TW201729928A - Laser soldering repair process, laser soldering process and laser soldering system - Google Patents

Laser soldering repair process, laser soldering process and laser soldering system Download PDF

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TW201729928A
TW201729928A TW105129929A TW105129929A TW201729928A TW 201729928 A TW201729928 A TW 201729928A TW 105129929 A TW105129929 A TW 105129929A TW 105129929 A TW105129929 A TW 105129929A TW 201729928 A TW201729928 A TW 201729928A
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laser
laser beam
welding
soldering
substrate
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TWI664042B (en
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鄭大鎬
鄭泰吾
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Eo科技股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/492Bases or plates or solder therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
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  • Optics & Photonics (AREA)
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  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Laser Beam Processing (AREA)

Abstract

A laser soldering repairing process, a laser soldering process, and a laser soldering system are provided. The laser soldering repairing process is performed by using laser in a repair area not having undergone a soldering process from among a soldering region on a substrate. The laser soldering repairing process includes the operation of performing a laser cleaning process by radiating a cleaning laser beam to the repair area of the substrate, the operation of providing solder balls on a cleaned repair area of the substrate, and heating the solder balls with a soldering laser beam and attaching the solder balls to the repair area.

Description

雷射焊接修復製程、雷射焊接製程和雷射焊接系統Laser welding repair process, laser welding process and laser welding system

本發明是有關於一種雷射焊接,詳細而言,是有關於一種雷射焊接修復製程、包括其的雷射焊接製程及雷射焊接系統。This invention relates to a laser welding process and, in particular, to a laser welding repair process, a laser welding process therewith and a laser welding system.

通常,於半導體製程中,進行利用焊料(solder)於如印刷電路板(Printed Circuit Board,PCB)等的基板上接合半導體晶片的製程。此種製程可包括焊接製程,上述焊接製程是於在基板的特定位置印刷包括錫成分的焊球(solder ball)後,藉由高溫加熱上述焊球而使上述焊球附著至基板。此種焊接製程通常稱為回流焊製程(reflow soldering process),其廣泛地應用於所有產業。先前使用利用熱的焊接裝置,但此種裝置具有尺寸較大且所需的焊接製程時間較多的問題。因此,作為解決上述問題的方案,最近正在開發一種利用雷射的焊接裝置。利用雷射的焊接裝置可將雷射束聚光至基板的較窄的區域而使尺寸較小的焊球熔融,可利用少於利用熱的方式的輸出執行製程。另外,可利用雷射束的高能量於短時間內熔融焊球。Generally, in a semiconductor process, a process of bonding a semiconductor wafer using a solder on a substrate such as a printed circuit board (PCB) is performed. Such a process may include a soldering process in which the solder ball is attached to the substrate by heating the solder ball at a high temperature after printing a solder ball including a tin component at a specific position of the substrate. Such a soldering process is commonly referred to as a reflow soldering process, which is widely used in all industries. Previously, welding devices using heat have been used, but such devices have problems of large size and required welding time. Therefore, as a solution to the above problem, a welding device using a laser has recently been developed. The laser welding device can be used to condense the laser beam to a narrow area of the substrate to melt the smaller size solder balls, and the process can be performed with less than the output using heat. In addition, the high energy of the laser beam can be used to melt the solder balls in a short time.

於利用雷射進行焊接製程後,會產生未能對基板的一部分區域執行焊接製程的情形。因此,為了解決上述問題,需執行雷射焊接修復製程,即於在基板中的需進行修復的區域印刷焊球後,利用雷射再次執行焊接製程的製程。然而,由於分離地執行雷射焊接製程與雷射焊接製程,因此於第一次執行雷射焊接製程後搬運或保管基板的情形時,存在污染物質附著至基板的表面之虞。因此,若於在基板上附著有污染物質的狀態下執行雷射焊接修復製程,則存在污染物質作為可燃物質發揮作用而於發射雷射束時產生燃燒(burn)或爆炸(explosion)現象的可能性。為了解決此種基板的污染問題,可於執行雷射焊接修復製程前,藉由超音波清洗(ultrasonic cleaning)而去除污染物質,但這會增加新的製程,因此存在所需時間或費用增加的問題。After the laser is used for the soldering process, a soldering process may not be performed on a part of the substrate. Therefore, in order to solve the above problem, it is necessary to perform a laser solder repair process, that is, after printing a solder ball in an area of the substrate to be repaired, the process of the soldering process is performed again by using a laser. However, since the laser welding process and the laser welding process are separately performed, when the substrate is transported or stored after the first laser welding process is performed, there is a possibility that the contaminant adheres to the surface of the substrate. Therefore, if the laser welding repair process is performed in a state in which a contaminant is adhered to the substrate, there is a possibility that a contaminant acts as a combustible substance to cause a burn or explosion phenomenon when the laser beam is emitted. Sex. In order to solve the contamination problem of such a substrate, the pollutants can be removed by ultrasonic cleaning before performing the laser welding repair process, but this will increase the new process, so there is a problem that the time or cost increases. .

[發明欲解決的課題][Question to be solved by the invention]

根據本發明的一實施例,提供一種雷射焊接修復製程、包括其的雷射焊接製程及雷射焊接系統。In accordance with an embodiment of the present invention, a laser welding repair process, a laser welding process including the same, and a laser welding system are provided.

[解決課題的手段][Means for solving the problem]

於本發明的一態樣中, 提供一種雷射焊接修復製程,其是藉由對基板上的焊接區域中的未執行焊接製程的修復區域使用雷射來執行修復製程,上述雷射焊接修復製程包括如下步驟: 向上述基板的修復區域照射清洗雷射束而執行雷射清洗製程的步驟; 於上述基板的經清洗的修復區域設置焊球(solder ball)的步驟;及 向上述焊球照射焊接雷射束,藉此對上述焊球進行加熱而使上述焊球附著至上述修復區域的步驟。In one aspect of the present invention, a laser solder repair process is provided for performing a repair process by using a laser for a repair region in a soldering region on a substrate that is not subjected to a soldering process, the laser solder repair process The method includes the following steps: a step of performing a laser cleaning process by irradiating a repairing region of the substrate with a cleaning laser beam; a step of providing a solder ball in the cleaned repairing region of the substrate; and irradiating the solder ball with the solder ball The laser beam is used to heat the solder ball to adhere the solder ball to the repairing region.

於對上述基板的修復區域執行雷射清洗製程後,可包括塗佈助焊劑(flux)的步驟。另外,於利用上述焊接雷射束將上述焊球附著至上述修復區域後,可更包括對上述基板執行水洗製程的步驟。After the laser cleaning process is performed on the repaired region of the substrate, a step of applying a flux may be included. In addition, after the solder ball is attached to the repairing region by using the solder beam, the step of performing a water washing process on the substrate may be further included.

上述清洗雷射束及上述焊接雷射束可具有相同的波長。例如,上述清洗雷射束及上述焊接雷射束可具有近紅外線範圍的波長。作為具體例,上述清洗雷射束及上述焊接雷射束可具有915 nm的波長。The cleaning laser beam and the welding laser beam described above may have the same wavelength. For example, the cleaning laser beam and the welding laser beam described above may have wavelengths in the near infrared range. As a specific example, the cleaning laser beam and the welding laser beam described above may have a wavelength of 915 nm.

上述清洗雷射束可具有小於上述焊接雷射束的輸出。例如,上述清洗雷射束及上述焊接雷射束可分別具有2 W及5 W的輸出。The cleaning laser beam described above may have an output that is less than the welding beam described above. For example, the cleaning laser beam and the welding laser beam described above may have outputs of 2 W and 5 W, respectively.

