TW201724344A - Support body separation device and support body separation method capable of detecting support body having its holding portion failing holding laminated body - Google Patents

Support body separation device and support body separation method capable of detecting support body having its holding portion failing holding laminated body Download PDF

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TW201724344A
TW201724344A TW105127695A TW105127695A TW201724344A TW 201724344 A TW201724344 A TW 201724344A TW 105127695 A TW105127695 A TW 105127695A TW 105127695 A TW105127695 A TW 105127695A TW 201724344 A TW201724344 A TW 201724344A
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support
plate
support body
claw
substrate
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TW105127695A
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Chinese (zh)
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TWI685055B (en
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岩田泰昌
中村彰彦
小針倫
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東京應化工業股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

Abstract

The subject of the present invention is to detect the support body whose holding portion could not hold a laminated body. The support body separation device (100) as the solution of the present invention comprises a claw portion (1) for holding a support plate (17), a driving portion (2), a magnetic sensor (3) for detecting the position of the claw portion (1) that is moved by the driving portion (2), and a control portion for controlling the claw portion (1) to move to an initial position while the magnetic sensor (3) detected that the claw portion (1) is moved closer the inner side than a predetermined area.

Description

支持體分離裝置及支持體分離方法 Support separation device and support separation method

本發明係關於支持體分離裝置及支持體分離方法。 The present invention relates to a support separation device and a support separation method.

近年來,被要求IC卡、手機等的電子機器的薄型化、小型化、輕量化等。對於為了滿足該等要求來說,關於被組入的半導體晶片,也必須使用薄型的半導體晶片。因此,作為半導體晶片的基底之晶圓基板的厚度(膜厚)在現狀中為125μm~150μm,但是,次世代的晶片用必須設為25μm~50μm。所以,對於為了獲得前述之膜厚的晶圓基板來說,必定需要晶圓基板的薄板化工程。 In recent years, electronic devices such as IC cards and mobile phones have been required to be thinner, smaller, and lighter. In order to satisfy these requirements, it is also necessary to use a thin semiconductor wafer with respect to the semiconductor wafer to be incorporated. Therefore, the thickness (film thickness) of the wafer substrate which is the base of the semiconductor wafer is 125 μm to 150 μm in the current state, but the next generation wafer must be 25 μm to 50 μm. Therefore, in order to obtain the above-mentioned wafer thickness of the wafer substrate, a thinning process of the wafer substrate is required.

晶圓基板因薄板化而強度降低,所以,為了防止薄板化之晶圓基板的破損,在製程中,一邊在將輔助板貼合於晶圓基板的狀態下自動搬送,一邊於晶圓基板上安裝電路等的構造物。然後,製程後,分離晶圓基板與輔助板。因此,至今使用從晶圓剝離支持體的各種方法。 In order to prevent the wafer substrate from being damaged by the thinning of the wafer substrate, the wafer is automatically transferred while being bonded to the wafer substrate in the process, and is on the wafer substrate. A structure such as a circuit is mounted. Then, after the process, the wafer substrate and the auxiliary board are separated. Therefore, various methods of peeling off the support from the wafer have hitherto been used.

於專利文獻1,記載有連接於可旋動地配設在 機台的機械臂體,握持搬送晶圓的晶圓搬送機器人之機械手,且具有握持晶圓之外周面的握持部所構成的機械手。 Patent Document 1 describes that the connection is rotatably disposed in The robot arm of the machine holder holds the robot of the wafer transfer robot that transports the wafer, and has a robot that holds the grip portion on the outer peripheral surface of the wafer.

於專利文獻2,記載有剝離透過黏合材黏合於具有剛性之支持體的半導體晶圓的方法,具備將插入構件插入黏合材的插入工程,與一邊往將半導體晶圓從支持體剝離之方向彈撥,一邊對黏合材施加振動的加振工程之半導體晶圓的剝離方法。 Patent Document 2 describes a method in which a peeling and transmitting adhesive is bonded to a semiconductor wafer having a rigid support, and includes an insertion process for inserting the insert member into the adhesive, and plucking the semiconductor wafer from the support. A method of peeling off a semiconductor wafer by applying vibration to the adhesive material.

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開平11-116046號公報(1999年4月27日公開) [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 11-116046 (published on Apr. 27, 1999)

[專利文獻2]日本特開2006-32506號公報(2006年2月2日公開) [Patent Document 2] Japanese Laid-Open Patent Publication No. 2006-32506 (published on Feb. 2, 2006)

專利文獻1並不是揭示在分離基板與支持體時,可防止基板破損的支持體分離裝置及支持體分離方法者。 Patent Document 1 does not disclose a support separation device and a support separation method that can prevent the substrate from being damaged when the substrate and the support are separated.

在專利文獻2所記載的支持體分離方法中,將板子的前端插入至晶圓與支持體之間,故板子的插入時有晶圓破損之虞。 In the support separation method described in Patent Document 2, since the tip end of the board is inserted between the wafer and the support, the wafer is broken at the time of insertion of the board.

又,專利文獻2所記載的支持體分離方法,也不是揭示偵測出握持部未能握持層積體之支持體的方法者。 Further, the method of separating the support described in Patent Document 2 does not disclose a method of detecting that the grip portion fails to hold the support of the laminate.

本發明係有鑑於前述問題所發明者,目的為提供可偵測出握持部未能握持層積體之支持體的支持體分離裝置及其關聯技術。 The present invention has been made in view of the above problems, and an object thereof is to provide a support separation device capable of detecting a support in which a grip portion fails to hold a laminate, and a related art thereof.

為了解決前述的課題,本案發明者銳意檢討的結果,到達以下的本發明。 In order to solve the above problems, the inventors of the present invention have determined the results of the review and have arrived at the following invention.

本發明的支持體分離裝置,係從貼附基板與支持前述基板之支持體所成的層積體,分離前述支持體的支持體分離裝置,其特徵為具備:複數爪部,係握持前述層積體之前述支持體的外周端部;驅動部,使前述爪部分別對於前述支持體的平面部個別平行地移動;偵測部,係個別偵測出藉由前述驅動部移動之前述爪部的各別位置;及控制部,係在前述偵測部偵測出前述複數爪部中至少一個移動至比所定區域更靠內側時,以移動至初始的位置之方式控制所有的前述複數爪部。 The support separation device of the present invention is a support separation device that separates the support from the support substrate and the support that supports the substrate, and is characterized in that it has a plurality of claws and holds the aforementioned a peripheral end portion of the support body of the laminate; the drive portion moves the claw portions individually in parallel with respect to a plane portion of the support body; and the detecting portion individually detects the claws moved by the driving portion And the control unit is configured to control all of the plurality of claws when the detecting unit detects that at least one of the plurality of claws moves to be inside the predetermined area, and moves to an initial position. unit.

又,本發明的支持體分離方法,係從貼附基板與支持前述基板之支持體所成的層積體,分離前述支持體的支持體分離方法,其特徵為:包含藉由複數爪部來握持前述層積體之前述支持體的外周端部的握持工程;在前 述握持工程中,個別偵測出移動之前述爪部的各別位置,在偵測出前述複數爪部中至少一個移動至比所定區域更靠內側時,以移動至初始的位置之方式控制所有的前述複數爪部。 Moreover, the support separation method of the present invention is a method of separating a support body from a laminate obtained by attaching a substrate and a support supporting the substrate, and is characterized in that the support body is separated by a plurality of claws. Grip holding the outer peripheral end of the aforementioned support body of the aforementioned laminate; In the gripping process, the respective positions of the claws that are moved are individually detected, and when at least one of the plurality of claws is detected to be moved to the inner side than the predetermined area, the movement is controlled to the initial position. All of the aforementioned plurality of claws.

本發明可發揮提供可偵測出握持部未能握持層積體之支持體的支持體分離裝置及其關聯技術之效果。 The present invention can exert the effects of providing a support separation device capable of detecting a support body in which the grip portion fails to hold the laminate, and related art.

