TWI752928B - Inspection jig, inspection jig set, and substrate inspecting apparatus - Google Patents
Inspection jig, inspection jig set, and substrate inspecting apparatus Download PDFInfo
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- TWI752928B TWI752928B TW105141391A TW105141391A TWI752928B TW I752928 B TWI752928 B TW I752928B TW 105141391 A TW105141391 A TW 105141391A TW 105141391 A TW105141391 A TW 105141391A TW I752928 B TWI752928 B TW I752928B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
- G01R31/2805—Bare printed circuit boards
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
- G01R31/2806—Apparatus therefor, e.g. test stations, drivers, analysers, conveyors
- G01R31/2808—Holding, conveying or contacting devices, e.g. test adapters, edge connectors, extender boards
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
- G01R31/281—Specific types of tests or tests for a specific type of fault, e.g. thermal mapping, shorts testing
- G01R31/2817—Environmental-, stress-, or burn-in tests
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- Manufacturing & Machinery (AREA)
- Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
本發明係有關用以使探針接觸於基板之檢查輔助具、檢查輔助具套組及基板檢查裝置。 The present invention relates to an inspection aid, a kit of inspection aids, and a substrate inspection device for contacting a probe with a substrate.
以往,已知有基板檢查裝置,該基板檢查裝置係為了進行檢查印刷配線基板等基板上所形成的配線圖案的導通、各配線圖案之間有無不良短路、或配線圖案及配線圖案之間的電阻值等的基板檢查,例如使移動式的檢查用接觸子、保持成多針狀之複數個檢查用接觸子等接觸形成在配線圖案上的焊墊(pad)、焊盤(land)等複數個檢查點,來測量該檢查對象配線圖案上的檢查點之間的電阻,藉此,進行基板檢查。 Conventionally, there has been known a board inspection apparatus for inspecting the continuity of wiring patterns formed on substrates such as printed wiring boards, the presence or absence of defective short circuits between wiring patterns, or the resistance between wiring patterns and wiring patterns. For board inspection of value, etc., for example, a movable inspection contact, a plurality of inspection contacts held in a multi-pin shape, etc., are brought into contact with a plurality of pads, lands, etc. formed on the wiring pattern. The inspection point is used to measure the resistance between the inspection points on the inspection target wiring pattern, thereby performing the board inspection.
於此種基板中,會有例如配線圖案與通孔(via hole)之間的接觸不完全而雖導通但接觸狀態不穩定的情形。此種不良情形,會有於檢查時被判斷為檢查點之間呈導通而被當作良品並組裝於製品之後,由於使用環境的熱應力而使不良情形顯現出來的情況。特別是,在基板的內部,由於接觸於配線圖案之間的埋入通孔的不完全的接 觸之不良情況係無法由基板的外部來目視檢查,所以難以藉由檢查來檢查出。 In such a substrate, for example, the contact between the wiring pattern and the via hole may be incomplete, and the contact state may be unstable even though it is conductive. In such a defect, it is judged that there is continuity between inspection points at the time of inspection, and it is regarded as a good product and assembled into a product, and then the defect may appear due to the thermal stress of the use environment. In particular, in the interior of the substrate, due to the incomplete connection of the buried vias between the wiring patterns The contact defect cannot be visually inspected from the outside of the substrate, so it is difficult to detect it by inspection.
對此,已提案有一種檢查裝置(例如專利文獻1),該檢查裝置係於基板檢查時,使用預熱腔(chamber)來加熱載置有檢查對象之基板的空間,將基板置於高溫環境下施予熱應力來進行檢查,藉此來檢測出此種不完全的接觸之不良情況。 In this regard, an inspection apparatus has been proposed (for example, Patent Document 1), which uses a preheating chamber to heat a space in which a substrate to be inspected is placed and exposes the substrate to a high temperature environment during substrate inspection (for example, Patent Document 1). This kind of incomplete contact is detected by applying thermal stress to inspect it.
專利文獻1:日本特開2001-215257號公報 Patent Document 1: Japanese Patent Laid-Open No. 2001-215257
然而,如上述的方式使用預熱腔來加熱檢查對象之基板的載置空間以對基板施予熱應力所構成的檢查裝置,存在有由於基板的加熱耗費時間而會大幅增加檢查時間的不良情形。 However, the inspection apparatus using the preheating chamber to heat the placement space of the substrate to be inspected to apply thermal stress to the substrate as described above has the disadvantage that the inspection time is greatly increased due to the time-consuming heating of the substrate.
本發明的目的在於提供能夠對檢查對象的基板施加熱應力之同時縮短檢查時間的檢查輔助具、檢查輔助具套組及基板檢查裝置。 An object of the present invention is to provide an inspection aid, an inspection aid set, and a substrate inspection apparatus capable of shortening inspection time while applying thermal stress to a substrate to be inspected.
本發明之檢查輔助具係用以檢查設定有檢查對象之檢查點之基板的檢查輔助具該檢查輔助具係具備:探針,用以接觸於前述檢查點;以及加熱部,具有用 以接觸於前述基板的接觸面,藉由加熱前述接觸面而加熱前述基板。 An inspection aid of the present invention is an inspection aid for inspecting a substrate on which an inspection point of an inspection object is set. The inspection aid is provided with: a probe for contacting the inspection point; The substrate is heated by heating the contact surface in contact with the contact surface of the substrate.
依據此構成,由於能夠藉由加熱接觸於基板的接觸面來加熱基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。 According to this configuration, since the substrate can be heated by heating the contact surface in contact with the substrate, it is easier to heat the substrate in a short time than heating the substrate by using a preheating chamber to heat the placement space of the substrate. Therefore, the inspection time can be shortened while applying thermal stress to the substrate to be inspected.
再者,前述基板係具有第一面與第二面,於前述第一面與前述第二面設定有前述檢查點,前述探針係接觸於前述第一面的檢查點,前述接觸面係接觸於前述基板中之在前述第二面設定有前述檢查點之區域的前述第一面,且具有與前述第一面之檢查點分離的形狀。 Furthermore, the substrate has a first surface and a second surface, the inspection points are set on the first surface and the second surface, the probes are in contact with the inspection points on the first surface, and the contact surfaces are in contact with each other. The first surface of the region in which the inspection point is set on the second surface of the substrate has a shape separated from the inspection point of the first surface.
依據此構成,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針被加熱的風險之情況下加熱基板。 According to this configuration, since the region where the inspection point of the substrate is set can be heated from the back side of the surface where the inspection point is set, the substrate can be heated while reducing the risk of heating of the probe for contacting the inspection point.
再者,較佳者為:前述加熱部包含:金屬構件,係具有前述接觸面,且於與前述接觸面正交的方向具有厚度;以及加熱器,係與前述接觸面大致平行地延伸於前述金屬構件的厚度內。 Furthermore, preferably, the heating portion includes: a metal member having the contact surface and having a thickness in a direction orthogonal to the contact surface; and a heater extending substantially parallel to the contact surface on the contact surface within the thickness of the metal member.
依據此構成,能有效地將加熱器所產生的熱傳導至金屬構件,並且能以均勻性良好地傳導熱的方式加熱整體接觸面。 According to this configuration, the heat generated by the heater can be efficiently conducted to the metal member, and the entire contact surface can be heated so as to conduct the heat uniformly.
