TW201740121A - Inspection jig, inspection jig set, and substrate inspecting apparatus - Google Patents

Inspection jig, inspection jig set, and substrate inspecting apparatus Download PDF

Info

Publication number
TW201740121A
TW201740121A TW105141391A TW105141391A TW201740121A TW 201740121 A TW201740121 A TW 201740121A TW 105141391 A TW105141391 A TW 105141391A TW 105141391 A TW105141391 A TW 105141391A TW 201740121 A TW201740121 A TW 201740121A
Authority
TW
Taiwan
Prior art keywords
inspection
substrate
probe
contact
aid
Prior art date
Application number
TW105141391A
Other languages
Chinese (zh)
Other versions
TWI752928B (en
Inventor
松川俊英
北澤一孝
中山孝文
辻本正之
高橋正
角田晴美
楠田達文
Original Assignee
日本電產理德股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電產理德股份有限公司 filed Critical 日本電產理德股份有限公司
Publication of TW201740121A publication Critical patent/TW201740121A/en
Application granted granted Critical
Publication of TWI752928B publication Critical patent/TWI752928B/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2801Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
    • G01R31/2805Bare printed circuit boards
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2801Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
    • G01R31/2806Apparatus therefor, e.g. test stations, drivers, analysers, conveyors
    • G01R31/2808Holding, conveying or contacting devices, e.g. test adapters, edge connectors, extender boards
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2801Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
    • G01R31/281Specific types of tests or tests for a specific type of fault, e.g. thermal mapping, shorts testing
    • G01R31/2817Environmental-, stress-, or burn-in tests
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

Provided are an inspection jig, an inspection jig set and a substrate inspection apparatus capable of subjecting temperature stress to a substrate of an inspection object as well as reducing inspection time. An inspection jig 3D is an inspection jig 3D for inspecting a substrate 100 of an inspection object, which is set with inspection points P1, the inspection jig 3D including probes Pr for contacting with the inspection points P1, and a contacting surface B1 for contacting with the substrate 100, the inspection jig 3D further including a heating block 35D for heating the substrate 100 by heating the contacting surface B1.

Description

檢查輔助具、檢查輔助具套組、及基板檢查裝置 Inspection aid, inspection aid set, and substrate inspection device

本發明係有關用以使探針接觸於基板之檢查輔助具、檢查輔助具套組及基板檢查裝置。 The present invention relates to an inspection aid, an inspection aid kit, and a substrate inspection apparatus for contacting a probe to a substrate.

以往,已知有基板檢查裝置,該基板檢查裝置係為了進行檢查印刷配線基板等基板上所形成的配線圖案的導通、各配線圖案之間有無不良短路、或配線圖案及配線圖案之間的電阻值等的基板檢查,例如使移動式的檢查用接觸子、保持成多針狀之複數個檢查用接觸子等接觸形成在配線圖案上的焊墊(pad)、焊盤(land)等複數個檢查點,來測量該檢查對象配線圖案上的檢查點之間的電阻,藉此,進行基板檢查。 Conventionally, there has been known a substrate inspection apparatus for inspecting conduction of a wiring pattern formed on a substrate such as a printed wiring board, and whether or not there is a defective short circuit between the wiring patterns or a resistance between the wiring pattern and the wiring pattern. For the substrate inspection such as a value, for example, a movable inspection contact, a plurality of inspection contacts held in a multi-needle shape, and the like, a plurality of pads, land, and the like formed on the wiring pattern are contacted. The inspection point is used to measure the electric resistance between the inspection points on the inspection target wiring pattern, thereby performing the substrate inspection.

於此種基板中,會有例如配線圖案與通孔(via hole)之間的接觸不完全而雖導通但接觸狀態不穩定的情形。此種不良情形,會有於檢查時被判斷為檢查點之間呈導通而被當作良品並組裝於製品之後,由於使用環境的熱應力而使不良情形顯現出來的情況。特別是,在基板的內部,由於接觸於配線圖案之間的埋入通孔的不完全的接 觸之不良情況係無法由基板的外部來目視檢查,所以難以藉由檢查來檢查出。 In such a substrate, for example, the contact between the wiring pattern and the via hole is incomplete, but the conduction is unstable, but the contact state is unstable. Such an inconvenience may occur when the inspection is judged to be a conduction between the inspection points and is regarded as a good product and assembled into the product, and the defective condition is revealed due to the thermal stress of the use environment. In particular, in the interior of the substrate, due to incomplete connection of the buried vias between the wiring patterns The contact failure cannot be visually inspected from the outside of the substrate, so it is difficult to check by inspection.

對此,已提案有一種檢查裝置(例如專利文獻1),該檢查裝置係於基板檢查時,使用預熱腔(chamber)來加熱載置有檢查對象之基板的空間,將基板置於高溫環境下施予熱應力來進行檢查,藉此來檢測出此種不完全的接觸之不良情況。 In view of this, an inspection apparatus (for example, Patent Document 1) has been proposed which uses a preheating chamber to heat a space on which a substrate to be inspected is placed, and places the substrate in a high temperature environment. Thermal stress is applied to perform inspection to detect such incomplete contact failure.

(先前技術文獻) (previous technical literature) (專利文獻) (Patent Literature)

專利文獻1:日本特開2001-215257號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2001-215257

然而,如上述的方式使用預熱腔來加熱檢查對象之基板的載置空間以對基板施予熱應力所構成的檢查裝置,存在有由於基板的加熱耗費時間而會大幅增加檢查時間的不良情形。 However, as described above, the inspection apparatus including the preheating chamber for heating the mounting space of the substrate to be inspected to apply thermal stress to the substrate has a problem that the inspection time is greatly increased due to the time required for the heating of the substrate.

本發明的目的在於提供能夠對檢查對象的基板施加熱應力之同時縮短檢查時間的檢查輔助具、檢查輔助具套組及基板檢查裝置。 An object of the present invention is to provide an inspection aid, an inspection aid kit, and a substrate inspection apparatus that can reduce the inspection time while applying thermal stress to the substrate to be inspected.

本發明之檢查輔助具係用以檢查設定有檢查對象之檢查點之基板的檢查輔助具該檢查輔助具係具備:探針,用以接觸於前述檢查點;以及加熱部,具有用 以接觸於前述基板的接觸面,藉由加熱前述接觸面而加熱前述基板。 The inspection aid of the present invention is an inspection aid for inspecting a substrate on which an inspection target is set, the inspection aid having a probe for contacting the inspection point, and a heating portion for use The substrate is heated by heating the contact surface by contacting the contact surface of the substrate.

依據此構成,由於能夠藉由加熱接觸於基板的接觸面來加熱基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。 According to this configuration, since the substrate can be heated by heating the contact surface contacting the substrate, the substrate can be heated to heat the substrate by using the preheating chamber to heat the substrate, and it is easier to heat the substrate in a short time. Therefore, it is possible to shorten the inspection time while applying thermal stress to the substrate to be inspected.

再者,前述基板係具有第一面與第二面,於前述第一面與前述第二面設定有前述檢查點,前述探針係接觸於前述第一面的檢查點,前述接觸面係接觸於前述基板中之在前述第二面設定有前述檢查點之區域的前述第一面,且具有與前述第一面之檢查點分離的形狀。 Furthermore, the substrate has a first surface and a second surface, and the inspection point is set on the first surface and the second surface, and the probe is in contact with the inspection point on the first surface, and the contact surface is in contact with The first surface of the substrate on which the inspection point is set on the second surface is formed to have a shape separated from the inspection point of the first surface.

依據此構成,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針被加熱的風險之情況下加熱基板。 According to this configuration, since the region where the inspection point of the substrate is set can be heated from the back side on the side where the inspection point is set, the substrate can be heated while reducing the risk of the probe for contacting the inspection point being heated.

再者,較佳者為:前述加熱部包含:金屬構件,係具有前述接觸面,且於與前述接觸面正交的方向具有厚度;以及加熱器,係與前述接觸面大致平行地延伸於前述金屬構件的厚度內。 Further, preferably, the heating unit includes a metal member having the contact surface and having a thickness in a direction orthogonal to the contact surface, and a heater extending substantially parallel to the contact surface Within the thickness of the metal member.

依據此構成,能有效地將加熱器所產生的熱傳導至金屬構件,並且能以均勻性良好地傳導熱的方式加熱整體接觸面。 According to this configuration, the heat generated by the heater can be efficiently conducted to the metal member, and the entire contact surface can be heated to conduct heat with uniformity.

再者,較佳者為:前述檢查輔助具更具備:支撐前述探針的支撐構件;以及一體地支撐前述支撐構件與前述加熱部的基台,前述加熱部與前述基台係透過具有 隔熱性的隔熱構件而連結。 Furthermore, it is preferable that the inspection aid further includes: a support member that supports the probe; and a base that integrally supports the support member and the heating unit, wherein the heating unit and the base system have transmission The heat insulating member is connected to each other.

依據此構成,由於能降低加熱部所產生的熱往基台散逸的風險,所以能快速且有效地加熱基板。再者,能降低探針透過基板被加熱的風險。 According to this configuration, since the risk of the heat generated by the heating portion being dissipated to the base can be reduced, the substrate can be heated quickly and efficiently. Furthermore, the risk of the probe being heated through the substrate can be reduced.

本發明之檢查輔助具套組係具備上述檢查輔助具、以及用以檢查前述基板之第二面用檢查輔助具者,前述第二面用檢查輔助具係具備:第二面用探針,用以接觸於前述第二面的檢查點;以及第二面用加熱部,具有用以接觸於前述基板之前述第二面的第二面用接觸面,藉由加熱前述第二面用接觸面而加熱前述基板;前述第二面用接觸面係接觸於前述基板中之在前述第一面設定有前述檢查點之區域的前述第二面,且具有與前述第二面之檢查點分離的形狀。 The inspection aid kit of the present invention includes the inspection aid and the second surface inspection aid for inspecting the substrate, and the second surface inspection aid includes a second surface probe. The second surface heating surface has a second surface contact surface for contacting the second surface of the substrate, and the second surface contact surface is heated by the contact portion contacting the second surface; The second substrate contact surface is in contact with the second surface of the substrate on the first surface where the inspection point is set, and has a shape separated from the inspection point of the second surface.

依據此檢查輔助具套組,能從基板的兩面加熱及檢查基板。 According to this inspection aid set, it is possible to heat and inspect the substrate from both sides of the substrate.

再者,本發明之檢查輔助具套組係用以檢查具有第一面與第二面且於前述第一面設定有檢查對象的檢查點之基板者,該檢查輔助具套組係具備:探針輔助具,具有用以接觸於前述第一面之前述檢查點的探針;以及加熱輔助具,具有用以接觸於前述基板之前述第二面的接觸面,藉由加熱前述接觸面而加熱前述基板。 Furthermore, the inspection aid kit of the present invention is for inspecting a substrate having a first surface and a second surface and having an inspection point on the first surface of the inspection surface, the inspection aid kit having: a needle assisting device having a probe for contacting the aforementioned inspection point of the first surface; and a heating aid having a contact surface for contacting the second surface of the substrate, heated by heating the contact surface The aforementioned substrate.

