TW201705561A - Novel piezoelectric quartz wafer with dual-convex structure and machining process thereof - Google Patents
Novel piezoelectric quartz wafer with dual-convex structure and machining process thereof Download PDFInfo
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- 239000010453 quartz Substances 0.000 title claims abstract description 97
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 97
- 238000003754 machining Methods 0.000 title claims abstract 3
- 239000000758 substrate Substances 0.000 claims description 36
- 238000005530 etching Methods 0.000 claims description 28
- 230000001681 protective effect Effects 0.000 claims description 21
- 239000011241 protective layer Substances 0.000 claims description 17
- 238000005520 cutting process Methods 0.000 claims description 12
- 238000001312 dry etching Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 9
- 238000001039 wet etching Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 238000004528 spin coating Methods 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000000227 grinding Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000005422 blasting Methods 0.000 claims description 3
- 238000003698 laser cutting Methods 0.000 claims description 3
- 238000010329 laser etching Methods 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 230000035484 reaction time Effects 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 abstract description 41
- 230000000694 effects Effects 0.000 abstract description 8
- 230000003071 parasitic effect Effects 0.000 abstract description 4
- 230000001965 increasing effect Effects 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 2
- 238000010295 mobile communication Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
- H10N30/706—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings characterised by the underlying bases, e.g. substrates
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/05—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
本發明涉及壓電石英晶片構造的技術領域，尤指一種新型具有雙凸結構的壓電石英晶片及其加工工藝。The invention relates to the technical field of piezoelectric quartz wafer construction, in particular to a novel piezoelectric quartz wafer with a double convex structure and a processing technique thereof.
目前，石英晶體諧振器通常由壓電石英晶片及封裝外殼構成，其中壓電石英晶片為長方形或圓形，封裝外殼材料為陶瓷、玻璃等。壓電石英晶片上下兩面需蒸鍍電極，電極通過密封封裝的引線，與封裝外殼中的基座引腳相連。交流電壓可通過引腳連通石英晶片的上下電極，使石英晶片產生逆壓電效應，從而產生振盪。石英晶體諧振器因其頻率的準確性和穩定性等特性廣泛應用在移動電子設備、手機、移動通信裝置等電子行業。At present, a quartz crystal resonator is generally composed of a piezoelectric quartz wafer and a package casing, wherein the piezoelectric quartz wafer is rectangular or circular, and the package casing material is ceramic, glass, or the like. The electrodes on the upper and lower sides of the piezoelectric quartz wafer are vapor-deposited, and the electrodes are connected to the pedestal pins in the package casing through the leads of the sealed package. The AC voltage can be connected to the upper and lower electrodes of the quartz wafer through the pins, causing the quartz wafer to have an inverse piezoelectric effect, thereby generating oscillation. Quartz crystal resonators are widely used in electronic industries such as mobile electronic devices, mobile phones, and mobile communication devices due to their frequency accuracy and stability.
隨著移動通信電子的迅速發展，器件小型化需求越來越高，石英晶體諧振器的小型化也勢在必行。在石英晶體諧振器小型化的進程中，傳統設計結構已很難生產，且成本較高。傳統的切條、腐蝕等工藝方式難以加工超小型石英晶片，已經不能滿足小型化的要求。With the rapid development of mobile communication electronics, the demand for miniaturization of devices is increasing, and the miniaturization of quartz crystal resonators is also imperative. In the process of miniaturization of quartz crystal resonators, the conventional design structure has been difficult to produce and the cost is high. Conventional cutting, etching and other processes are difficult to process ultra-small quartz wafers, which cannot meet the requirements of miniaturization.
石英晶體諧振器的諧振頻率較低時，為了提高能陷效應，削弱石英晶片邊緣效應，需改變石英晶片的外形。通常情況下，採用的是滾磨磨削方式，改變石英晶片外形，即雙凸曲面結構。但因滾磨工藝的穩定性差、重複性低，所以成本一直居高不下，因此，石英晶片技術亟待提升。When the resonant frequency of the quartz crystal resonator is low, in order to improve the trapping effect and weaken the edge effect of the quartz wafer, it is necessary to change the shape of the quartz wafer. Usually, the barrel grinding method is adopted to change the shape of the quartz wafer, that is, the biconvex surface structure. However, due to the poor stability and low repeatability of the barreling process, the cost has always been high. Therefore, the quartz wafer technology needs to be improved.
