TW201816014A - Touch sensor and touch panel having touch sensor - Google Patents

Abstract

A touch sensor and a touch panel having the same are provided. For a touch sensor and a touch panel having the same, a substrate, a touch sensor layer and a passivation layer are arranged orderly, wherein the passivation layer includes polysiloxane for more easily making the touch sensor without deteriorating the physical properties of the passivation layer.

Description

Touch sensor and touch screen panel including the same

The invention relates to a touch sensor and a touch screen panel including the touch sensor, and more particularly relates to a touch sensor that does not reduce physical properties and is easy to manufacture and includes the touch sensor. Touch screen panel of the sensor.

With the development of the information society in recent years, the demand for display screens has also increased in various forms. Therefore, various flat panel display devices (Thin Panel Display Devices) with features such as thinness, light weight, and low power consumption, such as , Liquid Crystal Display device, Plasma Display Panel device, Electro Luminescent Display device, Organic Light-Emitting Diode Display device Wait.

Among them, since organic light emitting diode (OLED) display devices have the advantages of high-speed response, high picture quality, wide viewing angle, and low power consumption, they have attracted attention in recent years with a new generation of display devices.

In addition, a touch panel, which is an input device that is pasted on the display device and can input a user's command by selecting instruction content displayed on the screen by a human hand or an object, has attracted much attention. The touch panel is provided on the front face of the display device, thereby converting a position where a human hand or an object directly contacts into an electric signal.

Thereby, the instruction content selected at the contact position is received with the input signal. Since such a touch panel can replace other input devices such as a keyboard and a mouse that are connected to the image display device and operate, its use range is gradually expanding.

Therefore, as in Korean Laid-Open Patent No. 2014-0092366, in recent years, a touch sensor using a touch screen panel has been used in a variety of image display devices, but it has been manufactured in a simpler process for improving productivity The need for touch sensors has always existed.

Prior art literature

Patent Literature-Korean Published Patent No. 2014-0092366.

An object of the present invention is to provide a touch sensor having a passivation layer that does not reduce physical properties and is easy to manufacture. Furthermore, an object of the present invention is to provide a method for manufacturing a touch sensor that is easy to manufacture and can form a passivation layer with a thick thickness.

Solution to the problem:

Solution 1-A touch sensor, in which a substrate, a touch sensor layer, and a passivation layer are sequentially arranged, and the passivation layer includes a polysiloxane structure.

Embodiment 2-The touch sensor according to the above embodiment 1, wherein the passivation layer is a fired layer of a polysiloxane compound.

Solution 3- According to the touch sensor of the above solution 1, the thickness of the passivation layer is 0.5 μm to 2 μm.

Solution 4-The touch sensor according to the above solution 1, wherein the touch sensor layer includes a plurality of isolated sensing patterns, and the sensing patterns are disposed on a same surface.

Scheme 5-The touch sensor according to the above Scheme 1,

The touch sensor layer includes: a first sensing pattern formed along a first direction; a second sensing pattern formed along a second direction; and a bridge electrode connected to mutually isolated units of the second sensing pattern pattern.

Scheme 6-The touch-sensitive sensor according to the above Scheme 1, wherein the substrate is an organic light emitting diode (OLED) package substrate.

Embodiment 7-The touch-sensitive sensor according to the embodiment 1, wherein the substrate is formed of glass, a polymer, or a metal oxide.

Item 8- The touch sensor according to item 4, wherein the sensing pattern is selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and indium zinc tin. At least one of a group consisting of an oxide (IZTO), a cadmium tin oxide (CTO), and a metal wire is formed.

Item 9-The touch sensor according to item 5, wherein the sensing pattern is selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and indium zinc tin. At least one of a series consisting of an oxide (IZTO), a cadmium tin oxide (CTO), and a metal wire is formed.

Item 10-The touch sensor according to item 5, in order to prevent the first sensing pattern from being electrically connected to the bridge electrode, an insulator is further included between the first sensing pattern and the bridge electrode.

