CN107817916A - Tactile sensor and the touch panel including the tactile sensor - Google Patents

Tactile sensor and the touch panel including the tactile sensor Download PDF

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Publication number
CN107817916A
CN107817916A CN201710818419.1A CN201710818419A CN107817916A CN 107817916 A CN107817916 A CN 107817916A CN 201710818419 A CN201710818419 A CN 201710818419A CN 107817916 A CN107817916 A CN 107817916A
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CN
China
Prior art keywords
tactile sensor
sensor according
passivation layer
sensing pattern
layer
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Pending
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CN201710818419.1A
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Chinese (zh)
Inventor
尹亿根
金龙焕
崔永民
姜求炫
琴同基
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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Publication of CN107817916A publication Critical patent/CN107817916A/en
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/061—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208—Touch screens
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Abstract

The present invention is on a kind of tactile sensor and the touch panel including tactile sensor, it is related in more detail and is configured with substrate, tactile sensor layer and passivation layer in order, and the passivation layer includes polysiloxanes and constructed so as to not with reducing the physical property tactile sensor of easy to manufacture and the touch panel including tactile sensor.

Description

Tactile sensor and the touch panel including the tactile sensor
Technical field
The present invention is on a kind of tactile sensor and the touch panel including the tactile sensor, in more detail It is related to the tactile sensor for not reducing physical property and easy to manufacture and the touch panel including the tactile sensor.
Background technology
Recently as the development of informationized society, the demand to display area is also to be increased with variform, therefore Various panel display apparatus (Flat Panel Display with features such as thin type, lightweight, low power consumptions Device), for example, liquid crystal display device (Liquid Crystal Display device), plasma display system (Plasma Display Panel device), el display device (Electro Luminescent Display Device), organic LED display device (Organic Light-Emitting Diode Display device) Deng.
Wherein, because Organic Light Emitting Diode (OLED) display device has high-speed responsive, high image quality, wide viewing angle, low work( The advantages that consumption, therefore concern is received with the display device of a new generation in recent years.
In addition, patch is on said display means, the instruction content that can be shown in by hand or the object selection of people on picture Got most of the attention to input the input unit of the order of user, i.e. touch panel (touch panel).Touch panel is provided in Before display device (front face), so as to which the evolution for directly contacting the hand of people or object is electric signal.
So as to receive the instruction content in contact position selection with input signal.Because this touch panel can substitute The input unit separately set that such as keyboard and mouse are connected and operated with image display, therefore its utilization scope is gradual The trend of expansion.
Therefore, such as KR published patent the 2014-0092366th, in recent years using the touch sensing of touch panel Device is used on a variety of image display devices, but in order to improve productivity so as to be manufactured with simpler process Tactile sensor demand exists always.
Prior art literature
Patent document
KR published patent the 2014-0092366th
The content of the invention
Technical task
It is an object of the invention to provide a kind of touch biography for possessing and not reducing the easy passivation layer of physical property and manufacturing process Sensor.
Moreover, it is an object of the invention to provide a kind of easy to manufacture and can form the touch biography of passivation layer thicker For the purpose of the manufacture method of sensor.
Solves the scheme of problem
A kind of 1. tactile sensor of scheme, substrate, tactile sensor layer and passivation layer are configured with order, and The passivation layer constructs including polysiloxanes.
Tactile sensor of the scheme 2. according to such scheme 1, the passivation layer are the burnings of polysiloxane compound Preparative layer.
Tactile sensor of the scheme 3. according to such scheme 1, the thickness of the passivation layer is 0.5 to 2 μm.
Tactile sensor of the scheme 4. according to such scheme 1, the tactile sensor layer include multiple isolation Sensing pattern, it is described sensing pattern configuration in the same face.
Tactile sensor of the scheme 5. according to such scheme 1,
The tactile sensor layer includes：The the first sensing pattern formed in the first direction；Formed in a second direction Second sensing pattern；And bridge electrode, it connects the mutually isolated unit cell pattern of the second sensing pattern.
Tactile sensor of the scheme 6. according to such scheme 1, the substrate are OLED package substrates.
