TW201724342A - Support body separation device and support body separation method capable of holding a laminated body smoothly without relying on the thickness of the laminated body and capable of being separated from the laminated body - Google Patents

Support body separation device and support body separation method capable of holding a laminated body smoothly without relying on the thickness of the laminated body and capable of being separated from the laminated body Download PDF

Info

Publication number
TW201724342A
TW201724342A TW105127693A TW105127693A TW201724342A TW 201724342 A TW201724342 A TW 201724342A TW 105127693 A TW105127693 A TW 105127693A TW 105127693 A TW105127693 A TW 105127693A TW 201724342 A TW201724342 A TW 201724342A
Authority
TW
Taiwan
Prior art keywords
support
plate
holding
substrate
laminate
Prior art date
Application number
TW105127693A
Other languages
Chinese (zh)
Other versions
TWI690016B (en
Inventor
岩田泰昌
中村彰彦
小針倫
Original Assignee
東京應化工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京應化工業股份有限公司 filed Critical 東京應化工業股份有限公司
Publication of TW201724342A publication Critical patent/TW201724342A/en
Application granted granted Critical
Publication of TWI690016B publication Critical patent/TWI690016B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

An object of the present invention is a support body capable of holding a laminated body smoothly without relying on the thickness of the laminated body and capable of being separated from the laminated body. The solution of the present invention includes: a support body separation apparatus (100) having a platform (15) for fixing a substrate (20), a claw part (12) holding an auxiliary board (18), an escalating part (5) allowing the claw part (12) to move upward or downward, and a hook part (1) to hook and hold the claw part (12) at the escalating part (5). The claw part (12) is hooked by the hook part (1) at the escalating part (5) in a manner of moving in an upward/downward direction.

Description

支持體分離裝置及支持體分離方法 Support separation device and support separation method

本發明係關於支持體分離裝置及支持體分離方法。 The present invention relates to a support separation device and a support separation method.

近年來,被要求IC卡、手機等的電子機器的薄型化、小型化、輕量化等。對於為了滿足該等要求來說,關於被組入的半導體晶片,也必須使用薄型的半導體晶片。因此,作為半導體晶片的基底之晶圓基板的厚度(膜厚)在現狀中為125μm~150μm,但是,次世代的晶片用必須設為25μm~50μm。所以,對於為了獲得前述之膜厚的晶圓基板來說,必定需要晶圓基板的薄板化工程。 In recent years, electronic devices such as IC cards and mobile phones have been required to be thinner, smaller, and lighter. In order to satisfy these requirements, it is also necessary to use a thin semiconductor wafer with respect to the semiconductor wafer to be incorporated. Therefore, the thickness (film thickness) of the wafer substrate which is the base of the semiconductor wafer is 125 μm to 150 μm in the current state, but the next generation wafer must be 25 μm to 50 μm. Therefore, in order to obtain the above-mentioned wafer thickness of the wafer substrate, a thinning process of the wafer substrate is required.

晶圓基板因薄板化而強度降低,所以,為了防止薄板化之晶圓基板的破損,在製程中,一邊在將輔助板貼合於晶圓基板的狀態下自動搬送,一邊於晶圓基板上安裝電路等的構造物。然後,製程後,分離晶圓基板與輔助板。因此,至今使用從晶圓剝離支持體的各種方法。 In order to prevent the wafer substrate from being damaged by the thinning of the wafer substrate, the wafer is automatically transferred while being bonded to the wafer substrate in the process, and is on the wafer substrate. A structure such as a circuit is mounted. Then, after the process, the wafer substrate and the auxiliary board are separated. Therefore, various methods of peeling off the support from the wafer have hitherto been used.

於專利文獻1,記載有連接於可旋動地配設在 機台的機械臂體,握持搬送晶圓的晶圓搬送機器人之機械手,且具有握持晶圓之外周面的握持部所構成的機械手。 Patent Document 1 describes that the connection is rotatably disposed in The robot arm of the machine holder holds the robot of the wafer transfer robot that transports the wafer, and has a robot that holds the grip portion on the outer peripheral surface of the wafer.

於專利文獻2,記載有剝離透過黏合材黏合於具有剛性之支持體的半導體晶圓的方法,具備將插入構件插入黏合材的插入工程,與一邊往將半導體晶圓從支持體剝離之方向彈撥,一邊對黏合材施加振動的加振工程之半導體晶圓的剝離方法。 Patent Document 2 describes a method in which a peeling and transmitting adhesive is bonded to a semiconductor wafer having a rigid support, and includes an insertion process for inserting the insert member into the adhesive, and plucking the semiconductor wafer from the support. A method of peeling off a semiconductor wafer by applying vibration to the adhesive material.

〔先前技術文獻〕 [Previous Technical Literature] 〔專利文獻〕 [Patent Document]

[專利文獻1]日本特開平11-116046號公報(1999年4月27日公開) [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 11-116046 (published on Apr. 27, 1999)

[專利文獻2]日本特開2006-32506號公報(2006年2月2日公開) [Patent Document 2] Japanese Laid-Open Patent Publication No. 2006-32506 (published on Feb. 2, 2006)

專利文獻1並不是揭示在分離基板與支持體時,可防止基板破損的支持體分離裝置及支持體分離方法者。 Patent Document 1 does not disclose a support separation device and a support separation method that can prevent the substrate from being damaged when the substrate and the support are separated.

又,在專利文獻2所記載的支持體分離方法中,將板子的前端插入至晶圓與支持體之間,故板子的插入時有晶圓破損之虞。 Further, in the support separation method described in Patent Document 2, since the tip end of the board is inserted between the wafer and the support, the wafer is broken at the time of insertion of the board.

又,專利文獻2所記載的支持體分離方法, 並不是針對不取決於層積體的厚度,可順利保持該層積體之支持體,可從該層積體分離支持體的支持體分離裝置及支持體分離方法進行揭示者。 Moreover, the support separation method described in Patent Document 2, It is not disclosed that the support body of the laminate can be smoothly held without depending on the thickness of the laminate, and the support separation device and the support separation method for separating the support from the laminate can be disclosed.

本發明係有鑑於前述問題所發明者,目的為提供不取決於層積體的厚度,可順利保持該層積體之支持體,從該層積體分離支持體的支持體分離裝置及其關聯技術。 The present invention has been made in view of the above problems, and an object thereof is to provide a support separation device capable of smoothly holding a support without depending on the thickness of the laminate, and a support separation device for separating the support from the laminate and its association technology.

為了解決前述的課題,本案發明者銳意檢討的結果,到達以下的本發明。 In order to solve the above problems, the inventors of the present invention have determined the results of the review and have arrived at the following invention.

本發明的支持體分離裝置,係從透過接著層貼附基板與支持前述基板之支持體所成的層積體,分離該支持體的支持體分離裝置,其特徵為:具備:固定部,係固定前述層積體之前述基板;保持部,係保持前述層積體之前述支持體;升降部,係使前述保持部往上下方向升降;及鉤止部,係將前述保持部鉤止於前述升降部;前述保持部,係藉由前述鉤止部以可移動於上下方向之方式鉤止於前述升降部。 The support separation device of the present invention is a support separation device that separates the support from a laminate that is attached to a support that supports the substrate through an adhesive layer, and is characterized in that it has a fixing portion and a fixing portion. The substrate is fixed to the laminate; the holding portion holds the support of the laminate; the lifting portion moves the holding portion up and down; and the hook portion hooks the holding portion to the front side The lifting portion; the holding portion is hooked to the lifting portion so as to be movable in the vertical direction by the hook portion.

又,本發明的支持體分離方法,係從貼附基板與支持前述基板之支持體所成的層積體,分離前述支持體的支持體分離方法,其特徵為:包含:保持工程,係固定前述層積體之基板,保持前述層積體之支持體;及分離工程,係在前述保持工程之後,抬起被保持的前述支持體 並將其從前述層積體分離;在前述保持工程中,使以可移動於上下方向之方式鉤止的保持部下降,抵接於前述支持體的平面部,保持該支持體。 Moreover, the support separation method of the present invention is a method of separating a support body from a laminate obtained by attaching a substrate and a support supporting the substrate, and is characterized in that: a holding process is performed, and the method is: a substrate of the laminate, holding the support of the laminate; and a separation process, lifting the held support after the holding process In the holding process, the holding portion hooked so as to be movable in the vertical direction is lowered to abut against the flat portion of the support, and the support is held.

依據本發明,可發揮不取決於層積體的厚度,可順利地保持該層積體之支持體,從該層積體分離支持體的效果。 According to the present invention, it is possible to exhibit the effect of separating the support from the laminate without depending on the thickness of the laminate, and the support of the laminate can be smoothly held.

1‧‧‧鉤止部 1‧‧‧ hook stop

2‧‧‧軸承部(鉤止部) 2‧‧‧ bearing part (hook stop)

2a‧‧‧錐面(開口面,軸承部) 2a‧‧‧Cone surface (opening surface, bearing part)

3‧‧‧抵接部(鉤止部) 3‧‧‧Abutment (hook stop)

3a‧‧‧嵌合面(抵接部,鉤止部) 3a‧‧‧Fitting surface (abutment, hook stop)

4‧‧‧軸部(鉤止部) 4‧‧‧Axis (hook stop)

5‧‧‧升降部 5‧‧‧ Lifting Department

6‧‧‧浮動接合件(接合件,升降部) 6‧‧‧Floating joints (joints, lifting parts)

7‧‧‧擋止器 7‧‧‧stops

8‧‧‧升降板(升降部) 8‧‧‧ Lifting plate (lifting section)

8’‧‧‧升降板(升降部) 8'‧‧‧ Lifting plate (lifting section)

10‧‧‧分離板(板部,保持部) 10‧‧‧Separation plate (plate part, holding part)

10’‧‧‧分離板(板部,保持部) 10'‧‧‧Separation plate (plate part, holding part)

10a‧‧‧抵接面(板部) 10a‧‧‧Abutment (board)

12‧‧‧爪部 12‧‧‧ claws

12a‧‧‧捕捉面(爪部) 12a‧‧‧Capture surface (claw)

12b‧‧‧傾斜面(爪部) 12b‧‧‧Sloping surface (claw)

12c‧‧‧調整部 12c‧‧‧Adjustment Department

12d‧‧‧螺絲軸 12d‧‧‧ screw shaft

12e‧‧‧平面部 12e‧‧‧Flat Department

13‧‧‧驅動部 13‧‧‧ Drive Department

13a‧‧‧移動軸 13a‧‧‧Moving axis

13b‧‧‧支持部 13b‧‧‧Support Department

14‧‧‧磁性感測器 14‧‧‧Magnetic sensor

14a‧‧‧磁鐵 14a‧‧‧ Magnet

14b‧‧‧感測頭 14b‧‧‧Sensing head

14c‧‧‧感測頭 14c‧‧ ‧Sensing head

15‧‧‧平台(固定部) 15‧‧‧ Platform (fixed department)

16‧‧‧多孔部(固定部) 16‧‧‧Porous part (fixed part)

17‧‧‧外周部(固定部) 17‧‧‧The outer part (fixed part)

18‧‧‧輔助板(支持體) 18‧‧‧Auxiliary board (support)

18’‧‧‧輔助板(支持體) 18’‧‧‧Auxiliary board (support)

18a‧‧‧倒角部位(支持體) 18a‧‧‧Chamfering part (support)

19‧‧‧接著層 19‧‧‧Next layer

20‧‧‧基板 20‧‧‧Substrate

21‧‧‧層積體 21‧‧‧Layer

21’‧‧‧層積體 21’‧‧‧Layer

22‧‧‧切割膠帶 22‧‧‧Cut Tape

23‧‧‧切割框架 23‧‧‧ cutting frame

24‧‧‧吸附墊(保持部) 24‧‧‧Adsorption pad (holding section)

25‧‧‧分離層 25‧‧‧Separation layer

100‧‧‧支持體分離裝置 100‧‧‧Support body separation device

101‧‧‧支持體分離裝置 101‧‧‧Support body separation device

[圖1]說明本發明之一實施型態(第一實施型態)的支持體分離裝置100之概略的圖。 Fig. 1 is a view showing the outline of a support separation device 100 according to an embodiment (first embodiment) of the present invention.