可將上述清洗雷射束及上述焊接雷射束散焦而照射至上述修復區域。The cleaning laser beam and the welding laser beam may be defocused and irradiated to the repairing area.

於另一態樣中, 提供一種雷射焊接製程,其包括如下步驟: 對基板上的焊接區域執行第一焊接製程的步驟; 對基板上的焊接區域中的未執行焊接製程的修復區域執行雷射清洗製程的步驟;及 對上述基板的經清洗的修復區域執行第二焊接製程的步驟。In another aspect, a laser soldering process is provided, comprising the steps of: performing a first soldering process on a soldering region on a substrate; performing a lightning on a repairing region in a soldering region on the substrate that is not performing a soldering process a step of injecting a cleaning process; and performing a second soldering process on the cleaned repair region of the substrate.

上述第一焊接製程可包括如下步驟:於上述基板上的焊接區域設置焊球的步驟;及向上述焊球照射焊接雷射束而進行加熱,藉此將上述焊球附著至上述焊接區域的步驟。The first soldering process may include the steps of: providing a solder ball on a soldering region on the substrate; and heating the solder ball to the solder ball to heat the solder ball, thereby attaching the solder ball to the soldering region .

可藉由向上述基板的修復區域照射清洗雷射束而執行上述雷射清洗製程。The laser cleaning process described above can be performed by irradiating the repaired area of the substrate with a cleaning laser beam.

上述第二焊接製程可包括如下步驟:於上述基板上的經清洗的修復區域設置焊球的步驟;及向上述焊球照射焊接雷射束而進行加熱,藉此將上述焊球附著至上述修復區域的步驟。The second soldering process may include the steps of: providing a solder ball on the cleaned repaired area on the substrate; and heating the solder ball by irradiating the soldering beam, thereby attaching the solder ball to the repairing The steps of the area.

於上述第二焊接製程後,可更包括對上述基板執行水洗製程的步驟。After the second soldering process, the step of performing a water washing process on the substrate may be further included.

上述清洗雷射束及上述焊接雷射束可具有相同的波長。上述清洗雷射束可具有小於上述焊接雷射束的輸出。可將上述清洗雷射束及上述焊接雷射束散焦而照射。The cleaning laser beam and the welding laser beam described above may have the same wavelength. The cleaning laser beam described above may have an output that is less than the welding beam described above. The cleaning laser beam and the welding laser beam may be defocused and irradiated.

於又一態樣中, 提供一種雷射焊接系統,其是利用焊接雷射束對基板的焊接區域執行焊接製程,且對上述基板的焊接區域中的未執行上述焊接製程的修復區域執行雷射焊接修復製程,上述雷射焊接系統包括: 焊球供給單元,向上述基板的焊接區域提供焊球;及 雷射照射裝置,將上述焊接雷射束照射至上述焊球,且將上述清洗雷射束照射至上述基板的修復區域。In another aspect, a laser welding system is provided, wherein a welding process is performed on a soldering region of a substrate by using a welding laser beam, and a laser is performed on a repairing region in the soldering region of the substrate that is not subjected to the soldering process. a solder repairing process, the laser soldering system comprising: a solder ball supply unit that supplies solder balls to a soldering area of the substrate; and a laser irradiation device that irradiates the solder beam to the solder ball and the cleaning laser The beam is irradiated to the repaired area of the above substrate.

上述雷射焊接系統可更包括於上述基板的焊接區域塗佈助焊劑的助焊劑塗佈單元。另外,上述雷射焊接系統可更包括向上述基板供給洗淨用水而執行水洗製程的洗淨用水供給單元。The above laser welding system may further include a flux coating unit that applies a flux to a soldering region of the above substrate. Further, the above-described laser welding system may further include a washing water supply unit that supplies washing water to the substrate to perform a water washing process.

[發明效果][Effect of the invention]

根據本發明的實施例,首先利用雷射對未執行焊接製程的基板的修復區域執行清洗製程,之後對經清洗的修復區域進行焊接作業。藉此,可有效地去除可能存在於基板的修復區域的異物等,其結果,可防止會因異物的污染而產生的燃燒(burn)現象或爆炸現象。並且,藉由利用雷射執行清洗製程,可減少清洗製程所需的時間或費用。另外,可不設置另外的清洗設備而由同一雷射光源產生清洗雷射束及焊接雷射束,因此可更簡單地構成雷射焊接系統。According to an embodiment of the present invention, a cleaning process is first performed on a repaired region of a substrate on which a soldering process is not performed using a laser, and then a soldering operation is performed on the cleaned repaired region. Thereby, foreign matter or the like which may exist in the repairing region of the substrate can be effectively removed, and as a result, a burn phenomenon or an explosion phenomenon due to contamination of foreign matter can be prevented. Moreover, by performing a cleaning process using a laser, the time or cost required for the cleaning process can be reduced. In addition, the cleaning laser beam and the welding laser beam can be generated by the same laser light source without providing an additional cleaning device, so that the laser welding system can be constructed more simply.

以下,參照隨附圖式,詳細地對本發明的實施例進行說明。以下所例示的實施例並不限定本發明的範圍,而是為了向於本技術領域內具有常識者說明本發明而提供。於圖中,相同的參照符號表示相同的構成要素,為了說明的明確性,可誇張地表示各構成要素的尺寸或厚度。並且,於說明為特定的物質層存在於基板或其他層時,上述物質層能夠以與基板或其他層直接相接的方式存在,亦可於上述物質層與基板或其他層之間存在其他第三層。另外,於以下的實施例中,構成各層的物質僅為示例,因此亦可使用除此之外的其他物質。Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The examples exemplified below are not intended to limit the scope of the invention, but are provided to illustrate the invention to those skilled in the art. In the drawings, the same reference numerals are given to the same components, and the size or thickness of each component can be exaggerated for clarity of description. Further, when it is described that a specific substance layer exists on a substrate or another layer, the substance layer may exist in direct contact with the substrate or other layers, or may exist between the substance layer and the substrate or other layers. Three floors. Further, in the following examples, the substances constituting each layer are merely examples, and other materials may be used.

圖1A至圖1D是表示通常的雷射焊接修復製程的圖。1A to 1D are views showing a general laser welding repairing process.

於圖1A中,表示有已於基板W上執行焊接製程的情況。於基板W設置有焊接區域,此種焊接區域包括焊墊50,藉由利用雷射的焊接製程而於上述焊墊50上附著焊料(solder)60。即,可藉由上述焊接製程而於位於基板W的焊接區域的焊墊50上附著焊料60。另一方面,會產生藉由焊接製程亦無法於基板W的焊接區域中的一部分區域附著焊料60的情形,此種區域會成為之後需進行焊接修復的修復區域65。In Fig. 1A, there is shown a case where a soldering process has been performed on the substrate W. A soldering region is provided on the substrate W. The soldering region includes a bonding pad 50 to which a solder 60 is attached by a laser soldering process. That is, the solder 60 can be attached to the pad 50 located in the soldering region of the substrate W by the soldering process described above. On the other hand, there is a case where the solder 60 cannot be attached to a part of the soldering region of the substrate W by the soldering process, and such a region becomes a repair region 65 to be subjected to solder repair later.

為了對基板W的修復區域65執行焊接修復製程,首先如圖1B所示般於基板W的修復區域65設置焊球61,之後如圖1C所示般向焊球61照射焊接雷射束L而進行加熱。藉此,如圖1D所示,會於位於基板W的修復區域65的焊墊50上附著焊料60。In order to perform the solder repair process on the repair region 65 of the substrate W, first, as shown in FIG. 1B, the solder ball 61 is disposed on the repair region 65 of the substrate W, and then the solder ball L is irradiated to the solder ball 61 as shown in FIG. 1C. Heat up. Thereby, as shown in FIG. 1D, the solder 60 is attached to the pad 50 located on the repair region 65 of the substrate W.

