TW201706127A - Laminate with transparent conductive film and laminate manufacturing method having hard coat property and sealability resistant to harsh active energy ray radiation - Google Patents

Laminate with transparent conductive film and laminate manufacturing method having hard coat property and sealability resistant to harsh active energy ray radiation Download PDF

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TW201706127A
TW201706127A TW105125244A TW105125244A TW201706127A TW 201706127 A TW201706127 A TW 201706127A TW 105125244 A TW105125244 A TW 105125244A TW 105125244 A TW105125244 A TW 105125244A TW 201706127 A TW201706127 A TW 201706127A
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compound
laminate
meth
transparent conductive
metal oxide
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TW105125244A
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Chinese (zh)
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Mitsuhito Ito
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Toyo Ink Sc Holdings Co Ltd
Toyo Ink Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/24Acids; Salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C09D163/10Epoxy resins modified by unsaturated compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24Electrically-conducting paints
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B2038/0052Other operations not otherwise provided for
    • B32B2038/0076Curing, vulcanising, cross-linking
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/102Oxide or hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2463/00Characterised by the use of epoxy resins; Derivatives of epoxy resins
    • C08J2463/10Epoxy resins modified by unsaturated compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2227Oxides; Hydroxides of metals of aluminium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2237Oxides; Hydroxides of metals of titanium
    • C08K2003/2241Titanium dioxide
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2244Oxides; Hydroxides of metals of zirconium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2296Oxides; Hydroxides of metals of zinc

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Laminated Bodies (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)

Abstract

This invention provides a transparent conductive film with hard coat property and sealability resistant to harsh active energy ray radiation as manufacturing the transparent conductive film. The subject is solved by the following laminate. The laminate has a resin layer made by curing an active energy ray curable composition containing compound (A) on a substrate as a polyester film, wherein compound (A) contains a fluorene structure and/or a biphenyl structure and two or more (meth)acryloyl groups, and the laminate further comprises the transparent conductive film.

Description

具有透明導電膜的積層體以及積層體的製造方法Laminated body having transparent conductive film and method of manufacturing laminated body

本發明涉及一種具有基材、將活性能量線硬化性組成物硬化而成的樹脂層、以及透明導電膜的積層體以及形成其的製造方法。The present invention relates to a laminate having a substrate, a resin layer obtained by curing an active energy ray-curable composition, and a transparent conductive film, and a method for producing the same.

以前,在觸控面板用途等中使用在聚酯等基材上設置有透明導電膜的透明導電性的積層體。透明導電膜通常使用氧化銦錫(Indium Tin Oxide,ITO)等金屬氧化物的薄膜,在基材上利用濺射法或真空蒸鍍來積層。 作為觸控面板的動作方式,電阻膜式為主流,但近年來,靜電電容式急速擴大。電阻膜式觸控面板中使用的具有透明導電性的積層體通常包括未經圖案化的透明導電膜。另一方面,靜電電容式觸控面板中通常使用積層有經圖案化的透明導電膜的透明導電性的積層體。Conventionally, a transparent conductive laminated body provided with a transparent conductive film on a substrate such as polyester has been used for touch panel applications and the like. The transparent conductive film is usually a film of a metal oxide such as indium tin oxide (ITO), and is deposited on the substrate by sputtering or vacuum deposition. As a mode of operation of the touch panel, the resistive film type is the mainstream, but in recent years, the electrostatic capacitance type has rapidly expanded. The laminate having transparent conductivity used in the resistive film type touch panel generally includes an unpatterned transparent conductive film. On the other hand, in a capacitive touch panel, a transparent conductive laminated body in which a patterned transparent conductive film is laminated is generally used.

靜電電容式觸控面板中使用的具有透明導電性的積層體通常利用照相平版蝕刻(photolithoetching)等,對透明導電膜進行圖案化,在俯視圖上存在透明導電膜的圖案部與非圖案部。 如上所述的使用透明導電膜經圖案化的具有透明導電性的積層體的靜電電容式觸控面板,其透明導電膜的圖案部可見的所謂“透視”的現象成為問題,使作為顯示裝置的品質下降。 例如專利文獻1、專利文獻2等中提出了抑制透明導電膜圖案的透視。 [現有技術文獻] [專利文獻]The laminate having transparent conductivity used in the capacitive touch panel is usually patterned by photolithoetching or the like, and the pattern portion and the non-pattern portion of the transparent conductive film are present in a plan view. As described above, the capacitive touch panel having a transparent conductive film patterned with a transparent conductive film has a problem that a so-called "perspective" phenomenon in which a pattern portion of the transparent conductive film is visible becomes a problem, and is used as a display device. The quality is declining. For example, Patent Document 1, Patent Document 2, and the like have proposed fluoroscopy for suppressing a pattern of a transparent conductive film. [Prior Art Document] [Patent Literature]

[專利文獻1]日本專利特開2011-84075號 [專利文獻2]日本專利第5110226號[Patent Document 1] Japanese Patent Laid-Open No. 2011-84075 [Patent Document 2] Japanese Patent No. 5110226

[發明所欲解決的課題] 近年來,根據積層體的用途而在基材的單面或兩面上多層化,在這些各層形成時或透明導電膜的圖案化時照射大量的活性能量線。專利文獻1或專利文獻2的技術中,雖顯現出抑制透明導電膜圖案的透視的效果,但在樹脂層接受到大量的活性能量線的情況下,存在與基材的密合性下降的課題。另外,為了確保基材與樹脂層的密合性,若欲以活性能量線的累計光量不成為大量的方式設計層構成,則產生積層體的層構成受到限定的問題。 因此,本發明的目的在於當製造具有透明導電性的積層體時,提供具有透明性以及對於大量的活性能量線照射也可耐受的密合性、與透明導電性的積層體。 [解決課題的手段][Problems to be Solved by the Invention] In recent years, a single layer or both surfaces of a substrate are multilayered depending on the use of the laminate, and a large amount of active energy rays are irradiated when these layers are formed or when the transparent conductive film is patterned. In the technique of Patent Document 1 or Patent Document 2, the effect of suppressing the fluoroscopy of the transparent conductive film pattern is exhibited. However, when the resin layer receives a large amount of active energy rays, the adhesion to the substrate is lowered. . Further, in order to secure the adhesion between the substrate and the resin layer, if the layer configuration is to be designed such that the integrated light amount of the active energy ray does not become large, the layer structure of the laminate is limited. Therefore, an object of the present invention is to provide a laminate having transparency and transparency and transparency to a large amount of active energy ray irradiation when producing a laminate having transparent conductivity. [Means for solving the problem]

本發明涉及一種在作為聚酯膜的基材上具有樹脂層,且更具有透明導電膜的積層體,所述樹脂層是將包含具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A)的活性能量線硬化性組成物進行硬化而成。The present invention relates to a laminate having a resin layer on a substrate as a polyester film and further having a transparent conductive film, the resin layer comprising a fluorene structure and/or a biphenyl structure, and two or more ( The active energy ray-curable composition of the methyl (meth) fluorenyl group-containing compound (A) is cured.

另外,本發明涉及所述積層體,其中所述樹脂層是將更包含具有3個以上的(甲基)丙烯醯基的化合物(X)(其中,為化合物(A)的情況除外)的組成物硬化而成的層。Further, the present invention relates to the laminate, wherein the resin layer is a composition which further contains a compound (X) having three or more (meth) acryloyl groups (excluding the case of the compound (A)) a layer of hardened material.

另外,本發明涉及所述積層體,其中在具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A),與具有3個以上的(甲基)丙烯醯基的化合物(X)(其中,為化合物(A)的情況除外)的固體成分的合計100重量%中,化合物(A)的含量為10重量%~90重量%。Further, the present invention relates to the laminate, wherein the compound (A) having a fluorene structure and/or a biphenyl structure and two or more (meth) acryl fluorenyl groups has three or more (meth) groups The content of the compound (A) is from 10% by weight to 90% by weight based on 100% by weight of the total solid content of the compound (X) of the acrylonitrile group (excluding the case of the compound (A)).

另外,本發明涉及所述積層體,其中所述化合物(A)為下述通式(1)所表示的化合物(A1)。 通式(1):Furthermore, the present invention relates to the layered product, wherein the compound (A) is a compound (A1) represented by the following formula (1). General formula (1):

[化1](通式(1)中,R1 及R3 中至少一個為下述所示的四價或一價有機殘基, R2 表示具有(甲基)丙烯醯基的一價有機殘基) [化2][化3] [Chemical 1] (In the formula (1), at least one of R 1 and R 3 is a tetravalent or monovalent organic residue shown below, and R 2 represents a monovalent organic residue having a (meth) acrylonitrile group) [ 2] [Chemical 3]

另外,本發明涉及所述積層體,其中所述化合物(A)為下述通式(2)所表示的化合物(A2)。 通式(2):   R5 -O-R4 -O-R5 (通式(2)中,R4 為下述所示的二價有機殘基, R5 表示具有(甲基)丙烯醯基的一價有機殘基)Furthermore, the present invention relates to the laminate, wherein the compound (A) is a compound (A2) represented by the following formula (2). General formula (2): R 5 -OR 4 -OR 5 (In the formula (2), R 4 is a divalent organic residue shown below, and R 5 represents a monovalent group having a (meth)acryl fluorenyl group. Organic residue)

[化4] [Chemical 4]

另外,本發明涉及所述積層體,其中在照射累計光量為2000 mJ/cm2 以上的活性能量線的情況下,利用依據JIS K5600-5-6的附著性交叉切割法來測定的所述基材與所述樹脂層的密合性為每單位面積的剝離面積小於5%。Further, the present invention relates to the laminate, wherein the base is measured by an adhesion cross-cut method according to JIS K5600-5-6 in the case of irradiating an active energy ray having an integrated light amount of 2000 mJ/cm 2 or more. The adhesion of the material to the resin layer is less than 5% of the peeling area per unit area.

另外,本發明涉及所述積層體,其中所述組成物更包含金屬氧化物。 另外,本發明涉及所述積層體,其中所述金屬氧化物包含鈦及/或鋯原子。Further, the present invention relates to the laminate, wherein the composition further comprises a metal oxide. Furthermore, the invention relates to the laminate, wherein the metal oxide comprises titanium and/or zirconium atoms.

本發明涉及一種積層體的製造方法,其包括:在作為聚酯膜的基材上,塗敷包含具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A)的活性能量線硬化性組成物,照射活性能量線使其硬化而形成樹脂層的步驟;以及 形成透明導電膜的步驟。 [發明的效果]The present invention relates to a method for producing a laminate comprising: coating a compound having a fluorene structure and/or a biphenyl structure and two or more (meth) acryl fluorenyl groups on a substrate as a polyester film The active energy ray-curable composition of (A), a step of irradiating an active energy ray to cure the resin layer, and a step of forming a transparent conductive film. [Effects of the Invention]

通過本發明,可提供具有透明性以及對於大量的活性能量線照射也可耐受的密合性與透明導電性的積層體。According to the present invention, it is possible to provide a laminate having transparency and transparent conductivity which is also resistant to irradiation with a large amount of active energy rays.

本發明的積層體在基材膜上的單面或兩面上依次設置作為活性能量線硬化膜的樹脂層、以及透明導電膜。In the laminate of the present invention, a resin layer as an active energy ray-curing film and a transparent conductive film are sequentially provided on one surface or both surfaces of a base film.

以下,對於構成本發明的具有作為聚酯膜的基材、將活性能量線硬化性組成物硬化而成的樹脂層、以及透明導電膜的積層體的各個構成要素進行詳細說明。In the following, each component constituting the laminate having the base material as the polyester film, the resin layer obtained by curing the active energy ray-curable composition, and the transparent conductive film of the present invention will be described in detail.

<聚酯膜> 本發明的聚酯膜的折射率為1.61至1.70,特別優選使用聚對苯二甲酸乙二酯膜。 聚酯膜的折射率優選為1.62至1.69的範圍,尤其優選為1.63至1.68的範圍,特別優選為1.64至1.67的範圍。<Polyester film> The polyester film of the present invention has a refractive index of 1.61 to 1.70, and a polyethylene terephthalate film is particularly preferably used. The refractive index of the polyester film is preferably in the range of from 1.62 to 1.69, particularly preferably in the range of from 1.63 to 1.68, particularly preferably in the range of from 1.64 to 1.67.

聚酯膜的厚度適當為20 μm至300 μm的範圍,優選為50 μm至250 μm的範圍,更優選為50 μm至200 μm的範圍。The thickness of the polyester film is suitably in the range of 20 μm to 300 μm, preferably in the range of 50 μm to 250 μm, and more preferably in the range of 50 μm to 200 μm.

本發明的聚酯膜可在其表面更具有包含有機物或無機物的層,其具體例可列舉用以提高與其他層的黏接性的易黏接層。The polyester film of the present invention may further have a layer containing an organic substance or an inorganic substance on its surface, and specific examples thereof include an easy-adhesion layer for improving adhesion to other layers.

設置有易黏接層的聚酯膜的市售品可列舉: 東麗(Toray)公司製造:露米勒(Lumirror)系列,東洋紡公司製造:考斯摩辛(Cosmoshine)系列等。特別優選為透明性高且在光學用途中使用的東麗(Toray)公司製造:露米勒(Lumirror)UH13、U48系列。A commercial product of a polyester film provided with an easy-adhesion layer can be exemplified by Toray Co., Ltd.: Lumirror series, manufactured by Toyobo Co., Ltd.: Cosmoshine series, and the like. It is particularly preferably manufactured by Toray Co., Ltd., which has high transparency and is used in optical applications: Lumirror UH13, U48 series.

<樹脂層> 本發明的樹脂層是將包含具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A)的活性能量線硬化性組成物硬化而成的層。<Resin layer> The resin layer of the present invention is obtained by curing an active energy ray-curable composition containing a compound (A) having a fluorene structure and/or a biphenyl structure and two or more (meth) acryl fluorenyl groups. Layer.

化合物(A)若在其結構中具有1個以上的芴結構及/或聯苯結構、與2個以上的(甲基)丙烯醯基即可,該化合物(A)與聚酯膜的密合性優異。When the compound (A) has one or more fluorene structures and/or a biphenyl structure and two or more (meth) acrylonitrile groups in the structure, the compound (A) is adhered to the polyester film. Excellent sex.

化合物(A)的優選具體例也可列舉下述通式(1)所表示的化合物(A1)。化合物(A1)由於硬塗性優異而可適合使用。Preferable specific examples of the compound (A) include the compound (A1) represented by the following formula (1). The compound (A1) can be suitably used because it has excellent hard coat properties.

通式(1): [化1]通式(1)中,R1 及R3 中至少一個為具有芴結構或聯苯結構的四價或一價有機殘基, R2 表示具有(甲基)丙烯醯基的一價有機殘基。General formula (1): [Chemical 1] In the formula (1), at least one of R 1 and R 3 is a tetravalent or monovalent organic residue having a fluorene structure or a biphenyl structure, and R 2 represents a monovalent organic residue having a (meth) acryl fluorenyl group. .

通式(1)中,R1 若為具有芴結構或聯苯結構者,則並無特別限定,適合的具體例可列舉下述所示的四價有機殘基。優選為具有聯苯結構的殘基。In the general formula (1), R 1 is not particularly limited as long as it has an anthracene structure or a biphenyl structure, and specific examples thereof include the tetravalent organic residues shown below. It is preferably a residue having a biphenyl structure.