Tactile sensor of the scheme 7. according to such scheme 1, the substrate are aoxidized by glass, macromolecule or metal Thing is formed.
Tactile sensor of the scheme 8. according to such scheme 4, the sensing pattern is by selected from indium tin oxide (ITO), indium-zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin-oxide (CTO) and gold Belong at least one formation in the group of silk composition.
Tactile sensor of the scheme 9. according to such scheme 5, the sensing pattern is by selected from indium tin oxide (ITO), indium-zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin-oxide (CTO) and gold Belong at least one formation in the series matter of silk composition.
Tactile sensor of the scheme 10. according to such scheme 5, in order to prevent the first sensing pattern and bridge electrode Electrical connection, also include insulator between the first sensing pattern and bridge electrode.
Tactile sensor of the scheme 11. according to such scheme 10, the insulator are by Photosensitve resin composition Solidfied material or Si oxide formed.
A kind of manufacture method of 12. tactile sensor of scheme, including：The step of tactile sensor layer is formed on substrate Suddenly；Passivation layer formation composition of the coating comprising polysiloxane compound and solvent on the tactile sensor layer Step；And the step of firing the passivation layer formation composition of the coating and forming passivation layer.
The manufacture method of tactile sensor of the scheme 13. according to such scheme 12, form the group of the passivation layer The surface energy of compound is 20 to 30dyne/cm.
The manufacture method of tactile sensor of the scheme 14. according to such scheme 12, is performed with ink jet printing mode The passivation layer formation composition coating.
The manufacture method of tactile sensor of the scheme 15. according to such scheme 12, it is described to fire first to fire work Sequence and rear ablating work procedure perform.
The manufacture method of tactile sensor of the scheme 16. according to such scheme 15, the first ablating work procedure is 110 Performed 50 to 150 seconds to 150 DEG C.
The manufacture method of tactile sensor of the scheme 17. according to such scheme 15, the rear ablating work procedure is 180 Performed 15 to 45 minutes to 230 DEG C.
The manufacture method of tactile sensor of the scheme 18. according to such scheme 15, the rear ablating work procedure include： 180 to 230 DEG C perform 15 to 45 minutes first after fire the stage；And the of 15 to 45 minutes is performed at 380 to 420 DEG C The stage is fired after two.
A kind of 19. touch panel of scheme, including the touch biography described in any one in such scheme 1 to scheme 11 Sensor.
A kind of 20. image display device of scheme, including the touch panel described in such scheme 19.
Invention effect
The tactile sensor of the present invention, because passivation layer includes polysiloxane structure, it is possible to by simpler Process manufacture, and can possess thicker passivation layer according to demand.
According to the passivation layer of the tactile sensor of the present invention, can have for the Si oxide passivation layer formed by being deposited There is the physical property more than equal.
Moreover, the present invention tactile sensor manufacture method by be coated with polysiloxane compound and fire rank Section, can be easily performed.
Moreover, the present invention tactile sensor manufacture method when being coated with polysiloxane compound according to ink-jet side Thicker passivation layer can be formed during formula.
Brief description of the drawings
Fig. 1 is the skeleton diagram for the tactile sensor for representing one embodiment of the invention.
Fig. 2 is the A-A' sectional views for representing the tactile sensor shown in Fig. 1.
Fig. 3 identically with Fig. 2, is represented when bridge electrode is positioned at the top of the second sensing pattern by contact hole and second Sense the general profile chart of the structure of pattern connection.
Fig. 4 is the approximate three-dimensional map for the tactile sensor for representing another embodiment of the present invention.
Fig. 5 is the A-A' sectional views for representing the tactile sensor shown in Fig. 4.
Fig. 6 identically with Fig. 4, is represented when bridge electrode is positioned at the bottom of the second sensing pattern by contact hole and second Sense the general profile chart of the structure of pattern connection.
