TW201711969A - Method for breaking brittle substrate capable of accurately breaking a brittle substrate along a trench line - Google Patents

Method for breaking brittle substrate capable of accurately breaking a brittle substrate along a trench line Download PDF

Info

Publication number
TW201711969A
TW201711969A TW105126429A TW105126429A TW201711969A TW 201711969 A TW201711969 A TW 201711969A TW 105126429 A TW105126429 A TW 105126429A TW 105126429 A TW105126429 A TW 105126429A TW 201711969 A TW201711969 A TW 201711969A
Authority
TW
Taiwan
Prior art keywords
brittle substrate
line
glass substrate
groove line
crack
Prior art date
Application number
TW105126429A
Other languages
Chinese (zh)
Other versions
TWI610892B (en
Inventor
岩坪佑磨
曽山浩
Original Assignee
三星鑽石工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三星鑽石工業股份有限公司 filed Critical 三星鑽石工業股份有限公司
Publication of TW201711969A publication Critical patent/TW201711969A/en
Application granted granted Critical
Publication of TWI610892B publication Critical patent/TWI610892B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0017Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
    • B28D5/0023Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rectilinearly
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/037Controlling or regulating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/851Division of substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

The present invention discloses a method for breaking a brittle substrate accurately along a trench line. Prepare a brittle substrate 11 which is provided with a first surface SF1 containing a trench line TL consisted of a first part LR and a second part HR, and a second surface SF2 opposite to the first surface SF1. Cracks extend only along the second part HR of the first part LR and the second part HR. Next, place the first surface SF1 of the brittle substrate 11 on a support part 80 via a first elastic member 71, wherein the first elastic member 71 is more elastic than both the brittle substrate 11 and the support part 80. Subsequently, press a stress-applying member 85 against the second surface SF2 of the brittle substrate 11 via a second elastic member 72, wherein the second elastic member 71 is more elastic than both the brittle substrate 11 and the tress-applying member 85.

Description

脆性基板之分斷方法Fragmentation method of brittle substrate

本發明係關於一種脆性基板之分斷方法。The present invention relates to a method of breaking a brittle substrate.

於平面顯示器面板或太陽電池面板等電氣設備之製造中,經常需要將玻璃基板等脆性基板分斷。首先於基板上形成劃線,其次沿著該劃線將基板分斷。劃線能夠藉由使用刀尖對基板進行機械加工而形成。藉由刀尖於基板上滑動或滾動,而於基板上形成利用塑性變形所得之溝槽,與此同時,於該溝槽之下方形成垂直裂痕。其後,進行被稱為斷裂步驟之應力賦予。藉此,使上述垂直裂痕於厚度方向上完全行進,從而將基板分斷。 將基板分斷之步驟於在基板形成劃線之步驟後即刻進行之情況相對較多。然而,亦提出於形成劃線之步驟與斷裂步驟之間進行加工基板之步驟。 例如根據國際公開第2002/104078號之技術,於有機EL(Electroluminescence,電致發光)顯示器之製造方法中,於安裝密封蓋之前對成為各有機EL顯示器之每個區域於玻璃基板上形成劃線。因此,能夠避免於設置密封蓋後於玻璃基板上形成劃線時成為問題之密封蓋與玻璃切割器之接觸。 又,例如根據國際公開第2003/006391號之技術,於液晶顯示面板之製造方法中,於形成劃線後將2個玻璃基板貼合。藉此,能夠於1次斷裂步驟中同時斷裂2片脆性基板。 [先前技術文獻] [專利文獻] [專利文獻1]國際公開第2002/104078號 [專利文獻2]國際公開第2003/006391號In the manufacture of electrical equipment such as a flat panel display panel or a solar panel, it is often necessary to break a brittle substrate such as a glass substrate. First, a scribe line is formed on the substrate, and then the substrate is divided along the scribe line. The scribing can be formed by machining the substrate using the tip. A groove obtained by plastic deformation is formed on the substrate by sliding or rolling the blade tip on the substrate, and at the same time, a vertical crack is formed below the groove. Thereafter, stress imparting is referred to as a fracture step. Thereby, the vertical crack is completely traveled in the thickness direction to break the substrate. The step of dividing the substrate is performed relatively immediately after the step of forming the scribe line on the substrate. However, the step of processing the substrate between the step of forming the scribe line and the step of breaking is also proposed. For example, according to the technique of International Publication No. 2002/104078, in the manufacturing method of an organic EL (Electroluminescence) display, a scribe line is formed on a glass substrate for each region of each organic EL display before the sealing cover is mounted. . Therefore, it is possible to avoid contact between the sealing cover which is a problem when the scribing is formed on the glass substrate after the sealing cover is provided, and the glass cutter. Further, for example, according to the technique of the international publication No. 2003/006391, in the method of manufacturing a liquid crystal display panel, two glass substrates are bonded together after forming a scribe line. Thereby, it is possible to simultaneously break two brittle substrates in one breaking step. [Prior Art Document] [Patent Document] [Patent Document 1] International Publication No. 2002/104078 [Patent Document 2] International Publication No. 2003/006391

[發明所欲解決之問題] 根據上述先前之技術,對脆性基板之加工係於形成劃線後進行,藉由其後之應力賦予進行斷裂步驟。該情形意味著,於對脆性基板之加工時沿著劃線整體已經存在垂直裂痕。因此,可能存在因於加工中意外產生該垂直裂痕之厚度方向上之進一步之伸展,而導致加工中應為一體之脆性基板分離之情況。又,即便於在劃線之形成步驟與基板之斷裂步驟之間不進行基板之加工步驟之情形時,通常亦需要於劃線之形成步驟之後且基板之斷裂步驟之前搬送或保管基板,此時可能存在基板意外分斷之情況。 為了解決上述問題,本發明者等人開發出單獨之分斷技術。根據該技術,作為規定將脆性基板分斷之位置之線,首先,於其下方形成不具有裂痕之溝槽線。藉由形成溝槽線,而規定將脆性基板分斷之位置。其後,只要維持於溝槽線之下方不存在裂痕之狀態,則不易產生沿著溝槽線之分斷。藉由利用該狀態,能夠一面預先規定將脆性基板分斷之位置,一面防止脆性基板於應分斷之時間點之前意外分斷。 如上所述,溝槽線與通常之劃線相比,不易產生沿其之分斷。藉此,防止脆性基板之意外之分斷,另一方面,存在沿著溝槽線準確地進行脆性基板之分斷之難度變高之問題。 本發明係為了解決如上所述之問題而完成者,其目的在於提供一種能夠準確地進行沿著於其下方不具有裂痕之溝槽線之分斷之脆性基板之分斷方法。 [解決問題之技術手段] 本發明之脆性基板之分斷方法具有以下之步驟。 a)準備脆性基板,該脆性基板具有設置有包含第1及第2部分之溝槽線之第1面、及與第1面相反之第2面,且具有與第1面垂直之厚度方向。僅於第1部分及第2部分中之第1部分之下方,脆性基板處於在與溝槽線交叉之方向上連續連接之狀態即無裂痕狀態。裂痕僅沿著第1及第2部分中之第2部分延伸。 b)經由第1彈性構件將脆性基板之第1面載置於支持部上。第1彈性構件較脆性基板及支持部之各者富有彈性。 c)於步驟b)之後,經由第2彈性構件將應力施加構件壓抵於脆性基板之第2面。第2彈性構件較脆性基板及應力施加構件之各者富有彈性。 [發明之效果] 根據本發明,第1彈性構件較脆性基板及支持部之各者富有彈性。又,第2彈性構件較脆性基板及應力施加構件之各者富有彈性。藉此,首先沿著溝槽線之第2部分的脆性基板之分離穩定地產生。其後,沿著溝槽線之第1部分穩定地產生脆性基板之進一步之分離。因此,能夠沿著溝槽線之整體穩定地將脆性基板分斷。[Problem to be Solved by the Invention] According to the above prior art, the processing of the brittle substrate is performed after the scribing is formed, and the stress is applied to the subsequent fracture step. This situation means that there is already a vertical crack along the entire scribe line during processing of the brittle substrate. Therefore, there may be a case where the vertical stretching in the thickness direction of the vertical crack is unexpectedly generated during processing, resulting in separation of the brittle substrate which should be integrated during processing. Further, even when the processing step of the substrate is not performed between the step of forming the scribe line and the step of structuring the substrate, it is usually necessary to transport or store the substrate after the step of forming the scribe line and before the step of rupturing the substrate. There may be cases where the substrate is accidentally broken. In order to solve the above problems, the inventors of the present invention have developed a separate breaking technique. According to this technique, as a line defining a position at which the brittle substrate is divided, first, a groove line having no crack is formed under the line. The position at which the brittle substrate is broken is defined by forming the groove lines. Thereafter, as long as the state in which no crack exists below the groove line is maintained, the break along the groove line is less likely to occur. By using this state, it is possible to prevent the brittle substrate from being accidentally broken before the time point at which the brittle substrate is to be separated, by preliminarily specifying the position at which the brittle substrate is to be separated. As described above, the groove line is less likely to be broken along with the usual scribe line. Thereby, the accidental breaking of the brittle substrate is prevented, and on the other hand, there is a problem that it is difficult to accurately perform the breaking of the brittle substrate along the groove line. The present invention has been made in order to solve the above problems, and an object thereof is to provide a breaking method capable of accurately performing a brittle substrate along which a groove line having no cracks is formed below. [Technical means for solving the problem] The breaking method of the brittle substrate of the present invention has the following steps. a) A brittle substrate having a first surface on which the groove lines including the first and second portions are provided and a second surface opposite to the first surface, and a thickness direction perpendicular to the first surface. Only under the first part of the first part and the second part, the brittle substrate is in a state of continuous connection in a direction crossing the groove line, that is, a crack-free state. The crack extends only along the second part of the first and second parts. b) The first surface of the brittle substrate is placed on the support portion via the first elastic member. The first elastic member is more flexible than each of the brittle substrate and the support portion. c) After step b), the stress applying member is pressed against the second surface of the brittle substrate via the second elastic member. The second elastic member is more elastic than each of the brittle substrate and the stress applying member. [Effects of the Invention] According to the invention, the first elastic member is more elastic than the brittle substrate and the support portion. Further, the second elastic member is more elastic than each of the brittle substrate and the stress applying member. Thereby, first, the separation of the brittle substrate along the second portion of the groove line is stably generated. Thereafter, further separation of the brittle substrate is stably generated along the first portion of the trench line. Therefore, the brittle substrate can be stably broken along the entire groove line.