爰是，本發明的目的在於克服現有技術的缺點，提供一種成本低、可用於小型化石英晶片批量型生產、減弱邊緣產生的寄生振動，並能夠增強石英晶片中心的能陷效應、大幅度提升產品的一致性的新型具有雙凸結構的壓電石英晶片及其加工工藝。Therefore, the object of the present invention is to overcome the shortcomings of the prior art, to provide a low cost, can be used for miniaturizing the mass production of quartz wafers, reducing the parasitic vibration generated by the edges, and enhancing the trapping effect of the center of the quartz wafer, and greatly improving A new type of piezoelectric quartz wafer with a double convex structure and its processing technology for product consistency.
為達致以上目的，吾等發明人提供一種新型具有雙凸結構的壓電石英晶片，它包括中央構件、保護框和連接部，所述的中央構件和保護框均呈矩形狀，保護框內設置有型腔，型腔內設置有中央構件，中央構件的頂表面設置有第一凸台，中央構件的底表面設置有第二凸台，保護框的兩條長邊與中央構件的兩條長邊之間形成有第一通槽，保護框的兩條短邊與中央構件的兩條短邊之間形成有第二通槽，第一通槽與第二通槽連通，所述的保護框的任意一條短邊與中央構件之間通過連接部相連接，連接部設置在任意一個第二通槽內。In order to achieve the above object, the inventors have provided a novel piezoelectric quartz wafer having a double convex structure, which comprises a central member, a protective frame and a connecting portion, wherein the central member and the protective frame are both rectangular and protected within the frame. a cavity is arranged, a central member is arranged in the cavity, a top surface of the central member is provided with a first boss, and a bottom surface of the central member is provided with a second boss, two long sides of the protection frame and two of the central member A first through slot is formed between the long sides, and a second through slot is formed between the two short sides of the protection frame and the two short sides of the central member, and the first through slot communicates with the second through slot, the protection Any one of the short sides of the frame and the central member are connected by a connecting portion, and the connecting portion is disposed in any one of the second through grooves.
所述的第一凸台和第二凸台為圓形凸台、矩形凸台或梯形凸台。The first boss and the second boss are circular bosses, rectangular bosses or trapezoidal bosses.
所述的連接部的形狀為矩形或梯形。The connecting portion has a rectangular or trapezoidal shape.
所述的壓電石英晶片的長度為0.8~3.2mm。The piezoelectric quartz wafer has a length of 0.8 to 3.2 mm.
所述的壓電石英晶片的寬度為0.6~2.5mm。The piezoelectric quartz wafer has a width of 0.6 to 2.5 mm.
所述的中央構件、保護框和連接部的材質均為石英。The material of the central member, the protective frame and the connecting portion is quartz.