Reference
1：Substrate
10：First sensing pattern 20：Second sensing pattern
30：Bridge electrode 40：Insulator
60：Tactile sensor layer 70：Passivation layer
Embodiment
The present invention is on a kind of tactile sensor, and the tactile sensor is configured with substrate, touch in order Sensor layer and passivation layer, and the passivation layer constructs including polysiloxanes, and also the tactile sensor does not reduce Physical property and easy to manufacture.
Below, embodiments of the invention are described in detail with reference to accompanying drawings.But the figure shown in accompanying drawing is by the present invention Specific embodiment example combines to have in foregoing invention and understands the technology of the present invention thought in more detail in schematic diagram Effect, therefore, it is understood that the present invention is not limited to the embodiment disclosed in figure.
According to an embodiment of the tactile sensor of the present invention, Fig. 1 is its stereogram, and Fig. 2 is represented shown in Fig. 1 The A-A' sectional views of tactile sensor.
According to another embodiment of the tactile sensor of the present invention, Fig. 4 is its stereogram, and Fig. 5 is represented shown in Fig. 4 Tactile sensor A-A' sectional views.
According to the another embodiment of the tactile sensor of the present invention, difference corresponding diagram 1 (Fig. 4) and Fig. 4 (Fig. 5), still Insulator is formed with stratiform so that bridge electrode is represented in Fig. 3 and Fig. 6 by contact hole with the embodiment that sensing pattern is connected.
But in Fig. 1 and Fig. 4, passivation layer 70 is not shown in order to be easily mastered stepped construction.
The tactile sensor of the present invention has is configured with substrate 1, tactile sensor layer 60 and passivation layer in order 70 structure.Substrate 1, tactile sensor layer 60 and passivation layer 70 can be the structures being laminated in order, and those it Between can be further inserted into known structure in art.
Substrate 1, it can be not specifically limited and unrestrictedly using the material for being typically used in tactile sensor, such as Can be selected in the series matter formed by glass, macromolecule and metal oxide.Macromolecule can be by cyclic olefin polymerization Thing (COP), polyethylene terephthalate (PET), polyacrylate (PAR), PEI (PEI), polystyrene two Formates (PEN), polyphenylene sulfide (PPS), polypropylene ester (polyallylate), polyimides (PI), cellulose acetate propionate (CAP), polyether sulfone (PES), cellulose triacetate (TAC), makrolon (PC), cyclic olefine copolymer (COC), polymethyl In sour methyl esters (PMMA) etc. individually or mixing is two or more uses, it is preferred to use polyimides, but it is not limited to this.
Aluminum oxide (Al2O3) etc. can be used in metal oxide.
In view of the ablating work procedure for forming passivation layer 70 described later, substrate 1 preferably can be glass or metal oxygen Compound.
According to one embodiment of the invention, substrate 1 can be the package substrate for sealing OLED.
OLED is typically the organic film and negative electrode and quilt for the anode including organic luminous layer being laminated on base substrate The structure of package substrate sealing.
The organic luminescent substance of organic luminous layer will be oxidized so as to which the life-span substantially reduces when contacting moisture or oxygen, because This package substrate plays the role of to prevent the barrier layer that moisture and oxygen pass through.
Tactile sensor layer 60 can be formed on substrate 1.
Tactile sensor layer 60 can use tactile sensor known to art with being not particularly limited.Such as Tactile sensor layer 60 has multiple sensing patterns.The coordinate information that pattern provides contact point is sensed, specifically, when the hand of people Or object is contacted by the pattern of the position and the position detection lines transmission for being connected to pattern when being contacted with covering window substrate The change of the static capacity of position, and electric signal is transformed to by the change of the static capacity, confirm contact position.
Represented according to an embodiment of the tactile sensor layer 60 of the present invention in Fig. 1 and Fig. 4.
Tactile sensor layer 60 shown in Fig. 1 and Fig. 4 can include：The the first sensing pattern formed in the first direction 10；The the second sensing pattern 20 formed in a second direction；And the mutually isolated unit figure of connection the second sensing pattern The bridge electrode of case.
Fig. 1 illustrates the embodiment (reference picture 2) for the structure that bridge electrode 30 contacts with passivation layer 70, and Fig. 4 illustrates bridge electricity The embodiment (reference picture 5) for the structure that pole 30 contacts with substrate 1.