再者,較佳者為:前述檢查輔助具更具備:支撐前述探針的支撐構件;以及一體地支撐前述支撐構件與前述加熱部的基台,前述加熱部與前述基台係透過具有 隔熱性的隔熱構件而連結。 Furthermore, it is preferable that the inspection aid further includes: a support member for supporting the probe; and a base for integrally supporting the support member and the heating part, the heating part and the base are connected through a connected with a heat insulating heat insulating material.
依據此構成,由於能降低加熱部所產生的熱往基台散逸的風險,所以能快速且有效地加熱基板。再者,能降低探針透過基板被加熱的風險。 According to this configuration, since the risk of the heat generated by the heating portion escaping to the base can be reduced, the substrate can be heated quickly and efficiently. Furthermore, the risk of the probe being heated through the substrate can be reduced.
本發明之檢查輔助具套組係具備上述檢查輔助具、以及用以檢查前述基板之第二面用檢查輔助具者,前述第二面用檢查輔助具係具備:第二面用探針,用以接觸於前述第二面的檢查點;以及第二面用加熱部,具有用以接觸於前述基板之前述第二面的第二面用接觸面,藉由加熱前述第二面用接觸面而加熱前述基板;前述第二面用接觸面係接觸於前述基板中之在前述第一面設定有前述檢查點之區域的前述第二面,且具有與前述第二面之檢查點分離的形狀。 The inspection aid kit of the present invention is provided with the above-mentioned inspection aid and an inspection aid for the second surface of the substrate, wherein the second surface inspection aid is provided with: a probe for the second surface, a an inspection point in contact with the second surface; and a heating unit for the second surface having a contact surface for the second surface for contacting the second surface of the substrate, and heating the contact surface for the second surface by heating the contact surface for the second surface. The substrate is heated; the contact surface for the second surface is in contact with the second surface of the substrate in the region where the inspection point is set on the first surface, and has a shape separated from the inspection point of the second surface.
依據此檢查輔助具套組,能從基板的兩面加熱及檢查基板。 According to this inspection aid kit, the substrate can be heated and inspected from both sides of the substrate.
再者,本發明之檢查輔助具套組係用以檢查具有第一面與第二面且於前述第一面設定有檢查對象的檢查點之基板者,該檢查輔助具套組係具備:探針輔助具,具有用以接觸於前述第一面之前述檢查點的探針;以及加熱輔助具,具有用以接觸於前述基板之前述第二面的接觸面,藉由加熱前述接觸面而加熱前述基板。 Furthermore, the inspection aid kit of the present invention is used for inspecting a substrate having a first surface and a second surface and an inspection point of an inspection object is set on the first surface, and the inspection aid kit includes: a probe A needle aid having a probe for contacting the inspection point on the first surface; and a heating aid having a contact surface for contacting the second surface of the substrate, heated by heating the contact surface the aforementioned substrate.
依據此構成,由於能藉由加熱輔助具加熱接觸於基板的接觸面而藉以加熱基板,並且能藉由探針輔助具來檢查基板,比使用預熱腔來加熱基板的載置空間的 方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。再者,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針被加熱的風險之情況下加熱基板。 According to this configuration, the substrate can be heated by heating the contact surface that is in contact with the substrate by the heating aid, and the substrate can be inspected by the probe aid, compared with the use of a preheating chamber to heat the placement space of the substrate. way to heat the substrate, it is easier to heat the substrate in a short time. Therefore, the inspection time can be shortened while applying thermal stress to the substrate to be inspected. Furthermore, since the area where the inspection point of the substrate is set can be heated from the back side of the surface where the inspection point is set, the substrate can be heated while reducing the risk of heating of the probe for contacting the inspection point.
再者,本發明之基板檢查裝置係具備:上述檢查輔助具;以及檢查處理部,使前述探針接觸於前述檢查點並使前述接觸面接觸於前述基板,且依據自前述探針所獲得的電氣信號而進行前述基板的檢查。 Further, a substrate inspection apparatus of the present invention includes: the inspection aid; and an inspection processing unit for bringing the probes into contact with the inspection points and bringing the contact surfaces into contact with the substrate, and based on the information obtained from the probes. The inspection of the above-mentioned substrate is carried out according to the electrical signal.
依據此構成,由於能藉由加熱接觸於基板的接觸面來加熱基板之情況下,藉由探針來檢查基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。 According to this configuration, when the substrate can be heated by heating the contact surface in contact with the substrate, the probe can be used to inspect the substrate, and the substrate can be heated more easily than by using a preheating chamber to heat the placement space of the substrate. The substrate is heated for a short period of time. Therefore, the inspection time can be shortened while applying thermal stress to the substrate to be inspected.
再者,本發明之基板檢查裝置係具備:上述檢查輔助具套組;以及檢查處理部,使前述探針接觸於前述第一面的檢查點,使前述接觸面接觸於前述基板之於前述第二面設定有前述檢查點之區域的前述第一面,並且使前述第二面用探針接觸於前述第二面的檢查點,使前述第二面用接觸面接觸於前述基板中之於前述第一面設定有前述檢查點之區域的前述第二面,且依據自該探針及該第二面用探針所獲得的電氣信號而進行前述基板的檢查。 Furthermore, a substrate inspection apparatus according to the present invention includes: the inspection aid set; and an inspection processing unit for bringing the probes into contact with the inspection points on the first surface, and bringing the contact surface into contact with the substrate on the first surface. The first surface in the region of the inspection point is set on both surfaces, and the probe for the second surface is brought into contact with the inspection point of the second surface, and the contact surface for the second surface is brought into contact with the substrate in the substrate. The first surface is provided with the second surface in the region of the inspection point, and the inspection of the substrate is performed based on electrical signals obtained from the probe and the probe for the second surface.
依據此構成,即使於基板的兩面設定有檢查點時,亦能藉由加熱接觸於基板之兩面的接觸面與第二 面接觸面來加熱基板,並且能使探針及第二面用探針接觸兩面的檢查點來檢查基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。再者,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針及第二面用探針被加熱的風險之情況下加熱基板。 According to this configuration, even when inspection points are set on both sides of the substrate, the contact surfaces on both sides of the substrate can be heated to the second contact surface. It is easier to heat the substrate in a short time than using a preheating chamber to heat the substrate placement space by heating the substrate by surface-to-surface contact, and the probes and the second surface can be contacted with the probes on the inspection points on both sides to inspect the substrate. Internal heating of the substrate. Therefore, the inspection time can be shortened while applying thermal stress to the substrate to be inspected. Furthermore, since the area where the inspection point of the substrate is set can be heated from the back side of the surface where the inspection point is set, it is possible to reduce the risk of heating the probe for contacting the inspection point and the probe for the second surface. under heating the substrate.
再者,本發明之基板檢查裝置係具備:上述檢查輔助具套組;以及檢查處理部,使前述探針接觸於前述第一面的檢查點並使前述接觸面接觸於前述第二面,且依據自該探針所獲得的電氣信號而進行前述基板的檢查。 Furthermore, the substrate inspection apparatus of the present invention includes: the above-mentioned inspection aid set; and an inspection processing unit that makes the probes come into contact with the inspection points on the first surface and the contact surfaces come into contact with the second surface, and The inspection of the aforementioned substrate is performed based on the electrical signal obtained from the probe.
