TW201816835A - Processing liquid generator and substrate processing apparatus using the same - Google Patents

Abstract

A processing liquid generator that generates processing liquid having undergone concentration adjustment includes a processing liquid adjuster, which adjusts the concentration of the processing liquid, a first processing liquid path, through which the processing liquid flows to the processing liquid adjuster, a second processing liquid path, through which the processing liquid flows to the processing liquid adjuster, a first concentration meter, which measures the concentration of the processing liquid flowing through the first processing liquid path, the measured concentration being the concentration of a component involved in the concentration adjustment in the processing liquid adjuster, a second concentration meter, which measures the concentration of the processing liquid flowing through the second processing liquid path, the measured concentration being the concentration of a component that is involved in the concentration adjustment and should be measured with the first concentration meter in terms of concentration, a first valve mechanism, which opens and closes the first processing liquid path, and a second valve mechanism, which opens and closes the second processing liquid path.

Description

Processing liquid generating device and substrate processing device using the same

FIELD OF THE INVENTION The present invention relates to a processing liquid generating device for generating a processing liquid for a semiconductor wafer processing program and the like, and a substrate processing device using the same.

BACKGROUND OF THE INVENTION Hitherto, an organic substance peeling device (an example of a substrate processing device) described in Patent Document 1 is known. The organic substance peeling device supplies a chemical solution (a peeling treatment solution) to the surface of a semiconductor wafer (an example of a substrate), and removes organic substances such as a photoresist or a polymer formed in a manufacturing process of the semiconductor wafer. In this peeling device for organic matter, the concentration of each component constituting the medicinal solution and the concentration of pure water is measured by a concentration meter (organic component concentration meter, water concentration meter), and the respective components are mixed in a circulation tank (chemical solution tank) It is circulated, and each component and pure water are added to a circulation tank so that the measured concentration value of each component and pure water may be maintained in a predetermined range. As a result, a chemical liquid (peeling treatment liquid) composed of each component and moisture held within a predetermined concentration range is generated in the circulation tank (function as a treatment liquid generation device). Then, the chemical solution generated in the circulation tank is supplied to the surface of the semiconductor wafer supported on the turntable through a peeling liquid supply pipe.

According to such an organic substance stripping device, since the concentration of each component of the medicinal solution stored in the circulation tank (medicine solution tank) is measured, and only the component having a lower concentration is added to the circulation tank, it can be stored in the circulation tank. The concentration of each component of the chemical liquid is kept within a predetermined range, respectively. Therefore, the peeling performance of the chemical solution can be maintained at a high level, and the chemical solution stored in the circulation tank can be repeatedly used for the peeling treatment of the organic substance formed on the semiconductor wafer. [Antecedent Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2005-347384

SUMMARY OF THE INVENTION The problem to be solved by the present invention is applicable to a processing liquid (medicine liquid) generating device for an organic material peeling device as described above. Since the concentration of each component of the chemical liquid (processing liquid) is measured with a single concentration meter, the concentration The reliability of the measurement depends on a single densitometer. Therefore, the reliability of the concentration of the produced processing liquid may not necessarily be sufficient. The present invention has been made in view of such a situation, and therefore, a processing liquid generating device capable of improving the reliability of the concentration of the generated processing liquid is provided.

The present invention also provides a substrate processing apparatus for processing a substrate using a processing solution generated by the processing solution generating apparatus.

Solution to Problem The processing liquid generating device of the present invention is a processing liquid generating device that generates a concentration-adjusted processing liquid based on a measured concentration of a densitometer, and includes a processing liquid adjusting unit for adjusting the concentration of the processing liquid; The processing liquid path causes the processing liquid to flow to the processing liquid adjusting section; the second processing liquid path causes the processing liquid to flow to the processing liquid adjusting section; and the first concentration meter is used to measure the amount of the processing liquid flowing through the first processing path. Concentration, and the foregoing concentration is the concentration of the components related to the concentration adjustment in the processing liquid adjusting section; the second concentration meter is used to measure the concentration of the processing liquid flowing in the second processing liquid path, and the concentration is determined by The first concentration meter measures the concentration measurement, and adjusts the concentration of the components related to the concentration adjustment in the processing liquid adjusting section; a first valve mechanism for opening and closing the first processing liquid path; and a second valve mechanism for The second processing liquid path is opened and closed.

According to such a configuration, when the first processing liquid path and the second processing liquid path are opened by the first valve mechanism and the second valve mechanism, the processing liquid flows in the first processing liquid path and flows into the processing liquid. The processing liquid flows in the second processing liquid path and flows into the processing liquid adjusting section. In this state, the processing liquid adjusting unit may perform the concentration adjustment of the processing liquid based on the measured concentration of at least one of the first concentration meter and the second concentration meter, that is, perform the determination of the components in the processing liquid. For the concentration adjustment, the first concentration meter is used to measure the concentration of the processing liquid flowing in the first processing liquid path, and the concentration is the concentration of components related to the concentration adjustment, and the second concentration meter is used to measure the concentration The concentration of the processing liquid flowing in the second processing liquid path, and the concentration is a concentration of a component to be measured by the concentration of the first concentration meter and the concentration adjustment.

When the first processing liquid path is opened by the first valve mechanism, and when the second processing liquid path is closed by the second valve mechanism, the processing liquid does not flow in the second processing liquid path, and the processing liquid is in the first (1) The process liquid flow flows into the process liquid adjustment section. In this state, the processing liquid adjusting unit may adjust the measurement concentration of the first concentration meter based on the concentration of the processing liquid used to measure the concentration of the processing liquid flowing in the first processing liquid path, and the concentration of the relevant components. The concentration of the processing liquid is adjusted, that is, the concentration of the aforementioned components in the processing liquid is adjusted.

When the first processing liquid path is closed by the first valve mechanism and the second processing liquid path is opened by the second valve mechanism, the processing liquid does not flow through the first processing liquid path and does not pass through the first concentration. The processing liquid flows through the second processing liquid path and flows into the processing liquid adjustment unit through the second concentration meter. In this state, the processing liquid adjustment unit can perform the concentration adjustment of the processing liquid based on the measured concentration in the second concentration meter, that is, the concentration adjustment of the components in the processing liquid that should be adjusted in concentration.

In addition, the substrate processing apparatus of the present invention includes a processing liquid generating device for generating a processing liquid whose concentration is adjusted according to a measured concentration in a densitometer; a table for holding the substrate; and a driving mechanism for causing the foregoing The table is rotated; and a processing liquid supply mechanism supplies the processing liquid generated by the processing liquid generating device to the surface of the substrate rotated together with the table. The processing liquid generating device includes a processing liquid adjusting unit for: Adjusting the concentration of the processing liquid; a first processing liquid path to flow the processing liquid to the processing liquid adjusting section; a second processing liquid path to flow the processing liquid to the processing liquid adjusting section; and a first concentration meter for measuring the 1 The concentration of the processing liquid flowing in the processing liquid path, and the concentration is the concentration of the relevant components in the concentration adjustment section of the processing liquid adjusting section; the second concentration meter is used to measure the processing liquid flowing in the second processing liquid path And the aforementioned concentration is the concentration of a component whose concentration should be measured by the aforementioned first concentration meter and which is adjusted in the concentration adjustment of the processing solution adjusting section; A first valve mechanism is used to open and close the first processing liquid path; and a second valve mechanism is used to open and close the second processing liquid path.

ADVANTAGE OF THE INVENTION According to the processing-solution production apparatus of this invention, the reliability of the density | concentration of the processing liquid produced can be improved.

In addition, according to the substrate processing apparatus of the present invention, the substrate can be processed by the processing liquid generated by the processing liquid generating apparatus.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT Hereinafter, an embodiment of the present invention will be described using drawings.

A substrate processing apparatus including a processing liquid generating apparatus according to an embodiment of the present invention is configured as shown in FIG. 1.