一種加工壓電石英晶片的工藝，它包括以下步驟：A process for processing a piezoelectric quartz wafer, comprising the steps of:
S1、取出一定規格的石英基板，並對石英基板的上、下表面進行研磨、拋光處理；S1, taking out a quartz substrate of a certain specification, and grinding and polishing the upper and lower surfaces of the quartz substrate;
S2、通過旋塗或噴淋方式在石英基板表面形成厚度均勻的光刻抗刻蝕保護層ER，然後使用光刻曝光在光刻抗刻蝕保護層ER上，在表面形成待刻蝕圖形；S2, forming a lithographic anti-etching protective layer ER having a uniform thickness on the surface of the quartz substrate by spin coating or spraying, and then using lithographic exposure on the lithographic anti-etching protective layer ER to form a pattern to be etched on the surface;
S3、通過濕法刻蝕或乾法刻蝕方式在石英基板上表面刻蝕，從而在石英基板表面形成第一凸台和第二凸台，第一凸台和第二凸台的刻蝕深度通過控制濕法刻蝕或乾法刻蝕反應時間決定；S3, etching the surface of the quartz substrate by wet etching or dry etching to form a first protrusion and a second protrusion on the surface of the quartz substrate, and etching depths of the first protrusion and the second protrusion Determine the reaction time by controlling the wet etching or dry etching;
S4、去除步驟S3中的光刻抗刻蝕保護層ER並將石英基板表面清洗乾淨；S4, removing the lithographic anti-etching protective layer ER in step S3 and cleaning the surface of the quartz substrate;
S5、清洗結束後，先通過旋塗或噴淋方式在石英基板表面形成厚度均勻的光刻抗刻蝕保護層ER，再使用光刻曝光在光刻抗刻蝕保護層ER上表面形成待刻蝕圖形；S5. After the cleaning is completed, a lithographic anti-etching protective layer ER having a uniform thickness is formed on the surface of the quartz substrate by spin coating or spraying, and then the surface of the lithographic anti-etching protective layer ER is formed by photolithography exposure. Eclipse pattern
S6、通過濕法刻蝕、乾法刻蝕、鐳射刻蝕、物理噴砂等方式在石英基板上表面刻蝕，從而形成第一通槽和第二通槽；S6, etching the surface of the quartz substrate by wet etching, dry etching, laser etching, physical blasting, etc., thereby forming a first through groove and a second through groove;
S7、去除光刻抗刻蝕保護層ER並將石英基板表面清洗乾淨，從而制得具有雙凸結構的壓電石英晶片。S7. The lithographic anti-etching protective layer ER is removed and the surface of the quartz substrate is cleaned to obtain a piezoelectric quartz wafer having a double convex structure.
S8、在石英基板上加工出切割定位孔；S8, processing a cutting positioning hole on the quartz substrate;
S9、使用鐳射切割或刀片切割沿著切割定位孔對石英基板進行切割分離，從而實現了石英晶片的加工。S9, using a laser cutting or a blade cutting to cut and separate the quartz substrate along the cutting positioning hole, thereby realizing the processing of the quartz wafer.
是由上述說明及設置，顯見本發明主要具有下列數項優點及功效，茲逐一詳述如下：It is obvious from the above description and setting that the present invention has the following several advantages and effects, which are detailed as follows:
1. 本發明的中央構件的頂表面設置有第一凸台，中央構件的底表面設置有第二凸台，第一凸台和第二凸台能夠減弱邊緣產生的寄生振動，並能夠增強石英晶片中心的能陷效應。（2）本發明可用於小型化石英晶片批量型生產、大幅度提升了晶片和晶體的製造效率，同時一致性也得到提升。（3）當保護框受到外界力的作用時，力不會傳遞到中央構件上，從而很好地保護了中央構件。1. The top surface of the central member of the present invention is provided with a first boss, and the bottom surface of the central member is provided with a second boss, the first boss and the second boss can attenuate the parasitic vibration generated by the edge and can enhance the quartz The trapping effect at the center of the wafer. (2) The present invention can be used for mass production of miniaturized quartz wafers, greatly improving the manufacturing efficiency of wafers and crystals, and at the same time improving consistency. (3) When the protective frame is subjected to external force, the force is not transmitted to the central member, thereby protecting the central member well.
關於吾等發明人之技術手段，茲舉數種較佳實施例配合圖式於下文進行詳細說明，俾供 鈞上深入瞭解並認同本發明。The invention will be described in detail below with reference to the drawings.
