及靜電塗佈法。藉由該等塗佈法,可於導電性基材之至少單面上形成塗佈液之塗膜。 較佳為於將塗佈液塗佈至導電性基材後,視需要進行使塗膜乾燥之步驟。可藉由該乾燥步驟而將塗膜更牢固地形成於導電性基材之表面。乾燥條件可根據塗佈液之組成、溶劑種類等而適當地選擇。乾燥步驟較佳為於10~90℃之溫度下進行1~20分鐘。 於在導電性基材之表面形成塗佈液之塗膜後,於含氧環境下進行焙燒。焙燒溫度可根據塗佈液之組成及溶劑種類而適當地選擇。焙燒溫度較佳為300~650℃。若焙燒溫度未達300℃,則存在如下情形:釕化合物等前驅物之分解變得不充分,而未獲得包含氧化釕等之觸媒層。若焙燒溫度超過650℃,則存在導電性基材受到氧化之情形,因此存在觸媒層與基材之界面之密接性下降之情況。尤其是於使用鈦製之基材作為導電性基材之情形時,應重視該傾向。 焙燒時間較長為宜。另一方面,就電極之生產性之觀點而言,較佳為以焙燒時間不會變得過長之方式進行調整。若考慮該等情形,則1次之焙燒時間較佳為5~60分鐘。 可視需要反覆進行複數次上述觸媒層之塗佈、乾燥、焙燒之各步驟而將觸媒層形成為所需之厚度。於形成觸媒層後,亦可視需要進而進行長時間之焙燒而進一步提高於化學、物理、及熱方面極其穩定之觸媒層之穩定性。作為長時間焙燒之條件,較佳為於400~650℃下進行30分鐘~4小時左右。 本實施形態之電解用電極係即便於電解初期過電壓亦較低,且能夠持續長期地以低電壓、低耗電量實現電解。因此,可用於各種電解。尤其是較佳為用作氯產生用陽極,更佳為用作離子交換膜法之食鹽電解用陽極。 (電解槽) 本實施形態之電解槽具備本實施形態之電解用電極。該電解槽係進行電解時之初始電壓得到減小者。於圖1中表示本實施形態之電解槽之一例之剖面模式圖。 電解槽200具備:電解液210、用以收容電解液210之容器220、浸漬於電解液210中之陽極230及陰極240、離子交換膜250、以及用以將陽極230與陰極240連接於電源之配線260。於電解槽200中,將由離子交換膜250隔開之陽極側之空間稱為陽極室,將陰極側之空間稱為陰極室。本實施形態之電解槽可用於各種電解。以下,作為其代表例,對用於氯化鹼水溶液之電解之情形進行說明。 作為供給於本實施形態之電解槽之電解液210,例如可分別為於陽極室中使用2.5~5.5當量濃度(N)之氯化鈉水溶液(食鹽水)、氯化鉀水溶液等氯化鹼水溶液,於陰極室中使用經稀釋之氫氧化鹼水溶液(例如,氫氧化鈉水溶液、氫氧化鉀水溶液等)或水。 使用本實施形態之電解用電極作為陽極230。 作為離子交換膜250,例如可使用具有離子交換基之氟樹脂膜等。作為其具體例,例如可列舉「Aciplex」(註冊商標)F6801(旭化成股份有限公司製造)等。作為陰極240,可使用氫產生用陰極,且於導電性基材上塗佈有觸媒之電極等。作為該陰極,可採用公知者,具體而言,例如可列舉: 於鎳基材上塗覆有鎳、氧化鎳、鎳與錫之合金、活性碳與氧化物之組合、氧化釕、鉑等之陰極; 於鎳製金屬絲網基材上形成有氧化釕之被覆之陰極。 本實施形態之電解槽之構成並無特別限定,可為單極式,亦可為複極式。作為構成電解槽之材料,並無特別限定,例如作為陽極室之材料,較佳為對氯化鹼及氯具有耐性之鈦等;作為陰極室之材料,較佳為對氫氧化鹼及氫具有耐性之鎳等。 本實施形態之電解用電極(陽極230)亦可以在與離子交換膜250之間設置適當間隔之方式進行配置,且即便與離子交換膜250接觸地配置,亦可無任何問題地使用。陰極240亦可以在與離子交換膜250之間設置適當間隔之方式進行配置,且即便為在與離子交換膜250之間無間隔之接觸型電解槽(零間距式電解槽),亦可無任何問題地使用。 關於本實施形態之電解槽之電解條件,並無特別限定,可於公知之條件下運轉。例如,較佳為將電解溫度調整為50~120℃,將電流密度調整為0.5~10 kA/m2 而實施電解。 本實施形態之電解用電極可使食鹽電解時之電解電壓低於先前。因此,根據具備該電解用電極之本實施形態之電解槽,可減少食鹽電解所需之耗電。 進而,本實施形態之電解用電極具有於化學、物理、及熱方面極其穩定之觸媒層,故而長期之耐久性優異。因此,根據具備該電解用電極之本實施形態之電解槽,能夠持續長時間地維持電極之觸媒活性較高,而穩定地製造高純度之氯。 [實施例] 以下,基於實施例而進一步詳細地對本實施形態進行說明。本實施形態並不僅僅限定於該等實施例。 首先,於以下表示實施例及比較例中之各評估方法。 (離子交換膜法食鹽電解試驗) 作為電解池(cell),準備具備具有陽極室之陽極池、及具有陰極室之陰極池之電解池。 將於各實施例及比較例中所準備之電解用電極切成特定之尺寸(95×110 mm=0.01045 m2 ),將所獲得者設為試驗用電極,藉由焊接將該試驗用電極安裝於陽極池之陽極室之壁部而用作陽極。 作為陰極,使用於鎳製之金屬絲網基材上進行氧化釕之觸媒被覆而成者。首先,以與陽極相同之尺寸切出作為集電體之金屬鎳製延伸基材並焊接至陰極池之陰極室的壁部上後,搭載編織有鎳製線之緩衝墊,於該緩衝墊上配置陰極。 作為墊片,使用EPDM(乙烯丙烯二烯)製之橡膠墊片,且於陽極池與陰極池之間隔著離子交換膜。作為該離子交換膜,使用食鹽電解用陽離子交換膜「Aciplex」(註冊商標)F6801(旭化成公司製造)。 為了測定氯過電壓,而利用聚四氟乙烯製絲線,將去除經PFA(四氟乙烯-全氟烷基乙烯基醚共聚物)被覆之鉑線之前端約1 mm之部分的被覆而使鉑露出者連結固定於陽極之與離子交換膜相反側之面以用作參考電極。於電解試驗中,因所產生之氯氣而成為飽和環境,因此參考電極顯示出氯產生電位。因此,將自陽極之電位減去參考電極之電位所得者作為陽極之氯過電壓進行評估。 另一方面,作為電解電壓,測定陰極與陽極之間之電位差。 為了測定陽極之初期電解性能,過電壓及電解電壓係分別測定自電解開始經過7天後之值。關於電解條件,係於電流密度6 kA/m2 、陽極池內之鹽水濃度205 g/L、陰極池內之NaOH濃度32質量%、溫度90℃下進行電解。作為電解用整流器,係使用「PAD36-100LA」(菊水電子工業公司製造)。 (加速試驗) 作為安裝於陽極池之試驗用電極,使用切成58×48 mm=0.002748 m2 之尺寸者,除此之外,使用與上述離子交換膜法食鹽電解試驗相同之電解池。 關於電解條件,係於電流密度6 kA/m2 、陽極槽內之鹽水濃度205 g/L、陰極槽內之NaOH濃度32質量%、溫度90℃下進行電解。為了確認試驗用電極之耐久性,以7天1次之頻度進行電解停止、電解池內之水洗(10分鐘)、及電解開始之一連串操作,電解開始後每隔7天測定氯過電壓(陽極過電壓)。進而,使用電解前後之藉由各金屬成分之螢光X射線測定(XRF)所獲得之數值而算出電解後的試驗用電極之觸媒層中之Ru及Ir之殘留率(100×電解前之含量/電解後之含量;%)。作為XRF測定裝置,使用Niton XL3t-800或Niton XL3t-800s(商品名,Thermo Scientific公司製造)。 (成為電雙層電容之指標之D值) 將試驗用電極切成30×30 mm=0.0009 m2 之尺寸,利用鈦製螺釘固定至電解池。相對電極係使用鉑網,於85~90℃、鹽水濃度205 g/L之NaCl水溶液中,以電解電流密度1 kA/m2 、2 kA/m2 及3 kA/m2 各進行5分鐘之電解,以4 kA/m2 進行30分鐘之電解以使試驗陽極產生氯。 上述電解後,將Ag/AgCl用於參考電極,並將施加電位設為0 V至0.3 V之範圍,將掃描速度設為10 mV/秒、30 mV/秒、50 mV/秒、80 mV/秒、100 mV/秒、及150 mV/秒而測定循環伏安圖,測定自0 V向0.3 V之正方向掃描時之施加電位範圍之中心即0.15 V時的電解電流密度、及自0.3 V向0 V之反方向掃描時之施加電位範圍之中心即0.15 V時的電解電流密度,於上述各掃描速度下獲得該等2個電解電流密度之差。於各掃描速度下獲得之電解電流密度之差、與作為掃描範圍之0.3 V之乘積係與掃描速度大致成正比,算出其斜率以作為成為電雙層電容之指標之D值(C/m2 )。 [實施例1] 作為導電性基材,使用大網眼之尺寸(LW)為6 mm、小網眼之尺寸(SW)為3 mm、板厚為1.0 mm之鈦製延伸基材。於大氣中以540℃對該延伸基材進行4小時焙燒,於表面形成氧化覆膜後,於25質量%硫酸中以85℃進行4小時酸處理而實施於導電性基材之表面設置微細之凹凸的預處理。 其次,以釕、銥、鈦及釩之元素比(莫耳比)成為21.25∶21.25∶42.5∶15之方式,利用乾冰將硝酸釕水溶液(Furuya金屬公司製造,釕濃度為100 g/L)冷卻至5℃以下及進行攪拌,並且每次少量地加入四氯化鈦(和光純藥公司製造)後,進而每次少量地加入氯化銥水溶液(田中貴金屬公司製造,銥濃度為100 g/L)及氯化釩(III)(Kishida化學公司製造)而獲得總金屬濃度為100 g/L之水溶液即塗佈液A1。 將該塗佈液A1注入至塗佈機之液體接收缸內,藉由使EPDM製海綿輥旋轉而將塗佈液A1吸上來並含浸,以與該海綿輥之上部接觸之方式配置PVC製輥。然後,使實施過預處理之導電性基材通過上述EPDM製海綿輥與上述PVC製輥之間而進行塗佈。塗佈後,立即使上述塗佈後之導電性基材通過捲繞有布之2根EPDM製海綿輥之間而擦拭過量之塗佈液。此後,於在50℃下乾燥10分鐘後,於大氣中在400℃下進行10分鐘焙燒。 關於上述包含輥塗佈、乾燥、及焙燒之循環,將焙燒溫度升溫至450℃,進而反覆進行3次上述循環,最後進而進行520℃下之1小時之焙燒,藉此於導電性基材上形成黑褐色之觸媒層而製作電解用電極。 [比較例1] 以釕、銥及鈦之元素比(莫耳比)成為25∶25∶50之方式,利用乾冰將氯化釕水溶液(田中貴金屬公司製造,釕濃度為100 g/L)冷卻至5℃以下及進行攪拌,並且每次少量地加入四氯化鈦(和光純藥公司製造)後,進而每次少量地加入氯化銥水溶液(田中貴金屬公司製造,銥濃度為100 g/L)而獲得總金屬濃度為100 g/L之水溶液即塗佈液B1。使用該塗佈液B1,且關於包含輥塗佈、乾燥及焙燒之循環,將第1次之焙燒溫度設為440℃,其次升溫至475℃,進而反覆進行3次上述循環,最後進而進行520℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法製作電解用電極。 [實施例2] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為25.45∶25.45∶30∶19.1之方式調製而成之塗佈液A2並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例3] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為28.75∶28.75∶20∶22.5之方式調製而成之塗佈液A3並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例4] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為32.05∶32.05∶10∶25.9之方式調製而成之塗佈液A4並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例5] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為17.5∶17.5∶35∶30之方式調製而成之塗佈液A5並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 將分別於實施例1~5及比較例1中所製作之電解用電極之構成(用於形成觸媒層之塗佈液之金屬組成)與所測得之成為電雙層電容之指標的D值一併示於表1。表中之單位「mol%」意指相對於所形成之觸媒層所包含之全部金屬元素的莫耳百分率(饋入比)。又,第一過渡金屬元素/Ru之值及第一過渡金屬元素/Ti之值係自該饋入比算出之值。 [表1] [離子交換膜法食鹽電解試驗] 使用分別於實施例1~5及比較例1中所製作之電解用電極而實施離子交換膜法食鹽電解試驗。將其結果示於表2。 [表2] 電流密度6 kA/m2 時之電解電壓於實施例1及2中為2.94 V,於實施例3及4中分別為2.92 V,又,於實施例5中為2.91 V,與比較例1中之2.99 V相比,均顯示出極其低之值。 又,陽極過電壓於實施例1中為0.032 V,於實施例2中為0.034 V,於實施例3及實施例4中分別為0.032 V,又,於實施例5中為0.031 V,與比較例1之0.057 V相比,均顯示出較低之值。 [實施例6] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為37∶33.35∶11.15∶18.5之方式調製而成之塗佈液A6並塗佈至導電性基材,且關於包含輥塗佈、乾燥及焙燒之循環,將第1次之焙燒溫度設為310℃,其次升溫至520℃,進而反覆進行3次上述循環,進而進行520℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例7] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為31.25∶28.1∶9.4∶31.25之方式調製而成之塗佈液A7並塗佈至導電性基材,且關於包含輥塗佈、乾燥及焙燒之循環,將第1次之焙燒溫度設為380℃,其次升溫至450℃,進而反覆進行3次上述循環,進而進行450℃之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例8] 使用氯化釕水溶液(田中貴金屬公司製造,釕濃度為100 g/L)而並非硝酸釕水溶液,使用以釕、銥、鈦及釩之元素比(莫耳比)成為19.6∶20.2∶47.09∶13.11之方式調製而成之塗佈液A8並塗佈至導電性基材,並且關於包含輥塗佈、乾燥及焙燒之循環,將第1次至第8次之焙燒溫度設為393℃,其次進行485℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例9] 使用氯化釕水溶液(田中貴金屬公司製造,釕濃度為100 g/L)而並非硝酸釕水溶液,使用氯化鈷(II)六水合物(和光純藥公司製造)而並非氯化釩(III),且使用以釕、銥、鈦及鈷之元素比(莫耳比)成為50∶3∶30∶17之方式調製而成之塗佈液A9並塗佈至導電性基材,且關於包含輥塗佈、乾燥及焙燒之循環,將第1次之焙燒溫度設為440℃,其次升溫至475℃,進而反覆進行3次上述循環,最後進而進行520℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例10] 使用硝酸銅(II)三水合物(和光純藥公司製造)而並非氯化釩(III),使用以釕、銥、鈦及銅之元素比(莫耳比)成為32.05∶32.05∶10∶25.9之方式調製而成之塗佈液A10並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [實施例11] 使用硝酸鋅(II)六水合物(和光純藥公司製造)而並非氯化釩(III),使用以釕、銥、鈦及鋅之元素比(莫耳比)成為32.05∶32.05∶10∶25.9之方式調製而成之塗佈液A11並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例2] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為20∶18∶60∶2之方式調製而成之塗佈液B2並塗佈至導電性基材,且於塗佈液之調製中使用氯化釕水溶液(田中貴金屬公司製造,釕濃度為100 g/L),且關於包含輥塗佈、乾燥與焙燒之循環,將第1次之焙燒溫度設為450℃,繼而於450℃下進而反覆進行3次上述循環,進而進行450℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例3] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為22.7∶20.5∶34.1∶22.7之方式調製而成之塗佈液B3並塗佈至導電性基材,且關於包含輥塗佈、乾燥與焙燒之循環,將第1次之焙燒溫度設為380℃,繼而於380℃下進而反覆進行3次上述循環,最後進而進行590℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例4] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為28.6∶25.7∶42.8∶2.9之方式調製而成之塗佈液B4並塗佈至導電性基材,且關於包含輥塗佈、乾燥與焙燒之循環,將第1次之焙燒溫度設為450℃,其次升溫至520℃,進而反覆進行3次上述循環,進而進行520℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例5] 使用以釕、銥、鈦及釩之元素比(莫耳比)成為18.5∶16.7∶55.55∶9.25之方式調製而成之塗佈液B5並塗佈至導電性基材,且於塗佈液之調製中使用氯化釕水溶液(田中貴金屬公司製造,釕濃度為100 g/L),且關於包含輥塗佈、乾燥與焙燒之循環,將第1次之焙燒溫度設為310℃,其次升溫至380℃,進而反覆進行3次上述循環,最後進而進行590℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例6] 使用硝酸錳(和光純藥公司製造)代替實施例1中之氯化釩(III),使用以釕、銥、鈦及錳之元素比(莫耳比)成為21.25∶21.25∶42.5∶15之方式調製而成之塗佈液B6並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例7] 使用硝酸鋅(和光純藥公司製造)代替實施例1中之氯化釩(III),使用以釕、銥、鈦及鋅之元素比(莫耳比)成為21.25∶21.25∶42.5∶15之方式調製而成之塗佈液B7並塗佈至導電性基材,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例8] 使用硝酸鈀(和光純藥公司製造)代替實施例1中之氯化釩(III),使用以釕、銥、鈦及鈀之元素比(莫耳比)成為16.9∶15.4∶50.8∶16.9之方式調製而成之塗佈液B8並塗佈至導電性基材,且關於包含輥塗佈、乾燥與焙燒之循環,將第1次之焙燒溫度設為450℃,其次升溫至520℃,進而反覆進行3次上述循環,最後進而進行590℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 [比較例9] 使用以釕、鈦及釩之元素比(莫耳比)成為40∶40∶20之方式調製而成之塗佈液B9並塗佈至導電性基材,且於塗佈液之調製中使用氯化釕水溶液(田中貴金屬公司製造,釕濃度為100 g/L),且關於包含輥塗佈、乾燥與焙燒之循環,將第1次之焙燒溫度設為440℃,其次升溫至475℃,進而反覆進行3次上述循環,最後進而進行520℃下之1小時之焙燒,除此之外,藉由與實施例1相同之方法而製作電解用電極。 將分別於實施例6~11、及比較例2~9中所製作之電解用電極之構成(用於形成觸媒層之塗佈液之金屬組成)與所測得之成為電雙層電容之指標的D值一併示於表3。表中之單位「mol%」意指相對於所形成之觸媒層所包含之全部金屬元素的莫耳百分率(饋入比)。又,第一過渡金屬元素/Ru之值及第一過渡金屬元素/Ti之值係自該饋入比算出之值。 [表3] [加速試驗] 使用分別於實施例1~11及比較例1~9中所製作之電解用電極並實施加速試驗。將其結果示於表4。再者,比較例9係釕之耐久性較低,因此為於14天後中止試驗之時點之評估結果。 [表4] 實施21天之加速試驗,結果可知如下情況。 實施例1~11之電解用電極係試驗開始1天後之陽極過電壓為0.030~0.045 V,且21天後之陽極過電壓為0.030~0.039 V。相對於此,比較例1~8之電解用電極係試驗開始1天後之陽極過電壓為0.042~0.110 V,且21天後之陽極過電壓為0.043~0.093 V。如上所述,證實了如下情況:與比較例相比,實施例可於電解初期且持續長期地以低電壓、低耗電實現電解。 又,證實了如下情況:與陽極過電壓為相同程度之比較例9相比,於實施例1~11中,即便在試驗開始21天後,Ru及Ir之殘留率亦均較高,且一面維持陽極過電壓較低,一面長期之電解時之耐久性亦充分。 本申請案係基於2016年11月22日申請之日本專利申請案(日本專利特願2016-227066號)者,其內容係以參照之形式引用於此。 [產業上之可利用性] 本發明之電解用電極顯示出較低之氯產生過電壓,且能夠以低電壓、低耗電量實現電解,因此可較佳地利用於食鹽電解之領域。尤其是作為離子交換膜法食鹽電解用陽極有用,能夠持續長期地以低電壓、低耗電量製造氧氣濃度較低之高純度氯氣。