以下,基於圖式,對本發明之各實施形態中之脆性基板之分斷方法進行說明。再者,於以下之圖式中,對相同或相當之部分標註相同之參照編號,且不重複其說明。 <實施形態1> (分斷方法) 關於本實施形態之脆性基板之分斷方法,一面參照圖1之流程圖,一面於以下進行說明。 參照圖2~圖4,準備玻璃基板11。玻璃基板11具有第1面SF1、及與其相反之第2面SF2。又,玻璃基板11具有與第1面SF1垂直之厚度方向DT。 又,準備具有刀尖之劃線器具。下文對劃線器具之詳細情況進行敍述。 其次,一面將刀尖壓抵於玻璃基板11之第1面SF1上,一面使刀尖於第1面SF1上自起點N1經由中途點N2向終點N3移動。藉此,於玻璃基板11之第1面SF1上產生塑性變形。藉此,於第1面SF1上形成自起點N1經由中途點N2向終點N3延伸之溝槽線TL(圖1:步驟S11)。於圖2中,利用刀尖向方向DA之移動而形成3個TL。 形成溝槽線TL之步驟包括作為溝槽線TL之一部分而形成低負載區間LR(第1部分)之步驟、及作為溝槽線TL之一部分而形成高負載區間HR(第2部分)之步驟。於圖2中,自起點N1至中途點N2形成低負載區間,自中途點N2至終點N3形成高負載區間。形成高負載區間HR之步驟中對刀尖施加之負載高於形成低負載區間LR之步驟中所使用之負載。反而言之,形成低負載區間LR之步驟中對刀尖施加之負載低於形成高負載區間HR之步驟中所使用之負載,例如為高負載區間HR之負載之30~50%左右。因此,高負載區間HR之寬度大於低負載區間LR之寬度。例如,高負載區間HR具有寬度10 μm,低負載區間LR具有寬度5 μm。又,高負載區間HR之深度大於低負載區間LR之深度。溝槽線TL之剖面例如具有角度160°左右之V字形狀。 形成溝槽線TL之步驟係以如下方式進行,即於低負載區間LR與高負載區間HR之兩者之下方獲得玻璃基板11於與溝槽線TL交叉之方向DC(圖4(A)及(B))上連續連接之狀態即無裂痕狀態。為此,使對刀尖施加之負載大至使玻璃基板11之塑性變形產生之程度,且小至不使以該塑性變形部為起點之裂痕產生之程度。 其次,使裂痕僅沿著溝槽線TL之高負載區間HR及低負載區間LR中之高負載區間HR產生(圖1:步驟S12)。具體而言,進行以下之步驟。 參照圖5~圖7,首先,於玻璃基板11之第1面SF1上形成與高負載區間HR交叉之輔助線AL。輔助線AL伴有向玻璃基板11之厚度方向滲透之裂痕。輔助線AL能夠藉由通常之劃線方法形成。 其次,沿著輔助線AL將玻璃基板11分離。該分離能夠藉由通常之斷裂步驟進行。以該分離為契機,使厚度方向上之玻璃基板11之裂痕僅沿著溝槽線TL之低負載區間LR及高負載區間HR中之高負載區間HR伸展。 參照圖8及圖9,根據以上,使裂痕僅沿著溝槽線TL之低負載區間LR及高負載區間HR中之高負載區間HR產生。具體而言,於高負載區間HR中之藉由分離而新產生之邊與中途點N2之間之部分形成裂痕線CL。形成裂痕線CL之方向與形成溝槽線TL之方向DA(圖2)相反。再者,於藉由分離而新產生之邊與終點N3之間之部分不易形成裂痕線CL。該方向相依性係起因於形成高負載區間HR時之刀尖之狀態,下文進行詳細敍述。 參照圖10,藉由裂痕線CL,而於溝槽線TL之高負載區間HR之下方,玻璃基板11於與溝槽線TL之延伸方向交叉之方向DC上連續之連接斷開。此處所謂「連續之連接」,換言之係不因裂痕而遮斷之連接。再者,於如上所述使連續之連接斷開之狀態下,玻璃基板11之部分彼此亦可經由裂痕線CL之裂痕而接觸。又,亦可於溝槽線TL之正下方殘留稍微連續之連接。 根據以上,準備藉由下述步驟而斷裂之玻璃基板11(圖1:步驟S10)。於該時間點,僅於低負載區間LR及高負載區間HR中之低負載區間LR之下方,玻璃基板11處於在與溝槽線TL交叉之方向上連續連接之狀態即無裂痕狀態。又,裂痕僅沿著低負載區間LR及高負載區間HR中之高負載區間HR延伸。 其次,進行沿著溝槽線TL將玻璃基板11分斷之斷裂步驟。此時,藉由對玻璃基板11施加應力而使裂痕以裂痕線CL為起點沿著低負載區間LR伸展。裂痕伸展之方向(圖11中之箭頭PR)與形成溝槽線TL之方向DA(圖2)相反。以下,對斷裂步驟之詳細情況進行說明。 參照圖12,準備平台80(支持部)。平台80例如係由玻璃或不鏽鋼製成。平台80典型而言具有平坦之表面。其次,經由下側彈性片71(第1彈性構件)將玻璃基板11之第1面SF1載置於平台80上(圖1:步驟S20)。 下側彈性片71係由通常意義上之彈性體製成,因此較玻璃基板11及平台80之各者富有彈性。換言之,下側彈性片71具有較玻璃基板11及平台80之各者之楊氏模數低之楊氏模數。進而換言之,下側彈性片71具有較玻璃基板11及平台80之各者之硬度低之硬度。下側彈性片71之硬度較佳為40~90°。作為下側彈性片71之材料之彈性體較佳為橡膠,例如為聚矽氧橡膠、氯丁二烯橡膠或天然橡膠。下側彈性片71之厚度例如為數mm左右。 參照圖13及圖14,將上側彈性片72(第2彈性構件)載置於玻璃基板11之第2面SF2。又,準備斷開桿85(應力施加構件)。如圖14所示,斷開桿85較佳為具有以能夠局部地壓抵施加應力之對象之方式突出之形狀,於圖14中,具有大致V字狀之形狀。如圖13所示,該突出部分呈直線狀延伸。斷開桿85例如係由超硬合金、部分穩定化氧化鋯或不鏽鋼製成。 上側彈性片72係由通常意義上之彈性體製成,因此較玻璃基板11及斷開桿85之各者富有彈性。換言之,上側彈性片72具有較玻璃基板11及斷開桿85之各者之楊氏模數低之楊氏模數。進而換言之,上側彈性片72具有較玻璃基板11及斷開桿85之各者之硬度低之硬度。上側彈性片72之硬度較佳為40~90°。作為上側彈性片72之材料之彈性體較佳為橡膠,例如為聚矽氧橡膠、氯丁二烯橡膠或天然橡膠。上側彈性片72之材料亦可與下側彈性片71之材料相同。上側彈性片72之厚度例如為數mm左右。 參照圖15,其次,使斷開桿85靠近平台80。較佳為使斷開桿85相對於平台80向方向DR相對地進行直線移動。方向DR只要係以斷開桿85靠近平台80之方式選擇即可,例如為與平台80之表面(圖中,上表面)垂直之方向。斷開桿85係以其經由上側彈性片72與玻璃基板11接觸之位置為基準,典型而言朝向玻璃基板11進而移動數百μm左右。藉由該移動,經由上側彈性片72將斷開桿85壓抵於玻璃基板11之第2面SF2(圖1:步驟S30)。藉此,針對玻璃基板11,藉由夾於上側彈性片72及下側彈性片71而施加應力。其結果為,裂痕自沿著高負載區間HR設置之裂痕線CL擴展。 參照圖16,因上述裂痕之擴展,玻璃基板11沿著高負載區間HR分離。並且進而如圖中箭頭PR所示,裂痕自高負載區間HR向低負載區間LR伸展。 根據以上,沿著高負載區間HR及低負載區間LR之兩者,換言之沿著溝槽線TL,將玻璃基板11分斷。即,進行將玻璃基板11如圖11所示般分斷之斷裂步驟。 (劃線器具) 參照圖17(A)及(B),對適於上述溝槽線TL之形成之劃線器具50進行說明。劃線器具50藉由安裝於劃線頭(未圖示)而相對於玻璃基板11相對地移動,藉此對玻璃基板11進行劃線。劃線器具50具有刀尖51及柄52。刀尖51保持於柄52。 於刀尖51,設置有頂面SD1、及包圍頂面SD1之複數個面。該等複數個面包括側面SD2及側面SD3。頂面SD1、側面SD2及SD3朝向互不相同之方向,且相互相鄰。刀尖51具有頂面SD1、側面SD2及SD3合流之頂點,且由該頂點構成刀尖51之突起部PP。又,側面SD2及SD3形成構成刀尖51之側部PS之稜線。側部PS自突起部PP呈線狀延伸。又,側部PS如上所述為稜線,因此具有呈線狀延伸之凸形狀。 刀尖51較佳為金剛石尖。即,刀尖51較佳為由金剛石製成。於該情形時,能夠容易地使硬度變高,使表面粗糙度變小。更佳為,刀尖51係由單晶金剛石製成。進而較佳為,結晶學上而言,頂面SD1為{001}面,側面SD2及SD3之各者為{111}面。於該情形時,側面SD2及SD3具有不同之方向,但結晶學上為相互等效之結晶面。 再者,亦可使用非單晶之金剛石,例如亦可使用利用CVD(Chemical Vapor Deposition,化學氣相沈積)法合成之多晶體金剛石。或者,亦可使用自微粒之石墨或非石墨狀碳不含鐵族元素等結合材料燒結而成之多晶體金剛石、或藉由鐵族元素等結合材料使金剛石粒子結合而成之燒結金剛石。 柄52沿著軸方向AX延伸。刀尖51較佳為以頂面SD1之法線方向大致沿著軸方向AX之方式安裝於柄52。 於使用劃線器具50之溝槽線TL之形成中,首先將刀尖51壓抵於玻璃基板11之第1面SF1。具體而言,使刀尖51之突起部PP及側部PS向玻璃基板11具有之厚度方向DT壓抵。 其次,使被壓抵之刀尖51於第1面SF1上向方向DA滑動。方向DA係將自突起部PP沿著側部PS延伸之方向投影至第1面SF1上者,且與將軸方向AX投影至第1面SF1上之方向大致對應。滑動時,刀尖51藉由柄52於第1面SF1上拖拽滑動。藉由該滑動,於玻璃基板11之第1面SF1上產生塑性變形。藉由該塑性變形而形成溝槽線TL。 再者,於本實施形態中之自起點N1向終點N3之溝槽線TL之形成中,若使刀尖51向方向DB移動,換言之,若以刀尖51之移動方向為基準而刀尖51之姿勢向反方向傾斜,則圖9所示之裂痕線CL之形成、及圖16所示之裂痕之行進與使用方向DA之情形相比不易產生。更一般而言,於利用刀尖51向方向DA之移動所形成之溝槽線TL中,裂痕容易向與方向DA相反之方向伸展。另一方面,於利用刀尖51向方向DB之移動所形成之溝槽線TL中,裂痕容易向與方向DB相同之方向伸展。推測此種方向相依性可能與因形成溝槽線TL時產生之塑性變形而產生於玻璃基板11內之應力分佈相關聯。又,根據本發明者等人之研究,藉由使軸方向AX相對於第1面SF1更接近於垂直,能夠使上述方向相依性反轉。 (比較例) 於圖15中,對在平台80與斷開桿85之間無下側彈性片71及上側彈性片72而夾著玻璃基板11之比較例進行說明。於該情形時,於利用斷開桿85對玻璃基板11進行應力施加之初始階段中,能夠對玻璃基板11局部地施加較大之應力。具體而言,能夠對玻璃基板11之第2面SF2中之斷開桿85最初接觸之位置局部地施加較大之應力。於該位置位於不設置有裂痕之低負載區間LR(圖15)上之情形時,會對不存在成為起點之裂痕之區域局部地施加較大之應力,結果為,容易自低負載區間LR之線脫離而將玻璃基板11分斷。 若斷開桿85能夠同時與沿著溝槽線TL之線(圖15中之玻璃基板11之上邊)之整體接觸,則能夠避免該問題。然而,為此需要嚴密之位置控制,尤其是玻璃基板11之長度(圖15中橫向之尺寸)越大,其實施越困難,若成為500 mm左右以上,則特別困難。 若於以斷開桿85(圖13)之圖中之右側位於較左側充分靠下方之方式配置後,使斷開桿85相對於平台80向方向DR(圖15)相對地進行直線移動,則於應力施加之初始階段中,斷開桿85相較於第2面SF2中之低負載區間LR更先有餘裕地接觸於高負載區間HR上。於該情形時,防止於應力施加之初始階段中,對低負載區間LR附近局部地施加較大之應力。然而,若為了使斷裂步驟進展而使斷開桿85進而靠近平台80,則斷開桿85之右側與平台80碰撞。因此,使斷裂步驟完成至最後變得困難。玻璃基板11之長度(圖15中之橫向之尺寸)越大,該問題越顯著,若成為500 mm左右以上,則尤其成為問題。 (效果) 與上述比較例不同,根據本實施形態,於斷裂步驟中使用下側彈性片71及上側彈性片72(圖15)。下側彈性片71較玻璃基板11及平台80之各者富有彈性。又,上側彈性片72較玻璃基板11及斷開桿85之各者富有彈性。藉由該下側彈性片71及上側彈性片72,抑制於應力施加之初始階段中對玻璃基板11局部地施加較大之應力。藉此,於初始階段中,首先,沿著溝槽線TL之高負載區間HR的玻璃基板11之分離穩定地產生。其後,沿著溝槽線TL之低負載區間LR穩定地產生玻璃基板11之進一步之分離。藉此,能夠沿著溝槽線TL之整體穩定地將玻璃基板11分斷。 較佳為,斷開桿85對玻璃基板11之第2面SF2之接觸係藉由使斷開桿85相對於平台80沿著方向DR直線移動而進行。藉此,可無需斷開桿85或平台80之複雜之動作,而進行斷裂。 又,根據本實施形態,形成用以規定將玻璃基板11分斷之位置之溝槽線TL(圖2及圖3)時,與高負載區間HR相比,於低負載區間LR中,減輕對刀尖51(圖17(A))施加之負載。藉此,能夠減小對刀尖51之損害。 又,於低負載區間LR及高負載區間HR中之低負載區間LR為無裂痕狀態之情形時(圖8及圖9),成為將玻璃基板11分斷之起點之裂痕不存在於低負載區間LR。因此,於在該狀態下對玻璃基板11進行任意之處理之情形時,即便對低負載區間LR施加意外之應力,亦不易產生玻璃基板11之意外之分斷。因此,能夠穩定地進行上述處理。 又,於低負載區間LR及高負載區間HR之兩者為無裂痕狀態之情形時(圖2及圖3),成為將玻璃基板11分斷之起點之裂痕不存在於溝槽線TL。因此,於在該狀態下對玻璃基板11進行任意之處理之情形時,即便對溝槽線TL施加意外之應力,亦不易產生玻璃基板11之意外之分斷。因此,能夠更穩定地進行上述處理。 又,溝槽線TL係於輔助線AL之形成前形成。藉此,能夠避免形成溝槽線TL時輔助線AL造成影響。尤其是能夠避免為了形成溝槽線TL而刀尖51剛通過輔助線AL上後之形成異常。 其次,以下對實施形態1之變化例進行說明。 參照圖18,亦可以輔助線AL與溝槽線TL交叉為契機,而形成裂痕線CL。於形成輔助線AL時對玻璃基板11施加之應力較大之情形時,可能出現此種現象。 參照圖19,亦可於玻璃基板11之第1面SF1首先形成輔助線AL,其後形成溝槽線TL(於圖19中未圖示)。 參照圖20,輔助線AL亦可以於平面佈局中與高負載區間HR交叉之方式形成於玻璃基板11之第2面SF2上。藉此,能夠相互不造成影響地形成輔助線AL及溝槽線TL之兩者。 參照圖21(A)及(B),亦可使用劃線器具50v以代替劃線器具50(圖17(A)及(B))。刀尖51v具有包含頂點及圓錐面SC之圓錐形狀。刀尖51v之突起部PPv由頂點構成。刀尖之側部PSv係自頂點沿著於圓錐面SC上延伸之假想線(圖21(B)中之虛線)而構成。藉此,側部PSv具有呈線狀延伸之凸形狀。 <實施形態2> 參照圖22,首先準備玻璃基板11。又,準備具有刀尖之劃線器具。下文對劃線器具之詳細情況進行敍述。 其次,藉由刀尖於玻璃基板11之第1面SF1上向方向DB之移動,而於第1面SF1上形成與下述高負載區間HR(圖23)交叉之輔助線AL。 參照圖23,藉由刀尖向方向DB之移動,而於玻璃基板11之第1面SF1上自起點Q1經由中途點Q2至終點Q3形成溝槽線TL。自起點Q1至中途點Q2之溝槽線TL作為高負載區間HR而形成。自中途點Q2至終點Q3之溝槽線TL作為低負載區間LR而形成。 其次,沿著輔助線AL將玻璃基板11分離。該分離能夠藉由通常之斷裂步驟而進行。以該分離為契機,使厚度方向上之玻璃基板11之裂痕沿著溝槽線TL僅於溝槽線TL中之高負載區間HR伸展。 參照圖24,藉由上述裂痕之伸展,沿著溝槽線TL之一部分形成裂痕線CL。具體而言,於高負載區間HR中之藉由分離而新產生之邊與中途點Q2之間之部分形成裂痕線CL。形成裂痕線CL之方向與形成溝槽線TL之方向DB(圖23)相同。再者,於藉由分離而新產生之邊與起點Q1之間之部分不易形成裂痕線CL。該方向相依性係起因於形成高負載區間HR時之刀尖之狀態,下文進行詳細敍述。 其次,藉由與實施形態1相同之斷裂步驟(圖12~圖16),進行使裂痕以裂痕線CL為起點沿著溝槽線TL自中途點Q2朝向終點Q3伸展之斷裂步驟。藉此將玻璃基板11分斷。 參照圖25及圖26,作為第1變化例,亦可首先形成溝槽線TL,其後形成輔助線AL。參照圖27,作為第2變化例,亦可以輔助線AL之形成為契機,形成裂痕線CL。參照圖28,輔助線AL亦可以於平面佈局中與高負載區間HR交叉之方式形成於玻璃基板11之第2面SF2上。又,於本實施形態中,高負載區間HR係自起點Q1形成,但只要高負載區間HR形成於與輔助線AL交叉之部分即可。例如,亦可自起點Q1至與輔助線AL交叉之位置之近前為止形成低負載區間LR,繼此之後,以與輔助線AL交叉之方式形成高負載區間HR。 參照圖29,其次對適於本實施形態中之溝槽線TL之形成之劃線器具50R進行說明。劃線器具50R具有劃線輪51R、固持器52R、及銷53。劃線輪51R具有大致圓盤狀之形狀,其直徑典型而言為數mm左右。劃線輪51R經由銷53可繞旋轉軸RX旋轉地保持於固持器52R。 劃線輪51R具有設置有刀尖之外周部PF。外周部PF繞旋轉軸RX呈圓環狀延伸。外周部PF如圖30(A)所示,於目視水平下呈稜線狀陡立,藉此構成包含稜線與傾斜面之刀尖。另一方面,於顯微鏡水平下,如圖30(B)所示,劃線輪51R進入至第1面SF1內,藉此於實際起作用之部分(較圖30(B)之二點鏈線更下方)中,外周部PF之稜線具有細微之表面形狀MS。表面形狀MS較佳為於正面觀察(圖30(B))時具有曲線形狀,該曲線形狀具有有限之曲率半徑。劃線輪51R係使用超硬合金、燒結金剛石、多晶金剛石或單晶金剛石等硬質材料形成。就使上述稜線及傾斜面之表面粗糙度變小之觀點而言,亦可使劃線輪51R整體由單晶金剛石製成。 使用劃線器具50R之溝槽線TL之形成係藉由以下方式進行,即藉由使劃線輪51R於玻璃基板11之第1面SF1上滾動(圖29:箭頭RT),而使劃線輪51R於第1面SF1上向方向DB行進。一面藉由對劃線輪51R施加負載F而將劃線輪51R之外周部PF壓抵於玻璃基板11之第1面SF1上,一面進行利用該滾動之行進。藉此,於玻璃基板11之第1面SF1上使塑性變形產生,藉此形成具有槽形狀之溝槽線TL。負載F具有與玻璃基板11之厚度方向DT平行之垂直成分Fp、及與第1面SF1平行之面內成分Fi。方向DB與面內成分Fi之方向相同。 再者,溝槽線TL亦可藉由除向方向DB移動之劃線器具50R以外之方法而形成,例如,亦可藉由向方向DB移動之劃線器具50(圖17(A)及(B))或50v(圖21(A)及(B))而形成。 再者,對於上述以外之構成,由於與上述實施形態1之構成大致相同,故而對相同或對應之要素標註相同之符號,且不重複其說明。 根據本實施形態,亦獲得與實施形態1大致相同之效果。又,於本實施形態中,可使用旋轉之刀尖而非固定之刀尖來形成溝槽線TL,因此能夠延長刀尖之壽命。 <實施形態3> 參照圖31及圖32,於本實施形態中,於利用刀尖形成溝槽線TL時,該高負載區間HR形成至玻璃基板11之邊緣上之終點N4以代替終點N3(圖2)。藉此,於形成溝槽線TL時,刀尖於終點N4將玻璃基板4之邊緣切下。 參照圖33,以切下玻璃基板4之邊緣為契機,如圖中箭頭所示,裂痕自玻璃基板4之邊緣伸展。藉此形成裂痕線CL。 參照圖34,藉由重複該步驟而形成所需數量之溝槽線TL。其後,進行與實施形態1相同之斷裂步驟。 根據本實施形態,能夠不特別需要輔助線AL(圖5)等之形成,而容易地對玻璃基板4提供使裂痕線CL之形成開始之契機。 <實施形態4> 參照圖35,於本實施形態中,於經由下側彈性片71將玻璃基板11之第1面SF1載置於平台80上時,於玻璃基板11之第1面SF1與下側彈性片71之間配置膜81。膜81係於玻璃基板11之第1面SF1側,具有較下側彈性片71之黏著性(黏性)低之黏著性。膜81較佳為樹脂膜,例如由聚對苯二甲酸乙二酯、聚乙烯、聚氯乙烯或聚烯烴製成。膜81之厚度小於下側彈性片71之厚度,例如為數十μm左右。 又,於經由上側彈性片72將斷開桿85壓抵於玻璃基板11之第2面SF2時,於玻璃基板11之第2面SF2與上側彈性片72之間配置膜82。具體而言,將膜82載置於玻璃基板11之第2面SF2上。上側彈性片72載置於膜82上。膜82係於玻璃基板11之第2面SF2側,具有較上側彈性片72之黏著性低之黏著性。膜82較佳為樹脂膜,例如由聚對苯二甲酸乙二酯、聚乙烯、聚氯乙烯或聚烯烴製成。膜82之厚度小於上側彈性片72之厚度,例如為數十μm左右。 再者,對於上述以外之構成,由於與上述實施形態1至3中任一構成大致相同,故而對相同或對應之要素標註相同之符號,且不重複其說明。 根據本實施形態,藉由於玻璃基板11之第1面SF1與下側彈性片71之間配置膜81而防止下側彈性片71貼附於第1面SF1。又,藉由於玻璃基板11之第2面SF2與上側彈性片72之間配置膜82而防止上側彈性片72貼附於第2面SF2。 上述各實施形態之脆性基板之分斷方法尤其適宜應用於玻璃基板,但脆性基板亦可由玻璃以外之材料製成。例如亦可使用陶瓷、矽、化合物半導體、藍寶石、或石英作為玻璃以外之材料。