First sensing pattern 10 and second senses pattern 20 and configured along mutually different direction.For example, first direction is X-axis Direction, second direction can be the Y direction intersected with it, but not limited with this.
First sensing pattern 10 and second senses the information that pattern 20 provides X-coordinate and Y-coordinate on contact point.Specifically Ground, sense pattern 20 and position via the first sensing pattern 10, second when the hand or object of people contact with covering window substrate Put the change that detection line transmits the static capacity according to contact position to driving circuit side.Then, the change of static capacity passes through X And Y input processings loop (not shown) etc. is transformed to electric signal, so as to confirm contact position.
Related to this, the first sensing pattern 10 and second senses pattern 20 and formed in same layer, in order to detect touch location, Each pattern needs to electrically connect.But although first sensing pattern 10 unit cell pattern by junction surface into be connected with each other form, And the unit cell pattern of the second sensing pattern 20 is the structure being separated from each other in the form of island (island), therefore in order to electrically connect the Two sensing patterns 20 need other bridge electrode 30.
Transparent electrode material known to art can unrestrictedly be applied to sensing pattern 10,20.For example, indium tin oxygen Compound (ITO), indium-zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin-oxide (CTO), gold Belong to silk, can preferably use indium tin oxide.Metal for wire is not particularly limited, for example, silver-colored (Ag), gold, aluminium, Copper, iron, nickel, titanium, tellurium, chromium.These can individually or mixing two kinds it is used above.
The mutually isolated unit cell pattern of the electrical connection of bridge electrode 30 second sensing pattern 20.
Now, because bridge electrode 30 needs to be electrically isolated with the first sensing pattern 10 in sensing pattern, for this formed with exhausted Edge body 40.This is described below.
Bridge electrode 30 can be located at the top or bottom of the second sensing pattern 20.
Fig. 1 be represent bridge electrode 30 positioned at second sensing pattern 20 top an embodiment stereogram (that is, with passivation The form of the contact of layer 70), Fig. 4 is the stereogram for representing bridge electrode 30 positioned at an embodiment of the bottom of the second sensing pattern 20 (that is, the form contacted with substrate 1).
Moreover, Fig. 2 is the A-A' sectional views for representing the tactile sensor shown in Fig. 1.Fig. 5 is represented shown in Fig. 4 Tactile sensor A-A' sectional views.
As described in above-mentioned accompanying drawing, bridge electrode 30 can be located at the top or bottom of the second sensing pattern 20, therefore influence chart Case and the lamination order of insulator 40 method can equally properly select as known to art.
Formed according to the bridge electrode 30 of the present invention by metal material, preferably by with configuring in the non-display of touch panel The identical material such as the position detection lines in corresponding field in portion is formed.Now, because can shape simultaneously during forming position detection line Into bridge electrode 30, it is possible to further simplify process.
In this specification, non-display portion refers in touch panel using tactile sensor the not edge of display image Position (frame), display part refer to the position of display image.The sensing pattern and bridge electrode formed in display part identifies user Touch signal, the signal detected via non-display portion position detection lines to driving circuit side transmit.
The metal, as long as electrical conductivity is outstanding and low-resistance metal will be not particularly limited, such as can be molybdenum, Silver, aluminium, copper, palladium, gold, platinum, zinc, tin, more than two kinds of the alloy etc. of titanium and these metals.These metals can individually or Mix two or more uses.
Moreover, bridge electrode 30 can be the form of more than two kinds of more than two layers of metal stacking.Can be by above-mentioned metal Two or more metals in the range of material are formed with the structure of two layers, three layers etc. multilayer, such as the three-layered node of molybdenum/aluminium/molybdenum Structure, but it is not limited to this.
In order to prevent the electrical connection of the first sensing pattern 10 and bridge electrode 30, insulator 40 is formed senses pattern 10 first Between bridge electrode 30.
Insulator 40 can be formed on the junction surface of the unit cell pattern of the first sensing pattern 10.