依據此構成,由於能夠藉由加熱接觸於基板的接觸面來加熱基板,比使用預熱腔來加熱基板的載置空間的方式加熱基板,更容易在短時間內加熱基板。因此,能夠對檢查對象的基板施加熱應力之同時縮短檢查時間。再者,由於能從設定有檢查點之面的背側加熱設定有基板之檢查點的區域,所以能在降低用以接觸檢查點之探針被加熱的風險之情況下加熱基板。 According to this configuration, since the substrate can be heated by heating the contact surface in contact with the substrate, it is easier to heat the substrate in a short time than heating the substrate by using a preheating chamber to heat the placement space of the substrate. Therefore, the inspection time can be shortened while applying thermal stress to the substrate to be inspected. Furthermore, since the area where the inspection point of the substrate is set can be heated from the back side of the surface where the inspection point is set, the substrate can be heated while reducing the risk of heating of the probe for contacting the inspection point.
1‧‧‧基板檢查裝置 1‧‧‧Board Inspection Device
2、2’‧‧‧檢查輔助具套組 2. 2’‧‧‧Inspection aid set
3D‧‧‧檢查輔助具 3D‧‧‧Inspection Aids
3D’‧‧‧加熱輔助具 3D’‧‧‧Heating Aids
3U‧‧‧檢查輔助具(第二面用檢查輔助具) 3U‧‧‧Inspection aids (inspection aids for the second side)
3U’‧‧‧探針輔助具 3U’‧‧‧Probe Aids
4、4D、4U‧‧‧檢查部 4. 4D, 4U‧‧‧Inspection Department
6‧‧‧基板固定裝置 6‧‧‧Substrate fixing device
8‧‧‧檢查處理部 8‧‧‧Inspection and Processing Department
9‧‧‧溫度控制部 9‧‧‧Temperature Control Section
30D、30U‧‧‧探針塊 30D, 30U‧‧‧Probe block
31D、31U‧‧‧支撐塊 31D, 31U‧‧‧Support block
31Da、31Db、31Ua、31Ub‧‧‧支撐板 31Da, 31Db, 31Ua, 31Ub‧‧‧Support Plate
34‧‧‧配線 34‧‧‧Wiring
34a‧‧‧電極 34a‧‧‧electrode
35D‧‧‧加熱塊(加熱部) 35D‧‧‧heating block (heating part)
35U‧‧‧加熱塊(第二面用加熱部) 35U‧‧‧heating block (heating part for the second side)
36‧‧‧隔熱構件 36‧‧‧Insulation components
37‧‧‧支柱 37‧‧‧Pillar
100‧‧‧基板 100‧‧‧Substrate
101‧‧‧下表面 101‧‧‧Lower surface
102‧‧‧上表面 102‧‧‧Top surface
321D、321U‧‧‧基台 321D, 321U‧‧‧Abutment
351D、351U‧‧‧金屬構件 351D, 351U‧‧‧Metal components
352‧‧‧加熱器 352‧‧‧Heater
353‧‧‧溫度感測器 353‧‧‧Temperature sensor
A‧‧‧基板 A‧‧‧Substrate
B1‧‧‧接觸面 B1‧‧‧contact surface
B2‧‧‧接觸面(第二面用接觸面) B2‧‧‧contact surface (contact surface for second surface)
C1、C2‧‧‧接觸面 C1, C2‧‧‧contact surface
H‧‧‧貫穿孔 H‧‧‧Through Hole
P1、P2、Px、Py‧‧‧檢查點 P1, P2, Px, Py‧‧‧Checkpoints
Pr‧‧‧探針 Pr‧‧‧Probe
X‧‧‧區域 X‧‧‧ area
第1圖係示意地顯示本發明之一實施形態之具有接觸端子及檢查輔助具之基板檢查裝置之構成的示意圖。 FIG. 1 is a schematic diagram schematically showing the configuration of a substrate inspection apparatus having contact terminals and inspection aids according to an embodiment of the present invention.
第2圖係顯示第1圖所示之基板之一例的平面圖。 FIG. 2 is a plan view showing an example of the substrate shown in FIG. 1 .
第3圖係顯示第1圖所示之檢查輔助具之構成之一例的說明圖。 FIG. 3 is an explanatory diagram showing an example of the configuration of the inspection aid shown in FIG. 1 .
第4圖係顯示第1圖所示之檢查輔助具之構成之一例的說明圖。 FIG. 4 is an explanatory diagram showing an example of the configuration of the inspection aid shown in FIG. 1 .
第5圖係從上表面側顯示重疊檢查輔助具之接觸面及探針與基板而顯示為了檢查而使檢查輔助具接觸於基板之下表面的狀態的說明圖。 FIG. 5 is an explanatory diagram showing a state where the inspection aid is brought into contact with the lower surface of the substrate for inspection by overlapping the contact surface of the inspection aid and the probe and the substrate from the upper surface side.
第6圖係從上表面側顯示重疊檢查輔助具之接觸面及探針與基板而顯示為了檢查而使檢查輔助具接觸於基板之上表面的狀態的說明圖。 Fig. 6 is an explanatory diagram showing a state where the inspection aid is brought into contact with the upper surface of the substrate for inspection by overlapping the contact surface of the inspection aid and the probe and the substrate from the upper surface side.
第7圖係顯示第1圖所示之檢查輔助具套組之另一例的說明圖。 FIG. 7 is an explanatory diagram showing another example of the inspection aid set shown in FIG. 1 .
第8圖係用以說明基板檢查方法的說明圖。 FIG. 8 is an explanatory diagram for explaining a board inspection method.
第9圖係用以說明基板檢查方法之一例的流程圖。 FIG. 9 is a flowchart for explaining an example of a board inspection method.
第10圖係用以說明基板檢查方法之一例的流程圖。 FIG. 10 is a flowchart for explaining an example of a substrate inspection method.
以下,依據圖式來詳細說明本發明。此外,於各圖中賦予了相同符號的構成係表示相同的構成而省略其說明。 Hereinafter, the present invention will be described in detail based on the drawings. In addition, the structure which attached|subjected the same code|symbol in each figure shows the same structure, and abbreviate|omits the description.