[化2] [Chemical 2]

通式(1)中,在R3 具有芴結構或聯苯結構的情況下,R1 也可不具有芴結構或聯苯結構。所述者並無特別限定,適合的具體例可列舉下述所示的四價有機殘基。優選為具有芳香環的殘基。 [化3] In the general formula (1), in the case where R 3 has a fluorene structure or a biphenyl structure, R 1 may not have a fluorene structure or a biphenyl structure. The above is not particularly limited, and specific examples thereof include tetravalent organic residues shown below. It is preferably a residue having an aromatic ring. [Chemical 3]

通式(1)中,R3 若為具有芴結構或聯苯結構者,則並無特別限定,適合的具體例可列舉下述所示的一價有機殘基。 [化4] In the general formula (1), R 3 is not particularly limited as long as it has a fluorene structure or a biphenyl structure, and specific examples thereof include the monovalent organic residues shown below. [Chemical 4]

通式(1)中,在R1 具有芴結構或聯苯結構的情況下,R3 也可不具有芴結構或聯苯結構。所述者並無特別限定,可列舉氫原子、或者下述所示的一價有機殘基。 [化5] In the general formula (1), in the case where R 1 has a fluorene structure or a biphenyl structure, R 3 may not have a fluorene structure or a biphenyl structure. The above is not particularly limited, and examples thereof include a hydrogen atom or a monovalent organic residue shown below. [Chemical 5]

通式(1)中,R2 若為具有(甲基)丙烯醯基者,則並無特別限定,適合的具體例可列舉下述所示的一價有機殘基。 [化6] In the general formula (1), R 2 is not particularly limited as long as it has a (meth) acrylonitrile group, and specific examples thereof include the monovalent organic residues shown below. [Chemical 6]

通式(1)所表示的化合物(A1)若具有2個以上的芴結構及/或聯苯結構,則與基材的密合性優異,故而優選,進而,優選為R1 及R3 兩者具有芴結構或聯苯結構。When the compound (A1) represented by the formula (1) has two or more fluorene structures and/or a biphenyl structure, it is preferable because it has excellent adhesion to a substrate, and further preferably R 1 and R 3 . It has a fluorene structure or a biphenyl structure.

化合物(A)的(甲基)丙烯醯基必須為2個以上。在2個以下的情況下,所獲得的活性能量線硬化膜與作為聚酯膜的基材的密合性下降。進而,由於樹脂層的硬塗性優異,故而(甲基)丙烯醯基的個數優選為3個以上,尤其優選為6個以上。The (meth) acrylonitrile group of the compound (A) must be two or more. In the case of two or less, the adhesion between the obtained active energy ray-curable film and the substrate as the polyester film is lowered. Further, since the resin layer is excellent in hard coatability, the number of (meth)acryl fluorenyl groups is preferably 3 or more, and particularly preferably 6 or more.

通式(1)所表示的化合物(A1)中,R3 為氫原子的化合物(A1-1)例如可通過使具有R1 所表示的結構的四羧酸的二酐(b1),與選自丙烯酸2-羥基乙酯、季戊四醇三丙烯酸酯及二季戊四醇五丙烯酸酯中的至少一種化合物(b2)進行反應而獲得。 R3 為氫原子以外的化合物(A1-2)例如可通過使所述反應中獲得的化合物中所含的羧基,與選自由聯苯縮水甘油醚、甲基丙烯酸縮水甘油酯、以及丙烯酸4-羥基丁酯縮水甘油醚所組成的群組中的至少一種含環氧基的化合物(b3)進行反應而獲得。In the compound (A1) represented by the formula (1), the compound (A1-1) wherein R 3 is a hydrogen atom can be selected, for example, by a dianhydride (b1) having a tetracarboxylic acid having a structure represented by R 1 . It is obtained by reacting at least one compound (b2) of 2-hydroxyethyl acrylate, pentaerythritol triacrylate, and dipentaerythritol pentaacrylate. The compound (A1-2) having R 3 other than a hydrogen atom can be, for example, selected from the carboxyl group contained in the compound obtained in the reaction, and selected from the group consisting of biphenyl glycidyl ether, glycidyl methacrylate, and acrylic acid 4- At least one epoxy group-containing compound (b3) in the group consisting of hydroxybutyl ester glycidyl ether is obtained by a reaction.

四羧酸二酐(b1)若為具有芴結構或聯苯結構者,則並無特別限定,適合的具體例可列舉:具有聯苯骨架的3,3',4,4'-聯苯四羧酸二酐、具有芴骨架的9,9-雙(3,4-二羧基苯基)芴二酐等,優選為具有聯苯結構者。在含環氧基的化合物(b3)具有芴結構或聯苯結構的情況下,四羧酸二酐(b1)也可不具有芴結構或聯苯結構。所述者並無特別限定,適合的具體例可列舉1,2,4,5-苯四羧酸二酐、1,2,3,4-丁烷四羧酸二酐,優選為具有芳香環者。The tetracarboxylic dianhydride (b1) is not particularly limited as long as it has a fluorene structure or a biphenyl structure, and specific examples thereof include 3,3',4,4'-biphenyl having a biphenyl skeleton. The carboxylic acid dianhydride, 9,9-bis (3,4-dicarboxyphenyl) phthalic anhydride having an anthracene skeleton, and the like are preferably those having a biphenyl structure. In the case where the epoxy group-containing compound (b3) has a fluorene structure or a biphenyl structure, the tetracarboxylic dianhydride (b1) may not have a fluorene structure or a biphenyl structure. The above is not particularly limited, and specific examples thereof include 1,2,4,5-benzenetetracarboxylic dianhydride and 1,2,3,4-butanetetracarboxylic dianhydride, and preferably have an aromatic ring. By.

這些四羧酸二酐中,3,3',4,4'-聯苯四羧酸二酐由於可兼具硬化膜的硬塗性與金屬氧化物的良好分散性,故而特別優選。Among these tetracarboxylic dianhydrides, 3,3',4,4'-biphenyltetracarboxylic dianhydride is particularly preferable because it has both a hard coat property of a cured film and a good dispersibility of a metal oxide.

就光硬化性與硬塗性的觀點而言,所述化合物(b2)優選為季戊四醇三丙烯酸酯以及二季戊四醇五丙烯酸酯。 季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯的具體的市售品可列舉:畢斯寇特(Viscoat)#300(大阪有機化學工業(股)製造)、卡亞拉德(KAYARAD)PET30(日本化藥(股)製造)、佩蒂亞(PETIA)(大賽璐(Daicel)UCB(股)製造)、亞羅尼斯(Aronix)M305(東亞合成(股)製造)、NK酯(NK Ester)A-TMM-3LMN(新中村化學工業(股)製造)、萊特丙烯酸酯(Light Acrylate)PE-3A(共榮社化學(股)製造)、SR-444(沙多瑪(Sartomer)(股)製造)、萊特丙烯酸酯(Light Acrylate)DPE-6A(共榮社化學(股)製造)、卡亞拉德(KAYARAD)DPHA(日本化藥(股)製造)、亞羅尼斯(Aronix)M402(東亞合成(股)製造)等。From the viewpoints of photocurability and hard coatability, the compound (b2) is preferably pentaerythritol triacrylate and dipentaerythritol pentaacrylate. Specific commercial products of pentaerythritol triacrylate and dipentaerythritol pentaacrylate include Viscoat #300 (made by Osaka Organic Chemical Industry Co., Ltd.) and KAYARAD PET30 (Japan) Pharmaceutical (stock) manufacturing), Petia (PETIA) (Daicel UCB (share) manufacturing), Aronix (Aronix) M305 (made in East Asia Synthetic (stock)), NK ester (NK Ester) A- TMM-3LMN (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), Light Acrylate PE-3A (manufactured by Kyoeisha Chemical Co., Ltd.), SR-444 (manufactured by Sartomer Co., Ltd.) , Light Acrylate DPE-6A (manufactured by Kyoeisha Chemical Co., Ltd.), KAYARAD DPHA (manufactured by Nippon Chemical Co., Ltd.), Aronix M402 (East Asian Synthetic) (share) manufacturing) and so on.

這些市售品分別含有5重量%~15重量%左右的具有2個羥基的季戊四醇二丙烯酸酯、二季戊四醇四丙烯酸酯作為副成分。因此,在四羧酸二酐(b1)與季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯的反應中,除了通式(1)所表示的化合物(A1)以外,還同時生成由副成分而來的反應物、進而經高分子量化的樹脂。These commercially available products each contain about 5% by weight to 15% by weight of pentaerythritol diacrylate having two hydroxyl groups and dipentaerythritol tetraacrylate as an accessory component. Therefore, in the reaction of the tetracarboxylic dianhydride (b1) with pentaerythritol triacrylate or dipentaerythritol pentaacrylate, in addition to the compound (A1) represented by the formula (1), a subcomponent is simultaneously produced. The reactant and the polymer which is further polymerized.

所述四羧酸二酐(b1)與化合物(b2)的反應為四羧酸二酐所具有的2個羧酸酐基、與化合物(b2)所具有的羥基的反應,可利用現有公知的方法來進行。例如,可使四羧酸二酐(b1)與化合物(b2)在如環己酮之類的有機溶媒中,在如1,8-二氮雜雙環[5.4.0]-7-十一烯之類的催化劑的存在下,在50℃~120℃的溫度下進行反應。該情況下,可在反應系統中添加如甲基對苯二酚(2-METHYLHYDROQUINONE)之類的聚合抑制劑。The reaction between the tetracarboxylic dianhydride (b1) and the compound (b2) is a reaction between two carboxylic anhydride groups of the tetracarboxylic dianhydride and a hydroxyl group of the compound (b2), and a conventionally known method can be used. Come on. For example, tetracarboxylic dianhydride (b1) and compound (b2) can be used in an organic solvent such as cyclohexanone such as 1,8-diazabicyclo[5.4.0]-7-undecene. The reaction is carried out at a temperature of from 50 ° C to 120 ° C in the presence of a catalyst such as. In this case, a polymerization inhibitor such as methyl hydroquinone (2-METHYLHYDROQUINONE) may be added to the reaction system.

可不對所述反應中獲得的包含R3 為氫原子的化合物(A1-1)的反應物進行純化,進而使化合物(b3)進行反應。The reaction product of the compound (A1-1) containing R 3 which is a hydrogen atom obtained in the above reaction may be purified, and the compound (b3) may be further reacted.

化合物(A1-1)與化合物(b3)的反應為化合物(A1-1)所具有的羧基與化合物(b3)所具有的環氧基的反應,可利用現有公知的方法來進行。例如,該反應可在如二甲基苄基胺等之類的胺催化劑的存在下,在50℃~120℃的溫度下進行。The reaction of the compound (A1-1) with the compound (b3) is a reaction between a carboxyl group of the compound (A1-1) and an epoxy group of the compound (b3), and can be carried out by a conventionally known method. For example, the reaction can be carried out at a temperature of from 50 ° C to 120 ° C in the presence of an amine catalyst such as dimethylbenzylamine or the like.

這些反應可在無溶媒條件下進行,或也可在對反應為惰性的溶媒中進行。所述溶媒例如可列舉:正己烷、苯或甲苯等烴系溶媒;丙酮、甲基乙基酮或甲基異丁基酮等酮系溶媒;乙酸乙酯或乙酸丁酯等酯系溶媒;二乙醚、四氫呋喃或二噁烷等醚系溶媒;二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷或全氯乙烯(Perclene)等鹵素系溶媒;乙腈、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基咪唑烷酮等極性溶媒等。這些溶媒也可併用兩種以上。These reactions can be carried out in the absence of a solvent or in a solvent inert to the reaction. Examples of the solvent include a hydrocarbon-based solvent such as n-hexane, benzene or toluene; a ketone-based solvent such as acetone, methyl ethyl ketone or methyl isobutyl ketone; and an ester-based solvent such as ethyl acetate or butyl acetate; An ether solvent such as diethyl ether, tetrahydrofuran or dioxane; a halogen-based solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane or perclene; acetonitrile, N, N-di A polar solvent such as methylformamide, N,N-dimethylacetamide or N,N-dimethylimidazolidinone. These solvents may be used in combination of two or more kinds.

在添加溶劑的情況下,優選為使溶劑揮發後進行硬化處理。溶劑並無特別限制,可使用各種公知的有機溶劑。具體而言,例如可列舉:環己酮、甲基異丁基酮、甲基乙基酮、丙酮、乙醯基丙酮、甲苯、二甲苯、正丁醇、異丁醇、叔丁醇、正丙醇、異丙醇、乙醇、甲醇、3-甲氧基-1-丁醇、3-甲氧基-2-丁醇、乙二醇單甲醚、乙二醇單正丁醚、2-乙氧基乙醇、1-甲氧基-2-丙醇、二丙酮醇、乳酸乙酯、乳酸丁酯、丙二醇單甲醚、乙二醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、乙酸2-乙氧基乙酯、乙酸丁酯、乙酸異戊酯、己二酸二甲酯、丁二酸二甲酯、戊二酸二甲酯、四氫呋喃、甲基吡咯烷酮等。這些有機溶劑也可併用兩種以上。When a solvent is added, it is preferable to carry out a hardening process after volatilizing a solvent. The solvent is not particularly limited, and various known organic solvents can be used. Specific examples thereof include cyclohexanone, methyl isobutyl ketone, methyl ethyl ketone, acetone, etidyl acetone, toluene, xylene, n-butanol, isobutanol, tert-butanol, and Propanol, isopropanol, ethanol, methanol, 3-methoxy-1-butanol, 3-methoxy-2-butanol, ethylene glycol monomethyl ether, ethylene glycol mono-n-butyl ether, 2- Ethoxyethanol, 1-methoxy-2-propanol, diacetone alcohol, ethyl lactate, butyl lactate, propylene glycol monomethyl ether, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate And 2-ethoxyethyl acetate, butyl acetate, isoamyl acetate, dimethyl adipate, dimethyl succinate, dimethyl glutarate, tetrahydrofuran, methyl pyrrolidone and the like. These organic solvents may be used in combination of two or more kinds.

化合物(A)的優選具體例也可列舉下述通式(2)所表示的化合物(A2)。 通式(2):   R5 -O-R4 -O-R5 Preferable specific examples of the compound (A) include the compound (A2) represented by the following formula (2). General formula (2): R 5 -OR 4 -OR 5

通式(2)中,R4 為具有芴結構或聯苯結構的二價有機殘基, R5 表示具有(甲基)丙烯醯基的一價有機殘基。In the formula (2), R 4 is a divalent organic residue having a fluorene structure or a biphenyl structure, and R 5 represents a monovalent organic residue having a (meth) acryl fluorenyl group.

通式(2)中,R4 若為具有芴結構或聯苯結構者,則並無特別限定,適合的具體例可列舉下述所示的二價有機殘基。優選為具有芴結構的殘基。In the general formula (2), R 4 is not particularly limited as long as it has an anthracene structure or a biphenyl structure, and specific examples thereof include the divalent organic residues shown below. It is preferably a residue having a fluorene structure.

[化7] [Chemistry 7]

通式(2)中,R5 若為具有(甲基)丙烯醯基者,則並無特別限定,適合的具體例可列舉下述所示的一價有機殘基。 [化8] In the general formula (2), R 5 is not particularly limited as long as it has a (meth) acrylonitrile group, and specific examples thereof include the monovalent organic residues shown below. [化8]

化合物(A2)例如可列舉9,9-雙[4-(2-丙烯醯氧基乙氧基)苯基]芴等。另外,市售品可使用:新中村化學工業公司製造的NK酯(NK Ester)A-BPEF、大阪燃氣化學(Osaka Gas Chemicals)公司製造的奧古索爾(Ogsol)EA系列等。The compound (A2) is, for example, 9,9-bis[4-(2-propenyloxyethoxy)phenyl]anthracene or the like. In addition, commercially available products include NK Ester A-BPEF manufactured by Shin-Nakamura Chemical Industry Co., Ltd., and Ogsol EA series manufactured by Osaka Gas Chemicals Co., Ltd., and the like.