Hereinafter, a method of dividing a brittle substrate in each embodiment of the present invention will be described based on the drawings. In the following, the same or corresponding components are denoted by the same reference numerals, and the description thereof is not repeated. <Embodiment 1> (Blocking method) The breaking method of the brittle substrate of the present embodiment will be described below with reference to the flowchart of Fig. 1 . The glass substrate 11 is prepared with reference to Figs. 2 to 4 . The glass substrate 11 has a first surface SF1 and a second surface SF2 opposite thereto. Further, the glass substrate 11 has a thickness direction DT perpendicular to the first surface SF1. Further, a scribing tool having a blade tip is prepared. The details of the marking device are described below. Then, while the blade edge is pressed against the first surface SF1 of the glass substrate 11, the blade edge is moved from the starting point N1 to the end point N3 from the starting point N1 on the first surface SF1. Thereby, plastic deformation occurs on the first surface SF1 of the glass substrate 11. Thereby, the groove line TL extending from the starting point N1 to the end point N3 via the intermediate point N2 is formed on the first surface SF1 (FIG. 1: Step S11). In Fig. 2, three TLs are formed by the movement of the blade edge in the direction DA. The step of forming the trench line TL includes a step of forming a low load section LR (first part) as a part of the trench line TL, and a step of forming a high load section HR (part 2) as a part of the trench line TL . In FIG. 2, a low load section is formed from the starting point N1 to the halfway point N2, and a high load section is formed from the midway point N2 to the end point N3. The load applied to the tool tip in the step of forming the high load interval HR is higher than the load used in the step of forming the low load interval LR. Conversely, the load applied to the tool tip in the step of forming the low load section LR is lower than the load used in the step of forming the high load section HR, for example, about 30 to 50% of the load of the high load section HR. Therefore, the width of the high load interval HR is greater than the width of the low load interval LR. For example, the high load interval HR has a width of 10 μm and the low load interval LR has a width of 5 μm. Also, the depth of the high load section HR is greater than the depth of the low load section LR. The cross section of the groove line TL has, for example, a V shape having an angle of about 160°. The step of forming the trench line TL is performed in such a manner that the glass substrate 11 is crossed in the direction intersecting the trench line TL below both the low load section LR and the high load section HR (FIG. 4(A) and (B)) The state of continuous connection is the state of no crack. For this reason, the load applied to the blade tip is made large to the extent that the plastic deformation of the glass substrate 11 is generated, and is small enough not to cause cracks starting from the plastic deformation portion. Next, the crack is generated only along the high load section HR of the groove line TL and the high load section HR in the low load section LR (FIG. 1: Step S12). Specifically, the following steps are performed. Referring to FIGS. 5 to 7 , first, an auxiliary line AL intersecting the high load section HR is formed on the first surface SF1 of the glass substrate 11 . The auxiliary line AL is accompanied by a crack which penetrates into the thickness direction of the glass substrate 11. The auxiliary line AL can be formed by a usual scribing method. Next, the glass substrate 11 is separated along the auxiliary line AL. This separation can be carried out by a usual cleavage step. In response to this separation, the crack of the glass substrate 11 in the thickness direction extends only along the low load section LR of the trench line TL and the high load section HR in the high load section HR. 8 and 9, according to the above, the crack is generated only along the low load section LR of the groove line TL and the high load section HR in the high load section HR. Specifically, the crack line CL is formed in a portion between the edge newly generated by the separation and the halfway point N2 in the high load section HR. The direction in which the crack line CL is formed is opposite to the direction DA (FIG. 2) in which the groove line TL is formed. Further, the portion between the side newly formed by the separation and the end point N3 is less likely to form the crack line CL. This direction dependence is caused by the state of the blade edge when the high load section HR is formed, which will be described in detail below. Referring to Fig. 10, the glass substrate 11 is continuously disconnected in the direction DC intersecting the extending direction of the groove line TL by the crack line CL below the high load interval HR of the groove line TL. Here, "continuous connection", in other words, is a connection that is not interrupted by cracks. Further, in a state where the continuous connection is broken as described above, portions of the glass substrate 11 can also be in contact with each other via the crack of the crack line CL. Further, a slightly continuous connection may remain immediately below the groove line TL. From the above, the glass substrate 11 which was broken by the following procedure was prepared (FIG. 1: Step S10). At this point of time, the glass substrate 11 is in a state of being continuously connected in a direction intersecting the groove line TL, that is, in a state where there is no crack, only under the low load section LR in the low load section LR and the high load section HR. Further, the crack extends only along the high load section HR in the low load section LR and the high load section HR. Next, a step of breaking the glass substrate 11 along the groove line TL is performed. At this time, by applying stress to the glass substrate 11, the crack is stretched along the low load section LR starting from the crack line CL. The direction in which the crack is stretched (arrow PR in Fig. 11) is opposite to the direction DA (Fig. 2) in which the groove line TL is formed. The details of the breaking step will be described below. Referring to Fig. 12, a platform 80 (support portion) is prepared. The platform 80 is made, for example, of glass or stainless steel. Platform 80 typically has a flat surface. Next, the first surface SF1 of the glass substrate 11 is placed on the stage 80 via the lower elastic piece 71 (first elastic member) (FIG. 1: Step S20). The lower elastic piece 71 is made of a general elastic body, and thus is more elastic than each of the glass substrate 11 and the stage 80. In other words, the lower elastic piece 71 has a Young's modulus lower than the Young's modulus of each of the glass substrate 11 and the stage 80. Further, in other words, the lower elastic sheet 71 has a hardness lower than that of each of the glass substrate 11 and the stage 80. The hardness of the lower elastic sheet 71 is preferably 40 to 90°. The elastic body as the material of the lower elastic sheet 71 is preferably rubber, such as polyoxymethylene rubber, chloroprene rubber or natural rubber. The thickness of the lower elastic piece 71 is, for example, about several mm. Referring to FIGS. 13 and 14 , the upper elastic piece 72 (second elastic member) is placed on the second surface SF2 of the glass substrate 11 . Further, the rod 85 (stress applying member) is prepared to be broken. As shown in Fig. 14, the breaking lever 85 preferably has a shape that protrudes so as to be locally pressed against the object to which the stress is applied, and has a substantially V-shaped shape in Fig. 14 . As shown in Fig. 13, the protruding portion extends linearly. The break lever 85 is made of, for example, a cemented carbide, partially stabilized zirconia or stainless steel. The upper elastic piece 72 is made of a general elastic body, and thus is more elastic than each of the glass substrate 11 and the breaking lever 85. In other words, the upper elastic piece 72 has a Young's modulus which is lower than the Young's modulus of each of the glass substrate 11 and the break lever 85. Further, in other words, the upper elastic piece 72 has a hardness lower than that of each of the glass substrate 11 and the break lever 85. The hardness of the upper elastic sheet 72 is preferably 40 to 90°. The elastomer as the material of the upper elastic sheet 72 is preferably rubber, such as polyoxyethylene rubber, chloroprene rubber or natural rubber. The material of the upper elastic piece 72 may be the same as that of the lower elastic piece 71. The thickness of the upper elastic piece 72 is, for example, about several mm. Referring to Figure 15, second, the break lever 85 is brought close to the platform 80. Preferably, the break lever 85 is linearly moved relative to the platform 80 in the direction DR. The direction DR may be selected in such a manner that the breaking lever 85 is close to the stage 80, for example, a direction perpendicular to the surface (upper surface in the drawing) of the stage 80. The break lever 85 is typically moved toward the glass substrate 11 by a distance of about several hundred μm based on the position at which the upper elastic piece 72 is in contact with the glass substrate 11 . By this movement, the break lever 85 is pressed against the second surface SF2 of the glass substrate 11 via the upper elastic piece 72 (FIG. 1: Step S30). Thereby, stress is applied to the glass substrate 11 by being sandwiched between the upper elastic sheet 72 and the lower elastic sheet 71. As a result, the crack spreads from the crack line CL set along the high load section HR. Referring to Fig. 16, the glass substrate 11 is separated along the high load section HR due to the expansion of the crack. Further, as shown by an arrow PR in the figure, the crack extends from the high load section HR to the low load section LR. As described above, the glass substrate 11 is divided along the groove line TL along both the high load section HR and the low load section LR. That is, a breaking step of dividing the glass substrate 11 as shown in FIG. 11 is performed. (Scribing Apparatus) Referring to Figs. 17(A) and (B), the scribing tool 50 suitable for the formation of the groove line TL will be described. The scribing tool 50 is relatively moved with respect to the glass substrate 11 by being attached to a scribing head (not shown), thereby scribing the glass substrate 11. The scribing tool 50 has a blade tip 51 and a handle 52. The tip 51 is held by the handle 52. The blade tip 51 is provided with a top surface SD1 and a plurality of faces surrounding the top surface SD1. The plurality of faces include a side surface SD2 and a side surface SD3. The top surface SD1, the side surfaces SD2, and the SD3 face different directions from each other and are adjacent to each other. The blade edge 51 has a vertex where the top surface SD1, the side surfaces SD2, and SD3 merge, and the apex constitutes the protrusion PP of the blade edge 51. Further, the side faces SD2 and SD3 form a ridge line constituting the side portion PS of the