第1圖係示意地顯示本發明之一實施形態之具有接觸端子及檢查輔助具之基板檢查裝置1之構成的示意圖。第1圖所示之基板檢查裝置1係用以檢查形成在作為檢查之對象物之基板100之電路圖案的裝置。
FIG. 1 is a schematic diagram schematically showing the configuration of a
基板100可為例如印刷配線基板、可撓性基
板、陶瓷多層配線基板、液晶顯示器、電漿顯示器等用的電極板、半導體基板及半導體封裝用的封裝基板、軟片捲架等各種基板。
The
第1圖所示的基板檢查裝置1係具備:檢查部4U、4D、基板固定裝置6、檢查處理部8、以及溫度控制部9。基板固定裝置6係以將檢查對象的基板100固定於預定位置的方式所構成。檢查部4U、4D係具有檢查輔助具3U、3D、以及將檢查輔助具3U、3D所具有的探針Pr與檢查處理部8電性連接的連接電路等。檢查部4U、4D係藉由省略圖示的驅動機構而可將檢查輔助具3U、3D移動於相互正交之X、Y、Z之三軸方向,並且可將檢查輔助具3U、3D以Z軸為中心來轉動。
The
檢查部4U係位於固定在基板固定裝置6之基板100的上方。檢查部4D係位於固定在基板固定裝置6之基板100的下方。檢查部4U、4D係將用以檢查形成在基板100之電路圖案之檢查輔助具3U、3D可裝卸地構成。以下,將檢查部4U、4D總稱為檢查部4。
The
檢查輔助具3U、3D係分別具有複數個探針Pr。在第1圖中,省略了檢查輔助具3U、3D的詳細顯示而簡易地記載。檢查輔助具3U、3D係設成可因應檢查對象的基板100而替換。檢查輔助具3U、3D係分別相當於檢查輔助具的一例。並且,具有如下的關係:檢查輔助具3U、3D之中的一方相當於檢查輔助具的一例,而另一方相當於第二面用檢查輔助具之一例。再者,將檢查輔助具3U
與檢查輔助具3D的組合設為檢查輔助具套組2。檢查輔助具3U、3D的詳細內容將於後述。
The inspection aids 3U and 3D have a plurality of probes Pr, respectively. In Fig. 1, the detailed display of the inspection aids 3U and 3D is omitted for simplicity. The inspection aids 3U and 3D are provided so as to be replaceable according to the
檢查處理部8係具有例如電源電路、電壓計、電流計、以及微電腦等。檢查處理部8係控制省略圖示的驅動機構而使檢查部4U、4D移動、定位,使各探針Pr的前端接觸於基板100的各檢查點。藉此,各檢查點可與檢查處理部8電性接觸。再者,檢查處理部8係控制溫度控制部9的動作,使基板100加熱。於此狀態下,檢查處理部8係透過檢查輔助具3U、3D之各探針Pr,對基板100之各檢查點供給檢查用的電流或電壓,並依據從各探針Pr所獲得的電壓信號或電流信號,執行例如電路圖案之斷線或短路等的基板100的檢查。或是,檢查處理部8也可對各檢查點供給交流電流或電壓而根據從各探針Pr所獲得的電壓信號或電流信號來測量檢查對象的阻抗。
The inspection processing unit 8 has, for example, a power supply circuit, a voltmeter, an ammeter, a microcomputer, and the like. The inspection processing unit 8 controls a drive mechanism (not shown) to move and position the
基板100係具有下表面101及上表面102。下表面101相當於第一面的一例,上表面102相當於第二面的一例。此外,第一面與第二面可為基板100之一方的面與另一方的面,其方向不受限定。
The
第2圖係顯示第1圖所示之基板100之一例的平面圖。第2圖所示之基板100例如為可撓性基板,形成為組合了具有相同的形狀、相同的配線之兩個檢查對象的基板A而成的組基板。兩個基板A係由於為了增加基板材料可取得之基板取得數的觀點而被組合成相互不同的方向。此外,基板100不限於此種配組基板。再者,也可為
此種配組基板進一步組合成複數配組而構成基板100。基板A也可為安裝於例如觸控面板顯示器等電子零件,或被組入觸控面板顯示器來使用的基板。
FIG. 2 is a plan view showing an example of the
基板100的下表面101設定有複數個檢查點P1。基板100的上表面102設定有複數個檢查點P2。檢查點P1、P2可為例如用以連接觸控面板顯示器等電子零件的電極,也可為用以安裝電子零件的焊墊、也可為配線圖案,也可為連接器端子。第2圖所示的例子中,例如檢查點P1係假設為供觸控面板顯示器等電子零件與外部連接之稱為焊片端子之連接器端子,例如檢查點P2係假設為用以連接電子零件之電極、用以安裝電子零件的焊墊、或配線圖案。
A plurality of inspection points P1 are set on the
第3圖係顯示第1圖所示之檢查輔助具3D之構成之一例的說明圖。第3圖(a)係顯示第1圖所示之檢查輔助具3D的上表面,亦即,檢查輔助具3D之與基板100相對向之對向面之一例的平面圖。第3圖(b)係第3圖(a)所示之檢查輔助具3D的b-b線剖面圖。
FIG. 3 is an explanatory diagram showing an example of the configuration of the
第3圖所示之檢查輔助具3D係具備探針塊30D、加熱塊35D(加熱部)、以及基台321D。基台321D係例如具有略呈板狀的形狀,於基台321D之一方的表面上安裝有探針塊30D及加熱塊35D。如此一來,基台321D係建構成將探針塊30D及加熱塊35D保持成一體。
The
加熱塊35D係例如具備:大致長方體形狀的金屬構件351D,具有用以與基板100之下表面101接觸的接觸面B1,且於與接觸面B1正交的方向具有厚度、複
數個加熱器352,以與接觸面B1大致平行地延伸的方式,埋設於金屬構件351D的厚度內、以及埋設於金屬構件351D之厚度內的溫度感測器353。溫度感測器353係檢測金屬構件351D的溫度。例如可使用熱電偶作為溫度感測器353。
The
金屬構件351D係由導熱性高的金屬材料所構成。例如可適宜地使用鋁作為金屬構件351D。接觸面B1係接觸於基板100之於上表面102設定有檢查點P2之區域的下表面101,且具有與下表面101的檢查點P1分離的形狀。
The
於金屬構件351D的厚度內,沿著金屬構件351D之長度方向形成複數個與接觸面B1大致平行地延伸的孔,於該孔插入有例如圓柱形狀的加熱器352。可使用例如於陶瓷芯捲繞鎳鉻合金線並封入於不銹鋼護套而形成的所謂匣式加熱器來作為加熱器352。
In the thickness of the
加熱器352及溫度感測器353係與溫度控制部9連接。溫度控制部9係可使用所謂的溫度調節器。溫度控制部9係例如依據來自檢查處理部8的控制信號而開始金屬構件351D、351U的加熱。溫度控制部9係例如依據溫度感測器353檢測出的金屬構件351D、351U的溫度而反饋控制加熱器352的加熱,藉此使金屬構件351D、351U加熱至預先設定的設定溫度Tta。例如可適宜地使用60℃至130℃範圍的溫度作為設定溫度Tta。藉由將已接觸於基板100的金屬構件351D、351U加熱至設定溫度Tta而將基
板100加熱至設定溫度Tta。此外,為了快速且確實地將基板100加熱至設定溫度Tta,也可建構成溫度控制部9將金屬構件351D、351U加熱至比設定溫度Tta還高的溫度。
The
金屬構件351D係例如藉由複數根支柱37與基台321D連結。金屬構件351D與複數根支柱37之間係例如中隔設置有片狀的隔熱構件36。亦即,加熱塊35D與基台321D係透過隔熱構件36而連結。
The
隔熱構件36係可適宜地使用例如熱傳導率0.1W/(m.K)以下之具有隔熱性的構件。如此一來,由於可抑制加熱器352所產生的熱傳導至基台321D及探針塊30D,所以可降低因熱膨脹而產生基台321D及探針塊30D的位置偏移等、以及探針Pr的溫度上升而使探針Pr的電阻值增大等之疑慮。
As the
再者,由於藉由加熱器352所加熱之金屬構件351D的熱因熱傳導而散逸的情形可藉由隔熱構件36而被抑制,所以容易藉由加熱器352而使金屬構件351D的溫度快速地上升,而且,也容易將金屬構件351D的溫度維持在固定的設定溫度Tta。
Furthermore, since the heat dissipation of the
探針塊30D係例如以包圍加熱塊35D的周圍的方式設置。探針塊30D係具備複數個探針Pr、以及將複數個探針Pr的前端保持成朝向基板100的支撐塊31D。
The
探針Pr係具有棒狀或針狀的形狀。探針Pr係以高導電性的材料構成,例如可使用鎳、鎳合金、鈀合金等各種材料。 The probe Pr has a rod-like or needle-like shape. The probe Pr is made of a highly conductive material, and various materials such as nickel, nickel alloys, and palladium alloys can be used, for example.