活性能量線硬化性組成物可更包含光聚合起始劑。 光聚合起始劑若具有如下功能,即,可通過光激發而引發用以形成活性能量線硬化膜的(甲基)丙烯醯基的乙烯基聚合的功能,則無特別限定,例如可使用:單羰基化合物、二羰基化合物、苯乙酮化合物、安息香醚化合物、醯基氧化膦化合物、胺基羰基化合物等。The active energy ray-curable composition may further comprise a photopolymerization initiator. The photopolymerization initiator has a function of initiating a function of vinyl polymerization of a (meth)acryl fluorenyl group for forming an active energy ray-curing film by photoexcitation, and is not particularly limited. For example, it is possible to use: A monocarbonyl compound, a dicarbonyl compound, an acetophenone compound, a benzoin ether compound, a mercaptophosphine oxide compound, an amine carbonyl compound, or the like.

具體而言,單羰基化合物可列舉:二苯甲酮、4-甲基-二苯甲酮、2,4,6-三甲基二苯甲酮、鄰苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、4-(4-甲基苯硫基)苯基-乙酮、3,3'-二甲基-4-甲氧基二苯甲酮、4-(1,3-丙烯醯基-1,3,3'-二甲基-4-甲氧基)二苯甲酮、4-(1,3-丙烯醯基-1,4,7,10,13-五氧代十三烷基)二苯甲酮、3,3',4,4'-四(叔丁基過氧羰基)二苯甲酮、4-苯甲醯基-N,N,N-三甲基-1-丙烷胺鹽酸鹽、4-苯甲醯基-N,N-二甲基-N-2-(1-氧代-2-丙烯氧基乙基)甲基銨乙二酸鹽、2-/4-異丙基硫雜蒽酮、2,4-二乙基硫雜蒽酮、2,4-二氯硫雜蒽酮、1-氯-4-丙氧基硫雜蒽酮、2-羥基-3-(3,4-二甲基-9-氧代-9H-硫雜蒽酮-2-氧基-N,N,N-三甲基-1-丙烷胺鹽酸鹽、苯甲醯基亞甲基-3-甲基萘並(1,2-d)噻唑啉等。Specifically, the monocarbonyl compound may, for example, be benzophenone, 4-methyl-benzophenone, 2,4,6-trimethylbenzophenone, methyl orthobenzoylbenzoate, or 4 -Phenylbenzophenone, 4-(4-methylphenylthio)phenyl-ethanone, 3,3'-dimethyl-4-methoxybenzophenone, 4-(1,3 -propenyl-1,3,3'-dimethyl-4-methoxy)benzophenone, 4-(1,3-propenyl-1,4,7,10,13-pentaoxy Tridecyl)benzophenone, 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone, 4-benzylidene-N,N,N-trimethyl 1,-1-propanylamine hydrochloride, 4-benzylidene-N,N-dimethyl-N-2-(1-oxo-2-propenyloxyethyl)methylammonium oxalate , 2-/4-isopropylthioxanthone, 2,4-diethylthiazinone, 2,4-dichlorothiazinone, 1-chloro-4-propoxythiazinone 2-Hydroxy-3-(3,4-dimethyl-9-oxo-9H-thianonanone-2-oxy-N,N,N-trimethyl-1-propanamine hydrochloride , benzhydrylmethylene-3-methylnaphtho(1,2-d)thiazoline, and the like.

二羰基化合物可列舉:1,2,2-三甲基-雙環[2.1.1]庚烷-2,3-二酮、苯偶醯(benzil)、2-乙基蒽醌、9,10-菲醌(phenanthrenequinone)、甲基-α-氧代苯乙酸酯、4-苯基苯偶醯(benzil)等。 苯乙酮化合物可列舉:2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-二-2-甲基-1-苯基丙烷-1-酮、1-羥基-環己基苯基酮、2-羥基-2-甲基-1-苯乙烯基丙烷-1-酮聚合物、二乙氧基苯乙酮、二丁氧基苯乙酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、2,2-二乙氧基-1,2-二苯基乙烷-1-酮、2-甲基-1-[4-(甲基硫基)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)丁烷-1-酮、1-苯基-1,2-丙二酮-2-(鄰乙氧基羰基)肟、3,6-雙(2-甲基-2-嗎啉基-丙醯基)-9-丁基咔唑等。The dicarbonyl compound may, for example, be 1,2,2-trimethyl-bicyclo[2.1.1]heptane-2,3-dione, benzil, 2-ethylhydrazine, 9,10- Phinethrenequinone, methyl-α-oxophenyl acetate, 4-phenylbenzil, and the like. Examples of the acetophenone compound include 2-hydroxy-2-methyl-1-phenylpropan-1-one and 1-(4-isopropylphenyl)-2-hydroxy-2-methyl-1-benzene. Propane-1-one, 1-(4-isopropylphenyl)-2-hydroxy-di-2-methyl-1-phenylpropan-1-one, 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-styrylpropan-1-one polymer, diethoxyacetophenone, dibutoxyacetophenone, 2,2-dimethoxy-1,2 -diphenylethane-1-one, 2,2-diethoxy-1,2-diphenylethane-1-one, 2-methyl-1-[4-(methylthio) Phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one, 1-phenyl -1,2-propanedione-2-(o-ethoxycarbonyl)anthracene, 3,6-bis(2-methyl-2-morpholinyl-propenyl)-9-butylcarbazole, and the like.

安息香醚化合物可列舉:安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚、安息香正丁醚等。 醯基氧化膦化合物可列舉:2,4,6-三甲基苯甲醯基二苯基氧化膦、4-正丙基苯基-二(2,6-二氯苯甲醯基)氧化膦等。Examples of the benzoin ether compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzoin n-butyl ether. The fluorenylphosphine oxide compound may, for example, be 2,4,6-trimethylbenzimidyldiphenylphosphine oxide or 4-n-propylphenyl-bis(2,6-dichlorobenzhydryl)phosphine oxide. Wait.

胺基羰基化合物可列舉:4-(二甲氧基胺基)苯甲酸甲酯、4-(二甲基胺基)苯甲酸乙酯、4-(二甲基胺基)苯甲酸2-正丁氧基乙酯、4-(二甲基胺基)苯甲酸異戊酯、苯甲酸2-(二甲基胺基)乙酯、4,4'-雙-4-二甲基胺基二苯甲酮、4,4'-雙-4-二乙基胺基二苯甲酮、2,5'-雙(4-二乙基胺基苯亞甲基)環戊酮等。 光聚合起始劑的市售品可列舉:汽巴精化(Ciba Specialty Chemicals)(股)製造的豔佳固(Irgacure)184、651、500、907、127、369、784、2959,巴斯夫(BASF)公司製造的魯西林(Lucirin)TPO,日本華嘉(Nihon Siber Hegner)(股)製造的易曬固(Esacure)ONE等。The aminocarbonyl compound may, for example, be methyl 4-(dimethoxyamino)benzoate, ethyl 4-(dimethylamino)benzoate or 4-(dimethylamino)benzoic acid 2-positive Butoxyethyl ester, isoamyl 4-(dimethylamino)benzoate, 2-(dimethylamino)ethyl benzoate, 4,4'-bis-4-dimethylamino Benzophenone, 4,4'-bis-4-diethylaminobenzophenone, 2,5'-bis(4-diethylaminobenzylidene)cyclopentanone, and the like. Commercial products of the photopolymerization initiators include: Irgacure 184, 651, 500, 907, 127, 369, 784, 2959 manufactured by Ciba Specialty Chemicals Co., Ltd., BASF ( BASF) company's Lucirin TPO, Japan's Nihon Siber Hegner (Esacure) ONE and so on.

光聚合起始劑並不限定於所述化合物,若具有利用紫外線來引發聚合的能力,則可為任意者。這些光聚合起始劑除了使用一種以外,也可將兩種以上混合使用。 關於光聚合起始劑的使用量並無特別限制,優選為相對於包含化合物(A)的活性能量線硬化性化合物的總量(在包含化合物(A)以外的光硬化性化合物的情況下,為化合物(A)與化合物(A)以外的光硬化性化合物的合計量)100重量份,在1重量份~20重量份的範圍內使用。 作為增感劑,也可添加公知的有機胺等。 進而,除了所述自由基聚合用起始劑以外,也可併用陽離子聚合用的起始劑。The photopolymerization initiator is not limited to the compound, and may have any ability to initiate polymerization by ultraviolet rays. These photopolymerization initiators may be used in combination of two or more kinds in addition to one. The amount of use of the photopolymerization initiator is not particularly limited, and is preferably the total amount of the active energy ray-curable compound containing the compound (A) (in the case of a photocurable compound other than the compound (A), The total amount of the compound (A) and the photocurable compound other than the compound (A) is 100 parts by weight, and is used in the range of 1 part by weight to 20 parts by weight. A well-known organic amine etc. can also be added as a sensitizer. Further, in addition to the initiator for radical polymerization, an initiator for cationic polymerization may be used in combination.

活性能量線硬化性組成物可更含有具有3個以上的(甲基)丙烯醯基的化合物(X)(但,為化合物(A)的情況除外)。通過化合物(X),可進一步提高樹脂層的硬塗性。 就塗膜強度、耐擦傷性的觀點而言,化合物(X)可適合使用聚胺基甲酸酯聚(甲基)丙烯酸酯、聚環氧聚(甲基)丙烯酸酯等聚(甲基)丙烯酸酯類、多官能的丙烯酸酯類。 聚環氧聚(甲基)丙烯酸酯是將環氧樹脂的環氧基以(甲基)丙烯酸進行酯化,且將官能基設為(甲基)丙烯醯基者,有對雙酚A型環氧樹脂的(甲基)丙烯酸加成物、對酚醛清漆型環氧樹脂的(甲基)丙烯酸加成物等。The active energy ray-curable composition may further contain a compound (X) having three or more (meth) acrylonitrile groups (except for the case of the compound (A)). The hard coat property of the resin layer can be further improved by the compound (X). From the viewpoint of coating film strength and scratch resistance, the compound (X) can be suitably used as a poly(methyl) group such as a polyurethane poly(meth)acrylate or a polyepoxy poly(meth)acrylate. Acrylates, polyfunctional acrylates. The polyepoxy poly(meth)acrylate is obtained by esterifying an epoxy group of an epoxy resin with (meth)acrylic acid, and setting the functional group to a (meth)acrylonitrile group, and having a bisphenol A type. A (meth)acrylic acid addition product of an epoxy resin, a (meth)acrylic acid addition product to a novolac type epoxy resin, or the like.

聚胺基甲酸酯聚(甲基)丙烯酸酯例如有:使二異氰酸酯與具有羥基的(甲基)丙烯酸酯類進行反應而獲得者;將使多元醇與聚異氰酸酯在異氰酸酯基過剩的條件下進行反應而成的含異氰酸酯基的胺基甲酸酯預聚物,與具有羥基的(甲基)丙烯酸酯類進行反應而獲得者。或者也可將使多元醇與聚異氰酸酯在羥基過剩的條件下進行反應而成的含羥基的胺基甲酸酯預聚物,與具有異氰酸酯基的(甲基)丙烯酸酯類進行反應而獲得。The polyurethane poly(meth) acrylate is, for example, obtained by reacting a diisocyanate with a (meth) acrylate having a hydroxyl group; and the polyol and the polyisocyanate are in an excess of an isocyanate group. The isocyanate group-containing urethane prepolymer obtained by the reaction is obtained by reacting with a (meth) acrylate having a hydroxyl group. Alternatively, a hydroxyl group-containing urethane prepolymer obtained by reacting a polyhydric alcohol with a polyisocyanate under a condition that a hydroxyl group is excessive may be obtained by reacting with a (meth) acrylate having an isocyanate group.

多元醇可列舉:乙二醇、丙二醇、二乙二醇、二丙二醇、丁二醇、1,6-己二醇、3-甲基-1,5-戊二醇、新戊二醇、己三醇、三羥甲基丙烷、聚四亞甲基二醇、己二酸與乙二醇的縮聚物等。Examples of the polyhydric alcohol include ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, butylene glycol, 1,6-hexanediol, 3-methyl-1,5-pentanediol, neopentyl glycol, and Triol, trimethylolpropane, polytetramethylene glycol, polycondensate of adipic acid and ethylene glycol, and the like.

聚異氰酸酯可列舉:甲伸苯基二異氰酸酯、異佛爾酮二異氰酸酯、六亞甲基二異氰酸酯等。 具有羥基的(甲基)丙烯酸酯類可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯等。 具有異氰酸酯基的(甲基)丙烯酸酯類可列舉:2-(甲基)丙烯醯氧基乙基異氰酸酯、(甲基)丙烯醯基異氰酸酯等。Examples of the polyisocyanate include methylphenyl diisocyanate, isophorone diisocyanate, and hexamethylene diisocyanate. Examples of the (meth) acrylate having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, and pentaerythritol. Acrylate, dipentaerythritol penta (meth) acrylate, di-trimethylolpropane tetra (meth) acrylate, and the like. Examples of the (meth) acrylate having an isocyanate group include 2-(meth)acryloxyethyl isocyanate and (meth) propylene decyl isocyanate.

光硬化性化合物的市售品可例示以下者。 東亞合成(股)製造:亞羅尼斯(Aronix)M-400、亞羅尼斯(Aronix)M-402、亞羅尼斯(Aronix)M-408、亞羅尼斯(Aronix)M-450、亞羅尼斯(Aronix)M-7100、亞羅尼斯(Aronix)M-8030、亞羅尼斯(Aronix)M-8060; 大阪有機化學工業(股)製造:畢斯寇特(Viscoat)#400; 化藥沙多瑪(Sartomer)(股)製造:SR-295; 大賽璐(Daicel)UCB(股)製造:DPHA、艾巴克力(Ebecryl)220、艾巴克力(Ebecryl)1290K、艾巴克力(Ebecryl)5129、艾巴克力(Ebecryl)2220、艾巴克力(Ebecryl)6602; 新中村化學工業(股)製造:NK酯(NK Ester)A-TMMT、NK寡聚(NK Oligo)EA-1020、NK寡聚(NK Oligo)EMA-1020、NK寡聚(NK Oligo)EA-6310、NK寡聚(NK Oligo)EA-6320、NK寡聚(NK Oligo)EA-6340、NK寡聚(NK Oligo)MA-6、NK寡聚(NK Oligo)U-4HA、NK寡聚(NK Oligo)U-6HA、NK寡聚(NK Oligo)U-324A; 巴斯夫(BASF)公司製造:拉羅瑪(Laromer)EA81; 聖諾普科(San Nopco)(股)製造:佛托瑪(Photomer)3016、 荒川化學工業(股)製造:畢姆賽特(Beamset)371、畢姆賽特(Beamset)575、畢姆賽特(Beamset)577、畢姆賽特(Beamset)700、畢姆賽特(Beamset)710; 根上工業(股)製造:阿特樹脂(Art Resin)UN-3320HA、阿特樹脂(Art Resin)UN-3320HB、阿特樹脂(Art Resin)UN-3320HC、阿特樹脂(Art Resin)UN-3320HS、阿特樹脂(Art Resin)UN-9000H、阿特樹脂(Art Resin)UN-901T、阿特樹脂(Art Resin)HDP、阿特樹脂(Art Resin)HDP-3、阿特樹脂(Art Resin)H61; 日本合成化學工業(股)製造:紫光UV-7600B、紫光UV-7610B、紫光UV-7620EA、紫光UV-7630B、紫光UV-1400B、紫光UV-1700B、紫光UV-6300B; 共榮社化學(股)製造:萊特丙烯酸酯(Light Acrylate)PE-4A、萊特丙烯酸酯(Light Acrylate)DPE-6A、UA-306H、UA-306T、UA-306I; 日本化藥(股)製造:卡亞拉德(KAYARAD)DPHA、卡亞拉德(KAYARAD)DPHA2C、卡亞拉德(KAYARAD)DPHA-40H、卡亞拉德(KAYARAD)D-310、卡亞拉德(KAYARAD)D-330。Commercially available products of the photocurable compound can be exemplified below. East Asian synthetic (stock) manufacturing: Aronix M-400, Aronix M-402, Aronix M-408, Aronix M-450, Aronis (Aronix) M-7100, Aronix M-8030, Aronix M-8060; Osaka Organic Chemical Industry (Stock) Manufacturing: Viscoat #400; Chemical Shado Made by Sartomer (SR): SR-295; Daicel UCB (manufacturing): DPHA, Ebecryl 220, Ebecryl 1290K, Ebecryl 5129, Ebecryl 2220, Ebecryl 6602; manufactured by Xinzhongcun Chemical Industry Co., Ltd.: NK Ester A-TMMT, NK Oligo EA-1020, NK oligomerization ( NK Oligo) EMA-1020, NK Oligo EA-6310, NK Oligo EA-6320, NK Oligo EA-6340, NK Oligo MA-6 NK Oligo U-4HA, NK Oligo U-6HA, NK Oligo U-324A; Made by BASF: Laromer EA81; San Nopco (stock) manufacturing: Photomer 3016, Arakawa Chemical Industry (stock) manufacturing: Beamset 371, Beamset 575, Beamset 577, Beamset 700, Beamset 710; Roots Industrial (stock) manufacturing: Art Resin UN-3320HA, Art Resin (Art Resin)UN-3320HB, Art Resin UN-3320HC, Art Resin UN-3320HS, Art Resin UN-9000H, Art Resin UN-901T, Art Resin HDP, Art Resin HDP-3, Art Resin H61; Japan Synthetic Chemical Industry Co., Ltd.: Violet UV-7600B, Violet UV-7610B, Violet UV -7620EA, Violet UV-7630B, Violet UV-1400B, Violet UV-1700B, Violet UV-6300B; Produced by Gongrongshe Chemical Co., Ltd.: Light Acrylate PE-4A, Light Acrylate DPE-6A, UA-306H, UA-306T, UA-306I; manufactured by Nippon Chemical Co., Ltd.: Kaya De (KAYARAD) DPHA, Kaya rad (KAYARAD) DPHA2C, Kaya rad (KAYARAD) DPHA-40H, Kaya rad (KAYARAD) D-310, Kaya rad (KAYARAD) D-330.