In FIG. 1, the substrate processing apparatus includes two processing liquid generating devices, two systems of processing liquid supply (processing liquid supply mechanism) / recovery system, and a rotation device 100. One of the processing liquid generating devices is configured to include a first supply tank 11a, two integrating flow meters 14a, 15a, two adjusting valves 16a, 17a, a first pump 18a, an on-off valve 19a, and two generating systems. Directional valves 21, 22, first upstream valve group 12a, upstream second valve group 12b, first concentration meter side portion 20a, second concentration meter side portion 20b, downstream side first valve group 13a, and downstream side 2 valve group 13b. The other processing liquid generating device is configured to share the two three-way valves 21 and 22, the first upstream valve group 12a, and the second upstream valve group 12b of the circulation system with one of the foregoing processing liquid generating devices; the first concentration meter The side portion 20a, the second concentration meter side portion 20b, the downstream first valve group 13a, and the downstream second valve group 13b further include a second supply tank 11b, two integrating flow meters 14b, 15b, Two adjustment valves 16b, 17b, a second pump 18b, and an on-off valve 19b. The processing liquid supply / recovery system of one system is configured to share the first supply tank 11a and the first pump 18a with one of the processing liquid generating devices described above, and includes three-way valves 23, 24 and a recovery tank 10. In addition, the processing liquid supply / recovery system of the other system is configured to share the second supply tank 11b and the second pump 18b with the other processing liquid generating device, and to share the processing liquid supply / recovery system of one of the systems. The recovery tank 10 and two three-way valves 23 and 24.

As described later, the processing liquid generated by the concentration adjustment in the first supply tank 11a is switched to the first supply tank 11a side by the three-way valve 23, and the first pump 18a is operated, and the first supply tank 11a passes through the three The valve 23 is supplied to the nozzle 111 in the rotary device 100, and a processing liquid (processing liquid supply mechanism) is discharged from the nozzle 111. The rotating device 100 is provided with a support table 110 (table) rotated by a driving mechanism 112 such as a motor, and the nozzle 111 is arranged to face the semiconductor wafer W supported by the support table 110 at its peripheral portion. A cup portion 115 is provided to cover the lower side from the side of the support base 110. A processing liquid (e.g., an etching solution) discharged from the nozzle 111 is applied to the surface of the semiconductor wafer W that rotates together with the support table 110, and the surface of the semiconductor wafer W is processed (etched) by the processing liquid. The used processing liquid scattered from the surface of the rotating semiconductor wafer W is stored in the cup portion 115, and further collected in the recovery tank 10 through a discharge path (not shown). Next, the used processing liquid in the recovery tank 10 is returned to the first supply tank 11a by switching to the three-way valve 24 on the side of the first supply tank 11a.

On the other hand, when the two three-way valves 23 and 24 are switched to the side of the second supply tank 11b, the processing liquid generated by the concentration adjustment in the second supply tank 11b is moved from the first pump 18b by the operation of the second pump 18b. The 2 supply tank 11 b is supplied to the nozzle 111 (processing liquid supply mechanism) of the rotary device 100 through the three-way valve 23. In the same manner as described above, the surface of the semiconductor wafer W spouted from the nozzle 111 and applied to the rotation device 100 is recovered into the recovery tank 10 as a used processing liquid, and further passes from the recovery tank 10 through the three-way valve 24 Then, it returns to the second supply tank 11b.

The processing liquid supply (processing liquid supply mechanism) / recovery system of the two systems divided into the aforementioned first supply tank 11a and second supply tank 11b depends on the state (amount, concentration, and concentration) of the processing liquid in each supply tank 11a, 11b. The amount of impurities, etc.) is appropriately switched by the three-way valves 23 and 24. As a result, in the rotating device 100, the surface treatment of the semiconductor wafer W by the processing liquid in an appropriate state (concentration, etc.) can be continued.

Next, a specific configuration of the processing liquid generating device will be described. In addition, the two treatment liquid generating devices share the first upstream valve group 12a, the second upstream valve group 12b, the first downstream valve group 13a, the second downstream valve group 13b, and the first concentration meter side portion 20a. Since the second concentration meter side portion 20b and the two three-way valves 21 and 22 have a plurality of similar components and perform the same operation, one of the processing liquid generating devices including the first supply tank 11a will be described.

The liquid path provided with the integral flow meter 14a and the adjustment valve 16a is connected to the first supply tank 11a, and a raw solution of a processing liquid (for example, an aqueous phosphoric acid solution as an etching solution) is supplied to the first supply tank 11a through the liquid path. The liquid path provided with the integral flow meter 15a and the adjustment valve 17a is connected to the first supply tank 11a, and the diluent (for example, pure water) is supplied to the first supply tank 11a through the liquid path.

A circulating fluid path is formed from the first supply tank 11a and returned to the first supply tank 11a by the first pump 18a and the on-off valve 19a. In addition, a first supply tank 11a, a first pump 18a, a three-way valve 21, a first upstream valve group 12a, a first concentration meter side portion 20a, a first downstream valve group 13a, and a three-way valve are formed. 22 and returns to the liquid path P1 of the first supply tank 11a. Hereinafter, this liquid path P1 is referred to as a first circulation liquid path P1 (first processing liquid path). Furthermore, a first supply tank 11a is formed, and via a first pump 18a, a three-way valve 21, a second upstream valve group 12b, a second concentration meter side portion 20b, a second downstream valve group 13b, and a three-way valve 22 and returns to the liquid path P2 of the first supply tank 11a. Hereinafter, this liquid path P2 is referred to as a second circulation liquid path P2 (second processing liquid path).

The upstream first valve group 12a, the upstream second valve group 12b, the downstream first valve group 13a, and the downstream second valve group 13b are configured as shown in FIG. 2A.

The upstream first valve group 12 a includes an on-off valve 120 a provided on the first circulation liquid path P1 extending from the three-way valve 21, and the upstream second valve group 12 b includes a second circulation liquid path extending from the three-way valve 21. On-off valve 120b of P2. The first downstream valve group 13a includes an on-off valve 130a provided in the first circulation liquid path P1. The first circulation liquid path P1 extends to the three-way valve 22 through the first concentration meter side portion 20a, and the second valve group on the downstream side 13b includes an on-off valve 130b provided in the second circulation liquid path P2, and the second circulation liquid path P2 extends to the three-way valve 22 through the second concentration meter side portion 20b.

The group of the on-off valve 120a included in the upstream first valve group 12a and the on-off valve 130a included in the first downstream valve group 13a is configured to be the first to perform the opening and closing of the first circulation liquid path P1 (the first processing liquid path). 1 valve mechanism. The group of the on-off valve 120b included in the upstream second valve group 12b and the on-off valve 130b included in the second downstream valve group 13b is configured to open and close the second circulation liquid path P2 (second processing liquid path). 2nd valve mechanism.

Although not shown in FIG. 1, the upstream first valve group 12a, the upstream second valve group 12b, the downstream first valve group 13a, and the downstream second valve group 13b include a plurality of openings and closings for opening and closing other liquid paths. valve. Specifically, as shown in FIG. 2A, in addition to the first circulation liquid path P1, two liquid paths Pc1 and Pp1 passing through the first concentration meter side portion 20a are formed, and in addition to the second circulation liquid path P2, There are two liquid paths Pc2 and Pp2 passing through the second concentration meter side portion 20b. The liquid path Pc1 is a liquid path extending from the liquid source of the correction liquid used for the correction of the densitometer used in the first concentration meter side portion 20a to the discharge portion through the first concentration meter side portion 20a, and constitutes the first correction liquid path. Pc1. The correction liquid may be a liquid having the same composition as the processing liquid. The first correction liquid path Pc1 supplies a correction liquid having a known concentration. In addition, as long as the concentration of the calibration solution through the concentration measurement is known, the calibration solution can be directly supplied from the source of the calibration solution, and the calibration solution from the source can also be supplied after being adjusted to a predetermined concentration. The liquid path Pc2 is a liquid path extending from the liquid source of the same calibration solution to the discharge section through the second concentration meter side section 20b, and the calibration solution flowing through this liquid path Pc2 is also used in the second concentration meter side section 20b. The calibration of the densitometer constitutes a second calibration liquid path Pc2. The liquid path Pp1 is a liquid path extending from a liquid source of pure water to the discharge section through the first concentration meter side portion 20a, and constitutes a first cleaning liquid path Pp1. The liquid path Pp2 is a liquid path extending from the same pure water liquid source to the discharge portion through the second concentration meter side portion 20b, and constitutes a second cleaning liquid path Pp2.