支撐塊31D中形成有支撐探針Pr之複數個貫穿孔H。各貫穿孔H係以與成為檢查對象之基板100之下表面101的檢查點P1的位置對應的方式配置。藉以使探針Pr的前端部接觸檢查點P1。基台321D中設置有與各探針Pr之後端接觸而導通的電極34a。檢查部4D係具備省略圖示的連接電路,該連接電路係透過基台321D之各電極,將各探針Pr的後端進行與檢查處理部8電性接觸、切換其連接等的動作。
A plurality of through holes H for supporting the probes Pr are formed in the
支撐塊31D係例如由板狀的支撐板31Da、31Db藉由省略圖示的支柱以分離而相對向配置的方式連結支撐所構成。支撐板31Db係設為支撐塊31D之前端側,即與基板100相對向的一側,支撐板31Da係設為支撐塊31D之後端側、即安裝於基台321D的一側。支撐板31Db的上表面設為用以與基板100接觸的接觸面C1。接觸面C1與接觸面B1為同一面,且與接觸面B1之間設有空間。並且,以貫穿支撐板31Da、31Db的方式,形成有複數個貫穿孔H。
The
支撐板31Da的後端側係安裝有例如由絕緣性的樹脂材料所構成的基台321D。藉由基台321D來閉塞貫穿孔H之後端側開口。在基台321D之與各後端側開口相對向之處,以貫穿基台321D的方式,設置有配線34。基台321D之面對支撐板31Da之側的表面與露出該面之配線34的端面係成為同一面。該配線34的端面係設為電極34a。各貫穿孔H中插入有探針Pr。配線34係與檢查處理
部8連接。如此一來,檢查處理部8係透過配線34及電極34a而與探針Pr連接。
A
第4圖係顯示第1圖所示之檢查輔助具3U之構成之一例的說明圖。第4圖(a)係顯示第1圖所示之檢查輔助具3U的下表面、即檢查輔助具3U之與基板100相對向之對向面之一例的平面圖。第4圖(b)係第4圖(a)所示之檢查輔助具3U之b-b線剖面圖。檢查輔助具3U係相當於第二面用檢查輔助具的一例。
FIG. 4 is an explanatory diagram showing an example of the configuration of the
第4圖所示之檢查輔助具3U係具備探針塊30U、兩個加熱塊35U(第二面用加熱部)、以及基台321U。基台321U係例如具有略呈板狀的形狀,於基台321U之一方的表面上安裝有探針塊30U及加熱塊35U。藉此,基台321U係將探針塊30U及加熱塊35U保持成一體。藉由探針塊30U所支撐的探針Pr係相當於第二面用探針的一例。
The
加熱塊35U係例如具備:“L”字形的二個金屬構件351U,各具有用以與基板100之上表面102接觸的接觸面B2(第二面用接觸面),且於與接觸面B2正交的方向具有厚度、加熱器352,以與接觸面B2大致平行地延伸的方式,埋設於各金屬構件351U的厚度內、以及安裝於各金屬構件351U之側面的溫度感測器353。各溫度感測器353係檢測各金屬構件351U的溫度。
The
金屬構件351U係以與金屬構件351D相同的材料構成。接觸面B2係接觸於基板100之於下表面101設定有檢查點P1之區域的上表面102,且具有與上表面102
的檢查點P2分離的形狀。
The
於金屬構件351U的厚度內,沿著金屬構件351U的長度方向形成與接觸面B2大致平行地延伸的孔,於該孔插入有加熱器352。溫度控制部9係例如依據溫度感測器353所檢測出之金屬構件351U的溫度而反饋控制加熱器352的發熱,藉此使金屬構件351U加熱至設定溫度Tta。
In the thickness of the
加熱器352係具有朝一方向長條地延伸的形狀,例如棒狀的形狀。加熱塊35D、35U係於具有厚度之塊狀的金屬構件351D、351U埋設有加熱器352,且加熱器352係沿著金屬構件351D、351U的長度方向與接觸面B1、B2大致平行地延設。結果,能使加熱器352所產生的熱效率良好地傳導至金屬構件351D、351U,且能以均勻度良好地傳導熱的方式加熱接觸面B1、B2。
The
此外,加熱塊35D、35U只要是使接觸面B1、B2接觸於基板100進行加熱即可,可不必為於金屬構件埋設加熱器的構成,也可不是加熱器與接觸面B1、B2平行地延設的構成。
In addition, the heating blocks 35D and 35U only need to be heated by bringing the contact surfaces B1 and B2 into contact with the
金屬構件351U係例如藉由複數根支柱37與基台321U連結。金屬構件351U與複數根支柱37之間係例如中隔設置有片狀的隔熱構件36。亦即,加熱塊35U與基台321U係透過隔熱構件36而連結。藉此,由於可抑制加熱器352所產生的熱傳導至基台321U及探針塊30U,所以可降低因熱膨脹而產生基台321U及探針塊30U的位
置偏移等、以及探針Pr的溫度上升而使探針Pr的電阻值增大等之疑慮。
The
再者,由於藉由加熱器352所加熱之金屬構件351U的熱因熱傳導而散逸的情形可藉由隔熱構件36而被抑制,所以容易藉由加熱器352而使金屬構件351U的溫度快速地上升,而且,也容易將金屬構件351U的溫度維持在固定的設定溫度Tta。
Furthermore, since the heat dissipation of the
此外,隔熱構件36亦可不為片狀。例如也能夠以具有隔熱性的材料構成支柱37,以支柱37發揮隔熱構件之功能的構成,來取代具備片狀的隔熱構件36。或是,檢查輔助具3U、3D也可為不具有隔熱構件的構成。
In addition, the
各探針塊30U之一方係例如空出一部分而與加熱塊35U之連續的兩側面對向配置,另一方係空出一部分而與加熱塊35U之另外的兩側面對向配置。探針塊30U係具備複數個探針Pr、以及將複數個探針Pr的前端保持成朝向基板100的支撐塊31U。
For example, one of the probe blocks 30U is partially vacated and arranged to face the continuous two sides of the
支撐塊31U中形成有支撐探針Pr之複數個貫穿孔H。各貫穿孔H係以與成為檢查對象之基板100之上表面102的檢查點P2的位置對應的方式配置。藉以使探針Pr的前端部接觸檢查點P2。基台321U中設置有與各探針Pr之後端接觸而導通的電極34a。檢查部4U係具備省略圖示的連接電路,該連接電路係透過基台321U之各電極,將各探針Pr的後端進行與檢查處理部8電性接觸、切換其連接等的動作。
A plurality of through holes H for supporting the probes Pr are formed in the
支撐塊31U係例如由板狀的支撐板31Ua、31Ub藉由省略圖示的支柱以分離而相對向配置的方式連結支撐所構成。支撐板31Ub係設為支撐塊31U之前端側,即與基板100相對向的一側,支撐板31Da係設為支撐塊31U之後端側、即安裝於基台321U的一側。支撐板31Ub的下表面(第4圖(b)中為上表面)設為用以與基板100接觸的接觸面C2。接觸面C2與接觸面B2為同一面,且與接觸面B2之間設有空間。並且,以貫穿支撐板31Ua、31Ub的方式,形成有複數個貫穿孔H。
The
支撐板31Ua的後端側係安裝有基台321U。藉由基台321U來閉塞貫穿孔H之後端側開口。在基台321U之與各後端側開口相對向之處,以貫穿基台321U的方式,設置有配線34。基台321U之面對支撐板31Ua之側的表面與露出該面之配線34的端面係成為同一面。該配線34的端面係設為電極34a。各貫穿孔H中插入有探針Pr。配線34係與檢查處理部8連接。如此一來,檢查處理部8係透過配線34及電極34a而與檢查輔助具3U的探針Pr連接。
A
第5圖係從上表面102側顯示重疊檢查輔助具3D之接觸面及探針Pr與基板100而顯示為了檢查而使檢查輔助具3D接觸於基板100之下表面101的狀態的說明圖。第6圖係從上表面102側顯示重疊檢查輔助具3U之接觸面及探針Pr與基板100而顯示為了檢查而使檢查輔助具3U接觸於基板100之上表面102的狀態的說明圖。
FIG. 5 is an explanatory diagram showing a state in which the
如第5圖所示,使檢查輔助具3D接觸到基
板100的下表面101時,接觸面B1就接觸於基板100之於上表面102設定有檢查點P2之區域的下表面101,且與基板100的下表面101的檢查點P1分離。相對於此,如第6圖所示,使檢查輔助具3U接觸到基板100的上表面102時,接觸面B2就會接觸於基板100之於下表面101設定有檢查點P1之區域的上表面102,且與上表面102的檢查點P2分離。
As shown in Fig. 5, the