依據此構成,由於能藉由加熱輔助具加熱接觸於基板的接觸面而藉以加熱基板,並且能藉由探針輔助具來檢查基板,比使用預熱腔來加熱基板的載置空間的 方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。再者,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針被加熱的風險之情況下加熱基板。 According to this configuration, since the substrate can be heated by heating the contact surface of the substrate by the heating aid, and the substrate can be inspected by the probe aid, the pre-heating chamber is used to heat the mounting space of the substrate. By heating the substrate in a manner, it is easier to heat the substrate in a short time. Therefore, it is possible to shorten the inspection time while applying thermal stress to the substrate to be inspected. Further, since the region where the inspection point of the substrate is set can be heated from the back side on the side where the inspection point is set, the substrate can be heated while reducing the risk of the probe for contacting the inspection point being heated.

再者,本發明之基板檢查裝置係具備:上述檢查輔助具;以及檢查處理部,使前述探針接觸於前述檢查點並使前述接觸面接觸於前述基板,且依據自前述探針所獲得的電氣信號而進行前述基板的檢查。 Furthermore, the substrate inspection apparatus according to the present invention includes: the inspection aid; and an inspection processing unit that causes the probe to contact the inspection point and contact the contact surface with the substrate, and is obtained from the probe The inspection of the aforementioned substrate is performed with an electrical signal.

依據此構成,由於能藉由加熱接觸於基板的接觸面來加熱基板之情況下,藉由探針來檢查基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。 According to this configuration, when the substrate can be heated by heating the contact surface contacting the substrate, the substrate is inspected by the probe, and the substrate is heated to heat the substrate by using the preheating chamber to heat the substrate. The substrate is heated in a short time. Therefore, it is possible to shorten the inspection time while applying thermal stress to the substrate to be inspected.

再者,本發明之基板檢查裝置係具備:上述檢查輔助具套組;以及檢查處理部,使前述探針接觸於前述第一面的檢查點,使前述接觸面接觸於前述基板之於前述第二面設定有前述檢查點之區域的前述第一面,並且使前述第二面用探針接觸於前述第二面的檢查點,使前述第二面用接觸面接觸於前述基板中之於前述第一面設定有前述檢查點之區域的前述第二面,且依據自該探針及該第二面用探針所獲得的電氣信號而進行前述基板的檢查。 Further, the substrate inspection apparatus according to the present invention includes: the inspection aid set; and an inspection processing unit that causes the probe to contact the inspection point on the first surface, and the contact surface contacts the substrate The first surface of the region of the inspection point is set on both sides, and the second surface probe is brought into contact with the inspection point of the second surface, and the second surface contact surface is brought into contact with the substrate The second surface of the region of the inspection point is set on the first surface, and the inspection of the substrate is performed based on an electrical signal obtained from the probe and the probe for the second surface.

依據此構成,即使於基板的兩面設定有檢查點時,亦能藉由加熱接觸於基板之兩面的接觸面與第二 面接觸面來加熱基板,並且能使探針及第二面用探針接觸兩面的檢查點來檢查基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。再者,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針及第二面用探針被加熱的風險之情況下加熱基板。 According to this configuration, even when the check points are set on both sides of the substrate, the contact faces on the both sides of the substrate can be heated and contacted by the second The surface contact surface is used to heat the substrate, and the probe and the second surface probe are in contact with the inspection points on both sides to inspect the substrate, and the substrate is heated in a manner that heats the substrate mounting space by using the preheating chamber, which is easier in a short time. The substrate is heated inside. Therefore, it is possible to shorten the inspection time while applying thermal stress to the substrate to be inspected. In addition, since the area where the inspection point of the substrate is set can be heated from the back side where the inspection point is set, the risk of heating the probe for contacting the inspection point and the probe for the second surface can be reduced. The substrate is heated down.

再者,本發明之基板檢查裝置係具備:上述檢查輔助具套組;以及檢查處理部,使前述探針接觸於前述第一面的檢查點並使前述接觸面接觸於前述第二面,且依據自該探針所獲得的電氣信號而進行前述基板的檢查。 Furthermore, the substrate inspection apparatus according to the present invention includes: the inspection aid set; and an inspection processing unit that causes the probe to contact the inspection point on the first surface, and the contact surface contacts the second surface, and The inspection of the substrate is performed based on an electrical signal obtained from the probe.

依據此構成,由於能夠藉由加熱接觸於基板的接觸面來加熱基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。再者,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針被加熱的風險之情況下加熱基板。 According to this configuration, since the substrate can be heated by heating the contact surface contacting the substrate, the substrate can be heated to heat the substrate by using the preheating chamber to heat the substrate, and it is easier to heat the substrate in a short time. Therefore, it is possible to shorten the inspection time while applying thermal stress to the substrate to be inspected. Further, since the region where the inspection point of the substrate is set can be heated from the back side on the side where the inspection point is set, the substrate can be heated while reducing the risk of the probe for contacting the inspection point being heated.

1‧‧‧基板檢查裝置 1‧‧‧Substrate inspection device

2、2’‧‧‧檢查輔助具套組 2, 2'‧‧‧ inspection aid kit

3D‧‧‧檢查輔助具 3D‧‧‧Check aids

3D’‧‧‧加熱輔助具 3D’‧‧‧heating aids

3U‧‧‧檢查輔助具(第二面用檢查輔助具) 3U‧‧‧Inspection aids (second side inspection aids)

3U’‧‧‧探針輔助具 3U’‧‧‧ probe aids

4、4D、4U‧‧‧檢查部 4, 4D, 4U‧‧‧ Inspection Department

6‧‧‧基板固定裝置 6‧‧‧Substrate fixing device

8‧‧‧檢查處理部 8‧‧‧ Inspection and Processing Department

9‧‧‧溫度控制部 9‧‧‧ Temperature Control Department

30D、30U‧‧‧探針塊 30D, 30U‧‧‧ probe block

31D、31U‧‧‧支撐塊 31D, 31U‧‧‧ support blocks

31Da、31Db、31Ua、31Ub‧‧‧支撐板 31Da, 31Db, 31Ua, 31Ub‧‧‧ support plates

34‧‧‧配線 34‧‧‧Wiring

34a‧‧‧電極 34a‧‧‧electrode

35D‧‧‧加熱塊(加熱部) 35D‧‧‧heating block (heating section)

35U‧‧‧加熱塊(第二面用加熱部) 35U‧‧・heating block (heating part for the second side)

36‧‧‧隔熱構件 36‧‧‧Insulation members

37‧‧‧支柱 37‧‧‧ pillar

100‧‧‧基板 100‧‧‧Substrate

101‧‧‧下表面 101‧‧‧ lower surface

102‧‧‧上表面 102‧‧‧ upper surface

321D、321U‧‧‧基台 321D, 321U‧‧‧Abutment

351D、351U‧‧‧金屬構件 351D, 351U‧‧‧Metal components

352‧‧‧加熱器 352‧‧‧heater

353‧‧‧溫度感測器 353‧‧‧temperature sensor

A‧‧‧基板 A‧‧‧Substrate

B1‧‧‧接觸面 B1‧‧‧ contact surface

B2‧‧‧接觸面(第二面用接觸面) B2‧‧‧Contact surface (contact surface for the second side)

C1、C2‧‧‧接觸面 C1, C2‧‧‧ contact surface

H‧‧‧貫穿孔 H‧‧‧through hole

P1、P2、Px、Py‧‧‧檢查點 P1, P2, Px, Py‧‧‧ checkpoints

Pr‧‧‧探針 Pr‧‧‧ probe

X‧‧‧區域 X‧‧‧ area

第1圖係示意地顯示本發明之一實施形態之具有接觸端子及檢查輔助具之基板檢查裝置之構成的示意圖。 Fig. 1 is a schematic view showing the configuration of a substrate inspecting apparatus having a contact terminal and an inspection aid according to an embodiment of the present invention.

第2圖係顯示第1圖所示之基板之一例的平面圖。 Fig. 2 is a plan view showing an example of the substrate shown in Fig. 1.

第3圖係顯示第1圖所示之檢查輔助具之構成之一例的說明圖。 Fig. 3 is an explanatory view showing an example of the configuration of the inspection aid shown in Fig. 1.

第4圖係顯示第1圖所示之檢查輔助具之構成之一例的說明圖。 Fig. 4 is an explanatory view showing an example of the configuration of the inspection aid shown in Fig. 1.

第5圖係從上表面側顯示重疊檢查輔助具之接觸面及探針與基板而顯示為了檢查而使檢查輔助具接觸於基板之下表面的狀態的說明圖。 Fig. 5 is an explanatory view showing a state in which the contact surface of the inspection aid and the probe and the substrate are displayed on the upper surface side, and the inspection aid is brought into contact with the lower surface of the substrate for inspection.

第6圖係從上表面側顯示重疊檢查輔助具之接觸面及探針與基板而顯示為了檢查而使檢查輔助具接觸於基板之上表面的狀態的說明圖。 Fig. 6 is an explanatory view showing a state in which the contact surface of the inspection aid and the probe and the substrate are displayed on the upper surface side, and the inspection aid is brought into contact with the upper surface of the substrate for inspection.

第7圖係顯示第1圖所示之檢查輔助具套組之另一例的說明圖。 Fig. 7 is an explanatory view showing another example of the inspection aid set shown in Fig. 1.

第8圖係用以說明基板檢查方法的說明圖。 Fig. 8 is an explanatory view for explaining a substrate inspection method.

第9圖係用以說明基板檢查方法之一例的流程圖。 Fig. 9 is a flow chart for explaining an example of a substrate inspection method.

第10圖係用以說明基板檢查方法之一例的流程圖。 Fig. 10 is a flow chart for explaining an example of a substrate inspection method.

以下,依據圖式來詳細說明本發明。此外,於各圖中賦予了相同符號的構成係表示相同的構成而省略其說明。 Hereinafter, the present invention will be described in detail based on the drawings. In the drawings, the same reference numerals are given to the same components, and the description thereof is omitted.

第1圖係示意地顯示本發明之一實施形態之具有接觸端子及檢查輔助具之基板檢查裝置1之構成的示意圖。第1圖所示之基板檢查裝置1係用以檢查形成在作為檢查之對象物之基板100之電路圖案的裝置。 Fig. 1 is a schematic view showing the configuration of a substrate inspection apparatus 1 having a contact terminal and an inspection aid according to an embodiment of the present invention. The substrate inspection device 1 shown in Fig. 1 is a device for inspecting a circuit pattern formed on a substrate 100 as an object to be inspected.

基板100可為例如印刷配線基板、可撓性基 板、陶瓷多層配線基板、液晶顯示器、電漿顯示器等用的電極板、半導體基板及半導體封裝用的封裝基板、軟片捲架等各種基板。 The substrate 100 may be, for example, a printed wiring substrate, a flexible base Electrode plates for boards, ceramic multilayer wiring boards, liquid crystal displays, plasma displays, etc., various substrates such as semiconductor substrates, package substrates for semiconductor packages, and film roll holders.