1‧‧‧爪部 1‧‧‧ claws

1a‧‧‧捕捉面(爪部) 1a‧‧‧ capture surface (claw)

1b‧‧‧傾斜面(爪部) 1b‧‧‧Sloping surface (claw)

1c‧‧‧調整部 1c‧‧‧Adjustment Department

1d‧‧‧螺絲軸 1d‧‧‧ screw shaft

1e‧‧‧平面部 1e‧‧‧Flat Department

2‧‧‧驅動部 2‧‧‧ Drive Department

2a‧‧‧移動軸(驅動部) 2a‧‧‧Moving shaft (driver)

2b‧‧‧支持部(驅動部) 2b‧‧‧Support Department (Drive Department)

3‧‧‧磁性感測器(偵測部) 3‧‧‧Magnetic sensor (detection department)

3a‧‧‧磁鐵(偵測部) 3a‧‧‧ Magnet (detection department)

3b‧‧‧感測頭(偵測部) 3b‧‧‧Sensing head (detection department)

3c‧‧‧感測頭(偵測部) 3c‧‧‧Sensing head (detection department)

4‧‧‧分離板(板部) 4‧‧‧Separation board (board part)

4a‧‧‧抵接面(板部) 4a‧‧‧Abutment (board)

6‧‧‧鉤止部 6‧‧‧ hook stop

7‧‧‧軸承部(鉤止部) 7‧‧‧ bearing part (hook stop)

7a‧‧‧錐面(開口面,鉤止部) 7a‧‧‧Cone surface (opening surface, hook stop)

8‧‧‧抵接部(鉤止部) 8‧‧‧Abutment (hook stop)

8a‧‧‧嵌合面(鉤止部) 8a‧‧‧Fitting surface (hook stop)

9‧‧‧軸部(鉤止部) 9‧‧‧Axis (hook stop)

10‧‧‧升降部 10‧‧‧ Lifting Department

13‧‧‧升降板 13‧‧‧ lifting plate

14‧‧‧平台(固定部) 14‧‧‧ Platform (fixed department)

15‧‧‧多孔部 15‧‧‧Porous Department

16‧‧‧外周部 16‧‧‧The outer part

17‧‧‧輔助板(支持體) 17‧‧‧Auxiliary board (support)

17a‧‧‧倒角部位(支持體) 17a‧‧‧Chamfering part (support)

18‧‧‧接著層 18‧‧‧Next layer

19‧‧‧基板 19‧‧‧Substrate

20‧‧‧層積體 20‧‧‧Layer

23‧‧‧控制部 23‧‧‧Control Department

100‧‧‧支持體分離裝置 100‧‧‧Support body separation device

[圖1]說明本發明之一實施形態的支持體分離裝置100之概略的圖。 Fig. 1 is a view showing the outline of a support separating apparatus 100 according to an embodiment of the present invention.

[圖2]說明本發明之一實施形態的支持體分離裝置100之動作概略的圖。 Fig. 2 is a view for explaining an outline of the operation of the support separating apparatus 100 according to the embodiment of the present invention.

[圖3]說明本發明之一實施形態的支持體分離裝置100所具備的爪部1之概略的圖。 [Fig. 3] A schematic view of a claw portion 1 provided in a support separating device 100 according to an embodiment of the present invention.

[圖4]說明本發明之一實施形態的支持體分離裝置100之概略的區塊圖。 Fig. 4 is a block diagram showing the outline of a support separating apparatus 100 according to an embodiment of the present invention.

<支持體分離裝置100> <Support body separation device 100>

使用圖1~4,針對本發明之一實施形態的支持體分離 裝置100進行詳細說明。 Supporting body separation for an embodiment of the present invention using Figures 1-4 The device 100 will be described in detail.

圖1(a)係說明俯視之構成設置於升降板13之鉤止部6的軸承部7及抵接部8的配置,及設置於位於升降板13下之分離板(板部)4的爪部1的配置的圖。又,圖1(b)係依據圖1(a)所示之A-A’線箭頭剖面,說明支持體分離裝置100的概略的圖。 Fig. 1(a) is a view showing the arrangement of the bearing portion 7 and the abutting portion 8 which are provided in the hook portion 6 of the lift plate 13 in a plan view, and the claws provided in the separating plate (plate portion) 4 located under the lift plate 13. A diagram of the configuration of the section 1. Further, Fig. 1(b) is a schematic view showing the support separation device 100 in accordance with the A-A' line arrow cross section shown in Fig. 1(a).

如圖1(a)及(b)所示,本實施形態的支持體分離裝置100係具備複數爪部(握持部)1、複數鉤止部6、及升降部10。在此,升降部10係透過升降板13,藉由鉤止部6鉤止分離板4,藉此,使配置於分離板4之外周部份的爪部1往上下方向升降。再者,爪部1係藉由驅動部2移動。 As shown in FIGS. 1(a) and 1(b), the support separating device 100 of the present embodiment includes a plurality of claw portions (grip portions) 1, a plurality of hook portions 6, and a lifting portion 10. Here, the elevating portion 10 passes through the elevating plate 13, and the hooking portion 6 hooks the separating plate 4, whereby the claw portion 1 disposed on the outer peripheral portion of the separating plate 4 is moved up and down. Further, the claw portion 1 is moved by the driving portion 2.

又,控制部23係依據磁性感測器(偵測部)3所偵測之爪部1的位置,控制驅動部2及升降部10的動作。 Further, the control unit 23 controls the operations of the drive unit 2 and the lift unit 10 in accordance with the position of the claw portion 1 detected by the magnetic sensor (detection unit) 3.

又,支持體分離裝置100係具備平台(固定部)14,於平台14上,固定依序層積輔助板(支持體)17、接著層18及基板19所成的層積體20。層積體20之接著層18係藉由剝離液等,因膨潤而接著力降低。 Further, the support separation device 100 includes a stage (fixed portion) 14 on which the laminate 20 formed by the sequential laminate auxiliary plate (support) 17, the subsequent layer 18, and the substrate 19 is fixed. The adhesive layer 18 of the laminate 20 is reduced in adhesion by swelling due to swelling or the like.

再者,於本實施形態的支持體分離裝置100中,於固定於平台14之層積體20的基板19側,黏合有切割膠帶21,切割膠帶21係具備切割框架22。 Further, in the support separation device 100 of the present embodiment, the dicing tape 21 is bonded to the substrate 19 side of the laminate 20 fixed to the stage 14, and the dicing tape 21 is provided with the dicing frame 22.

如圖1(a)所示,於支持體分離裝置100中,構成複數鉤止部6的軸承部7與抵接部8,於升降板13 的周緣部分中等間隔地配置。又,複數爪部1隔著驅動部2,等間隔地配置於分離板4上。鉤止部6與爪部1係交互配置,且鉤止部6與爪部1於俯視中等間隔地配置。所以,藉由使升降部10上升,透過升降板13施加於鉤止部6的力,會均等地施加於配置於分離板4的複數爪部1。所以,藉由複數爪部1,握持(保持)層積體20,升降部10透過鉤止部6抬起分離板4時,可從複數爪部1將力均等地施加於層積體20。 As shown in FIG. 1(a), in the support body separating device 100, the bearing portion 7 and the abutting portion 8 of the plurality of hook portions 6 are formed on the lift plate 13 The peripheral portions are arranged at medium intervals. Further, the plurality of claws 1 are disposed on the separation plate 4 at equal intervals with the drive unit 2 interposed therebetween. The hook portion 6 and the claw portion 1 are alternately arranged, and the hook portion 6 and the claw portion 1 are disposed at an intermediate interval in plan view. Therefore, by raising the elevating portion 10, the force applied to the hooking portion 6 through the elevating plate 13 is equally applied to the plurality of claw portions 1 disposed on the separating plate 4. Therefore, when the stacked body 20 is gripped (held) by the plurality of claws 1, and the lifting and lowering portion 10 lifts the separating plate 4 through the hook stopping portion 6, the force can be equally applied to the laminated body 20 from the plurality of claw portions 1. .

以下,針對支持體分離裝置100所具備之爪部1、驅動部2、磁性感測器3、分離板4、鉤止部6、升降部10、平台14及控制部23,更詳細地說明。 Hereinafter, the claw portion 1, the driving portion 2, the magnetic sensor 3, the separating plate 4, the hooking portion 6, the lifting portion 10, the stage 14, and the control portion 23 provided in the support separating device 100 will be described in more detail.

[爪部1] [Claw 1]

使用圖2及圖3,針對本實施形態的支持體分離裝置100所具備的爪部1,更詳細進行說明。 The claw portion 1 provided in the support separating device 100 of the present embodiment will be described in more detail with reference to Figs. 2 and 3 .

圖2的(a)~(c)係說明本實施形態的支持體分離裝置100之動作概略的圖。再者,於圖2(a)~(c)中,省略支持體分離裝置100所具備的升降部10。又,圖3(a)係說明爪部1及設置於爪部1之調整部1c之概略的圖,圖3(b)係說明爪部1之傾斜面1b,抵接於層積體20之輔助板17的倒角部位17a之狀態的圖,圖3(c)係揭示於圖3(a)之B-B’線箭頭剖面中,捕捉面1a捕捉層積體20之輔助板17的外周端部前之狀態的圖。 (a) to (c) of FIG. 2 are views showing an outline of the operation of the support separation device 100 of the present embodiment. In addition, in FIGS. 2(a) to 2(c), the elevating portion 10 included in the support separating device 100 is omitted. 3(a) is a schematic view showing the claw portion 1 and the adjustment portion 1c provided in the claw portion 1, and FIG. 3(b) is a view showing the inclined surface 1b of the claw portion 1 and abutting on the laminated body 20 The state of the chamfered portion 17a of the auxiliary plate 17 is shown in Fig. 3(c) in the BB' line arrow cross section of Fig. 3(a), and the capturing surface 1a captures the outer periphery of the auxiliary plate 17 of the laminated body 20. A diagram of the state before the end.

首先,如圖2(a)所示,複數爪部1係藉由分 離板4利用升降部10沿著Y軸方向下降,配置於抵接於分離板4的抵接面4a之輔助板17的外周端部的外側。 First, as shown in Fig. 2(a), the plurality of claws 1 are separated by The off-board 4 is lowered in the Y-axis direction by the elevating portion 10, and is disposed on the outer side of the outer peripheral end portion of the auxiliary plate 17 that abuts against the abutting surface 4a of the separating plate 4.