Hereinafter, the form (hereinafter, abbreviated as "this embodiment") for implementing this invention is demonstrated in detail. The following embodiment is an example for explaining the present invention, and is not intended to limit the present invention to the following contents. The present invention can be appropriately modified and implemented within the scope of the gist thereof. The electrode for electrolysis according to this embodiment includes a conductive substrate and a catalyst layer formed on the surface of the conductive substrate. The catalyst layer includes a ruthenium element, an iridium element, a titanium element, and a material selected from the group consisting of rhenium, At least one first transition metal element in the group consisting of vanadium, chromium, iron, cobalt, nickel, copper, and zinc (hereinafter, these transition metal elements are also collectively referred to as "first transition metal element"). Furthermore, the electrode for electrolysis of this embodiment is configured as follows: the content ratio of the first transition metal element contained in the catalyst layer to the titanium element is 1 mol% or more and less than 3.4 moles %, The D value of the above-mentioned electrode for electrolysis to be an electric double-layer capacitor is 120 C / m 2 or more and 420 C / m 2 or less. In this embodiment, in addition to the ruthenium, iridium, and titanium elements in the catalyst layer, the first transition metal element is also used, thereby becoming an electrode for electrolysis as measured by X-ray photoelectron spectroscopy (XPS) The peak position of the peak belonging to Ru3d5 / 2 derived from RuO 2 shifted from 280.5 eV of RuO 2 to the high binding energy side. In addition, the XPS charge correction is performed in such a way that the combined energy of Ti2p3 / 2 becomes 458.4 eV. The shift of the peak position of Ru3d5 / 2 to the high binding energy side indicates the state where Ru is oxidized due to the charge, and this state is considered to be due to the addition of the first transition metal element. For example, when vanadium is added as the first transition metal element, the following polarization occurs. RuO 2 + VO 2 → RuO 2 δ + + VO 2 δ- RuO 2 δ + becomes the active adsorption site for chlorine adsorption, and it can reduce the overvoltage generated by chlorine by promoting the adsorption of chlorine. The gist of the present invention is not limited to the above-mentioned mechanism of action. Since the electrode for electrolysis of the present embodiment has the above-mentioned structure, when the electrode for electrolysis is used for electrolysis, the overvoltage in the initial stage of electrolysis can be reduced, and it can be sustained for a long time Realize electrolysis with low voltage and low power consumption. The electrode for electrolysis according to this embodiment can be preferably used as an electrode for generating chlorine, especially in salt electrolysis by an ion exchange membrane method. (Conductive base material) The electrode for electrolysis according to this embodiment is used in a high-concentration saline solution close to saturation and used in a chlorine gas generating environment. Therefore, as the material of the conductive substrate in this embodiment, a valve metal having corrosion resistance is preferred. The valve metal is not limited to the following, and examples thereof include titanium, tantalum, niobium, and zirconium. From the viewpoint of economy and affinity with the catalyst layer, titanium is preferred. The shape of the conductive substrate is not particularly limited, and an appropriate shape can be selected according to the purpose. For example, shapes such as an extended shape, a perforated plate, and a wire mesh are preferably used. The thickness of the conductive substrate is preferably 0.1 to 2 mm. In order to improve the adhesiveness with the catalyst layer, it is preferable that the contact surface of the conductive substrate and the catalyst layer be subjected to a surface area increasing treatment. The method of increasing the surface area is not limited to the following, and examples thereof include a sandblasting treatment using a cut wire, steel gravel, aluminum gravel, and the like; an acid treatment using sulfuric acid or hydrochloric acid, and the like. Among these treatments, it is preferable to perform a method of forming an unevenness on the surface of the conductive substrate by a sandblasting treatment, and then performing an acid treatment. (Catalyst layer) The catalyst layer formed on the surface of the conductive substrate subjected to the above-mentioned treatment includes a ruthenium element, an iridium element, a titanium element, and a first transition metal element. The ruthenium element, the iridium element, and the titanium element are preferably each in the form of an oxide. The ruthenium oxide is not limited to the following, and examples thereof include RuO 2 and the like. The iridium oxide is not limited to the following, and examples include IrO 2 and the like. The titanium oxide is not limited to the following, and examples thereof include TiO 2 and the like. In the catalyst layer of this embodiment, it is preferable that the ruthenium oxide, iridium oxide, and titanium oxide form a solid solution. Ruthenium oxide, iridium oxide, and titanium oxide form a solid solution, and the durability of ruthenium oxide is further improved. The so-called solid solution usually refers to those in which two or more substances are fused with each other and become a uniform solid phase as a whole. Examples of the substance forming the solid solution include metal monomers and metal oxides. Especially when it is suitable for the solid solution of the metal oxide of this embodiment, two or more kinds of metal atoms are arranged irregularly on the equivalent lattice point in the unit lattice in the oxide crystal structure. Specifically, it is preferable that ruthenium oxide, iridium oxide, and titanium oxide are mixed with each other. When viewed from the side of ruthenium oxide, the ruthenium atom is replaced by an iridium atom or a titanium atom, or both of them. Solution. The solid solution state is not particularly limited, and there may also be a local solid solution region. The size of the unit lattice in the crystalline structure changes slightly due to solid solution. The degree of this change can be confirmed, for example, by measuring the powder X-ray diffraction without changing the diffraction pattern due to the crystal structure, but changing the peak position due to the size of the unit lattice. In the catalyst layer of this embodiment, the content ratio of the ruthenium element, the iridium element, and the titanium element is preferably 1 mole with respect to the ruthenium element, 0.06 to 3 mole with the iridium element, and 0.2 to 0.2 with the titanium element. 8 mol; more preferably 1 mol with respect to ruthenium, 0.2 to 3 mol with iridium, and 0.2 to 8 mol with titanium; further preferably 1 mol with ruthenium, 0.3 with iridium ~ 2 mol, and the titanium element is 0.2-6 mol; especially preferred is 1 mol to the ruthenium element, iridium is 0.5-1.5 mol, and the titanium element is 0.2-3 mol. By setting the content ratio of the three elements to the above range, the long-term durability of the electrode for electrolysis tends to be further improved. Iridium, ruthenium, and titanium may be contained in the catalyst layer in a form other than an oxide, for example, as a metal element. The catalyst layer of this embodiment contains the first transition metal element together with the above-mentioned ruthenium element, iridium element, and titanium element. The existence form of the first transition metal element is not particularly limited, and as long as it is contained in the catalyst layer, it may be, for example, an oxide form, a simple metal substance, or an alloy. In this embodiment, from the viewpoint of durability of the catalyst layer, the first transition metal element is preferably a solid solution with a solid solution of ruthenium oxide, iridium oxide, and titanium oxide. The formation of such a solid solution can be confirmed by XRD (X-ray Diffraction), for example. The solid solution can be formed by adjusting the firing temperature when the catalyst layer is formed, the amount of the first transition metal element added, and the like to an appropriate range. In this embodiment, from the viewpoint of considering both the voltage and durability of the catalyst layer, the first transition metal element preferably contains a metal element selected from the group consisting of vanadium, cobalt, copper, and zinc. The transition metal element is more preferably a vanadium element. The content ratio of the first transition metal element in the embodiment to all metal elements contained in the catalyst layer is preferably 10 mol% or more and 30 mol% or less, more preferably more than 10 mol% and 22.5 Molar% or less, more preferably 12 mol% or more and 20 mol% or less. In the case where the first transition metal element contains vanadium, the content ratio of vanadium with