第1圖所示的基板檢查裝置1係具備:檢查部4U、4D、基板固定裝置6、檢查處理部8、以及溫度控制部9。基板固定裝置6係以將檢查對象的基板100固定於預定位置的方式所構成。檢查部4U、4D係具有檢查輔助具3U、3D、以及將檢查輔助具3U、3D所具有的探針Pr與檢查處理部8電性連接的連接電路等。檢查部4U、4D係藉由省略圖示的驅動機構而可將檢查輔助具3U、3D移動於相互正交之X、Y、Z之三軸方向,並且可將檢查輔助具3U、3D以Z軸為中心來轉動。 The substrate inspection apparatus 1 shown in FIG. 1 includes inspection units 4U and 4D, a substrate fixing device 6, an inspection processing unit 8, and a temperature control unit 9. The substrate fixing device 6 is configured to fix the substrate 100 to be inspected at a predetermined position. The inspection units 4U and 4D include inspection aids 3U and 3D, and a connection circuit that electrically connects the probe Pr of the inspection aids 3U and 3D to the inspection processing unit 8. In the inspection units 4U and 4D, the inspection aids 3U and 3D can be moved in the three-axis directions of X, Y, and Z which are orthogonal to each other by a drive mechanism (not shown), and the inspection aids 3U and 3D can be Z. The shaft is centered to rotate.

檢查部4U係位於固定在基板固定裝置6之基板100的上方。檢查部4D係位於固定在基板固定裝置6之基板100的下方。檢查部4U、4D係將用以檢查形成在基板100之電路圖案之檢查輔助具3U、3D可裝卸地構成。以下,將檢查部4U、4D總稱為檢查部4。 The inspection unit 4U is located above the substrate 100 fixed to the substrate fixing device 6. The inspection portion 4D is located below the substrate 100 fixed to the substrate fixing device 6. The inspection units 4U and 4D are configured to detachably inspect the inspection aids 3U and 3D for inspecting the circuit patterns formed on the substrate 100. Hereinafter, the inspection units 4U and 4D are collectively referred to as an inspection unit 4.

檢查輔助具3U、3D係分別具有複數個探針Pr。在第1圖中,省略了檢查輔助具3U、3D的詳細顯示而簡易地記載。檢查輔助具3U、3D係設成可因應檢查對象的基板100而替換。檢查輔助具3U、3D係分別相當於檢查輔助具的一例。並且,具有如下的關係:檢查輔助具3U、3D之中的一方相當於檢查輔助具的一例,而另一方相當於第二面用檢查輔助具之一例。再者,將檢查輔助具3U 與檢查輔助具3D的組合設為檢查輔助具套組2。檢查輔助具3U、3D的詳細內容將於後述。 The inspection aids 3U and 3D have a plurality of probes Pr, respectively. In the first drawing, the detailed display of the inspection aids 3U and 3D is omitted and simply described. The inspection aids 3U and 3D are provided so as to be replaceable in accordance with the substrate 100 to be inspected. The inspection aids 3U and 3D are respectively equivalent to an example of the inspection aid. Further, the relationship between the inspection aids 3U and 3D corresponds to an example of the inspection aid, and the other corresponds to an example of the second surface inspection aid. In addition, the inspection aid will be 3U The combination with the inspection aid 3D is set as the inspection aid set 2. The details of the inspection aids 3U and 3D will be described later.

檢查處理部8係具有例如電源電路、電壓計、電流計、以及微電腦等。檢查處理部8係控制省略圖示的驅動機構而使檢查部4U、4D移動、定位,使各探針Pr的前端接觸於基板100的各檢查點。藉此,各檢查點可與檢查處理部8電性接觸。再者,檢查處理部8係控制溫度控制部9的動作,使基板100加熱。於此狀態下,檢查處理部8係透過檢查輔助具3U、3D之各探針Pr,對基板100之各檢查點供給檢查用的電流或電壓,並依據從各探針Pr所獲得的電壓信號或電流信號,執行例如電路圖案之斷線或短路等的基板100的檢查。或是,檢查處理部8也可對各檢查點供給交流電流或電壓而根據從各探針Pr所獲得的電壓信號或電流信號來測量檢查對象的阻抗。 The inspection processing unit 8 includes, for example, a power supply circuit, a voltmeter, an ammeter, a microcomputer, and the like. The inspection processing unit 8 controls the drive mechanism (not shown) to move and position the inspection units 4U and 4D, and the distal ends of the probes Pr are brought into contact with the respective inspection points of the substrate 100. Thereby, each inspection point can be in electrical contact with the inspection processing unit 8. Further, the inspection processing unit 8 controls the operation of the temperature control unit 9 to heat the substrate 100. In this state, the inspection processing unit 8 transmits the probe currents and voltages to the respective inspection points of the substrate 100 through the probes Pr of the inspection aids 3U and 3D, and based on the voltage signals obtained from the respective probes Pr. Or a current signal, for example, inspection of the substrate 100 such as disconnection or short circuit of the circuit pattern. Alternatively, the inspection processing unit 8 may supply an alternating current or a voltage to each of the inspection points, and measure the impedance of the inspection target based on the voltage signal or the current signal obtained from each probe Pr.

基板100係具有下表面101及上表面102。下表面101相當於第一面的一例,上表面102相當於第二面的一例。此外,第一面與第二面可為基板100之一方的面與另一方的面,其方向不受限定。 The substrate 100 has a lower surface 101 and an upper surface 102. The lower surface 101 corresponds to an example of the first surface, and the upper surface 102 corresponds to an example of the second surface. Further, the first surface and the second surface may be one surface and the other surface of the substrate 100, and the direction thereof is not limited.

第2圖係顯示第1圖所示之基板100之一例的平面圖。第2圖所示之基板100例如為可撓性基板,形成為組合了具有相同的形狀、相同的配線之兩個檢查對象的基板A而成的組基板。兩個基板A係由於為了增加基板材料可取得之基板取得數的觀點而被組合成相互不同的方向。此外,基板100不限於此種配組基板。再者,也可為 此種配組基板進一步組合成複數配組而構成基板100。基板A也可為安裝於例如觸控面板顯示器等電子零件,或被組入觸控面板顯示器來使用的基板。 Fig. 2 is a plan view showing an example of the substrate 100 shown in Fig. 1. The substrate 100 shown in FIG. 2 is, for example, a flexible substrate, and is formed as a group substrate in which two substrates A having the same shape and the same wiring are combined. The two substrates A are combined in mutually different directions from the viewpoint of increasing the number of substrates that can be obtained by increasing the substrate material. Further, the substrate 100 is not limited to such a group substrate. Furthermore, it can also be Such a grouping substrate is further combined into a plurality of groups to constitute the substrate 100. The substrate A may also be a substrate mounted on an electronic component such as a touch panel display or incorporated into a touch panel display.

基板100的下表面101設定有複數個檢查點P1。基板100的上表面102設定有複數個檢查點P2。檢查點P1、P2可為例如用以連接觸控面板顯示器等電子零件的電極,也可為用以安裝電子零件的焊墊、也可為配線圖案,也可為連接器端子。第2圖所示的例子中,例如檢查點P1係假設為供觸控面板顯示器等電子零件與外部連接之稱為焊片端子之連接器端子,例如檢查點P2係假設為用以連接電子零件之電極、用以安裝電子零件的焊墊、或配線圖案。 A plurality of check points P1 are set on the lower surface 101 of the substrate 100. The upper surface 102 of the substrate 100 is provided with a plurality of check points P2. The inspection points P1 and P2 may be, for example, electrodes for connecting electronic components such as a touch panel display, or may be solder pads for mounting electronic components, wiring patterns, or connector terminals. In the example shown in Fig. 2, for example, the checkpoint P1 is assumed to be a connector terminal called a solder tab terminal for connecting an electronic component such as a touch panel display to the outside. For example, the checkpoint P2 is assumed to be used for connecting electronic components. The electrode, the pad used to mount the electronic component, or the wiring pattern.

第3圖係顯示第1圖所示之檢查輔助具3D之構成之一例的說明圖。第3圖(a)係顯示第1圖所示之檢查輔助具3D的上表面,亦即,檢查輔助具3D之與基板100相對向之對向面之一例的平面圖。第3圖(b)係第3圖(a)所示之檢查輔助具3D的b-b線剖面圖。 Fig. 3 is an explanatory view showing an example of the configuration of the inspection aid 3D shown in Fig. 1. Fig. 3(a) is a plan view showing an example of an upper surface of the inspection aid 3D shown in Fig. 1, that is, an inspection surface of the inspection aid 3D facing the substrate 100. Fig. 3(b) is a cross-sectional view taken along line b-b of the inspection aid 3D shown in Fig. 3(a).

第3圖所示之檢查輔助具3D係具備探針塊30D、加熱塊35D(加熱部)、以及基台321D。基台321D係例如具有略呈板狀的形狀,於基台321D之一方的表面上安裝有探針塊30D及加熱塊35D。如此一來,基台321D係建構成將探針塊30D及加熱塊35D保持成一體。 The inspection aid 3D shown in Fig. 3 includes a probe block 30D, a heating block 35D (heating portion), and a base 321D. The base 321D has, for example, a substantially plate shape, and the probe block 30D and the heating block 35D are attached to one surface of the base 321D. In this way, the base 321D is constructed to maintain the probe block 30D and the heating block 35D integrally.

加熱塊35D係例如具備:大致長方體形狀的金屬構件351D,具有用以與基板100之下表面101接觸的接觸面B1,且於與接觸面B1正交的方向具有厚度、複 數個加熱器352,以與接觸面B1大致平行地延伸的方式,埋設於金屬構件351D的厚度內、以及埋設於金屬構件351D之厚度內的溫度感測器353。溫度感測器353係檢測金屬構件351D的溫度。例如可使用熱電偶作為溫度感測器353。 The heating block 35D includes, for example, a substantially rectangular parallelepiped metal member 351D having a contact surface B1 for contacting the lower surface 101 of the substrate 100, and having a thickness in a direction orthogonal to the contact surface B1. The plurality of heaters 352 are embedded in the thickness of the metal member 351D and the temperature sensor 353 embedded in the thickness of the metal member 351D so as to extend substantially parallel to the contact surface B1. The temperature sensor 353 detects the temperature of the metal member 351D. For example, a thermocouple can be used as the temperature sensor 353.

金屬構件351D係由導熱性高的金屬材料所構成。例如可適宜地使用鋁作為金屬構件351D。接觸面B1係接觸於基板100之於上表面102設定有檢查點P2之區域的下表面101,且具有與下表面101的檢查點P1分離的形狀。 The metal member 351D is made of a metal material having high thermal conductivity. For example, aluminum can be suitably used as the metal member 351D. The contact surface B1 is in contact with the lower surface 101 of the substrate 100 on the upper surface 102 where the inspection point P2 is set, and has a shape separated from the inspection point P1 of the lower surface 101.