依據檢查輔助具3D、3U,不加熱探針Pr,即能一邊從檢查點P1、P2的背側加熱包含檢查點P1、P2之基板的區域,一邊使探針Pr接觸檢查點P1、P2,因此,能降低探針被加熱所造成之檢查的影響,且能在加熱基板100而施加熱應力之同時進行基板100的檢查。如此一來,就能檢測出在常溫下的檢查中不易顯現的基板不良。再者,由於能使接觸面B1、B2直接接觸於基板100來加熱基板100,與先前技術般地使用預熱腔來加熱基板的情形相比較,能快速地加熱基板100,且提升將基板100加熱至設定溫度Tta的確實性。如此一來,能夠對檢查對象之基板施加熱應力之同時縮短檢查時間,且提升對基板施加熱應力的確實性。
According to the inspection aids 3D and 3U, the probes Pr can be brought into contact with the inspection points P1 and P2 while heating the region of the substrate including the inspection points P1 and P2 from the back side of the inspection points P1 and P2 without heating the probes Pr. Therefore, the influence of the inspection due to the heating of the probes can be reduced, and the inspection of the
再者,第5圖所示之接觸面B1係以接觸於未設有任何檢查點P1、P2之區域X的方式而設定其形狀。藉此,能將形成在基板1001之區域X的配線圖案等予以加熱,因此提升在區域X產生之不良的檢查精度。 In addition, the shape of the contact surface B1 shown in FIG. 5 is set so that it may contact the area|region X which does not have any inspection point P1, P2. Thereby, since the wiring pattern etc. formed in the area|region X of the board|substrate 1001 can be heated, the inspection precision of the defect which arises in the area|region X can be improved.
第7圖係顯示第1圖所示之檢查輔助具套組
2之另一例的說明圖。第7圖所示之檢查輔助具套組2’係組合加熱輔助具3D’及探針輔助具3U’所構成。加熱輔助具3D’係由加熱塊35D所構成。探針輔助具3U’係由探針塊30U所構成。探針輔助具3U’的探針Pr係例如藉由與基板321U同樣的電極34a及配線34而與檢查處理部8連接。如此構成的檢查輔助具套組2’可適宜地使用於檢查點僅設於一方之面側之基板的檢查。
Figure 7 shows the inspection aid set shown in Figure 1
2 is an explanatory diagram of another example. The inspection aid kit 2' shown in Fig. 7 is composed of a combination of a
此外,基板檢查裝置1也可為僅具有檢查部4U、4D中任一方的構成。即使僅有檢查部4U、4D中任一方,也能藉由檢查輔助具3U、3D中任一方來進行基板的檢查及加熱,所以能夠對檢查對象之基板施加熱應力之同時能縮短檢查時間。
In addition, the board|
再者,雖然顯示了用以加熱基板100之接觸面B1與用以支撐探針Pr之支撐塊31D的接觸面C1為分離的構成,然而,也可為例如藉由加熱接觸面C1而將探針塊30D兼用為加熱部的構成。即使是如此的構成,也能夠進行基板的檢查與加熱,因此能夠對檢查對象之基板施加熱應力之同時能縮短檢查時間。
Furthermore, although the contact surface B1 for heating the
接著,說明由檢查處理部8執行的基板檢查方法的一例。如以上所述,藉由溫度控制部9進行溫度控制,將接觸於基板100的金屬構件351D、351U加熱,以使基板100的溫度達到設定溫度Tta。但是,由於金屬構件351D、351U為金屬塊,所以熱容量較大。因此,要將加熱前的常溫(環境溫度)的金屬構件351D、351U加熱至設定溫
度Tta或其以上的溫度乃須要耗費時間。
Next, an example of a board inspection method performed by the inspection processing unit 8 will be described. As described above, the
再者,基板100也具有熱容量,且構成基板100的材料(例如環氧樹脂等)的熱傳導率比金屬構件351D、351U低。因此,從金屬構件351D、351U的溫度達到設定溫度Tta或其以上的溫度起,至基板100達到設定溫度Tta或其以上的溫度為止,乃會產生時間差。所以,為了於基板100達到設定溫度Tta之後進行檢查,一般地,在加熱器352進行之加熱開始之後,要等待基板100達到設定溫度Tta所需的充分長的時間,再執行檢查。但是,若等待如此長時間經過再開始檢查,則進行檢查就需要花費長時間。
Furthermore, the
對此,檢查處理部8係利用形成在基板100之配線圖案的電阻值R隨著溫度而改變的特性,於電阻值R達到與設定溫度Tta對應的目標電阻值Tra時開始檢查。藉此,能夠於基板100其本身溫度實際達到設定溫度Tta時快速進行檢查,與等待非常長的時間之後才開始檢查的情形相比較,能夠縮短檢查時間。再者,由於是在確認基板100其本身溫度實際達到設定溫度Tta之後進行檢查,所以會提升檢查時施加於基板100之熱應力的精度。
In contrast, the inspection processing unit 8 starts inspection when the resistance value R reaches the target resistance value Tra corresponding to the set temperature Tta by utilizing the characteristic that the resistance value R of the wiring pattern formed on the
此外,也可使用預測的基板100,預先實驗測量加熱器352的加熱開始起至電阻值R達到目標電阻值Tra為止的時間,設為等待時間,並將該等待時間預先記憶在記憶裝置,在實際的基板100的檢查中,在加熱器352的加熱開始起經過預先測量的等待時間之後,依據從接觸
各檢查點之各探針所獲得之電氣信號來執行檢查。
In addition, using the predicted
再者,連續檢查複數個基板100時,例如檢查連結有複數個基板100而成的配組基板時,在第二個以後的檢查中,由於檢查輔助具3U、3D已經被加熱,所以從開始加熱起(使檢查輔助具3U、3D接觸於基板100起)至基板100的溫度達到設定溫度Tta的時間變短。如此一來,也可預先實驗測量第二個以後的檢查之際的等待時間,與上述同樣地分別設為等待時間,而因應該各等待時間,使第二個以後的檢查的等待時間改變。
Furthermore, when a plurality of
具體地,檢查處理部8係以如下的方式執行基板100的檢查。第8圖係用以說明基板檢查方法的說明圖。首先,預先從設定於基板100之複數個檢查點P1或P2之中選擇在配線圖案相互電性連接之一對的特定檢查點Px、Py,而預先設定特定檢查點Px、Py。
Specifically, the inspection processing unit 8 performs inspection of the
第9、10圖係用以說明基板檢查方法之一例的流程圖。檢查處理部8係使檢查輔助具3U、3D的接觸面B1、B2、C1、C2接觸於基板100,並使各探針Pr接觸於各檢查點P1、P2(步驟S1)。
FIGS. 9 and 10 are flowcharts for explaining an example of a substrate inspection method. The inspection processing unit 8 brings the contact surfaces B1 , B2 , C1 , and C2 of the inspection aids 3U, 3D into contact with the
其次,檢查處理部8係取得溫度感測器353的檢測溫度t作為低溫時溫度TLo(步驟S2)。此時,可使用各溫度感測器353中任一檢測溫度,也可使用各溫度感測器353之檢測溫度的平均值等。