所述具有3個以上的(甲基)丙烯醯基的化合物(X)可單獨或混合多種來使用。 另外,通常,可用作化合物(b2)的季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯的製品中存在:不具有羥基的季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯。因此,在化合物(b2)中使用季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯的情況下,這些化合物中所含的季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯作為化合物(X)而有助於硬塗性的提高。The compound (X) having three or more (meth) acrylonitrile groups may be used singly or in combination of two or more. Further, in general, a product of pentaerythritol triacrylate or dipentaerythritol pentaacrylate which can be used as the compound (b2) is a pentaerythritol tetraacrylate having no hydroxyl group or dipentaerythritol hexaacrylate. Therefore, in the case where pentaerythritol triacrylate or dipentaerythritol pentaacrylate is used in the compound (b2), pentaerythritol tetraacrylate and dipentaerythritol hexaacrylate contained in these compounds are used as the compound (X) to contribute to hard coating. Sexual improvement.

在具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A),與具有3個以上的(甲基)丙烯醯基的化合物(X)(其中,為化合物(A)的情況除外)的固體成分的合計100重量%中,化合物(A)的含量優選為10重量%~90重量%,尤其優選為20重量%~80重量%。其原因在於:若為所述範圍內,則聚酯基材與樹脂層的密合性、以及硬塗性優異。a compound (A) having an anthracene structure and/or a biphenyl structure, and two or more (meth)acrylonyl groups, and a compound (X) having three or more (meth)acrylonyl groups (wherein The content of the compound (A) is preferably 10% by weight to 90% by weight, particularly preferably 20% by weight to 80% by weight, based on 100% by weight of the total solid content of the compound (A). The reason for this is that the adhesion between the polyester base material and the resin layer and the hard coat property are excellent in the above range.

活性能量線硬化性組成物也可為了調整作為硬化膜的樹脂層的折射率而包含金屬氧化物。 金屬氧化物的D50粒徑優選為0.005 μm~0.200 μm。金屬氧化物的D50粒徑例如可使用利用動態光散射法的日機裝(股)製造的“納奇克(Nanotrac)UPA”等來測定。 在D50粒徑小於0.005 μm的金屬氧化物組成物的情況下,微粒子彼此的凝聚力非常大,因此存在透明性高的一次粒子水平的分散性下降的傾向。另一方面,在D50粒徑超過0.200 μm的情況下,由於粒徑大,故而存在對於可見光等光容易產生散射,在硬化膜中產生混濁的傾向。The active energy ray-curable composition may contain a metal oxide in order to adjust the refractive index of the resin layer as the cured film. The D50 particle diameter of the metal oxide is preferably from 0.005 μm to 0.200 μm. The D50 particle diameter of the metal oxide can be measured, for example, using "Nnotrac UPA" manufactured by Nikkiso Co., Ltd. using a dynamic light scattering method. In the case of a metal oxide composition having a D50 particle diameter of less than 0.005 μm, the cohesive force of the fine particles is extremely large, and thus the dispersibility of the primary particle level having high transparency tends to decrease. On the other hand, when the particle diameter of D50 exceeds 0.200 μm, since the particle diameter is large, light such as visible light is likely to be scattered, and turbidity tends to occur in the cured film.

金屬氧化物優選為含有選自由鈦、鋅、鋯、矽、鋁所組成的群組中的至少一種原子者。特別是含有鈦及/或鋯的任一種原子的金屬氧化物更優選。 具體而言,可列舉:氧化鈦、氧化鋅、氧化鋯、氧化矽、氧化鋁、鈦酸鋇等。這些金屬氧化物也可利用有機物或無機物對表面進行處理。另外,這些金屬氧化物也可併用兩種以上。The metal oxide is preferably one containing at least one atom selected from the group consisting of titanium, zinc, zirconium, hafnium, and aluminum. In particular, a metal oxide containing any atom of titanium and/or zirconium is more preferable. Specific examples thereof include titanium oxide, zinc oxide, zirconium oxide, cerium oxide, aluminum oxide, and barium titanate. These metal oxides can also be treated with organic or inorganic materials. Further, these metal oxides may be used in combination of two or more kinds.

在包含金屬氧化物的情況下,其含量優選為硬化性組成物的固體成分中的10重量%~80重量%,更優選為30重量%~60重量%。 金屬氧化物可使用預先作為包含所述化合物(A)的分散體而進行調整者。優選為使用化合物(A1)的分散體。When the metal oxide is contained, the content thereof is preferably 10% by weight to 80% by weight, and more preferably 30% by weight to 60% by weight, based on the solid content of the curable composition. The metal oxide can be adjusted using a dispersion which contains the compound (A) in advance. It is preferred to use a dispersion of the compound (A1).

繼而,對將活性能量線硬化性組成物進行硬化而成的樹脂層的製造方法進行說明。 樹脂層的製造方法例如包括:將活性能量線硬化性樹脂組成物塗佈於作為聚酯膜的基材上;以及照射活性能量線,使基材上的活性能量線硬化性組成物硬化。 更具體而言,可通過以乾燥後的膜厚成為優選為0.02 μm~30 μm、更優選為0.02 μm~20 μm的方式,將該樹脂組成物塗敷於作為聚酯膜的基材上後,進行硬化處理而形成。Next, a method of producing a resin layer obtained by curing an active energy ray-curable composition will be described. The method for producing a resin layer includes, for example, applying an active energy ray-curable resin composition onto a substrate as a polyester film, and irradiating an active energy ray to cure the active energy ray-curable composition on the substrate. More specifically, the resin composition can be applied to a substrate as a polyester film after the film thickness after drying is preferably 0.02 μm to 30 μm, more preferably 0.02 μm to 20 μm. And formed by hardening treatment.

塗敷方法可使用公知的方法,例如可使用:利用棒(rod)或線棒(wire bar)等的方法,或微凹版、凹版、模、簾幕、模唇(lip)、狹縫(slot)或旋轉等各種塗佈方法。 硬化處理可通過使用公知的技術,例如照射紫外線、電子束、波長為400 nm~500 nm的可見光線等活性能量線來進行。紫外線及波長為400 nm~500 nm的可見光線的線源(光源)中,可使用例如高壓水銀燈、超高壓水銀燈、金屬鹵化物燈、鎵燈、氙燈、碳弧燈等。電子束源中可使用熱電子放射槍、電解放射槍等。A known method can be used for the coating method, for example, a method using a rod or a wire bar, or a micro gravure, a gravure, a mold, a curtain, a lip, a slit (slot) ) or various coating methods such as rotation. The hardening treatment can be carried out by using a known technique such as irradiation of an ultraviolet ray, an electron beam, or an active energy ray having a wavelength of from 400 nm to 500 nm. For ultraviolet light and a line source (light source) of visible light having a wavelength of 400 nm to 500 nm, for example, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a gallium lamp, a xenon lamp, a carbon arc lamp, or the like can be used. A thermal electron ray gun, an electrolysis lance, or the like can be used in the electron beam source.

就在步驟上容易管理的方面而言,所照射的活性能量線量優選為50 mJ/cm2 ~1000 mJ/cm2 的範圍內。 這些活性能量線照射中,可併用利用紅外線、遠紅外線、熱風、高頻加熱等的熱處理。The amount of the active energy ray to be irradiated is preferably in the range of 50 mJ/cm 2 to 1000 mJ/cm 2 in terms of ease of management in the step. In the irradiation of these active energy rays, heat treatment using infrared rays, far infrared rays, hot air, high frequency heating, or the like can be used in combination.

硬化膜可在基材上塗敷活性能量線硬化性組成物,使其自然或強制乾燥後進行硬化處理而形成,也可塗敷而進行硬化處理後,使其自然或強制乾燥,但優選為在自然或強制乾燥後進行硬化處理。 特別是在以電子束使其硬化的情況下,為了防止由水引起的硬化阻礙或者由有機溶劑的殘留引起的塗膜的強度下降,更優選為使其自然或強制乾燥後進行硬化處理。 硬化處理的時機可為與塗敷同時,也可為塗敷後。The cured film may be formed by applying an active energy ray-curable composition to a substrate, allowing it to be naturally or forcedly dried, followed by curing treatment, or may be applied and hardened, and then naturally or forcibly dried, but preferably Hardening after natural or forced drying. In particular, in the case of hardening by an electron beam, in order to prevent hardening by water or to reduce the strength of the coating film caused by the residual of the organic solvent, it is more preferable to carry out the hardening treatment after natural or forced drying. The timing of the hardening treatment may be at the same time as the application, or may be after application.

所獲得的硬化膜由於透明性、密合性優異,故而可適合作為光學材料來利用。 硬化膜的厚度優選為0.02 μm~30 μm。 進而,硬化膜的折射率優選為1.4~2.0的範圍,更優選為1.5~1.9的範圍。Since the obtained cured film is excellent in transparency and adhesiveness, it can be suitably used as an optical material. The thickness of the cured film is preferably 0.02 μm to 30 μm. Further, the refractive index of the cured film is preferably in the range of 1.4 to 2.0, and more preferably in the range of 1.5 to 1.9.

用以獲得本發明的活性能量線硬化膜的組成物可在不損及本發明的目的或效果的範圍內更包含多種添加劑。具體而言,可列舉:化合物(A)或化合物(X)以外的光硬化性化合物、聚合抑制劑、光增感劑、調平劑、界面活性劑、抗菌劑、抗結塊劑、塑化劑、紫外線吸收劑、紅外線吸收劑、抗氧化劑、矽烷偶合劑、導電性聚合物、導電性界面活性劑、無機填充劑、顏料、染料等。The composition for obtaining the active energy ray-curing film of the present invention may further contain various additives within a range not impairing the object or effect of the present invention. Specific examples thereof include a photocurable compound other than the compound (A) or the compound (X), a polymerization inhibitor, a photosensitizer, a leveling agent, a surfactant, an antibacterial agent, an anti-caking agent, and plasticization. Agent, ultraviolet absorber, infrared absorber, antioxidant, decane coupling agent, conductive polymer, conductive surfactant, inorganic filler, pigment, dye, and the like.

<透明導電膜> 透明導電膜的材料可使用觸控面板的電極中使用的公知材料。例如可列舉:氧化錫、氧化銦、氧化銻、氧化鋅、氧化銦錫(ITO)、氧化銻錫(Antimony Tin Oxide,ATO)等金屬氧化物。這些金屬氧化物中優選使用ITO。<Transparent Conductive Film> The material of the transparent conductive film can use a known material used in the electrode of the touch panel. For example, metal oxides such as tin oxide, indium oxide, antimony oxide, zinc oxide, indium tin oxide (ITO), and antimony tin Oxide (ATO) may be mentioned. Among these metal oxides, ITO is preferably used.

例如就確保表面電阻值為103 Ω/□以下的良好導電性的觀點而言,透明導電膜的厚度優選為10 nm以上,更優選為15 nm以上,特別優選為20 nm以上。另一方面,若透明導電膜的厚度變得過大,則有時會產生透明性下降的不良情況,因此透明導電膜的厚度的上限優選為60 nm以下,更優選為50 nm以下,特別優選為40 nm以下。For example, from the viewpoint of ensuring good electrical conductivity of the surface resistance value of 10 3 Ω/□ or less, the thickness of the transparent conductive film is preferably 10 nm or more, more preferably 15 nm or more, and particularly preferably 20 nm or more. On the other hand, when the thickness of the transparent conductive film is too large, the transparency may be lowered. Therefore, the upper limit of the thickness of the transparent conductive film is preferably 60 nm or less, more preferably 50 nm or less, and particularly preferably Below 40 nm.

透明導電膜的折射率為1.81以上。進而,透明導電膜的折射率優選為1.85以上,更優選為1.90以上。上限優選為2.20以下,更優選為2.10以下。The refractive index of the transparent conductive film is 1.81 or more. Further, the refractive index of the transparent conductive film is preferably 1.85 or more, and more preferably 1.90 or more. The upper limit is preferably 2.20 or less, and more preferably 2.10 or less.

透明導電膜的形成方法並無特別限定,可使用現有公知的方法。具體而言,例如可使用:真空蒸鍍法、濺射法、離子鍍法等乾式製程(dry process)。The method for forming the transparent conductive film is not particularly limited, and a conventionally known method can be used. Specifically, for example, a dry process such as a vacuum deposition method, a sputtering method, or an ion plating method can be used.

本發明的透明導電膜經圖案化。例如,將以所述方式製膜的透明導電膜進行圖案化。圖案化可根據透明導電膜所應用的用途來形成各種圖案。此外,通過透明導電膜的圖案化,形成圖案部與非圖案部,圖案部的形狀例如可列舉條紋(stripe)狀、格子狀等。The transparent conductive film of the present invention is patterned. For example, a transparent conductive film formed in the manner described above is patterned. Patterning can form various patterns depending on the application to which the transparent conductive film is applied. Further, the pattern portion and the non-pattern portion are formed by patterning of the transparent conductive film, and the shape of the pattern portion may be, for example, a stripe shape or a lattice shape.

透明導電膜的圖案化通常通過蝕刻來進行。例如,通過利用光微影法、雷射曝光法、或印刷法,在透明導電膜上形成圖案狀的抗蝕刻膜後進行蝕刻處理,從而使透明導電膜圖案化。Patterning of the transparent conductive film is usually performed by etching. For example, a pattern-shaped anti-etching film is formed on a transparent conductive film by a photolithography method, a laser exposure method, or a printing method, and then an etching treatment is performed to pattern the transparent conductive film.