於金屬構件351D的厚度內,沿著金屬構件351D之長度方向形成複數個與接觸面B1大致平行地延伸的孔,於該孔插入有例如圓柱形狀的加熱器352。可使用例如於陶瓷芯捲繞鎳鉻合金線並封入於不銹鋼護套而形成的所謂匣式加熱器來作為加熱器352。 Within the thickness of the metal member 351D, a plurality of holes extending substantially in parallel with the contact surface B1 are formed along the longitudinal direction of the metal member 351D, and a heater 352 having a cylindrical shape, for example, is inserted into the hole. As the heater 352, a so-called helium heater formed by winding a nichrome wire with a ceramic core and sealing it in a stainless steel sheath can be used.

加熱器352及溫度感測器353係與溫度控制部9連接。溫度控制部9係可使用所謂的溫度調節器。溫度控制部9係例如依據來自檢查處理部8的控制信號而開始金屬構件351D、351U的加熱。溫度控制部9係例如依據溫度感測器353檢測出的金屬構件351D、351U的溫度而反饋控制加熱器352的加熱,藉此使金屬構件351D、351U加熱至預先設定的設定溫度Tta。例如可適宜地使用60℃至130℃範圍的溫度作為設定溫度Tta。藉由將已接觸於基板100的金屬構件351D、351U加熱至設定溫度Tta而將基 板100加熱至設定溫度Tta。此外,為了快速且確實地將基板100加熱至設定溫度Tta,也可建構成溫度控制部9將金屬構件351D、351U加熱至比設定溫度Tta還高的溫度。 The heater 352 and the temperature sensor 353 are connected to the temperature control unit 9. The temperature control unit 9 can use a so-called temperature regulator. The temperature control unit 9 starts heating of the metal members 351D and 351U in accordance with, for example, a control signal from the inspection processing unit 8. The temperature control unit 9 feedback-controls the heating of the heater 352 based on the temperature of the metal members 351D and 351U detected by the temperature sensor 353, thereby heating the metal members 351D and 351U to a predetermined set temperature Tta. For example, a temperature in the range of 60 ° C to 130 ° C can be suitably used as the set temperature Tta. By heating the metal members 351D, 351U that have been in contact with the substrate 100 to the set temperature Tta The plate 100 is heated to a set temperature Tta. Further, in order to quickly and surely heat the substrate 100 to the set temperature Tta, the temperature control unit 9 may be configured to heat the metal members 351D and 351U to a temperature higher than the set temperature Tta.

金屬構件351D係例如藉由複數根支柱37與基台321D連結。金屬構件351D與複數根支柱37之間係例如中隔設置有片狀的隔熱構件36。亦即,加熱塊35D與基台321D係透過隔熱構件36而連結。 The metal member 351D is coupled to the base 321D by, for example, a plurality of pillars 37. A sheet-shaped heat insulating member 36 is interposed between the metal member 351D and the plurality of pillars 37, for example. That is, the heating block 35D and the base 321D are connected to each other through the heat insulating member 36.

隔熱構件36係可適宜地使用例如熱傳導率0.1W/(m.K)以下之具有隔熱性的構件。如此一來,由於可抑制加熱器352所產生的熱傳導至基台321D及探針塊30D,所以可降低因熱膨脹而產生基台321D及探針塊30D的位置偏移等、以及探針Pr的溫度上升而使探針Pr的電阻值增大等之疑慮。 For the heat insulating member 36, for example, a member having heat conductivity of 0.1 W/(m.K) or less of thermal conductivity can be suitably used. In this manner, since the heat generated by the heater 352 can be suppressed from being transmitted to the base 321D and the probe block 30D, the positional deviation of the base 321D and the probe block 30D due to thermal expansion, and the probe Pr can be reduced. The temperature rises and the resistance value of the probe Pr increases.

再者,由於藉由加熱器352所加熱之金屬構件351D的熱因熱傳導而散逸的情形可藉由隔熱構件36而被抑制,所以容易藉由加熱器352而使金屬構件351D的溫度快速地上升,而且,也容易將金屬構件351D的溫度維持在固定的設定溫度Tta。 Further, since the heat of the metal member 351D heated by the heater 352 is dissipated by heat conduction by the heat insulating member 36, the temperature of the metal member 351D can be easily made by the heater 352. It is also easy to raise the temperature of the metal member 351D at a fixed set temperature Tta.

探針塊30D係例如以包圍加熱塊35D的周圍的方式設置。探針塊30D係具備複數個探針Pr、以及將複數個探針Pr的前端保持成朝向基板100的支撐塊31D。 The probe block 30D is provided, for example, in such a manner as to surround the periphery of the heating block 35D. The probe block 30D includes a plurality of probes Pr and a support block 31D that holds the tips of the plurality of probes Pr toward the substrate 100.

探針Pr係具有棒狀或針狀的形狀。探針Pr係以高導電性的材料構成,例如可使用鎳、鎳合金、鈀合金等各種材料。 The probe Pr has a rod shape or a needle shape. The probe Pr is made of a material having high conductivity, and for example, various materials such as nickel, a nickel alloy, and a palladium alloy can be used.

支撐塊31D中形成有支撐探針Pr之複數個貫穿孔H。各貫穿孔H係以與成為檢查對象之基板100之下表面101的檢查點P1的位置對應的方式配置。藉以使探針Pr的前端部接觸檢查點P1。基台321D中設置有與各探針Pr之後端接觸而導通的電極34a。檢查部4D係具備省略圖示的連接電路,該連接電路係透過基台321D之各電極,將各探針Pr的後端進行與檢查處理部8電性接觸、切換其連接等的動作。 A plurality of through holes H supporting the probe Pr are formed in the support block 31D. Each of the through holes H is disposed so as to correspond to the position of the inspection point P1 of the lower surface 101 of the substrate 100 to be inspected. Thereby, the front end portion of the probe Pr is brought into contact with the inspection point P1. The base 321D is provided with an electrode 34a that is in contact with the rear end of each probe Pr to be electrically connected. The inspection unit 4D includes a connection circuit (not shown) that transmits the respective ends of the probes Pr to the inspection processing unit 8 and switches the connection thereof, etc., through the respective electrodes of the base 321D.

支撐塊31D係例如由板狀的支撐板31Da、31Db藉由省略圖示的支柱以分離而相對向配置的方式連結支撐所構成。支撐板31Db係設為支撐塊31D之前端側,即與基板100相對向的一側,支撐板31Da係設為支撐塊31D之後端側、即安裝於基台321D的一側。支撐板31Db的上表面設為用以與基板100接觸的接觸面C1。接觸面C1與接觸面B1為同一面,且與接觸面B1之間設有空間。並且,以貫穿支撐板31Da、31Db的方式,形成有複數個貫穿孔H。 The support block 31D is configured by, for example, a plate-shaped support plates 31Da and 31Db that are connected to each other so as to be separated from each other by a column (not shown). The support plate 31Db is a front end side of the support block 31D, that is, a side facing the substrate 100, and the support plate 31Da is a rear side of the support block 31D, that is, a side attached to the base 321D. The upper surface of the support plate 31Db is provided as a contact surface C1 for contacting the substrate 100. The contact surface C1 and the contact surface B1 are flush with each other, and a space is provided between the contact surface B1 and the contact surface B1. Further, a plurality of through holes H are formed to penetrate the support plates 31Da and 31Db.

支撐板31Da的後端側係安裝有例如由絕緣性的樹脂材料所構成的基台321D。藉由基台321D來閉塞貫穿孔H之後端側開口。在基台321D之與各後端側開口相對向之處,以貫穿基台321D的方式,設置有配線34。基台321D之面對支撐板31Da之側的表面與露出該面之配線34的端面係成為同一面。該配線34的端面係設為電極34a。各貫穿孔H中插入有探針Pr。配線34係與檢查處理 部8連接。如此一來,檢查處理部8係透過配線34及電極34a而與探針Pr連接。 A base 321D made of, for example, an insulating resin material is attached to the rear end side of the support plate 31Da. The end opening is closed after the through hole H is closed by the base 321D. Where the base 321D faces each of the rear end side openings, the wiring 34 is provided so as to penetrate the base 321D. The surface of the base 321D facing the side of the support plate 31Da is flush with the end surface of the wiring 34 exposing the surface. The end face of the wiring 34 is referred to as an electrode 34a. A probe Pr is inserted into each of the through holes H. Wiring 34 series and inspection processing Part 8 is connected. In this manner, the inspection processing unit 8 is connected to the probe Pr through the wiring 34 and the electrode 34a.

第4圖係顯示第1圖所示之檢查輔助具3U之構成之一例的說明圖。第4圖(a)係顯示第1圖所示之檢查輔助具3U的下表面、即檢查輔助具3U之與基板100相對向之對向面之一例的平面圖。第4圖(b)係第4圖(a)所示之檢查輔助具3U之b-b線剖面圖。檢查輔助具3U係相當於第二面用檢查輔助具的一例。 Fig. 4 is an explanatory view showing an example of the configuration of the inspection aid 3U shown in Fig. 1. Fig. 4(a) is a plan view showing an example of the lower surface of the inspection aid 3U shown in Fig. 1, that is, the opposing surface of the inspection aid 3U facing the substrate 100. Fig. 4(b) is a cross-sectional view taken along line b-b of the inspection aid 3U shown in Fig. 4(a). The inspection aid 3U is an example of an inspection aid for the second surface.

第4圖所示之檢查輔助具3U係具備探針塊30U、兩個加熱塊35U(第二面用加熱部)、以及基台321U。基台321U係例如具有略呈板狀的形狀,於基台321U之一方的表面上安裝有探針塊30U及加熱塊35U。藉此,基台321U係將探針塊30U及加熱塊35U保持成一體。藉由探針塊30U所支撐的探針Pr係相當於第二面用探針的一例。 The inspection aid 3U shown in Fig. 4 includes a probe block 30U, two heating blocks 35U (a heating unit for the second surface), and a base 321U. The base 321U has, for example, a substantially plate shape, and the probe block 30U and the heating block 35U are attached to one surface of the base 321U. Thereby, the base 321U holds the probe block 30U and the heating block 35U integrally. The probe Pr supported by the probe block 30U corresponds to an example of the probe for the second surface.

加熱塊35U係例如具備:“L”字形的二個金屬構件351U,各具有用以與基板100之上表面102接觸的接觸面B2(第二面用接觸面),且於與接觸面B2正交的方向具有厚度、加熱器352,以與接觸面B2大致平行地延伸的方式,埋設於各金屬構件351U的厚度內、以及安裝於各金屬構件351U之側面的溫度感測器353。各溫度感測器353係檢測各金屬構件351U的溫度。 The heating block 35U includes, for example, two metal members 351U having an "L" shape, each having a contact surface B2 (contact surface for the second surface) for contacting the upper surface 102 of the substrate 100, and being positive with the contact surface B2. The heater 352 has a thickness and a heater 352, and is embedded in the thickness of each metal member 351U and a temperature sensor 353 attached to the side surface of each metal member 351U so as to extend substantially parallel to the contact surface B2. Each temperature sensor 353 detects the temperature of each metal member 351U.