Moreover, convenience of the insulator for formation, the knot of the unit cell pattern of the first sensing pattern 10 is not only formed in Above conjunction portion, it can also be formed in the form of the layer including it.
As shown in Figure 3 and Figure 6, can possess contact hole according to demand when insulator 40 is formed in the form of layer, so that Bridge electrode 30 can connect the unit cell pattern of the isolation of the second sensing pattern 20.Now, the second pattern 20 is realized in contact hole The unit cell pattern of isolation and the electrical contact of bridge electrode 30.
The transparent insulation material according to known to the insulator 40 of the present invention unrestrictedly can be applicable art.For example, Can use as Si oxide inorganic material, or solidification include acrylic resin transparent Photosensitve resin composition or Compositions of thermosetting resin, be formed as the pattern of layer or needs.
According to another embodiment of the present invention, tactile sensor layer 60 can be that the sensing pattern configuration of multiple isolation exists Structure on the same face.Now, respectively sensing pattern is connected with position detection lines, and can not need bridge electrode.
Passivation layer 70 has protection tactile sensor layer 60 and makes its function with exterior insulation.
Polysiloxane structure is included according to the passivation layer 70 of the present invention.
For the passivating material inorganic oxide film of known existing tactile sensor, evaporation process be it is necessary, Therefore there is the problem of manufacturing process's complexity.
On the other hand, the present invention includes polysiloxane structure by passivation layer 70, it is (hard to possess outstanding transparency, scratch resistance Degree), heat resistance, while be adjacent to power, can by coating and firing of such as the composition including polysiloxane compound etc. compared with Simple process manufacture.
As long as structure known to art is not particularly limited polysiloxane structure, such as can form poly- silica At least one structure in the element silicon bound fat race's hydrocarbon and aromatic hydrocarbon of alkyl structure.Aliphatic hydrocarbon can be such as carbon number For the alkyl or alkoxy of 1 to 10 straight or branched, aromatic hydrocarbon can be the aryl that carbon number is 6 to 20, but be not limited to This.
The polysiloxane structure of passivation layer 70 can have the recurring unit same with polysiloxane compound.In addition, root According to another embodiment of the present invention, polysiloxane structure can be formed by being coated with to fire after polysiloxane compound.Poly- silica Hydride compounds are ceramic characteristics that are transparent and having after firing, so as to the raw material suitable for passivation layer 70.Polysiloxane structure When being by being obtained after firing polysiloxane compound, its recurring unit be incorporated in ablating work procedure element silicon aliphatic and/ Or aromatic hydrocarbon may depart from, it is therefore possible to different from the recurring unit of polysiloxane compound.
The thickness of passivation layer 70 according to the present invention can be 0.5 to 2 μm, preferably can be 0.8 to 1.5 μm.By The thickness range has sufficient hardness, therefore can more effectively play and improve scratch resistance and protection tactile sensor The function of layer 70.
Hereinafter, an embodiment of the manufacture method of the tactile sensor according to the present invention is described in detail.But It is that manufacture method described below is according to the example of the tactile sensor specific embodiment of the present invention, and for tying Close the foregoing content of the invention to sharpen understanding the effect of ground technological thought of the invention, therefore the present invention can not be construed to and be defined in this.
According to an embodiment of the tactile sensor of the present invention, can include：Tactile sensor is formed on substrate The step of layer；Passivation layer formation group of the coating comprising polysiloxane compound and solvent on the tactile sensor layer The step of compound；And the step of firing the passivation layer formation composition of the coating and forming passivation layer.
According to the manufacture method of the tactile sensor of the present invention, passivation can be formed by being coated with and firing composition Layer 70, therefore passivation layer 70 can be more easily formed compared to vapour deposition method, therefore it is more outstanding in terms of productivity and economy.
First, the step of forming tactile sensor layer 60 on substrate 1 can be applicable art without particular limitation In known tactile sensor manufacturing process.