[圖2]說明本發明之一實施型態(第一實施型態)的支持體分離裝置100之動作概略的圖。 Fig. 2 is a view for explaining an outline of the operation of the support separating apparatus 100 according to an embodiment (first embodiment) of the present invention.

[圖3]說明本發明之一實施型態(第一實施型態)的支持體分離裝置100所具備的爪部12之概略的圖。 [Fig. 3] A schematic view of a claw portion 12 provided in a support separating device 100 according to an embodiment (first embodiment) of the present invention.

[圖4]說明本發明之一實施型態(第二實施型態)的支持體分離裝置101之概略的圖。 Fig. 4 is a view showing the outline of a support separating apparatus 101 according to an embodiment (second embodiment) of the present invention.

<支持體分離裝置100> <Support body separation device 100>

使用圖1~3,針對本發明之一實施型態(第一實施 型態)的支持體分離裝置100進行詳細說明。 One embodiment of the present invention is implemented using FIGS. 1 to 3 (first implementation) The support separation device 100 of the type) will be described in detail.

圖1(a)係說明俯視之構成設置於升降板8之鉤止部1的軸承部2及抵接部3的配置,及設置於位於升降板8下之分離板(板部,保持部)10的爪部12的配置的圖。又,圖1(b)係依據圖1(a)所示之A-A’線箭頭剖面,說明支持體分離裝置100的概略的圖。 Fig. 1 (a) shows the arrangement of the bearing portion 2 and the abutting portion 3 which are provided in the hook portion 1 of the elevating plate 8 in a plan view, and the separating plate (plate portion, holding portion) provided under the elevating plate 8 A diagram of the arrangement of the claw portions 12 of 10. Further, Fig. 1(b) is a schematic view showing the support separation device 100 in accordance with the A-A' line arrow cross section shown in Fig. 1(a).

如圖1(a)及(b)所示,本實施型態的支持體分離裝置100係具備複數鉤止部1、升降部5、複數爪部(保持部)12。在此,升降部5係透過升降板8,藉由鉤止部1鉤止分離板10,藉此,使配置於分離板10之外周部份的爪部12往上下方向升降。再者,爪部12係藉由驅動部13移動。 As shown in FIGS. 1(a) and 1(b), the support separation device 100 of the present embodiment includes a plurality of hook portions 1, a lifting portion 5, and a plurality of claw portions (holding portions) 12. Here, the elevating portion 5 passes through the elevating plate 8, and the hooking portion 1 hooks the separating plate 10, whereby the claw portion 12 disposed on the outer peripheral portion of the separating plate 10 is moved up and down. Further, the claw portion 12 is moved by the driving portion 13.

又,支持體分離裝置100係具備平台(固定部)15,於平台15上,固定依序層積輔助板(支持體)18、接著層19及基板20所成的層積體21。再者,層積體21之接著層19係藉由剝離液等,因膨潤而接著力降低。 Further, the support separation device 100 includes a stage (fixed portion) 15 on which the laminate 21 formed by the sequential laminate auxiliary plate (support) 18, the subsequent layer 19, and the substrate 20 is fixed. Further, the adhesive layer 19 of the laminate 21 is reduced in adhesion by swelling or the like by the peeling liquid or the like.

再者,於本實施型態的支持體分離裝置100中,於固定於平台15之層積體21的基板20側,黏合有切割膠帶22,切割膠帶22係具備切割框架23。 Further, in the support separation device 100 of the present embodiment, the dicing tape 22 is bonded to the substrate 20 side of the laminate 21 fixed to the stage 15, and the dicing tape 22 is provided with the dicing frame 23.

如圖1(a)所示,於支持體分離裝置100中,構成複數鉤止部1的軸承部2與抵接部3,於升降板8的周緣部分中等間隔地配置。又,複數爪部12隔著驅動部13,等間隔地配置於分離板10上。鉤止部1與爪部 12係交互配置,且鉤止部1與爪部12於俯視中等間隔地配置。所以,藉由使升降部5上升,透過升降板8施加於鉤止部1的力,會均等地施加於配置於分離板10的複數爪部12。所以,藉由複數爪部12,握持(保持)層積體21,升降部5透過鉤止部1抬起分離板10時,可從複數爪部12將力均等地施加於層積體21。 As shown in Fig. 1(a), in the support body separating device 100, the bearing portion 2 and the abutting portion 3 constituting the plurality of hook portions 1 are disposed at equal intervals on the peripheral portion of the lift plate 8. Further, the plurality of claw portions 12 are disposed on the separating plate 10 at equal intervals across the driving portion 13. Hook stop 1 and claw The 12 series are alternately arranged, and the hook portion 1 and the claw portion 12 are disposed at an intermediate interval in plan view. Therefore, the force applied to the hooking portion 1 through the elevating plate 8 is equally applied to the plurality of claw portions 12 disposed on the separating plate 10 by raising the elevating portion 5. Therefore, when the stacking body 21 is held (held) by the plurality of claw portions 12 and the lifting and lowering portion 5 lifts the separating plate 10 through the hook stopping portion 1, the force can be equally applied to the laminated body 21 from the plurality of claw portions 12. .

以下,針對支持體分離裝置100所具備之鉤止部1、升降部5、分離板10、爪部12、驅動部13、磁性感測器14及平台15,更詳細地說明。 Hereinafter, the hooking portion 1, the lifting portion 5, the separating plate 10, the claw portion 12, the driving portion 13, the magnetic sensor 14, and the stage 15 provided in the support separating device 100 will be described in more detail.

[鉤止部1] [hook stop 1]

複數鉤止部1係將分離板10鉤止於升降部5所具備的升降板8。又,鉤止部1係伴隨升降部5的升降,一邊沿著圖1(b)所示之Y軸方向(升降方向)升降,一邊使鉤止的分離板10升降。隨此,使設置於分離板10的驅動部13及爪部12升降。 The plurality of hook portions 1 hook the separation plate 10 to the lift plate 8 provided in the lift portion 5. In addition, the hooking portion 1 moves up and down along the Y-axis direction (elevating direction) shown in FIG. 1(b) as the lifting portion 5 moves up and down, and raises and lowers the hooking separating plate 10. Accordingly, the driving portion 13 and the claw portion 12 provided on the separating plate 10 are moved up and down.

複數鉤止部1分別具備軸承部2、抵接部3、軸部4。 Each of the plurality of hook portions 1 includes a bearing portion 2, a contact portion 3, and a shaft portion 4.

軸承部2係具有沿著圖1(b)所示之Y軸貫通於上下方向的孔,將具備抵接部3的軸部4插通於該孔。在此,軸承部2係具有朝向Y軸方向往上側擴大之圓錐狀的錐面(開口面)2a。 The bearing portion 2 has a hole that penetrates the vertical direction along the Y axis shown in FIG. 1(b), and the shaft portion 4 including the contact portion 3 is inserted into the hole. Here, the bearing portion 2 has a conical tapered surface (opening surface) 2a that expands upward in the Y-axis direction.

抵接部3係朝向軸部4之Y軸方向設置於上側,於與軸承部2的錐面2a對向之面,具備嵌合於該錐 面2a的嵌合面3a。 The abutting portion 3 is provided on the upper side in the Y-axis direction of the shaft portion 4, and is fitted to the tapered surface 2a facing the bearing portion 2 The fitting surface 3a of the surface 2a.

再者,如圖1(b)所示,分離板10之抵接面10a在未抵接於層積體21的輔助板18之狀態下,抵接部3之嵌合面3a係嵌合於軸承部2之錐面2a。藉此,分離板10係藉由鉤止部1,鉤止於升降板8。 Further, as shown in Fig. 1(b), in the state in which the abutting surface 10a of the separating plate 10 is not in contact with the auxiliary plate 18 of the laminated body 21, the fitting surface 3a of the abutting portion 3 is fitted to The tapered surface 2a of the bearing portion 2. Thereby, the separating plate 10 is hooked to the lifting plate 8 by the hooking portion 1.

圖2的(a)~(c)係說明本實施型態的支持體分離裝置100之動作概略的圖。再者,於圖2(a)~(c)中,省略支持體分離裝置100所具備的升降部5。 (a) to (c) of FIG. 2 are views showing an outline of the operation of the support separation device 100 of the present embodiment. In addition, in FIGS. 2(a) to 2(c), the elevating portion 5 included in the support separating device 100 is omitted.

如圖2(a)所示,升降板8沿著Y軸方向下降,在層積體21之輔助板18的平面部抵接於分離板10的抵接面10a之後,進而,在升降板8下降時,鉤止部1之軸承部2的錐面2a,與設置於軸部4之抵接部3的嵌合面3a分離,軸部4係滑動於軸承部2所具有之孔的內側。亦即,升降部5下降時,施加於升降板8的力,因為鉤止部1不將分離板10鉤止於升降板8,不會從升降板8傳達至分離板10。因此,可防止力從升降板8,透過分離板10的抵接面10a,施加至層積體21。所以,可防止層積體21被施加過度的力,而造成層積體21破損。 As shown in Fig. 2(a), the elevating plate 8 descends in the Y-axis direction, and after the flat portion of the auxiliary plate 18 of the laminated body 21 abuts against the abutting surface 10a of the separating plate 10, and further, on the elevating plate 8 At the time of the lowering, the tapered surface 2a of the bearing portion 2 of the hooking portion 1 is separated from the fitting surface 3a of the abutting portion 3 of the shaft portion 4, and the shaft portion 4 is slid inside the hole of the bearing portion 2. That is, when the lifting portion 5 is lowered, the force applied to the lifting plate 8 is not caused by the hooking portion 1 to hook the separating plate 10 to the lifting plate 8, and is not transmitted from the lifting plate 8 to the separating plate 10. Therefore, it is possible to prevent the force from being applied to the laminated body 21 from the lifting plate 8 through the abutting surface 10a of the separating plate 10. Therefore, excessive force is prevented from being applied to the laminated body 21, and the laminated body 21 is broken.