金屬構件351U係以與金屬構件351D相同的材料構成。接觸面B2係接觸於基板100之於下表面101設定有檢查點P1之區域的上表面102,且具有與上表面102 的檢查點P2分離的形狀。 The metal member 351U is made of the same material as the metal member 351D. The contact surface B2 is in contact with the upper surface 102 of the substrate 100 on the lower surface 101 where the inspection point P1 is set, and has an upper surface 102 The checkpoint P2 separates the shape.

於金屬構件351U的厚度內,沿著金屬構件351U的長度方向形成與接觸面B2大致平行地延伸的孔,於該孔插入有加熱器352。溫度控制部9係例如依據溫度感測器353所檢測出之金屬構件351U的溫度而反饋控制加熱器352的發熱,藉此使金屬構件351U加熱至設定溫度Tta。 A hole extending substantially in parallel with the contact surface B2 is formed along the longitudinal direction of the metal member 351U in the thickness of the metal member 351U, and the heater 352 is inserted into the hole. The temperature control unit 9 feedback-controls the heat generation of the heater 352 based on the temperature of the metal member 351U detected by the temperature sensor 353, thereby heating the metal member 351U to the set temperature Tta.

加熱器352係具有朝一方向長條地延伸的形狀,例如棒狀的形狀。加熱塊35D、35U係於具有厚度之塊狀的金屬構件351D、351U埋設有加熱器352,且加熱器352係沿著金屬構件351D、351U的長度方向與接觸面B1、B2大致平行地延設。結果,能使加熱器352所產生的熱效率良好地傳導至金屬構件351D、351U,且能以均勻度良好地傳導熱的方式加熱接觸面B1、B2。 The heater 352 has a shape that extends in a strip shape in one direction, such as a rod shape. The heating blocks 35D and 35U are embedded in the metal members 351D and 351U having a thickness of a block, and the heater 352 is embedded in the longitudinal direction of the metal members 351D and 351U substantially in parallel with the contact faces B1 and B2. . As a result, the heat generated by the heater 352 can be efficiently conducted to the metal members 351D and 351U, and the contact faces B1 and B2 can be heated to conduct heat with uniformity.

此外,加熱塊35D、35U只要是使接觸面B1、B2接觸於基板100進行加熱即可,可不必為於金屬構件埋設加熱器的構成,也可不是加熱器與接觸面B1、B2平行地延設的構成。 Further, the heating blocks 35D and 35U may be configured such that the contact faces B1 and B2 are in contact with the substrate 100 and heated, and it is not necessary to embed the heater in the metal member, or the heater may be extended in parallel with the contact faces B1 and B2. The composition of the setting.

金屬構件351U係例如藉由複數根支柱37與基台321U連結。金屬構件351U與複數根支柱37之間係例如中隔設置有片狀的隔熱構件36。亦即,加熱塊35U與基台321U係透過隔熱構件36而連結。藉此,由於可抑制加熱器352所產生的熱傳導至基台321U及探針塊30U,所以可降低因熱膨脹而產生基台321U及探針塊30U的位 置偏移等、以及探針Pr的溫度上升而使探針Pr的電阻值增大等之疑慮。 The metal member 351U is coupled to the base 321U by, for example, a plurality of pillars 37. A sheet-shaped heat insulating member 36 is interposed between the metal member 351U and the plurality of pillars 37, for example. That is, the heating block 35U and the base 321U are connected to each other through the heat insulating member 36. Thereby, since the heat generated by the heater 352 can be suppressed from being transmitted to the base 321U and the probe block 30U, the position of the base 321U and the probe block 30U due to thermal expansion can be reduced. There is a concern that the temperature of the probe Pr rises and the resistance value of the probe Pr increases, such as an offset.

再者,由於藉由加熱器352所加熱之金屬構件351U的熱因熱傳導而散逸的情形可藉由隔熱構件36而被抑制,所以容易藉由加熱器352而使金屬構件351U的溫度快速地上升,而且,也容易將金屬構件351U的溫度維持在固定的設定溫度Tta。 Further, since the heat of the metal member 351U heated by the heater 352 is dissipated by heat conduction by the heat insulating member 36, the temperature of the metal member 351U can be easily made by the heater 352. It is also easy to raise the temperature of the metal member 351U at a fixed set temperature Tta.

此外,隔熱構件36亦可不為片狀。例如也能夠以具有隔熱性的材料構成支柱37,以支柱37發揮隔熱構件之功能的構成,來取代具備片狀的隔熱構件36。或是,檢查輔助具3U、3D也可為不具有隔熱構件的構成。 Further, the heat insulating member 36 may not be in the form of a sheet. For example, the pillar 37 may be formed of a material having a heat insulating property, and the pillar 37 may be configured to function as a heat insulating member instead of the sheet-shaped heat insulating member 36. Alternatively, the inspection aids 3U and 3D may have a configuration without a heat insulating member.

各探針塊30U之一方係例如空出一部分而與加熱塊35U之連續的兩側面對向配置,另一方係空出一部分而與加熱塊35U之另外的兩側面對向配置。探針塊30U係具備複數個探針Pr、以及將複數個探針Pr的前端保持成朝向基板100的支撐塊31U。 One of the probe blocks 30U is disposed, for example, with a portion vacating and facing the continuous sides of the heating block 35U, and the other portion is vacant and disposed facing the other two sides of the heating block 35U. The probe block 30U includes a plurality of probes Pr and a support block 31U that holds the tips of the plurality of probes Pr toward the substrate 100.

支撐塊31U中形成有支撐探針Pr之複數個貫穿孔H。各貫穿孔H係以與成為檢查對象之基板100之上表面102的檢查點P2的位置對應的方式配置。藉以使探針Pr的前端部接觸檢查點P2。基台321U中設置有與各探針Pr之後端接觸而導通的電極34a。檢查部4U係具備省略圖示的連接電路,該連接電路係透過基台321U之各電極,將各探針Pr的後端進行與檢查處理部8電性接觸、切換其連接等的動作。 A plurality of through holes H supporting the probe Pr are formed in the support block 31U. Each of the through holes H is disposed so as to correspond to the position of the inspection point P2 of the upper surface 102 of the substrate 100 to be inspected. Thereby, the front end portion of the probe Pr is brought into contact with the inspection point P2. The base 321U is provided with an electrode 34a that is in contact with the rear end of each probe Pr to be electrically connected. The inspection unit 4U includes a connection circuit (not shown) that transmits the electrodes at the rear end of each probe Pr to the inspection processing unit 8 and switches the connection thereof, etc., through the respective electrodes of the base 321U.

支撐塊31U係例如由板狀的支撐板31Ua、31Ub藉由省略圖示的支柱以分離而相對向配置的方式連結支撐所構成。支撐板31Ub係設為支撐塊31U之前端側,即與基板100相對向的一側,支撐板31Da係設為支撐塊31U之後端側、即安裝於基台321U的一側。支撐板31Ub的下表面(第4圖(b)中為上表面)設為用以與基板100接觸的接觸面C2。接觸面C2與接觸面B2為同一面,且與接觸面B2之間設有空間。並且,以貫穿支撐板31Ua、31Ub的方式,形成有複數個貫穿孔H。 The support block 31U is configured by, for example, a plate-shaped support plates 31Ua and 31Ub that are connected to each other so as to be separated from each other by a column (not shown). The support plate 31Ub is a front end side of the support block 31U, that is, a side facing the substrate 100, and the support plate 31Da is a rear side of the support block 31U, that is, a side attached to the base 321U. The lower surface (the upper surface in FIG. 4(b)) of the support plate 31Ub is set as the contact surface C2 for contacting the substrate 100. The contact surface C2 and the contact surface B2 are flush with each other, and a space is provided between the contact surface B2 and the contact surface B2. Further, a plurality of through holes H are formed to penetrate the support plates 31Ua and 31Ub.

支撐板31Ua的後端側係安裝有基台321U。藉由基台321U來閉塞貫穿孔H之後端側開口。在基台321U之與各後端側開口相對向之處,以貫穿基台321U的方式,設置有配線34。基台321U之面對支撐板31Ua之側的表面與露出該面之配線34的端面係成為同一面。該配線34的端面係設為電極34a。各貫穿孔H中插入有探針Pr。配線34係與檢查處理部8連接。如此一來,檢查處理部8係透過配線34及電極34a而與檢查輔助具3U的探針Pr連接。 A base 321U is attached to the rear end side of the support plate 31Ua. The end opening is closed after the through hole H is closed by the base 321U. Where the base 321U faces each of the rear end side openings, the wiring 34 is provided so as to penetrate the base 321U. The surface of the base 321U facing the side of the support plate 31Ua is flush with the end surface of the wiring 34 exposing the surface. The end face of the wiring 34 is referred to as an electrode 34a. A probe Pr is inserted into each of the through holes H. The wiring 34 is connected to the inspection processing unit 8. In this manner, the inspection processing unit 8 is connected to the probe Pr of the inspection aid 3U through the wiring 34 and the electrode 34a.

第5圖係從上表面102側顯示重疊檢查輔助具3D之接觸面及探針Pr與基板100而顯示為了檢查而使檢查輔助具3D接觸於基板100之下表面101的狀態的說明圖。第6圖係從上表面102側顯示重疊檢查輔助具3U之接觸面及探針Pr與基板100而顯示為了檢查而使檢查輔助具3U接觸於基板100之上表面102的狀態的說明圖。 5 is an explanatory view showing a state in which the contact surface of the inspection aid 3D and the probe Pr and the substrate 100 are displayed on the upper surface 102 side, and the inspection aid 3D is brought into contact with the lower surface 101 of the substrate 100 for inspection. Fig. 6 is an explanatory view showing a state in which the contact surface of the inspection aid 3U and the probe Pr and the substrate 100 are displayed on the upper surface 102 side, and the inspection aid 3U is brought into contact with the upper surface 102 of the substrate 100 for inspection.

如第5圖所示,使檢查輔助具3D接觸到基 板100的下表面101時,接觸面B1就接觸於基板100之於上表面102設定有檢查點P2之區域的下表面101,且與基板100的下表面101的檢查點P1分離。相對於此,如第6圖所示,使檢查輔助具3U接觸到基板100的上表面102時,接觸面B2就會接觸於基板100之於下表面101設定有檢查點P1之區域的上表面102,且與上表面102的檢查點P2分離。 As shown in Fig. 5, the inspection aid 3D is brought into contact with the base At the lower surface 101 of the board 100, the contact surface B1 is in contact with the lower surface 101 of the substrate 100 on the upper surface 102 where the inspection point P2 is set, and is separated from the inspection point P1 of the lower surface 101 of the substrate 100. On the other hand, as shown in FIG. 6, when the inspection aid 3U is brought into contact with the upper surface 102 of the substrate 100, the contact surface B2 contacts the upper surface of the substrate 100 on the lower surface 101 where the inspection point P1 is set. 102 and separated from the inspection point P2 of the upper surface 102.