然而,於如上所述的製程中,於在執行焊接製程後,在執行雷射焊接修復製程前搬運或保管基板W的情形時,存在基板W的修復區域65被異物污染之虞。如上所述,若於在基板W的修復區域65附著有異物的狀態下執行利用雷射的焊接修復製程,則存在污染物質發揮可燃物質的作用而產生燃燒(burn)現象或爆炸(explosion)現象的可能性。However, in the above-described manufacturing process, when the substrate W is transported or stored before the laser soldering repair process is performed after the soldering process is performed, there is a possibility that the repaired region 65 of the substrate W is contaminated by foreign matter. As described above, when the welding repair process using the laser is performed in a state in which the foreign matter adheres to the repair region 65 of the substrate W, the contaminated substance acts as a combustible substance to cause a burn phenomenon or an explosion phenomenon. The possibility.

圖2A至圖2E是表示本發明的例示性的實施例的雷射焊接修復製程的圖。2A through 2E are views showing a laser welding repair process of an exemplary embodiment of the present invention.

參照圖2A,表示有已對基板W執行焊接製程的情況。此處,基板W例如可包括印刷電路板(Printed Circuit Board,PCB)等。於基板W設置有焊接區域,此種焊接區域包括焊墊50,其藉由利用雷射的焊接製程而於上述焊墊50上附著焊料60。藉此,可藉由焊接製程而於基板的焊墊50附著焊料60。另一方面,藉由焊接製程而亦會無法於基板W的焊接區域中的一部分區域附著焊料60,此種區域會成為需於之後的製程中進行焊接修復的修復區域65。Referring to Fig. 2A, there is shown a case where a soldering process has been performed on the substrate W. Here, the substrate W may include, for example, a printed circuit board (PCB) or the like. A soldering region is provided on the substrate W. The soldering region includes a bonding pad 50 to which the solder 60 is attached by the soldering process using a laser. Thereby, the solder 60 can be attached to the pad 50 of the substrate by a soldering process. On the other hand, the solder 60 may not be attached to a part of the soldering region of the substrate W by the soldering process, and such a region may become a repair region 65 to be repaired by soldering in a subsequent process.

參照圖2B,對基板W的修復區域65執行雷射清洗製程。可藉由將清洗雷射束L'散焦照射至基板W的修復區域65而執行此種雷射清洗製程。此處,清洗雷射束L'例如可具有近紅外線範圍的波長。作為具體例,上述清洗雷射束及上述焊接雷射束可具有大致915 nm的波長。然而,並不限定於此。Referring to FIG. 2B, a laser cleaning process is performed on the repair region 65 of the substrate W. Such a laser cleaning process can be performed by defocusing the cleaning laser beam L' to the repairing region 65 of the substrate W. Here, the cleaning laser beam L' may have, for example, a wavelength in the near infrared range. As a specific example, the cleaning laser beam and the welding laser beam may have a wavelength of approximately 915 nm. However, it is not limited to this.

另外,清洗雷射束L'可具有小於下文將述的焊接雷射束L的輸出。例如,清洗雷射束L'可具有大致2 W的輸出,但並不限定於此。可將此種清洗雷射束L'散焦而照射至基板W的修復區域。例如,清洗雷射束L'的散焦距離(圖7D的d2)可大致為15 mm左右,但並不限定於此。Additionally, the cleaning laser beam L' may have an output that is less than the welding laser beam L to be described later. For example, the cleaning laser beam L' may have an output of approximately 2 W, but is not limited thereto. Such a cleaning laser beam L' can be defocused and irradiated to the repaired area of the substrate W. For example, the defocus distance (d2 of FIG. 7D) of the cleaning laser beam L' may be approximately 15 mm, but is not limited thereto.

如上所述,若將具有特定波長及輸出的清洗雷射束L'散焦而照射至基板W的修復區域65,則可去除可能存在於修復區域65的異物等。As described above, when the cleaning laser beam L' having a specific wavelength and output is defocused and irradiated to the repairing region 65 of the substrate W, foreign matter or the like which may exist in the repairing region 65 can be removed.

參照圖2C,於位於藉由上述雷射清洗製程而得到清洗的基板W的修復區域65的焊墊50上設置焊球61。此種焊球61例如可包括Sn成分。另一方面,為了防止藉由下文將述的焊接雷射束L加熱而熔融的焊球61氧化,可更執行於焊墊50上塗佈助焊劑(flux,未圖示出)的步驟。Referring to Fig. 2C, a solder ball 61 is provided on the pad 50 of the repair region 65 of the substrate W which is cleaned by the above-described laser cleaning process. Such a solder ball 61 may include, for example, a Sn component. On the other hand, in order to prevent oxidation of the solder ball 61 which is melted by heating the welding laser beam L which will be described later, a step of applying a flux (not shown) on the pad 50 may be further performed.

參照圖2D,對設置於基板W的修復區域65的焊球61照射焊接雷射束L而進行加熱。以此方式加熱的焊球61熔融而附著至基板W的修復區域65的焊墊50上,藉此形成焊料60。此處,用以加熱焊球61的焊接雷射束L可具有與上述清洗雷射束L'相同的波長。具體而言,焊接雷射束L可具有近紅外線範圍的波長。例如,清洗雷射束L'可具有大致915 nm的波長,但並不限定於此。Referring to Fig. 2D, the solder ball 61 provided in the repair region 65 of the substrate W is irradiated with the welding laser beam L to be heated. The solder ball 61 heated in this manner is melted and adhered to the pad 50 of the repair region 65 of the substrate W, thereby forming the solder 60. Here, the welding laser beam L for heating the solder balls 61 may have the same wavelength as the above-described cleaning laser beam L'. In particular, the welding laser beam L can have a wavelength in the near infrared range. For example, the cleaning laser beam L' may have a wavelength of approximately 915 nm, but is not limited thereto.

焊接雷射束L可具有高於清洗雷射束L'的輸出。例如,於清洗雷射束L'具有大致2 W的輸出的情形時,焊接雷射束L可具有大致5 W的輸出,但並非必須限定於此。The welding laser beam L may have an output higher than the cleaning laser beam L'. For example, in the case where the cleaning laser beam L' has an output of approximately 2 W, the welding laser beam L may have an output of approximately 5 W, but is not necessarily limited thereto.

焊接雷射束L可與清洗雷射束L'相同地散焦而照射至焊球61。此處,焊接雷射束L的散焦距離(圖7B的d1)可小於清洗雷射束L'的散焦距離(圖7D的d2)。例如,於清洗雷射束L'的散焦距離d2大致為15 mm的情形時,焊接雷射束L的散焦距離d1可大致為4 mm左右,但並不限定於此。The welding laser beam L can be defocused and irradiated to the solder ball 61 in the same manner as the cleaning laser beam L'. Here, the defocus distance of the welding laser beam L (d1 of FIG. 7B) may be smaller than the defocusing distance of the cleaning laser beam L' (d2 of FIG. 7D). For example, when the defocusing distance d2 of the cleaning laser beam L' is approximately 15 mm, the defocusing distance d1 of the welding laser beam L may be approximately 4 mm, but is not limited thereto.