又,複數爪部1係分別對於分離板4的外周端部,隔開相等距離配置(圖1(a))。又,爪部1係分別於握持輔助板17的外周端部之狀態中,在與分離板4的外周端部之間設置有間距(間隙)(圖2(b))。 Further, the plurality of claw portions 1 are arranged at equal intervals with respect to the outer peripheral end portions of the separating plate 4 (Fig. 1 (a)). Further, in the state in which the claw portion 1 is held at the outer peripheral end portion of the auxiliary plate 17, a pitch (gap) is provided between the outer peripheral end portion of the separating plate 4 (Fig. 2(b)).

用以形成爪部1的材料,係因應應握持之輔助板17的材質,適當選擇即可。所以,用以形成爪部的材料,可使用不鏽鋼或鋁等的金屬,及工程塑膠等。又,在輔助板17的材質是玻璃時,使用工程塑膠即芳香族聚醚酮(Aromatic polyether ketone)來形成更佳,即使在芳香族聚醚酮中,具有芳香族基的聚醚醚酮(PEEK)、具有芳香族基的聚醚酮酮(PEKK)及具有芳香族基的聚醚醚酮酮(PEEKK)為佳,PEEK最理想。藉此,藉由爪部1握持由玻璃所成之輔助板17的外周端部時,可防止該輔助板17破損。 The material for forming the claw portion 1 may be appropriately selected depending on the material of the auxiliary plate 17 to be held. Therefore, as the material for forming the claw portion, a metal such as stainless steel or aluminum, an engineering plastic or the like can be used. Further, when the material of the auxiliary plate 17 is glass, it is more preferably formed of an aromatic polyetherketone (Aromatic polyether ketone) which is an engineering plastic, and an aromatic polyetheretherketone is used even in the aromatic polyether ketone. PEEK), polyetherketoneketone (PEKK) having an aromatic group, and polyetheretherketoneketone (PEEKK) having an aromatic group are preferred, and PEEK is most preferred. Thereby, when the outer peripheral end portion of the auxiliary plate 17 made of glass is held by the claw portion 1, the auxiliary plate 17 can be prevented from being damaged.

如圖3(a)~(c)所示,爪部1係分別具有捕捉面1a及傾斜面1b,且具備調整部1c。 As shown in FIGS. 3( a ) to 3 ( c ), the claw portions 1 each have a capturing surface 1 a and an inclined surface 1 b , and include an adjusting portion 1 c .

(捕捉面1a) (capture face 1a)

捕捉面1a係捕捉輔助板17的外周端部。在此,捕捉面1a係與分離板4的抵接面4a垂直之面,且以與輔助板17的外周端部相同,或描繪更大之圓弧之方式彎曲之面。 The capturing surface 1a captures the outer peripheral end of the auxiliary plate 17. Here, the capturing surface 1a is a surface that is perpendicular to the abutting surface 4a of the separating plate 4, and is curved like the outer peripheral end of the auxiliary plate 17, or a curved surface of a larger arc.

複數爪部1的捕捉面1a係於將輔助板17的平面部抵接於分離板4的抵接面4a之狀態中,包圍輔助板17的外周端部,以朝向分離板4的中心點之方式移動(圖2(a)及(b))。在此,複數爪部1的捕捉面1a係藉由驅動部2,同時以相同速度,接近輔助板17的外周端部。因此,可藉由捕捉面1a,一邊以層積體20之輔助板17的中心點,與分離板4的中心點重疊之方式,誘導該層積體20,一邊握持輔助板17的外周端部。又,以與輔助板17的外周端部相同,或者描更大圓弧之方式彎曲的捕捉面1a,係以圓弧的中心點附近抵接於輔助板17的外周端部之方式,捕捉輔助板17。因此,於複數捕捉面1a的各中心部中,可握持圓形狀的輔助板17。所以,藉由複數爪部1,可等間隔且順利地握持輔助板17的外周端部。因此,抬起分離板4時,可讓藉由複數爪部1施加於輔助板17的力均等。 The capturing surface 1a of the plurality of claws 1 is in a state in which the flat portion of the auxiliary plate 17 abuts against the abutting surface 4a of the separating plate 4, and surrounds the outer peripheral end portion of the auxiliary plate 17 so as to face the center point of the separating plate 4. Move in mode (Fig. 2(a) and (b)). Here, the capturing surface 1a of the plurality of claw portions 1 is approached to the outer peripheral end portion of the auxiliary plate 17 at the same speed by the driving portion 2. Therefore, the laminated body 20 can be induced while the center point of the auxiliary plate 17 of the laminated body 20 overlaps with the center point of the separating plate 4 by the capturing surface 1a, while the outer peripheral end of the auxiliary plate 17 is gripped. unit. Further, the capturing surface 1a which is curved in the same manner as the outer peripheral end portion of the auxiliary plate 17 or which is curved in a larger arc shape is abutting against the outer peripheral end portion of the auxiliary plate 17 in the vicinity of the center point of the circular arc. Board 17. Therefore, in the center portions of the plurality of capturing faces 1a, the circular auxiliary plate 17 can be held. Therefore, the outer peripheral end portions of the auxiliary plates 17 can be gripped at equal intervals and smoothly by the plurality of claw portions 1. Therefore, when the separation plate 4 is lifted, the force applied to the auxiliary plate 17 by the plurality of claw portions 1 can be made equal.

(傾斜面1b) (inclined surface 1b)

如圖3(b)所示,傾斜面1b係層積體20之抵接於輔助板17的倒角部位17a的未彎曲的平面。傾斜面1b係沿著包含捕捉面1a的端邊之中心點的一部分設置。 As shown in FIG. 3(b), the inclined surface 1b is a non-curved plane in which the laminated body 20 abuts against the chamfered portion 17a of the auxiliary plate 17. The inclined surface 1b is provided along a portion of the center point including the end side of the capturing surface 1a.

傾斜面1b係於分離板4之抵接面4a的面方向中,越離開該抵接面4a,從該抵接面4a的外周朝向內周的傾斜越大(圖3(b))。藉此,於輔助板17的外周端部中,於位於與分離板4對向之面的背面側的倒角部位 17a,可抵接傾斜面1b。 The inclined surface 1b is in the surface direction of the abutting surface 4a of the separating plate 4, and the inclination from the outer circumference toward the inner circumference of the abutting surface 4a is larger as it goes away from the abutting surface 4a (Fig. 3(b)). Thereby, in the outer peripheral end portion of the auxiliary plate 17, the chamfered portion on the back side of the surface facing the separation plate 4 17a, can abut the inclined surface 1b.

傾斜部1b係對於分離板4的抵接面4a,具有30°以上且未滿90°之範圍內的傾斜。藉此,可防止對於輔助板17的倒角部位17a,從傾斜面1b施加過度的力。又,在將輔助板17的平面部抵接於分離板4的抵接面4a之狀態中,傾斜面1b的傾斜係以對於輔助板17之倒角部位17a的傾斜成為平行之方式設置,因可讓倒角部位17a的端部不會集中過度的力,所以最理想。 The inclined portion 1b has an inclination in a range of 30° or more and less than 90° with respect to the abutting surface 4a of the separating plate 4. Thereby, it is possible to prevent an excessive force from being applied to the chamfered portion 17a of the auxiliary plate 17 from the inclined surface 1b. Further, in a state in which the planar portion of the auxiliary plate 17 abuts against the abutting surface 4a of the separating plate 4, the inclination of the inclined surface 1b is set so as to be parallel to the inclination of the chamfered portion 17a of the auxiliary plate 17, because It is preferable that the end portion of the chamfered portion 17a does not concentrate excessive force.

又,傾斜面1b係沿著從分離板4的抵接面4a分離的捕捉面1a的端邊,設置於包含該端邊之中心點的一部分。藉此,可使所捕捉之輔助板17的外周端部,在接近大略點接觸於平面的傾斜面1b之狀態下順利地抵接於爪部1之捕捉面1a所具有之圓弧的中心點附近。所以,支持體分離裝置100係藉由以包圍分離板4之方式等間隔地配置的複數傾斜面1b,在接近大略點接觸之狀態下握持輔助板17的外周端部。因此,可從複數傾斜面1b均等地施加用以握持輔助板17的力,抬起分離板4時,可防止抵接於複數傾斜面1b之輔助板17的外周端部,從傾斜面1b脫離。 Further, the inclined surface 1b is provided along the end side of the capturing surface 1a separated from the abutting surface 4a of the separating plate 4, and is provided at a part including the center point of the end side. Thereby, the outer peripheral end portion of the auxiliary plate 17 to be caught can smoothly abut against the center point of the arc of the capturing surface 1a of the claw portion 1 in a state in which the inclined surface 1b close to the plane is brought into close contact with the plane. nearby. Therefore, the support body separating device 100 holds the outer peripheral end portion of the auxiliary plate 17 in a state of being brought close to a large point by the plurality of inclined faces 1b arranged at equal intervals so as to surround the separating plate 4. Therefore, the force for gripping the auxiliary plate 17 can be equally applied from the plurality of inclined faces 1b, and when the separation plate 4 is lifted, the outer peripheral end portion of the auxiliary plate 17 abutting against the plurality of inclined faces 1b can be prevented from the inclined face 1b. Get rid of.

又,如圖3(b)所示,傾斜面1b的下端係與輔助板17之與基板19對向之側的面,配置於相同平面上。藉此,可防止傾斜面1b鉤住基板19及接著層18等。所以,僅將傾斜面1b抵接於輔助板17,可藉由爪部1順利地握持該輔助板17。 Further, as shown in FIG. 3(b), the lower end of the inclined surface 1b is disposed on the same plane as the surface of the auxiliary plate 17 facing the substrate 19. Thereby, the inclined surface 1b can be prevented from being caught by the substrate 19, the subsequent layer 18, and the like. Therefore, only the inclined surface 1b is brought into contact with the auxiliary plate 17, and the auxiliary plate 17 can be smoothly gripped by the claw portion 1.

[調整部1c] [Adjustment section 1c]

如圖3(a)所示,調整部1c係具備螺絲軸1d與平面部1e,利用將螺絲軸1d推頂於平面部1e,使爪部1對於分離板4的抵接面4a垂直移動。藉此,可因應輔助板17的厚度,調整爪部1之傾斜面1b的下端,與分離板4的抵接面4a之間的距離。因此,不取決於層積體20之輔助板17的厚度,可藉由爪部1,更正確地握持輔助板17的倒角部位17a。再者,調整部1c所致之與分離板4的抵接面4a之間的距離的調整,因應應分離之支持體的種類預先進行即可。 As shown in Fig. 3 (a), the adjustment portion 1c includes a screw shaft 1d and a flat portion 1e, and the claw portion 1 is vertically moved to the abutting surface 4a of the separating plate 4 by pushing the screw shaft 1d against the flat portion 1e. Thereby, the distance between the lower end of the inclined surface 1b of the claw portion 1 and the abutting surface 4a of the separating plate 4 can be adjusted in accordance with the thickness of the auxiliary plate 17. Therefore, the chamfered portion 17a of the auxiliary plate 17 can be more accurately held by the claw portion 1 without depending on the thickness of the auxiliary plate 17 of the laminated body 20. Further, the adjustment of the distance between the abutting surface 4a of the separating plate 4 by the adjusting portion 1c may be performed in advance in accordance with the type of the support to be separated.

[驅動部2] [Drive unit 2]

驅動部2係具備使爪部1移動的移動軸2a,與可動地支持該移動軸2a的支持部2b。驅動部2係分別等間隔地配置於分離板4的上面部,使各爪部1以平行地沿著分離板4的抵接面4a,朝向分離板4的外周端部接近或離開之方式移動(圖2(a)及(b))。又,驅動部2係使各爪部1同時以相同速度,朝向輔助板17的外周端部移動。藉此,可藉由爪部1一邊包圍一邊握持輔助板17的外周端部。再者,複數驅動部2藉由控制部23控制動作。 The drive unit 2 includes a movement shaft 2a that moves the claw portion 1, and a support portion 2b that movably supports the movement shaft 2a. The driving unit 2 is disposed at an upper surface portion of the separating plate 4 at equal intervals, and moves the claw portions 1 in such a manner as to approach or close to the outer peripheral end portion of the separating plate 4 along the abutting surface 4a of the separating plate 4 in parallel. (Figure 2 (a) and (b)). Moreover, the drive unit 2 moves the respective claw portions 1 toward the outer peripheral end portion of the auxiliary plate 17 at the same speed. Thereby, the outer peripheral end portion of the auxiliary plate 17 can be gripped by the claw portion 1 while being surrounded. Furthermore, the complex drive unit 2 controls the operation by the control unit 23.

[磁性感測器3] [Magnetic Sensor 3]

磁性感測器(偵測部)3係個別地偵測被驅動部2移動 之爪部1的各別位置。 The magnetic sensor (detection unit) 3 detects the movement of the driven portion 2 individually The respective positions of the claws 1.

如圖2(a)及(b)所示,磁性感測器3係具備固定於驅動部2之移動軸2a的磁鐵3a,與配置於該磁鐵3a的移動方向之前後,偵測該磁鐵3a之變位的兩個感測頭3b及3c。在此,磁鐵3a係在移動軸2a移動爪部1時,同時等距離移動。此時,兩個感測頭3b及3c係依據從磁鐵3a發出之磁性的變化,偵測因移動軸2a移動,磁鐵3a變位亦即移動。 As shown in FIGS. 2(a) and 2(b), the magnetic sensor 3 includes a magnet 3a fixed to the moving shaft 2a of the driving unit 2, and the magnet 3a is detected before being placed in the moving direction of the magnet 3a. The two sensing heads 3b and 3c are displaced. Here, the magnet 3a moves at the same time when the moving shaft 2a moves the claw portion 1. At this time, the two sensing heads 3b and 3c detect the movement of the moving shaft 2a in response to the change in the magnetic force emitted from the magnet 3a, and the magnet 3a is displaced and moved.

兩個感測頭3b及3c係以該等兩個位置為基準,以例如0~100之值,量表化感測頭3b及3c之間的距離。例如,將感測頭3b及3c之間的距離設定為數mm程度時,可利用μm級來判定爪部1的位置。依據該量表化值,感測頭3b及3c係判定磁鐵3a的位置。藉此,可正確判定藉由移動軸2a與磁鐵3a同時移動相等的距離之爪部1的位置。更具體來說,於量表化值的範圍類別,判定爪部1是配置於握持輔助板17的外周端部之前的位置,或爪部1正握持輔助板17的外周端部,又或爪部1未能握持輔助板17的外周端部。例如,以表示比0~100的範圍中量表化之值的60還大之值時,可判定爪部1是配置於握持輔助板17的外周端部之前的位置,表示大於10且60以下之值時,可判定爪部1是配置於可握持輔助板17的外周端部的位置,表示0以上且10以下之值時,則可判定爪部1是配置於比可握持輔助板17的外周端部的位置更靠內側之方式,調整量表化值與爪部的配置。在此, 爪部1被配置於比可握持輔助板17的外周端部的位置更靠內側時,則可確認爪部1未能握持輔助板17的外周端部。如此,藉由使用磁性感測器3,不僅可判定爪部1是否正握持輔助板17的外周端部,也可判定爪部1是否未能握持輔助板17的外周端部。又,磁性感測器3所致之判定係於複數驅動部2中分別進行。 The two sensing heads 3b and 3c quantify the distance between the sensing heads 3b and 3c with reference to the two positions, for example, a value of 0 to 100. For example, when the distance between the sensing heads 3b and 3c is set to a few mm, the position of the claw portion 1 can be determined by the μm level. Based on the scaled value, the sensing heads 3b and 3c determine the position of the magnet 3a. Thereby, the position of the claw portion 1 at the same distance by the movement of the moving shaft 2a and the magnet 3a can be accurately determined. More specifically, in the range of the scaled value, it is determined that the claw portion 1 is disposed at a position before the outer peripheral end portion of the grip auxiliary plate 17, or the claw portion 1 is holding the outer peripheral end portion of the auxiliary plate 17, and Or the claw portion 1 fails to grip the outer peripheral end portion of the auxiliary plate 17. For example, when the value indicating the value of the scaled value in the range of 0 to 100 is greater than 60, it can be determined that the claw portion 1 is disposed before the outer peripheral end portion of the grip auxiliary plate 17, indicating that it is greater than 10 and 60. When the value is the following, it can be determined that the claw portion 1 is disposed at the outer peripheral end portion of the grippable auxiliary plate 17, and when the value is 0 or more and 10 or less, it can be determined that the claw portion 1 is disposed to be more than the grippable auxiliary. The arrangement of the gauge value and the claw portion is adjusted such that the position of the outer peripheral end portion of the plate 17 is further inside. here, When the claw portion 1 is disposed further inside than the position at which the outer peripheral end portion of the auxiliary plate 17 can be gripped, it can be confirmed that the claw portion 1 fails to grip the outer peripheral end portion of the auxiliary plate 17. As described above, by using the magnetic sensor 3, it is possible to determine not only whether the claw portion 1 is gripping the outer peripheral end portion of the auxiliary plate 17, but also whether or not the claw portion 1 fails to grip the outer peripheral end portion of the auxiliary plate 17. Further, the determination by the magnetic sensor 3 is performed in the complex drive unit 2, respectively.

在本實施形態的支持體分離裝置100中,採用磁性感測器,但是,偵測部並不限定於磁性感測器。具體來說,只要是可藉由光、超音波或雷射等來偵測對象物之變位的位置檢測感測器的話,可使用任意感測器。 In the support separation device 100 of the present embodiment, a magnetic sensor is used, but the detection unit is not limited to the magnetic sensor. Specifically, any sensor can be used as long as it is a position detecting sensor that can detect the displacement of the object by light, ultrasonic or laser.

作為位置檢測感測器,除了磁性感測器之外,例如,可舉出超音波感測器、渦電流感測器、雷射感測器及接觸式感測器等。 As the position detecting sensor, in addition to the magnetic sensor, for example, an ultrasonic sensor, an eddy current sensor, a laser sensor, a contact sensor, or the like can be given.

[分離板4] [Separation plate 4]

分離板(板部)4係與輔助板17相等的圓形狀,分離板4的直徑係與輔助板17的直徑相等或稍微比較小。又,分離板4係於底面部側具有抵接面4a(圖1(b))。 The separating plate (plate portion) 4 has a circular shape equal to the auxiliary plate 17, and the diameter of the separating plate 4 is equal to or slightly smaller than the diameter of the auxiliary plate 17. Further, the separating plate 4 has an abutting surface 4a on the bottom surface side (Fig. 1(b)).