Next, the inspection processing unit 8 acquires the detected temperature t of the
接著,檢查處理部8係取得特定檢查點Px、Py之間的電阻值R作為低溫時電阻值RLo(步驟S3)。電阻 值R係藉由測量在接觸於特定檢查點Px、Py之一對探針Pr之間流通電流而產生於該一對探針Pr之間的電壓,以該電壓值除以該電流值來求得。 Next, the inspection processing unit 8 acquires the resistance value R between the specific inspection points Px and Py as the low temperature resistance value RLo (step S3 ). resistance The value R is obtained by dividing the voltage value by the current value by measuring the voltage between the pair of probes Pr generated by passing a current between the pair of probes Pr in contact with the specific inspection point Px, Py. have to.
此外,於電阻值R的測量中,藉由所謂的四端子法來進行電阻測量,因能以良好精度進行電阻測量而較佳。具體上,使電流供給用的探針Pr及電壓測量用的探針Pr接觸特定檢查點Px,並且也使電流供給用的探針Pr及電壓測量用的探針Pr接觸特定檢查點Py,於一對電流供給用探針Pr之間流通電流,並測量一對電壓測量用的探針Pr之間產生的電壓,以該電壓值除以該電流值來求得電阻值R為較佳。 In addition, in the measurement of the resistance value R, it is preferable to perform the resistance measurement by the so-called four-terminal method because the resistance measurement can be performed with good accuracy. Specifically, the current supply probe Pr and the voltage measurement probe Pr are brought into contact with the specific inspection point Px, and the current supply probe Pr and the voltage measurement probe Pr are also brought into contact with the specific inspection point Py. A current flows between the pair of current supply probes Pr, and the voltage generated between the pair of voltage measurement probes Pr is measured, and the resistance value R is preferably obtained by dividing the voltage value by the current value.
其次,檢查處理部8係對溫度控制部9輸出控制信號,使加熱器352發熱,藉由加熱金屬構件351D、351U來加熱基板100(步驟S4)。
Next, the inspection processing unit 8 outputs a control signal to the
接著,檢查處理部8係與步驟S2、S3同樣地動作,取得溫度感測器353的檢測溫度t作為高溫時溫度THi(步驟S5),並取得特定檢查點Px、Py之間的電阻值R作為高溫時電阻RHi(步驟S6)。
Next, the inspection processing unit 8 operates in the same manner as in steps S2 and S3, acquires the detected temperature t of the
其次,檢查處理部8係依據低溫時溫度TLo、低溫時電阻RLo、高溫時溫度THi、以及高溫時電阻RHi,算出溫度係數Tc(步驟S7)。具體而言,檢查處理部8可依據下述式(1)算出溫度係數Tc。 Next, the inspection processing unit 8 calculates the temperature coefficient Tc based on the low temperature temperature TLo, the low temperature resistance RLo, the high temperature temperature THi, and the high temperature resistance RHi (step S7). Specifically, the inspection processing unit 8 can calculate the temperature coefficient Tc according to the following formula (1).
溫度係數Tc=[(RHi-RLo)/RLo]/(THi-TLo)…(1) Temperature coefficient Tc=[(RHi-RLo)/RLo]/(THi-TLo)…(1)
接著,檢查處理部8係依據低溫時溫度
TLo、低溫時電阻RLo、以及溫度係數Tc,算出基板100達到設定溫度Tta時的目標電阻值Rta(步驟S8)。具體而言,檢查處理部8可依據下述式(2)算出目標電阻值Rta。
Next, the inspection processing unit 8 is based on the low temperature
TLo, the resistance at low temperature RLo, and the temperature coefficient Tc, and the target resistance value Rta when the
目標電阻值Rta=RLo{[(Tta-TLo)/Tc]+1}…(2) Target resistance value Rta=RLo{[(Tta-TLo)/Tc]+1}…(2)
其次,檢查處理部8係以與上述同樣的方法,測量特定檢查點Px、Py之間的電阻值R(步驟S11:電阻測量步驟)。 Next, the inspection processing unit 8 measures the resistance value R between the specific inspection points Px and Py in the same manner as described above (step S11 : resistance measurement step).
接著,檢查處理部8係將步驟S11所測量的電阻值R與電阻判定值Rj作比較(步驟S12)。電阻判定值Rj係用以判定特定檢查點Px、Py之間的配線圖案之良否的電阻值,設定有假設例如斷線、線變細而使電阻值增大等的情形下的特定檢查點Px、Py之間的電阻值,而預先設定遠大於目標電阻值Rta的值作為電阻判定值Rj。 Next, the inspection processing unit 8 compares the resistance value R measured in step S11 with the resistance judgment value Rj (step S12 ). The resistance judgment value Rj is a resistance value for judging whether the wiring pattern between the specific inspection points Px and Py is good or not, and the specific inspection point Px is set in the case where the resistance value increases, for example, in the case of disconnection or thinning of the wire. The resistance value between , Py, and a value much larger than the target resistance value Rta is preset as the resistance judgment value Rj.