如上所述,若將具有特定波長及輸出的焊接雷射束L散焦而照射至焊球61,則焊球61因加熱而熔融,從而如圖2e所示般附著至位於基板W的修復區域65的焊墊50上而形成焊料60。另一方面,參照圖2e,可於基板W上更執行水洗製程。於水洗製程中,向基板W噴射洗淨用水,藉此可利用洗淨用水去除殘留於基板W上的助焊劑或異物等。As described above, when the welding laser beam L having a specific wavelength and output is defocused and irradiated to the solder ball 61, the solder ball 61 is melted by heating, and is attached to the repairing region of the substrate W as shown in FIG. 2e. Solder 60 is formed on pad 50 of 65. On the other hand, referring to FIG. 2e, the water washing process can be further performed on the substrate W. In the water washing process, the washing water is sprayed onto the substrate W, whereby the flux or the foreign matter remaining on the substrate W can be removed by the washing water.

根據本發明例示性的實施例,首先利用雷射對未執行焊接製程的基板W的修復區域65執行清洗製程,之後對經清洗的修復區域65進行焊接作業。藉此,可有效地去除可能存在於基板W的修復區域65的異物等,其結果,可防止會因異物的污染而產生的燃燒(burn)現象或爆炸現象。並且,藉由利用雷射執行清洗製程,可減少清洗製程所需的時間或費用。另外,如下所述,可不設置另外的清洗設備而由同一雷射光源產生清洗雷射束L'及焊接雷射束L,因此可更簡單地構成雷射焊接系統。According to an exemplary embodiment of the present invention, a cleaning process is first performed on the repair region 65 of the substrate W on which the soldering process is not performed using a laser, and then the soldered repair region 65 is subjected to a soldering operation. Thereby, foreign matter or the like which may exist in the repair region 65 of the substrate W can be effectively removed, and as a result, a burn phenomenon or an explosion phenomenon due to contamination of foreign matter can be prevented. Moreover, by performing a cleaning process using a laser, the time or cost required for the cleaning process can be reduced. Further, as described below, the cleaning laser beam L' and the welding laser beam L can be generated by the same laser light source without providing another cleaning device, so that the laser welding system can be constructed more simply.

圖3A是拍攝於位於基板的修復區域的焊墊上附著有污染物質的狀態所得的照片,圖3B是拍攝於如圖3A所示般修復區域受到污染的狀態下進行雷射焊接製程的情況所得的照片。參照圖3A及圖3B可知,若於基板的修復區域受到污染的狀態下進行利用雷射的焊接作業,則會產生燃燒(burn)現象。3A is a photograph obtained by attaching a state in which a contaminant is adhered to a pad located in a repair area of a substrate, and FIG. 3B is a case where a laser welding process is performed in a state where the repaired area is contaminated as shown in FIG. 3A. photo. 3A and 3B, when a welding operation using a laser is performed in a state where the repaired area of the substrate is contaminated, a burn phenomenon occurs.

圖4A是拍攝於基板的修復區域附著有污染物質的狀態所得的照片,圖4B是拍攝於如圖4A所示般修復區域受到污染的狀態下進行雷射焊接作業的情況所得的照片。參照圖4A及圖4B可知,若於基板的修復區域受到污染的狀態下進行利用雷射的焊接作業,則會不完整地完成焊接製程。4A is a photograph obtained in a state in which a contaminated substance is attached to a repaired region of a substrate, and FIG. 4B is a photograph obtained by performing a laser welding operation in a state where the repaired area is contaminated as shown in FIG. 4A. 4A and 4B, if the welding operation using the laser is performed in a state where the repaired area of the substrate is contaminated, the welding process is completed incompletely.

圖5A是拍攝於基板的修復區域附著有污染物質的狀態所得的照片。另外,圖5B是拍攝於圖5A所示狀態下根據本發明的例示性的實施例而執行雷射清洗的狀態所得的照片。參照圖5B可知,已藉由雷射清洗製程去除基板的修復區域的異物。圖5C是拍攝於如圖5B所示般基板的修復區域得到清洗的狀態下進行雷射焊接製程的情況所得的照片。參照圖5C可知,已對基板的修復區域完整地完成焊接。FIG. 5A is a photograph obtained in a state in which a contaminated substance is attached to a repaired region of a substrate. FIG. In addition, FIG. 5B is a photograph taken in a state in which laser cleaning is performed in accordance with an exemplary embodiment of the present invention in the state shown in FIG. 5A. Referring to FIG. 5B, the foreign matter in the repaired area of the substrate has been removed by the laser cleaning process. Fig. 5C is a photograph obtained by performing a laser welding process in a state where the repaired area of the substrate is cleaned as shown in Fig. 5B. Referring to Fig. 5C, the repair of the repaired area of the substrate has been completed completely.

圖6是表示本發明的另一例示性的實施例的雷射焊接系統。Figure 6 is a perspective view of a laser welding system in accordance with another exemplary embodiment of the present invention.

參照圖6,本實施例的雷射焊接系統是利用焊接雷射束L1對基板W的焊接區域執行焊接製程,且對基板W的焊接區域中的未執行上述焊接製程的修復區域65執行雷射焊接修復製程。此處,雷射焊接修復製程可包括利用清洗雷射束L2對基板W的修復區域65進行清洗的雷射清洗製程。基板W例如可包括印刷電路板等,此種基板W可堆載至以可移動的方式設置的平台S。Referring to FIG. 6, the laser welding system of the present embodiment performs a soldering process on the soldering region of the substrate W by using the soldering laser beam L1, and performs laser processing on the repairing region 65 in which the soldering process is not performed in the soldering region of the substrate W. Welding repair process. Here, the laser solder repair process may include a laser cleaning process for cleaning the repair region 65 of the substrate W by cleaning the laser beam L2. The substrate W may include, for example, a printed circuit board or the like, which may be stacked to a platform S that is movably disposed.

雷射焊接系統包括焊球供給單元150及雷射照射裝置。焊球供給單元150於焊接製程中,向位於堆載於平台S的基板W的焊接區域的焊墊(圖7A的50)上供給焊球(圖7A的61)。此處,焊球61例如可包括Sn成分。並且,雷射焊接系統可更包括助焊劑塗佈單元160。助焊劑塗佈單元160可於焊球供給單元150向焊墊50供給焊球61前,預先於焊墊50上塗佈助焊劑(未圖示)。此處,助焊劑可發揮防止焊球61於藉由焊接雷射束L1加熱而熔融的情形時氧化的作用。The laser welding system includes a solder ball supply unit 150 and a laser irradiation device. The solder ball supply unit 150 supplies the solder balls (61 of FIG. 7A) to the pads (50 of FIG. 7A) of the solder regions of the substrate W stacked on the stage S in the soldering process. Here, the solder ball 61 may include, for example, a Sn component. Also, the laser welding system may further include a flux coating unit 160. The flux application unit 160 may apply a flux (not shown) to the pad 50 in advance before the solder ball supply unit 150 supplies the solder balls 61 to the pad 50. Here, the flux acts to prevent oxidation of the solder ball 61 when it is melted by heating by the welding laser beam L1.

雷射照射裝置是於焊接製程及雷射清洗製程中,分別將焊接雷射束L1與清洗雷射束L2照射至基板W的焊接區域及修復區域(圖7A的65)的裝置。為此,雷射照射裝置可包括雷射光源110、鏡面120、聚焦透鏡140及控制部115。The laser irradiation device is a device that irradiates the welding laser beam L1 and the cleaning laser beam L2 to the welding region of the substrate W and the repairing region (65 of FIG. 7A) in the welding process and the laser cleaning process, respectively. To this end, the laser irradiation device may include a laser light source 110, a mirror surface 120, a focus lens 140, and a control portion 115.