Item 11-The touch sensor according to the item 10, wherein the insulator is formed of a cured product or a silicon oxide of a photosensitive resin composition.

Scheme 12-A method for manufacturing a touch sensor, comprising the steps of forming a touch sensor layer on a substrate; coating the touch sensor layer with a polysiloxane compound and A step of forming a composition for forming a passivation layer by a solvent; and a step of firing the coated composition for forming a passivation layer.

Embodiment 13-The method for manufacturing a touch sensor according to the above embodiment 12, wherein a surface energy of the composition forming the passivation layer is 20 to 30 dyne / cm.

Embodiment 14: The method for manufacturing a touch sensor according to the above embodiment 12, wherein the composition for forming a passivation layer is applied by an inkjet printing method.

Embodiment 15-The method for manufacturing a touch sensor according to the above embodiment 12, wherein the firing is performed in a first firing process and a post firing process.

Embodiment 16-The method for manufacturing a touch sensor according to the above embodiment 15, wherein the first firing step is performed at 110 to 150 ° C. for 50 to 150 seconds.

Embodiment 17- The method for manufacturing a touch sensor according to the above Embodiment 15, the post-baking step is performed at 180 to 230 ° C. for 15 to 45 minutes.

Item 18- The method for manufacturing a touch sensor according to item 15, wherein the post-baking process includes: performing a first post-baking stage at 180 to 230 ° C. for 15 to 45 minutes; and A second post-firing stage is performed at 420 ° C for 15 to 45 minutes.

Embodiment 19-A touch screen panel including the touch sensor according to any one of the above embodiments 1 to 11.

Item 20-An image display device including the touch screen panel according to item 19 above.

Since the touch-sensitive sensor of the present invention includes a polysiloxane structure, the passivation layer can be manufactured in a simpler process, and a thicker passivation layer can be provided according to requirements.

According to the passivation layer of the touch sensor of the present invention, it is possible to have the same or more physical properties for a silicon oxide passivation layer formed by vapor deposition.

Furthermore, the method for manufacturing a touch sensor of the present invention can be easily performed at a stage of applying a polysiloxane compound and firing.

In addition, in the method for manufacturing a touch sensor of the present invention, when a polysiloxane compound is applied, if the inkjet method is used, a thicker passivation layer can be formed.

In order to have a better understanding of the above and other aspects of the present invention, the following specific examples are described in detail below in conjunction with the accompanying drawings:

The invention relates to a touch sensor. The touch sensor is configured with a substrate, a touch sensor layer, and a passivation layer in this order. The passivation layer includes a polysiloxane structure. The touch sensor does not reduce physical properties and is easy to manufacture.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. However, the drawings shown in the drawings are examples of specific embodiments of the present invention in a schematic diagram, and have a more detailed understanding of the technical idea of the present invention in combination with the above-mentioned content of the invention. Therefore, it should be understood that the present invention is not limited to The embodiment disclosed in the figure.

According to an embodiment of the touch sensor of the present invention, FIG. 1 is a perspective view thereof, and FIG. 2 is an AA ′ cross-sectional view showing the touch sensor shown in FIG. 1.

According to another embodiment of the touch sensor of the present invention, FIG. 4 is a perspective view thereof, and FIG. 5 is an AA ′ cross-sectional view showing the touch sensor shown in FIG. 4.

According to yet another embodiment of the touch sensor of the present invention, corresponding to FIG. 1 (FIG. 4) and FIG. 4 (FIG. 5), respectively, but the insulator is formed in a layered manner so that the bridge electrode passes through the contact hole and Examples of the sensing pattern connection are shown in FIGS. 3 and 6.

However, in FIGS. 1 and 4, the passivation layer 70 is not shown in order to easily grasp the laminated structure.

The touch sensor of the present invention has a structure in which a substrate 1, a touch sensor layer 60, and a passivation layer 70 are sequentially arranged. The substrate 1, the touch sensor layer 60, and the passivation layer 70 may have a stacked structure in order, and a structure known in the art may be further interposed therebetween.

The substrate 1 may be any material that is generally used in a touch sensor without limitation, and may be selected from a series consisting of glass, a polymer, and a metal oxide, for example. Macromolecules can be composed of cyclic olefin polymers (COP), polyethylene terephthalate (PET), polyacrylates (PAR), polyether-imide (PEI), and polyvinyl phthalate (PEN ), Polyphenylene sulfide (PPS), polypropylene (polyallylate), polyimide (PI), cellulose acetate propionate (CAP), polyether fluorene (PES), cellulose triacetate (TAC), poly Carbonate (PC), cyclic olefin copolymer (COC), polymethyl methacrylate (PMMA), etc. may be used alone or as a mixture of two or more thereof. Polyimide is preferably used, but is not limited thereto.

Aluminum oxide (Al ₂ O ₃ ) and the like can be used for the metal oxide.

In consideration of a firing process for forming a passivation layer 70 described later, the substrate 1 may preferably be glass or a metal oxide.

According to an embodiment of the present invention, the substrate 1 may be a package substrate for sealing an organic light emitting diode (OLED).

An OLED generally has a structure in which an anode, an organic film layer including an organic light emitting layer, and a cathode are stacked on a base substrate and sealed by a package substrate.

The organic light-emitting material of the organic light-emitting layer will be oxidized when exposed to moisture or oxygen, thereby significantly reducing its life. Therefore, the packaging substrate has a role of a barrier layer to prevent moisture and oxygen from passing through.

The touch sensor layer 60 may be formed on the substrate 1.

The touch sensor layer 60 is not particularly limited to a touch sensor known in the art. For example, the touch sensor layer 60 has a plurality of sensing patterns. The sensing pattern provides coordinate information of the contact point. Specifically, when a human hand or an object is in contact with the cover window substrate, the change in the electrostatic capacity of the contact position is transmitted through the pattern at the position and the position detection line connected to the pattern, and through The change in capacitance is converted into an electrical signal, and the contact position is confirmed.

An embodiment of the touch sensor layer 60 according to the present invention is shown in FIGS. 1 and 4.

The touch sensor layer 60 shown in FIGS. 1 and 4 may include: a first sensing pattern 10 formed along a first direction; a second sensing pattern 20 formed along a second direction; Bridge electrodes of unit patterns with two sensing patterns separated from each other.

FIG. 1 shows an example of a structure in which the bridge electrode 30 is in contact with the passivation layer 70 (see FIG. 2), and FIG. 4 shows an example of a structure in which the bridge electrode 30 is in contact with the substrate 1 (see FIG. 5).

The first sensing pattern 10 and the second sensing pattern 20 are arranged in mutually different directions. For example, the first direction is the X-axis direction, and the second direction may be the Y-axis direction crossing it, but it is not limited thereto.

The first sensing pattern 10 and the second sensing pattern 20 provide information about the X coordinate and the Y coordinate of the contact point. Specifically, when a human hand or an object is in contact with the cover window substrate, a change in the electrostatic capacity according to the contact position is transmitted to the driving circuit side via the first sensing pattern 10, the second sensing pattern 20, and the position detection line. Then, the change in the electrostatic capacity is converted into an electric signal through an X and Y input processing circuit (not shown), etc., thereby confirming the contact position.

Related to this, the first sensing pattern 10 and the second sensing pattern 20 are formed on the same layer, and in order to detect a touch position, each pattern needs to be electrically connected. However, although the unit patterns of the first sensing pattern 10 are connected to each other through the joint portion, and the unit patterns of the second sensing pattern 20 are separated from each other in an island form, it is necessary to electrically connect the second sensing pattern 20 Additional bridge electrode 30.

Transparent electrode materials known in the art can be applied to the sensing patterns 10 and 20 without limitation. For example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO), metal wire, preferably can be used Indium tin oxide. The metal used for the wire is not particularly limited, and examples thereof include silver (Ag), gold, aluminum, copper, iron, nickel, titanium, tellurium, and chromium. These can be used individually or in mixture of 2 or more types.

The bridge electrode 30 is electrically connected to the unit patterns of the second sensing pattern 20 that are isolated from each other.

At this time, since the bridge electrode 30 needs to be electrically isolated from the first sensing pattern 10 in the sensing pattern, an insulator 40 is formed for this purpose. This is explained below.

The bridge electrode 30 may be located above or below the second sensing pattern 20.

FIG. 1 is a perspective view showing an embodiment in which the bridge electrode 30 is located on the upper part of the second sensing pattern 20 (that is, a state in which the bridge electrode 30 is in contact with the passivation layer 70). FIG. A perspective view of an embodiment (ie, a form of contact with the substrate 1).

FIG. 2 is a cross-sectional view taken along the line AA ′ of the touch sensor shown in FIG. 1. FIG. 5 is an AA ′ cross-sectional view showing the touch sensor shown in FIG. 4.

As described in the above drawings, the bridge electrode 30 may be located on the upper or lower portion of the second sensing pattern 20, so the stacking order of the sensing pattern and the insulator 40 may also be appropriately selected by a method known in the art.

The bridge electrode 30 according to the present invention is formed of a metal material, and is preferably formed of the same material as a position detection line or the like disposed in a corresponding area of a non-display portion of the touch screen panel. At this time, since the bridge electrode 30 can be formed at the same time when the position detection line is formed, the process can be further simplified.

In this specification, the non-display portion refers to an edge portion (frame) where an image is not displayed in a touch screen panel using a touch sensor, and the display portion refers to a portion where an image is displayed. The sensing pattern formed on the display section and the bridge electrode recognize the user's touch signal, and the detected signal is transmitted to the drive circuit side via the position detection line of the non-display section.

The metal is not particularly limited as long as it is a metal having excellent electrical conductivity and low resistance, and may be, for example, molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium, and two or more of these metals. Alloys, etc. These metals can be used alone or in combination of two or more.

In addition, the bridge electrode 30 may be in a form in which two or more metals are stacked in two or more layers. The two or more metals in the range of the above-mentioned metal materials may be formed in a multilayer structure such as two layers or three layers, such as a three-layer structure of molybdenum / aluminum / molybdenum, but it is not limited thereto.

To prevent the first sensing pattern 10 from being electrically connected to the bridge electrode 30, an insulator 40 is formed between the first sensing pattern 10 and the bridge electrode 30.

The insulator 40 may be formed on a joint portion of the unit pattern of the first sensing pattern 10.

In addition, for the convenience of formation, the insulator may be formed not only on the upper portion of the coupling portion of the unit pattern of the first sensing pattern 10 but also in the form of a layer including the same.

As shown in FIGS. 3 and 6, when the insulator 40 is formed in the form of a layer, a contact hole may be provided as required so that the bridge electrode 30 can be connected to the isolated unit pattern of the second sensing pattern 20. At this time, the unit pattern that isolates the second pattern 20 in the contact hole is in electrical contact with the bridge electrode 30.

The insulator 40 according to the present invention can be applied without limitation to a transparent insulating material known in the art. For example, an inorganic material such as silicon oxide, or a transparent photosensitive resin composition or a thermosetting resin composition including an acrylic resin may be used to form a layer or a desired pattern.

According to another embodiment of the present invention, the touch sensor layer 60 may be a structure in which a plurality of isolated sensing patterns are arranged on the same surface. At this time, each sensing pattern is connected to a position detection line, and a bridge electrode may not be required.

The passivation layer 70 has a function of protecting the touch sensor layer 60 and isolating it from the outside.

The passivation layer 70 according to the present invention includes a polysiloxane structure.

For the conventional inorganic oxide film of a passivation material of a conventional touch sensor, a vapor deposition process is necessary, and therefore there is a problem that the manufacturing process is complicated.

In this regard, the present invention includes a polysiloxane structure through the passivation layer 70, and has excellent transparency, scratch resistance (hardness), heat resistance, and adhesion. It can be manufactured by simpler processes such as coating and firing.

The polysiloxane structure is not particularly limited as long as the structure is known in the art, and for example, it may be a structure in which at least one of an aliphatic hydrocarbon and an aromatic hydrocarbon is bonded to a silicon element forming a polysiloxane structure. The aliphatic hydrocarbon may be, for example, a linear or branched alkyl or alkoxy group having 1 to 10 carbon atoms, and the aromatic hydrocarbon may be an aryl group having 6 to 20 carbon atoms, but is not limited thereto.

The polysiloxane structure of the passivation layer 70 may have the same repeating unit as the polysiloxane compound. In addition, according to another embodiment of the present invention, the polysiloxane structure may be formed by applying a polysiloxane compound and firing. The polysiloxane compound is transparent and has ceramic characteristics after firing, so that it is suitable for the raw material of the passivation layer 70. When the polysiloxane structure is obtained by firing a polysiloxane compound, the aliphatic and / or aromatic hydrocarbons of which the repeating unit is bound to the silicon element during the firing process may be detached, so it may be separated from the polysiloxane The repeating unit of the alkane compound is different.

The thickness of the passivation layer 70 according to the present invention may be 0.5 μm to 2 μm, and preferably 0.8 μm to 1.5 μm. By having sufficient hardness in the thickness range, the functions of improving scratch resistance and protecting the touch sensor layer 70 can be exhibited more effectively.

Hereinafter, an embodiment of a method for manufacturing a touch sensor according to the present invention will be described in detail. However, the manufacturing method described below is an example of a specific embodiment of the touch sensor according to the present invention, and is used to deepen the understanding of the technical idea of the present invention in combination with the foregoing summary, and therefore cannot be interpreted as a limitation of the present invention. herein.

According to an embodiment of the touch sensor of the present invention, it may include: forming a touch sensor layer on a substrate; and coating the touch sensor layer with a polysiloxane A step of forming a passivation layer composition with a compound and a solvent; and a step of firing the coated passivation layer forming composition to form a passivation layer.

According to the manufacturing method of the touch sensor of the present invention, the passivation layer 70 can be formed by coating and firing the composition. Therefore, the passivation layer 70 can be formed more easily than the vapor deposition method. Sexually good.

First, the step of forming the touch sensor layer 60 on the substrate 1 can be applied to a manufacturing process of a touch sensor known in the art without particular limitation.

For example, the sensing patterns 10 and 20 and the bridge electrode 30 may be formed by various thin film evaporation techniques such as Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), and the like. For example, it can be formed by reactive sputtering, which is an example of a physical vapor deposition method. Alternatively, it may be formed by a printing process. In the printing process, a variety of printing methods such as gravure off set, reverse off set, inkjet printing, screen printing, and gravure printing can be used. In particular, when forming a sensing pattern by a printing process, it can be formed from a printable paste substance. For example, it may be formed of a carbon nano tube (CNT), a conductive polymer, and a silver nano wire ink (Ag nano wire ink). In addition to the method, it can also be formed by a lithography process.

When the insulator 40 is formed of an inorganic material such as a metal oxide, the method applicable to the sensing pattern can also be applied thereto, and when formed of an organic material such as a photosensitive resin composition, a curing layer known in the art can be applied without particular limitation. Or a method for manufacturing a cured pattern.

Next, a composition for forming a passivation layer containing a polysiloxane compound and a solvent is applied on the touch sensor layer 60.

As described above, the polysiloxane compound may have a structure in which at least one of an aliphatic hydrocarbon and an aromatic hydrocarbon is bonded to the silicon element of the silicon element in the repeating unit of the silicone.

For example, the weight average molecular weight of the polysiloxane compound may be 1,000 to 5,000. After firing in the above range, excellent transparency, layer smoothness, hardness, and scratch resistance can be exhibited.

The solvent is not particularly limited as long as it is a solvent capable of dissolving the polysiloxane compound. For example, propylene glycol methyl ether acetate, propylene glycol methyl ether, or the like can be used alone or in combination, but is not limited thereto.

A preferable viscosity of the composition for forming a passivation layer is 5 to 15 cps (25 ° C) in terms of coatability, smoothness of the film after coating or curing, and processability. The preferred concentration of the polysiloxane compound in the composition in this aspect is 20% to 50% by weight.

The surface energy of the composition for forming a passivation layer may be 20 to 30 dyne / cm (dyne / cm). When the surface energy of the composition is within the above range, the composition exhibits more uniform plating properties when the composition is sprayed in the inkjet printing process, and at the same time, the pattern characteristics of the passivation layer can be optimized. The surface energy can be adjusted by adjusting the specific types and contents of the polysiloxane compound and the solvent.

The ordinary method can be applied to the application of the composition for forming a passivation layer without limitation, and an inkjet printing method can be used in consideration of the precision of the application.

After that, the composition for forming a passivation layer is fired to form a passivation layer.

Through the bake process, the polysiloxane compounds are combined with each other or polymerized to form a hardened layer having excellent transparency and hardness.

Preferably, the firing process can be divided into a pre-bake process and a post-bake process.

Most of the solvent (70% to 80%) of the composition is removed by the first firing process. In this regard, the first firing step may be performed at 110 ° C. to 150 ° C. for 50 to 150 seconds, but is not limited thereto.

In the post-firing step, a part of the organic group is separated from the polysiloxane compound, and the bonding or the polymerization reaction between the silicone compounds is performed to form a passivation layer 70 having inorganic characteristics. In order to form an excellent passivation layer 70, the post-baking process may be performed at 180 ° C to 230 ° C for 15 to 45 minutes.

According to another embodiment of the present invention, the post-firing process may include a first post-firing stage performed between 180 ° C. and 230 ° C. for 15-45 minutes, and a post-firing period between 380 ° C. and 420 ° C. The second post-firing stage. The first post-baking step is to show the effects of the aforementioned post-baking step, and the second post-baking step may be performed in order to increase the durability of the subsequent heat treatment step after the passivation layer 70 is formed.

In addition, the present invention provides a touch screen panel including the touch sensor described above. The touch screen panel according to the present invention can be manufactured with additional configurations disclosed in the art.

In addition, the present invention provides an image display device including the touch screen panel described above. The touch sensor of the present invention is not only applicable to a common liquid crystal display device (Liquid Crystal Display device), but also applicable to a plasma display panel device (Plasma Display Panel device) and an electroluminescence display device (Electro Luminescent Display device). ), Organic light-emitting diode display devices (Organic Light-Emitting Diode Display device) and other image display devices.

Hereinafter, embodiments for understanding the present invention are disclosed, but these embodiments are exemplarily shown by the present invention, and do not limit the scope of the claims. Those of ordinary skill in the art should understand without departing from the description in the present invention. Within the scope of the claims of the invention and the scope of the technical idea, the present invention can be variously modified and changed.

Example one

A touch sensor layer having a structure shown in FIG. 4 was manufactured on a glass substrate. ITO was used as the first and second sensing patterns, molybdenum was used as the bridge electrode, and silicon dioxide was used as the insulator.

A composition for forming a passivation layer (surface energy: 25 dyne / cm) containing 30 parts by weight of polymethylsiloxane (weight average molecular weight Mw: 3000) and 70 parts by weight of propylene glycol monomethyl ether was applied on the touch sensor layer. , Viscosity 7cps), and then fired at 130 ° C for 90 seconds, and then fired at 200 ° C for 30 minutes to form a passivation layer (thickness 1µm after firing), thereby manufacturing a touch sensor. At this time, the passivation layer was formed into a rectangular opening pattern having a length of 0.25 mm on one side.