blade edge 51. The side portion PS extends linearly from the protrusion portion PP. Further, since the side portion PS is a ridge line as described above, it has a convex shape extending in a line shape. The tip 51 is preferably a diamond tip. That is, the cutting edge 51 is preferably made of diamond. In this case, the hardness can be easily increased and the surface roughness can be made small. More preferably, the tip 51 is made of single crystal diamond. More preferably, crystallographically, the top surface SD1 is a {001} plane, and each of the side surfaces SD2 and SD3 is a {111} plane. In this case, the side faces SD2 and SD3 have different directions, but are crystallographically equivalent to each other. Further, a non-single crystal diamond may be used. For example, a polycrystalline diamond synthesized by a CVD (Chemical Vapor Deposition) method may also be used. Alternatively, a polycrystalline diamond obtained by sintering a particulate material such as graphite or a non-graphite carbon containing no iron group element, or a sintered diamond obtained by combining diamond particles by a bonding material such as an iron group element may be used. The shank 52 extends along the axial direction AX. The blade edge 51 is preferably attached to the shank 52 so as to be substantially along the axial direction AX in the normal direction of the top surface SD1. In the formation of the groove line TL using the scribing tool 50, the blade edge 51 is first pressed against the first surface SF1 of the glass substrate 11. Specifically, the protrusion PP and the side portion PS of the blade edge 51 are pressed against the thickness direction DT of the glass substrate 11 . Next, the blade tip 51 that has been pressed is slid in the direction DA on the first surface SF1. The direction DA is projected onto the first surface SF1 from the direction in which the protrusion portion PP extends along the side portion PS, and substantially corresponds to the direction in which the axial direction AX is projected onto the first surface SF1. When sliding, the blade edge 51 is dragged and slid on the first surface SF1 by the shank 52. By this sliding, plastic deformation occurs on the first surface SF1 of the glass substrate 11. The groove line TL is formed by the plastic deformation. Further, in the formation of the groove line TL from the starting point N1 to the end point N3 in the present embodiment, when the blade edge 51 is moved in the direction DB, in other words, the blade edge 51 is referenced based on the moving direction of the blade edge 51. When the posture is inclined in the reverse direction, the formation of the crack line CL shown in FIG. 9 and the progress of the crack shown in FIG. 16 are less likely to occur than in the use direction DA. More generally, in the groove line TL formed by the movement of the blade edge 51 in the direction DA, the crack easily spreads in a direction opposite to the direction DA. On the other hand, in the groove line TL formed by the movement of the blade edge 51 in the direction DB, the crack easily spreads in the same direction as the direction DB. It is presumed that such a direction dependency may be associated with a stress distribution generated in the glass substrate 11 due to plastic deformation generated when the groove line TL is formed. Moreover, according to the study by the inventors of the present invention, the axial dependence can be reversed by making the axial direction AX closer to the vertical with respect to the first surface SF1. (Comparative Example) A comparative example in which the glass substrate 11 is sandwiched between the stage 80 and the break lever 85 without the lower elastic sheet 71 and the upper elastic sheet 72 is shown in Fig. 15 . In this case, in the initial stage of applying stress to the glass substrate 11 by the break lever 85, a large stress can be locally applied to the glass substrate 11. Specifically, a large stress can be locally applied to the position where the break lever 85 of the second surface SF2 of the glass substrate 11 initially contacts. When the position is on the low load section LR (FIG. 15) where the crack is not provided, a large stress is locally applied to the region where the crack which is the starting point is not present, and as a result, it is easy to be from the low load section LR. The glass substrate 11 is separated by the wire being separated. This problem can be avoided if the break lever 85 can simultaneously contact the entire line along the line of the groove line TL (the upper side of the glass substrate 11 in Fig. 15). However, strict position control is required for this purpose, and in particular, the larger the length of the glass substrate 11 (the lateral dimension in Fig. 15), the more difficult it is to carry out, and it is particularly difficult to be about 500 mm or more. If the right side of the map of the break lever 85 (FIG. 13) is disposed substantially below the left side, the break lever 85 is linearly moved relative to the platform 80 in the direction DR (FIG. 15). In the initial stage of stress application, the break lever 85 is more marginally contacted with the high load section HR than the low load section LR of the second face SF2. In this case, it is prevented that a large stress is locally applied to the vicinity of the low load section LR in the initial stage of stress application. However, if the break lever 85 is further brought closer to the platform 80 in order to advance the breaking step, the right side of the break lever 85 collides with the platform 80. Therefore, it becomes difficult to complete the fracture step until the end. The larger the length of the glass substrate 11 (the lateral dimension in FIG. 15), the more remarkable the problem is, and it is particularly problematic if it is about 500 mm or more. (Effect) Unlike the above comparative example, according to the present embodiment, the lower elastic sheet 71 and the upper elastic sheet 72 (Fig. 15) are used in the breaking step. The lower elastic piece 71 is more elastic than each of the glass substrate 11 and the stage 80. Further, the upper elastic piece 72 is more elastic than each of the glass substrate 11 and the break lever 85. By the lower elastic piece 71 and the upper elastic piece 72, it is suppressed that a large stress is locally applied to the glass substrate 11 in the initial stage of stress application. Thereby, in the initial stage, first, the separation of the glass substrate 11 along the high load section HR of the groove line TL is stably generated. Thereafter, the further separation of the glass substrate 11 is stably generated along the low load interval LR of the groove line TL. Thereby, the glass substrate 11 can be stably broken along the entire groove line TL. Preferably, the contact of the break lever 85 with respect to the second surface SF2 of the glass substrate 11 is performed by linearly moving the break lever 85 in the direction DR with respect to the stage 80. Thereby, the breakage can be performed without breaking the complicated action of the rod 85 or the platform 80. Further, according to the present embodiment, when the groove line TL (Figs. 2 and 3) for defining the position at which the glass substrate 11 is to be separated is formed, the light load is reduced in the low load section LR as compared with the high load section HR. The load applied by the tip 51 (Fig. 17(A)). Thereby, damage to the blade edge 51 can be reduced. Further, when the low load section LR in the low load section LR and the high load section HR is in the non-cracked state (Figs. 8 and 9), the crack at the starting point for breaking the glass substrate 11 does not exist in the low load section. LR. Therefore, when the glass substrate 11 is subjected to an arbitrary treatment in this state, even if an unexpected stress is applied to the low load section LR, the accidental breakage of the glass substrate 11 is less likely to occur. Therefore, the above processing can be performed stably. Further, when both the low load section LR and the high load section HR are in the non-cracked state (FIGS. 2 and 3), the crack which is the starting point for breaking the glass substrate 11 does not exist in the groove line TL. Therefore, in the case where the glass substrate 11 is subjected to an arbitrary treatment in this state, even if an unexpected stress is applied to the groove line TL, the accidental breakage of the glass substrate 11 is less likely to occur. Therefore, the above processing can be performed more stably. Further, the groove line TL is formed before the formation of the auxiliary line AL. Thereby, it is possible to avoid the influence of the auxiliary line AL when the groove line TL is formed. In particular, it is possible to avoid the formation of an abnormality immediately after the cutting edge 51 passes through the auxiliary line AL in order to form the groove line TL. Next, a modification of the first embodiment will be described below. Referring to Fig. 18, it is also possible to form a crack line CL by crossing the auxiliary line AL and the groove line TL. This phenomenon may occur when the stress applied to the glass substrate 11 when the auxiliary line AL is formed is large. Referring to Fig. 19, an auxiliary line AL may be first formed on the first surface SF1 of the glass substrate 11, and then a groove line TL (not shown in Fig. 19) may be formed. Referring to Fig. 20, the auxiliary line AL may be formed on the second surface SF2 of the glass substrate 11 so as to intersect the high load section HR in the planar layout. Thereby, both the auxiliary line AL and the groove line TL can be formed without affecting each other. Referring to Figs. 21(A) and (B), a scribing device 50v may be used instead of the scribing device 50 (Figs. 17(A) and (B)). The blade tip 51v has a conical shape including a vertex and a conical surface SC. The protrusion PPv of the blade edge 51v is constituted