蝕刻液是使用現有公知者。例如使用:氯化氫、溴化氫、硫酸、硝酸、磷酸等無機酸,乙酸等有機酸,以及這些酸的混合物、以及它們的水溶液。The etching solution is known to those skilled in the art. For example, inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, phosphoric acid, organic acids such as acetic acid, and mixtures of these acids, and aqueous solutions thereof are used.

本發明的積層體若具有作為聚酯膜的基材、作為活性能量線硬化膜的樹脂層、以及透明導電膜,且基材與樹脂層鄰接即可。其以外的層構成為任意,可視需要在基材或樹脂層的單面設置折射率不同的膜或黏著層等。The laminate of the present invention may have a base material as a polyester film, a resin layer as an active energy ray-curing film, and a transparent conductive film, and the base material may be adjacent to the resin layer. The layer other than the layer is arbitrary, and a film or an adhesive layer having a different refractive index may be provided on one surface of the substrate or the resin layer as needed.

以下列舉本發明的積層體的若干優選構成例,但本發明並不限定於這些構成例。此外,下述構成例中,透明導電膜為經圖案化的透明導電膜。透明導電膜以外的其他層未經圖案化。 (I) 基材/樹脂層/透明導電膜 (II) 基材/樹脂層/(M)/透明導電膜 (III) (M)/基材/樹脂層/透明導電膜 (IV) (M)/基材/樹脂層/(M)/透明導電膜 (V) (M)/樹脂層/基材/樹脂層/透明導電膜 (VI) 樹脂層//基材/樹脂層/透明導電膜 其中,(M)包含折射率不同的膜或黏著層的任一層。Hereinafter, some preferred configuration examples of the laminate of the present invention are listed, but the present invention is not limited to these configuration examples. Further, in the following configuration example, the transparent conductive film is a patterned transparent conductive film. Other layers than the transparent conductive film are not patterned. (I) Substrate/Resin Layer/Transparent Conductive Film (II) Substrate/Resin Layer/(M)/Transparent Conductive Film (III) (M)/Substrate/Resin Layer/Transparent Conductive Film (IV) (M) / Substrate / Resin Layer / (M) / Transparent Conductive Film (V) (M) / Resin Layer / Substrate / Resin Layer / Transparent Conductive Film (VI) Resin Layer / / Substrate / Resin Layer / Transparent Conductive Film (M) comprises any layer of a film or an adhesive layer having a different refractive index.

折射率不同的膜為具有本發明的樹脂層所具有的功能以外的功能者。其形成方法並無特別限定,利用公知方法來形成。例如可使用:蒸鍍、濺射等乾式塗佈法,使用棒、線棒的方法,微凹版、凹版、模、簾幕、模唇、狹縫、旋轉等濕式塗佈方法。所使用的材料也無限定,視需要可使用能夠對積層體賦予資訊記錄功能、防眩功能、抗牛頓環(anti-Newton ring)功能、黏著功能、特定波長的遮斷、色調修正等功能的一種以上的任意材料。The film having a different refractive index is a function other than the function of the resin layer of the present invention. The method for forming the film is not particularly limited and is formed by a known method. For example, a dry coating method such as vapor deposition or sputtering, a method using a rod or a wire bar, a wet coating method such as a micro gravure, a gravure, a mold, a curtain, a lip, a slit, and a rotation can be used. The material to be used is not limited, and an information recording function, an anti-glare function, an anti-Newton ring function, an adhesive function, a specific wavelength interruption, a color tone correction, and the like can be used as needed. Any of more than one material.

本發明的積層體在其製造時,在樹脂層或任意層的硬化時、或透明導電膜的圖案化時照射活性能量線。在該製造過程中,即便對樹脂層照射的活性能量線的合計為累計光量2000 mJ/cm2 以上,作為聚酯膜的基材與作為活性能量線硬化膜的樹脂層的密合性優異。此外,所述所謂累計光量,也包含用以形成作為活性能量線硬化膜的樹脂層的初始硬化時的累計光量。In the production of the laminate of the present invention, the active energy ray is irradiated when the resin layer or any layer is cured or when the transparent conductive film is patterned. In this manufacturing process, even if the total amount of active energy rays irradiated to the resin layer is 2,000 mJ/cm 2 or more, the adhesion between the base material of the polyester film and the resin layer as the active energy ray-curable film is excellent. Further, the so-called integrated light amount also includes an integrated light amount at the time of initial hardening for forming a resin layer as an active energy ray-curing film.

[密合性] 關於本發明的具有作為聚酯膜的基材、作為活性能量線硬化膜的樹脂層、以及透明導電膜的積層體的密合性,利用依據JIS K5600-5-6的附著性交叉切割法來評價的密合性為每單位面積的剝離面積小於5%,非常優異。優選為小於2%。 詳細而言,在實施例的評價中進行說明。 [實施例][Adhesiveness] The adhesion of the laminate having the polyester film as the base material, the resin layer as the active energy ray-curable film, and the transparent conductive film of the present invention is adhered according to JIS K5600-5-6. The adhesion evaluated by the sexual cross-cut method is a peeling area per unit area of less than 5%, which is very excellent. It is preferably less than 2%. Specifically, it demonstrates in the evaluation of an Example. [Examples]

以下,基於製造例、實施例,對本發明進一步進行詳細說明。在製造例、實施例中,份及%分別表示重量份及重量%。 所使用的化學品如以下所述。 <四羧酸二酐(b1)> 3,3',4,4'-聯苯四羧酸二酐(三菱化學(股)製造,商品名BPDA) 9,9-雙(3,4-二羧基苯基)芴二酸酐(JFE化學(股)製造,商品名:BPAF) 1,2,3,4-丁烷四羧酸二酐(新日本理化(股)製造,商品名:利卡希德(Rikacid)BT-100) 1,2,4,5-苯四羧酸二酐(大賽璐(Daicel)(股)製造,商品名:均苯四甲酸二酐,PMDA) 鄰苯二甲酸酐(和光純藥工業(股)製造) <化合物(b2)> 季戊四醇三丙烯酸酯(1)(日本化藥(股)製造,商品名:卡亞拉德(KAYARAD)PET-30,也包含作為副產物的季戊四醇四丙烯酸酯) 季戊四醇三丙烯酸酯(2)(新中村化學工業(股)製造,商品名:A-TMM-3LM-N,也包含作為副產物的季戊四醇四丙烯酸酯) 二季戊四醇五丙烯酸酯(新中村化學工業(股)製造,商品名:A-9570W,也包含作為副產物的二季戊四醇六丙烯酸酯) 丙烯酸2-羥基乙酯(日本催化劑(股)製造,HEA) <聚合抑制劑> 甲基對苯二酚(和光純藥工業(股)製造) <催化劑> 1,8-二氮雜雙環[5.4.0]-7-十一烯(東京化成工業(股)製造) 二甲基苄基胺(和光純藥工業(股)製造) <含環氧基的化合物(b3)> 甲基丙烯酸縮水甘油酯(日本陶氏化學(Japan Dow Chemical)(股)製造,GMA) 丙烯酸4-羥基丁酯縮水甘油醚(日本化成(股)製造,商品名:丙烯酸4-羥基丁酯縮水甘油醚) 聯苯縮水甘油醚(三光(股)製造,商品名:OPP-G)Hereinafter, the present invention will be further described in detail based on production examples and examples. In the production examples and examples, parts and % represent parts by weight and % by weight, respectively. The chemicals used are as described below. <tetracarboxylic dianhydride (b1)> 3,3',4,4'-biphenyltetracarboxylic dianhydride (Mitsubishi Chemical Co., Ltd., trade name BPDA) 9,9-double (3,4-di Carboxyphenyl) sebacic anhydride (manufactured by JFE Chemical Co., Ltd., trade name: BPAF) 1,2,3,4-butane tetracarboxylic dianhydride (manufactured by Nippon Chemical and Chemical Co., Ltd., trade name: Likahi Rikacid BT-100) 1,2,4,5-benzenetetracarboxylic dianhydride (manufactured by Daicel), trade name: pyromellitic dianhydride, PMDA) phthalic anhydride (made by Wako Pure Chemical Industries, Ltd.) <Compound (b2)> Pentaerythritol triacrylate (1) (Manufactured by Nippon Kayaku Co., Ltd., trade name: KAYARAD PET-30, also included as a vice Pentaerythritol tetraacrylate of the product) Pentaerythritol triacrylate (2) (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: A-TMM-3LM-N, also contains pentaerythritol tetraacrylate as a by-product) Dipentaerythritol pentaacrylate Ester (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., trade name: A-9570W, also contains dipentaerythritol hexaacrylate as a by-product) 2-Hydroxyethyl ester (manufactured by Japan Catalyst Co., Ltd., HEA) <Polymerization inhibitor> Methyl hydroquinone (manufactured by Wako Pure Chemical Industries, Ltd.) <Catalyst> 1,8-diazabicyclo[5.4. 0]-7-undecene (manufactured by Tokyo Chemical Industry Co., Ltd.) dimethylbenzylamine (manufactured by Wako Pure Chemical Industries, Ltd.) <epoxy group-containing compound (b3)> glycidyl methacrylate (Manufactured by Japan Dow Chemical Co., Ltd., GMA) 4-Hydroxybutyl acrylate glycidyl ether (manufactured by Nippon Kasei Co., Ltd., trade name: 4-hydroxybutyl acrylate glycidyl ether) Biphenyl shrinkage Glycerol ether (made by Sanguang Co., Ltd., trade name: OPP-G)

<酸值的測定方法> 依據JIS K 0070的電位差滴定法,對所測定的酸值(mgKOH/g)進行固體成分換算。<Method for Measuring Acid Value> According to the potential difference titration method of JIS K 0070, the measured acid value (mgKOH/g) was converted into a solid content.

<化合物(A1)的合成例> (合成例1) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、250.0份的羥值為122 mgKOH/g的季戊四醇三丙烯酸酯(1)、0.24份的甲基對苯二酚、217.8份的環己酮,升溫至60℃。繼而,添加作為催化劑的1.65份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的紅外線(infrared,IR)測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為94 mgKOH/g。接著,在該溶液中添加140.0份的聯苯縮水甘油醚、91.0份的環己酮,繼而,添加作為催化劑的2.65份的二甲基苄基胺,在100℃下攪拌6小時,進行反應。一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,另外,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物的比例為79%。 此外,所謂包含化合物(A)的反應物,表示除了化合物(A)以外,由化合物(b2)中包含多個羥基的副產物而來的高分子量反應物。包含化合物(A)的反應物的比例是根據樹脂清漆的最終酸值來算出。其餘表示反應中使用的化合物(b2)中不具有羥基的化合物或未反應原料。在以下的合成例2~合成例11中也同樣。<Synthesis Example of Compound (A1)> (Synthesis Example 1) 80.0 parts of 3,3',4,4'-biphenyl was placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. Tetracarboxylic dianhydride, 250.0 parts of pentaerythritol triacrylate (1) having a hydroxyl value of 122 mgKOH/g, 0.24 parts of methyl hydroquinone, and 217.8 parts of cyclohexanone were heated to 60 °C. Then, 1.65 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the infrared (IR) measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peaks around 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 94 mgKOH/g. Next, 140.0 parts of biphenyl glycidyl ether and 91.0 parts of cyclohexanone were added to the solution, and then 2.65 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours to carry out a reaction. While continuing the reaction, the acid value of the reactant was periodically measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the ratio of the reactant containing the compound (A) in the solid content of the obtained resin varnish was 79%. Further, the reactant containing the compound (A) means a high molecular weight reactant containing a by-product of a plurality of hydroxyl groups in the compound (b2) in addition to the compound (A). The ratio of the reactant containing the compound (A) is calculated from the final acid value of the resin varnish. The rest indicates a compound having no hydroxyl group or an unreacted raw material in the compound (b2) used in the reaction. The same applies to the following Synthesis Example 2 to Synthesis Example 11.

(合成例2) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的1,2,3,4-丁烷四羧酸二酐、402.0份的羥值為113 mgKOH/g的季戊四醇三丙烯酸酯(2)、0.33份的甲基對苯二酚、318.0份的環己酮,升溫至60℃。繼而,添加作為催化劑的2.41份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為95 mgKOH/g。 接著,在該溶液中添加182.9份的聯苯縮水甘油醚、118.0份的環己酮,繼而,添加作為催化劑的3.88份的二甲基苄基胺,在100℃下攪拌6小時。一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆固體成分中的包含化合物(A)的反應物為73%。(Synthesis Example 2) In a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer, 80.0 parts of 1,2,3,4-butanetetracarboxylic dianhydride and 402.0 parts of hydroxyl value were charged. It was 113 mg KOH/g of pentaerythritol triacrylate (2), 0.33 part of methyl hydroquinone, and 318.0 parts of cyclohexanone, and the temperature was raised to 60 °C. Then, 2.41 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 95 mgKOH/g. Next, 182.9 parts of biphenyl glycidyl ether and 118.0 parts of cyclohexanone were added to the solution, and then 3.88 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours. While continuing the reaction, the acid value of the reactant was periodically measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the obtained resin varnish solid content was 73%.

(合成例3) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的1,2,4,5-苯四羧酸二酐、364.9份的羥值為113 mgKOH/g的季戊四醇三丙烯酸酯(2)、0.31份的甲基對苯二酚、294.1份的環己酮,升溫至60℃。繼而,添加作為催化劑的2.22份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為93 mgKOH/g。 接著,在該溶液中添加166.0份的聯苯縮水甘油醚、107.1份的環己酮,繼而,添加作為催化劑的3.58份的二甲基苄基胺,在100℃下攪拌6小時,冷卻至室溫而結束反應。一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆固體成分中的包含化合物(A)的反應物為74%。(Synthesis Example 3) In a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer, 80.0 parts of 1,2,4,5-benzenetetracarboxylic dianhydride and 364.9 parts of a hydroxyl value were charged. 113 mg KOH/g of pentaerythritol triacrylate (2), 0.31 part of methyl hydroquinone, and 294.1 parts of cyclohexanone were heated to 60 °C. Then, 2.22 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 93 mgKOH/g. Next, 166.0 parts of biphenyl glycidyl ether and 107.1 parts of cyclohexanone were added to the solution, and then 3.58 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours, and cooled to room. The reaction is terminated. While continuing the reaction, the acid value of the reactant was periodically measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the obtained resin varnish solid content was 74%.

(合成例4) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、359.0份的羥值為85 mgKOH/g的二季戊四醇五丙烯酸酯、0.29份的甲基對苯二酚、290.1份的環己酮,升溫至60℃。繼而,添加作為催化劑的2.19份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為74 mgKOH/g。 然後,添加123.1份的聯苯縮水甘油醚、78.5份的環己酮,繼而,添加作為催化劑的3.53份的二甲基苄基胺,在100℃下攪拌6小時,冷卻至室溫而結束反應。一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為83%。(Synthesis Example 4) 80.0 parts of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 359.0 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. Dipentaerythritol pentaacrylate having a hydroxyl value of 85 mgKOH/g, 0.29 parts of methyl hydroquinone, and 290.1 parts of cyclohexanone were heated to 60 °C. Then, 2.19 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 74 mgKOH/g. Then, 123.1 parts of biphenyl glycidyl ether and 78.5 parts of cyclohexanone were added, and then 3.53 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours, and cooled to room temperature to terminate the reaction. . While continuing the reaction, the acid value of the reactant was periodically measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 83%.