For example, sensing pattern 10,20 and bridge electrode 30 can be by physical vapor deposition (Physical Vapor Deposition, PVD), a variety of film vapor deposition technology shapes such as chemical vapor deposition method (Chemical VaporDeposition, CVD) Into.For example, it can be formed by the reactive sputtering (reactive sputtering) of one of physical vapor deposition.Or Ke Yiyou Printing process is formed.When carrying out printing process, intaglio offset (gravure off set), reverse bias can be utilized A variety of printing processes such as (reverse off set), ink jet printing, silk-screen printing and intaglio plate (gravure) printing.Especially Ground, when forming sensing pattern using printing process, it can be formed by printable slurry material.Such as can be by CNT (carbon nano tube, CNT), electric conductive polymer and nano silver wire ink (Ag nano wire ink) formation.Remove It can also be formed outside methods described by photoetching process.
When insulator 40 is formed by the inorganic material of such as metal oxide, it can equally be fitted suitable for the method for sensing pattern It can be applicable without particular limitation for it, and when being formed by the organic material of such as Photosensitve resin composition public in art The cured layer or the manufacture method of cured pattern known.
Secondly, passivation layer formation group of the coating comprising polysiloxane compound and solvent on tactile sensor layer 60 Compound.
Polysiloxane compound is as described above, can be that the element silicon of oxyalkylene repeating unit combines fat on element silicon At least one structure in fat race hydrocarbon and aromatic hydrocarbon.
Such as the weight average molecular weight of polysiloxane compound can be 1000 to 5000.Can after scope firing To show outstanding transparency, the smoothness of layer, hardness and scratch resistance.
As long as the solvent that solvent can dissolve polysiloxane compound is just not particularly limited, for example, can individually or mixing Using propylene glycol methyl ether acetate, propylene glycol monomethyl ether etc., but it is not limited to this.
The flatness of film, processability after coating, coating or solidification etc. passivation layer formation composition it is excellent The viscosity of choosing is 5 to 15cps (25 DEG C).The concentration of the preferable polysiloxane compound in composition is 20 to 50 in this regard Weight %.
The surface energy of passivation layer formation composition can be 20 to 30dyne/cm.The surface energy of composition is in institute More uniform coating is shown when composition sprays in ink jet printing process when stating scope, while passivation layer can be optimized Pattern properties.The regulation of surface energy can be real by adjusting the specific species and content of polysiloxane compound and solvent It is existing.
Usual way can be applied to the coating of passivation layer formation composition unlimitedly, it is contemplated that the precision of coating Property can preferred ink jet printing mode.
Afterwards, the passivation layer formation composition for firing coating forms passivation layer.
By firing (bake) process, polysiloxane compound it is mutual with reference to so that polymerization and formed with outstanding The hardened layer of transparency and hardness.
Preferably, ablating work procedure can be divided into first firing (pre-bake) process and firing (post-bake) process afterwards and hold OK.
The major part (70 to 80%) of the solvent of composition is removed by first ablating work procedure.In this regard, first ablating work procedure It can be performed 50 to 150 seconds at 110 to 150 DEG C, but be not limited to this.
In rear ablating work procedure, a part for organic group is departed from from polysiloxane compound, and carry out silicone compounds it Between with reference to so that polymerisation and form the passivation layer 70 with inorganic matter characteristic.In order to form outstanding passivation layer 70, after Ablating work procedure can perform 15 to 45 minutes at 180 to 230 DEG C.
According to another embodiment of the present invention, 15 to 45 points are performed between rear ablating work procedure can be included in 180 to 230 DEG C After the first of clock fire the stage and performed between 380 to 420 DEG C 15 to 45 minutes second after fire the stage.After first Ablating work procedure is to show the effect of foregoing rear ablating work procedure, and ablating work procedure can form passivation to increase after second The durability of follow-up heat treatment step after layer 70 and perform.
In addition, the invention provides the touch panel for including above-mentioned tactile sensor.According to the touch of the present invention Composition that panel plate can be added disclosed in art and manufacture.
In addition, the invention provides the image display device for including above-mentioned touch panel.The touch biography of the present invention Sensor is applicable not only to common liquid crystal display device (Liquid Crystal Display device), can be applicable to Plasma display panel apparatus (Plasma Display Panel device), el display device (Electro Luminescent Display device), organic LED display device (Organic Light-Emitting Diode Display device) etc. a variety of image display devices.