又,不取決於層積體的厚度,分離板10的抵接面10a抵接於層積體的話,軸承部2之錐面2a與設置於軸部4之抵接部3的嵌合面3a分離,可讓力不會從升降板8傳達至分離板10。亦即,可不取決於層積體的厚度,防止因分離板10將過度的力施加於層積體。因此, 不需要因應層積體的厚度,調整使分離板下降的位置。所以,可不取決於層積體的厚度,將層積體21抵接於分離板10的抵接面10a,可順利藉由爪部12,握持層積體21之輔助板18的外周端部(圖2(b))。 Further, the tapered surface 2a of the bearing portion 2 and the fitting surface 3a of the abutting portion 3 provided on the shaft portion 4 when the abutting surface 10a of the separating plate 10 abuts against the laminated body does not depend on the thickness of the laminated body. Separation allows force to be transmitted from the lift plate 8 to the separation plate 10. That is, it is possible to prevent an excessive force from being applied to the laminated body by the separating plate 10 without depending on the thickness of the laminated body. therefore, It is not necessary to adjust the position at which the separation plate is lowered in response to the thickness of the laminate. Therefore, the laminated body 21 can be abutted against the abutting surface 10a of the separating plate 10 without depending on the thickness of the laminated body, and the outer peripheral end of the auxiliary plate 18 of the laminated body 21 can be gripped smoothly by the claw portion 12. (Fig. 2(b)).

之後,如圖2(c)所示,在藉由爪部12握持輔助板18之狀態下,使升降板8朝向Y軸方向往上側上升。藉此,軸部4係滑動於軸承部2之孔的內側,軸承部2之錐面2a與抵接部3之嵌合面3a嵌合。因此,升降部5上升時抬起升降板8的力,係透過鉤止部1傳達至分離板10及分離板10所具備的爪部12。在此,鉤止部1吊起分離板10時,利用嵌合軸承部2之錐面2a與抵接部3之嵌合面3a,可對於升降板8將分離板10配置於特定位置。所以,藉由圖1(a)及(b)所示之複數鉤止部1與複數爪部12,可對於層積體21均等地施加力,可順利地分離輔助板18(圖2(c))。 Thereafter, as shown in FIG. 2( c ), the lift plate 8 is raised upward in the Y-axis direction while the auxiliary plate 18 is held by the claw portion 12 . Thereby, the shaft portion 4 is slid inside the hole of the bearing portion 2, and the tapered surface 2a of the bearing portion 2 is fitted to the fitting surface 3a of the abutting portion 3. Therefore, the force for lifting the lift plate 8 when the lift unit 5 is raised is transmitted to the separation plate 10 and the claw portion 12 of the separation plate 10 through the hook portion 1 . When the hooking portion 1 lifts the separating plate 10, the separating plate 10 can be placed at a specific position with respect to the lifting plate 8 by the fitting surface 3a of the fitting bearing portion 2 and the fitting surface 3a of the abutting portion 3. Therefore, by the plurality of hook portions 1 and the plurality of claw portions 12 shown in Figs. 1 (a) and (b), a force can be uniformly applied to the laminated body 21, and the auxiliary plate 18 can be smoothly separated (Fig. 2 (c )).

再者,支持體分離裝置100係於升降板8的周緣部分,等間隔地具備3個鉤止部1,但是,只要可鉤止分離板(板部,保持部),並不限定鉤止部的數量。又,鉤止部之抵接部的嵌合面與軸承部的開口面相互嵌合即可,例如,抵接部的嵌合面作為比軸部的直徑還大之圓柱形狀的凸型,開口面作為嵌合於凸型的凹型亦可。 Further, the support body separating device 100 is provided on the peripheral portion of the elevating plate 8 and has three hooking portions 1 at equal intervals. However, the hooking portion is not limited as long as the separating plate (plate portion, holding portion) can be hooked. quantity. Further, the fitting surface of the abutting portion of the hooking portion and the opening surface of the bearing portion may be fitted to each other. For example, the fitting surface of the abutting portion is a cylindrical convex shape larger than the diameter of the shaft portion, and the opening is opened. The surface may be a concave type that is fitted to the convex shape.

[升降部5] [lifting section 5]

升降部5係具備升降板8,該升降板8被固定於升降 部5。升降部5係使藉由複數鉤止部1鉤止於升降板8的分離板10,往上下方向升降。 The lifting portion 5 is provided with a lifting plate 8 which is fixed to the lifting plate Department 5. The elevating portion 5 is configured such that the plurality of hook portions 1 are hooked to the separating plate 10 of the elevating plate 8, and are moved up and down.

作為在將基板20固定於平台15上之狀態下使保持輔助板18的升降部5上升的速度,0.1mm/秒以上,2mm/秒以下為佳。藉此,可防止基板20及輔助板18負擔過度的力。所以,可逐漸分離輔助板18。 The speed at which the lifting portion 5 of the holding auxiliary plate 18 is raised in a state where the substrate 20 is fixed to the stage 15 is preferably 0.1 mm/sec or more and 2 mm/sec or less. Thereby, the substrate 20 and the auxiliary board 18 can be prevented from being burdened with excessive force. Therefore, the auxiliary board 18 can be gradually separated.

[分離板10] [Separation plate 10]

分離板(板部,保持部)10係與輔助板18相等的圓形狀,分離板10的直徑係與輔助板18的直徑相等或稍微比較小。又,分離板10係於底面部側具有抵接面10a(圖1(b))。 The separating plate (plate portion, holding portion) 10 has a circular shape equal to the auxiliary plate 18, and the diameter of the separating plate 10 is equal to or slightly smaller than the diameter of the auxiliary plate 18. Further, the separation plate 10 has an abutting surface 10a on the bottom surface side (Fig. 1(b)).

分離板10係於其上面部,等間隔地設置安裝於複數驅動部13的複數爪部12(圖1(a))。 The separating plate 10 is attached to the upper surface portion, and the plurality of claw portions 12 attached to the plurality of driving portions 13 are provided at equal intervals (Fig. 1 (a)).

[爪部12] [Claw 12]

使用圖3(a)~(c),針對本實施型態的支持體分離裝置100所具備的爪部12,更詳細進行說明。 The claw portions 12 provided in the support separating device 100 of the present embodiment will be described in more detail with reference to Figs. 3(a) to 3(c).

圖3(a)係說明爪部12及設置於爪部12之調整部12c、12d及12e之概略的圖,圖3(b)係說明爪部12之傾斜面(傾斜部)12b,抵接於層積體21之輔助板18的倒角部位18a之狀態的圖,圖3(c)係揭示於圖3(a)之B-B’線箭頭剖面中,捕捉面12a捕捉層積體21之輔助板18的外周端部前之狀態的圖。 Fig. 3(a) is a schematic view showing the claw portion 12 and the adjustment portions 12c, 12d, and 12e provided in the claw portion 12, and Fig. 3(b) is a view showing the inclined surface (inclined portion) 12b of the claw portion 12, abutting FIG. 3(c) is a view taken along line BB' of the arrow of FIG. 3(a), and the capturing surface 12a captures the laminated body 21 in a state of the chamfered portion 18a of the auxiliary plate 18 of the laminated body 21. A view of the state before the outer peripheral end of the auxiliary plate 18.

複數爪部12係分別對於分離板10的外周端部,隔開相等距離配置(圖1(a))。又,爪部12係分別於握持輔助板18的外周端部之狀態中,在與分離板10的外周端部之間設置有間距(間隙)(圖2(b))。 The plurality of claw portions 12 are arranged at equal intervals with respect to the outer peripheral end portions of the separating plate 10 (Fig. 1 (a)). Further, in the state in which the claw portions 12 are respectively gripped at the outer peripheral end portions of the auxiliary plates 18, a pitch (gap) is provided between the outer peripheral end portions of the separating plates 10 (Fig. 2(b)).

如圖3(a)~(c)所示,爪部12係具備捕捉面12a、傾斜面12b、及調整部12c。 As shown in FIGS. 3(a) to 3(c), the claw portion 12 includes a catching surface 12a, an inclined surface 12b, and an adjustment portion 12c.

用以形成爪部12的材料,係因應應握持之輔助板18的材質,適當選擇即可。所以,用以形成爪部的材料,可使用不鏽鋼或鋁等的金屬,及工程塑膠等。又,在輔助板18的材質是玻璃時,使用工程塑膠即芳香族聚醚酮(Aromatic polyether ketone)來形成更佳,即使在芳香族聚醚酮中,具有芳香族基的聚醚醚酮(PEEK)、具有芳香族基的聚醚酮酮(PEKK)及具有芳香族基的聚醚醚酮酮(PEEKK)為佳,PEEK最理想。藉此,藉由爪部12握持由玻璃所成之輔助板18的外周端部時,可防止該輔助板18破損。 The material for forming the claw portion 12 may be appropriately selected depending on the material of the auxiliary plate 18 to be held. Therefore, as the material for forming the claw portion, a metal such as stainless steel or aluminum, an engineering plastic or the like can be used. Further, when the material of the auxiliary plate 18 is glass, it is more preferably formed of an aromatic polyetherketone (Aromatic polyether ketone) which is an engineering plastic, and an aromatic polyetheretherketone is used even in the aromatic polyether ketone. PEEK), polyetherketoneketone (PEKK) having an aromatic group, and polyetheretherketoneketone (PEEKK) having an aromatic group are preferred, and PEEK is most preferred. Thereby, when the outer peripheral end portion of the auxiliary plate 18 made of glass is held by the claw portion 12, the auxiliary plate 18 can be prevented from being damaged.

(捕捉面12a) (capture face 12a)

捕捉面12a係捕捉輔助板18的外周端部。在此,捕捉面12a係與分離板10的抵接面10a垂直之面,且以與輔助板18的外周端部相同,或描繪更大之圓弧之方式彎曲之面。 The capturing surface 12a captures the outer peripheral end of the auxiliary plate 18. Here, the capturing surface 12a is a surface that is perpendicular to the abutting surface 10a of the separating plate 10, and is curved like the outer peripheral end of the auxiliary plate 18, or a curved surface that depicts a larger arc.

複數爪部12的捕捉面12a係於將輔助板18的平面部抵接於分離板10的抵接面10a之狀態中,包圍 輔助板18的外周端部,以朝向分離板10的中心點之方式移動(圖2(a)及(c))。在此,複數爪部12的捕捉面12a係藉由驅動部13,同時以相同速度,接近輔助板18的外周端部。因此,可藉由捕捉面12a,一邊以層積體21之輔助板18的中心點,與分離板10的中心點重疊之方式,誘導該層積體21,一邊握持輔助板18的外周端部。又,以與輔助板18的外周端部相同,或者描繪更大圓弧之方式彎曲的捕捉面12a,係以圓弧的中心點附近抵接於輔助板18的外周端部之方式,捕捉輔助板18。因此,於複數捕捉面12a的各中心部中,可握持圓形狀的輔助板18。所以,藉由複數爪部12,可等間隔且順利地握持輔助板18的外周端部。因此,抬起分離板10時,可讓藉由複數爪部12施加於輔助板18的力均等。 The capturing surface 12a of the plurality of claws 12 is in a state of abutting the planar portion of the auxiliary plate 18 against the abutting surface 10a of the separating plate 10, and is surrounded by The outer peripheral end portion of the auxiliary plate 18 is moved toward the center point of the separating plate 10 (Figs. 2(a) and (c)). Here, the capturing surface 12a of the plurality of claw portions 12 is approached to the outer peripheral end portion of the auxiliary plate 18 at the same speed by the driving portion 13. Therefore, the laminated body 21 can be induced to overlap the center point of the auxiliary plate 18 of the laminated body 21 by the center of the auxiliary plate 18 of the laminated body 21 while holding the outer peripheral end of the auxiliary plate 18 by the capturing surface 12a. unit. Further, the capturing surface 12a which is curved in the same manner as the outer peripheral end portion of the auxiliary plate 18 or which is curved in a larger arc shape is abutting against the outer peripheral end portion of the auxiliary plate 18 in the vicinity of the center point of the circular arc. Board 18. Therefore, the circular auxiliary plate 18 can be held in each center portion of the plurality of capturing faces 12a. Therefore, the outer peripheral end portions of the auxiliary plates 18 can be gripped at equal intervals and smoothly by the plurality of claw portions 12. Therefore, when the separation plate 10 is lifted, the force applied to the auxiliary plate 18 by the plurality of claw portions 12 can be made uniform.