雷射光源110於焊接製程中射出第一雷射束L1,於雷射清洗製程中射出第二雷射束L2。此處,第一雷射束L1可為用以對設置於基板W的焊接區域的焊球61進行加熱而使上述焊球61熔融的焊接雷射束。另外,第二雷射束L2可為用於對基板W的修復區域65進行清洗的清洗雷射束。The laser source 110 emits the first laser beam L1 in the welding process and the second laser beam L2 in the laser cleaning process. Here, the first laser beam L1 may be a welding laser beam for heating the solder ball 61 provided in the soldering region of the substrate W to melt the solder ball 61. In addition, the second laser beam L2 may be a cleaning laser beam for cleaning the repair region 65 of the substrate W.

第一雷射束L1及第二雷射束L2可具有相同的波長。例如,第一雷射束L1及第二雷射束L2可具有近紅外線區域的波長。作為具體例,第一雷射束L1及第二雷射束L2可具有大致915 nm的波長,但並不限定於此。並且,作為焊接雷射束的第一雷射束L1可具有大於作為清洗雷射束的第二雷射束L2的輸出。例如,第一雷射束L1及第二雷射束L2可分別具有大致5 W及2 W的輸出。然而,並不限定於此。The first laser beam L1 and the second laser beam L2 may have the same wavelength. For example, the first laser beam L1 and the second laser beam L2 may have wavelengths in the near-infrared region. As a specific example, the first laser beam L1 and the second laser beam L2 may have a wavelength of approximately 915 nm, but are not limited thereto. Also, the first laser beam L1 as the welding laser beam may have an output larger than the second laser beam L2 as the cleaning laser beam. For example, the first laser beam L1 and the second laser beam L2 may each have an output of approximately 5 W and 2 W. However, it is not limited to this.

自雷射光源110射出的第一雷射束L1及第二雷射束L2的行進路徑可藉由鏡面120改變至所期望的位置。另外,於鏡面120反射的第一雷射束L1及第二雷射束L2經由聚焦透鏡140而照射至堆載於平台S的基板W的焊接區域。此處,於鏡面120與聚焦透鏡140之間的光路徑上,可更設置放大第一雷射束L1及第二雷射束L2的尺寸的擴束器(Beam Expanding Telescope, BET)130。The travel paths of the first laser beam L1 and the second laser beam L2 emitted from the laser light source 110 can be changed to a desired position by the mirror 120. Further, the first laser beam L1 and the second laser beam L2 reflected by the mirror surface 120 are irradiated to the welding region of the substrate W stacked on the stage S via the focus lens 140. Here, a beam expander (Beam Expanding Telescope, BET) 130 that enlarges the sizes of the first laser beam L1 and the second laser beam L2 may be further disposed on the optical path between the mirror 120 and the focus lens 140.

經由聚焦透鏡140的第一雷射束L1及第二雷射束L2能夠以散焦狀態照射至基板W的焊接區域。此處,作為焊接雷射束的第一雷射束L1的散焦距離(圖7B的d1)可小於作為清洗雷射束的第二雷射束L2的散焦距離(圖7D的d2)。例如,第一雷射束L1的散焦距離d1及第二雷射束L2的散焦距離d2可分別為4 mm及15 mm左右,但並不限定於此。The first laser beam L1 and the second laser beam L2 via the focus lens 140 can be irradiated to the soldering region of the substrate W in a defocused state. Here, the defocus distance (d1 of FIG. 7B) as the first laser beam L1 of the welding laser beam may be smaller than the defocus distance of the second laser beam L2 as the cleaning laser beam (d2 of FIG. 7D). For example, the defocus distance d1 of the first laser beam L1 and the defocus distance d2 of the second laser beam L2 may be about 4 mm and 15 mm, respectively, but are not limited thereto.

控制部115發揮對雷射光源110及鏡面120進行控制的作用。具體而言,控制部115可對自雷射光源110釋放的輸出等進行調節,亦可發揮對鏡面120的移動進行控制的作用。The control unit 115 functions to control the laser light source 110 and the mirror surface 120. Specifically, the control unit 115 can adjust the output or the like released from the laser light source 110, and can also function to control the movement of the mirror surface 120.

另一方面,雷射焊接系統可更包括洗淨用水供給單元170。洗淨用水供給單元170於焊接製程結束後,向基板W供給洗淨用水,藉此可執行清洗基板W的水洗製程。On the other hand, the laser welding system may further include a washing water supply unit 170. The washing water supply unit 170 supplies the washing water to the substrate W after the completion of the welding process, whereby the water washing process for cleaning the substrate W can be performed.

以下,詳細地對利用圖6所示的雷射焊接系統執行雷射焊接製程的過程進行說明。圖7A至圖7H是用以說明本發明的例示性的實施例的雷射焊接製程的圖。圖7A至圖7H所示的雷射焊接製程可包括第一焊接製程、雷射清洗製程及第二焊接製程。Hereinafter, a process of performing a laser welding process using the laser welding system shown in FIG. 6 will be described in detail. 7A through 7H are views for explaining a laser welding process of an exemplary embodiment of the present invention. The laser welding process shown in FIGS. 7A to 7H may include a first welding process, a laser cleaning process, and a second welding process.

首先,對基板W的焊接區域執行第一焊接製程。此處,焊接區域包括焊墊50,藉由下文將述的利用雷射的焊接製程而於上述焊墊50附著焊球61熔融而形成的焊料60。First, a first soldering process is performed on the soldering region of the substrate W. Here, the soldering region includes the bonding pad 50, and the solder 60 formed by melting the solder ball 61 on the bonding pad 50 by a soldering process to be described later.

具體而言,參照圖7A,利用圖6所示的焊球供給單元150向位於基板W的焊接區域的焊墊50供給焊球61。此處,焊球61例如可包括Sn成分。另一方面,於供給此種焊球61前,可更包括利用圖6所示的助焊劑塗佈單元160於焊墊50上塗佈助焊劑的步驟。於此情形時,會未對設置至基板W的焊接區域的焊墊50中的一部分供給焊球61,上述一部分會如下所述般成為需於之後的製程中進行修復的修復區域65。Specifically, referring to FIG. 7A, the solder ball 61 is supplied to the pad 50 located in the soldering region of the substrate W by the solder ball supply unit 150 shown in FIG. 6. Here, the solder ball 61 may include, for example, a Sn component. On the other hand, before the supply of such a solder ball 61, the step of applying a flux on the pad 50 by the flux application unit 160 shown in FIG. 6 may be further included. In this case, the solder ball 61 is not supplied to a part of the pad 50 provided in the soldering region of the substrate W, and the above portion becomes a repair region 65 to be repaired in a subsequent process as described below.

參照圖7B,利用圖6所示的雷射照射裝置向設置於焊墊50上的焊球61照射第一雷射束L1而進行加熱,藉此形成焊料60。此處,第一雷射束L1可於作為焊接雷射束而自雷射光源110射出後,經由鏡面120、聚焦透鏡140等而照射至焊球61。Referring to Fig. 7B, the first laser beam L1 is irradiated onto the solder ball 61 provided on the pad 50 by the laser irradiation device shown in Fig. 6 to be heated, whereby the solder 60 is formed. Here, the first laser beam L1 may be emitted from the laser light source 110 as a welding laser beam, and then irradiated to the solder ball 61 via the mirror 120, the focus lens 140, and the like.

第一雷射束L1可具有近紅外線區域的波長。例如,第一雷射束L1可具有大致915 nm的波長,但並不限定於此。另外,此種第一雷射束L1可具有高於下文將述的作為清洗雷射束的第二雷射束L2的輸出。例如,第一雷射束L1可具有大致5 W的輸出,但並不限定於此。The first laser beam L1 may have a wavelength of a near-infrared region. For example, the first laser beam L1 may have a wavelength of approximately 915 nm, but is not limited thereto. Additionally, such first laser beam L1 may have an output that is higher than the second laser beam L2 that will be described below as a cleaning laser beam. For example, the first laser beam L1 may have an output of approximately 5 W, but is not limited thereto.