(合成例5) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的9,9-雙(3,4-二羧基苯基)芴二酸酐、160.2份的羥值為122 mgKOH/g的季戊四醇三丙烯酸酯(1)、0.16份的甲基對苯二酚、158.8份的環己酮,升溫至60℃。繼而,添加作為催化劑的1.20份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為82 mgKOH/g。 然後,添加79.0份的聯苯縮水甘油醚、50.7份的環己酮,繼而,添加作為催化劑的1.93份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為79%。(Synthesis Example 5) 80.0 parts of 9,9-bis(3,4-dicarboxyphenyl)sebacic anhydride and 160.2 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. The pentaerythritol triacrylate (1) having a hydroxyl value of 122 mgKOH/g, 0.16 parts of methyl hydroquinone, and 158.8 parts of cyclohexanone were heated to 60 °C. Then, 1.20 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 82 mgKOH/g. Then, 79.0 parts of biphenyl glycidyl ether and 50.7 parts of cyclohexanone were added, and then 1.93 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours, and the reaction was continuously measured while continuing the reaction. When the acid value of the reactant is 5.0 mgKOH/g or less, the reaction is stopped by cooling to room temperature. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 79%.

(合成例6) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的9,9-雙(3,4-二羧基苯基)芴二酸酐、160.2份的羥值為122 mgKOH/g的季戊四醇三丙烯酸酯(1)、0.16份的甲基對苯二酚、158.8份的環己酮,升溫至60℃。繼而,添加作為催化劑的1.20份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為82 mgKOH/g。 然後,添加50.3份的甲基丙烯酸縮水甘油醚、31.6份的環己酮,繼而,添加作為催化劑的1.94份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為75%。(Synthesis Example 6) 80.0 parts of 9,9-bis(3,4-dicarboxyphenyl)sebacic anhydride and 160.2 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. The pentaerythritol triacrylate (1) having a hydroxyl value of 122 mgKOH/g, 0.16 parts of methyl hydroquinone, and 158.8 parts of cyclohexanone were heated to 60 °C. Then, 1.20 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 82 mgKOH/g. Then, 50.3 parts of glycidyl methacrylate and 31.6 parts of cyclohexanone were added, and then 1.94 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction while periodically. The acid value of the reactant was measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 75%.

(合成例7) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、250.0份的羥值為122 mgKOH/g的季戊四醇三丙烯酸酯(1)、0.24份的甲基對苯二酚、217.8份的環己酮,升溫至60℃。繼而,添加作為催化劑的1.65份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為94 mgKOH/g。 然後,添加78.3份的甲基丙烯酸縮水甘油醚、54.0份的環己酮,繼而,添加作為催化劑的2.65份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為76%。(Synthesis Example 7) 80.0 parts of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 250.0 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. Pentaerythritol triacrylate (1) having a hydroxyl value of 122 mgKOH/g, 0.24 parts of methyl hydroquinone, and 217.8 parts of cyclohexanone were heated to 60 °C. Then, 1.65 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 94 mgKOH/g. Then, 78.3 parts of glycidyl methacrylate and 54.0 parts of cyclohexanone were added, and then 2.65 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction while periodically. The acid value of the reactant was measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 76%.

(合成例8) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、359.0份的羥值為85 mgKOH/g的二季戊四醇五丙烯酸酯、0.29份的甲基對苯二酚、290.1份的環己酮,升溫至60℃。繼而,添加作為催化劑的2.19份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為74 mgKOH/g。 然後,添加78.3份的甲基丙烯酸縮水甘油醚、48.7份的環己酮,繼而,添加作為催化劑的3.53份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為69%。(Synthesis Example 8) 80.0 parts of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 359.0 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. Dipentaerythritol pentaacrylate having a hydroxyl value of 85 mgKOH/g, 0.29 parts of methyl hydroquinone, and 290.1 parts of cyclohexanone were heated to 60 °C. Then, 2.19 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 74 mgKOH/g. Then, 78.3 parts of glycidyl methacrylate and 48.7 parts of cyclohexanone were added, and then 3.53 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction while periodically. The acid value of the reactant was measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 69%.

(合成例9) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、63.1份的羥值為483 mgKOH/g的丙烯酸2-羥基乙酯、0.11份的甲基對苯二酚、94.6份的環己酮,升溫至60℃。繼而,添加作為催化劑的0.72份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為215 mgKOH/g。 然後,添加123.1份的聯苯縮水甘油醚、80.9份的環己酮,繼而,添加作為催化劑的1.15份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為89%。(Synthesis Example 9) 80.0 parts of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 63.1 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. The hydroxyl value was 483 mgKOH/g of 2-hydroxyethyl acrylate, 0.11 part of methyl hydroquinone, and 94.6 parts of cyclohexanone, and the temperature was raised to 60 °C. Then, 0.72 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 215 mgKOH/g. Then, 123.1 parts of biphenyl glycidyl ether and 80.9 parts of cyclohexanone were added, and then 1.15 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours, and the reaction was continuously measured while continuing the reaction. When the acid value of the reactant is 5.0 mgKOH/g or less, the reaction is stopped by cooling to room temperature. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 89%.

(合成例10) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、63.1份的羥值為483 mgKOH/g的丙烯酸2-羥基乙酯、0.11份的甲基對苯二酚、94.6份的環己酮,升溫至60℃。繼而,添加作為催化劑的0.72份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為215 mgKOH/g。 然後,添加108.8份的丙烯酸4-羥基丁酯縮水甘油醚、71.4份的環己酮,繼而,添加作為催化劑的1.15份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為89%。 (合成例11) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的3,3',4,4'-聯苯四羧酸二酐、250.0份的羥值為122 mgKOH/g的季戊四醇三丙烯酸酯(1)、0.24份的甲基對苯二酚、217.8份的環己酮,升溫至60℃。繼而,添加作為催化劑的1.65份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為94 mgKOH/g。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為94 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的包含化合物(A)的反應物為72%。(Synthesis Example 10) 80.0 parts of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 63.1 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. The hydroxyl value was 483 mgKOH/g of 2-hydroxyethyl acrylate, 0.11 part of methyl hydroquinone, and 94.6 parts of cyclohexanone, and the temperature was raised to 60 °C. Then, 0.72 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 215 mgKOH/g. Then, 108.8 parts of 4-hydroxybutyl acrylate glycidyl ether and 71.4 parts of cyclohexanone were added, and then 1.15 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction. The acid value of the reactant was periodically measured. When the acid value was 5.0 mgKOH/g or less, the reaction was stopped by cooling to room temperature. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 89%. (Synthesis Example 11) 80.0 parts of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 250.0 parts were placed in a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer. Pentaerythritol triacrylate (1) having a hydroxyl value of 122 mgKOH/g, 0.24 parts of methyl hydroquinone, and 217.8 parts of cyclohexanone were heated to 60 °C. Then, 1.65 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 94 mgKOH/g. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 94 mgKOH/g. Therefore, the reactant containing the compound (A) in the solid content of the obtained resin varnish was 72%.

(合成例12) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的1,2,3,4-丁烷四羧酸二酐、402.0份的羥值為113 mgKOH/g的季戊四醇三丙烯酸酯(2)、0.34份的甲基對苯二酚、203.8份的環己酮,升溫至60℃。繼而,添加作為催化劑的1.75份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為95 mgKOH/g。 然後,添加116.4份的甲基丙烯酸縮水甘油醚、188.5份的環己酮,繼而,添加作為催化劑的3.88份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的反應物為71%。此外,反應物不包含化合物(A)。在以下的合成例13、合成例14中也同樣。(Synthesis Example 12) In a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer, 80.0 parts of 1,2,3,4-butanetetracarboxylic dianhydride and 402.0 parts of hydroxyl value were charged. It was 113 mg KOH/g of pentaerythritol triacrylate (2), 0.34 part of methyl hydroquinone, and 203.8 parts of cyclohexanone, and the temperature was raised to 60 °C. Then, 1.75 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 95 mgKOH/g. Then, 116.4 parts of glycidyl methacrylate and 188.5 parts of cyclohexanone were added, and then 3.88 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction while periodically. The acid value of the reactant was measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g, so that the reactant in the solid content of the obtained resin varnish was 71%. Further, the reactant does not contain the compound (A). The same applies to Synthesis Example 13 and Synthesis Example 14 below.

(合成例13) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的1,2,4,5-苯四羧酸二酐、364.9份的羥值為113 mgKOH/g的季戊四醇三丙烯酸酯(2)、0.31份的甲基對苯二酚、293.9份的環己酮,升溫至60℃。繼而,添加作為催化劑的2.22份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為93 mgKOH/g。 然後,添加105.6份的甲基丙烯酸縮水甘油醚、66.9份的環己酮,繼而,添加作為催化劑的3.58份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的反應物為71%。(Synthesis Example 13) In a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer, 80.0 parts of 1,2,4,5-benzenetetracarboxylic dianhydride and 364.9 parts of a hydroxyl value were charged. 113 mg KOH/g of pentaerythritol triacrylate (2), 0.31 part of methyl hydroquinone, and 293.9 parts of cyclohexanone were heated to 60 °C. Then, 2.22 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 93 mgKOH/g. Then, 105.6 parts of glycidyl methacrylate and 66.9 parts of cyclohexanone were added, and then 3.58 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction while periodically. The acid value of the reactant was measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g, so that the reactant in the solid content of the obtained resin varnish was 71%.

(合成例14) 在具備攪拌機、回流冷卻管、乾燥空氣導入管、溫度計的四口燒瓶中,投入80.0份的1,2,3,4-丁烷四羧酸二酐、533.3份的羥值為85 mgKOH/g的二季戊四醇五丙烯酸酯、0.37份的甲基對苯二酚、405.5份的環己酮,升溫至60℃。繼而,添加作為催化劑的3.07份的1,8-二氮雜雙環[5.4.0]-7-十一烯,在90℃下攪拌8小時。在反應物的IR測定中確認到酸酐基的峰值、即1780 cm-1 及1850 cm-1 附近的峰值消失後,進行冷卻,使反應停止。在該時間點測定反應物的酸值,結果為75 mgKOH/g。 然後,添加116.4份的甲基丙烯酸縮水甘油醚、72.6份的環己酮,繼而,添加作為催化劑的4.93份的二甲基苄基胺,在100℃下攪拌6小時,一邊繼續反應,一邊定期測定反應物的酸值,當酸值成為5.0 mgKOH/g以下時,冷卻至室溫而使反應停止。所獲得的樹脂清漆為淡黃色透明,固體成分為60%,最終的酸值為3.0 mgKOH/g,因此所獲得的樹脂清漆的固體成分中的反應物為68%。(Synthesis Example 14) In a four-necked flask equipped with a stirrer, a reflux cooling tube, a dry air introduction tube, and a thermometer, 80.0 parts of 1,2,3,4-butanetetracarboxylic dianhydride and 533.3 parts of a hydroxyl value were charged. The temperature was raised to 60 ° C at 85 mg KOH/g dipentaerythritol pentaacrylate, 0.37 parts methyl hydroquinone, and 405.5 parts cyclohexanone. Then, 3.07 parts of 1,8-diazabicyclo[5.4.0]-7-undecene as a catalyst was added, and the mixture was stirred at 90 ° C for 8 hours. In the IR measurement of the reactant, it was confirmed that the peak of the acid anhydride group, that is, the peak near 1780 cm -1 and 1850 cm -1 disappeared, and then the reaction was stopped to stop the reaction. The acid value of the reactant was measured at this time point and found to be 75 mgKOH/g. Then, 116.4 parts of glycidyl methacrylate and 72.6 parts of cyclohexanone were added, and then 4.93 parts of dimethylbenzylamine as a catalyst was added, and the mixture was stirred at 100 ° C for 6 hours while continuing the reaction while periodically. The acid value of the reactant was measured. When the acid value was 5.0 mgKOH/g or less, the reaction was cooled to room temperature to stop the reaction. The obtained resin varnish was light yellow transparent, the solid content was 60%, and the final acid value was 3.0 mgKOH/g, so that the reactant in the solid content of the obtained resin varnish was 68%.

在表1中示出合成的總結、以及所獲得的反應物的概要。表中記載的簡稱表示化合物的製品名。A summary of the synthesis and an overview of the reactants obtained are shown in Table 1. The abbreviations described in the table indicate the product names of the compounds.

[表1]   表.1 [Table 1] Table 1.

(金屬氧化物組成物的製作) 使用通過所述合成例來製作的含有化合物(A)的樹脂清漆,根據表2所示的配方(份)來進行金屬氧化物的分散,製作分散有金屬氧化物的金屬氧化物組成物。 此外,樹脂清漆使用所述合成例中製作者。 分散方法是以預分散(使用氧化鋯珠(0.5 mm)作為介質,利用塗料攪拌器(paint shaker)分散1小時)、與正式分散(使用氧化鋯珠(0.1 mm)作為介質,利用壽工業(股)製造的分散機UAM-015來分散)的兩個階段來進行。(Preparation of metal oxide composition) The resin varnish containing the compound (A) produced by the above-mentioned synthesis example was used, and the metal oxide was dispersed according to the formulation (parts) shown in Table 2 to prepare a dispersed metal oxide. Metal oxide composition of matter. Further, a resin varnish was used as a producer in the synthesis example. The dispersion method was predispersed (using zirconia beads (0.5 mm) as a medium, dispersed by a paint shaker for 1 hour), and officially dispersed (using zirconia beads (0.1 mm) as a medium, using Shou Industrial ( The production of the disperser UAM-015 to disperse) is carried out in two stages.

[表2]   表.2 [Table 2] Table 2.

下述示出表2中的簡稱。 TiO2 :帝化(Tayca)(股)製造的“MT-05”(平均一次粒徑:10 nm) ZrO2 :日本電工(股)製造的“PCS-60”(平均一次粒徑:20 nm) BaTiO3 :堺化學工業(股)製造的“KZM-20”(平均一次粒徑:20 nm) ZnO:堺化學工業(股)製造的“凡奈克斯(FINEX)-50”(平均一次粒徑:20 nm) SiO2 :日本艾羅西爾(Nippon Aerosil)(股)製造的“艾羅西爾(AEROSIL)50”(平均一次粒徑:50 nm) Al2 O3 :日本艾羅西爾(Nippon Aerosil)(股)製造的“氧化鋁(Aluminium Oxide)C”(平均一次粒徑:13 nm) MEK:甲基乙基酮 Methobuta:3-甲氧基-1-丁醇The abbreviation in Table 2 is shown below. TiO 2 : "MT-05" manufactured by Tayca Co., Ltd. (average primary particle diameter: 10 nm) ZrO 2 : "PCS-60" manufactured by Nippon Electric Co., Ltd. (average primary particle diameter: 20 nm) BaTiO 3 : "KZM-20" manufactured by 堺Chemical Industries Co., Ltd. (average primary particle size: 20 nm) ZnO: "FINEX-50" manufactured by 堺Chemical Industries Co., Ltd. (on average Particle size: 20 nm) SiO 2 : "AEROSIL 50" manufactured by Nippon Aerosil Co., Ltd. (average primary particle size: 50 nm) Al 2 O 3 : Japan Airo "Aluminium Oxide C" (average primary particle size: 13 nm) manufactured by Nippon Aerosil Co., Ltd. MEK: methyl ethyl ketone Methobuta: 3-methoxy-1-butanol

<D50粒徑> 所獲得的金屬氧化物組成物的D50粒徑是使用日機裝(股)製造的“納奇克(Nanotrac)UPA”來測定。在實用上必須為200 nm以下。<D50 Particle Size> The D50 particle diameter of the obtained metal oxide composition was measured using "Nnotrac UPA" manufactured by Nikkiso Co., Ltd. Practically, it must be below 200 nm.