Example two

Except that it was divided into a first post-firing step performed at 200 ° C for 20 minutes and a second post-firing step performed at 400 ° C for 30 minutes, a contact was manufactured using the same method as in Example 1. Control sensor.

Example three

In addition to the passivation layer-forming composition, the composition for forming a passivation layer contains 40 parts by weight of polymethylsiloxane (weight average molecular weight Mw: 3000) and 60 parts by weight of propylene glycol monomethyl ether, and has a surface energy of 35 dyne / cm and a viscosity Except for 10 cps, a touch sensor was manufactured using the same method as in the first embodiment.

Embodiment 4

A touch sensor was manufactured using the same method as in Example 1 except that the post-baking process was performed at 250 ° C.

Comparative example

Except for the passivation layer (thickness of 3000Å after coating) formed by the SiO ₂ layer by the chemical vapor deposition method, a touch sensor was manufactured using the same method as in the first embodiment. After the same SiO ₂ layer was formed, it was formed into a quadrangular opening pattern with a length of 0.25 mm on one side by a lithography process.

Experimental example

The following experiments were performed on the touch sensors of Examples and Comparative Examples, and the results are shown in Table 1.

1. Measuring transmittance

The transmittance of the touch sensors manufactured in the examples and comparative examples was measured with a spectral colorimeter (CM-3600A, Konica Minolta) at a wavelength of 550 nm, and formed separately on another glass substrate. After the passivation layer, the individual transmittance of the passivation layer was measured.

2. Measuring Haze

The haze of the touch sensors manufactured in the examples and comparative examples was measured using a haze meter (HM-150, Murasaki).

3． Measure chromaticity and color difference

The chromaticity and color difference values of the touch sensors manufactured in the examples and comparative examples were measured using a spectral colorimeter (CM-3600A, Konica Minolta) under the condition of a wavelength of 550 nm.

4． Measuring pencil hardness

The pencil hardness of the touch sensors manufactured by Examples and Comparative Examples was measured according to ASTM D3363.

5． Measuring adhesion

The adhesion of the touch sensors manufactured in the examples and comparative examples was measured according to ASTM D3359, and the evaluation criteria were as follows.

5B: No peeling

4B: Less than 5% peeling

3B: above 5%, less than 15% peeling

2B: above 15%, less than 35% peeling

1B: more than 35%, less than 65% peeling

0B: more than 65% peeling

6. Measuring crack

The occurrence of cracks was observed with a microscope and evaluated.

7. Measuring pattern characteristics

The image of the opening pattern was observed with a microscope and evaluated.

Table 1

Referring to Table 1, it can be confirmed that the passivation layer of the example exhibits optical characteristics and mechanical characteristics equivalent to those of the vapor-deposited silicon oxide layer.

However, in other examples, no collapse of the pattern image was found, but in Example 3 where the surface energy of the composition was large, it was found that about 10% of the entire pattern collapsed at the pattern boundary.

Further, in Example 4 where the temperature of the post-firing step was high, fine cracks were found on the surface of the passivation layer, and the results of the color difference value, the hardness, and the close force were relatively low compared with other examples.

In summary, although the present invention has been disclosed as above with the embodiments, it is not intended to limit the present invention. Those with ordinary knowledge in the technical field to which the present invention pertains can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the scope of the attached patent application.

1‧‧‧ substrate

10‧‧‧First sensor pattern

20‧‧‧Second sensor pattern

30‧‧‧bridge electrode

40‧‧‧ insulator

60‧‧‧Touch sensor layer

70‧‧‧ passivation layer

FIG. 1 is a schematic diagram showing a touch sensor according to an embodiment of the present invention. Fig. 2 is an AA 'cross-sectional view showing the touch sensor shown in Fig. 1. 3 is a schematic cross-sectional view showing a structure in which a bridge electrode is connected to a second sensing pattern through a contact hole when the bridge electrode is positioned above the second sensing pattern, as in FIG. 2. FIG. 4 is a schematic perspective view showing a touch sensor according to another embodiment of the present invention. FIG. 5 is an AA ′ cross-sectional view showing the touch sensor shown in FIG. 4. FIG. 6 is a schematic cross-sectional view showing a structure in which the bridge electrode is connected to the second sensing pattern through the contact hole when the bridge electrode is located below the second sensing pattern, as in FIG.