The upstream-side first valve group 12 a includes an on-off valve 121 a provided on the first cleaning liquid path Pp1 and an on-off valve 122 a provided on the first correction liquid path Pc1. The downstream first valve group 13a also includes an on-off valve 131a provided in the first cleaning liquid path Pp1 and an on-off valve 132a provided in the first correction liquid path Pc1. The upstream second valve group 12b includes an on-off valve 121b provided in the second cleaning liquid path Pp2 and an on-off valve 122b provided in the second correction liquid path Pc2. The downstream second valve group 13b also includes an on-off valve 131b provided in the second cleaning liquid path Pp2 and an on-off valve 132b provided in the second correction liquid path Pc2.

The set of the on-off valve 122a of the upstream first valve group 12a and the on-off valve 132a of the first downstream valve group 13a is configured as a third valve mechanism for opening and closing the first correction liquid path Pc1. The set of the on-off valve 122b of the upstream second valve group 12b and the on-off valve 132b of the second downstream valve group 13b is a fourth valve mechanism configured to open and close the second correction liquid path Pc2. The set of the on-off valve 121a of the upstream first valve group 12a and the on-off valve 131a of the downstream valve group 13a is configured as a fifth valve mechanism for opening and closing the first cleaning liquid path Pp1, and the upstream second valve group The group of the on-off valve 121b of 12b and the on-off valve group 131b of the second valve group 13b on the downstream side is configured as a sixth valve mechanism for opening and closing the second cleaning liquid path Pp2.

The first concentration meter side portion 20a is configured as shown in FIG. 2B, and the second concentration meter side portion 20b is configured as shown in FIG. 2C.

As shown in FIG. 2B, the first concentration meter side portion 20a includes a first concentration meter 201a, an upstream first switching valve 202a, and a downstream first switching valve 203a. As described above, the three liquid paths provided with the first circulation liquid path P1, the first correction liquid path Pc1, and the first cleaning liquid path Pp1 of the upstream first valve group 12a and the downstream first valve group 13a are in the first position. In the concentration meter side portion 20a, the upstream first switching valve 202a is connected in parallel on the upstream side and the downstream first switching valve 203a is connected in parallel on the downstream side, thereby integrating the upstream first switching valve 202a and One flow path Pm1 connected to the downstream-side first switching valve 203a. A first concentration meter 201a is provided in a portion of the flow path Pm1.

In the first concentration meter side portion 20a as described above, when the switching operation of the upstream first switching valve 202a and the downstream first switching valve 203a causes the liquid path Pm1 to communicate with the first circulation liquid path P1, the first circulation The processing liquid flowing through the liquid path P1 flows through the liquid path Pm1. Thereby, the concentration of the processing liquid flowing in the liquid path Pm1 can be measured by the first concentration meter 201a, that is, the concentration of the processing liquid flowing in the first circulation liquid path P1 can be measured. In addition, due to the switching operation of the first switching valve 202a on the upstream side and the first switching valve 203a on the downstream side, when the flow path Pm1 communicates with the first correction liquid path Pc1, the correction liquid flowing in the first correction liquid path Pc1 is in The flow in the liquid path Pm1 allows the first concentration meter 201a to be calibrated. Furthermore, by the switching operation of the upstream first switching valve 201a and the downstream first switching valve 203a, when the flow path Pm1 communicates with the first cleaning liquid path Pp1, the cleaning flowing in the first cleaning liquid path Pp1 The liquid flows through the liquid path Pm1, and the liquid path Pm1 and the first concentration meter 201a can be cleaned by the cleaning liquid.

As shown in FIG. 2C, the second concentration meter side portion 20b includes a second concentration meter 201b, a second upstream switching valve 202b, and a second downstream switching valve 203b. As described above, the three liquid paths provided with the second circulation liquid path P2, the second correction liquid path Pc2, and the second cleaning liquid path Pp2 of the upstream second valve group 12b and the downstream second valve group 13b are in the second position. In the concentration meter side portion 20b, the upstream side second switching valve 202b is connected in parallel on the upstream side, and the downstream side second switching valve 203b is connected in parallel on the downstream side. The liquid path Pm2 connected to the downstream second switching valve 203b. A second concentration meter 201b is provided in a portion of the liquid path Pm2.

In such a second concentration meter side portion 20b, the switching operation of the upstream second switching valve 202b and the downstream second switching valve 203b causes the liquid path Pm2 to communicate with the second circulating liquid path P2, and the second The processing liquid flowing in the circulating liquid path P2 flows in the liquid path Pm2, and the concentration of the processing liquid flowing in the liquid path Pm2 can be measured by the second concentration meter 201b. In addition, by the switching operation of the upstream second switching valve 202b and the downstream second switching valve 203b, when the liquid path Pm2 communicates with the second correction liquid path Pc2, the correction liquid flowing in the second correction liquid path Pc2 becomes the The liquid path Pm2 flows, and the second concentration meter 201a can be calibrated. Furthermore, by the switching operation of the upstream second switching valve 202b and the downstream second switching valve 203b, when the flow path Pm2 communicates with the second cleaning liquid path Pp1, the cleaning flowing in the second cleaning liquid path Pp2 The liquid flows through the liquid path Pm2, and the liquid path Pm2 and the second concentration meter 201b can be cleaned by the cleaning liquid.

The first densitometer 201a provided in the first densitometer side portion 20a and the second densitometer 201b provided in the second densitometer side portion 20b are measured on the densitometer side portions 20a and 20b by different measuring principles. The concentration of the flowing processing solution (calibration solution) is output, and a measurement signal corresponding to the measurement concentration is output. In other words, the first concentration meter 201a and the second concentration meter 201b are based on the treatment liquids that flow through the first circulation liquid path P1 and the second circulation liquid path P2 (more specifically, the liquid paths Pm1 and Pm2 treatment solution) was measured using different measurement principles. The first concentration meter 201a (see FIG. 2B) can be used, for example, to measure the concentration based on the electrical conductivity of the target liquid. As shown in FIG. 2C, the second concentration meter 201b is composed of a laser light source and a light-receiving portion provided through the transparent portion TP of the liquid path Pm2, and can be used to optically measure the concentration of the target liquid. The first concentration meter 201a and the second concentration meter 201b can be used, for example, those who measure the concentration by using ultrasound, those who measure the concentration by using infrared rays, and the like.

In addition, the first concentration meter 201a and the second concentration meter 201b measure the concentration of the same component related to the adjusted concentration of the first supply tank 11a or the second supply tank 11b (included in the processing liquid adjustment unit) in the processing liquid as the The concentration of the treatment liquid. For example, if the treatment solution is an etching treatment solution of an aqueous phosphoric acid solution, and the phosphoric acid concentration adjustment in the etching treatment solution is performed as the concentration adjustment of the treatment solution, the first concentration meter 201a and the second concentration meter 201b measure the phosphoric acid in the etching treatment solution. The concentration is taken as the concentration of the treatment liquid. In general, even if the processing liquid contains a plurality of components, the first concentration meter 201a and the second concentration meter 201b measure the adjusted concentration in the first supply tank 11a or the second supply tank 11b (included in the processing liquid adjustment unit). The concentration of the same component is used as the concentration of the treatment liquid.

In addition, at least one of the first concentration meter 201a and the second concentration meter 201b is a concentration capable of measuring a plurality of components (for example, a phosphoric acid concentration and a water concentration). If one of the densitometers performs concentration measurement of a plurality of components including a component related to concentration adjustment, the other densitometer only needs to perform concentration measurement of at least the component related to concentration adjustment. Thereby, at least both the first concentration meter 201a and the second concentration meter 201b can measure the concentration measurement of at least the components related to the concentration adjustment, and based on the measured concentration of at least one of the first concentration meter 201a and the second concentration meter 201b. , You can adjust the component concentration in the processing solution.

As described above, the control system of the processing liquid generating device is configured as shown in FIG. 3.