作為焊接雷射束的此種第一雷射束L1可於經由聚焦透鏡140後,散焦特定距離d1而照射至焊球61。此處,第一雷射束L1的散焦距離d1例如可大致為4 mm左右,但並不限定於此。Such a first laser beam L1 as a welding laser beam may be irradiated to the solder ball 61 after being defocused by a specific distance d1 after passing through the focus lens 140. Here, the defocus distance d1 of the first laser beam L1 can be, for example, approximately 4 mm, but is not limited thereto.

如上所述,若利用雷射照射裝置向焊球61照射作為焊接雷射束的第一雷射束L1,則焊球61熔融而附著至焊墊50上,藉此形成焊料60。一面相對於基板W移動此種第一雷射束L1,一面將上述第一雷射束照射至位於焊墊50上的焊球61,藉此完成第一焊接製程。As described above, when the first laser beam L1 as the welding laser beam is irradiated to the solder ball 61 by the laser irradiation device, the solder ball 61 is melted and adheres to the pad 50, whereby the solder 60 is formed. The first laser beam is irradiated to the solder ball 61 on the pad 50 while the first laser beam L1 is moved relative to the substrate W, thereby completing the first soldering process.

於圖7C中,表示有對基板W的焊接區域完成第一焊接製程的狀態。參照圖7C,未對基板W的焊接區域中的一部分執行第一焊接製程,從而上述一部分會成為需進行焊接修復製程的修復區域65。In Fig. 7C, a state in which the first welding process is completed for the welding region of the substrate W is shown. Referring to FIG. 7C, the first soldering process is not performed on a portion of the soldering region of the substrate W, so that the above portion becomes the repairing region 65 where the soldering repair process is to be performed.

可於執行第一焊接製程後,執行雷射清洗製程。The laser cleaning process can be performed after the first welding process is performed.

具體而言,參照圖7D,利用圖6所示的雷射照射裝置向位於修復區域65的焊墊50照射第二雷射束L2,藉此對修復區域65進行清洗。此處,第二雷射束L2可於作為清洗雷射束而自雷射光源110射出後,經由鏡面120、聚焦透鏡140等而照射至修復區域65。Specifically, referring to FIG. 7D, the second laser beam L2 is irradiated to the pad 50 located in the repairing region 65 by the laser irradiation device shown in FIG. 6, thereby cleaning the repaired region 65. Here, the second laser beam L2 may be emitted from the laser light source 110 as a cleaning laser beam, and then irradiated to the repair region 65 via the mirror 120, the focus lens 140, and the like.

作為清洗雷射束的第二雷射束L2可具有與第一雷射束L1相同的波長。第二雷射束L2可具有近紅外線區域的波長。例如,第二雷射束L2可具有大致915 nm的波長,但並不限定於此。第二雷射束L2可具有低於作為焊接雷射束的第一雷射束L1的輸出。例如,於第一雷射束L1的輸出為5 W的情形時,第二雷射束L2的輸出可大致為2 W,但並不限定於此。The second laser beam L2 as the cleaning laser beam may have the same wavelength as the first laser beam L1. The second laser beam L2 may have a wavelength of a near-infrared region. For example, the second laser beam L2 may have a wavelength of approximately 915 nm, but is not limited thereto. The second laser beam L2 may have an output lower than the first laser beam L1 as a welding laser beam. For example, when the output of the first laser beam L1 is 5 W, the output of the second laser beam L2 may be approximately 2 W, but is not limited thereto.

作為清洗雷射束的第二雷射束L2可於經由聚焦透鏡140後,散焦特定距離d2而照射至修復區域65。此處,第二雷射束L2的散焦距離d2可大於上述第一雷射束L1的散焦距離d1。例如,於第一雷射束L1的散焦距離d1大致為4 mm的情形時,第二雷射束L2的散焦距離d2可大致為15 mm左右。然而,並不限定於此,第一雷射束L1的散焦距離d1及第二雷射束L2的散焦距離d2可實現各種變形。The second laser beam L2 as the cleaning laser beam may be irradiated to the repairing region 65 after being defocused by a specific distance d2 after passing through the focusing lens 140. Here, the defocus distance d2 of the second laser beam L2 may be greater than the defocus distance d1 of the first laser beam L1 described above. For example, when the defocus distance d1 of the first laser beam L1 is approximately 4 mm, the defocus distance d2 of the second laser beam L2 may be approximately 15 mm. However, it is not limited thereto, and various kinds of deformations can be realized by the defocus distance d1 of the first laser beam L1 and the defocus distance d2 of the second laser beam L2.

如上所述,若利用雷射照射裝置向位於基板W的修復區域65的焊墊50照射作為清洗雷射束的第二雷射束L2,則可去除附著於焊墊50的異物等。一面相對於基板W移動此種第二雷射束L,一面將上述第二雷射束L2照射至位於修復區域65的焊墊50,藉此完成雷射清洗製程。As described above, when the second laser beam L2 as the cleaning laser beam is irradiated to the pad 50 located in the repair region 65 of the substrate W by the laser irradiation device, foreign matter adhering to the pad 50 and the like can be removed. The second laser beam L is moved relative to the substrate W, and the second laser beam L2 is irradiated to the pad 50 located in the repairing region 65, thereby completing the laser cleaning process.

於完成上述雷射清洗製程後,對基板W的經清洗的修復區域65執行第二焊接製程。After the above laser cleaning process is completed, a second soldering process is performed on the cleaned repair region 65 of the substrate W.

具體而言,參照圖7E,利用圖6所示的焊球供給單元150向位於基板W的修復區域65的焊墊50供給焊球61。另一方面,於供給此種焊球61前,可更包括利用圖6所示的助焊劑塗佈單元160於焊墊50上塗佈助焊劑(未圖示)的步驟。Specifically, referring to FIG. 7E, the solder ball 61 is supplied to the pad 50 located in the repair region 65 of the substrate W by the solder ball supply unit 150 shown in FIG. On the other hand, before the supply of such a solder ball 61, a step of applying a flux (not shown) to the pad 50 by the flux application unit 160 shown in FIG. 6 may be further included.

參照圖7F,利用圖6所示的雷射照射裝置向設置於修復區域65的焊墊50上的焊球61照射第一雷射束L1而進行加熱,藉此形成焊料60。此處,第一雷射束L1可為焊接雷射束。如上所述,此種第一雷射束L1可具有與第二雷射束L2相同的波長,例如可具有近紅外線區域的波長。另外,第一雷射束L1可具有高於作為清洗雷射束的第二雷射束L2的輸出。Referring to Fig. 7F, the first laser beam L1 is irradiated onto the solder balls 61 provided on the pad 50 of the repair region 65 by the laser irradiation device shown in Fig. 6 to be heated, whereby the solder 60 is formed. Here, the first laser beam L1 may be a welding laser beam. As described above, such first laser beam L1 may have the same wavelength as the second laser beam L2, for example, may have a wavelength of a near-infrared region. In addition, the first laser beam L1 may have an output higher than the second laser beam L2 as the cleaning laser beam.