Claims (20)

A touch sensor is characterized in that a substrate, a touch sensor layer, and a passivation layer are sequentially arranged, and the passivation layer includes a polysiloxane structure. The touch sensor according to item 1 of the scope of patent application, wherein the passivation layer is a fired layer of a polysiloxane compound. The touch sensor according to item 1 of the scope of patent application, wherein a thickness of the passivation layer is 0.5 μm to 2 μm. The touch sensor according to item 1 of the scope of the patent application, wherein the touch sensor layer includes a plurality of isolated sensing patterns, and the sensing patterns are disposed on a same surface. The touch sensor according to item 1 of the scope of patent application, wherein the touch sensor layer includes: a first sensing pattern formed along a first direction; a second sensing formed along a second direction A pattern; and a bridge electrode connected to the unit patterns of the second sensing pattern that are isolated from each other. The touch sensor according to item 1 of the scope of application, wherein the substrate is an organic light emitting diode (OLED) package substrate. The touch-sensitive sensor according to item 1 of the scope of patent application, wherein the substrate is formed of glass, a polymer, or a metal oxide. The touch sensor according to item 4 of the scope of patent application, wherein the sensing pattern is selected from the group consisting of indium tin oxide, indium zinc oxide, zinc oxide, indium zinc tin oxide, and cadmium tin oxide. And at least one of the group consisting of wires is formed. The touch sensor according to item 5 of the scope of patent application, wherein the sensing pattern is selected from the group consisting of indium tin oxide, indium zinc oxide, zinc oxide, indium zinc tin oxide, and cadmium tin oxide. And at least one of a series of metal wires is formed. The touch sensor according to item 5 of the patent application, wherein, in order to prevent the first sensing pattern from being electrically connected to the bridge electrode, an insulator is further included between the first sensing pattern and the bridge electrode. The touch sensor according to claim 10, wherein the insulator is formed of a cured product or a silicon oxide of a photosensitive resin composition. A method for manufacturing a touch sensor, comprising the steps of: forming a touch sensor layer on a substrate; and coating the touch sensor layer with a polysiloxane compound A step of forming a composition for forming a passivation layer by a solvent; and a step of firing the applied composition for forming a passivation layer. The method for manufacturing a touch sensor according to item 12 of the application, wherein a surface energy of the composition forming the passivation layer is 20 to 30 dyne / cm. The method for manufacturing a touch sensor according to item 12 of the scope of patent application, wherein the application of the composition for forming a passivation layer is performed by an inkjet printing method. The method for manufacturing a touch sensor according to item 12 of the scope of the patent application, wherein the firing is performed in a first firing step and a second firing step. The method for manufacturing a touch sensor according to item 15 of the scope of application for a patent, wherein the first firing step is performed at 110 ° C to 150 ° C for 50 seconds to 150 seconds. The method for manufacturing a touch sensor according to item 15 of the scope of patent application, wherein the post-baking step is performed at 180 ° C. to 230 ° C. for 15 minutes to 45 minutes. The method for manufacturing a touch sensor according to item 15 of the scope of patent application, wherein the post-baking process includes: performing a first post-baking stage at 180 ° C to 230 ° C for 15 minutes to 45 minutes; And a second post-firing stage performed at 380 ° C to 420 ° C for 15 minutes to 45 minutes. A touch screen panel includes a touch sensor according to any one of claims 1 to 11 of a patent application. An image display device is characterized in that it includes the touch screen panel according to item 19 of the scope of patent application.