In FIG. 3, the processing liquid supply device includes a control unit 30. The control unit 30 controls the first concentration meter side portion 20a (see FIG. 2B), and the first concentration meter side portion 20a upstream of the first switching valve 202a and the downstream side first switching valve 203a communicates the liquid path Pm1 to In the first circulation liquid path P1, in the second concentration meter side portion 20b (see FIG. 2C), the liquid path Pm2 communicates with the second circulation path P2, and the second switching valve on the upstream side of the second concentration meter side portion 20b is driven and controlled. 202b and the second downstream switching valve 203b. In this state, the control unit 30 monitors the flow rate information of the processing liquid (for example, an etching treatment liquid that is an aqueous phosphoric acid solution) from the integrating flowmeter 14a and the flow rate information of the diluent (for example, pure water) from the integrating flowmeter 15a, and Based on the measured concentration (for example, the measured concentration of phosphoric acid) based on the first concentration meter side portion 20a (first concentration meter 201a: see FIG. 2B) and the second concentration meter side portion 20b (second concentration meter 201b: see FIG. 2C). The driving circuit 31a for controlling the adjustment valves 16a and 17a is controlled, and the adjustment valves 16a and 17a are provided in two liquid paths for supplying the processing liquid and the diluent to the first supply tank 11a. Thereby, the concentration (for example, phosphoric acid concentration) of the processing liquid generated in the first supply tank 11a is adjusted. In addition, the control unit 30 monitors the flow rate information of the processing liquid from the integrating flowmeter 14b and the flow rate information of the diluent from the integrating flowmeter 15b, and based on the measurement at the first concentration meter side portion 20a and the second concentration meter side portion 20b. The control circuit 31b controls the drive circuits 31b for driving the adjustment valves 16b and 17b. The adjustment valves 16b and 17b are provided in two liquid paths for supplying the processing liquid and the diluent to the second supply tank 11b. Thereby, the density | concentration of the processing liquid produced in the 2nd supply tank 11b is adjusted. The details of the density adjustment will be described later.

The control unit 30 controls the driving circuit 34a for switching the three-way valve 23 of the processing liquid supply / recovery system to switch the supply source of the processing liquid to the rotary device 100 (the nozzle 111) to the first supply tank 11a and the second supply. Either of the slots 11b. In addition, the control unit 30 controls the driving circuit 34a for switching the three-way valve 24 for driving the processing liquid supply / recovery system to switch the transfer destination of the used processing liquid returned from the rotary device 100 to the recovery tank 10 to the first Either the first supply tank 11a or the second supply tank 11b.

The control unit 30 controls the drive circuit 34b for performing switching control of the three-way valves 21 and 22 for generating a circulation system so as to circulate through the first concentration meter side portion 20a and the second concentration meter side portion 20b and adjust the concentration to be adjusted. The storage source of the processing liquid is switched to either the first supply tank 11a or the second supply tank 11b. During the concentration adjustment, the control unit 30 controls the drive circuit 33a. The drive circuit 33a performs an on-off valve 120a and a first valve on the downstream side of the first valve group 12a on the upstream side of the first circulation liquid path P1 (see FIG. 2A). The opening and closing valve 130a of the group 13a is driven. At this time, the control unit 30 controls the drive circuit 33b, and the drive circuit 33b performs an on-off valve 120b and a second valve group 13b on the upstream side of the second valve group 12b and the second valve group 13b on the second circulation liquid path P2 (see FIG. 2A). The opening and closing valve 130b is driven.

Furthermore, the control unit 30 controls the driving circuit 33a during the calibration of the first concentration meter 201a of the first concentration meter side portion 20a, and the driving circuit 33a is provided on the upstream side of the first calibration liquid path Pc1 (see FIG. 2). On-off valve 122a of the first valve group 12a and on-off valve 132a of the first valve group 13a on the downstream side, and on-off valve of the first valve group 12a on the upstream side of the first cleaning liquid path Pp1 (see FIG. 2) 121a and the on-off drive of the on-off valve 131a of the first downstream valve group 13a. At this time, the control unit 30 performs switching control of the upstream first switching valve 202a and the downstream first switching valve 203b in the first concentration meter side portion 20a (see FIG. 2B) to switch the liquid path Pm1 to the first The state of the correction liquid path Pc1 and the state of the liquid path Pm1 communicating with the first cleaning liquid path Pp1. Furthermore, the control unit 30 controls the drive circuit 33b to perform the second valve on the upstream side of the second calibration liquid path Pc2 (see FIG. 2) during the calibration of the second concentration meter 201b of the second concentration meter side portion 20b. The on-off valve 122b of the group 12b and the on-off valve 132b of the second valve group 13b on the downstream side, and the on-off valve 121b and the second valve group 12b on the upstream side of the second cleaning liquid path Pp2 (see FIG. 2A) and Opening and closing driving of the on-off valve 131b of the downstream second valve group 13b. At this time, the control unit 30 performs switching control of the upstream second switching valve 202b and the downstream second switching valve 203b in the second concentration meter side portion 20b (see FIG. 2C), and the switching liquid path Pm2 is communicated to the second correction. The state of the liquid path Pc2 and the state in which the liquid path Pm2 communicates with the second cleaning liquid path Pp2. In addition, the control unit 30 controls a drive circuit 35a that drives the first pump 18a and a drive circuit 35b that drives the second pump 18b. The control unit 30 controls a drive circuit 32a for driving the on-off valve 19a to open and close and a drive circuit 32b for driving the on-off valve 19b to open and close.

The control unit 30 performs processing related to the concentration adjustment of the processing liquid (for example, an aqueous phosphoric acid solution as an etching processing liquid) generated in the first supply tank 11a and the second supply tank 11b in the order shown in FIGS. 4A and 4B. In the following, the processes related to the concentration adjustment of the processing liquid generated in the first supply tank 11a will be described, but the processes related to the concentration adjustment of the processing liquid generated in the second supply tank 11b will be performed in the same order.

The control unit 30 monitors the flow information from the integral flow meters 14a and 15a, and makes the adjustment valves 16a and 17a in an open state. When a predetermined amount of processing liquid (original liquid) and diluent are stored in the first supply tank 11a, the adjustment valves 16a, 17a is closed. Then, the control unit 30 sets the on-off valve 19a to an open state, and sets the first supply tank 11a side of the three-way valves 21 and 23 to a closed state to drive the first pump 18a. Thereby, the processing liquid and the dilution liquid from the 1st supply tank 11a return to the 1st supply tank 11a and circulate through the circulation liquid path provided with the on-off valve 19a. During this process, a treatment liquid in which the treatment liquid and the diluent are mixed and diluted is generated in the first supply tank 11a. In the first supply tank 11a, the entire mechanism of mixing the processing liquid with the diluent and adjusting the concentration of the processing liquid (for example, the concentration of phosphoric acid in the etching solution), that is, when the processing liquid is generated in the first supply tank 11a The related configuration functions as a processing liquid adjustment unit.

Then, the control unit 30 switches the on-off valve 19a to the closed state, and switches the three-way valves 21 and 22 of the circulation system to the side of the first supply tank 11a. At this time, the control unit 30 causes the on-off valve 120a of the first valve group 12a on the upstream side and the on-off valve 130a of the first valve group 13a on the downstream side (first valve mechanism: see FIG. 2A) ) Is open, and the on-off valve 120b (second valve mechanism: see FIG. 2A) of the second valve group 12b on the upstream side and the second valve group 13b on the downstream side of the second circulation liquid path P2 are set as follows: On. In this state, the processing liquid from the first supply tank 11a is returned to the first supply tank 11a and circulated in parallel through the first circulation liquid path P1 and the second circulation liquid path P2.

In this way, when the circulation of the processing liquid through the first circulation liquid path P1 and the second circulation liquid path P2 is started, the control unit 30 starts processing in the order shown in FIGS. 4A and 4B.