並且,作為焊接雷射束的第一雷射束L1可於經由聚焦透鏡140後,散焦特定距離d1而照射至位於修復區域65的焊墊50上的焊球61。此處,如上所述,第一雷射束L1的散焦距離d1可小於第二雷射束L2的散焦距離d2。Further, the first laser beam L1 as the welding laser beam may be irradiated to the solder ball 61 on the pad 50 of the repairing region 65 after being defocused by a specific distance d1 via the focusing lens 140. Here, as described above, the defocus distance d1 of the first laser beam L1 may be smaller than the defocus distance d2 of the second laser beam L2.

如上所述,若利用雷射照射裝置向位於修復區域65的焊墊50上的焊球61照射作為焊接雷射束的第一雷射束L1,則焊球61熔融而附著至焊墊50上,藉此形成焊料60。另外,一面相對於基板W移動第一雷射束L1,一面將上述第一雷射束照射至位於修復區域65的焊墊50上的焊球61,藉此完成第二焊接製程。藉由此種第二焊接製程,可於位於基板W的焊接區域的所有焊墊50設置焊料60。As described above, if the first laser beam L1 as the welding laser beam is irradiated to the solder ball 61 located on the pad 50 of the repairing region 65 by the laser irradiation device, the solder ball 61 is melted and adhered to the pad 50. Thereby, the solder 60 is formed. Further, while the first laser beam L1 is moved relative to the substrate W, the first laser beam is irradiated onto the solder balls 61 on the pad 50 of the repairing region 65, thereby completing the second soldering process. By this second soldering process, the solder 60 can be placed on all of the pads 50 located in the soldering regions of the substrate W.

於完成上述第二焊接製程後,會於基板W上殘留有如助焊劑等的異物,因此為了去除此種異物,可更執行以洗淨用水清洗基板W的水洗製程。After the second soldering process is completed, foreign matter such as a flux remains on the substrate W. Therefore, in order to remove such foreign matter, a water washing process of washing the substrate W with washing water can be further performed.

具體而言,參照圖7G,若藉由圖6所示的洗淨用水供給單元170向完成焊接製程的基板W噴射洗淨用水,則可去除殘留於基板W的如助焊劑等的異物,於圖7H中表示有完成此種水洗製程的情況。Specifically, referring to FIG. 7G, when the washing water supply unit 170 shown in FIG. 6 ejects the washing water to the substrate W that has completed the welding process, foreign matter such as flux remaining on the substrate W can be removed. A case in which such a water washing process is completed is shown in Fig. 7H.

根據以上所說明的本發明的實施例,首先利用雷射對未執行焊接製程的基板的修復區域執行清洗製程,之後對經清洗的修復區域進行焊接作業。藉此,可有效地去除可能存在於基板的修復區域的異物等,其結果,可防止會因異物的污染而產生的燃燒(burn)現象或爆炸現象。並且,藉由利用雷射執行清洗製程,可減少清洗製程所需的時間或費用。另外,如下所述,可不設置另外的清洗設備而由同一雷射光源產生清洗雷射束及焊接雷射束,因此可更簡單地構成雷射焊接系統。According to the embodiment of the present invention described above, the cleaning process is first performed on the repaired area of the substrate on which the soldering process is not performed by using the laser, and then the soldering operation is performed on the cleaned repaired area. Thereby, foreign matter or the like which may exist in the repairing region of the substrate can be effectively removed, and as a result, a burn phenomenon or an explosion phenomenon due to contamination of foreign matter can be prevented. Moreover, by performing a cleaning process using a laser, the time or cost required for the cleaning process can be reduced. Further, as described below, the cleaning laser beam and the welding laser beam can be generated by the same laser light source without providing another cleaning device, so that the laser welding system can be constructed more simply.

以上,對本發明的實施例進行了說明,但上述實施例僅為示例,於本技術領域內具有常識者應理解,可根據上述實施例實現各種變形及其他等同的實施例。The embodiments of the present invention have been described above, but the above-described embodiments are merely examples, and those skilled in the art should understand that various modifications and other equivalent embodiments can be implemented in accordance with the embodiments described above.

50‧‧‧焊墊
60‧‧‧焊料
61‧‧‧焊球
65‧‧‧修復區域
110‧‧‧雷射光源
115‧‧‧控制部
120‧‧‧鏡面
130‧‧‧擴束器
140‧‧‧聚焦透鏡
150‧‧‧焊球供給單元
160‧‧‧助焊劑塗佈單元
170‧‧‧洗淨用水供給單元
d1、d2‧‧‧距離
L、L'、L1、L2‧‧‧雷射束
S‧‧‧平台
W‧‧‧基板
50‧‧‧ solder pads
60‧‧‧ solder
61‧‧‧ solder balls
65‧‧‧Repair area
110‧‧‧Laser light source
115‧‧‧Control Department
120‧‧‧Mirror
130‧‧‧beam expander
140‧‧‧focus lens
150‧‧‧Ball supply unit
160‧‧‧flux coating unit
170‧‧‧Washing water supply unit
D1, d2‧‧‧ distance
L, L', L1, L2‧‧‧ laser beam
S‧‧‧ platform
W‧‧‧Substrate

圖1A至圖1D是表示通常的雷射焊接修復製程的圖。 圖2A至圖2E是表示本發明的例示性的實施例的雷射焊接修復製程的圖。 圖3A是拍攝於基板的修復區域(repair area)附著有污染物質的狀態所得的照片,圖3B是拍攝因於圖3A所示的狀態下執行雷射焊接製程而產生燃燒(burn)現象的情況所得的照片。 圖4A是拍攝於基板的修復區域附著有污染物質的狀態所得的照片,圖4B是拍攝因於圖4A所示的狀態下執行雷射焊接製程而未完整地執行焊接的情況所得的照片。 圖5A是拍攝於基板的修復區域附著有污染物質的狀態所得的照片。 圖5B是表示於圖5A所示的狀態下,根據本發明的例示性的實施例而藉由雷射清洗自基板的修復區域去除污染物質的狀態的圖。 圖5C是拍攝因於圖5B所示的狀態下執行雷射焊接製程而完整地執行焊接的情況所得的照片。 圖6是表示本發明的另一例示性的實施例的雷射焊接系統的圖。 圖7A至圖7H是說明利用圖6所示的雷射焊接系統執行雷射焊接製程的過程的圖。1A to 1D are views showing a general laser welding repairing process. 2A through 2E are views showing a laser welding repair process of an exemplary embodiment of the present invention. 3A is a photograph of a state in which a contaminant is attached to a repair area of a substrate, and FIG. 3B is a case where a burn phenomenon is generated by performing a laser welding process in the state shown in FIG. 3A. The resulting photo. 4A is a photograph obtained in a state in which a contaminated substance is attached to a repair area of a substrate, and FIG. 4B is a photograph obtained by photographing a case where welding is not completely performed by performing a laser welding process in the state shown in FIG. 4A. FIG. 5A is a photograph obtained in a state in which a contaminated substance is attached to a repaired region of a substrate. FIG. Fig. 5B is a view showing a state in which the contaminant is removed from the repaired region of the substrate by laser cleaning in accordance with an exemplary embodiment of the present invention in the state shown in Fig. 5A. Fig. 5C is a photograph obtained by photographing a case where the welding is completely performed by performing the laser welding process in the state shown in Fig. 5B. Fig. 6 is a view showing a laser welding system according to another exemplary embodiment of the present invention. 7A to 7H are views for explaining a process of performing a laser welding process using the laser welding system shown in Fig. 6.