依據檢查輔助具3D、3U,不加熱探針Pr,即能一邊從檢查點P1、P2的背側加熱包含檢查點P1、P2之基板的區域,一邊使探針Pr接觸檢查點P1、P2,因此,能降低探針被加熱所造成之檢查的影響,且能在加熱基板100而施加熱應力之同時進行基板100的檢查。如此一來,就能檢測出在常溫下的檢查中不易顯現的基板不良。再者,由於能使接觸面B1、B2直接接觸於基板100來加熱基板100,與先前技術般地使用預熱腔來加熱基板的情形相比較,能快速地加熱基板100,且提升將基板100加熱至設定溫度Tta的確實性。如此一來,能夠對檢查對象之基板施加熱應力之同時縮短檢查時間,且提升對基板施加熱應力的確實性。 According to the inspection aids 3D and 3U, the probe Pr can be brought into contact with the inspection points P1 and P2 while heating the probe including the inspection points P1 and P2 from the back side of the inspection points P1 and P2 without heating the probe Pr. Therefore, the influence of the inspection by the heating of the probe can be reduced, and the inspection of the substrate 100 can be performed while heating the substrate 100 to apply thermal stress. In this way, it is possible to detect a substrate defect that is hard to appear in the inspection at normal temperature. Furthermore, since the substrate 100 can be heated by directly contacting the contact faces B1, B2 with the substrate 100, the substrate 100 can be quickly heated and the substrate 100 can be lifted as compared with the case where the preheating cavity is used to heat the substrate in the prior art. Heating to the certainty of the set temperature Tta. As a result, it is possible to reduce the inspection time while applying thermal stress to the substrate to be inspected, and to improve the reliability of applying thermal stress to the substrate.

再者,第5圖所示之接觸面B1係以接觸於未設有任何檢查點P1、P2之區域X的方式而設定其形狀。藉此,能將形成在基板1001之區域X的配線圖案等予以加熱,因此提升在區域X產生之不良的檢查精度。 Further, the contact surface B1 shown in Fig. 5 is set in such a manner as to be in contact with the region X where no inspection points P1 and P2 are provided. Thereby, the wiring pattern or the like formed in the region X of the substrate 1001 can be heated, so that the inspection accuracy of the defect occurring in the region X is improved.

第7圖係顯示第1圖所示之檢查輔助具套組 2之另一例的說明圖。第7圖所示之檢查輔助具套組2’係組合加熱輔助具3D’及探針輔助具3U’所構成。加熱輔助具3D’係由加熱塊35D所構成。探針輔助具3U’係由探針塊30U所構成。探針輔助具3U’的探針Pr係例如藉由與基板321U同樣的電極34a及配線34而與檢查處理部8連接。如此構成的檢查輔助具套組2’可適宜地使用於檢查點僅設於一方之面側之基板的檢查。 Figure 7 shows the inspection aid set shown in Figure 1. An illustration of another example of 2. The inspection aid set 2' shown in Fig. 7 is composed of a combination heating aid 3D' and a probe assisting device 3U'. The heating aid 3D' is composed of a heating block 35D. The probe aid 3U' is composed of a probe block 30U. The probe Pr of the probe assistant 3U' is connected to the inspection processing unit 8 by, for example, the electrode 34a and the wiring 34 similar to the substrate 321U. The inspection aid set 2' thus configured can be suitably used for inspection of a substrate on which the inspection point is provided only on one side.

此外,基板檢查裝置1也可為僅具有檢查部4U、4D中任一方的構成。即使僅有檢查部4U、4D中任一方,也能藉由檢查輔助具3U、3D中任一方來進行基板的檢查及加熱,所以能夠對檢查對象之基板施加熱應力之同時能縮短檢查時間。 Further, the substrate inspection apparatus 1 may have only one of the inspection units 4U and 4D. Even if only one of the inspection units 4U and 4D is provided, the inspection and heating of the substrate can be performed by any one of the inspection aids 3U and 3D. Therefore, it is possible to reduce the inspection time while applying thermal stress to the substrate to be inspected.

再者,雖然顯示了用以加熱基板100之接觸面B1與用以支撐探針Pr之支撐塊31D的接觸面C1為分離的構成,然而,也可為例如藉由加熱接觸面C1而將探針塊30D兼用為加熱部的構成。即使是如此的構成,也能夠進行基板的檢查與加熱,因此能夠對檢查對象之基板施加熱應力之同時能縮短檢查時間。 Furthermore, although the configuration in which the contact surface B1 for heating the substrate 100 and the contact surface C1 of the support block 31D for supporting the probe Pr are separated is shown, it may be, for example, by heating the contact surface C1. The needle block 30D also serves as a configuration of the heating portion. Even in such a configuration, since inspection and heating of the substrate can be performed, it is possible to reduce the inspection time while applying thermal stress to the substrate to be inspected.

接著,說明由檢查處理部8執行的基板檢查方法的一例。如以上所述,藉由溫度控制部9進行溫度控制,將接觸於基板100的金屬構件351D、351U加熱,以使基板100的溫度達到設定溫度Tta。但是,由於金屬構件351D、351U為金屬塊,所以熱容量較大。因此,要將加熱前的常溫(環境溫度)的金屬構件351D、351U加熱至設定溫 度Tta或其以上的溫度乃須要耗費時間。 Next, an example of the substrate inspection method executed by the inspection processing unit 8 will be described. As described above, the temperature control unit 9 performs temperature control to heat the metal members 351D and 351U that are in contact with the substrate 100 so that the temperature of the substrate 100 reaches the set temperature Tta. However, since the metal members 351D and 351U are metal blocks, the heat capacity is large. Therefore, it is necessary to heat the metal members 351D and 351U at normal temperature (ambient temperature) before heating to the set temperature. Temperatures of Tta or above are time consuming.

再者,基板100也具有熱容量,且構成基板100的材料(例如環氧樹脂等)的熱傳導率比金屬構件351D、351U低。因此,從金屬構件351D、351U的溫度達到設定溫度Tta或其以上的溫度起,至基板100達到設定溫度Tta或其以上的溫度為止,乃會產生時間差。所以,為了於基板100達到設定溫度Tta之後進行檢查,一般地,在加熱器352進行之加熱開始之後,要等待基板100達到設定溫度Tta所需的充分長的時間,再執行檢查。但是,若等待如此長時間經過再開始檢查,則進行檢查就需要花費長時間。 Further, the substrate 100 also has a heat capacity, and the material constituting the substrate 100 (for example, an epoxy resin or the like) has a lower thermal conductivity than the metal members 351D and 351U. Therefore, when the temperature of the metal members 351D and 351U reaches the set temperature Tta or higher, the time difference is generated until the substrate 100 reaches the set temperature Tta or higher. Therefore, in order to perform inspection after the substrate 100 reaches the set temperature Tta, generally, after the heating by the heater 352 is started, it is necessary to wait for the substrate 100 to reach the set temperature Tta for a sufficiently long time before performing the inspection. However, if you wait for such a long time to start checking again, it takes a long time to perform the inspection.

對此,檢查處理部8係利用形成在基板100之配線圖案的電阻值R隨著溫度而改變的特性,於電阻值R達到與設定溫度Tta對應的目標電阻值Tra時開始檢查。藉此,能夠於基板100其本身溫度實際達到設定溫度Tta時快速進行檢查,與等待非常長的時間之後才開始檢查的情形相比較,能夠縮短檢查時間。再者,由於是在確認基板100其本身溫度實際達到設定溫度Tta之後進行檢查,所以會提升檢查時施加於基板100之熱應力的精度。 On the other hand, the inspection processing unit 8 starts the inspection when the resistance value R reaches the target resistance value Tra corresponding to the set temperature Tta by the characteristic that the resistance value R of the wiring pattern formed on the substrate 100 changes with temperature. Thereby, it is possible to quickly perform inspection when the temperature of the substrate 100 itself actually reaches the set temperature Tta, and it is possible to shorten the inspection time as compared with the case where the inspection is started after waiting for a very long time. In addition, since it is confirmed after the substrate 100 itself has actually reached the set temperature Tta, the accuracy of the thermal stress applied to the substrate 100 at the time of inspection is improved.

此外,也可使用預測的基板100,預先實驗測量加熱器352的加熱開始起至電阻值R達到目標電阻值Tra為止的時間,設為等待時間,並將該等待時間預先記憶在記憶裝置,在實際的基板100的檢查中,在加熱器352的加熱開始起經過預先測量的等待時間之後,依據從接觸 各檢查點之各探針所獲得之電氣信號來執行檢查。 Further, the predicted substrate 100 may be used to measure the time from the start of heating of the heater 352 until the resistance value R reaches the target resistance value Tra, and set the waiting time, and the waiting time is previously stored in the memory device. In the inspection of the actual substrate 100, after the waiting time of the pre-measurement from the start of the heating of the heater 352, the contact is based on The electrical signals obtained by the probes of each checkpoint are used to perform the inspection.

再者,連續檢查複數個基板100時,例如檢查連結有複數個基板100而成的配組基板時,在第二個以後的檢查中,由於檢查輔助具3U、3D已經被加熱,所以從開始加熱起(使檢查輔助具3U、3D接觸於基板100起)至基板100的溫度達到設定溫度Tta的時間變短。如此一來,也可預先實驗測量第二個以後的檢查之際的等待時間,與上述同樣地分別設為等待時間,而因應該各等待時間,使第二個以後的檢查的等待時間改變。 Further, when a plurality of substrates 100 are continuously inspected, for example, when a plurality of substrates 100 are connected to each other, the inspection aids 3U and 3D are heated in the second and subsequent inspections, so that the inspection is started. The time from the heating (the inspection aids 3U, 3D are brought into contact with the substrate 100) until the temperature of the substrate 100 reaches the set temperature Tta becomes shorter. In this way, the waiting time at the time of the second and subsequent inspections can be experimentally measured in advance, and the waiting time is set in the same manner as described above, and the waiting time of the second and subsequent inspections is changed in response to each waiting time.

具體地,檢查處理部8係以如下的方式執行基板100的檢查。第8圖係用以說明基板檢查方法的說明圖。首先,預先從設定於基板100之複數個檢查點P1或P2之中選擇在配線圖案相互電性連接之一對的特定檢查點Px、Py,而預先設定特定檢查點Px、Py。 Specifically, the inspection processing unit 8 performs inspection of the substrate 100 in the following manner. Fig. 8 is an explanatory view for explaining a substrate inspection method. First, the specific inspection points Px and Py in which one pair of wiring patterns are electrically connected to each other are selected from a plurality of inspection points P1 or P2 set on the substrate 100 in advance, and the specific inspection points Px and Py are set in advance.

第9、10圖係用以說明基板檢查方法之一例的流程圖。檢查處理部8係使檢查輔助具3U、3D的接觸面B1、B2、C1、C2接觸於基板100,並使各探針Pr接觸於各檢查點P1、P2(步驟S1)。 Figs. 9 and 10 are flowcharts for explaining an example of the substrate inspection method. The inspection processing unit 8 brings the contact faces B1, B2, C1, and C2 of the inspection aids 3U and 3D into contact with the substrate 100, and brings the probes Pr into contact with the respective inspection points P1 and P2 (step S1).