<硬化性樹脂組成物與積層體的製作及其評價:實施例1~實施例33、比較例1~比較例7> (實施例1) 將作為具有芴結構及2個丙烯醯基的化合物(A)的9,9-雙[4-(2-丙烯醯氧基乙氧基)苯基]芴(商品名:“NK酯(NK Ester)A-BPEF”,新中村化學公司製造)、以及作為具有3個以上(甲基)丙烯醯基的化合物(X)的季戊四醇四丙烯酸酯(商品名:“亞羅尼斯(Aronix)M450”,東亞合成公司製造),以成為(A):(X)=30份:70份的方式進行混合,進而混合作為光聚合起始劑的5份的豔佳固(Irgacure)184(汽巴精化製造)、丙二醇單甲醚,獲得經調整為固體成分成為40%的硬化性樹脂組成物(也稱為塗佈用組成物或者塗液)。 利用棒塗佈機,以乾燥後的膜厚成為1.5 μm的方式,將所述組成物塗敷於125 μm厚的易黏接處理聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)膜(東麗(Toray)(股)製造的“露米勒(Lumirror)UH13”)上後,利用高壓水銀燈來照射400 mJ/cm2 的紫外線,形成樹脂層。然後,利用高壓水銀燈來照射1次至3次2000 mJ/cm2 的紫外線。 在所獲得的作為活性能量線硬化膜的樹脂層上,利用濺射法,以作為透明導電膜的ITO膜的厚度成為30 nm的方式積層後,僅對透明導電膜進行圖案加工(蝕刻處理)而形成為條紋狀,獲得積層體。<Preparation and Evaluation of Curable Resin Composition and Laminate: Examples 1 to 33 and Comparative Examples 1 to 7 (Example 1) A compound having an anthracene structure and two propylene groups ( A9,9-bis[4-(2-acryloxyethoxy)phenyl]anthracene (trade name: "NK Ester A-BPEF", manufactured by Shin-Nakamura Chemical Co., Ltd.), and Pentaerythritol tetraacrylate (trade name: "Aronix M450", manufactured by Toagosei Co., Ltd.) having a compound (X) having three or more (meth) acrylonitrile groups, to be (A): (X) = 30 parts: 70 parts of the mixture were mixed, and 5 parts of Irgacure 184 (manufactured by Ciba Specialty Chemicals) and propylene glycol monomethyl ether as a photopolymerization initiator were mixed to obtain a solid content. 40% of a curable resin composition (also referred to as a coating composition or a coating liquid). The composition was applied to a 125 μm thick adhesive polyethylene terephthalate (PET) film by a bar coater so that the film thickness after drying became 1.5 μm. After "Lumirror UH13" manufactured by Toray Co., Ltd., a high-pressure mercury lamp was used to irradiate ultraviolet rays of 400 mJ/cm 2 to form a resin layer. Then, the high-pressure mercury lamp was used to irradiate the ultraviolet rays of 2000 mJ/cm 2 once to three times. On the resin layer as the active energy ray-cured film obtained by the sputtering method, the thickness of the ITO film as the transparent conductive film is 30 nm, and only the transparent conductive film is patterned (etched). It is formed into a stripe shape to obtain a laminate.

(實施例2) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X)的比率變更為(A):(X)=50:50以外,以與實施例1相同的方式獲得積層體。(Example 2) The same as Example 1 except that the ratio of NK ester (NK Ester) A-BPEF (A) to pentaerythritol tetraacrylate (X) was changed to (A): (X) = 50:50. The way to get the laminate.

(實施例3) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X)的比率變更為(A):(X)=70:30以外,以與實施例1相同的方式獲得積層體。(Example 3) The same as Example 1 except that the ratio of NK ester (NK Ester) A-BPEF (A) to pentaerythritol tetraacrylate (X) was changed to (A): (X) = 70:30. The way to get the laminate.

(實施例4) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X)的比率變更為(A):(X)=100:0以外,以與實施例1相同的方式獲得積層體。(Example 4) The same as Example 1 except that the ratio of NK ester (NK Ester) A-BPEF (A) to pentaerythritol tetraacrylate (X) was changed to (A): (X) = 100:0. The way to get the laminate.

(實施例5) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(A):(X):金屬氧化物的粒子成分=10:40:50以外,以與實施例1相同的方式獲得積層體。(Example 5) Except that NK ester (NK Ester) A-BPEF (A) and pentaerythritol tetraacrylate (X), and zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (A): (X): the particle component of the metal oxide = 10:40:50, the same as in the first embodiment The way to get the laminate.

(實施例6) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(A):(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例1相同的方式獲得積層體。(Example 6) Except that NK ester (NK Ester) A-BPEF (A) and pentaerythritol tetraacrylate (X), and zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (A): (X): the particle component of the metal oxide = 25:25:50, the same as in the first embodiment The way to get the laminate.

(實施例7) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(A):(X):金屬氧化物的粒子成分=35:15:50以外,以與實施例1相同的方式獲得積層體。(Example 7) Except that NK ester (NK Ester) A-BPEF (A) and pentaerythritol tetraacrylate (X), and zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (A): (X): the particle content of the metal oxide = 35:15:50, the same as in the first embodiment The way to get the laminate.

(實施例8) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(A):(X):金屬氧化物的粒子成分=50:0:50以外,以與實施例1相同的方式獲得積層體。(Example 8) Except that NK ester (NK Ester) A-BPEF (A) and pentaerythritol tetraacrylate (X), and zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (A): (X): the particle content of the metal oxide = 50:0:50, the same as in the first embodiment The way to get the laminate.

(實施例9) 將作為具有聯苯結構及2個以上(甲基)丙烯醯基的化合物(A)的合成例1與作為具有3個以上(甲基)丙烯醯基的化合物(X)的季戊四醇四丙烯酸酯(商品名:“亞羅尼斯(Aronix)M450”,東亞合成公司製造),以成為合成例1的包含化合物(A)的反應物:(X)=30:70的方式進行混合,進而混合作為光聚合起始劑的5份的豔佳固(Irgacure)184(汽巴精化製造)、丙二醇單甲醚,獲得經調整為固體成分成為40%的硬化性組成物(也稱為塗佈用組成物或塗液)。 利用棒塗佈機,以乾燥後的膜厚成為1.5 μm的方式,將該組成物塗敷於125 μm厚的易黏接處理PET膜(東麗(Toray)(股)製造的“露米勒(Lumirror)UH13”)上後,利用高壓水銀燈照射400 mJ/cm2 的紫外線,形成樹脂層。然後,利用高壓水銀燈照射1次至3次2000 mJ/cm2 的紫外線。 在所獲得的作為活性能量線硬化膜的樹脂層上,以作為透明導電膜的ITO膜的厚度成為30 nm的方式利用濺射法來積層後,僅對透明導電膜進行圖案加工(蝕刻處理)而形成為條紋狀,獲得積層體。(Example 9) Synthesis Example 1 which is a compound (A) having a biphenyl structure and two or more (meth) acryl fluorenyl groups, and a compound (X) having three or more (meth) acryl fluorenyl groups Pentaerythritol tetraacrylate (trade name: "Aronix M450", manufactured by Toagosei Co., Ltd.), mixed in such a manner that the reaction product containing the compound (A) of Synthesis Example 1: (X) = 30:70 Further, 5 parts of Irgacure 184 (manufactured by Ciba Specialty Chemicals) and propylene glycol monomethyl ether as a photopolymerization initiator were mixed to obtain a curable composition adjusted to have a solid content of 40% (also referred to as a hardening composition). It is a coating composition or coating liquid). The composition was applied to a 125 μm-thick adhesive PET film (Toray Miller) by a bar coater so that the film thickness after drying became 1.5 μm. After (Lumirror) UH13"), ultraviolet rays of 400 mJ/cm 2 were irradiated with a high pressure mercury lamp to form a resin layer. Then, ultraviolet rays of 2000 mJ/cm 2 were irradiated once to three times with a high pressure mercury lamp. On the resin layer as the active energy ray-cured film, the thickness of the ITO film as the transparent conductive film is 30 nm, and the transparent conductive film is patterned (etched). It is formed into a stripe shape to obtain a laminate.

(實施例10) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X)的比率變更為合成例1的包含化合物(A)的反應物:(X)=50:50以外,以與實施例9相同的方式獲得積層體。(Example 10) The ratio of the reaction product containing the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X) was changed to the reaction product containing the compound (A) of Synthesis Example 1: (X) = 50: A laminate was obtained in the same manner as in Example 9 except for 50.

(實施例11) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X)的比率變更為合成例1的包含化合物(A)的反應物:(X)=70:30以外,以與實施例9相同的方式獲得積層體。(Example 11) The ratio of the reaction product containing the compound (A) of Synthesis Example 1 and the pentaerythritol tetraacrylate (X) was changed to the reaction product containing the compound (A) of Synthesis Example 1: (X) = 70: A laminate was obtained in the same manner as in Example 9 except for 30.

(實施例12) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=10:40:50以外,以與實施例9相同的方式獲得積層體。(Example 12) The reaction product containing the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30% by weight and a particle diameter of 15 nm as a metal oxide were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 1: (X): particle composition of the metal oxide = 10:40:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例13) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 13) The reaction product containing the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30% by weight and a particle diameter of 15 nm as a metal oxide were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 1: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例14) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=35:15:50以外,以與實施例9相同的方式獲得積層體。(Example 14) Except that the reactant containing the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 1: (X): particle composition of the metal oxide = 35:15:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例15) 除了將合成例2的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例2的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 15) Except that the reactant containing the compound (A) of Synthesis Example 2 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 2: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例16) 除了將合成例3的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例3的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 16) Except that the reactant containing the compound (A) of Synthesis Example 3 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 3: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例17) 除了將合成例4的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例4的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 17) The reaction product containing the compound (A) of Synthesis Example 4 and the pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30% by weight and a particle diameter of 15 nm as a metal oxide were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 4: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例18) 除了將合成例5的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例5的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 18) The reaction product containing the compound (A) of Synthesis Example 5 and the pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30% by weight and a particle diameter of 15 nm as a metal oxide were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 5: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例19) 除了將合成例6的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例6的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 19) Except that the reactant containing the compound (A) of Synthesis Example 6 and pentaerythritol tetraacrylate (X), and the particle concentration of the metal oxide of 30% by weight and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 6: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例20) 除了將合成例7的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例7的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 20) The reaction product containing the compound (A) of Synthesis Example 7 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 7: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例21) 除了將合成例8的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例8的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 21) Except that the reactant containing the compound (A) of Synthesis Example 8 and pentaerythritol tetraacrylate (X), and the particle concentration of the metal oxide of 30% by weight and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 8: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例22) 除了將合成例9的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例9的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 22) Except that the reactant containing the compound (A) of Synthesis Example 9 and pentaerythritol tetraacrylate (X), and the particle concentration of the metal oxide of 30% by weight and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 9: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例23) 除了將合成例10的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例10的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 23) Except that the reactant containing the compound (A) of Synthesis Example 10 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 10: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例24) 除了將合成例11的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為合成例11的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例9相同的方式獲得積層體。(Example 24) Except that the reactant containing the compound (A) of Synthesis Example 11 and pentaerythritol tetraacrylate (X), and the zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to the reaction product containing the compound (A) of Synthesis Example 11: (X): particle composition of the metal oxide = 25:25:50 A laminate was obtained in the same manner as in Example 9 except for the same.

(實施例25) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(1),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例9相同的方式獲得積層體。(Example 25) The reaction product of the compound (A) of Synthesis Example 1 and the pentaerythritol tetraacrylate (X), and the metal oxide composition (1) containing the synthesis example (1) as a metal oxide, The laminate was obtained in the same manner as in Example 9 except that the reactant of the compound (A) of Synthesis Example 1 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例26) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(2),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例25相同的方式獲得積層體。(Example 26) The reaction product of the compound (A) of Synthesis Example 1 and the pentaerythritol tetraacrylate (X), and the metal oxide composition (2) containing the synthesis example (1) as a metal oxide, The laminate was obtained in the same manner as in Example 25 except that the reactant of the compound (A) of the synthesis example 1 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例27) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(3),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例25相同的方式獲得積層體。(Example 27) Except that the reactant containing the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X), and the metal oxide composition (3) containing the synthesis example (1) as a metal oxide, The laminate was obtained in the same manner as in Example 25 except that the reactant of the compound (A) of the synthesis example 1 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例28) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(4),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例25相同的方式獲得積層體。(Example 28) In addition to the reaction product containing the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X), and the metal oxide composition (4) containing the synthesis example (1) as a metal oxide, The laminate was obtained in the same manner as in Example 25 except that the reactant of the compound (A) of the synthesis example 1 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例29) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(5),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例25相同的方式獲得積層體。(Example 29) The reaction product of the compound (A) of Synthesis Example 1 and pentaerythritol tetraacrylate (X), and the metal oxide composition (5) containing the synthesis example (1) as a metal oxide, The laminate was obtained in the same manner as in Example 25 except that the reactant of the compound (A) of the synthesis example 1 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例30) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(6),變更為合成例1的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例25相同的方式獲得積層體。(Example 30) The reaction product of the compound (A) of Synthesis Example 1 and the pentaerythritol tetraacrylate (X), and the metal oxide composition (6) containing the synthesis example (1) as a metal oxide, The laminate was obtained in the same manner as in Example 25 except that the reactant of the compound (A) of the synthesis example 1 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例31) 除了將合成例1的包含化合物(A)的反應物與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的包含合成例(7)的金屬氧化物組成物(7),變更為合成例7的包含化合物(A)的反應物:(X):金屬氧化物的粒子成分=40:11:49以外,以與實施例25相同的方式獲得積層體。(Example 31) The reaction product of the compound (A) of Synthesis Example 1 and the pentaerythritol tetraacrylate (X), and the metal oxide composition (7) containing the synthesis example (7) as a metal oxide, The laminate was obtained in the same manner as in Example 25 except that the reactant of the compound (A) of Synthesis Example 7 was changed: (X): the particle component of the metal oxide = 40:11:49.

(實施例32) 除了將NK酯(NK Ester)A-BPEF以及作為金屬氧化物的包含合成例(1)的金屬氧化物組成物(1)中的包含化合物(A)的反應物、季戊四醇四丙烯酸酯(X),變更為(A):(X):金屬氧化物的粒子成分=47:4:49以外,以與實施例25相同的方式獲得積層體。(Example 32) A reactant containing the compound (A), pentaerythritol IV, in addition to the NK ester (NK Ester) A-BPEF and the metal oxide composition (1) containing the synthesis example (1) as a metal oxide The layered body was obtained in the same manner as in Example 25 except that the acrylate (X) was changed to (A): (X): the particle component of the metal oxide = 47:4:49.

(實施例33) 除了將NK酯(NK Ester)A-BPEF以及作為金屬氧化物的包含合成例(7)的金屬氧化物組成物(7)中的包含化合物(A)的反應物、季戊四醇四丙烯酸酯(X),變更為(A):(X):金屬氧化物的粒子成分=46:5:49以外,以與實施例25相同的方式獲得積層體。(Example 33) A reactant containing the compound (A), pentaerythritol IV, in addition to the NK ester (NK Ester) A-BPEF and the metal oxide composition (7) containing the synthesis example (7) as a metal oxide The layered body was obtained in the same manner as in Example 25 except that the acrylate (X) was changed to (A): (X): the particle component of the metal oxide = 46:5:49.

(比較例1) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X)的比率變更為(A):(X)=0:100以外,以與實施例1相同的方式獲得積層體。(Comparative Example 1) The same as Example 1 except that the ratio of NK ester (NK Ester) A-BPEF (A) to pentaerythritol tetraacrylate (X) was changed to (A): (X) = 0:100. The way to get the laminate.

(比較例2) 除了將NK酯(NK Ester)A-BPEF(A)與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(A):(X):金屬氧化物的粒子成分=0:50:50以外,以與實施例1相同的方式獲得積層體。(Comparative Example 2) Except that NK ester (NK Ester) A-BPEF (A) and pentaerythritol tetraacrylate (X), and zirconia having a particle concentration of 30 wt% as a metal oxide and having a particle diameter of 15 nm were dispersed. The product (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (A): (X): the particle content of the metal oxide was 0:50:50, and the same as in the first embodiment. The way to get the laminate.