下面結合附圖對本發明做進一步的描述，本發明的保護範圍不局限於以下所述：The present invention will be further described below in conjunction with the accompanying drawings, and the scope of protection of the present invention is not limited to the following:
實施例一：Embodiment 1:
如圖1~4所示，一種新型具有雙凸結構的壓電石英晶片，該石英晶片採用AT切型，此切型普遍應用於石英晶體諧振器中，其中晶片的長邊平行於X軸，X軸是石英晶體的電軸，短邊平行於Z'軸，厚度方向平行於Y'軸。不排除，石英晶片的長邊平行於Z'軸，寬度平行於X軸，厚度方向平行於Y'軸，該壓電石英晶片包括中央構件1、保護框2和連接部3，中央構件1、保護框2和連接部3的材質均為石英，所述的中央構件1和保護框2均呈矩形狀，保護框2內設置有型腔，型腔內設置有中央構件1，中央構件1的頂表面設置有第一凸台4，中央構件1的底表面設置有第二凸台5，第一凸台4和第二凸台5能夠減弱邊緣產生的寄生振動，並能夠增強石英晶片中心的能陷效應。所述的保護框2的兩條長邊與中央構件1的兩條長邊之間形成有第一通槽6。如圖1~4所示，保護框2的兩條短邊與中央構件1的兩條短邊之間形成有第二通槽7，第一通槽6與第二通槽7連通，所述的保護框2的任意一條短邊與中央構件1之間通過連接部3相連接，連接部3設置在任意一個第二通槽7內。As shown in FIGS. 1 to 4, a novel piezoelectric quartz wafer having a double convex structure using an AT cut type is generally applied to a quartz crystal resonator in which a long side of the wafer is parallel to the X axis. The X axis is the electrical axis of the quartz crystal, the short side is parallel to the Z' axis, and the thickness direction is parallel to the Y' axis. It is not excluded that the long side of the quartz wafer is parallel to the Z' axis, the width is parallel to the X axis, and the thickness direction is parallel to the Y' axis. The piezoelectric quartz wafer includes the central member 1, the protective frame 2 and the connecting portion 3, and the central member 1, The material of the protective frame 2 and the connecting portion 3 is quartz. The central member 1 and the protective frame 2 are both rectangular. The protective frame 2 is provided with a cavity, and the central member 1 is disposed in the cavity. The top surface is provided with a first boss 4, and the bottom surface of the central member 1 is provided with a second boss 5, and the first boss 4 and the second boss 5 can attenuate the parasitic vibration generated by the edge and can enhance the center of the quartz wafer Can trap effect. A first through groove 6 is formed between the two long sides of the protective frame 2 and the two long sides of the central member 1. As shown in FIGS. 1 to 4, a second through slot 7 is formed between the two short sides of the protective frame 2 and the two short sides of the central member 1, and the first through slot 6 communicates with the second through slot 7, Any one of the short sides of the protective frame 2 is connected to the central member 1 via the connecting portion 3, and the connecting portion 3 is disposed in any one of the second through grooves 7.
所述的第一凸台4和第二凸台5為圓形凸台、矩形凸台或梯形凸台。所述的連接部3的形狀為矩形或梯形，本實施例中第一凸台4和第二凸台5均為矩形凸台，本實施例中的連接部3均為矩形狀。The first boss 4 and the second boss 5 are circular bosses, rectangular bosses or trapezoidal bosses. The shape of the connecting portion 3 is rectangular or trapezoidal. In the present embodiment, the first boss 4 and the second boss 5 are rectangular bosses, and the connecting portions 3 in this embodiment are all rectangular.
所述的壓電石英晶片的長度為0.8~3.2mm，本實施例中的長度為1.6mm，所述的壓電石英晶片的寬度為0.6~2.5mm，本實例中的寬度為1.2mm，該石英晶片的諧振頻率為t=1664/F，t表示石英晶片的厚度，單位為μm；F表示諧振頻率，單位為MHz，本實例中的石英晶片的諧振頻率在8MHz ~70MHz之間。The piezoelectric quartz wafer has a length of 0.8 to 3.2 mm, a length of 1.6 mm in the embodiment, a width of the piezoelectric quartz wafer of 0.6 to 2.5 mm, and a width of 1.2 mm in the present example. The resonant frequency of the quartz wafer is t=1664/F, t represents the thickness of the quartz wafer in μm; F represents the resonant frequency in MHz, and the resonant frequency of the quartz wafer in this example is between 8 MHz and 70 MHz.