(傾斜面12b) (inclined surface 12b)

如圖3(b)所示,傾斜面(傾斜部)12b係層積體21之抵接於輔助板18的倒角部位18a的未彎曲的平面。傾斜面12b係沿著包含捕捉面12a的端邊之中心點的一部分設置。 As shown in FIG. 3(b), the inclined surface (inclined portion) 12b is a non-curved plane in which the laminated body 21 abuts against the chamfered portion 18a of the auxiliary plate 18. The inclined surface 12b is provided along a portion of the center point including the end side of the capturing surface 12a.

傾斜面12b係於分離板10之抵接面10a的面方向中,越離開該抵接面10a,從該抵接面10a的外周朝向內周的傾斜越大(圖3(b))。藉此,於輔助板18的外周端部中,於位於與分離板10對向之面的背面側的倒角部位18a,可抵接傾斜面12b。 The inclined surface 12b is in the surface direction of the abutting surface 10a of the separating plate 10, and the inclination from the outer circumference toward the inner circumference of the abutting surface 10a is larger as it goes away from the abutting surface 10a (Fig. 3(b)). Thereby, in the outer peripheral end portion of the auxiliary plate 18, the inclined surface 12b can be abutted on the chamfered portion 18a on the back side of the surface facing the separation plate 10.

傾斜部12b係對於分離板10的抵接面10a,具有30°以上且未滿90°之範圍內的傾斜。藉此,可防止對於輔助板18的倒角部位18a,從傾斜面12b施加過度的力。又,在將輔助板18的平面部抵接於分離板10的抵接面10a之狀態中,傾斜面12b的傾斜係以對於輔助板18之倒角部位18a的傾斜成為平行之方式設置,因可讓倒角部位18a的端部不會集中過度的力,所以最理想。 The inclined portion 12b has an inclination in a range of 30° or more and less than 90° with respect to the abutting surface 10a of the separating plate 10. Thereby, excessive force is applied from the inclined surface 12b to the chamfered portion 18a of the auxiliary plate 18. Further, in a state where the flat portion of the auxiliary plate 18 is in contact with the abutting surface 10a of the separating plate 10, the inclination of the inclined surface 12b is set so that the inclination of the chamfered portion 18a of the auxiliary plate 18 is parallel, because It is preferable that the end portion of the chamfered portion 18a does not concentrate excessive force.

又,傾斜面12b係沿著從分離板10的抵接面10a分離的捕捉面12a的端邊,設置於包含該端邊之中心點的一部分。藉此,可使所捕捉之輔助板18的外周端部,在接近大略點接觸於平面的傾斜面12b之狀態下順利地抵接於爪部12之捕捉面12a所具有之圓弧的中心點附近。所以,支持體分離裝置100係藉由以包圍分離板10之方式等間隔地配置的複數傾斜面12b,在接近大略點接觸之狀態下握持輔助板18的外周端部。因此,可從複數傾斜面12b均等地施加用以握持輔助板18的力,抬起分離板10時,可防止抵接於複數傾斜面12b之輔助板18的外周端部,從傾斜面12b脫離。 Further, the inclined surface 12b is provided along the end side of the capturing surface 12a separated from the abutting surface 10a of the separating plate 10, and is provided at a part including the center point of the end side. As a result, the outer peripheral end portion of the assisted auxiliary plate 18 can be smoothly brought into contact with the center point of the arc of the capturing surface 12a of the claw portion 12 in a state in which the inclined surface 12b close to the plane is brought into close contact with the plane. nearby. Therefore, the support body separating device 100 holds the outer peripheral end portion of the auxiliary plate 18 in a state of being brought close to a large point by the plurality of inclined faces 12b arranged at equal intervals so as to surround the separating plate 10. Therefore, the force for holding the auxiliary plate 18 can be equally applied from the plurality of inclined faces 12b, and when the separation plate 10 is lifted, the outer peripheral end portion of the auxiliary plate 18 abutting against the plurality of inclined faces 12b can be prevented from the inclined face 12b. Get rid of.

又,如圖3(b)所示,傾斜面12b的下端係與輔助板18之與基板20對向之側的面,配置於相同平面上。藉此,可防止傾斜面12b鉤住基板20及接著層19等。所以,僅將傾斜面12b抵接於輔助板18,可藉由爪部12順利地握持該輔助板18。 Further, as shown in FIG. 3(b), the lower end of the inclined surface 12b is disposed on the same plane as the surface of the auxiliary plate 18 facing the substrate 20. Thereby, the inclined surface 12b can be prevented from being caught by the substrate 20, the subsequent layer 19, and the like. Therefore, only the inclined surface 12b is abutted against the auxiliary plate 18, and the auxiliary plate 18 can be smoothly gripped by the claw portion 12.

[調整部12c] [Adjustment section 12c]

如圖3(a)所示,調整部12c係具備螺絲軸12d與平面部12e,利用將螺絲軸12d推頂於平面部12e,使爪部12對於分離板10的抵接面10a垂直移動。藉此,可因應輔助板18的厚度,調整爪部12之傾斜面12b的下端,與分離板10的抵接面10a之間的距離。因此,不取決於層積體21之輔助板18的厚度,可藉由爪部12,更正確地握持輔助板18的倒角部位18a。再者,調整部12c所致之與分離板10的抵接面10a之間的距離的調整,因應應分離之支持體的種類預先進行即可。 As shown in Fig. 3 (a), the adjustment portion 12c includes a screw shaft 12d and a flat portion 12e, and the claw portion 12 is vertically moved to the abutting surface 10a of the separating plate 10 by pushing the screw shaft 12d against the flat portion 12e. Thereby, the distance between the lower end of the inclined surface 12b of the claw portion 12 and the abutting surface 10a of the separating plate 10 can be adjusted in accordance with the thickness of the auxiliary plate 18. Therefore, the chamfered portion 18a of the auxiliary plate 18 can be more accurately held by the claw portion 12 without depending on the thickness of the auxiliary plate 18 of the laminated body 21. Further, the adjustment of the distance between the abutting surface 10a of the separating plate 10 by the adjusting portion 12c may be performed in advance in accordance with the type of the support to be separated.

[驅動部13] [Drive unit 13]

驅動部13係具備使爪部12移動的移動軸13a,與可動地支持該移動軸13a的支持部13b。驅動部13係分別等間隔地配置於分離板10的上面部,使各爪部12以平行地沿著分離板10的抵接面10a,朝向分離板10的外周端部接近或離開之方式移動(圖2(a)及(b))。又,驅動部13係使各爪部12同時以相同速度,朝向輔助板18的外周端部移動。藉此,可藉由爪部一邊包圍一邊握持輔助板18的外周端部。 The drive unit 13 includes a movement shaft 13a that moves the claw portion 12, and a support portion 13b that movably supports the movement shaft 13a. The driving portions 13 are disposed at equal intervals on the upper surface portion of the separating plate 10, and move the claw portions 12 in parallel so as to approach or separate from the outer peripheral end portion of the separating plate 10 along the abutting surface 10a of the separating plate 10. (Figure 2 (a) and (b)). Further, the drive unit 13 moves the claw portions 12 toward the outer peripheral end portion of the auxiliary plate 18 at the same speed at the same time. Thereby, the outer peripheral end portion of the auxiliary plate 18 can be gripped while being surrounded by the claw portion.

[磁性感測器14] [Magnetic Sensor 14]

磁性感測器(偵測部)14係個別地偵測被驅動部13移動之爪部12的各別位置。再者,磁性感測器14係藉由 控制部控制。 The magnetic sensor (detection unit) 14 individually detects the respective positions of the claw portions 12 moved by the drive unit 13. Furthermore, the magnetic sensor 14 is Control unit control.

如圖2(a)及(b)所示,磁性感測器14係具備固定於驅動部13之移動軸13a的磁鐵14a,與配置於該磁鐵14a的移動方向之前後,偵測該磁鐵14a之變位的兩個感測頭14b及14c。在此,磁鐵14a係在移動軸13a移動爪部12時,同時等距離移動。此時,兩個感測頭14b及14c係依據從磁鐵14a發出之磁性的變化,偵測因移動軸13a移動,磁鐵14a變位亦即移動。 As shown in FIGS. 2(a) and 2(b), the magnetic sensor 14 includes a magnet 14a fixed to the moving shaft 13a of the driving unit 13, and the magnet 14a is detected before being placed in the moving direction of the magnet 14a. The two sensing heads 14b and 14c are displaced. Here, the magnet 14a moves at the same time when the moving shaft 13a moves the claw portion 12. At this time, the two sensing heads 14b and 14c detect that the magnet 14a is displaced or moved due to the movement of the moving shaft 13a in accordance with the change in the magnetic force emitted from the magnet 14a.