其次,檢查處理部8係取得溫度感測器353的檢測溫度t作為低溫時溫度TLo(步驟S2)。此時,可使用各溫度感測器353中任一檢測溫度,也可使用各溫度感測器353之檢測溫度的平均值等。 Next, the inspection processing unit 8 acquires the detected temperature t of the temperature sensor 353 as the low temperature temperature TLo (step S2). At this time, the temperature of any one of the temperature sensors 353 may be used, or the average value of the detected temperatures of the respective temperature sensors 353 may be used.

接著,檢查處理部8係取得特定檢查點Px、Py之間的電阻值R作為低溫時電阻值RLo(步驟S3)。電阻 值R係藉由測量在接觸於特定檢查點Px、Py之一對探針Pr之間流通電流而產生於該一對探針Pr之間的電壓,以該電壓值除以該電流值來求得。 Next, the inspection processing unit 8 acquires the resistance value R between the specific inspection points Px and Py as the low-temperature resistance value RLo (step S3). resistance The value R is obtained by measuring a voltage generated between the pair of probes Pr by a current flowing between one of the specific inspection points Px and Py and the probe Pr, and dividing the voltage value by the current value. Got it.

此外,於電阻值R的測量中,藉由所謂的四端子法來進行電阻測量,因能以良好精度進行電阻測量而較佳。具體上,使電流供給用的探針Pr及電壓測量用的探針Pr接觸特定檢查點Px,並且也使電流供給用的探針Pr及電壓測量用的探針Pr接觸特定檢查點Py,於一對電流供給用探針Pr之間流通電流,並測量一對電壓測量用的探針Pr之間產生的電壓,以該電壓值除以該電流值來求得電阻值R為較佳。 Further, in the measurement of the resistance value R, the resistance measurement is performed by a so-called four-terminal method, and it is preferable to perform resistance measurement with good precision. Specifically, the current supply probe Pr and the voltage measurement probe Pr are brought into contact with the specific inspection point Px, and the current supply probe Pr and the voltage measurement probe Pr are also brought into contact with the specific inspection point Py. A current flows between the pair of current supply probes Pr, and a voltage generated between the pair of probes for voltage measurement Pr is measured. It is preferable to obtain the resistance value R by dividing the voltage value by the current value.

其次,檢查處理部8係對溫度控制部9輸出控制信號,使加熱器352發熱,藉由加熱金屬構件351D、351U來加熱基板100(步驟S4)。 Next, the inspection processing unit 8 outputs a control signal to the temperature control unit 9, causes the heater 352 to generate heat, and heats the metal members 351D and 351U to heat the substrate 100 (step S4).

接著,檢查處理部8係與步驟S2、S3同樣地動作,取得溫度感測器353的檢測溫度t作為高溫時溫度THi(步驟S5),並取得特定檢查點Px、Py之間的電阻值R作為高溫時電阻RHi(步驟S6)。 Then, the inspection processing unit 8 operates in the same manner as steps S2 and S3, and acquires the detected temperature t of the temperature sensor 353 as the high temperature temperature THi (step S5), and acquires the resistance value R between the specific inspection points Px and Py. The resistor RHi is used as a high temperature (step S6).

其次,檢查處理部8係依據低溫時溫度TLo、低溫時電阻RLo、高溫時溫度THi、以及高溫時電阻RHi,算出溫度係數Tc(步驟S7)。具體而言,檢查處理部8可依據下述式(1)算出溫度係數Tc。 Next, the inspection processing unit 8 calculates the temperature coefficient Tc based on the low temperature temperature TLO, the low temperature resistance RLo, the high temperature temperature THi, and the high temperature resistance RHi (step S7). Specifically, the inspection processing unit 8 can calculate the temperature coefficient Tc based on the following formula (1).

溫度係數Tc=[(RHi-RLo)/RLo]/(THi-TLo)…(1) Temperature coefficient Tc=[(RHi-RLo)/RLo]/(THi-TLo)...(1)

接著,檢查處理部8係依據低溫時溫度 TLo、低溫時電阻RLo、以及溫度係數Tc,算出基板100達到設定溫度Tta時的目標電阻值Rta(步驟S8)。具體而言,檢查處理部8可依據下述式(2)算出目標電阻值Rta。 Next, the inspection processing unit 8 is based on the temperature at a low temperature. TLo, the low-temperature resistance RLo, and the temperature coefficient Tc are calculated as the target resistance value Rta when the substrate 100 reaches the set temperature Tta (step S8). Specifically, the inspection processing unit 8 can calculate the target resistance value Rta based on the following formula (2).

目標電阻值Rta=RLo{[(Tta-TLo)/Tc]+1}…(2) Target resistance value Rta=RLo{[(Tta-TLo)/Tc]+1}...(2)

其次,檢查處理部8係以與上述同樣的方法,測量特定檢查點Px、Py之間的電阻值R(步驟S11:電阻測量步驟)。 Next, the inspection processing unit 8 measures the resistance value R between the specific inspection points Px and Py in the same manner as described above (step S11: resistance measurement step).

接著,檢查處理部8係將步驟S11所測量的電阻值R與電阻判定值Rj作比較(步驟S12)。電阻判定值Rj係用以判定特定檢查點Px、Py之間的配線圖案之良否的電阻值,設定有假設例如斷線、線變細而使電阻值增大等的情形下的特定檢查點Px、Py之間的電阻值,而預先設定遠大於目標電阻值Rta的值作為電阻判定值Rj。 Next, the inspection processing unit 8 compares the resistance value R measured in step S11 with the resistance determination value Rj (step S12). The resistance determination value Rj is a resistance value for determining whether or not the wiring pattern between the specific inspection points Px and Py is good, and a specific inspection point Px in the case where the line is thinned and the resistance value is increased, for example, is set. The resistance value between Py and Py is set to a value far larger than the target resistance value Rta as the resistance determination value Rj.

若電阻值R超過了電阻判定值Rj(步驟S12中為「是」),檢查處理部8係判定特定檢查點Px、Py之間的配線圖案為不良,亦即基板100為不良(步驟S13),並結束處理。如此一來,由於特定檢查點Px、Py之間的配線圖案為不良而成為目標電阻值Rta以上的電阻值時,即使基板100的溫度尚未達到設定溫度Tta以上,亦能降低執行步驟S15的良否判定的不確定性。 When the resistance value R exceeds the resistance determination value Rj (YES in step S12), the inspection processing unit 8 determines that the wiring pattern between the specific inspection points Px and Py is defective, that is, the substrate 100 is defective (step S13). And end the process. In this case, when the wiring pattern between the specific inspection points Px and Py is defective and becomes a resistance value equal to or higher than the target resistance value Rta, even if the temperature of the substrate 100 has not reached the set temperature Tta or more, the execution of the step S15 can be reduced. The uncertainty of the decision.

其次,檢查處理部8係將步驟S11所測量的電阻值R與目標電阻值Rta作比較(步驟S14)。若電阻值R未達目標電阻值Rta(步驟S14中為「否」),就再次反覆步驟S11至S14,並待機至電阻值R達到目標電阻值Rta以 上。 Next, the inspection processing unit 8 compares the resistance value R measured in step S11 with the target resistance value Rta (step S14). If the resistance value R does not reach the target resistance value Rta (NO in step S14), the steps S11 to S14 are repeated again, and the standby value R reaches the target resistance value Rta. on.

相對於此,若電阻值R達到目標電阻值Rta以上(步驟S14中為「是」:檢查開始判定步驟),由於成為基板100的溫度達到設定溫度Tta以上,依據從各探針獲得的電氣信號來進行基板100的良否判定,開始基板100的檢查(步驟S15)。 On the other hand, when the resistance value R reaches the target resistance value Rta or more (YES in step S14: the inspection start determination step), the electrical signal obtained from each probe is obtained based on the temperature of the substrate 100 reaching the set temperature Tta or more. The quality of the substrate 100 is determined, and the inspection of the substrate 100 is started (step S15).

此外,即使不執行步驟S12、S13,特定檢查點Px、Py之間的配線發生了斷線等不良的情形時,由於在步驟S15應可檢測出其不良,因此也可設為不執行步驟S12、S13的構成。 Further, even if steps S12 and S13 are not performed, if the wiring between the specific inspection points Px and Py is defective such as disconnection, since the failure can be detected in step S15, step S12 may not be performed. The composition of S13.

此外,步驟S1~S8不限定於基板檢查時執行的例子。例如,也可使用預測的基板100,實驗性地執行步驟S1~S8,求得目標電阻值Rta。並且,也可將如此方式獲得的目標電阻值Rta先記憶到記憶裝置,於實際檢查基板100之際,依據記憶在其記憶裝置的目標電阻值Rta來執行步驟S1、S4、S11~S15的構成。 Further, steps S1 to S8 are not limited to the examples executed at the time of substrate inspection. For example, the predicted substrate 100 may be used, and steps S1 to S8 may be experimentally performed to obtain a target resistance value Rta. Further, the target resistance value Rta obtained in this manner can be first memorized to the memory device, and when the substrate 100 is actually inspected, the steps S1, S4, and S11 to S15 are performed in accordance with the target resistance value Rta stored in the memory device. .

3D‧‧‧檢查輔助具 3D‧‧‧Check aids

30D‧‧‧探針塊 30D‧‧‧ probe block

31D‧‧‧支撐塊 31D‧‧‧Support block

31Da、31Db‧‧‧支撐板 31Da, 31Db‧‧‧ support plate

34‧‧‧配線 34‧‧‧Wiring

34a‧‧‧電極 34a‧‧‧electrode

35D‧‧‧加熱塊(加熱部) 35D‧‧‧heating block (heating section)

36‧‧‧隔熱構件 36‧‧‧Insulation members

37‧‧‧支柱 37‧‧‧ pillar

321D‧‧‧基台 321D‧‧‧Abutment

351D‧‧‧金屬構件 351D‧‧‧Metal components

352‧‧‧加熱器 352‧‧‧heater

353‧‧‧溫度感測器 353‧‧‧temperature sensor

B1‧‧‧接觸面 B1‧‧‧ contact surface

C1‧‧‧接觸面 C1‧‧‧ contact surface

H‧‧‧貫穿孔 H‧‧‧through hole

Pr‧‧‧探針 Pr‧‧‧ probe

Claims (10)

一種檢查輔助具,係用以檢查設定有檢查對象之檢查點的基板,該檢查輔助具係具備:探針,用以接觸於前述檢查點;以及加熱部,具有用以接觸於前述基板的接觸面,藉由加熱前述接觸面而加熱前述基板。 An inspection aid for inspecting a substrate on which an inspection object is set, the inspection aid having: a probe for contacting the inspection point; and a heating portion having a contact for contacting the substrate The surface is heated by heating the contact surface. 如申請專利範圍第1項所述之檢查輔助具,其中,前述基板係具有第一面與第二面,於前述第一面與前述第二面設定有前述檢查點,前述探針係接觸於前述第一面的檢查點,前述接觸面係接觸於前述基板中之在前述第二面設定有前述檢查點之區域的前述第一面,且具有與前述第一面之檢查點分離的形狀。 The inspection aid according to claim 1, wherein the substrate has a first surface and a second surface, and the inspection point is set on the first surface and the second surface, and the probe is in contact with In the inspection point on the first surface, the contact surface is in contact with the first surface of the substrate on the second surface where the inspection point is set, and has a shape separated from the inspection point of the first surface. 如申請專利範圍第1或2項所述之檢查輔助具,其中,前述加熱部包含:金屬構件,係具有前述接觸面,且於與前述接觸面正交的方向具有厚度;以及加熱器,係與前述接觸面大致平行地延伸於前述金屬構件的厚度內。 The inspection aid according to claim 1 or 2, wherein the heating unit includes: a metal member having the contact surface and having a thickness in a direction orthogonal to the contact surface; and a heater Extending substantially parallel to the aforementioned contact surface within the thickness of the aforementioned metal member. 如申請專利範圍第1至3項中任一項所述之檢查輔助具,更具備:支撐前述探針的支撐構件;以及一體地支撐前述支撐構件與前述加熱部的基台,前述加熱部與前述基台係透過具有隔熱性的隔熱 構件而連結。 The inspection aid according to any one of claims 1 to 3, further comprising: a support member that supports the probe; and a base that integrally supports the support member and the heating portion, the heating portion and The aforementioned abutment is insulated by heat insulation Connected by components. 一種檢查輔助具套組,係具備如申請專利範圍第2項所述的檢查輔助具、以及用以檢查前述基板之第二面用檢查輔助具,前述第二面用檢查輔助具係具備:第二面用探針,用以接觸於前述第二面的檢查點;以及第二面用加熱部,具有用以接觸於前述基板之前述第二面的第二面用接觸面,藉由加熱前述第二面用接觸面而加熱前述基板;前述第二面用接觸面係接觸於前述基板中之在前述第一面設定有前述檢查點之區域的前述第二面,且具有與前述第二面之檢查點分離的形狀。 An inspection aid kit comprising the inspection aid according to item 2 of the application patent and the inspection aid for the second surface for inspecting the substrate, wherein the inspection aid for the second surface includes: a probe for the two sides for contacting the inspection point of the second surface; and a heating portion for the second surface having a contact surface for contacting the second surface of the substrate, by heating the foregoing The second surface is heated by the contact surface; the second surface contact surface is in contact with the second surface of the substrate on the first surface where the inspection point is set, and has the second surface The shape of the checkpoint is separated. 一種檢查輔助具套組,係用以檢查具有第一面與第二面且於前述第一面設定有檢查對象的檢查點之基板,該檢查輔助具套組係具備:探針輔助具,具有用以接觸於前述第一面之前述檢查點的探針;以及加熱輔助具,具有用以接觸於前述基板之前述第二面的接觸面,藉由加熱前述接觸面而加熱前述基板。 An inspection aid kit for inspecting a substrate having a first surface and a second surface and having an inspection object set on the first surface, the inspection aid kit having: a probe aid having a probe for contacting the inspection point on the first surface; and a heating aid having a contact surface for contacting the second surface of the substrate, and heating the substrate by heating the contact surface. 一種基板檢查裝置,係具備:如申請專利範圍第1至4項中任一項所述的檢查輔助具;以及檢查處理部,使前述探針接觸於前述檢查點並使 前述接觸面接觸於前述基板,且依據自前述探針所獲得的電氣信號而進行前述基板的檢查。 A substrate inspection device comprising: the inspection aid according to any one of claims 1 to 4; and an inspection processing unit that causes the probe to contact the inspection point and The contact surface is in contact with the substrate, and the inspection of the substrate is performed based on an electrical signal obtained from the probe. 一種基板檢查裝置,係具備:如申請專利範圍第5項所述的檢查輔助具套組;以及檢查處理部,使前述探針接觸於前述第一面的檢查點,使前述接觸面接觸於前述基板中之於前述第二面設定有前述檢查點之區域的前述第一面,並且使前述第二面用探針接觸於前述第二面的檢查點,使前述第二面用接觸面接觸於前述基板中之於前述第一面設定有前述檢查點之區域的前述第二面,且依據自該探針及該第二面用探針所獲得的電氣信號而進行前述基板的檢查。 A substrate inspection device comprising: the inspection aid set according to claim 5; and an inspection processing unit, wherein the probe is in contact with the inspection point on the first surface, and the contact surface is in contact with the aforementioned The first surface of the substrate on which the inspection point is set on the second surface, and the second surface probe is in contact with the inspection point of the second surface, and the second surface contact surface is contacted The second surface of the substrate on which the inspection point is set on the first surface, and the inspection of the substrate based on an electrical signal obtained from the probe and the probe for the second surface. 一種基板檢查裝置,係具備:如申請專利範圍第6項所述的檢查輔助具套組;以及檢查處理部,使前述探針接觸於前述第一面的檢查點並使前述接觸面接觸於前述第二面,且依據自該探針所獲得的電氣信號而進行前述基板的檢查。 A substrate inspection device comprising: the inspection aid set according to claim 6; and an inspection processing unit that contacts the probe to the inspection point of the first surface and contacts the contact surface with the aforementioned On the second side, the inspection of the substrate is performed based on an electrical signal obtained from the probe. 如申請專利範圍第7至9項中任一項所述之基板檢查裝置,其中,前述基板形成有配線圖案,預先設定有以前述配線圖案相互連接之一對特定檢查點作為前述檢查點, 前述檢查處理部係執行下列步驟:電阻測量步驟,依據自接觸於前述各特定檢查點之探針所獲得的電氣信號而測量前述一對特定檢查點之間的電阻值;以及檢查開始判定步驟,藉由前述電阻測量步驟所測量到的電阻值成為預定的目標電阻值以上時,開始前述檢查。 The substrate inspection device according to any one of the seventh aspect of the present invention, wherein the substrate has a wiring pattern formed thereon, and one of the connection patterns is connected to the specific inspection point as the inspection point. The inspection processing unit performs the following steps: a resistance measuring step of measuring a resistance value between the pair of specific inspection points based on an electrical signal obtained from a probe contacting the respective specific inspection points; and an inspection start determination step, When the resistance value measured by the resistance measuring step becomes equal to or higher than a predetermined target resistance value, the aforementioned inspection is started.
TW105141391A 2016-02-12 2016-12-14 Inspection jig, inspection jig set, and substrate inspecting apparatus TWI752928B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016024330A JP6682895B2 (en) 2016-02-12 2016-02-12 Inspection jig, inspection jig set, and board inspection device
JP2016-024330 2016-02-12

Publications (2)

Publication Number Publication Date
TW201740121A true TW201740121A (en) 2017-11-16
TWI752928B TWI752928B (en) 2022-01-21

Family

ID=59563301

Family Applications (2)

Application Number Title Priority Date Filing Date
TW110131479A TWI780874B (en) 2016-02-12 2016-12-14 Inspection jig, inspection jig set, and substrate inspecting apparatus
TW105141391A TWI752928B (en) 2016-02-12 2016-12-14 Inspection jig, inspection jig set, and substrate inspecting apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW110131479A TWI780874B (en) 2016-02-12 2016-12-14 Inspection jig, inspection jig set, and substrate inspecting apparatus

Country Status (3)

Country Link
JP (1) JP6682895B2 (en)
TW (2) TWI780874B (en)
WO (1) WO2017138380A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110155645A (en) * 2019-04-28 2019-08-23 苏州峘一自动化有限公司 Automatic detection system

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7215206B2 (en) * 2019-02-19 2023-01-31 富士電機株式会社 Semiconductor device manufacturing method
US11378619B2 (en) * 2019-12-18 2022-07-05 Formfactor, Inc. Double-sided probe systems with thermal control systems and related methods
CN114397560A (en) 2022-01-24 2022-04-26 环旭电子股份有限公司 Electric property detection device of test carrier plate
US12066514B2 (en) * 2022-08-09 2024-08-20 Cirrus Logic, Inc. Integrated thin-film resistive sensor with integrated heater and metal layer thermal equalizer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007064883A (en) * 2005-09-01 2007-03-15 Nippon Mektron Ltd Electrical conduction inspecting device and method of printed circuit board
JP5097046B2 (en) * 2008-08-01 2012-12-12 エスペック株式会社 Semiconductor device reliability evaluation method and semiconductor device reliability evaluation apparatus
JP5466043B2 (en) * 2010-02-25 2014-04-09 タツモ株式会社 Method for inspecting printed circuit board used in electronic equipment and inspection apparatus used therefor
JP2014211412A (en) * 2013-04-22 2014-11-13 三菱電機株式会社 Device and method for inspecting printed wiring board
WO2014207894A1 (en) * 2013-06-28 2014-12-31 株式会社メイコー Inspection jig, and printed board inspection system employing the inspection jig

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110155645A (en) * 2019-04-28 2019-08-23 苏州峘一自动化有限公司 Automatic detection system

Also Published As

Publication number Publication date
TW202201017A (en) 2022-01-01
TWI752928B (en) 2022-01-21
WO2017138380A1 (en) 2017-08-17
TWI780874B (en) 2022-10-11
JP2017142189A (en) 2017-08-17
JP6682895B2 (en) 2020-04-15

Similar Documents

Publication Publication Date Title
TWI780874B (en) Inspection jig, inspection jig set, and substrate inspecting apparatus
TWI634604B (en) Probe card, inspection device using the same, and inspection method
JP5235163B2 (en) Inspection device
JP6418118B2 (en) Semiconductor device evaluation apparatus and evaluation method
JP2008028082A (en) Prober, and probe contact method
TW200809226A (en) Substrate inspecting apparatus and substrate inspecting method
JP2007019094A (en) Semiconductor testing device
TWI822852B (en) Inspection equipment and inspection methods
TWI230952B (en) Testing method for electronic part and testing device
JP4981525B2 (en) Semiconductor inspection equipment
JP7416439B2 (en) Electronic component testing equipment
CN110794290A (en) Substrate detection device and substrate detection method
US20200341031A1 (en) Inspection device and method of controlling temperature of probe card
JP2012256799A (en) Semiconductor inspection device
JP2022096153A (en) Electronic device inspection device and inspection method
JP2003121459A (en) Electric characteristic measuring device and measuring method
JP2020181970A (en) Inspection device and method of controlling temperature of probe card
JP4676370B2 (en) Bonding failure detection device and bonding failure detection method
JP3994891B2 (en) Inspection method for workpiece
JP5151170B2 (en) Temperature test apparatus and temperature adjustment method thereof
JP4881334B2 (en) Insulation inspection method for sensor element
JPH04120481A (en) Test clip device
JP2010038742A (en) Device for inspecting circuit disconnection
JP2020016591A (en) Circuit board inspection method and circuit board inspection device
TW200409924A (en) Inspecting apparatus for wiring board and inspecting method for wiring board