分離板4係於其上面部,等間隔地設置安裝於複數驅動部2的複數爪部14a(圖1(a))。 The separating plate 4 is attached to the upper surface portion, and the plurality of claw portions 14a attached to the plurality of driving portions 2 are provided at equal intervals (Fig. 1 (a)).

藉此,分離板4在從固定於平台14的層積體20抬起輔助板17時,可防止該輔助板17翹曲。所以,在從層積體20分離輔助板17時,可防止輔助板17破損。 Thereby, when the separation plate 4 lifts the auxiliary plate 17 from the laminated body 20 fixed to the stage 14, the auxiliary plate 17 can be prevented from being warped. Therefore, when the auxiliary plate 17 is separated from the laminated body 20, the auxiliary plate 17 can be prevented from being damaged.

[鉤止部6] [hook stop 6]

複數鉤止部6係將分離板4鉤止於升降部10所具備的升降板13。又,鉤止部6係伴隨升降部10的升降,一邊沿著圖1(b)所示之Y軸方向(升降方向)升降,一邊使鉤止的分離板4升降。隨此,使設置於分離板4的驅動部2及爪部1升降。 The plurality of hook portions 6 hook the separation plate 4 to the lift plate 13 provided in the lift unit 10. In addition, the hooking portion 6 moves up and down along the Y-axis direction (elevating direction) shown in FIG. 1(b) as the lifting portion 10 moves up and down, and raises and lowers the hooking separation plate 4. Accordingly, the drive unit 2 and the claw portion 1 provided on the separation plate 4 are moved up and down.

複數鉤止部6分別具備軸承部7、抵接部8、軸部9。 The plurality of hook portions 6 are provided with a bearing portion 7, a contact portion 8, and a shaft portion 9, respectively.

軸承部7係具有沿著圖1(b)所示之Y軸貫通於上下方向的孔,將具備抵接部8的軸部9插通於該孔。在此,軸承部7係具有朝向Y軸方向往上側擴大之圓錐狀的錐面(開口面)2a。 The bearing portion 7 has a hole that penetrates the vertical direction along the Y axis shown in FIG. 1(b), and the shaft portion 9 including the contact portion 8 is inserted into the hole. Here, the bearing portion 7 has a conical tapered surface (opening surface) 2a that expands upward in the Y-axis direction.

抵接部8係朝向軸部9之Y軸方向設置於上側,於與軸承部7的錐面7a對向之面,具備嵌合於該錐面7a的嵌合面8a。 The abutting portion 8 is provided on the upper side in the Y-axis direction of the shaft portion 9, and has a fitting surface 8a fitted to the tapered surface 7a on a surface facing the tapered surface 7a of the bearing portion 7.

再者,如圖1(b)所示,分離板4之抵接面4a在未抵接於層積體20的輔助板17之狀態下,抵接部8之嵌合面8a係嵌合於軸承部7之錐面7a。藉此,分離板4係藉由鉤止部6,鉤止於升降板13。 Further, as shown in Fig. 1(b), in the state in which the abutting surface 4a of the separating plate 4 is not in contact with the auxiliary plate 17 of the laminated body 20, the fitting surface 8a of the abutting portion 8 is fitted to The tapered surface 7a of the bearing portion 7. Thereby, the separating plate 4 is hooked to the lifting plate 13 by the hooking portion 6.

圖2的(a)~(c)係說明本實施形態的支持體分離裝置100之動作概略的圖。再者,於圖2(a)~(c)中,省略支持體分離裝置100所具備的升降部10。 (a) to (c) of FIG. 2 are views showing an outline of the operation of the support separation device 100 of the present embodiment. In addition, in FIGS. 2(a) to 2(c), the elevating portion 10 included in the support separating device 100 is omitted.

如圖2(a)所示,升降板13沿著Y軸方向下 降,在層積體20之輔助板17的平面部抵接於分離板4的抵接面4a之後,進而,在升降板13下降時,鉤止部6之軸承部7的錐面7a,與設置於軸部9之抵接部8的嵌合面8a分離,軸部9係滑動於軸承部7所具有之孔的內側。亦即,升降部10下降時,施加於升降板13的力,因為鉤止部6不將分離板4鉤止於升降板13,不會從升降板13傳達至分離板4。因此,可防止力從升降板13,透過分離板4的抵接面4a,施加至層積體20。所以,可防止層積體20被施加過度的力,而造成層積體20破損。 As shown in Fig. 2(a), the lifting plate 13 is arranged along the Y-axis direction. After the flat portion of the auxiliary plate 17 of the laminated body 20 abuts against the abutting surface 4a of the separating plate 4, and further, when the lifting plate 13 is lowered, the tapered surface 7a of the bearing portion 7 of the hooking portion 6 is The fitting surface 8a provided in the abutting portion 8 of the shaft portion 9 is separated, and the shaft portion 9 is slid inside the hole of the bearing portion 7. That is, when the lifting portion 10 is lowered, the force applied to the lifting plate 13 is not caused by the hooking portion 6 to hook the separating plate 4 to the lifting plate 13, and is not transmitted from the lifting plate 13 to the separating plate 4. Therefore, it is possible to prevent the force from being applied to the laminated body 20 from the lifting plate 13 through the abutting surface 4a of the separating plate 4. Therefore, the laminated body 20 can be prevented from being excessively applied, and the laminated body 20 can be broken.

又,不取決於層積體的厚度,分離板4的抵接面4a抵接於層積體的話,軸承部7之錐面7a與設置於軸部9之抵接部8的嵌合面8a分離,可讓力不會從升降板13傳達至分離板4。亦即,可不取決於層積體的厚度,防止因分離板4將過度的力施加於層積體。因此,不需要因應層積體的厚度,調整使分離板下降的位置。所以,可不取決於層積體的厚度,將層積體20抵接於分離板4的抵接面4a,可順利藉由爪部1,握持層積體20之輔助板17的外周端部(圖2(b))。 Further, the tapered surface 7a of the bearing portion 7 and the fitting surface 8a of the abutting portion 8 provided on the shaft portion 9 are not depending on the thickness of the laminated body, and the abutting surface 4a of the separating plate 4 abuts against the laminated body. Separation allows force to be transmitted from the lifting plate 13 to the separating plate 4. That is, it is possible to prevent an excessive force from being applied to the laminate by the separation plate 4 without depending on the thickness of the laminate. Therefore, it is not necessary to adjust the position at which the separation plate is lowered in accordance with the thickness of the laminate. Therefore, the laminated body 20 can be abutted against the abutting surface 4a of the separating plate 4 without depending on the thickness of the laminated body, and the outer peripheral end portion of the auxiliary plate 17 of the laminated body 20 can be gripped smoothly by the claw portion 1. (Fig. 2(b)).

之後,如圖2(c)所示,在藉由爪部1握持輔助板17之狀態下,使升降板13朝向Y軸方向往上側上升。藉此,軸部9係滑動於軸承部7之孔的內側,軸承部7之錐面7a與抵接部8之嵌合面8a嵌合。因此,升降部10上升時抬起升降板13的力,係透過鉤止部6傳達至分離板4及分離板4所具備的爪部1。在此,鉤止部6吊起 分離板4時,利用嵌合軸承部7之錐面7a與抵接部8之嵌合面8a,可對於升降板13將分離板4配置於特定位置。所以,藉由圖1(a)及(b)所示之複數鉤止部6與複數爪部1,可對於層積體20均等地施加力,可順利地分離輔助板17(圖2(c))。 Thereafter, as shown in FIG. 2( c ), the lift plate 13 is raised upward in the Y-axis direction while the auxiliary plate 17 is held by the claw portion 1 . Thereby, the shaft portion 9 is slid inside the hole of the bearing portion 7, and the tapered surface 7a of the bearing portion 7 is fitted to the fitting surface 8a of the abutting portion 8. Therefore, the force for lifting the lift plate 13 when the lift unit 10 is raised is transmitted to the claw portion 1 of the separating plate 4 and the separating plate 4 through the hook portion 6. Here, the hook portion 6 is lifted In the case of the separation plate 4, the separation plate 4 can be placed at a specific position with respect to the lift plate 13 by the fitting surface 8a of the tapered surface 7a of the fitting bearing portion 7 and the abutting portion 8. Therefore, by the plurality of hook portions 6 and the plurality of claw portions 1 shown in Figs. 1 (a) and (b), a force can be uniformly applied to the laminated body 20, and the auxiliary plate 17 can be smoothly separated (Fig. 2 (c )).

再者,支持體分離裝置100係於升降板13的周緣部分,等間隔地具備3個鉤止部6,但是,只要可鉤止分離板(板部),並不限定鉤止部的數量。又,鉤止部之抵接部的嵌合面與軸承部的開口面相互嵌合即可,例如,抵接部的嵌合面作為比軸部的直徑還大之圓柱形狀的凸型,開口面作為嵌合於凸型的凹型亦可。 Further, the support separation device 100 is provided on the peripheral portion of the lift plate 13 and has three hook portions 6 at equal intervals. However, the number of the hook portions is not limited as long as the separation plate (plate portion) can be hooked. Further, the fitting surface of the abutting portion of the hooking portion and the opening surface of the bearing portion may be fitted to each other. For example, the fitting surface of the abutting portion is a cylindrical convex shape larger than the diameter of the shaft portion, and the opening is opened. The surface may be a concave type that is fitted to the convex shape.

[升降部10] [lifting unit 10]

升降部10係具備升降板13,該升降板13被固定於升降部10。升降部10係使藉由複數鉤止部6鉤止於升降板13的分離板4,往上下方向升降。 The lift unit 10 is provided with a lift plate 13 that is fixed to the lift unit 10. The elevating portion 10 is hooked and held by the separating plate 4 of the elevating plate 13 by the plurality of hook portions 6, and is moved up and down.

作為在將基板19固定於平台14上之狀態下使保持輔助板17的升降部10上升的速度,0.1mm/秒以上,2mm/秒以下為佳。藉此,可防止基板19及輔助板17負擔過度的力。所以,可逐漸分離輔助板17。 The speed at which the elevating portion 10 of the holding auxiliary plate 17 is raised in a state where the substrate 19 is fixed to the stage 14 is preferably 0.1 mm/sec or more and 2 mm/sec or less. Thereby, the substrate 19 and the auxiliary board 17 can be prevented from being burdened with excessive force. Therefore, the auxiliary board 17 can be gradually separated.

[平台14] [platform 14]

平台14係固定層積體20之基板19者。在本實施形態的支持體分離裝置100中,平台14係具備多孔部15與 外周部16。黏合切割膠帶21的層積體20被載置於平台14,使層積體20位於多孔部15上。 The platform 14 is a substrate 19 that holds the laminate 20. In the support separation device 100 of the present embodiment, the stage 14 is provided with the porous portion 15 and The outer peripheral portion 16. The laminate 20 of the adhesive dicing tape 21 is placed on the stage 14 such that the laminate 20 is placed on the porous portion 15.

(多孔部15) (Porous portion 15)

多孔部15係指設置於外周部16的多孔性部分。多孔部15係可藉由減壓部(未圖示)吸引將切割膠帶21黏合於其多孔性部分的層積體20之基板19。藉此,可將基板19理想地固定於平台14上。 The porous portion 15 is a porous portion provided in the outer peripheral portion 16. The porous portion 15 can attract the substrate 19 of the laminate 20 in which the dicing tape 21 is bonded to the porous portion thereof by a pressure reducing portion (not shown). Thereby, the substrate 19 can be ideally fixed to the stage 14.

在本實施形態中,平台14係使用具備多孔部15與外周部16者,但是,在本發明中,只要可固定層積體20之基板19的話,可使用任意者。 In the present embodiment, the platform 14 is provided with the porous portion 15 and the outer peripheral portion 16. However, in the present invention, any substrate 19 may be used as long as the substrate 19 of the laminate 20 can be fixed.

[控制部23] [Control Unit 23]

如圖4所示,控制部23係控制驅動部2、磁性感測器3及升降部10。控制部23係藉由有線或無線通訊,與驅動部2、磁性感測器3及升降部10各別可通訊地連接。以下,說明控制部23所致之支持體分離裝置100的動作之一例。 As shown in FIG. 4, the control unit 23 controls the drive unit 2, the magnetic sensor 3, and the lift unit 10. The control unit 23 is communicably connected to the drive unit 2, the magnetic sensor 3, and the elevation unit 10 by wired or wireless communication. Hereinafter, an example of the operation of the support separation device 100 by the control unit 23 will be described.

首先,控制部23係使升降部10下降,使分離板4的抵接面4a,抵接於被固定於平台14的層積體20之輔助板17的平面部。接下來,控制部23係使驅動部2之移動軸2a移動,使複數爪部1握持輔助板17的外周端部之方式發送指令。 First, the control unit 23 lowers the elevating unit 10 so that the abutting surface 4a of the separating plate 4 abuts against the flat surface of the auxiliary plate 17 of the laminated body 20 fixed to the stage 14. Next, the control unit 23 transmits a command to move the moving shaft 2a of the driving unit 2 so that the plurality of claws 1 grip the outer peripheral end portion of the auxiliary plate 17.

接著,控制部23係個別判定分別設置於複數 驅動部2的磁性感測器3所示之量表化值,判定各爪部1是否正握持輔助板17的外周端部。 Next, the control unit 23 determines that each of the control units 23 is set to plural The scaled value shown by the magnetic sensor 3 of the drive unit 2 determines whether or not each of the claw portions 1 is holding the outer peripheral end portion of the auxiliary plate 17.

在此,控制部23係依據所有磁性感測器3所示之量表化值,判定所有爪部1被配置於可握持輔助板17的外周端部的位置時,使升降部10上升。藉此,提起被鉤止部6鉤止的分離板4,隨此,抬起所有爪部1。所以,以從層積體20分離輔助板17之方式施加力。藉此,從層積體20分離輔助板17的話,則完成輔助板17的分離,支持體分離裝置100進行以下的工程。 Here, the control unit 23 raises the lift unit 10 when it is determined that all the claws 1 are disposed at the position of the outer peripheral end of the auxiliary plate 17 in accordance with the scaled values indicated by all the magnetic sensors 3. Thereby, the separation plate 4 hooked by the hooking portion 6 is lifted, and accordingly, all the claw portions 1 are lifted up. Therefore, a force is applied in such a manner that the auxiliary plate 17 is separated from the laminated body 20. Thereby, when the auxiliary board 17 is separated from the laminated body 20, the separation of the auxiliary board 17 is completed, and the support body separation apparatus 100 performs the following processes.

又,控制部23使升降部10上升,以從層積體20分離輔助板17之方式施加力時,至少一個爪部1脫離輔助板17的話,對脫離的爪部1施加用以握持輔助板17的力的驅動部2,會使該爪部1朝向分離板4的外周端部移動。因此,磁性感測器3所示之量表化值,變成比判定為爪部正握持輔助板17的外周端部之所定範圍內的值還小。控制部23係確認到磁性感測器3所示之量表化值是比所定範圍內還小之值的話,則使升降部10下降,對驅動部2以使所有爪部1移動至初始的位置之方式發送指令。之後,控制部23係再次以使所有爪部1握持輔助板17的外周端部之方式指示驅動部2,接下來,對升降部10發送指示使其上升。可藉由再次的分離操作,從層積體20分離輔助板17的話,則完成輔助板17的分離,支持體分離裝置100進行以下的工程。又,於再次的分離操作中,輔助板17的分離失敗的話,控制部23係藉由搬送 機械臂(未圖示)將分離失敗的層積體20搬送至外部。被搬送至支持體分離裝置100的外部的層積體20係再次藉由剝離液使接著層18膨潤。 Further, when the control unit 23 raises the elevating unit 10 and applies a force to separate the auxiliary plate 17 from the laminated body 20, when at least one of the claws 1 is disengaged from the auxiliary plate 17, the gripping claw 1 is applied to the disengaged claw portion 1. The driving portion 2 of the force of the plate 17 moves the claw portion 1 toward the outer peripheral end portion of the separating plate 4. Therefore, the scaled value shown by the magnetic sensor 3 becomes smaller than a value within a predetermined range determined to be the outer peripheral end portion of the claw-side holding auxiliary plate 17. When the control unit 23 confirms that the scaled value shown by the magnetic sensor 3 is smaller than the predetermined range, the control unit 23 lowers the lift unit 10, and moves the claws 1 to the initial position of the drive unit 2 The command is sent in the same way. Thereafter, the control unit 23 instructs the drive unit 2 so that all the claw portions 1 grip the outer peripheral end portion of the auxiliary plate 17, and then sends an instruction to the lift unit 10 to raise it. When the auxiliary plate 17 is separated from the laminated body 20 by the separate separating operation, the separation of the auxiliary plate 17 is completed, and the support body separating device 100 performs the following work. Further, in the re-separation operation, if the separation of the auxiliary plate 17 fails, the control unit 23 transmits the same. The robot arm (not shown) conveys the laminated body 20 which failed the separation to the outside. The laminate 20 conveyed to the outside of the support separation device 100 is again swollen by the peeling liquid.

再者,控制部23進行再次的分離操作的次數,係使用者可選擇,對控制部23進行指示亦可。 Further, the number of times the control unit 23 performs the separation operation again may be selected by the user and may be instructed by the control unit 23.

又,分離失敗的層積體是於與輔助板的接著層對向之面具備分離層者時,則隔著輔助板對分離層照射光線,使該分離層變質,讓接著力降低亦可。 Further, when the laminated body that has failed to be separated has a separation layer on the surface opposite to the adhesive layer of the auxiliary plate, the separation layer is irradiated with light through the auxiliary plate to deteriorate the separation layer, and the adhesion may be lowered.

[層積體20] [Layer 20]

針對圖1(b)所示,藉由本實施形態的支持體分離裝置100分離輔助板17的層積體20,詳細進行說明。層積體20係透過接著層18貼附基板19與輔助板17。 As shown in Fig. 1(b), the laminate 20 of the auxiliary plate 17 is separated by the support separation device 100 of the present embodiment, and will be described in detail. The laminate 20 is attached to the substrate 19 and the auxiliary plate 17 through the adhesive layer 18.

(輔助板17) (auxiliary board 17)

輔助板17係在基板19的薄化、搬送、安裝等的製程時,為了防止基板19的破損或變形,用以支持基板19者,透過接著層18貼附於基板19。 The auxiliary board 17 is attached to the substrate 19 through the adhesive layer 18 in order to prevent the substrate 19 from being damaged or deformed during the process of thinning, transporting, or mounting the substrate 19.

於藉由本實施形態的支持體分離裝置100分離的層積體20中,輔助板17係俯視的形狀為圓形的平板狀,於厚度方向中設置有複數貫通孔。輔助板17可利用從貫通孔供給剝離液,使接著層18膨潤。 In the laminate 20 separated by the support separation device 100 of the present embodiment, the auxiliary plate 17 has a circular plate shape in plan view, and a plurality of through holes are provided in the thickness direction. The auxiliary plate 17 can swell the adhesive layer 18 by supplying the peeling liquid from the through holes.

輔助板(支持體)17係支持基板19的支持體,透過接著層18貼附於基板19。因此,作為輔助板17,在 基板19的薄化、搬送、安裝等的製程時,為了防止基板19的破損或變形而具有必要的強度即可。再者,輔助板也可使用形成有藉由對於與接著層對向之側的面照射光線而變質的分離層者。所以,作為透射用以使分離層變質的光線者即可。根據以上觀點,作為輔助板17,可舉出由玻璃、矽、丙烯酸系樹脂所成者等。 The auxiliary plate (support) 17 is a support for supporting the substrate 19, and is attached to the substrate 19 through the adhesive layer 18. Therefore, as the auxiliary board 17, in In the process of thinning, transporting, or mounting the substrate 19, it is necessary to have necessary strength in order to prevent breakage or deformation of the substrate 19. Further, the auxiliary plate may be formed by a separation layer formed by illuminating the surface on the side opposite to the adhesion layer. Therefore, it is sufficient to transmit light for deteriorating the separation layer. From the above viewpoints, examples of the auxiliary plate 17 include glass, enamel, and acrylic resin.

再者,輔助板17可使用300~1000μm的厚度者。依據本實施形態的支持體分離裝置100,如此即使是厚度薄的支持體,也可一邊防止該支持體破損,一邊順利地握持該支持體的外周端部。 Further, the auxiliary plate 17 can be used in a thickness of 300 to 1000 μm. According to the support separation device 100 of the present embodiment, even in the support having a small thickness, the outer peripheral end portion of the support can be smoothly gripped while preventing the support from being damaged.

(接著層18) (Next layer 18)

接著層18係貼合基板19與輔助板17者,藉由將接著劑塗佈於基板19形成。作為對基板19或輔助板17之接著劑的塗布方法,並未特別限定,但例如可舉出旋轉塗布、浸漬(dipping)、滾輪刮刀、噴射塗布、縫隙塗布等的方法。又,接著層18係例如代替將接著劑直接塗布於基板19,利用將兩面預先塗布接著劑的薄膜(所謂乾膜)貼附於基板19來形成亦可。 Next, the layer 18 is bonded to the substrate 19 and the auxiliary board 17, and is formed by applying an adhesive to the substrate 19. The coating method of the adhesive agent for the substrate 19 or the auxiliary plate 17 is not particularly limited, and examples thereof include a method of spin coating, dipping, roller scraping, spray coating, and slit coating. Further, the bonding layer 18 may be formed by, for example, directly applying a bonding agent to the substrate 19, and attaching a film (so-called dry film) on which both surfaces are applied with an adhesive to the substrate 19.

接著層18的厚度可因應貼合對象的基板19及輔助板17的種類、施加於接著後的基板19的處理等適當設定,10~150μm為佳,15~100μm更佳。 The thickness of the layer 18 can be appropriately set in accordance with the type of the substrate 19 and the auxiliary plate 17 to be bonded, the treatment applied to the subsequent substrate 19, and the like, preferably 10 to 150 μm, more preferably 15 to 100 μm.

作為形成接著層18的接著劑,可無特別限定地使用,藉由加熱可提升熱流動性之熱可塑性的接著材料 為佳。作為熱可塑性的接著材料,例如可舉出丙烯酸系樹脂、苯乙烯系樹脂、馬來醘亞胺系樹脂、碳氫系樹脂、彈性體、聚碸系樹脂等。 As the adhesive for forming the adhesive layer 18, it can be used without any particular limitation, and a thermoplastic material which can improve thermal fluidity by heating can be used. It is better. Examples of the thermoplastic adhesive material include an acrylic resin, a styrene resin, a maleic imine resin, a hydrocarbon resin, an elastomer, and a polyfluorene resin.

(基板19) (substrate 19)

基板19可在隔著接著層18被輔助板17支持之狀態下,供應於薄化、安裝等的製程。作為基板19,並不限定於矽晶圓基板,可使用陶瓷基板、薄膜基板、可撓性基板等之任意基板。 The substrate 19 can be supplied to a process of thinning, mounting, or the like in a state where it is supported by the auxiliary plate 17 via the adhesive layer 18. The substrate 19 is not limited to the ruthenium wafer substrate, and any substrate such as a ceramic substrate, a film substrate, or a flexible substrate can be used.

(切割膠帶21) (Cutting Tape 21)

切割膠帶21係被黏合於層積體20的基板19側,為了切割剝離輔助板17後的基板19所使用。 The dicing tape 21 is bonded to the substrate 19 side of the laminated body 20, and is used for cutting the substrate 19 after peeling the auxiliary plate 17.

作為切割膠帶21,例如可使用黏著層形成於基底薄膜之構造的切割膠帶21。作為基底薄膜,例如可使用PVC(聚氯乙烯)、聚烯或聚丙烯等的樹脂薄膜。 As the dicing tape 21, for example, a dicing tape 21 having a structure in which an adhesive layer is formed on a base film can be used. As the base film, for example, a resin film of PVC (polyvinyl chloride), polyolefin or polypropylene can be used.

(切割框架22) (Cutting frame 22)

於切割膠帶21的露出面的更外周,安裝有用以防止切割膠帶21被壓彎的切割框架22。作為切割框架22,例如可舉出鋁等之金屬製的切割框架、不銹鋼(SUS)等之合金製的切割框架、及樹脂製的切割框架。 On the outer periphery of the exposed face of the dicing tape 21, a cutting frame 22 for preventing the dicing tape 21 from being bent is attached. The cutting frame 22 is, for example, a metal cutting frame made of aluminum or the like, a cutting frame made of an alloy such as stainless steel (SUS), or a resin cutting frame.

<支持體分離方法> <Support separation method>

本發明的一實施形態之支持體分離方法,係從貼附基板19與支持基板19之輔助板(支持體)17所成的層積體20,分離輔助板17的支持體分離方法,包含藉由複數爪部1來握持層積體20之輔助板的外周端部的握持工程;在握持工程中,個別偵測出移動之爪部1的各別位置,在偵測出複數爪部1中至少一個移動至比所定區域更靠內側時,以移動至初始的位置之方式控制所有的複數爪部1。 The support separation method according to the embodiment of the present invention is a laminate body 20 formed by attaching the substrate 19 and the auxiliary plate (support) 17 of the support substrate 19, and a method for separating the support of the auxiliary plate 17, including Holding the outer peripheral end of the auxiliary plate of the laminated body 20 by the plurality of claws 1; in the holding process, the respective positions of the moving claws 1 are individually detected, and the plurality of claws are detected When at least one of 1 moves to the inside of the predetermined area, all of the plurality of claws 1 are controlled in such a manner as to move to the initial position.

又,本發明的一實施形態之支持體分離方法,係偵測出爪部1移動至比所定區域更靠內側時,將所有的複數爪部1移動至初始的位置,之後,再次對於相同的層積體20進行握持工程亦可。 Further, in the support separation method according to the embodiment of the present invention, when the claw portion 1 is moved to the inside of the predetermined region, all of the plurality of claw portions 1 are moved to the initial position, and then the same is performed again. The laminate 20 can also be held by a holding project.

又,本發明的一實施形態之支持體分離方法,係在握持工程中,將輔助板17的平面部,抵接於與輔助板17的平面部抵接的抵接面4a;藉由將設置於輔助板17的倒角部位17a,抵接於複數爪部1分別具有之於抵接面4a的面方向中越離開抵接面4a,從抵接面4a的外周朝向內周之傾斜越大的複數傾斜面1b,來握持輔助板更佳 Further, in the support separation method according to the embodiment of the present invention, the flat portion of the auxiliary plate 17 is brought into contact with the abutting surface 4a that abuts against the flat portion of the auxiliary plate 17 in the gripping process; The chamfered portion 17a of the auxiliary plate 17 abuts against the abutting surface 4a in the surface direction of the abutting surface 4a, and the inclination of the outer peripheral portion toward the inner circumference of the abutting surface 4a is larger. Multiple inclined faces 1b to better hold the auxiliary plate

又,本發明的一實施形態之支持體分離方法,係具備在握持工程之前,於抵接面4a的面方向中,因應輔助板17的厚度來調整爪部1之傾斜面1b的端邊與抵接面4a之間的距離的調整工程更佳。 Further, in the support separation method according to the embodiment of the present invention, the end surface of the inclined surface 1b of the claw portion 1 is adjusted in accordance with the thickness of the auxiliary plate 17 in the surface direction of the contact surface 4a before the gripping process. The adjustment of the distance between the abutting faces 4a is better.

本發明的一實施形態之支持體分離方法,係在握持工程中,使具備抵接面4a,且以可移動於上下方 向之方式鉤止的分離板(板部)4下降,將抵接面4a抵接於輔助板17的平面部亦可。 A support separation method according to an embodiment of the present invention is provided with a contact surface 4a in a holding process, and is movable to the upper and lower sides. The separating plate (plate portion) 4 that has been hooked thereto is lowered, and the abutting surface 4a may be in contact with the flat portion of the auxiliary plate 17.

本發明並不限定於上述之各實施形態,在申請項所記載的範圍中可進行各種變更,關於適當組合不同實施形態分別揭示之技術手段所得的實施形態,也包含於本發明的技術範圍。 The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the invention, and the embodiments obtained by appropriately combining the technical means disclosed in the respective embodiments are also included in the technical scope of the present invention.

[產業上之利用可能性] [Industry use possibility]

本發明的支持體分離裝置及支持體分離方法,係例如於細微化之半導體裝置的製造工程中可廣範圍利用。 The support separation device and the support separation method of the present invention can be widely used, for example, in the manufacturing process of a miniaturized semiconductor device.

1‧‧‧爪部 1‧‧‧ claws

2‧‧‧驅動部 2‧‧‧ Drive Department

3‧‧‧磁性感測器 3‧‧‧Magnetic sensor

3a‧‧‧磁鐵 3a‧‧‧ Magnet

3b‧‧‧感測頭 3b‧‧‧Sensing head

3c‧‧‧感測頭 3c‧‧ ‧Sensing head

4‧‧‧分離板 4‧‧‧Separation board

6‧‧‧鉤止部 6‧‧‧ hook stop

10‧‧‧升降部 10‧‧‧ Lifting Department

23‧‧‧控制部 23‧‧‧Control Department

100‧‧‧支持體分離裝置 100‧‧‧Support body separation device

Claims (11)

一種支持體分離裝置,係從貼附基板與支持前述基板之支持體所成的層積體,分離前述支持體的支持體分離裝置,其特徵為具備:複數爪部,係握持前述層積體之前述支持體的外周端部;驅動部,使前述爪部分別對於前述支持體的平面部個別平行地移動;偵測部,係個別偵測出藉由前述驅動部移動之前述爪部的各別位置;及控制部,係在前述偵測部偵測出前述複數爪部中至少一個移動至比所定區域更靠內側時,以移動至初始的位置之方式控制所有的前述複數爪部。 A support separation device is a support separation device that separates a support from a substrate and a support for supporting the substrate, and is characterized in that the support separation device includes a plurality of claws and holds the laminate a driving portion that moves the claw portions individually in parallel with respect to a plane portion of the support body; and the detecting portion individually detects the claw portion moved by the driving portion And the control unit controls the all of the plurality of claws so as to move to the initial position when the detecting unit detects that at least one of the plurality of claws moves to the inside of the predetermined area. 如申請專利範圍第1項所記載之支持體分離裝置,其中,前述偵測部,係具備偵測前述爪部之變位的位置檢測感測器。 The support separation device according to claim 1, wherein the detection unit includes a position detecting sensor that detects displacement of the claw portion. 如申請專利範圍第1項或第2項所記載之支持體分離裝置,其中,前述驅動部,係具備移動軸,與可動地支持該移動軸的支持部;前述偵測部,係具備至少一個磁鐵,與偵測出該磁鐵之變位的至少兩個感測頭;前述爪部,係設置於配置在比被握持之前述支持體的 外周端部更靠外側之側的前述移動軸的端部;前述感測頭,係分別配置於前述支持部之前述移動軸的移動方向之前側與後側;前述磁鐵,係固定於前述移動軸,配置於前述兩個感測頭之間。 The support separation device according to the first or second aspect of the invention, wherein the drive unit includes a movement axis and a support unit that movably supports the movement axis; and the detection unit includes at least one a magnet, and at least two sensing heads for detecting displacement of the magnet; the claws are disposed on the support body disposed opposite to the holder An end portion of the moving shaft on the outer side of the outer peripheral end portion; the sensing head is disposed on a front side and a rear side of the moving direction of the moving shaft of the support portion; and the magnet is fixed to the moving shaft , disposed between the two sensing heads. 如申請專利範圍第1項或第2項所記載之支持體分離裝置,其中,前述驅動部,係設置於板部,該板部具有與前述層積體之前述支持體的平面部抵接之抵接面;前述爪部,係分別具備越離開前述板部之前述抵接面,從該抵接面的外周朝向內周的傾斜越大的傾斜面;藉由將前述支持體的平面部抵接於前述抵接面,並將前述傾斜面抵接於設置在前述支持體之外周端部的倒角部位,來握持前述支持體。 The support separation device according to the first or second aspect of the invention, wherein the drive unit is provided on a plate portion having a planar portion that is in contact with the support body of the laminate. The abutting surface; the claw portion is provided with an inclined surface that is larger in inclination from the outer circumference of the abutting surface toward the inner circumference than the abutting surface that is apart from the plate portion; and the flat portion of the support body is abutted The support body is gripped by the abutting surface, and the inclined surface is brought into contact with a chamfered portion provided at an outer peripheral end portion of the support body. 如申請專利範圍第4項所記載之支持體分離裝置,其中,前述爪部,係分別具備於前述板部之抵接面的面方向中,調整該爪部之傾斜面的端邊與前述板部之抵接面之間的距離的調整部。 The support body separating device according to the fourth aspect of the invention, wherein the claw portion is provided in an end surface of the abutting surface of the plate portion, and an edge of the inclined surface of the claw portion is adjusted to the plate The adjustment unit of the distance between the abutting faces of the part. 如申請專利範圍第4項所記載之支持體分離裝置,其中,具備:前述板部;固定部,係固定前述層積體之基板側;及 升降部,係使前述板部往上下方向升降;前述板部,係以可移動於上下方向之方式,藉由鉤止部鉤止於前述升降部。 The support separation device according to claim 4, further comprising: the plate portion; and a fixing portion that fixes the substrate side of the laminate; The lifting portion moves the plate portion up and down. The plate portion is hooked to the lifting portion by a hooking portion so as to be movable in the vertical direction. 一種支持體分離方法,係從貼附基板與支持前述基板之支持體所成的層積體,分離前述支持體的支持體分離方法,其特徵為:包含藉由複數爪部來握持前述層積體之前述支持體的外周端部的握持工程;在前述握持工程中,個別偵測出移動之前述爪部的各別位置,在偵測出前述複數爪部中至少一個移動至比所定區域更靠內側時,以移動至初始的位置之方式控制所有的前述複數爪部。 A method for separating a support, which is a method for separating a support from a support substrate and a support for supporting the substrate, and separating the support from the support, comprising: holding the layer by a plurality of claws Holding the outer peripheral end of the support body of the integrated body; in the holding project, individually detecting the respective positions of the moving claw portions, and detecting at least one of the plurality of claw portions moving to a ratio When the predetermined area is further inside, all of the plurality of claws are controlled in such a manner as to move to the initial position. 如申請專利範圍第7項所記載之支持體分離方法,其中,偵測出前述爪部移動至比所定區域更靠內側時,將所有的前述複數爪部移動至初始的位置,之後,再次對於相同的層積體進行前述握持工程。 The support separation method according to claim 7, wherein when the claw portion is detected to move further inside than the predetermined region, all of the plurality of claw portions are moved to an initial position, and then, again, The same laminate is subjected to the aforementioned holding work. 如申請專利範圍第7項或第8項所記載之支持體分離方法,其中,在前述握持工程中,將前述支持體的平面部,抵接於與前述支持體的平面部抵接的抵接面;藉由將設置於前述支持體的倒角部位,抵接於前述複數爪部分別具有之於該抵接面的面方向中越離開該抵接面,從該抵接面的外周朝向內周之傾斜越大的複數傾斜 面,來握持前述支持體。 The support separation method according to the seventh aspect of the invention, wherein the flat portion of the support member abuts against the planar portion of the support body in the gripping process. And a contact surface provided in the chamfered portion of the support body, the abutting of the plurality of claw portions in the surface direction of the abutting surface, and the distance from the outer surface of the abutting surface The slope of the week is steeper Face, to hold the aforementioned support. 如申請專利範圍第9項所記載之支持體分離方法,其中,具備:調整工程,係在前述握持工程之前,於前述抵接面的面方向中,因應前述支持體的厚度來調整該爪部之前述傾斜面的端邊與前述抵接面之間的距離。 The method for separating a support according to the ninth aspect of the invention, further comprising: an adjustment project, wherein the claw is adjusted in a surface direction of the abutting surface in response to a thickness of the support body before the holding process The distance between the end of the inclined surface of the portion and the abutting surface. 如申請專利範圍第9項所記載之支持體分離方法,其中,在前述握持工程中,使具備前述抵接面,且以可移動於上下方向之方式鉤止的板部下降,將前述抵接面抵接於前述支持體的平面部。 The support separation method according to the ninth aspect of the invention, wherein the abutting surface is provided, and the plate portion that is hooked to the upper and lower directions is lowered, and the The junction abuts against the flat portion of the support.
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JPH11116046A (en) 1997-10-20 1999-04-27 Mecs Corp Robot hand for wafer carrying robot
JP2000247537A (en) * 1999-02-23 2000-09-12 Matsushita Electric Works Ltd Separating device
JP3918556B2 (en) * 2001-12-28 2007-05-23 三菱電機株式会社 Sticking wafer separating apparatus and sticking wafer separating method
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