by a vertex. The side portion PSv of the blade edge is formed from an imaginary line extending from the apex on the conical surface SC (dashed line in FIG. 21(B)). Thereby, the side portion PSv has a convex shape extending in a line shape. <Embodiment 2> Referring to Fig. 22, first, a glass substrate 11 is prepared. Further, a scribing tool having a blade tip is prepared. The details of the marking device are described below. Then, by moving the blade edge on the first surface SF1 of the glass substrate 11 in the direction DB, the auxiliary line AL intersecting the following high load section HR (FIG. 23) is formed on the first surface SF1. Referring to Fig. 23, the groove line TL is formed on the first surface SF1 of the glass substrate 11 from the starting point Q1 via the intermediate point Q2 to the end point Q3 by the movement of the blade edge in the direction DB. The groove line TL from the starting point Q1 to the halfway point Q2 is formed as the high load section HR. The groove line TL from the half point Q2 to the end point Q3 is formed as the low load section LR. Next, the glass substrate 11 is separated along the auxiliary line AL. This separation can be carried out by a usual cleavage step. With this separation, the crack of the glass substrate 11 in the thickness direction extends along the groove line TL only in the high load section HR in the groove line TL. Referring to Fig. 24, a crack line CL is formed along a portion of the groove line TL by the extension of the above-mentioned crack. Specifically, the crack line CL is formed in a portion between the newly generated side and the halfway point Q2 in the high load section HR by separation. The direction in which the crack line CL is formed is the same as the direction DB (Fig. 23) in which the groove line TL is formed. Further, it is difficult to form the crack line CL in the portion between the newly generated side and the starting point Q1 by separation. This direction dependence is caused by the state of the blade edge when the high load section HR is formed, which will be described in detail below. Next, in the same fracture step (Figs. 12 to 16) as in the first embodiment, a step of breaking the crack from the midway point Q2 toward the end point Q3 along the groove line TL with the crack line CL as a starting point is performed. Thereby, the glass substrate 11 is broken. Referring to FIGS. 25 and 26, as a first modification, the groove line TL may be formed first, and then the auxiliary line AL may be formed. Referring to Fig. 27, as a second modification, the formation of the auxiliary line AL may be triggered to form the crack line CL. Referring to Fig. 28, the auxiliary line AL may be formed on the second surface SF2 of the glass substrate 11 so as to intersect the high load section HR in the planar layout. Further, in the present embodiment, the high load section HR is formed from the starting point Q1, but the high load section HR may be formed in a portion intersecting the auxiliary line AL. For example, the low load section LR may be formed from the start point Q1 to the position where the auxiliary line AL intersects, and thereafter, the high load section HR is formed so as to intersect the auxiliary line AL. Referring to Fig. 29, a scribing tool 50R suitable for the formation of the groove line TL in the present embodiment will be described next. The scribing tool 50R has a scribing wheel 51R, a holder 52R, and a pin 53. The scribing wheel 51R has a substantially disk-like shape, and its diameter is typically about several mm. The scribing wheel 51R is rotatably held by the holder 52R around the rotation axis RX via the pin 53. The scribing wheel 51R has a peripheral portion PF provided with a blade edge. The outer peripheral portion PF extends in an annular shape around the rotation axis RX. As shown in Fig. 30(A), the outer peripheral portion PF is steeply ridged at a visual level, thereby constituting a blade edge including a ridge line and an inclined surface. On the other hand, at the microscope level, as shown in Fig. 30(B), the scribing wheel 51R enters the first surface SF1, thereby being in the actual functioning portion (more than the two-point chain line of Fig. 30(B) Further below, the ridgeline of the outer peripheral portion PF has a fine surface shape MS. The surface shape MS preferably has a curved shape when viewed from the front (Fig. 30(B)), and the curved shape has a finite radius of curvature. The scribing wheel 51R is formed using a hard material such as cemented carbide, sintered diamond, polycrystalline diamond, or single crystal diamond. From the viewpoint of making the surface roughness of the ridge line and the inclined surface small, the entire scribing wheel 51R may be made of single crystal diamond. The formation of the groove line TL using the scribing tool 50R is performed by rolling the scribing wheel 51R on the first surface SF1 of the glass substrate 11 (FIG. 29: arrow RT). The wheel 51R travels in the direction DB on the first surface SF1. While the load F is applied to the scribing wheel 51R, the outer peripheral portion PF of the scribing wheel 51R is pressed against the first surface SF1 of the glass substrate 11, and the rolling is performed. Thereby, plastic deformation is generated on the first surface SF1 of the glass substrate 11, whereby the groove line TL having the groove shape is formed. The load F has a vertical component Fp parallel to the thickness direction DT of the glass substrate 11 and an in-plane component Fi parallel to the first surface SF1. The direction DB is the same as the in-plane component Fi. Further, the groove line TL may be formed by a method other than the scribing tool 50R that moves in the direction DB, for example, by the scribing device 50 that moves in the direction DB (Fig. 17(A) and B)) or 50v (Fig. 21 (A) and (B)) are formed. The components other than the above are substantially the same as those of the above-described first embodiment, and the same or corresponding elements are denoted by the same reference numerals, and the description thereof will not be repeated. According to this embodiment, the same effects as those of the first embodiment are obtained. Further, in the present embodiment, the groove line TL can be formed by using the rotating blade edge instead of the fixed blade edge, so that the life of the blade edge can be extended. <Embodiment 3> Referring to Fig. 31 and Fig. 32, in the present embodiment, when the groove line TL is formed by the blade edge, the high load section HR is formed to the end point N4 on the edge of the glass substrate 11 instead of the end point N3 ( figure 2). Thereby, when the groove line TL is formed, the edge of the glass substrate 4 is cut at the end point N4. Referring to Fig. 33, the edge of the glass substrate 4 is cut, and as shown by the arrow in the figure, the crack extends from the edge of the glass substrate 4. Thereby, the crack line CL is formed. Referring to Figure 34, a desired number of trench lines TL are formed by repeating this step. Thereafter, the same fracture step as in the first embodiment was carried out. According to the present embodiment, it is possible to easily provide the glass substrate 4 with a start of the formation of the crack line CL without particularly requiring the formation of the auxiliary line AL (FIG. 5) or the like. <Embodiment 4> Referring to Fig. 35, in the present embodiment, when the first surface SF1 of the glass substrate 11 is placed on the stage 80 via the lower elastic sheet 71, the first surface SF1 and the lower surface of the glass substrate 11 are placed. A film 81 is disposed between the side elastic pieces 71. The film 81 is on the first surface SF1 side of the glass substrate 11, and has adhesiveness lower than that of the lower elastic sheet 71 (adhesiveness). The film 81 is preferably a resin film made of, for example, polyethylene terephthalate, polyethylene, polyvinyl chloride or polyolefin. The thickness of the film 81 is smaller than the thickness of the lower elastic sheet 71, and is, for example, about several tens of μm. When the break lever 85 is pressed against the second surface SF2 of the glass substrate 11 via the upper elastic sheet 72, the film 82 is placed between the second surface SF2 of the glass substrate 11 and the upper elastic sheet 72. Specifically, the film 82 is placed on the second surface SF2 of the glass substrate 11. The upper elastic sheet 72 is placed on the film 82. The film 82 is attached to the second surface SF2 side of the glass substrate 11, and has adhesiveness lower than that of the upper elastic sheet 72. The film 82 is preferably a resin film made of, for example, polyethylene terephthalate, polyethylene, polyvinyl chloride or polyolefin. The thickness of the film 82 is smaller than the thickness of the upper elastic sheet 72, and is, for example, about several tens of μm. In addition, the configuration other than the above is substantially the same as that of the above-described first to third embodiments, and the same or corresponding elements are denoted by the same reference numerals, and the description thereof will not be repeated. According to the present embodiment, the lower elastic sheet 71 is prevented from being attached to the first surface SF1 by arranging the film 81 between the first surface SF1 of the glass substrate 11 and the lower elastic sheet 71. In addition, the film 82 is disposed between the second surface SF2 of the glass substrate 11 and the upper elastic sheet 72 to prevent the upper elastic sheet 72 from being attached to the second surface SF2. The breaking method of the brittle substrate according to each of the above embodiments is particularly preferably applied to a glass substrate, but the brittle substrate may be made of a material other than glass. For example, ceramics, ruthenium, compound semiconductors, sapphire, or quartz may be used as materials other than glass.