兩個感測頭14b及14c係以該等兩個位置為基準,以例如0~100之值,量表化感測頭14b及14c之間的距離。例如,將感測頭14b及14c之間的距離設定為數mm程度時,可利用μm級來判定爪部12的位置。依據該量表化值,感測頭14b及14c係判定磁鐵14a的位置。藉此,可正確判定藉由移動軸13a與磁鐵14a同時移動相等的距離之爪部12的位置。更具體來說,於量表化值的範圍類別,判定爪部12是配置於握持輔助板18的外周端部之前的位置,或爪部12正握持輔助板18的外周端部,又或爪部12未能握持輔助板18的外周端部。例如,以表示比0~100的範圍中量表化之值的60還大之值時,可判定爪部12是配置於握持輔助板18的外周端部之前的位置,表示大於10且60以下之值時,可判定爪部12是配置於可握持輔助板18的外周端部的位置,表示0以上且10以下之值時,則可判定爪部12是配置於比可握持輔助板18的外周端部的位置更靠內側之方式,調整量表化值 與爪部的配置。在此,爪部12被配置於比可握持輔助板18的外周端部的位置更靠內側時,則可確認爪部12未能握持輔助板18的外周端部。如此,藉由使用磁性感測器14,不僅可判定爪部12是否正握持輔助板18的外周端部,也可判定爪部12是否未能握持輔助板18的外周端部。又,於複數驅動部13中分別進行磁性感測器14所致之判定。藉此,至少於1個爪部12中,確認未能握持輔助板18的外周端部的話,則中斷輔助板18的分離,藉由剝離液來膨潤層積體21的接著層亦可。或者,將支持體分離裝置100之複數爪部12及分離板10的位置回歸初始的狀態,再次進行輔助板18的分離亦可。該等操作係藉由利用控制部(未圖示)控制驅動部13、磁性感測器14來進行。 The two sensing heads 14b and 14c quantify the distance between the sensing heads 14b and 14c with reference to the two positions, for example, a value of 0 to 100. For example, when the distance between the sensing heads 14b and 14c is set to a few mm, the position of the claw portion 12 can be determined by the μm level. Based on the scaled value, the sensing heads 14b and 14c determine the position of the magnet 14a. Thereby, the position of the claw portion 12 which is moved by the movable shaft 13a and the magnet 14a at the same time can be correctly determined. More specifically, in the range of the scaled value, it is determined that the claw portion 12 is disposed at a position before the outer peripheral end portion of the grip auxiliary plate 18, or the claw portion 12 is holding the outer peripheral end portion of the auxiliary plate 18, and Or the claw portion 12 fails to grip the outer peripheral end portion of the auxiliary plate 18. For example, when the value indicating the value of the scaled value in the range of 0 to 100 is greater than 60, it can be determined that the claw portion 12 is disposed at the position before the outer peripheral end portion of the grip auxiliary plate 18, and indicates that it is greater than 10 and 60. When the value is the following, it can be determined that the claw portion 12 is disposed at the outer peripheral end portion of the grippable auxiliary plate 18, and when the value is 0 or more and 10 or less, it can be determined that the claw portion 12 is disposed to be more than the grippable auxiliary. The position of the outer peripheral end of the plate 18 is further on the inner side, and the scaled value is adjusted. With the configuration of the claws. Here, when the claw portion 12 is disposed inside the position at which the outer peripheral end portion of the auxiliary plate 18 can be gripped, it can be confirmed that the claw portion 12 fails to grip the outer peripheral end portion of the auxiliary plate 18. As described above, by using the magnetic sensor 14, it is possible to determine not only whether the claw portion 12 is gripping the outer peripheral end portion of the auxiliary plate 18 but also whether or not the claw portion 12 fails to grip the outer peripheral end portion of the auxiliary plate 18. Further, the determination by the magnetic sensor 14 is performed in the complex drive unit 13. By confirming that the outer peripheral end portion of the auxiliary plate 18 is not gripped in at least one of the claw portions 12, the separation of the auxiliary plate 18 is interrupted, and the adhesive layer of the laminated body 21 may be swelled by the peeling liquid. Alternatively, the positions of the plurality of claw portions 12 and the separation plate 10 of the support body separating device 100 may be returned to the initial state, and the separation of the auxiliary plates 18 may be performed again. These operations are performed by controlling the drive unit 13 and the magnetic sensor 14 by a control unit (not shown).

在本實施型態的支持體分離裝置100中,採用磁性感測器,但是,偵測部並不限定於磁性感測器。具體來說,只要是可藉由光、超音波或雷射等來偵測對象物之變位的位置檢測感測器的話,可使用任意感測器。 In the support body separating device 100 of the present embodiment, a magnetic sensor is used, but the detecting portion is not limited to the magnetic sensor. Specifically, any sensor can be used as long as it is a position detecting sensor that can detect the displacement of the object by light, ultrasonic or laser.

作為位置檢測感測器,除了磁性感測器之外,例如,可舉出超音波感測器、渦電流感測器、雷射感測器及接觸式感測器等。 As the position detecting sensor, in addition to the magnetic sensor, for example, an ultrasonic sensor, an eddy current sensor, a laser sensor, a contact sensor, or the like can be given.

[平台15] [platform 15]

平台15係固定層積體21之基板20者。在本實施型態的支持體分離裝置100中,平台15係具備多孔部16與 外周部17。黏合切割膠帶22的層積體21被載置於平台15,使層積體21位於多孔部16上。 The stage 15 is a substrate 20 to which the laminated body 21 is fixed. In the support separation device 100 of the present embodiment, the platform 15 is provided with a porous portion 16 and The outer peripheral portion 17. The laminate 21 of the adhesive dicing tape 22 is placed on the stage 15 such that the laminate 21 is placed on the porous portion 16.

(多孔部16) (Porous part 16)

多孔部16係指設置於外周部17的多孔性部分。多孔部16係可藉由減壓部(未圖示)吸引將切割膠帶22黏合於其多孔性部分的層積體21之基板20。藉此,可將基板20理想地固定於平台15上。 The porous portion 16 is a porous portion provided in the outer peripheral portion 17. The porous portion 16 is capable of attracting the substrate 20 of the laminate 21 in which the dicing tape 22 is bonded to the porous portion thereof by a pressure reducing portion (not shown). Thereby, the substrate 20 can be ideally fixed to the stage 15.

在本實施型態中,平台15係使用具備多孔部16與外周部17者,但是,在本發明中,只要可固定層積體21之基板20的話,可使用任意者。 In the present embodiment, the platform 15 is provided with the porous portion 16 and the outer peripheral portion 17. However, in the present invention, any substrate may be used as long as the substrate 20 of the laminate 21 can be fixed.

[層積體21] [Layer 21]

針對圖1(b)所示,藉由本實施型態的支持體分離裝置100分離輔助板18的層積體21,詳細進行說明。層積體21係透過接著層19貼附基板20與輔助板18。 As shown in Fig. 1(b), the laminate 21 of the auxiliary plate 18 is separated by the support separation device 100 of the present embodiment, and will be described in detail. The laminate 21 is attached to the substrate 20 and the auxiliary plate 18 through the adhesive layer 19.

(輔助板18) (auxiliary board 18)

輔助板18係在基板20的薄化、搬送、安裝等的製程時,為了防止基板20的破損或變形,用以支持基板20者,透過接著層19貼附於基板20。 The auxiliary board 18 is attached to the substrate 20 through the adhesive layer 19 in order to prevent the substrate 20 from being damaged or deformed during the process of thinning, transporting, or mounting the substrate 20 .

於本實施型態的支持體分離裝置100中分離的層積體21中,輔助板18係俯視的形狀為圓形的平板狀,於厚度方向中設置有複數貫通孔。輔助板18可利用 從貫通孔供給剝離液,使接著層19膨潤。 In the laminate 21 separated in the support separation device 100 of the present embodiment, the auxiliary plate 18 has a circular plate shape in plan view, and a plurality of through holes are provided in the thickness direction. Auxiliary board 18 can be utilized The peeling liquid is supplied from the through hole, and the adhesive layer 19 is swollen.

輔助板(支持體)18係支持基板20的支持體,透過接著層19貼附基板20。因此,作為輔助板18,在基板20的薄化、搬送、安裝等的製程時,為了防止基板20的破損或變形而具有必要的強度即可。又,作為透射用以使分離層變質的光線者即可。根據以上觀點,作為輔助板18,可舉出由玻璃、矽、丙烯酸系樹脂所成者等。再者,輔助板也可使用形成有藉由對於與接著層對向之側的面照射光線而變質的分離層者。 The auxiliary board (support) 18 is a support for supporting the substrate 20, and the substrate 20 is attached through the adhesive layer 19. Therefore, in the process of thinning, transporting, or mounting the substrate 20, the auxiliary plate 18 may have necessary strength in order to prevent breakage or deformation of the substrate 20. Further, it may be a light that transmits the deterioration of the separation layer. From the above viewpoints, examples of the auxiliary plate 18 include glass, enamel, and acrylic resin. Further, the auxiliary plate may be formed by a separation layer formed by illuminating the surface on the side opposite to the adhesion layer.

再者,輔助板18可使用300~1000μm的厚度者。依據本實施型態的支持體分離裝置100,如此即使是厚度薄的支持體,也可一邊防止該支持體破損,一邊順利地握持該支持體的外周端部。 Further, the auxiliary board 18 can be used with a thickness of 300 to 1000 μm. According to the support body separating apparatus 100 of the present embodiment, even in the support body having a small thickness, the outer peripheral end portion of the support can be smoothly gripped while preventing the support from being damaged.

(接著層19) (Next layer 19)

接著層19係貼合基板20與輔助板18者,藉由將接著劑塗佈於基板20形成。作為對基板20或輔助板18之接著劑的塗佈方法,並未特別限定,但例如可舉出旋轉塗佈、浸漬(dipping)、滾輪刮刀、噴射塗佈、縫隙塗佈等的方法。又,接著層19係例如代替將接著劑直接塗佈於基板20,利用將兩面預先塗佈接著劑的薄膜(所謂乾膜)貼附於基板20來形成亦可。 Next, the layer 19 is bonded to the substrate 20 and the auxiliary board 18, and is formed by applying an adhesive to the substrate 20. The coating method of the adhesive agent for the substrate 20 or the auxiliary plate 18 is not particularly limited, and examples thereof include a method of spin coating, dipping, roller scraping, spray coating, and slit coating. Further, the subsequent layer 19 may be formed by, for example, directly applying an adhesive to the substrate 20, and attaching a film (so-called dry film) on which both surfaces are applied with an adhesive to the substrate 20.

接著層19的厚度可因應貼合對象的基板20及輔助板18的種類、施加於接著後的基板20的處理等適 當設定,10~150μm為佳,15~100μm更佳。 The thickness of the layer 19 can be adapted to the type of the substrate 20 and the auxiliary plate 18 to be bonded, and the subsequent application to the substrate 20. When set, 10~150μm is better, and 15~100μm is better.

作為形成接著層19的接著劑,可無特別限定地使用,藉由加熱可提升熱流動性之熱可塑性的接著材料為佳。作為熱可塑性的接著材料,例如可舉出丙烯酸系樹脂、苯乙烯系樹脂、馬來醘亞胺系樹脂、碳氫系樹脂、彈性體、聚碸系樹脂等。 The adhesive for forming the adhesive layer 19 can be used without particular limitation, and it is preferable to heat the adhesive material which can improve the thermal fluidity. Examples of the thermoplastic adhesive material include an acrylic resin, a styrene resin, a maleic imine resin, a hydrocarbon resin, an elastomer, and a polyfluorene resin.

(基板20) (substrate 20)

基板20可在隔著接著層19被輔助板18支持之狀態下,供應於薄化、安裝等的製程。作為基板20,並不限定於矽晶圓基板,可使用陶瓷基板、薄膜基板、可撓性基板等之任意基板。 The substrate 20 can be supplied to a process of thinning, mounting, or the like in a state where it is supported by the auxiliary plate 18 via the adhesive layer 19. The substrate 20 is not limited to the tantalum wafer, and any substrate such as a ceramic substrate, a thin film substrate, or a flexible substrate can be used.

(切割膠帶22) (Cutting Tape 22)

切割膠帶22係被黏合於層積體21的基板20側,為了切割剝離輔助板18後的基板20所使用。 The dicing tape 22 is bonded to the substrate 20 side of the laminate 21, and is used for cutting the substrate 20 after peeling the auxiliary sheet 18.

作為切割膠帶22,例如可使用黏著層形成於基底薄膜之構造的切割膠帶22。作為基底薄膜,例如可使用PVC(聚氯乙烯)、聚烯或聚丙烯等的樹脂薄膜。 As the dicing tape 22, for example, a dicing tape 22 having an adhesive layer formed on the structure of the base film can be used. As the base film, for example, a resin film of PVC (polyvinyl chloride), polyolefin or polypropylene can be used.

