TW201715308A - 組成物、硬化膜、圖案、圖案的製造方法、光學感測器及攝像元件 - Google Patents

組成物、硬化膜、圖案、圖案的製造方法、光學感測器及攝像元件 Download PDF

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Publication number
TW201715308A
TW201715308A TW105130084A TW105130084A TW201715308A TW 201715308 A TW201715308 A TW 201715308A TW 105130084 A TW105130084 A TW 105130084A TW 105130084 A TW105130084 A TW 105130084A TW 201715308 A TW201715308 A TW 201715308A
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TW
Taiwan
Prior art keywords
group
compound
composition
formula
acid
Prior art date
Application number
TW105130084A
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English (en)
Chinese (zh)
Inventor
Hirotaka TAKISHITA
Shoichi Nakamura
Kazuto Shimada
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=58423313&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW201715308(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW201715308A publication Critical patent/TW201715308A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polymerisation Methods In General (AREA)
TW105130084A 2015-09-29 2016-09-19 組成物、硬化膜、圖案、圖案的製造方法、光學感測器及攝像元件 TW201715308A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015190723 2015-09-29
JP2015235882 2015-12-02

Publications (1)

Publication Number Publication Date
TW201715308A true TW201715308A (zh) 2017-05-01

Family

ID=58423313

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105130084A TW201715308A (zh) 2015-09-29 2016-09-19 組成物、硬化膜、圖案、圖案的製造方法、光學感測器及攝像元件

Country Status (3)

Country Link
JP (1) JP6598868B2 (fr)
TW (1) TW201715308A (fr)
WO (1) WO2017056901A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102400879B1 (ko) * 2018-06-01 2022-05-20 고오 가가쿠고교 가부시키가이샤 감광성 수지 조성물, 드라이 필름, 및 프린트 배선판

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4500409B2 (ja) * 2000-04-05 2010-07-14 大日本印刷株式会社 カラーフィルタ
JP2004037706A (ja) * 2002-07-02 2004-02-05 Toppan Printing Co Ltd カラーフィルタ
JP5539429B2 (ja) * 2012-03-19 2014-07-02 富士フイルム株式会社 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
JP6126975B2 (ja) * 2012-11-16 2017-05-10 富士フイルム株式会社 白色感光性樹脂組成物、白色硬化膜、及び白色パターンの製造方法
KR20140086584A (ko) * 2012-12-28 2014-07-08 삼성전기주식회사 터치스크린 모듈의 베젤용 감광성 수지 조성물 및 이로 제조된 터치스크린 모듈용 베젤
JP2015028619A (ja) * 2013-07-30 2015-02-12 東友ファインケム株式会社 ディスプレイ装置の前面遮光層形成用感光性樹脂組成物
JP2016027384A (ja) * 2014-06-25 2016-02-18 Jsr株式会社 ベゼル形成用感光性組成物、ベゼル及び表示装置

Also Published As

Publication number Publication date
JP6598868B2 (ja) 2019-10-30
WO2017056901A1 (fr) 2017-04-06
JPWO2017056901A1 (ja) 2018-04-12

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