11‧‧‧玻璃基板(脆性基板)
50‧‧‧劃線器具
50R‧‧‧劃線器具
50v‧‧‧劃線器具
51‧‧‧刀尖
51R‧‧‧劃線輪
51v‧‧‧刀尖
52‧‧‧柄
52R‧‧‧固持器
53‧‧‧銷
71‧‧‧下側彈性片
72‧‧‧上側彈性片
80‧‧‧平台(支持部)
81‧‧‧膜
82‧‧‧膜
85‧‧‧斷開桿(應力施加構件)
AL‧‧‧輔助線
AX‧‧‧軸方向
CL‧‧‧裂痕線
DA‧‧‧方向
DB‧‧‧方向
DC‧‧‧方向
DR‧‧‧方向
DT‧‧‧厚度方向
F‧‧‧負載
Fi‧‧‧面內成分
Fp‧‧‧垂直成分
HR‧‧‧高負載區間(第2部分)
LR‧‧‧低負載區間(第1部分)
MS‧‧‧表面形狀
N1‧‧‧起點
N2‧‧‧中途點
N3‧‧‧終點
N4‧‧‧終點
PF‧‧‧外周部
PP‧‧‧突起部
PPv‧‧‧突起部
PR‧‧‧箭頭
PS‧‧‧側部
PSv‧‧‧側部
Q1‧‧‧起點
Q2‧‧‧中途點
Q3‧‧‧終點
RT‧‧‧箭頭
RX‧‧‧旋轉軸
S10‧‧‧步驟
S11‧‧‧步驟
S12‧‧‧步驟
S20‧‧‧步驟
S30‧‧‧步驟
SC‧‧‧圓錐面
SD1‧‧‧頂面
SD2‧‧‧側面
SD3‧‧‧側面
SF1‧‧‧第1面
SF2‧‧‧第2面
TL‧‧‧溝槽線
11‧‧‧Glass substrate (brittle substrate)
50‧‧‧Marking equipment
50R‧‧‧ marking equipment
50v‧‧‧ marking equipment
51‧‧‧Tool tip
51R‧‧‧marking wheel
51v‧‧‧ pointed
52‧‧‧ handle
52R‧‧‧ Holder
53‧‧ ‧ sales
71‧‧‧Bottom elastic sheet
72‧‧‧Upper elastic piece
80‧‧‧ Platform (Support Department)
81‧‧‧ film
82‧‧‧ film
85‧‧‧Disconnecting rod (stress applying member)
AL‧‧‧Auxiliary line
AX‧‧‧ axis direction
CL‧‧‧crack line
DA‧‧‧ directions
DB‧‧‧ direction
DC‧‧ direction
DR‧‧‧ direction
DT‧‧‧ thickness direction
F‧‧‧load
Fi‧‧‧Inside ingredients
Fp‧‧‧ vertical component
HR‧‧‧High load range (Part 2)
LR‧‧‧Low load range (Part 1)
MS‧‧‧ surface shape
Starting point for N1‧‧
N2‧‧‧ halfway point
N3‧‧‧ end point
N4‧‧‧ end point
PF‧‧‧Outer Week
PP‧‧‧Protruding
PPv‧‧‧Protruding
PR‧‧‧ arrow
PS‧‧‧ side
PSv‧‧‧ side
Starting point of Q1‧‧
Q2‧‧‧ halfway point
Q3‧‧‧ End
RT‧‧‧ arrow
RX‧‧‧Rotary axis
S10‧‧‧ steps
S11‧‧ steps
Step S12‧‧‧
S20‧‧‧ steps
S30‧‧‧ steps
SC‧‧‧Conical surface
SD1‧‧‧ top surface
SD2‧‧‧ side
SD3‧‧‧ side
SF1‧‧‧ first side
SF2‧‧‧2nd
TL‧‧‧ trench line