(切割框架23) (Cutting frame 23)

於切割膠帶22的露出面的更外周,安裝有用以防止切割膠帶22被壓彎的切割框架23。作為切割框架23,例如可舉出鋁等之金屬製的切割框架、不銹鋼(SUS)等之 合金製的切割框架、及樹脂製的切割框架。 On the outer periphery of the exposed face of the dicing tape 22, a cutting frame 23 for preventing the dicing tape 22 from being bent is attached. Examples of the cutting frame 23 include a metal cutting frame made of aluminum or the like, stainless steel (SUS), or the like. A cutting frame made of alloy and a cutting frame made of resin.

<支持體分離裝置101> <Support body separation device 101>

本發明的支持體分離裝置並未限定於前述實施型態(第一實施型態)。如圖4(a)及(b)所示,例如在一實施型態(第二實施型態)中,是作為用以保持輔助板18的保持部,具備吸附墊24來代替爪部12的構造。 The support separation device of the present invention is not limited to the above-described embodiment (first embodiment). As shown in FIGS. 4(a) and 4(b), for example, in an embodiment (second embodiment), a holding portion for holding the auxiliary plate 18 is provided, and an adsorption pad 24 is provided instead of the claw portion 12. structure.

圖4(a)係說明俯視之構成設置於升降板8’之鉤止部1的軸承部2及抵接部3的配置,及設置於位於升降板8’下之分離板10’的吸附墊(保持部)24的配置的圖。又,圖4(b)係依據圖4(a)所示之C-C’線箭頭剖面,說明本實施型態的支持體分離裝置101的概略的圖。再者,關於與第一實施型態相同構件號碼者,即指相同者,省略其說明。 Fig. 4 (a) is a view showing the arrangement of the bearing portion 2 and the abutting portion 3 which are provided in the hook portion 1 of the lifting plate 8' in plan view, and the suction pad provided on the separating plate 10' under the lifting plate 8'. Diagram of the arrangement of (holding unit) 24. Further, Fig. 4(b) is a schematic view showing the support separation device 101 of the present embodiment, based on the C-C' line arrow cross section shown in Fig. 4(a). In addition, the same component number as the first embodiment is the same as the same, and the description thereof is omitted.

[升降部5] [lifting section 5]

在本實施型態中,升降部5係除了升降板8’之外,更具備浮動接合件6,使藉由複數鉤止部1鉤止於升降板8’的分離板10’,往上下方向升降。 In the present embodiment, the lifting portion 5 is provided with a floating engaging member 6 in addition to the lifting plate 8', and is hooked to the separating plate 10' of the lifting plate 8' by the plurality of hooking portions 1 in the up and down direction. Lifting.

(浮動接合件6) (floating joint 6)

浮動接合件(接合件)6係設置於俯視的形狀為圓形的升降板8’之上面側的中心部。藉由透過浮動接合件6連結於升降部5,升降板8’係可旋動,且以對於被鉤止於升 降板8’的分離板10’之平台15水平地固定的層積體21’的平面傾斜之方式可動。 The floating joint (joining member) 6 is provided at a central portion on the upper surface side of the circular lift plate 8' in a plan view. By being coupled to the lifting portion 5 through the floating joint 6, the lifting plate 8' is rotatable and is hooked to the lift The plane of the laminated body 21' to which the platform 15 of the separating plate 10' of the lowering plate 8' is horizontally inclined is movable.

透過浮動接合件6從分離板10’對層積體21’施加力的話,在力集中於層積體21’的外周端部的一部分時,浮動接合件6可動,分離板10’以往該外周端部的一部分朝吸附墊24接觸於輔助板18’之面之方式傾斜。隨此,從層積體21’分離中的輔助板18’會傾斜。藉此,可防止過度的力施加於輔助板18’及基板20的一部分,且可使力集中於被層積於輔助板18’與接著層19之間,藉由照射光線而變質的分離層25。所以,可一邊防止輔助板18’及基板20因過度的力而破損,一邊理想地從基板20剝離輔助板18’。 When a force is applied to the laminated body 21' from the separating plate 10' through the floating joint 6, when the force concentrates on a part of the outer peripheral end portion of the laminated body 21', the floating engaging member 6 is movable, and the separating plate 10' is conventionally peripheral. A portion of the end portion is inclined toward the surface of the suction pad 24 that contacts the auxiliary plate 18'. Accordingly, the auxiliary plate 18' separated from the laminated body 21' is inclined. Thereby, excessive force can be prevented from being applied to the auxiliary board 18' and a part of the substrate 20, and the force can be concentrated on the separation layer which is laminated between the auxiliary board 18' and the bonding layer 19 and which is deteriorated by the irradiation of the light. 25. Therefore, the auxiliary plate 18' can be preferably peeled off from the substrate 20 while preventing the auxiliary plate 18' and the substrate 20 from being damaged by excessive force.

本實施型態的支持體分離裝置100係具備浮動接合件6,但只要是對於升降板8’及分離板10’可動者,例如作為萬向接合件(Universal joint)亦可。 The support body separating device 100 of the present embodiment is provided with the floating joint member 6. However, as long as it is movable to the lift plate 8' and the split plate 10', for example, it may be a universal joint.

又,支持體分離裝置100係作為以升降板8’不會超過必要地傾斜之方式卡止的卡止部,設置有擋止器7。此時,升降板8’欲超過必要地傾斜的話,擋止器7與浮動接合件6或升降板8’接觸,讓升降板8’不會更加傾斜。因此,可防止分離板10’超過必要地傾斜,輔助板18’與基板20過度翹曲。 Further, the support body separating device 100 is provided as a locking portion that locks the lifting plate 8' so as not to be inclined more than necessary, and a stopper 7 is provided. At this time, if the elevating plate 8' is to be inclined more than necessary, the stopper 7 comes into contact with the floating engaging member 6 or the elevating plate 8', so that the elevating plate 8' is not inclined more. Therefore, it is possible to prevent the separation plate 10' from being tilted more than necessary, and the auxiliary plate 18' and the substrate 20 are excessively warped.

又,將層積體21’的基板20側固定於平台15,使輔助板18’傾斜時,以輔助板18’中最高位置與輔助板18’中最低位置的高低差成為1cm以下之方式設置擋 止器7為佳。利用將該高低差設為1cm以下,基板20或輔助板18’不會負擔過度的力,可防止基板20或輔助板18’的破損或變形。 Further, when the substrate 20 side of the laminate 21' is fixed to the stage 15, and the auxiliary plate 18' is inclined, the height difference between the highest position of the auxiliary plate 18' and the lowest position of the auxiliary plate 18' is set to 1 cm or less. block The stopper 7 is preferably. By setting the height difference to 1 cm or less, the substrate 20 or the auxiliary plate 18' does not burden excessive force, and damage or deformation of the substrate 20 or the auxiliary plate 18' can be prevented.

[吸附墊24] [Adsorption pad 24]

吸附墊(保持部)24係吸附與設置有輔助板18’的接著層19之面相反側之面。 The adsorption pad (holding portion) 24 is attached to the surface opposite to the surface on which the bonding layer 19 of the auxiliary plate 18' is provided.

吸附墊24係連通於減壓部(未圖示),利用吸附於輔助板18’的平面之周緣部分,保持該輔助板18’。 The adsorption pad 24 is connected to a decompression portion (not shown), and the auxiliary plate 18' is held by a peripheral portion of a plane that is adsorbed on the auxiliary plate 18'.

如圖4(a)所示,於支持體分離裝置101中,構成複數鉤止部1的軸承部2與抵接部3,於升降板8’的周緣部分中等間隔地配置。又,吸附墊24係等間隔地配置於分離板10’的周緣部分上。鉤止部1與吸附墊24係交互配置,且鉤止部1與吸附墊24於俯視中等間隔地配置。所以,與支持體分離裝置100之狀況相同,藉由複數吸附墊24,保持層積體21’,升降部5透過鉤止部1抬起分離板10’時,可從吸附墊24將力均等地施加於層積體21’。 As shown in Fig. 4 (a), in the support body separating device 101, the bearing portion 2 and the abutting portion 3 constituting the plurality of hook portions 1 are disposed at equal intervals on the peripheral portion of the lift plate 8'. Further, the adsorption pads 24 are disposed at equal intervals on the peripheral portion of the separation plate 10'. The hooking portion 1 and the suction pad 24 are alternately arranged, and the hooking portion 1 and the suction pad 24 are disposed at an intermediate interval in plan view. Therefore, in the same manner as the support separation device 100, the laminated body 21' is held by the plurality of adsorption pads 24, and when the lifting portion 5 lifts the separation plate 10' through the hook portion 1, the force can be equalized from the adsorption pad 24. Applied to the laminate 21'.

再者,如圖4(b)所示,支持體分離裝置101係升降板8’沿著Y軸方向下降,吸附墊24在層積體21’之輔助板18’的平面部抵接之後,進而,在升降板8下降時,鉤止部1之軸承部2的錐面2a,與設置於軸部4之抵接部3的嵌合面3a分離,軸部4係滑動於軸承部2 所具有之孔的內側。所以,與支持體分離裝置100之狀況相同,可防止力從升降板8’,透過分離板10’的吸附墊24,施加至層積體21’。所以,可防止層積體21’被施加過度的力,而造成層積體21’破損。 Further, as shown in FIG. 4(b), the support body separating device 101 is lowered in the Y-axis direction, and after the suction pad 24 abuts on the plane portion of the auxiliary plate 18' of the laminated body 21', Further, when the elevating plate 8 is lowered, the tapered surface 2a of the bearing portion 2 of the hooking portion 1 is separated from the fitting surface 3a of the abutting portion 3 provided on the shaft portion 4, and the shaft portion 4 is slidable to the bearing portion 2 The inside of the hole. Therefore, similarly to the state of the support separating apparatus 100, it is possible to prevent the force from being applied to the laminated body 21' from the elevating plate 8' through the suction pad 24 of the separating plate 10'. Therefore, excessive force is prevented from being applied to the laminated body 21', and the laminated body 21' is broken.

又,不取決於層積體的厚度,吸附墊24抵接於層積體的話,軸承部2之錐面2a與設置於軸部4之抵接部3的嵌合面3a分離,可讓力不會從升降板8’傳達至分離板10’。因此,不需要因應層積體的厚度,調整使分離板10’下降的位置。所以,可不取決於層積體的厚度,可藉由分離板10’的吸附墊24,保持層積體21’之輔助板18’的外周端部(圖4(b))。 Further, when the adsorption pad 24 abuts against the laminate without depending on the thickness of the laminate, the tapered surface 2a of the bearing portion 2 is separated from the fitting surface 3a of the abutment portion 3 provided on the shaft portion 4, and the force can be made It is not transmitted from the lifting plate 8' to the separating plate 10'. Therefore, it is not necessary to adjust the position at which the separation plate 10' is lowered in accordance with the thickness of the laminate. Therefore, the outer peripheral end portion of the auxiliary plate 18' of the laminated body 21' can be held by the suction pad 24 of the separating plate 10' without depending on the thickness of the laminated body (Fig. 4(b)).

再者,吸附墊24的配置及數量並不限定於圖4(a)所示之配置及數量。吸附墊24的配置及數量,係因應從層積體21’分離之輔助板18’的種類及大小適當設計即可。 Furthermore, the arrangement and number of the adsorption pads 24 are not limited to the arrangement and number shown in FIG. 4(a). The arrangement and the number of the adsorption pads 24 may be appropriately designed in accordance with the type and size of the auxiliary plate 18' separated from the laminate 21'.

[層積體21’] [Layer 21']

在本實施型態的支持體分離裝置101中,從依序層積基板20、接著層19、藉由照射光線而變質的分離層25、輔助板18’所成的層積體21’分離輔助板18’。再者,基板20及接著層19可使用與層積體21相同者,故省略其說明。 In the support separation device 101 of the present embodiment, the laminated body 21' is separated from the sequentially laminated substrate 20, the subsequent layer 19, the separation layer 25 which is deteriorated by irradiation with light, and the auxiliary plate 18'. Board 18'. In addition, the substrate 20 and the adhesive layer 19 can be the same as those of the laminated body 21, and the description thereof will be omitted.

(輔助板18’) (auxiliary board 18')

輔助板18’係於其厚度方向中,並未設置複數貫通孔之處,與輔助板18不同。又,於輔助板18’的與接著層19對向之側之面,形成有分離層25。 The auxiliary plate 18' is in the thickness direction thereof, and a plurality of through holes are not provided, unlike the auxiliary plate 18. Further, a separation layer 25 is formed on the surface of the auxiliary plate 18' facing the side of the adhesive layer 19.

(分離層25) (separation layer 25)

分離層25係藉由吸收隔著輔助板18’照射之光線而變質之層。 The separation layer 25 is a layer which is deteriorated by absorbing light irradiated through the auxiliary plate 18'.

分離層25例如可舉出藉由電漿CVD(化學氣相沉積)法所成膜的氟碳(Fluorocarbon)。又例如,分離層25,可舉出其重複單元包含具有光吸收性之構造的聚合體、無機物、具有紅外線吸收性之構造的化合物、及使用反應性聚倍半矽氧烷(Polysilsesquioxane)等所形成的分離層。再者,照射至分離層25的光線,係因應分離層25所吸收的波長而適當選擇即可。 The separation layer 25 is, for example, fluorocarbon (Fluorocarbon) formed by a plasma CVD (Chemical Vapor Deposition) method. Further, for example, the separation layer 25 may be a polymer having a structure having a light absorbing property, an inorganic substance, a compound having an infrared absorbing property, and a reactive polysesquioxalate (Polysilsesquioxane). A separation layer formed. In addition, the light which is irradiated to the separation layer 25 may be appropriately selected depending on the wavelength absorbed by the separation layer 25.

分離層25的厚度係例如0.05μm以上且50μm以下的範圍內為佳,0.3μm以上且1μm以下的範圍內更佳。分離層25的厚度可納於0.05μm以上且50μm以下的範圍的話,可藉由短時間之光線的照射及低能量之光線的照射,使分離層25產生所望的變質。又,分離層25的厚度係根據生產性的觀點,納於1μm以下的範圍尤其為佳。 The thickness of the separation layer 25 is preferably in the range of, for example, 0.05 μm or more and 50 μm or less, and more preferably in the range of 0.3 μm or more and 1 μm or less. When the thickness of the separation layer 25 can be in the range of 0.05 μm or more and 50 μm or less, the separation layer 25 can be deteriorated by irradiation of light for a short period of time and irradiation of light of low energy. Further, the thickness of the separation layer 25 is particularly preferably in the range of 1 μm or less from the viewpoint of productivity.

於本說明書中,分離層「變質」係指分離層承受細微的外力而可能被破壞的狀態,或成為分離層與接觸之層的接著力降低的狀態之現象。作為藉由吸收紅外線 而產生之分離層的變質的結果,分離層會喪失承受光線的照射之前的強度或接著性。亦即,因為吸收光線,分離層變得脆弱。所謂分離層的變質也可能是分離層產生吸收之光線的能量所致之分解、立體配置的變化或功能基的解離等。分離層的變質係吸收光線的結果。 In the present specification, the "deterioration" of the separation layer refers to a state in which the separation layer is subjected to a slight external force and may be destroyed, or a state in which the adhesion between the separation layer and the contact layer is lowered. By absorbing infrared rays As a result of the deterioration of the resulting separation layer, the separation layer loses the strength or adhesion before exposure to light. That is, the separation layer becomes weak because of the absorption of light. The deterioration of the separation layer may also be due to the decomposition of the energy of the light absorbed by the separation layer, the change in the stereo configuration, or the dissociation of the functional group. The metamorphism of the separation layer is the result of absorbing light.

因此,例如以僅利用抬起輔助板而破壞分離層之方式變質,可容易分離輔助板與基板。更具體來說,例如藉由支持體分離裝置等,將層積體之基板及輔助板之一方固定於載置台,利用藉由具備吸附手段的吸附墊(保持部)等來保持另一方並予以抬起,分離輔助板與基板,或藉由具備箝夾(爪部)等的分離板,握持輔助板的周緣部分端部的倒角部位來施加力,分離基板與輔助板。又,例如藉由具備供給用以剝離接著劑之剝離液的剝離手段的支持體分離裝置,從層積體之基板剝離輔助板亦可。藉由該剝離手段對層積體之接著層的周端部的至少一部分供給剝離液,使層積體之接著層膨潤,藉此從該接著層膨潤之處,使力集中於分離層,可對基板與輔助板施加力。因此,可理想地分離基板與輔助板。 Therefore, for example, it is possible to separate the auxiliary plate and the substrate by deteriorating the separation layer by merely lifting the auxiliary plate. More specifically, for example, one of the substrate and the auxiliary plate of the laminate is fixed to the mounting table by a support separation device or the like, and the other is held by the adsorption pad (holding portion) provided with the adsorption means. The substrate is lifted, the auxiliary plate and the substrate are separated, or a separation plate having a clamp (claw portion) or the like is attached, and a chamfered portion of the peripheral portion of the auxiliary plate is gripped to apply a force to separate the substrate from the auxiliary plate. Moreover, for example, the support plate may be peeled off from the substrate of the laminate by the support separation device including the release means for supplying the release liquid for peeling off the adhesive. By applying the peeling liquid to at least a part of the peripheral end portion of the adhesive layer of the laminate by the peeling means, the adhesive layer of the laminate is swollen, whereby the force is concentrated on the separation layer from the swelling of the adhesive layer. A force is applied to the substrate and the auxiliary plate. Therefore, it is desirable to separate the substrate from the auxiliary board.

之後,在藉由吸附墊24保持輔助板18’之狀態下,使升降板8’朝向Y軸方向往上側上升。藉此,軸部4係滑動於軸承部2之孔的內側,軸承部2之錐面2a與抵接部3之嵌合面3a嵌合。因此,升降部5上升時抬起升降板8’的力,係透過鉤止部1傳達至分離板10及分離板10所具備的爪部12。所以,藉由複數鉤止部1與複 數吸附墊24,可對於層積體21’均等地施加力,可順利地分離輔助板18’。 Thereafter, in a state where the auxiliary plate 18' is held by the suction pad 24, the elevating plate 8' is raised upward in the Y-axis direction. Thereby, the shaft portion 4 is slid inside the hole of the bearing portion 2, and the tapered surface 2a of the bearing portion 2 is fitted to the fitting surface 3a of the abutting portion 3. Therefore, the force for lifting the lift plate 8' when the lift portion 5 is raised is transmitted to the separation plate 10 and the claw portion 12 of the separation plate 10 through the hook portion 1. Therefore, by the plurality of hooks 1 and The number of adsorption pads 24 can equally apply force to the laminate 21', and the auxiliary plate 18' can be smoothly separated.

再者,施加於層積體的力,係根據層積體的大小等適當調整即可,並不限定,例如,直徑為300mm程度的層積體的話,可藉由施加0.1~5kgf程度的力,可理想地分離基板與輔助板。 In addition, the force applied to the laminate is not limited as long as it is appropriately adjusted depending on the size of the laminate, and for example, a laminate having a diameter of about 300 mm can be applied with a force of about 0.1 to 5 kgf. It is ideal to separate the substrate from the auxiliary board.

<支持體分離方法> <Support separation method>

又,本發明之一實施型態的支持體分離方法,係從貼附基板20與支持基板20之輔助板(支持體)18’所成的層積體21’,分離輔助板18的支持體分離方法,包含固定層積體21’之基板20,保持層積體21之輔助板18’的保持工程,與在保持工程之後,抬起被保持的輔助板18並將其從層積體21’分離的分離工程;在保持工程中,使以可移動於上下方向之方式鉤止的吸附墊24下降,抵接於輔助板18’的平面部,保持輔助板18’。 Further, in the support separation method according to an embodiment of the present invention, the support body of the auxiliary plate 18 is separated from the laminate 21' formed by the auxiliary substrate (support) 18' to which the substrate 20 and the support substrate 20 are attached. The separation method includes the substrate 20 of the fixed laminate 21', the holding process of the auxiliary plate 18' of the laminated body 21, and after the holding process, the held auxiliary plate 18 is lifted and removed from the laminated body 21 'Separation separation work; in the holding process, the suction pad 24 hooked in such a manner as to be movable in the up and down direction is lowered to abut against the flat portion of the auxiliary plate 18', and the auxiliary plate 18' is held.

又,在本發明之一實施型態的支持體分離方法中,爪部(保持部)12係具有抵接於輔助板18的平面部的抵接面10a,與以包圍輔助板18之方式配置,於抵接面10a的面方向中越離開抵接面10a,從抵接面10a的外周朝向內周傾斜的複數傾斜面12b,在保持工程中,利用將輔助板18的平面部抵接於抵接面10a,將複數傾斜面12b抵接於設置在輔助板18的外周端部的倒角部位18a,握持輔助板18。 Further, in the support separation method according to the embodiment of the present invention, the claw portion (holding portion) 12 has the abutting surface 10a that abuts against the flat portion of the auxiliary plate 18, and is disposed to surround the auxiliary plate 18. The plurality of inclined surfaces 12b that are inclined from the outer circumference of the abutting surface 10a toward the inner circumference in the surface direction of the abutting surface 10a are brought into contact with each other by the flat portion of the auxiliary plate 18 during the holding process. The joint surface 10a abuts the plurality of inclined surfaces 12b against the chamfered portion 18a provided at the outer peripheral end portion of the auxiliary plate 18, and holds the auxiliary plate 18.

亦即,上述之支持體分離裝置100及101的各實施型態,本發明的支持體分離方法係依據上述之實施型態及圖1~4的說明。 That is, in the respective embodiments of the above-described support separation devices 100 and 101, the support separation method of the present invention is based on the above-described embodiment and the description of Figs.

本發明並不限定於上述之各實施型態,在申請項所記載的範圍中可進行各種變更,關於適當組合不同實施型態分別揭示之技術手段所得的實施型態,也包含於本發明的技術範圍。 The present invention is not limited to the above-described embodiments, and various modifications can be made in the scope of the application, and the embodiments obtained by appropriately combining the technical means disclosed in the different embodiments are also included in the present invention. Technical scope.

〔產業上之利用可能性〕 [Industrial use possibility]

本發明的支持體分離裝置及支持體分離方法,係例如於細微化之半導體裝置的製造工程中可廣範圍利用。 The support separation device and the support separation method of the present invention can be widely used, for example, in the manufacturing process of a miniaturized semiconductor device.