Hereinafter, disclose for understanding embodiments of the invention, but those embodiments are illustrating for the present invention, And the scope of claim is not limited, it will be understood by those within the art that being documented in right of the present invention not departing from In the range of the category and technological thought of claim, the present invention can carry out a variety of amendments and change.
Embodiment one
The tactile sensor layer of the structure shown in Fig. 4 has been manufactured on the glass substrate.As the first and second sensings Pattern has been deposited ITO, molybdenum has been deposited as bridge electrode, silica has been deposited as insulator to use.
Coating includes polymethyl siloxane (Mw on tactile sensor layer:3000) 30 parts by weight and propylene glycol monomethyl ether The passivation layer of 70 parts by weight, which is formed, uses composition (surface energy 25dyne/cm, viscosity 7cps), and is first fired 90 seconds at 130 DEG C, Fired after 200 DEG C 30 minutes and form passivation layer (1 μm of thickness after firing), so as to manufacture tactile sensor.Now, passivation layer The length for being formed as one side is 0.25mm dimetric opening portion pattern.
Embodiment two
Except be divided into 200 DEG C perform 20 minutes first after fire the stage and 400 DEG C perform 30 minutes second after Outside the rear ablating work procedure that the firing stage performs, use and manufactured tactile sensor with the identical method of embodiment one.
Embodiment three
Except passivation layer formation with composition includes polymethyl siloxane (Mw:3000) 40 parts by weight and propylene glycol monomethyl ether The passivation layer formation composition of 60 parts by weight, and surface energy is 35dyne/cm, and viscosity is outside 10cps, has been used and reality Apply the identical method of example one and manufacture tactile sensor.
Example IV
In addition to ablating work procedure after being performed at 250 DEG C, use and manufactured touch biography with the identical method of embodiment one Sensor.
Comparative example
Except by chemical vapor coating method by SiO2(thickness is the passivation layer that layer is formed after plated film) outside, use With the identical method of embodiment one tactile sensor is manufactured.Same SiO2Be formed as after layer film forming by photoetching process One edge lengths are 0.25mm tetragonal opening portion pattern.
Experimental example
Following experiment is performed to the tactile sensor of embodiment and comparative example, its result is documented in table 1.
1. measure penetrance
Measured respectively using spectrocolorimeter (CM-3600A, Konica Minolta) under conditions of 550nm wavelength The penetrance of the tactile sensor manufactured by embodiment and comparative example, and its passivation is individually formed on other glass substrate After layer, the single penetrance of passivation layer is measured respectively.
2. measure mist degree
The touch sensing by embodiment and comparative example manufacture is measured using haze measurement instrument (HM-150, Murasaki) The mist degree of device.
3. measure colourity and aberration
Measured under conditions of 550nm wavelength using spectrocolorimeter (CM-3600A, Konica Minolta) by reality Apply the colourity and value of chromatism of the tactile sensor of example and comparative example manufacture.
4. measure pencil hardness
The pencil hardness of the tactile sensor by embodiment and comparative example manufacture is measured according to ASTM D3363.
5. measure adhesiveness
The adhesiveness of the tactile sensor by embodiment and comparative example manufacture is measured according to ASTM D3359, evaluates base It is accurate as follows.
5B:Without stripping
4B:Less than 5% stripping
3B:More than 5%, the stripping less than 15%
2B:More than 15%, the stripping less than 35%
1B:More than 35%, the stripping less than 65%
0B:More than 65% stripping
6. measure crackle
Whether produce and evaluate using microscopic crackle.
7. measure pattern properties
Using the vivid of microscopic opening portion pattern and evaluate.
【Table 1】
With reference to table 1, it can confirm that the passivation layer of embodiment shows the optics spy of level equal with the silicon oxide layer being deposited Property, mechanical property.
But in the collapsing without discovery pattern image of other embodiment, but the surface energy in composition is larger Embodiment 3 be found that about 10% phenomenon caved in pattern boundaries of all patterns.