若電阻值R超過了電阻判定值Rj(步驟S12中為「是」),檢查處理部8係判定特定檢查點Px、Py之間的配線圖案為不良,亦即基板100為不良(步驟S13),並結束處理。如此一來,由於特定檢查點Px、Py之間的配線圖案為不良而成為目標電阻值Rta以上的電阻值時,即使基板100的溫度尚未達到設定溫度Tta以上,亦能降低執行步驟S15的良否判定的不確定性。
If the resistance value R exceeds the resistance determination value Rj (YES in step S12 ), the inspection processing unit 8 determines that the wiring pattern between the specific inspection points Px and Py is defective, that is, the
其次,檢查處理部8係將步驟S11所測量的電阻值R與目標電阻值Rta作比較(步驟S14)。若電阻值R未達目標電阻值Rta(步驟S14中為「否」),就再次反覆步驟S11至S14,並待機至電阻值R達到目標電阻值Rta以 上。 Next, the inspection processing unit 8 compares the resistance value R measured in step S11 with the target resistance value Rta (step S14). If the resistance value R does not reach the target resistance value Rta (NO in step S14 ), steps S11 to S14 are repeated again, and wait until the resistance value R reaches the target resistance value Rta or more superior.
相對於此,若電阻值R達到目標電阻值Rta以上(步驟S14中為「是」:檢查開始判定步驟),由於成為基板100的溫度達到設定溫度Tta以上,依據從各探針獲得的電氣信號來進行基板100的良否判定,開始基板100的檢查(步驟S15)。
On the other hand, if the resistance value R becomes equal to or higher than the target resistance value Rta (YES in step S14: the inspection start determination step), since the temperature of the
此外,即使不執行步驟S12、S13,特定檢查點Px、Py之間的配線發生了斷線等不良的情形時,由於在步驟S15應可檢測出其不良,因此也可設為不執行步驟S12、S13的構成。 In addition, even if steps S12 and S13 are not executed, if a defect such as disconnection occurs in the wiring between the specific check points Px and Py, since the defect should be detected in step S15, step S12 may not be executed. , The composition of S13.
此外,步驟S1~S8不限定於基板檢查時執行的例子。例如,也可使用預測的基板100,實驗性地執行步驟S1~S8,求得目標電阻值Rta。並且,也可將如此方式獲得的目標電阻值Rta先記憶到記憶裝置,於實際檢查基板100之際,依據記憶在其記憶裝置的目標電阻值Rta來執行步驟S1、S4、S11~S15的構成。
In addition, steps S1-S8 are not limited to the example performed at the time of board|substrate inspection. For example, steps S1 to S8 may be performed experimentally using the predicted
3D‧‧‧檢查輔助具 3D‧‧‧Inspection Aids
30D‧‧‧探針塊 30D‧‧‧Probe Block
31D‧‧‧支撐塊 31D‧‧‧Support block
31Da、31Db‧‧‧支撐板 31Da, 31Db‧‧‧Support Plate
34‧‧‧配線 34‧‧‧Wiring
34a‧‧‧電極 34a‧‧‧electrode
35D‧‧‧加熱塊(加熱部) 35D‧‧‧heating block (heating part)
36‧‧‧隔熱構件 36‧‧‧Insulation components
37‧‧‧支柱 37‧‧‧Pillar
321D‧‧‧基台 321D‧‧‧Abutment
351D‧‧‧金屬構件 351D‧‧‧Metal components
352‧‧‧加熱器 352‧‧‧Heater
353‧‧‧溫度感測器 353‧‧‧Temperature sensor
B1‧‧‧接觸面 B1‧‧‧contact surface
C1‧‧‧接觸面 C1‧‧‧contact surface
H‧‧‧貫穿孔 H‧‧‧Through Hole
Pr‧‧‧探針 Pr‧‧‧Probe
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2016-024330 | 2016-02-12 | ||
JP2016024330A JP6682895B2 (en) | 2016-02-12 | 2016-02-12 | Inspection jig, inspection jig set, and board inspection device |
Publications (2)
Publication Number | Publication Date |
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TW201740121A TW201740121A (en) | 2017-11-16 |
TWI752928B true TWI752928B (en) | 2022-01-21 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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TW110131479A TWI780874B (en) | 2016-02-12 | 2016-12-14 | Inspection jig, inspection jig set, and substrate inspecting apparatus |
TW105141391A TWI752928B (en) | 2016-02-12 | 2016-12-14 | Inspection jig, inspection jig set, and substrate inspecting apparatus |
Family Applications Before (1)
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TW110131479A TWI780874B (en) | 2016-02-12 | 2016-12-14 | Inspection jig, inspection jig set, and substrate inspecting apparatus |
Country Status (3)
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JP (1) | JP6682895B2 (en) |
TW (2) | TWI780874B (en) |
WO (1) | WO2017138380A1 (en) |
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JP7215206B2 (en) * | 2019-02-19 | 2023-01-31 | 富士電機株式会社 | Semiconductor device manufacturing method |
CN110155645A (en) * | 2019-04-28 | 2019-08-23 | 苏州峘一自动化有限公司 | Automatic detection system |
US11378619B2 (en) * | 2019-12-18 | 2022-07-05 | Formfactor, Inc. | Double-sided probe systems with thermal control systems and related methods |
CN114397560A (en) | 2022-01-24 | 2022-04-26 | 环旭电子股份有限公司 | Electric property detection device of test carrier plate |
US12066514B2 (en) * | 2022-08-09 | 2024-08-20 | Cirrus Logic, Inc. | Integrated thin-film resistive sensor with integrated heater and metal layer thermal equalizer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI305840B (en) * | 2005-09-01 | 2009-02-01 | Nippon Mektron Kk | |
JP2011174863A (en) * | 2010-02-25 | 2011-09-08 | Tatsumo Kk | Method of inspecting printed circuit board used for electronic devices and inspection device used therefor |
WO2014207894A1 (en) * | 2013-06-28 | 2014-12-31 | 株式会社メイコー | Inspection jig, and printed board inspection system employing the inspection jig |
Family Cites Families (2)
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JP5097046B2 (en) * | 2008-08-01 | 2012-12-12 | エスペック株式会社 | Semiconductor device reliability evaluation method and semiconductor device reliability evaluation apparatus |
JP2014211412A (en) * | 2013-04-22 | 2014-11-13 | 三菱電機株式会社 | Device and method for inspecting printed wiring board |
-
2016
- 2016-02-12 JP JP2016024330A patent/JP6682895B2/en active Active
- 2016-12-14 TW TW110131479A patent/TWI780874B/en active
- 2016-12-14 TW TW105141391A patent/TWI752928B/en active
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI305840B (en) * | 2005-09-01 | 2009-02-01 | Nippon Mektron Kk | |
JP2011174863A (en) * | 2010-02-25 | 2011-09-08 | Tatsumo Kk | Method of inspecting printed circuit board used for electronic devices and inspection device used therefor |
WO2014207894A1 (en) * | 2013-06-28 | 2014-12-31 | 株式会社メイコー | Inspection jig, and printed board inspection system employing the inspection jig |
Also Published As
Publication number | Publication date |
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TW202201017A (en) | 2022-01-01 |
TW201740121A (en) | 2017-11-16 |
JP6682895B2 (en) | 2020-04-15 |
TWI780874B (en) | 2022-10-11 |
JP2017142189A (en) | 2017-08-17 |
WO2017138380A1 (en) | 2017-08-17 |
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