(比較例3) 除了將不具有(甲基)丙烯醯基的9,9-雙[4-(2-羥基乙氧基)苯基]芴與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為9,9-雙[4-(2-羥基乙氧基)苯基]芴:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例1相同的方式獲得積層體。(Comparative Example 3) except that 9,9-bis[4-(2-hydroxyethoxy)phenyl]fluorene having no (meth)acryl fluorenyl group and pentaerythritol tetraacrylate (X), and oxidation as a metal A zirconia dispersion having a particle concentration of 30% by weight and a particle diameter of 15 nm (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to 9,9-bis [4-(2- A layered body was obtained in the same manner as in Example 1 except that the particle component of the metal oxide = 25:25:50 was used for the hydroxyethoxy)phenyl]anthracene: (X).

(比較例4) 除了將具有1個(甲基)丙烯醯基的乙氧基化鄰苯基苯酚丙烯酸酯與季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為乙氧基化鄰苯基苯酚丙烯酸酯:(X):金屬氧化物的粒子成分=25:25:50以外,以與實施例1相同的方式獲得積層體。(Comparative Example 4) except that ethoxylated o-phenylphenol acrylate having one (meth)acrylinyl group and pentaerythritol tetraacrylate (X), and a particle concentration of the metal oxide were 30% by weight, A zirconia dispersion having a particle size of 15 nm (trade name: "ZR-010", manufactured by Solar Co., Ltd.), changed to ethoxylated o-phenylphenol acrylate: (X): particles of metal oxide A laminate was obtained in the same manner as in Example 1 except that the composition = 25:25:50.

(比較例5) 除了將包含不具有芴結構及/或聯苯結構的合成例(12)的反應物及季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(X):金屬氧化物的粒子成分=50:50以外,以與實施例1相同的方式獲得積層體。(Comparative Example 5) A reaction product containing the synthesis example (12) having no fluorene structure and/or a biphenyl structure, and pentaerythritol tetraacrylate (X), and a particle concentration of the metal oxide of 30% by weight, granules The zirconia dispersion having a diameter of 15 nm (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (X): the particle content of the metal oxide = 50:50, and Example 1 The laminate is obtained in the same manner.

(比較例6) 除了將包含不具有芴結構及/或聯苯結構的合成例(13)的反應物及季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(X):金屬氧化物的粒子成分=50:50以外,以與實施例1相同的方式獲得積層體。(Comparative Example 6) A reaction product containing the synthesis example (13) having no fluorene structure and/or a biphenyl structure, and pentaerythritol tetraacrylate (X), and a particle concentration of the metal oxide as 30% by weight, granules The zirconia dispersion having a diameter of 15 nm (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (X): the particle content of the metal oxide = 50:50, and Example 1 The laminate is obtained in the same manner.

(比較例7) 除了將包含不具有芴結構及/或聯苯結構的合成例(14)的反應物及季戊四醇四丙烯酸酯(X),以及作為金屬氧化物的粒子濃度為30重量%、粒徑為15 nm的氧化鋯分散體(商品名:“ZR-010”,太陽(Solar)公司製造),變更為(X):金屬氧化物的粒子成分=50:50以外,以與實施例1相同的方式獲得積層體。(Comparative Example 7) A reaction product containing the synthesis example (14) having no fluorene structure and/or a biphenyl structure, and pentaerythritol tetraacrylate (X), and a particle concentration of the metal oxide as 30% by weight, granules The zirconia dispersion having a diameter of 15 nm (trade name: "ZR-010", manufactured by Solar Co., Ltd.) was changed to (X): the particle content of the metal oxide = 50:50, and Example 1 The laminate is obtained in the same manner.

(評價方法) 密合性是在積層透明導電膜前及積層透明導電膜後實施評價。 關於透明性、耐擦傷性,在積層透明導電膜之前實施評價。將評價結果示於表3及表4。(Evaluation method) The adhesion was evaluated before laminating the transparent conductive film and after laminating the transparent conductive film. Regarding transparency and scratch resistance, evaluation was performed before laminating a transparent conductive film. The evaluation results are shown in Tables 3 and 4.

下述示出表3及表4中的簡稱。此外,表中記載的調配量的單位為份。 光聚合起始劑:汽巴精化(股)製造的“豔佳固(Irgacure)184” 溶劑:PGME(丙二醇單甲醚) [表3] 表3 The abbreviations in Tables 3 and 4 are shown below. In addition, the unit of the amount of preparation described in the table is a part. Photopolymerization initiator: "Irgacure 184" manufactured by Ciba Specialty Chemicals (Solvent): PGME (propylene glycol monomethyl ether) [Table 3] Table 3

[表4] 表4 [Table 4] Table 4

(1)密合性(透明導電膜積層前) 依據JIS K5600-5-6,利用附著性交叉切割法來評價耐性。將其結果分類為下述的0~5。在實用上必須為分類0或分類1。 0:切口的邊緣完全光滑,任一格子眼中均無剝落。 1:切口的交叉點的積層體有小的剝落,每單位面積有小於5%的剝落。 2:積層體沿著切口的邊緣,及/或在交叉點剝落。每單位面積有5%以上且小於15%的剝落。 3:積層體沿著切口的邊緣,部分或全面性地產生大的剝落,及/或格子眼的許多部分會部分或全面性地剝落。每單位面積有15%以上且小於35%的剝落。 4:積層體沿著切口的邊緣,部分或全面性地產生大的剝落,及/或數個部位的格子眼會部分或全面性地剝落。每單位面積有小於35%的剝落。 5:每單位面積有35%以上的剝落。(1) Adhesion (before lamination of transparent conductive film) Resistance was evaluated by an adhesive cross-cut method in accordance with JIS K5600-5-6. The results were classified into the following 0 to 5. In practice, it must be Category 0 or Category 1. 0: The edge of the slit is completely smooth and there is no peeling in any of the lattice eyes. 1: The layered body at the intersection of the slits has a small peeling, and there is less than 5% peeling per unit area. 2: The laminate is peeled off along the edge of the slit and/or at the intersection. There is 5% or more and less than 15% peeling per unit area. 3: The laminate body partially or comprehensively produces large peeling along the edge of the slit, and/or many portions of the lattice eye are partially or completely peeled off. There is more than 15% and less than 35% peeling per unit area. 4: The laminate body partially or comprehensively produces large peeling along the edge of the slit, and/or the lattice eyes of several portions are partially or comprehensively peeled off. There is less than 35% peeling per unit area. 5: More than 35% of the peeling per unit area.

(2)密合性(透明導電膜積層後) 依據JIS K5600-5-6,利用附著性交叉切割法來評價耐性。 作為評價方法,將試驗結果分類為下述的0~5。由此評價的基材與樹脂層及透明導電膜的密合性在實用上必須為分類0或分類1。此處,通過對積層體進行目視確認或者測定膜厚,可確認基材與樹脂層的剝離。 0:切口的邊緣完全光滑,任一格子眼中均無剝落。 1:切口的交叉點的積層體有小的剝落。每單位面積有小於5%的剝落。 2:積層體沿著切口的邊緣,及/或在交叉點剝落。每單位面積有5%以上且小於15%的剝落。 3:積層體沿著切口的邊緣,部分或全面性地產生大的剝落,及/或格子眼的許多部分會部分或全面性地剝落。每單位面積有15%以上且小於35%的剝落。 4:積層體沿著切口的邊緣,部分或全面性地產生大的剝落,及/或數個部位的格子眼會部分或全面性地剝落。每單位面積有小於35%的剝落。 5:每單位面積有35%以上的剝落。(2) Adhesiveness (after lamination of a transparent conductive film) Resistance was evaluated by an adhesive cross-cut method in accordance with JIS K5600-5-6. As a method of evaluation, the test results were classified into the following 0 to 5. The adhesion of the substrate thus evaluated to the resin layer and the transparent conductive film must be practically classified into Category 0 or Category 1. Here, the peeling of the base material and the resin layer can be confirmed by visually confirming the laminated body or measuring the film thickness. 0: The edge of the slit is completely smooth and there is no peeling in any of the lattice eyes. 1: The laminate of the intersection of the slits has a small peeling. Less than 5% peeling per unit area. 2: The laminate is peeled off along the edge of the slit and/or at the intersection. There is 5% or more and less than 15% peeling per unit area. 3: The laminate body partially or comprehensively produces large peeling along the edge of the slit, and/or many portions of the lattice eye are partially or completely peeled off. There is more than 15% and less than 35% peeling per unit area. 4: The laminate body partially or comprehensively produces large peeling along the edge of the slit, and/or the lattice eyes of several portions are partially or comprehensively peeled off. There is less than 35% peeling per unit area. 5: More than 35% of the peeling per unit area.

(3)透明性(霧度值) 使用霧度計來測定積層透明導電膜之前的具有基材與樹脂層的積層體的濁度(霧度值)。在實用上,霧度值必須為1.5%以下。(3) Transparency (haze value) The haze (haze value) of the laminate having the substrate and the resin layer before laminating the transparent conductive film was measured using a haze meter. Practically, the haze value must be 1.5% or less.

(4)耐擦傷性(硬塗性) 將積層透明導電膜之前的具有基材與樹脂層的積層體設置於學振(Gakushin-type Rubbing Tester)試驗機上,使用鋼絲絨的No.0000,以負重250 g使其學振10次。對於取出的積層體,依據以下5個階段的目視評價來判斷受傷的情況。數值越大,表示積層體的耐擦傷性越良好。 5:完全無傷痕。 4:帶有少量傷痕。 3:帶有傷痕,但看不到基材。 2:帶有傷痕,一部分硬化膜剝落。 1:硬化膜剝落,基材為露出的狀態。(4) Scratch resistance (hard-coating property) The laminated body which has the base material and the resin layer before laminating the transparent conductive film was set on the Gakushin-type Rubbing Tester test machine, and No.0000 of steel wool was used. It was tempered 10 times with a load of 250 g. For the taken-out laminate, the injury was judged based on the visual evaluation of the following five stages. The larger the value, the better the scratch resistance of the laminate. 5: Completely free of scars. 4: With a small amount of scars. 3: With a flaw, but the substrate is not visible. 2: With a scar, a part of the hardened film peeled off. 1: The cured film peeled off and the substrate was exposed.

根據表3及表4的結果而判明,實施例1~實施例33的積層體的透明性與密合性的平衡性良好而優異。另外,即便作為活性能量線硬化膜的樹脂層中包含金屬氧化物,透明性與密合性也平衡性良好而優異。From the results of Tables 3 and 4, it was found that the laminates of Examples 1 to 33 were excellent in transparency and adhesion balance. In addition, even if a metal oxide is contained in the resin layer as the active energy ray-cured film, the transparency and the adhesion are excellent and the balance is excellent.

與此相對,不含化合物(A)的比較例(1)至比較例(7)的聚酯基材與作為活性能量線硬化膜的樹脂層的密合性以及作為活性能量線硬化膜的樹脂層與透明導電膜的密合性均為不足。On the other hand, the adhesion between the polyester base material of Comparative Example (1) to Comparative Example (7) containing no compound (A) and the resin layer as the active energy ray-curing film, and the resin as the active energy ray-curing film The adhesion between the layer and the transparent conductive film is insufficient.

no

Claims (9)

一種積層體,其在作為聚酯膜的基材上具有將包含化合物(A)的活性能量線硬化性組成物硬化而成的樹脂層,所述化合物(A)具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基,且所述積層體更具有透明導電膜。A laminate comprising a resin layer obtained by curing an active energy ray-curable composition containing a compound (A) having a fluorene structure and/or a biphenyl group on a substrate as a polyester film. The structure and the two or more (meth)acrylonitrile groups, and the laminate further has a transparent conductive film. 如申請專利範圍第1項所述的積層體,其中所述樹脂層是將如下組成物硬化而成的層,所述組成物更包含具有3個以上的(甲基)丙烯醯基的化合物(X)(其中,為化合物(A)的情況除外)。The laminate according to claim 1, wherein the resin layer is a layer obtained by hardening a composition further comprising a compound having three or more (meth) acrylonitrile groups ( X) (except in the case of the compound (A)). 如申請專利範圍第2項所述的積層體,其中在具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A),與具有3個以上的(甲基)丙烯醯基的化合物(X)(其中,為化合物(A)的情況除外)的固體成分的合計100重量%中,化合物(A)的含量為10重量%~90重量%。The laminate according to claim 2, wherein the compound (A) having a fluorene structure and/or a biphenyl structure and two or more (meth) acryl fluorenyl groups has three or more ( The content of the compound (A) is from 10% by weight to 90% by weight based on 100% by weight of the total of the solid components of the methyl (meth) fluorenyl group compound (X) (excluding the case of the compound (A)). 如申請專利範圍第1項至第3項中任一項所述的積層體,其中所述化合物(A)為下述通式(1)所表示的化合物(A1), 通式(1):(通式(1)中,R1 及R3 中至少一個為下述所示的四價或一價有機殘基, R2 表示具有(甲基)丙烯醯基的一價有機殘基) The laminate according to any one of claims 1 to 3, wherein the compound (A) is a compound (A1) represented by the following formula (1), and the formula (1): (In the formula (1), at least one of R 1 and R 3 is a tetravalent or monovalent organic residue shown below, and R 2 represents a monovalent organic residue having a (meth) acrylonitrile group) . 如申請專利範圍第1項至第3項中任一項所述的積層體,其中所述化合物(A)為下述通式(2)所表示的化合物(A2), 通式(2):   R5 -O-R4 -O-R5 (通式(2)中,R4 為下述所示的二價有機殘基, R5 表示具有(甲基)丙烯醯基的一價有機殘基)The laminate according to any one of claims 1 to 3, wherein the compound (A) is a compound (A2) represented by the following formula (2), and the formula (2): R 5 -OR 4 -OR 5 (In the formula (2), R 4 is a divalent organic residue shown below, and R 5 represents a monovalent organic residue having a (meth) acrylonitrile group) . 如申請專利範圍第1項至第5項中任一項所述的積層體,其中在照射累計光量為2000 mJ/cm2 以上的活性能量線的情況下,利用依據日本工業標準K5600-5-6的附著性交叉切割法來測定的所述基材與所述樹脂層的密合性為每單位面積的剝離面積小於5%。The laminate according to any one of claims 1 to 5, wherein, in the case of irradiating an active energy ray having an integrated light amount of 2000 mJ/cm 2 or more, the use is in accordance with Japanese Industrial Standard K5600-5- The adhesion between the substrate and the resin layer measured by the adhesion cross-cut method of 6 is less than 5% of the peeling area per unit area. 如申請專利範圍第1項至第6項中任一項所述的積層體,其中所述組成物更包含金屬氧化物。The laminate according to any one of claims 1 to 6, wherein the composition further comprises a metal oxide. 如申請專利範圍第7項所述的積層體,其中所述金屬氧化物包含鈦及/或鋯原子。The laminate according to claim 7, wherein the metal oxide comprises titanium and/or zirconium atoms. 一種積層體的製造方法,其包括: 在作為聚酯膜的基材上,塗敷包含具有芴結構及/或聯苯結構、以及2個以上的(甲基)丙烯醯基的化合物(A)的活性能量線硬化性組成物,照射活性能量線使其硬化而形成樹脂層的步驟;以及 形成透明導電膜的步驟。A method for producing a laminate comprising: coating a compound (A) comprising a fluorene structure and/or a biphenyl structure and two or more (meth) acryl fluorenyl groups on a substrate as a polyester film The active energy ray-curable composition, the step of irradiating the active energy ray to harden it to form a resin layer, and the step of forming a transparent conductive film.
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