1‧‧‧鉤止部 1‧‧‧ hook stop

2‧‧‧軸承部 2‧‧‧ bearing department

2a‧‧‧錐面 2a‧‧‧ Cone

3‧‧‧抵接部 3‧‧‧Apartment

3a‧‧‧嵌合面 3a‧‧‧Fitting face

4‧‧‧軸部 4‧‧‧Axis

5‧‧‧升降部 5‧‧‧ Lifting Department

6‧‧‧浮動接合件 6‧‧‧Floating joints

8‧‧‧升降板 8‧‧‧ lifting plate

10‧‧‧分離板 10‧‧‧Separation board

10a‧‧‧抵接面(板部) 10a‧‧‧Abutment (board)

12‧‧‧爪部 12‧‧‧ claws

12c‧‧‧調整部 12c‧‧‧Adjustment Department

13‧‧‧驅動部 13‧‧‧ Drive Department

13a‧‧‧移動軸 13a‧‧‧Moving axis

13b‧‧‧支持部 13b‧‧‧Support Department

14‧‧‧磁性感測器 14‧‧‧Magnetic sensor

14a‧‧‧磁鐵 14a‧‧‧ Magnet

14b‧‧‧感測頭 14b‧‧‧Sensing head

14c‧‧‧感測頭 14c‧‧ ‧Sensing head

15‧‧‧平台 15‧‧‧ platform

16‧‧‧多孔部 16‧‧‧Porous Department

17‧‧‧外周部 17‧‧‧The outer part

18‧‧‧輔助板 18‧‧‧Auxiliary board

19‧‧‧接著層 19‧‧‧Next layer

20‧‧‧基板 20‧‧‧Substrate

21‧‧‧層積體 21‧‧‧Layer

22‧‧‧切割膠帶 22‧‧‧Cut Tape

23‧‧‧切割框架 23‧‧‧ cutting frame

100‧‧‧支持體分離裝置 100‧‧‧Support body separation device

Claims (8)

一種支持體分離裝置,係從透過接著層貼附基板與支持前述基板之支持體所成的層積體,分離該支持體的支持體分離裝置,其特徵為:具備:固定部,係固定前述層積體之前述基板;保持部,係保持前述層積體之前述支持體;升降部,係使前述保持部往上下方向升降;及鉤止部,係將前述保持部鉤止於前述升降部;前述保持部,係藉由前述鉤止部以可移動於上下方向之方式鉤止於前述升降部。 A support separation device is a support separation device that separates a support from a support that is attached to a substrate and supports the substrate, and is provided with a fixing portion that fixes the aforementioned a substrate according to the laminate; a holding portion for holding the support body of the laminate; a lifting portion for lifting the holding portion in a vertical direction; and a hook portion for hooking the holding portion to the lifting portion The holding portion is hooked to the lifting portion by the hook portion so as to be movable in the vertical direction. 如申請專利範圍第1項所記載之支持體分離裝置,其中,具備複數前述鉤止部;前述鉤止部,係分別由前述升降部的升降時具有貫通於上下方向之孔的軸承部,與插通於前述孔,於上端具備比前述孔的直徑還大之直徑的抵接部的軸部所成;前述軸部的下端,係固定於前述保持部。 The support body separating device according to the first aspect of the invention, further comprising: the plurality of hooking portions; wherein the hooking portion has a bearing portion that penetrates a hole extending in a vertical direction when the lifting portion is raised and lowered, and The hole is inserted into the hole, and the shaft end of the abutting portion having a diameter larger than the diameter of the hole is formed at the upper end, and the lower end of the shaft portion is fixed to the holding portion. 如申請專利範圍第2項所記載之支持體分離裝置,其中,設置於前述軸部之上端的前述抵接部,係具有在前述升降部的升降時,嵌合於前述軸承部的孔之上側的開口面的嵌合面。 The support separation device according to the second aspect of the invention, wherein the abutting portion provided at an upper end of the shaft portion has a hole that is fitted to a hole of the bearing portion when the lifting portion is moved up and down The fitting surface of the open face. 如申請專利範圍第1項至第3項中任一項所記載之支持體分離裝置,其中,前述保持部,係具備:板部,係具有抵接於前述支持體之平面部的抵接面;及複數爪部,係以包圍前述板部的外周之方式配置;前述爪部,係具有於前述抵接面的面方向中越離開該抵接面,從該抵接面的外周朝向內周的傾斜越大的傾斜部;前述保持部,係使前述支持體的平面部抵接於前述板部的抵接面,使前述爪部的傾斜部抵接於設置在前述支持體之外周端部的倒角部位,藉此握持前述支持體。 The support separation device according to any one of the first aspect, wherein the holding portion includes a plate portion having an abutting surface that abuts against a flat portion of the support body. And the plurality of claws are disposed so as to surround the outer circumference of the plate portion; the claw portion has a distance from the abutting surface in the surface direction of the abutting surface, and the outer circumference of the abutting surface faces the inner circumference. The inclined portion having a larger inclination; the holding portion is configured such that the flat portion of the support abuts against the abutting surface of the plate portion, and the inclined portion of the claw portion abuts on the outer peripheral end portion of the support body The chamfered portion is thereby held by the support. 如申請專利範圍第4項所記載之支持體分離裝置,其中,前述傾斜部,係對於前述板部的抵接面,具有30°以上且未滿90°之範圍內的傾斜。 The support separation device according to the fourth aspect of the invention, wherein the inclined portion has an inclination in a range of 30° or more and less than 90° with respect to the contact surface of the plate portion. 如申請專利範圍第1項至第3項中任一項所記載之支持體分離裝置,其中,前述保持部,係具備具有吸附保持前述支持體之複數吸附墊的板部;前述升降部,係更具備可使具有該吸附墊的板部以對於水平面傾斜之方式移動的接合件,透過該接合件,使被前述鉤止部鉤止的前述板部,於上下方向中升降。 The support separation device according to any one of claims 1 to 3, wherein the holding portion includes a plate portion having a plurality of adsorption pads that adsorb and hold the support; and the lifting portion is Further, the joint member that can move the plate portion having the suction pad so as to be inclined with respect to the horizontal plane is provided, and the plate member hooked by the hook portion is moved up and down in the vertical direction. 一種支持體分離方法,係從貼附基板與支持前述 基板之支持體所成的層積體,分離前述支持體的支持體分離方法,其特徵為:包含:保持工程,係固定前述層積體之基板,保持前述層積體之支持體;及分離工程,係在前述保持工程之後,抬起被保持的前述支持體並將其從前述層積體分離;在前述保持工程中,使以可移動於上下方向之方式鉤止的保持部下降,抵接於前述支持體的平面部,保持該支持體。 A support separation method, which is from attaching a substrate and supporting the aforementioned a laminate formed by a support of a substrate, and a method for separating a support for separating the support, comprising: a holding process, fixing a substrate of the laminate, and holding a support of the laminate; and separating In the above-described holding process, the held support is lifted and separated from the laminate; in the holding process, the holding portion that can be hooked in the vertical direction is lowered. The support is held by the flat portion of the support. 如申請專利範圍第7項所記載之支持體分離方法,其中,前述保持部,係具有:抵接面,係抵接於前述支持體的平面部;及複數傾斜面,係以包圍前述支持體之方式配置,於前述抵接面的面方向中越離開該抵接面,越從該抵接面的外周朝向內周傾斜;在前述保持工程中,使前述支持體的平面部抵接於前述抵接面,使前述複數傾斜面抵接於設置在前述支持體之外周端部的倒角部位,藉此握持支持體。 The support separation method according to claim 7, wherein the holding portion has an abutting surface that abuts against a flat portion of the support, and a plurality of inclined surfaces that surround the support In this manner, the outer surface of the abutting surface is inclined toward the inner circumference as it leaves the abutting surface in the surface direction of the abutting surface. In the holding process, the planar portion of the support is brought into contact with the abutting surface. The connection surface is such that the plurality of inclined surfaces abut against the chamfered portion provided at the outer peripheral end portion of the support body, thereby holding the support.
TW105127693A 2015-11-06 2016-08-29 Support body separation device and support body separation method TWI690016B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015218863A JP6612588B2 (en) 2015-11-06 2015-11-06 Support body separating apparatus and support body separating method
JP2015-218863 2015-11-06

Publications (2)

Publication Number Publication Date
TW201724342A true TW201724342A (en) 2017-07-01
TWI690016B TWI690016B (en) 2020-04-01

Family

ID=58768195

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105127693A TWI690016B (en) 2015-11-06 2016-08-29 Support body separation device and support body separation method

Country Status (3)

Country Link
JP (1) JP6612588B2 (en)
KR (1) KR102543036B1 (en)
TW (1) TWI690016B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7184722B2 (en) 2019-09-19 2022-12-06 株式会社東芝 SUPPORTING SUBSTRATE, SUPPORTING SUBSTRATE SEPARATING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11116046A (en) 1997-10-20 1999-04-27 Mecs Corp Robot hand for wafer carrying robot
JP3918556B2 (en) * 2001-12-28 2007-05-23 三菱電機株式会社 Sticking wafer separating apparatus and sticking wafer separating method
JP2006032506A (en) 2004-07-14 2006-02-02 Taiyo Yuden Co Ltd Method and device for peeling semiconductor wafer
JP2010010207A (en) * 2008-06-24 2010-01-14 Tokyo Ohka Kogyo Co Ltd Separating apparatus and separating method
JP5338250B2 (en) * 2008-08-21 2013-11-13 株式会社東京精密 Work separation method and cutting apparatus
JP6271312B2 (en) * 2014-03-24 2018-01-31 株式会社ディスコ Transport device

Also Published As

Publication number Publication date
JP6612588B2 (en) 2019-11-27
KR20170053563A (en) 2017-05-16
JP2017092194A (en) 2017-05-25
KR102543036B1 (en) 2023-06-14
TWI690016B (en) 2020-04-01

Similar Documents

Publication Publication Date Title
KR102010095B1 (en) Peeling device, peeling system, peeling method, and computer recording medium
KR102066293B1 (en) Peeling device, peeling system and peeling method
JP6120748B2 (en) Peeling apparatus, peeling system, peeling method, program, and computer storage medium
JP6145415B2 (en) Peeling method, program, computer storage medium, peeling apparatus and peeling system
KR101625730B1 (en) Supporting member separation apparatus and supporting member separation method
TW201913852A (en) Adhesive tape stripping method and adhesive tape stripping device
JP5969663B2 (en) Peeling device, peeling system and peeling method
TW201724342A (en) Support body separation device and support body separation method capable of holding a laminated body smoothly without relying on the thickness of the laminated body and capable of being separated from the laminated body
JP2015035561A (en) Peeling device, peeling system and peeling method
TWI705518B (en) A substrate processing apparatus, and a substrate processing method
JP6647014B2 (en) Support separating apparatus and support separating method
KR100448292B1 (en) Device and method for producing a data carrier
KR101403850B1 (en) System for holding large scale substrate
TW201724344A (en) Support body separation device and support body separation method capable of detecting support body having its holding portion failing holding laminated body
US20070113969A1 (en) Optical disk laminating method and optical disk laminating device
KR101403840B1 (en) Mixed type large scale area substrate holding unit