如圖5和圖6所示，一種新型具有雙凸結構的壓電石英晶片，其加工步驟如下：As shown in FIG. 5 and FIG. 6, a novel piezoelectric quartz wafer having a double convex structure is processed as follows:
S1、取出一定規格的石英基板8，並對石英基板8的上、下表面進行研磨、拋光處理；S1, taking out a quartz substrate 8 of a certain specification, and grinding and polishing the upper and lower surfaces of the quartz substrate 8;
S2、通過旋塗或噴淋方式在石英基板8表面形成厚度均勻的光刻抗刻蝕保護層ER，然後使用光刻曝光在光刻抗刻蝕保護層ER上，在表面形成待刻蝕圖形；S2, forming a uniform thickness lithographic anti-etching protective layer ER on the surface of the quartz substrate 8 by spin coating or spraying, and then using lithographic exposure on the lithographic anti-etching protective layer ER to form a pattern to be etched on the surface ;
S3、通過濕法刻蝕或乾法刻蝕方式在石英基板8上表面刻蝕，從而在石英基板8表面形成第一凸台4和第二凸台5，第一凸台4和第二凸台5的刻蝕深度通過控制濕法刻蝕或乾法刻蝕反應時間決定；S3, etching the upper surface of the quartz substrate 8 by wet etching or dry etching, thereby forming a first boss 4 and a second boss 5 on the surface of the quartz substrate 8, the first boss 4 and the second bump The etching depth of the stage 5 is determined by controlling the wet etching or dry etching reaction time;
S4、去除步驟S3中的光刻抗刻蝕保護層ER並將石英基板8表面清洗乾淨；S4, removing the lithographic anti-etching protective layer ER in step S3 and cleaning the surface of the quartz substrate 8;
S5、清洗結束後，先通過旋塗或噴淋方式在石英基板8表面形成厚度均勻的光刻抗刻蝕保護層ER，再使用光刻曝光在光刻抗刻蝕保護層ER上表面形成待刻蝕圖形；S5. After the cleaning is completed, a lithographic anti-etching protective layer ER having a uniform thickness is formed on the surface of the quartz substrate 8 by spin coating or spraying, and then formed on the upper surface of the lithographic anti-etching protective layer ER by photolithography exposure. Etching the pattern;
S6、通過濕法刻蝕、乾法刻蝕、鐳射刻蝕、物理噴砂等方式在石英基板8上表面刻蝕，從而形成第一通槽6和第二通槽7；S6, the surface of the quartz substrate 8 is etched by wet etching, dry etching, laser etching, physical blasting, etc., thereby forming a first through groove 6 and a second through groove 7;
S7、去除光刻抗刻蝕保護層ER並將石英基板8表面清洗乾淨，從而制得具有雙凸結構的壓電石英晶片。S7. The lithographic anti-etching protective layer ER is removed and the surface of the quartz substrate 8 is cleaned, thereby producing a piezoelectric quartz wafer having a double convex structure.
S8、在石英基板8上加工出切割定位孔9；S8, processing a cutting positioning hole 9 on the quartz substrate 8;
S9、使用鐳射切割或刀片切割沿著切割定位孔9對石英基板8進行切割分離，從而實現了石英晶片的加工。S9. Cutting and separating the quartz substrate 8 along the cutting positioning hole 9 by using laser cutting or blade cutting, thereby realizing processing of the quartz wafer.
實施例二：Embodiment 2:
如圖7~9所示，本實施二與實施例一的不同點在於：所述的保護框2的任意一條短邊與中央構件1之間連接有兩個連接部3，兩個連接部3增加了中央構件1和與保護框2之間的機械強度。As shown in FIG. 7 to FIG. 9 , the difference between the second embodiment and the first embodiment is that two short connecting portions 3 and two connecting portions 3 are connected between the short side of the protective frame 2 and the central member 1 . The mechanical strength between the central member 1 and the protective frame 2 is increased.