respect to all the metal elements contained in the catalyst layer is particularly preferably to satisfy the above range. The above-mentioned content ratio is mainly derived from the feed ratio of each element in the coating liquid prepared in the following preferred method for producing an electrode for electrolysis, and can be scanned by the following section STEM (Scanning Transmission Electron Microscope, scanning Transmission electron microscope (EDX) -EDX (Energy Dispersive X-Ray Analysis) or depth direction analysis using X-ray photoelectron spectroscopy (XPS) to confirm. When the content ratio of the first transition metal element is 10 mol% or more, there is a tendency that the overvoltage or electrolytic voltage generated by chlorine can be reduced from the initial stage of electrolysis. When the content ratio of the first transition metal element is 30 mol% or less, the durability of the ruthenium oxide tends to be sufficiently ensured. The content ratio of the first transition metal element contained in the catalyst layer in this embodiment to the 1 mol of the ruthenium element is preferably 0.3 mol or more and less than 2 mol, more preferably 0.5 mol or more and It is less than 2 moles, more preferably 0.5 moles or more and less than 1.8 moles. When the first transition metal element contains vanadium, it is particularly preferred that the content ratio of vanadium to the 1 mol of the ruthenium element contained in the catalyst layer satisfies the above range. The above-mentioned content ratio is mainly derived from the feed ratio of each element in the coating liquid prepared in the following preferred method for producing an electrode for electrolysis, and can be obtained by using the following section STEM-EDX or X-ray photoelectron It was confirmed by the depth direction analysis of the spectroscopic method (XPS). When the content ratio of the first transition metal element is 0.3 mol or more with respect to 1 mol of the ruthenium element, there is a tendency that the overvoltage or electrolytic voltage of chlorine can be reduced from the initial stage of electrolysis, and It is possible to sufficiently increase the following D value which is an index of the electric double layer capacitor. When it is less than 2 moles, the durability of the ruthenium oxide tends to be sufficiently ensured. The content ratio of the first transition metal element contained in the catalyst layer in this embodiment to the above-mentioned titanium element is 1 mol or more and less than 3.4 mol, preferably 0.25 mol or more and less than 2.6 Mol. In the case where the first transition metal element contains vanadium, it is particularly preferred that the content ratio of vanadium to the titanium element contained in the catalyst layer is 1 mol to satisfy the above range. The above-mentioned content ratio is mainly derived from the feed ratio of each element in the coating liquid prepared in the following preferred method for producing an electrode for electrolysis, and can be obtained by using the following section STEM-EDX or X-ray photoelectron It was confirmed by the depth direction analysis of the spectroscopic method (XPS). When the content ratio of the first transition metal element is 0.25 mol or more relative to 1 mol of the titanium element, there is a tendency that the overvoltage or electrolytic voltage of chlorine can be reduced from the initial stage of electrolysis, and It is possible to sufficiently increase the following D value which is an index of the electric double layer capacitor. When it is less than 3.4 mol, the durability of the ruthenium oxide tends to be sufficiently ensured. The element ratio (molar ratio) of V and Ti in the catalyst layer in the electrode for electrolysis can be confirmed by, for example, cross-sectional STEM-EDX or depth-direction analysis using X-ray photoelectron spectroscopy (XPS). For example, the following method is shown below: The elemental ratio of V to Ti in the catalyst layer containing ruthenium, iridium, titanium, and vanadium as the first transition metal element is determined by quantitative analysis in the XPS depth direction (Mo Ear ratio). Here, a Ti substrate is used as the conductive substrate. The XPS measurement conditions can be set as follows. Device: PHI5000VersaProbeII manufactured by ULVAC-PHI Company; Excitation source: Monochromatic AlKα (15 kV × 0.3 mA); Analysis size: about 200 μm f ; Photoelectron extraction angle: 45 °; PassEnergy: 46.95 eV (narrow Scan (Narrow scan) The Ar + sputtering conditions can be set as follows. Acceleration voltage: 2 kV; Scanning field range: 2 mm square; Zalar rotation. Regarding the calculation method of the concentration, the optical energy levels of the photoelectron peaks used for the quantification of Ru, Ir, Ti, and V are Ru3d, Ir4f, Ti2p, and V2p3 / 2. Since Ru3p3 / 2 overlaps Ti2p and Ti3s overlaps Ir4f, quantification can be performed in the following order. (1) Use the analysis software "MaltiPak" attached to the device to determine the area intensity of the peaks of Ru3d, Ir4f (including Ti3s), Ti2p (including Ru3p3 / 2), and V2p3 / 2 (each below) for each sputtering time (each depth). , Peak area intensity). (2) The peak area intensity of Ru3p3 / 2 was calculated based on the peak area intensity of Ru3d. The calculation was performed using the ratio of the corrected relative sensitivity factor (Corrected RSF) of MaltiPak (the relative sensitivity factor corrected according to the value of the general energy). The peak area intensity of only Ti2p was calculated by subtracting the peak area intensity of Ru3p3 / 2 from the peak area intensity of Ti2p containing Ru3p3 / 2. (3) Calculate the peak area intensity of Ti3s based on the corrected peak area intensity of Ti2p and use the ratio of the corrected relative sensitivity factor (Corrected RSF). The peak area intensity of only Ir4f was calculated by subtracting the peak area intensity of Ti3s from the peak area intensity of Ir4f containing Ti3s. The measured value of the element ratio (Molar ratio) of V and Ti in the catalyst layer obtained by quantitative analysis in the depth direction of XPS is based on the following calculation formula and is set to the ratio of the following two values, that is, cumulative detection The peak area intensity of V2p3 / 2 at each depth within the depth range of the catalyst layer of V is divided by the value obtained by the corrected relative sensitivity factor of V2p3 / 2, and the peak area intensity of Ti2p at each depth is summed. Divided by the corrected relative sensitivity factor (Corrected RSF) of Ti2p. Regarding the depth range of the catalyst layer that accumulates the peak area intensity of each element, for example, when the catalyst layer is a single layer, it is set to a depth range from the outermost surface to the time when a signal originating from Ti of the Ti substrate is detected. . Here, when the catalyst layer is multi-layer, the layers other than the catalyst layer directly formed on the surface of the Ti substrate are set to the depth range of each catalyst layer, and the layer directly formed on the surface of the Ti substrate is set. The catalyst layer is set to a depth range until a signal of Ti originating from the Ti substrate starts to be detected. [Number 1] Fig. 2 shows the actual measurement of V / Ti obtained from the following four samples a to d with different element ratios (molar ratios) of V and Ti using the above measurement method and XPS depth analysis. The results were plotted against the feed V / Ti value in the coating solution. (Sample a) The electrode for electrolysis with a V / Ti feed ratio of 0.11 is prepared by coating the elements (mole ratio) of ruthenium, iridium, titanium, and vanadium to 23.75: 23.75: 47.5: 5, respectively. An electrode for electrolysis obtained by the same method as in Example 1 described below except that the cloth liquid a was applied to a conductive substrate. (Sample b) The electrode for electrolysis with a V / Ti feed ratio of 0.22 is a coating prepared by adjusting the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium to 22.5: 22.5: 45: 10, respectively. The electrode for electrolysis obtained by the same method as in Example 1 except that the cloth liquid b was applied to a conductive substrate. (Sample c) An electrode for electrolysis having a V / Ti feed ratio of 0.35 was obtained by the same method as in Example 1 described below. (Sample d) An electrode for electrolysis having a V / Ti feed ratio of 1.13 was obtained by the same method as in Example 3 described below. As shown in Figure 2, the measured value of V / Ti shows a positive correlation with the feed value, so the V in the catalyst layer containing ruthenium, iridium, titanium, and vanadium can be obtained from the calibration curve. Elemental ratio to Ti (Molar ratio). When the composition contained in the catalyst layer is changed, a calibration curve of the measured value and the fed value of V / Ti is prepared by the same method, so that the V and Ti elements in the catalyst layer can be obtained. Ratio (Morle ratio). Furthermore, in the electrode for electrolysis of this embodiment, the catalyst layer may include only one layer, or may have a multilayer structure of two or more layers. In the case of a multilayer structure, as long as the content ratio of the above-mentioned first transition metal element to the above-mentioned titanium element 1 mol in at least one of the layers is 0.25 mol or more and less than 3.4 mol, other layers also It may be one that does not satisfy the content ratio. The electrode for electrolysis of this embodiment is characterized in that a D value that is an index of an electric double-layer capacitor is 120 C / m 2 or more and 420 C / m 2 or less. Moreover, it is more preferably 120 C / m 2 or more and 380 C / m 2 or less, and still more preferably 150 C / m 2 or more and 360 C / m 2 or less. When the D value is 120 C / m 2 or more, the generation of chlorine overvoltage can be suppressed, and the electrolytic voltage can be reduced. Furthermore, the durability of the ruthenium oxide can be maintained by being 420 C / m 2 or less. The D value used as the index of the electric double-layer capacitor here is a value calculated by using the concept of the electric double-layer capacitor, and it is considered that the larger the surface area of the electrode (that is, the specific surface area of the catalyst layer on the electrode), the The value becomes larger. In addition, for example, by adjusting the content of the first transition metal element to the above-mentioned preferable range, the D value can be set to the above-mentioned range. In particular, by increasing the content of the first transition metal element, the D value tends to increase. In addition, the D value tends to decrease by increasing the firing temperature (post-baking temperature) when the catalyst layer is formed. Specifically, the cyclic voltammetry method described in the following examples can be used, and the value of the electrolytic current density (A / m 2 ) measured with respect to a certain scanning speed (V / sec) can be used. And figure it out. More specifically, the difference in current density inherent in each scanning speed (the difference between the current density during forward scanning and the current density during reverse scanning) is obtained, and the vertical axis is set to the current density difference and 0.3 as the scanning range. Multiplying V, the horizontal axis is set to the scanning speed to draw each data, and then the slope when linear approximation of each drawn curve is set to the D value. Here, the product of the current density difference and 0.3 V, which is the scanning range, is often directly proportional to the scanning speed, so the D value can be expressed by the following formula (a). By setting the value of D, which is an index of the electric double-layer capacitor, to the above range, it is possible to reduce the overvoltage in the initial stage of electrolysis without impairing the durability of the obtained electrode for electrolysis. D (C / m 2 ) = [Difference in electrolytic current density (A / m 2 ) × 0.3 (V)] ÷ [Scanning speed (V / sec)] (a) The catalyst layer in this embodiment contains a ruthenium element , Iridium, titanium, and the first transition metal element, and further set the content ratio of the first transition metal element to the titanium element in a specific range, thereby increasing the D value that is an index of the electric double-layer capacitor as an electrolysis The function of the catalyst is improved, which can reduce the overvoltage in the initial stage of electrolysis. The catalyst layer in this embodiment may contain only the ruthenium element, iridium element, titanium element, and first transition metal element described above as constituent elements, and may contain other metal elements in addition to these. Specific examples of other metal elements are not limited to the following, and examples thereof include elements selected from tantalum, niobium, tin, and platinum. Examples of the existence form of these other metal elements include the existence of the metal elements included in the oxide. In the case where the catalyst layer in this embodiment contains other metal elements, its content ratio is based on the molar ratio of other metal elements to all metal elements contained in the catalyst layer, and is preferably 20 mol% or less. More preferably, it is 10 mol% or less. The thickness of the catalyst layer in this embodiment is preferably 0.1 to 5 μm, and more preferably 0.5 to 3 μm. By setting the thickness of the catalyst layer to be equal to or more than the above-mentioned lower limit value, there is a tendency that the initial electrolytic performance can be sufficiently maintained. In addition, by setting the thickness of the catalyst layer to be equal to or less than the above-mentioned upper limit value, there is a tendency that an electrode for electrolysis excellent in economic efficiency can be obtained. The catalyst layer may include only one layer or two or more layers. In a case where the catalyst layer is two or more layers, at least one of them is the catalyst layer in the embodiment. When the catalyst layer is two or more layers, it is preferred that at least the outermost layer be the catalyst layer in this embodiment. It is also preferable to have two or more catalyst layers in this embodiment with the same composition or different compositions. That is, when the catalyst layer is more than two layers, the thickness of the catalyst layer in this embodiment is also as described above, preferably 0.1 to 5 μm, and more preferably 0.5 to 3 μm. (Manufacturing method of electrode for electrolysis) Next, an example of the manufacturing method of the electrode for electrolysis of this embodiment is demonstrated in detail. The electrode for electrolysis of this embodiment can be produced, for example, by forming a catalyst layer containing a ruthenium element, an iridium element, a titanium element, and a first transition metal element on a conductive substrate that has been subjected to the surface area increasing treatment described above. The formation of the catalyst layer is preferably performed by a thermal decomposition method. Regarding the manufacturing method using a thermal decomposition method, a coating liquid containing a mixture of a compound (precursor) containing the above-mentioned elements can be applied to a conductive substrate, and then the coating liquid can be baked in an oxygen-containing environment. The components are thermally decomposed to form a catalyst layer. According to this method, the number of steps of the previous manufacturing method can be used to manufacture the electrode for electrolysis with high productivity. Here, the term "thermal decomposition" means that a metal salt or the like that becomes a precursor is baked in an oxygen-containing environment to decompose it into a metal oxide or a metal and a gaseous substance. The obtained decomposition products can be controlled by preparing the types of metals contained in the precursor, the types of metal salts, and the environment in which thermal decomposition is carried out as raw materials. Generally in an oxidizing environment, a large amount of metal tends to easily form an oxide. In the industrial manufacturing process of the electrode for electrolysis, the thermal decomposition is usually performed in the air. In this embodiment, the range of the oxygen concentration during firing is not particularly limited, and it may be performed in the air. However, if necessary, air may be circulated in the baking furnace or oxygen may be supplied. As a preferred aspect of the method for manufacturing an electrode for electrolysis in this embodiment, it is preferable to have the following steps: preparing a coating solution containing a ruthenium compound, an iridium compound, a titanium compound, and a compound containing a first transition metal element; The coating solution is coated on at least one side of a conductive substrate to form a coating film; and the coating film is fired in an oxygen-containing environment to form a catalyst layer. In addition, the ruthenium compound, the iridium compound, the titanium compound, and the compound containing the first transition metal element are equivalent to the precursor containing the metal element contained in the catalyst layer in this embodiment. By the above method, an electrode for electrolysis having a uniform catalyst layer can be manufactured. Among the compounds contained in the coating liquid, the ruthenium compound, the iridium compound, and the titanium compound may be oxides, but they are not necessarily oxides. For example, a metal salt may be used. The metal salts are not limited to the following, and examples thereof include oxidation selected from chloride salts, nitrates, dinitrosodiammine complexes, nitroso nitrates, sulfates, acetates, and metal alkanoates. Any of the groups of things. The metal salt of the ruthenium compound is not limited to the following, and examples thereof include ruthenium chloride and ruthenium nitrate. The metal salt of the iridium compound is not limited to the following, and examples thereof include iridium chloride and iridium nitrate. The metal salt of the titanium compound is not limited to the following, and examples thereof include titanium tetrachloride. Among the compounds contained in the coating liquid, the compound containing the first transition metal element may be an oxide, but it is not necessarily an oxide. For example, one or more members selected from the group consisting of an oxo acid of vanadium and a salt thereof, a chloride of vanadium, and a nitrate of vanadium are preferable. The counter cation in the oxo acid salt is not limited to the following, and examples thereof include Na + , K + , and Ca 2+ . As specific examples of such a compound, examples of the oxo acid or a salt thereof include sodium metavanadate, sodium orthovanadate, and potassium orthovanadate; examples of the chloride include vanadium chloride; and examples of the nitrate Examples include vanadium nitrate. The above compounds are appropriately selected and used depending on the required metal element ratio in the catalyst layer. The coating liquid may further include a compound other than the compound included in the compound. The other compounds are not limited to the following, and examples thereof include metal compounds containing metal elements such as tantalum, niobium, tin, platinum, and rhodium; organic compounds containing metal elements such as tantalum, niobium, tin, platinum, and rhodium. The coating liquid is preferably a liquid composition obtained by dissolving or dispersing the compound group in an appropriate solvent. As a solvent of the coating liquid used here, it can be selected depending on the kind of the compound. For example, water; alcohols such as butanol and the like can be used. The total compound concentration in the coating liquid is not particularly limited, but from the viewpoint of appropriately controlling the thickness of the catalyst layer, it is preferably 10 to 150 g / L. The method for applying the coating liquid to the surface of the conductive substrate is not limited to the following. For example, the following methods can be used: an immersion method of dipping the conductive substrate in the coating liquid; A method for applying a coating liquid on the surface of a conductive substrate; a roller method in which a conductive substrate is passed through a sponge-shaped roller impregnated with a coating liquid; and a conductive substrate and a coating liquid are sprayed with opposite charges The electrostatic coating method. Among these coating methods, a roll method and an electrostatic coating method are preferred from the viewpoint of excellent industrial productivity. By these coating methods, a coating film of a coating liquid can be formed on at least one side of a conductive substrate. After applying the coating liquid to the conductive substrate, it is preferable to perform a step of drying the coating film as necessary. By this drying step, the coating film can be more firmly formed on the surface of the conductive substrate. The drying conditions can be appropriately selected depending on the composition of the coating liquid, the type of solvent, and the like. The drying step is preferably performed at a temperature of 10 to 90 ° C for 1 to 20 minutes. After a coating film of a coating liquid is formed on the surface of the conductive substrate, it is fired in an oxygen-containing environment. The firing temperature can be appropriately selected according to the composition of the coating liquid and the type of the solvent. The firing temperature is preferably 300 to 650 ° C. If the firing temperature is less than 300 ° C., the decomposition of the precursor such as the ruthenium compound becomes insufficient, and a catalyst layer containing ruthenium oxide or the like may not be obtained. If the firing temperature exceeds 650 ° C, the conductive substrate may be oxidized, and thus the adhesion between the catalyst layer and the substrate may decrease. In particular, when a substrate made of titanium is used as the conductive substrate, this tendency should be taken seriously. A longer roasting time is preferred. On the other hand, from the viewpoint of electrode productivity, it is preferable to adjust so that the firing time does not become excessively long. Taking these circumstances into consideration, the firing time for one time is preferably 5 to 60 minutes. If necessary, the steps of coating, drying, and firing the catalyst layer are repeated several times to form the catalyst layer to a desired thickness. After the formation of the catalyst layer, the stability of the catalyst layer which is extremely stable chemically, physically, and thermally can be further improved by further firing for a long time if necessary. As a condition of long-time baking, it is preferable to carry out at 400 to 650 ° C for about 30 minutes to 4 hours. The electrode for electrolysis of this embodiment has a low overvoltage even at the initial stage of electrolysis, and can achieve electrolysis with low voltage and low power consumption for a long period of time. Therefore, it can be used for various electrolysis. Particularly, it is preferably used as an anode for chlorine generation, and more preferably used as an anode for salt electrolysis by an ion exchange membrane method. (Electrolytic cell) The electrolytic cell of this embodiment includes the electrode for electrolysis of this embodiment. This electrolytic cell is the one whose initial voltage is reduced during electrolysis. Fig. 1 is a schematic cross-sectional view showing an example of an electrolytic cell according to this embodiment. The electrolytic cell 200 is provided with an electrolytic solution 210, a container 220 for containing the electrolytic solution 210, an anode 230 and a cathode 240 immersed in the electrolytic solution 210, an ion exchange membrane 250, and a means for connecting the anode 230 and the cathode 240 to a power source Wiring 260. In the electrolytic cell 200, a space on the anode side separated by the ion exchange membrane 250 is referred to as an anode chamber, and a space on the cathode side is referred to as a cathode chamber. The electrolytic cell of this embodiment can be used for various electrolysis. Hereinafter, as a representative example, a case where it is used for the electrolysis of an alkali chloride aqueous solution will be described. As the electrolytic solution 210 supplied to the electrolytic cell of the present embodiment, for example, an aqueous sodium chloride solution (aqueous salt solution) such as a 2.5 to 5.5 equivalent (N) sodium chloride solution and an aqueous potassium chloride solution can be used in the anode chamber, respectively. In the cathode chamber, a dilute aqueous alkali hydroxide solution (for example, an aqueous sodium hydroxide solution, an aqueous potassium hydroxide solution, etc.) or water is used. As the anode 230, the electrode for electrolysis of this embodiment is used. As the ion exchange membrane 250, for example, a fluororesin membrane having an ion exchange group can be used. Specific examples thereof include "Aciplex" (registered trademark) F6801 (manufactured by Asahi Kasei Corporation). The cathode 240 may be a cathode for hydrogen generation, and an electrode or the like coated with a catalyst on a conductive substrate. As the cathode, a known one can be used. Specifically, for example, a cathode coated with nickel, nickel oxide, an alloy of nickel and tin, a combination of activated carbon and an oxide, ruthenium oxide, platinum, or the like is coated on a nickel substrate. ; A ruthenium oxide-coated cathode is formed on a nickel metal wire mesh substrate. The configuration of the electrolytic cell in this embodiment is not particularly limited, and may be a unipolar type or a bipolar type. The material constituting the electrolytic cell is not particularly limited. For example, as the material of the anode chamber, titanium having resistance to alkali chloride and chlorine is preferable; as the material of the cathode chamber, it is preferable to have alkali hydroxide and hydrogen. Resistant to nickel. The electrode (anode 230) for electrolysis in this embodiment can be arranged with an appropriate interval between the electrode and the ion exchange membrane 250, and can be used without any problem even if it is arranged in contact with the ion exchange membrane 250. The cathode 240 can also be arranged with an appropriate distance from the ion-exchange membrane 250, and even if it is a contact-type electrolytic cell (zero-pitch type electrolytic cell) without a gap from the ion-exchange membrane 250, Use it questionably. There are no particular restrictions on the electrolysis conditions of the electrolytic cell of this embodiment, and it can be operated under known conditions. For example, it is preferable to perform the electrolysis by adjusting the electrolysis temperature to 50 to 120 ° C and the current density to 0.5 to 10 kA / m 2 . The electrode for electrolysis of this embodiment can reduce the electrolysis voltage when the salt is electrolyzed. Therefore, according to the electrolytic cell of this embodiment provided with the electrode for electrolysis, the power consumption required for salt electrolysis can be reduced. Furthermore, the electrode for electrolysis according to this embodiment has a catalyst layer that is extremely stable chemically, physically, and thermally, and therefore has excellent long-term durability. Therefore, according to the electrolytic cell of this embodiment provided with the electrode for electrolysis, the catalyst activity of the electrode can be maintained high for a long period of time, and high-purity chlorine can be stably produced. [Examples] Hereinafter, this embodiment will be described in more detail based on examples. This embodiment is not limited to these examples. First, each evaluation method in an Example and a comparative example is shown below. (Ion Exchange Membrane Salt Electrolysis Test) As an electrolytic cell, an electrolytic cell including an anode cell having an anode chamber and a cathode cell having a cathode chamber was prepared. The electrode for electrolysis prepared in each example and comparative example was cut into a specific size (95 × 110 mm = 0.01045 m 2 ), the obtained electrode was used as a test electrode, and the test electrode was mounted by welding. Used as the anode in the wall of the anode compartment of the anode cell. As the cathode, a catalyst coated with ruthenium oxide on a nickel wire mesh substrate was used. First, a metal nickel extension base material as a current collector is cut out in the same size as the anode and welded to the wall portion of the cathode chamber of the cathode cell. Then, a buffer pad with a braided nickel wire is mounted, and the cathode is arranged on the buffer pad. . As the gasket, a rubber gasket made of EPDM (ethylene propylene diene) was used, and an ion exchange membrane was interposed between the anode cell and the cathode cell. As this ion exchange membrane, a cation exchange membrane "Aciplex" (registered trademark) F6801 (manufactured by Asahi Kasei Corporation) for salt electrolysis was used. In order to measure the overvoltage of chlorine, using a polytetrafluoroethylene thread, platinum was removed by covering a portion of approximately 1 mm from the front end of the platinum wire covered with PFA (tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer). The exposed person is connected and fixed to the surface of the anode opposite to the ion exchange membrane to serve as a reference electrode. In the electrolytic test, the generated chlorine gas became a saturated environment, so the reference electrode showed a potential for chlorine generation. Therefore, the voltage obtained by subtracting the potential of the reference electrode from the potential of the anode was used as the chlorine overvoltage of the anode. On the other hand, as the electrolytic voltage, the potential difference between the cathode and the anode was measured. In order to measure the initial electrolytic performance of the anode, the overvoltage and electrolytic voltage were measured at 7 days after the start of electrolysis. The electrolysis conditions were performed at a current density of 6 kA / m 2 , a saltwater concentration of 205 g / L in the anode cell, a NaOH concentration of 32% by mass in the cathode cell, and a temperature of 90 ° C. As the rectifier for electrolysis, "PAD36-100LA" (manufactured by Kikusui Electronics Co., Ltd.) was used. (Accelerated test) As a test electrode to be mounted on the anode cell, a cell cut into a size of 58 × 48 mm = 0.002748 m 2 was used. Except that, the same electrolytic cell as the above-mentioned ion exchange membrane method salt electrolysis test was used. The electrolytic conditions were performed at a current density of 6 kA / m 2 , a brine concentration of 205 g / L in the anode tank, a NaOH concentration of 32% by mass in the cathode tank, and a temperature of 90 ° C. In order to confirm the durability of the test electrode, a series of operations including electrolysis stop, water washing in the electrolytic cell (10 minutes), and start of electrolysis were performed once every 7 days. Chlorine overvoltage (anode) was measured every 7 days after the start of electrolysis. Overvoltage). Furthermore, the values of Ru and Ir residues in the catalyst layer of the test electrode after electrolysis were calculated using the values obtained by fluorescent X-ray measurement (XRF) of each metal component before and after electrolysis (100 × before electrolysis). Content / content after electrolysis;%). As the XRF measurement device, Niton XL3t-800 or Niton XL3t-800s (trade name, manufactured by Thermo Scientific) was used. (D value which becomes an index of an electric double layer capacitor) The test electrode was cut into a size of 30 × 30 mm = 0.0009 m 2 , and was fixed to the electrolytic cell with a screw made of titanium. The opposite electrode system was a platinum mesh, and was subjected to an electrolytic current density of 1 kA / m 2 , 2 kA / m 2, and 3 kA / m 2 for 5 minutes each in an aqueous NaCl solution at a temperature of 85 to 90 ° C. and a salt concentration of 205 g / L. Electrolysis was performed at 4 kA / m 2 for 30 minutes to generate chlorine at the test anode. After the above electrolysis, Ag / AgCl was used as a reference electrode, the applied potential was set to a range of 0 V to 0.3 V, and the scanning speed was set to 10 mV / sec, 30 mV / sec, 50 mV / sec, 80 mV / The cyclic voltammogram was measured in seconds, 100 mV / second, and 150 mV / second, and the electrolytic current density at 0.15 V was measured at the center of the applied potential range when scanning from 0 V to the positive direction of 0.3 V, and from 0.3 V The center of the applied potential range when scanning in the opposite direction of 0 V is the electrolytic current density at 0.15 V, and the difference between the two electrolytic current densities is obtained at each of the above scanning speeds. The difference between the electrolytic current density obtained at each scanning speed and the product of 0.3 V, which is the scanning range, is approximately proportional to the scanning speed, and the slope is calculated as the D value (C / m 2) which is an indicator of the electric double layer capacitance. ). [Example 1] As the conductive substrate, a titanium extended substrate having a large mesh size (LW) of 6 mm, a small mesh size (SW) of 3 mm, and a plate thickness of 1.0 mm was used. This stretched substrate was baked in the air at 540 ° C for 4 hours, and after forming an oxide film on the surface, it was subjected to an acid treatment in 25% by mass of sulfuric acid at 85 ° C for 4 hours, and then finely set on the surface of the conductive substrate. Pre-bumping. Next, the ruthenium nitrate aqueous solution (manufactured by Furiya Metal Co., Ltd., with a ruthenium concentration of 100 g / L) was cooled with dry ice so that the element ratios (molar ratios) of ruthenium, iridium, titanium, and vanadium were 21.25: 21.25: 42.5: 15. After stirring to 5 ° C or lower, titanium tetrachloride (manufactured by Wako Pure Chemical Industries, Ltd.) was added in small amounts, and then an iridium chloride aqueous solution (manufactured by Tanaka Precious Metals Co., Ltd.) was added in small amounts each time. ) And vanadium (III) chloride (manufactured by Kishida Chemical Co., Ltd.) to obtain a coating solution A1, which is an aqueous solution having a total metal concentration of 100 g / L. The coating liquid A1 is poured into a liquid receiving tank of the coating machine, and the EPDM sponge roller is rotated to suck up the coating liquid A1 and impregnate it. The PVC roller is arranged so as to contact the upper part of the sponge roller. . Then, the conductive substrate subjected to the pretreatment is applied between the EPDM sponge roller and the PVC roller. Immediately after coating, the above-mentioned coated conductive substrate was passed between two EPDM sponge rollers wound with a cloth to wipe the excess coating liquid. Thereafter, it was dried at 50 ° C for 10 minutes, and then calcined at 400 ° C for 10 minutes in the air. Regarding the above-mentioned cycle including roll coating, drying, and firing, the firing temperature was raised to 450 ° C, and the above-mentioned cycle was repeated three times, and finally, firing at 520 ° C for one hour was performed on the conductive substrate A dark brown catalyst layer was formed to prepare an electrode for electrolysis. [Comparative Example 1] A ruthenium chloride aqueous solution (manufactured by Tanaka Noble Metal Co., Ltd., with a ruthenium concentration of 100 g / L) was cooled with dry ice so that the element ratio (molar ratio) of ruthenium, iridium, and titanium became 25:25:50. After