In FIG. 4A, the control unit 30 checks whether the first concentration meter side portion 20a (first concentration meter 201a: see FIG. 2B) and the second concentration meter side portion 20b (second concentration meter 201b: see FIG. 2C) are being calibrated ( (S11, S12), if both the first concentration meter side 20a and the second concentration meter side 20b are not in calibration (NO in S11, NO in S12), the data obtained from the first densitometer 201a (No. 1 The concentration C1 of the measurement signal of the densitometer side portion 20a) and the concentration C2 obtained based on the measurement signal from the second densitometer 201b (the second densitometer side portion 20b) (S13, S14). Then, the control unit 30 determines whether the second concentration meter 201b is normal based on the two measured concentrations C1 and C2 (S15: the second determination unit (valve control unit for processing liquid)) and whether the first concentration meter 201a is normal ( S16: The first determination unit (valve control unit for processing liquid)).

The first concentration meter 201a and the second concentration meter 201b measured the concentration of the same treatment liquid (specifically, the phosphoric acid concentration in the etching treatment liquid), and the measured concentrations were originally the same. Therefore, if the difference between the measured concentration C1 of the first concentration meter 201a and the measured concentration C2 of the second concentration meter 201b is within a predetermined range set in advance, it can be determined that the first concentration meter 201a and the second concentration meter 201b are normal. . On the other hand, there is a low possibility that the concentration of the circulating treatment liquid will rapidly change. In addition, the possibility that both the first density meter 201a and the second density meter 201b will fail at the same time is low. In particular, the principle of measuring the concentration of the first concentration meter 201a is different from the principle of measuring the concentration of the second concentration meter 201b. Therefore, it is less likely that the first concentration meter 201a and the second concentration meter 201b used in the same environment will fail at the same time. Therefore, in a state where the measured concentration of one of the densitometers has stabilized, if the measured concentration of the other densitometer is rapidly changed (for example, the difference between the measured concentrations obtained from one of the densitometers and the other of the densitometers) It exceeds the predetermined range, and if the fluctuation range of the concentration measured by another densitometer per unit time exceeds the preset allowable value, or the fluctuation range of the measured concentration by the other densitometer per unit time exceeds the preset range Allowable value), it can be determined that the other densitometer is abnormal. That is, in this embodiment, the concentration meter has a self-diagnostic function. In addition, if the measured concentration C1 of the first concentration meter 201a and the measured concentration C2 of the second concentration meter 201b are rapidly changed, if the difference between the measured concentrations C1 and C2 is within a preset allowable range, the first concentration meter 201a Both the second concentration meter 201b is normal, and it can be determined that the concentration of the processing liquid in the first supply tank 11a is in a state of being adjusted.

When it is determined that both the second concentration meter 201b and the first concentration meter 201a are normal (YES at S15 and YES at S16), the control unit 30 performs a concentration adjustment process of the processing liquid based on the measured concentration C1 from the first concentration meter 201a. (S17). Specifically, the control unit 30 monitors the flow rate information of the integrating flow meters 14a and 15b and adjusts the opening and closing states of the adjustment valves 16a and 17a so that the measured concentration C1 becomes the target concentration. Then, the control unit 30 determines whether the conditions for the end of the cycle for adjusting the concentration of the processing liquid are satisfied, for example, whether the conditions for measuring the concentration C1 to reach a predetermined concentration range centered on the target concentration after a predetermined time elapses (S18) . If it is determined that the conditions for the end of the cycle for adjusting the concentration of the processing liquid are not satisfied (NO at S18), the control unit 30 executes processing in the same order (S11 to S18) as the above-mentioned order. Then, the control unit 30 repeatedly executes its processing in the same order (S11 to S18) in a state where the first concentration meter 201a and the second concentration meter 201b are normal. As a result, based on the measured concentration C1 in the first concentration meter 201a, the concentration of the processing liquid is adjusted in the first supply tank 11a (the processing liquid adjustment unit) (specifically, the phosphoric acid concentration in the etching processing liquid is adjusted). To generate a treatment liquid adjusted to a predetermined target concentration (specifically, an etching treatment liquid whose phosphoric acid concentration is adjusted to a target concentration). Furthermore, when the following conditions are satisfied: a predetermined time elapses after the cycle for adjusting the concentration of the processing liquid has elapsed, or a condition for adjusting the concentration of the processing liquid has been satisfied, such as when the measurement target C1 reaches a predetermined concentration range centered on the target concentration S18 is YES), the control unit 30 stops the first pump 18a, and opens and closes the on-off valve 120a and the on-off valve 130a of the first valve group 12a on the upstream side and the first valve group 13a of the downstream side valve group 13a (the 1 valve mechanism: refer to FIG. 2A) is switched to the closed state, and the on-off valve 120b and the on-off valve 130b (the second valve group 13b) of the second valve group 12b on the upstream side of the second circulation liquid path P2 Valve mechanism: Refer to FIG. 2A) to switch to the closed state. Thereby, the circulation for adjusting the concentration of the processing liquid in the first supply tank 11a is stopped.

In the above-mentioned processing procedure, the control unit 30 changes the measurement concentration C1 of the first concentration meter 201a in a state where the measurement concentration C2 of the second concentration meter 201b has stabilized (for example, from the first concentration, respectively). If the difference between the measured concentration obtained by the meter 201a and the second concentration meter 201b exceeds a predetermined range, and the fluctuation range of the concentration C1 detected by the first concentration meter 201a per unit time exceeds a preset allowable value), etc., then When it is determined that the first concentration meter 201a is abnormal (NO in S16), the on-off valve 120a of the first valve group 12a on the upstream side of the first circulation path P1 and the on-off valve 130a of the first valve group 13a on the downstream side (the first 1-valve mechanism: refer to FIG. 2A) After switching to the closed state (as a function of the first valve control unit (valve control unit for processing liquid)), the calibration process of the first concentration meter 201a is started in parallel (S20). In this state, the switching operation of the upstream first switching valve 202a and the downstream first switching valve 203a in the aforementioned first concentration measurement unit 20a (see FIG. 2B) does not affect the first concentration meter 201a (liquid path). Pm1) The processing liquid is supplied, and the calibration process of the first concentration meter 201a is performed. The correction processing will be described later. Then, when the control unit 30 determines that the conditions for the end of the cycle for adjusting the concentration of the processing liquid are not satisfied (NO in S18), it further determines whether or not the first concentration meter 201a is being calibrated (S11).

Since the calibration process of the first densitometer 201a has already started, when the control unit 30 determines that the first densitometer 201a is being calibrated (YES in S11), it shifts to the sequence shown in FIG. 4B and determines the second densitometer 201b ( The second concentration measurement unit 20b: refer to FIG. 2C) is the calibration in progress (S21). If the second concentration meter 201b is not being calibrated (NO at S21), the control unit 30 determines whether the measured concentration C2 of the second concentration meter 201b has maintained a stable state (for example, the concentration C2 detected by the second concentration meter 201b is Whether the fluctuation range per unit time exceeds a preset allowable value), it is determined whether the second concentration meter 201b is normal (S22). When it is determined that the second concentration meter 201b is normal (YES in S22), the control unit 30 obtains the concentration C2 based on the measurement signal from the second concentration meter 201b (S23), and performs a concentration adjustment process of the processing liquid based on the measured concentration C2 ( S24). Specifically, the control unit 30 monitors the flow rate information of the integrating flow meters 14a and 15a and adjusts the opening and closing states of the adjustment valves 16a and 17a so that the measured concentration C2 becomes the target concentration. Then, the control unit 30 returns to the step of FIG. 4A to determine whether the conditions for the end of the cycle for adjusting the concentration of the processing liquid for the processing liquid are satisfied (S18). NO), the control unit 30 executes processing in accordance with the same steps as those described above. In this case, since the first concentration meter 201a is being calibrated, the concentration of the processing solution is adjusted in the first supply tank 11a (the processing solution adjustment unit) based on the measured concentration C2 of the second concentration meter 201b. A treatment liquid (specifically, an etching treatment liquid containing phosphoric acid with the adjusted concentration) is generated at the adjusted concentration. Then, when the measured concentration C2 reaches a predetermined concentration range centered on the target concentration, etc., and the conditions for ending the cycle for adjusting the concentration of the processing liquid are satisfied (YES in S18), the control unit 30 similarly stops the first pump 18a, etc. To end the cycle for adjusting the concentration of the processing liquid (S19)

In addition, as described above, based on the measured concentration C2 in the second concentration meter 201b, the concentration of the processing liquid (specifically, the concentration of phosphoric acid in the etching processing liquid) is adjusted in the first supply tank 11a. When the calibration process of the first concentration meter 201a is completed, the control unit 30 determines that both the first concentration meter 201a (the first concentration measurement section 20a) and the second concentration meter 201b (the second concentration measurement section 20b) are not in calibration ( (NO in S11 and NO in S12). Therefore, the on-off valve 120a of the first valve group 12a on the upstream side and the on-off valve 130a of the first valve group 13a on the downstream side are provided in the closed state of the first circulation liquid path P1 (the first 1-valve mechanism: refer to FIG. 2A) After switching to the open state, the same steps (S11 to S18) as the aforementioned processing steps are repeatedly executed. As a result, the concentration of the processing liquid is adjusted in the first supply tank 11 based on the measured concentration C1 in the first concentration meter 201a again.