110‧‧‧雷射光源 110‧‧‧Laser light source

115‧‧‧控制部 115‧‧‧Control Department

120‧‧‧鏡面 120‧‧‧Mirror

130‧‧‧擴束器 130‧‧‧beam expander

140‧‧‧聚焦透鏡 140‧‧‧focus lens

150‧‧‧焊球供給單元 150‧‧‧Ball supply unit

160‧‧‧助焊劑塗佈單元 160‧‧‧flux coating unit

170‧‧‧洗淨用水供給單元 170‧‧‧Washing water supply unit

S‧‧‧平台 S‧‧‧ platform

W‧‧‧基板 W‧‧‧Substrate

L1‧‧‧第一雷射束 L1‧‧‧first laser beam

L2‧‧‧第二雷射束 L2‧‧‧second laser beam

Claims (20)

一種雷射焊接修復製程,其是藉由對基板上的焊接區域中的未執行焊接製程的修復區域使用雷射來執行修復製程,所述雷射焊接修復製程包括: 向所述基板的所述修復區域照射清洗雷射束而執行雷射清洗製程; 於所述基板的經清洗的所述修復區域設置焊球;以及 向所述焊球照射焊接雷射束,藉此對所述焊球進行加熱而使所述焊球附著至所述修復區域。A laser solder repair process for performing a repair process by using a laser for a repair region in a soldering region on a substrate that is not subjected to a soldering process, the laser solder repair process including: Performing a laser cleaning process by irradiating the cleaning laser beam with the repairing area; providing a solder ball on the cleaned repairing area of the substrate; and irradiating the soldering beam with the welding laser beam, thereby performing the soldering ball The solder balls are attached to the repair area by heating. 如申請專利範圍第1項所述的雷射焊接修復製程,其中於對所述基板的修復區域執行雷射清洗製程後,更包括塗佈助焊劑。The laser soldering repair process of claim 1, wherein after the laser cleaning process is performed on the repaired area of the substrate, the flux is further coated. 如申請專利範圍第1項所述的雷射焊接修復製程,其中於利用所述焊接雷射束將所述焊球附著至所述修復區域後,更包括對所述基板執行水洗製程。The laser soldering repair process of claim 1, wherein after attaching the solder ball to the repairing area by using the soldering laser beam, the method further comprises performing a water washing process on the substrate. 如申請專利範圍第1項所述的雷射焊接修復製程,其中所述清洗雷射束及所述焊接雷射束具有相同的波長。The laser welding repair process of claim 1, wherein the cleaning laser beam and the welding laser beam have the same wavelength. 如申請專利範圍第4項所述的雷射焊接修復製程,其中所述清洗雷射束及所述焊接雷射束具有近紅外線範圍的波長。The laser welding repair process of claim 4, wherein the cleaning laser beam and the welding laser beam have wavelengths in the near infrared range. 如申請專利範圍第5項所述的雷射焊接修復製程,其中所述清洗雷射束及所述焊接雷射束的波長為915 nm。The laser welding repair process of claim 5, wherein the cleaning laser beam and the welding laser beam have a wavelength of 915 nm. 如申請專利範圍第1項所述的雷射焊接修復製程,其中所述清洗雷射束具有小於所述焊接雷射束的輸出。The laser welding repair process of claim 1, wherein the cleaning laser beam has an output that is smaller than the welding laser beam. 如申請專利範圍第7項所述的雷射焊接修復製程,其中所述清洗雷射束及所述焊接雷射束分別具有2 W及5 W的輸出。The laser welding repair process of claim 7, wherein the cleaning laser beam and the welding laser beam respectively have an output of 2 W and 5 W. 如申請專利範圍第1項所述的雷射焊接修復製程,其中將所述清洗雷射束及所述焊接雷射束散焦而照射至所述修復區域。The laser welding repair process of claim 1, wherein the cleaning laser beam and the welding laser beam are defocused and irradiated to the repairing area. 一種雷射焊接製程,包括: 對基板上的焊接區域執行第一焊接製程; 對所述基板上的所述焊接區域中的未執行焊接製程的修復區域執行雷射清洗製程;以及 對所述基板的經清洗的所述修復區域執行第二焊接製程。A laser soldering process, comprising: performing a first soldering process on a soldering region on a substrate; performing a laser cleaning process on a repairing region in the soldering region on the substrate that is not performing a soldering process; and The repaired area of the cleaning performs a second welding process. 如申請專利範圍第10項所述的雷射焊接製程,其中所述第一焊接製程包括:於所述基板上的所述焊接區域設置焊球;以及向所述焊球照射焊接雷射束而進行加熱,藉此使所述焊球附著至所述焊接區域。The laser welding process of claim 10, wherein the first soldering process comprises: providing a solder ball on the soldering area on the substrate; and irradiating the soldering beam with the soldering beam Heating is performed whereby the solder balls are attached to the soldering region. 如申請專利範圍第11項所述的雷射焊接製程,其中藉由向所述基板的所述修復區域照射清洗雷射束而執行所述雷射清洗製程。The laser welding process of claim 11, wherein the laser cleaning process is performed by irradiating the repaired area of the substrate with a cleaning laser beam. 如申請專利範圍第12項所述的雷射焊接製程,其中所述第二焊接製程包括:於所述基板上的經清洗的所述修復區域設置焊球;以及向所述焊球照射焊接雷射束而進行加熱,藉此使所述焊球附著至所述修復區域。The laser welding process of claim 12, wherein the second soldering process comprises: providing a solder ball on the cleaned repair area on the substrate; and irradiating the solder ball with a solder mine The beam is heated to adhere the solder ball to the repair area. 如申請專利範圍第13項所述的雷射焊接製程,其中於所述第二焊接製程後,更包括對所述基板執行水洗製程的步驟。The laser soldering process of claim 13, wherein after the second soldering process, the step of performing a water washing process on the substrate is further included. 如申請專利範圍第13項所述的雷射焊接製程,其中所述清洗雷射束及所述焊接雷射束具有相同的波長。The laser welding process of claim 13, wherein the cleaning laser beam and the welding laser beam have the same wavelength. 如申請專利範圍第13項所述的雷射焊接製程,其中所述清洗雷射束具有小於所述焊接雷射束的輸出。The laser welding process of claim 13, wherein the cleaning laser beam has an output that is smaller than the welding laser beam. 如申請專利範圍第13項所述的雷射焊接製程,其中將所述清洗雷射束及所述焊接雷射束散焦而照射。The laser welding process of claim 13, wherein the cleaning laser beam and the welding laser beam are defocused and irradiated. 一種雷射焊接系統,其是利用焊接雷射束對基板的焊接區域執行焊接製程,且對所述基板的所述焊接區域中的未執行所述焊接製程的修復區域執行雷射焊接修復製程,所述雷射焊接系統包括: 焊球供給單元,向所述基板的所述焊接區域提供焊球;以及 雷射照射裝置,將所述焊接雷射束照射至所述焊球,且將清洗雷射束照射至所述基板的所述修復區域。A laser welding system for performing a welding process on a soldering region of a substrate by using a welding laser beam, and performing a laser welding repairing process on a repairing region in the soldering region of the substrate in which the soldering process is not performed, The laser welding system includes: a solder ball supply unit that supplies solder balls to the soldering region of the substrate; and a laser irradiation device that irradiates the solder laser beam to the solder ball and that will clean the solder The beam is irradiated to the repaired area of the substrate. 如申請專利範圍第18項所述的雷射焊接系統,其更包括於所述基板的所述焊接區域塗佈助焊劑的助焊劑塗佈單元。The laser welding system of claim 18, further comprising a flux coating unit that applies a flux to the soldering region of the substrate. 如申請專利範圍第18項所述的雷射焊接系統,其更包括向所述基板供給洗淨用水而執行水洗製程的洗淨用水供給單元。The laser welding system according to claim 18, further comprising a washing water supply unit that supplies washing water to the substrate to perform a water washing process.
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