stirring to 5 ° C or lower, titanium tetrachloride (manufactured by Wako Pure Chemical Industries, Ltd.) was added in small amounts, and then an iridium chloride aqueous solution (manufactured by Tanaka Precious Metals Co., Ltd.) was added in small amounts each time. ) To obtain a coating solution B1 which is an aqueous solution having a total metal concentration of 100 g / L. This coating liquid B1 was used, and regarding the cycle including roll coating, drying, and firing, the first firing temperature was set to 440 ° C, the temperature was then raised to 475 ° C, the above-mentioned cycle was repeated three times, and finally 520 was further performed. An electrode for electrolysis was produced in the same manner as in Example 1 except that it was calcined at 1 ° C for 1 hour. [Example 2] A coating liquid A2 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 25.45: 25.45: 30: 19.1 was used and applied to a conductive substrate, except that Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Example 3] A coating liquid A3 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 28.75: 28.75: 20: 22.5 was used and applied to a conductive substrate, except that Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Example 4] A coating liquid A4 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 32.05: 32.05: 10: 25.9 was used and applied to a conductive substrate, except that Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Example 5] A coating liquid A5 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 17.5: 17.5: 35: 30 was applied to a conductive substrate, except that Other than that, an electrode for electrolysis was produced by the same method as in Example 1. The composition of the electrode for electrolysis (metal composition of the coating liquid used to form the catalyst layer) prepared in Examples 1 to 5 and Comparative Example 1 and the measured D which becomes the index of the electric double layer capacitor The values are shown in Table 1. The unit "mol%" in the table means the mole percentage (feed ratio) with respect to all metal elements included in the formed catalyst layer. The value of the first transition metal element / Ru and the value of the first transition metal element / Ti are values calculated from the feed ratio. [Table 1] [Ion exchange membrane method salt electrolysis test] An ion exchange membrane method salt electrolysis test was performed using the electrodes for electrolysis prepared in Examples 1 to 5 and Comparative Example 1, respectively. The results are shown in Table 2. [Table 2] The electrolytic voltage at a current density of 6 kA / m 2 was 2.94 V in Examples 1 and 2, 2.92 V in Examples 3 and 4, respectively, and 2.91 V in Example 5, which was the same as in Comparative Example 1. Compared with 2.99 V, they all show extremely low values. The anode overvoltage was 0.032 V in Example 1, 0.034 V in Example 2, 0.032 V in Examples 3 and 4, and 0.031 V in Example 5, respectively. Compared with 0.057 V in Example 1, all showed lower values. [Example 6] A coating liquid A6 prepared so that the element ratios (molar ratios) of ruthenium, iridium, titanium, and vanadium became 37: 33.35: 11.15: 18.5 was applied to a conductive substrate, and Regarding the cycle including roll coating, drying, and firing, the first firing temperature was set to 310 ° C, followed by increasing the temperature to 520 ° C, and then the above-mentioned cycle was repeated 3 times, and then the firing at 520 ° C for 1 hour was performed. Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Example 7] A coating liquid A7 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 31.25: 28.1: 9.4: 31.25 was used and applied to a conductive substrate, and Regarding the cycle including roll coating, drying, and firing, the first firing temperature was set to 380 ° C, followed by increasing the temperature to 450 ° C, and then the above-mentioned cycle was repeated 3 times, and then the firing at 450 ° C for 1 hour was performed. Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Example 8] An aqueous ruthenium chloride solution (manufactured by Tanaka Noble Metal Co., Ltd. with a ruthenium concentration of 100 g / L) was used instead of an aqueous ruthenium nitrate solution. The element ratio (molar ratio) of ruthenium, iridium, titanium, and vanadium was 19.6: The coating liquid A8 prepared in the manner of 20.2: 47.09: 13.11 is applied to a conductive substrate, and the cycle including the roll coating, drying, and baking is performed at the first to eighth baking temperatures. An electrode for electrolysis was produced by the same method as in Example 1 except that the baking was performed at 393 ° C for one hour at 485 ° C. [Example 9] An aqueous ruthenium chloride solution (manufactured by Tanaka Noble Metal Co., Ltd., with a ruthenium concentration of 100 g / L) was used instead of an aqueous ruthenium nitrate solution, and cobalt (II) chloride hexahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was used instead of chlorine. Vanadium (III), and a coating liquid A9 prepared by adjusting the element ratio (mole ratio) of ruthenium, iridium, titanium, and cobalt to 50: 3: 30: 17, and applied to a conductive substrate And, for the cycle including roll coating, drying and baking, the first baking temperature was set to 440 ° C, followed by increasing the temperature to 475 ° C, and then the above-mentioned cycle was repeated 3 times, and finally, it was further performed at 520 ° C for 1 hour. Except for firing, an electrode for electrolysis was produced in the same manner as in Example 1. [Example 10] Copper (II) nitrate trihydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was used instead of vanadium (III) chloride, and the element ratio (molar ratio) using ruthenium, iridium, titanium, and copper was 32.05: Except that the coating liquid A10 prepared in the manner of 32.05: 10: 25.9 was applied to a conductive substrate, an electrode for electrolysis was produced by the same method as in Example 1. [Example 11] Zinc (II) nitrate hexahydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was used instead of vanadium (III) chloride, and the element ratio (molar ratio) using ruthenium, iridium, titanium, and zinc was 32.05: Except that the coating liquid A11 prepared in the manner of 32.05: 10: 25.9 was applied to a conductive substrate, an electrode for electrolysis was produced by the same method as in Example 1. [Comparative Example 2] A coating liquid B2 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 20: 18: 60: 2 was applied to a conductive substrate, and An aqueous ruthenium chloride solution (manufactured by Tanaka Precious Metals Co., Ltd., with a concentration of 100 g / L) was used for the preparation of the coating liquid, and the first firing temperature was set to 450 for the cycle including roll coating, drying, and firing. The above-mentioned cycle was repeated three times at 450 ° C and then baked at 450 ° C for one hour, and an electrode for electrolysis was produced in the same manner as in Example 1. [Comparative Example 3] A coating liquid B3 prepared so that the element ratios (molar ratios) of ruthenium, iridium, titanium, and vanadium were 22.7: 20.5: 34.1: 22.7 was applied to a conductive substrate, and Regarding the cycle including roll coating, drying, and firing, the first firing temperature was set to 380 ° C, and then the above-mentioned cycle was repeated 3 times at 380 ° C, and finally the firing at 590 ° C for 1 hour was performed. Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Comparative Example 4] A coating liquid B4 prepared so that the element ratio (mole ratio) of ruthenium, iridium, titanium, and vanadium becomes 28.6: 25.7: 42.8: 2.9 is applied to a conductive substrate, and Regarding the cycle including roll coating, drying and firing, the first firing temperature was set to 450 ° C, followed by increasing the temperature to 520 ° C, and then the above-mentioned cycle was repeated 3 times, and then the firing at 520 ° C was performed for 1 hour. Other than that, an electrode for electrolysis was produced by the same method as in Example 1. [Comparative Example 5] A coating liquid B5 prepared by applying an element ratio (molar ratio) of ruthenium, iridium, titanium, and vanadium to 18.5: 16.7: 55.55: 9.25 was applied to a conductive substrate, and An aqueous ruthenium chloride solution (manufactured by Tanaka Noble Metal Co., Ltd., with a concentration of 100 g / L) was used for the preparation of the coating solution, and the first baking temperature was set to 310 for a cycle including roll coating, drying, and baking. The temperature was raised to 380 ° C, followed by repeating the above-mentioned cycle three times, and finally firing at 590 ° C for one hour. Except that, an electrode for electrolysis was produced in the same manner as in Example 1. [Comparative Example 6] Manganese nitrate (manufactured by Wako Pure Chemical Industries, Ltd.) was used instead of vanadium (III) chloride in Example 1, and the element ratio (molar ratio) of ruthenium, iridium, titanium, and manganese was 21.25: 21.25: An electrolytic electrode was prepared by the same method as in Example 1 except that the coating liquid B6 prepared in the manner of 42.5: 15 was applied to a conductive substrate. [Comparative Example 7] Zinc nitrate (manufactured by Wako Pure Chemical Industries, Ltd.) was used instead of vanadium (III) chloride in Example 1, and the element ratio (molar ratio) of ruthenium, iridium, titanium, and zinc was 21.25: 21.25: An electrolytic electrode was prepared by the same method as in Example 1 except that the coating liquid B7 prepared in the manner of 42.5: 15 was applied to a conductive substrate. [Comparative Example 8] Palladium nitrate (manufactured by Wako Pure Chemical Industries, Ltd.) was used instead of vanadium (III) chloride in Example 1, and the element ratio (molar ratio) of ruthenium, iridium, titanium, and palladium was 16.9: 15.4: The coating liquid B8 prepared in the manner of 50.8: 16.9 is applied to a conductive substrate. Regarding the cycle including roll coating, drying, and baking, the first baking temperature is set to 450 ° C, and the second temperature is raised to The above-mentioned cycle was repeated three times at 520 ° C, and finally, baking was further performed at 590 ° C for one hour, and an electrode for electrolysis was produced by the same method as in Example 1. [Comparative Example 9] A coating liquid B9 prepared so that the element ratio (mole ratio) of ruthenium, titanium, and vanadium becomes 40:40:20 was applied to a conductive substrate, and the coating liquid was applied to the conductive liquid. For the preparation, an aqueous ruthenium chloride solution (manufactured by Tanaka Noble Metal Co., Ltd., with a ruthenium concentration of 100 g / L) was used. Regarding the cycle including roll coating, drying, and baking, the first baking temperature was set to 440 ° C, and the second temperature was raised The above-mentioned cycle was repeated three times to 475 ° C, and finally, baking was further performed at 520 ° C for one hour, and an electrode for electrolysis was produced by the same method as in Example 1. The configurations of the electrodes for electrolysis (metal composition of the coating liquid used to form the catalyst layer) prepared in Examples 6 to 11 and Comparative Examples 2 to 9 were respectively measured to be electric double-layer capacitors. The D value of the index is shown in Table 3. The unit "mol%" in the table means the mole percentage (feed ratio) with respect to all metal elements included in the formed catalyst layer. The value of the first transition metal element / Ru and the value of the first transition metal element / Ti are values calculated from the feed ratio. [table 3] [Acceleration Test] The acceleration tests were performed using the electrodes for electrolysis prepared in Examples 1 to 11 and Comparative Examples 1 to 9, respectively. The results are shown in Table 4. In addition, since the durability of Comparative Example 9 ruthenium was low, it was an evaluation result at the time when the test was suspended after 14 days. [Table 4] The results of the 21-day accelerated test were as follows. The anode overvoltages of the electrode systems for electrolysis in Examples 1 to 11 were 0.030 to 0.045 V one day after the test was started, and the anode overvoltages were 0.030 to 0.039 V after 21 days. In contrast, the anode overvoltages of the electrolytic electrode system tests of Comparative Examples 1 to 8 were 0.042 to 0.110 V one day after the test was started, and the anode overvoltages were 0.043 to 0.093 V 21 days later. As described above, it was confirmed that, compared with the comparative example, the example can achieve electrolysis with low voltage and low power consumption in the initial stage of electrolysis and for a long period of time. In addition, it was confirmed that, compared with Comparative Example 9 in which the anode overvoltage was the same, in Examples 1 to 11, even after 21 days from the start of the test, the residual rates of Ru and Ir were higher, and one side The anode overvoltage is kept low, and the durability during long-term electrolysis is also sufficient. This application is based on a Japanese patent application filed on November 22, 2016 (Japanese Patent Application No. 2016-227066), the contents of which are incorporated herein by reference. [Industrial Applicability] The electrode for electrolysis of the present invention exhibits low overvoltage generated by chlorine, and can achieve electrolysis with low voltage and low power consumption. Therefore, it can be preferably used in the field of salt electrolysis. It is particularly useful as an anode for salt electrolysis by the ion-exchange membrane method, and can continuously produce high-purity chlorine gas with low oxygen concentration with low voltage and low power consumption for a long period of time.

200‧‧‧電解用電解槽200‧‧‧ electrolytic cell for electrolysis

210‧‧‧電解液210‧‧‧ Electrolyte

220‧‧‧容器220‧‧‧container

230‧‧‧陽極(電解用電極)230‧‧‧Anode (electrode for electrolysis)

240‧‧‧陰極240‧‧‧ cathode

250‧‧‧離子交換膜250‧‧‧ ion exchange membrane

260‧‧‧配線260‧‧‧Wiring

圖1係本實施形態之電解槽之一例之剖面模式圖。 圖2係表示針對V與Ti之元素比(莫耳比)不同之4個試樣,將藉由XPS(X-ray Photoelectron Spectroscopy,X射線光電子光譜法)深度方向分析所求出之V/Ti的實測值、與塗佈液中之饋入V/Ti值進行繪製並進行線性近似所得之結果的曲線圖。FIG. 1 is a schematic cross-sectional view of an example of an electrolytic cell according to this embodiment. FIG. 2 shows V / Ti obtained by analyzing the depth direction of XPS (X-ray Photoelectron Spectroscopy) for 4 samples with different element ratios (molar ratios) of V and Ti. A graph of the actual measured value and the feed V / Ti value in the coating solution, and the results obtained by linear approximation.

Claims (9)

一種電解用電極,其係具備: 導電性基材、及 形成於上述導電性基材之表面上之觸媒層者,且 上述觸媒層包含釕元素、銥元素、鈦元素、以及選自由Sc、V、Cr、Fe、Co、Ni、Cu及Zn所組成之群中之至少一種第一過渡金屬元素, 上述觸媒層所包含之第一過渡金屬元素相對於上述鈦元素1莫耳之含有比率為0.25莫耳%以上且未達3.4莫耳%, 上述電解用電極之成為電雙層電容之指標之D值為120 C/m2 以上且420 C/m2 以下。An electrode for electrolysis, comprising: a conductive substrate, and a catalyst layer formed on a surface of the conductive substrate, wherein the catalyst layer includes a ruthenium element, an iridium element, a titanium element, and a member selected from the group consisting of Sc At least one first transition metal element in the group consisting of V, Cr, Fe, Co, Ni, Cu and Zn, and the first transition metal element contained in the catalyst layer contains 1 mole of the titanium element. The ratio is 0.25 mol% or more and less than 3.4 mol%. The D value of the above-mentioned electrode for electrolysis to be an electric double-layer capacitor is 120 C / m 2 or more and 420 C / m 2 or less. 如請求項1之電解用電極,其中上述第一過渡金屬元素與釕氧化物、銥氧化物及鈦氧化物之固溶體形成固溶體。The electrode for electrolysis according to claim 1, wherein the first transition metal element and the solid solution of ruthenium oxide, iridium oxide, and titanium oxide form a solid solution. 如請求項1或2之電解用電極,其中上述第一過渡金屬元素包含選自由釩、鈷、銅及鋅所組成之群中之至少一種金屬元素。The electrode for electrolysis according to claim 1 or 2, wherein the first transition metal element includes at least one metal element selected from the group consisting of vanadium, cobalt, copper, and zinc. 如請求項1至3中任一項之電解用電極,其中上述第一過渡金屬元素包含釩元素。The electrode for electrolysis according to any one of claims 1 to 3, wherein the first transition metal element includes a vanadium element. 如請求項1至4中任一項之電解用電極,其中上述第一過渡金屬元素相對於上述觸媒層所包含之所有金屬元素之含有率為10莫耳%以上且30莫耳%以下。The electrode for electrolysis according to any one of claims 1 to 4, wherein the content ratio of the first transition metal element to all the metal elements contained in the catalyst layer is 10 mol% or more and 30 mol% or less. 如請求項1至5中任一項之電解用電極,其中上述觸媒層所包含之上述第一過渡金屬元素相對於上述釕元素1莫耳之含有比率為0.3莫耳以上且未達2莫耳。The electrolytic electrode according to any one of claims 1 to 5, wherein a content ratio of the first transition metal element contained in the catalyst layer to 1 mol of the ruthenium element is 0.3 mol or more and less than 2 mol. ear. 如請求項1至6中任一項之電解用電極,其中上述D值為120 C/m2 以上且380 C/m2 以下。The electrode for electrolysis according to any one of claims 1 to 6, wherein the above-mentioned D value is 120 C / m 2 or more and 380 C / m 2 or less. 一種電解用電極之製造方法,其係用以製造如請求項1至7中任一項之電解用電極之方法,其具有如下步驟: 製備含有釕化合物、銥化合物、鈦化合物、及包含上述第一過渡金屬元素之化合物之塗佈液; 將上述塗佈液塗佈於上述導電性基材之至少單面上而形成塗膜;及 於含氧環境下焙燒上述塗膜而形成上述觸媒層。A method for manufacturing an electrode for electrolysis, which is a method for manufacturing the electrode for electrolysis according to any one of claims 1 to 7, which has the following steps: preparing a ruthenium compound, an iridium compound, a titanium compound, and A coating liquid of a compound of a transition metal element; coating the coating liquid on at least one side of the conductive substrate to form a coating film; and firing the coating film in an oxygen-containing environment to form the catalyst layer . 一種電解槽,其具備如請求項1至7中任一項之電解用電極。An electrolytic cell provided with the electrode for electrolysis according to any one of claims 1 to 7.
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