綜上所述，本發明所揭露之技術手段確能有效解決習知等問題，並達致預期之目的與功效，且申請前未見諸於刊物、未曾公開使用且具長遠進步性，誠屬專利法所稱之發明無誤，爰依法提出申請，懇祈 鈞上惠予詳審並賜准發明專利，至感德馨。In summary, the technical means disclosed by the present invention can effectively solve the problems of the prior knowledge, achieve the intended purpose and efficacy, and are not found in the publication before publication, have not been publicly used, and have long-term progress, The inventions referred to in the Patent Law are correct, and the application is filed according to law, and the company is invited to give a detailed examination and grant a patent for invention.
惟以上所述者，僅為本發明之數種較佳實施例，當不能以此限定本發明實施之範圍，即大凡依本發明申請專利範圍及發明說明書內容所作之等效變化與修飾，皆應仍屬本發明專利涵蓋之範圍內。The above is only the preferred embodiments of the present invention, and the scope of the present invention is not limited thereto, that is, the equivalent changes and modifications made by the scope of the invention and the contents of the invention are all It should remain within the scope of this invention.
1‧‧‧中央構件
2‧‧‧保護框
3‧‧‧連接部
4‧‧‧第一凸台
5‧‧‧第二凸台
6‧‧‧第一通槽
7‧‧‧第二通槽
8‧‧‧石英基板
9‧‧‧切割定位孔1‧‧‧Central components
2‧‧‧protection frame
3‧‧‧Connecting Department
4‧‧‧First boss
5‧‧‧second boss
6‧‧‧ first slot
7‧‧‧Second trough
8‧‧‧Quartz substrate
9‧‧‧ cutting positioning hole
圖1為本發明實施例一的結構示意圖。 圖2為圖1的俯視圖。 圖3為圖2的A-A剖視圖。 圖4為圖1的仰視圖。 圖5為本發明實施例一基於石英基板經製造工藝加工後產品俯視圖。 圖6為圖5的仰視圖。 圖7為本發明實施例二的結構示意圖。 圖8為圖7的俯視圖。 圖9為圖7的仰視圖。 圖10為本發明實施例二基於石英基板經製造工藝加工後產品俯視圖。 圖11為圖10的仰視圖。FIG. 1 is a schematic structural view of Embodiment 1 of the present invention. Figure 2 is a plan view of Figure 1. Fig. 3 is a cross-sectional view taken along line A-A of Fig. 2; Figure 4 is a bottom view of Figure 1. FIG. 5 is a top plan view of a product based on a quartz substrate processed by a manufacturing process according to an embodiment of the present invention. Figure 6 is a bottom view of Figure 5. FIG. 7 is a schematic structural diagram of Embodiment 2 of the present invention. Figure 8 is a plan view of Figure 7. Figure 9 is a bottom view of Figure 7. 10 is a top plan view of a product based on a quartz substrate processed by a manufacturing process according to Embodiment 2 of the present invention. Figure 11 is a bottom view of Figure 10.
1‧‧‧中央構件 1‧‧‧Central components
2‧‧‧保護框 2‧‧‧protection frame
3‧‧‧連接部 3‧‧‧Connecting Department
4‧‧‧第一凸台 4‧‧‧First boss
6‧‧‧第一通槽 6‧‧‧ first slot
7‧‧‧第二通槽 7‧‧‧Second trough
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| CN110224684B (en) * | 2019-07-09 | 2024-01-30 | 成都泰美克晶体技术有限公司 | High-frequency polished quartz wafer with bump structure |
| CN110224681B (en) * | 2019-07-09 | 2024-01-26 | 成都泰美克晶体技术有限公司 | High-frequency polished quartz wafer with short H-shaped structure |
| CN110224683B (en) * | 2019-07-09 | 2024-02-02 | 成都泰美克晶体技术有限公司 | High-frequency polished quartz wafer with long H-shaped structure |
| CN111252728B (en) * | 2020-01-22 | 2023-03-28 | 上海应用技术大学 | Batch processing method of MEMS piezoelectric devices |
| CN114770781B (en) * | 2022-06-22 | 2022-10-14 | 成都泰美克晶体技术有限公司 | SC wafer chord-changing positioning device and using method thereof |
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