圖1係概略性地表示本發明之實施形態1中之脆性基板之分斷方法的流程圖。 圖2係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的俯視圖。 圖3係沿著圖2之線III-III之概略剖視圖。 圖4係沿著圖2之線IVA-IVA之概略剖視圖(A)、及沿著圖2之線IVB-IVB之概略剖視圖(B)。 圖5係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的俯視圖。 圖6係沿著圖5之線VI-VI之概略剖視圖。 圖7係沿著圖5之線VII-VII之概略剖視圖。 圖8係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的俯視圖。 圖9係沿著圖8之線IX-IX之概略剖視圖。 圖10係沿著圖8之線X-X之概略剖視圖。 圖11係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的俯視圖。 圖12係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的剖視圖。 圖13係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的剖視圖。 圖14係沿著圖13之線XIV-XIV之概略性之局部剖視圖。 圖15係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的剖視圖。 圖16係概略性地表示本發明之實施形態1中之脆性基板之分斷方法之一步驟的剖視圖。 圖17係概略性地表示本發明之實施形態1中之脆性基板之分斷方法中所使用之劃線器具之構成的側視圖(A)、及與圖17(A)之箭頭XVII對應之視野之刀尖的仰視圖(B)。 圖18係概略性地表示本發明之實施形態1之第1變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖19係概略性地表示本發明之實施形態1之第2變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖20係概略性地表示本發明之實施形態1之第3變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖21係概略性地表示本發明之實施形態1之第4變化例中之脆性基板之分斷方法中所使用之劃線器具之構成的側視圖(A)、及與圖21(A)之箭頭XXI對應之視野之刀尖的仰視圖(B)。 圖22係概略性地表示本發明之實施形態2中之脆性基板之分斷方法之一步驟的俯視圖。 圖23係概略性地表示本發明之實施形態2中之脆性基板之分斷方法之一步驟的俯視圖。 圖24係概略性地表示本發明之實施形態2中之脆性基板之分斷方法之一步驟的俯視圖。 圖25係概略性地表示本發明之實施形態2之第1變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖26係概略性地表示本發明之實施形態2之第1變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖27係概略性地表示本發明之實施形態2之第2變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖28係概略性地表示本發明之實施形態2之第3變化例中之脆性基板之分斷方法之一步驟的俯視圖。 圖29係概略性地表示本發明之實施形態2中之脆性基板之分斷方法中所使用之劃線器具之構成的側視圖。 圖30係概略性地表示圖29中之劃線輪及銷之構成之前視圖(A)、及圖30(A)之局部放大圖(B)。 圖31係概略性地表示本發明之實施形態3中之脆性基板之分斷方法之一步驟的俯視圖。 圖32係沿著圖31之線XXXII-XXXII之概略性之剖視圖。 圖33係概略性地表示本發明之實施形態3中之脆性基板之分斷方法之一步驟的剖視圖。 圖34係概略性地表示本發明之實施形態3中之脆性基板之分斷方法之一步驟的俯視圖。 圖35係概略性地表示本發明之實施形態4中之脆性基板之分斷方法之一步驟的局部剖視圖。Fig. 1 is a flow chart schematically showing a method of dividing a brittle substrate in the first embodiment of the present invention. Fig. 2 is a plan view schematically showing one step of the breaking method of the brittle substrate in the first embodiment of the present invention. Figure 3 is a schematic cross-sectional view taken along line III-III of Figure 2 . 4 is a schematic cross-sectional view (A) taken along line IVA-IVA of FIG. 2, and a schematic cross-sectional view (B) taken along line IVB-IVB of FIG. 2. Fig. 5 is a plan view schematically showing a step of a method of dividing a brittle substrate in the first embodiment of the present invention. Fig. 6 is a schematic cross-sectional view taken along line VI-VI of Fig. 5. Fig. 7 is a schematic cross-sectional view taken along line VII-VII of Fig. 5. Fig. 8 is a plan view schematically showing one step of the breaking method of the brittle substrate in the first embodiment of the present invention. Figure 9 is a schematic cross-sectional view taken along line IX-IX of Figure 8. Figure 10 is a schematic cross-sectional view taken along line X-X of Figure 8. Fig. 11 is a plan view schematically showing one step of the breaking method of the brittle substrate in the first embodiment of the present invention. Fig. 12 is a cross-sectional view schematically showing a step of a method of dividing a brittle substrate in the first embodiment of the present invention. Fig. 13 is a cross-sectional view schematically showing one step of the breaking method of the brittle substrate in the first embodiment of the present invention. Figure 14 is a schematic partial cross-sectional view taken along line XIV-XIV of Figure 13 . Fig. 15 is a cross-sectional view schematically showing one step of the breaking method of the brittle substrate in the first embodiment of the present invention. Fig. 16 is a cross-sectional view schematically showing a step of a method of dividing a brittle substrate in the first embodiment of the present invention. FIG. 17 is a side view (A) showing a configuration of a scribing device used in the breaking method of the brittle substrate according to the first embodiment of the present invention, and a view corresponding to an arrow XVII of FIG. 17(A). The bottom view of the knife tip (B). FIG. 18 is a plan view schematically showing a step of a method of dividing a brittle substrate in a first modification of the first embodiment of the present invention. Fig. 19 is a plan view schematically showing one step of a method of dividing a brittle substrate in a second modification of the first embodiment of the present invention. FIG. 20 is a plan view schematically showing one of the steps of the breaking method of the brittle substrate in the third modification of the first embodiment of the present invention. FIG. 21 is a side view (A) and a view of FIG. 21(A) showing a configuration of a scribing device used in a method for dividing a brittle substrate in a fourth modification of the first embodiment of the present invention. The bottom view (B) of the tip of the field of view corresponding to the arrow XXI. Fig. 22 is a plan view schematically showing one step of the breaking method of the brittle substrate in the second embodiment of the present invention. Fig. 23 is a plan view schematically showing one of the steps of the breaking method of the brittle substrate in the second embodiment of the present invention. Fig. 24 is a plan view schematically showing one of the steps of the breaking method of the brittle substrate in the second embodiment of the present invention. Fig. 25 is a plan view schematically showing one step of a method of dividing a brittle substrate in a first modification of the second embodiment of the present invention. Fig. 26 is a plan view schematically showing a step of a method of dividing a brittle substrate in a first modification of the second embodiment of the present invention. Fig. 27 is a plan view schematically showing one step of a method of dividing a brittle substrate in a second modification of the second embodiment of the present invention. FIG. 28 is a plan view schematically showing one step of the breaking method of the brittle substrate in the third modification of the second embodiment of the present invention. FIG. 29 is a side view schematically showing the configuration of a scribing device used in the method for dividing a brittle substrate in the second embodiment of the present invention. Fig. 30 is a front view (A) showing a configuration of the scribing wheel and the pin in Fig. 29, and a partially enlarged view (B) of Fig. 30 (A). Fig. 31 is a plan view schematically showing one step of the breaking method of the brittle substrate in the third embodiment of the present invention. Figure 32 is a schematic cross-sectional view taken along line XXXII-XXXII of Figure 31. Fig. 33 is a cross-sectional view schematically showing one of the steps of the breaking method of the brittle substrate in the third embodiment of the present invention. Fig. 34 is a plan view schematically showing one of the steps of the breaking method of the brittle substrate in the third embodiment of the present invention. Fig. 35 is a partial cross-sectional view schematically showing a step of a method of dividing a brittle substrate in the fourth embodiment of the present invention.