Moreover, it is found that blind crack, and table in passivation layer surface in the higher embodiment 4 of the temperature of rear ablating work procedure Revealed compared with other embodiment value of chromatism and hardness and press close to power it is relatively low under result.

Claims (20)

  1. A kind of 1. tactile sensor, it is characterised in that
    Substrate, tactile sensor layer and passivation layer are configured with order, and the passivation layer constructs including polysiloxanes.
  2. 2. tactile sensor according to claim 1, it is characterised in that
    The passivation layer is the firing layer of polysiloxane compound.
  3. 3. tactile sensor according to claim 1, it is characterised in that
    The thickness of the passivation layer is 0.5 to 2 μm.
  4. 4. tactile sensor according to claim 1, it is characterised in that
    The tactile sensor layer includes the sensing pattern of multiple isolation, and the sensing pattern configuration is in the same face.
  5. 5. tactile sensor according to claim 1, it is characterised in that
    The tactile sensor layer includes：
    The the first sensing pattern formed in the first direction；
    The the second sensing pattern formed in a second direction；And
    Bridge electrode, it connects the mutually isolated unit cell pattern of the second sensing pattern.
  6. 6. tactile sensor according to claim 1, it is characterised in that
    The substrate is OLED package substrate.
  7. 7. tactile sensor according to claim 1, it is characterised in that
    The substrate is formed by glass, macromolecule or metal oxide.
  8. 8. tactile sensor according to claim 4, it is characterised in that
    The sensing pattern is by selected from indium tin oxide, indium-zinc oxide, zinc oxide, indium zinc tin oxide, cadmium tin-oxide And groups of metal filaments into group at least one formation.
  9. 9. tactile sensor according to claim 5, it is characterised in that
    The sensing pattern is by selected from indium tin oxide, indium-zinc oxide, zinc oxide, indium zinc tin oxide, cadmium tin-oxide And groups of metal filaments into series matter at least one formation.
  10. 10. tactile sensor according to claim 5, it is characterised in that
    In order to prevent the electrical connection of the first sensing pattern and bridge electrode, also include insulation between the first sensing pattern and bridge electrode Body.
  11. 11. tactile sensor according to claim 10, it is characterised in that
    The insulator is formed by the solidfied material or Si oxide of Photosensitve resin composition.
  12. A kind of 12. manufacture method of tactile sensor, it is characterised in that including：
    On substrate formed tactile sensor layer the step of；
    Passivation layer formation composition of the coating comprising polysiloxane compound and solvent on the tactile sensor layer The step of；And
    The step of firing the passivation layer formation composition of the coating and forming passivation layer.
  13. 13. the manufacture method of tactile sensor according to claim 12, it is characterised in that
    The surface energy for forming the composition of the passivation layer is 20 to 30dyne/cm.
  14. 14. the manufacture method of tactile sensor according to claim 12, it is characterised in that
    The coating of the passivation layer formation composition performed with ink jet printing mode.
  15. 15. the manufacture method of tactile sensor according to claim 12, it is characterised in that
    The firing is performed with first ablating work procedure and rear ablating work procedure.
  16. 16. the manufacture method of tactile sensor according to claim 15, it is characterised in that
    The first ablating work procedure performs 50 to 150 seconds at 110 to 150 DEG C.
  17. 17. the manufacture method of tactile sensor according to claim 15, it is characterised in that
    Ablating work procedure performs 15 to 45 minutes at 180 to 230 DEG C after described.
  18. 18. the manufacture method of tactile sensor according to claim 15, it is characterised in that
    Ablating work procedure includes after described：180 to 230 DEG C perform 15 to 45 minutes first after fire the stage；And 380 to 420 DEG C perform 15 to 45 minutes second after fire the stage.
  19. A kind of 19. touch panel, it is characterised in that
    Including the tactile sensor described in any one in claim 1 to 11.
  20. A kind of 20. image display device, it is characterised in that
    Including the touch panel described in claim 19.
CN201710818419.1A 2016-09-13 2017-09-12 Tactile sensor and the touch panel including the tactile sensor Pending CN107817916A (en)

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