Furthermore, both the first concentration meter 201a and the second concentration meter 201b are normal, and the concentration adjustment process (S11 to S18) is performed based on the measured concentration C1 of the first concentration meter 201a, for example, during the measurement While the concentration C1 remains stable, the measured concentration C2 fluctuates sharply (this is, for example, that the difference between the concentration obtained from the first concentration meter 201a and the second concentration meter 201b exceeds a predetermined range, and the second concentration meter 201b detects The fluctuation range of the concentration C2 per unit time exceeds the preset allowable value). Based on this, when it is determined that the second concentration meter 201b is abnormal (NO in S15), the control unit 30 will set the second concentration meter 201b in the second circulation liquid path. The on-off valve 120b of the second valve group 12b on the upstream side of P2 and the on-off valve 130b of the second valve group 13b on the downstream side (second valve mechanism: refer to FIG. 2A) are switched to a closed state (as a second valve control unit (for processing liquid) Function of the valve control unit), the switching operation of the upstream second switching valve 202b and the downstream second switching valve 203b in the aforementioned second concentration measurement unit 20b (see FIG. 2C) is started to start the second concentration meter in parallel. 201b correction processing (S25). After that, the control unit 30 confirms that the first concentration meter 201a is not in calibration and the second concentration meter 201b is in calibration (NO in S11 and YES in S12), and obtains the measurement signal from the first concentration meter 201a. Concentration C1 (S26), maintaining the state where the measured concentration C1 is stable (in this case, for example, the fluctuation range of the concentration C1 detected by the first concentration meter 201a per unit time does not exceed a preset allowable value), that is, confirm the first The densitometer 201a is normal (YES in S16), and the concentration adjustment processing of the processing liquid in the first supply tank 11a is performed based on the measured concentration C1 (specifically, the phosphoric acid concentration adjustment processing in the etching processing liquid) (S17).

Furthermore, it is determined that the measurement concentration C2 of the second concentration meter 201b whose first concentration meter 201a is being calibrated and the measurement concentration C2 has stabilized (for example, the concentration C2 detected by the second concentration meter 201b changes every unit). When the time fluctuation range exceeds a preset allowable value, etc.), and when the second concentration meter 201b is abnormal (NO in S22 of FIG. 4B), the control unit 30 further sets the second concentration meter on the upstream side of the second circulation liquid path P2. After the on-off valve 120b of the valve group 12b and the on-off valve 130b (second valve mechanism: see FIG. 2A) of the second downstream valve group 13b are switched to the closed state, the calibration process of the second concentration meter 201b is started in parallel (S27). In this case, since both the first concentration meter 201a and the second concentration meter 201b are being calibrated, the control unit 30 stops the first pump 18a, etc., and uses the cycle to adjust the concentration of the processing liquid (S19). In addition, when it is determined that both the first concentration meter 201a and the second concentration meter 201b are being calibrated (YES in S11 in FIG. 4A and YES in S21 in FIG. 4B), this case is also the control unit 30. The first pump 18a is stopped, etc., and the cycle for adjusting the concentration of the processing liquid is ended (S19)

In the device (processing liquid generating device) that generates a processing liquid by adjusting the concentration according to the above steps, even if it is determined that the first concentration meter 201a is abnormal, the processing is continued based on the measured concentration C2 of the second concentration meter 201b that is determined to be normal. The process of adjusting the concentration of the liquid (specifically, the adjustment of the concentration of phosphoric acid in the etching treatment liquid) can prevent the adjustment of the concentration of the processing liquid based on the measured concentration of the abnormal concentration meter, and can increase the reliability of the concentration of the processing liquid that is generated. Sex.

In addition, since one density meter can still use other densitometers to measure the correct concentration during calibration, the concentration adjustment of the processing liquid can be continued without interruption.

In addition, even if one of the densitometers fails, the process of concentration adjustment can be continued based on the measured concentration of the other densitometer, so that the processing efficiency related to the concentration adjustment of the processing liquid can be improved.

Furthermore, in the foregoing processing, if both the first and second concentration meters 201a and 201b are normal, the concentration adjustment processing is performed based on the measured concentration C1 of the first concentration meter 201a (see S17), but it may be performed. The concentration adjustment process is performed based on the measured concentrations C1 and C2 of both the first concentration meter 201a and the second concentration meter 201b, for example, the average of these.

The above-mentioned correction processing is performed according to the steps shown in FIG. 5. The correction process is performed by both the first concentration meter 201a of the first concentration meter side portion 20a (refer to FIG. 2B) and the second concentration meter 201b of the second concentration meter side portion 20b (refer to FIG. 2C). The isochronous correction process is the same. Therefore, the correction process of the first densitometer 20a of the first densitometer side portion 20a (see FIG. 2B) will be described below as an example.

The control unit 30 switches the on-off valve 120a (the first valve mechanism: see FIG. 2) of the first valve group 12a on the upstream side and the first valve group 13a on the downstream side of the first circulation liquid path P1 to the closed state. Thereafter, the processing is performed according to the steps shown in FIG. 5. In FIG. 5, the control unit 30 is an on-off valve 121a (a fifth valve mechanism: refer to the figure) for opening and closing the valve 121a and the first valve group 13a on the upstream side of the first cleaning liquid path Pp1. 2) It is in an open state, and the upstream first switching valve 202a and the downstream first switching valve 203a are operated so that the liquid path Pm1 in the first concentration meter side portion 20a communicates with the first cleaning liquid path Pp1. Next, after the cleaning liquid (for example, pure water) flows to the first cleaning liquid path Pp1 for a predetermined time, the on-off valves 121a and 131a (the fifth valve mechanism) are switched to the closed state (S31 (1)). Thereby, the cleaning liquid passing through the first cleaning liquid path Pp1 flows through Pm1 of the first concentration meter 201a provided with the first concentration measurement section 20a, and the first concentration meter 20a (concentration detection section) is washed with its liquid path Pm1 net.

Then, the control unit 30 switches the on-off valves 121a and 131a provided in the first cleaning liquid path Pp1 to a closed state, and then causes the on-off valves 122a and 122a provided in the first valve group 12a on the upstream side of the first correction liquid path Pc1. The on-off valve 132a (the third valve mechanism: see FIG. 2A) of the first valve group 13a on the downstream side is in an open state (functions as a first correction liquid valve control unit (equivalent to the second correction liquid valve control unit)), The upstream first switching valve 202a and the downstream first switching valve 203a are operated so that the liquid path Pm1 provided with the first concentration meter 201a communicates with the first correction liquid path Pc1. Next, the first correction liquid Lc1 having a known concentration flows through the first correction liquid path Pc1 (S32 (1)). Thereby, the first correction liquid Lc1 passing through the first correction liquid path Pc1 flows through the liquid path Pm1 of the first concentration meter 20a (concentration detection unit) provided with the first concentration meter side portion 20a. In this state, the control unit 30 obtains a value (for example, a step value) of the measurement signal output from the first density meter 201a (S33 (1)). Then, the control unit 30 stops the supply of the first correction liquid Lc1 (S34 (1)).

After that, the calibration solutions with different concentrations are sequentially switched, and the same processing is repeatedly performed (S31 (n) to S34 (n) until the n-th calibration solution Lcn. Then, the control unit 30 controls the concentration of each calibration solution Lc1 to Lcn. Correspondence (correlation) of the corresponding measurement signal values generates correspondence information between the measurement signal value and the concentration (S35: first correction processing unit (equivalent to the second correction processing unit)). Next, the control unit 30 based on the corresponding information The correspondence table between the measured signal value and the concentration stored in the first concentration meter 201a is updated. Thus, in this embodiment, the concentration meter judged to be abnormal has a self-calibration function. The control unit 30 that has finished the calibration process is referred to The correspondence table is used to obtain the concentration C1 based on the measurement signal from the first concentration meter 201a.

Furthermore, in this embodiment, the self-calibration function of the densitometer has been described as an example of sequentially using calibration solutions with different concentrations, and updating the correspondence table of each measured signal value and concentration. However, the calibration function may be achieved using only a calibration solution having a known specific concentration. For example, in a state where the first cleaning liquid path Pp1 is communicated with the flow path Pm1, after the cleaning liquid flows for a predetermined time, the first correction liquid path Pc1 is communicated with the flow path Pm1, and a calibration solution of a specific concentration flows. To flow path Pm1. In this state, the control unit 30 obtains the measurement signal value output from the first densitometer 201a. Next, if the concentration C1 measured by the first densitometer 201a matches the specific concentration flowing to the flow path Pm1, dirt or the like attached to the electrode of the densitometer or the inner surface of the flow path provided by the densitometer can be removed. It is judged that the correction is normal. Such a processing function can also be used as a correction function. Furthermore, if the concentration C1 measured by the first concentration meter 201a does not match the specific concentration flowing to the flow path Pm1, the supply of the cleaning liquid to the flow path Pm1 and the supply of the calibration solution may be repeated a preset number of times to an upper limit. .

When the correction process as described above ends, the control unit 30 switches the on-off valves 122a and 132a provided on the first correction fluid path Pc1 to a closed state, and switches the on-off valves 120a and 130a provided on the first circulation path P1 to open. State (the first valve recovery control device (equivalent to the second valve recovery control device)). Thereby, the 1st density meter 201a of the 1st density measurement part 20a can be restored to the density | concentration adjustment of a processing liquid.

In the substrate processing apparatus shown in FIG. 1, as described above, when the concentration adjustment of the processing liquid in the first supply tank 11 a (specifically, the adjustment of the phosphoric acid concentration in the etching processing liquid) is completed, the three-way valve 21, 22 is switched to the 2nd supply tank 11b (process liquid adjustment part) side, and the three-way valves 23 and 24 are switched to the 1st supply tank 11a side. In this state, the processing liquid (specifically, the etching processing liquid) generated by the concentration adjustment in the first supply tank 11 by the operation of the first pump 18a is supplied to the rotary device 100 from the first supply tank 11a. (Nozzle 111) The surface of the semiconductor wafer W is processed (etched) by the processing liquid supplied from the first supply tank 11a in the rotary device 100. The used processing liquid recovered from the rotary device 100 passes through the recovery tank 10 and returns to the first supply tank 11a.

In this way, in a state where the processing liquid is supplied from the first supply tank 11a to the rotating device 100, the second supply tank 11b performs processing related to the concentration adjustment of the processing liquid in accordance with the above-mentioned steps (see FIGS. 4A and 4B, etc.). And generate a treatment solution with a predetermined concentration. Then, the concentration adjustment of the processing liquid in the first supply tank 11a and the second supply tank 11b and the supply of the processing liquid to the rotary device 100 can be switched to each other and continued.

In the device (processing liquid generating device) that performs the calibration process according to the above steps, even if the concentration meter is determined to be abnormal, the self-calibration function can be utilized to restore itself, and the reliability of the processing liquid concentration can be improved. In addition, since the self-diagnostic function described above is also provided, the reliability of the treatment liquid can always be improved.

In addition, since there are individual washing liquid channels used for washing the concentration meter itself or for cleaning the inner surface of the liquid channel provided with the concentration meter, in the calibration of the concentration meter, the concentration timer is washed to prevent adhesion. The dirt on the conductive plate (electrode) of the concentration meter and the inner surface of the flow path are mixed into the circulating liquid path through which the treatment liquid flows or the correction liquid path through which the correction liquid flows.

In the above embodiment, the first concentration meter 201a and the second concentration meter 201b use different measurement principles to measure the concentration of the processing liquid. However, considering that the two densitometers will become abnormal at the same time, the probability is low, and it can also be a densitometer with the same principle.

In FIG. 2A, the first circulation liquid path P1, the first correction liquid path Pc1, and the first cleaning liquid path Pp1 are individually provided. However, a single piping with a three-way valve may be used for the processing liquid and the correction. Liquid and pure water alternately flow to the first concentration meter side portion 20a. The same applies to the second circulation liquid path P2, the second correction liquid path Pc2, and the second cleaning liquid path Pp2 that are individually provided in the second concentration meter 20b.

In the above embodiment, an example of the first concentration meter 201a (refer to FIG. 2B) is a concentration meter based on conductivity, and an example of the second concentration meter 201b (refer to FIG. 2C) is an example of using laser light. In this case, in terms of washing the concentration meter with the washing solution, the first concentration meter 201a is used to clean, for example, the conductive plate (electrode) included in the first concentration meter 201a, and the second concentration meter 201b , Use the cleaning solution to clean the inside of the liquid path.

In addition, in the above embodiment, the etching liquid (for example, an aqueous phosphoric acid solution) is taken as an example of the processing liquid. However, if it is a processing liquid that detects the concentration and is processed, the liquid can be applied to other processing liquids such as a photoresist stripping liquid. The treatment liquid may include a plurality of components other than pure water. In this case, each densitometer may be used to measure the concentration of all the components, or it may be used to measure the concentration of one or more partial components.

In the above-mentioned device, two density meters of the first density meter 201a and the second density meter 201b are used, but three or more density meters may be used. In this case, any one of the three or more concentration meters may be used as the first concentration meter, the other may be used as the second concentration meter, and any one may be used as the first or second concentration meter. The remaining concentration meter group can also be used as the second concentration meter or the first concentration meter.

In the above device, each of the on-off valve, the three-way valve, and the regulating valve is performed by a driving circuit controlled by the control unit 30, but these valves can also be manually switched. In this case, the operator observes the measured concentrations in the first concentration meter 201a and the second concentration meter 201b, and switches the valves according to the same steps as those described above.

In the above-mentioned device, when the processing liquid after the concentration adjustment is supplied from the supply tank 11a (11b) to the rotary device 100, the used processing liquid is returned to the supply tank 11a (11b) as a recovery liquid. In such a configuration, when the processing liquid is supplied from the supply tank 11a (11b) to the rotating device 100, the concentration of the processing liquid in the supply tank 11a (11b) can also be adjusted. In this case, for example, when the three-way valves 23 and 24 are switched to the first supply tank 11a side and the processing liquid in the first supply tank 11a is supplied to the rotary device 100, the three-way valves 21 and 22 are also switched to the first 1 supply tank 11a side. After the three-way valves 21 and 22 are switched to the side of the first supply tank 11a, the concentration adjustment of the processing liquid in the first supply tank 11a and the self-calibration function of the concentration meter are the same as those described using FIGS. 4A, 4B, and 5 . The same applies when the processing liquid is supplied from the second supply tank 11b to the rotating device 100. With this configuration, not only when the processing liquid starts to be supplied to the rotary device 100, the concentration management can be performed during the supply, and the processing liquid that can undergo the concentration management can continue to appropriately process the substrate processing. In addition, if at least one of the two concentration meters 201a and 201b is normal, the processing liquid can be continuously supplied to the rotary device 100, and during this period, calibration of the concentration meter determined to be abnormal can also be performed, which also helps To increase productivity.

In the above, several embodiments of the present invention and modification examples of each part have been described, but this embodiment or modification examples of each part is suggested as an example, and is not intended to limit the scope of the invention. The novel embodiments described above can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. Such embodiments or modifications thereof are also included in the scope or gist of the invention, and are included in the invention described in the scope of patent application.

10‧‧‧ Recovery Tank

11a‧‧‧The first supply tank

11b‧‧‧ 2nd supply tank

12a‧‧‧The first valve group on the upstream side

12b‧‧‧ upstream 2nd valve group

13a‧‧‧The first valve group on the downstream side

13b‧‧‧ 2nd downstream valve group

14a, 14b, 15a, 15b ‧‧‧ integral flowmeter

16a, 16b, 17a, 17b ‧‧‧ regulating valve

18a‧‧‧The first pump

18b‧‧‧Second pump

19a, 19b‧‧‧ On-off valve

20a‧‧‧ side of the first concentration meter

20b‧‧‧Second Densitometer Side

21, 22, 23, 24‧‧‧Three-way valve

30‧‧‧Control unit

31a, 31b, 32a, 32b, 33a, 33b, 34a, 34b, 35a, 35b ‧‧‧ drive circuit

100‧‧‧ rotating device

110‧‧‧Support

111‧‧‧Nozzle

115‧‧‧ Cup

120a, 130a‧‧‧Open / close valve / first valve mechanism

120b, 130b‧‧‧Open / close valve / second valve mechanism

121a, 131a‧‧‧Open / close valve / 5th valve mechanism

121b, 131b‧‧‧Open / close valve / 6th valve mechanism

122a, 132a‧‧‧Open / close valve / 3rd valve mechanism

122b, 132b‧‧‧Open / close valve / 4th valve mechanism

201a‧‧‧The first concentration meter

201b‧‧‧Second Densitometer

202a‧‧‧ upstream side first switching valve

202b‧‧‧ 2nd upstream switching valve

203a‧‧‧The first switching valve on the downstream side

203b‧‧‧ 2nd downstream switching valve

P1‧‧‧The first processing liquid path (the first circulation liquid path)

P2‧‧‧Second treatment fluid path (second circulation fluid path)

Pc1‧‧‧The first calibration fluid path

Pc2‧‧‧Second calibration fluid path

Pm1, Pm2‧‧‧Liquid circuit

Pp1‧‧‧The first cleaning liquid path

Pp2‧‧‧Second washing liquid path

TP‧‧‧Transparency Department

W‧‧‧ Wafer

FIG. 1 is a diagram showing a substrate processing apparatus including a processing liquid generating apparatus according to an embodiment of the present invention. FIG. 2A is a diagram showing a configuration example of an upstream first valve group, an upstream second valve group, a downstream first valve group, and a downstream second valve group in the processing liquid generating device shown in FIG. 1. FIG. 2B is a diagram showing a configuration example of the first concentration measurement unit shown in FIG. 2A. FIG. 2C is a diagram showing a configuration example of a second concentration measurement unit shown in FIG. 2A. 3 is a block diagram showing a configuration example of a control system for controlling each valve in the processing liquid generating device shown in FIGS. 1, 2A to 2C. FIG. 4A is a flowchart (No. 1) showing an example of processing steps of a control unit in the control system shown in FIG. 3. FIG. FIG. 4B is a flowchart (part 2) showing an example of processing steps of a control unit in the control system shown in FIG. 3. FIG. 5 is a flowchart showing an example of the procedure of the calibration process of the densitometer.

Claims (12)

A processing liquid generating device generates a concentration-adjusted processing liquid based on a measured concentration of a densitometer, and includes: a processing liquid adjusting unit for adjusting the concentration of the processing liquid; and a first processing liquid path for allowing the processing liquid to flow to the processing. A liquid adjusting section; a second processing liquid path for causing the processing liquid to flow to the processing liquid adjusting section; a first concentration meter for measuring the concentration of the processing liquid flowing in the first processing path, and the concentration is in the processing liquid The concentration of the relevant components is adjusted by the concentration of the adjusting unit; the second concentration meter is used to measure the concentration of the processing solution flowing in the second processing liquid path, and the concentration is to be measured by the first concentration meter, and The concentration of the components related to the concentration adjustment of the processing liquid adjusting section; a first valve mechanism for opening and closing the first processing liquid path; and a second valve mechanism for opening and closing the second processing liquid path. The processing liquid generating device according to claim 1, wherein the first processing liquid path includes a first circulating liquid path for returning the processing liquid from the processing liquid adjusting section to the processing liquid adjusting section through the first concentration meter, and The second processing liquid path includes a second circulating liquid path for returning the processing liquid from the processing liquid adjusting section to the processing liquid adjusting section through the second concentration meter. For example, the processing liquid generating device according to claim 1 or 2, wherein the first concentration meter and the second concentration meter use different measuring principles to measure the concentration of the processing solution. For example, the processing liquid generating device according to any one of claims 1 to 3 includes: a first correction liquid path for making a known correction liquid to the first concentration meter; and a second correction liquid path for making a concentration known. The liquid flows to the second concentration meter; a third valve mechanism for opening and closing the first calibration liquid path; and a fourth valve mechanism for opening and closing the second calibration liquid path. The processing liquid generating device according to any one of claims 1 to 4, further comprising a valve control unit for the processing liquid, wherein the valve control unit for the processing liquid is based on the first measured concentration obtained by the first concentration meter and the first measured concentration obtained by the first concentration meter. The second measurement concentration obtained by the 2 densitometer controls the operation of the first valve mechanism and the second valve mechanism. The processing liquid generating device according to claim 5, wherein the processing liquid valve control unit includes a first determination unit that determines the first concentration based on at least a first measurement concentration of the first measurement concentration and the second measurement concentration. Whether the meter is normal; and when the first valve control unit determines that the first concentration meter is abnormal according to the first determination unit, controls the first valve mechanism so that the first processing liquid path is closed. The processing liquid generating device according to claim 5 or 6, wherein the processing liquid valve control unit includes: a second determination unit that determines the first measurement concentration based on at least a second measurement concentration of the first measurement concentration and the second measurement concentration. 2 whether the concentration meter is normal; and the second valve control unit, when it is determined by the second determination unit that the second concentration meter is abnormal, controls the second valve mechanism so that the second processing liquid path is closed. For example, the processing liquid generating device of claim 6 includes: a first correction liquid valve control unit that controls the third valve mechanism to be the first when the first determination unit determines that the first concentration meter is abnormal. The calibration liquid path is in an open state; and a first calibration processing unit, when the calibration liquid flowing in the first calibration liquid path passes the first concentration timing, the first concentration meter is calibrated based on the output value of the first concentration meter. . For example, the processing liquid generating device of claim 7 includes: a second correction liquid valve control unit that controls the fourth valve mechanism to be the second when the second determination unit determines that the second concentration meter is abnormal. The calibration liquid path is in an open state; and the second calibration processing unit, when the calibration fluid flowing in the second calibration liquid path passes the second concentration timing, performs the second concentration meter's output based on the output value of the second concentration meter. Correction. For example, the processing liquid generating device of claim 8 includes a first valve recovery control device that performs the first processing after the calibration of the first concentration meter by the first calibration processing unit is completed. The fluid path returns to the open state. For example, the processing liquid generating device of claim 9 includes a second valve recovery control device for performing the second processing after the calibration of the second concentration meter by the second calibration processing unit is completed. The fluid path returns to the open state. A substrate processing device includes: a processing liquid generating device for generating a processing liquid whose concentration is adjusted according to a measured concentration in a densitometer; a table for holding a substrate; a driving mechanism for rotating the foregoing table; And a processing liquid supply mechanism for supplying a processing liquid generated by the processing liquid generating device to a surface of the substrate rotated together with the table, the processing liquid generating device includes: a processing liquid adjusting unit for adjusting the processing liquid The first processing liquid path causes the processing liquid to flow to the processing liquid adjusting section; the second processing liquid path causes the processing liquid to flow to the processing liquid adjusting section; the first concentration meter is used to measure the first processing liquid path A concentration of the processing solution flowing, and the concentration is a concentration of a component related to concentration adjustment in the processing solution adjusting section; a second concentration meter for measuring the concentration of the processing solution flowing in the second processing liquid path, and The concentration is the concentration of a component to be measured by the first concentration meter, and the concentration of the component related to the concentration adjustment in the processing liquid adjusting section; A valve mechanism for opening and closing the first liquid passage; and a second valve means for opening and closing the second liquid path.