11‧‧‧玻璃基板(脆性基板) 11‧‧‧Glass substrate (brittle substrate)

71‧‧‧下側彈性片 71‧‧‧Bottom elastic sheet

72‧‧‧上側彈性片 72‧‧‧Upper elastic piece

80‧‧‧平台(支持部) 80‧‧‧ Platform (Support Department)

85‧‧‧斷開桿(應力施加構件) 85‧‧‧Disconnecting rod (stress applying member)

CL‧‧‧裂痕線 CL‧‧‧crack line

DR‧‧‧方向 DR‧‧‧ direction

HR‧‧‧高負載區間(第2部分) HR‧‧‧High load range (Part 2)

LR‧‧‧低負載區間(第1部分) LR‧‧‧Low load range (Part 1)

SF1‧‧‧第1面 SF1‧‧‧ first side

SF2‧‧‧第2面 SF2‧‧‧2nd

TL‧‧‧溝槽線 TL‧‧‧ trench line

Claims (5)

一種脆性基板之分斷方法,其具備: a)準備脆性基板之步驟,該脆性基板具有設置有包含第1與第2部分之溝槽線之第1面、及與上述第1面相反之第2面,且具有與上述第1面垂直之厚度方向;僅於上述第1部分及上述第2部分中之上述第1部分之下方,上述脆性基板處於在與上述溝槽線交叉之方向上連續連接之狀態即無裂痕狀態,裂痕僅沿著上述第1及第2部分中之上述第2部分延伸; b)經由第1彈性構件將上述脆性基板之上述第1面載置於支持部上之步驟,上述第1彈性構件較上述脆性基板及上述支持部之各者富有彈性; c)於上述步驟b)之後經由第2彈性構件將應力施加構件壓抵於上述脆性基板之上述第2面的步驟,上述第2彈性構件較上述脆性基板及上述應力施加構件之各者富有彈性。A method for breaking a brittle substrate, comprising: a) preparing a brittle substrate having a first surface on which a groove line including first and second portions is provided, and a first surface opposite to the first surface The two surfaces have a thickness direction perpendicular to the first surface; and the brittle substrate is continuous in a direction crossing the groove line only under the first portion of the first portion and the second portion The state of the connection is the state of no crack, and the crack extends only along the second portion of the first and second portions; b) the first surface of the brittle substrate is placed on the support portion via the first elastic member Step, the first elastic member is more elastic than each of the brittle substrate and the support portion; c) after the step b), the stress applying member is pressed against the second surface of the brittle substrate via the second elastic member In the step, the second elastic member is more elastic than each of the brittle substrate and the stress applying member. 如請求項1之脆性基板之分斷方法,其中 上述步驟a)包括: a1)藉由一面將刀尖壓抵於上述脆性基板之第1面上、一面使上述刀尖於上述第1面上移動而於上述脆性基板之上述第1面上產生塑性變形,藉此形成上述溝槽線的步驟,於形成上述溝槽線之步驟中,為形成上述溝槽線之上述第2部分而對上述刀尖施加之負載高於為形成上述溝槽線之上述第1部分而對上述刀尖施加之負載,形成上述溝槽線之步驟係以於上述第1及第2部分之兩者之下方獲得無裂痕狀態之方式進行; a2)使裂痕僅沿著上述溝槽線之上述第1及第2部分中之上述第2部分產生的步驟。The breaking method of the brittle substrate according to claim 1, wherein the step a) comprises: a1) pressing the blade edge against the first surface of the brittle substrate while the blade edge is on the first surface a step of forming the groove line by plastically deforming the first surface of the brittle substrate to form the groove line, and forming the second line of the groove line in the step of forming the groove line The load applied by the blade tip is higher than a load applied to the blade tip for forming the first portion of the groove line, and the step of forming the groove line is obtained under both the first and second portions The crack-free state is performed; a2) the step of causing the crack to be generated only along the second portion of the first and second portions of the groove line. 如請求項1之脆性基板之分斷方法,其中於上述步驟b)中,於上述脆性基板之上述第1面與上述第1彈性構件之間配置具有較上述第1彈性構件之黏著性低之黏著性之膜。The breaking method of the brittle substrate according to claim 1, wherein in the step b), the adhesion between the first surface of the brittle substrate and the first elastic member is lower than that of the first elastic member. Adhesive film. 如請求項2之脆性基板之分斷方法,其中於上述步驟b)中,於上述脆性基板之上述第1面與上述第1彈性構件之間配置具有較上述第1彈性構件之黏著性低之黏著性之膜。The breaking method of the brittle substrate according to claim 2, wherein in the step b), the adhesion between the first surface of the brittle substrate and the first elastic member is lower than that of the first elastic member. Adhesive film. 如請求項1至4中任一項之脆性基板之分斷方法,其中於上述步驟c)中,於上述脆性基板之上述第2面與上述第2彈性構件之間配置具有較上述第2彈性構件之黏著性低之黏著性之膜。The breaking method of the brittle substrate according to any one of claims 1 to 4, wherein in the step c), the second elastic layer is disposed between the second surface of the brittle substrate and the second elastic member A film with a low adhesion to the component.
TW105126429A 2015-09-25 2016-08-18 Fragmentation method of brittle substrate TWI610892B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015188312A JP6544179B2 (en) 2015-09-25 2015-09-25 Method of dividing brittle substrate

Publications (2)

Publication Number Publication Date
TW201711969A true TW201711969A (en) 2017-04-01
TWI610892B TWI610892B (en) 2018-01-11

Family

ID=58429141

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105126429A TWI610892B (en) 2015-09-25 2016-08-18 Fragmentation method of brittle substrate

Country Status (4)

Country Link
JP (1) JP6544179B2 (en)
KR (1) KR101851069B1 (en)
CN (1) CN106985293B (en)
TW (1) TWI610892B (en)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001293586A (en) * 2000-04-12 2001-10-23 Takatori Corp Method of cutting glass
JP3602846B2 (en) 2001-06-14 2004-12-15 三星ダイヤモンド工業株式会社 Organic EL display manufacturing apparatus and organic EL display manufacturing method
TWI226877B (en) 2001-07-12 2005-01-21 Mitsuboshi Diamond Ind Co Ltd Method of manufacturing adhered brittle material substrates and method of separating adhered brittle material substrates
US7851241B2 (en) * 2002-04-01 2010-12-14 Mitsuboshi Diamond Industrial Co., Ltd. Method for severing brittle material substrate and severing apparatus using the method
JP4169565B2 (en) * 2002-10-11 2008-10-22 三星ダイヤモンド工業株式会社 Brittle material substrate break method, apparatus and processing apparatus therefor
CN101530951B (en) * 2008-03-13 2012-03-14 富士迈半导体精密工业(上海)有限公司 Brittle substrate and laser cutting method therefor
TWI494284B (en) * 2010-03-19 2015-08-01 Corning Inc Mechanical scoring and separation of strengthened glass
JP5331078B2 (en) * 2010-09-28 2013-10-30 三星ダイヤモンド工業株式会社 Method for scribing a brittle material substrate
TWI474981B (en) * 2011-10-06 2015-03-01 Taiwan Mitsuboshi Diamond Ind Co Ltd Method for cutting a strengthened glass substrate accompanying control of compressive stress
US20150076203A1 (en) * 2011-11-16 2015-03-19 Nippon Electric Glass Co., Ltd. Glass sheet cutting apparatus, glass sheet cutting method, glass sheet manufacturing method, and glass sheet cutting system
JP2014198658A (en) * 2013-03-30 2014-10-23 株式会社レミ Method of breaking high-strength glass substrate
JP2015030661A (en) * 2013-08-07 2015-02-16 株式会社レミ Method for breaking glass substrate

Also Published As

Publication number Publication date
KR20170037512A (en) 2017-04-04
TWI610892B (en) 2018-01-11
CN106985293A (en) 2017-07-28
CN106985293B (en) 2018-11-13
KR101851069B1 (en) 2018-04-20
JP2017061398A (en) 2017-03-30
JP6544179B2 (en) 2019-07-17

Similar Documents

Publication Publication Date Title
TWI660828B (en) Manufacturing method of liquid crystal display panel
TW201545276A (en) Segmentation method for crisp substrate
KR101912685B1 (en) Method for severing brittle substrate
JP6589380B2 (en) Method for forming vertical crack in brittle material substrate and method for dividing brittle material substrate
JP6555354B2 (en) Method for dividing brittle substrate
TWI678343B (en) Breaking method of brittle substrate
JP6350669B2 (en) Method for dividing brittle substrate
TWI605024B (en) Breaking method of brittle substrate
JP6544149B2 (en) Method of forming inclined cracks in brittle material substrate and method of dividing brittle material substrate
TW201711969A (en) Method for breaking brittle substrate capable of accurately breaking a brittle substrate along a trench line
TWI667515B (en) Manufacturing method of liquid crystal display panel
TWI653201B (en) Fragmentation method of brittle substrate
CN107108322B (en) Method for dividing brittle substrate
WO2017145937A1 (en) Method of dividing brittle substrate
JP2017065007A (en) Method of segmenting brittle substrate
TW201620843A (en) Dividing method of brittle substrate

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees